WO2016204058A1 - 有機el素子の製造方法 - Google Patents
有機el素子の製造方法 Download PDFInfo
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- WO2016204058A1 WO2016204058A1 PCT/JP2016/067176 JP2016067176W WO2016204058A1 WO 2016204058 A1 WO2016204058 A1 WO 2016204058A1 JP 2016067176 W JP2016067176 W JP 2016067176W WO 2016204058 A1 WO2016204058 A1 WO 2016204058A1
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- Prior art keywords
- organic
- forming
- layer
- organic functional
- functional layer
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- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
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- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
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- YMBNBZFZTXCWDV-UHFFFAOYSA-N ethane-1,2-diol;propane-1,2,3-triol Chemical compound OCCO.OCC(O)CO YMBNBZFZTXCWDV-UHFFFAOYSA-N 0.000 description 1
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- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
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- 150000003462 sulfoxides Chemical class 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- IFLREYGFSNHWGE-UHFFFAOYSA-N tetracene Chemical compound C1=CC=CC2=CC3=CC4=CC=CC=C4C=C3C=C21 IFLREYGFSNHWGE-UHFFFAOYSA-N 0.000 description 1
- NLDYACGHTUPAQU-UHFFFAOYSA-N tetracyanoethylene Chemical group N#CC(C#N)=C(C#N)C#N NLDYACGHTUPAQU-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- JFLKFZNIIQFQBS-FNCQTZNRSA-N trans,trans-1,4-Diphenyl-1,3-butadiene Chemical group C=1C=CC=CC=1\C=C\C=C\C1=CC=CC=C1 JFLKFZNIIQFQBS-FNCQTZNRSA-N 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 229910021642 ultra pure water Inorganic materials 0.000 description 1
- 239000012498 ultrapure water Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/841—Self-supporting sealing arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/811—Controlling the atmosphere during processing
Definitions
- the present invention relates to a method for producing an organic EL element.
- Organic electroluminescence elements (hereinafter referred to as “organic EL elements”) have high luminous efficiency and low driving voltage, and therefore can be suitably used for display and lighting applications.
- the organic EL device includes an anode, a cathode, and a light emitting layer disposed between the anode and the cathode, and holes and electrons injected from the anode and the cathode, respectively, are combined in the light emitting layer. Emits light.
- An organic EL element has an advantage that an organic layer such as a light emitting layer can be formed by a coating method that is easy to manufacture and can easily increase the area of the element.
- the organic layer film forming step is performed such that the sulfur oxide concentration is 2.2 ⁇ g / m 3 or less, the nitrogen oxide concentration is 3.1 ⁇ g / m 3 or less, A method for manufacturing an organic EL element manufactured at a carbon concentration of 0.7 ⁇ g / m 3 or less has been proposed (Patent Document 1).
- an object of this invention is to provide the manufacturing method of the organic EL element which is excellent in the light emission lifetime.
- a method for producing an organic EL device comprising an anode, a cathode, at least one organic functional layer provided between the anode and the cathode, and a sealing layer, Including a step of forming an anode, a step of forming a cathode, a step of forming at least one organic functional layer, and a step of forming a sealing layer, Average concentration of sulfur oxide to which the organic EL element being manufactured is exposed from the start of the step of forming at least one organic functional layer to the end of the step of forming the sealing layer: A (ppm), The method for producing an organic EL device, wherein the exposure time: B (seconds) satisfies the formula (1-1).
- the step of forming at least one organic functional layer includes a film forming step, a drying step, and a baking step, and the time required for the film forming step: C (seconds) satisfies the formula (2-1).
- the manufacturing method of the organic EL element as described in [1]. 0 ⁇ A ⁇ (BC) ⁇ 2.2 (2-1) [3] The method for producing an organic EL element according to [1] or [2], wherein A satisfies Formula (3-1). 0 ⁇ A ⁇ 0.3 (3-1) [4] The method for producing an organic EL element according to any one of [1] to [3], wherein B satisfies formula (4-1).
- FIG. 1 From the average concentration of sulfur oxide to which the organic EL element being manufactured is exposed: A (ppm) and the exposure time: B (second), the time required for the film-forming stage of at least one organic functional layer: C (second) It is a figure which shows the relationship with the reduced time BC: A ⁇ (BC) and the luminance 5% life reduction (time).
- the “polymer compound” means a polymer having a molecular weight distribution and having a polystyrene-equivalent number average molecular weight of 1 ⁇ 10 3 to 1 ⁇ 10 8 .
- the polymer compound may be any of a block copolymer, a random copolymer, an alternating copolymer, and a graft copolymer, or other embodiments.
- Low molecular weight compound means a compound having no molecular weight distribution and a molecular weight of 1 ⁇ 10 4 or less.
- crosslinking group is a group capable of generating a new bond by being subjected to heat treatment (baking), ultraviolet irradiation treatment, radical reaction, etc., and preferably has the formula (B-1)-( B-17) is a group represented by any of the above. These groups may have a substituent.
- the organic EL element being manufactured is exposed means being exposed to a gas existing outside the organic EL element.
- At the start of the step of forming at least one organic functional layer “means the start of the step of forming the first organic functional layer.
- Ppm is based on volume.
- the production method of the present invention comprises: A method for producing an organic EL device comprising an anode, a cathode, at least one organic functional layer provided between the anode and the cathode, and a sealing layer, Including a step of forming an anode, a step of forming a cathode, a step of forming at least one organic functional layer, and a step of forming a sealing layer, Average concentration of sulfur oxide to which the organic EL element being manufactured is exposed from the start of the step of forming at least one organic functional layer to the end of the step of forming the sealing layer: A (ppm),
- the exposure time: B (seconds) is a method for manufacturing an organic EL element that satisfies the above formula (1-1).
- the product A ⁇ B of the average concentration A of sulfur oxides and the exposure time B indicates that the organic EL element being manufactured is exposed in the process of forming each organic functional layer. It can also be calculated from the sum of the products of the average concentration a (ppm) of sulfur oxide and the exposure time b (seconds).
- a ⁇ B preferably satisfies the formula (1-2), more preferably satisfies the formula (1-3), and more preferably satisfies the formula (1-4) because it can maintain a good element lifetime.
- 0 ⁇ A ⁇ B ⁇ 1 (1-2) 0 ⁇ A ⁇ B ⁇ 0.5 (1-3) 0.2 ⁇ A ⁇ B ⁇ 0.5 (1-4)
- the process of forming at least one organic functional layer usually includes a film forming stage, a drying stage, a standby stage, a firing stage, and a cooling stage.
- the drying step, the standby step, the firing step, and the cooling step can be omitted if unnecessary.
- the film forming step is a step of forming a film with an organic functional material or a composition containing an organic functional material and an organic solvent by using a vacuum deposition method or a coating method.
- the drying step is a step of removing the organic solvent as necessary when the film forming step is performed by a coating method.
- the drying step is preferably performed in a vacuum in order to flatten the film shape.
- the standby stage is a stage in which the organic EL element being manufactured is held before moving to the next stage.
- the standby stage is preferably a short time.
- the baking step is a step of removing the water in the organic solvent or the organic functional layer remaining in the drying step in order to crosslink the cross-linking group or when the organic functional material has a cross-linking group.
- the firing step is preferably performed in an inert gas atmosphere in order to prevent oxidation of the organic functional material.
- the cooling step is a step of returning the baked organic EL element being manufactured to room temperature.
- the cooling step is preferably performed in a dry environment with a moisture concentration of 1 ppm or less in order to prevent moisture adsorption.
- the process of forming at least one organic functional layer includes a film forming stage, a drying stage, and a firing stage, and the film forming stage includes The time required: C (seconds) preferably satisfies the formula (2-1).
- the product A ⁇ (BC) of the average concentration A of sulfur oxides and the exposure time BC is calculated in the process of forming each organic functional layer. It can also be calculated from the sum of the products of the average sulfur oxide concentration a (ppm) and the exposure time bc (seconds) to which the organic EL element is exposed.
- a ⁇ (BC) preferably satisfies the formula (2-2), more preferably satisfies the formula (2-3), and particularly preferably satisfies the formula (2-4).
- 0 ⁇ A ⁇ (BC) ⁇ 1 (2-2) 0 ⁇ A ⁇ (BC) ⁇ 0.5 (2-3) 0.2 ⁇ A ⁇ (BC) ⁇ 0.5 (2-4)
- A can maintain a good element lifetime, it preferably satisfies the above formula (3-1), more preferably satisfies the formula (3-2), and further preferably satisfies the formula (3-3). . 0 ⁇ A ⁇ 0.03 (3-2) 0 ⁇ A ⁇ 0.003 (3-3)
- B can maintain a good element lifetime, it preferably satisfies the above formula (4-1), more preferably satisfies the formula (4-2), and further preferably satisfies the formula (4-3). . 0 ⁇ B ⁇ 43200 (4-2) 0 ⁇ B ⁇ 18000 (4-3)
- C can maintain a good device lifetime, it preferably satisfies the above formula (5-1), more preferably satisfies the formula (5-2), and further preferably satisfies the formula (5-3). . 0 ⁇ C ⁇ 1500 (5-2) 0 ⁇ C ⁇ 600 (5-3)
- the production method of the present invention from the start of the step of forming at least one organic functional layer to the end of the step of forming the sealing layer, it is performed in an environment where the average concentration of sulfur oxide is low.
- an environment can be prepared by any method, but from the start of the process of forming at least one organic functional layer to the end of the process of forming the sealing layer, a removal filter is installed at the outside air intake. It is preferable to carry out in the indoor environment.
- the removal filter examples include chemical filters such as a chemical filter using activated carbon and a chemical filter using a catalyst. Since the average concentration of sulfur oxides can be further reduced, a chemical filter using activated carbon is used. preferable.
- the average concentration of sulfur oxide can be measured, for example, using a detector tube manufactured by Gastec.
- the organic EL device produced by the production method of the present invention has an anode, a cathode, at least one organic functional layer, and a sealing layer.
- the organic functional layer is a layer containing a material capable of injecting and transporting holes or electrons to cause light emission by passing a current through the anode and the cathode or applying a voltage.
- the material used for the organic functional layer may be any material that can inject and transport holes or electrons by applying an electric current or applying a voltage to emit light. preferable.
- organic functional material known materials can be used.
- a distyryl biphenyl material a dimesitylboryl material, a stilbene material, a dipyrylyl dicyanobenzene material, a benzoxazole material, a distyryl material, and a carbazole material
- Dibenzochrysene materials arylamine materials, pyrene-substituted oligothiophene materials, PPV oligomer materials, carbazole materials, and polyfluorene materials.
- the organic functional layer is preferably formed by a coating method using a composition containing an organic functional material and an organic solvent.
- coating methods include spin coating, casting, micro gravure coating, gravure coating, bar coating, roll coating, wire bar coating, dip coating, spray coating, screen printing, and flexographic printing. Method, offset printing method, ink jet printing method, capillary coating method, and nozzle coating method, and spin coating method, nozzle coating method, and ink jet printing method are preferable.
- the viscosity of the composition may be adjusted depending on the type of coating method, but when ink is applied to a printing method such as an ink jet printing method via an ejection device, in order to prevent clogging and flight bending at the time of ejection. Further, it is preferably 1 to 20 mPa ⁇ s at 25 ° C.
- the organic solvent contained in the composition is preferably a solvent that can dissolve or uniformly disperse the solid content in the composition.
- the organic solvent include chlorine solvents such as 1,2-dichloroethane, 1,1,2-trichloroethane, chlorobenzene and o-dichlorobenzene; ether solvents such as tetrahydrofuran, dioxane, anisole and 4-methylanisole; toluene , Xylene, mesitylene, ethylbenzene, n-hexylbenzene, cyclohexylbenzene and other aromatic hydrocarbon solvents; cyclohexane, methylcyclohexane, n-pentane, n-hexane, n-heptane, n-octane, n-nonane, n -Aliphatic hydrocarbon solvents such as decane, n-dodecane, bicyclohexyl
- a solvent may be used individually by 1 type, or may use 2 or more types together.
- Examples of the organic functional layer include a hole transport layer, a hole injection layer, an electron transport layer, an electron injection layer, and a light emitting layer.
- the hole transport layer, the hole injection layer, the electron transport layer, the electron injection layer, and the light emitting layer contain a hole transport material, a hole injection material, an electron transport material, an electron injection material, and a light emitting material, respectively. Each of these can be formed using a material, a hole injection material, an electron transport material, an electron injection material, and a light emitting material.
- the order, number and thickness of the layers to be laminated may be adjusted in consideration of the light emission lifetime of the organic EL element produced by the production method of the present invention.
- the thicknesses of the hole transport layer, hole injection layer, electron transport layer, electron injection layer and light emitting layer are usually 1 nm to 10 ⁇ m, respectively.
- the organic EL device produced by the production method of the present invention is at least one layer of a hole injection layer and a hole transport layer between the anode and the light emitting layer from the viewpoint of hole injection properties and hole transport properties. From the viewpoint of electron injecting property and electron transporting property, it is preferable to have at least one of an electron injecting layer and an electron transporting layer between the cathode and the light emitting layer.
- the hole transport layer, the hole injection layer, the electron transport layer, the electron injection layer, and the light emitting layer may be formed by using, for example, a powder when a low molecular weight compound is used.
- a powder when a low molecular weight compound is used.
- a polymer compound for example, a method by film formation from a solution or a molten state may be mentioned.
- a composition containing a hole transport material, a hole injection material, an electron transport material, an electron injection material, and a light emitting layer is used. And can be formed by a coating method. Examples of the coating method include the same coating methods as those used in the formation of the organic functional layer described above. Moreover, as an organic solvent contained in this composition, the thing similar to the organic solvent contained in the composition in formation of the organic functional layer mentioned above is mentioned, for example.
- the amount of the organic solvent is usually 1000 to 100,000 parts by weight, preferably 100 to 100 parts by weight, preferably 100 parts by weight of the hole transport material, hole injection material, electron transport material, electron injection material and light emitting material. 2000 to 20000 parts by weight.
- a hole transport material, a hole injection material, an electron transport material, an electron injection material, and a light-emitting material are a hole transport layer, a hole injection layer, an electron transport layer, an electron, respectively, in the method for producing an organic EL device of the present invention.
- the material When dissolved in a solvent used when forming a layer adjacent to the injection layer and the light emitting layer, it is preferable that the material has a crosslinking group in order to avoid dissolution of the material in the solvent. After forming each layer using a material having a crosslinking group, the layer can be insolubilized by crosslinking the crosslinking group.
- the heating temperature for cross-linking each layer is usually 25 to 300 ° C., and the organic EL device produced by the production method of the present invention has an excellent emission lifetime, and is preferably 50 to 250 ° C., more preferably Is 150-200 ° C.
- the types of light used for light irradiation for crosslinking each layer are, for example, ultraviolet light, near ultraviolet light, and visible light.
- the organic EL device produced by the production method of the present invention usually has a substrate.
- the substrate may be any substrate as long as it can form electrodes and does not change chemically when the organic functional layer is formed.
- the substrate is made of a material such as glass, plastic, or silicon.
- Examples of the material for the anode include conductive metal oxides and translucent metals, preferably indium oxide, zinc oxide, tin oxide; indium tin oxide (ITO), indium zinc oxide, etc.
- conductive metal oxides and translucent metals preferably indium oxide, zinc oxide, tin oxide; indium tin oxide (ITO), indium zinc oxide, etc.
- Examples of the material of the cathode include metals such as lithium, sodium, potassium, rubidium, cesium, beryllium, magnesium, calcium, strontium, barium, aluminum, zinc, indium; two or more kinds of alloys thereof; Alloys of at least one species and at least one of silver, copper, manganese, titanium, cobalt, nickel, tungsten, and tin; and graphite and graphite intercalation compounds.
- Examples of the alloy include a magnesium-silver alloy, a magnesium-indium alloy, a magnesium-aluminum alloy, an indium-silver alloy, a lithium-aluminum alloy, a lithium-magnesium alloy, a lithium-indium alloy, and a calcium-aluminum alloy.
- the anode and the cathode may each have a laminated structure of two or more layers.
- At least one of the anode and the cathode is usually transparent or translucent, but the anode is preferably transparent or translucent.
- Examples of the method for forming the anode and the cathode include a vacuum deposition method, a sputtering method, an ion plating method, a plating method, and a laminating method.
- the light emitting material is usually formed of an organic compound (low molecular compound and high molecular compound) that mainly emits fluorescence or phosphorescence and a dopant that assists the organic compound.
- organic compound low molecular compound and high molecular compound
- the light emitting material include a dye material, a metal complex material, and a polymer material.
- Examples of the dye-based material include cyclopentamine and derivatives thereof, tetraphenylbutadiene and derivatives thereof, triphenylamine and derivatives thereof, oxadiazole and derivatives thereof, pyrazoloquinoline and derivatives thereof, distyrylbenzene and derivatives thereof, Examples include distyrylarylene and derivatives thereof, pyrrole and derivatives thereof, thiophene ring compounds, pyridine ring compounds, perinone and derivatives thereof, perylene and derivatives thereof, oligothiophene and derivatives thereof, oxadiazole dimers, and pyrazoline dimers.
- metal complex materials include aluminum quinolinol complex, benzoquinolinol beryllium complex, benzoxazolyl zinc complex, benzothiazole zinc complex, azomethylzinc complex, porphyrin zinc complex, europium complex, etc.
- polymer material examples include polyparaphenylene vinylene and derivatives thereof, polythiophene and derivatives thereof, polyparaphenylene and derivatives thereof, polysilane and derivatives thereof, polyacetylene and derivatives thereof, polyfluorene and derivatives thereof, and polyvinylcarbazole and derivatives thereof. And compounds obtained by polymerizing the above dye-based materials or metal complex-based materials.
- blue luminescent materials include, for example, distyrylarylene and derivatives thereof, oxadiazole and derivatives thereof, and polymers thereof; polyvinylcarbazole and derivatives thereof, polyparaphenylene and derivatives thereof, polyfluorene and Examples thereof include polyvinylcarbazole and derivatives thereof, polyparaphenylene and derivatives thereof, and polyfluorene and derivatives thereof.
- examples of the green light emitting material include quinacridone and derivatives thereof, coumarin and derivatives thereof, and polymers thereof; polyparaphenylene vinylene and derivatives thereof, polyfluorene and derivatives thereof, and polyparaphenylene. Vinylene and its derivatives, polyfluorene and its derivatives are preferred.
- examples of the red light emitting material include coumarin and derivatives thereof, thiophene ring compounds, and polymers thereof; polyparaphenylene vinylene and derivatives thereof, polythiophene and derivatives thereof, polyfluorene and derivatives thereof. Polyparaphenylene vinylene and derivatives thereof, polythiophene and derivatives thereof, and polyfluorene and derivatives thereof are preferable.
- a dopant can be added to the light emitting layer for the purpose of improving the light emission efficiency and changing the light emission wavelength.
- the dopant include perylene and derivatives thereof, coumarin and derivatives thereof, rubrene and derivatives thereof, quinacridone and derivatives thereof, squalium and derivatives thereof, porphyrin and derivatives thereof, styryl dyes, tetracene and derivatives thereof, pyrazolone and derivatives thereof, Examples include decacyclene and phenoxazone.
- Fluorescent materials may be used alone or in combination of two or more.
- the hole transport material is classified into a low molecular compound and a high molecular compound, and is preferably a high molecular compound.
- the hole transport material may have a crosslinking group.
- polymer compound examples include polyvinyl carbazole and derivatives thereof; polyarylene having an aromatic amine structure in the side chain or main chain and derivatives thereof.
- the polymer compound may be a compound to which an electron accepting site is bonded. Examples of the electron accepting site include fullerene, tetrafluorotetracyanoquinodimethane, tetracyanoethylene, and trinitrofluorenone, and fullerene is preferable.
- the hole transport material may be used alone or in combination of two or more.
- Electron transport materials are classified into low molecular compounds and high molecular compounds.
- the electron transport material may have a crosslinking group.
- Low molecular weight compounds include, for example, metal complexes having 8-hydroxyquinoline as a ligand, oxadiazole, anthraquinodimethane, benzoquinone, naphthoquinone, anthraquinone, tetracyanoanthraquinodimethane, fluorenone, diphenyldicyanoethylene and diphenoquinone. As well as these derivatives.
- polymer compound examples include polyphenylene, polyfluorene, and derivatives thereof.
- the polymer compound may be doped with a metal.
- the electron transport material may be used alone or in combination of two or more.
- the hole injection material and the electron injection material are classified into a low molecular compound and a high molecular compound, respectively.
- the hole injection material and the electron injection material may have a crosslinking group.
- low molecular weight compounds include metal phthalocyanines such as copper phthalocyanine; carbon; metal oxides such as molybdenum and tungsten; and metal fluorides such as lithium fluoride, sodium fluoride, cesium fluoride, and potassium fluoride.
- metal phthalocyanines such as copper phthalocyanine
- carbon such as carbon
- metal oxides such as molybdenum and tungsten
- metal fluorides such as lithium fluoride, sodium fluoride, cesium fluoride, and potassium fluoride.
- polymer compound examples include polyaniline, polythiophene, polypyrrole, polyphenylene vinylene, polythienylene vinylene, polyquinoline and polyquinoxaline, and derivatives thereof; conductive polymers such as polymers containing an aromatic amine structure in the main chain or side chain. A functional polymer.
- the content of the hole injection material and the electron injection material is usually 1 to 100 parts by weight, preferably 5 to 100 parts by weight, with respect to 100 parts by weight of the hole injection material.
- Each of the hole injection material and the electron injection material may be used alone or in combination of two or more.
- the electrical conductivity of the conductive polymer is preferably 1 ⁇ 10 ⁇ 5 S / cm to 1 ⁇ 10 3 S / cm.
- the conductive polymer can be doped with an appropriate amount of ions.
- the kind of ions to be doped is an anion for a hole injection material and a cation for an electron injection material.
- the anion include polystyrene sulfonate ion, alkylbenzene sulfonate ion, and camphor sulfonate ion.
- the cation include lithium ion, sodium ion, potassium ion, and tetrabutylammonium ion.
- the ions to be doped may be used alone or in combination of two or more.
- the sealing layer only needs to have a barrier property against moisture and oxygen gas.
- an anode, a cathode, and at least one organic functional layer included in the organic EL element are used. However, it is sealed with a substrate made of a material such as glass, plastic, or silicon in a state filled with an inert gas such as nitrogen gas or argon gas.
- the anode, cathode, and at least one organic functional layer of the organic EL element are made of glass, through an insulating layer made of an organic compound or an insulating layer made of an inorganic compound, Examples thereof include those sealed by a substrate made of a material such as plastic or silicon.
- the material for the insulating layer made of an organic compound include thermoplastic resins and photocrosslinkable resins.
- the material for the insulating layer made of an inorganic compound include metal oxides and metal nitrides.
- the desiccant may be arrange
- the sealing layer is usually formed lastly after forming an anode, a cathode, and at least one organic functional layer.
- planar anode and cathode may be arranged so as to overlap each other.
- pattern-like light emission a method of installing a mask provided with a pattern-like window on the surface of a planar organic EL element, a layer that is desired to be a non-light-emitting part is formed extremely thick and substantially non-light-emitting. And a method of forming an anode or a cathode, or both electrodes in a pattern.
- a segment type display device capable of displaying numbers, characters, and the like can be obtained.
- both the anode and the cathode may be formed in stripes and arranged orthogonally. Partial color display and multicolor display are possible by a method of separately coating a plurality of types of polymer compounds having different emission colors, or a method using a color filter or a fluorescence conversion filter.
- the dot matrix display device can be driven passively or can be driven actively in combination with TFTs. These display devices can be used for displays of computers, televisions, portable terminals and the like.
- the planar organic EL element can be suitably used as a planar light source for backlight of a liquid crystal display device or a planar illumination light source. If a flexible substrate is used, it can be used as a curved light source and display device.
- Example 1 The following steps were performed in a space prepared using a chemical guard (manufactured by NICHIAS, model number: WAVE-HA).
- anode was formed on the glass substrate by attaching an ITO film with a thickness of 45 nm by sputtering. This substrate was washed with an organic solvent, an alkaline detergent, and ultrapure water, and dried with hot air at about 80 ° C. for about 4 hours. Next, with respect to the plane ITO film is formed, a UV-O 3 treatment was carried out for about 15 minutes using a UV-O 3 apparatus. A composition containing a hole injecting material was dropped on the ITO film and treated for 28 seconds by a spin coating method to form a film having a thickness of 35 nm. It was dried on a hot plate at 80 ° C.
- a hole transport material was mixed with xylene to obtain a composition for forming a hole transport layer having a solid content concentration (hole transport material) of 0.6% by weight.
- the composition for forming a hole transport layer dropped onto the hole injection layer was treated by spin coating for 13 seconds to form a film with a thickness of 20 nm.
- the substrate was baked at 180 ° C. for 60 minutes in a nitrogen gas atmosphere, and then naturally cooled to room temperature to form a hole transport layer.
- a luminescent conjugated polymer compound was mixed with xylene to obtain a composition for forming a luminescent layer having a solid content (luminescent conjugated polymer compound) of 1.3% by weight.
- the organic EL device under production was exposed to sulfur oxide so that the cumulative exposure amount to which sulfur oxide was exposed was 0.2002 ppm ⁇ sec. At this time, the average concentration of sulfur oxide was 0.0286 ppm, and the exposure time was 7 seconds. Then, after baking at 150 degreeC for 10 minute (s) under nitrogen gas atmosphere, it naturally cooled to room temperature under nitrogen gas atmosphere, and formed the light emitting layer. At this time, in the step of forming the light emitting layer, the integrated exposure amount in which the organic EL element being manufactured was exposed to sulfur oxide was 0.2095 ppm ⁇ sec. The accumulated exposure amount excluding the time of 34 seconds for the film forming process was 0.2093 ppm ⁇ sec.
- the organic EL element under production in which the light emitting layer was formed was placed in a vapor deposition machine, and after reducing the pressure to 1.0 ⁇ 10 ⁇ 4 Pa or less, about 3 nm of sodium fluoride was used as a cathode on the light emitting layer. Next, aluminum was deposited to about 100 nm. Then, the organic EL element 1 was produced by forming a sealing layer using a glass substrate in nitrogen gas atmosphere. The time required for forming and sealing the cathode was 4500 seconds.
- the exposure amount A ⁇ B was 0.2315 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00004 ppm and the exposure time B was 6202 seconds.
- the cumulative exposure amount A ⁇ (BC) excluding the time required for the organic functional layer deposition stage was 0.2312 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00004 ppm and the exposure time BC was 6127 seconds.
- Example 2 In Example 1, sulfur oxidation was performed so that the cumulative exposure amount of the organic EL element being manufactured with the light emitting layer formed thereon exposed to sulfur oxide in an atmosphere in which the concentration of sulfur oxide was controlled was 0.6006 ppm ⁇ sec. An organic EL element was produced in the same manner as in Example 1 except that it was exposed to an object (hereinafter referred to as “organic EL element 2”). The average concentration of sulfur oxide was 0.0286 ppm and the exposure time was 21 seconds.
- the integration of the organic EL element being manufactured exposed to sulfur oxide from the start of the process of forming the organic functional layer to the end of the process of forming the sealing layer The exposure amount A ⁇ B was 0.6319 ppm ⁇ sec.
- the average concentration A of sulfur oxide was 0.00010 ppm, and the exposure time B was 6216 seconds.
- the accumulated exposure A ⁇ (BC) excluding the time required for the organic functional layer deposition stage was 0.6316 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00010 ppm and the exposure time BC was 6141 seconds.
- Example 3 In Example 1, sulfur oxidation was performed so that the cumulative exposure amount of the organic EL element being manufactured with the light emitting layer formed and exposed to sulfur oxide in an atmosphere in which the concentration of sulfur oxide was controlled was 0.9438 ppm ⁇ sec. An organic EL element was produced in the same manner as in Example 1 except that it was exposed to an object (hereinafter referred to as “organic EL element 3”). The average sulfur oxide concentration was 0.0286 ppm and the exposure time was 33 seconds.
- the integration of the organic EL element being manufactured exposed to sulfur oxide from the start of the process of forming the organic functional layer to the end of the process of forming the sealing layer The exposure amount A ⁇ B was 0.9751 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00016 ppm and the exposure time B was 6228 seconds.
- the accumulated exposure A ⁇ (BC) excluding the time required for the organic functional layer deposition stage was 0.9748 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00016 ppm and the exposure time BC was 6153 seconds.
- Example 1 sulfur oxidation was performed so that the cumulative exposure amount of the organic EL device being manufactured with the light emitting layer formed and exposed to sulfur oxide in an atmosphere in which the concentration of sulfur oxide was controlled was 2.9744 ppm ⁇ sec.
- An organic EL element was produced in the same manner as in Example 1 except that it was exposed to an object (hereinafter referred to as “organic EL element C1”).
- the average sulfur oxide concentration was 0.0286 ppm and the exposure time was 104 seconds.
- the exposure amount A ⁇ B was 3.0057 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00048 ppm and the exposure time B was 6299 seconds.
- the cumulative exposure amount A ⁇ (BC) excluding the time required for the organic functional layer deposition stage was 3.0054 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00048 ppm and the exposure time BC was 6224 seconds.
- Example 2 the organic EL device being manufactured with the light emitting layer formed therein was subjected to sulfur oxidation such that the cumulative exposure amount exposed to sulfur oxide in an atmosphere in which the concentration of sulfur oxide was controlled was 4.9478 ppm ⁇ sec.
- An organic EL element was produced in the same manner as in Example 1 except that it was exposed to an object (hereinafter referred to as “organic EL element C2”).
- the average concentration of sulfur oxide was 0.0286 ppm and the exposure time was 173 seconds.
- the integration of the organic EL element being manufactured exposed to sulfur oxide from the start of the process of forming the organic functional layer to the end of the process of forming the sealing layer The exposure amount A ⁇ B was 4.9791 ppm ⁇ sec.
- the average sulfur oxide concentration A was 0.00078 ppm and the exposure time B was 6368 seconds.
- the accumulated exposure A ⁇ (BC) excluding the time required for the organic functional layer deposition stage was 4.9788 ppm ⁇ sec.
- the average concentration A of sulfur oxide was 0.00079 ppm, and the exposure time B was 6293 seconds.
Abstract
Description
そこで、本発明は、発光寿命が優れる有機EL素子の製造方法を提供することを目的とする。
[1]
陽極と、陰極と、陽極と陰極の間に設けられた少なくとも1層の有機機能層と、封止層とを有する有機EL素子の製造方法であって、
陽極を形成する工程と、陰極を形成する工程と、少なくとも1層の有機機能層を形成する工程と、封止層を形成する工程とを含み、
少なくとも1層の有機機能層を形成する工程の開始時から封止層を形成する工程の終了時までに製造中の有機EL素子が曝露される硫黄酸化物の平均濃度:A(ppm)と、曝露時間:B(秒)とが、式(1-1)を満たす、有機EL素子の製造方法。
0≦A×B<2.2 (1-1)
[2]
少なくとも1層の有機機能層を形成する工程が、成膜段階、乾燥段階、及び、焼成段階を含み、該成膜段階に要する時間:C(秒)が、式(2-1)を満たす、[1]に記載の有機EL素子の製造方法。
0≦A×(B-C)<2.2 (2-1)
[3]
Aが、式(3-1)を満たす、[1]又は[2]に記載の有機EL素子の製造方法。
0≦A<0.3 (3-1)
[4]
Bが、式(4-1)を満たす、[1]~[3]のいずれか1項に記載の有機EL素子の製造方法。
0≦B≦86400 (4-1)
[5]
Cが、式(5-1)を満たす、[1]~[4]のいずれか1項に記載の有機EL素子の製造方法。
0≦C≦3000 (5-1)
[6]
少なくとも1層の有機機能層を形成する工程が、有機機能材料と有機溶媒とを含有する組成物を用いて、塗布法により成膜される工程を含む、[1]~[5]のいずれか1項に記載の有機EL素子の製造方法。
[7]
少なくとも1層の有機機能層が高分子化合物を含む[1]~[6]のいずれか1項に記載の有機EL素子の製造方法。
本明細書で共通して用いられる用語は、特記しない限り、以下の意味である。
本発明の製造方法は、
陽極と、陰極と、陽極と陰極の間に設けられた少なくとも1層の有機機能層と、封止層とを有する有機EL素子の製造方法であって、
陽極を形成する工程と、陰極を形成する工程と、少なくとも1層の有機機能層を形成する工程と、封止層を形成する工程とを含み、
少なくとも1層の有機機能層を形成する工程の開始時から封止層を形成する工程の終了時までに製造中の有機EL素子が曝露される硫黄酸化物の平均濃度:A(ppm)と、曝露時間:B(秒)とが、前記式(1-1)を満たす、有機EL素子の製造方法である。
0≦A×B<1 (1-2)
0≦A×B<0.5 (1-3)
0.2≦A×B<0.5 (1-4)
成膜段階とは、真空蒸着法又は塗布法を用いて、有機機能材料、又は、有機機能材料と有機溶媒とを含有する組成物で、膜を形成する段階である。
乾燥段階とは、成膜段階を塗布法により行った場合に、必要に応じて有機溶媒を除去する段階である。乾燥段階は、膜形状を平坦にするために、真空中で行うことが好ましい。
待機段階とは、次の段階に移るまでに製造中の有機EL素子が保持される段階である。待機段階は、短時間であることが好ましい。
焼成段階とは、有機機能材料が架橋基を有する場合に、該架橋基を架橋させるため、又は、乾燥段階に残留した有機溶媒、若しくは、有機機能層中の水分を除去する段階である。焼成段階は、有機機能材料の酸化を防ぐため、不活性ガス雰囲気下で行うことが好ましい。
冷却段階とは、焼成した製造中の有機EL素子を、室温まで戻す段階である。冷却段階は、水分の吸着を防ぐため、水分濃度が1ppm以下の乾燥環境で行うことが好ましい。
0≦A×(B-C)<1 (2-2)
0≦A×(B-C)<0.5 (2-3)
0.2≦A×(B-C)<0.5 (2-4)
0≦A<0.03 (3-2)
0≦A<0.003 (3-3)
0≦B<43200 (4-2)
0≦B<18000 (4-3)
0≦C<1500 (5-2)
0≦C<600 (5-3)
本発明の製造方法により製造される有機EL素子は、陽極、陰極、少なくとも1層の有機機能層、及び、封止層を有している。
正孔輸送層、正孔注入層、電子輸送層、電子注入層及び発光層は、正孔輸送材料、正孔注入材料、電子輸送材料、電子注入材料及び発光材料をそれぞれ含有し、正孔輸送材料、正孔注入材料、電子輸送材料、電子注入材料及び発光材料を用いてそれぞれ形成することができる。
本発明の製造方法により製造される有機EL素子は、通常、基板を有する。この基板は、電極を形成することができ、かつ、有機機能層を形成する際に化学的に変化しない基板であればよく、例えば、ガラス、プラスチック、シリコン等の材料からなる基板である。
発光材料は、通常、主として蛍光又はりん光を発光する有機化合物(低分子化合物及び高分子化合物)と、これを補助するドーパントとから形成される。発光材料としては、例えば、色素系材料、金属錯体系材料、高分子系材料が挙げられる。
正孔輸送材料は、低分子化合物と高分子化合物とに分類され、好ましくは高分子化合物である。正孔輸送材料は、架橋基を有していてもよい。
電子輸送材料は、低分子化合物と高分子化合物とに分類される。電子輸送材料は、架橋基を有していてもよい。
正孔注入材料及び電子注入材料は、各々、低分子化合物と高分子化合物とに分類される。正孔注入材料及び電子注入材料は、架橋基を有していてもよい。
封止層は、水分及び酸素ガスに対してバリア性を有するものであればよいが、封止層の一形態としては、有機EL素子が有する陽極、陰極、及び、少なくとも1層の有機機能層が、窒素ガス、アルゴンガス等の不活性ガスが充填された状態で、ガラス、プラスチック、シリコン等の材料からなる基板により密封されたものが挙げられる。封止層の他の一形態としては、有機EL素子が有する陽極、陰極、及び、少なくとも1層の有機機能層が、有機化合物からなる絶縁層又は無機化合物からなる絶縁層を介して、ガラス、プラスチック、シリコン等の材料からなる基板により密封されたものが挙げられる。有機化合物からなる絶縁層の材料としては、例えば、熱可塑性樹脂、光架橋性樹脂が挙げられる。無機化合物からなる絶縁層の材料としては、例えば、金属酸化物、金属窒化物が挙げられる。
有機EL素子を用いて面状の発光を得るためには、面状の陽極と陰極が重なり合うように配置すればよい。パターン状の発光を得るためには、面状の有機EL素子の表面にパターン状の窓を設けたマスクを設置する方法、非発光部にしたい層を極端に厚く形成し実質的に非発光とする方法、陽極若しくは陰極、又は両方の電極をパターン状に形成する方法がある。これらのいずれかの方法でパターンを形成し、いくつかの電極を独立にON/OFFできるように配置することにより、数字、文字等を表示できるセグメントタイプの表示装置が得られる。ドットマトリックス表示装置とするためには、陽極と陰極を共にストライプ状に形成して直交するように配置すればよい。複数の種類の発光色の異なる高分子化合物を塗り分ける方法、カラーフィルター又は蛍光変換フィルターを用いる方法により、部分カラー表示、マルチカラー表示が可能となる。ドットマトリックス表示装置は、パッシブ駆動も可能であるし、TFT等と組み合わせてアクティブ駆動も可能である。これらの表示装置は、コンピュータ、テレビ、携帯端末等のディスプレイに用いることができる。面状の有機EL素子は、液晶表示装置のバックライト用の面状光源、又は、面状の照明用光源として好適に用いることができる。フレキシブルな基板を用いれば、曲面状の光源及び表示装置としても使用できる。
以下の工程は、ケミカルガード(ニチアス社製、型番:WAVE-HA)を用いて準備した空間で行った。
ガラス基板に、スパッタ法により45nmの厚さでITO膜を付けることにより陽極を形成した。この基板を、有機溶媒、アルカリ洗剤、及び、超純水で洗浄し、約80℃の温風で約4時間乾燥させた。次に、ITO膜が形成された面に対して、UV-O3装置を用いてUV-O3処理を約15分間行った。ITO膜上に、正孔注入材料を含む組成物を滴下し、スピンコート法によって28秒間処理することにより、35nmの厚さの膜を形成した。ホットプレート上で、80℃で4分間乾燥させ、35分間の待機時間の後、更に、230℃で15分間加熱し、次いで10分間冷却し、正孔注入層を形成した。
正孔注入層を形成する工程において、硫黄酸化物に製造中の有機EL素子が曝露される積算曝露量は、5.06×10-6×3868=0.0196ppm・secであった。成膜段階に要した時間28秒を除いた積算曝露量は、5.06×10-6×3840=0.0194ppm・secであった。
キシレンに正孔輸送材料を混合し、固形分濃度(正孔輸送材料)が0.6重量%の正孔輸送層形成用組成物を得た。この正孔輸送層形成用組成物を用いてスピンコート法によって、正孔注入層上に滴下した正孔輸送層形成用組成物を13秒間処理することにより、20nmの厚さで成膜した。8分間の待機時間の後、窒素ガス雰囲気下、180℃で60分間焼成した後、室温まで自然冷却し、正孔輸送層を形成した。
正孔輸送層を形成する工程において、硫黄酸化物に製造中の有機EL素子が曝露される積算曝露量は、5.06×10-6×493=0.0025ppm・secであった。成膜段階に要した時間13秒を除いた積算曝露量は、5.06×10-6×480=0.0024ppm・secであった。
キシレンに発光性共役高分子化合物を混合し、固形分濃度(発光性共役高分子化合物)が1.3重量%の発光層形成用組成物を得た。この発光層形成用組成物を用いてスピンコート法により、正孔輸送層上に滴下した発光層形成用組成物を34秒間処理することにより、60nmの厚さで成膜した。その後、30分間待機した。
ここまでに、硫黄酸化物に製造中の有機EL素子が曝露される積算曝露量は、5.06×10-6×1834=0.0093ppm・secであった。成膜段階に要する時間34秒を除いた積算曝露量は、5.06×10-6×1800=0.0091ppm・secであった。
発光層を形成した製造中の有機EL素子を蒸着機内に置いて、1.0×10-4Pa以下となるまで減圧した後、発光層の上に、陰極として、フッ化ナトリウムを約3nm、次いで、アルミニウムを約100nm蒸着した。その後、窒素ガス雰囲気下、ガラス基板を用いて封止層を形成することにより、有機EL素子1を作製した。陰極の形成及び封止に要した時間は、4500秒であった。
有機機能層の成膜段階に要した時間を除いた積算曝露量A×(B-C)は、0.2312ppm・secであった。硫黄酸化物の平均濃度Aは0.00004ppmであり、曝露時間B-Cは6127秒であった。
実施例1において、発光層を成膜した製造中の有機EL素子が硫黄酸化物濃度を制御した雰囲気で硫黄酸化物に曝露された積算曝露量が、0.6006ppm・secとなるように硫黄酸化物に曝露させた以外は実施例1と同様にして、有機EL素子を作製した(以下、「有機EL素子2」と言う。)。硫黄酸化物の平均濃度は0.0286ppmであり、曝露時間は21秒であった。
有機機能層の成膜段階に要した時間を除いた積算曝露量A×(B-C)は、0.6316ppm・secであった。硫黄酸化物の平均濃度Aは0.00010ppmであり、曝露時間B-Cは6141秒であった。
実施例1において、発光層を成膜した製造中の有機EL素子が硫黄酸化物濃度を制御した雰囲気で硫黄酸化物に曝露された積算曝露量が、0.9438ppm・secとなるように硫黄酸化物に曝露させた以外は実施例1と同様にして、有機EL素子を作製した(以下、「有機EL素子3」と言う。)。硫黄酸化物の平均濃度は0.0286ppmであり、曝露時間は33秒であった。
有機機能層の成膜段階に要した時間を除いた積算曝露量A×(B-C)は、0.9748ppm・secであった。硫黄酸化物の平均濃度Aは0.00016ppmであり、曝露時間B-Cは6153秒であった。
実施例1において、発光層を成膜した製造中の有機EL素子が硫黄酸化物濃度を制御した雰囲気で硫黄酸化物に曝露された積算曝露量が、2.9744ppm・secとなるように硫黄酸化物に曝露させた以外は実施例1と同様にして、有機EL素子を作製した(以下、「有機EL素子C1」と言う。)。硫黄酸化物の平均濃度は0.0286ppmであり、曝露時間は104秒であった。
有機機能層の成膜段階に要した時間を除いた積算曝露量A×(B-C)は3.0054ppm・secであった。硫黄酸化物の平均濃度Aは0.00048ppmであり、曝露時間B-Cは6224秒であった。
実施例1において、発光層を成膜した製造中の有機EL素子が硫黄酸化物濃度を制御した雰囲気で硫黄酸化物に曝露された積算曝露量が、4.9478ppm・secとなるように硫黄酸化物に曝露させた以外は実施例1と同様にして、有機EL素子を作製した(以下、「有機EL素子C2」と言う。)。硫黄酸化物の平均濃度は0.0286ppmであり、曝露時間は173秒であった。
有機機能層の成膜段階に要した時間を除いた積算曝露量A×(B-C)は、4.9788ppm・secであった。硫黄酸化物の平均濃度Aは0.00079ppmであり、曝露時間Bは6293秒であった。
Claims (7)
- 陽極と、陰極と、陽極と陰極の間に設けられた少なくとも1層の有機機能層と、封止層とを有する有機EL素子の製造方法であって、
陽極を形成する工程と、陰極を形成する工程と、少なくとも1層の有機機能層を形成する工程と、封止層を形成する工程とを含み、
少なくとも1層の有機機能層を形成する工程の開始時から封止層を形成する工程の終了時までに製造中の有機EL素子が曝露される硫黄酸化物の平均濃度:A(ppm)と、曝露時間:B(秒)とが、式(1-1)を満たす、有機EL素子の製造方法。
0≦A×B<2.2 (1-1)
- 少なくとも1層の有機機能層を形成する工程が、成膜段階、乾燥段階、及び、焼成段階を含み、該成膜段階に要する時間:C(秒)が、式(2-1)を満たす、請求項1に記載の有機EL素子の製造方法。
0≦A×(B-C)<2.2 (2-1)
- Aが、式(3-1)を満たす、請求項1又は2に記載の有機EL素子の製造方法。
0≦A<0.3 (3-1)
- Bが、式(4-1)を満たす、請求項1~3のいずれか1項に記載の有機EL素子の製造方法。
0≦B≦86400 (4-1)
- Cが、式(5-1)を満たす、請求項2~4のいずれか1項に記載の有機EL素子の製造方法。
0≦C≦3000 (5-1)
- 少なくとも1層の有機機能層を形成する工程が、有機機能材料と有機溶媒とを含有する組成物を用いて、塗布法により成膜される工程を含む、請求項1~5のいずれか1項に記載の有機EL素子の製造方法。
- 少なくとも1層の有機機能層が高分子化合物を含む請求項1~6のいずれか1項に記載の有機EL素子の製造方法。
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EP3226656B1 (en) | 2020-11-25 |
EP3226656A1 (en) | 2017-10-04 |
EP3226656A4 (en) | 2018-03-21 |
JP2017045735A (ja) | 2017-03-02 |
US10600984B2 (en) | 2020-03-24 |
TWI600193B (zh) | 2017-09-21 |
CN107615883A (zh) | 2018-01-19 |
KR101775315B1 (ko) | 2017-09-05 |
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