WO2017043793A1 - Exhaust gas purifying apparatus - Google Patents

Abstract

The present invention relates to an exhaust gas purifying apparatus comprising: a first duct that guides an exhaust gas containing foreign substances in a first direction; a foreign-substance receiving part formed on the bottom of the first duct to receive the foreign substances contained in the exhaust gas; a second duct that communicates with a purified-gas outlet formed on a side surface of the first duct and guides a purified gas, from which the foreign substances have been removed, in a second direction; and a first baffle installed to protrude toward the inside of the first duct and guiding an exhaust gas introduced into the first duct such that the flow direction of the exhaust gas is rapidly changed into the second direction toward the second duct, wherein the first duct includes: a first inflow part installed in a position relatively close to the second duct; and a second inflow part installed adjacent to the first inflow part and installed in a position relatively far away from the second duct.

Description

Exhaust gas purification device

The present invention relates to an exhaust gas purifying apparatus, and more particularly, to an exhaust gas purifying apparatus and a baffle thereof which can be used in an installation in which it is necessary to remove foreign substances such as various ashes and suspended solids generated by the use of fossil fuels.

In general, combustion facilities such as thermal power plants, incinerators and industrial boilers generate energy by burning fossil fuels such as coal, heavy oil, and natural gas. When the fossil fuel is burned, it contains a large amount of foreign matter such as ash or ash in the form of powder or solid generated after combustion, unburned fuel material, non-combustible material, nitrogen compound or carbon compound. If the gas containing these foreign substances is discharged to the atmosphere may cause air pollution, and in some cases may be adversely affected even in the facility that is connected to the combustion facility to process the gas generated during combustion. For example, in the selective catalytic reduction process, a flue gas treatment technology that harmlessly processes harmful substances such as NOx, CO, Dioxine, etc. generated in various combustion facilities, these foreign substances get stuck in the catalyst layer, thereby improving the function and characteristics of the catalyst layer. Significantly degraded. Therefore, there is a need for a technique for separating and removing foreign matter contained in the gas generated by combustion.

The idea of the present invention is to guide the discharge gas containing the foreign matter toward the foreign matter accommodating portion to improve the foreign matter separation performance, and to install a first baffle and a second baffle that can induce a sudden change in the direction of the air flow and the discharge gas and It is to provide an exhaust gas purification device that facilitates the separation of foreign matter, and can accelerate the change of direction of the air flow in the discharge direction by using the air flow guide groove.

The exhaust gas purifying apparatus according to the spirit of the present invention for solving the above problems is formed on the bottom surface of the first duct, the first duct to guide the exhaust gas containing foreign matter in the first direction, A foreign matter accommodating part for accommodating foreign matter contained therein, and a second duct part communicating with a purge gas outlet formed at a side surface of the first duct part and guiding the purge gas from which the foreign matter is separated in a second direction, and the inside of the first duct part. And a first baffle installed to protrude from the first duct part such that the air flow direction of the exhaust gas flowing into the first duct part is suddenly changed in a second direction of the second duct part direction. The first inlet part installed at a position relatively close to the second duct part and the second inlet part installed adjacent to the first inlet part and installed at a position relatively far from the second duct part. It can hamhal.

The first baffle may have a front end protruding obliquely downward at a first downward angle with respect to the foreign substance accommodating part and a rear end fixed above the purge gas outlet.

The first downward angle may be 30 degrees to 50 degrees.

The first baffle may have a first protrusion length protruding obliquely toward the foreign substance accommodating portion at least 33 percent to 42 percent at a first orientation distance from a connection point of the purge gas outlet to a first extension point on the foreign substance accommodating portion. Can be.

The second duct portion may have a flow path height that is a height of a flow path through which the purge gas is discharged, and a first pass distance obtained by subtracting the first protrusion length from the first direction distance may be equal to or greater than the flow path height.

The first duct unit may further include a partition wall that divides the first inlet unit and the second inlet unit.

It may further include a second baffle installed to protrude into the first inlet, and to induce a rapid change in the air flow direction of the exhaust gas introduced into the first inlet to a second direction of the second duct part. .

The second baffle may have a front end protruding obliquely downward at a second downward angle with respect to the foreign substance accommodating part and a rear end fixed to a lower end of the separation wall.

The second downward angle may be 30 degrees to 50 degrees.

The second baffle may have a second protrusion length protruding obliquely toward the foreign substance accommodating portion at a second direction distance from a connection point of the separation wall to a second extension point on the foreign substance accommodating portion. have.

The foreign matter receiving portion may be a funnel-shaped hopper recessed downward, and an induction plane portion having a flat surface may be formed between the first duct portion and the foreign matter receiving portion.

According to the embodiment of the present invention made as described above, the exhaust gas purification apparatus can improve the separation performance of separating the foreign matter contained in the exhaust gas to the foreign matter receiving portion through the rapid change in the direction of the air flow of the exhaust gas.

In addition, it is possible to purify the exhaust gases intake at various locations using a single device, and to change the angle or length of the baffle, and to increase the efficiency without changing a separate device or manufacturing method, so that the equipment or the production is easy. It can have an easy effect. Of course, the scope of the present invention is not limited by these effects.

1 is a perspective view showing an exhaust gas purification apparatus according to an embodiment of the present invention.

2 to 7 are views illustrating an exhaust gas purification apparatus according to various embodiments of the present invention.

8 is an operational state diagram showing the exhaust gas purification apparatus of FIG. 1.

FIG. 9 is a comparison table illustrating a foreign matter removal rate and a pressure difference according to the baffle angle of the exhaust gas purifying apparatus of FIG. 2.

FIG. 10 is a comparison table illustrating a foreign matter removal rate and a pressure difference according to the baffle length of the exhaust gas purifying apparatus of FIG. 3.

The embodiments of the present invention are provided to more fully explain the present invention to those skilled in the art, and the following examples can be modified in various other forms, and the scope of the present invention is It is not limited to an Example. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. In addition, the thickness or size of each layer in the drawings is exaggerated for convenience and clarity of description.

1 is a perspective view showing an exhaust gas purification apparatus 100 according to an embodiment of the present invention.

As shown in FIG. 1, the first duct part 10, the second duct part 20, the foreign substance accommodating part 30, and the first baffle 40 may be included.

As illustrated in FIG. 1, the first duct part 10 may be formed to guide the discharge gas G1 including the foreign matter 1 in the first direction. For example, the first duct unit 10 may be ash or ash in the form of powder or solids generated after combustion, fuel materials in an unburned state, non-burning incombustibles, nitrogen compounds, carbon bonds, or the like. Inducing the discharge gas (G1) containing the 1) in the first direction (downward in Figure 1), the first duct portion 10 is formed in a variety of ducts, such as a cylindrical or pipe, in addition to a rectangular cylindrical shape Can be.

As shown in FIG. 1, the first duct part 10 is installed adjacent to the first inlet part 11 and the first inlet part 11 which are installed at a relatively close position from the second duct part 20. And a second inflow portion 12 installed at a position relatively far from the second duct portion 20. for example. The first duct part 10 may further include a separation wall 50 capable of dividing the first inlet part 11 and the second inlet part 12.

For example, as illustrated in FIG. 1, the first duct part 10 may be formed by combining ducts connected at different positions, and may separate one duct to purify the foreign matter 1 more efficiently. It may be.

As shown in FIG. 1, the dividing wall 50 may be formed by combining ducts or may be installed to separate the ducts. The dividing wall 50 may be installed in a plate shape, and may be installed in a polygonal column shape that extends in the horizontal direction in order to increase the pressure into which the introduced discharge gas G1 flows. For example, as shown in FIG. 1, an upper wall of the first inlet part 11 and the second inlet part 12 in which the separation wall 50 is horizontally laid in a pentagonal column shape and into which the exhaust gas G1 flows is introduced. The inlet portion formed in the lower portion than the inlet tube formed in the narrower the pressure of the inlet gas (G1) may be higher. Thus, the introduced exhaust gas G1 loses momentum due to the rapidly slowed flow rate and gravity due to the sharply lowered pressure in the wider foreign matter accommodating part 30, and thus is purified by the foreign substance accommodating part 30. Can be.

As shown in FIG. 1, the first inlet 11 may be installed at a position close to the second duct 20, and the exhaust gas G1 introduced from the first inlet 11 may be faster. Although it may flow out to the second duct part 20, the direction of airflow may be changed due to the separation wall to be described later, and thus may flow out to the second duct part 20.

As shown in FIG. 1, the second inflow portion 12 may be installed at a position relatively far from the first inflow portion 11 in the second duct portion 20, and in the second inflow portion 12. The introduced discharge gas G1 may flow out to the second duct part 20 relatively slower than the discharge gas G1 introduced from the first inlet part, but may be purified by inertia or centrifugal force due to the separation wall to be described later. It may flow out to the two duct portion 20.

Although not shown in addition, in addition to the first inlet 11 and the second inlet 12 may be formed by combining a plurality of ducts connected at different positions.

As illustrated in FIG. 1, the second duct part 20 communicates with a purification gas outlet H formed at a side surface of the first duct part 10, and the purification gas G2 having the foreign matter 1 separated therefrom. Can be derived in the second direction (rear of FIG. 1). For example, the second duct portion 20 may be formed in various shapes such as a cylinder or a pipe in addition to the rectangular cylinder shape.

Here, the second direction is a direction flowing into the processing apparatus for treating harmful components of the exhaust gas G1 before finally discharging the discharge gas G1 introduced through the first duct part 10 to the outside. Can be. In this case, the treatment apparatus may be a selective catalytic reduction facility, and the exhaust gas G1 introduced into the second direction may be directed to a catalyst layer constituting the selective catalytic reduction facility.

As illustrated in FIG. 1, the foreign matter accommodating part 30 is formed on the bottom surface of the first duct part 10, and the foreign matter 1 included in the discharge gas G1 guided in the first direction and dropped. I can accept it. The foreign material accommodating part 30 may be a funnel-shaped hopper recessed downward so that the foreign materials 1 are stacked downward.

As shown in FIG. 1, the first baffle 40 is installed to protrude into the first duct part 10, and the air flow direction of the discharge gas G1 introduced into the first duct part 10 is set to the first baffle 40. It can be induced to change rapidly in the second direction of the two duct portion direction.

As shown in FIG. 1, the first baffle 40 may allow the exhaust gas G1 of the first duct part 10 to be diverted to the second duct part 20 via the foreign matter accommodating part 30. It may be installed to protrude into the first duct portion 10. In addition, the first baffle 40 may be formed to have a rounded surface to promote the change of direction of the exhaust gas (G1), but is not necessarily limited thereto.

As shown in FIG. 1, the first baffle 40 protrudes inclined at a first downward angle A1 downward with respect to a horizontal surface toward the foreign substance accommodating portion 30 and the rear end thereof is a purge gas discharge hole H. It may be fixed above.

As shown in FIG. 1, the first baffle 40 sharply changes the direction of the discharge gas G1 introduced into the first direction through the first duct part 10 toward the second duct part 20. It can be induced to change. That is, the exhaust gas G1 introduced through the first duct part 10 flows in the first direction (downward in FIG. 1), and then the direction of the air flow is changed by the first duct baffle 40. 20 may be abruptly switched to the second direction. When such a sudden change of direction of the airflow occurs, the foreign matter 1 having a predetermined mass contained in the exhaust gas G1 tends to continue to move in the first direction by inertia (or centrifugal force). As it does not correspond to the change in the air flow direction is moved toward the foreign matter receiving portion 30 may be separated from the exhaust gas (G1).

Therefore, most of the foreign matter 1 can be accommodated in the foreign matter accommodating portion 30 by the sudden change of air flow induced by the first baffle 40, and the foreign matter 1 is transferred to the second duct portion 20. Only the purged gas G2 that has been removed and purified may be discharged to the outside.

2 to 7 are views illustrating exhaust gas purifying apparatuses 200, 300, 400, 500, 600, and 700 according to various embodiments of the present disclosure.

As shown in FIG. 2, the first baffle 40 of the exhaust gas purification apparatus 200 according to another embodiment of the present invention is fixed above the purification gas outlet H to face the foreign matter accommodating part 30. It may be installed to be inclined downward with respect to the horizontal plane. For example, the first baffle 40 discharges the discharge gas G1 introduced from the first duct unit 10 to the second duct unit 20 so as to discharge the discharge gas G1 from the first duct unit 10. It does not interfere with the inflow of, and may be installed so as not to interfere with the discharge of the purification gas (G2) in the second duct portion 20, inclined at a first downward angle (A1) relative to the horizontal plane to maximize the purification efficiency. Can be increased with For example, when the first downward angle A1 becomes greater than or equal to a certain angle or less, the inlet becomes wider and the outlet becomes narrower so that the pressure difference between the inlet and the outlet becomes too large and the purification efficiency can be lowered. The first downward angle A1 may be 30 degrees to 50 degrees.

As shown in FIG. 3, the first baffle 40 of the exhaust gas purification apparatus 300 according to another embodiment of the present invention may be installed to protrude a predetermined distance. For example, the length of the first baffle 40 protruding obliquely toward the foreign substance accommodating part 30 may be the first protrusion length B1. In addition, the virtual extension point of the first baffle 40 located on the foreign matter receiving portion 30 may be a first extension point 41, from a connection point of the first baffle 40 and the purge gas outlet H. The distance to the first extension point 41 may be a first direction distance C1.

As illustrated in FIG. 3, the first baffle 40 may have a first protrusion length B1 of 33% to 42% or more of the first direction distance C1 to maximize the purification efficiency. For example, if the first protrusion length B1 is too long, the inlet and outlet may be narrowed, the discharge of the foreign matter 1 may be slowed down, and the purification efficiency may be lowered. If the first protrusion length B1 is too short, the foreign matter 1 may be reduced. As the rotational force is lowered, the purification efficiency may be lowered.

As shown in FIG. 3, the second duct part 20 may include a flow path height E, and the discharge gas G1 introduced from the first duct part 10 is introduced to allow the first baffle 40 to flow. The distance when passing through) may be greater than or equal to the channel height E. For example, the first passing distance D1 obtained by subtracting the first protrusion length B1 from the first direction distance C1 may be greater than or equal to the flow path height E.

That is, the first protrusion length B1 has a flow path height E in which the first passage distance D1 through which the discharge gas G1 introduced from the first duct part 10 passes passes is formed in the second duct part 20. It can be formed so that it can be improved to the maximum purification efficiency.

As shown in FIG. 4, the exhaust gas purifying apparatus 400 according to another embodiment of the present invention is installed to protrude into the first inlet 11, and discharges introduced into the first inlet 11. The air flow direction of the gas G1 may further include a second baffle 60 to induce a rapid change in a second direction in the direction of the second duct part 20.

As shown in FIG. 4, the second baffle 60 may be fixed to the lower portion of the separation wall 50 and be inclined downward based on a horizontal plane toward the foreign substance accommodating part 30. For example, the second baffle 60 discharges gas G1 from the first duct part 10 to discharge the discharge gas G1 introduced from the first duct part 10 to the second duct part 20. It does not interfere with the inflow of, can be installed so as not to interfere with the discharge of the purge gas (G2) in the second duct portion 20, inclined at a second downward angle (A2) relative to the horizontal plane to maximize the purification efficiency Can be increased with For example, when the second downward angle A2 becomes greater than or equal to a certain angle or less, the inlet becomes wider and the outlet becomes narrower, so that the pressure difference between the inlet and the outlet becomes too large and the purification efficiency can be lowered. The second downward angle A2 may be 30 degrees to 50 degrees.

As shown in FIG. 6, the second baffle 60 of the exhaust gas purification apparatus 600 according to another embodiment of the present invention may be installed to protrude a predetermined distance. For example, the length of the second baffle 60 protruding obliquely toward the foreign substance accommodating part 30 may be the second protrusion length B2. In addition, the virtual extension point of the second baffle 60 located on the foreign matter receiving portion 30 may be a second extension point 42, from the connection point of the second baffle 60 and the purge gas outlet H. The distance to the second extension point 42 may be a second direction distance C2.

As shown in FIG. 6, the second baffle 60 may have a second protrusion length B2 of 33% to 42% or more of the second direction distance C2 to maximize the purification efficiency. For example, if the second protrusion length B2 is too long, the inlet and outlet ports are narrowed, the discharge of the foreign matter 1 may be slowed down, and the purification efficiency may be lowered. If the second protrusion length B2 is too short, the foreign matter 1 may be As the rotational force is lowered, the purification efficiency may be lowered.

As illustrated in FIG. 7, the foreign matter receiving portion 30 of the exhaust gas purifying apparatus 700 according to another embodiment of the present invention is a funnel-shaped hopper recessed downward, and the first duct portion 10 and the foreign matter receiving portion. Induction plane portion 70 whose surface is a plane between the portions 30 may be formed.

As shown in FIG. 7, the induction plane 70 is guided in a direction different from the first direction so that the airflow direction is rapidly changed, and in particular, a kind of inclined surface may be formed to more easily induce a rapid vortex. The induction plane portion 70 has a significant drop in the flow rate at the foreign matter accommodating portion 30, but instead of the induction plane portion 70 and the baffles 40 and 60, a rapid vortex of rapid flow rate is generated and the foreign matter 1 is By the centrifugal force it may fall in the direction of the foreign matter receiving portion (30).

On the other hand, the induction plane portion 70 is formed in a curved surface is longer than the distance from the first baffle 40 to the induction plane portion 70 and the length of the first baffle 40 by the difference in distance It may be formed longer, and when the length of the first baffle 40 is longer, it is possible to enhance the direction change effect of the air flow by the first baffle 40.

8 is an operating state diagram illustrating the exhaust gas purification apparatus 100 of FIG. 1.

As illustrated in FIG. 8, the exhaust gas purifying apparatus 100 extracts the exhaust gas G1 from the first duct part 10 including the first inlet part 11 and the second inlet part 12. Guided in one direction, the direction of the air flow by the first baffle 40 through the first duct portion 10 can be rapidly switched to the second direction of the second duct portion 20 direction.

At this time, the foreign matter 1 is stacked in the foreign matter receiving portion 30, which is a funnel-shaped hopper, and the foreign matter 1 is removed by the second duct portion 20 to purify only the purified gas G2 to the outside. May be discharged.

Hereinafter, an experimental example to which the above-described technical concept is applied will be described to help understanding of the present invention. However, the following experimental examples are only for helping understanding of the present invention, and the present invention is not limited to the following experimental examples.

Experimental Example

In this experiment, all the analysis conditions were the same and the difference according to the change of the baffle angle or the length of the baffle was confirmed in order to confirm the removal rate of the foreign material that changes with the angle change of the baffle.

9 is an analysis result of the first experiment.

In the first experiment, the flow velocity and the pressure were changed according to the angle of the baffle, and the angle of the baffle was 30 degrees, 38 degrees, 45 degrees, 60 degrees, and 75 degrees with respect to the horizontal plane. In the first experiment, the baffle angle was 30 degrees, and Type1, 38 degrees were Type2, 45 degrees were Type3, 60 degrees were Type4, and 75 degrees were Type5.

[Table 1] is a table showing the difference between the average pressure of the inlet and outlet for Experiment 1.

	Pressure (Pa)
	Inlet			outlet	Pressure difference between inlet and outlet
Inlet 1	2nd inlet	Average pressure
Type1 (30 degrees)	28.5	226.5	132.4	-223.8	356.2
Type2 (38 degrees)	25.2	124.0	77	-225.8	302.8
Type3 (45 degrees)	22.2	71.6	48.1	-240.0	288.1
Type 4 (60 degrees)	22.8	10.2	16.2	-354.8	371.0
Type 5 (75 degrees)	18.7	0.2	9	-638.6	647.6

In Table 1, the first inlet is an inlet installed at a position far from the outlet, and the second inlet is an inlet at a position close to the outlet.

As shown in [Table 1], it can be seen that the average pressure of the inlet and outlet pressure decreases as the angle of the baffle is lowered from Type 1 (30 degrees) to Type 5 (75 degrees), but the pressure of the inlet and outlet is reduced. The difference decreases from Type 1 (30 degrees) to Type 3 (45 degrees) and then increases again, indicating that the pressure difference is the largest in Type 5 (75 degrees).

Accordingly, it can be seen that the angle of the baffle for maintaining the pressure difference between the inlet and outlet.

[Table 2] is a table showing the removal rate according to the size of the foreign matter for Experiment 1.

	Removal rate (%)
	100			140			200			Average removal rate
Inlet 1	2nd inlet	Removal rate		Inlet 1	2nd inlet	Removal rate		Inlet 1	2nd inlet	Removal rate
Type1 (30 degrees)	85.5	78.9	82.1	91.6	89.9	90.7	93.5	95.3	94.4	90.2
Type2 (38 degrees)	82.5	48.8	65.1	92.2	90.4	91.3	93.5	93.3	93.4	86.6
Type3 (45 degrees)	82.1	14.5	47.2	92.3	88.9	90.5	93.7	92.7	93.2	82.5
Type 4 (60 degrees)	79.7	0.2	38.6	91.4	22.2	55.6	98.9	98.9	98.9	66.7
Type 5 (75 degrees)	72.2	0.0	34.9	94.0	0.7	45.8	99.1	37.6	67.4	50.9

In Table 2, the first inlet is an inlet installed at a position far from the outlet, and the second inlet is an inlet at a position close to the outlet.

As shown in [Table 2], the removal rate was tested by changing the baffle angle at 100 μm, 140 μm, and 200 μm of foreign matters. Accordingly, it was confirmed that the removal rate of foreign matter decreased as the angle of the baffle was lowered from Type 1 (30 degrees) to Type 5 (75 degrees), and on average, the overall removal rate was 70 from Type 1 (30 degrees) to Type 3 (45 degrees). You can see that it is more than a percentage.

FIG. 9 is a comparison table illustrating a foreign matter removal rate and a pressure difference according to the baffle angle of the exhaust gas purifying apparatus 200 of FIG. 2.

As shown in FIG. 9, as the angle of the baffle is lowered from Type 1 (30 degrees) to Type 5 (75 degrees), the pressure difference (ΔP) between the inlet and the outlet increases, and the size of the foreign matter is increased. It can be seen that the removal rates at 100 μm, 140 μm and 200 μm decrease. Therefore, the difference in pressure between the inlet and the outlet according to the angle of the baffle is low and the installation angle of the baffle having a high foreign matter removal rate is effective when the angle of 30 to 50 degrees.

10 is an analysis result of the second experiment.

In the second experiment, the flow rate and the pressure were varied according to the length of the baffle, and the ratio of the length of the baffle to the directing distance was changed. Here, the directing distance is a distance from the connection point of the baffle and the purge gas outlet to the virtual extension point of the baffle. In the experiment where the ratio of the baffle length to the directing distance is 1: 0.54, Type6, 1: 0.49 is Type7, 1: 0.43 is Type8, 1: 0.38 is Type9, 1: 0.32 is Type10, and 1: 0.27 is Type11. .

[Table 3] is a table showing the difference between the average pressure of the inlet and the outlet for Experiment 2.

	Pressure (Pa)
	Inlet			outlet	Pressure difference between inlet and outlet
Inlet 1	2nd inlet	Average pressure
Type 6 (1: 0.54)	28.5	226.5	132.4	-223.8	356.2
Type7 (1: 0.49)	19.5	197.9	113.1	-191.7	304.8
Type8 (1: 0.43)	14.9	152.4	87	-169.7	256.1
Type9 (1: 0.38)	18.1	110.4	66.5	-146	212.5
Type10 (1: 0.32)	16.1	60.6	39.4	-130.7	170.1
Type11 (1: 0.27)	16.9	22.5	19.9	-115.9	135.8

In Table 3, the first inlet is an inlet installed at a position far from the outlet, and the second inlet is an inlet at a position close to the outlet.

As shown in [Table 3], the average pressure of the inlet and the outlet pressure decrease as the length of the baffle is shortened from Type 6 (1: 0.54) to Type 11 (1: 0.27). It can be seen that the pressure difference is lowered as the baffle length becomes shorter from Type6 (1: 0.54) to Type11 (1: 0.27).

[Table 4] is a table showing the removal rate according to the size of the foreign matter for Experiment 1.

	Removal rate (%)
	100			140			200
	Inlet 1	2nd inlet	1st removal rate		Inlet 1	2nd inlet	Removal rate		Inlet 1	2nd inlet	Removal rate
Type 6 (1: 0.54)	85.5	78.9	82.1	91.6	89.9	90.7	93.5	95.3	94.4
Type7 (1: 0.49)	76.8	35.8	55.6	97.2	90.7	93.8	98.1	97.7	97.9
Type8 (1: 0.43)	56.8	0.0	27.5	93.8	55.7	74.1	97.8	96.9	97.3
Type9 (1: 0.38)	51.9	0.0	25.1	93.9	0.0	45.4	100.0	85.8	92.7
Type10 (1: 0.32)	50.9	0.0	24.6	93.7	0.0	45.3	100.0	8.7	52.9
Type11 (1: 0.27)	51.9	0.0	25.1	92.8	0.0	44.9	100.0	0.0	48.4

In Table 4, the first inlet is an inlet installed at a position far from the outlet, and the second inlet is an inlet at a position close to the outlet.

As shown in [Table 2], the removal rate was tested by changing the length of the baffle in the size of the foreign matter 100㎛, 140㎛, 200㎛. Accordingly, the removal rate of the foreign matter can be confirmed that the removal rate is the highest in Type6 (1: 0.54) when the size of the foreign matter is 100㎛.

In addition, when the size of the foreign matter was 200 μm, the removal rate was high in Type 6 (1: 0.54), Type 7 (1: 0.49), Type 8 (1: 0.43), and Type 9 (1: 0.38), and the length of the baffle was shorter. In Type 10 (1: 0.32) and Type 11 (1: 0.27), relatively low removal rates can be seen.

FIG. 10 is a comparison table illustrating a foreign matter removal rate and a pressure difference according to the baffle length of the exhaust gas purification apparatus 300 of FIG. 3.

As shown in FIG. 10, as the length of the baffle is shortened from Type 6 (1: 0.54) to Type 11 (1: 0.27), the pressure difference between the inlet and the outlet (ΔP) and the size of the foreign matter are 100 μm and 140 μm. And it can be confirmed that the removal rate at 200 μm is reduced.

Accordingly, when the length of the baffle is shortened, it can be seen that the pressure difference between the inlet and the outlet decreases but the removal rate is lowered. Thus, the ratio of the length of the baffle to the directing distance is determined by the inlet and the outlet. It is effective to install more than 1: 0.38 in order to maintain a high foreign material removal rate while forming a relatively low pressure difference.

Although the present invention has been described with reference to the embodiments shown in the drawings, this is merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

According to the embodiment of the present invention made as described above, the exhaust gas purification apparatus can improve the separation performance of separating the foreign matter contained in the exhaust gas to the foreign matter receiving portion through the rapid change in the direction of the air flow of the exhaust gas.

In addition, it is possible to purify the exhaust gases intake at various locations using a single device, and to change the angle or length of the baffle, and to increase the efficiency without changing a separate device or manufacturing method, so that the equipment or the production is easy. It is possible to reduce the manufacturing cost of the exhaust gas purification device with an easy effect.

Claims (11)

1. A first duct unit guiding a discharge gas containing foreign matter in a first direction;

   A foreign material accommodating part formed on a bottom surface of the first duct part and accommodating foreign matter contained in the exhaust gas;

   A second duct portion communicating with a purge gas discharge port formed at a side surface of the first duct portion and guiding the purge gas from which foreign substances are separated in a second direction; And

   A first baffle installed to protrude into the first duct part and causing the air flow direction of the exhaust gas introduced into the first duct part to change rapidly in a second direction of the second duct part;

   Including,

   The first duct portion,

   A first inflow part installed at a position relatively close to the second duct part; And

   A second inlet part installed adjacent to the first inlet part and installed at a position relatively far from the second duct part;

   Comprising, exhaust gas purification device.
2. The method of claim 1,

   The first baffle,

   The front end protrudes inclined downward with respect to the foreign substance accommodating part at a first downward angle with respect to a horizontal plane, and the rear end is fixed above the purge gas outlet, exhaust gas purification apparatus.
3. The method of claim 2,

   The first downward angle is 30 to 50 degrees, exhaust gas purification device.
4. The method of claim 2,

   The first baffle,

   And a first projection length projecting obliquely toward the foreign substance accommodating portion is 33% to 42 percent or more at a first direction distance from a connection point of the purge gas outlet to a first extension point on the foreign substance accommodating portion.
5. The method of claim 4, wherein

   The second duct portion,

   Has a flow path height which is a height of a flow path through which the purge gas is discharged,

   And a first passage distance obtained by subtracting the first protrusion length from the first direction distance is greater than or equal to the flow path height.
6. The method of claim 1,

   The first duct portion,

   A partition wall capable of dividing the first inflow portion and the second inflow portion;

   Further comprising, exhaust gas purification device.
7. The method of claim 6,

   A second baffle installed to protrude into the first inlet, and causing the airflow direction of the exhaust gas introduced into the first inlet to be rapidly changed in a second direction of the second duct part;

   Further comprising, exhaust gas purification device.
8. The method of claim 7, wherein

   The second baffle,

   The front end is projected inclined downward with a second downward angle toward the foreign matter receiving portion relative to the horizontal plane, and the rear end is fixed to the lower end of the separation wall, exhaust gas purification apparatus.
9. The method of claim 8,

   The second downward angle is 30 to 50 degrees, exhaust gas purification device.
10. The method of claim 8,

    The second baffle,

    And a second projection length protruding obliquely toward the foreign substance accommodating portion is 33% to 42 percent or more at a second direction distance from a connection point of the separation wall to a second extension point on the foreign substance accommodating portion.
11. The method of claim 1,

    The foreign matter receiving portion,

    A funnel-shaped hopper concave down, wherein an induction plane portion whose surface is planar is formed between the first duct portion and the foreign matter accommodating portion.

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