JP2004268311A - Highly scratch-resistant film for preventing adhesion of stain - Google Patents

Highly scratch-resistant film for preventing adhesion of stain Download PDF

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Publication number
JP2004268311A
JP2004268311A JP2003059346A JP2003059346A JP2004268311A JP 2004268311 A JP2004268311 A JP 2004268311A JP 2003059346 A JP2003059346 A JP 2003059346A JP 2003059346 A JP2003059346 A JP 2003059346A JP 2004268311 A JP2004268311 A JP 2004268311A
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film
resistant
scratch
thin film
stain
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JP2003059346A
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JP4175919B2 (en
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Yoshihiro Kishimoto
好弘 岸本
Minoru Komada
実 駒田
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Dai Nippon Printing Co Ltd
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Dai Nippon Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a highly scratch-resistant film for preventing the adhesion of stain which is arranged on the surface of an object having to be prevented from the adhesion of the stain and the occurrence of a scratch not only to prevent surface staining but also to reduce an external impact. <P>SOLUTION: The highly scratch-resistant film for preventing the adhesion of a stain is obtained by laminating an inorganic thin film layer and a water repelling resin layer on a base film in this order and the inorganic thin film layer is formed by a vacuum film forming method while the water repelling resin layer is composed of a fluororesin having a silicon atom at the terminal of the polymer main chain thereof. By this constitution, the silicon atom positioned at the terminal of the polymer main chain of the fluororesin constituting the water repelling resin layer is bonded to the constituent atom of the inorganic thin film layer to enhance the adhesion of the water repelling resin layer and the inorganic thin film layer. The adhesion of the stain to the water repelling resin layer is prevented by the fluororesin, the coefficient of surface friction of the water repelling resin layer is reduced by the fluoroplastic to reduce the impact due to foreign matter to the film. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、汚れ付着防止高耐擦過性フィルムに係り、例えば、建材やタッチパネル、ディスプレイ等における表面の汚れ、擦過発生を防止するための汚れ付着防止高耐擦過性フィルムに関する。
【0002】
【従来の技術】
【特許文献1】特願平8−16875号公報
タッチパネルは、CRTやLCD等のディスプレイ上に配置され、表示を見ながら指等で押さえることによりデータや指示、命令等を入力できる装置であり、例えば、現金自動預け払い機のデータ入力等に使用されている。このようなタッチパネルは不特定多数の人が利用して接触するため汚れが付着し易く、表示の視認性が低下するという問題があった。
また、表面を樹脂フィルムで被覆した建材、家具等においても、多数の人が接触したり、空気中の汚染物質の付着等により表面が汚れて美感が損なわれるという問題があった。
上記のような問題を解消するために、例えば、タッチパネルをフィルムでカバーし、自動巻取り機構によって操作回ごとにフィルムを必要量巻取ることにより、常時きれいなフィルム面を使用可能とすることが提案されている(特許文献1)。
【0003】
【発明が解決しようとする課題】
しかし、タッチパネルを利用したCRTやLCD等のディスプレイにフィルムの自動巻取り機構を組み込む必要があり、装置の構造が複雑となり、また、大型化し、製造コストの増大、設置スペースの拡大を来たすという問題があった。また、一般住宅等で使用される建材や家具では、特別な装置等の設置を必要とするような汚れ防止手段の採用は不可能である。
また、近年では、パチンコ等の遊戯施設においてのLCD化も開発されており、LCDの透明電極基板が異物(例えば、パチンコ球、ゲーム用コイン等)によって衝撃を受けるという問題も生じている。
本発明は、このような実情に鑑みてなされたものであり、汚れ防止や擦過発生防止が必要な対象物の表面に配設することにより、表面汚れを防止することができ、また、外部衝撃を緩和することのできる汚れ付着防止高耐擦過性フィルムを提供することを目的とする。
【0004】
【課題を解決するための手段】
このような目的を達成するために、本発明の汚れ付着防止高耐擦過性フィルムは、基材フィルム上に無機薄膜層と撥水性樹脂層とをこの順に積層して備え、前記無機薄膜層は真空成膜法により形成された薄膜であり、前記撥水性樹脂層は高分子主鎖末端に珪素原子を有するフッ素系樹脂からなるような構成とした。
本発明の好ましい態様として、前記フッ素系樹脂の平均分子量が1000〜100000の範囲にあるような構成とした。
本発明の好ましい態様として、前記フッ素系樹脂中に末端珪素原子が0.02〜4重量%の範囲内で存在するような構成とした。
本発明の好ましい態様として、前記撥水性樹脂層は真空成膜法により形成された厚み0.001〜0.5μmの範囲内の薄膜であるような構成とした。
【0005】
本発明の好ましい態様として、前記無機薄膜層は、酸化珪素、窒化珪素、窒化酸化珪素、炭化珪素、炭化酸化珪素、または、酸化アルミニウムであるような構成とした。
本発明の好ましい態様として、前記基材フィルムに所望の絵柄、模様が形成されているような構成とした。
本発明の好ましい態様として、前記基材フィルムの一方の面に透明導電膜が形成されているような構成、前記基材フィルムと前記透明電極膜の間に無機薄膜からなるガスバリア膜が形成されているような構成とした。
本発明の好ましい態様として、ディスプレイ面の保護フィルムとして使用するような構成とした。
【0006】
このような本発明では、撥水性樹脂層を構成するフッ素系樹脂の高分子主鎖末端に位置する珪素原子が無機薄膜層の構成原子と結合して、撥水性樹脂層と無機薄膜層との密着性を高いものとし、フッ素系樹脂が撥水性樹脂層への汚れ付着を阻止する作用をなし、また、フッ素系樹脂が撥水性樹脂層の表面摩擦係数を小さいものとし、異物による衝撃を緩和させる作用もなす。
【0007】
【発明の実施の形態】
次に、本発明の実施形態について図面を参照しながら説明する。
図1は本発明の汚れ付着防止高耐擦過性フィルムの一実施形態を示す概略断面図である。図1において、汚れ付着防止高耐擦過性フィルム1は基材フィルム2と、この基材フィルム2の一方の面に形成された無機薄膜層3と撥水性樹脂層4とを備えている。このような本発明の汚れ付着防止高耐擦過性フィルム1において、無機薄膜層3は真空成膜法により形成された薄膜であり、撥水性樹脂層4は高分子主鎖末端に珪素原子を有するフッ素系樹脂からなるものである。
【0008】
また、図2は本発明の汚れ付着防止高耐擦過性フィルムの他の実施形態を示す概略断面図である。図2において、汚れ付着防止高耐擦過性フィルム11は絵柄・模様層15を有する基材フィルム12と、この基材フィルム12の絵柄・模様層15上に形成された無機薄膜層13と撥水性樹脂層14とを備えている。このような本発明の汚れ付着防止高耐擦過性フィルム11において、無機薄膜層13は真空成膜法により形成された薄膜であり、撥水性樹脂層14は高分子主鎖末端に珪素原子を有するフッ素系樹脂からなるものである。このような汚れ付着防止高耐擦過性フィルム11は、例えば、CRT、LCD等のディスプレイ面に保護層として使用したり、建材、家具等の表面を被覆するように接着して使用することができる。
【0009】
また、図3は本発明の汚れ付着防止高耐擦過性フィルムの他の実施形態を示す概略断面図である。図3において、汚れ付着防止高耐擦過性フィルム21は基材フィルム22と、この基材フィルム22の一方の面に形成された無機薄膜層23と撥水性樹脂層24と、基材フィルム22の他方の面に形成された透明導電膜26とを備えている。このような本発明の汚れ付着防止高耐擦過性フィルム21において、無機薄膜層23は真空成膜法により形成された薄膜であり、撥水性樹脂層24は高分子主鎖末端に珪素原子を有するフッ素系樹脂からなるものである。このような汚れ付着防止高耐擦過性フィルム21は、例えば、タッチパネルの上部透明電極シートとして使用することができる。
【0010】
さらに、図4は本発明の汚れ付着防止高耐擦過性フィルムの他の実施形態を示す概略断面図である。図4において、汚れ付着防止高耐擦過性フィルム21′は、上述の汚れ付着防止高耐擦過性フィルム21と同様に、基材フィルム22と無機薄膜層23と撥水性樹脂層24と、基材フィルム22の他方の面に形成された透明導電膜26とを備えるとともに、基材フィルム22と透明電極膜26の間に無機薄膜からなるガスバリア膜27を備えている。このような本発明の汚れ付着防止高耐擦過性フィルム21′において、無機薄膜層23は真空成膜法により形成された薄膜であり、撥水性樹脂層24は高分子主鎖末端に珪素原子を有するフッ素系樹脂からなるものである。このような汚れ付着防止高耐擦過性フィルム21′は、例えば、タッチパネルの上部透明電極シートとして使用することができる。
【0011】
次に、上述の本発明の汚れ付着防止高耐擦過性フィルムの各構成部材について説明する。
本発明の汚れ付着防止高耐擦過性フィルムを構成する基材フィルムは、無機薄膜層と撥水性樹脂層を保持し得るフィルムであれば特に制限はなく、汚れ付着防止高耐擦過性フィルムの使用目的等から適宜選択することができる。具体的には、基材フィルムとしてポリエチレン、ポリプロピレン、ポリブテン等のポリオレフィン系樹脂;環状ポリオレフィン等の非晶質ポリオレフィン系樹脂;(メタ)アクリル系樹脂;ポリ塩化ビニル系樹脂;ポリスチレン系樹脂;エチレン−酢酸ビニル共重合体ケン化物;ポリビニルアルコール樹脂、エチレン−ビニルアルコール共重合体等のポリビニルアルコール系樹脂;ポリカーボネート系樹脂;ポリビニルブチラート樹脂;ポリアリレート樹脂;エチレン−四フッ化エチレン共重合体、三フッ化塩化エチレン、四フッ化エチレン−パーフルオロアルキルビニルエーテル共重合体、フッ化ビニリデン、フッ化ビニル、パーフルオロ−パーフロロプロピレン−パーフロロビニルエーテル共重合体等のフッ素系樹脂;ポリ酢酸ビニル系樹脂;アセタール系樹脂;ポリエチレンテレフタレート(PET)、ポリエチレン2,6−ナフタレート(PEN)等のポリエステル系樹脂;ナイロン6、ナイロン12、共重合ナイロン等のポリアミド系樹脂;ポリイミド樹脂;ポリエーテルイミド樹脂;ポリサルホン樹脂;ポリエーテルサルホン樹脂;ポリエーテルエーテルケトン樹脂等の延伸(一軸ないし二軸)または未延伸の可撓性透明樹脂フィルムを用いることができる。基材フィルムの厚さとしては、5〜1000μm、好ましくは10〜200μmの範囲内で適宜設定することができる。
【0012】
本発明の汚れ付着防止高耐擦過性フィルムを構成する無機薄膜層は、CVD(化学気相蒸着)法、プラズマCVD法、スパッタリング法、物理蒸着法、イオンプレーティング法等の真空成膜法により形成したものである。無機薄膜層の材質としては、酸化珪素、窒化珪素、窒化酸化珪素、炭化珪素、炭化酸化珪素、酸化アルミニウム、窒化アルミニウム、窒化酸化アルミニウム、酸化チタン、酸化マグネシウム、酸化インジウム、酸化スズ、酸化亜鉛等を挙げることができ、これらの1種を単独で、あるいは、これらを任意に混合して使用することができる。この中で、基材フィルムと撥水性樹脂層における後述するアルコキシシランとの反応性の点から、酸化珪素、窒化珪素、窒化酸化珪素、炭化珪素、炭化酸化珪素が特に好ましく用いられる。
【0013】
このような無機薄膜層の厚みは1〜1000nm、好ましくは5〜150nmの範囲で適宜設定することができる。無機薄膜層の厚みが上記の範囲未満であると、撥水性樹脂層との高い密着性を発現することができない。また、無機薄膜層の厚みが上記の範囲を超えると、逆に応力等によるクラックが生じ易くなるとともに、成膜に要する時間が長くなり好ましくない。
【0014】
本発明の汚れ付着防止高耐擦過性フィルムを構成する撥水性樹脂層は汚れ付着防止機能を発現するためのものである。このような撥水性樹脂層は、高分子主鎖末端に珪素原子を有するフッ素系樹脂からなるものである。
撥水性樹脂層を形成するためのフッ素系樹脂は、上記の高分子主鎖が、例えば、CF=、−CF−、−CFH−等の繰り返し単位を有するものであってよい。また、高分子主鎖末端に位置する珪素原子には、アルコキシ基が酸素−珪素結合により付加していることが好ましい。この末端珪素原子は、フッ素系樹脂中に0.02〜4重量%の範囲内で存在することが好ましい。末端珪素原子の存在量が0.02重量%未満であると、無機薄膜層と撥水性樹脂層4との密着性が不十分となり、また、末端珪素原子の存在量が4重量%を超えると、高分子主鎖の相対的分子量が低下し、それにより無機薄膜層の表面全体を覆うことが困難になり、機能劣化を来たすため好ましくない。このようなフッ素系樹脂は、その平均分子量が1000〜100000、好ましくは2000〜10000の範囲であるものが望ましい。フッ素系樹脂の平均分子量が1000未満であると、無機薄膜層の表面全体を覆うことが困難となり、また、平均分子量が100000を超えると、溶剤に対する溶解性が乏しくなり、また、蒸気圧も高くなるため成膜が困難となり好ましくない。
【0015】
撥水性樹脂層は、上記のフッ素系樹脂を含有する樹脂組成物を用いて、ロールコート、グラビアコート、ナイフコート、ディップコート、スプレイコート等のコーティング法で無機薄膜層上にコーティングし、その後、溶剤や希釈剤等を乾燥除去して形成することができる。また、撥水性樹脂層は、上記のフッ素系樹脂を使用して真空成膜法によっても形成することができる。真空成膜法により撥水性樹脂層を形成することにより、コーティング法に比べて上記フッ素系樹脂の使用量を低減することができ、製造コスト的に有利である。このように形成された撥水性樹脂層では、フッ素系樹脂の高分子主鎖末端に位置する珪素原子が無機薄膜層の構成原子と結合しており、これにより、撥水性樹脂層と無機薄膜層との密着性は極めて高いものとなる。
【0016】
上記のような撥水性樹脂層の厚みは0.0005〜5μm、好ましくは0.001〜2μm、より好ましくは0.001〜0.5μmの範囲で適宜設定することができる。撥水性樹脂層の厚みが0.0005μm未満であると、充分な汚れ付着防止機能を発現することが困難となり、また、撥水性樹脂層の厚みが5μmを超えると、生産性の低下、光透過率の低下、膜応力によるカールの発生が生じ易くなり好ましくない。
【0017】
また、汚れ付着防止高耐擦過性フィルム11を構成する絵柄・模様層15は、基材フィルム12上にグラビア印刷、スクリーン印刷等の公知の印刷法、あるいは、公知の転写フィルム等を用いて形成することができる。また、本発明では、基材フィルム12を多層構造とし、中間層として絵柄・模様層を有するものを使用してもよい。
【0018】
さらに、汚れ付着防止高耐擦過性フィルム21を構成する透明導電膜26は、例えば、酸化インジウムスズ、酸化インジウム、酸化スズ、金、銀、パラジウム等の公知の導電性物質を用いて、真空成膜法等にて形成することができる。図示例では、透明導電膜26は基材フィルム22の全面に形成されているが、これに限定されるものではなく、所定の電極パターンとして形成されてもよい。
【0019】
また、汚れ付着防止高耐擦過性フィルム21′を構成する無機薄膜からなるガスバリア膜27は、CVD(化学気相蒸着)法、プラズマCVD法、スパッタリング法、物理蒸着法、イオンプレーティング法等の真空成膜法により形成することができる。このガスバリア膜27の無機薄膜の材質としては、酸化珪素、窒化珪素、窒化酸化珪素、炭化珪素、炭化酸化珪素、酸化アルミニウム、窒化アルミニウム、窒化酸化アルミニウム、酸化チタン、酸化マグネシウム、酸化インジウム、酸化スズ、酸化亜鉛等を挙げることができ、これらの1種を単独で、あるいは、これらを任意に混合して使用することができる。この中で、電極パターニング耐性の点から、酸化珪素、窒化珪素、窒化酸化珪素、炭化珪素、炭化酸化珪素が特に好ましく用いられる。
【0020】
このようなガスバリア膜の厚みは1〜1000nm、好ましくは5〜150nmの範囲で適宜設定することができる。ガスバリア膜の厚みが1nm未満であると、十分がガスバリア性を発現することができず、また、ガスバリア膜が1000nmを超えると、逆に応力等によるクラックが生じ易くなるとともに、成膜に要する時間が長くなり好ましくない。
【0021】
【実施例】
次に、実施例を示して本発明を更に詳細に説明する。
[実施例1]
(無機薄膜層の形成)
基材フィルム2としてシート状の2軸延伸ポリエステルフィルム(東洋紡績(株)製A−4100、厚み100μm、大きさ20cm×20cm)を準備し、スパッタリング装置のチャンバー内の下部電極に平滑面を上側(成膜面側)として装着した。次いで、チャンバー内を油回転ポンプおよびターボ分子ポンプにより、到達真空度0.0005Paまで減圧した。上記のスパッタリング装置は、チャンバーとともに、電源、排気弁、排気装置、ガス導入口を備えていものを使用した。
【0022】
また、ターゲットとしてのシリコンと、酸素ガス(太陽東洋酸素(株)製(純度99.9999%以上))を準備した。
次に、下部電極に電力(投入電力2kW)を印加した。そして、電極近傍に設けられたガス導入口からチャンバー内に、酸素2sccmを導入し、排気装置とチャンバーとの間にある排気弁の開閉度を制御することにより、成膜チャンバー内圧力を0.2Paに保ち、基材フィルム上に厚み100nmの珪素酸化膜からなる無機薄膜層を形成した。尚、sccmとは、standard cubic centimeter per minuteの略であり、以下の比較例においても同様である。
(撥水性樹脂層の形成)
【0023】
下記組成の撥水性樹脂層形成用の樹脂組成物を調製した。この樹脂組成物中のフッ素系樹脂の平均分子量をゲルパーミエションクロマトグラフィ法により測定した結果、5000であった。また、フッ素系樹脂中には、末端珪素原子が0.6重量%存在するものであった。
撥水性樹脂層形成用の樹脂組成物
・フッ素系樹脂 … 0.1重量部
(ダイキン工業(株)製オプツールDSX)
・1,1,1,2,2,3,3,4,5,5,5−ウンデカフルオロ−4−
(トリフルオロメチル)ペンタン … 100重量部
【0024】
次いで、上述の無機薄膜層を形成した基材フィルムを、無機薄膜層が上側となるようにガラス基板上に固定し、無機薄膜層上にスピンコーターを用いて上記の樹脂組成物を塗布し、その後、60℃のオーブン中で60分間熱処理を施した。これにより、無機薄膜層上に撥水性樹脂層を形成し、本発明の汚れ付着防止高耐擦過性フィルムを得た。
このように作製した汚れ付着防止高耐擦過性フィルムについて、下記の条件で汚れ付着試験、および、耐擦過性試験を行った。その結果、撥水性樹脂層の汚れ付着防止効果が実用レベル以上であることが確認された。また、汚れ付着防止高耐擦過性フィルムを80℃、相対湿度90%RHの環境試験機(湿熱オーブン)に500時間保管した後に、同様の条件で汚れ付着試験を行った。その結果、無機薄膜層と撥水性樹脂層との密着性が高く、撥水性樹脂層が安定して汚れ付着防止効果(10度の拭取り性試験のいずれも拭取り回数が10回以下)を発現することが確認された。また、耐擦過性も良好であり、傷抑止効果があることが確認された。
【0025】
汚れ付着試験条件
マジック拭取り性試験を実施した。すなわち、ぺんてる(株)製油性フェルトペン(黒、赤の2種)を用いて、汚れ付着防止高耐擦過性フィルムの撥水性樹脂層上に油性インキを塗布し、24時間後に白十字(株)製の救急綿にて拭取り、油性インキが完全に拭取れるまでの拭取り回数を測定した。この試験を10度繰り返した。尚、拭取り回数が10回以下である状態を、汚れ付着防止効果が実用レベル以上にあると判断した。
【0026】
耐擦過性試験条件
#0000のスチール・ウールで約1kg/cmの荷重をかけながら5往復表面擦過して傷の程度を目視評価した。この試験を10度繰り返した。尚、目視で傷跡が明瞭なものを不可とし、目視で傷跡が不明瞭なものを傷抑止効果が実用レベル以上にあると判断した。
【0027】
[実施例2]
(無機薄膜層の形成)
実施例1と同様にして、基材フィルム上に厚み100nmの珪素酸化膜からなる無機薄膜層を形成した。
【0028】
(撥水性樹脂層の形成)
真空蒸着装置のチャンバー内の基板ホルダーに上記の基材フィルムを珪素酸化膜面が表側(成膜面側)となるように装着した。次いで、チャンバー内を油回転ポンプおよびターボ分子ポンプにより、到達真空度0.005Paまで減圧した。上記の真空蒸着装置は、チャンバーとともに、電源、排気弁、排気装置、ガス導入口を備えていものを使用した。
また、蒸着材料としてのフッ素系樹脂(ダイキン工業(株)製オプツールDSX)をハース内に準備した。
次に、ハースを加熱し、排気装置とチャンバーとの間にある排気弁の開閉度を制御することにより、チャンバー内圧力を0.2Paに保ち、基材フィルムの珪素酸化膜上に厚み5nmの撥水性樹脂層を形成した。
【0029】
このように作製した汚れ付着防止高耐擦過性フィルムについて、実施例1と同様の条件で汚れ付着試験、耐擦過性試験を行った。その結果、撥水性樹脂層の汚れ付着防止効果が実用レベル以上であることが確認された。また、汚れ付着防止高耐擦過性フィルムを80℃、相対湿度90%RHの環境試験機(湿熱オーブン)に500時間保管した後に、同様の条件で汚れ付着試験を行った。その結果、無機薄膜層と撥水性樹脂層との密着性が高く、撥水性樹脂層が安定して汚れ付着防止効果(10度の拭取り性試験のいずれも拭取り回数が10回以下)を発現することが確認された。また、耐擦過性も良好であり、傷抑止効果があることが確認された。
【0030】
[比較例]
撥水性樹脂層形成用の樹脂組成物として、下記組成の樹脂組成物を調製して使用した他は、実施例と同様にして、比較フィルムを得た。使用した樹脂組成物中のフッ素系樹脂の平均分子量を実施例と同様に測定した結果、5000であり、フッ素系樹脂中の高分子主鎖には珪素原子が存在しないものであった。
撥水性樹脂層形成用の樹脂組成物
・フッ素系樹脂 … 0.1重量部
(セントラル硝子(株)製セフラルルーブI)
・1,1,1,2,2,3,3,4,5,5,5−ウンデカフルオロ−4−
(トリフルオロメチル)ペンタン … 100重量部
【0031】
このように作製した比較フィルムについて、実施例と同様の条件で汚れ付着試験、耐擦過性試験を行った。その結果、撥水性樹脂層の汚れ付着防止効果が実用レベル以上であることが確認された。しかし、比較フィルムを80℃、相対湿度90%RHの環境試験機(湿熱オーブン)に500時間保管した後に、同様の条件で汚れ付着試験を行った。その結果、1度目の拭取り性試験では、拭取り回数が10回以下で油性インキが拭取れたが、2度目以降の拭取り性試験では、汚れ付着が多く、実用レベルに達しないものであった。また、耐擦過性も不良であり、擦過後傷跡が明瞭であった。
【0032】
【発明の効果】
以上詳述したように、本発明によれば汚れ付着防止高耐擦過性フィルムは基材フィルム上に無機薄膜層と撥水性樹脂層とをこの順に積層して備え、無機薄膜層は真空成膜法により形成された薄膜であって基材フィルムに強固に固着されており、また、撥水性樹脂層が高分子主鎖末端に珪素原子を有するフッ素系樹脂からなるので、上記の高分子主鎖末端に位置する珪素原子が無機薄膜層の構成原子と結合し、これにより、撥水性樹脂層と無機薄膜層との密着性は極めて高いものとなり、フッ素系樹脂を含有する撥水性樹脂層は、汚れ付着を抑制する機能を安定して発現する。また、撥水性樹脂層の表面摩擦係数が小さいため、異物等による外部からの衝撃を緩和することができ、優れた耐擦過性を具備したものとなる。
【図面の簡単な説明】
【図1】本発明の汚れ付着防止高耐擦過性フィルムの一実施形態を示す概略断面図である。
【図2】本発明の汚れ付着防止高耐擦過性フィルムの他の実施形態を示す概略断面図である。
【図3】本発明の汚れ付着防止高耐擦過性フィルムの他の実施形態を示す概略断面図である。
【図4】本発明の汚れ付着防止高耐擦過性フィルムの他の実施形態を示す概略断面図である。
【符号の説明】
1,11,21…汚れ付着防止高耐擦過性フィルム
2,12,22…基材フィルム
3,13,23…無機薄膜層
4,14,24…撥水性樹脂層
15…絵柄・模様層
26…透明導電膜
27…ガスバリア膜
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a stain-adhesion-preventing, high-scratch-resistant film, and more particularly to a stain-adhesion-prevention, high-scratch-resistant film for preventing the occurrence of surface stains and scratches in building materials, touch panels, displays, and the like.
[0002]
[Prior art]
[Patent Document 1] Japanese Patent Application No. 8-16875 A touch panel is a device that is arranged on a display such as a CRT or an LCD, and that can input data, instructions, instructions, etc. by pressing with a finger or the like while watching the display. For example, it is used for data input of an automatic teller machine. Such a touch panel has a problem that dirt easily adheres to the touch panel because it is used by an unspecified number of people and the visibility of display is reduced.
Further, even in building materials, furniture, and the like whose surfaces are covered with a resin film, there is a problem that a large number of people come into contact with each other, or the surface is stained by adhesion of contaminants in the air, and the aesthetic appearance is impaired.
In order to solve the above problems, for example, it is proposed to cover the touch panel with a film and wind up the required amount of film each time the operation is performed by the automatic winding mechanism so that a clean film surface can always be used. (Patent Document 1).
[0003]
[Problems to be solved by the invention]
However, it is necessary to incorporate an automatic film winding mechanism into a display such as a CRT or LCD using a touch panel, which complicates the structure of the device, increases the size, increases the manufacturing cost, and increases the installation space. was there. Further, in building materials and furniture used in general houses and the like, it is impossible to employ a stain prevention means that requires installation of a special device or the like.
In recent years, the use of LCDs in game facilities such as pachinko machines has also been developed, and there has been a problem in that the transparent electrode substrate of the LCDs is impacted by foreign substances (for example, pachinko balls, game coins, etc.).
The present invention has been made in view of such circumstances, and by arranging it on the surface of an object that needs to be prevented from being stained or causing abrasion, the surface can be prevented from being stained. It is an object of the present invention to provide a high-scratch-resistant film for preventing adhesion of dirt, which can alleviate the problem.
[0004]
[Means for Solving the Problems]
In order to achieve such an object, the antifouling film of the present invention has an inorganic thin film layer and a water-repellent resin layer laminated on a base film in this order, and the inorganic thin film layer is It is a thin film formed by a vacuum film-forming method, and the water-repellent resin layer is formed of a fluorine-based resin having a silicon atom at the terminal of a polymer main chain.
In a preferred embodiment of the present invention, the fluorine-based resin has an average molecular weight in a range of 1,000 to 100,000.
As a preferred embodiment of the present invention, the fluorine-based resin is configured so that terminal silicon atoms are present in a range of 0.02 to 4% by weight.
In a preferred embodiment of the present invention, the water-repellent resin layer is a thin film having a thickness in the range of 0.001 to 0.5 μm formed by a vacuum film forming method.
[0005]
In a preferred aspect of the present invention, the inorganic thin film layer is configured to be silicon oxide, silicon nitride, silicon nitride oxide, silicon carbide, silicon carbide oxide, or aluminum oxide.
In a preferred embodiment of the present invention, the base film has a configuration in which a desired picture or pattern is formed.
As a preferred embodiment of the present invention, a structure in which a transparent conductive film is formed on one surface of the base film, and a gas barrier film made of an inorganic thin film is formed between the base film and the transparent electrode film Configuration.
In a preferred embodiment of the present invention, the configuration is such that it is used as a protective film on the display surface.
[0006]
In the present invention, the silicon atom located at the terminal of the polymer main chain of the fluorine-containing resin constituting the water-repellent resin layer is bonded to the constituent atoms of the inorganic thin film layer, and the silicon atom between the water-repellent resin layer and the inorganic thin film layer is formed. Adhesion is high, fluororesin acts to prevent the adhesion of dirt to the water-repellent resin layer, and fluorine-based resin reduces the surface friction coefficient of the water-repellent resin layer to reduce the impact of foreign matter It also has the effect of causing
[0007]
BEST MODE FOR CARRYING OUT THE INVENTION
Next, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic cross-sectional view showing an embodiment of the high-scratch-resistant film for preventing the adhesion of dirt according to the present invention. In FIG. 1, a stain-resistant and high-scratch-resistant film 1 includes a base film 2, an inorganic thin film layer 3 and a water-repellent resin layer 4 formed on one surface of the base film 2. In such a stain-resistant and highly scratch-resistant film 1 of the present invention, the inorganic thin film layer 3 is a thin film formed by a vacuum film forming method, and the water-repellent resin layer 4 has a silicon atom at the terminal of the polymer main chain. It is made of a fluorine-based resin.
[0008]
FIG. 2 is a schematic cross-sectional view showing another embodiment of the high-scratch-resistant film of the present invention. In FIG. 2, a stain-proofing high-scratch-resistant film 11 is composed of a base film 12 having a pattern / pattern layer 15 and an inorganic thin film layer 13 formed on the pattern / pattern layer 15 of the base film 12. And a resin layer 14. In such a film 11 of the present invention, the inorganic thin film layer 13 is a thin film formed by a vacuum film forming method, and the water-repellent resin layer 14 has a silicon atom at the terminal of the polymer main chain. It is made of a fluorine-based resin. Such a stain-resistant and high-scratch-resistant film 11 can be used, for example, as a protective layer on a display surface of a CRT, LCD, or the like, or can be used by bonding so as to cover the surface of a building material, furniture, or the like. .
[0009]
FIG. 3 is a schematic cross-sectional view showing another embodiment of the stain-preventing high scratch-resistant film of the present invention. In FIG. 3, a stain adhesion preventing high abrasion resistant film 21 is a base film 22, an inorganic thin film layer 23 and a water repellent resin layer 24 formed on one surface of the base film 22, and a base film 22. And a transparent conductive film 26 formed on the other surface. In such a stain-resistant and highly scratch-resistant film 21 of the present invention, the inorganic thin film layer 23 is a thin film formed by a vacuum film forming method, and the water-repellent resin layer 24 has a silicon atom at the terminal of the polymer main chain. It is made of a fluorine-based resin. Such a stain-resistant and high-scratch-resistant film 21 can be used, for example, as an upper transparent electrode sheet of a touch panel.
[0010]
FIG. 4 is a schematic cross-sectional view showing another embodiment of the stain-preventing high scratch-resistant film of the present invention. In FIG. 4, a stain-proof high-scratch-resistant film 21 ′ comprises a base film 22, an inorganic thin film layer 23, a water-repellent resin layer 24, A transparent conductive film 26 is formed on the other surface of the film 22, and a gas barrier film 27 made of an inorganic thin film is provided between the base film 22 and the transparent electrode film 26. In such a film 21 'for preventing fouling of the present invention, the inorganic thin film layer 23 is a thin film formed by a vacuum film forming method, and the water-repellent resin layer 24 has a silicon atom at the terminal of the polymer main chain. It is made of a fluorine-based resin. Such a stain-resistant and high-scratch-resistant film 21 'can be used, for example, as an upper transparent electrode sheet of a touch panel.
[0011]
Next, each constituent member of the above-mentioned stain-adhesion preventing high scratch-resistant film of the present invention will be described.
There is no particular limitation on the base film constituting the stain-resistant and high-scratch-resistant film of the present invention, as long as it can hold the inorganic thin film layer and the water-repellent resin layer. It can be appropriately selected from the purpose and the like. Specifically, as the base film, a polyolefin resin such as polyethylene, polypropylene and polybutene; an amorphous polyolefin resin such as a cyclic polyolefin; a (meth) acrylic resin; a polyvinyl chloride resin; a polystyrene resin; Saponified vinyl acetate copolymer; polyvinyl alcohol-based resin such as polyvinyl alcohol resin and ethylene-vinyl alcohol copolymer; polycarbonate-based resin; polyvinyl butyrate resin; polyarylate resin; ethylene-tetrafluoroethylene copolymer; Fluorinated resins such as fluorinated ethylene chloride, ethylene tetrafluoride-perfluoroalkyl vinyl ether copolymer, vinylidene fluoride, vinyl fluoride, perfluoro-perfluoropropylene-perfluorovinyl ether copolymer; polyvinyl acetate Fatty acid; Acetal resin; Polyester resin such as polyethylene terephthalate (PET) and polyethylene 2,6-naphthalate (PEN); Polyamide resin such as nylon 6, nylon 12, copolymerized nylon; Polyimide resin; A stretched (uniaxial or biaxial) or unstretched transparent resin film of a polysulfone resin; a polyether sulfone resin; a polyether ether ketone resin or the like can be used. The thickness of the base film can be appropriately set within the range of 5 to 1000 μm, preferably 10 to 200 μm.
[0012]
The inorganic thin film layer constituting the high-scratch-resistant film of the present invention is formed by a vacuum film forming method such as a CVD (chemical vapor deposition) method, a plasma CVD method, a sputtering method, a physical vapor deposition method, or an ion plating method. It was formed. Examples of the material of the inorganic thin film layer include silicon oxide, silicon nitride, silicon nitride oxide, silicon carbide, silicon carbide oxide, aluminum oxide, aluminum nitride, aluminum nitride oxide, titanium oxide, magnesium oxide, indium oxide, tin oxide, and zinc oxide. These can be used singly or as a mixture of any of these. Among them, silicon oxide, silicon nitride, silicon nitride oxide, silicon carbide, and silicon carbide oxide are particularly preferably used from the viewpoint of the reactivity between the base film and the alkoxysilane described later in the water-repellent resin layer.
[0013]
The thickness of such an inorganic thin film layer can be appropriately set in the range of 1 to 1000 nm, preferably 5 to 150 nm. When the thickness of the inorganic thin film layer is less than the above range, high adhesion to the water-repellent resin layer cannot be exhibited. On the other hand, when the thickness of the inorganic thin film layer exceeds the above range, cracks due to stress or the like are liable to occur, and the time required for film formation is undesirably long.
[0014]
The water-repellent resin layer constituting the film for preventing stain adhesion and high abrasion resistance of the present invention is for exhibiting the function of preventing stain adhesion. Such a water-repellent resin layer is made of a fluorine-based resin having a silicon atom at the terminal of the polymer main chain.
The fluorine-based resin for forming the water-repellent resin layer may be one in which the above-mentioned polymer main chain has a repeating unit such as, for example, CF 2 、, —CF 2 —, and —CFH—. Further, it is preferable that an alkoxy group is added to the silicon atom located at the terminal of the polymer main chain through an oxygen-silicon bond. This terminal silicon atom is preferably present in the fluororesin in the range of 0.02 to 4% by weight. If the amount of terminal silicon atoms is less than 0.02% by weight, the adhesion between the inorganic thin film layer and the water-repellent resin layer 4 becomes insufficient, and if the amount of terminal silicon atoms exceeds 4% by weight. In addition, the relative molecular weight of the polymer main chain is reduced, which makes it difficult to cover the entire surface of the inorganic thin film layer, which is not preferable because the function deteriorates. Such a fluororesin preferably has an average molecular weight of 1,000 to 100,000, preferably 2,000 to 10,000. When the average molecular weight of the fluororesin is less than 1,000, it is difficult to cover the entire surface of the inorganic thin film layer, and when the average molecular weight exceeds 100,000, the solubility in a solvent is poor, and the vapor pressure is also high. Therefore, film formation becomes difficult, which is not preferable.
[0015]
The water-repellent resin layer is coated on the inorganic thin film layer by a coating method such as roll coating, gravure coating, knife coating, dip coating, spray coating, using a resin composition containing the above-described fluororesin, It can be formed by drying and removing a solvent and a diluent. Further, the water-repellent resin layer can also be formed by a vacuum film forming method using the above-mentioned fluorine-based resin. By forming the water-repellent resin layer by a vacuum film forming method, the amount of the fluororesin used can be reduced as compared with the coating method, which is advantageous in terms of manufacturing cost. In the water-repellent resin layer thus formed, the silicon atom located at the terminal of the polymer main chain of the fluorine-based resin is bonded to the constituent atoms of the inorganic thin film layer. Is extremely high.
[0016]
The thickness of the water-repellent resin layer as described above can be appropriately set in the range of 0.0005 to 5 μm, preferably 0.001 to 2 μm, more preferably 0.001 to 0.5 μm. When the thickness of the water-repellent resin layer is less than 0.0005 μm, it is difficult to exhibit a sufficient stain-preventing function, and when the thickness of the water-repellent resin layer exceeds 5 μm, productivity is reduced and light transmission is reduced. This is not preferred because the rate of reduction and curling due to film stress are likely to occur.
[0017]
In addition, the picture / pattern layer 15 constituting the stain-resistant high-scratch-resistant film 11 is formed on the base film 12 by a known printing method such as gravure printing, screen printing, or a known transfer film. can do. Further, in the present invention, the base film 12 may have a multilayer structure and may have a pattern / pattern layer as an intermediate layer.
[0018]
Further, the transparent conductive film 26 forming the stain-preventing and high-scratch-resistant film 21 is formed by vacuum forming using a known conductive material such as indium tin oxide, indium oxide, tin oxide, gold, silver, and palladium. It can be formed by a film method or the like. In the illustrated example, the transparent conductive film 26 is formed on the entire surface of the base film 22, but is not limited to this, and may be formed as a predetermined electrode pattern.
[0019]
In addition, the gas barrier film 27 made of an inorganic thin film constituting the stain adhesion preventing high scratch-resistant film 21 ′ is formed by a CVD (chemical vapor deposition) method, a plasma CVD method, a sputtering method, a physical vapor deposition method, an ion plating method, or the like. It can be formed by a vacuum film forming method. Examples of the material of the inorganic thin film of the gas barrier film 27 include silicon oxide, silicon nitride, silicon nitride oxide, silicon carbide, silicon carbide oxide, aluminum oxide, aluminum nitride, aluminum nitride oxide, titanium oxide, magnesium oxide, indium oxide, and tin oxide. , Zinc oxide and the like. One of these can be used alone, or these can be arbitrarily mixed and used. Among them, silicon oxide, silicon nitride, silicon nitride oxide, silicon carbide, and silicon carbide oxide are particularly preferably used from the viewpoint of electrode patterning resistance.
[0020]
The thickness of such a gas barrier film can be appropriately set in the range of 1 to 1000 nm, preferably 5 to 150 nm. If the thickness of the gas barrier film is less than 1 nm, sufficient gas barrier properties cannot be exhibited, and if the thickness of the gas barrier film exceeds 1000 nm, cracks due to stress or the like are likely to occur, and the time required for film formation. Is undesirably long.
[0021]
【Example】
Next, the present invention will be described in more detail with reference to examples.
[Example 1]
(Formation of inorganic thin film layer)
A sheet-shaped biaxially stretched polyester film (A-4100, manufactured by Toyobo Co., Ltd., thickness: 100 μm, size: 20 cm × 20 cm) is prepared as the base film 2, and the smooth surface is placed on the lower electrode in the chamber of the sputtering apparatus. (Film-forming surface side). Next, the pressure in the chamber was reduced to an ultimate vacuum of 0.0005 Pa by an oil rotary pump and a turbo molecular pump. As the above sputtering apparatus, one provided with a power source, an exhaust valve, an exhaust device, and a gas inlet together with a chamber was used.
[0022]
Further, silicon as a target and oxygen gas (purity of 99.9999% or more, manufactured by Taiyo Toyo Oxygen Co., Ltd.) were prepared.
Next, electric power (input power 2 kW) was applied to the lower electrode. Then, by introducing 2 sccm of oxygen into the chamber through a gas inlet provided near the electrode and controlling the opening / closing degree of an exhaust valve between the exhaust device and the chamber, the pressure in the film forming chamber is reduced to 0. While keeping the pressure at 2 Pa, an inorganic thin film layer made of a silicon oxide film having a thickness of 100 nm was formed on the base film. Note that sccm is an abbreviation for standard cubic centimeter per minute, and is the same in the following comparative examples.
(Formation of water-repellent resin layer)
[0023]
A resin composition for forming a water-repellent resin layer having the following composition was prepared. As a result of measuring the average molecular weight of the fluororesin in this resin composition by gel permeation chromatography, it was 5,000. The fluorine resin contained 0.6% by weight of terminal silicon atoms.
Resin composition for forming water-repellent resin layer / fluorine resin 0.1 part by weight (Optool DSX manufactured by Daikin Industries, Ltd.)
・ 1,1,1,2,2,3,3,4,5,5,5-undecafluoro-4-
(Trifluoromethyl) pentane ... 100 parts by weight
Next, the base film on which the inorganic thin film layer is formed is fixed on a glass substrate such that the inorganic thin film layer is on the upper side, and the above resin composition is applied on the inorganic thin film layer using a spin coater, Thereafter, a heat treatment was performed in an oven at 60 ° C. for 60 minutes. As a result, a water-repellent resin layer was formed on the inorganic thin film layer to obtain a stain-resistant and highly scratch-resistant film of the present invention.
With respect to the thus-prepared stain-resistant and highly scratch-resistant film, a stain adhesion test and a scratch resistance test were performed under the following conditions. As a result, it was confirmed that the effect of preventing the water-repellent resin layer from adhering dirt was higher than a practical level. In addition, the stain resistance test was carried out under the same conditions after storing the stain resistant high scratch resistant film in an environmental tester (moist heat oven) at 80 ° C. and a relative humidity of 90% RH for 500 hours. As a result, the adhesiveness between the inorganic thin film layer and the water-repellent resin layer is high, and the water-repellent resin layer is stable and has a dirt adhesion preventing effect (the number of times of wiping is 10 or less in each of the 10-degree wiping test). The expression was confirmed. In addition, the scratch resistance was also good, and it was confirmed that there was a scratch-inhibiting effect.
[0025]
Soil adhesion test conditions A magic wiping test was performed. That is, an oil-based ink is applied on the water-repellent resin layer of the stain-resistant and high-scratch-resistant film using an oil-based felt pen made by Pentel Co., Ltd. (two types: black and red). The number of times of wiping until the oil-based ink was completely wiped off was measured with an emergency cotton manufactured by the company. This test was repeated 10 times. When the number of times of wiping was 10 or less, it was determined that the effect of preventing contamination was more than a practical level.
[0026]
Scratch resistance test conditions Five reciprocal surfaces were rubbed with a steel wool of # 0000 while applying a load of about 1 kg / cm 2 to visually evaluate the degree of scratches. This test was repeated 10 times. It should be noted that those with a clear scar visually were not acceptable, and those with a scarless visual scar were judged to have a scratch-inhibiting effect at or above the practical level.
[0027]
[Example 2]
(Formation of inorganic thin film layer)
In the same manner as in Example 1, an inorganic thin film layer made of a silicon oxide film having a thickness of 100 nm was formed on the base film.
[0028]
(Formation of water-repellent resin layer)
The above substrate film was mounted on a substrate holder in a chamber of a vacuum evaporation apparatus such that the silicon oxide film surface was on the front side (film formation surface side). Next, the pressure in the chamber was reduced to the ultimate vacuum of 0.005 Pa by an oil rotary pump and a turbo molecular pump. As the above-mentioned vacuum deposition apparatus, one provided with a power supply, an exhaust valve, an exhaust device, and a gas inlet together with a chamber was used.
Also, a fluorine-based resin (Optool DSX manufactured by Daikin Industries, Ltd.) was prepared in the hearth as a vapor deposition material.
Next, by heating the hearth and controlling the degree of opening and closing of an exhaust valve between the exhaust device and the chamber, the pressure in the chamber is maintained at 0.2 Pa, and a 5 nm-thick film is formed on the silicon oxide film of the base film. A water-repellent resin layer was formed.
[0029]
A dirt adhesion test and a scratch resistance test were performed on the thus prepared dirt adhesion preventing high scratch resistant film under the same conditions as in Example 1. As a result, it was confirmed that the effect of preventing the water-repellent resin layer from adhering dirt was higher than a practical level. In addition, the stain resistance test was carried out under the same conditions after storing the stain resistant high scratch resistant film in an environmental tester (moist heat oven) at 80 ° C. and a relative humidity of 90% RH for 500 hours. As a result, the adhesiveness between the inorganic thin film layer and the water-repellent resin layer is high, and the water-repellent resin layer is stable and has a dirt adhesion preventing effect (the number of times of wiping is 10 or less in each of the 10-degree wiping test). The expression was confirmed. In addition, the scratch resistance was also good, and it was confirmed that there was a scratch-inhibiting effect.
[0030]
[Comparative example]
A comparative film was obtained in the same manner as in Example, except that a resin composition having the following composition was prepared and used as a resin composition for forming a water-repellent resin layer. The average molecular weight of the fluorine-based resin in the used resin composition was measured in the same manner as in the example. As a result, it was 5,000, and no silicon atom was present in the polymer main chain in the fluorine-based resin.
Resin composition for forming water-repellent resin layer / fluorinated resin 0.1 parts by weight (Cefrallube I manufactured by Central Glass Co., Ltd.)
・ 1,1,1,2,2,3,3,4,5,5,5-undecafluoro-4-
(Trifluoromethyl) pentane ... 100 parts by weight
The comparative film thus produced was subjected to a stain adhesion test and a scratch resistance test under the same conditions as in the example. As a result, it was confirmed that the effect of preventing the water-repellent resin layer from adhering dirt was higher than a practical level. However, after the comparative film was stored in an environmental tester (moist heat oven) at 80 ° C. and a relative humidity of 90% RH for 500 hours, a dirt adhesion test was performed under the same conditions. As a result, in the first wiping test, the oil-based ink was wiped off when the number of wiping was 10 or less, but in the second and subsequent wiping tests, a large amount of dirt was adhered, and the practical level was not reached. there were. In addition, the scratch resistance was poor, and the scar after the scratch was clear.
[0032]
【The invention's effect】
As described above in detail, according to the present invention, the stain-resistant high-scratch-resistant film includes an inorganic thin film layer and a water-repellent resin layer laminated on a base film in this order, and the inorganic thin film layer is formed by vacuum deposition. The thin film formed by the method is firmly fixed to the base film, and the water-repellent resin layer is made of a fluorine-based resin having a silicon atom at the terminal of the polymer main chain, so that the above-mentioned polymer main chain is used. The silicon atom located at the terminal is bonded to a constituent atom of the inorganic thin film layer, whereby the adhesion between the water-repellent resin layer and the inorganic thin film layer becomes extremely high, and the water-repellent resin layer containing a fluorine-based resin is The function to suppress the adhesion of dirt is stably exhibited. In addition, since the surface friction coefficient of the water-repellent resin layer is small, an external impact due to a foreign substance or the like can be reduced, and excellent scratch resistance is provided.
[Brief description of the drawings]
FIG. 1 is a schematic cross-sectional view showing one embodiment of a stain-adhering high-scratch-resistant film of the present invention.
FIG. 2 is a schematic cross-sectional view showing another embodiment of the high-scratch-resistant film for preventing adhesion of dirt according to the present invention.
FIG. 3 is a schematic cross-sectional view showing another embodiment of the high-scratch-resistant film for preventing adhesion of dirt of the present invention.
FIG. 4 is a schematic cross-sectional view showing another embodiment of the high-scratch-resistant film for preventing adhesion of dirt of the present invention.
[Explanation of symbols]
Reference numerals 1, 11, 21: Stain-resistant and high-scratch-resistant films 2, 12, 22 ... Base films 3, 13, 23 ... Inorganic thin film layers 4, 14, 24 ... Water-repellent resin layer 15: Picture / pattern layer 26 ... Transparent conductive film 27: gas barrier film

Claims (9)

基材フィルム上に無機薄膜層と撥水性樹脂層とをこの順に積層して備え、前記無機薄膜層は真空成膜法により形成された薄膜であり、前記撥水性樹脂層は高分子主鎖末端に珪素原子を有するフッ素系樹脂からなることを特徴とする汚れ付着防止高耐擦過性フィルム。An inorganic thin film layer and a water-repellent resin layer are provided in this order on a base film, and the inorganic thin film layer is a thin film formed by a vacuum film forming method, and the water-repellent resin layer is a polymer main chain terminal. A high-scratch-resistant film for preventing adhesion of dirt, characterized by comprising a fluorine-based resin having silicon atoms. 前記フッ素系樹脂の平均分子量が1000〜100000の範囲にあることを特徴とする請求項1に記載の汚れ付着防止高耐擦過性フィルム。The high-scratch-resistant film according to claim 1, wherein the average molecular weight of the fluororesin is in the range of 1,000 to 100,000. 前記フッ素系樹脂中に末端珪素原子が0.02〜4重量%の範囲内で存在することを特徴とする請求項1または請求項2に記載の汚れ付着防止高耐擦過性フィルム。3. The film according to claim 1, wherein terminal fluorine atoms are present in the fluorine-based resin in a range of 0.02 to 4% by weight. 4. 前記撥水性樹脂層は真空成膜法により形成された厚み0.001〜0.5μmの範囲内の薄膜であることを特徴とする請求項1乃至請求項3のいずれかに記載の汚れ付着防止高耐擦過性フィルム。4. The method according to claim 1, wherein the water-repellent resin layer is a thin film having a thickness in a range of 0.001 to 0.5 μm formed by a vacuum film forming method. 5. High abrasion resistant film. 前記無機薄膜層は、酸化珪素、窒化珪素、窒化酸化珪素、炭化珪素、炭化酸化珪素、または、酸化アルミニウムであることを特徴とする請求項1乃至請求項4のいずれかに記載の汚れ付着防止高耐擦過性フィルム。The contamination prevention according to any one of claims 1 to 4, wherein the inorganic thin film layer is made of silicon oxide, silicon nitride, silicon nitride oxide, silicon carbide, silicon carbide oxide, or aluminum oxide. High abrasion resistant film. 前記基材フィルムに所望の絵柄、模様が形成されていることを特徴とする請求項1乃至請求項5のいずれかに記載の汚れ付着防止高耐擦過性フィルム。The stain-resistant and high-scratch-resistant film according to any one of claims 1 to 5, wherein a desired pattern or pattern is formed on the base film. 前記基材フィルムの一方の面に透明導電膜が形成されていることを特徴とする請求項1乃至請求項6のいずれかに記載の汚れ付着防止高耐擦過性フィルム。The stain-resistant and high-scratch-resistant film according to any one of claims 1 to 6, wherein a transparent conductive film is formed on one surface of the base film. 前記基材フィルムと前記透明電極膜の間に無機薄膜からなるガスバリア膜が形成されていることを特徴とする請求項7に記載の汚れ付着防止高耐擦過性フィルム。The high-scratch-resistant film according to claim 7, wherein a gas barrier film made of an inorganic thin film is formed between the base film and the transparent electrode film. ディスプレイ面の保護フィルムとして使用することを特徴とする請求項1乃至請求項8のいずれかに記載の汚れ付着防止高耐擦過性フィルム。The stain-resistant and high-scratch-resistant film according to any one of claims 1 to 8, which is used as a protective film for a display surface.
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