WO2017016144A1 - Capteur de déplacement, procédé d'utilisation et de fabrication associé, et interféromètre - Google Patents

Capteur de déplacement, procédé d'utilisation et de fabrication associé, et interféromètre Download PDF

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Publication number
WO2017016144A1
WO2017016144A1 PCT/CN2015/097620 CN2015097620W WO2017016144A1 WO 2017016144 A1 WO2017016144 A1 WO 2017016144A1 CN 2015097620 W CN2015097620 W CN 2015097620W WO 2017016144 A1 WO2017016144 A1 WO 2017016144A1
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Prior art keywords
diffracted light
light
diffraction grating
displacement sensor
diffracted
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PCT/CN2015/097620
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English (en)
Chinese (zh)
Inventor
孙天玉
张宝顺
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中国科学院苏州纳米技术与纳米仿生研究所
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Publication of WO2017016144A1 publication Critical patent/WO2017016144A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P13/00—Indicating or recording presence, absence, or direction, of movement

Definitions

  • the present invention relates to the field of Micro Optic Electro Mechanical System (MOEMS) technology, and more particularly to a displacement sensor.
  • MOEMS Micro Optic Electro Mechanical System
  • Displacement refers to the offset of the position of the object relative to the reference point.
  • the displacement is easy to detect and easy to obtain high-precision detection results compared with other quantities. Therefore, the mechanical quantity of the measured object is often converted into The amount of displacement is detected.
  • the acceleration is converted into a displacement of the mass
  • the expansion is converted into a displacement of the surface of the object, and the like.
  • Small displacement measurement is the basis of measurement techniques such as pressure, acceleration, flow, temperature, and vibration.
  • Large displacement measurement is the basis of automated production lines (such as robot movement), industrial inspection (such as expansion), and online monitoring (such as vibration).
  • the photoelectric displacement sensor converts the displacement information into optical information and is reflected by the light intensity detected by the photodiode.
  • Photoelectric displacement sensors have been widely studied and applied for their non-contact measurement, fast test speed, high precision and small test points.
  • the existing photoelectric displacement tests mainly include laser triangulation, Moire fringe method, double beam interferometry, dual-frequency laser interferometry based on Doppler effect, etc., which are mostly used for measurement of large displacement, and their optical path systems are also It is more complicated and cannot meet the requirements of small size, easy integration, high reliability and low power consumption in modern industrial development.
  • the two-beam interferometry is based on a Michelson interferometer, which uses information about the change in the interference intensity of the two beams to reflect the amount of displacement.
  • the displacement information of the object to be measured is inferred from the interference intensity.
  • the sinusoidal phase modulation method can make the displacement measurement accuracy reach more than one percent of the wavelength of the detection light.
  • the coherence length of the source determines the maximum measurable range.
  • the light source is mostly provided by a He-Ne laser, but the body of the He-Ne laser itself. The larger the product, which fundamentally affects the volume of the large displacement two-beam interferometry system.
  • embodiments of the present invention are expected to provide a displacement sensor and an interferometer that are characterized by miniaturization, ease of integration, high reliability, and low power consumption.
  • the embodiment of the invention provides a displacement sensor, and the displacement sensor comprises:
  • a diffraction grating for directly diffracting and reflecting a part of the light of the laser beam to generate a first diffracted light; and simultaneously for passing the laser beam through itself, reaching an object to be measured, and reflecting the object to be tested Diffracting a portion of the light again through itself to form a second diffracted light;
  • a detector located at the intersection of the diffracted lights of the first order of the first diffracted light and the second diffracted light, for measuring between the first diffracted light and the second diffracted light The change in the interference intensity information
  • An information processor connected to the detector, for reading an interference intensity signal, and inverting displacement information of the object to be tested according to the interference intensity change information detected by the detector;
  • the diffraction grating is located between the semiconductor laser and the object to be tested.
  • the displacement sensor further includes:
  • a diffraction grating modulation and demodulation device for introducing periodic vibration to the diffraction grating and demodulating the interference intensity information detected by the detector.
  • the displacement sensor further includes:
  • the reflected light collecting device is configured to collect the light reflected by the object to be measured, so that the detected second diffracted light has the same intensity as the diffracted light of the first order of the first diffracted light.
  • the semiconductor laser is a long coherence distance semiconductor laser.
  • the invention also provides an interferometer comprising:
  • a diffraction grating for directly diffracting and reflecting a part of the light of the laser beam to generate a first diffracted light; and simultaneously for passing the laser beam through itself, reaching an object to be measured, and reflecting the object to be tested Diffracting a portion of the light again through itself to form a second diffracted light;
  • a detector located at the intersection of the diffracted lights of the first order of the first diffracted light and the second diffracted light, for measuring between the first diffracted light and the second diffracted light The change in the interference intensity information.
  • the interferometer further includes:
  • a diffraction grating modulation and demodulation device for introducing periodic vibration to the diffraction grating and demodulating the interference intensity information detected by the detector.
  • the interferometer further includes:
  • the reflected light collecting device is configured to collect the light reflected by the object to be measured, so that the detected second diffracted light has the same intensity as the diffracted light of the first order of the first diffracted light.
  • the semiconductor laser is a long coherence distance semiconductor laser.
  • the invention also provides a method of using a displacement sensor, the method comprising:
  • a semiconductor laser generates a laser beam
  • the diffraction grating directly diffracts and reflects a part of the light of the laser beam to generate a first diffracted light; at the same time, the diffraction grating passes the laser beam through itself, reaches an object to be measured, and passes through the object to be measured to pass through again. a part of the light of itself, diffracted into the second diffracted light;
  • the detector measures a change in interference intensity information between the first diffracted light and the diffracted light of the second order of the second diffracted light;
  • the information processor reads the interference intensity signal and inverts the displacement information of the object to be tested according to the interference intensity change information detected by the detector.
  • the invention also provides a method for manufacturing a displacement sensor, the method comprising:
  • All or part of the semiconductor laser, the diffraction grating, the photodetector, the information processor, and the grating modulation device, the MOEMS element of the reflected light collecting device are integrated into one single piece.
  • the probe light of the displacement sensor provided by the present invention can be provided by a long coherence distance semiconductor laser, unlike the existing dual beam displacement measurement system, and the probe light is provided by a He-Ne laser or the like.
  • the displacement sensor thus invented has the characteristics of miniaturization and easy integration.
  • the maximum range measured by the sensor is half the coherence distance of the semiconductor laser. With the continuous advancement of the long coherence distance semiconductor laser technology, the range of the invented displacement sensor can reach several meters or more.
  • the method of generating the coherent double beam is not realized by using different optical paths like the Michelson interferometer, but by using the semi-transverse property of the diffraction grating to achieve the splitting.
  • the direct reflection of the grating and the surface reflection of the object to be measured provide two coherent lights whose optical path difference contains the displacement information of the object to be measured.
  • the two beams that interfere with each other may be diffracted light of any one of the first diffracted light and the second diffracted light, such as 0th order, ⁇ 1 order, ⁇ 2 order, etc., and their spatial directions are different, so different levels of diffracted light are utilized.
  • the spatial position of the corresponding detector is also different.
  • a modulation system can be introduced to the diffraction grating. Periodic vibration is introduced into the diffraction grating, and then the interference intensity information detected by the detector is demodulated; this can effectively suppress and reduce noise and improve measurement accuracy.
  • the components of the displacement sensor and the interferometer provided by the present invention can utilize the MOEMS work.
  • the art production therefore, makes the displacement sensor and the interferometer provided by the invention have the characteristics of miniaturization and easy integration.
  • FIG. 1 is a schematic structural diagram of a displacement sensor according to an embodiment of the present invention.
  • FIG. 2 is a schematic flow chart of a method for using a displacement sensor according to an embodiment of the present invention
  • FIG. 3 is a schematic diagram of light propagation during operation of a displacement sensor according to an embodiment of the present invention.
  • FIG. 1 is a schematic structural diagram of a displacement sensor according to an embodiment of the present invention. As shown in FIG. 1 , the displacement sensor includes:
  • a diffraction grating 102 for directly diffracting and reflecting a part of the light of the laser beam to generate a first diffracted light; and simultaneously for passing the laser beam through itself, reaching an object to be measured, and reflecting by the object to be tested After that, a part of the light is again diffracted through itself to form a second diffracted light;
  • the detector 103 is located at the intersection of the diffracted lights of the first order of the first diffracted light and the second diffracted light, and is used for measuring the diffracted light of the first order of the first diffracted light and the second diffracted light. Change in interference intensity information;
  • the information processor 104 is connected to the detector for reading the interference intensity signal, and inverting the displacement information of the object to be tested according to the interference intensity change information detected by the detector;
  • the diffraction grating is located between the semiconductor laser and the object to be tested.
  • the semiconductor laser 101 may be a long coherence distance semiconductor laser, so that the displacement sensor can measure a large displacement, and the range of the displacement sensor is half of the coherence distance of the semiconductor laser, with long coherence
  • the range of the displacement sensor invented can reach several meters or more.
  • the diffraction grating 102 may be implemented as a grating that is transflective to the laser light.
  • the detector 103 may be a photodetector; the position of the detector 103 is the wavelength of the laser light emitted from the semiconductor laser 101, the period of the diffraction grating 102, and the diffracted light to be measured to interfere.
  • the position of the detector 103 is the wavelength of the laser light emitted from the semiconductor laser 101, the period of the diffraction grating 102, and the diffracted light to be measured to interfere.
  • the position of the detector is determined by the direction of the diffraction order to be measured and the distance between the detection surface and the diffraction grating. . Therefore, it is necessary to preset which level of diffracted light is specifically measured. In practical applications, it can be set to 0, ⁇ 1, ⁇ 2, etc. according to the specific situation, that is, the diffracted light of the same order of the above-mentioned preset can be It is a class 0, ⁇ 1 level, ⁇ 2 level diffracted light.
  • the information processor 104 may be in a practical application by a central processing unit (CPU), a microprocessor (MPU), a digital signal processor (DSP), or a field programmable gate array located in the displacement sensor. (FPGA) implementation.
  • CPU central processing unit
  • MPU microprocessor
  • DSP digital signal processor
  • FPGA field programmable gate array
  • the above displacement sensor may further include:
  • the diffraction grating modulation and demodulation device 105 is configured to introduce periodic vibration to the diffraction grating and demodulate the interference intensity information detected by the detector.
  • the diffraction grating modulation and demodulation device 105 can be implemented by a method such as piezoelectric modulation.
  • the purpose of the diffraction grating modulation and demodulation device is to suppress noise during measurement, and it can be implemented by means of phase lock amplification in a small signal processing. Improve the signal-to-noise ratio of the detection signal to improve the accuracy of the displacement measurement.
  • the above displacement sensor may further include:
  • the reflected light collecting device 106 is configured to collect the light reflected by the object to be tested, so that the detected second diffracted light has the same intensity as the diffracted light of the first order of the first diffracted light.
  • the reflected light collecting device 106 can be implemented by a lens or the like.
  • the purpose of the reflected light collecting device 106 is to cause more light reflected by the object to be measured to participate in coherence. Ideally, the intensity of the two beams participating in the coherence is equal.
  • the present invention also provides an interferometer comprising:
  • a diffraction grating for directly diffracting and reflecting a part of the light of the laser beam to generate a first diffracted light; and simultaneously for passing the laser beam through itself, reaching an object to be measured, and reflecting the object to be tested Diffracting a portion of the light again through itself to form a second diffracted light;
  • a detector located at the intersection of the diffracted lights of the first order of the first diffracted light and the second diffracted light, for measuring between the first diffracted light and the second diffracted light The change in the interference intensity information.
  • the interferometer further includes:
  • a diffraction grating modulation and demodulation device for introducing periodic vibration to the diffraction grating and demodulating the interference intensity information detected by the detector.
  • the interferometer further includes:
  • the reflected light collecting device is configured to collect the light reflected by the object to be measured, so that the detected second diffracted light has the same intensity as the diffracted light of the first order of the first diffracted light.
  • the semiconductor laser is a long coherence distance semiconductor laser.
  • FIG. 2 is a schematic flow chart of a method for using the above displacement sensor according to the present invention. As shown in FIG. 2, the method includes:
  • Step 201 the semiconductor laser generates a laser beam
  • Step 202 The diffraction grating directly diffracts and reflects a part of the light of the laser beam to generate a first diffracted light; and the diffraction grating passes the laser beam through itself, reaches an object to be tested, and is reflected by the object to be tested. Diffracting a portion of the light again through itself to form a second diffracted light;
  • the first diffracted light includes a series of diffraction orders.
  • a part of the laser beam passes through the diffraction grating to reach the object to be measured, is reflected by the object to be measured, and then diffracted into the second diffracted light through the diffraction grating through the reflected light collecting device.
  • the second diffracted light also contains a series of diffraction orders, such as 0, ⁇ 1, ⁇ 2, and the like.
  • Step 203 The detector measures a change in interference intensity information between the first diffracted light and the diffracted light of the second order of the second diffracted light.
  • the diffraction grating is adjusted such that the reflection surface of the object to be measured is parallel to the reflection surface of the grating, as shown in FIG. 3, and the space of the diffracted light of the same diffraction order preset in the first diffracted light and the second diffracted light at this time The directions are the same and they will interfere.
  • the detector is adjusted such that the detector is located at the intersection of the same diffraction orders preset in the first diffracted light and the second diffracted light, as shown in FIG. In this way, the detector can measure the change information of the interference intensity between the first diffracted light and the second diffracted light.
  • the predetermined same diffraction order means that the order of the first diffracted light and the second diffracted light is 0, the same as ⁇ 1, and the same as ⁇ 2.
  • the diffraction grating can be introduced into the diffraction grating by the diffraction grating modulation and demodulation device, and the interference intensity change information detected by the detector can be demodulated to suppress noise during the measurement process.
  • Step 204 The information processor reads the interference intensity signal, and inverts the displacement information of the object to be tested according to the interference intensity change information detected by the detector;
  • the optical path difference between the first diffracted light and the second diffracted light that interferes at this time is determined by the distance between the reflective surface of the diffraction grating and the reflective surface of the object to be measured, and thus The method of measuring the displacement information by the Michelson interferometer is the same.
  • the information processor can reverse the displacement information of the moving object after passing through the existing processing circuit and executing the existing processing algorithm.
  • the invention also provides a method for manufacturing the above displacement sensor, the method comprising:
  • All or part of the semiconductor laser, the diffraction grating, the photodetector, the information processor, and the grating modulation device, the MOEMS element of the reflected light collecting device are integrated into one single piece.
  • a separate semiconductor laser, a diffraction grating, a grating modulation device, a reflected light collecting device, a photodetector, an information processor, and the like are assembled with reference to FIG. 1 to constitute the inventive displacement sensor; or
  • MOEMS component of the reflected light collecting device into a single chip, to make a fully integrated Or semi-integrated MOEMS displacement sensor.
  • the probe light of the displacement sensor provided by the present invention can be provided by a long coherence distance semiconductor laser, unlike the existing dual beam displacement measurement system, and the probe light is provided by a He-Ne laser or the like.
  • the displacement sensor thus invented has the characteristics of miniaturization and easy integration.
  • the maximum range measured by the sensor is half the coherence distance of the semiconductor laser. With the continuous advancement of the long coherence distance semiconductor laser technology, the range of the invented displacement sensor can reach several meters or more.
  • the method of generating the coherent double beam is not realized by using different optical paths like the Michelson interferometer, but by using the semi-transverse property of the diffraction grating to achieve the splitting.
  • the direct reflection of the grating and the surface reflection of the object to be measured provide two coherent lights whose optical path difference contains the displacement information of the object to be measured.
  • the two beams that interfere with each other may be diffracted light of any one of the first diffracted light and the second diffracted light, such as 0th order, ⁇ 1 order, ⁇ 2 order, etc., and their spatial directions are different, so different levels of diffracted light are utilized.
  • the spatial position of the corresponding detector is also different.
  • a modulation system can be introduced to the diffraction grating. Periodic vibration is introduced into the diffraction grating, and then the interference intensity information detected by the detector is demodulated; this can effectively suppress and reduce noise and improve measurement accuracy.
  • the invented displacement sensor In terms of manufacturing method, it can be built by separate component patches or integrated. When the separated component patches are constructed, separate semiconductor lasers, diffraction gratings, grating modulation devices, reflected light collecting devices, photodetectors, information processors, and the like are assembled with reference to FIG. 1 to constitute the inventive displacement sensor. Since the components of the invented displacement sensor are manufactured to be compatible with existing MOEMS processes, a single integrated displacement sensor can be fabricated using all MOEMS processes.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)

Abstract

L'invention concerne un capteur de déplacement, comprenant : un laser à semi-conducteur (101) pour générer un faisceau laser ; un réseau de diffraction (102) pour diffracter directement puis réfléchir une partie de la lumière du faisceau laser pour générer une première lumière diffractée, et pour diffracter une partie de la lumière du faisceau laser passant à travers le réseau de diffraction, atteindre un objet à mesurer, et passer à travers le réseau de diffraction à nouveau après qu'elle a été réfléchie par l'objet, de manière à former une seconde lumière diffractée ; un détecteur (103), situé au niveau d'une intersection de lumières diffractées ayant un ordre identique prédéfini dans la première lumière diffractée et la seconde lumière diffractée à mesurer, et étant destiné à mesurer un changement d'informations d'intensité d'interférence entre les lumières diffractées ; et un processeur d'informations (104), connecté au détecteur (103), et étant destiné à lire un signal d'intensité d'interférence, et à inverser, selon les informations de variation d'intensité d'interférence mesurée par le détecteur (103), des informations de déplacement de l'objet, le réseau de diffraction (102) étant situé entre le laser semi-conducteur (101) et l'objet. L'invention concerne également des procédés d'utilisation et de fabrication du capteur de déplacement, et un interféromètre.
PCT/CN2015/097620 2015-07-27 2015-12-16 Capteur de déplacement, procédé d'utilisation et de fabrication associé, et interféromètre WO2017016144A1 (fr)

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CN201510447068.9A CN106403821A (zh) 2015-07-27 2015-07-27 一种位移传感器及其使用、制作方法和一种干涉仪

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CN109029273A (zh) * 2018-10-24 2018-12-18 中北大学 一种基于环形器的纳米光栅0级检测位移的测量方法
CN109211122B (zh) * 2018-10-30 2020-05-15 清华大学 基于光神经网络的超精密位移测量系统及方法
CN110388980A (zh) * 2019-07-31 2019-10-29 山东大学 一种基于衍射光栅结构的微型声学传感器
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