WO2017039339A1 - Method for manufacturing fluorocarbon thin film - Google Patents

Method for manufacturing fluorocarbon thin film Download PDF

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Publication number
WO2017039339A1
WO2017039339A1 PCT/KR2016/009757 KR2016009757W WO2017039339A1 WO 2017039339 A1 WO2017039339 A1 WO 2017039339A1 KR 2016009757 W KR2016009757 W KR 2016009757W WO 2017039339 A1 WO2017039339 A1 WO 2017039339A1
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Prior art keywords
thin film
sputtering
fluorocarbon thin
roll
fluorine
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PCT/KR2016/009757
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French (fr)
Korean (ko)
Inventor
이상진
이재흥
최우진
조성근
함동석
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한국화학연구원
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Priority claimed from KR1020150123303A external-priority patent/KR20170026985A/en
Priority claimed from KR1020150182969A external-priority patent/KR101817679B1/en
Priority claimed from KR1020160013829A external-priority patent/KR101791983B1/en
Priority claimed from KR1020160020926A external-priority patent/KR20170099053A/en
Application filed by 한국화학연구원 filed Critical 한국화학연구원
Publication of WO2017039339A1 publication Critical patent/WO2017039339A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • DTEXTILES; PAPER
    • D06TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06MTREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M15/00Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment
    • D06M15/19Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment with synthetic macromolecular compounds
    • D06M15/21Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M15/263Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds of unsaturated carboxylic acids; Salts or esters thereof
    • D06M15/277Macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds of unsaturated carboxylic acids; Salts or esters thereof containing fluorine

Definitions

  • the present invention relates to a method for manufacturing a fluorine carbide thin film, and more particularly, to prevent dielectric breakdown of fluorine-based polymers and to realize a high deposition rate even in sputtering of an RF power supply system. Even the present invention relates to a method for producing a fluorocarbon thin film capable of stably sputtering.
  • the flat panel display panel examples include LCD, PDP, and OLED. They are widely used as display devices of various digital devices because of their light weight, thinness, low power drive, full-color and high resolution.
  • the touch screen is an input device installed on a display surface of various flat panel display devices and used to allow a user to select desired information while viewing the display device.
  • Such a flat panel display panel or a touch screen is exposed to the outside and is easily contaminated by contaminants containing moisture or moisture, and has a problem that it is not easy to wipe off contaminants when it is left standing for a long time with contaminants. Moreover, the display panel or touch screen needs to be protected from moisture because moisture may adversely affect the function of the product.
  • a method of forming a hydrophobic film by forming a protective film containing fluorine on the surface of these display devices is mainly used.
  • fluorine-based compound coating as a method for realizing a hydrophobic surface, a method of forming a thin film of the compound on a substrate by heating a solution containing an organosilicon compound containing a fluorine-substituted alkyl group as it is (Patent Document 1, JP2009-).
  • Patent Document 2 JP1993-032810
  • Patent Document 3 JP1993-215905
  • the invention disclosed in Patent Document 1 has a problem in that when the raw material is heated for a predetermined time or more, the durability of the thin film is lowered, so that the thickness of the film that can be produced is limited, or a thin film having high durability cannot be stably produced.
  • Patent Literature 2 is limited due to the high melting point of PTFE, and causes high cost.
  • the invention disclosed in Patent Literature 3 is stable because the raw material used as the deposition source becomes unstable before being introduced into the deposition apparatus. There is a problem that can not produce a thin film.
  • another method for implementing a hydrophobic surface is a method using a fluorine-based surfactant.
  • low molecular weight fluorine-based surfactants can be introduced to control the fluorinated hydrocarbons on the surface, but it causes problems in durability, and durability is improved when high molecular weight fluorine-based surfactants are introduced. Is not preferable because it causes difficulty in the appearance and may cause appearance problems on the surface due to phase separation from the coating matrix.
  • sputtering which is a method of coating a fluorine-based polymer by a dry process, and a strong plasma is formed on the surface of the fluorine-based polymer, and the generated plasma gives strong energy to the surface of the fluorine-based polymer, and molecular-level fluorine-based polymer is separated from the surface and deposited on the opposite side. It is a process that is deposited and coated on the surface of the ash.
  • the present inventors have solved the above problems of the conventional fluorine carbide thin film deposition which had to apply high energy, and the high deposition rate even with the sputtering of the power method having a frequency lower than tens of KHz or lower than RF.
  • the present invention has been completed by developing a new technology capable of depositing and manufacturing a large-area fluorocarbon thin film in a roll-to-roll process in a very short time.
  • the present invention solves a problem in the method of manufacturing a thin film including a fluorine-based polymer that had to be applied to the RF (Radio Frequency) power source due to the superhydrophobic nature, and at the same time, excellent deposition at a relatively low power source compared to RF.
  • An object of the present invention is to provide a method for producing a fluorocarbon thin film that can exhibit efficiency.
  • the present invention can form the same thin film as that of the RF power method even in a mid-range frequency (MF) or direct current (DC) power supply method, thereby implementing a roll-to-roll process capable of producing a large area thin film in a very short time. This is possible, and the existing roll-to-roll equipment can be directly applied to the replacement of the target without any additional renovation cost, thereby providing a method of manufacturing a fluorocarbon thin film having excellent commercial and economical efficiency.
  • MF mid-range frequency
  • DC direct current
  • Still another object of the present invention is to provide a roll-to-roll sputtering deposition system for fluorine carbide thin film deposition capable of stably sputtering fluorinated polymer even in MF or DC, and a molded body formed using the same.
  • the molded article according to the present invention may be a high quality transparent fluorocarbon thin film having super water repellency.
  • the present invention may be a fluorine-based polymer thin film having additional various physical properties depending on the type and content of the functionalizing agent.
  • the present invention provides a molded article comprising a composite thin film comprising the fluorine-based polymer thin film and a molding agent comprising the same.
  • the thin film may include all substrates having various forms, for example, thin films formed on the surface of a substrate such as a film, a fiber, or a three-dimensional structure.
  • the present invention provides a method for producing a fluorocarbon thin film comprising the step of sputtering on a substrate using a fluorine-based polymer composite target comprising a functionalizing agent having conductivity to the fluorine-based polymer.
  • the sputtering may be performed by RF, MF or DC power supply method, of course, due to the deterioration phenomenon due to the application of high energy during the deposition of the conventional fluorine-based polymer by the introduction of a functionalizing agent having the conductivity as described above
  • a functionalizing agent having the conductivity as described above
  • the fluorine thin film can be manufactured.
  • sputtering in a roll-to-roll method using MF or DC power supply is possible. That is, while transporting the substrate in a roll-to-roll method, it is possible to perform the sputtering process by MF or DC power supply using a fluorine-based polymer composite target containing a conductive functionalizing agent to provide a large-area fluorocarbon thin film as well as
  • the conventional roll-to-roll equipment can be directly applied without additional modification cost, thereby enabling automation, simplification, and continuous manufacturing of the fluorocarbon thin film manufacturing method.
  • the method of manufacturing a fluorocarbon thin film according to an embodiment of the present invention is not only applicable to a variety of substrates, but also in addition to the plate-shaped substrate, some of the curved form, for example, the curved edge, only the curved corner, Uniform application is possible even when applied to a substrate having all three-dimensional shapes such as curved shape and hemispherical shape.
  • the method for manufacturing a fluorocarbon thin film according to the present invention is a power supply method of MF or DC sputtering, which has a relatively low frequency of several tens of KHz or less than RF, so that a large-area thin film can be manufactured. Implementation is possible.
  • the fluorocarbon thin film can be manufactured by a low energy power supply method, it can be directly applied to the existing roll-to-roll equipment without any additional modification cost, and thus commerciality is also excellent.
  • the fluorine-based polymer composite target is additionally a metal compound, that is, metal organic matter, metal oxide, metal carbon body, metal hydroxide, metal carbonate, metal bicarbonate, metal nitride
  • a metal compound that is, metal organic matter, metal oxide, metal carbon body, metal hydroxide, metal carbonate, metal bicarbonate, metal nitride
  • it may further include a single or mixed component selected from metal fluoride and the like.
  • the method for manufacturing a fluorocarbon thin film according to an aspect of the present invention may further include an additional treatment step to control the surface characteristics of the fluorocarbon thin film.
  • the treatment process may be to inject the reactive gas during the sputtering of the fluorocarbon thin film to perform reactive sputtering or to inject the surface treatment gas after the sputtering to perform plasma surface treatment.
  • the present invention provides a continuous roll-to-roll sputtering deposition system suitable for a method of manufacturing a fluorocarbon thin film capable of sputtering at low energy.
  • the roll-to-roll deposition apparatus can be used without limitation as long as the conventional one, but briefly described with reference to the drawings of FIG.
  • the roll-to-roll sputtering deposition system includes an unwinder chamber 100 in which a roll on which a web-type substrate is wound is mounted, and a main chamber 200 in which a fluorocarbon thin film is deposited on one surface of the substrate. And a winder chamber 300 for winding the deposited fluorocarbon thin film.
  • the productivity of the fluorocarbon thin film can be greatly improved.
  • the present invention provides a molded body formed by sputtering by MF or DC power supply using a fluorine-based polymer composite target including a conductive agent having conductivity on a substrate, that is, a high quality fluorocarbon thin film.
  • the present invention provides a high quality fluoride carbide thin film with improved deposition rate by effectively preventing defects caused by conventional strong energy, insulation breakdown, etc. by using a conductive fluorinated polymer composite target and generating plasma with high efficiency. Can be. This effect is more prominent in the sputtering method of the RF power method applying a stronger energy.
  • the method for producing a fluorocarbon thin film according to the present invention is not only possible to sputter with a MF or DC power supply method having a frequency lower than tens of KHz or lower than that of the conventional sputtering method using a fluorine-based polymer target.
  • a fluorine-based polymer target Compared to the fluorocarbon thin film using the% fluorine-based polymer target, not only can the physical, chemical, and optical properties be significantly improved, but also various functionalities can be simultaneously provided.
  • the manufacturing method according to the present invention can be directly applied to the production of fluorinated carbide thin film without the need for additional modification of the conventional roll-to-roll MF or DC sputtering apparatus capable of manufacturing a large-area thin film, automation and simplification of the process And it is possible to manufacture a continuous fluorocarbon thin film.
  • the roll-to-roll sputtering deposition system according to the present invention the sputtering process efficiency of the fluorocarbon thin film can be improved more quickly or more.
  • FIG. 1 is a schematic diagram of a roll-to-roll sputtering deposition system according to the present invention.
  • Figure 2 is an XPS analysis result in the water repellent layer of the super water-repellent coating fiber prepared by the method of Example 21.
  • Example 3 is a surface elasticity and hardness characteristics of the transparent hard coat film prepared by the method of Example 22.
  • Example 4 is a result of surface elasticity and hardness of the transparent hard coat film manufactured by the method of Example 23.
  • the method of manufacturing the fluorocarbon thin film according to the present invention is different from the method of manufacturing the fluorocarbon thin film, which requires a high energy such as RF in the related art in that it can be implemented regardless of the output voltage.
  • the present invention can not only implement a high deposition rate even by using a sputtering process of MF or DC power supply, which is an industrially useful power supply method, but also deforms the electrode surface or the electrode surface that can be generated when a strong energy such as RF is applied. It is possible to effectively prevent the occurrence of defects and the like at the joints.
  • the method for manufacturing a fluorocarbon thin film according to the present invention enables the implementation of a roll-to-roll process capable of manufacturing a large-area thin film, and the automation, simplification and continuous carbonization of the process using existing roll-to-roll equipment with a low energy power method It is possible to provide a method for producing a fluorine thin film.
  • a sputtering process may be performed by MF or DC power supply using a fluorine-based polymer composite target having conductivity while transferring a substrate in a roll-to-roll manner.
  • the fluorine-based polymer composite target includes a fluorine-based polymer and a functionalizing agent having conductivity.
  • the functionalizing agent is not limited as long as it has a conductivity, but one example may be one or a mixture of two or more selected from conductive particles, conductive polymers, and metal components.
  • Non-limiting examples of the conductive particles include carbon nanotubes, carbon nanofibers, Carbon black, graphene, graphite, carbon fiber, and the like, and other organic conductive particles may also be included. In this case, when the organic conductive particles which are examples of the conductive particles are used, conductivity can be imparted while maintaining the fluorocarbon component.
  • Non-limiting examples of the conductive polymer polyaniline (polyaniline), polyacetylene (polyacetylene), polythiophene (polythiophene), polypyrrole (polypyrrole), polyfluorene (polyfluorene), polypyrene (polypyrene), polyazulene ( polyazulene, polynaphthalene, polyphenylene, poly phenylene vinylene, polycarbazole, polyindole, polyazephine, polyethylene , Polyethylene vinylene, polyphenylene sulfide, polyfuran, polyselenophene, polytellurophene, polysulfur nitride And the like, but are not limited thereto.
  • non-limiting examples of the metal component are copper (Cu), aluminum (Al), silver (Ag), gold (Au), tungsten (W), magnesium (Mg), nickel (Ni), molybdenum (Mo) ), Vanadium (V), niobium (Nb), titanium (Ti), platinum (Pt), chromium (Cr), tantalum (Ta), and the like.
  • the fluorine-based polymer composite target according to an aspect of the present invention includes a fluorine-based polymer
  • the fluorine-based polymer is not limited as long as it is a resin containing fluorine, preferably polytetra is a synthetic resin polymerized olefin containing fluorine Fluoroethylene (PTFE, polytetrafluoroethylene), polychlorotrifluoroethylene (PCTFE, polychlorotrifluoroethylene), polyvinylidenedifluoride (PVDF, polyvinylidenedifluoride), fluorinated ethylene propylene copolymer (FEP), polyethylene -Tetrafluoroethylene (ETFE, poly ethylene-co-tetra fluoro ethylene), polyethylene-chloro trifluoro ethylene (ECTFE, poly ethylene-co-chloro trifluoro ethylene), polytetrafluoro ethylene-fluoro alkyl vinyl ether
  • PFA poly fluorine Fluoroethylene
  • the composition of the fluorine-based polymer composite target according to the present invention is not limited, but preferably may be contained in 0.01 to 2000 parts by weight of the functionalizing agent with respect to 100 parts by weight of the fluorine-based polymer, to prevent higher deposition rate and insulation breakdown In terms of being able to deposit a high quality fluorocarbon thin film, it is preferable to contain 0.5 to 1500 parts by weight, more preferably 1 to 1000 parts by weight.
  • the substrate according to an aspect of the present invention may be selected from silicon, metal, ceramic, resin, paper, glass, quartz, fiber, plastic, organic polymer, and the like, but is not limited to flexible silicone, polypropylene ( PP), polyethylene (PE), polycarbonate (PC), polyethylene terephthalate (PET), polyimide (PI), cyclic olefic copolymer (COC), cyclic olefin polymer (cyclic olefin polymer, COC) ), Triacetyl cellulose (TAC), polyethylene naphthalene (PEN), polyurethane (PU), polyacrylate, polyester, polymethylene pentene (PMP) ), Polymethyl methacrylate (PMMA), polymethacrylate (polymethacrylate, PMA), polystyrene (PS), styrene-acrylonitrile copolymer (styrene- acrylonitrile copolymer (SAN), acrylonitrile-butylene-s
  • Sputtering according to the method for producing a fluorocarbon thin film of an aspect of the present invention may be a reactive sputtering step performed under reaction gas injection. Due to this reactive sputtering, the molded article, ie, the fluorocarbon thin film manufactured by the manufacturing method according to the present invention, can maintain the hydrophobic surface property as it is and at the same time give enhanced oil repellency, and have excellent adhesion to the substrate.
  • the oil repellency according to the present invention may mean a property that hydrocarbons such as toluene, decane, hexadecane, or alcohol represented by IPA (Isopropyl alcohol) does not penetrate, and in the first half of the present invention, It has been described as oil repellency for, but of course not limited to oil repellent for that.
  • IPA Isopropyl alcohol
  • the molded body formed by the reactive sputtering according to an aspect of the present invention that is, a fluorocarbon thin film is deposited on the outermost layer of the surface of a display device such as a flat panel display panel or a touch screen with excellent oil repellent properties as well as super water repellent properties to attach contaminants When preventing and attaching contaminants, it is expected to facilitate the removal of contaminants and to be used in various applications because of excellent surface modification properties.
  • the fluorocarbon thin film according to the present invention is highly applicable to a surface protection film due to high transparency, and can be applied to various anti-reflection films due to low refractive index.
  • the fluorocarbon thin film may be prepared by performing at least one reactive sputtering process to implement desired water and oil repellent properties.
  • the present invention can be prepared by appropriately adjusting the components of the fluorine-based polymer composite target and their content and the type and flow rate of the reaction gas in various embodiments according to various purposes or functions in the reactive sputtering process.
  • the present invention significantly improves the process convenience, and the reactive sputtering process is preferably performed by the MF or DC power source for the purpose of more improved sputtering efficiency, but is not limited thereto.
  • the method of manufacturing a fluorocarbon thin film satisfying the water / oil repellent property according to the present invention is conventional RF (Radio Frequency) in terms of being deposited regardless of the output voltage by using a fluorine-based polymer composite target containing a functionalizing agent having conductivity It is differentiated from the manufacturing method using the fluorine-based polymer target that required high energy.
  • RF Radio Frequency
  • the reaction gas according to an aspect of the present invention is oxygen (O 2 ), ozone (O 3 ), hydrogen peroxide (H 2 O 2 ), ammonia (NH 3 ), nitrous oxide (N 2 O), nitrogen monoxide (NO) , Nitrogen dioxide (NO 2 ), nitrogen (N 2 ), carbon tetrafluoride (CF 4 ) and hydrazine (N 2 H 4 ) and the like may be one or more selected from those used in the art are not limited. In order to have a lower surface energy value and excellent visibility, injecting one or more reactive gases selected from oxygen (O 2 ), ozone (O 3 ), nitrous oxide (N 2 O), nitrogen (N 2 ), etc. good.
  • the process gas according to the present invention is not limited as long as it is an inert gas, but non-limiting examples thereof include one or more process gases selected from argon (Ar), helium (He), nitrogen (N 2 ), neon (Ne), and the like. It is preferred to be injected with.
  • the process gas and the reaction gas may be injected in a mixing ratio (process gas: reaction gas, based on the flow rate unit) in the range of 1: 1 to 1000: 1, preferably 1: 1 to 100: 1, more preferably 1 It may be mixed in a mixing ratio of 1: 1 to 20: 1, but may be modified in various embodiments to control physical properties such as water repellency, oil repellency, visible light transmittance, and chromaticity.
  • the method for manufacturing a fluorocarbon thin film according to an embodiment of the present invention may further perform the step of treating the surface of the fluorocarbon thin film by using an ion plasma by injecting a surface treatment gas into the formed fluorocarbon thin film.
  • a surface treatment gas may be easily adjusted according to the method for producing a fluorocarbon thin film according to an aspect of the present invention.
  • the surface treatment gas may be at least one selected from argon, nitrogen, oxygen, carbon tetrafluoride (CF 4 ), hydrogen, and the like, and a reaction gas in which argon and oxygen are mixed in view of having a lower surface energy value and excellent visibility. It is good to inject.
  • the surface characteristics for example, water repellent and oil repellent
  • the optical properties of the surface of the formed fluorocarbon thin film can be appropriately adjusted, and the strength, chemical resistance, and the atmosphere of the fluorocarbon thin film The aging phenomenon which appears at the time of exposure, etc. can be remarkably improved.
  • the flow rate of the surface treatment gas is not limited, but may be injected at a flow rate of 1 to 1000 sccm to maximize the above-described effects, preferably may be injected at a flow rate of 5 to 800 sccm, more preferably 10 Injected at a flow rate of 500 sccm, but is not limited thereto.
  • the sputtering may be performed by forming a plasma with a power of 0.1 to 15 W / cm2, preferably a power of 0.3 to 10 W / cm2, more Preferably it is carried out at a power of 0.5 to 5.0 W / cm2.
  • the fluorine-based polymer composite target according to an aspect of the present invention further includes at least one metal compound selected from metal organic matter, metal oxide, metal carbon body, metal hydroxide, metal carbonate, metal bicarbonate, metal nitride and metal fluoride, thereby forming a film.
  • metal compound selected from metal organic matter, metal oxide, metal carbon body, metal hydroxide, metal carbonate, metal bicarbonate, metal nitride and metal fluoride, thereby forming a film.
  • Various functionalities can be imparted to the fluorocarbon thin film.
  • non-limiting examples of the metal compound is SiO 2 , Al 2 O 3 , ITO, IGZO, ZnO, In 2 O 3 , SnO 2 , TiO 2 , AZO, ATO, SrTiO 3 , CeO 2 , MgO, NiO , CaO, ZrO 2 , Y 2 O 3 , Al 2 O 3 , MgF 2 , CuF 2 , Si 3 N 4 , CuN, Nb 2 O 5 , V 2 O 5 And AlN may be selected from, and the like formed thin film SiO 2 , Al 2 O 3 , ITO, Nb 2 O 5 , V 2 O 5 It is good to be selected from such.
  • the present invention provides a continuous roll-to-roll sputtering deposition system suitable for a method for producing a fluorocarbon thin film capable of sputtering at low energy (see FIG. 1).
  • Roll-to-roll sputtering deposition system is an unwinder chamber (100), the main chamber (200) for depositing a fluorocarbon thin film on one surface of the substrate and the deposited fluorine carbide Winder chamber (300) for winding a thin film may be included, which can realize excellent deposition rate even in low energy bands such as MF or DC, and continuous roll-to-roll process, while ensuring simplicity in the manufacturing process In addition, it is possible to quickly form a large-area fluorocarbon thin film without defects.
  • the main chamber according to one aspect of the invention comprises three MF dual sputtering cathodes 202, 203, 204 and one DC single sputtering cathode 205. Due to this configuration, not only MF and DC sputtering can be performed at the same time but also have the advantage that the deposition of the composite material is possible by applying various kinds of targets.
  • the winder chamber includes a resistance meter (301), a transmittance analyzer (302) and a reflectance meter (reflectance meter, 303), fluorocarbon manufactured from the roll-to-roll type sputtering deposition system
  • a resistance meter 301
  • a transmittance analyzer (302)
  • a reflectance meter reflectance meter, 303
  • fluorocarbon manufactured from the roll-to-roll type sputtering deposition system
  • the substrate according to an aspect of the present invention is not limited to the roll-to-roll sputtering deposition system but is transported at a speed of 0.1 m / min to 20 m / min, preferably 0.5 m / min to 5 m / It is good to feed at min speed.
  • the low deposition rate and the considerably high defect rate which are problems in the conventional method of manufacturing a fluorine carbide thin film, which had to be accompanied by high frequency energy of RF as having hydrophobic and insulating properties, are solved, thereby improving productivity.
  • Commercially available MF or DC sputtering can be used to provide economically high quality fluorocarbon thin films.
  • the present invention provides a molded article, ie, a fluorocarbon thin film formed by sputtering using a fluorine-based polymer composite target containing a conductive agent having conductivity on a substrate.
  • the fluorocarbon thin film according to the present invention can be deposited with excellent deposition rate even at a lower voltage by using a conductive fluorine-based polymer target, and it is possible to form nano-level thin films while maintaining the hydrophobic surface property as it is.
  • the adhesion to the substrate is also excellent.
  • the contact angle with moisture may be in the range of 90 to 150 °, preferably 110 to 150 °, more preferably 140 ° or more, so that super water-repellent characteristics can be realized. Do.
  • the thickness of the fluorocarbon thin film according to an aspect of the present invention is not limited, but may be deposited with a thickness of 5 nm to 1 ⁇ m, and in terms of achieving a lower transmittance for moisture and a contact angle with respected moisture. Preferably it can be deposited to a thickness of 10 nm to 200 nm.
  • sputtered using a fluorine-based polymer composite target containing a functionalizing agent on the surface of the textile fabric excellent hydrophobic properties, flame retardant properties, flame-retardant properties, self-cleaning properties and water repellent properties, mechanical It is possible to provide a highly functional super water-repellent coated fiber to which special functions such as properties, antibacterial properties and electromagnetic shielding properties are given.
  • the super water-repellent coating fibers according to the present invention by introducing an inorganic layer using a metal target, a metal oxide target or a metal nitride target, prior to the step of depositing a fluorocarbon thin film using the fluorine-based polymer composite target described above, By maximizing the adhesion between and the water repellent layer can maintain the super water-repellent properties even during multiple washing.
  • the inorganic layer may be formed preferentially on the fiber substrate or may sequentially form the inorganic layer and the fluorocarbon thin film layer.
  • the super water-repellent coating fibers according to an aspect of the present invention is formed by repeatedly repeating the step of forming an inorganic layer and the step of forming an organic layer (fluorine carbide thin film) two or more times, from the textile fabric by deterioration or impact, washing, etc. Desorption can be significantly reduced.
  • the present invention provides a multifunctional super water-repellent coated fiber produced by the above production method.
  • the super water-repellent coating fibers according to the present invention may be included in the atomic weight ratio of the metal atoms of 0.01 to 50% by weight, based on 100% by weight of the total atomic weight contained in the organic layer.
  • the organic layer of the super water-repellent coating fiber further includes a metal compound with a functionalizing agent having conductivity, thereby providing various functionalities such as electrical conductivity, heat dissipation, thermal insulation, antifouling, flame retardant, antibacterial, electromagnetic shielding properties and improved appearance. It is possible to provide various types of textile fabrics.
  • the water repellent layer is Al 2 O 3 in terms of effectively suppressing the generation of static electricity
  • Metal compounds such as, and the like may include metal components such as Ag in order to give excellent antimicrobial properties, but is not limited thereto.
  • the fiber fabric which is one example of the substrate according to one aspect of the superhydrophobic coated fiber according to the present invention, polyvinyl alcohol, polyacrylonitrile, nylon, polyester, polyurethane, polyvinyl chloride, polystyrene, cellulose , Chitosan, silk, cotton yarn, polylactic acid, polylactic-co-glycolic acid, polyglycolic acid polycaprolactone, collagen, polypyrrole, polyaniline and poly (styrene-co-maleic anhydride) It may be made, but if it can be produced with conventional fibers are not limited.
  • substrate as a natural skin; textile; knitting; Non-woven; Skin material such as artificial skin synthesized by adding a resin such as PU or PVC to an artificial leather or a fiber bubble having a relatively simple tissue form; And the like can be applied without limitation.
  • the original material of the base material has the same as it is, combines chemical resistance (detergent, lax, disinfectant, etc.), it is possible to maximize the water repellent properties and antifouling properties.
  • high-strength fabric made of high strength yarn such as polyamide multifilament, glass fiber or carbon fiber to improve initial water repellency as well as water repellency after friction, and effectively prevent wrinkles of textile fabrics generated during water repellent treatment. have.
  • the diameter and length of the yarn there is no particular limitation on the diameter and length of the yarn, but the diameter may be between 1 and 100 ⁇ m, preferably between 5 and 20 ⁇ m, and the length is usually between 500 ⁇ m and 10 cm, in particular 1000 It may be between ⁇ m and 5 cm.
  • uniform sputtering of nano-sized thickness is possible on the fiber surface, and the surface of the fiber fabric can be modified to have super water repellency regardless of the type of the fiber fabric through a single process, and the adhesion to the fiber fabric is improved.
  • Significantly improved super water repellency can be maintained for a long time with or without washing.
  • the present invention provides a highly functional coating fiber having a special function of antifouling, antibacterial, deodorant, flame retardant, electromagnetic shielding, etc. as well as super water repellent properties by using a fluorine-based polymer composite target further comprising a variety of metals and ceramics, etc. can do.
  • the ceramic is not limited, but may be ceramic fine particles such as pegmatite and bentonite that emit far infrared rays.
  • the fine particles may have an average diameter of 0.01 to 10 ⁇ m, more preferably 0.01 to 3 ⁇ m.
  • the pegmatite is a rock in which a bitumen, a silly stone, a padite, an albite, and the like form a quartz and a cultured structure, and biotite garnet tin stone column bite, fergusonite, fluorite, tourmaline, spodumene, topaz, It is a rock composed of various minerals emitting far infrared rays such as tantalum, and the bentonite is clay containing montmorillonite, a mineral belonging to a monoclinic system having a mica-like crystal structure, and quartz, feldspar, zeolite, etc. It may be included.
  • a high hardness transparent hard coat film can be provided by applying a conductive functional agent, particularly a fluorine-based polymer composite target containing carbon nanoparticles, onto a flexible substrate.
  • the surface hardness is about 200 MPa so that when applied to the surface of a liquid crystal display device or the like, it is easily affected by the external environment. Wear and the like.
  • the transparent hard coat film according to the present invention has a large number of C-C bonding structure and organic-inorganic composite structure, it is possible to solve the above problems by giving a significantly improved hardness and elastic properties (modulus).
  • the transparent hard coat layer according to an aspect of the present invention may be effectively applied to a flexible liquid crystal display and a folding or bent display device, which are currently commercialized for having excellent cyanity and improved durability and excellent adhesion to a substrate. have.
  • the transparent hard coating film according to the present invention is sputtered using a fluorine-based polymer composite target containing fluorine-based polymers and carbon nanoparticles, in order to realize more improved hardness and elastic properties, and furthermore, conductive polymers, metal components and One embodiment further including at least one functionalizing agent selected from metal compounds and the like is also of course included in the present invention.
  • the light transmittance (550 nm) of the above-mentioned transparent hard coat film is characterized in that it has a high transparency of 90% or more, preferably 90 to 99%, more preferably 91 to 98% may have a light transmittance.
  • the hardness of the transparent hard coating film according to the present invention is not limited, but preferably has a high hardness characteristics in the range of 1.0 to 10.0 GPa, but may be implemented as a hard coating film having various hardness characteristics according to the purpose.
  • the hard coating film of the present invention bends or folds continuously or repeatedly, the hard coating film effectively suppresses cracking or peeling of the hard coating film, thereby providing excellent durability and reliability to the flexible liquid crystal display device employing the same.
  • a high quality water and oil repellent coating film is provided.
  • the water / oil repellent coating film may be prepared by performing a reactive sputtering process under injection of a reaction gas using a fluorine-based polymer composite target including a functionalizing agent having conductivity on a substrate. It is not only capable of depositing at an excellent deposition rate even at a lower voltage, but also capable of forming nanoscale films, maintaining hydrophobic surface properties as well as having improved oil repellency, and having excellent adhesion to substrates.
  • the water / oil repellent coating film according to the present invention is deposited on the outermost layer of the surface of a display device such as a flat panel display panel or a touch screen, thereby preventing contaminant adhesion and removing contaminants when attaching contaminants, and having excellent surface modification properties. Utilization of furnace is expected.
  • the water- and oil-repellent coating film according to the present invention is highly applicable to a surface protection film due to high transparency, and can be applied to various display devices due to its low refractive index.
  • the water and oil repellent coating film according to one aspect of the present invention has a contact angle with water in a range of 100 to 150 ° and has excellent water repellency, as well as a contact angle with hexadecane of 50 ° to 70 °. It is characterized by having a significantly improved oil repellency compared to the thin film (35 °).
  • the contact angle, the thickness of the thin film, the surface characteristics and the light transmittance were measured by the following method, and the results are shown in Tables 1 to 5 below.
  • the water contact angle or hexadecane contact angle of the completed fluorocarbon thin film was measured using a contact angle measuring instrument (PHOEIX 300 TOUCH, SEO).
  • the substrate was cut and the cross section was measured using a FE-SEM (Field Effect-Scanning Electron Microscope, Philips XL30S FEG) apparatus.
  • FE-SEM Field Effect-Scanning Electron Microscope, Philips XL30S FEG
  • the surface hardness characteristics of the indentation depth were measured by increasing the load to 0 to 4 mN by the nanoindentation method (Nanoindenter Xp manufactured by MTS Systems Corp.). 15 experiments were conducted for each sample to calculate the average and standard deviation of the surface hardness according to the indentation depth. In addition, elastic properties were measured by the same method.
  • the light transmittance at a wavelength of 550 nm was measured after measuring the light transmittance in the wavelength range of 300 to 700 nm using a spectrophotometer (Hitachi Co., U-4100 type). Measured.
  • a fluorocarbon thin film was produced on a PET film (SKC, SH-40, thickness 100 ⁇ m, width 600 mm) using a roll-to-roll sputter (ULVAC, SPW-060) apparatus (see FIG. 1).
  • the fluorine-based polymer composite target (length 950 mm, width 127 mm, thickness 6 mm) was manufactured in a square plate shape.
  • the PET film is wound in an unwinder chamber, and the inside of the roll-to-roll sputtering device is made low vacuum by using a rotary pump and a booster pump, and then a high vacuum (2 ⁇ 10 -4 Pa) is obtained by using a turbo molecular pump. Formed.
  • MF and DC power is 1.0 W / cm 2 while argon (Ar) gas is injected into each cathode at a flow rate of 400 sccm, and the pre- sputtering was performed.
  • the temperature of the main roll was lowered to 10 ° C., and the fluorocarbon thin film was deposited while conveying the PET film at a speed of 1 m / min.
  • the fluorocarbon thin film was wound in the winder chamber a thin fluorocarbon thin film deposited with a thickness of 30 nm at MF power 2.5 W / cm 2 through the cathode 2.
  • Example 1 Example 2 Contact angle (°) 108 107 Visible light transmittance (%) 91.06 90.92
  • the fluorocarbon thin film according to the present invention can be sputtered by MF and DC power supply by using a fluorine-based polymer composite target containing a functionalizing agent having conductivity, thereby greatly improving productivity.
  • a high-quality fluorocarbon thin film having high transparency with low surface energy could be manufactured.
  • the yellowness means a deviation from the colorless state in the yellow direction.
  • the fluorocarbon thin film manufactured by additionally performing the surface treatment of the fluorocarbon thin film can realize a uniform color and brightness overall while maintaining visibility, and the surface energy value and optical properties according to the purpose It was confirmed that it can be easily changed.
  • the surface treatment of the fluorocarbon thin film according to the present invention it was confirmed that improved visible light transmittance can be realized by using a reaction gas mixed with argon and oxygen.
  • a superhydrophobic coated fiber in which a hydrocarbon thin film was deposited on a polyester fiber fabric was manufactured using a cluster sputtering device.
  • the cluster sputtering apparatus includes a loader portion on which a substrate is loaded, a transfer module portion for transferring the substrate, and a sputtering chamber portion for depositing a thin film, and the sputtering chamber portion includes an MF dual sputtering cathode.
  • the fluorine-based polymer composite target (4 inches in diameter and 6 mm in thickness) was manufactured in a circular form containing 85 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% of graphite (Timcal, 40um). It was attached to the copper backing plate electrode surface and installed in the MF dual sputtering cathode of the sputtering chamber portion.
  • powder PTFE polytetrafluoroethylene, DuPont 7AJ
  • graphite graphite
  • a polyester fiber fabric is attached to the substrate, and the inside of the chamber is evacuated to 50 mtorr by a rotary pump to make a low vacuum state, followed by a high vacuum (5 ⁇ 10-5 Torr) using a cryo pump. Formed.
  • argon gas was injected into the process gas at a flow rate of 50 sccm, pre-sputtering was performed at a MF power of 100 W to remove contaminants. Since the MF power to 300W (3.7 W / cm2) to deposit a fluorocarbon thin film for 30 minutes, the deposited super water-repellent coating fibers were taken out of the loader.
  • a superhydrophobic coated fiber in which a hydrocarbon thin film was deposited using a roll-to-roll sputter device (SPW-060, see FIG. 1) was fabricated on a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll).
  • the SPW-060 roll-to-roll sputtering device includes an unwinder part for winding a fiber fabric, a process chamber part for depositing a thin film on the fiber fabric, and a winder part for winding the formed fiber fabric.
  • the process chamber part is composed of three MF dual sputtering cathodes (cathode 1 to 3) and one DC sputtering cathode (cathode 4) independently.
  • Fluorine-based polymer composite target (length 950 mm, width 127 mm, thickness 6 mm) was produced in a square plate shape.
  • a fluorine-based polymer composite target containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotubes was attached to an electrode surface of a copper backing plate. It was installed in MF dual sputtering cathode 1. After that, a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll) was loaded into the unwinder chamber, and a rotary pump and a booster pump were used to vacuum the inside of the roll-to-roll sputtering device to 50 mtorr.
  • a high vacuum (2 ⁇ 10 -4 Pa) was formed using a turbo molecular pump.
  • pre-sputtering was performed with MF power of 1 kW while argon (Ar) gas was injected into the cathode at a flow rate of 400 sccm.
  • MF power was 3 kW by MF dual sputtering cathode 1 while conveying the nylon fiber fabric at a speed of 1 m / min. Was deposited, and the deposited superhydrophobic coated fiber was taken out of the loader.
  • a high purity Si (99.9%, Mitsui) Target (square plate, length 950 mm, width 127 mm, thickness 6 mm) is attached to the copper backing plate electrode surface and attached to the MF dual sputtering cathode 1 Installed.
  • a copper backing plate (Cu backing) was made of a fluoropolymer composite target (length 950 mm, width 127 mm, thickness 6 mm) made of a square plate containing 90 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotubes. plate) attached to the electrode surface. It was installed in MF dual sputtering cathode 2.
  • a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll) was loaded into the unwinder chamber, and a rotary pump and a booster pump were used to vacuum the inside of the roll-to-roll sputtering device to 50 mtorr. After evacuating the vacuum to a low vacuum state, a high vacuum (2 ⁇ 10 -4 Pa) was formed using a turbo molecular pump. When the internal vacuum degree of the roll-to-roll sputtering device became 2 ⁇ 10 ⁇ 4 Pa or less, pre-sputtering was performed with MF power of 1 kW while injecting argon (Ar) gas into each cathode at a flow rate of 400 sccm.
  • the temperature of the main roll was lowered to 10 ° C., and the MF power was set to 10 kW by MF dual sputtering cathode 1 while conveying the nylon fiber fabric at a speed of 1 m / min.
  • the silicon oxide (SiO 2 ) inorganic coating layer was deposited while the gas was injected in a PID controlled manner to maintain the sputtering voltage at 80%.
  • a fluorocarbon thin film was deposited by using cathode 2 at a MF power of 3 kW, and the deposited superhydrophobic coated fiber was taken out of the loader unit.
  • a copper backing plate (Cu backing) was made of a fluoropolymer composite target (length 950 mm, width 127 mm, thickness 6 mm) made of a square plate containing 85 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% of carbon nanotubes. plate) attached to the electrode surface. It was installed in a DC (Direct Current) single sputtering cathode 4. After that, a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll) was loaded into the unwinder chamber, and the inside of the roll-to-roll sputtering device (SPW-060) was opened using a rotary pump and a booster pump.
  • SPW-060 roll-to-roll sputtering device
  • a high vacuum (2 ⁇ 10 ⁇ 4 Pa) was formed using a turbo molecular pump.
  • pre-sputtering was performed with DC power of 1 kW while argon (Ar) gas was injected into the cathode at a flow rate of 400 sccm.
  • the temperature of the main roll was lowered to 10 ° C., and the fluorocarbon thin film was made with DC power of 1 kW by DC sputtering cathode 4 while conveying the nylon fiber fabric at a speed of 1 m / min. Was deposited, and the deposited superhydrophobic coated fiber was taken out of the loader.
  • a superhydrophobic coated fiber in which a hydrocarbon thin film was deposited on a polyester fiber fabric was manufactured using a cluster sputtering device.
  • the cluster sputtering device includes a loader part, a transfer module part for transferring the substrate, and a sputtering chamber part for depositing a thin film, and the sputtering chamber part is composed of an MF dual sputtering cathode.
  • a fluorine-based polymer composite target (4 inches in diameter, 6 mm thick) made of circular PTFE (polytetrafluoroethylene, DuPont 7AJ) containing 65 wt%, 5 wt% carbon nanotubes, and 30 wt% Al 2 O 3 was coated with a copper backing plate ( Cu backing plate) was attached to the electrode surface. This was installed in the MF dual sputtering cathode of the sputtering chamber portion.
  • a polyester fiber fabric (100 mm wide, 100 mm thick 0.1 mm thick) is attached to the substrate, and the chamber is evacuated to 50 mtorr with a rotary pump to make a low vacuum state and then use a cryo pump. To form a high vacuum (5 ⁇ 10 ⁇ 5 Torr). At this time, while argon gas was injected into the process gas at a flow rate of 50 sccm, pre-sputtering was performed at MF power of 100 W to remove contaminants. Since the MF power was set to 300W for 30 minutes to deposit a fluorocarbon thin film, the superhydrophobic coating fibers deposited were taken out of the loader.
  • Monochromatic Al-K ⁇ (15 kV, large spot with X-ray photoelectron spectroscopy, X-ray light source to quantify the chemical bonding state and chemical composition in the fluorocarbon thin film (water repellent layer) of the super water-repellent coating fibers prepared by the above method) AXIS NOVA) with size: 400 ⁇ m ⁇ 800 ⁇ m, small spot size: 10 ⁇ m) was used.
  • the Al-K ⁇ light source was used, and the acceleration voltage was set to 15 kV and the emission current was 10 mA to confirm the chemical bonding state and chemical composition in the fluorocarbon thin film.
  • the C1s spectrum of the fluorocarbon thin film showed that carbon-fluorine bonds and CC carbon-carbon bonds such as CF, CF 2 , CF 3 , and CCF were observed.
  • the carbon atom (C) contained 29.57% by weight
  • the fluorine atom (F) was 59.02% by weight
  • the aluminum atom (Al) was 6.64% by weight based on 100% by weight of the total atoms in the fluorocarbon thin film. .
  • Example 17 Example 18 Example 19 Example 20 Example 21 Comparative Example 5 Contact angle (°) 140 143 145 142 143 25 Coating film thickness (nm) 100 50 95 53 105 45
  • the present invention is different from the conventional fluorocarbon thin film in that the present invention can be implemented regardless of the output voltage, and evenly deposited fluorine carbide thin film (water repellent layer) at a high deposition rate even by an MF or DC power supply having an applied voltage lower than RF. It can provide a super water-repellent coating fiber comprising a. In addition, the super water-repellent coated fiber has a high contact angle of 140 ° or more, it can be seen that it has a relatively high deposition rate (see Table 3).
  • the manufacturing method of the super water-repellent coating fiber according to the present invention can be directly applied to the existing roll-to-roll equipment only by replacing the target without any additional renovation cost, and it is possible to manufacture a large-area thin film in a very short time.
  • As a continuous process for fabric making it can contribute to mass production of high quality fiber with high quality due to simplified process and reduced manufacturing cost.
  • the present invention can continuously improve the productivity by providing a variety of functions to the textile fabric in a single equipment, and can significantly improve productivity, and replace various conventional processes using a large amount of water and chemicals, etc. Minimize problems and provide benefits in terms of energy savings.
  • a hydrocarbon thin film was fabricated on a 1 ⁇ 2 cm 2 glass substrate (eagle XG glass 0.7mmTh) using a cluster sputtering device.
  • the fluorine-based polymer composite target (4 inches in diameter and 6 mm in thickness) was manufactured in a circular form containing 85 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% of carbon nanotubes. It was attached to the copper backing plate electrode face. This was installed in the MF dual sputtering cathode of the sputtering chamber portion.
  • powder PTFE polytetrafluoroethylene, DuPont 7AJ
  • the substrate was prepared by washing and drying with an ultrasonic cleaner for 5 minutes each with acetone and alcohol.
  • the prepared substrate was attached to a substrate holder made of aluminum using a heat resistant tape, and the substrate holder was mounted on a substrate stage in the chamber, the chamber was closed, and a rotary pump was used to reach 50 mtorr.
  • the vacuum was evacuated and high vacuum was formed with a cryogenic pump after the low vacuum operation was completed.
  • a distance between the substrate and the target was fixed at 24 cm at room temperature (25 ° C.), and a 100 nm fluoride carbide thin film was manufactured by a power (200 W) and an argon partial pressure (10 mtorr).
  • Example 22 Instead of the fluorine-based polymer composite target used in Example 22, 85 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% graphite (TIMCAL, average diameter of 2 um) were used in the form of a fluorine-based polymer composite target. Except that a fluorocarbon thin film was produced in the same manner.
  • powdered PTFE polytetrafluoroethylene, DuPont 7AJ
  • TIMCAL average diameter of 2 um
  • the fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the fluorocarbon thin film manufactured by the above method were measured, and the results are shown in FIGS. 4 and 4.
  • fluorine-based fluorine-based made of a circular containing PTFE (polytetrafluoroethylene, DuPont 7AJ) 70 wt%, alumina oxide (Al 2 O 3 ) 20 wt%, carbon nanotube 10 wt%
  • PTFE polytetrafluoroethylene
  • Al 2 O 3 alumina oxide
  • carbon nanotube 10 wt% A fluorocarbon thin film was manufactured in the same manner except that a polymer composite target was used.
  • the fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the fluorocarbon thin film manufactured by the above method were measured, and the results are shown in Table 4 below.
  • a fluorocarbon thin film was produced using a roll-to-roll sputter (ULVAC, SPW-060) on a PET film (SKC, SH-40, thickness of 100 ⁇ m, width of 600 mm).
  • Copper backing plate with fluoropolymer composite target (square plate, length 950 mm, width 127 mm, thickness 6 mm) made from square plate containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotube (Cu backing plate) It was attached to the electrode surface. It was installed in MF dual sputtering cathode 1. After that, the PET film is wound in an unwinder chamber, and the inside of the roll-to-roll sputtering device is evacuated to 50 mtorr using a rotary pump and a booster pump to make a low vacuum state, followed by a turbo molecular pump.
  • PTFE polytetrafluoroethylene
  • Cu backing plate carbon nanotube
  • a fluorocarbon thin film was deposited by a MF dual sputtering cathode 1 with a MF power of 5 kW at a thickness of 100 nm, and the fluorocarbon thin film thus produced was unwound in a winder chamber.
  • the fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the fluorocarbon thin film manufactured by the above method were measured, and the results are shown in Table 4 below.
  • a high purity Si target (99.9%, Mitsui, square plate, length 950 mm, width 127 mm, thickness 6 mm) was attached to the copper backing plate electrode face and mounted on MF dual sputtering cathode 1.
  • a copper fluorine-based composite target (square plate, length 950 mm, width 127 mm, thickness 6 mm) made of a rectangular plate containing 99 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 1 wt% of carbon nanotubes was copper.
  • the backing plate was attached to the electrode face and mounted on the MF dual sputtering cathode 2.
  • a MF dual sputtering cathode 2 deposited a SiO 2 thin film as a buffer layer with a MF power of 3 kW (20 nm thick). Subsequently, a fluorocarbon thin film was deposited to a thickness of 100 nm with MF power of 5 kW by MF dual sputtering cathode 2, and then a hard coat film prepared was wound in a winder chamber.
  • Example 22 Example 23 Example 24 Example 25 Example 26 Comparative Example 8 Surface Hardness (GPa) 1.41 6.90 2.35 1.15 2.05 0.58 Transmittance (%, wavelength 550nm) 95.45 94.55 95.75 92.56 93.24 91.27
  • the fluorocarbon thin film according to the present invention provides a transparent fluorine carbide thin film having a significantly improved surface hardness characteristics compared to Comparative Example 8, which is a fluorine carbide thin film deposited by RF power, scratch resistance, It is expected to have a water repellent property, antifouling property, anti-fingerprint and the like, which can be usefully applied to the surface of a liquid crystal display device.
  • a hydrocarbon thin film was fabricated on a 1 ⁇ 1 cm 2 glass substrate (eagle XG glass 0.5mmTh) using a cluster sputtering device.
  • the fluorine-based polymer composite target (4 inches in diameter and 6 mm in thickness) was manufactured in a circular shape containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotubes (average particle diameter: 30 nm). It was attached to the copper backing plate electrode face. This was installed in the MF dual sputtering cathode of the sputtering chamber portion.
  • powder PTFE polytetrafluoroethylene, DuPont 7AJ
  • carbon nanotubes average particle diameter: 30 nm
  • Example 27 A fluorocarbon thin film was manufactured in the same manner, except that a fluorine-based polymer composite target containing 1 wt% of carbon nanotubes (average particle diameter: 30 nm) was used.
  • a fluorocarbon thin film was produced using a roll-to-roll sputter (ULVAC, SPW-060) on a PET film (SKC, SH-40, thickness of 100 ⁇ m, width of 600 mm).
  • Fluorine-based polymer composite target (length 950 mm, width 127 mm, thickness 6 mm) made of square plate containing PTFE (polytetrafluoroethylene, DuPont 7AJ) 95 wt% and carbon nanotube (average particle diameter 30 nm) 5 wt% Backing plate (Cu backing plate) was attached to the electrode surface. It was installed in MF dual sputtering cathode 2. After that, the PET film is wound in an unwinder chamber, the inside of the roll-to-roll sputtering apparatus is made low vacuum by using a rotary pump and a booster pump, and then a high vacuum (2 ⁇ 10 -4) is used by using a turbo molecular pump. Pa) was formed.
  • MF and DC power are 1.0 W / cm 2 while injecting process gases (argon, Ar) into each cathode at a flow rate of 400 sccm, -sputtering was performed. Thereafter, the temperature of the main roll is lowered to 10 ° C., and the reaction gas (oxygen, O 2 ) is injected while the process gas Ar is injected at a rate of 400 sccm while conveying the PET film at a speed of 1 m / min. Injected at 35 sccm to perform a reactive sputtering process for 30 minutes using MF sputtering (power 2.0 W / cm2) to produce a fluorocarbon thin film (100nm thickness).
  • process gases argon, Ar
  • Example 27 Example 28 Example 29 Comparative Example 9 Male contact angle (°) 114 105 103 98 Hexadecane contact angle (°) 55 55 55 35 35
  • the present invention can provide a fluorocarbon thin film having high water repellency and oil repellency for hexadecane of 50 ° or more.
  • the fluorocarbon thin film according to the present invention is significantly improved oil repellency compared to the fluorocarbon thin film made of 100% PTFE prepared by the method of Comparative Example 9, the organic EL display device, field emission with excellent pollution resistance and transparency It is applied to outermost layers such as display panels and touch screens such as flexible substrates or encapsulating materials of various display devices (displays) such as display devices and liquid crystal displays, solar cells, thin film batteries, and electric double layer capacitors, and the like. It is expected to be able to provide the device.
  • PET film (SKC, SH-40, thickness 100um, width 600mm) using roll-to-roll sputter (ULVAC, SPW-060) device using PTFE 100% Target by MF sputtering method and MF power in Ar gas atmosphere 2.5 W / cm 2 was applied, but no plasma was formed, so that deposition of the fluorocarbon thin film was impossible.
  • PET 100% (SKC, SH-40, 100um thick, 600mm wide) using roll-to-roll sputter (ULVAC, SPW-060) device using DC 100% Target by DC sputtering method and 2.5 DC power in Ar gas atmosphere. W / cm 2 was applied, but no plasma was formed, so that deposition of the fluorocarbon thin film was impossible.
  • Example 19 It was intended to form only the inorganic layer according to Example 19 using a roll-to-roll sputter device (ULVAC, SPW-060) on the nylon fiber fabric.
  • UAVC roll-to-roll sputter device
  • the coated fiber deposited under an oxygen (O 2 ) atmosphere with an MF power of 10 kW through the cathode 2 was prepared.
  • Hydrocarbon thin film was produced in PET film (SKC, SH-40, thickness 100micrometer) using the cluster sputter apparatus. At this time, the fluorocarbon thin film was manufactured at 200W using RF power method using 100% PTFE Target.
  • the fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the prepared fluorocarbon thin film were measured, and the results are shown in Table 4.
  • Hydrocarbon thin film was produced in a PET film (SKC, SH-40, thickness 100um, width 100mm, length 100mm) using a cluster sputtering equipment.
  • 100 nm fluorocarbon thin film was prepared by depositing for 30 minutes while injecting only 50 sccm of Ar, which is a process gas, by using a 100% PTFE power target at 3.7 W / cm 2 by RF power method using a 100% PTFE target.

Abstract

The present invention relates to a method for manufacturing a fluorocarbon thin film and a continuous roll-to-roll method-based sputtering deposition system for the manufacturing thereof by which conductivity is imparted on a super water repellent and high insulating fluorine-based polymer, thereby enabling plasma to be stably formed even by means of the industrially widely used DC and MF power supply systems, thus enabling sputtering even at a more lower energy.

Description

탄화불소 박막의 제조방법Method of manufacturing fluorocarbon thin film
본 발명은 탄화불소 박막의 제조방법에 관한 것으로, 보다 상세하게 RF 전원방식의 스퍼터링시에도 불소계고분자의 절연파괴를 방지하고 높은 증착율의 구현이 가능하며, RF 보다 낮은 에너지인 MF 및 DC 전원방식에서 조차도 안정적으로 스퍼터링이 가능한 탄화불소 박막의 제조방법에 관한 것이다.The present invention relates to a method for manufacturing a fluorine carbide thin film, and more particularly, to prevent dielectric breakdown of fluorine-based polymers and to realize a high deposition rate even in sputtering of an RF power supply system. Even the present invention relates to a method for producing a fluorocarbon thin film capable of stably sputtering.
최근, 디스플레이 장치는 멀티미디어의 발달과 함께 그 중요성이 증대되고 있다. 이에 부응하여 액정 디스플레이 장치, 플라즈마 디스플레이 장치 및 유기 발광 디스플레이 장치 등의 평판 디스플레이 장치가 상용화되고 있으며, 스마트폰, 디지털 TV, 테블릿 PC, 노트북, PMP, 네비게이션 등 다양한 디지털 기기가 출시되면서 평판 디스플레이 패널이나 터치 스크린의 수요가 증가하고 있다.Recently, the importance of the display device is increasing with the development of multimedia. In response to this, flat panel display devices such as liquid crystal display devices, plasma display devices, and organic light emitting display devices have been commercialized, and various digital devices such as smart phones, digital TVs, tablet PCs, notebook computers, PMPs, navigation devices, etc. have been released. But the demand for touch screens is increasing.
상기 평판 디스플레이 패널로는 LCD, PDP, OLED 등을 들 수 있다. 이들은 경량, 박형, 저전력구동, 풀-컬러 및 고해상도 구현 등의 특징으로 인해 각종 디지털 기기의 디스플레이 장치로 널리 사용되고 있다. 상기 터치 스크린은 각종 평판 표시 장치의 표시 면에 설치되어 사용자가 표시 장치를 보면서 원하는 정보를 선택하도록 하는데 이용되는 입력장치로 그 수요가 증가하고 있다.Examples of the flat panel display panel include LCD, PDP, and OLED. They are widely used as display devices of various digital devices because of their light weight, thinness, low power drive, full-color and high resolution. The touch screen is an input device installed on a display surface of various flat panel display devices and used to allow a user to select desired information while viewing the display device.
이러한 평판 디스플레이 패널이나 터치 스크린은 전면이 외부로 노출되어 있어서 수분이나 수분을 함유한 오염물에 의해 오염되기 쉬우며, 오염물이 묻은 상태로 장시간 방치되어 고착되면 오염물을 닦아내기가 쉽지 않다는 문제점을 가진다. 더욱이, 디스플레이 패널이나 터치 스크린은 수분이 묻으면 제품의 기능에 악영향을 줄 수 있으므로 수분으로부터 보호될 필요가 있다.Such a flat panel display panel or a touch screen is exposed to the outside and is easily contaminated by contaminants containing moisture or moisture, and has a problem that it is not easy to wipe off contaminants when it is left standing for a long time with contaminants. Moreover, the display panel or touch screen needs to be protected from moisture because moisture may adversely affect the function of the product.
이러한 문제점을 해결하기 위해, 이들 디스플레이 장치 표면에 불소를 함유하는 보호막을 형성하여 소수성화 시키는 방법이 주로 이용되고 있다. 소수성 표면의 구현을 위한 방법으로 불소계 화합물 코팅의 구체적인 일예로는 불소 치환 알킬기 함유 유기 규소 화합물 함유 용액을 그대로 용기에 넣어 가열하여 기재 상에 그 화합물의 박막을 형성하는 방법(특허문헌 1, JP2009-175500), PTFE(polytetrafluoroethylene), 분체 분산액을 내열성 기판 상에 도포 후 융점 이상으로 가열하여 분체를 결착시켜 박막을 형성하는 방법(특허문헌 2, JP1993-032810), 불소 함유의 실라잔계 유기 규소 화합물을 진공하에서 가열해 광학부재 위에 증착하여 성막하는 방법(특허문헌 3, JP1993-215905) 등을 들 수 있다. 그러나 특허문헌 1에 개시된 발명은 원료를 소정 시간 이상 가열했을 경우, 박막의 내구성이 저하되기 때문에 생산할 수 있는 막의 두께가 제한되거나, 안정적으로 내구성이 높은 박막을 생산할 수 없다는 문제점을 가진다. 특허문헌 2 에 개시된 발명은 PTFE의 높은 용융점 때문에 사용할 수 있는 장치가 한정되고 고비용의 원인이 되며, 특허문헌 3 에 개시된 발명은 증착장치에 도입하기 전에 증착원으로 사용한 원료 물질이 불안정해지기 때문에 안정적으로 박막을 생산할 수 없다는 문제점을 가진다.In order to solve this problem, a method of forming a hydrophobic film by forming a protective film containing fluorine on the surface of these display devices is mainly used. As a specific example of fluorine-based compound coating as a method for realizing a hydrophobic surface, a method of forming a thin film of the compound on a substrate by heating a solution containing an organosilicon compound containing a fluorine-substituted alkyl group as it is (Patent Document 1, JP2009-). 175500), PTFE (polytetrafluoroethylene), a powder dispersion is coated on a heat-resistant substrate and heated above the melting point to bind the powder to form a thin film (Patent Document 2, JP1993-032810), a fluorine-containing silazane-based organosilicon compound The method of depositing and depositing on a optical member by heating under vacuum (patent document 3, JP1993-215905), etc. are mentioned. However, the invention disclosed in Patent Document 1 has a problem in that when the raw material is heated for a predetermined time or more, the durability of the thin film is lowered, so that the thickness of the film that can be produced is limited, or a thin film having high durability cannot be stably produced. The invention disclosed in Patent Literature 2 is limited due to the high melting point of PTFE, and causes high cost. The invention disclosed in Patent Literature 3 is stable because the raw material used as the deposition source becomes unstable before being introduced into the deposition apparatus. There is a problem that can not produce a thin film.
또한, 소수성 표면의 구현을 위한 또 다른 방법으로는 불소계 계면활성제를 이용하는 방법이 있다. 소수성 표면 특성을 구현하기 위해 저분자량의 불소계 계면활성제를 도입하여 탄화불소 부분이 표면에 잘 나올 수 있도록 조절할 수 있으나 내구성에 문제를 야기하고, 고분자량의 불소계 계면활성제 도입시 내구성은 좋아지나 소수성 구현에 어려움이 생기고, 코팅 매트릭스와의 상분리 문제로 표면에 외관 문제를 일으킬 수 있어서 바람직하지 않다.In addition, another method for implementing a hydrophobic surface is a method using a fluorine-based surfactant. In order to realize hydrophobic surface properties, low molecular weight fluorine-based surfactants can be introduced to control the fluorinated hydrocarbons on the surface, but it causes problems in durability, and durability is improved when high molecular weight fluorine-based surfactants are introduced. Is not preferable because it causes difficulty in the appearance and may cause appearance problems on the surface due to phase separation from the coating matrix.
상기와 같은 문제점들을 극복하고자, 최근에는 습식공정이 아닌 불소계고분자를 건식공정을 이용하여 코팅하고자 하는 기술 개발이 이뤄지고 있다. 불소계고분자를 건식공정으로 코팅하는 방법으로 가장 대표적인 예가 스퍼터링이며, 이는 불소계고분자 표면에 강한 플라즈마를 형성하여 발생된 플라즈마가 불소계고분자 표면에 강한 에너지를 부여하여 분자 레벨의 불소계고분자가 표면에서 떨어져서 반대편 피착재 표면에 증착되어 코팅되는 공정이다. 그러나 고분자수지와 같은 절연특성을 가지는 스퍼터링 타겟의 경우에는 직류 전원을 인가할 경우 타겟 표면에 양전하들이 모이게 되어 인가 전압을 약화시키게 되어 입사되는 충돌 입자의 에너지가 감소하므로, 증착율이 아주 낮거나 플라즈마 자체가 생성되지 않는 문제점을 가진다. 이러한 문제점으로 인해, 고분자수지와 같은 절연특성을 가지는 물질의 스퍼터링을 위해서는 반드시 고 에너지가 필요하고, 이를 위해서는 고주파 전원 방식인 RF (Radio Frequency) 등을 사용할 수 밖에 없었다. 하지만, 절연특성이 높은 스퍼터링 타겟을 이용하여 고 에너지의 RF로 스퍼터링 하게 될 경우, 부전압의 인가가 용이하지 못하여 박막의 낮은 증착율을 보이는 등의 문제점이 여전하였으며, 고주파의 손실을 막기 위하여 장치 내에 별도의 임피던스(Impedance, 교류저항)를 조절해주는 매칭박스(Matching Box) 등의 추가 설비가 필수적으로 요구된다. In order to overcome the problems as described above, in recent years, a technique for coating a fluorine-based polymer using a dry process rather than a wet process has been made. The most typical example is sputtering, which is a method of coating a fluorine-based polymer by a dry process, and a strong plasma is formed on the surface of the fluorine-based polymer, and the generated plasma gives strong energy to the surface of the fluorine-based polymer, and molecular-level fluorine-based polymer is separated from the surface and deposited on the opposite side. It is a process that is deposited and coated on the surface of the ash. However, in the case of sputtering targets having insulation characteristics such as polymer resins, when direct current power is applied, positive charges are collected on the target surface, which weakens the applied voltage, thereby reducing the energy of incident collision particles. Has the problem that it is not created. Due to this problem, high energy is required for sputtering of a material having an insulating property such as a polymer resin, and for this purpose, RF (Radio Frequency), which is a high frequency power supply method, has to be used. However, when sputtering with high energy RF using sputtering target with high insulation properties, it is not easy to apply negative voltage and shows low deposition rate of thin film. Additional equipment, such as a matching box, which controls separate impedance, is required.
이에, 본 발명자들은 고에너지를 인가해야만 했던 종래 탄화불소 박막 증착의 상기 문제점의 해결과 더불어, RF에 비해, 비교적 낮은 수십 KHz의 주파수 또는 그 이하의 주파수를 가지는 전원방식의 스퍼터링으로도 높은 증착율로 증착이 가능하여, 매우 단시간 내에 롤투롤 공정으로 대면적의 탄화불소 박막의 제조가 가능한 새로운 기술을 개발함으로써, 본 발명을 완성하게 되었다. Accordingly, the present inventors have solved the above problems of the conventional fluorine carbide thin film deposition which had to apply high energy, and the high deposition rate even with the sputtering of the power method having a frequency lower than tens of KHz or lower than RF. The present invention has been completed by developing a new technology capable of depositing and manufacturing a large-area fluorocarbon thin film in a roll-to-roll process in a very short time.
본 발명은 종래 초발수성의 특성으로 인해 RF(Radio Frequency) 전원방식을 인가해야만 했던 불소계고분자를 포함하는 박막의 제조방법에서의 문제점을 해결함과 동시에 RF에 비해, 비교적 낮은 전원방식으로도 우수한 증착 효율을 나타낼 수 있는 탄화불소 박막의 제조방법을 제공하는 것을 목적으로 한다. 특히, 본 발명은 MF(Mid-range Frequency) 또는 DC(direct current) 전원방식에서도, RF 전원방식에서와 동일한 박막을 형성할 수 있어, 매우 단시간 내에 대면적 박막의 제조가 가능한 롤투롤 공정의 구현이 가능하며, 기존 롤투롤 장비에서 별도의 개조 비용 없이 타겟의 교환으로 바로 적용이 가능하여 상업성 및 경제성이 우수한 탄화불소 박막의 제조방법을 제공한다.The present invention solves a problem in the method of manufacturing a thin film including a fluorine-based polymer that had to be applied to the RF (Radio Frequency) power source due to the superhydrophobic nature, and at the same time, excellent deposition at a relatively low power source compared to RF. An object of the present invention is to provide a method for producing a fluorocarbon thin film that can exhibit efficiency. Particularly, the present invention can form the same thin film as that of the RF power method even in a mid-range frequency (MF) or direct current (DC) power supply method, thereby implementing a roll-to-roll process capable of producing a large area thin film in a very short time. This is possible, and the existing roll-to-roll equipment can be directly applied to the replacement of the target without any additional renovation cost, thereby providing a method of manufacturing a fluorocarbon thin film having excellent commercial and economical efficiency.
본 발명의 또 다른 목적은 MF 또는 DC에서도 불소계고분자를 안정적으로 스퍼터링이 가능한 탄화불소 박막 증착용 롤투롤 방식의 스퍼터링 증착 시스템 및 이를 이용하여 형성된 성형체를 제공하는 것이다. 이때, 본 발명에 따른 성형체는 초발수성을 가지는 고품질의 투명 탄화불소 박막일 수 있다. 또한 본 발명은 기능화제의 종류 및 함량 등에 따라 추가적인 다양한 물성을 가지는 불소계고분자 박막일 수도 있다. 또한 본 발명은 상기 불소계고분자 박막을 포함하는 복합박막 및 이들을 포함하는 성형제를 포함하는 성형체를 제공한다.Still another object of the present invention is to provide a roll-to-roll sputtering deposition system for fluorine carbide thin film deposition capable of stably sputtering fluorinated polymer even in MF or DC, and a molded body formed using the same. In this case, the molded article according to the present invention may be a high quality transparent fluorocarbon thin film having super water repellency. In addition, the present invention may be a fluorine-based polymer thin film having additional various physical properties depending on the type and content of the functionalizing agent. In another aspect, the present invention provides a molded article comprising a composite thin film comprising the fluorine-based polymer thin film and a molding agent comprising the same.
본 박명에서 박막은 다양한 형태를 가지는 기재(substrate), 예를 들면, 필름이나 섬유 또는 입체적 구조 등의 기재 표면에 형성되는 박막을 모두 포함하는 것은 당연하다. In the present invention, the thin film may include all substrates having various forms, for example, thin films formed on the surface of a substrate such as a film, a fiber, or a three-dimensional structure.
본 발명은 상기 목적을 달성하기 위하여, 불소계고분자에 도전성을 가지는 기능화제를 포함하는 불소계고분자 복합 타겟을 이용하여 기재 상에 스퍼터링 하는 단계를 포함하는 탄화불소 박막의 제조방법을 제공한다. 이때, 상기 스퍼터링은 RF, MF 또는 DC 전원방식으로 수행될 수 있음은 물론이며, 상술된 바와 같은 도전성을 가지는 기능화제의 도입으로 종래 불소계고분자의 증착시 고에너지를 인가함에 따른 열화현상 등으로 인해 발생하는 불소계고분자 타겟의 손상, 인가 전압에 비해 낮은 효율의 플라즈마 발생으로 낮은 증착율 등의 문제점을 획기적으로 개선할 수 있었을 뿐 아니라 보다 상업적으로 유용한 MF 또는 DC 전원방식으로도 높은 증착율의 구현이 가능한 탄화불소 박막의 제조가 가능하다.The present invention provides a method for producing a fluorocarbon thin film comprising the step of sputtering on a substrate using a fluorine-based polymer composite target comprising a functionalizing agent having conductivity to the fluorine-based polymer. At this time, the sputtering may be performed by RF, MF or DC power supply method, of course, due to the deterioration phenomenon due to the application of high energy during the deposition of the conventional fluorine-based polymer by the introduction of a functionalizing agent having the conductivity as described above Not only could the fluorine-based polymer target be damaged or the plasma generated at a lower efficiency than the applied voltage, it was able to drastically improve problems such as low deposition rate and carbonization which could realize high deposition rate even with more commercially available MF or DC power supply. The fluorine thin film can be manufactured.
본 발명의 일 양태에 따른 탄화불소 박막의 제조방법은 MF 또는 DC 전원방식을 이용하는 롤투롤 방식으로의 스퍼터링이 가능하다. 즉, 기재를 롤투롤 방식으로 이송시키면서, 도전성 기능화제를 포함하는 불소계고분자 복합 타겟을 이용하여 MF 또는 DC 전원방식으로 스퍼터링 공정의 수행이 가능하여 대면적의 탄화불소 박막을 제공할 수 있을 뿐 아니라 종래의 롤투롤 장비를 별도 개조 비용 없이 바로 적용이 가능하여 탄화불소 박막의 제조방법의 자동화, 단순화 및 연속된 제조를 가능케 한다. In the method for manufacturing a fluorocarbon thin film according to an aspect of the present invention, sputtering in a roll-to-roll method using MF or DC power supply is possible. That is, while transporting the substrate in a roll-to-roll method, it is possible to perform the sputtering process by MF or DC power supply using a fluorine-based polymer composite target containing a conductive functionalizing agent to provide a large-area fluorocarbon thin film as well as The conventional roll-to-roll equipment can be directly applied without additional modification cost, thereby enabling automation, simplification, and continuous manufacturing of the fluorocarbon thin film manufacturing method.
또한, 본 발명의 일 양태예에 따른 탄화불소 박막의 제조방법은 다양한 기재에 적용이 가능할 뿐 아니라 판 형태의 기재 외에도 일부가 굴곡진 형태, 일예로 가장자리가 굴곡된 형태, 모서리만 굴곡된 형태, 전체 면이 커브된 형태, 반구 형태 등 모든 입체적인 형태를 가지는 기재에 적용시에도 균일한 증착이 가능하다.In addition, the method of manufacturing a fluorocarbon thin film according to an embodiment of the present invention is not only applicable to a variety of substrates, but also in addition to the plate-shaped substrate, some of the curved form, for example, the curved edge, only the curved corner, Uniform application is possible even when applied to a substrate having all three-dimensional shapes such as curved shape and hemispherical shape.
본 발명에 따른 탄화불소 박막의 제조방법은 RF에 비해, 비교적 낮은 수십 KHz의 주파수 또는 그 이하의 주파수를 가지는 전원방식인 MF 또는 DC 스퍼터링이 가능하여, 대면적 박막의 제조가 가능한 롤투롤 공정의 구현이 가능하다. 또한, 낮은 에너지대의 전원방식으로 탄화불소 박막을 제조할 수 있음에 따라 기존 롤투롤 장비에서 별도의 개조 비용 없이 바로 적용이 가능하여 상업성 또한 우수하다.The method for manufacturing a fluorocarbon thin film according to the present invention is a power supply method of MF or DC sputtering, which has a relatively low frequency of several tens of KHz or less than RF, so that a large-area thin film can be manufactured. Implementation is possible. In addition, since the fluorocarbon thin film can be manufactured by a low energy power supply method, it can be directly applied to the existing roll-to-roll equipment without any additional modification cost, and thus commerciality is also excellent.
본 발명의 일 양태에 따른 상기 탄화불소 박막의 제조방법에 있어서, 상기 불소계고분자 복합 타겟은 추가적으로 금속화합물, 즉 금속유기물, 금속산화물, 금속탄소체, 금속수산화물, 금속카보네이트, 금속바이카보네이트, 금속질화물, 금속불화물 등에서 선택되는 단독 또는 혼합성분을 더 포함할 수 있음은 물론이다. 이러한 금속화합물의 추가에 따라 본 발명에 따른 제조방법으로 제조된 성형체, 즉 탄화불소 박막의 물리·화학·광학적 특성을 용이하게 조절할 수 있다. In the method of manufacturing the fluorocarbon thin film according to an aspect of the present invention, the fluorine-based polymer composite target is additionally a metal compound, that is, metal organic matter, metal oxide, metal carbon body, metal hydroxide, metal carbonate, metal bicarbonate, metal nitride Of course, it may further include a single or mixed component selected from metal fluoride and the like. With the addition of such metal compounds, the physical, chemical, and optical properties of the molded article, ie, fluorocarbon thin film, produced by the manufacturing method according to the present invention can be easily adjusted.
또한 본 발명의 일 양태에 따른 탄화불소 박막의 제조방법은 탄화불소 박막의 표면 특성을 제어하기 위해 추가적인 처리 공정을 더 포함할 수 있다. 구체적으로, 상기 처리 공정은 탄화불소 박막의 스퍼터링하는 단계 중 반응 가스를 주입하여 반응성 스퍼터링이 수행될 수 있게 하거나 스퍼터링하는 단계 이후 표면처리 가스를 주입하여 플라즈마 표면처리를 수행하는 것일 수 있다.In addition, the method for manufacturing a fluorocarbon thin film according to an aspect of the present invention may further include an additional treatment step to control the surface characteristics of the fluorocarbon thin film. Specifically, the treatment process may be to inject the reactive gas during the sputtering of the fluorocarbon thin film to perform reactive sputtering or to inject the surface treatment gas after the sputtering to perform plasma surface treatment.
본 발명은 낮은 에너지에서 스퍼터링이 가능한 탄화불소 박막의 제조방법에 적합한 연속적인 롤투롤 방식의 스퍼터링 증착 시스템을 제공한다. 롤투롤 방식의 증착 장치는 종래에 것이라면 제한하지 않고 사용할 수 있지만, 도 1의 도면을 예로 간략히 설명하면 다음과 같다. The present invention provides a continuous roll-to-roll sputtering deposition system suitable for a method of manufacturing a fluorocarbon thin film capable of sputtering at low energy. The roll-to-roll deposition apparatus can be used without limitation as long as the conventional one, but briefly described with reference to the drawings of FIG.
상기 롤투롤 방식의 스퍼터링 증착 시스템은 웹 형태의 기재가 감겨져 있는 롤이 장착되는 언와인더 챔버(unwinder chamber, 100), 상기 기재의 일면에 탄화불소 박막을 증착하는 메인 챔버(main chamber, 200) 및 증착된 탄화불소 박막을 권취하는 와인더 챔버(winder chamber, 300)를 포함할 수 있다. The roll-to-roll sputtering deposition system includes an unwinder chamber 100 in which a roll on which a web-type substrate is wound is mounted, and a main chamber 200 in which a fluorocarbon thin film is deposited on one surface of the substrate. And a winder chamber 300 for winding the deposited fluorocarbon thin film.
본 발명의 일 양태에 따른 상기 롤투롤 방식의 스퍼터링 증착 시스템의 메인 챔버에는 3개의 MF 듀얼 스퍼터링 캐소드(MF dual cathode, cathode 1 내지 3, 202-204)와 1개의 DC 싱글 스퍼터링 캐소드(MF single cathode, cathode 4, 205)를 가져, MF 및 DC를 이용한 연속적인 스퍼터링이 가능할 뿐 아니라 금속 또는 합금을 포함하는 다양한 종류의 타겟들과 동시에 스퍼터링이 가능하고, 대면적의 박막의 제조가 용이하여 고품질의 탄화불소 박막의 생산성을 크게 향상시킬 수 있다. In the main chamber of the roll-to-roll sputtering deposition system according to an aspect of the present invention, three MF dual cathode (cathodes 1 to 3, 202-204) and one DC single sputtering cathode (MF single cathode) , cathodes 4 and 205, which enables continuous sputtering using MF and DC, as well as sputtering simultaneously with various targets including metals or alloys, and are easy to manufacture large-area thin films. The productivity of the fluorocarbon thin film can be greatly improved.
본 발명은 기재 상에 도전성을 가지는 기능화제를 포함하는 불소계고분자 복합타겟을 이용하여 MF 또는 DC 전원방식으로 스퍼터링하여 형성된 성형체, 즉 고품질의 탄화불소 박막을 제공한다.The present invention provides a molded body formed by sputtering by MF or DC power supply using a fluorine-based polymer composite target including a conductive agent having conductivity on a substrate, that is, a high quality fluorocarbon thin film.
본 발명은 도전성을 부여한 불소계고분자 복합 타겟을 이용하여, 종래 강한 에너지에 의해 발생하는 결함, 절연파괴 등을 효과적으로 방지하고, 높은 효율로 플라즈마를 발생시킴으로써 보다 향상된 증착율로 고품질의 탄화불소 박막을 제공할 수 있다. 이와 같은 효과는 보다 강한 에너지를 인가하는 RF 전원방식의 스퍼터링 방법에서 더욱 두드러진다.The present invention provides a high quality fluoride carbide thin film with improved deposition rate by effectively preventing defects caused by conventional strong energy, insulation breakdown, etc. by using a conductive fluorinated polymer composite target and generating plasma with high efficiency. Can be. This effect is more prominent in the sputtering method of the RF power method applying a stronger energy.
본 발명에 따른 탄화불소 박막의 제조방법은 종래 불소계고분자 타겟을 이용한 스퍼터링 방법에 비해, 비교적 낮은 수십 KHz의 주파수 또는 그 이하의 주파수를 가지는 MF나 DC 전원방식으로도 스퍼터링이 가능할 뿐 아니라, 종래 100% 불소계고분자 타겟을 이용한 탄화불소 박막 대비 현저하게 향상된 물리·화학·광학적 특성의 구현이 가능할 뿐 아니라 다양한 기능성을 동시에 부여할 수 있다.The method for producing a fluorocarbon thin film according to the present invention is not only possible to sputter with a MF or DC power supply method having a frequency lower than tens of KHz or lower than that of the conventional sputtering method using a fluorine-based polymer target. Compared to the fluorocarbon thin film using the% fluorine-based polymer target, not only can the physical, chemical, and optical properties be significantly improved, but also various functionalities can be simultaneously provided.
또한, 본 발명에 따른 제조방법은 대면적의 박막 제조가 가능한 기존의 롤투롤 방식의 MF 또는 DC 스퍼터링 장치를 별도의 개조 비용 없이 탄화불소 박막의 제조에 바로 적용이 가능하며, 공정의 자동화, 단순화 및 연속화된 탄화불소 박막의 제조가 가능하다. 이때, 본 발명에 따른 롤투롤 방식의 스퍼터링 증착 시스템을 적용함으로써, 탄화불소 박막의 스퍼터링 공정 효율을 보다 신속하게 또는 보다 향상시킬 수 있다.In addition, the manufacturing method according to the present invention can be directly applied to the production of fluorinated carbide thin film without the need for additional modification of the conventional roll-to-roll MF or DC sputtering apparatus capable of manufacturing a large-area thin film, automation and simplification of the process And it is possible to manufacture a continuous fluorocarbon thin film. At this time, by applying the roll-to-roll sputtering deposition system according to the present invention, the sputtering process efficiency of the fluorocarbon thin film can be improved more quickly or more.
도 1은 본 발명에 따른 롤투롤 방식의 스퍼터링 증착 시스템의 개략적인 구성도이다.1 is a schematic diagram of a roll-to-roll sputtering deposition system according to the present invention.
도 2는 실시예 21의 방법으로 제조된 초발수 코팅섬유의 발수제층 내 XPS 분석 결과이다.Figure 2 is an XPS analysis result in the water repellent layer of the super water-repellent coating fiber prepared by the method of Example 21.
도 3은 실시예 22의 방법으로 제조된 투명 하드코팅막의 표면 탄성 및 경도 특성 결과이다.3 is a surface elasticity and hardness characteristics of the transparent hard coat film prepared by the method of Example 22.
도 4는 실시예 23의 방법으로 제조된 투명 하드코팅막의 표면 탄성 및 경도 특성 결과이다.4 is a result of surface elasticity and hardness of the transparent hard coat film manufactured by the method of Example 23.
본 발명에 따른 탄화불소 박막의 제조방법에 대하여 이하 상술하나, 이때 사용되는 기술 용어 및 과학 용어에 있어서 다른 정의가 없다면, 이 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 통상적으로 이해하고 있는 의미를 가지며, 하기의 설명에서 본 발명의 요지를 불필요하게 흐릴 수 있는 공지 기능 및 구성에 대한 설명은 생략한다.A method of manufacturing a fluorocarbon thin film according to the present invention will be described in detail below, but unless otherwise defined in technical terms and scientific terms used herein, a person having ordinary knowledge in the technical field to which the present invention pertains generally means The description of well-known functions and configurations that may unnecessarily obscure the subject matter of the present invention will be omitted.
본 발명에 따른 탄화불소 박막의 제조방법은 출력 전압에 상관없이 구현될 수 있다는 측면에서, 종래 RF 등과 같이 고 에너지를 반드시 필요로 하였던 탄화불소 박막의 제조방법과 차별화된다. The method of manufacturing the fluorocarbon thin film according to the present invention is different from the method of manufacturing the fluorocarbon thin film, which requires a high energy such as RF in the related art in that it can be implemented regardless of the output voltage.
또한, 본 발명은 산업적으로 유용한 전원방식인 MF나 DC 전원방식의 스퍼터링 공정을 이용하여도 높은 증착율을 구현할 수 있을 뿐 아니라 RF 등의 강한 에너지의 인가시 발생될 수 있는 타겟의 변형 또는 전극면과의 접합부위의 결함 등의 발생을 효과적으로 방지할 수 있다.In addition, the present invention can not only implement a high deposition rate even by using a sputtering process of MF or DC power supply, which is an industrially useful power supply method, but also deforms the electrode surface or the electrode surface that can be generated when a strong energy such as RF is applied. It is possible to effectively prevent the occurrence of defects and the like at the joints.
또한, 본 발명에 따른 탄화불소 박막의 제조방법은 대면적 박막의 제조가 가능한 롤투롤 공정의 구현이 가능하여, 낮은 에너지대의 전원방식으로 기존 롤투롤 장비를 이용한 공정의 자동화, 단순화 및 연속화된 탄화불소 박막의 제조방법을 제공할 수 있다.In addition, the method for manufacturing a fluorocarbon thin film according to the present invention enables the implementation of a roll-to-roll process capable of manufacturing a large-area thin film, and the automation, simplification and continuous carbonization of the process using existing roll-to-roll equipment with a low energy power method It is possible to provide a method for producing a fluorine thin film.
본 발명의 일 양태에 따른 탄화불소 박막의 제조방법은 기재를 롤투롤 방식으로 이송시키면서, 도전성을 가지는 불소계고분자 복합 타겟을 이용하여 MF 또는 DC 전원방식으로 스퍼터링 공정을 수행할 수 있다. 이때, 상기 불소계고분자 복합 타겟은 불소계고분자와 도전성을 가지는 기능화제를 포함한다. 이때, 상기 기능화제는 도전성을 가지는 물질이라면 한정되지 않으나 바람직할 일예로는 전도성입자, 전도성 고분자, 금속성분 등에서 선택되는 하나 또는 둘 이상의 혼합물일 수 있다.In the method for manufacturing a fluorocarbon thin film according to an aspect of the present invention, a sputtering process may be performed by MF or DC power supply using a fluorine-based polymer composite target having conductivity while transferring a substrate in a roll-to-roll manner. In this case, the fluorine-based polymer composite target includes a fluorine-based polymer and a functionalizing agent having conductivity. In this case, the functionalizing agent is not limited as long as it has a conductivity, but one example may be one or a mixture of two or more selected from conductive particles, conductive polymers, and metal components.
상기 전도성입자의 비한정적인 일예로는 카본나노튜브(Carbon nano tube), 카본나노섬유 (carbon nano fiber), 카본블랙(Carbon black), 그래핀(Graphene), 그라파이트(Graphite), 탄소섬유(Carbon fiber) 등을 들 수 있으며, 기타 유기 전도성입자도 포함할 수 있다. 이때, 상기 전도성입자의 일예인 유기 전도성입자를 사용할 경우 탄화불소 성분을 유지하면서 도전성을 부여할 수 있어 바람직하다. 상기 전도성 고분자의 비한정적인 일예로는, 폴리아닐린(polyaniline), 폴리아세틸렌(polyacetylene), 폴리티오펜(polythiophene), 폴리피롤(polypyrrole), 폴리플루렌(polyfluorene), 폴리피렌(polypyrene), 폴리아줄렌(polyazulene), 폴리나프탈렌(polynaphthalene), 폴리페닐렌(polyphenylene), 폴리페닐렌비닐렌(poly phenylene vinylene), 폴리카르바졸(polycarbazole), 폴리인돌(polyindole), 폴리아제핀(polyazephine), 폴리에틸렌(polyethylene), 폴리에틸렌비닐렌(polyethylene vinylene), 폴리페닐렌설파이드(polyphenylene sulfide), 폴리퓨란(polyfuran), 폴리셀레노펜(polyselenophene), 폴리텔루로펜(polytellurophene), 폴리설퍼 나이트라이드 (polysulfur nitride) 등을 들 수 있으나 이에 한정되는 것은 아니다. 또한, 상기 금속성분의 비한정적인 일예로는 구리(Cu), 알루미늄(Al), 은(Ag), 금(Au), 텅스텐(W), 마그네슘(Mg), 니켈(Ni), 몰리브덴(Mo), 바나듐(V), 나이오븀(Nb), 티타늄(Ti), 백금(Pt), 크롬(Cr), 탄탈(Ta) 등을 들 수 있으며, 금속 전극과의 우수한 결착력을 가지는 측면에서 바람직하게는 구리(Cu), 알루미늄(Al), 은(Ag), 금(Au), 텅스텐(W), 실리콘(Si), 마그네슘(Mg), 니켈(Ni) 또는 이들의 혼합물, 보다 바람직하게는 구리(Cu), 알루미늄(Al), 은(Ag), 금(Au) 또는 이들의 혼합물이 좋으나 이에 한정되는 것은 아니다.Non-limiting examples of the conductive particles include carbon nanotubes, carbon nanofibers, Carbon black, graphene, graphite, carbon fiber, and the like, and other organic conductive particles may also be included. In this case, when the organic conductive particles which are examples of the conductive particles are used, conductivity can be imparted while maintaining the fluorocarbon component. Non-limiting examples of the conductive polymer, polyaniline (polyaniline), polyacetylene (polyacetylene), polythiophene (polythiophene), polypyrrole (polypyrrole), polyfluorene (polyfluorene), polypyrene (polypyrene), polyazulene ( polyazulene, polynaphthalene, polyphenylene, poly phenylene vinylene, polycarbazole, polyindole, polyazephine, polyethylene , Polyethylene vinylene, polyphenylene sulfide, polyfuran, polyselenophene, polytellurophene, polysulfur nitride And the like, but are not limited thereto. Further, non-limiting examples of the metal component are copper (Cu), aluminum (Al), silver (Ag), gold (Au), tungsten (W), magnesium (Mg), nickel (Ni), molybdenum (Mo) ), Vanadium (V), niobium (Nb), titanium (Ti), platinum (Pt), chromium (Cr), tantalum (Ta), and the like. Silver (Cu), aluminum (Al), silver (Ag), gold (Au), tungsten (W), silicon (Si), magnesium (Mg), nickel (Ni) or mixtures thereof, more preferably copper (Cu), aluminum (Al), silver (Ag), gold (Au) or mixtures thereof are preferred, but are not limited thereto.
또한, 본 발명의 일 양태에 따른 불소계고분자 복합 타겟은 불소계고분자를 포함하며, 상기 불소계고분자는 불소를 함유한 수지류 라면 한정되는 것은 아니나 바람직하게는 불소를 함유하는 올레핀을 중합시킨 합성수지인 폴리테트라 플루오로에틸렌(PTFE, polytetrafluoroethylene), 폴리클로로트리플루오로에틸렌(PCTFE, polychlorotrifluoroethylene), 폴리비닐리덴디플루오라이드(PVDF, polyvinylidenedifluoride), 플로린화 에틸렌 프로필렌 공중합체 (FEP, fluorinated ethylene propylene copolymer), 폴리 에틸렌-테트라플루오로 에틸렌 (ETFE, poly ethylene-co-tetra fluoro ethylene), 폴리 에틸렌-클로로 트리플루오로 에틸렌 (ECTFE, poly ethylene-co-chloro trifluoro ethylene), 폴리 테트라 플루오로 에틸렌-플로오로 알킬 비닐 에테르 (PFA, poly tetra fluoro ethylene-co-fluoro alkyl vinyl ether) 등에서 선택되는 하나 이상의 불소계고분자 또는 이들중 어느 하나 이상을 포함하는 공중합체; 비닐플루오라이드 단일중합체 고무, 비닐플루오라이드 공중합체 고무, 비닐리덴플루오라이드 단일중합체 고무 및 비닐리덴플루오라이드 공중합체 고무 등에서 선택되는 하나 이상의 불소고무; 로부터 선택되는 하나 이상일 수 있으며, 보다 바람직하게는 폴리테트라 플루오로에틸렌(PTFE, polytetrafluoroethylene)일 수 있지만 이에 한정하는 것은 아니다.In addition, the fluorine-based polymer composite target according to an aspect of the present invention includes a fluorine-based polymer, the fluorine-based polymer is not limited as long as it is a resin containing fluorine, preferably polytetra is a synthetic resin polymerized olefin containing fluorine Fluoroethylene (PTFE, polytetrafluoroethylene), polychlorotrifluoroethylene (PCTFE, polychlorotrifluoroethylene), polyvinylidenedifluoride (PVDF, polyvinylidenedifluoride), fluorinated ethylene propylene copolymer (FEP), polyethylene -Tetrafluoroethylene (ETFE, poly ethylene-co-tetra fluoro ethylene), polyethylene-chloro trifluoro ethylene (ECTFE, poly ethylene-co-chloro trifluoro ethylene), polytetrafluoro ethylene-fluoro alkyl vinyl ether One or more selected from (PFA, poly tetra fluoro ethylene-co-fluoro alkyl vinyl ether) Fluorinated polymer or copolymer comprising one or more of these; At least one fluororubber selected from vinyl fluoride homopolymer rubber, vinyl fluoride copolymer rubber, vinylidene fluoride homopolymer rubber, vinylidene fluoride copolymer rubber, and the like; It may be one or more selected from, and more preferably may be polytetrafluoroethylene (PTFE, polytetrafluoroethylene), but is not limited thereto.
이때, 본 발명에 따른 상기 불소계고분자 복합 타겟의 조성은 제한되지는 않지만 좋게는 상기 불소계고분자 100 중량부에 대하여 상기 기능화제 0.01 내지 2000 중량부로 함유할 수 있으며, 보다 높은 증착율과 절연파괴를 방지하여 고품질의 탄화불소 박막을 증착할 수 있는 측면에서 바람직하게는 0.5 내지 1500 중량부, 보다 바람직하게는 1 내지 1000 중량부로 함유되는 것이 좋다.At this time, the composition of the fluorine-based polymer composite target according to the present invention is not limited, but preferably may be contained in 0.01 to 2000 parts by weight of the functionalizing agent with respect to 100 parts by weight of the fluorine-based polymer, to prevent higher deposition rate and insulation breakdown In terms of being able to deposit a high quality fluorocarbon thin film, it is preferable to contain 0.5 to 1500 parts by weight, more preferably 1 to 1000 parts by weight.
또한, 본 발명의 일 양태에 따른 상기 기재는 실리콘, 금속, 세라믹, 수지, 종이, 유리, 수정, 섬유, 플라스틱, 유기 고분자 등에서 선택될 수 있으며, 이에 한정되는 것은 아니나 플렉시블한 실리콘, 폴리프로필렌(PP), 폴리에틸렌(PE), 폴리카보네이트(PC), 폴리에틸렌테레프탈레이트(PET), 폴리이미드(polyimide, PI), 환형올레핀공중합체(cyclic olefic copolymer, COC), 환형올레핀고분자(cyclic olefin polymer, COC), 트리아세틸 셀룰로오스 (triacetyl cellulose, TAC), 폴리에틸렌나프탈렌(polyethylene naphthalene, PEN), 폴리우레탄(polyurethane, PU), 폴리아크릴레이트 (polyacrylate), 폴리에스터(polyester), 폴리메틸펜텐 (polymethylene pentene, PMP), 폴리메틸메타크릴레이트(polymethyl methacrylate, PMMA), 폴리메타크릴레이트 (polymethacrylate, PMA), 폴리스티렌(polystyrene, PS), 스티렌-아크릴로니트릴 공중합체 (styrene-acrylonitrile copolymer, SAN), 아크릴로니트릴-부틸렌-스티렌 공중합체 (acrylonitrile-butylene-styrene copolymer, ABS), 폴리염화비닐 (polyvinyl chloride, PVC), 에틸렌-비닐 아세테이트 공중합체 (ethylene-vinyl acetate, EVA), 에틸렌비닐알콜 (ethylene-vinyl alcohol copolymer, EVOH), 폴리비닐알콜 (polyvinyl alcohol, PVA), 폴리알릴레이트 (polyarylate, PAR), 아크릴-스티렌-아크릴로니트릴 공중합체 (acrylic-styrene-acrylonitrile copolymer), 에틸렌-부텐 공중합체 (ethylene-butylene copolymer), 에틸렌-옥텐 공중합체 (ethylene-octene copolymer), 에틸렌-프로필렌 공중합체 (ethylene-propylene copolymer), 에틸렌-프로필렌-디엔 공중합체 (ethylene-propylene-diene monomer copolymer, EPDM), 폴리아미드(polyamide), 폴리페닐렌옥사이드 (polyphenylene oxide, PPO), 폴리부틸렌 테레프탈레이트 (polybuthylene terephthalate, PBT), 폴리트리메틸렌테레프탈레이트(polytrimethylene terephthalate, PTT), 폴리옥시메틸렌 (polyoxy methylene, POM), 폴리프탈아미드 (polyphthalamide, PPA), 폴리술폰 (polysulfone, PSf), 폴리에테르술폰 (polyether sulfone, PES), 폴리페닐렌설피드 (polyphenylene sulfide, PPS), 액정고분자 (liquid crystalline polymer, LCP), 폴리에테르이미드 (polyether imide, PEI), 폴리아미드이미드(polyamide imide, PAI), 폴리케톤 (polyketone, PK), 폴리에테르에테르케톤 (poly ether ether ketone, PEEK), 폴리에테르케톤 (poly ether ketone, PEK), 폴리에테르케톤케톤 (polyether ketone ketone, PEKK), 폴리에테르케톤에테르케톤케톤 (polyether ketone ether ketone ketone, PEKEKK), 폴리아릴에테르케톤 (polyaryl ether ketone, PAEK), 폴리벤조이미다졸(polybenzimidazole, PBI), 폴리비닐부티랄(polyvinyl butyral, PVB), 폴리프로필렌카보네이트 (polypropylene carbonate, PPC), 폴리락트산(polylactic acid, PLA), 폴리히드록시알카노에이트 (polyhydroxy alkanoates, PHAs), 알키드 수지 (alkyd resin), 페놀 수지 (phenol resin), 에폭시 수지 (epoxy resin) 등의 필름에서 선택되거나 섬유 또는 유리 등에 사용되는 것이 좋으나 이에 한정되는 것은 아니다. In addition, the substrate according to an aspect of the present invention may be selected from silicon, metal, ceramic, resin, paper, glass, quartz, fiber, plastic, organic polymer, and the like, but is not limited to flexible silicone, polypropylene ( PP), polyethylene (PE), polycarbonate (PC), polyethylene terephthalate (PET), polyimide (PI), cyclic olefic copolymer (COC), cyclic olefin polymer (cyclic olefin polymer, COC) ), Triacetyl cellulose (TAC), polyethylene naphthalene (PEN), polyurethane (PU), polyacrylate, polyester, polymethylene pentene (PMP) ), Polymethyl methacrylate (PMMA), polymethacrylate (polymethacrylate, PMA), polystyrene (PS), styrene-acrylonitrile copolymer (styrene- acrylonitrile copolymer (SAN), acrylonitrile-butylene-styrene copolymer (ABS), polyvinyl chloride (PVC), ethylene-vinyl acetate, EVA ), Ethylene-vinyl alcohol copolymer (EVOH), polyvinyl alcohol (PVA), polyallylate (PAR), acrylic-styrene-acrylonitrile copolymer ), Ethylene-butylene copolymer, ethylene-octene copolymer, ethylene-propylene copolymer, ethylene-propylene-diene copolymer diene monomer copolymer (EPDM), polyamide, polyphenylene oxide (PPO), polybutylene terephthalate (PBT), polytrimethylene terephthalate (polytrime) thylene terephthalate (PTT), polyoxy methylene (POM), polyphthalamide (PPA), polysulfone (PSf), polyether sulfone (PES), polyphenylene sulfide , PPS), liquid crystalline polymer (LCP), polyether imide (PEI), polyamide imide (PAI), polyketone (PK), polyether ether ketone (poly ether ether) ketone, PEEK), polyether ketone (PEK), polyether ketone ketone (PEKK), polyether ketone ether ketone ketone (PEKEKK), polyaryl ether ketone (polyaryl ketone) ether ketone (PAEK), polybenzimidazole (PBI), polyvinyl butyral (PVB), polypropylene carbonate (PPC), polylactic acid (PLA), polyhydroxyal Canoate (polyhydroxy alkanoates, PHAs), alkyd resin (alkyd resin), phenolic resin (phenol resin), epoxy resin (epoxy resin) and the like selected from the film or used in fiber or glass, but is not limited thereto.
본 발명의 일 양태의 탄화불소 박막의 제조방법에 따른 스퍼터링하는 단계는 반응 가스 주입하에서 수행되는 반응성 스퍼터링 단계일 수 있다. 이러한 반응성 스퍼터링으로 인해, 본 발명에 따른 제조방법으로 제조된 성형체, 즉 탄화불소 박막은 소수성의 표면 특성을 그대로 유지함과 동시에 향상된 발유성을 부여할 수 있으며, 기재에 대한 우수한 밀착력을 가질 수 있다. 이때, 본 발명에 따른 상기 발유성은 톨루엔, 데칸, 헥사데칸 등의 탄화수소 또는 IPA(Isopropyl alcohol)로 대표되는 알코올 등이 스며들지 않는 특성을 의미하는 것일 수 있으며, 본 발명의 전반에서는 헥사데칸에 대한 발유성으로 기재되었으나 이에 대한 발유성으로만 한정되지 않음은 물론이다.Sputtering according to the method for producing a fluorocarbon thin film of an aspect of the present invention may be a reactive sputtering step performed under reaction gas injection. Due to this reactive sputtering, the molded article, ie, the fluorocarbon thin film manufactured by the manufacturing method according to the present invention, can maintain the hydrophobic surface property as it is and at the same time give enhanced oil repellency, and have excellent adhesion to the substrate. At this time, the oil repellency according to the present invention may mean a property that hydrocarbons such as toluene, decane, hexadecane, or alcohol represented by IPA (Isopropyl alcohol) does not penetrate, and in the first half of the present invention, It has been described as oil repellency for, but of course not limited to oil repellent for that.
즉, 본 발명의 일 양태에 따른 상기 반응성 스퍼터링에 의해 형성된 성형체, 즉 탄화불소 박막은 초발수 특성 뿐 아니라 우수한 발유 특성으로 평판 디스플레이 패널이나 터치 스크린 등의 디스플레이 장치 표면의 최외각층에 증착되어 오염물 부착 방지 및 오염물 부착시 오염물의 제거를 용이하게 하고, 표면 개질성이 우수하여 다양한 용도로의 활용이 기대된다. 이에 더불어, 본 발명에 따른 탄화불소 박막은 높은 투명성으로 인해 표면 보호용 필름 등으로 적용 가능성이 높으며, 낮은 굴절률로 인해 반사방지 필름 등으로의 적용이 가능하여 다양한 디스플레이 장치에 적용 가능하다. That is, the molded body formed by the reactive sputtering according to an aspect of the present invention, that is, a fluorocarbon thin film is deposited on the outermost layer of the surface of a display device such as a flat panel display panel or a touch screen with excellent oil repellent properties as well as super water repellent properties to attach contaminants When preventing and attaching contaminants, it is expected to facilitate the removal of contaminants and to be used in various applications because of excellent surface modification properties. In addition, the fluorocarbon thin film according to the present invention is highly applicable to a surface protection film due to high transparency, and can be applied to various anti-reflection films due to low refractive index.
본 발명의 일 양태에 따르면, 상기 탄화불소 박막은 목적하는 발수 및 발유 특성을 구현하기 위해 반응성 스퍼터링 공정을 1회 이상 수행하여 제조될 수 있다. 또한, 본 발명은 상기 반응성 스퍼터링 공정에서 다양한 목적이나 기능에 따라 다양한 양태로 불소계고분자 복합타겟의 성분 및 이들의 함량 등과 반응가스의 종류 및 유량 등을 적절하게 조절하여 제조될 수 있다. 또한, 본 발명은 공정 편의성을 획기적으로 높이고, 보다 향상된 스퍼터링 효율의 구현을 위해 반응성 스퍼터링 공정은 MF 또는 DC 전원방식으로 수행되는 것이 선호되나 이에 한정되는 것은 아니다.According to one aspect of the present invention, the fluorocarbon thin film may be prepared by performing at least one reactive sputtering process to implement desired water and oil repellent properties. In addition, the present invention can be prepared by appropriately adjusting the components of the fluorine-based polymer composite target and their content and the type and flow rate of the reaction gas in various embodiments according to various purposes or functions in the reactive sputtering process. In addition, the present invention significantly improves the process convenience, and the reactive sputtering process is preferably performed by the MF or DC power source for the purpose of more improved sputtering efficiency, but is not limited thereto.
본 발명에 따른 발수 발유 특성을 만족하는 탄화불소 박막의 제조방법은 도전성을 가지는 기능화제를 포함하는 불소계고분자 복합타겟을 이용함으로써, 출력 전압에 상관없이 증착될 수 있다는 측면에서, 종래 RF(Radio Frequency) 등과 같이 고 에너지를 반드시 필요로 하였던 불소계고분자 타겟을 이용한 제조방법과 차별화된다. The method of manufacturing a fluorocarbon thin film satisfying the water / oil repellent property according to the present invention is conventional RF (Radio Frequency) in terms of being deposited regardless of the output voltage by using a fluorine-based polymer composite target containing a functionalizing agent having conductivity It is differentiated from the manufacturing method using the fluorine-based polymer target that required high energy.
본 발명의 일 양태에 따른 상기 반응 가스는 산소(O2), 오존(O3), 과산화수소(H2O2), 암모니아(NH3), 아산화질소(N2O), 일산화질소(NO), 이산화질소(NO2), 질소(N2), 사불화탄소(CF4) 및 하이드라진(N2H4) 등에서 선택되는 하나 이상일 수 있으며 이 기술분야에 사용하는 것이라면 제한하지 않는다. 보다 낮은 표면 에너지 값을 가지고 우수한 시인성을 가지기 위한 측면에서 산소(O2), 오존(O3), 아산화질소(N2O), 질소(N2) 등에서 선택되는 하나 이상의 반응 가스를 주입하는 것이 좋다. The reaction gas according to an aspect of the present invention is oxygen (O 2 ), ozone (O 3 ), hydrogen peroxide (H 2 O 2 ), ammonia (NH 3 ), nitrous oxide (N 2 O), nitrogen monoxide (NO) , Nitrogen dioxide (NO 2 ), nitrogen (N 2 ), carbon tetrafluoride (CF 4 ) and hydrazine (N 2 H 4 ) and the like may be one or more selected from those used in the art are not limited. In order to have a lower surface energy value and excellent visibility, injecting one or more reactive gases selected from oxygen (O 2 ), ozone (O 3 ), nitrous oxide (N 2 O), nitrogen (N 2 ), etc. good.
또한, 본 발명에 따른 공정 가스는 불활성기체라면 제한되지 않으나, 이의 비한정적인 일예로는 아르곤(Ar), 헬륨(He), 질소(N2) 및 네온(Ne) 등에서 선택되는 하나 이상의 공정 가스와 함께 주입되는 것이 바람직하다. 상기 공정 가스와 반응 가스는 1:1 내지 1000:1 범위의 혼합비(공정 가스: 반응 가스, 유량단위 기준)로 주입될 수 있으며, 바람직하게는 1:1 내지 100:1, 보다 바람직하게는 1:1 내지 20:1 범위의 혼합비로 혼합될 수 있으나 목적하는 발수성, 발유성, 가시광선 투과율, 색도 등의 물성을 조절하기 위해 다양한 양태로 변형될 수 있음은 물론이다. In addition, the process gas according to the present invention is not limited as long as it is an inert gas, but non-limiting examples thereof include one or more process gases selected from argon (Ar), helium (He), nitrogen (N 2 ), neon (Ne), and the like. It is preferred to be injected with. The process gas and the reaction gas may be injected in a mixing ratio (process gas: reaction gas, based on the flow rate unit) in the range of 1: 1 to 1000: 1, preferably 1: 1 to 100: 1, more preferably 1 It may be mixed in a mixing ratio of 1: 1 to 20: 1, but may be modified in various embodiments to control physical properties such as water repellency, oil repellency, visible light transmittance, and chromaticity.
이에 더불어, 본 발명의 일 양태에 따른 탄화불소 박막의 제조방법은 성막된 탄화불소 박막에 표면처리 가스를 주입하여, 이온 플라즈마를 이용하여 탄화불소 박막의 표면을 처리하는 단계를 더 수행할 수 있다. 상술한 표면처리 단계를 더 포함함으로써, 본 발명의 일 양태에 따른 탄화불소 박막의 제조방법에 따라 용이하게 목적하는 접촉각, 가시광선 투과율, 색도 등이 조절되는 탄화불소 박막을 제공할 수 있다. 즉, 본 발명의 일 양태에 따른 표면처리 단계를 더 포함하여, 안정적으로 탄화불소 박막의 광학특성을 유지하면서도 향상된 내구성의 구현이 가능할 뿐 아니라 용이하게 표면 에너지 값을 조절할 수 있는 유연성 투명 탄화불소 박막을 제공할 수 있다. In addition, the method for manufacturing a fluorocarbon thin film according to an embodiment of the present invention may further perform the step of treating the surface of the fluorocarbon thin film by using an ion plasma by injecting a surface treatment gas into the formed fluorocarbon thin film. . By further including the above-described surface treatment step, it is possible to provide a fluorocarbon thin film in which the desired contact angle, visible light transmittance, chromaticity and the like can be easily adjusted according to the method for producing a fluorocarbon thin film according to an aspect of the present invention. That is, further comprising a surface treatment step according to an aspect of the present invention, while maintaining the optical properties of the fluorocarbon thin film stably, it is possible to implement the improved durability and flexible transparent fluorocarbon thin film that can easily adjust the surface energy value Can be provided.
상기 표면처리 가스는 아르곤, 질소, 산소, 사불화탄소(CF4) 및 수소 등에서 선택되는 하나 이상일 수 있으며, 보다 낮은 표면 에너지 값을 가지고 우수한 시인성을 가지기 위한 측면에서 아르곤과 산소가 혼합된 반응 가스를 주입하는 것이 좋다.The surface treatment gas may be at least one selected from argon, nitrogen, oxygen, carbon tetrafluoride (CF 4 ), hydrogen, and the like, and a reaction gas in which argon and oxygen are mixed in view of having a lower surface energy value and excellent visibility. It is good to inject.
또한 본 발명의 일 양태에 따르면, 성막된 탄화불소 박막의 표면 특성(일예로서, 발수 및 발유) 및 표면의 광학 특성 등을 적절하게 조절할 수 있을 뿐 아니라 탄화불소 박막의 강도, 내화학성 및 대기 중에 노출시에 나타나는 에이징(aging) 현상 등을 현저하게 개선할 수 있다. In addition, according to an aspect of the present invention, the surface characteristics (for example, water repellent and oil repellent) and the optical properties of the surface of the formed fluorocarbon thin film can be appropriately adjusted, and the strength, chemical resistance, and the atmosphere of the fluorocarbon thin film The aging phenomenon which appears at the time of exposure, etc. can be remarkably improved.
이때, 상기 표면처리 가스의 유량은 제한 하지 않지만 1 내지 1000 sccm의 유량으로 주입되어 상술한 효과를 극대화 할 수 있으며, 바람직하게는 5 내지 800 sccm의 유량으로 주입될 수 있으며, 보다 바람직하게는 10 내지 500 sccm의 유량으로 주입되는 것이 좋지만 이에 한정하는 것은 아니다.At this time, the flow rate of the surface treatment gas is not limited, but may be injected at a flow rate of 1 to 1000 sccm to maximize the above-described effects, preferably may be injected at a flow rate of 5 to 800 sccm, more preferably 10 Injected at a flow rate of 500 sccm, but is not limited thereto.
본 발명의 일 양태에 따른 탄화불소 박막의 제조방법에 있어, 상기 스퍼터링은 0.1 내지 15 W/㎠ 의 파워로 플라즈마를 형성하여 수행될 수 있으며, 바람직하게는 0.3 내지 10 W/㎠ 의 파워, 보다 바람직하게는 0.5 내지 5.0 W/㎠ 의 파워에서 수행되는 것이 좋다. In the method for producing a fluorocarbon thin film according to an aspect of the present invention, the sputtering may be performed by forming a plasma with a power of 0.1 to 15 W / ㎠, preferably a power of 0.3 to 10 W / ㎠, more Preferably it is carried out at a power of 0.5 to 5.0 W / ㎠.
본 발명의 일 양태에 따른 불소계고분자 복합 타겟은 금속유기물, 금속산화물, 금속탄소체, 금속수산화물, 금속카보네이트, 금속바이카보네이트, 금속질화물 및 금속불화물에서 선택되는 하나 이상의 금속화합물을 더 포함함으로써, 성막된 탄화불소 박막에 다양한 기능성을 부여할 수 있다. 이때, 상기 금속화합물의 비한정적인 일예로는 SiO2, Al2O3, ITO, IGZO, ZnO, In2O3, SnO2, TiO2, AZO, ATO, SrTiO3, CeO2, MgO, NiO, CaO, ZrO2, Y2O3, Al2O3 , MgF2, CuF2, Si3N4, CuN, Nb2O5, V2O5 및 AlN 등에서 선택되는 것 일 수 있으며, 형성된 박막의 광학 특성 및 강도 특성을 향상시키기 위한 측면에서 SiO2, Al2O3, ITO, Nb2O5, V2O5 등에서 선택되는 것이 좋다.The fluorine-based polymer composite target according to an aspect of the present invention further includes at least one metal compound selected from metal organic matter, metal oxide, metal carbon body, metal hydroxide, metal carbonate, metal bicarbonate, metal nitride and metal fluoride, thereby forming a film. Various functionalities can be imparted to the fluorocarbon thin film. At this time, non-limiting examples of the metal compound is SiO 2 , Al 2 O 3 , ITO, IGZO, ZnO, In 2 O 3 , SnO 2 , TiO 2 , AZO, ATO, SrTiO 3 , CeO 2 , MgO, NiO , CaO, ZrO 2 , Y 2 O 3 , Al 2 O 3 , MgF 2 , CuF 2 , Si 3 N 4 , CuN, Nb 2 O 5 , V 2 O 5 And AlN may be selected from, and the like formed thin film SiO 2 , Al 2 O 3 , ITO, Nb 2 O 5 , V 2 O 5 It is good to be selected from such.
또한, 본 발명은 낮은 에너지에서 스퍼터링이 가능한 탄화불소 박막의 제조방법에 적합한 연속적인 롤투롤 방식의 스퍼터링 증착 시스템을 제공한다(도 1 참조). In addition, the present invention provides a continuous roll-to-roll sputtering deposition system suitable for a method for producing a fluorocarbon thin film capable of sputtering at low energy (see FIG. 1).
본 발명의 일 양태에 따른 롤투롤 방식의 스퍼터링 증착 시스템은 언와인더 챔버(unwinder chamber, 100), 상기 기재의 일면에 탄화불소 박막을 증착하는 메인 챔버(main chamber, 200) 및 증착된 탄화불소 박막을 권취하는 와인더 챔버(winder chamber, 300)를 포함할 수 있으며, 이는 MF나 DC와 같은 낮은 에너지대에서도 우수한 증착율을 구현할 수 있으며, 제조 공정에서의 단순성을 확보하면서, 연속적인 롤투롤 공정으로도 디펙트 없이 신속하게 대면적의 탄화불소 박막을 형성할 수 있다.Roll-to-roll sputtering deposition system according to an aspect of the present invention is an unwinder chamber (100), the main chamber (200) for depositing a fluorocarbon thin film on one surface of the substrate and the deposited fluorine carbide Winder chamber (300) for winding a thin film may be included, which can realize excellent deposition rate even in low energy bands such as MF or DC, and continuous roll-to-roll process, while ensuring simplicity in the manufacturing process In addition, it is possible to quickly form a large-area fluorocarbon thin film without defects.
본 발명의 일 양태에 따른 상기 메인 챔버에는 3개의 MF 듀얼 스퍼터링 캐소드(202, 203, 204)와 1개의 DC 싱글 스퍼터링 캐소드(205)를 포함한다. 이와 같은 구성으로 인해, MF 및 DC 스퍼터링이 동시에 수행될 수 있을 뿐 아니라 다양한 종류의 타겟의 적용으로 복합소재의 증착이 가능하다는 장점을 가질 수 있다.The main chamber according to one aspect of the invention comprises three MF dual sputtering cathodes 202, 203, 204 and one DC single sputtering cathode 205. Due to this configuration, not only MF and DC sputtering can be performed at the same time but also have the advantage that the deposition of the composite material is possible by applying various kinds of targets.
또한, 상기 와인더 챔버에는 저항 측정기(resistance meter, 301), 투과율 분석기(transmittance analyzer, 302) 및 반사율 측정기(reflectance meter, 303)를 포함하여, 상기 롤투롤 방식의 스퍼터링 증착 시스템으로부터 제조된 탄화불소 박막의 특성을 간편하게 원스톱으로 수행할 수 있다. In addition, the winder chamber includes a resistance meter (301), a transmittance analyzer (302) and a reflectance meter (reflectance meter, 303), fluorocarbon manufactured from the roll-to-roll type sputtering deposition system The properties of the thin film can be conveniently performed in one stop.
본 발명의 일 양태에 따른 기재는 상기 롤투롤 방식의 스퍼터링 증착 시스템에 적용시 제한되지는 않으나 0.1 m/min 내지 20 m/min의 속도로 이송되며, 바람직하게는 0.5 m/min 내지 5 m/min의 속도로 이송되는 것이 좋다.The substrate according to an aspect of the present invention is not limited to the roll-to-roll sputtering deposition system but is transported at a speed of 0.1 m / min to 20 m / min, preferably 0.5 m / min to 5 m / It is good to feed at min speed.
본 발명에 따르면 소수성의 특성 및 절연 특성을 가짐에 따라 RF의 고주파 에너지가 반드시 수반되어야만 했던 종래의 탄화불소 박막의 제조방법에서의 문제점인 낮은 증착율과 상당히 높은 불량률 등을 해결함으로써, 향상된 생산성과 함께 상업적으로 유용한 MF 또는 DC 스퍼터링을 이용하여 경제적으로 고품질의 탄화불소 박막을 제공할 수 있다.According to the present invention, the low deposition rate and the considerably high defect rate, which are problems in the conventional method of manufacturing a fluorine carbide thin film, which had to be accompanied by high frequency energy of RF as having hydrophobic and insulating properties, are solved, thereby improving productivity. Commercially available MF or DC sputtering can be used to provide economically high quality fluorocarbon thin films.
또한, 본 발명은 기재 상에 도전성을 가지는 기능화제를 포함하는 불소계고분자 복합타겟을 이용하여 스퍼터링하여 형성된 성형체, 즉 탄화불소 박막을 제공한다. 본 발명에 따른 탄화불소 박막은 도전성이 부여된 불소계고분자 타겟을 이용함에 따라 보다 낮은 전압으로도 우수한 증착율로 증착될 수 있으며, 나노 수준의 박막 형성이 가능하면서 소수성의 표면 특성을 그대로 유지할 수 있을 뿐 아니라 기재와의 밀착력 역시 우수하다. In addition, the present invention provides a molded article, ie, a fluorocarbon thin film formed by sputtering using a fluorine-based polymer composite target containing a conductive agent having conductivity on a substrate. The fluorocarbon thin film according to the present invention can be deposited with excellent deposition rate even at a lower voltage by using a conductive fluorine-based polymer target, and it is possible to form nano-level thin films while maintaining the hydrophobic surface property as it is. In addition, the adhesion to the substrate is also excellent.
본 발명의 일 양태에 따른 탄화불소 박막은 수분과의 접촉각은 90 내지 150 °범위일 수 있으며, 바람직하게는 110 내지 150 °, 보다 바람직하게는 140 °이상의 접촉각을 가져 초발수 특성의 구현이 가능하다.In the fluorocarbon thin film according to the aspect of the present invention, the contact angle with moisture may be in the range of 90 to 150 °, preferably 110 to 150 °, more preferably 140 ° or more, so that super water-repellent characteristics can be realized. Do.
또한, 본 발명의 일 양태에 따른 탄화불소 박막의 두께는 제한되지는 않으나 5 nm 내지 1 ㎛ 두께로 증착될 수 있으며, 수분에 대한 보다 낮은 투과율과 상숭된 수분과의 접촉각을 구현하기 위한 측면에서 바람직하게는 10 nm 내지 200 nm 두께로 증착될 수 있다.In addition, the thickness of the fluorocarbon thin film according to an aspect of the present invention is not limited, but may be deposited with a thickness of 5 nm to 1 μm, and in terms of achieving a lower transmittance for moisture and a contact angle with respected moisture. Preferably it can be deposited to a thickness of 10 nm to 200 nm.
이하, 본 발명의 일 양태에 따른 성형체의 일예는 하기와 같이 예시될 수 있으나 이에 한정되는 것은 아니다.Hereinafter, an example of a molded article according to an aspect of the present invention may be exemplified as follows, but is not limited thereto.
본 발명의 일 양태에 따르면, 섬유직물 표면상에 도전성을 가지는 기능화제를 포함하는 불소계고분자 복합타겟을 이용하여 스퍼터링 되어, 우수한 소수 특성, 난연 특성, 방염 특성, 자가-세정 특성 및 발수 특성, 기계적 특성, 항균 특성, 전자기 차폐 특성 등의 특수 기능이 부여된 고기능의 초발수 코팅섬유를 제공할 수 있다. According to one aspect of the present invention, sputtered using a fluorine-based polymer composite target containing a functionalizing agent on the surface of the textile fabric, excellent hydrophobic properties, flame retardant properties, flame-retardant properties, self-cleaning properties and water repellent properties, mechanical It is possible to provide a highly functional super water-repellent coated fiber to which special functions such as properties, antibacterial properties and electromagnetic shielding properties are given.
이는 유기용매 등의 유해 화학 물질의 사용없이 단일공정으로 섬유직물 표면에 탄화불소 박막을 직접적으로 코팅하여 발수 가공을 함으로써, 생산성을 극대화 할 수 있고, 공정상에서 발생될 수 있는 오염물의 생성을 최소화 할 수 있다. 또한, 본 발명에 따른 초발수 코팅섬유는 상술된 불소계고분자 복합 타겟을 이용하여 탄화불소 박막을 증착하는 단계에 앞서, 금속 타겟, 금속산화물 타겟 또는 금속질화물 타겟을 이용한 무기층을 도입함으로써, 섬유직물과 발수제층 사이의 부착력을 극대화하여 여러번의 세탁시에도 초발수 특성을 유지할 수 있다. 이때, 상기 무기층은 섬유 기재상에 우선적으로 형성되거나 상기 무기층 및 탄화불소 박막층을 순차적으로 형성할 수 있음은 물론이다.It can maximize productivity and minimize the generation of contaminants that can be generated in the process by directly coating the fluorocarbon thin film on the surface of the textile fabric in a single process without the use of harmful chemicals such as organic solvents. Can be. In addition, the super water-repellent coating fibers according to the present invention, by introducing an inorganic layer using a metal target, a metal oxide target or a metal nitride target, prior to the step of depositing a fluorocarbon thin film using the fluorine-based polymer composite target described above, By maximizing the adhesion between and the water repellent layer can maintain the super water-repellent properties even during multiple washing. In this case, the inorganic layer may be formed preferentially on the fiber substrate or may sequentially form the inorganic layer and the fluorocarbon thin film layer.
본 발명의 일 양태에 따른 상기 초발수 코팅섬유은 무기층을 형성하는 단계 및 유기층(탄화불소 박막)을 형성하는 단계를 순차적으로 2회 이상 반복하여 형성됨으로써, 열화 또는 충격, 세탁 등에 의한 섬유직물로부터 탈리되는 현상을 현저하게 줄일 수 있다. The super water-repellent coating fibers according to an aspect of the present invention is formed by repeatedly repeating the step of forming an inorganic layer and the step of forming an organic layer (fluorine carbide thin film) two or more times, from the textile fabric by deterioration or impact, washing, etc. Desorption can be significantly reduced.
또한, 본 발명은 상기 제조방법으로 제조되는 다기능의 초발수 코팅섬유를 제공한다. 이에 한정되는 것은 아니나 바람직하게, 본 발명에 따른 초발수 코팅섬유는 유기층에 포함된 총 원자량을 100 중량%로 기준, 금속원자의 원자량비가 0.01 내지 50 중량%로 포함될 수 있다. 또한, 상기 초발수 코팅섬유의 유기층은 전도성을 가지는 기능화제와 함께 금속화합물을 더 포함함으로써, 전기전도성, 방열, 보온, 방오, 방염, 항균, 전자기 차폐 특성 및 향상된 외관 등의 다양한 기능성의 부여가 가능하여 다양한 타입의 섬유직물을 제공할 수 있다. 비한정적인 일예로, 상기 발수제층은 정전기 발생을 효과적으로 억제하기 위한 측면에서 Al2O3 등의 금속화합물이 포함될 수 있으며, 우수한 항균특성을 부여하기 위해 Ag 등의 금속성분이 포함될 수 있으나 이에 한정되는 것은 아니다.In addition, the present invention provides a multifunctional super water-repellent coated fiber produced by the above production method. Preferably, but not limited to, the super water-repellent coating fibers according to the present invention may be included in the atomic weight ratio of the metal atoms of 0.01 to 50% by weight, based on 100% by weight of the total atomic weight contained in the organic layer. In addition, the organic layer of the super water-repellent coating fiber further includes a metal compound with a functionalizing agent having conductivity, thereby providing various functionalities such as electrical conductivity, heat dissipation, thermal insulation, antifouling, flame retardant, antibacterial, electromagnetic shielding properties and improved appearance. It is possible to provide various types of textile fabrics. As a non-limiting example, the water repellent layer is Al 2 O 3 in terms of effectively suppressing the generation of static electricity Metal compounds such as, and the like, may include metal components such as Ag in order to give excellent antimicrobial properties, but is not limited thereto.
또한, 본 발명에 따른 초발수 코팅섬유의 일 양태에 따른 기재의 일예인, 상기 섬유직물은 폴리비닐알콜, 폴리아크릴로니트릴, 나일론, 폴리에스테르, 폴리우레탄, 폴리염화비닐, 폴리스티렌, 셀룰로우즈, 키토산, 실크, 면사, 폴리락틱산, 폴리락틱-co-글리콜산, 폴리글리콜산 폴리카프로락톤, 콜라겐, 폴리피롤, 폴리아닐린 및 폴리(스티렌-co-무수말레산) 등에서 선택되는 하나 이상의 원사로 제작된 것일 수 있지만 종래의 섬유로 제조할 수 있는 것이라면 제한하지 않는다. In addition, the fiber fabric, which is one example of the substrate according to one aspect of the superhydrophobic coated fiber according to the present invention, polyvinyl alcohol, polyacrylonitrile, nylon, polyester, polyurethane, polyvinyl chloride, polystyrene, cellulose , Chitosan, silk, cotton yarn, polylactic acid, polylactic-co-glycolic acid, polyglycolic acid polycaprolactone, collagen, polypyrrole, polyaniline and poly (styrene-co-maleic anhydride) It may be made, but if it can be produced with conventional fibers are not limited.
또한, 본 발명의 일 양태에 따르면 기재(substrate)로서는 천연피역; 직물; 편물; 부직포; 인조피혁이나 비교적 단순한 조직 형태를 가지는 섬유기포에 PU, PVC 등의 수지를 부가하여 합성된 인조 피역 등의 피역 소재; 등을 제한 없이 적용가능하다. 상기 기재에 적용함으로써, 기재를 이루는 소재 본연의 장점은 그대로 가지며, 내약품성(세제, 락스, 소독제 등)을 겸비하고, 발수 특성과 방오 특성을 극대화할 수 있다. 또한 폴리아미드 멀티필라멘트, 유리섬유 또는 탄소섬유 등과 같은 고강도 원사로 제작된 고강도 직물 등에 적용하여 초기 발수성은 물론 마찰후의 발수성 또한 향상시킬 수 있고, 발수처리 중 발생되는 섬유직물의 주름을 효과적으로 방지시킬 수 있다. In addition, according to one aspect of the present invention (substrate) as a natural skin; textile; knitting; Non-woven; Skin material such as artificial skin synthesized by adding a resin such as PU or PVC to an artificial leather or a fiber bubble having a relatively simple tissue form; And the like can be applied without limitation. By applying to the base material, the original material of the base material has the same as it is, combines chemical resistance (detergent, lax, disinfectant, etc.), it is possible to maximize the water repellent properties and antifouling properties. In addition, it can be applied to high-strength fabric made of high strength yarn such as polyamide multifilament, glass fiber or carbon fiber to improve initial water repellency as well as water repellency after friction, and effectively prevent wrinkles of textile fabrics generated during water repellent treatment. have.
이때, 상기 원사의 지름 및 길이에 대한 특별한 제한은 없으나, 상기 지름은 1 내지 100 ㎛ 사이, 바람직하게는 5 내지 20 ㎛ 사이인 것일 수 있고, 상기 길이는 통상적으로 500 ㎛ 내지 10 ㎝, 특히 1000 ㎛ 내지 5 ㎝ 사이인 것 일 수 있다. At this time, there is no particular limitation on the diameter and length of the yarn, but the diameter may be between 1 and 100 μm, preferably between 5 and 20 μm, and the length is usually between 500 μm and 10 cm, in particular 1000 It may be between μm and 5 cm.
본 발명에 따르면 섬유 표면에 나노크기의 두께로 균일한 스퍼터링이 가능하고, 단일 공정을 통해 섬유직물의 종류에 관계없이 섬유직물 표면을 초발수성을 가지도록 개질할 수 있으며, 섬유직물에 대한 부착력을 획기적으로 향상시켜 초발수성을 세탁 유무와 관계없이 오랜 시간동안 유지시킬 수 있다는 장점을 가진다.According to the present invention, uniform sputtering of nano-sized thickness is possible on the fiber surface, and the surface of the fiber fabric can be modified to have super water repellency regardless of the type of the fiber fabric through a single process, and the adhesion to the fiber fabric is improved. Significantly improved super water repellency can be maintained for a long time with or without washing.
또한, 본 발명은 다양한 금속이나 세라믹 등을 더 포함하는 불소계고분자 복합 타겟을 이용함으로써, 초발수 특성 뿐 아니라 방오성, 항균성, 소취성, 방염성, 전자기 차폐성 등을 특수 기능을 가지는 고기능성 코팅섬유를 제공할 수 있다. In addition, the present invention provides a highly functional coating fiber having a special function of antifouling, antibacterial, deodorant, flame retardant, electromagnetic shielding, etc. as well as super water repellent properties by using a fluorine-based polymer composite target further comprising a variety of metals and ceramics, etc. can do.
이때, 상기 세라믹은 제한되지는 않으나 원적외선을 방사하는 페그마타이트(pegmatite), 벤토나이트(bentonite) 등의 세라믹 미립자 일 수 있다. 상기 미립자는 바람직하게는 0.01 내지 10 ㎛의 평균직경을 가지는 것일 수 있으며, 보다 바람직하게는 0.01 내지 3 ㎛인 것이 좋다. 상기 페그마타이트는 일반적으로는 정장석, 미사장석, 퍼다이트, 앨바이트 등이 석영과 문상(文象) 구조를 이루는 암석으로 흑운모 석류석 주석석 컬럼바이트, 퍼거소나이트, 형석, 전기석, 스포듀민, 황옥, 탄탈석등 원적외선을 방출하는 여러 광물의 구성된 암석이며, 상기 벤토나이트(bentonite)는 운모와 같은 결정구조를 하는 단사정계에 속하는 광물인 몬모릴로나이트가 주로 들어있는 점토로 원적외선을 방출하는 석영, 장석, 제올라이트 등이 포함된 것일 수 있다.In this case, the ceramic is not limited, but may be ceramic fine particles such as pegmatite and bentonite that emit far infrared rays. Preferably, the fine particles may have an average diameter of 0.01 to 10 μm, more preferably 0.01 to 3 μm. The pegmatite is a rock in which a bitumen, a silly stone, a padite, an albite, and the like form a quartz and a cultured structure, and biotite garnet tin stone column bite, fergusonite, fluorite, tourmaline, spodumene, topaz, It is a rock composed of various minerals emitting far infrared rays such as tantalum, and the bentonite is clay containing montmorillonite, a mineral belonging to a monoclinic system having a mica-like crystal structure, and quartz, feldspar, zeolite, etc. It may be included.
본 발명의 또 다른 일 양태에 따르면, 도전성을 가지는 기능화제, 특히 카본나노입자를 포함하는 불소계고분자 복합타겟을 이용하여 플랙서블 기재 상에 적용함으로써, 고경도 투명 하드코팅막을 제공할 수 있다. According to still another aspect of the present invention, a high hardness transparent hard coat film can be provided by applying a conductive functional agent, particularly a fluorine-based polymer composite target containing carbon nanoparticles, onto a flexible substrate.
일반적으로 불소계고분자를 스퍼터링하여 기재에 증착할 경우, 투명하고 유연한 발수성의 탄화불소 박막의 제조가 가능함에도 불구하고, 표면경도가 200MPa 정도로 낮아 액정표시장치 등의 표면에 적용시 외부의 환경에 의해 쉽게 마모되는 등의 문제점을 가진다. 본 발명에 따른 투명 하드코팅막은 C-C 결합구조 및 유무기 복합구조가 다수 존재하여, 현저하게 향상된 경도 및 탄성 특성(모듈러스)을 부여하여 상술한 문제점을 해결 할 수 있다. Generally, when sputtering fluorine-based polymers and depositing them on a substrate, despite the possibility of producing a transparent and flexible water-repellent fluorocarbon thin film, the surface hardness is about 200 MPa so that when applied to the surface of a liquid crystal display device or the like, it is easily affected by the external environment. Wear and the like. The transparent hard coat film according to the present invention has a large number of C-C bonding structure and organic-inorganic composite structure, it is possible to solve the above problems by giving a significantly improved hardness and elastic properties (modulus).
본 발명의 일 양태에 따른 투명 하드코팅막은 우수한 시안성을 가짐과 동시에 향상된 내구성 및 기재에 대한 우수한 접합성으로 현재 상용화되고 있는 플랙서블 액정표시장치를 비롯하여 접거나 구부리는 형태의 표시장치 등에 효과적으로 적용될 수 있다. The transparent hard coat layer according to an aspect of the present invention may be effectively applied to a flexible liquid crystal display and a folding or bent display device, which are currently commercialized for having excellent cyanity and improved durability and excellent adhesion to a substrate. have.
특히, 본 발명에 따른 투명 하드 코팅막은 보다 향상된 경도 및 탄성 특성을 구현하기 위해, 불소계고분자와 카본나노입자를 포함하는 불소계고분자 복합 타겟을 이용하여 스퍼터링되는 것이 우선되며, 추가적으로 전도성 고분자, 금속성분 및 금속화합물 등에서 선택되는 하나 이상의 기능화제를 더 포함한 일 양태 또한 본 발명에 포함되는 것은 물론이다. In particular, the transparent hard coating film according to the present invention is sputtered using a fluorine-based polymer composite target containing fluorine-based polymers and carbon nanoparticles, in order to realize more improved hardness and elastic properties, and furthermore, conductive polymers, metal components and One embodiment further including at least one functionalizing agent selected from metal compounds and the like is also of course included in the present invention.
이때, 상술된 투명 하드코팅막의 광투과도(550nm)는 90%이상으로 고투명성을 가지는 것을 특징으로 하며, 바람직하게는 90 내지 99%, 보다 바람직하게는 91 내지 98%의 광투과도를 가지는 것일 수 있다. 또한, 본 발명에 따른 투명 하드코팅막의 경도는 제한되지는 않으나 바람직하게 1.0 내지 10.0 GPa 범위의 고경도 특성을 가지는 것을 우선하나 목적에 따라 다양한 경도 특성을 가지는 하드코팅막으로의 구현이 가능하다.At this time, the light transmittance (550 nm) of the above-mentioned transparent hard coat film is characterized in that it has a high transparency of 90% or more, preferably 90 to 99%, more preferably 91 to 98% may have a light transmittance. have. In addition, the hardness of the transparent hard coating film according to the present invention is not limited, but preferably has a high hardness characteristics in the range of 1.0 to 10.0 GPa, but may be implemented as a hard coating film having various hardness characteristics according to the purpose.
또한 본 발명의 하드코팅막은 지속적 또는 반복적으로 구부리거나 접더라도 하드코팅막의 균열이나 박리 현상을 효과적으로 억제함으로써, 이를 채용한 플랙서블 액정표시장치에 우수한 내구성 및 신뢰성을 부여할 수 있다.In addition, even if the hard coating film of the present invention bends or folds continuously or repeatedly, the hard coating film effectively suppresses cracking or peeling of the hard coating film, thereby providing excellent durability and reliability to the flexible liquid crystal display device employing the same.
본 발명의 또 다른 일 양태에 따르면, 고품질의 발수 발유 코팅막을 제공한다. 상기 발수 발유 코팅막은 기재 상에 도전성을 가지는 기능화제를 포함하는 불소계고분자 복합타겟을 이용하여, 반응가스 주입하에서 반응성 스퍼터링 공정을 수행하여 제조될 수 있다. 이는, 보다 낮은 전압으로도 우수한 증착율로 증착 가능할 뿐 아니라 나노 수준의 막 형성이 가능하면서 소수성의 표면 특성을 그대로 유지할 수 있을 뿐 아니라 향상된 발유성을 동시에 가질 수 있으며, 기재와의 밀착력 역시 우수하다는 특성을 가진다. According to another aspect of the present invention, a high quality water and oil repellent coating film is provided. The water / oil repellent coating film may be prepared by performing a reactive sputtering process under injection of a reaction gas using a fluorine-based polymer composite target including a functionalizing agent having conductivity on a substrate. It is not only capable of depositing at an excellent deposition rate even at a lower voltage, but also capable of forming nanoscale films, maintaining hydrophobic surface properties as well as having improved oil repellency, and having excellent adhesion to substrates. Has
즉, 본 발명에 따른 발수 발유 코팅막은 평판 디스플레이 패널이나 터치 스크린 등의 디스플레이 장치 표면의 최외각층에 증착되어 오염물 부착 방지 및 오염물 부착시 오염물의 제거를 용이하게 하고, 표면 개질성이 우수하여 다양한 용도로의 활용이 기대된다. 이에 더불어, 본 발명에 따른 발수 발유 코팅막은 높은 투명성으로 인해 표면 보호용 필름 등으로 적용 가능성이 높으며, 낮은 굴절률로 인해 반사방지 필름 등으로의 적용이 가능하여 다양한 디스플레이 장치에 적용 가능하다.That is, the water / oil repellent coating film according to the present invention is deposited on the outermost layer of the surface of a display device such as a flat panel display panel or a touch screen, thereby preventing contaminant adhesion and removing contaminants when attaching contaminants, and having excellent surface modification properties. Utilization of furnace is expected. In addition, the water- and oil-repellent coating film according to the present invention is highly applicable to a surface protection film due to high transparency, and can be applied to various display devices due to its low refractive index.
본 발명의 일 양태에 따른 발수 발유 코팅막은 물과의 접촉각이 100 내지 150°범위를 가져 우수한 발수성을 가질 뿐 아니라 헥사데칸과의 접촉각이 50°내지 70°으로 종래 100% PTFE가 증착된 탄화불소 박막(35°) 대비 현저하게 향상된 발유성을 가지는 것을 특징으로 한다.The water and oil repellent coating film according to one aspect of the present invention has a contact angle with water in a range of 100 to 150 ° and has excellent water repellency, as well as a contact angle with hexadecane of 50 ° to 70 °. It is characterized by having a significantly improved oil repellency compared to the thin film (35 °).
이하, 본 발명을 하기 실시예에 의해 더욱 구체적으로 설명한다. 그러나 이들 실시예는 본 발명에 대한 이해를 돕기 위한 것일 뿐, 어떤 의미로든 본 발명의 범위가 이들에 의해 제한되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to the following examples. However, these examples are only for the understanding of the present invention, and the scope of the present invention in any sense is not limited thereto.
또한 본 발명에 따른 탄화불소 박막의 물성을 확인하기 위하여, 접촉각, 박막 두께, 표면특성 및 광투과율을 하기와 같은 방법으로 측정하였으며, 그 결과를 하기 표 1 내지 표 5에 나타내었다.In addition, in order to confirm the physical properties of the fluorocarbon thin film according to the present invention, the contact angle, the thickness of the thin film, the surface characteristics and the light transmittance were measured by the following method, and the results are shown in Tables 1 to 5 below.
1. 접촉각 측정1. Contact angle measurement
완성된 탄화불소 박막의 수접촉각 또는 헥사데칸 접촉각을 접촉각 측정기(PHOEIX 300 TOUCH, SEO 사)를 사용하여 측정하였다.The water contact angle or hexadecane contact angle of the completed fluorocarbon thin film was measured using a contact angle measuring instrument (PHOEIX 300 TOUCH, SEO).
2. 박막 두께 측정2. Thin Film Thickness Measurement
완성된 탄화불소 박막의 두께를 측정하기 위해 기재를 절단하여 단면을 FE-SEM (Field Effect - Scanning Electron Microscope, Philips XL30S FEG) 장치를 이용하여 측정하였다. In order to measure the thickness of the finished fluorocarbon thin film, the substrate was cut and the cross section was measured using a FE-SEM (Field Effect-Scanning Electron Microscope, Philips XL30S FEG) apparatus.
3. 표면특성 측정3. Measurement of surface properties
완성된 탄화불소 박막의 표면특성을 측정하기 위하여, 나노인덴터테이션법(MTS Systems Corp제 Nanoindenter Xp)에 의해 하중을 0~4 mN으로 증가하면서 압입깊이에 따른 표면 경도 특성을 측정하였다. 각 샘플별로 15회 실험을 실시하여 압입깊이에 따른 표면 경도의 평균 및 표준편차를 계산하여 사용하였다. 또한, 동일한 방법에 의해 탄성 특성을 측정하였다. In order to measure the surface characteristics of the finished fluorocarbon thin film, the surface hardness characteristics of the indentation depth were measured by increasing the load to 0 to 4 mN by the nanoindentation method (Nanoindenter Xp manufactured by MTS Systems Corp.). 15 experiments were conducted for each sample to calculate the average and standard deviation of the surface hardness according to the indentation depth. In addition, elastic properties were measured by the same method.
4. 광투과율 측정4. Light transmittance measurement
완성된 탄화불소 박막의 광투과율을 측정하기 위하여, 분광 광도계(히타치 제작소 제조, U-4100형)를 사용하여 파장 300~700 ㎚ 영역의 광투과율을 측정한 후 파장 550 ㎚에 있어서의 광투과율을 측정하였다.In order to measure the light transmittance of the completed fluorocarbon thin film, the light transmittance at a wavelength of 550 nm was measured after measuring the light transmittance in the wavelength range of 300 to 700 nm using a spectrophotometer (Hitachi Co., U-4100 type). Measured.
(실시예 1)(Example 1)
PET 필름(SKC, SH-40, 두께 100㎛, 폭 600 mm)에 롤투롤 스퍼터 (ULVAC, SPW-060)장치(도 1 참조)를 이용하여 탄화불소 박막을 제작하였다.A fluorocarbon thin film was produced on a PET film (SKC, SH-40, thickness 100 μm, width 600 mm) using a roll-to-roll sputter (ULVAC, SPW-060) apparatus (see FIG. 1).
불소계고분자 복합 타겟(길이 950 mm, 폭 127 mm, 두께 6 mm)은 사각 판형으로 제작되었다. 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 90 wt%, 탄소나노튜브(평균입경 30nm) 10 wt%가 함유된 불소계고분자 복합 타겟을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 MF 듀얼 스퍼터링 캐소드 2(cathode 2)에 설치하였다. 그 후, PET 필름을 언와인더 챔버에 권취하고, 로타리 펌프와 부스터 펌프를 이용하여 롤투롤 스퍼터 장치 내부를 저진공 상태로 만든 후 터보 분자 펌프를 이용하여 고진공(2×10-4 Pa)을 형성하였다. 상기 롤투롤 스퍼터 장치의 내부 진공도가 2×10-4 Pa 이하가 되면 각각의 캐소드에 아르곤(Ar) 가스를 400 sccm의 유량으로 주입하면서 MF 및 DC 파워를 1.0 W/cm2 로하여, pre-sputtering을 실시하였다. 이후, 메인 롤(main roll)의 온도를 10 ℃로 하온하고, 1 m/min의 속도로 PET 필름을 반송하면서 탄화불소 박막을 증착하였다. 이때, 상기 탄화불소 박막은 상기 캐소드 2를 통해 MF 파워 2.5 W/cm2 로 두께 30 nm로 증착된 탄화불소 박막을 와인더 챔버에서 권취하였다.The fluorine-based polymer composite target (length 950 mm, width 127 mm, thickness 6 mm) was manufactured in a square plate shape. A fluorine-based polymer composite target containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotubes (average particle diameter: 30 nm) was attached to the copper backing plate electrode surface. It was installed in MF dual sputtering cathode 2. After that, the PET film is wound in an unwinder chamber, and the inside of the roll-to-roll sputtering device is made low vacuum by using a rotary pump and a booster pump, and then a high vacuum (2 × 10 -4 Pa) is obtained by using a turbo molecular pump. Formed. When the internal vacuum of the roll-to-roll sputtering apparatus is 2 × 10 −4 Pa or less, MF and DC power is 1.0 W / cm 2 while argon (Ar) gas is injected into each cathode at a flow rate of 400 sccm, and the pre- sputtering was performed. Thereafter, the temperature of the main roll was lowered to 10 ° C., and the fluorocarbon thin film was deposited while conveying the PET film at a speed of 1 m / min. In this case, the fluorocarbon thin film was wound in the winder chamber a thin fluorocarbon thin film deposited with a thickness of 30 nm at MF power 2.5 W / cm 2 through the cathode 2.
상기 방법으로 제조된 탄화불소 박막의 물성을 확인하기 위하여, 수접촉각을 측정하였으며, 가시광선(550 nm)에서의 광투과율을 측정하여, 그 결과를 하기 표 1에 나타내었다.In order to confirm the physical properties of the fluorocarbon thin film prepared by the above method, the water contact angle was measured, and the light transmittance in visible light (550 nm) was measured, and the results are shown in Table 1 below.
(실시예 2)(Example 2)
상기 실시예 1의 불소계고분자 복합 타겟을 MF 듀얼 스퍼터링 캐소드 2(cathode 2)에 설치하는 것 대신, 이를 DC 싱글 스퍼터링 캐소드 3(cathode 4)에 설치하여 DC 파워 2.5 W/cm2 로 수행하는 것을 제외하고는 동일한 방법으로 두께 30 nm로 증착된 탄화불소 박막을 제조하였다.Instead of installing the fluorine-based polymer composite target of Example 1 in the MF dual sputtering cathode 2 (cathode 2), except that it is installed in the DC single sputtering cathode 3 (cathode 4) to perform at DC power 2.5 W / cm 2 In the same manner to prepare a fluorocarbon thin film deposited to a thickness of 30 nm.
상기 방법으로 제조된 탄화불소 박막의 물성을 확인하기 위하여, 수접촉각을 측정하였으며, 가시광선(550 nm)에서의 광투과율을 측정하여, 그 결과를 하기 표 1에 나타내었다.In order to confirm the physical properties of the fluorocarbon thin film prepared by the above method, the water contact angle was measured, and the light transmittance in visible light (550 nm) was measured, and the results are shown in Table 1 below.
실시예 1Example 1 실시예 2Example 2
접촉각(°)Contact angle (°) 108108 107107
가시광선 투과율(%)Visible light transmittance (%) 91.0691.06 90.9290.92
상기 표 1에 나타낸 바와 같이, 본 발명에 따른 탄화불소 박막은 도전성을 가지는 기능화제를 포함하는 불소계고분자 복합 타겟을 이용함으로써, MF 및 DC 전원방식으로도 스퍼터링이 가능하여 생산성을 크게 향상시킬 수 있을 뿐 아니라 낮은 표면 에너지를 가지는 투명성이 높은 양질의 탄화불소 박막을 제조할 수 있음을 확인하였다.As shown in Table 1, the fluorocarbon thin film according to the present invention can be sputtered by MF and DC power supply by using a fluorine-based polymer composite target containing a functionalizing agent having conductivity, thereby greatly improving productivity. In addition, it was confirmed that a high-quality fluorocarbon thin film having high transparency with low surface energy could be manufactured.
(실시예 3-16)(Example 3-16)
상기 실시예 1의 제조방법으로 제조된 탄화불소 박막에 하기 표 2의 조건에서 탄화불소 박막의 표면처리하는 단계를 더 실시하고, 이의 방법으로 처리된 탄화불소 박막의 물성을 확인하기 위하여, 수접촉각을 측정하였으며, 가시광선(550 nm)에서의 광투과율을 측정하여, 그 결과를 하기 표 2에 나타내었다. Further performing the step of surface treatment of the fluorocarbon thin film in the conditions of Table 2 to the fluorocarbon thin film prepared by the manufacturing method of Example 1, in order to check the physical properties of the fluorocarbon thin film treated by the method, the water contact angle The light transmittance in visible light (550 nm) was measured, and the results are shown in Table 2 below.
또한, UV 분광계(UV/VIS Spectrophotometer, Agilent 8456, #G1103A)를 이용하여 ASTM E313 규격으로 황색도를 측정하여, 그 결과를 표 2에 나타내었다. 이때, 상기 황색도는 황색방향에서의 무색 상태로부터의 편차를 의미한다. In addition, by using a UV spectrometer (UV / VIS Spectrophotometer, Agilent 8456, # G1103A) to measure the yellowness according to the ASTM E313 standard, the results are shown in Table 2. In this case, the yellowness means a deviation from the colorless state in the yellow direction.
실시예. NoExample. No 플라즈마 파워 (W)Plasma Power (W) 아르곤(sccm)Argon (sccm) 산소(sccm)Oxygen (sccm) 접촉각(°)Contact angle (°) 가시광선 투과율(%)Visible light transmittance (%) 황색도(B*)Yellowness degree (B *)
33 100100 500500 00 9494 90.5490.54 0.350.35
44 150150 00 7474 89.8189.81 0.350.35
55 100100 100100 9898 91.4291.42 1.191.19
66 100100 500500 101101 91.2691.26 1.141.14
77 200200 500500 00 5454 90.1990.19 0.030.03
88 300300 00 4444 90.4090.40 0.410.41
99 100100 100100 8787 91.2191.21 1.111.11
1010 100100 500500 9191 91.2391.23 1.051.05
1111 300300 500500 00 2626 90.1490.14 0.420.42
1212 100100 100100 8484 91.2691.26 1.221.22
1313 100100 500500 8686 91.4191.41 1.151.15
1414 320320 500500 00 2424 90.3790.37 0.310.31
1515 400400 100100 100100 6969 91.2191.21 1.071.07
1616 100100 500500 8080 91.3191.31 0.990.99
상기 표 2에 나타낸 바와 같이, 추가적으로 탄화불소 박막의 표면처리를 수행함에 따라 제조된 탄화불소 박막은 시인성을 유지하면서도 전체적으로 균일한 색상 및 밝기를 구현할 수 있으며, 목적에 따라 표면 에너지값과 광학 특성을 용이하게 변화시킬 수 있음을 확인하였다. 특히, 본 발명에 따른 탄화불소 박막의 표면처리에 있어, 아르곤과 산소가 혼합된 반응 가스를 사용함에 따라 보다 향상된 가시광선 투과율의 구현이 가능함을 확인하였다.As shown in Table 2, the fluorocarbon thin film manufactured by additionally performing the surface treatment of the fluorocarbon thin film can realize a uniform color and brightness overall while maintaining visibility, and the surface energy value and optical properties according to the purpose It was confirmed that it can be easily changed. In particular, in the surface treatment of the fluorocarbon thin film according to the present invention, it was confirmed that improved visible light transmittance can be realized by using a reaction gas mixed with argon and oxygen.
(실시예 17)(Example 17)
폴리에스테르 섬유직물(가로 100mm, 세로 100mm 두께 0.1mm)에 클러스터 스퍼터 장치를 이용하여 탄화수소 박막이 증착된 초발수 코팅섬유를 제작하였다.A superhydrophobic coated fiber in which a hydrocarbon thin film was deposited on a polyester fiber fabric (width 100 mm, length 100 mm thickness 0.1 mm) was manufactured using a cluster sputtering device.
상기 클러스터 스퍼터 장치는 기재가 로딩되는 로더부, 기재를 이송하는 이송 모듈부, 박막을 증착하는 스퍼터링 챔버부로 구성되며, 스퍼터링 챔버부는 MF 듀얼 스퍼터링 캐소드(cathode)로 구성되어 있다.The cluster sputtering apparatus includes a loader portion on which a substrate is loaded, a transfer module portion for transferring the substrate, and a sputtering chamber portion for depositing a thin film, and the sputtering chamber portion includes an MF dual sputtering cathode.
불소계고분자 복합 타겟(직경 4인치, 두께 6 mm)은 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 85 wt%, graphite (Timcal, 40um) 15 wt%가 함유된 원형으로 제작되었다. 이를 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하고, 스퍼터링 챔버부의 MF 듀얼 스퍼터링 캐소드(cathode)에 설치하였다. The fluorine-based polymer composite target (4 inches in diameter and 6 mm in thickness) was manufactured in a circular form containing 85 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% of graphite (Timcal, 40um). It was attached to the copper backing plate electrode surface and installed in the MF dual sputtering cathode of the sputtering chamber portion.
폴리에스테르 섬유직물을 기판에 부착하고, 로타리 펌프로 챔버 내부를 50 mtorr까지 진공(vacuum)을 배기하여 저진공 상태로 만든 후 크라이오(cryo) 펌프를 이용하여 고진공(5×10-5 Torr)을 형성하였다. 이때, 공정 가스로 아르곤 가스를 50 sccm의 유량으로 주입하면서, MF 파워를 100W로 하여 pre-sputtering을 실시하여, 오염물질을 제거하였다. 이후 MF 파워를 300W(3.7 W/㎠)로 하여 30분 동안 탄화불소 박막을 증착하고, 증착된 초발수 코팅섬유를 로더부에서 꺼내었다.A polyester fiber fabric is attached to the substrate, and the inside of the chamber is evacuated to 50 mtorr by a rotary pump to make a low vacuum state, followed by a high vacuum (5 × 10-5 Torr) using a cryo pump. Formed. At this time, while argon gas was injected into the process gas at a flow rate of 50 sccm, pre-sputtering was performed at a MF power of 100 W to remove contaminants. Since the MF power to 300W (3.7 W / ㎠) to deposit a fluorocarbon thin film for 30 minutes, the deposited super water-repellent coating fibers were taken out of the loader.
상기 방법으로 제조된 초발수 코팅섬유의 물성을 확인하기 위하여, 접촉각 및 초발수 코팅섬유에서의 코팅막 두께를 측정하여, 그 결과를 표 3에 나타내었다. In order to confirm the physical properties of the super water-repellent coating fibers prepared by the above method, the coating angle in the contact angle and the super water-repellent coating fibers was measured, and the results are shown in Table 3.
(실시예 18)(Example 18)
나일론 섬유직물(600mm 폭, 0.1mm 두께, 30m 길이의 롤)에 롤투롤 스퍼터 장치(SPW-060, 도 1 참조)를 이용하여 탄화수소 박막이 증착된 초발수 코팅섬유를 제작하였다.A superhydrophobic coated fiber in which a hydrocarbon thin film was deposited using a roll-to-roll sputter device (SPW-060, see FIG. 1) was fabricated on a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll).
상기 SPW-060 롤투롤 스퍼터 장치는 섬유직물을 권취(load)하는 언와인더(unwinder)부, 섬유직물 위에 박막을 증착하는 프로세스 챔버부, 성막된 섬유직물을 권취하는 와인더(winder)부로 구성되며, 프로세스 챔버부는 3개의 MF 듀얼 스퍼터링 캐소드(cathode 1 내지 3)와 1개의 DC 스퍼터링 캐소드(cathode 4)가 독립적으로 구성되어 있다.The SPW-060 roll-to-roll sputtering device includes an unwinder part for winding a fiber fabric, a process chamber part for depositing a thin film on the fiber fabric, and a winder part for winding the formed fiber fabric. The process chamber part is composed of three MF dual sputtering cathodes (cathode 1 to 3) and one DC sputtering cathode (cathode 4) independently.
불소계고분자 복합 타겟(길이 950 mm, 폭 127 mm, 두께 6 mm)사각 판형으로 제작되었다. 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 90 wt%, 탄소나노튜브 10 wt%가 함유된 불소계고분자 복합 타겟을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 MF 듀얼 스퍼터링 캐소드 1(cathode 1)에 설치하였다. 그 후, 나일론 섬유직물 (600mm 폭, 0.1mm 두께, 30m 길이의 롤)을 언와인더 챔버에 권취(load)하고, 로타리 펌프와 부스터 펌프를 이용하여 롤투롤 스퍼터 장치 내부를 50 mtorr까지 진공(vacuum)을 배기하여 저진공 상태로 만든 후 터보 분자 펌프를 이용하여 고진공(2×10-4 Pa)을 형성하였다. 상기 롤투롤 스퍼터 장치의 내부 진공도가 2×10-4 Pa 이하가 되면 캐소드에 아르곤(Ar) 가스를 400 sccm의 유량으로 주입하면서 MF 파워를 1 kW로하여, pre-sputtering을 실시하였다. 이후, 메인 롤(main roll)의 온도를 10 ℃로 하온하고, 1 m/min의 속도로 나일론 섬유직물을 반송하면서 MF 듀얼 스퍼터링 캐소드 1(cathode 1)에 의해 MF 파워를 3kW로 하여 탄화불소 박막을 증착하고, 증착된 초발수 코팅섬유를 로더부에서 꺼내었다.Fluorine-based polymer composite target (length 950 mm, width 127 mm, thickness 6 mm) was produced in a square plate shape. A fluorine-based polymer composite target containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotubes was attached to an electrode surface of a copper backing plate. It was installed in MF dual sputtering cathode 1. After that, a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll) was loaded into the unwinder chamber, and a rotary pump and a booster pump were used to vacuum the inside of the roll-to-roll sputtering device to 50 mtorr. After evacuating the vacuum to a low vacuum state, a high vacuum (2 × 10 -4 Pa) was formed using a turbo molecular pump. When the internal vacuum degree of the roll-to-roll sputtering device became 2 × 10 −4 Pa or less, pre-sputtering was performed with MF power of 1 kW while argon (Ar) gas was injected into the cathode at a flow rate of 400 sccm. Thereafter, the temperature of the main roll was lowered to 10 ° C., and the MF power was 3 kW by MF dual sputtering cathode 1 while conveying the nylon fiber fabric at a speed of 1 m / min. Was deposited, and the deposited superhydrophobic coated fiber was taken out of the loader.
상기 방법으로 제조된 초발수 코팅섬유의 물성을 확인하기 위하여 접촉각, 초발수 코팅막의 두께를 측정하였으며, 그 결과를 표 3에 나타내었다.In order to check the physical properties of the super water-repellent coating fiber prepared by the above method, the contact angle and the thickness of the super water-repellent coating film were measured, and the results are shown in Table 3.
(실시예 19)(Example 19)
고순도 Si (99.9%, Mitsui) Target(사각 판형, 길이 950 mm, 폭 127 mm, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하여 이를 MF 듀얼 스퍼터링 캐소드 1 (cathode 1)에 설치하였다. 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 90 wt%, 탄소나노튜브 10 wt%가 함유된 사각 판형으로 제작된 불소계고분자 복합 타겟(길이 950 mm, 폭 127 mm, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 MF 듀얼 스퍼터링 캐소드 2(cathode 2)에 설치하였다. 그 후, 나일론 섬유직물 (600mm 폭, 0.1mm 두께, 30m 길이의 롤)을 언와인더 챔버에 권취(load)하고, 로타리 펌프와 부스터 펌프를 이용하여 롤투롤 스퍼터 장치 내부를 50 mtorr까지 진공(vacuum)을 배기하여 저진공 상태로 만든 후 터보 분자 펌프를 이용하여 고진공(2×10-4 Pa)을 형성하였다. 상기 롤투롤 스퍼터 장치의 내부 진공도가 2×10-4 Pa 이하가 되면 각각의 캐소드에 아르곤(Ar) 가스를 400 sccm의 유량으로 주입하면서 MF 파워를 1 kW로하여, pre-sputtering을 실시하였다. 이후, 메인 롤(main roll)의 온도를 10 ℃로 하온하고, 1 m/min의 속도로 나일론 섬유직물을 반송하면서 MF 듀얼 스퍼터링 캐소드 1(cathode 1)에 의해 MF 파워를 10 kW로 하고 산소 반응가스를 스퍼터링 전압이 80%를 유지하도록 PID 제어방식으로 주입하면서 산화실리콘 (SiO2) 무기 코팅층을 증착하였다. 그리고 연속적으로 캐소드 2 (cathode 2)에 의해 MF 파워를 3 kW로 하여 탄화불소 박막을 증착하고, 증착된 초발수 코팅섬유를 로더부에서 꺼내었다.A high purity Si (99.9%, Mitsui) Target (square plate, length 950 mm, width 127 mm, thickness 6 mm) is attached to the copper backing plate electrode surface and attached to the MF dual sputtering cathode 1 Installed. A copper backing plate (Cu backing) was made of a fluoropolymer composite target (length 950 mm, width 127 mm, thickness 6 mm) made of a square plate containing 90 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotubes. plate) attached to the electrode surface. It was installed in MF dual sputtering cathode 2. After that, a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll) was loaded into the unwinder chamber, and a rotary pump and a booster pump were used to vacuum the inside of the roll-to-roll sputtering device to 50 mtorr. After evacuating the vacuum to a low vacuum state, a high vacuum (2 × 10 -4 Pa) was formed using a turbo molecular pump. When the internal vacuum degree of the roll-to-roll sputtering device became 2 × 10 −4 Pa or less, pre-sputtering was performed with MF power of 1 kW while injecting argon (Ar) gas into each cathode at a flow rate of 400 sccm. Thereafter, the temperature of the main roll was lowered to 10 ° C., and the MF power was set to 10 kW by MF dual sputtering cathode 1 while conveying the nylon fiber fabric at a speed of 1 m / min. The silicon oxide (SiO 2 ) inorganic coating layer was deposited while the gas was injected in a PID controlled manner to maintain the sputtering voltage at 80%. Subsequently, a fluorocarbon thin film was deposited by using cathode 2 at a MF power of 3 kW, and the deposited superhydrophobic coated fiber was taken out of the loader unit.
상기 방법으로 제조된 초발수 코팅섬유의 물성을 확인하기 위하여 접촉각, 초발수 코팅막의 두께를 측정하였으며, 그 결과를 표 3에 나타내었다. In order to check the physical properties of the super water-repellent coating fiber prepared by the above method, the contact angle and the thickness of the super water-repellent coating film were measured, and the results are shown in Table 3.
(실시예 20)(Example 20)
분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 85 wt%, 탄소나노튜브 15 wt%가 함유된 사각 판형으로 제작된 불소계고분자 복합 타겟(길이 950 mm, 폭 127 mm, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 DC (Direct Current) 싱글(single) 스퍼터링 캐소드 4(cathode 4)에 설치하였다. 그 후, 나일론 섬유직물 (600mm 폭, 0.1mm 두께, 30m 길이의 롤)을 언와인더 챔버에 권취(load)하고, 로타리 펌프와 부스터 펌프를 이용하여 롤투롤 스퍼터 장치(SPW-060) 내부를 50 mtorr까지 진공(vacuum)을 배기하여 저진공 상태로 만든 후 터보 분자 펌프를 이용하여 고진공(2×10-4 Pa)을 형성하였다. 상기 롤투롤 스퍼터 장치의 내부 진공도가 2×10-4 Pa 이하가 되면 캐소드에 아르곤(Ar) 가스를 400 sccm의 유량으로 주입하면서 DC 파워를 1 kW로하여, pre-sputtering을 실시하였다. 이후, 메인 롤(main roll)의 온도를 10 ℃로 하온하고, 1 m/min의 속도로 나일론 섬유직물을 반송하면서 DC 스퍼터링 캐소드 4(cathode 4)에 의해 DC 파워를 1 kW로 하여 탄화불소 박막을 증착하고, 증착된 초발수 코팅섬유를 로더부에서 꺼내었다.A copper backing plate (Cu backing) was made of a fluoropolymer composite target (length 950 mm, width 127 mm, thickness 6 mm) made of a square plate containing 85 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% of carbon nanotubes. plate) attached to the electrode surface. It was installed in a DC (Direct Current) single sputtering cathode 4. After that, a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll) was loaded into the unwinder chamber, and the inside of the roll-to-roll sputtering device (SPW-060) was opened using a rotary pump and a booster pump. After evacuating the vacuum to 50 mtorr to make a low vacuum state, a high vacuum (2 × 10 −4 Pa) was formed using a turbo molecular pump. When the internal vacuum degree of the roll-to-roll sputtering device became 2 × 10 −4 Pa or less, pre-sputtering was performed with DC power of 1 kW while argon (Ar) gas was injected into the cathode at a flow rate of 400 sccm. Thereafter, the temperature of the main roll was lowered to 10 ° C., and the fluorocarbon thin film was made with DC power of 1 kW by DC sputtering cathode 4 while conveying the nylon fiber fabric at a speed of 1 m / min. Was deposited, and the deposited superhydrophobic coated fiber was taken out of the loader.
상기 방법으로 제조된 초발수 코팅섬유의 물성을 확인하기 위하여 접촉각, 초발수 코팅막의 두께를 측정하였으며, 그 결과를 표 3에 나타내었다. In order to check the physical properties of the super water-repellent coating fiber prepared by the above method, the contact angle and the thickness of the super water-repellent coating film were measured, and the results are shown in Table 3.
(실시예 21)(Example 21)
폴리에스테르 섬유직물(가로 100mm, 세로 100mm 두께 0.1mm)에 클러스터 스퍼터 장치를 이용하여 탄화수소 박막이 증착된 초발수 코팅섬유를 제작하였다.A superhydrophobic coated fiber in which a hydrocarbon thin film was deposited on a polyester fiber fabric (width 100 mm, length 100 mm thickness 0.1 mm) was manufactured using a cluster sputtering device.
상기 클러스터 스퍼터 장치는 기재는 로더부, 기재를 이송하는 이송 모듈부, 박막을 증착하는 스퍼터링 챔버부로 구성되며, 스퍼터링 챔버부는 MF 듀얼 스퍼터링 캐소드(cathode)로 구성되어 있다.The cluster sputtering device includes a loader part, a transfer module part for transferring the substrate, and a sputtering chamber part for depositing a thin film, and the sputtering chamber part is composed of an MF dual sputtering cathode.
분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 65 wt%, 탄소나노튜브 5 wt% 및 Al2O3 30wt%가 함유된 원형으로 제작된 불소계고분자 복합 타겟(직경 4인치, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 스퍼터링 챔버부의 MF 듀얼 스퍼터링 캐소드(cathode)에 설치하였다. A fluorine-based polymer composite target (4 inches in diameter, 6 mm thick) made of circular PTFE (polytetrafluoroethylene, DuPont 7AJ) containing 65 wt%, 5 wt% carbon nanotubes, and 30 wt% Al 2 O 3 was coated with a copper backing plate ( Cu backing plate) was attached to the electrode surface. This was installed in the MF dual sputtering cathode of the sputtering chamber portion.
폴리에스테르 섬유직물(가로 100mm, 세로 100mm 두께 0.1mm)을 기판에 부착하고, 로타리 펌프로 챔버 내부를 50 mtorr까지 진공(vacuum)을 배기하여 저진공 상태로 만든 후 크라이오(cryo) 펌프를 이용하여 고진공(5×10-5 Torr)을 형성하였다. 이때, 공정가스로 아르곤 가스를 50 sccm의 유량으로 주입하면서, MF 파워를 100W로 하여 pre-sputtering을 실시하여, 오염물질을 제거하였다. 이후 MF 파워를 300W로 하여 30분 동안 탄화불소 박막을 증착하고, 증착된 초발수 코팅섬유를 로더부에서 꺼내었다.A polyester fiber fabric (100 mm wide, 100 mm thick 0.1 mm thick) is attached to the substrate, and the chamber is evacuated to 50 mtorr with a rotary pump to make a low vacuum state and then use a cryo pump. To form a high vacuum (5 × 10 −5 Torr). At this time, while argon gas was injected into the process gas at a flow rate of 50 sccm, pre-sputtering was performed at MF power of 100 W to remove contaminants. Since the MF power was set to 300W for 30 minutes to deposit a fluorocarbon thin film, the superhydrophobic coating fibers deposited were taken out of the loader.
상기 방법으로 제조된 초발수 코팅섬유의 탄화불소 박막(발수제층) 내 화학결합 상태 및 화학적 조성을 정량화하기 위하여 XPS(X-ray photoelectron spectroscopy, X-선 광원으로 monochromatic Al-Kα(15 kV, large spot size: 400 μm x 800 μm, small spot size: 10 μm)를 구비한 AXIS NOVA)을 이용하였다. Al-Kα광원을 이용하고, 가속 전압 15 kV, 방출 전류 10 mA로 설정하여 탄화불소 박막 내 화합결합 상태 및 화학적 조성을 확인하였다.Monochromatic Al-Kα (15 kV, large spot with X-ray photoelectron spectroscopy, X-ray light source to quantify the chemical bonding state and chemical composition in the fluorocarbon thin film (water repellent layer) of the super water-repellent coating fibers prepared by the above method) AXIS NOVA) with size: 400 μm × 800 μm, small spot size: 10 μm) was used. The Al-Kα light source was used, and the acceleration voltage was set to 15 kV and the emission current was 10 mA to confirm the chemical bonding state and chemical composition in the fluorocarbon thin film.
그 결과, 도 2에 도시한바와 같이, 상기 탄화불소 박막의 C1s 스펙트럼 결과, C-F, C-F2, C-F3, C-C-F 등의 탄소-불소 결합과 C-C 탄소-탄소 결합이 관찰되었다. 이때, 상기 탄화불소 박막 내 총 원자 100 중량%를 기준으로 탄소 원자(C)는 29.57중량%, 불소 원자(F)는 59.02 중량%, 알루미늄 원자(Al)가 6.64중량% 로 함유됨을 알 수 있었다. As a result, as shown in FIG. 2, the C1s spectrum of the fluorocarbon thin film showed that carbon-fluorine bonds and CC carbon-carbon bonds such as CF, CF 2 , CF 3 , and CCF were observed. In this case, it was found that the carbon atom (C) contained 29.57% by weight, the fluorine atom (F) was 59.02% by weight, and the aluminum atom (Al) was 6.64% by weight based on 100% by weight of the total atoms in the fluorocarbon thin film. .
또한, 상기 방법으로 제조된 초발수 코팅섬유의 물성을 확인하기 위하여 접촉각 및 초발수 코팅막의 두께를 측정하여, 그 결과를 표 3에 나타내었다. In addition, in order to confirm the properties of the super water-repellent coating fibers prepared by the above method, the contact angle and the thickness of the super water-repellent coating film were measured, and the results are shown in Table 3.
실시예 17Example 17 실시예 18Example 18 실시예 19Example 19 실시예 20Example 20 실시예 21Example 21 비교예 5Comparative Example 5
접촉각(°)Contact angle (°) 140140 143143 145145 142142 143143 2525
코팅막 두께(nm)Coating film thickness (nm) 100100 5050 9595 5353 105105 4545
본 발명은 출력 전압에 상관없이 구현될 수 있다는 측면에서, 종래 탄화불소 박막과 차별되며, RF보다 낮은 인가 전압인 MF 또는 DC 전원방식으로도 높은 증착율로 균일하게 증착된 탄화불소 박막(발수제층)을 포함하는 초발수 코팅섬유를 제공할 수 있다. 또한, 상기 초발수 코팅섬유는 140°이상의 높은 접촉각을 가지며, 비교적 높은 증착율을 가짐을 알 수 있다(표 3 참조).The present invention is different from the conventional fluorocarbon thin film in that the present invention can be implemented regardless of the output voltage, and evenly deposited fluorine carbide thin film (water repellent layer) at a high deposition rate even by an MF or DC power supply having an applied voltage lower than RF. It can provide a super water-repellent coating fiber comprising a. In addition, the super water-repellent coated fiber has a high contact angle of 140 ° or more, it can be seen that it has a relatively high deposition rate (see Table 3).
또한, 본 발명에 따른 초발수 코팅섬유의 제조방법은 기존 롤투롤 장비에서 별도의 개조 비용 없이 타겟의 교환만으로 바로 적용이 가능할 뿐 아니라 매우 단시간 내에 대면적의 박막의 제조가 가능하여, 다기능성 섬유직물 제작을 위한 연속공정으로 공정의 단순화 및 절감된 제조 원가로 품질이 우수한 고기능성 섬유의 대량생산에 기여할 수 있다.In addition, the manufacturing method of the super water-repellent coating fiber according to the present invention can be directly applied to the existing roll-to-roll equipment only by replacing the target without any additional renovation cost, and it is possible to manufacture a large-area thin film in a very short time. As a continuous process for fabric making, it can contribute to mass production of high quality fiber with high quality due to simplified process and reduced manufacturing cost.
즉, 본 발명은 한 대의 장비에서 연속적으로 다양한 기능을 섬유직물에 부여하는 공정이 가능하여 생산성을 획기적으로 향상시킬 수 있으며, 다량의 물과 화학약품 등을 사용하는 기존의 공정을 대체하여 각종 환경문제를 최소화 하고, 에너지 절감 측면에도 이점을 제공한다.That is, the present invention can continuously improve the productivity by providing a variety of functions to the textile fabric in a single equipment, and can significantly improve productivity, and replace various conventional processes using a large amount of water and chemicals, etc. Minimize problems and provide benefits in terms of energy savings.
(실시예 22)(Example 22)
1 X 2 ㎠ 크기의 glass 기판(eagle XG glass 0.7mmTh)에 클러스터 스퍼터 장치를 이용하여 탄화수소 박막을 제작하였다.A hydrocarbon thin film was fabricated on a 1 × 2 cm 2 glass substrate (eagle XG glass 0.7mmTh) using a cluster sputtering device.
불소계고분자 복합 타겟(직경 4인치, 두께 6 mm)은 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 85 wt%, 탄소나노튜브 15wt%가 함유된 원형으로 제작되었다. 이를 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 스퍼터링 챔버부의 MF 듀얼 스퍼터링 캐소드(cathode)에 설치하였다. The fluorine-based polymer composite target (4 inches in diameter and 6 mm in thickness) was manufactured in a circular form containing 85 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% of carbon nanotubes. It was attached to the copper backing plate electrode face. This was installed in the MF dual sputtering cathode of the sputtering chamber portion.
이때, 상기 기판은 아세톤과 알코올로 각각 5분간 초음파 세척기를 사용하여 세척하고 건조하여 준비하였다. 준비된 기판은 알루미늄으로 제작된 기판 홀더(holder)에 내열 테이프를 사용하여 부착하였고, 기판 홀더를 챔버내의 기판 스테이지(stage)에 거치한 후 챔버를 닫고 로터리(rotary) 펌프(pump)로 50 mtorr까지 진공(vacuum)을 배기하였고, 저진공 작업을 완료한 후 cryogenic 펌프로 고진공을 형성하였다. 상온(25 ℃)에서 기판과 타겟 사이의 거리를 24 cm로 고정하고, 파워(200 W)와 아르곤 가스(Ar gas) 분압(10 mtorr)으로 100 nm 탄화불소 박막을 제작하였다. At this time, the substrate was prepared by washing and drying with an ultrasonic cleaner for 5 minutes each with acetone and alcohol. The prepared substrate was attached to a substrate holder made of aluminum using a heat resistant tape, and the substrate holder was mounted on a substrate stage in the chamber, the chamber was closed, and a rotary pump was used to reach 50 mtorr. The vacuum was evacuated and high vacuum was formed with a cryogenic pump after the low vacuum operation was completed. A distance between the substrate and the target was fixed at 24 cm at room temperature (25 ° C.), and a 100 nm fluoride carbide thin film was manufactured by a power (200 W) and an argon partial pressure (10 mtorr).
상기 방법으로 제조된 1 X 2 ㎠ 크기의 glass 기판(eagle XG glass 0.7mmTh)에 100nm 두께로 코팅된 투명 탄화불소 박막의 물성을 확인하기 위하여, 표면특성 및 광투과율을 측정하여, 그 결과를 도 3 및 표 4에 나타내었다. In order to check the physical properties of a 100 nm thick transparent fluorocarbon thin film coated on a 1 x 2 cm 2 glass substrate (eagle XG glass 0.7mmTh) prepared by the above method, by measuring the surface properties and light transmittance, 3 and Table 4.
(실시예 23)(Example 23)
상기 실시예 22에서 사용된 불소계고분자 복합 타겟 대신 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 85 wt%, 그라파이트(TIMCAL社, 평균직경 2 um) 15 wt%가 함유된 원형으로 제작된 불소계고분자 복합 타겟을 사용한 것을 제외하고는 동일한 방법으로 탄화불소 박막을 제작하였다. Instead of the fluorine-based polymer composite target used in Example 22, 85 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 15 wt% graphite (TIMCAL, average diameter of 2 um) were used in the form of a fluorine-based polymer composite target. Except that a fluorocarbon thin film was produced in the same manner.
상기 방법으로 제조된 탄화불소 박막은 100 nm 두께로 증착되었으며, 상기 방법으로 제조된 탄화불소 박막의 표면특성 및 광투과율을 측정하여, 그 결과를 도 4 및 표 4에 나타내었다.  The fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the fluorocarbon thin film manufactured by the above method were measured, and the results are shown in FIGS. 4 and 4.
(실시예 24)(Example 24)
상기 실시예 22에서 사용된 불소계고분자 복합 타겟 대신 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 70 wt%, 산화알루미나 (Al2O3) 20 wt%, 탄소나노튜브 10 wt%가 함유된 원형으로 제작된 불소계고분자 복합 타겟을 사용한 것을 제외하고는 동일한 방법으로 탄화불소 박막을 제작하였다. Instead of the fluorine-based polymer composite target used in Example 22 fluorine-based fluorine-based made of a circular containing PTFE (polytetrafluoroethylene, DuPont 7AJ) 70 wt%, alumina oxide (Al 2 O 3 ) 20 wt%, carbon nanotube 10 wt% A fluorocarbon thin film was manufactured in the same manner except that a polymer composite target was used.
상기 방법으로 제조된 탄화불소 박막은 100 nm 두께로 증착되었으며, 상기 방법으로 제조된 탄화불소 박막의 표면특성 및 광투과율을 측정하여, 그 결과를 표 4에 나타내었다.  The fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the fluorocarbon thin film manufactured by the above method were measured, and the results are shown in Table 4 below.
(실시예 25)(Example 25)
PET 필름(SKC, SH-40, 두께 100㎛, 폭 600mm)에 롤투롤 스퍼터 (ULVAC, SPW-060)를 이용하여 탄화불소 박막을 제작하였다.A fluorocarbon thin film was produced using a roll-to-roll sputter (ULVAC, SPW-060) on a PET film (SKC, SH-40, thickness of 100 μm, width of 600 mm).
분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 90 wt%, 탄소나노튜브 10 wt%가 함유된 사각 판형으로 제작된 불소계고분자 복합 타겟(사각 판형, 길이 950 mm, 폭 127 mm, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 MF 듀얼 스퍼터링 캐소드 1에 설치하였다. 그 후, PET 필름을 언와인더 챔버에 권취(load)하고, 로타리 펌프와 부스터 펌프를 이용하여 롤투롤 스퍼터 장치 내부를 50 mtorr까지 진공(vacuum)을 배기하여 저진공 상태로 만든 후 터보 분자 펌프를 이용하여 고진공(2×10-4 Pa)을 형성하였다. 상기 롤투롤 스퍼터 장치의 내부 진공도가 2×10-4 Pa 이하가 되면 캐소드에 아르곤(Ar) 가스를 400 sccm의 유량으로 주입하면서 MF 파워를 1 kW로하여 각각의 타겟의 pre-sputtering을 실시하였다. 이후, 메인 롤(main roll)의 온도를 10 ℃로 하온하고, 1 m/min의 속도로 기재를 반송하면서 탄화불소 박막을 제작하였다.Copper backing plate with fluoropolymer composite target (square plate, length 950 mm, width 127 mm, thickness 6 mm) made from square plate containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotube (Cu backing plate) It was attached to the electrode surface. It was installed in MF dual sputtering cathode 1. After that, the PET film is wound in an unwinder chamber, and the inside of the roll-to-roll sputtering device is evacuated to 50 mtorr using a rotary pump and a booster pump to make a low vacuum state, followed by a turbo molecular pump. Was used to form a high vacuum (2 × 10 −4 Pa). When the internal vacuum of the roll-to-roll sputtering device was 2 × 10 −4 Pa or less, pre-sputtering of each target was performed with MF power of 1 kW while argon (Ar) gas was injected into the cathode at a flow rate of 400 sccm. . Thereafter, the temperature of the main roll was lowered to 10 ° C., and a fluorocarbon thin film was produced while conveying the substrate at a speed of 1 m / min.
MF 듀얼 스퍼터링 캐소드 1에 의해 MF 파워를 5kW로 하여 탄화불소 박막을 100nm 두께로 증착한 후 제조된 탄화불소 박막을 와인더 챔버에서 권출하였다. A fluorocarbon thin film was deposited by a MF dual sputtering cathode 1 with a MF power of 5 kW at a thickness of 100 nm, and the fluorocarbon thin film thus produced was unwound in a winder chamber.
상기 방법으로 제조된 탄화불소 박막은 100 nm 두께로 증착되었으며, 상기 방법으로 제조된 탄화불소 박막의 표면특성 및 광투과율을 측정하여, 그 결과를 표 4에 나타내었다. The fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the fluorocarbon thin film manufactured by the above method were measured, and the results are shown in Table 4 below.
(실시예 26)(Example 26)
고순도 Si 타겟(99.9%, Mitsui, 사각 판형, 길이 950 mm, 폭 127 mm, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하여 이를 MF 듀얼 스퍼터링 캐소드 1에 설치하였다. 또, 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 99 wt%, 탄소나노튜브 1 wt%가 함유된 사각 판형으로 제작된 불소계고분자 복합 타겟(사각 판형, 길이 950 mm, 폭 127 mm, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하여, 이를 MF 듀얼 스퍼터링 캐소드 2에 설치하였다. A high purity Si target (99.9%, Mitsui, square plate, length 950 mm, width 127 mm, thickness 6 mm) was attached to the copper backing plate electrode face and mounted on MF dual sputtering cathode 1. In addition, a copper fluorine-based composite target (square plate, length 950 mm, width 127 mm, thickness 6 mm) made of a rectangular plate containing 99 wt% of powdered PTFE (polytetrafluoroethylene, DuPont 7AJ) and 1 wt% of carbon nanotubes was copper. The backing plate was attached to the electrode face and mounted on the MF dual sputtering cathode 2.
MF 듀얼 스퍼터링 캐소드 2에 의해 MF 파워를 3 kW로 하여 버퍼층으로서 SiO2 박막을 증착하였다(20nm 두께). 연속적으로 MF 듀얼 스퍼터링 캐소드 2에 의해 MF 파워를 5 kW로 하여 탄화불소 박막을 100nm 두께로 증착한 후 제조된 하드코팅막을 와인더 챔버에서 권취하였다.A MF dual sputtering cathode 2 deposited a SiO 2 thin film as a buffer layer with a MF power of 3 kW (20 nm thick). Subsequently, a fluorocarbon thin film was deposited to a thickness of 100 nm with MF power of 5 kW by MF dual sputtering cathode 2, and then a hard coat film prepared was wound in a winder chamber.
상기 방법으로 제조된 하드코팅막의 표면특성 및 광투과율을 측정하여, 그 결과를 표 4에 나타내었다.  The surface characteristics and the light transmittance of the hard coat film prepared by the above method were measured, and the results are shown in Table 4.
실시예 22Example 22 실시예 23Example 23 실시예 24Example 24 실시예 25Example 25 실시예 26Example 26 비교예 8Comparative Example 8
표면경도(GPa)Surface Hardness (GPa) 1.411.41 6.906.90 2.352.35 1.151.15 2.052.05 0.580.58
투과율(%, 파장 550nm)Transmittance (%, wavelength 550nm) 95.4595.45 94.5594.55 95.7595.75 92.5692.56 93.2493.24 91.2791.27
상기 표 4에 나타낸 바와 같이, 본 발명에 따른 탄화불소 박막은 RF 전원방식으로 증착된 탄화불소 박막인 비교예 8에 비해 현저하게 향상된 표면경도 특성을 가지는 투명 탄화불소 박막을 제공하여 내스크레치성, 발수특성, 방오특성, 내지문성 등을 가져 액정표시장치 등의 표면에 유용하게 적용 가능할 것으로 기대된다.As shown in Table 4, the fluorocarbon thin film according to the present invention provides a transparent fluorine carbide thin film having a significantly improved surface hardness characteristics compared to Comparative Example 8, which is a fluorine carbide thin film deposited by RF power, scratch resistance, It is expected to have a water repellent property, antifouling property, anti-fingerprint and the like, which can be usefully applied to the surface of a liquid crystal display device.
(실시예 27)(Example 27)
1 X 1 ㎠ 크기의 glass 기판(eagle XG glass 0.5mmTh)에 클러스터 스퍼터 장치를 이용하여 탄화수소 박막을 제작하였다.A hydrocarbon thin film was fabricated on a 1 × 1 cm 2 glass substrate (eagle XG glass 0.5mmTh) using a cluster sputtering device.
불소계고분자 복합 타겟(직경 4인치, 두께 6 mm)은 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 90 wt%, 탄소나노튜브(평균입경 30nm) 10 wt%가 함유된 원형으로 제작되었다. 이를 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 스퍼터링 챔버부의 MF 듀얼 스퍼터링 캐소드(cathode)에 설치하였다. The fluorine-based polymer composite target (4 inches in diameter and 6 mm in thickness) was manufactured in a circular shape containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotubes (average particle diameter: 30 nm). It was attached to the copper backing plate electrode face. This was installed in the MF dual sputtering cathode of the sputtering chamber portion.
로타리 펌프로 챔버 내부를 50 mtorr까지 진공(vacuum)을 배기하여 저진공 상태로 만든 후 크라이오(cryo) 펌프를 이용하여 고진공(5×10-5 Torr)을 형성하였다. 이때, 공정가스로 아르곤 가스를 50 sccm의 유량으로 주입하면서, MF 파워를 1.23 W/㎠으로 하여 pre-sputtering을 실시하여, 오염물질을 제거하였다. 이후 MF 파워를 3.7 W/㎠로 하여 공정가스(아르곤, Ar)를 50 sccm 속도로 주입하면서 반응가스(산소, O2)를 5 sccm으로 주입하여 MF 스퍼터링(파워 3.7 W/㎠)를 이용해 30분 동안 반응성 스퍼터링 공정을 수행하여 탄화불소 박막을 제작하였다.After vacuuming the inside of the chamber with a rotary pump to 50 mtorr, the vacuum was reduced to a low vacuum state, and a high vacuum (5 × 10 −5 Torr) was formed by using a cryo pump. At this time, while argon gas was injected into the process gas at a flow rate of 50 sccm, pre-sputtering was performed at a MF power of 1.23 W / cm 2 to remove contaminants. After the process gas (argon, Ar) is injected at a rate of 50 sccm with MF power of 3.7 W / cm 2, the reaction gas (oxygen, O 2 ) is injected at 5 sccm and MF sputtering (power 3.7 W / cm 2) is used. A reactive sputtering process was performed for minutes to produce a fluorocarbon thin film.
상기 방법으로 제조된 탄화불소 박막의 수접촉각 및 헥사데칸 접촉각을 측정하여, 그 결과를 하기 표 5에 나타내었다.The water contact angle and the hexadecane contact angle of the fluorocarbon thin film prepared by the above method were measured, and the results are shown in Table 5 below.
(실시예 28)(Example 28)
상기 실시예 27에서 분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 90 wt%, 탄소나노튜브(평균입경 30nm) 10 wt%가 함유된 불소계고분자 복합 타겟 대신 분말 PFA(perfluoroalkoxy copolymer, 3M Dyneon PFA 6503) 99 wt%, 탄소나노튜브(평균입경 30nm) 1 wt%가 함유된 불소계고분자 복합 타겟을 사용하는 것을 제외하고는 동일한 방법으로 탄화불소 박막을 제작하였다.99 wt% of powder PFA (perfluoroalkoxy copolymer, 3M Dyneon PFA 6503) instead of fluorinated polymer composite target containing 90 wt% of powder PTFE (polytetrafluoroethylene, DuPont 7AJ) and 10 wt% of carbon nanotube (average particle diameter: 30 nm) in Example 27 A fluorocarbon thin film was manufactured in the same manner, except that a fluorine-based polymer composite target containing 1 wt% of carbon nanotubes (average particle diameter: 30 nm) was used.
상기 방법으로 제조된 탄화불소 박막의 수접촉각 및 헥사데칸 접촉각을 측정하여, 그 결과를 하기 표 5에 나타내었다.The water contact angle and the hexadecane contact angle of the fluorocarbon thin film prepared by the above method were measured, and the results are shown in Table 5 below.
(실시예 29)(Example 29)
PET 필름(SKC, SH-40, 두께 100㎛, 폭 600mm)에 롤투롤 스퍼터 (ULVAC, SPW-060)를 이용하여 탄화불소 박막을 제작하였다.A fluorocarbon thin film was produced using a roll-to-roll sputter (ULVAC, SPW-060) on a PET film (SKC, SH-40, thickness of 100 μm, width of 600 mm).
분말 PTFE(polytetrafluoroethylene, DuPont 7AJ) 95 wt%, 탄소나노튜브(평균입경 30nm) 5 wt%가 함유된 사각 판형으로 제작된 불소계고분자 복합 타겟(길이 950 mm, 폭 127 mm, 두께 6 mm)을 구리 백킹 플레이트(Cu backing plate) 전극면에 부착하였다. 이를 MF 듀얼 스퍼터링 캐소드 2(cathode 2)에 설치하였다. 그 후, PET 필름을 언와인더 챔버에 권취(load)하고, 로타리 펌프와 부스터 펌프를 이용하여 롤투롤 스퍼터 장치 내부를 저진공 상태로 만든 후 터보 분자 펌프를 이용하여 고진공(2×10-4 Pa)을 형성하였다. 상기 롤투롤 스퍼터 장치의 내부 진공도가 2×10-4 Pa 이하가 되면 각각의 캐소드에 공정가스(아르곤, Ar)를 400 sccm의 유량으로 주입하면서 MF 및 DC 파워를 1.0 W/㎠ 로하여, pre-sputtering을 실시하였다. 이후, 메인 롤(main roll)의 온도를 10 ℃로 하온하고, 1 m/min의 속도로 PET 필름을 반송하면서 공정가스(Ar)를 400 sccm 속도로 주입하면서 반응가스(산소, O2)를 35 sccm으로 주입하여 MF 스퍼터링(파워 2.0 W/㎠)를 이용하여 30분 동안 반응성 스퍼터링 공정을 수행하여 탄화불소 박막(100nm 두께)을 제작하였다.Fluorine-based polymer composite target (length 950 mm, width 127 mm, thickness 6 mm) made of square plate containing PTFE (polytetrafluoroethylene, DuPont 7AJ) 95 wt% and carbon nanotube (average particle diameter 30 nm) 5 wt% Backing plate (Cu backing plate) was attached to the electrode surface. It was installed in MF dual sputtering cathode 2. After that, the PET film is wound in an unwinder chamber, the inside of the roll-to-roll sputtering apparatus is made low vacuum by using a rotary pump and a booster pump, and then a high vacuum (2 × 10 -4) is used by using a turbo molecular pump. Pa) was formed. When the internal vacuum of the roll-to-roll sputtering device is 2 × 10 −4 Pa or less, MF and DC power are 1.0 W / cm 2 while injecting process gases (argon, Ar) into each cathode at a flow rate of 400 sccm, -sputtering was performed. Thereafter, the temperature of the main roll is lowered to 10 ° C., and the reaction gas (oxygen, O 2 ) is injected while the process gas Ar is injected at a rate of 400 sccm while conveying the PET film at a speed of 1 m / min. Injected at 35 sccm to perform a reactive sputtering process for 30 minutes using MF sputtering (power 2.0 W / ㎠) to produce a fluorocarbon thin film (100nm thickness).
상기 방법으로 제조된 탄화불소 박막의 물성을 확인하기 위하여, 수접촉각 및 헥사데칸 접촉각을 측정하여, 그 결과를 하기 표 5에 나타내었다.In order to confirm the physical properties of the fluorocarbon thin film prepared by the above method, the water contact angle and the hexadecane contact angle were measured, and the results are shown in Table 5 below.
실시예 27Example 27 실시예 28Example 28 실시예 29Example 29 비교예 9Comparative Example 9
수 접촉각(°)Male contact angle (°) 114114 105105 103103 9898
헥사데칸 접촉각(°)Hexadecane contact angle (°) 5555 5555 5555 3535
상기 표 5에 나타낸 바와 같이, 본 발명에 따르면 높은 발수성과 동시에 50°이상의 헥사데칸에 대한 발유성을 가지는 탄화불소 박막을 제공할 수 있다. 또한, 본 발명에 따른 탄화불소 박막은 비교예 9의 방법으로 제조된 100% PTFE를 이용한 탄화불소 박막에 비해 월등히 향상된 발유성이 부여되어, 우수한 내오염성과 투명성으로 유기 EL 표시 장치, 필드 이미션 표시 장치, 액정 표시 장치 등의 각종 표시 장치(디스플레이), 태양 전지, 박막 전지, 전기 이중층 콘덴서 등의 각종 전기 소자의 플렉시블 기판 또는 봉지 재료 등의 디스플레이 패널이나 터치스크린 등의 최외각층에 적용되어 고품질의 소자를 제공할 수 있을 것으로 기대된다.As shown in Table 5, the present invention can provide a fluorocarbon thin film having high water repellency and oil repellency for hexadecane of 50 ° or more. In addition, the fluorocarbon thin film according to the present invention is significantly improved oil repellency compared to the fluorocarbon thin film made of 100% PTFE prepared by the method of Comparative Example 9, the organic EL display device, field emission with excellent pollution resistance and transparency It is applied to outermost layers such as display panels and touch screens such as flexible substrates or encapsulating materials of various display devices (displays) such as display devices and liquid crystal displays, solar cells, thin film batteries, and electric double layer capacitors, and the like. It is expected to be able to provide the device.
(비교예 1)(Comparative Example 1)
PET 필름(SKC, SH-40, 두께 100um, 폭 600 mm)에 롤투롤 스퍼터 (ULVAC, SPW-060)장치를 이용하여 MF 스퍼터링 방식으로 PTFE 100% Target을 이용하고 Ar 가스 분위기에서 MF power를 2.5 W/cm2 를 인가하였으나, 플라즈마가 형성되지 않아 탄화불소 박막의 증착이 불가하였다. PET film (SKC, SH-40, thickness 100um, width 600mm) using roll-to-roll sputter (ULVAC, SPW-060) device using PTFE 100% Target by MF sputtering method and MF power in Ar gas atmosphere 2.5 W / cm 2 was applied, but no plasma was formed, so that deposition of the fluorocarbon thin film was impossible.
(비교예 2)(Comparative Example 2)
PET 필름(SKC, SH-40, 두께 100um, 폭 600 mm)에 롤투롤 스퍼터 (ULVAC, SPW-060)장치를 이용하여 DC 스퍼터링 방식으로 PTFE 100% Target을 이용하고 Ar 가스 분위기에서 DC power를 2.5 W/cm2 를 인가하였으나, 플라즈마가 형성되지 않아 탄화불소 박막의 증착이 불가하였다. PET 100% (SKC, SH-40, 100um thick, 600mm wide) using roll-to-roll sputter (ULVAC, SPW-060) device using DC 100% Target by DC sputtering method and 2.5 DC power in Ar gas atmosphere. W / cm 2 was applied, but no plasma was formed, so that deposition of the fluorocarbon thin film was impossible.
상기 비교예 1 및 2에서는 도전성이 부여되지 않은 불소수지 타겟을 이용하여, MF와 DC 방식으로 스퍼터링을 시도하였지만 플라즈마 방전이 발생하지 않아 탄화불소 박막의 증착이 불가하였다. In Comparative Examples 1 and 2, sputtering was attempted by using a MF resin and a DC method using a fluorine resin target having no conductivity. However, since plasma discharge did not occur, deposition of the fluorocarbon thin film was impossible.
(비교예 3)(Comparative Example 3)
나일론 섬유직물(600mm 폭, 0.1mm 두께, 30m 길이의 롤)에 롤투롤 스퍼터 장치(ULVAC, SPW-060)를 이용하여, 상기 실시예 18에서 사용된 불소계고분자 복합 타겟 대신 100% PTFE Target을 사용하여, 동일한 방법으로 수행하되 상기 캐소드 1을 통해 MF 파워를 3 kW로 인가하였으나, 플라즈마가 형성되지 않아 탄화불소 박막의 증착이 불가하였다. Using a roll-to-roll sputter device (ULVAC, SPW-060) on a nylon fiber fabric (600 mm wide, 0.1 mm thick, 30 m long roll), 100% PTFE Target was used instead of the fluorine-based polymer composite target used in Example 18. In the same manner, the MF power was applied at 3 kW through the cathode 1, but no plasma was formed so that the deposition of the fluorocarbon thin film was impossible.
(비교예 4)(Comparative Example 4)
나일론 섬유직물에 롤투롤 스퍼터 장치(ULVAC, SPW-060)를 이용하여 상기 비교예 3에서 100% PTFE Target 대신 90% PTFE, SiO2 10 wt%가 함유된 불소계고분자 복합 타겟을 사용하는 것을 제외하고는 동일한 방법으로 MF 파워를 3 kW로 인가하였으나, 플라즈마가 형성되지 않아 탄화불소 박막의 증착이 불가하였다. Except for using a fluoropolymer composite target containing 90% PTFE and SiO 2 10 wt% instead of 100% PTFE Target in Comparative Example 3 by using a roll-to-roll sputter device (ULVAC, SPW-060) in the nylon fiber fabric In the same way, MF power was applied at 3 kW, but the plasma was not formed, so it was impossible to deposit the fluorocarbon thin film.
(비교예 5)(Comparative Example 5)
나일론 섬유직물에 롤투롤 스퍼터 장치(ULVAC, SPW-060)를 이용하여 상기 실시예 19에 따른 무기층만을 형성하고자 하였다. 이때, 상기 무기층의 형성을 위해 상기 캐소드 2를 통해 MF 파워를 10 kW로 산소(O2) 분위기 하에서 증착된 코팅섬유를 제작하였다.It was intended to form only the inorganic layer according to Example 19 using a roll-to-roll sputter device (ULVAC, SPW-060) on the nylon fiber fabric. At this time, in order to form the inorganic layer, the coated fiber deposited under an oxygen (O 2 ) atmosphere with an MF power of 10 kW through the cathode 2 was prepared.
상기 방법으로 제조된 코팅섬유의 물성을 확인하기 위하여 수접촉각 및 초발수 코팅막의 두께를 측정하여, 그 결과를 표 3에 나타내었다. In order to confirm the physical properties of the coated fiber prepared by the above method, the water contact angle and the thickness of the super water-repellent coating film were measured, and the results are shown in Table 3.
(비교예 6)(Comparative Example 6)
상기 실시예 22에서 사용된 불소계고분자 복합 타겟 대신 100% PTFE Target을 사용하여, 탄화불소 박막을 형성하고자 하였다. 이때, 상기 캐소드 1을 통해 MF 파워를 200W로 인가하였으나, 플라즈마가 형성되지 않아 투명 하드코팅막의 증착이 불가하였다. Instead of the fluorine-based polymer composite target used in Example 22, 100% PTFE target was used to form a fluorocarbon thin film. In this case, although MF power was applied to 200W through the cathode 1, plasma was not formed, and thus, the deposition of the transparent hard coat layer was impossible.
(비교예 7)(Comparative Example 7)
PET 필름(SKC, SH-40, 두께 100㎛, 폭 600mm)에 롤투롤 스퍼터 장치(ULVAC, SPW-060)를 이용하여 상기 실시예 25에서 사용된 불소계고분자 복합 타겟 대신 100% PTFE Target을 사용하여, 탄화불소 박막을 형성하고자 하였다. 이때, 상기 캐소드 1을 통해 MF 파워를 5 kW로 인가하였으나, 플라즈마가 형성되지 않아 탄화불소 박막의 증착이 불가하였다. Using a roll-to-roll sputter device (ULVAC, SPW-060) on a PET film (SKC, SH-40, thickness 100㎛, width 600mm) using 100% PTFE target instead of the fluorine-based polymer composite target used in Example 25 , To form a fluorocarbon thin film. In this case, although MF power was applied at 5 kW through the cathode 1, plasma was not formed and deposition of the fluorocarbon thin film was impossible.
(비교예 8)(Comparative Example 8)
PET 필름(SKC, SH-40, 두께 100㎛)에 클러스터 스퍼터 장치를 이용하여 탄화수소 박막을 제작하였다. 이때, 100% PTFE Target을 사용하여 RF 전원 방식으로 200W에서 탄화불소 박막을 제작하였다.Hydrocarbon thin film was produced in PET film (SKC, SH-40, thickness 100micrometer) using the cluster sputter apparatus. At this time, the fluorocarbon thin film was manufactured at 200W using RF power method using 100% PTFE Target.
상기 방법으로 제조된 탄화불소 박막은 100 nm 두께로 증착되었으며, 제조된 탄화불소 박막의 표면특성 및 광투과율을 측정하여, 그 결과를 표 4에 나타내었다.  The fluorocarbon thin film prepared by the above method was deposited to a thickness of 100 nm, and the surface characteristics and the light transmittance of the prepared fluorocarbon thin film were measured, and the results are shown in Table 4.
(비교예 9)(Comparative Example 9)
PET 필름(SKC, SH-40, 두께 100um, 가로 100mm, 세로 100mm)에 클러스터 스퍼터 장비를 이용하여 탄화수소 박막을 제작하였다. 이때, 100% PTFE Target을 사용하여 RF 전원 방식으로 파워 3.7 W/㎠에서 PTFE 100% 타겟을 이용하여 공정 가스인 Ar만 50 sccm 주입하면서 30분 동안 증착하여 100 nm 탄화불소 박막을 제작하였다.Hydrocarbon thin film was produced in a PET film (SKC, SH-40, thickness 100um, width 100mm, length 100mm) using a cluster sputtering equipment. In this case, 100 nm fluorocarbon thin film was prepared by depositing for 30 minutes while injecting only 50 sccm of Ar, which is a process gas, by using a 100% PTFE power target at 3.7 W / cm 2 by RF power method using a 100% PTFE target.
상기 방법으로 제조된 탄화불소 박막의 수접촉각 및 헥사데칸 접촉각을 측정하여, 그 결과를 하기 표 5에 나타내었다.The water contact angle and the hexadecane contact angle of the fluorocarbon thin film prepared by the above method were measured, and the results are shown in Table 5 below.
(부호의 설명)(Explanation of the sign)
100 : 언와인더 챔버(unwinder chamber), 101 : 이온 플라즈마 처리부(ion plasma trestment), 102 : 히터(Heater), 103 : 서브 언와인더(suv UW), 104 : 언와인더(unwinder), 105 : 폴리콜드(poly cold), 200 : 메인 챔버(main chamber), 201 : 메인 롤(main roll), 202 : MF 듀얼 캐소드(MF dual cathode, cathode 1), 203 : MF 듀얼 캐소드(MF dual cathode, cathode 2), 204 : MF 듀얼 캐소드(MF dual cathode, cathode 3), 205 : DC 싱글 캐소드(MF single cathode, cathode 4), 205 : 폴리콜드(poly cold), 300 : 와인더 챔버(winder chamber), 301 : 저항 측정기(resistance meter), 302 : 투과율 분석기(transmittance analyzer), 303 : 반사율 측정기(reflectance meter), 304 : 서브 와인더(suv WD), 305 : 와인더(winder)100: unwinder chamber, 101: ion plasma trestment, 102: heater, 103: sub unwinder, 104: unwinder, 105 : Poly cold, 200: main chamber, 201: main roll, 202: MF dual cathode, 203: MF dual cathode, cathode 2), 204: MF dual cathode (cathode 3), 205: DC single cathode (MF single cathode, cathode 4), 205: poly cold, 300: winder chamber 301: resistance meter, 302: transmittance analyzer, 303: reflectance meter, 304: sub-winder (SUV WD), 305: winder

Claims (22)

  1. 기재 상에 전도성을 가지는 기능화제를 포함하는 불소계고분자 복합 타겟을 이용하여 스퍼터링하는 단계를 포함하는 탄화불소 박막의 제조방법.A method of manufacturing a fluorocarbon thin film comprising the step of sputtering using a fluorine-based polymer composite target comprising a functionalizing agent having conductivity on a substrate.
  2. 제 1항에 있어서,The method of claim 1,
    상기 스퍼터링은 RF, MF 또는 DC 전원방식으로 수행되는 탄화불소 박막의 제조방법.The sputtering is a method of manufacturing a fluorocarbon thin film is performed by RF, MF or DC power supply method.
  3. 제 1항에 있어서,The method of claim 1,
    상기 단계는 MF 또는 DC 전원방식으로 롤투롤 스퍼터링 되는 탄화불소 박막의 제조방법.The step is a roll-to-roll sputtering method of manufacturing a fluorocarbon thin film by MF or DC power supply method.
  4. 제 1항에 있어서, The method of claim 1,
    상기 기능화제는 전도성 입자, 전도성 고분자 및 금속성분에서 선택되는 하나 이상인 탄화불소 박막의 제조방법.The functionalizing agent is a method for producing a fluorocarbon thin film of at least one selected from conductive particles, conductive polymers and metal components.
  5. 제 4항에 있어서, The method of claim 4, wherein
    상기 불소계고분자 복합 타겟은 금속유기물, 금속산화물, 금속탄소체, 금속수산화물, 금속카보네이트, 금속바이카보네이트, 금속질화물 및 금속불화물에서 선택되는 하나 이상의 금속화합물을 더 포함하는 탄화불소 박막의 제조방법.The fluorine-based polymer composite target is a method for producing a fluorocarbon thin film further comprising at least one metal compound selected from metal organic matter, metal oxide, metal carbon body, metal hydroxide, metal carbonate, metal bicarbonate, metal nitride and metal fluoride.
  6. 제 4항에 있어서, The method of claim 4, wherein
    상기 전도성입자는 카본나노튜브, 카본나노섬유, 카본블랙, 그래핀, 그라파이트 및 탄소섬유에서 선택되는 하나 이상인 탄화불소 박막의 제조방법.The conductive particles are at least one selected from carbon nanotubes, carbon nanofibers, carbon black, graphene, graphite and carbon fibers.
  7. 제 4항에 있어서, The method of claim 4, wherein
    상기 전도성 고분자는 폴리아닐린, 폴리아세틸렌, 폴리티오펜, 폴리피롤, 폴리플루렌, 폴리피렌, 폴리아줄렌, 폴리나프탈렌, 폴리페닐렌, 폴리페닐렌비닐렌, 폴리카르바졸, 폴리인돌, 폴리아제핀, 폴리에틸렌, 폴리에틸렌비닐렌, 폴리페닐렌설파이드, 폴리퓨란, 폴리셀레노펜, 폴리텔루로펜 및 폴리설퍼 나이트라이드에서 선택되는 하나 이상인 탄화불소 박막의 제조방법.The conductive polymer may be polyaniline, polyacetylene, polythiophene, polypyrrole, polyfluene, polypyrene, polyazulene, polynaphthalene, polyphenylene, polyphenylenevinylene, polycarbazole, polyindole, polyazene, polyethylene, A method for producing a fluorocarbon thin film of at least one selected from polyethylenevinylene, polyphenylene sulfide, polyfuran, polyselenophene, polytelurophene and polysulfur nitride.
  8. 제 4항에 있어서, The method of claim 4, wherein
    상기 금속성분은 구리, 알루미늄, 은, 금, 텅스텐, 실리콘, 마그네슘, 니켈, 몰리브덴, 바나듐, 나이오븀, 타이타늄, 백금, 크롬 및 탄탈륨에서 선택되는 하나 이상인 탄화불소 박막의 제조방법.The metal component is a method for producing a fluorocarbon thin film of at least one selected from copper, aluminum, silver, gold, tungsten, silicon, magnesium, nickel, molybdenum, vanadium, niobium, titanium, platinum, chromium and tantalum.
  9. 제 1항에 있어서, The method of claim 1,
    상기 단계는 반응가스 주입하에서 반응성 스퍼터링이 수행되는 것인 탄화불소 박막의 제조방법.The step is a method for producing a fluorocarbon thin film that reactive sputtering is performed under reaction gas injection.
  10. 제 9항에 있어서,The method of claim 9,
    상기 반응가스는 산소, 오존, 과산화수소, 아모니아, 아산화질소, 일산화질소, 이산화질소, 질소, 사불화탄소 및 하이드라진에서 선택되는 탄화불소 박막의 제조방법.The reaction gas is a method for producing a fluorocarbon thin film selected from oxygen, ozone, hydrogen peroxide, ammonia, nitrous oxide, nitrogen monoxide, nitrogen dioxide, nitrogen, carbon tetrafluoride and hydrazine.
  11. 제 10항에 있어서, The method of claim 10,
    상기 반응가스는 아르곤, 헬륨, 네온 및 질소에서 선택되는 하나 이상의 공정가스와 함께 주입되는 것인 탄화불소 박막의 제조방법.The reaction gas is injected with at least one process gas selected from argon, helium, neon and nitrogen fluorine carbide thin film manufacturing method.
  12. 제 11항에 있어서, The method of claim 11,
    상기 공정가스와 반응가스의 혼합비(공정가스:반응가스)는 1:1 내지 1000:1인 탄화불소 박막의 제조방법.The mixing ratio of the process gas and the reaction gas (process gas: reaction gas) is 1: 1 to 1000: 1 method for producing a fluorocarbon thin film.
  13. 제 1항에 있어서, The method of claim 1,
    상기 단계 이후, 표면처리 가스를 주입하여 플라즈마 표면처리하는 단계를 더 포함하는 탄화불소 박막의 제조방법.After the step, injecting the surface treatment gas further comprising the step of plasma surface treatment method of manufacturing a fluorocarbon thin film.
  14. 제 13항에 있어서,The method of claim 13,
    상기 표면처리 가스는 아르곤, 질소, 산소, 사불화탄소 및 수소에서 선택되는 하나 이상인 탄화불소 박막의 제조방법.The surface treatment gas is at least one selected from argon, nitrogen, oxygen, carbon tetrafluoride and hydrogen fluorocarbon thin film manufacturing method.
  15. 제 13항에 있어서,The method of claim 13,
    상기 표면처리 가스는 1 내지 1000 sccm의 유량을 주입되는 탄화불소 박막의 제조방법.The surface treatment gas is a method for producing a fluorocarbon thin film is injected to a flow rate of 1 to 1000 sccm.
  16. 제 1항에 있어서,The method of claim 1,
    상기 스퍼터링은 0.1 내지 15 W/㎠의 파워로 플라즈마를 형성하여 수행되는 것인 탄화불소 박막의 제조방법.The sputtering is a method of manufacturing a fluorocarbon thin film that is performed by forming a plasma with a power of 0.1 to 15 W / ㎠.
  17. 제 1항에 있어서,The method of claim 1,
    상기 기재는 실리콘, 금속, 세라믹, 수지, 종이, 유리, 수정, 섬유, 플라스틱 및 유기 고분자에서 선택되는 것인 탄화불소 박막의 제조방법.The substrate is a method of manufacturing a fluorocarbon thin film that is selected from silicon, metal, ceramic, resin, paper, glass, quartz, fiber, plastic and organic polymer.
  18. 기재 상에 기능화제를 포함하는 불소계고분자 복합 타겟을 이용하여 스퍼터링하여 형성된 성형체.A molded article formed by sputtering on a substrate using a fluorine-based polymer composite target containing a functionalizing agent.
  19. 제 18항에 있어서, The method of claim 18,
    수분과의 접촉각이 90 내지 150 °범위인 성형체.Molded body having a contact angle with water in the range of 90 to 150 °.
  20. 제 19항에 있어서, The method of claim 19,
    헥사데칸과의 접촉각이 50°내지 70°범위인 성형체.Molded products with a contact angle with hexadecane ranging from 50 ° to 70 °.
  21. 제 18항에 있어서, The method of claim 18,
    상기 성형체는 MF 또는 DC 전원방식으로 스퍼터링되는 것인 성형체.The molded body is sputtered by MF or DC power supply.
  22. 전도성 입자, 전도성 고분자 및 금속성분에서 선택되는 하나 이상을 포함하는 불소계고분자로 제조되는 불소계고분자 복합타켓을 챔버내에 가지고, 기재를 공급하는 언와인더 챔버, 상기 기재의 일면에 탄화불소 박막을 증착하는 메인 챔버 및 증착된 탄화불소 박막을 권취하는 와인더 챔버를 포함하고, 상기 메인 챔버에는 3개의 MF 듀얼 스퍼터링 캐소드와 1개의 DC 싱글 스퍼터링 캐소드를 가지는 롤투롤 방식의 스퍼터링 증착 시스템.A fluorine-based polymer composite target made of fluorine-based polymer containing at least one selected from conductive particles, conductive polymers and metal components in the chamber, and an unwinder chamber for supplying a substrate, and depositing a fluorocarbon thin film on one surface of the substrate. A roll-to-roll type sputtering deposition system comprising a main chamber and a winder chamber for winding the deposited fluorocarbon thin film, wherein the main chamber has three MF dual sputtering cathodes and one DC single sputtering cathode.
PCT/KR2016/009757 2015-09-01 2016-09-01 Method for manufacturing fluorocarbon thin film WO2017039339A1 (en)

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KR1020150182969A KR101817679B1 (en) 2015-12-21 2015-12-21 Fabrics with super water-repellent function including fluorocarbon thin film and Method of Manufacturing The Same
KR10-2015-0182969 2015-12-21
KR1020160013829A KR101791983B1 (en) 2016-02-04 2016-02-04 Transparent hard coating film with high hardness properties and Method of Manufacturing The Same
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