WO2017018692A1 - Transparent glass having pattern - Google Patents

Transparent glass having pattern Download PDF

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Publication number
WO2017018692A1
WO2017018692A1 PCT/KR2016/007543 KR2016007543W WO2017018692A1 WO 2017018692 A1 WO2017018692 A1 WO 2017018692A1 KR 2016007543 W KR2016007543 W KR 2016007543W WO 2017018692 A1 WO2017018692 A1 WO 2017018692A1
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WO
WIPO (PCT)
Prior art keywords
pattern
mask
etching
pattern groove
glass
Prior art date
Application number
PCT/KR2016/007543
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French (fr)
Korean (ko)
Inventor
신도현
주현덕
Original Assignee
주식회사 도은
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020160024308A external-priority patent/KR20170011979A/en
Application filed by 주식회사 도은 filed Critical 주식회사 도은
Priority to CN201680038420.6A priority Critical patent/CN107683266A/en
Priority to JP2017568411A priority patent/JP2018522809A/en
Priority to US15/741,494 priority patent/US20180201540A1/en
Publication of WO2017018692A1 publication Critical patent/WO2017018692A1/en

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase

Definitions

  • the present invention relates to a transparent glass having a pattern. More specifically, the dot, linear or wavy pattern is formed on the surface of an optical glass such as a display glass or an eyeglass lens mounted on a smartphone, tablet PC, netbook, notebook, or the like. It is related with the transparent glass which has a pattern which improves fingerprint, antifouling, water repellency, and light transmittance by forming a surface and forming a fingerprint-coating layer thereon.
  • display glasses such as smartphones, tablet PCs, netbooks, notebooks, etc. are manufactured with tempered glass so as not to be easily broken, and technologies for providing specific images, logos, and characters on such tempered glass surfaces have been attempted.
  • Patent Document 1 includes: (a) forming a coating layer on an upper or lower surface to protect a surface of a transparent display member; (b) attaching a photosensitive film (DFR; Dry Film Photoresist) including various images including a logo, a character, and a character to an upper portion and a lower portion of the coating layer; (c) irradiating the ultraviolet (Ultra Violet) to the photosensitive film, and performing an exposure process such that only a necessary area is exposed from UV through a photo mask; (d) performing a development process of removing the photosensitive film positioned in the remaining region except for the UV-irradiated region of the transparent display member to which the photosensitive film is attached; (e) performing an etching process of removing the coating layer located in the remaining regions except for the UV-irradiated region; And (f) when the etching process is completed, performing a strip process of removing the photosensitive film attached to various image regions.
  • DFR Dry Film Photoresist
  • the pattern is not directly formed on the surface of the tempered glass, but the protective coating layer coated on the surface of the tempered glass forms a pattern, so when the touch of a finger is frequently performed such as a smartphone or a tablet PC, the protective coating layer is worn or peeled off for a long time. There may be a problem that the durability of the pattern is not good.
  • Patent Document 1 Republic of Korea Patent No. 10-1295251 (2013.8.9 announcement)
  • An object of the present invention is to provide a transparent glass having a pattern capable of improving fingerprint, antifouling, water repellency, and light transmittance by forming a fingerprint coating layer.
  • the present invention provides a concave-convex surface having any one of a plurality of dots, a plurality of lines, and a plurality of waveforms by a deposition process or an etching process on a surface of a glass substrate.
  • the pattern groove the width or width is 0.3 ⁇ 5 ⁇ m
  • the depth or height is 0.2 ⁇ 2 ⁇ m
  • the distance between the pattern grooves 0.5 5 ⁇ m, wherein the width or width of each pattern groove and the distance between each pattern groove become constant so that the uneven surface is regularly arranged.
  • a primer layer having a thickness of 10 to 30 nm may be interposed between the uneven surface and the anti-door coating layer.
  • the groove diameter or width of the concave-convex surface formed by embossing or engraving on the glass surface is in the range of 0.3 ⁇ m to 5 ⁇ m, so that it can be easily manufactured and commercialized without using high technology and expensive equipment.
  • the manufacturing cost is not high, so it is not only competitive in price but also free to design the pattern freely according to the application such as dot, linear, waveform, etc. using a mask.
  • the contact angle of the glass surface is maintained at 140 degrees or more, there is an advantage such that the light transmittance can be improved while being excellent in antifouling properties and water repellency.
  • the anti-fingerprint layer on the uneven surface, not only the anti-fingerprint can be improved, but also the durability of the anti-finish coating layer can be improved by forming the anti-fingerprint layer through the primer layer.
  • FIG. 1 is a partially enlarged view of a transparent glass surface having a pattern according to the present invention.
  • FIG. 2 is a partially enlarged view of a transparent glass cross section having a pattern according to the present invention.
  • FIG 3 is a partially enlarged view of a glass cross section for showing a deposition process of a transparent glass having a pattern according to the present invention.
  • FIG. 4 is a partially enlarged view of a glass cross section for showing a dry etching process of a transparent glass having a pattern according to the present invention.
  • FIG. 5 is a partially enlarged view of a glass cross section for showing a wet etching process of a transparent glass having a pattern according to the present invention.
  • the present invention may be modified in various ways and may have various embodiments.
  • the present invention may include a plurality of dots, a plurality of linear lines, and a plurality of dots by a deposition process or an etching process on a surface of a glass substrate.
  • An uneven surface having a pattern groove of any one of waveforms is formed, and a to-coating layer having a thickness of 10 to 50 nm is formed on the surface of the uneven surface, wherein the pattern groove has a width or a width of 0.3 to 5 ⁇ m, Depth or height is 0.2 ⁇ 2 ⁇ m, the distance between the pattern groove is 0.5 ⁇ 5 ⁇ m, the width or width of each pattern groove and the distance between each pattern groove is constant so that the irregular surface can be arranged regularly.
  • a primer layer having a thickness of 10 to 30 nm may be interposed between the uneven surface and the anti-door coating layer.
  • FIG. 1 is a partially enlarged view of a transparent glass surface having a pattern according to the present invention
  • FIG. 2 is a partially enlarged view of a transparent glass cross section having a pattern according to the present invention.
  • the transparent glass having the pattern of the present invention, a plurality of circular dots (see Fig. 1 (a)), a plurality of rectangular dots (Fig. 1) on the surface of the glass substrate 10
  • the pattern groove 102 may be formed by a deposition process as shown in FIG. 2A, or may be formed by an etching process as shown in FIG. 2B.
  • Pattern grooves 102 are formed in the grooves.
  • the pattern grooves 102 may be formed by etching a region corresponding to the pattern grooves 102 with respect to the surface of the glass substrate 10 as shown in FIG. .
  • the width or width (diameter) of the pattern groove 102 may range from 0.3 to 5 ⁇ m, and the distance between the pattern grooves 102 may be arbitrarily adjusted within the range of 0.5 to 5 ⁇ m.
  • the width or area (diameter) of the pattern groove 102 is smaller than 0.3 ⁇ m, and the distance between the pattern grooves 102 is smaller than 0.5 ⁇ m, precise and expensive equipment and complicated processes are required, resulting in an increase in manufacturing cost. It is difficult to commercialize because it is not competitive, and it is difficult to form a constant width or width of each pattern groove 102, which makes it difficult to arrange regular irregularities, and conversely, the width or width of the pattern groove 102 and the pattern groove ( 102) When the distance between each is larger than 5 micrometers, the pattern of the glass surface becomes visually discernible, and it is difficult to expect the improvement of the fingerprint, antifouling, water repellency, and light transmittance at the same time as this invention aims at.
  • the height of the pattern groove 102 that is, the height of the deposition layer 101 formed by the above-described deposition process, and the depth of the pattern groove 102 etched by the etching process may be adjusted in a range of 0.2 to 2 ⁇ m.
  • the height or depth of the pattern groove 102 is less than 0.2 ⁇ m, the height difference of the uneven surface is small, and it is difficult to expect to improve the anti-fingerprint, antifouling, water repellency and light transmittance exerted by the uneven surface of the glass substrate 10, On the contrary, if the thickness is larger than 2 ⁇ m, the amount of time required for the deposition process or the etching process is excessive, resulting in poor mass productivity, and a uniform pattern for the entire surface of the glass substrate 10 because the height or depth of each pattern groove 102 is not constant. It is hard to expect the irregularities of the.
  • the primer layer 40 and the anti-fingerprint layer 50 are sequentially stacked on the surface of the glass substrate 10 formed by the pattern groove 102, or the primer layer 40 is excluded.
  • the anti-fingerprint coating layer 50 may be directly formed on the uneven surface 100.
  • the primer layer 40 is a kind of binder resin, which is used to improve the adhesion of the anti-fingerprint coating layer 50 to minimize detachment or peeling of the anti-fingerprint coating layer 50.
  • binder resin for example, an acrylic polymer resin, water A dispersed polyester copolymer resin may be included.
  • the maximum thickness of the primer layer 40 and the to-door coating layer 50 or the to-door coating layer 50 is preferably smaller than the minimum value of the width or the range of the pattern groove 102, for example, the primer layer
  • the thickness of the 40 may be 10 to 30 nm
  • the thickness of the anti-coating layer 50 may be 10 to 50 nm.
  • the thickness of the primer layer 40 and the gate coating layer 50 is less than 10nm it is difficult to maintain a uniform thickness for the entire surface of the glass substrate 10, if the precise thickness to achieve a uniform thickness over the entire surface As expensive equipment is required, the price competitiveness is lowered. On the contrary, when the thickness of the primer layer 40 and the anti-coating layer 50 is greater than 30 nm and 50 nm, respectively, the boundary between the region where the pattern groove 102 is formed and the region where it is not formed is formed. Since the substantial loss of the concave-convex surface 100 is not apparent, it is difficult to expect the effect of improving the anti-fingerprint, antifouling, water repellency and light transmittance as intended by the present invention.
  • FIG 3 is a partially enlarged view of a glass cross section for showing a deposition process of a transparent glass having a pattern according to the present invention.
  • FIG. 3 (b) is a transparent glass having a pattern according to an embodiment of the present invention, transparent deposition of oxide or fluoride on the surface of the glass substrate 10 to 0.2 ⁇ m ⁇ 2 ⁇ m height (D)
  • the uneven surface 100 having a predetermined pattern is embossed by the transparent deposition layer 101.
  • the glass substrate 10 is washed and dried, and then a mask 20 is attached, and the mask ( And depositing an oxide or fluoride at a height of 0.2 to 2 ⁇ m in a vacuum environment with respect to the hole 21 of 20), and removing the mask 20.
  • the mask 20 is formed with a hole 21 in which the pattern region corresponding to the pattern groove 102 is closed and the remaining region is opened, thereby closing the mask 20 as shown in FIG.
  • the deposition of the uneven surface is not performed, but an oxide or fluoride is deposited on the surface of the glass substrate 10 through the hole 21 to form the uneven surface 100 having the pattern groove 102 of any one of dot, linear and corrugation. Can be formed.
  • the deposition of the oxide or fluoride can be carried out under reduced vacuum environment conditions, it is possible to use a known vacuum deposition equipment.
  • Examples of the oxide for forming the transparent deposition layer 101 may include SiO 2 and MgF 2 , and the fluoride may have a structure in which a fluorine organic material and a silane are connected to each other.
  • the material forming the transparent deposition layer 101 is not limited to the materials listed above, and other materials not listed may be applied as long as they are known materials capable of forming the transparent deposition layer 101. Do.
  • the primer layer 40 and / or the gate coating layer 50 are formed on the surface of the glass substrate 10 on which the uneven surface 100 is formed after the mask 20 is removed.
  • the anti-fingerprint layer 50 is a process that is generally carried out in other fields such as optical glass as well as glass for display of electronic devices, and may be, for example, a mixture of a fluorine coating agent and a volatile solvent. As known and known materials can be applied, there is no limitation on the materials related thereto.
  • FIG. 4 is a partially enlarged view of a glass cross section for showing a dry etching process of a transparent glass having a pattern according to the present invention.
  • the transparent glass having the pattern according to the exemplary embodiment of the present invention has a pattern groove 102 having a depth D of 0.2 ⁇ m to 2 ⁇ m with respect to the surface of the glass substrate 10.
  • the uneven surface 100 is intaglio formed by the pattern groove 102 formed on the surface of the glass substrate 10.
  • the glass substrate 10 is washed and dried, and then, the mask 20 is attached to the uneven surface 100 by dry etching. Etching the surface of the glass substrate 10 exposed by the hole 21 of the mask 20 to a depth of 0.2 to 2 ⁇ m to form the pattern groove 102 and removing the mask 20. It includes.
  • the mask 20 has a hole 21 in which an area corresponding to the pattern groove 102 is opened, and the remaining area, that is, an area not corresponding to the pattern groove 102, is closed.
  • the closed region of the mask 20 is not etched, and only the portion where the hole 21 is located is etched, so that the glass substrate having the uneven surface 100 formed by the pattern groove 102 as shown in FIG. (10) can be manufactured.
  • Dry etching may ionize an inert argon gas by a high frequency discharge, or may use plasma of the gas containing a halogen element, and this dry etching method is applicable by selecting the well-known technique generally commercialized.
  • the side surface of the pattern groove 102 may be etched to have an equilateral trapezoid in order to lower the light reflectance.
  • the primer layer 40 and / or the gate coating layer 50 are formed on the surface of the glass substrate 10 on which the uneven surface 100 is formed after the mask 20 is removed.
  • FIG. 5 is a partially enlarged view of a glass cross section for showing a wet etching process of a transparent glass having a pattern according to the present invention.
  • the transparent glass having the pattern according to the exemplary embodiment of the present invention has a pattern groove 102 having a depth D of 0.2 ⁇ m to 2 ⁇ m with respect to the surface of the glass substrate 10.
  • the concave-convex surface 100 of the predetermined pattern is intaglio formed by the pattern groove 102 formed on the surface of the glass substrate 10.
  • the glass substrate 10 is washed and dried, and then the mask 20 is attached to the uneven surface 100.
  • Forming the pattern grooves 102 by etching the glass surface in the region where the cavities are not formed to a depth of 0.2 to 2 ⁇ m, and removing the etching resist layer 30 with a remover.
  • the mask 20 is provided with a hole 21 in which a pattern region corresponding to the pattern groove 102 is closed and the remaining regions are opened.
  • the etching register ink is printed, and the etching resist ink passes through the holes 21 so that the etching resist layer 30 is formed. Formed, and it is dried.
  • the etching resist layer 30 is formed on the surface of the glass substrate 10 as shown in FIG. 5B. It is formed in a corresponding pattern, and in this state, when a wet etching process such as dipping or spraying in an acidic etching solution such as hydrofluoric acid is performed, a portion of the surface of the glass substrate 10 where the etching resistor 30 is not formed. This etching is performed to form the pattern groove 102.
  • the etching resistor 30 is removed to form the pattern groove 102 as shown in FIG.
  • the glass substrate 10 having the concave-convex surface 100 formed thereon may be manufactured, and the pattern groove 102 may have any one of dot, linear, and wavy patterns.
  • the side cross-sectional shape of the pattern groove 102 may be formed in a semi-circular shape in order to lower the light reflectance.
  • the primer layer 40 and / or the gate coating layer 50 are formed on the surface of the glass substrate 10 on which the uneven surface 100 is formed in a state where the etching resist layer 30 is removed.
  • the width or the width W of the pattern groove 102 is 0.3 to 5 ⁇ m as described above, and the distance S between the pattern grooves 102 is 0.5 to 5 ⁇ m, and the pattern groove ( Depth or height of 102) is 0.2 ⁇ 2 ⁇ m, such a numerical range does not require a high degree of precision can eliminate expensive deposition or etching equipment, because the ease of manufacture to form the uneven surface 100 with a minimum cost
  • the glass substrate 10 can be uniformly and uniformly processed on the entire surface of the glass substrate 10 by the width or width W of the pattern grooves 102 and the distance S between the pattern grooves 102.
  • the uneven surface 100 formed on the surface of 10 may be arranged regularly.
  • a pattern groove having a depth of 2 ⁇ m was formed through the above-described dry etching process on the surface of the tempered glass having a thickness of 0.8 mm.
  • the pattern groove is a circular dot
  • the width (diameter) of each pattern groove is 3 ⁇ m
  • the distance between each pattern groove is 3 ⁇ m at the front, rear, left and right
  • three samples (AG1 ⁇ AG3) are used for the reliability of the experimental data. Ready.
  • a tempered glass (bare) having a thickness of 0.8 mm on a flat plate without a pattern groove was prepared.
  • the average values of the light transmittances of the wavelengths of 400 nm to 700 nm are 92.96 nm, 92.79 nm for AG2, 92.79 nm for AG2, and 92.84 nm for AG3, which is higher than the average value of 92.45 nm. It was confirmed.
  • the surface contact angle of the 3 ⁇ m water drop was measured.
  • the average contact angle of the sample formed pattern grooves of the present invention was 140 ⁇ 1 °
  • the comparative material was 101 ⁇ . It was measured at 0.8 °, it was confirmed that the water-repellent properties of the glass substrate with a pattern groove according to the present invention.

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  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
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  • Surface Treatment Of Glass (AREA)

Abstract

The present invention relates to transparent glass having a pattern and, more specifically, to transparent glass having a pattern, and having the purpose of allowing a dotted, linear or wave-shaped uneven surface to be formed on the surface of glass at low cost and improving fingerprint resistance, contamination resistance, water repellency and light transmittance by forming a fingerprint-resistant coating layer thereon, such that an uneven surface (100), which has a pattern groove (102) of any one of a plurality of dots, a plurality of linear forms, and a plurality of wave forms, is formed on the surface of a glass substrate by a deposition process or an etching process, a primer layer (40) and a fingerprint-resistant coating layer (50) are formed on the uneven layer, and the width or area of the pattern groove and the spacing distance between the pattern grooves are constant, thereby allowing the uneven surface to be systematically arranged.

Description

패턴을 갖는 투명 유리Clear glass with pattern
본 발명은 패턴을 갖는 투명 유리에 관한 것으로, 더욱 구체적으로는 스마트폰이나 테블릿 PC, 넷북, 노트북 등에 장착되는 디스플레이용 유리 또는 안경렌즈와 같은 광학 유리의 표면에 돗트, 선형 또는 파형 패턴의 요철면을 형성하고, 그 위에 내지문코팅층을 형성함으로써 내지문, 방오, 발수 및 광 투과율을 향상시키는 패턴을 갖는 투명 유리에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent glass having a pattern. More specifically, the dot, linear or wavy pattern is formed on the surface of an optical glass such as a display glass or an eyeglass lens mounted on a smartphone, tablet PC, netbook, notebook, or the like. It is related with the transparent glass which has a pattern which improves fingerprint, antifouling, water repellency, and light transmittance by forming a surface and forming a fingerprint-coating layer thereon.
최근 스마트폰이나 테블릿 PC, 넷북, 노트북 등의 디스플레이 유리는 쉽게 깨지지 않도록 하기 위해 강화유리로 제조되고 있으며, 이러한 강화유리 표면에 특정 이미지나 로고, 문자 등을 부여하는 기술이 시도되고 있다.Recently, display glasses such as smartphones, tablet PCs, netbooks, notebooks, etc. are manufactured with tempered glass so as not to be easily broken, and technologies for providing specific images, logos, and characters on such tempered glass surfaces have been attempted.
이와 관련된 선행기술의 일 예로서 대한민국 등록특허 제 10-1295251호(특허문헌 1)에는, (a) 투명 디스플레이 부재의 표면을 보호하기 위해 상부 또는 하부면에 코팅층을 형성하는 단계; (b) 상기 코팅층의 상부 및 하부에 로고, 캐릭터, 문자를 포함하는 각종 이미지들이 구성된 감광성필름(DFR; Dry Film Photoresist)을 부착하는 단계; (c) 상기 감광성필름에 UV(Ultra Violet)를 조사하되, 포토 마스크를 통해 필요한 영역만 UV로부터 노출이 이루어지도록 하는 노광(Expose) 공정을 수행하는 단계; (d) 상기 감광성필름이 부착된 투명 디스플레이 부재 중 UV를 조사한 영역을 제외한 나머지 영역에 위치한 감광성필름을 제거하는 현상(Development) 공정을 수행하는 단계; (e) 상기 UV를 조사한 영역을 제외한 나머지 영역에 위치한 코팅층을 제거하는 에칭(Etching) 공정을 수행하는 단계; 및 (f) 상기 에칭 공정이 완료되면, 각종 이미지 영역에 부착 구성되어 있는 감광성필름을 제거하는 스트립 공정을 수행하는 단계를 포함하는 투명 디스플레이부 이미지 멀티 증착 방법이 제안된 바 있다.As an example of the related art, Korean Patent No. 10-1295251 (Patent Document 1) includes: (a) forming a coating layer on an upper or lower surface to protect a surface of a transparent display member; (b) attaching a photosensitive film (DFR; Dry Film Photoresist) including various images including a logo, a character, and a character to an upper portion and a lower portion of the coating layer; (c) irradiating the ultraviolet (Ultra Violet) to the photosensitive film, and performing an exposure process such that only a necessary area is exposed from UV through a photo mask; (d) performing a development process of removing the photosensitive film positioned in the remaining region except for the UV-irradiated region of the transparent display member to which the photosensitive film is attached; (e) performing an etching process of removing the coating layer located in the remaining regions except for the UV-irradiated region; And (f) when the etching process is completed, performing a strip process of removing the photosensitive film attached to various image regions.
그러나 특허문헌 1을 방법을 적용할 경우 강화유리 표면에 소재 보호를 위한 코팅층을 형성한 다음, 감광성 필름 부착 공정, UV 노광 공정, 현상 공정, 에칭 공정, 스트립 공정 등이 필요한바, 이러한 공정을 수행하기 위한 장비나 장치가 과다할 뿐 아니라 많은 시간이 소요되므로 경제적이지 못하다는 문제점이 있다.However, when applying the method of Patent Document 1, after forming a coating layer for protecting the material on the surface of the tempered glass, a photosensitive film attaching process, a UV exposure process, a developing process, an etching process, a strip process, etc. are required. There is a problem that it is not economical because the equipment or apparatus to do so is not only excessive but also takes a lot of time.
더욱이 패턴이 강화유리 표면에 직접 형성되는 것이 아니라, 강화유리 표면에 코팅된 보호 코팅층이 패턴을 이루므로 스마트폰이나 테블릿 PC와 같이 손가락의 터치가 빈번하기 이루어지는 경우 장시간 사용시 보호 코팅층이 마모되거나 박리될 수 있어서 패턴의 내구성이 좋지 않다는 문제점이 있다.Furthermore, the pattern is not directly formed on the surface of the tempered glass, but the protective coating layer coated on the surface of the tempered glass forms a pattern, so when the touch of a finger is frequently performed such as a smartphone or a tablet PC, the protective coating layer is worn or peeled off for a long time. There may be a problem that the durability of the pattern is not good.
[특허문헌 1] 대한민국 등록특허 제 10-1295251호(2013.8.9 공고)[Patent Document 1] Republic of Korea Patent No. 10-1295251 (2013.8.9 announcement)
상기의 종래 기술이 내포한 문제점을 해결하기 위한 본 발명은, 고도의 기술력 및 고가의 장비 없이 간단하고 저렴한 비용으로 유리 표면에 돗트, 선형 또는 파형 패턴의 요철면을 형성할 수 있고, 그 위에 내지문코팅층을 형성함으로써 내지문, 방오, 발수 및 광 투과율을 향상시킬 수 있는 패턴을 갖는 투명 유리를 제공하는데 그 목적이 있다.The present invention for solving the problems of the prior art, it is possible to form a concave-convex surface of the dot, linear or corrugated pattern on the glass surface at a simple and low cost without high technical skills and expensive equipment, An object of the present invention is to provide a transparent glass having a pattern capable of improving fingerprint, antifouling, water repellency, and light transmittance by forming a fingerprint coating layer.
상기 목적을 달성하기 위한 본 발명은, 유리기재의 표면에 대하여 증착 공정 또는 에칭 공정에 의해 다수의 돗트(dot), 다수의 선형, 다수의 파형 중 어느 하나의 패턴 홈을 가진 요철면이 형성되고, 상기 요철면의 표면 상에 두께 10 ~ 50㎚인 내지문코팅층이 형성되며, 상기 패턴 홈은, 폭 또는 넓이가 0.3 ~ 5㎛, 깊이 또는 높이가 0.2 ~ 2㎛, 패턴 홈 간 거리가 0.5 ~ 5㎛이되, 각 패턴 홈의 폭 또는 넓이와 각 패턴 홈 간 이격 거리가 일정하게 됨으로써 요철면이 규칙적으로 배열된 것을 특징으로 한다.In order to achieve the above object, the present invention provides a concave-convex surface having any one of a plurality of dots, a plurality of lines, and a plurality of waveforms by a deposition process or an etching process on a surface of a glass substrate. , To the door coating layer having a thickness of 10 to 50nm on the surface of the uneven surface, the pattern groove, the width or width is 0.3 ~ 5㎛, the depth or height is 0.2 ~ 2㎛, the distance between the pattern grooves 0.5 5 μm, wherein the width or width of each pattern groove and the distance between each pattern groove become constant so that the uneven surface is regularly arranged.
이때 상기 내지문코팅층의 내구성을 향상시키기 위해 상기 요철면과 상기 내지문코팅층 사이에 두께 10~30㎚인 프라이머층이 개재될 수 있다.In this case, in order to improve durability of the anti-door coating layer, a primer layer having a thickness of 10 to 30 nm may be interposed between the uneven surface and the anti-door coating layer.
본 발명에 따르면, 유리 표면에 양각 또는 음각에 의해 형성된 요철면의 홈 직경 또는 폭이 0.3㎛ ~ 5㎛ 범위로서, 고도의 기술력 및 고가의 장비를 사용하지 않고서도 용이하게 제조 및 상용화가 가능하므로 제조비용이 높지 않아 가격경쟁력이 있을 뿐 아니라 마스크를 이용하여 사각 또는 원형의 돗트(dot), 선형, 파형 등 용도에 따라 패턴을 임의로 자유롭게 설계할 수 있다.According to the present invention, the groove diameter or width of the concave-convex surface formed by embossing or engraving on the glass surface is in the range of 0.3 μm to 5 μm, so that it can be easily manufactured and commercialized without using high technology and expensive equipment. The manufacturing cost is not high, so it is not only competitive in price but also free to design the pattern freely according to the application such as dot, linear, waveform, etc. using a mask.
또한, 유리 표면의 접촉각이 140도 이상 유지되어 방오성, 발수성이 우수하면서 광투과율을 향상시킬 수 있는 등의 이점이 있다.In addition, the contact angle of the glass surface is maintained at 140 degrees or more, there is an advantage such that the light transmittance can be improved while being excellent in antifouling properties and water repellency.
더욱이, 요철면 상에 내지문코팅층을 형성함으로써 내지문성을 향상시킬 수 있을 뿐 아니라, 프라이머층을 매개로 내지문코팅층을 형성함으로써 내지문코팅층의 내구성을 향상시킬 수 있다.Furthermore, by forming the anti-fingerprint layer on the uneven surface, not only the anti-fingerprint can be improved, but also the durability of the anti-finish coating layer can be improved by forming the anti-fingerprint layer through the primer layer.
도 1은 본 발명에 따른 패턴을 갖는 투명 유리 표면의 부분 확대도이다.1 is a partially enlarged view of a transparent glass surface having a pattern according to the present invention.
도 2는 본 발명에 따른 패턴을 갖는 투명 유리 단면의 부분 확대도이다.2 is a partially enlarged view of a transparent glass cross section having a pattern according to the present invention.
도 3은 본 발명에 따른 패턴을 갖는 투명 유리의 증착 공정을 보이기 위한 유리 단면의 부분 확대도이다.3 is a partially enlarged view of a glass cross section for showing a deposition process of a transparent glass having a pattern according to the present invention.
도 4는 본 발명에 따른 패턴을 갖는 투명 유리의 건식 에칭 공정을 보이기 위한 유리 단면의 부분 확대도이다.4 is a partially enlarged view of a glass cross section for showing a dry etching process of a transparent glass having a pattern according to the present invention.
도 5는 본 발명에 따른 패턴을 갖는 투명 유리의 습식 에칭 공정을 보이기 위한 유리 단면의 부분 확대도이다.5 is a partially enlarged view of a glass cross section for showing a wet etching process of a transparent glass having a pattern according to the present invention.
[도면 부호의 설명][Description of Drawing Reference]
10... 유리 기재10 ... glass substrate
20... 마스크20 ... mask
21... 홀21 ... Hall
30... 에칭레지스터30. Etching register
40... 프라이머층40 ... primer layer
50... 내지문코팅층50 ... fingerprint coating layer
100... 요철면100. Uneven surface
101... 증착층101 ... Deposition layer
102... 패턴 홈102 ... pattern groove
본 발명은 다양한 변경을 가할 수 있고 여러 가지 실시예를 가질 수 있는 바, 일 예로서 본 발명은 유리기재의 표면에 대하여 증착 공정 또는 에칭 공정에 의해 다수의 돗트(dot), 다수의 선형, 다수의 파형 중 어느 하나의 패턴 홈을 가진 요철면이 형성되고, 상기 요철면의 표면 상에 두께 10 ~ 50㎚인 내지문코팅층이 형성되며, 상기 패턴 홈은, 폭 또는 넓이가 0.3 ~ 5㎛, 깊이 또는 높이가 0.2 ~ 2㎛, 패턴 홈 간 거리가 0.5 ~ 5㎛이되, 각 패턴 홈의 폭 또는 넓이와 각 패턴 홈 간 이격 거리가 일정하게 됨으로써 요철면이 규칙적으로 배열될 수 있다.The present invention may be modified in various ways and may have various embodiments. For example, the present invention may include a plurality of dots, a plurality of linear lines, and a plurality of dots by a deposition process or an etching process on a surface of a glass substrate. An uneven surface having a pattern groove of any one of waveforms is formed, and a to-coating layer having a thickness of 10 to 50 nm is formed on the surface of the uneven surface, wherein the pattern groove has a width or a width of 0.3 to 5 μm, Depth or height is 0.2 ~ 2㎛, the distance between the pattern groove is 0.5 ~ 5㎛, the width or width of each pattern groove and the distance between each pattern groove is constant so that the irregular surface can be arranged regularly.
이때 상기 내지문코팅층의 내구성을 향상시키기 위해 상기 요철면과 상기 내지문코팅층 사이에 두께 10~30㎚인 프라이머층이 개재될 수 있다.In this case, in order to improve durability of the anti-door coating layer, a primer layer having a thickness of 10 to 30 nm may be interposed between the uneven surface and the anti-door coating layer.
이하에서는 본 발명의 바람직한 형태의 구조를 예시하고 이에 기하여 본 발명을 상세하게 설명하고자 한다. 그러나 이는 본 발명을 예시된 형태만으로 한정하려는 것이 아니며, 본 발명의 사상 및 기술 범위는 예시된 형태의 통상적인 변경이나 균등물 내지 대체물까지 포함한다.Hereinafter, exemplary structures of the present invention will be illustrated and the present invention will be described in detail. However, this is not intended to limit the present invention to only the illustrated form, and the spirit and scope of the present invention include the conventional modifications and equivalents or substitutes of the illustrated forms.
도 1은 본 발명에 따른 패턴을 갖는 투명 유리 표면의 부분 확대도이고, 도 2는 본 발명에 따른 패턴을 갖는 투명 유리 단면의 부분 확대도이다.1 is a partially enlarged view of a transparent glass surface having a pattern according to the present invention, and FIG. 2 is a partially enlarged view of a transparent glass cross section having a pattern according to the present invention.
도 1 및 도 2를 참조하는 바와 같이, 본 발명의 패턴을 갖는 투명 유리는, 유리기재(10)의 표면에 다수의 원형 돗트[도 1의 (a) 참조], 다수의 사각형 돗트[도 1의 (b) 참조], 다수의 선형[도 1의 (c) 참조], 다수의 파형[도 1의 (d) 참조] 중 어느 하나의 패턴을 가진 패턴 홈(102)을 가진 요철면(100)이 형성된다.As shown in Fig. 1 and Fig. 2, the transparent glass having the pattern of the present invention, a plurality of circular dots (see Fig. 1 (a)), a plurality of rectangular dots (Fig. 1) on the surface of the glass substrate 10 Uneven surface 100 having a pattern groove 102 having a pattern of any one of (b)], a plurality of linears (see FIG. 1 (c)), and a plurality of waveforms (see (d) of FIG. 1). ) Is formed.
상기 패턴 홈(102)은, 도 2의 (a)와 같이 증착 공정에 의해 형성되거나, 도 2의 (b)와 같이 에칭 공정에 의해 형성될 수 있다.The pattern groove 102 may be formed by a deposition process as shown in FIG. 2A, or may be formed by an etching process as shown in FIG. 2B.
도 2의 (a)와 같이 증착 공정을 통해 유리기재(10) 표면에 대하여 패턴 홈(102) 이외의 영역에 증착층(101)을 형성하면, 결과적으로 증착층(101)이 형성되지 않은 영역에는 패턴 홈(102)이 형성되고, 이와 달리 도 2의 (b)와 같이 유리기재(10) 표면에 대하여 패턴 홈(102)과 대응하는 영역을 에칭하여 패턴 홈(102)을 형성할 수 있다.As shown in FIG. 2A, when the deposition layer 101 is formed in a region other than the pattern groove 102 on the surface of the glass substrate 10 through the deposition process, the region in which the deposition layer 101 is not formed as a result. Pattern grooves 102 are formed in the grooves. Alternatively, the pattern grooves 102 may be formed by etching a region corresponding to the pattern grooves 102 with respect to the surface of the glass substrate 10 as shown in FIG. .
상기 패턴 홈(102)의 폭 또는 넓이(직경)는 0.3 ~ 5㎛ 범위일 수 있고, 패턴 홈(102) 간 거리는 0.5 ~ 5㎛ 범위 내에서 임의 조절 가능하다.The width or width (diameter) of the pattern groove 102 may range from 0.3 to 5 μm, and the distance between the pattern grooves 102 may be arbitrarily adjusted within the range of 0.5 to 5 μm.
상기 패턴 홈(102)의 폭 또는 넓이(직경)가 0.3㎛보다 작은 경우, 그리고 패턴 홈(102) 간 거리가 0.5㎛보다 작으면 정밀한 고가의 장비과 복잡한 공정이 요구되어 제조비용의 상승으로 인해 가격 경쟁력이 떨어지므로 상용화가 어려울 뿐 아니라 각 패턴 홈(102)의 폭 또는 넓이를 일정하게 형성하는 것이 곤란하여 규칙적인 요철면의 배열이 어렵고, 반대로 패턴 홈(102)의 폭 또는 넓이와 패턴 홈(102) 간 거리가 각각 5㎛보다 크면 유리 표면의 패턴이 육안으로 식별 가능하게 되어 상품성이 떨어지는 동시에 본 발명이 목적하는 바와 같은 내지문, 방오, 발수 및 광 투과율을 향상을 기대하기 어렵다.When the width or area (diameter) of the pattern groove 102 is smaller than 0.3 μm, and the distance between the pattern grooves 102 is smaller than 0.5 μm, precise and expensive equipment and complicated processes are required, resulting in an increase in manufacturing cost. It is difficult to commercialize because it is not competitive, and it is difficult to form a constant width or width of each pattern groove 102, which makes it difficult to arrange regular irregularities, and conversely, the width or width of the pattern groove 102 and the pattern groove ( 102) When the distance between each is larger than 5 micrometers, the pattern of the glass surface becomes visually discernible, and it is difficult to expect the improvement of the fingerprint, antifouling, water repellency, and light transmittance at the same time as this invention aims at.
상기 패턴 홈(102)의 높이, 즉 전술한 증착 공정에 의해 형성된 증착층(101)의 높이를 비롯하여 에칭 공정에 의해 에칭된 패턴 홈(102)의 깊이는 0.2 ~ 2㎛ 범위에서 조절할 수 있다.The height of the pattern groove 102, that is, the height of the deposition layer 101 formed by the above-described deposition process, and the depth of the pattern groove 102 etched by the etching process may be adjusted in a range of 0.2 to 2 μm.
패턴 홈(102)의 높이 또는 깊이가 0.2㎛보다 작으면 요철면의 고저차가 작아서 유리기재(10) 표면의 요철면에 의해 발휘되는 내지문, 방오, 발수 및 광 투과율을 향상을 기대하기 어렵고, 반대로 2㎛보다 크면 증착 공정 또는 에칭 공정에 소요되는 시간이 과다하여 대량 생산성이 좋지 않을 뿐 아니라 각 패턴 홈(102)의 높이 또는 깊이가 일정하지 않아 유리기재(10) 전체 면에 대해 균일한 패턴의 요철면을 기대하기 어렵다.If the height or depth of the pattern groove 102 is less than 0.2 µm, the height difference of the uneven surface is small, and it is difficult to expect to improve the anti-fingerprint, antifouling, water repellency and light transmittance exerted by the uneven surface of the glass substrate 10, On the contrary, if the thickness is larger than 2 μm, the amount of time required for the deposition process or the etching process is excessive, resulting in poor mass productivity, and a uniform pattern for the entire surface of the glass substrate 10 because the height or depth of each pattern groove 102 is not constant. It is hard to expect the irregularities of the.
한편, 상기 유리기재(10)의 표면에서 패턴 홈(102)에 의해 형성된 요철면(100)에는 프라이머층(40)과 내지문코팅층(50)이 순차적으로 적층되거나, 프라이머층(40)을 배제하고 요철면(100)에 직접 내지문코팅층(50)이 형성될 수 있다.Meanwhile, the primer layer 40 and the anti-fingerprint layer 50 are sequentially stacked on the surface of the glass substrate 10 formed by the pattern groove 102, or the primer layer 40 is excluded. In addition, the anti-fingerprint coating layer 50 may be directly formed on the uneven surface 100.
상기 프라이머층(40)은 바인더 수지의 일종으로 상기 내지문코팅층(50)의 접착성을 향상시켜서 내지문코팅층(50)의 이탈이나 박리를 최소화하기 위해 사용되는데, 일 예로서 아크릴계 고분자 수지, 수분산 폴리에스테르 공중합체 수지를 포함할 수 있다.The primer layer 40 is a kind of binder resin, which is used to improve the adhesion of the anti-fingerprint coating layer 50 to minimize detachment or peeling of the anti-fingerprint coating layer 50. For example, an acrylic polymer resin, water A dispersed polyester copolymer resin may be included.
상기 프라이머층(40)과 내지문코팅층(50) 또는 상기 내지문코팅층(50)의 최대 두께는 상기 패턴 홈(102)의 폭 또는 넓이 범위의 최소치보다 작은 것이 바람직하며, 일 예로서 상기 프라이머층(40)의 두께는 10~30㎚, 상기 내지문코팅층(50)의 두께는 10 ~ 50㎚일 수 있다.The maximum thickness of the primer layer 40 and the to-door coating layer 50 or the to-door coating layer 50 is preferably smaller than the minimum value of the width or the range of the pattern groove 102, for example, the primer layer The thickness of the 40 may be 10 to 30 nm, and the thickness of the anti-coating layer 50 may be 10 to 50 nm.
상기 프라이머층(40)과 내지문코팅층(50)의 두께가 10㎚보다 작으면 유리기재(10) 표면 전체에 대해 균일한 두께를 유지하기 어렵고, 만약 전체 면에 대해 균일한 두께를 이루기 위해서는 정밀한 고가의 장비가 요구되므로 가격경쟁력이 떨어지고, 반대로 프라이머층(40)과 내지문코팅층(50)의 두께가 각각 30㎚와 50㎚보다 크면 패턴 홈(102)이 형성된 영역과 형성되지 않은 영역의 경계가 상당 부분 상실되어 요철면(100)이 뚜렷하지 않게 되므로 본 발명이 목적하는 바와 같은 내지문, 방오, 발수 및 광 투과율의 향상 효과를 기대하기 어렵다.If the thickness of the primer layer 40 and the gate coating layer 50 is less than 10nm it is difficult to maintain a uniform thickness for the entire surface of the glass substrate 10, if the precise thickness to achieve a uniform thickness over the entire surface As expensive equipment is required, the price competitiveness is lowered. On the contrary, when the thickness of the primer layer 40 and the anti-coating layer 50 is greater than 30 nm and 50 nm, respectively, the boundary between the region where the pattern groove 102 is formed and the region where it is not formed is formed. Since the substantial loss of the concave-convex surface 100 is not apparent, it is difficult to expect the effect of improving the anti-fingerprint, antifouling, water repellency and light transmittance as intended by the present invention.
이하에서는 상기 유리기재(10) 표면에 패턴 홈(102)을 형성하기 위한 증착 공정과 에칭 공정에 대하여 설명하며, 이러한 설명을 통해 본 발명이 더욱 구체화될 것이다.Hereinafter, a deposition process and an etching process for forming the pattern groove 102 on the surface of the glass substrate 10 will be described, and the present invention will be further embodied through this description.
도 3은 본 발명에 따른 패턴을 갖는 투명 유리의 증착 공정을 보이기 위한 유리 단면의 부분 확대도이다.3 is a partially enlarged view of a glass cross section for showing a deposition process of a transparent glass having a pattern according to the present invention.
도 3의 (b)를 참조하는 바와 같이 본 발명의 일 실시예에 따른 패턴을 갖는 투명 유리는, 유리기재(10) 표면에 0.2㎛ ~ 2㎛ 높이(D)로 산화물 또는 불화물로 이루어진 투명 증착층(101)을 형성하면, 상기 투명 증착층(101)에 의해서 소정의 패턴의 요철면(100)이 양각(陽刻)으로 형성된다.As shown in Figure 3 (b) is a transparent glass having a pattern according to an embodiment of the present invention, transparent deposition of oxide or fluoride on the surface of the glass substrate 10 to 0.2㎛ ~ 2㎛ height (D) When the layer 101 is formed, the uneven surface 100 having a predetermined pattern is embossed by the transparent deposition layer 101.
상기 투명 증착층(101)을 형성하기 위한 증착 공정은, 도 3의 (a)를 참조하는 바와 같이 유리기재(10)를 세척, 건조한 다음, 마스크(20)를 부착하는 단계와, 상기 마스크(20)의 홀(21)에 대하여 진공 환경하에서 산화물 또는 불화물을 0.2 ~ 2㎛ 높이로 증착하는 단계와, 상기 마스크(20)를 제거하는 단계를 포함한다.In the deposition process for forming the transparent deposition layer 101, as shown in (a) of FIG. 3, the glass substrate 10 is washed and dried, and then a mask 20 is attached, and the mask ( And depositing an oxide or fluoride at a height of 0.2 to 2 μm in a vacuum environment with respect to the hole 21 of 20), and removing the mask 20.
여기서 상기 마스크(20)는 상기 패턴 홈(102)과 대응하는 패턴 영역이 폐쇄되고 나머지 영역이 개방된 홀(21)이 형성되며, 이에 따라 도 3의 (b)와 같이 마스크(20) 중 폐쇄된 영역으로는 증착이 이루어지지 않고 홀(21)을 통해 산화물 또는 불화물이 유리기재(10) 표면에 증착되어 돗트, 선형, 파형 중 어느 하나의 패턴 홈(102)을 가진 요철면(100)을 형성할 수 있다.Here, the mask 20 is formed with a hole 21 in which the pattern region corresponding to the pattern groove 102 is closed and the remaining region is opened, thereby closing the mask 20 as shown in FIG. The deposition of the uneven surface is not performed, but an oxide or fluoride is deposited on the surface of the glass substrate 10 through the hole 21 to form the uneven surface 100 having the pattern groove 102 of any one of dot, linear and corrugation. Can be formed.
상기 산화물 또는 불화물의 증착은 감압된 진공 환경 조건에서 수행할 수 있고, 공지의 진공 증착 설비를 이용하는 것이 가능하다.The deposition of the oxide or fluoride can be carried out under reduced vacuum environment conditions, it is possible to use a known vacuum deposition equipment.
상기 투명 증착층(101)을 형성하기 위한 산화물은 SiO2, MgF2를 예로 들 수 있고, 상기 불화물은 불소 유기물과 실란이 연결된 구조일 수 있다. 그러나 본 발명에서 투명 증착층(101)을 형성하는 물질이 위에서 열거된 물질에 한정되지 않으며, 투명 증착층(101)을 형성할 수 있는 공지의 물질이면, 열거되지 않은 다른 물질을 적용하는 것도 가능하다.Examples of the oxide for forming the transparent deposition layer 101 may include SiO 2 and MgF 2 , and the fluoride may have a structure in which a fluorine organic material and a silane are connected to each other. However, in the present invention, the material forming the transparent deposition layer 101 is not limited to the materials listed above, and other materials not listed may be applied as long as they are known materials capable of forming the transparent deposition layer 101. Do.
상기 프라이머층(40) 및/또는 내지문코팅층(50)은 전술한 마스크(20) 제거 단계를 수행한 다음, 상기 요철면(100)이 형성된 유리기재(10)의 표면에 형성된다.The primer layer 40 and / or the gate coating layer 50 are formed on the surface of the glass substrate 10 on which the uneven surface 100 is formed after the mask 20 is removed.
상기 내지문코팅층(50)은 전자기기의 디스플레이용 유리뿐 아니라 광학 유리 등 다른 분야에도 일반적으로 시행되고 있는 공정으로, 예를 들면 불소 코팅제와 휘발성 용제의 혼합물일 수 있으며, 그 외에도 내지문 코팅제로 알려진 공지의 물질을 적용할 수 있으므로 그에 관한 물질에는 제한이 없다.The anti-fingerprint layer 50 is a process that is generally carried out in other fields such as optical glass as well as glass for display of electronic devices, and may be, for example, a mixture of a fluorine coating agent and a volatile solvent. As known and known materials can be applied, there is no limitation on the materials related thereto.
도 4는 본 발명에 따른 패턴을 갖는 투명 유리의 건식 에칭 공정을 보이기 위한 유리 단면의 부분 확대도이다.4 is a partially enlarged view of a glass cross section for showing a dry etching process of a transparent glass having a pattern according to the present invention.
도 4의 (b)를 참조하는 바와 같이 본 발명의 일 실시예에 따른 패턴을 갖는 투명 유리는, 유리기재(10) 표면에 대하여 0.2㎛ ~ 2㎛ 깊이(D)로 패턴 홈(102)이 형성됨으로써 유리기재(10)의 표면에 형성된 패턴 홈(102)에 의해 요철면(100)이 음각(陰刻)으로 형성된다.As shown in (b) of FIG. 4, the transparent glass having the pattern according to the exemplary embodiment of the present invention has a pattern groove 102 having a depth D of 0.2 μm to 2 μm with respect to the surface of the glass substrate 10. As a result, the uneven surface 100 is intaglio formed by the pattern groove 102 formed on the surface of the glass substrate 10.
이러한 요철면(100)을 형성하기 위해 도 4의 (a)를 참조하는 바와 같이 유리기재(10)를 세척, 건조한 다음, 마스크(20)를 부착하는 단계와, 건식 에칭(dry etching)을 통해 상기 마스크(20)의 홀(21)에 의해 노출된 유리기재(10) 표면을 0.2 ~ 2㎛ 깊이로 에칭함으로써 상기 패턴 홈(102)을 형성하는 단계와, 상기 마스크(20)를 제거하는 단계를 포함한다.In order to form the uneven surface 100, as shown in FIG. 4A, the glass substrate 10 is washed and dried, and then, the mask 20 is attached to the uneven surface 100 by dry etching. Etching the surface of the glass substrate 10 exposed by the hole 21 of the mask 20 to a depth of 0.2 to 2 μm to form the pattern groove 102 and removing the mask 20. It includes.
상기 마스크(20)는 상기 패턴 홈(102)과 대응하는 영역이 개방된 홀(21)이 형성되고 나머지 영역, 즉 패턴 홈(102)과 대응하지 않는 영역은 폐쇄되어 있다.The mask 20 has a hole 21 in which an area corresponding to the pattern groove 102 is opened, and the remaining area, that is, an area not corresponding to the pattern groove 102, is closed.
따라서 마스크(20)에서 폐쇄 영역은 에칭이 이루어지지 않고 홀(21)이 위치한 부분만 에칭이 이루어지므로 도 4의 (b)와 같이 패턴 홈(102)에 의해 요철면(100)이 형성된 유리기재(10)를 제조할 수 있다.Therefore, the closed region of the mask 20 is not etched, and only the portion where the hole 21 is located is etched, so that the glass substrate having the uneven surface 100 formed by the pattern groove 102 as shown in FIG. (10) can be manufactured.
건식 에칭은, 비활성 아르곤 가스를 고주파 방전으로 이온화하거나 할로겐 원소를 포함하는 가스의 플라스마(plasma)를 이용할 수 있으며, 이러한 건식 에칭법은 일반적으로 상용화되고 있는 공지의 기법을 선택하여 적용할 수 있다.Dry etching may ionize an inert argon gas by a high frequency discharge, or may use plasma of the gas containing a halogen element, and this dry etching method is applicable by selecting the well-known technique generally commercialized.
건식 에칭을 통해 패턴 홈(102)을 형성하는 경우, 광 반사율을 낮추기 위해 패턴 홈(102)의 측단면 형상이 등변사다리꼴로 이루어지도록 에칭할 수 있다. When the pattern groove 102 is formed by dry etching, the side surface of the pattern groove 102 may be etched to have an equilateral trapezoid in order to lower the light reflectance.
상기 프라이머층(40) 및/또는 내지문코팅층(50)은 전술한 마스크(20) 제거 단계를 수행한 다음, 상기 요철면(100)이 형성된 유리기재(10)의 표면에 형성된다.The primer layer 40 and / or the gate coating layer 50 are formed on the surface of the glass substrate 10 on which the uneven surface 100 is formed after the mask 20 is removed.
도 5는 본 발명에 따른 패턴을 갖는 투명 유리의 습식 에칭 공정을 보이기 위한 유리 단면의 부분 확대도이다.5 is a partially enlarged view of a glass cross section for showing a wet etching process of a transparent glass having a pattern according to the present invention.
도 5의 (c)를 참조하는 바와 같이 본 발명의 일 실시예에 따른 패턴을 갖는 투명 유리는, 유리기재(10) 표면에 대하여 0.2㎛ ~ 2㎛ 깊이(D)로 패턴 홈(102)이 형성됨으로써 유리기재(10) 표면에 형성된 패턴 홈(102)에 의해 소정 패턴의 요철면(100)이 음각(陰刻)으로 형성된다.As shown in FIG. 5C, the transparent glass having the pattern according to the exemplary embodiment of the present invention has a pattern groove 102 having a depth D of 0.2 μm to 2 μm with respect to the surface of the glass substrate 10. As a result, the concave-convex surface 100 of the predetermined pattern is intaglio formed by the pattern groove 102 formed on the surface of the glass substrate 10.
상기 요철면(100)을 형성하기 위해 도 5의 (a)를 참조하는 바와 같이 유리기재(10)를 세척, 건조한 다음, 마스크(20)를 부착하는 단계와, 상기 마스크(20)의 홀(21)에 대하여 에칭 레지스터를 도포하여 상기 유리기재(10) 표면에 에칭레지스터층(30)을 형성하는 단계와, 상기 마스크(20)를 제거하는 단계와, 습식 에칭을 통해 상기 에칭레지스터층(30)이 형성되지 않은 영역의 유리 표면을 0.2 ~ 2㎛ 깊이로 에칭함으로써 상기 패턴 홈(102)을 형성하는 단계와, 리무버로 상기 에칭레지스터층(30)을 제거하는 단계를 포함한다.In order to form the uneven surface 100, as shown in FIG. 5A, the glass substrate 10 is washed and dried, and then the mask 20 is attached to the uneven surface 100. 21 to form an etching resist layer 30 on the surface of the glass substrate 10 by applying an etching resistor, removing the mask 20, and wet etching to form the etching resist layer 30. Forming the pattern grooves 102 by etching the glass surface in the region where the cavities are not formed to a depth of 0.2 to 2 μm, and removing the etching resist layer 30 with a remover.
상기 마스크(20)는 상기 패턴 홈(102)과 대응하는 패턴 영역이 폐쇄되고 나머지 영역이 개방된 홀(21)이 형성된다.The mask 20 is provided with a hole 21 in which a pattern region corresponding to the pattern groove 102 is closed and the remaining regions are opened.
따라서 유리기재(10) 표면에 홀(21)이 천공된 마스크(20)를 맞붙인 후, 에칭 레지스터 잉크를 인쇄하면 상기 홀(21)을 통해 에칭레지스터 잉크가 통과하여 에칭 레지스터층(30)이 형성되며, 이를 건조시킨다.Therefore, after attaching the mask 20 with the holes 21 perforated on the surface of the glass substrate 10, the etching register ink is printed, and the etching resist ink passes through the holes 21 so that the etching resist layer 30 is formed. Formed, and it is dried.
이후, 유리기재(10) 표면에서 상기 마스크(20)를 제거하면 도 5의 (b)와 같이 유리기재(10) 표면에 에칭 레지스터층(30)이 소정의 패턴, 즉 상기 홀(21)과 대응하는 패턴으로 형성되며, 이 상태에서 불산 등의 산성 에칭액에 침지하거나 살포하는 등의 습식 에칭(wet etching) 공정을 수행하면, 유리기재(10) 표면 중 에칭 레지스터(30)가 형성되지 않은 부분이 에칭되어 패턴 홈(102)이 형성된다.Subsequently, when the mask 20 is removed from the surface of the glass substrate 10, the etching resist layer 30 is formed on the surface of the glass substrate 10 as shown in FIG. 5B. It is formed in a corresponding pattern, and in this state, when a wet etching process such as dipping or spraying in an acidic etching solution such as hydrofluoric acid is performed, a portion of the surface of the glass substrate 10 where the etching resistor 30 is not formed. This etching is performed to form the pattern groove 102.
다음으로, 패턴 홈(102)을 형성한 후, 아세톤 등의 리무버를 이용하여 유리기재(10)를 세척하면 상기 에칭 레지스터(30)가 제거되어 도 5의 (c)와 같이 패턴 홈(102)에 의해 요철면(100)이 형성된 유리기재(10)를 제조할 수 있으며, 상기 패턴 홈(102)은, 돗트, 선형, 파형 중 어느 하나의 패턴을 갖는다.Next, after the pattern groove 102 is formed, when the glass substrate 10 is cleaned using a remover such as acetone, the etching resistor 30 is removed to form the pattern groove 102 as shown in FIG. The glass substrate 10 having the concave-convex surface 100 formed thereon may be manufactured, and the pattern groove 102 may have any one of dot, linear, and wavy patterns.
이러한 습식 에칭을 통해 패턴 홈(102)을 형성하는 경우, 광 반사율을 낮추기 위해 패턴 홈(102)의 측단면 형상이 반원형 형태로 이루어지도록 할 수 있다.When the pattern groove 102 is formed through the wet etching, the side cross-sectional shape of the pattern groove 102 may be formed in a semi-circular shape in order to lower the light reflectance.
상기 프라이머층(40) 및/또는 내지문코팅층(50)은 에칭레지스터층(30)이 제거된 상태에서 상기 요철면(100)이 형성된 유리기재(10)의 표면에 형성된다.The primer layer 40 and / or the gate coating layer 50 are formed on the surface of the glass substrate 10 on which the uneven surface 100 is formed in a state where the etching resist layer 30 is removed.
도 3 내지 도 5에서 상기 패턴 홈(102)의 폭 또는 넓이(W)는 전술한 바와 같이 0.3 ~ 5㎛이고, 패턴 홈(102) 간 거리(S)는 0.5 ~ 5㎛이며, 패턴 홈(102)의 깊이 또는 높이는 0.2 ~ 2㎛로서, 이와 같은 수치 범위는 고도의 정밀성을 요하지 않으므로 고가의 증착 또는 에칭 장비를 배제할 수 있고, 제조가 용이하기 때문에 최소의 비용으로 요철면(100) 형성이 가능하면서 유리기재(10) 표면 전체 면에 각 패턴 홈(102)의 폭 또는 넓이(W)와 각 패턴 홈(102) 간 이격 거리(S)를 일정하고 균일하게 가공할 수 있기 때문에 유리기재(10)의 표면에 형성된 요철면(100)이 규칙적으로 배열될 수 있다.3 to 5, the width or the width W of the pattern groove 102 is 0.3 to 5 μm as described above, and the distance S between the pattern grooves 102 is 0.5 to 5 μm, and the pattern groove ( Depth or height of 102) is 0.2 ~ 2㎛, such a numerical range does not require a high degree of precision can eliminate expensive deposition or etching equipment, because the ease of manufacture to form the uneven surface 100 with a minimum cost In addition, the glass substrate 10 can be uniformly and uniformly processed on the entire surface of the glass substrate 10 by the width or width W of the pattern grooves 102 and the distance S between the pattern grooves 102. The uneven surface 100 formed on the surface of 10 may be arranged regularly.
[시험예 1][Test Example 1]
- 광투과율 시험-Light transmittance test
본 발명의 패턴을 갖는 유리의 광 투과율을 확인하기 위하여 두께 0.8mm의 강화유리 표면에 대하여 전술한 건식 에칭 공정을 통해 깊이가 2㎛의 패턴 홈을 형성하였다. 이때 패턴 홈은 원형 돗트로서 각 패턴 홈의 넓이(직경)은 3㎛이고, 각 패턴 홈 간거리는 전후좌우로 3㎛ 간격을 이루도록 하였으며, 실험 데이터의 신뢰성을 위해 3개의 시료(AG1 ~ AG3)를 준비하였다.In order to confirm the light transmittance of the glass having the pattern of the present invention, a pattern groove having a depth of 2 μm was formed through the above-described dry etching process on the surface of the tempered glass having a thickness of 0.8 mm. At this time, the pattern groove is a circular dot, the width (diameter) of each pattern groove is 3㎛, and the distance between each pattern groove is 3㎛ at the front, rear, left and right, and three samples (AG1 ~ AG3) are used for the reliability of the experimental data. Ready.
또한, 비교재로서 패턴 홈을 형성하지 않은 평판 상의 두께 0.8mm의 강화유리(bare)를 준비하였다.Further, as a comparative material, a tempered glass (bare) having a thickness of 0.8 mm on a flat plate without a pattern groove was prepared.
이렇게 본 발명의 일 실시예에 따른 시료 AG1 내지 AG3와, 패턴이 없는 비교재 시료(bare)에 대해 분광광도계(모델명: U-4100)를 이용하여 가시광선 파장인 400nm ~ 700nm 범위의 광 유과율을 측정하였고, 그 결과는 하기 표 1과 같다.Thus, the light transmittance in the range of 400 nm to 700 nm of visible light wavelength using a spectrophotometer (Model: U-4100) for the samples AG1 to AG3 according to an embodiment of the present invention and a sample without a pattern (bare). Was measured, and the results are shown in Table 1 below.
파장(가시광선)Wavelength (Visible Light) AG1AG1 AG2AG2 AG3AG3 barebare
400nm400 nm 92.892.8 92.592.5 92.792.7 92.292.2
450nm450 nm 93.093.0 92.992.9 92.992.9 92.392.3
500nm500 nm 93.093.0 93.093.0 93.093.0 92.492.4
550nm550 nm 93.193.1 92.992.9 93.093.0 92.592.5
600nm600 nm 93.093.0 92.892.8 92.992.9 92.492.4
650nm650 nm 92.992.9 92.792.7 92.792.7 92.392.3
700nm700 nm 93.093.0 92.792.7 92.792.7 92.492.4
상기의 표 1에서 확인되는 바와 같이 400nm ~ 700nm 파장의 광투과율 각각의 평균치를 보면, 본 발명의 패턴 시료 AG1은 92.96nm, AG2는 92.79nm, AG3는 92.84nm로서 비교재의 평균치인 92.45nm보다 높다는 것을 확인하였다.As can be seen from Table 1, the average values of the light transmittances of the wavelengths of 400 nm to 700 nm are 92.96 nm, 92.79 nm for AG2, 92.79 nm for AG2, and 92.84 nm for AG3, which is higher than the average value of 92.45 nm. It was confirmed.
[시험예 2][Test Example 2]
- 접촉각 시험Contact angle test
전술한 시험예 1과 동일한 시료 및 비교재를 제작한 뒤, 3㎛ 워터 드롭의 표면 접촉각을 측정한 결과, 본 발명의 패턴 홈이 형성된 시료의 평균 접촉각은 140±1°였고, 비교재는 101±0.8°로 측정되었으며, 본 발명에 따른 패턴 홈이 형성된 유리기재의 발수성이 우수함을 확인하였다.After fabricating the same sample and comparative material as in Test Example 1 described above, the surface contact angle of the 3 μm water drop was measured. As a result, the average contact angle of the sample formed pattern grooves of the present invention was 140 ± 1 °, and the comparative material was 101 ±. It was measured at 0.8 °, it was confirmed that the water-repellent properties of the glass substrate with a pattern groove according to the present invention.
이와 같이 상술한 설명은 본 발명의 기술 사상을 보인 한정된 실시 예에 따라 설명하였으나, 본 발명은 특정의 실시 예나 수치에 한정되지 아니하며, 실시 예들의 구성요소 일부를 변경, 혼합하는 등, 특허청구범위에서 청구하는 본 발명의 요지를 벗어남이 없이 당해 발명이 속하는 기술 분야에서 통상의 지식을 가진 자에 의해 다양한 변형실시가 가능하고, 그러한 변형 실시는 본 발명의 기술적 사상이나 전망으로부터 개별적으로 이해되어서는 안 될 것이다.As described above has been described according to a limited embodiment showing the technical idea of the present invention, the present invention is not limited to a specific embodiment or numerical values, and the claims, such as changing some components of the embodiments, mixing Various modifications can be made by those skilled in the art without departing from the gist of the invention as claimed in the present invention, and such modifications can be separately understood from the technical spirit or the prospect of the invention. I will not.

Claims (5)

  1. 유리기재의 표면에 대하여 증착 공정 또는 에칭 공정에 의해 다수의 돗트(dot), 다수의 선형, 다수의 파형 중 어느 하나의 패턴 홈을 가진 요철면이 형성되고, On the surface of the glass substrate, an uneven surface having a pattern groove of any one of a plurality of dots, a plurality of linear lines, and a plurality of waveforms is formed by a deposition process or an etching process.
    상기 요철면의 표면 상에 두께 10 ~ 50㎚인 내지문코팅층이 형성되며, On the surface of the concave-convex surface is formed a gate coating layer having a thickness of 10 ~ 50nm
    상기 패턴 홈은, 폭 또는 넓이가 0.3 ~ 5㎛, 패턴 홈 간 거리가 0.5 ~ 5㎛이되, 각 패턴 홈의 폭 또는 넓이와 각 패턴 홈 간 이격 거리가 일정하게 됨으로써 요철면이 규칙적으로 배열된 것을 특징으로 하는 패턴을 갖는 투명 유리.The pattern groove has a width or width of 0.3 to 5 μm and a distance between the pattern grooves of 0.5 to 5 μm, and the width or width of each pattern groove and the distance between the pattern grooves become constant so that irregularities are regularly arranged. Transparent glass which has a pattern characterized by the above-mentioned.
  2. 청구항 1에 있어서,The method according to claim 1,
    상기 요철면과 상기 내지문코팅층 사이에 두께 10~30㎚인 프라이머층이 개재된 것을 특징으로 하는 패턴을 갖는 투명 유리.A transparent glass having a pattern, wherein a primer layer having a thickness of 10 to 30 nm is interposed between the uneven surface and the to-coating layer.
  3. 청구항 1 또는 청구항 2에 있어서,The method according to claim 1 or 2,
    상기 증착 공정은, 상기 패턴 홈과 대응하는 패턴 영역이 폐쇄되고 나머지 영역이 개방된 마스크를 부착하는 단계와, 상기 마스크의 개방 영역에 대하여 진공 환경하에서 산화물 또는 불화물을 0.2 ~ 2㎛ 높이로 증착하는 단계와, 상기 마스크를 제거하는 단계를 포함하는 것을 특징으로 하는 패턴을 갖는 투명 유리.The deposition process may include attaching a mask in which a pattern region corresponding to the pattern groove is closed and the remaining region is opened, and depositing an oxide or fluoride at a height of 0.2 to 2 μm in a vacuum environment with respect to the open region of the mask. And removing the mask, wherein the transparent glass has a pattern.
  4. 청구항 1 또는 청구항 2에 있어서,The method according to claim 1 or 2,
    상기 에칭 공정은, 상기 패턴 홈과 대응하는 패턴 영역이 개방되고 나머지 영역이 폐쇄된 마스크를 부착하는 단계와, 건식 에칭을 통해 상기 마스크의 개방 영역의 유리 표면을 0.2 ~ 2㎛ 깊이로 에칭함으로써 상기 패턴 홈을 형성하는 단계와, 상기 마스크를 제거하는 단계를 포함하는 것을 특징으로 하는 패턴을 갖는 투명 유리.The etching process includes attaching a mask in which the pattern region corresponding to the pattern groove is opened and the remaining region is closed, and etching the glass surface of the open region of the mask to a depth of 0.2 to 2 μm through dry etching. And forming a pattern groove, and removing the mask.
  5. 청구항 1 또는 청구항 2에 있어서,The method according to claim 1 or 2,
    상기 에칭 공정은, 상기 패턴 홈과 대응하는 패턴 영역이 폐쇄되고 나머지 영역이 개방된 마스크를 부착하는 단계와, 상기 마스크의 개방 영역에 대하여 에칭 레지스터를 도포하여 상기 유리기재 표면에 에칭레지스터층을 형성하는 단계와, 상기 마스크를 제거하는 단계와, 습식 에칭을 통해 상기 에칭레지스터층이 형성되지 않은 영역의 유리 표면을 0.2 ~ 2㎛ 깊이로 에칭함으로써 상기 패턴 홈을 형성하는 단계와, 리무버로 상기 에칭레지스터층을 제거하는 단계를 포함하는 것을 특징으로 하는 패턴을 갖는 투명 유리.The etching process includes attaching a mask in which the pattern region corresponding to the pattern groove is closed and the remaining region is open, and applying an etching resistor to the open region of the mask to form an etching resist layer on the surface of the glass substrate. Forming a pattern groove by etching the glass surface in a region where the etching resist layer is not formed by a wet etching to a depth of 0.2 to 2 μm through wet etching, and removing the mask with the remover. And removing the resist layer.
PCT/KR2016/007543 2015-07-24 2016-07-12 Transparent glass having pattern WO2017018692A1 (en)

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