WO2016175390A1 - Novel compound, photosensitive resin composition containing same and color filter - Google Patents

Novel compound, photosensitive resin composition containing same and color filter Download PDF

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Publication number
WO2016175390A1
WO2016175390A1 PCT/KR2015/008106 KR2015008106W WO2016175390A1 WO 2016175390 A1 WO2016175390 A1 WO 2016175390A1 KR 2015008106 W KR2015008106 W KR 2015008106W WO 2016175390 A1 WO2016175390 A1 WO 2016175390A1
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Prior art keywords
formula
represented
substituted
unsubstituted
compound
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PCT/KR2015/008106
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French (fr)
Korean (ko)
Inventor
정의수
김규영
김형묵
박채원
서혜원
신명엽
이영
Original Assignee
삼성에스디아이 주식회사
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Priority to CN201580077258.4A priority Critical patent/CN107428766B/en
Publication of WO2016175390A1 publication Critical patent/WO2016175390A1/en

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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F1/00Compounds containing elements of Groups 1 or 11 of the Periodic System
    • C07F1/08Copper compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D487/00Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/22Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains four or more hetero rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F11/00Compounds containing elements of Groups 6 or 16 of the Periodic System
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F15/00Compounds containing elements of Groups 8, 9, 10 or 18 of the Periodic System
    • C07F15/06Cobalt compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F3/00Compounds containing elements of Groups 2 or 12 of the Periodic System
    • C07F3/06Zinc compounds
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials

Definitions

  • Novel compounds, photosensitive resin compositions and color filters comprising the same
  • the present disclosure relates to a novel compound, a photosensitive resin composition and a color filter comprising the same.
  • One embodiment is to provide novel compounds.
  • Another embodiment is to provide a photosensitive resin composition comprising the compound.
  • Another embodiment is to provide a color filter manufactured using the photosensitive resin composition.
  • One embodiment of the present invention provides a compound represented by the following formula (1). -Ha ⁇
  • M is Cu, Zn, Co or Mo
  • R 1 to R 16 are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted group Substituted C6 to C20
  • At least one of R ′ to R 16 is represented by the following Formula 2,
  • R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
  • Formula 2 may be represented by the following formula (3).
  • R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or Or a substituted or unsubstituted C6 to C20 aryl group.
  • At least one of R 1 to R 10 may be represented by Formula 2, and at least one of R 1 to R 16 may be represented by any one of Formulas 4 to 7.
  • L 1 is a substituted or unsubstituted C1 to C10 alkylene group
  • R 19 is a substituted or unsubstituted C1 to C10 alkyl group.
  • At least one of R 'to R 4 is represented by Formula 2
  • at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7
  • at least one of the R 9 to R 12 is One of Formulas 4 to 7 may be represented
  • at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
  • At least one of R 1 to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by Formula 2, and at least one of R 9 to R 12 is represented by Formula 4 to Formula 7 It may be represented by any one of, and at least one of the R 13 to R 16 may be represented by any one of the formulas (4) to (7). At least one of R 1 to R 4 is represented by Formula 2, and at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7, At least one of R 9 to R 12 may be represented by Formula 2, and at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
  • At least one of R 1 to R 4 is represented by Formula 2 , and R 5 to
  • At least one of R 8 is represented by Formula 2 , wherein R 9 to R! At least one of two increase may be represented by Formula 2, and at least one of R 13 to R 16 may be represented by any one of Formula 4 to Formula 7.
  • At least one of R ′ to R 4 is represented by Formula 2
  • at least one of R 5 to R 8 is represented by Formula 2
  • at least one of R 9 to R 12 is represented by Formula 2
  • At least one of R 13 to R 16 may be represented by Formula 2.
  • the compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas 8 to 16.
  • the compound may be a green dye.
  • the green dye may have a maximum transmittance in the wavelength range of 445nm to 560nm. have.
  • the photosensitive resin composition may further include an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
  • the photosensitive resin composition may further include a pigment.
  • the pigment may be a yellow pigment.
  • Another embodiment provides a color filter manufactured using the photosensitive resin composition.
  • Compound according to an embodiment has excellent green spectral properties and high molar absorption coefficient and excellent solubility in organic solvents, can be used as a dye when preparing a photosensitive resin composition for a green color filter, the color filter comprising the dye It can have excellent brightness and contrast ratio.
  • substituted to “substituted” means that at least one hydrogen atom of the functional group of the present invention is a halogen atom (F, Br, Cl or I), hydroxy group, nitro group, cyano group, amino group ( NH 2 , NH (R 200 ) or N (R 201 ) (R 202 ), wherein R 200 , R 201 and R 202 are the same or different from each other, and are each independently C 1 to C 10 alkyl groups, amidino groups, Hydrazine group, hydrazone group, carboxyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted alkenyl group, substituted or unsubstituted alkynyl group, substituted or unsubstituted alicyclic organic group, substituted or unsubstituted aryl group, And it means substituted with one or more substituents selected from the group consisting of a substituted or
  • an "alkyl group”' is a C1 to C20 alkyl group Means, specifically, a C 1 to C 15 alkyl group
  • "cycloalkyl group” means a C3 to C20 cycloalkyl group, specifically means a C3 to C18 cycloalkyl group
  • '' alkoxy group 'means C1 to C20 Means an alkoxy group, specifically means a C1 to C18 alkoxy group
  • "aryl group” means a C6 to C20 aryl group
  • alkenyl group means a C2 to C20 alkenyl group, specifically means a C2 to C18 alkenyl group, '' alkylene group 'means a C1 to C20 alkylene group
  • arylene group means a C6 to C20 arylene group, and specifically means a C6 to C16 arylene group.
  • Copolymer means a block copolymer or a random copolymer.
  • M is Cu, Zn, Co or Mo
  • R 1 to R 16 are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted group Substituted C6 to C20
  • At least one of R 1 to R 16 is represented by the following formula (2),
  • R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
  • the compound represented by Chemical Formula 1 has excellent green spectral characteristics and high molar extinction coefficient. Furthermore, the compound represented by Chemical Formula 1 may include a substituent represented by Chemical Formula 2, thereby exhibiting excellent solubility in organic solvents and excellent luminance when applied to a color filter.
  • M may be Zn.
  • Formula 2 may be represented by the following formula (3).
  • R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
  • the compound represented by Chemical Formula 1 necessarily includes a substituent represented by Chemical Formula 2, for example, Chemical Formula 3, so that red-shift occurs, and thus, a case in which a conventional pigment such as a green pigment is applied The brightness is excellent.
  • the solubility in an organic solvent is greatly reduced, but the compound represented by Formula 1 according to the embodiment is The solubility in an organic solvent can be greatly improved by including the substituent represented by Formula 2, for example, Formula 3.
  • At least one of R 1 to R 16 may be represented by Formula 2, and at least one of R 1 to R 16 may be represented by any one of Formulas 4 to 7.
  • L 1 is a substituted or unsubstituted C1 to C10 alkylene group
  • R 19 is a substituted or unsubstituted C1 to C10 alkyl group.
  • L 1 is a substituted or unsubstituted methylene group, a substituted or unsubstituted ethylene group, a substituted or unsubstituted propylene group, a substituted or unsubstituted butylene group, a substituted or unsubstituted pentylene group, a substituted or unsubstituted And a substituted or unsubstituted hexylene group, a substituted or unsubstituted heptylene group, a substituted or unsubstituted octylene group, a substituted or unsubstituted nonylene group or a substituted or unsubstituted decylene group.
  • R 1 to R 4 is represented by Formula 2
  • at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7
  • R 9 to At least one of R 12 may be represented by any one of Formulas 4 to 7
  • at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
  • R 1 to R 4 is represented by Formula 2
  • at least one of R 5 to R 8 is represented by Formula 2
  • at least one of R 9 to R 12 May be represented by any one of Formulas 4 to 7, and at least one of R 13 to R 16 may be represented by any one of Formulas 4 to VII.
  • R 1 to R 4 is represented by Formula 2
  • at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7
  • R 9 to At least one of R 12 may be represented by Formula 2
  • at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
  • At least one of the R 1 to R 4 is the formula 2
  • at least one of R 5 to R 8 is represented by Formula 2
  • at least one of R 9 to R 12 is represented by Formula 2
  • at least one of R 13 to R 16 is It may be represented by any one of Formula 4 to Formula 7.
  • at least one of R 1 to R 4 is represented by Formula 2
  • at least one of R 5 to R 8 is represented by Formula 2
  • at least one of R 9 to R 12 May be represented by Formula 2
  • at least one of R 13 to R 16 may be represented by Formula 2.
  • the compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas 8 to 16, but is not necessarily limited thereto.
  • the compound according to one embodiment includes a substituent represented by Chemical Formula 2, for example, Chemical Formula 3, a more vivid color is expressed even in a small amount. It is possible to manufacture a display element having excellent color characteristics such as brightness and contrast ratio when used as a colorant.
  • the compound may be a colorant such as a dye such as a green dye such as a dye having a maximum transmittance in the wavelength range of 445 nm to 560 nm.
  • dyes are the most expensive of the components used in color filters. Therefore, in order to achieve a desired effect such as high brightness or high contrast ratio, more expensive dyes have to be used.
  • the compound according to the embodiment as a dye in the color filter, it is possible to achieve excellent color characteristics such as high brightness, high contrast ratio even in a small amount it is possible to reduce the production cost.
  • the compound according to the embodiment may further include a substituent represented by any one of Formulas 4 to 7 in addition to the substituent represented by Formula 2, for example, Formula 3, in this case, for the organic solvent Solubility and coloring power become more excellent.
  • a photosensitive resin composition including the compound according to the embodiment is provided.
  • the photosensitive resin composition may include a compound according to the embodiment, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
  • the compound according to one embodiment may serve as a colorant such as a dye such as a green dye in the photosensitive resin composition, thereby expressing excellent color characteristics.
  • the compound according to one embodiment may be included in an amount of 1 weight 0 /. 10 weight 0 /. For example, 3 weight 0 /. 7 weight 0 /. When the compound according to the embodiment is included in the above range, color reproduction and contrast ratio are excellent.
  • the photosensitive resin composition may further include a pigment, such as a yellow pigment.
  • the yellow pigment has a C.I. Pigment Yellow 139, CI. Pigment yellow 138, I. Pigment yellow 150, etc. are mentioned, These can be used individually or in mixture of 2 or more types.
  • the pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
  • the pigment dispersion is a pigment, a solvent of the solid content and the pigment in the solvent A dispersant for uniformly dispersing may be included.
  • Pigments of the solid content is 1% to 20 weight 0 / weight relative to the pigment dispersion as a total amount.
  • Such as 8 wt. 0/0 to 20 parts by weight 0/0, for example, 8 parts by weight 0/0 to 15 parts by weight 0/0, for example, 10 parts by weight 0 / 0 to 20 may be included in a weight 0/0, for example, 10 parts by weight 0/0 to 15 parts by weight 0/0.
  • non-dispersible dispersants non-dispersible dispersants, anionic dispersants, cationic dispersants, and the like may be used.
  • Specific examples of the dispersant include polyalkylene glycols and esters thereof, polyoxyalkylenes, polyhydric alcohol ester alkylene oxide adducts,
  • Examples of commercially available products of the dispersant include, for example, DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPE BYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165,
  • the dispersing agent may comprise from 1 weight 0/0 to 20% by weight relative to the total amount of the pigment dispersion.
  • the dispersant is included in the above range, it is possible to maintain an appropriate viscosity to excellent dispersibility of the photosensitive resin composition, thereby maintaining the optical, physical and chemical quality in the product application.
  • Examples of the solvent for forming the pigment dispersion include ethylene glycol acetate,
  • Polyethylene glycol, cyclonucleanone, propylene glycol methyl ether and the like can be used.
  • the pigment dispersion can comprise from 10 weight 0 /. To 20 parts by weight 0/0, for example, 12 to 18% by weight relative to the total photosensitive resin composition. remind
  • the pigment dispersion is included in the above range, it is advantageous to secure process margins, color reproducibility and Contrast ratio is excellent.
  • the alkali-soluble resin may be an acrylic resin.
  • the acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including one or more acrylic repeating units.
  • the C1 ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing one or more carboxyl groups, and specific examples thereof may include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
  • the first ethylenically unsaturated monomer may comprise from 5 parts by weight 0 /. To 50 parts by weight 0/0, for example 10% to 40% by weight relative to the total amount of the acrylic binder resin.
  • the second ethylenically unsaturated monomer is an aromatic vinyl compound such as styrene, ⁇ -methylstyrene, vinylluene, vinylbenzylmethyl ether, etc .; Methyl (meth) acrylate,
  • Saturated carboxylic acid ester compounds such as cyclonuclear chamber (meth) acrylate and phenyl (meth) acrylate; Unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth) acrylate and 2-dimethylaminoethyl (meth) acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate;
  • Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth) acrylate; Vinyl cyanide compounds such as (meth) acrylonitrile; Unsaturated amide compounds such as (meth) acrylamide; And the like, and these may be used alone or in combination of two or more.
  • acrylic resin examples include (meth) acrylic acid / benzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / styrene copolymer,
  • the weight average molecular weight of the alkali-soluble resin is 3,000 g / mol to 150,000 g / mol, such as 5,000 g / mol to 50,000 g / mol, such as 20,000 g / mol to 30,000 g / mol.
  • the weight average molecular weight of the alkali-soluble resin is within the above range, the physical and chemical properties of the photosensitive resin composition are excellent, the viscosity is appropriate, and the adhesion to the substrate is excellent in the manufacture of the color filter.
  • the acid value of the alkali-soluble resin is 15 mgKOH / g to 60 mgKOH / g, such as
  • the alkali-soluble resin may be included in one weight 0/0 to 30% by weight, for example 1 weight 0/0 to 20 parts by weight 0/0 relative to the total photosensitive resin composition.
  • the soluble resin When the soluble resin is included in the above range, it is excellent in developability in the production of color filters and crosslinkability is improved to obtain excellent surface smoothness.
  • a monofunctional or polyfunctional ester of (meth) acrylic acid having at least one ethylenically unsaturated double bond may be used.
  • the photopolymerizable compound since the photopolymerizable compound has the ethylenically unsaturated double bond, the photopolymerizable compound may form a polymerized layer upon exposure in the pattern forming process, thereby forming a pattern having excellent heat resistance, light resistance, and chemical resistance.
  • the photopolymerizable compound examples include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate and neopentyl glycol di.
  • Tri (meth) acrylate pentaerythritol tetra (meth) acrylate, pentaerythritol to hexa (meth) acrylate, dipentaerythr to di (meth) acrylate, dipentaerythr to tri (meth) acrylic Latent, dipentaerythritol penta (meth) acrylate,
  • dipentaerythride is nucleated (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ether (meth) acrylate, trimethylol propane
  • Tri (meth) acrylate tris (meth) acryloyloxyethyl phosphate, novolac epoxy (meth) acrylate and the like.
  • the (meth) transfer function of an example esters of acrylic acid are, doah Gosei Kagaku Kogyo (Note) ⁇ of Aronix M-210 ®, copper or the like M-240 ®, the same M-6200 ®; Nihon Kayak Co., Ltd. KAYARAD HDDA ® , HX-220 ® , R-604 ®, etc .; And V-260 ® , V-312 ® and V-335 HP ® from Osaka Yuki Kagaku Kogyo Co., Ltd. Trifunctionality of the (meth) acrylic acid
  • esters examples include Aronix M-309 ® , M-400 ® , M-405 ® , M-450 ® , M-710 ® , M-807 from Toagosei Kagaku Kogyo Co., Ltd. ® , copper M-8060 ®, etc .; Nihon
  • the photopolymerizable compound may be used by treating with an acid anhydride in order to impart better developability.
  • the photopolymerizable compounds may be included as one weight 0 /. 15 to increase 0 /., For example 5% by weight to 10 parts by weight 0/0 relative to the total photosensitive resin composition.
  • a photopolymerizable compound is contained in the said range, hardening arises at the time of exposure in a pattern formation process, and it is excellent in reliability, and is excellent in developability to an alkaline developing solution.
  • the photopolymerization initiator is generally used in the photosensitive resin composition
  • an acetophenone type compound As an initiator, an acetophenone type compound, a benzophenone type compound, a thioxanthone type compound, a benzoin type compound, an oxime type compound, or a combination thereof can be used, for example.
  • acetophenone-based compound examples include 2,2'-dietospecific acetophenone, 2,2'-dibuspecial acetophenone, 2-hydroxy-2-methylpropiophenone and pt-butyltrichloro aceto Phenone, pt-butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholino Propane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, and the like.
  • benzophenone-based compound examples include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, 4,4 '-Bis (diethylamino) benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like.
  • benzophenone benzoyl benzoic acid
  • methyl benzoyl benzoate 4-phenyl benzophenone
  • hydroxy benzophenone acrylated benzophenone
  • 4,4'-bis (dimethylamino) benzophenone 4,4 '-Bis (diethylamino) benzophenone
  • 4,4'-dimethylaminobenzophenone 4,4'-dichloro
  • thioxanthone compound examples include thioxanthone, 2-methyl thioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.
  • benzoin compound examples include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal and the like.
  • triazine-based compound examples include 2,4,6-trichloro-S-triazine, 2-phenyl 4,6-bis (trichloromethyl) -S-triazine and 2- (3 ', 4'- Dimethoxystyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (4'-methoxynaphthyl) -4,6-bis (trichloromethyl) -S-triazine , 2- (p-Mexyphenyl) -4,6-bis (trichloromethyl) -S-triazine , 2- (p-ryll) -4,6-bis (trichloromethyl) -S-triazine ,
  • oxime compounds examples include 0-acyl oxime compounds, 2- (o-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2, octanedione, 1- (eacetyloxime) -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-
  • 3-yl] ethanone, 0-ethoxycarbonyl- ⁇ -oxyamino-1-phenylpropane-1- may be used.
  • the 0-acyl oxime compound include 1,2-octanedione, 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin-4-yl-phenyl) -butane- 1-one, 1- (4-phenylsulfanylphenyl) -butane-1,2-dione 2-oxime-0-benzoate, 1- (4 ⁇ phenylsulfanylphenyl) -octane-1,2-disilver 2 -Oxime -0-benzoate, 1- (4-phenylsulfanylphenyl) -octane -1 -onoxime -0-acetate, 1- (4-phenylsulfanylphenyl) -butane-1-onoxime -0- Acetate and the like.
  • the photopolymerization initiator is a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound,
  • a biimidazole type compound etc. can be used.
  • the photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light and transferring energy after being excited.
  • photosensitizer examples include tetraethylene glycol bis-3-mercapto propionate pentaerythritol and tetrakis-3-mercapto propionate and dipentaerythryl tetrakis- 3-mercapto propionate, etc. are mentioned.
  • the photoinitiator may comprise from 0.01 weight% to 10 weight 0/0, for example, 0.1% by weight to 5 parts by weight 0 /. Relative to the total photosensitive resin composition.
  • the photopolymerization initiator is included in the above range, curing occurs during exposure in the pattern forming process to obtain excellent reliability, excellent heat resistance, light resistance and chemical resistance of the pattern, excellent resolution and adhesion, The fall of the transmittance
  • the solvent may be a material having compatibility with the compound, pigment, alkali-soluble resin, photopolymerizable compound and photopolymerization initiator according to one embodiment, but does not react.
  • solvent examples include alcohols such as methanol and ethanol; Ethers such as dichloroethyl ether, ⁇ -butyl ether, diisoamyl ether, methylphenyl ether and tetrahydrofuran; Glycols such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether
  • Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate and diethyl cellosolve acetate; Methyl ethyl carbitle, diethyl carbye, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methylethyl ether, diethylene glycol
  • Carbyls such as diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Methyl ethyl ketone,
  • Ketones such as cyclonucleanone, 4-hydroxy-4-methyl-2-pentanone, methyl - ⁇ -propyl ketone, methyl - ⁇ -butyl ketone, methyl - ⁇ -amyl ketone and 2-heptanone; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, - ⁇ -butyl acetate and isobutyl acetate; Lactic acid esters such as methyl lactate and ethyl lactate; Oxy acetic acid alkyl esters such as methyl oxy acetate, oxy ethyl acetate and oxy butyl acetate; Alkoxy acetate alkyl esters, such as methoxy methyl acetate, methoxy specialty ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxy propionic
  • 3-alkoxy propionic acid alkyl esters such as methyl propionate, ethyl 3-methoxy propionate, ethyl 3-ethoxy propionate and methyl 3-ethoxy propionate; 2-oxy propionic acid, such as 2-oxy methyl propionate, 2-oxy ethyl propionate and 2-oxy propionic acid propyl Alkyl esters; 2-alkoxy propionic acid alkyl esters such as methyl 2-methoxy propionate, ethyl 2-methoxy propionate, ethyl 2-ethoxy propionate and methyl 2-ethoxy propionate; 2-oxy-2-methyl propionic acid esters, such as 2-oxy-2-methyl propionate, 2-oxy-2-methyl ethyl propionate, 2-methoxy-2-methyl methyl propionate, 2-ethoxy-2 Monooxy monocarboxylic acid alkyl esters of 2-alkoxy-2-methyl propionic acid alkyls such as methyl methyl propionate
  • Glycol ethers such as monoethyl ether; Ethylene glycol alkylether acetates such as ethyl salosolve acetate; Esters such as 2-hydroxy ethyl propionate; Carbyls such as diethylene glycol monomethyl ether; Propylene glycol alkylether acetates such as propylene glycol monomethylether acetate and propylene glycol propylether acetate can be used.
  • solvents can be included in glass of quantification, such as 30 wt. 0/0 to 80% by weight relative to the total photosensitive resin composition.
  • the solvent is included in the above range, as the photosensitive resin composition has an appropriate viscosity, the processability in manufacturing the color filter is excellent.
  • the photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion to the substrate and the like.
  • a phenol novolak epoxy compound a tetramethyl biphenyl epoxy compound, a bisphenol-A epoxy compound, an alicyclic epoxy compound, or a combination thereof is mentioned.
  • the photosensitive resin composition may further include a silane coupling agent having a semi-aromatic substituent such as carboxyl group, methacryloyl group, isocyanate group, epoxy group, etc. in order to improve adhesion to the substrate.
  • a silane coupling agent having a semi-aromatic substituent such as carboxyl group, methacryloyl group, isocyanate group, epoxy group, etc. in order to improve adhesion to the substrate.
  • silane coupling agent examples include trimethoxysilyl benzoic acid, ⁇ -methacryloxypropyl trimethoxysilane, vinyl triacetic silane, vinyl trimethoxysilane, ⁇ -isocyanate propyl triethoxysilane, and ⁇ -glycidoxy Cipropyl trimethoxysilane, (beta)-(3, 4- epoxycyclonuclear chamber) ethyltrimethoxysilane, etc. are mentioned, These can be used individually or in mixture of 2 or more types.
  • the silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included in the above range, it is excellent in adhesion, shelf life and the like.
  • the photosensitive resin composition may further include a surfactant in order to improve coating properties and prevent defects, if necessary.
  • surfactant examples include, but are not limited to, BM-1000 ® , BM-1100 ® , and the like by BM Chemie; Mecha packs F 142D ® , F 172 ® , F 173 ® , F 183 ®, etc. of Dai Nippon Inki Chemical Co., Ltd .; Prorad FC-135 ® , FC-170C ® , FC-430 ® , East ⁇ 31 ®, etc. of Sumitomo 3M Co., Ltd .; Asahi Grass Co., Ltd.
  • the surfactant may be used in an amount of 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. If the surfactant is included in the above range, coating uniformity is ensured, staining does not occur, and
  • the said photosensitive resin composition is in the range which does not inhibit physical property.
  • antioxidants and stabilizers may be added.
  • a color filter manufactured using the photosensitive resin composition according to the embodiment is provided.
  • the pattern forming process in the color filter is as follows. Applying the photosensitive resin composition on a support substrate by spin coating, slit coating, inkjet printing, or the like; Drying the coated photosensitive resin composition to form a photosensitive resin composition film; Exposing the photosensitive resin composition film; The exposed photosensitive resin composition film is developed with an aqueous alkali solution to be photosensitive.
  • Photopolymerizable compound dipentaerythr to nucleoacrylate (DPHA) 8.0 photopolymerization initiator 1,2-octanedione 1.0
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 8 (compound represented by Formula 9) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Example 3 the compound of Synthesis Example 8 (compound represented by Formula 9) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 9 (compound represented by Formula 10) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Example 4 the compound of Synthesis Example 9 (compound represented by Formula 10) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 10 (compound represented by Formula 11) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Example 5 A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 1 (compound represented by Formula 12) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Example 6 A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 1 (compound represented by Formula 12) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 12 (compound represented by Formula 13) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Example 7
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 13 (compound represented by Formula 14) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Example 8
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 14 (compound represented by Formula 15) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Example 9
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 15 (compound represented by Formula 16) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Comparative Example 1
  • a photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Comparative Synthesis Example 1 (compound represented by Formula 17) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8).
  • Comparative Example 2 A photosensitive resin composition was prepared in the same manner as in Example 1 except that the composition shown in Table 2 was used instead of the composition shown in Table 1.
  • a photosensitive resin composition was prepared in the same manner as in Comparative Example 2 except that Pigment G36 pigment dispersion was used instead of Pigment G58 in the pigment dispersion. Evaluation: color coordinates, luminance, and contrast ratio measurements
  • the photosensitive resin composition prepared in Examples 1 to 9 and Comparative Examples 1 to 3 was applied to a glass substrate having a thickness of 1 mm by degreasing, and 9 (hot plate of TC The coating was dried for 2 minutes to obtain a coating, which was then exposed using a high pressure mercury lamp having a dominant wavelength of 365 nm.Then, the sample was dried in a hot air circulation drying furnace at 200 ° C. for 5 minutes. Obtained. The pixel layer was measured in color coordinates (x, y), luminance (Y) and contrast ratio using a spectrophotometer (MCPD3000, Otsuka electronic Co., Ltd.), and are shown in Table 3 below.
  • MCPD3000 spectrophotometer

Abstract

Provided are a compound represented by a specific chemical formula, a photosensitive resin composition containing the same, and a color filter manufactured using the photosensitive resin composition.

Description

【명세서】  【Specification】
【발명의 명칭】  [Name of invention]
신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터 【기술분야】  Novel compounds, photosensitive resin compositions and color filters comprising the same
본 기재는 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터에 관한 것이다ᅳ  The present disclosure relates to a novel compound, a photosensitive resin composition and a color filter comprising the same.
【배경기술】 Background Art
안료형 감광성 수지 조성물로 제조된 컬러필터에서는 안료 입자 크기에서 비롯되는 휘도와 명암비의 한계가 존재한다. 또한 이미지 센서용 컬러 촬상 소자의 경우에는 미세한 패턴 형성을 위해 더 작은 분산입도를 요구하게 된다. 이와 같은 요구에 부웅하고자 안료 대신 입자를 이루지 않는 염료를 도입한 감광성 수지 조성물을 제조하여 휘도와 명암비 등의 색특성이 개선된 컬러필터를 구현하려는 시도가 계속되고 있다.  In the color filter made of the pigment-type photosensitive resin composition, there are limitations of brightness and contrast ratio resulting from the pigment particle size. In addition, in the case of a color imaging device for an image sensor, a smaller dispersion particle size is required for forming a fine pattern. In order to satisfy such a demand, attempts have been made to implement color filters having improved color characteristics such as brightness and contrast ratio by preparing a photosensitive resin composition incorporating a dye that does not form particles instead of pigments.
따라서, 감광성 수지 조성물의 제조에 사용되는 염료로 적합한 화합물에 대한 연구가 필요한 실정이다.  Therefore, there is a need for research on a compound suitable as a dye used in the preparation of the photosensitive resin composition.
【발명의 상세한 설명】 [Detailed Description of the Invention]
【기술적 과제】  [Technical problem]
일 구현예는 신규한 화합물을 제공하기 위한 것이다.  One embodiment is to provide novel compounds.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공하기 위한 것이다.  Another embodiment is to provide a photosensitive resin composition comprising the compound.
또 다른 구현예는 상기 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공하기 위한 것이다.  Another embodiment is to provide a color filter manufactured using the photosensitive resin composition.
【기술적 해결방법】 Technical Solution
본 발명의 일 구현예는 하기 화학식 1로 표시되는 화합물을 제공한다. -하^ One embodiment of the present invention provides a compound represented by the following formula (1). -Ha ^
Figure imgf000003_0001
Figure imgf000003_0001
상기 화학식 1에서,  In Chemical Formula 1,
M은 Cu, Zn, Co 또는 Mo이고,  M is Cu, Zn, Co or Mo,
R1 내지 R16은 각각 독립적으로 수소 원자, 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 알콕시기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C6 내지 C20 R 1 to R 16 are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted group Substituted C6 to C20
아릴옥시기이고, It is an aryloxy group,
R' 내지 R16 증 적어도 하나는 하기 화학식 2로 표시되고, At least one of R ′ to R 16 is represented by the following Formula 2,
[화학식 2]  [Formula 2]
Figure imgf000003_0002
Figure imgf000003_0002
상기 화학식 2에서,  In Chemical Formula 2,
R17 및 R18은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다. R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 2는 하기 화학식 3으로 표시될 수 있다.  Formula 2 may be represented by the following formula (3).
Figure imgf000003_0003
Figure imgf000003_0003
상기 화학식 3에서,  In Chemical Formula 3,
R17 및 R18은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다. R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or Or a substituted or unsubstituted C6 to C20 aryl group.
상기 R1 내지 R10 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R1 내지 R16 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. At least one of R 1 to R 10 may be represented by Formula 2, and at least one of R 1 to R 16 may be represented by any one of Formulas 4 to 7.
[화학식 4]  [Formula 4]
Figure imgf000004_0001
Figure imgf000004_0001
상기 화학식 6 및 화학식 7에서,  In Chemical Formulas 6 and 7,
L1은 치환 또는 비치환된 C1 내지 C10 알킬렌기이고, L 1 is a substituted or unsubstituted C1 to C10 alkylene group,
R19는 치환 또는 비치환된 C1 내지 C10 알킬기이다. R 19 is a substituted or unsubstituted C1 to C10 alkyl group.
상기 R' 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. At least one of R 'to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7, and at least one of the R 9 to R 12 is One of Formulas 4 to 7 may be represented, and at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. 상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 증 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. At least one of R 1 to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by Formula 2, and at least one of R 9 to R 12 is represented by Formula 4 to Formula 7 It may be represented by any one of, and at least one of the R 13 to R 16 may be represented by any one of the formulas (4) to (7). At least one of R 1 to R 4 is represented by Formula 2, and at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7, At least one of R 9 to R 12 may be represented by Formula 2, and at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지At least one of R 1 to R 4 is represented by Formula 2 , and R 5 to
R8 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R!2 증 적어도 하나는 상기 화학식 2로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. At least one of R 8 is represented by Formula 2 , wherein R 9 to R! At least one of two increase may be represented by Formula 2, and at least one of R 13 to R 16 may be represented by any one of Formula 4 to Formula 7.
상기 R' 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R12 증 적어도 하나는 상기 화학식 2로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 2로 표시될 수 있다. At least one of R ′ to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by Formula 2, and at least one of R 9 to R 12 is represented by Formula 2; At least one of R 13 to R 16 may be represented by Formula 2.
상기 화학식 1로 표시되는 화합물은 하기 화학식 8 내지 화학식 16 중 어느 하나로 표시될 수 있다.  The compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas 8 to 16.
[화학식 8]  [Formula 8]
Figure imgf000005_0001
Figure imgf000006_0001
Figure imgf000005_0001
Figure imgf000006_0001
Figure imgf000006_0002
Figure imgf000007_0001
[화학식 13]
Figure imgf000008_0001
Figure imgf000006_0002
Figure imgf000007_0001
[Formula 13]
Figure imgf000008_0001
[화학식 14]
Figure imgf000008_0002
15]
[Formula 14]
Figure imgf000008_0002
15]
Figure imgf000009_0001
Figure imgf000009_0001
상기 화합물은 녹색 염료일 수 있다. The compound may be a green dye.
상기 녹색 염료는 445nm 내지 560nm의 파장범위에서 최대 투과도를 가질 수 있다. The green dye may have a maximum transmittance in the wavelength range of 445nm to 560nm. have.
다른 일 구현예는 상기 화합물을 포함하는 감광성 수지 조성물을 제공한다. 상기 감광성 수지 조성물은 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함할 수 있다.  Another embodiment provides a photosensitive resin composition comprising the compound. The photosensitive resin composition may further include an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
상기 감광성 수지 조성물은 안료를 더 포함할 수 있다.  The photosensitive resin composition may further include a pigment.
상기 안료는 황색 안료일 수 있다.  The pigment may be a yellow pigment.
또 다른 일 구현예는 상기 감광성 수지 조성물을 이용하여 제조되는 컬러필터를 제공한다.  Another embodiment provides a color filter manufactured using the photosensitive resin composition.
기타 본 발명의 측면들의 구체적인 사항은 이하의 상세한 설명에 포함되어 있다.  Other details of aspects of the invention are included in the following detailed description.
【유리한 효과】 Advantageous Effects
일 구현예에 따른 화합물은 우수한 녹색 분광 특성과 높은 몰흡광계수를 가지고 유기 용매에 대한 용해도가 우수하여, 녹색 컬러필터용 감광성 수지 조성물 제조 시 염료로 사용될 수 있고, 상기 염료를 포함하는 컬러필터는 우수한 휘도 및 명암비를 가질 수 있다.  Compound according to an embodiment has excellent green spectral properties and high molar absorption coefficient and excellent solubility in organic solvents, can be used as a dye when preparing a photosensitive resin composition for a green color filter, the color filter comprising the dye It can have excellent brightness and contrast ratio.
【발명의 실시를 위한 최선의 형태】 [Best form for implementation of the invention]
이하, 본 발명의 구현예를 상세히 설명하기로 한다. 다만, 이는 예시로서 제시되는 것으로, 이에 의해 본 발명이 제한되지는 않으며 본 발명은 후술할 청구범위의 범주에 의해 정의될 뿐이다.  Hereinafter, embodiments of the present invention will be described in detail. However, this is presented as an example, whereby the present invention is not limited and the present invention is defined only by the scope of the claims to be described later.
본 명세서에서 특별한 언급이 없는 한, "치환" 내지 "치환된"이란, 본 발명의 작용기 중의 하나 이상의 수소 원자가 할로겐 원자 (F, Br, Cl 또는 I), 히드록시기, 니트로기, 시아노기, 아미노기 (NH2, NH(R200) 또는 N(R201)(R202)이고, 여기서 R200, R201 및 R202는 동일하거나 서로 상이하며, 각각 독립적으로 C1 내지 C10 알킬기임), 아미디노기 , 하이드라진기, 하이드라존기 , 카르복실기, 치환 또는 비치환된 알킬기, 치환 또는 비치환된 알케닐기, 치환 또는 비치환된 알키닐기, 치환 또는 비치환된 지환족 유기기, 치환 또는 비치환된 아릴기, 및 치환 또는 비치환된 헤테로고리기로 이루어진 군에서 선택되는 1종 이상의 치환기로 치환된 것을 의미한다. Unless stated otherwise in the specification, "substituted" to "substituted" means that at least one hydrogen atom of the functional group of the present invention is a halogen atom (F, Br, Cl or I), hydroxy group, nitro group, cyano group, amino group ( NH 2 , NH (R 200 ) or N (R 201 ) (R 202 ), wherein R 200 , R 201 and R 202 are the same or different from each other, and are each independently C 1 to C 10 alkyl groups, amidino groups, Hydrazine group, hydrazone group, carboxyl group, substituted or unsubstituted alkyl group, substituted or unsubstituted alkenyl group, substituted or unsubstituted alkynyl group, substituted or unsubstituted alicyclic organic group, substituted or unsubstituted aryl group, And it means substituted with one or more substituents selected from the group consisting of a substituted or unsubstituted heterocyclic group.
본 명세서에서 특별한 언급이 없는 한, "알킬기' '란 C1 내지 C20 알킬기를 의미하고, 구체적으로는 C 1 내지 C15 알킬기를 의미하고, "사이클로알킬기"란 C3 내지 C20 사이클로알킬기를 의미하고, 구체적으로는 C3 내지 C18 사이클로알킬기를 의미하고, ' '알콕시기"란 C1 내지 C20 알콕시기를 의미하고, 구체적으로는 C1 내지 C18 알콕시기를 의미하고, "아릴기 "란 C6 내지 C20 아릴기를 의미하고, Unless stated otherwise in the specification, an "alkyl group"'is a C1 to C20 alkyl group Means, specifically, a C 1 to C 15 alkyl group, "cycloalkyl group" means a C3 to C20 cycloalkyl group, specifically means a C3 to C18 cycloalkyl group, '' alkoxy group 'means C1 to C20 Means an alkoxy group, specifically means a C1 to C18 alkoxy group, "aryl group" means a C6 to C20 aryl group,
구체적으로는 C6 내지 C18 아릴기를 의미하고,"알케닐기"란 C2 내지 C20 알케닐기를 의미하고, 구체적으로는 C2 내지 C18 알케닐기를 의미하고, ' '알킬렌기"란 C1 내지 C20 알킬렌기를 의미하고, 구체적으로는 C1 내지 C18 알킬렌기를 의미하고 "아릴렌기' '란 C6 내지 C20 아릴렌기를 의미하고, 구체적으로는 C6 내지 C16 아릴렌기를 의미한다. Specifically, it means a C6 to C18 aryl group, "alkenyl group" means a C2 to C20 alkenyl group, specifically means a C2 to C18 alkenyl group, '' alkylene group 'means a C1 to C20 alkylene group In addition, specifically, it means a C1 to C18 alkylene group, "arylene group" means a C6 to C20 arylene group, and specifically means a C6 to C16 arylene group.
본 명세서에서 특별한 언급이 없는 한, " (메타)아크릴레이트 "는  Unless stated otherwise in the specification, "(meth) acrylate"
"아크릴레이트"와 "메타크릴레이트" 둘 다 가능함을 의미하며, " (메타)아크릴산"은 "아크릴산' '과 "메타크릴산" 둘 다 가능함을 의미한다.  Both "acrylate" and "methacrylate" mean possible, and "(meth) acrylic acid" means that both "acrylic acid" and "methacrylic acid" are possible.
본 명세서에서 별도의 정의가 없는 한, "조합"이란 흔합 또는 공증합을 의미한다ᅳ 또한 "공증합"이란 블록 공중합 내지 랜덤 공중합을 의미하고,  As used herein, unless otherwise defined, "combination" means a combination or co-addition. "Co-polymerization" means block copolymerization or random copolymerization,
"공중합체"란 블록 공중합체 내지 랜덤 공중합체를 의미한다. "Copolymer" means a block copolymer or a random copolymer.
본 명세서 내 화학식에서 별도의 정의가 없는 한, 화학 결합이 그려져야 하는 위치에 화학결합이 그려져 있지 않은 경우는 상기 위치에 수소 원자가 결합되어 있음을 의미한다.  Unless otherwise defined in the chemical formulas herein, when a chemical bond is not drawn at the position where the chemical bond is to be drawn, it means that a hydrogen atom is bonded at the position.
또한, 본 명세서에서 별도의 정의가 없는 한, ' 는 동일하거나 상이한 원자 또는 화학식과 연결되는 부분을 의미한다. 하기 화학식 1로 표시되는 화합물을 제공한다. Also, unless otherwise defined herein, 'means a moiety connected to the same or different atoms or formulas. It provides a compound represented by the following formula (1).
Figure imgf000012_0001
Figure imgf000012_0001
상기 화학식 1에서,  In Chemical Formula 1,
M은 Cu, Zn, Co 또는 Mo이고,  M is Cu, Zn, Co or Mo,
R1 내지 R16은 각각 독립적으로 수소 원자, 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 알콕시기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C6 내지 C20 R 1 to R 16 are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted group Substituted C6 to C20
아릴옥시기이고, It is an aryloxy group,
R1 내지 R16 중 적어도 하나는 하기 화학식 2로 표시되고, At least one of R 1 to R 16 is represented by the following formula (2),
[화학식 2]  [Formula 2]
Figure imgf000012_0002
Figure imgf000012_0002
상기 화학식 2에서,  In Chemical Formula 2,
R17 및 R18은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다. R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
상기 화학식 1로 표시되는 화합물은 우수한 녹색 분광 특성과 높은 몰흡광계수를 가진다. 나아가, 상기 화학식 1로 표시되는 화합물은 상기 화학식 2로 표시되는 치환기를 반드시 포함함에 따라 유기용매에 대해 우수한 용해도 및 컬러필터에 적용 시 우수한 휘도를 나타낼 수 있다.  The compound represented by Chemical Formula 1 has excellent green spectral characteristics and high molar extinction coefficient. Furthermore, the compound represented by Chemical Formula 1 may include a substituent represented by Chemical Formula 2, thereby exhibiting excellent solubility in organic solvents and excellent luminance when applied to a color filter.
일 실시예에서, 상기 M은 Zn일 수 있다.  In one embodiment, M may be Zn.
상기 화학식 2는 하기 화학식 3으로 표시될 수 있다.
Figure imgf000013_0001
Formula 2 may be represented by the following formula (3).
Figure imgf000013_0001
상기 화학식 3에서,  In Chemical Formula 3,
R17 및 R18은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다. R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
일 구현예에 따른 화학식 1로 표시되는 화합물은 상기 환학식 2, 예컨대 상기 화학식 3으로 표시되는 치환기를 반드시 포함하여, red-shift가 일어나고, 이로 인해 통상의 안료, 예컨대 녹색 안료를 적용하는 경우보다 휘도가 우수해진다.  The compound represented by Chemical Formula 1 according to an embodiment necessarily includes a substituent represented by Chemical Formula 2, for example, Chemical Formula 3, so that red-shift occurs, and thus, a case in which a conventional pigment such as a green pigment is applied The brightness is excellent.
또한, 일 구현예에 따른 화학식 1로 표시되는 화합물과 달리, 프탈로시아닌계 염료 화합물이 아마이드 치환기를 포함할 경우 유기용매에 대한 용해도가 크게 저하되나, 일 구현예에 따른 화학식 1로 표시되는 화합물은 상기 화학식 2, 예컨대 화학식 3으로 표시되는 치환기를 반드시 포함하여, 유기용매에 대한 용해도를 크게 향상시킬 수 있다.  In addition, unlike the compound represented by Formula 1 according to an embodiment, when the phthalocyanine-based dye compound includes an amide substituent, the solubility in an organic solvent is greatly reduced, but the compound represented by Formula 1 according to the embodiment is The solubility in an organic solvent can be greatly improved by including the substituent represented by Formula 2, for example, Formula 3.
상기 R1 내지 R16 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R1 내지 R16 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다.At least one of R 1 to R 16 may be represented by Formula 2, and at least one of R 1 to R 16 may be represented by any one of Formulas 4 to 7.
화학식 4]
Figure imgf000013_0002
[Formula 4]
Figure imgf000013_0002
5]
Figure imgf000013_0003
5]
Figure imgf000013_0003
[화학식 6]
Figure imgf000013_0004
Figure imgf000014_0001
[Formula 6]
Figure imgf000013_0004
Figure imgf000014_0001
상기 화학식 6 및 화학식 7에서,  In Chemical Formulas 6 and 7,
L1은 치환 또는 비치환된 C1 내지 C10 알킬렌기이고, L 1 is a substituted or unsubstituted C1 to C10 alkylene group,
R19는 치환 또는 비치환된 C1 내지 C10 알킬기이다. R 19 is a substituted or unsubstituted C1 to C10 alkyl group.
예컨대, 상기 L1은 치환 또는 비치환된 메틸렌기, 치환 또는 비치환된 에틸렌기, 치환 또는 비치환된 프로필렌기, 치환 또는 비치환된 부틸렌기, 치환 또는 비치환된 펜틸렌기, 치환 또는 비치환된 핵실렌기, 치환 또는 비치환된 헵틸렌기, 치환 또는 비치환된 옥틸렌기, 치환 또는 비치환된 노닐렌기 또는 치환 또는 비치환된 데실렌기일 수 있다. For example, L 1 is a substituted or unsubstituted methylene group, a substituted or unsubstituted ethylene group, a substituted or unsubstituted propylene group, a substituted or unsubstituted butylene group, a substituted or unsubstituted pentylene group, a substituted or unsubstituted And a substituted or unsubstituted hexylene group, a substituted or unsubstituted heptylene group, a substituted or unsubstituted octylene group, a substituted or unsubstituted nonylene group or a substituted or unsubstituted decylene group.
일 구현예에 따른 화합물은, 상기 화학식 2로 표시되는 치환기 외에, 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되는 치환기를 더 포함함으로써, 유기용매에 대한 용해도가 증가하고 착색력이 우수해질 수 있다.  Compound according to one embodiment, in addition to the substituent represented by the formula (2), by further including a substituent represented by any one of the formulas (4) to (7), solubility in the organic solvent can be increased and the coloring power can be excellent.
예컨대, 상기 화학식 1에서, 상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 증 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. For example, in Formula 1, at least one of R 1 to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7, R 9 to At least one of R 12 may be represented by any one of Formulas 4 to 7, and at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
예컨대, 상기 화학식 1에서, 상기 R1 내지 R4 증 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R13 내지 R16 증 적어도 하나는 상기 화학식 4 내지 화학식 Ί 중 어느 하나로 표시될 수 있다. For example, in Formula 1, at least one of R 1 to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by Formula 2, and at least one of R 9 to R 12 . May be represented by any one of Formulas 4 to 7, and at least one of R 13 to R 16 may be represented by any one of Formulas 4 to VII.
예컨대, 상기 화학식 1에서, 상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. For example, in Formula 1, at least one of R 1 to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by any one of Formula 4 to Formula 7, R 9 to At least one of R 12 may be represented by Formula 2, and at least one of R 13 to R 16 may be represented by any one of Formulas 4 to 7.
예컨대, 상기 화학식 1에서, 상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시될 수 있다. 예컨대, 상기 화학식 1에서, 상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 증 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 상기 화학식 2로 표시될 수 있다. For example, in Formula 1, at least one of the R 1 to R 4 is the formula 2, at least one of R 5 to R 8 is represented by Formula 2, at least one of R 9 to R 12 is represented by Formula 2, and at least one of R 13 to R 16 is It may be represented by any one of Formula 4 to Formula 7. For example, in Formula 1, at least one of R 1 to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by Formula 2, and at least one of R 9 to R 12 May be represented by Formula 2, and at least one of R 13 to R 16 may be represented by Formula 2.
예컨대, 상기 화학식 1로 표시되는 화합물은 하기 화학식 8 내지 화학식 16 중 어느 하나로 표시될 수 있으나, 반드시 이에 한정되는 것은 아니다.  For example, the compound represented by Chemical Formula 1 may be represented by any one of the following Chemical Formulas 8 to 16, but is not necessarily limited thereto.
[화학식 8]  [Formula 8]
Figure imgf000015_0001
Figure imgf000015_0001
Figure imgf000016_0001
Figure imgf000017_0001
Figure imgf000018_0001
Figure imgf000016_0001
Figure imgf000017_0001
Figure imgf000018_0001
Figure imgf000018_0002
화학식 15]
Figure imgf000018_0002
[Formula 15]
Figure imgf000019_0001
Figure imgf000019_0001
일 구현예에 따른 화합물은 상기 화학식 2, 예컨대 상기 화학식 3으로 표시되는 치환기를 포함하기 때문에 적은 양으로도 보다 선명한 색의 발현이 가능하여, 착색제로 사용 시 휘도나 명암비 등의 색특성이 우수한 디스플레이 소자의 제조가 가능하다. 예컨대, 상기 화합물은 착색제, 예컨대 염료, 예컨대 녹색 염료, 예컨대 445nm 내지 560nm의 파장범위에서 최대 투과도를 가지는 염료일 수 있다. Since the compound according to one embodiment includes a substituent represented by Chemical Formula 2, for example, Chemical Formula 3, a more vivid color is expressed even in a small amount. It is possible to manufacture a display element having excellent color characteristics such as brightness and contrast ratio when used as a colorant. For example, the compound may be a colorant such as a dye such as a green dye such as a dye having a maximum transmittance in the wavelength range of 445 nm to 560 nm.
일반적으로, 염료는 컬러필터 내에 사용되는 구성성분 중 가장 고가의 구성성분이다. 그러므로, 원하는 효과, 예컨대 고휘도나 고명암비 등을 달성하기 위해서는 고가의 염료를 더 많이 사용해야 하기 때문에 생산 단가가 상승할 수 밖에 없었다. 그러나, 일 구현예에 따른 화합물을 컬러필터 내 염료로 사용하는 경우, 적은 양으로도 고휘도, 고명암비 등의 우수한 색특성을 달성할 수 있어 생산 단가의 절감이 가능하다.  In general, dyes are the most expensive of the components used in color filters. Therefore, in order to achieve a desired effect such as high brightness or high contrast ratio, more expensive dyes have to be used. However, when using the compound according to the embodiment as a dye in the color filter, it is possible to achieve excellent color characteristics such as high brightness, high contrast ratio even in a small amount it is possible to reduce the production cost.
나아가, 일 구현예에 따른 화합물은 상기 화학식 2, 예컨대 상기 화학식 3으로 표시되는 치환기 이외에 추가로 상기 화학식 4 내지 화학식 7 중 어느 하나로 표시되는 치환기를 더 포함할 수 있고, 이 경우, 유기용매에 대한 용해도 및 착색력이 더욱 우수해진다.  Furthermore, the compound according to the embodiment may further include a substituent represented by any one of Formulas 4 to 7 in addition to the substituent represented by Formula 2, for example, Formula 3, in this case, for the organic solvent Solubility and coloring power become more excellent.
다른 일 구현예에 따르면, 상기 일 구현예에 따른 화합물을 포함하는 감광성 수지 조성물을 제공한다.  According to another embodiment, a photosensitive resin composition including the compound according to the embodiment is provided.
예컨대, 상기 감광성 수지 조성물은 상기 일 구현예에 따른 화합물, 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용매를 포함할 수 있다.  For example, the photosensitive resin composition may include a compound according to the embodiment, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and a solvent.
일 구현예에 따른 화합물은 감광성 수지 조성물 내에서 착색제, 예컨대 염료 예컨대 녹색 염료로서의 역할을 하여, 우수한 색특성을 발현할 수 있다.  The compound according to one embodiment may serve as a colorant such as a dye such as a green dye in the photosensitive resin composition, thereby expressing excellent color characteristics.
일 구현예에 따른 화합물은 상기 감광성 수지 조성물 총량에 대해 1 중량0 /。 내지 10 중량0 /。, 예컨대 3 중량0 /。 내지 7 중량0 /。로 포함될 수 있다. 상기 범위로 일 구현예에 따른 화합물이 포함될 경우 색재현을 및 명암비가 우수해진다. The compound according to one embodiment may be included in an amount of 1 weight 0 /. 10 weight 0 /. For example, 3 weight 0 /. 7 weight 0 /. When the compound according to the embodiment is included in the above range, color reproduction and contrast ratio are excellent.
상기 감광성 수지 조성물은 안료, 예컨대 황색 안료를 더 포함할 수 있다. 상기 황색 안료는 컬러 인덱스 (Color Index) 내에서 C.I. 안료 황색 139, CI. 안료 황색 138, I. 안료 황색 150 등을 들 수 있으며, 이들을 단독으로 또는 2종 이상 흔합하여 사용할 수 있다.  The photosensitive resin composition may further include a pigment, such as a yellow pigment. The yellow pigment has a C.I. Pigment Yellow 139, CI. Pigment yellow 138, I. Pigment yellow 150, etc. are mentioned, These can be used individually or in mixture of 2 or more types.
상기 안료는 안료분산액의 형태로 상기 감광성 수지 조성물에 포함될 수 있다.  The pigment may be included in the photosensitive resin composition in the form of a pigment dispersion.
상기 안료분산액은 고형분의 안료, 용제 및 상기 용제 내에 상기 안료를 균일하게 분산시키기 위한 분산제를 포함할 수 있다. The pigment dispersion is a pigment, a solvent of the solid content and the pigment in the solvent A dispersant for uniformly dispersing may be included.
상기 고형분의 안료는 안료분산액 총량에 대하여 1 중량% 내지 20 중량0 /。, 예컨대 8 중량0 /0 내지 20 중량0 /0, 예컨대 8 중량0 /0 내지 15 중량0 /0, 예컨대 10 중량0 /0 내지 20 중량0 /0, 예컨대 10 중량0 /0 내지 15 중량0 /0로 포함될 수 있다. Pigments of the solid content is 1% to 20 weight 0 / weight relative to the pigment dispersion as a total amount., Such as 8 wt. 0/0 to 20 parts by weight 0/0, for example, 8 parts by weight 0/0 to 15 parts by weight 0/0, for example, 10 parts by weight 0 / 0 to 20 may be included in a weight 0/0, for example, 10 parts by weight 0/0 to 15 parts by weight 0/0.
상기 분산제로는 비이은성 분산제, 음이온성 분산제, 양이온성 분산제 등을 사용할 수 있다. 상기 분산제의 구체적인 예로는, 폴리알킬렌글리콜 및 이의 에스테르, 폴리옥시알킬렌, 다가알코올 에스테르 알킬렌 옥사이드 부가물,  As the dispersant, non-dispersible dispersants, anionic dispersants, cationic dispersants, and the like may be used. Specific examples of the dispersant include polyalkylene glycols and esters thereof, polyoxyalkylenes, polyhydric alcohol ester alkylene oxide adducts,
알코을알킬렌 옥사이드 부가물, 술폰산 에스테르, 술폰산 염, 카르복실산 에스테르, 카르복실산 염, 알킬아미드 알킬렌 옥사이드 부가물, 알킬 아민 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 흔합하여 사용할 수 있다. Alcohols alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, carboxylic acid salts, alkylamide alkylene oxide adducts, alkyl amines, and the like, and these may be used alone or in combination of two or more thereof. .
상기 분산제의 시판되는 제품을 예로 들면, BYK社의 DISPERBYK- 101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPE BYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165,  Examples of commercially available products of the dispersant include, for example, DISPERBYK-101, DISPERBYK-130, DISPERBYK-140, DISPERBYK-160, DISPERBYK-161, DISPE BYK-162, DISPERBYK-163, DISPERBYK-164, DISPERBYK-165,
DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182, DISPERBYK-166, DISPERBYK-170, DISPERBYK-171, DISPERBYK-182,
DISPERBYK-2000, DISPERBYK-2001 등; EFKA 케미칼社의 EFKA-47, EFKA- 47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450 등; Zeneka社의 Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000 등; 또는 Ajinomoto社의 PB711 , PB821 등이 있다. DISPERBYK-2000, DISPERBYK-2001, and the like; EFKA-47, EFKA-47EA, EFKA-48, EFKA-49, EFKA-100, EFKA-400, EFKA-450, etc. of EFKA Chemical Co., Ltd .; Zenspera Solsperse 5000, Solsperse 12000, Solsperse 13240, Solsperse 13940, Solsperse 17000, Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000, and the like; Or PB711, PB821 from Ajinomoto.
상기 분산제는 안료분산액 총량에 대하여 1 중량0 /0 내지 20 중량%로 포함될 수 있다. 분산제가 상기 범위 내로 포함될 경우, 적절한 점도를 유지할 수 있어 감광성 수지 조성물의 분산성이 우수하며, 이로 인해 제품 적용시 광학적, 물리적 및 화학적 품질을 유지할 수 있다. The dispersing agent may comprise from 1 weight 0/0 to 20% by weight relative to the total amount of the pigment dispersion. When the dispersant is included in the above range, it is possible to maintain an appropriate viscosity to excellent dispersibility of the photosensitive resin composition, thereby maintaining the optical, physical and chemical quality in the product application.
상기 안료분산액을 형성하는 용제로는 에틸렌글리콜 아세테이트,  Examples of the solvent for forming the pigment dispersion include ethylene glycol acetate,
에틸샐로솔브, 프로필렌글리콜 메틸에테르아세테이트, 에틸락테이트, Ethyl salosolve, propylene glycol methyl ether acetate, ethyl lactate,
폴리에틸렌글리콜, 사이클로핵사논, 프로필렌글리콜 메틸에테르 등을 사용할 수 있다. Polyethylene glycol, cyclonucleanone, propylene glycol methyl ether and the like can be used.
상기 안료분산액은 상기 감광성 수지 조성물 총량에 대하여 10 중량0 /。 내지 20 중량0 /0, 예컨대 12 중량 % 내지 18 중량 %로 포함될 수 있다. 상기 The pigment dispersion can comprise from 10 weight 0 /. To 20 parts by weight 0/0, for example, 12 to 18% by weight relative to the total photosensitive resin composition. remind
안료분산액이 상기 범위 내로 포함될 경우, 공정마진 확보에 유리하고, 색재현율 및 명암비가 우수해진다. When the pigment dispersion is included in the above range, it is advantageous to secure process margins, color reproducibility and Contrast ratio is excellent.
상기 알칼리 가용성 수지는 아크릴계 수지일 수 있다.  The alkali-soluble resin may be an acrylic resin.
상기 아크릴계 수지는 제 1 에틸렌성 불포화 단량체 및 이와 공중합 가능한 제 2 에틸렌성 불포화 단량체의 공중합체로, 하나 이상의 아크릴계 반복단위를 포함하는 수지이다.  The acrylic resin is a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and is a resin including one or more acrylic repeating units.
상기 게 1 에틸렌성 불포화 단량체는 하나 이상의 카르복시기를 함유하는 에틸렌성 불포화 단량체이며, 이의 구체적인 예로는 아크릴산, 메타크릴산, 말레산, 이타콘산, 푸마르산, 또는 이들의 조합을 들 수 있다.  The C1 ethylenically unsaturated monomer is an ethylenically unsaturated monomer containing one or more carboxyl groups, and specific examples thereof may include acrylic acid, methacrylic acid, maleic acid, itaconic acid, fumaric acid, or a combination thereof.
상기 제 1 에틸렌성 불포화 단량체는 상기 아크릴계 바인더 수지 총량에 대하여 5 중량0 /。 내지 50 중량0 /0, 예컨대 10 중량% 내지 40 중량 %로 포함될 수 있다. The first ethylenically unsaturated monomer may comprise from 5 parts by weight 0 /. To 50 parts by weight 0/0, for example 10% to 40% by weight relative to the total amount of the acrylic binder resin.
상기 제 2 에틸렌성 불포화 단량체는 스티렌 , α-메틸스티렌, 비닐를루엔, 비닐벤질메틸에테르 등의 방향족 비닐 화합물; 메틸 (메타)아크릴레이트,  The second ethylenically unsaturated monomer is an aromatic vinyl compound such as styrene, α-methylstyrene, vinylluene, vinylbenzylmethyl ether, etc .; Methyl (meth) acrylate,
에틸 (메타)아크릴레이트, 부틸 (메타)아크릴레이트, 2-히드록시에틸 (메타)아크릴레이트, 2-히드록시 부틸 (메타)아크릴레이트, 벤질 (메타)아크릴레이트, Ethyl (meth) acrylate, butyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxy butyl (meth) acrylate, benzyl (meth) acrylate,
사이클로핵실 (메타)아크릴레이트, 페닐 (메타)아크릴레이트 등의 블포화 카르복시산 에스테르 화합물; 2-아미노에틸 (메타)아크릴레이트, 2- 디메틸아미노에틸 (메타)아크릴레이트 등의 불포화 카르복시산 아미노 알킬 에스테르 화합물; 초산비닐, 안식향산 비닐 등의 카르복시산 비닐 에스테르 화합물; Saturated carboxylic acid ester compounds such as cyclonuclear chamber (meth) acrylate and phenyl (meth) acrylate; Unsaturated carboxylic acid amino alkyl ester compounds such as 2-aminoethyl (meth) acrylate and 2-dimethylaminoethyl (meth) acrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate and a vinyl benzoate;
글리시딜 (메타)아크릴레이트 등의 불포화 카르복시산 글리시딜 에스테르 화합물; (메타)아크릴로니트릴 등의 시안화 비닐 화합물; (메타)아크릴아미드 등의 불포화 아미드 화합물; 등을 들 수 있으며, 이들을 단독으로 또는 둘 이상 흔합하여 사용할 수 있다ᅳ Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl (meth) acrylate; Vinyl cyanide compounds such as (meth) acrylonitrile; Unsaturated amide compounds such as (meth) acrylamide; And the like, and these may be used alone or in combination of two or more.
상기 아크릴계 수지의 구체적인 예로는 (메타)아크릴산 /벤질메타크릴레이트 공중합체, (메타)아크릴산 /벤질메타크릴레이트 /스티렌 공중합체,  Specific examples of the acrylic resin include (meth) acrylic acid / benzyl methacrylate copolymer, (meth) acrylic acid / benzyl methacrylate / styrene copolymer,
(메타)아크릴산 /벤질메타크릴레이트 /2-히드톡시에틸메타크릴레이트 공중합체,  (Meth) acrylic acid / benzyl methacrylate / 2- hydroxyethyl methacrylate copolymer,
(메타)아크릴산 /벤질메타크릴레이트 /스티렌 /2-히드록시에틸메타크릴레이트 공중합체 등을 들 수 있으나, 이에 한정되는 것은 아니며, 이들을 단독 또는 2종 이상을 배합하여 사용할 수도 있다.  (Meth) acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, etc. are mentioned, It is not limited to these, These can also be used individually or in combination of 2 or more types.
상기 알칼리 가용성 수지의 중량평균 분자량은 3,000 g/mol 내지 150,000 g/mol, 예컨대 5,000 g/mol 내지 50,000 g/mol, 예컨대 20,000 g/mol 내지 30,000 g/mol 일 수 있다. 상기 알칼리 가용성 수지의 중량평균 분자량이 상기 범위 내일 경우, 상기 감광성 수지 조성물의 물리적 및 화학적 물성이 우수하고 점도가 적절하며, 컬러필터 제조시 기판과의 밀착성이 우수하다. The weight average molecular weight of the alkali-soluble resin is 3,000 g / mol to 150,000 g / mol, such as 5,000 g / mol to 50,000 g / mol, such as 20,000 g / mol to 30,000 g / mol. When the weight average molecular weight of the alkali-soluble resin is within the above range, the physical and chemical properties of the photosensitive resin composition are excellent, the viscosity is appropriate, and the adhesion to the substrate is excellent in the manufacture of the color filter.
상기 알칼리 가용성 수지의 산가는 15 mgKOH/g 내지 60 mgKOH/g, 예컨대 The acid value of the alkali-soluble resin is 15 mgKOH / g to 60 mgKOH / g, such as
20 mgKOH/g 내지 50 mgKOH/g 일 수 있다. 알칼리 가용성 수지의 산가가 상기 범위 내일 경우 픽셀 패턴의 해상도가 우수하다. 20 mgKOH / g to 50 mgKOH / g. When the acid value of alkali-soluble resin is in the said range, the resolution of a pixel pattern is excellent.
상기 알칼리 가용성 수지는 상기 감광성 수지 조성물 총량에 대하여 1 중량0 /0 내지 30 중량 %, 예컨대 1 중량0 /0 내지 20 중량0 /0로 포함될 수 있다. 알칼리 The alkali-soluble resin may be included in one weight 0/0 to 30% by weight, for example 1 weight 0/0 to 20 parts by weight 0/0 relative to the total photosensitive resin composition. alkali
가용성 수지가 상기 범위 내로 포함될 경우, 컬러필터 제조시 현상성이 우수하며 가교성이 개선되어 우수한 표면 평활도를 얻을 수 있다. When the soluble resin is included in the above range, it is excellent in developability in the production of color filters and crosslinkability is improved to obtain excellent surface smoothness.
상기 광중합성 화합물은 적어도 1개의 에틸렌성 불포화 이증결합을 가지는 (메타)아크릴산의 일관능 또는 다관능 에스테르가 사용될 수 있다.  As the photopolymerizable compound, a monofunctional or polyfunctional ester of (meth) acrylic acid having at least one ethylenically unsaturated double bond may be used.
광중합성 화합물은 상기 에틸렌성 불포화 이중결합을 가짐으로써, 패턴 형성 공정에서 노광시 층분한 중합을 일으킴으로써 내열성, 내광성 및 내화학성이 우수한 패턴을 형성할 수 있다.  Since the photopolymerizable compound has the ethylenically unsaturated double bond, the photopolymerizable compound may form a polymerized layer upon exposure in the pattern forming process, thereby forming a pattern having excellent heat resistance, light resistance, and chemical resistance.
광중합성 화합물의 구체적인 예로는, 에틸렌 글리콜 디 (메타)아크릴레이트, 디에틸렌 글리콜 디 (메타)아크릴레이트, 트리에틸렌 글리콜 디 (메타)아크릴레이트, 프로필렌 글리콜 디 (메타)아크릴레이트, 네오펜틸 글리콜 디 (메타)아크릴레이트 , 1,4- 부탄디을 디 (메타)아크릴레이트 , 1,6-핵산디올 디 (메타)아크릴레이트, 비스페놀 A 디 (메타)아크릴레이트, 펜타에리트리틀 디 (메타)아크릴레이트, 펜타에리트리를  Specific examples of the photopolymerizable compound include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, propylene glycol di (meth) acrylate and neopentyl glycol di. (Meth) acrylate, 1,4-butanedi di (meth) acrylate, 1,6-nucleic acid diol di (meth) acrylate, bisphenol A di (meth) acrylate, pentaerythritol di (meth) acrylate , Pentaery tree
트리 (메타)아크릴레이트, 펜타에리트리틀 테트라 (메타)아크릴레이트, 펜타에리트리를 헥사 (메타)아크릴레이트, 디펜타에리트리를 디 (메타)아크릴레이트, 디펜타에리트리를 트리 (메타)아크릴레이트, 디펜타에리트리를 펜타 (메타)아크릴레이트, Tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, pentaerythritol to hexa (meth) acrylate, dipentaerythr to di (meth) acrylate, dipentaerythr to tri (meth) acrylic Latent, dipentaerythritol penta (meth) acrylate,
디펜타에리트리를 핵사 (메타)아크릴레이트, 비스페놀 A 에폭시 (메타)아크릴레이트, 에틸렌 글리콜 모노메틸에테르 (메타)아크릴레이트, 트리메틸올 프로판 The dipentaerythride is nucleated (meth) acrylate, bisphenol A epoxy (meth) acrylate, ethylene glycol monomethyl ether (meth) acrylate, trimethylol propane
트리 (메타)아크릴레이트, 트리스 (메타)아크릴로일옥시에틸 포스페이트, 노볼락에폭시 (메타)아크릴레이트 등을 들 수 있다. Tri (meth) acrylate, tris (meth) acryloyloxyethyl phosphate, novolac epoxy (meth) acrylate and the like.
광중합성 화합물의 시판되는 제품을 예로 들면 다음과 같다. 상기  Examples of commercially available products of the photopolymerizable compound are as follows. remind
(메타)아크릴산의 일관능 에스테르의 예로는, 도아 고세이 가가꾸 고교 (주)社의 아로닉스 M-101®, 동 M-l l l®, 동 M-1 14® 등; 니흔 가야꾸 (주)社의 KAYARAD TC- 1 1 OS®, 동 TC-120S® 등; 오사카 유끼 가가꾸 고교 (주)社의 V-158®, V-2311® 등을 들 수 있다. 상기 (메타)아크릴산의 이관능 에스테르의 예로는, 도아 고세이 가가꾸 고교 (주)社의 아로닉스 M-210®, 동 M-240®, 동 M-6200® 등; 니흔 가야꾸 (주)社의 KAYARAD HDDA®, 동 HX-220®, 동 R-604® 등; 오사카 유끼 가가꾸 고교 (주)社의 V- 260®, V-312®, V-335 HP® 등을 들 수 있다. 상기 (메타)아크릴산의 삼관능 As an example of the monofunctional ester of (meth) acrylic acid, Toagosei Kagaku Kogyo Co., Ltd. Aronix M-101 ® , Ml ll ® , M-1 14 ® etc .; KAYARAD TC-1 1 OS ® from Nihon Kayaku Co., Ltd., TC-120S ®, etc .; The V-158 ® and V-2311 ® of Osaka Yuki Chemical Co., Ltd. are mentioned. The (meth) transfer function of an example esters of acrylic acid are, doah Gosei Kagaku Kogyo (Note)社of Aronix M-210 ®, copper or the like M-240 ®, the same M-6200 ®; Nihon Kayak Co., Ltd. KAYARAD HDDA ® , HX-220 ® , R-604 ®, etc .; And V-260 ® , V-312 ® and V-335 HP ® from Osaka Yuki Kagaku Kogyo Co., Ltd. Trifunctionality of the (meth) acrylic acid
에스테르의 예로는, 도아 고세이 가가꾸 고교 (주)社의 아로닉스 M-309®, 동 M-400®, 동 M-405®, 동 M-450®, 동 M-710®, 동 M-8030®, 동 M-8060®등; 니흔 Examples of esters include Aronix M-309 ® , M-400 ® , M-405 ® , M-450 ® , M-710 ® , M-807 from Toagosei Kagaku Kogyo Co., Ltd. ® , copper M-8060 ®, etc .; Nihon
가야꾸 (주)社의 KAYARAD TMPTA®, 동 DPCA-20®, 동 -30®, 동 -60®, 동 -120® 등; KAYARAD TMPTA ® , DPCA-20 ® , -30 ® , -60 ® , -120 ® from Kayaku Co., Ltd .;
오사카 유끼 가야꾸 고교 (주)社의 V-295®, 동 -300®, 동 -360®, 동 -GPT®, 동 -3PA®, 동- 400® 등을 들 수 있다. 상기 제품을 단독 사용 또는 2종 이상 함께 사용할 수 있다. Osaka yukki Kayaku High School (main)社of V-295 ®, East -300 ®, East -360 ®, East -GPT ®, East -3PA ®, Dong, and the like 400 ®. The above products can be used alone or in combination of two or more.
상기 광중합성 화합물은 보다 우수한 현상성을 부여하기 위하여 산무수물로 처리하여 사용할 수도 있다.  The photopolymerizable compound may be used by treating with an acid anhydride in order to impart better developability.
상기 광중합성 화합물은 상기 감광성 수지 조성물 총량에 대하여 1 중량0 /。 내지 15 증량0 /。, 예컨대 5 중량 % 내지 10 중량0 /0로 포함될 수 있다. 광증합성 화합물이 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 충분히 일어나 신뢰성이 우수하며, 알칼리 현상액에의 현상성이 우수하다. The photopolymerizable compounds may be included as one weight 0 /. 15 to increase 0 /., For example 5% by weight to 10 parts by weight 0/0 relative to the total photosensitive resin composition. When a photopolymerizable compound is contained in the said range, hardening arises at the time of exposure in a pattern formation process, and it is excellent in reliability, and is excellent in developability to an alkaline developing solution.
상기 광중합 개시제는 감광성 수지 조성물에 일반적으로 사용되는  The photopolymerization initiator is generally used in the photosensitive resin composition
개시제로서, 예를 들어 아세토페논계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 벤조인계 화합물, 옥심계 화합물, 또는 이들의 조합을 사용할 수 있다. As an initiator, an acetophenone type compound, a benzophenone type compound, a thioxanthone type compound, a benzoin type compound, an oxime type compound, or a combination thereof can be used, for example.
상기 아세토페논계의 화합물의 예로는, 2,2'-디에특시 아세토페논, 2,2'-디부특시 아세토페논, 2-히드록시 -2-메틸프로피오페논, p-t-부틸트리클로로 아세토페논 , p-t- 부틸디클로로 아세토페논, 4-클로로 아세토페논, 2,2'-디클로로 -4-페녹시 아세토페논, 2- 메틸 -1-(4- (메틸티오)페닐) -2-모폴리노프로판 -1-온, 2-벤질 -2-디메틸아미노 -1-(4- 모폴리노페닐) -부탄 -1-온 등을 들 수 있다.  Examples of the acetophenone-based compound include 2,2'-dietospecific acetophenone, 2,2'-dibuspecial acetophenone, 2-hydroxy-2-methylpropiophenone and pt-butyltrichloro aceto Phenone, pt-butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1- (4- (methylthio) phenyl) -2-morpholino Propane-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, and the like.
상기 벤조페논계 화합물의 예로는, 벤조페논, 벤조일 안식향산, 벤조일 안식향산 메틸, 4-페닐 벤조페논, 히드록시 벤조페논, 아크릴화 벤조페논, 4,4'- 비스 (디메틸 아미노)벤조페논, 4,4'-비스 (디에틸아미노)벤조페논, 4,4'- 디메틸아미노벤조페논, 4,4'-디클로로벤조페논, 3,3'-디메틸 -2-메톡시벤조페논 등을 들 수 있다. Examples of the benzophenone-based compound include benzophenone, benzoyl benzoic acid, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxy benzophenone, acrylated benzophenone, 4,4'-bis (dimethylamino) benzophenone, 4,4 '-Bis (diethylamino) benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, and the like. Can be.
상기 티오크산톤계 화합물의 예로는, 티오크산톤, 2-메틸티오크산톤, 이소프로필 티오크산톤, 2,4-디에틸 티오크산톤, 2,4-디이소프로필 티오크산톤, 2- 클로로티오크산톤 등을 들 수 있다.  Examples of the thioxanthone compound include thioxanthone, 2-methyl thioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2- Chlorothioxanthone etc. are mentioned.
상기 벤조인계 화합물의 예로는, 벤조인, 벤조인 메틸 에테르, 벤조인 에틸 에테르, 벤조인 이소프로필 에테르, 벤조인 이소부틸 에테르, 벤질디메틸케탈 등을 들 수 있다.  Examples of the benzoin compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal and the like.
상기 트리아진계 화합물의 예로는 , 2,4,6-트리클로로 -S-트리아진, 2-페닐 4,6- 비스 (트리클로로메틸) -S-트리아진, 2-(3', 4'-디메특시스티릴) -4,6-비스 (트리클로로메틸) -S- 트리아진, 2-(4'-메톡시나프틸 )-4,6-비스 (트리클로로메틸) -S-트리아진, 2-(p-메특시페닐) - 4,6-비스 (트리클로로메틸) -S-트리아진, 2-(p-를릴 )-4,6-비스 (트리클로로 메틸) -S-트리아진, Examples of the triazine-based compound include 2,4,6-trichloro-S-triazine, 2-phenyl 4,6-bis (trichloromethyl) -S-triazine and 2- (3 ', 4'- Dimethoxystyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (4'-methoxynaphthyl) -4,6-bis (trichloromethyl) -S-triazine , 2- (p-Mexyphenyl) -4,6-bis (trichloromethyl) -S-triazine , 2- (p-ryll) -4,6-bis (trichloromethyl) -S-triazine ,
2-비페닐 4,6-비스 (트리클로로 메틸) -S-트리아진, 비스 (트리클로로메틸) -6-스티릴 -S- 트리아진, 2- (나프토 -1-일) -4,6-비스 (트리클로로메틸) -S-트리아진, 2-(4-메록시나프토 -1- 일) -4,6-비스 (트리클로로메틸) -S-트리아진, 2-4-비스 (트리클로로메틸) -6-피페로닐 -S- 트리아진, 2-4-비스 (트리클로로메틸) -6-(4-메록시스티릴) -S-트리아진 등을 들 수 있다. 상기 옥심계 화합물의 예로는 , 0-아실옥심계 화합물 , 2-(o-벤조일옥심) -1-[4- (페닐티오)페닐] -1 ,2ᅳ옥탄디온, 1- (으아세틸옥심) -1-[9-에틸 -6-(2-메틸벤조일) -9H-카르바졸-2-biphenyl 4,6-bis (trichloromethyl) -S-triazine, bis (trichloromethyl) -6-styryl -S-triazine, 2- (naphtho-1-yl) -4, 6-bis (trichloromethyl) -S-triazine, 2- (4-methoxynaphtho-1-yl) -4,6-bis (trichloromethyl) -S-triazine, 2-4-bis (Trichloromethyl) -6-piperonyl-S-triazine, 2-4-bis (trichloromethyl) -6- (4-methoxystyryl) -S-triazine, etc. are mentioned. Examples of the oxime compounds include 0-acyl oxime compounds, 2- (o-benzoyloxime) -1- [4- (phenylthio) phenyl] -1,2, octanedione, 1- (eacetyloxime) -1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazole-
3-일]에탄온 , 0-에특시카르보닐 -α-옥시아미노 -1-페닐프로판 -1-은 둥을 사용할 수 있다. 상기 0-아실옥심계 화합물의 구체적인 예로는 , 1 ,2-옥탄디온, 2-디메틸아미노 -2-(4- 메틸벤질) -1-(4-모르폴린 -4-일-페닐) -부탄 -1-온, 1-(4-페닐슬파닐페닐) -부탄 -1 ,2-디온 2- 옥심 -0-벤조에이트, 1-(4ᅳ페닐술파닐페닐) -옥탄 -1 ,2-디은 2-옥심 -0-벤조에이트, 1-(4- 페닐술파닐페닐) -옥탄 -1 -온옥심 -0-아세테이트, 1-(4-페닐술파닐페닐) -부탄 -1-온옥심 -0- 아세테이트 등올 들 수 있다. 3-yl] ethanone, 0-ethoxycarbonyl-α-oxyamino-1-phenylpropane-1- may be used. Specific examples of the 0-acyl oxime compound include 1,2-octanedione, 2-dimethylamino-2- (4-methylbenzyl) -1- (4-morpholin-4-yl-phenyl) -butane- 1-one, 1- (4-phenylsulfanylphenyl) -butane-1,2-dione 2-oxime-0-benzoate, 1- (4 ᅳ phenylsulfanylphenyl) -octane-1,2-disilver 2 -Oxime -0-benzoate, 1- (4-phenylsulfanylphenyl) -octane -1 -onoxime -0-acetate, 1- (4-phenylsulfanylphenyl) -butane-1-onoxime -0- Acetate and the like.
상기 광중합 개시제는 상기 화합물 이외에도 카바졸계 화합물, 디케톤류 화합물, 술포늄 보레이트계 화합물, 디아조계 화합물, 이미다졸계 화합물,  The photopolymerization initiator is a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound,
비이미다졸계 화합물 등을 사용할 수 있다. A biimidazole type compound etc. can be used.
상기 광중합 개시제는 빛을 흡수하여 들뜬 상태가 된 후 그 에너지를 전달함으로써 화학반웅을 일으키는 광 증감제와 함께 사용될 수도 있다.  The photopolymerization initiator may be used together with a photosensitizer that causes a chemical reaction by absorbing light and transferring energy after being excited.
상기 광 증감제의 예로는, 테트라에틸렌글리콜 비스 -3-머캡토 프로피오네이트 펜타에리트리를 테트라키스 -3-머캡토 프로피오네이트, 디펜타에리트리를 테트라키스- 3-머캡토 프로피오네이트 등을 들 수 있다. Examples of the photosensitizer include tetraethylene glycol bis-3-mercapto propionate pentaerythritol and tetrakis-3-mercapto propionate and dipentaerythryl tetrakis- 3-mercapto propionate, etc. are mentioned.
상기 광중합 개시제는 상기 감광성 수지 조성물 총량에 대하여 0.01 중량% 내지 10 중량0 /0, 예컨대 0.1 중량% 내지 5 중량0 /。로 포함될 수 있다. 광중합 개시제가 상기 범위 내로 포함될 경우, 패턴 형성 공정에서 노광시 경화가 층분히 일어나 우수한 신뢰성을 얻을 수 있으며, 패턴의 내열성, 내광성 및 내화학성이 우수하고, 해상도 및 밀착성 또한 우수하며, 미반웅 개시제로 인한 투과율의 저하를 막을 수 있다. The photoinitiator may comprise from 0.01 weight% to 10 weight 0/0, for example, 0.1% by weight to 5 parts by weight 0 /. Relative to the total photosensitive resin composition. When the photopolymerization initiator is included in the above range, curing occurs during exposure in the pattern forming process to obtain excellent reliability, excellent heat resistance, light resistance and chemical resistance of the pattern, excellent resolution and adhesion, The fall of the transmittance | permeability can be prevented.
상기 용매는 일 구현예에 따른 화합물, 안료, 알칼리 가용성 수지, 광중합성 화합물 및 광중합 개시제와의 상용성을 가지되 반웅하지 않는 물질들이 사용될 수 있다.  The solvent may be a material having compatibility with the compound, pigment, alkali-soluble resin, photopolymerizable compound and photopolymerization initiator according to one embodiment, but does not react.
상기 용매의 예로는, 메탄올, 에탄올 등의 알코올류; 디클로로에틸 에테르 , η- 부틸 에테르, 디이소아밀 에테르, 메틸페닐 에테르, 테트라히드로퓨란 등의 에테르류; 에틸렌 글리콜 모노메틸에테르, 에틸렌 글리콜 모노에틸에테르 등의 글리콜  Examples of the solvent include alcohols such as methanol and ethanol; Ethers such as dichloroethyl ether, η-butyl ether, diisoamyl ether, methylphenyl ether and tetrahydrofuran; Glycols such as ethylene glycol monomethyl ether and ethylene glycol monoethyl ether
에테르류; 메틸 셀로솔브 아세테이트, 에틸 셀로솔브 아세테이트, 디에틸 셀로솔브 아세테이트 등의 셀로솔브 아세테이트류; 메틸에틸 카르비틀, 디에틸 카르비를, 디에틸렌 글리콜 모노메틸에테르, 디에틸렌 글리콜 모노에틸에테르, 디에틸렌 글리콜 디메틸에테르, 디에틸렌 글리콜 메틸에틸에테르, 디에틸렌 글리콜 Ethers; Cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate and diethyl cellosolve acetate; Methyl ethyl carbitle, diethyl carbye, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methylethyl ether, diethylene glycol
디에틸에테르 등의 카르비를류; 프로필렌 글리콜 모노메틸 에테르 아세테이트, 프로필렌 글리콜 프로필 에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류; 를루엔, 크실렌 등의 방향족 탄화수소류; 메틸에틸케톤, Carbyls such as diethyl ether; Propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Aromatic hydrocarbons such as toluene and xylene; Methyl ethyl ketone,
사이클로핵사논, 4-히드록시 -4-메틸 -2-펜타논, 메틸 -η-프로필케톤, 메틸 -η-부틸케톤, 메틸 -η-아밀케톤, 2-헵타논 등의 케톤류; 초산 에틸, 초산 -η-부틸, 초산 이소부틸 등의 포화 지방족 모노카르복실산 알킬 에스테르류; 젖산 메틸, 젖산 에틸 등의 젖산 에스테르류; 옥시 초산 메틸, 옥시 초산 에틸, 옥시 초산 부틸 등의 옥시 초산 알킬 에스테르류; 메톡시 초산 메틸, 메특시 초산 에틸, 메톡시 초산 부틸, 에록시 초산 메틸, 에록시 초산 에틸 등의 알콕시 초산 알킬 에스테르류; 3-옥시 프로피온산 메틸, 3-옥시 프로피온산 에틸 등의 3-옥시 프로피온산 알킬에스테르류; 3-메특시 Ketones such as cyclonucleanone, 4-hydroxy-4-methyl-2-pentanone, methyl -η-propyl ketone, methyl -η-butyl ketone, methyl -η-amyl ketone and 2-heptanone; Saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, -η-butyl acetate and isobutyl acetate; Lactic acid esters such as methyl lactate and ethyl lactate; Oxy acetic acid alkyl esters such as methyl oxy acetate, oxy ethyl acetate and oxy butyl acetate; Alkoxy acetate alkyl esters, such as methoxy methyl acetate, methoxy specialty ethyl acetate, methoxy butyl acetate, ethoxy methyl acetate, and ethoxy ethyl acetate; 3-oxy propionic acid alkyl esters such as methyl 3-oxy propionate and ethyl 3-oxypropionate; 3-Messi
프로피온산 메틸, 3-메톡시 프로피온산 에틸, 3-에톡시 프로피온산 에틸, 3-에록시 프로피온산 메틸 등의 3-알콕시 프로피온산 알킬 에스테르류; 2-옥시 프로피온산 메틸, 2-옥시 프로피온산 에틸, 2-옥시 프로피온산 프로필 등의 2-옥시 프로피온산 알킬 에스테르류; 2-메톡시 프로피온산 메틸, 2-메록시 프로피온산 에틸, 2-에특시 프로피온산 에틸, 2-에록시 프로피온산 메틸 등의 2-알콕시 프로피온산 알킬 에스테르류; 2-옥시 -2-메틸 프로피은산 메틸, 2-옥시 -2-메틸 프로피온산 에틸 등의 2-옥시 -2-메틸 프로피온산 에스테르류, 2-메톡시 -2-메틸 프로피온산 메틸, 2-에톡시 -2- 메틸 프로피온산 에틸 등의 2-알콕시 -2-메틸 프로피온산 알킬류의 모노옥시 모노카르복실산 알킬 에스테르류; 2-히드록시 프로피온산 에틸, 2-히드록시 -2-메틸 프로피온산 에틸, 히드록시 초산 에틸, 2-히드록시 -3-메틸 부탄산 메틸 등의 에스테르류; 피루빈산 에틸 등의 케톤산 에스테르류 등이 있으며, 또한, N- 메틸포름아미드, Ν,Ν-디메틸포름아미드, Ν-메틸포름아닐라드, Ν-메틸아세트아미드, Ν,Ν-디메틸아세트아미드 , Ν-메틸피롤리돈, 디메틸술폭시드, 벤질에틸에테르, 디핵실에테르, 아세틸아세톤, 이소포론, 카프론산, 카프릴산, 1-옥탄올 , 1-노난올, 벤질알코올, 초산 벤질, 안식향산 에틸, 옥살산 디에틸, 말레인산 디에틸 , γ- 부티로락톤, 탄산 에틸렌, 탄산 프로필렌, 페닐 셀로솔브 아세테이트 등의 고비점 용매를 들 수 있다. 3-alkoxy propionic acid alkyl esters such as methyl propionate, ethyl 3-methoxy propionate, ethyl 3-ethoxy propionate and methyl 3-ethoxy propionate; 2-oxy propionic acid, such as 2-oxy methyl propionate, 2-oxy ethyl propionate and 2-oxy propionic acid propyl Alkyl esters; 2-alkoxy propionic acid alkyl esters such as methyl 2-methoxy propionate, ethyl 2-methoxy propionate, ethyl 2-ethoxy propionate and methyl 2-ethoxy propionate; 2-oxy-2-methyl propionic acid esters, such as 2-oxy-2-methyl propionate, 2-oxy-2-methyl ethyl propionate, 2-methoxy-2-methyl methyl propionate, 2-ethoxy-2 Monooxy monocarboxylic acid alkyl esters of 2-alkoxy-2-methyl propionic acid alkyls such as methyl methyl propionate; Esters such as ethyl 2-hydroxy propionate, ethyl 2-hydroxy-2-methyl propionate, ethyl hydroxy acetate, and methyl 2-hydroxy-3-methyl butanoate; Ketone acid esters such as ethyl pyruvate, and the like; and N-methylformamide, Ν, Ν-dimethylformamide, Ν-methylformanilade, Ν-methylacetamide, Ν, Ν-dimethylacetamide , N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dinuclear ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, benzoic acid High boiling point solvents, such as ethyl, diethyl oxalate, diethyl maleate, (gamma) -butyrolactone, ethylene carbonate, propylene carbonate, and phenyl cellosolve acetate, are mentioned.
이들 증 좋게는 상용성 및 반옹성을 고려하여, 에틸렌 글리콜  Ethylene glycol, taking into account their compatibility and reactivity
모노에틸에테르 등의 글리콜 에테르류; 에틸 샐로솔브 아세테이트 등의 에틸렌 글리콜 알킬에테르 아세테이트류 ; 2-히드록시 프로피온산 에틸 등의 에스테르류; 디에틸렌 글리콜 모노메틸에테르 등의 카르비를류; 프로필렌 글리콜 모노메틸에테르 아세테이트, 프로필렌 글리콜 프로필에테르 아세테이트 등의 프로필렌 글리콜 알킬에테르 아세테이트류가 사용될 수 있다. Glycol ethers such as monoethyl ether; Ethylene glycol alkylether acetates such as ethyl salosolve acetate; Esters such as 2-hydroxy ethyl propionate; Carbyls such as diethylene glycol monomethyl ether; Propylene glycol alkylether acetates such as propylene glycol monomethylether acetate and propylene glycol propylether acetate can be used.
상기 용매는 상기 감광성 수지 조성물 총량에 대하여 잔부량, 예컨대 30 중량0 /0 내지 80 중량 %로 포함될 수 있다. 용매가 상기 범위 내로 포함될 경우 상기 감광성 수지 조성물이 적절한 점도를 가짐에 따라 컬러필터 제조시 공정성이 우수하다. These solvents can be included in glass of quantification, such as 30 wt. 0/0 to 80% by weight relative to the total photosensitive resin composition. When the solvent is included in the above range, as the photosensitive resin composition has an appropriate viscosity, the processability in manufacturing the color filter is excellent.
다른 일 구현예에 따른 감광성 수지 조성물은 기판과의 밀착성 등을 개선하기 위해 에폭시 화합물을 더 포함할 수 있다.  The photosensitive resin composition according to another embodiment may further include an epoxy compound to improve adhesion to the substrate and the like.
상기 에폭시 화합물의 예로는, 페놀 노볼락 에폭시 화합물, 테트라메틸 비페닐 에폭시 화합물, 비스페놀 Α형 에폭시 화합물, 지환족 에폭시 화합물 또는 이들의 조합을 들 수 있다.  As an example of the said epoxy compound, a phenol novolak epoxy compound, a tetramethyl biphenyl epoxy compound, a bisphenol-A epoxy compound, an alicyclic epoxy compound, or a combination thereof is mentioned.
상기 에폭시 화합물은 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 20 중량부, 예컨대 0.1 중량부 내지 10 중량부로 포함될 수 있다. 에폭시 화합물이 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다. 0.01 weight part of said epoxy compound with respect to 100 weight part of photosensitive resin compositions To 20 parts by weight, such as 0.1 parts by weight to 10 parts by weight. When the epoxy compound is included in the above range, it is excellent in adhesion, storage properties and the like.
또한 상기 감광성 수지 조성물은 기판과의 접착성을 향상시키기 위해 카르복실기, 메타크릴로일기, 이소시아네이트기, 에폭시기 등의 반웅성 치환기를 갖는 실란 커플링제를 더 포함할 수 있다.  In addition, the photosensitive resin composition may further include a silane coupling agent having a semi-aromatic substituent such as carboxyl group, methacryloyl group, isocyanate group, epoxy group, etc. in order to improve adhesion to the substrate.
상기 실란 커플링제의 예로는, 트리메특시실릴 벤조산 , γ-메타크릴 옥시프로필 트리메록시실란, 비닐 트리아세특시실란, 비닐 트리메록시실란 , γ-이소시아네이트 프로필 트리에톡시실란 , γ-글리시독시 프로필 트리메록시실란 , β-(3,4- 에폭시사이클로핵실)에틸트리메특시실란 등을 들 수 있으며, 이들을 단독 또는 2종 이상 흔합하여 사용할 수 있다.  Examples of the silane coupling agent include trimethoxysilyl benzoic acid, γ-methacryloxypropyl trimethoxysilane, vinyl triacetic silane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, and γ-glycidoxy Cipropyl trimethoxysilane, (beta)-(3, 4- epoxycyclonuclear chamber) ethyltrimethoxysilane, etc. are mentioned, These can be used individually or in mixture of 2 or more types.
상기 실란 커플링제는 감광성 수지 조성물 100 중량부에 대하여 0.01 중량부 내지 10 증량부로 포함될 수 있다. 실란 커플링제가 상기 범위 내로 포함될 경우 밀착성, 저장성 등이 우수하다.  The silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the photosensitive resin composition. When the silane coupling agent is included in the above range, it is excellent in adhesion, shelf life and the like.
또한 상기 감광성 수지 조성물은 필요에 따라 코팅성 향상 및 결점 생성 방지 효과를 위해 계면 활성제를 더 포함할 수 있다.  In addition, the photosensitive resin composition may further include a surfactant in order to improve coating properties and prevent defects, if necessary.
상기 계면활성제의 예로는, BM Chemie社의 BM-1000®, BM-1100® 등; 다이 닛폰 잉키 가가꾸 고교 (주)社의 메카 팩 F 142D®, 동 F 172®, 동 F 173®, 동 F 183® 등; 스미토모 스리엠 (주)社의 프로라드 FC-135®, 동 FC-170C®, 동 FC-430®, 동 Κ 31® 등; 아사히 그라스 (주)社의 사프론 S-112®, 동 S-113®, 동 S-131®, 동 S-141®, 동 S- 145® 등; 도레이 실리콘 (주)社의 SH-28PA®, 동 -190®, 동 -193®, SZ-6032®, SF-8428® 등의 명칭으로 시판된고 있는 불소계 계면 활성제를 사용할 수 있다. Examples of the surfactant include, but are not limited to, BM-1000 ® , BM-1100 ® , and the like by BM Chemie; Mecha packs F 142D ® , F 172 ® , F 173 ® , F 183 ®, etc. of Dai Nippon Inki Chemical Co., Ltd .; Prorad FC-135 ® , FC-170C ® , FC-430 ® , East Κ 31 ®, etc. of Sumitomo 3M Co., Ltd .; Asahi Grass Co., Ltd. Saffron S-112 ® , S-113 ® , S-131 ® , S-141 ® , S-145 ®, etc .; Toray Silicone Co., Ltd. commercially available fluorine-based surfactants such as SH-28PA ® , -190 ® , -193 ® , SZ-6032 ® and SF-8428 ® can be used.
상기 계면 활성제는 감광성 수지 조성물 100 중량부에 대하여 0.001 중량부 내지 5 중량부로 사용될 수 있다. 계면 활성제가 상기 범위 내로 포함될 경우 코팅 균일성이 확보되고, 얼룩이 발생하지 않으며, 유리 기판에 대한  The surfactant may be used in an amount of 0.001 part by weight to 5 parts by weight based on 100 parts by weight of the photosensitive resin composition. If the surfactant is included in the above range, coating uniformity is ensured, staining does not occur, and
습윤성 (wetting)이 우수하다. Wetting is excellent.
또한 상기 감광성 수지 조성물은 물성을 저해하지 않는 범위 내에서  Moreover, the said photosensitive resin composition is in the range which does not inhibit physical property.
산화방지제, 안정제 등의 기타 첨가제가 일정량 첨가될 수도 있다. A certain amount of other additives such as antioxidants and stabilizers may be added.
또 다른 일 구현예에 따르면, 상기 일 구현예에 따른 감광성 수지 조성물을 이용하여 제조된 컬러필터를 제공한다.  According to another embodiment, a color filter manufactured using the photosensitive resin composition according to the embodiment is provided.
상기 컬러필터 내 패턴 형성 공정은 다음과 같다. 상기 감광성 수지 조성물을 지지 기판상에 스핀 코팅, 슬릿 코팅, 잉크젯 프린팅 등으로 도포하는 공정; 상기 도포된 감광성 수지 조성물을 건조하여 감광성 수지 조성물 막을 형성하는 공정 ; 상기 감광성 수지 조성물 막을 노광하는 공정 ; 상기 노광된 감광성 수지 조성물 막을 알칼리 수용액으로 현상하여 감광성 The pattern forming process in the color filter is as follows. Applying the photosensitive resin composition on a support substrate by spin coating, slit coating, inkjet printing, or the like; Drying the coated photosensitive resin composition to form a photosensitive resin composition film; Exposing the photosensitive resin composition film; The exposed photosensitive resin composition film is developed with an aqueous alkali solution to be photosensitive.
수지막올 제조하는 공정; 및 상기 감광성 수지막을 가열 처리하는 공정을 포함한다. 상기 공정 상의 조건 등에 대하여는 당해 분야에서 널리 알려진 사항이므로, 본 명세서에서 자세한 설명은 생략하기로 한다. Preparing a resin film; And heat-processing the said photosensitive resin film. Since the process conditions and the like are well known in the art, detailed descriptions thereof will be omitted herein.
【발명의 실시를 위한 형태】 [Form for implementation of invention]
이하, 실시예를 들어 본 발명에 대해서 더욱 상세하게 설명할 것이나, 하기의 실시예는 본 발명의 바람직한 실시예일 뿐 본 발명이 하기 실시예에 한정되는 것은 아니다.  Hereinafter, the present invention will be described in more detail with reference to Examples, but the following Examples are only preferred embodiments of the present invention, and the present invention is not limited to the following Examples.
(화합물의 합성) Synthesis of Compound
합성예 1 : 4-(Biphenyl-2-vIoxy)-3,5,6-trichloro-phthalonitrile의 합성  Synthesis Example 1 Synthesis of 4- (Biphenyl-2-vIoxy) -3,5,6-trichloro-phthalonitrile
100ml 폴라스크에 3,4,5,6-tetrachlorophthak itrile (5g), 2-Phenylphenol (3.201g), K2C03 (3.898g), 아세토나이트릴 (50ml)을 넣고 가열하면서 환류한다. 반응 종료 후 필터하고 tetrahydrofuran으로 워싱하여 농축 후 고체를 얻을 수 있다. 이때 얻어진 고체를 핵산으로 수회 씻어 주고, 여과 후 진공 건조하여 4-(Biphenyl-2-yloxy)-3,5,6- trichloro-phthalonitrile를 얻는다. 합성예 2: 3,4,6-Trichloro-5-i2,6-dimethoxy-phenoxy)-phthalonitrile의 합성 3,4,5,6-tetrachlorophthak itrile (5 g), 2-Phenylphenol (3.201 g), K 2 C0 3 (3.898 g) and acetonitrile (50 ml) are added to a 100 ml polar flask and heated to reflux. After completion of the reaction, the mixture was filtered and washed with tetrahydrofuran to obtain a solid after concentration. The solid obtained at this time was washed several times with nucleic acid, filtered and dried in vacuo to obtain 4- (Biphenyl-2-yloxy) -3,5,6-trichloro-phthalonitrile. Synthesis Example 2 Synthesis of 3,4,6-Trichloro-5-i2,6-dimethoxy-phenoxy) -phthalonitrile
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile (5g), 2,6-dimethxoy phenol (7.21g), K2CO3 (3.898g), N,N-Dimethylformamide (50rnl)를 넣고 70 °C에서 가열하면서 교반한다. 반웅 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한 후 농축 및 진공 건조하여 3,4,6- Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitrile 를 얻는다ᅳ 합성예 3: 4-(2-tert-Butyl-Dhenoxy)-3,5,6-trichloro-phthal()nitrile의 합성 In a 100 ml flask, add 3,4,5,6-tetrachlorophthalonitrile (5 g), 2,6-dimethxoy phenol (7.21 g), K 2 CO 3 (3.898 g), N, N-Dimethylformamide (50rnl) at 70 ° C Stir while heating. After reaction, extract with EA (ethyl acetate). Extraction and concentration, purification by column chromatography, concentration and vacuum drying yields 3,4,6-Trichloro-5- (2,6-dimethoxy-phenoxy) -phthalonitrile. Synthesis of (2-tert-Butyl-Dhenoxy) -3,5,6-trichloro-phthal () nitrile
100ml 플라스크에 3,4,5,6-tetrachlorophthalonitrile (5g), 2-tert-Butylphenol (6.6 K2C03 (3.898g), 아세토나이트릴 (50ml)을 넣고 가열하면서 환류한다. 반웅 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한 후 농축 및 진공 건조하여 4-(2-tert-Butyl-phenoxy)-3,5,6- trichloro-phthalonitrile 를 얻는다 . 합성예 4: 4-(4-tert-Butyl-phenoxy)-3,5,6-trichloro-phthaloiiitrile의 합성 3,4,5,6-tetrachlorophthalonitrile (5 g), 2-tert-Butylphenol (6.6 in a 100 ml flask Add K 2 CO 3 (3.898 g) and acetonitrile (50 ml) and reflux while heating. After reaction, extract with EA (ethyl acetate). Extraction, concentration, and purification by column chromatography, followed by concentration and vacuum drying to obtain 4- (2-tert-Butyl-phenoxy) -3,5,6-trichloro-phthalonitrile. Synthesis Example 4 Synthesis of 4- (4-tert-Butyl-phenoxy) -3,5,6-trichloro-phthaloiiitrile
100ml 플라스크에 3,4,5,6-tetrachk)iOphthalonitrile (5g), 4-tert-Butylphenol (6.64g), K2C03 (3.898g), 아세토나이트릴 (50ml)을 넣고 가열하면서 환류한다. 반웅 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한 후 농축 및 진공 건조하여 4-(4-tert-Butyl-phenoxy)-3,5,6- trichloro-phthalonitrile 를 얻는다 . 합성예 5: 3,4,6-Trichloro-5-i3-methyl-butoxy)-phthalonitrile의 합성 3,4,5,6-tetrachk) iophthalonitrile (5g), 4-tert-Butylphenol (6.64g), K 2 CO 3 (3.898g) and acetonitrile (50ml) were added to a 100ml flask and refluxed. After reaction, extract with EA (ethyl acetate). After extraction, the resultant was concentrated, purified by column chromatography, concentrated and vacuum dried to obtain 4- (4-tert-Butyl-phenoxy) -3,5,6-trichloro-phthalonitrile. Synthesis Example 5 Synthesis of 3,4,6-Trichloro-5-i3-methyl-butoxy) -phthalonitrile
100ml 플라스크에 3,4,5,6-tetrachlorophthal(3nitrile (5g), Isoamyl alcohol (5.9g), 1,8- Diazabicycloundec-7-ene (3.898g), 아세토나이트릴 (50ml)을 넣고 가열하면서 환류한다. 반웅 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축하여 컬럼  Add 3,4,5,6-tetrachlorophthal (3nitrile (5g), Isoamyl alcohol (5.9g), 1,8- Diazabicycloundec-7-ene (3.898g) and acetonitrile (50ml) in a 100ml flask After completion of reaction, extract with EA (ethyl acetate) Extraction and concentration column
크로마토그래피 (column chromatography)로 정제한 후 농축 및 진공 건조하여 3,4,6- Trichloro-5-(3-methyl-butoxy)-phthalonitrile 를 얻는다ᅳ 합성여 1 6: 3,4,6-Trichloro-5-i4-methoxy-phenoxyVphthalonitnle의 합성 Purification by column chromatography, concentration and vacuum drying give 3,4,6-Trichloro-5- (3-methyl-butoxy) -phthalonitrile. Synthesis 1 1 3,4,6-Trichloro- Synthesis of 5-i4-methoxy-phenoxyVphthalonitnle
100ml 플라스크에 3,4,5,6-tetrachlorOphtlialomtrile (5g), 4-methoxyphenol (3.201g), K2C03 (6.64g), 아세토나이트릴 (50ml)을 넣고 가열하면서 환류한다. 반웅 종료 후 EA(ethyl acetate)로 추출한다. 추출 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한 후 농축 및 진공 건조하여 3,4,6-Trichloro-5-(4-methoxy- phenoxy)-phthalonitri le 를 얻는다. 합성예 7: 화학식 8로 표시되는 화합물의 합성 Add 3,4,5,6-tetrachlorOphtlialomtrile (5 g), 4-methoxyphenol (3.201 g), K 2 CO 3 (6.64 g), acetonitrile (50 ml) in a 100 ml flask and reflux with heating. After reaction, extract with EA (ethyl acetate). After extraction, the mixture was purified by column chromatography, concentrated and vacuum dried to obtain 3,4,6-Trichloro-5- (4-methoxy-phenoxy) -phthalonitrile. Synthesis Example 7 Synthesis of Compound Represented by Chemical Formula 8
lOOmL 플라스크에 합성예 1의 4-(Biphenyl-2-yloxy)-3,5,6-trichloro-phthalonitrile (l.Og), 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitri^  4- (Biphenyl-2-yloxy) -3,5,6-trichloro-phthalonitrile (l.Og) of Synthesis Example 1, 3,4,6-Trichloro-5- (2,6) of Synthesis Example 2 in a 100 mL flask -dimethoxy-phenoxy) -phthalonitri ^
Diazabicycloundec-7-ene (0.38g), 1-펜탄을 (7g), zinc acetate (0.15g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여 하기 화학식 8로 표시되는 화합물을 얻는다. Add Diazabicycloundec-7-ene (0.38g), 1-pentane (7g), zinc acetate (0.15g) and put it at 140 ° C. Stir while heating. After completion of reaction, the solution was concentrated and purified by column chromatography. The liquid obtained after purification is concentrated to give a solid. The crystallized solid is dried in vacuo to obtain a compound represented by the following formula (8).
[화학식 8]  [Formula 8]
Figure imgf000031_0001
Figure imgf000031_0001
Maldi-tof MS: 1647.95 m/z 합성예 8: 화학식 9로 표시되는 화합물의 합성  Maldi-tof MS: 1647.95 m / z Synthesis Example 8 Synthesis of Compound Represented by Chemical Formula 9
lOOmL 플라스크에 합성예 1의 4-(Biphenyl-2-yloxy)-3,5,6-trichloro-phthalonitrile (l .Og), 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitrile ^ 4- (Biphenyl-2-yloxy) -3,5,6-trichloro-phthalonitrile in Synthesis example 1 in lOOmL flask (l .Og), 3 of Preparation Example 2, 4, 6-Trichloro- 5- (2, 6 -dimethoxy-phenoxy) -phthalonitrile ^
Diazabicycloundec-7-ene (().58g), 1-펜탄을 (14g), zinc acetate (().23g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여 하기 화학식 9로 표시되는 화합물을 얻었다. [화학식 9] Add Diazabicycloundec-7-ene (() .58g), 1-pentane (14g), zinc acetate (() .23g) and stir while heating to 140 ° C. After completion of reaction, the solution was concentrated and purified by column chromatography. The liquid obtained after purification is concentrated to give a solid. The crystallized solid was vacuum dried to obtain a compound represented by the following formula (9). [Formula 9]
Figure imgf000032_0001
Figure imgf000032_0001
Maldi-tof MS: 1631.91 m/z 합성예 9: 화학식 10으로 표시되는 화합물의 합성  Maldi-tof MS: 1631.91 m / z Synthesis Example 9 Synthesis of Compound Represented by Chemical Formula 10
lOOmL 플라스크에 합성예 1의 4-(Biphenyl-2-yloxy)-3,5,6-trichloro-phthalonitrile (0.5g), 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitrile (l.44g^ Diazabicycloundec-7-ene (0.58g), 1-펜탄을 (14g), zinc acetate (0.23g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여 하기 화학식 10으로 표시되는 화합물을 얻었다. Synthesis Example 1 in a flask lOOmL 4- (Biphenyl-2-yloxy) -3,5,6-trichloro-phthalonitrile (0.5g), 3 of Preparation Example 2, 4, 6 -Trichloro-5- (2, 6- Add dimethoxy-phenoxy) -phthalonitrile (l. 44 g ^ Diazabicycloundec-7-ene (0.58 g), 1-pentane (14 g) and zinc acetate (0.23 g) and stir while heating to 140 ° C. Concentration and purification by column chromatography The purification of the obtained liquid is concentrated to give a solid The crystallized solid is dried in vacuo to obtain a compound represented by the following Chemical Formula 10.
[화학식 Formula
Figure imgf000033_0001
Figure imgf000033_0001
Maldi-tof MS: 1615.86 m/z 합성예 10: 화학식 11로 표시되는 화합물의 합성  Maldi-tof MS: 1615.86 m / z Synthesis Example 10 Synthesis of Compound Represented by Chemical Formula 11
lOOmL 플라스크에 합성예 4의 4-(4-tert-Butyl-phenoxy)-3,5,6-trichloro- phthalonitrile (lg), 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitrile (0.33g), 1 ,8-Diazabicycloundec-7-ene (0.41 g), 1-펜탄올 (14g), zinc acetate (0.16g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여 하기 화학식 1 1로 표시되는 화합물을 얻었다. Synthesis Example 4 in lOOmL flask, 4- (4-tert-Butyl- phenoxy) - 3, 5,6-trichloro- phthalonitrile (lg), prepared in Synthesis Example 2 3,4,6-Trichloro-5- (2,6 Add -dimethoxy-phenoxy) -phthalonitrile (0.33g), 1,8-Diazabicycloundec-7-ene (0.41 g), 1-pentanol (14g), zinc acetate (0.16g) and stir while heating to 140 ° C . After completion of reaction, the solution was concentrated and purified by column chromatography. The liquid obtained after purification is concentrated to give a solid. The crystallized solid was dried in vacuo to obtain a compound represented by the following Chemical Formula 11.
Figure imgf000034_0001
Figure imgf000034_0001
합성예 11: 화학식 12로표시되는 화합물의 합성 Synthesis Example 11 Synthesis of Compound Represented by Chemical Formula 12
lOOmL 플라스크에 합성예 5의 3,4,6-Trichloro-5-(3-methyl-butoxy)-phthalonitrile (lg), 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalomtrile ^  3,4,6-Trichloro-5- (3-methyl-butoxy) -phthalonitrile (lg) of Synthesis Example 5 and 3,4,6-Trichloro-5- (2,6-dimethoxy of Synthesis Example 2 in a 100 mL flask -phenoxy) -phthalomtrile ^
Diazabicycloundec-7-ene (0.48g), 1-펜탄을 (14g), zinc acetate (0.19g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여, 하기 화학식 12로 표시되는 화합물을 얻었다. 12] Add Diazabicycloundec-7-ene (0.48g), 1-pentane (14g), zinc acetate (0.19g) and stir while heating to 140 ° C. After completion of reaction, the solution was concentrated and purified by column chromatography. The liquid obtained after purification is concentrated to give a solid. The crystallized solid was vacuum dried to obtain a compound represented by the following formula (12). 12]
Figure imgf000035_0001
Figure imgf000035_0001
Maldi-tof MS: 1401.77 m/z 합성예 12: 화학식 13으로 표시되는 화합물의 합성  Maldi-tof MS: 1401.77 m / z Synthesis Example 12 Synthesis of Compound Represented by Chemical Formula 13
lOOmL 플라스크에 합성예 1의 4-(Biphenyl-2-yloxy)-3,5,6-trichloiO-phthalonitrile (lg) 합성예 5의 3,4,6-Trichloro-5-(3-methyl-butoxy)-phthalonitrile (0.4g 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitrile (0.48g), 1 ,8-Diazabicycloundec-7-ene (0.58g), 1-펜탄을 (14g), zinc acetate (0.22g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여, 하기 화학식 13으로 표시되는 화합물을 얻었다. [화학식 13] 4- (Biphenyl-2-yloxy) -3,5,6-trichloiO-phthalonitrile (lg) of Synthesis Example 1 3,4,6-Trichloro-5- (3-methyl-butoxy) of Synthesis Example 5 in a 100 mL flask -phthalonitrile (0.4g 3,4,6-Trichloro-5- (2,6-dimethoxy-phenoxy) -phthalonitrile (0.48g) of Synthesis Example 2, 1,8-Diazabicycloundec-7-ene (0.58g), 1 Add pentane (14 g), add zinc acetate (0.22 g) and stir while heating to 140 ° C. After completion of reaction, concentrate and purify by column chromatography After purification, the obtained liquid is concentrated to give a solid. The crystallized solid was vacuum dried to obtain a compound represented by the following formula (13). [Formula 13]
Figure imgf000036_0001
Figure imgf000036_0001
Maldi-tof MS: 1565.89 m/z 합성예 13: 화학식 14로표시되는 화합물의 합성  Maldi-tof MS: 1565.89 m / z Synthesis Example 13: Synthesis of Compound Represented by Chemical Formula 14
lOOmL 플라스크에 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)- phthalonitrile (lg), 1 ,8-Diazabicycloundec-7-ene (0.30g), 1- 탄을 (7g), zinc acetate (0.12g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 In a 100 mL flask, 3,4,6-Trichloro-5- (2,6-dimethoxy-phenoxy) -phthalonitrile (lg), 1,8-Diazabicycloundec-7-ene (0.30 g) and 1-tan of Synthesis Example 2 were added. (7g), add zinc acetate (0.12g) and stir while heating to 140 ° C. After reaction, concentrate the column
크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여, 하기 화학식 14로 표시되는 화합물을 얻었다. Purification by column chromatography. The liquid obtained after purification is concentrated to give a solid. The crystallized solid was vacuum dried to obtain a compound represented by the following formula (14).
[화학식 Formula
Figure imgf000037_0001
Figure imgf000037_0001
Maldi-tof MS: 1599.82 m/z 합성예 14: 화학식 15로 표시되는 화합물의 합성  Maldi-tof MS: 1599.82 m / z Synthesis Example 14 Synthesis of Compound Represented by Chemical Formula 15
l OOmL 플라스크에 합성예 6의 (3,4,6-TrichknO-5-(4-methoxy-phenoxy)- phthalonitrile (lg), 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitrile (0.50g), 1 ,8-Diazabicycloundec-7-ene (0.65g), 1-펜탄올 (14g), zinc acetate (0.26g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여, 하기 화학식 15로 표시되는 화합물을 얻었다 In an OOmL flask, (3,4,6-TrichknO-5- ( 4- methoxy-phenoxy) -phthalonitrile (lg) of Synthesis Example 6, 3,4,6-Trichloro-5- (2,6) Add -dimethoxy-phenoxy) -phthalonitrile (0.50g), 1,8-Diazabicycloundec-7-ene (0.65g), 1-pentanol (14g), zinc acetate (0.26g) and stir while heating to 140 ° C After completion of reaction, the mixture was concentrated and purified by column chromatography, and then the obtained liquid was concentrated to obtain a solid, and the crystallized solid was dried in vacuo to obtain a compound represented by the following Chemical Formula 15.
[화학식 15] [Formula 15]
Figure imgf000038_0001
Figure imgf000038_0001
Maldi-tof MS: 1509.74 m/z 합성예 15: 화학식 16으로표시되는 화합물의 합성  Maldi-tof MS: 1509.74 m / z Synthesis Example 15 Synthesis of Compound Represented by Chemical Formula 16
lOOmL 플라스크에 합성예 3의 4-(2-tert-Butyl-phenoxy)-3,5,6-trichloiO- phthalonitrile (lg), 합성예 2의 3,4,6-Trichloro-5-(2,6-dimethoxy-phenoxy)-phthalonitrile (0.33g), 1 ,8-Diazabicycloundec-7-ene (0.41 g), 1-펜탄올 (14g), zinc acetate (0.16g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여, 하기 화학식 16으로 표시되는 화합물을 얻었다. [화학식 16] In a 100 mL flask, 4- (2-tert-Butyl-phenoxy) -3,5,6-trichloiO-phthalonitrile (lg) of Synthesis Example 3, 3, 4 , 6- Trichloro-5- (2,6) of Synthesis Example 2 Add -dimethoxy-phenoxy) -phthalonitrile (0.33g), 1,8-Diazabicycloundec-7-ene (0.41 g), 1-pentanol (14g), zinc acetate (0.16g) and stir while heating to 140 ° C . After completion of reaction, the solution was concentrated and purified by column chromatography. The liquid obtained after purification is concentrated to give a solid. The crystallized solid was vacuum dried to obtain a compound represented by the following formula (16). [Formula 16]
Figure imgf000039_0001
Figure imgf000039_0001
Maldi-tof MS: 1587.98 m/z 비교 합성예 화학식 17로 표시되는 화합물의 합성  Maldi-tof MS: 1587.98 m / z Comparative Synthesis Example Synthesis of Compound Represented by Chemical Formula 17
lOOmL 플라스크에 4-(2-sec-Butyl-phenoxy)-3,5,6-trichloro-phthalonitrile (lg), 1,8- Diazabicycloundec-7-ene (0.30g), 1-펜탄올 (7g), zinc acetate (().12g)를 넣고 140 °C로 가열하면서 교반한다. 반웅 종료 후 농축하여 컬럼 크로마토그래피 (column chromatography)로 정제한다. 정제 후 얻어진 액체를 농축하여 고체를 얻는다. 상기 결정화된 고체를 진공 건조하여, 하기 화학식 17로 표시되는 화합물을 얻었다. In a 100 mL flask, 4- (2-sec-Butyl-phenoxy) -3,5,6-trichloro-phthalonitrile (lg), 1,8- Diazabicycloundec-7-ene (0.30 g), 1-pentanol (7 g), Add zinc acetate (() .12g) and stir while heating to 140 ° C. After completion of reaction, the solution was concentrated and purified by column chromatography. The liquid obtained after purification is concentrated to give a solid. The crystallized solid was vacuum dried to obtain a compound represented by the following formula (17).
17] 17]
Figure imgf000040_0001
Figure imgf000040_0001
Maldi-tofMS: 1584.04 m/z  Maldi-tofMS : 1584.04 m / z
(감광성 수지 조성물의 합성) (Synthesis of Photosensitive Resin Composition)
실시예 1  Example 1
하기 언급된 구성성분들을 하기 표 1에 나타낸 조성으로 흔합하여 실시예 1에 따른 감광성 수지 조성물을 제조하였다.  The components mentioned below were mixed with the compositions shown in Table 1 below to prepare a photosensitive resin composition according to Example 1.
구체적으로, 용매에 광중합 개시제를 녹인 후 2 시간 동안 상온에서 교반한 다음, 여기에 알칼리 가용성 수지 및 광중합성 화합물을 첨가하여 2시간 동안 상온에서 교반하였다. 이어서, 얻어진 상기 반웅물에 착색제로서 상기 합성예 7에서 제조된 화합물 (화학식 8로 표시되는 화합물) 및 안료 (안료분산액 형태)를 넣고 1시간 동안 상은에서 교반하였다. 이어 상기 생성물을 3회 여과하여 불순물을 제거함으로써, 감광성 수지 조성물을 제조하였다.  Specifically, after dissolving the photopolymerization initiator in a solvent and stirred at room temperature for 2 hours, an alkali-soluble resin and a photopolymerizable compound were added thereto, followed by stirring at room temperature for 2 hours. Subsequently, a compound (compound represented by Formula 8) and a pigment (in the form of a pigment dispersion) prepared in Synthesis Example 7 were added as a colorant to the obtained semi-flour, followed by stirring at phase silver for 1 hour. The product was then filtered three times to remove impurities, thereby preparing a photosensitive resin composition.
[표 1], [Table 1],
(단위: 중량0 /。) (Unit: weight 0 /。)
배합원료 함량 착색제 염 합성예 7의 화합물 5.0 안료분산액 Pigment Y 138 안료분산액 15.0 Compounding Material Content Coloring Agent Salt Compound 7 of Synthesis Example 7 Pigment Dispersion Pigment Y 138 Pigment Dispersion 15.0
(A)/(B)-15/85(w/w),  (A) / (B) -15/85 (w / w),
분자량 (Mw)=22,000g/mol  Molecular weight (Mw) = 22,000 g / mol
알칼리 가용성 수지 3.5  Alkali Soluble Resin 3.5
(A): 메타크릴산  (A): methacrylic acid
(B): 벤질메타크릴레이트  (B): benzyl methacrylate
광중합성 화합물 디펜타에리트리를핵사아크릴레이트 (DPHA) 8.0 광중합 개시제 1,2-옥탄디온 1.0  Photopolymerizable compound dipentaerythr to nucleoacrylate (DPHA) 8.0 photopolymerization initiator 1,2-octanedione 1.0
2-디메틸아미노 -2-(4-메틸-벤질) -1-(4-모르폴린 -4- 2-dimethylamino-2- (4-methyl-benzyl) -1- (4-morpholine-4-
0.5 일-페닐) -부탄 -1-온 0.5 yl-phenyl) -butan-1-one
용매 사이클로핵사논 37.0  Solvent Cyclonuxanon 37.0
PGMEA(Propylene Glycol Monomethyl Ether  Propylene Glycol Monomethyl Ether
30.0 Acetate)  30.0 Acetate)
총량 (Total) 100.00 실시예 2  Total 100.00 Example 2
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 합성예 8의 화합물 (화학식 9로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 실시예 3  A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 8 (compound represented by Formula 9) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Example 3
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 합성예 9의 화합물 (화학식 10으로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 실시예 4  A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 9 (compound represented by Formula 10) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Example 4
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 합성예 10의 화합물 (화학식 11로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 실시예 5 합성예 7의 화합물 (화학식 8로표시되는 화합물) 대신 합성예 1 1의 화합물 (화학식 12로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 실시예 6 A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 10 (compound represented by Formula 11) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Example 5 A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 1 (compound represented by Formula 12) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Example 6
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 합성예 12의 화합물 (화학식 13으로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 실시예 7  A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 12 (compound represented by Formula 13) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Example 7
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 합성예 13의 화합물 (화학식 14로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 실시예 8  A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 13 (compound represented by Formula 14) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Example 8
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 합성예 14의 화합물 (화학식 15로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 실시예 9  A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 14 (compound represented by Formula 15) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Example 9
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 합성예 15의 화합물 (화학식 16으로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 비교예 1  A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Synthesis Example 15 (compound represented by Formula 16) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Comparative Example 1
합성예 7의 화합물 (화학식 8로 표시되는 화합물) 대신 비교 합성예 1의 화합물 (화학식 17로 표시되는 화합물)을 사용한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. 비교예 2 표 1에 나타낸 조성 대신 하기 표 2에 나타낸 조성으로 흔합한 것을 제외하고는 실시예 1과 동일하게 하여, 감광성 수지 조성물을 제조하였다. A photosensitive resin composition was prepared in the same manner as in Example 1 except that the compound of Comparative Synthesis Example 1 (compound represented by Formula 17) was used instead of the compound of Synthesis Example 7 (compound represented by Formula 8). Comparative Example 2 A photosensitive resin composition was prepared in the same manner as in Example 1 except that the composition shown in Table 2 was used instead of the composition shown in Table 1.
[표 2] TABLE 2
(단위 : 중량0 /0) (Unit: weight 0/0)
Figure imgf000043_0001
Figure imgf000043_0001
비교예 3  Comparative Example 3
안료분산액 중 Pigment G58 대신 Pigment G36 안료분산액을 사용한 것을 제외하고는 비교예 2와 동일하게 하여, 감광성 수지 조성물을 제조하였다. 평가: 색좌표, 휘도, 및 명암비 측정  A photosensitive resin composition was prepared in the same manner as in Comparative Example 2 except that Pigment G36 pigment dispersion was used instead of Pigment G58 in the pigment dispersion. Evaluation: color coordinates, luminance, and contrast ratio measurements
탈지 세척한 두께 1 mm의 유리 기판 상에 1 내지 3 卿의 두께로 상기 실시예 1 내지 실시예 9 및 비교예 1 내지 비교예 3에서 제조한 감광성 수지 조성물을 도포하고, 9(TC의 핫 플레이트 상에서 2분 동안 건조시켜 도막을 수득하였다. 계속해서 도막에 365nm의 주파장을 가진 고압수은램프를 사용하여 노광하였다. 이 후, 200°C의 열풍순환식 건조로 안에서 5분 동안 건조시켜 샘플을 수득하였다. 화소층은 분광광도계 (MCPD3000, Otsuka electronic社)를 이용하여 색좌표 (x, y), 휘도 (Y) 및 명암비를 측정하여 , 하기 표 3에 기재하였다. The photosensitive resin composition prepared in Examples 1 to 9 and Comparative Examples 1 to 3 was applied to a glass substrate having a thickness of 1 mm by degreasing, and 9 (hot plate of TC The coating was dried for 2 minutes to obtain a coating, which was then exposed using a high pressure mercury lamp having a dominant wavelength of 365 nm.Then, the sample was dried in a hot air circulation drying furnace at 200 ° C. for 5 minutes. Obtained. The pixel layer was measured in color coordinates (x, y), luminance (Y) and contrast ratio using a spectrophotometer (MCPD3000, Otsuka electronic Co., Ltd.), and are shown in Table 3 below.
[표 3]TABLE 3
Figure imgf000044_0001
상기 표 3으로부터, 일 구현예에 따른 화합물을 염료로 포함하는 실시예 1 내지 실시예 9의 감광성 수지 조성물이 상기 화합물을 포함하지 않은 비교예 1 내지 비교예 3의 감광성 수지 조성물보다 우수한 색특성을 나타냄을 확인할 수 있다. 이상 본 발명의 바람직한 실시예에 대하여 설명하였지만, 본 발명은 이에 한정되는 것이 아니고, 특허청구범위와 발명의 상세한 설명 및 첨부한 도면의 범위 안에서 여러 가지로 변형하여 실시하는 것이 가능하고, 이 또한 본 발명의 범위에 속하는 것은 당연하다.
Figure imgf000044_0001
From Table 3, the photosensitive resin composition of Examples 1 to 9 containing the compound according to one embodiment as a dye is superior to the photosensitive resin composition of Comparative Examples 1 to 3 without containing the compound It can be seen that. As mentioned above, although preferred embodiment of this invention was described, this invention is not limited to this, It can be variously modified and implemented in a claim, the detailed description of an invention, and the range of an accompanying drawing. Naturally, it belongs to the scope of the invention.

Claims

【청구의 범위】 【청구항 1】 하기 화학식 1로 표시되는 화합물: Claims Claim 1 Compound represented by the following formula (1):
[화학식 1]  [Formula 1]
Figure imgf000045_0001
Figure imgf000045_0001
상기 화학식 1에서,  In Chemical Formula 1,
Μ은 Cu, Zn, Co 또는 Mo이고,  Μ is Cu, Zn, Co or Mo,
R' 내지 R10은 각각 독립적으로 수소 원자, 할로겐 원자, 치환 또는 비치환된 C1 내지 C20 알킬기, 치환 또는 비치환된 C3 내지 C20 알콕시기, 치환 또는 비치환된 C6 내지 C20 아릴기 또는 치환 또는 비치환된 C6 내지 C20 R 'to R 10 are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 alkoxy group, a substituted or unsubstituted C6 to C20 aryl group, or a substituted or unsubstituted group Substituted C6 to C20
아릴옥시기이고, An aryloxy group,
R1 내지 R16 중 적어도 하나는 하기 화학식 2로 표시되고, At least one of R 1 to R 16 is represented by the following formula (2),
[화학식 2]  [Formula 2]
Figure imgf000045_0002
Figure imgf000045_0002
상기 화학식 2에서,  In Chemical Formula 2,
R17 및 R18은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C2 아릴기이다. R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C2 aryl group.
【청구항 2】 [Claim 2]
게 1항에 있어서,  According to claim 1,
상기 화학식 2는 하기 화학식 3으로 표시되는 화합물: Formula 2 is a compound represented by the following formula (3):
3] 3]
Figure imgf000046_0001
Figure imgf000046_0001
상기 화학식 3에서,  In Chemical Formula 3,
R17 및 R18은 각각 독립적으로 치환 또는 비치환된 C1 내지 C20 알킬기 또는 치환 또는 비치환된 C6 내지 C20 아릴기이다. R 17 and R 18 are each independently a substituted or unsubstituted C1 to C20 alkyl group or a substituted or unsubstituted C6 to C20 aryl group.
【청구항 3 ] [Claim 3]
제 1항에 있어서,  The method of claim 1,
상기 R1 내지 R16 중 적어도 하나는 상기 화학식 2로 표시되고, At least one of R 1 to R 16 is represented by Formula 2,
상기 R1 내지 R16 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되는 화합물: At least one of the R 1 to R 16 is a compound represented by any one of the following formula (4):
[화학식 4]
Figure imgf000046_0002
[Formula 4]
Figure imgf000046_0002
Figure imgf000046_0003
Figure imgf000046_0003
6]
Figure imgf000046_0004
6]
Figure imgf000046_0004
7]
Figure imgf000046_0005
7]
Figure imgf000046_0005
상기 화학식 6 및 화학식 7에서,  In Chemical Formulas 6 and 7,
L1은 치환 또는 비치환된 C1 내지 C 10 알킬렌기이고 L 1 is a substituted or unsubstituted C1 to C 10 alkylene group
R19는 치환 또는 비치환된 C1 내지 C 10 알킬기이다. 【청구항 4】 R 19 is a substituted or unsubstituted C1 to C 10 alkyl group. [Claim 4]
제 1항에 있어서,  The method of claim 1,
상기 R1 내지 R4 증 적어도 하나는 상기 화학식 2로 표시되고, At least one of R 1 to R 4 is represented by Formula 2,
상기 R5 내지 R8 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, At least one of R 5 to R 8 is represented by any one of the following Chemical Formulas 4 to 7,
상기 R9 내지 R12 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, At least one of the R 9 to R 12 is represented by any one of the following Formula 4 to Formula 7,
상기 R13 내지 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되는 화합물: Wherein R 13 to at least one of the compounds represented by any of the following formulas 4 to formula (7):
[화학식 4]
Figure imgf000047_0001
[Formula 4]
Figure imgf000047_0001
5]
Figure imgf000047_0002
5]
Figure imgf000047_0002
6]
Figure imgf000047_0003
Figure imgf000047_0004
6]
Figure imgf000047_0003
Figure imgf000047_0004
상기 화학식 6 및 화학식 7에서,  In Chemical Formulas 6 and 7,
L1은 치환 또는 비치환된 C1 내지 C10 알킬렌기이고 L 1 is a substituted or unsubstituted C1 to C10 alkylene group
R19는 치환 또는 비치환된 C 1 내지 C10 알킬기이다. R 19 is a substituted or unsubstituted C 1 to C10 alkyl group.
【청구항 5】 [Claim 5]
제 1항에 있어서,  The method of claim 1,
상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, At least one of R 1 to R 4 is represented by Formula 2, At least one of R 5 to R 8 is represented by Formula 2, at least one of R 9 to R 12 is represented by any one of Formulas 4 to 7,
상기 R13 내지 R16 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되는 화합물: At least one of the R 13 to R 16 is a compound represented by any one of the following formula (4):
[화학식 4]  [Formula 4]
Figure imgf000048_0001
Figure imgf000048_0001
Figure imgf000048_0002
Figure imgf000048_0002
상기 화학식 6 및 화학식 7에서,  In Chemical Formulas 6 and 7,
L1은 치환 또는 비치환된 C1 내지 C10 알킬렌기이고, L 1 is a substituted or unsubstituted C1 to C10 alkylene group,
R19는 치환 또는 비치환된 C1 내지 C10 알킬기이다. R 19 is a substituted or unsubstituted C1 to C10 alkyl group.
【청구항 6] [Claim 6]
제 1항에 있어서,  The method of claim 1,
상기 R' 내지 R4 증 적어도 하나는 상기 화학식 2로 표시되고, At least one of R ′ to R 4 is represented by Formula 2,
상기 R5 내지 R8 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되고, At least one of R 5 to R 8 is represented by any one of the following Chemical Formulas 4 to 7,
상기 R9 내지 R12 중 적어도 하나는 상기 화학식 2로 표시되고, At least one of R 9 to R 12 is represented by Formula 2,
상기 R13 내지 R10 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어느 하나로 표시되는 화합물: [화학식 4] At least one of R 13 to R 10 is a compound represented by any one of the following Formula 4 to Formula 7: [Formula 4]
Figure imgf000049_0001
Figure imgf000049_0001
상기 화학식 6 및 화학식 7에서,  In Chemical Formulas 6 and 7,
L1은 치환 또는 비치환된 C1 내지 C10 알킬렌기이고, L 1 is a substituted or unsubstituted C1 to C10 alkylene group,
R19는 치환 또는 비치환된 C1 내지 C10 알킬기이다. R 19 is a substituted or unsubstituted C1 to C10 alkyl group.
【청구항 7] [Claim 7]
저 U항에 있어서,  In that U term,
상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R5 내지 R8 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R9 내지 R12 중 적어도 하나는 상기 화학식 2로 표시되고, 상기 R13 내지 R16 중 적어도 하나는 하기 화학식 4 내지 화학식 7 중 어 하나로 표시되는 화합물: At least one of R 1 to R 4 is represented by Formula 2, at least one of R 5 to R 8 is represented by Formula 2, and at least one of R 9 to R 12 is represented by Formula 2 At least one of R 13 to R 16 may be represented by any one of the following Formulas 4 to 7:
[화학식 4] [Formula 4]
[화학식 5]
Figure imgf000050_0001
[Formula 5]
Figure imgf000050_0001
[화학식 6]  [Formula 6]
CH.  CH.
CH3 CH 3
[화학식 7]
Figure imgf000050_0002
[Formula 7]
Figure imgf000050_0002
상기 화학식 6 및 화학식 7에서,  In Chemical Formulas 6 and 7,
L1은 치환 또는 비치환된 C1 내지 C10 알킬렌기이고 L 1 is a substituted or unsubstituted C1 to C10 alkylene group
19 ι  19 ι
R 치환 또는 비치환된 C1 내지 C10 알킬기이다.  R substituted or unsubstituted C1 to C10 alkyl group.
【청구항 8】 [Claim 8]
제 1항에 있어서,  The method of claim 1,
상기 R1 내지 R4 중 적어도 하나는 상기 화학식 2로 표시되고, At least one of R 1 to R 4 is represented by Formula 2,
상기 R5 내지 R8 중 적어도 하나는 상기 화학식 2로 표시되고, At least one of the R 5 To R 8 Is represented by the formula (2),
상기 R9 내지 R12 중 적어도 하나는 상기 화학식 2로 표시되고, At least one of the R 9 to R 12 is represented by the formula (2),
상기 R13 내지 R10 중 적어도 하나는 상기 화학식 2로 표시되는 화합물. At least one of the R 13 to R 10 is a compound represented by the formula (2).
【청구항 9】 [Claim 9]
제 1항에 있어서,  The method of claim 1,
상기 화학식 1로 표시되는 화합물은 하기 화학식 8 내지 화학식 16 중 어느 하나로 표시되는 화합물. The compound represented by Chemical Formula 1 is a compound represented by any one of the following Chemical Formulas 8 to 16.
Figure imgf000051_0001
Figure imgf000051_0001
[화학식 9]
Figure imgf000051_0002
WO 2016/175390 PCT/KR2015/008106
Figure imgf000052_0001
[Formula 9]
Figure imgf000051_0002
WO 2016/175390 PCT / KR2015 / 008106
Figure imgf000052_0001
Figure imgf000052_0002
Figure imgf000053_0001
[화학식 14]
Figure imgf000054_0001
Figure imgf000052_0002
Figure imgf000053_0001
[Formula 14]
Figure imgf000054_0001
Figure imgf000054_0002
[화학식
Figure imgf000054_0002
Formula
Figure imgf000055_0001
Figure imgf000055_0001
【청구항 10] [Claim 10]
거 1 i항에 있어서,  According to claim 1 i,
상기 화합물은 녹색 염료인 화합물.  The compound is a green dye.
【청구항 1 1】 [Claim 1 11]
제 10항에 있어서,  The method of claim 10,
상기 녹색 염료는 445nm 내지 560nm의 파장범위에서 최대 투과도를 가지는 화합물. 【청구항 12]  The green dye has a maximum transmittance in the wavelength range of 445nm to 560nm. [Claim 12]
제 1항 내지 제 1 1항 중 어느 한 항의 화합물을 포함하는 감광성 수지 조성물.  The photosensitive resin composition containing the compound of any one of Claims 1-1.
【청구항 13 ] 【Claim 13】
제 12항에 있어서,  The method of claim 12,
상기 감광성 수지 조성물은 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제 및 용매를 더 포함하는 감광성 수지 조성물. 【청구항 14】 The photosensitive resin composition further comprises an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator and a solvent. [Claim 14]
제 13항에 있어서,  The method of claim 13,
상기 감광성 수지 조성물은 안료를 더 포함하는 감광성 수지 조성물.  The photosensitive resin composition further comprises a pigment.
【청구항 15 ] 【Claim 15】
제 14항에 있어서,  The method of claim 14,
상기 안료는 황색 안료인 감광성 수지 조성물. 【청구항 16】  The pigment is a yellow pigment photosensitive resin composition. [Claim 16]
제 12항의 감광성 수지 조성물을 이용하여 제조되는 컬러필터.  The color filter manufactured using the photosensitive resin composition of Claim 12.
PCT/KR2015/008106 2015-04-30 2015-08-03 Novel compound, photosensitive resin composition containing same and color filter WO2016175390A1 (en)

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