CN108107674A - Photosensitive polymer combination and use its photo-sensitive resin and colored filter - Google Patents
Photosensitive polymer combination and use its photo-sensitive resin and colored filter Download PDFInfo
- Publication number
- CN108107674A CN108107674A CN201711060733.4A CN201711060733A CN108107674A CN 108107674 A CN108107674 A CN 108107674A CN 201711060733 A CN201711060733 A CN 201711060733A CN 108107674 A CN108107674 A CN 108107674A
- Authority
- CN
- China
- Prior art keywords
- chemical formula
- weight
- photosensitive polymer
- polymer combination
- repetitive unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
Abstract
The present invention is provided a kind of photosensitive polymer combination, a kind of is included using the photo-sensitive resin and a kind of colored filter manufactured using the photosensitive polymer combination, the photosensitive polymer combination of the photosensitive polymer combination：(A1) the first acrylic adhesive resin；(A2) the second acrylic adhesive resin；(B) photopolymerizable monomer；(C) Photoepolymerizationinitiater initiater；(D) colorant；And (E) solvent.It is water stain that photosensitive polymer combination provided by the invention can improve heat resistance, brightness, surface folding, development, and therefore can be applied to colored filter.
Description
Technical field
The present invention relates to a kind of photosensitive polymer combination, it is a kind of manufactured using the photosensitive polymer combination it is photosensitive
Property resin bed and a kind of colored filter for including the photo-sensitive resin.
Background technology
Recently, as the use of big screen LCD (liquid crystal display, LCD) dramatically increases,
Therefore have become and have increasing need for improving its performance.Since colored filter is used to implement in all multi-parts of liquid crystal display
The most important factor of color, therefore the process margin to increasing colored filter carries out actively research to improve productivity.
In addition, in order to increase the excitation purity of big screen LCD (LCD) (color purity), increased using passing through
The concentration of colorant and the photosensitive polymer combination for preparing manufacture colored filter.Therefore, photosensitive polymer combination needs
There is the visualization ratio reduced to improve productivity and yield in a manufacturing process, and although light exposure still have it is excellent
Sensitivity.
The methods of by drying, electrophoretic deposition (electrophoretic deposition, EPD), printing, scattered pigment
Colored filter is manufactured using photosensitive polymer combination, wherein being coated with three or more colors on a transparent substrate.
Recently, pigment dispersion method is more energetically used.
On the other hand, using the colored filter that color type photosensitive polymer combination manufactures because of the size of granules of pigments and
Cohesion (cohesion) and there is the limitation for deteriorating brightness and contrast.In order to improve these limitations, to comprising not formed
The dyestuff of particle includes primary particle size (primary particle diameter) dye much smaller compared with dispersible pigment dispersion
The dye-type photosensitive polymer combination of material is studied.However, dye-type photosensitive polymer combination have it is weak heat-resisting
Property, light resistance and chemical resistance, thereby increases and it is possible to still be difficult to realize business application.
The content of the invention
The embodiment of the present invention, which provides one kind, can improve brightness and water stain (water stain) generation and pattern trickling
(flowing-down) photosensitive polymer combination.
The embodiment of the present invention provides a kind of photosensitive polymer combination, and the photosensitive polymer combination includes：(A1)
One acrylic adhesive resin, comprising the repetitive unit represented by chemical formula 1, the repetitive unit represented by chemical formula 2, by changing
The repetitive unit that formula 3 represents and the repetitive unit represented by chemical formula 4；(A2) the second acrylic adhesive resin, comprising
The repetitive unit that is represented by chemical formula 1, the repetitive unit represented by chemical formula 5, the repetitive unit represented by chemical formula 6, by changing
The repetitive unit that formula 7 represents and the repetitive unit represented by chemical formula 8；(B) photopolymerizable monomer；(C) Photoepolymerizationinitiater initiater；
(D) colorant；And (E) solvent.
[chemical formula 1]
[chemical formula 2]
[chemical formula 3]
[chemical formula 4]
[chemical formula 5]
[chemical formula 6]
[chemical formula 7]
[chemical formula 8]
In chemical formula 1 into chemical formula 8,
R1For the C1 that is substituted or is unsubstituted to C10 alkyl,
R2To R5And R7To R9It independently is hydrogen atom or the C1 that is substituted or is unsubstituted is to C10 alkyl, and
R6For the C11 that is substituted or is unsubstituted to C20 alkyl.
In terms of the total amount of first acrylic adhesive resin, can institute be included with the amount of 15 weight % to 25 weight %
The repetitive unit represented by chemical formula 1 is stated, the weight represented by chemical formula 2 can be included with the amount of 15 weight % to 25 weight %
Multiple unit can include the repetitive unit represented by chemical formula 3 with the amount of 10 weight % to 20 weight %, and can be with 40 weights
The amount of amount % to 50 weight % includes the repetitive unit represented by chemical formula 4.
In terms of the total amount of second acrylic adhesive resin, can institute be included with the amount of 15 weight % to 25 weight %
The repetitive unit represented by chemical formula 1 is stated, the weight represented by chemical formula 5 can be included with the amount of 5 weight % to 15 weight %
Multiple unit can include the repetitive unit represented by chemical formula 6 with the amount of 15 weight % to 25 weight %, can be with 35 weight %
Amount to 45 weight % includes the repetitive unit represented by chemical formula 7, and can be included with the amount of 5 weight % to 15 weight %
The repetitive unit represented by chemical formula 8.
The weight average molecular weight of first acrylic adhesive resin can be 2,000 grams/mol (g/mol) to 9,
000 gram/mol (g/mol).
The acid value of first acrylic adhesive resin can be 100 milligrams KOH/ grams (mgKOH/g) to 120 milligrams
KOH/ grams (mgKOH/g).
The weight average molecular weight of second acrylic adhesive resin can be 10,000g/mol to 17,000g/
mol。
The acid value of second acrylic adhesive resin can be 80mgKOH/g to 99mgKOH/g.
Comprising the amount of first acrylic adhesive resin be smaller than the second acrylic adhesive tree
Fat.
The photosensitive polymer combination can further include (A3) epoxy adhesive resin.
The photopolymerizable monomer can include the compound represented by chemical formula 9.
[chemical formula 9]
In chemical formula 9,
R10To R15Independently represented by chemical formula 10,
[chemical formula 10]
Wherein, in chemical formula 10,
N is 1 or 2 integer.
N can be 2 integer.
The colorant can include pigment and the dyestuff represented by chemical formula 11.
[chemical formula 11]
In chemical formula 11,
Y1To Y12Cl or Br independently is,
R16To R19The C1 for independently be halogen atom, being substituted or being unsubstituted is to C20 alkyl, the C3 being substituted to C20
Alkoxy, the C6 for being substituted or being unsubstituted to C20 aryl or the C6 for being substituted or being unsubstituted to C20 aryloxy group, and
R16To R19In it is at least one represented by chemical formula 12,
[chemical formula 12]
Wherein, in chemical formula 12,
R20And R21It independently is and is unsubstituted or through the alkyl-substituted C1 of C1 to C5 to C10 alkyl,
O and p independently is the integer in the range of 0 to 5, and 1≤o+p≤5.
The dyestuff represented by chemical formula 11 can be represented by one in chemical formula 11-1 to chemical formula 11-8.
[chemical formula 11-1]
[chemical formula 11-2]
[chemical formula 11-3]
[chemical formula 11-4]
[chemical formula 11-5]
[chemical formula 11-6]
[chemical formula 11-7]
[chemical formula 11-8]
The pigment may include viridine green and yellow uitramarine.
The Photoepolymerizationinitiater initiater can include the compound represented by chemical formula 13.
[chemical formula 13]
In chemical formula 13,
R22And R23It independently is hydrogen atom or the C1 that is substituted or is unsubstituted is to C10 alkyl, and
L1For the C1 that is substituted or is unsubstituted to C10 alkylidenes.
In terms of the total amount of the photosensitive polymer combination, the photosensitive polymer combination can include 1 weight % to 10
(A1) acrylic adhesive resin of weight %；(A2) acrylic adhesive described in 5 weight % to 15 weight %
Resin；(B) photopolymerizable monomer described in 1 weight % to 10 weight %；(C) photopolymerization described in 0.1 weight % to 5 weight %
Initiator；(D) colorant described in 30 weight % to 55 weight %；And surplus is described (E) solvent.
The photosensitive polymer combination can further include following additive：Malonic acid (malonic acid), 3- ammonia
Base -1,2-PD (3-amino-1,2-propanediol), silane system coupling agent (silane-based coupling
Agent), levelling agent (leveling agent), fluorine system surfactant (fluorine-based surfactant), freedom
Base polymerization initiator (radical polymerization initiator) or its combination.
Another embodiment provides a kind of photo-sensitive resin manufactured using the photosensitive polymer combination.
Another embodiment provides a kind of colored filter including photo-sensitive resin.
The other embodiment of the present invention includes in the following detailed description.
Photosensitive polymer combination according to the embodiment can improve heat resistance, brightness, surface folding, development it is water stain, and because
This can be applied to colored filter.
Description of the drawings
Fig. 1 and Fig. 2 is respectively to show to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 1
The photo of pattern.
Fig. 3 and Fig. 4 is respectively to show to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 2
The photo of pattern.
Fig. 5 and Fig. 6 is respectively to show to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 3
The photo of pattern.
Fig. 7 and Fig. 8 is respectively to show to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 4
The photo of pattern.
Fig. 9 and Figure 10 is respectively to show to use the photoresist manufactured according to the photosensitive polymer combination of comparative example 1
The photo of the pattern of layer.
Figure 11 and Figure 12 is respectively to show to use the photoresist manufactured according to the photosensitive polymer combination of comparative example 2
The photo of the pattern of layer.
Figure 13 and Figure 14 is respectively to show to use the photoresist manufactured according to the photosensitive polymer combination of comparative example 3
The photo of the pattern of layer.
Figure 15 is the conical by its shape for showing to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 1
And the photo of angle.
Figure 16 is the conical by its shape for showing to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 2
And the photo of angle.
Figure 17 is the conical by its shape for showing to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 3
And the photo of angle.
Figure 18 is the conical by its shape for showing to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of example 4
And the photo of angle.
Figure 19 is the cone shape for showing to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of comparative example 1
The photo of shape and angle.
Figure 20 is the cone shape for showing to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of comparative example 2
The photo of shape and angle.
Figure 21 is the cone shape for showing to use the photo-sensitive resin manufactured according to the photosensitive polymer combination of comparative example 3
The photo of shape and angle.
Specific embodiment
Hereinafter, the embodiment of the present invention is elaborated.However, these embodiments are exemplary, and the present invention is not only
It is limited to this but is only defined by the scope of claim.
When in addition offer is not specifically defined, " being substituted " as described herein refers to that the functional group's of the present invention is at least one
Hydrogen is replaced through one or more from the following substituent group：Halogen atom (F, Cl, Br or I), hydroxyl, nitro, cyano, amino
(NH2、NH(R200) and N (R201)(R202), wherein R200、R201And R202To be identical or different, and C1 independently is to C10 alkane
Base), amidino groups, diazanyl, hydrazone group, carboxyl, the alkyl for being substituted or being unsubstituted, the alkenyl for being substituted or being unsubstituted, be substituted
Or the alkynyl being unsubstituted, the cycloaliphatic organic radicals for being substituted or being unsubstituted, the aryl and warp that are substituted or are unsubstituted
The heterocycle for substituting or being unsubstituted.
When in addition offer is not specifically defined, " alkyl " as described herein refers to C1 to C20 alkyl and is specifically C1
To C15 alkyl, " cycloalkyl " refers to C3 to C20 cycloalkyl and is specifically C3 to C18 cycloalkyl, and " alkoxy " refers to C1 extremely
C20 alkoxies and be specifically C1 to C18 alkoxies, " aryl " refers to C6 to C20 aryl and is specifically C6 to C18 virtues
Base, " alkenyl " refers to C2 to C20 alkenyls and is specifically C2 to C18 alkenyls, and " alkylidene " refers to C1 to C20 alkylidenes and tool
Be C1 for body to C18 alkylidenes, and " arlydene " refer to C6 to C20 arlydene and specifically C6 to C16 arlydene.
When not in addition provide be specifically defined when, " miscellaneous " as described herein refer in chemical formula comprising it is at least one selected from N,
O, the hetero atom of S and P.
When in addition offer is not specifically defined, " (methyl) acrylate " as described herein refers to " acrylate " and " first
Both base acrylate ", and " (methyl) acrylic acid " refers to " acrylic acid " and " methacrylic acid ".
As used herein, when not in addition provide definition when, when chemical bond be not plotted in chemical formula should give source when,
Hydrogen bond knot is at the position.
When in addition offer is not specifically defined, " * " used herein represents to connect identical or different atom or chemical formula
Point.
A kind of photosensitive polymer combination according to the embodiment includes：(A1) the first acrylic adhesive resin, comprising
The repetitive unit that is represented by chemical formula 1, the repetitive unit represented by chemical formula 2, the repetitive unit represented by chemical formula 3 and by changing
The repetitive unit that formula 4 represents；(A2) the second acrylic adhesive resin, comprising the repetitive unit represented by chemical formula 1, by
Repetitive unit that chemical formula 5 represents, the repetitive unit represented by chemical formula 6, the repetitive unit that is represented by chemical formula 7 and by chemistry
The repetitive unit that formula 8 represents；(B) photopolymerizable monomer；(C) Photoepolymerizationinitiater initiater；(D) colorant；And (E) solvent.
[chemical formula 1]
[chemical formula 2]
[chemical formula 3]
[chemical formula 4]
[chemical formula 5]
[chemical formula 6]
[chemical formula 7]
[chemical formula 8]
In chemical formula 1 into chemical formula 8,
R1For the C1 that is substituted or is unsubstituted to C10 alkyl,
R2To R5And R7To R9It independently is hydrogen atom or the C1 that is substituted or is unsubstituted is to C10 alkyl, and
R6For the C11 that is substituted or is unsubstituted to C20 alkyl.
In general, the color characteristics of colored filter can be improved by improving the pigment in photosensitive polymer combination
(for example, brightness etc.) and pattern properties (for example, pattern fold, water stain etc.).However, when pigment obtains improving, possibly can not
To the pigment application traditional handicraft, and even if being applied, traditional handicraft is to the improvement of color characteristics also very little.
On the contrary, the acrylic adhesive resin in photosensitive polymer combination according to the embodiment is included by chemical formula 1
The repetitive unit represented to chemical formula 8, and it is thus ensured that high-fire resistance, patterned surfaces characteristic, high brightness characteristic and closely connect
Touch and control pattern can developability, and in addition, the acrylic adhesive resin include represented by specified chemical formula
Photopolymerizable monomer, Photoepolymerizationinitiater initiater and dyestuff, and therefore can effectively further improve above-mentioned characteristic.
Hereinafter, it is specifically described each component.
(A) acrylic adhesive resin
Photosensitive polymer combination according to the embodiment includes the first acrylic adhesive resin (A1), the first acrylic acid
It is that adhesive resin (A1) includes the repetitive unit represented by chemical formula 1, the repetitive unit represented by chemical formula 2, by chemical formula 3
The repetitive unit of expression and the repetitive unit represented by chemical formula 4.
For example, in chemical formula 1 into chemical formula 4,
R1To R4C1 can independently be to C5 alkyl, R5Can be hydrogen atom, and R6Can be the C11 for being substituted or being unsubstituted
To C18 alkyl.
In addition, photosensitive polymer combination according to the embodiment include the second acrylic adhesive resin (A2), second
Acrylic adhesive resin (A2) include the repetitive unit represented by chemical formula 1, the repetitive unit represented by chemical formula 5, by
Repetitive unit, the repetitive unit represented by chemical formula 7 and the repetitive unit represented by chemical formula 8 that chemical formula 6 represents.
For example, in chemical formula 5 into chemical formula 8,
R1To R4C1 can independently be to C5 alkyl, and R7To R9Hydrogen atom can independently be.
Since photosensitive polymer combination according to the embodiment includes the first acrylic adhesive resin, the one the third
Olefin(e) acid system adhesive resin can enhance heat resistance and therefore improve brightness, and further, since the photosensitive polymer combination
In also comprising the second acrylic adhesive resin, therefore the formation of surface folding can be controlled, and can further improve
Brightness.
In terms of the total amount of first acrylic adhesive resin, can institute be included with the amount of 15 weight % to 25 weight %
The repetitive unit represented by chemical formula 1 is stated, the weight represented by chemical formula 2 can be included with the amount of 15 weight % to 25 weight %
Multiple unit can include the repetitive unit represented by chemical formula 3 with the amount of 10 weight % to 20 weight %, and can be with 40 weights
The amount of amount % to 50 weight % includes the repetitive unit represented by chemical formula 4.
Specifically, when in terms of the total amount of the first acrylic adhesive resin to be less than 15 weight % or more than 25 weights
When the amount of amount % includes the repetitive unit represented by chemical formula 2, surface characteristic may deteriorate, and there is limit in terms of brightness raising
System.
It, can be with 1 weight % to 10 weight %, such as 1 weight % to 5 weights in terms of the total amount of the photosensitive polymer combination
The amount for measuring % includes the first acrylic adhesive resin.In addition, in terms of the total amount of the photosensitive polymer combination, it can be with 5
The amount of weight % to 15 weight %, such as 5 weight % to 10 weight % include the second acrylic adhesive resin.When being included
The first acrylic adhesive resin and the second acrylic adhesive resin when being in the scope, due to color in manufacture
Crosslinking is improved during colo(u)r filter, brightness, heat resistance and can developability improved and surface smoothness can be improved.
In addition, in terms of the total amount of second acrylic adhesive resin, it can be with 15 weight % to the amount of 25 weight %
Comprising the repetitive unit represented by chemical formula 1, can be included with the amount of 5 weight % to 15 weight % described by 5 table of chemical formula
The repetitive unit shown can include the repetitive unit represented by chemical formula 6 with the amount of 15 weight % to 25 weight %, can be with 35
The amount of weight % to 45 weight % includes the repetitive unit represented by chemical formula 7, and can be with 5 weight % to 15 weight %'s
Amount includes the repetitive unit represented by chemical formula 8.
When the first acrylic adhesive resin and the second acrylic adhesive resin included by chemical formula 1 to change
When the repetitive unit that formula 8 represents is in the scope, it can further improve patterned surfaces characteristic.
The weight average molecular weight of first acrylic adhesive resin can be 2,000g/mol to 9,000g/mol,
And its acid value can be 100mgKOH/g to 120mgKOH/g.In addition, the weight average of second acrylic adhesive resin
Molecular weight can be 10,000g/mol to 17,000g/mol, and its acid value can be 80mgKOH/g to 99mgKOH/g.
When the first acrylic adhesive resin and the weight average molecular weight and acid of the second acrylic adhesive resin
When value is respectively in the scope, can improve during pattern is formed can developability and pattern intimate contact force.
Comprising the amount of first acrylic adhesive resin be smaller than the second acrylic adhesive tree
Fat.When the amount of the first acrylic adhesive resin included (or institute identical with the amount of the second acrylic adhesive resin
Comprising the amount of the first acrylic adhesive resin be more than the second acrylic adhesive resin) when, can developability may be bad
Change.
The photosensitive polymer combination can further include epoxy adhesive resin (A3).
Photosensitive polymer combination according to the embodiment can be improved heat-resisting by further including epoxy adhesive resin
Property.Epoxy adhesive resin can be such as phenol novolac epoxy resins (phenol novolae epoxy resin), tetramethyl
Biphenyl epoxy resin (tetramethyl biphenyl epoxy resin), bisphenol A epoxide resin (bisphenol A
Epoxy resin), bisphenol F epoxy resin (bisphenol F epoxy resin), cycloaliphatic epoxy resin (alicyclic
Epoxy resin) or its combination, but it is not limited only to this.
In addition, epoxy adhesive resin can ensure that the then dispersion stabilization by the dyestuff of elaboration and pigment, and having simultaneously
Help form the pixel with desired resolution ratio during development.
The epoxide equivalent (g/eq) of epoxy adhesive resin can be 150g/eq to 200g/eq.When being wrapped in adhesive resin
When being in the epoxy adhesive resin in the scope containing epoxide equivalent, epoxy adhesive resin can improve the curing degree of pattern simultaneously
Promote adherence of the dyestuff in the structure for forming pattern.
It, can be with 0.1 weight % to 5 weight %, such as 0.1 weight % extremely in terms of the total amount of the photosensitive polymer combination
The amount of 3 weight % includes epoxy adhesive resin.
(B) photopolymerizable monomer
Photopolymerizable monomer can be (methyl) the acrylic acid simple function comprising at least one alkene system unsaturated double-bond or more officials
Energy ester, and can be combined with simple function or multifunctional ester.
Photopolymerizable monomer has alkene system unsaturated double-bond, and therefore, can draw during the exposure in patterning process
It plays enough polymerizations and forms the pattern with excellent heat resistance, light resistance and chemical resistance.
The specific example of photopolymerizable monomer can be ethylene glycol two (methyl) acrylate, diethylene glycol two (methyl) propylene
Acid esters, triethylene glycol two (methyl) acrylate, propylene glycol two (methyl) acrylate, neopentyl glycol two (methyl) acrylic acid
Ester, 1,4-butanediol two (methyl) acrylate, 1,6- hexylene glycols two (methyl) acrylate, bisphenol-A two (methyl) acrylic acid
Ester, pentaerythrite two (methyl) acrylate, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylic acid
Ester, pentaerythrite six (methyl) acrylate, dipentaerythritol two (methyl) acrylate, dipentaerythritol three (methyl) propylene
Acid esters, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate, bisphenol-A epoxy base (methyl)
Acrylate, glycol monoethyl ether (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, tricresyl phosphate (methyl)
Acryloyloxyethyl ester, phenolic and epoxy (methyl) acrylate or its combination.
The commercial examples of photopolymerizable monomer are as follows.Simple function (methyl) acrylate may include Aronix (East Asia Chemical Co., Ltd. (Toagosei Chemistry Industry
Co., Ltd.))；Ka Yala get(Japanese chemical drug Co., Ltd (Nippon Kayaku
Co., Ltd.))；(Osaka organic chemical industry Co., Ltd (Osaka Organic Chemical Ind.,
Ltd.)) etc..The example of two functions (methyl) acrylate may include Aronix
(East Asia Chemical Co., Ltd.), Ka Yala get(Japanese chemical drug is limited
Company),(Osaka organic chemical industry Co., Ltd) etc..Trifunctional (methyl) acrylate
Example may include Aronix
(East Asia Chemical Co., Ltd.), Ka Yala get (Japanese chemical drug Co., Ltd),It is (big
Slope organic chemical industry Co., Ltd) etc..These photopolymerizable monomers can be used alone or the form of mixtures with two or more
It uses.
Photopolymerizable monomer can utilize acid anhydrides processing can developability to improve.
In addition, photopolymerizable monomer can further include the change represented by chemical formula 9 in addition to simple function or multifunctional ester
Close object.
[chemical formula 9]
In chemical formula 9,
R10To R15Independently represented by chemical formula 10,
[chemical formula 10]
Wherein, in chemical formula 10,
N is 1 or 2 integer.
For example, n can be 2 integer.
In general, dipentaerythritol hexaacrylate is mainly included for the photosensitive polymer combination of colored filter
It, can be as photopolymerizable monomer, but when being applied, expose, developing and curing (rear baking) to form photo-sensitive resin
It generates water stain on the pattern of photo-sensitive resin, and not yet proposes clearly to solve the problems, such as water stain solution at present.
It can be gathered as light by the compound that chemical formula 9 represents however, photosensitive polymer combination according to the embodiment is included
Monomer is closed, and therefore can positively be solved the problems, such as water stain.
It, can be with 1 weight % to 10 weight %, such as 5 weight % to 10 in terms of the total amount of the photosensitive polymer combination
The amount of weight % includes photopolymerizable monomer.When the photopolymerizable monomer included is in the scope, photopolymerizable list
Body fully cures during the exposure of patterning process and with excellent reliability, and can improve alkaline-based developer can
Developability.
(C) Photoepolymerizationinitiater initiater
Photoepolymerizationinitiater initiater can be acetophenone based compound (acetophenone-based compound), benzophenone
Based compound (benzophenone-based compound), thioxanthones based compound (thioxanthone-based
Compound), styrax based compound (benzoin-based compound), triazine based compound (triazine-based
Compound), oxime compound (oxime-based compound) etc..
The example of acetophenone based compound can be 2,2 '-diethoxy acetophenone, 2,2 '-dibutoxy acetophenone, 2- hydroxyls
Base -2- methyl phenyl ketones, to tertiary butyl trichloroacetophenone, to tertiary butyl dichloroacetophenone, 4- chloro-acetophenones, 2,2 '-two chloro- 4-
Metaphenoxy acetophenone, 2- methyl-1s-(4- (methyl mercapto) phenyl) -2- morpholines and propyl- 1- ketone, 2- benzyl -2- dimethylaminos -1-
(4- morpholines and phenyl)-butyl- 1- ketone etc..
The example of benzophenone based compound can be benzophenone, benzoyl benzoic acid, benzoyl methyl benzoate
(benzoylbenzoic acidmethyl), 4- phenyl benzophenones, dihydroxy benaophenonel, acrylated benzophenone, 4,
4 '-bis- (dimethylamino) benzophenone, 4,4 '-bis- (diethylamino) benzophenone, 4,4 '-dimethylamino hexichol first
Ketone, 4,4 '-dichloro benzophenone, 3,3 '-dimethyl -2- methoxy benzophenones etc..
The example of thioxanthones based compound can be thioxanthones, 2- methyl thioxanthones, isopropyl thioxanthone, 2,4- diethyl thiophenes
Ton ketone, 2,4- diisopropylthioxanthones, 2-chlorothioxanthone etc..
The example of styrax based compound can be styrax, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, peace
The fragrant isobutyl ether of breath, benzyl dimethyl ketal etc..
The example of triazine based compound can be 2,4,6- trichloto-s-triazines, double (the trichloromethyl)-s- three of 2- phenyl -4,6-
Double (the trichloromethyl)-s- triazines of piperazine, 2- (3 ', 4 '-dimethoxy-styryl) -4,6-, 2- (4 '-methoxyl group naphthalene) -4,6-
Double (the trichloromethyl)-s- triazines of double (trichloromethyl)-s- triazines, 2- (p-methoxyphenyl) -4,6-, 2- (p-methylphenyl) -4,
Double (the trichloromethyl)-s- triazines of 6-, double (the trichloromethyl)-s- triazines of 2- xenyls -4,6-, double (trichloromethyl) -6- styrene
Double (the trichloromethyl)-s- triazines of base-s- triazines, 2- (naphtho- 1- yls) -4,6-, 2- (4- methoxyl group naphtho- 1- yls) -4,6- double (three
Chloromethyl)-s- triazines, double (the trichloromethyl) -6- piperonyl-s- triazines of 2-4-, double (trichloromethyl) -6- (the 4- methoxyl groups of 2-4-
Styryl)-s- triazines etc..
The example of oxime compound can be O- acyl groups oxime compound, 2- (O- benzoyl oximes) -1- [4- (thiophenyl) benzene
Base] -1,2- acetyl caproyls, 1- (O- acetyl group oxime) -1- [9- ethyls -6- (2- methyl benzoyls) -9H- carbazole -3- bases] ethyl ketone,
O- carbethoxyl groups-α-oxygen amino -1- phenyl propyl- 1- ketone etc..The specific example of O- acyl group oxime compounds can be 1,2- acetyl caproyls,
2- dimethylaminos -2- (4- methylbenzyls) -1- (4- morpholines -4- bases-phenyl)-butyl- 1- ketone, 1- (4- Phenylsulfanylphenyls) -
Butyl- 1,2- diketone -2- oxime-O- benzoic ethers, 1- (4- Phenylsulfanylphenyls)-octyl- 1,2- diketone -2- oxime-O- benzoic ethers, 1-
(4- Phenylsulfanylphenyls)-octyl- 1- ketoxime-O- acetic acid esters, 1- (4- Phenylsulfanylphenyls)-butyl- 1- ketoxime-O- acetic acid esters etc..
For example, the Photoepolymerizationinitiater initiater can include the oxime compound represented by chemical formula 13.
[chemical formula 13]
In chemical formula 13,
R22And R23It independently is hydrogen atom or the C1 that is substituted or is unsubstituted is to C10 alkyl, and
L1For the C1 that is substituted or is unsubstituted to C10 alkylidenes.
When the Photoepolymerizationinitiater initiater of photosensitive polymer combination according to the embodiment includes the chemical combination represented by chemical formula 13
During object, intimate contact force can be improved.
In addition to the compound, the Photoepolymerizationinitiater initiater can also include carbazole based compound, diketone based compound, boron
Sour sulfonium based compound, diazonium based compound, imidazole compound, bisglyoxaline based compound, fluorenes based compound etc..
The Photoepolymerizationinitiater initiater can with can be by absorbing light and being excited, and then transmit its energy and cause chemistry
The photosensitizer (photosensitizer) of reaction is used together.
The example of photosensitizer can be tetraethylene glycol pair -3-thiopropionate (tetraethylene glycolbis-3-
Mercaptopropionate), four -3-thiopropionate of pentaerythrite (pentaerythritoltetrakis-3-
Mercaptopropionate), four -3-thiopropionate of dipentaerythritol (dipentaerythritoltetrakis-3-
Mercaptopropionate) etc..
It, can be with 0.1 weight % to 5 weight %, such as 0.1 weight % extremely in terms of the total amount of the photosensitive polymer combination
The amount of 3 weight % includes Photoepolymerizationinitiater initiater.When the Photoepolymerizationinitiater initiater included is in the scope, formed in pattern
Abundant photopolymerization occurs during the exposure of process, and can prevent transmissivity from being deteriorated due to non-reaction initiator.
(D) colorant
Photosensitive polymer combination according to the embodiment include colorant, and the colorant can include pigment, dyestuff or
It is combined.For example, the colorant can include pigment and the dyestuff represented by chemical formula 11.
[chemical formula 11]
In chemical formula 11,
Y1To Y12Cl or Br independently is,
R16To R19The C1 for independently be halogen atom, being substituted or being unsubstituted is to C20 alkyl, the C3 being substituted to C20
Alkoxy, the C6 for being substituted or being unsubstituted to C20 aryl or the C6 for being substituted or being unsubstituted to C20 aryloxy group, and
R16To R19In it is at least one represented by chemical formula 12,
[chemical formula 12]
Wherein, in chemical formula 12,
R20And R21It independently is and is unsubstituted or through the alkyl-substituted C1 of C1 to C5 to C10 alkyl,
O and p independently is the integer in the range of 0 to 5, and 1≤o+p≤5.
The compound represented by chemical formula 11 has improved green spectral characteristic and high brightness.In addition, by chemical formula
11 compounds represented include the aryloxy group represented by chemical formula 12, and the aryloxy group includes alkyl as substituent group, and due to
The alkyl is unsubstituted or only substitutes through alkyl, therefore the compound can have excellent solubility in organic solvent.
More than R20And R21It can independently be and include the substituent group of isopropyl or tertiary butyl (such as tertiary butyl) in end.
Alkyl (by the substituent group for the aryloxy group that chemical formula 12 represents) includes isopropyl or tertiary butyl (such as tertiary butyl), and therefore can increase
Solubility in organic solvent and realize excellent brightness greatly.
O and p independently is 1 integer.What the aryloxy group represented by chemical formula 12 was substituted or was unsubstituted comprising two
Alkyl as alkyl substituent, and therefore can in organic solvent have than comprising an alkyl as substituent group aryloxy group more
Excellent solubility.
For example, chemical formula 12 can be represented by chemical formula 12-1.
[chemical formula 12-1]
In chemical formula 12-1,
R20And R21The C1 for being substituted or being unsubstituted independently is to C10 alkyl as alkyl.
R20It may be present at the ortho position related with the oxygen atom of aryloxy group (ortho position), and R21It may be present in
At the contraposition related with the oxygen atom of aryloxy group (para position).When alkyl substituent is present in and the oxygen of aryloxy group original
It, can be in solubility compared with when alkyl substituent is not present at above-mentioned position when at the related each ortho position of son and contraposition
And excellent effect is obtained in terms of brightness.
For example, R16To R19In at least two (for example, at least three) can be represented by chemical formula 12.For example,
All R16To R19It can be represented by chemical formula 12.
The number of the substituent group represented by chemical formula 12 is bigger, then is being had according to possessed by the compound of one embodiment
Solubility in solvent is more excellent.
The dyestuff represented by chemical formula 11 can be represented by one in chemical formula 11-1 to chemical formula 11-8.
[chemical formula 11-1]
[chemical formula 11-2]
[chemical formula 11-3]
[chemical formula 11-4]
[chemical formula 11-5]
[chemical formula 11-6]
[chemical formula 11-7]
[chemical formula 11-8]
Pigment may include organic pigment, such as red pigment, viridine green, blue pigment, yellow uitramarine etc..Citing comes
It says, pigment can be viridine green, yellow uitramarine or its combination.
The example of red pigment can be colour index (colorindex, C.I.) red pigment 254, C.I. red pigments 255,
C.I. red pigment 264, C.I. red pigments 270, C.I. red pigments 272, C.I. red pigments 177, C.I. red pigments
89 etc..
The example of viridine green can be copper phthalocyanine (the copper phthalocyanine substituted through halogen
), such as C.I. viridine greens 58, C.I. viridine greens 59, C.I. viridine greens 36, C.I. viridine greens 7 etc. pigment.
The example of blue pigment can be ketone phthalocyanine color, such as C.I. blue pigments 15:6th, C.I. blue pigments 15, C.I.
Blue pigment 15:1st, C.I. blue pigments 15:2nd, C.I. blue pigments 15:3rd, C.I. blue pigments 15:4th, C.I. blue pigments
15:5th, C.I. blue pigments 16 etc..
The example of yellow uitramarine can be isoindoline series pigments (isoindoline-based pigment), such as C.I.
Yellow uitramarine 139；Quinophthalone series pigments (quinophthalone-based pigment), such as C.I. yellow uitramarines 138；Nickel
Complex Pigments (nickel complex pigment), such as C.I. yellow uitramarines 150 etc..
The pigment can be used alone or be used with the form of mixtures of two or more, but be not limited only to this.
The photosensitive polymer combination can further include dispersant to improve the dispersiveness of pigment.Specifically, may be used
It adds together with dispersant to prepare photosensitive polymer combination using the surface of dispersant preconditioned pigment or by pigment.
Dispersant can be non-ionic dispersing agent, anionic dispersing agents, cation dispersing agent etc..The specific example of dispersant can
For polyalkylene glycol and its ester, polyoxyalkylene, polyol ester oxirane additive product, alcohol oxirane additive product, sulphonic acid ester,
Sulfonate, carboxylate, carboxylate, alkylamide oxirane additive product, alkylamine etc., and these dispersants can be used alone or
It is used with the form of mixtures of two or more.
The commercial examples of dispersant may include Di Sipabike made of Byk Chemie GmbH (BYK Co., Ltd.s)
(DISPERBYK)-101、DISPERBYK-130、DISPERBYK-140、DISPERBYK-160、DISPERBYK-161、
DISPERBYK-162、DISPERBYK-163、DISPERBYK-164、DISPERBYK-165、DISPERBYK-166、
DISPERBYK-170、DISPERBYK-171、DISPERBYK-182、DISPERBYK-2000、DISPERBYK-2001；Ai Fu
Block Efka (EFKA) -47, EFKA-47EA, EFKA-48, EFKA- made of chemical company (EFKA Chemicals Co.)
49、EFKA-100、EFKA-400、EFKA-450；Suo Sipa (Solsperse) made of prompt profit Kanggong department (Zeneka Co.)
5000、Solsperse 12000、Solsperse 13240、Solsperse 13940、Solsperse 17000、
Solsperse 20000, Solsperse 24000GR, Solsperse 27000, Solsperse 28000 etc.；Or aginomoto
PB711, PB821 etc. made of company (Ajinomoto Inc.).
In terms of the total amount of the photosensitive polymer combination, can dispersant be included with the amount of 0.1 weight % to 15 weight %.
When the dispersant included is in the scope, the composition is during photoresist layer is manufactured due to disperse properties improve
With excellent stability, can developability and pattern Forming ability.
Pigment can be pre-processed using water-soluble inorganic salt and wetting agent.When pigment is after pretreatment, pigment is put down
Equal grain size can become thinner.
Pretreatment can pass through following progress：Using water-soluble inorganic salt and wetting agent kneading pigment, and then filter and wash
Wash the pigment after kneading.
Kneading can perform at a temperature of 40 DEG C to 100 DEG C, and can by after inorganic salts are washed away using water etc. to face
Material is filtered to perform filtering and washing.
The example of water-soluble inorganic salt can be sodium chloride, potassium chloride etc., but be not limited only to this.Wetting agent can make pigment with
Water-soluble inorganic salt is equably mixed and crushed.The example of wetting agent includes alkylene glycol monoalkyl ethers (alkylene
Glycol monoalkyl ether), such as ethylene glycol monoethyl ether, propylene glycol monomethyl ether, diethylene glycol monomethyl ether etc.；Alcohol, example
Such as ethyl alcohol, isopropanol, butanol, hexanol, cyclohexanol, ethylene glycol, diethylene glycol, polyethylene glycol, glycerol polyethylene glycol.These profits
Humectant can be used alone or be used with the form of mixtures of two or more.
Pigment after kneading can have the average grain diameter in the range of 30 nanometers (nm) to 100 nanometers (nm).Work as pigment
Average grain diameter when being in the scope, heat resistance and light resistance are improved, and can be effectively formed fine pattern.
Specifically, pigment can include dispersant and then use the form of the dispersible pigment dispersion of the solvent of elaboration,
And dispersible pigment dispersion can include solid pigment, dispersant and solvent.It, can be with 10 weight % to 15 in terms of the total amount of dispersible pigment dispersion
The amount of weight % includes solid pigment.
It, can be with 30 weight % to 55 weight %, such as 30 weight % extremely in terms of the total amount of the photosensitive polymer combination
The amount of 50 weight % includes colorant.When the colorant included is in the scope, brightness, color reprodubility, pattern
Curability, heat resistance and intimate contact force are improved.
(E) solvent
Solvent is that have compatibility but not with adhesive resin, photopolymerizable monomer, Photoepolymerizationinitiater initiater and colorant
The material reacted with it.
The example of solvent may include alcohol, such as methanol, ethyl alcohol etc.；Ether, such as dichloroether, n-butyl ether, isoamyl ether, first
Base phenylate, tetrahydrofuran etc.；Glycol ethers, such as Ethylene glycol methyl ether, glycol ethyl ether, methyl proxitol etc.；Cellosolve
Acetic acid esters, such as methylcellosolve acetate, ethyl cellosolve acetate, ethylene glycol diethyl ether acetic acid esters etc.；Carbitol, such as
Methylethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethyl
Glycol methyl ethyl ether, diethylene glycol diethyl ether etc.；Propylene glycol alkyl ether acetic acid ester, such as methyl proxitol acetate, third
Glycol propyl ether acetic acid esters etc.；Aromatic hydrocarbon, such as toluene, dimethylbenzene etc.；Ketone, such as methyl ethyl ketone, cyclohexanone, 4- hydroxyls
Base -4-methyl-2 pentanone, methyl-positive acetone, methyl-positive butanone, methyl-positive pentanone, 2-HEPTANONE etc.；Representative examples of saturated aliphatic list carboxylic
Acid alkyl ester, such as ethyl acetate, n-butyl acetate, isobutyl acetate etc.；Lactic acid alkyl ester, such as methyl lactate, lactic acid second
Ester etc.；Hydroxyacetic acid Arrcostab, such as hydroxy methyl acetate, hydroxyl ethyl acetate, Butyl Glycolate etc.；Acetic acid alkoxy alkane
Base ester, for example, acetic acid methoxymethyl ester, acetic acid methoxy ethyl ester, acetic acid methoxy butyl acrylate, acetic acid (ethoxymethyl) base ester,
Acetic acid ethoxyethyl group ester etc.；3- hydroxyalkyl propionates, such as 3- hydroxy methyl propionates, 3- hydroxypropionates etc.；3- alkane
Oxygroup alkyl propionates, such as 3- methoxy methyl propionates, 3- methoxypropionates, 3- ethoxyl ethyl propionates, 3- ethoxies
Base methyl propionate etc.；2 hydroxy propanoic acid Arrcostab, such as 2 hydroxy propanoic acid methyl esters, 2 hydroxy propanoic acid ethyl ester, 2 hydroxy propanoic acid third
Ester etc.；2- alkoxypropan acid alkyl esters, such as 2- methoxy methyl propionates, 2- methoxypropionates, 2- ethoxy-propionic acid second
Ester, 2- ethoxypropanoates etc.；2- hydroxy-2-methyl alkyl propionates, such as 2- hydroxy-2-methyls methyl propionate, 2- hydroxyls
Base -2 Methylpropionic acid ethyl ester etc.；2- alkoxies -2 Methylpropionic acid Arrcostab, such as 2- methoxyl groups -2 Methylpropionic acid methyl esters, 2-
Ethyoxyl -2 Methylpropionic acid ethyl ester etc.；Ester, such as propionic acid -2- hydroxy methacrylates, propionic acid -2- hydroxy-2-methyls ethyl ester, acetic acid hydroxyl
Base ethyl ester, 2- hydroxy-3-methyl methyl butyrates etc.；Or keto ester, such as ethyl pyruvate etc., and be in addition N- methyl formyls
Amine, n,N-Dimethylformamide, N- methyl formyl anilines, N- methylacetamides, n,N-dimethylacetamide, N- crassitudes
Ketone, dimethyl sulfoxide (DMSO), benzyl ether, two hexyl ethers, acetylacetone,2,4-pentanedione, isophorone, caproic acid, octanoic acid, 1- octanols, 1 nonyl alcohol, benzene
Methanol, phenylmethyl acetate, ethyl benzoate, diethy-aceto oxalate, diethyl maleate, gamma-butyrolacton, ethylene carbonate,
Propylene carbonate, ethylene glycol monophenyl ether acetic acid esters etc., and these solvents can be used alone or the mixture with two or more
Form uses.
In view of compatibility and reactivity, it may be advantageous to use glycol ethers, such as ethylene glycol monoethyl ether (ethylene
Glycol monoethyl ether) etc.；Ethylene glycol alkyl ether acetic acid esters (ethylene glycol alkylether
), such as ethyl cellosolve acetate (ethyl cellosolve acetate) etc. acetate；Ester, such as propionic acid 2- hydroxy methacrylates
(2-hydroxyethyl propionate) etc.；Diethylene glycol, such as diethylene glycol monomethyl ether (diethylene glycol
Monomethyl ether) etc.；Propylene glycol alkyl ether acetic acid ester (propylene glycol alkylether acetate),
Such as propylene glycol methyl ether acetate (propylene glycol monomethylether acetate), propylene glycol propyl ether
Acetic acid esters (propylene glycol propylether acetate) etc..
It, can (such as 30 weight % be to 60 weight %, such as 30 with surplus in terms of the total amount of the photosensitive polymer combination
Weight % to 50 weight %) include solvent.When the solvent included is in the scope, the painting of photosensitive polymer combination
Cloth property is improved, and can obtain the film that flatness is improved.
(F) other additives
It is dirty to prevent from generating during coating that the photosensitive polymer combination can further include other following additives
Point or spot, adjustment levelling prevent from pattern being caused to remain when not developing：Such as malonic acid；3- amino -1,2-PD；Silicon
Methane series coupling agent；Levelling agent；Fluorine system surfactant；Radical polymerization initiator；Or its combination.
The example of silane system coupling agent can be trimethoxy silane yl benzoic acid, γ-methacryloxypropyl front three
Oxysilane, vinyltriacetoxy silane, vinyltrimethoxysilane, γ-isocyanate group propyl-triethoxysilicane
Alkane, γ-glycidoxypropyltrimewasxysilane, β-(3,4- epoxycyclohexyl) ethyl trimethoxy silane etc., and this
A little silane systems coupling agent can be used alone or be used with the form of mixtures of two or more.
The example of fluorine system surfactant can be following commercially available fluorine system surfactant：Such asAnd(BM chemical companies (BM Chemie Inc.))；Mei Jiafasi (MEGAFACE) FFFAnd F(big Japanese ink chemical industry Co., Ltd (Dainippon Ink Kagaku Kogyo Co., Ltd.s))；Flora moral
(FULORAD)FULORADFULORADAnd FULORAD(the limited public affairs of Sumitomo 3M
It takes charge of (Sumitomo 3M Co., Ltd.s))；Sha Fulong (SURFLON)SURFLONSURFLON
SURFLONAnd SURFLON(Asahi Glass Glass Co., Ltd. (Asahi Glass Co., Ltd.s))；AndAndDeng (Dong Li silicone Co., Ltd (Toray
Silicone Co., Ltd.s)).
The amount of these additives can be adjusted according to desired property.
Another embodiment provides a kind of photo-sensitive resin manufactured using the photosensitive polymer combination.
Another embodiment provides a kind of colored filter for including the photo-sensitive resin.
The method for manufacturing colored filter is as follows.
More than photosensitive polymer combination is coated on glass substrate with proper method (such as spin coating, roller coat, spraying etc.)
On to form 0.5 μm of resin composition layer to 10 μ m-thicks.
Then, by light irradiation there is the substrate of resin composition layer to form the required pattern of colored filter.Irradiation
Ultraviolet light, electron beam or X-ray can be used as light source to perform, and can be for example in 190nm to 450nm and specifically
Ultraviolet light is irradiated in the area of 200nm to 400nm.Irradiation can be performed by further using photoresist mask.With this
After mode performs irradiation process, the resin composition layer for being exposed to light source is handled using developer solution.Herein, resin
Dissolve and formed the pattern for colored filter in unexposed area in composition layer.Can according to the number of required color by this
Process repeatedly, so as to obtain the colored filter with expected pattern.In addition, when by reheating or irradiating thereto
Actinic ray come cure in the above process by develop obtain picture pattern when, crack resistance, solvent resistance etc. can be improved.
Hereinafter, the present invention is described in more detail in reference example.However, these examples should not be interpreted in any sense
It limits the scope of the invention.
(preparation of acrylic adhesive resin)
Synthesis example 1 is to synthesis example 4
It is put into 2g AIBN as initiator in 100ml beakers, is sequentially added thereto with weight % ratios shown in table 1
For polymerization monomer until summation is 40g, and the mixture stirred 30 minutes.Then, by 70g propylene glycol list first
Ether acetic acid ester is put into the 250ml glass reactors equipped with cooler to perform polymerisation, and is then heated to 85 DEG C, and
And last 3 it is small when prepared monomer solution has been added dropwise thereto.When by reaction, further execution 6 is small at the same temperature and connect
It and reduces the temperature to after room temperature, complete reaction, and herein, the reaction is to perform in a nitrogen atmosphere.
(table 1)
(unit：Weight %)
| Polymerisable monomer | Synthesis example 1 | Synthesis example 2 | Synthesis example 3 | Synthesis example 4 |
| Methacrylic acid | 20 | 20 | 20 | 20 |
| Isobornyl acrylate | 20 | - | 10 | 30 |
| N- phenylmaleimides | 15 | - | 25 | 5 |
| Lauryl acrylate | 45 | - | 45 | 45 |
| Methyl methacrylate | - | 10 | - | - |
| Cyclohexyl methacrylate | - | 20 | - | - |
| Cyclohexylmaleimide | - | 40 | - | - |
| Methacrylic acid tricyclodecyl ester | - | 10 | - | - |
| Weight average molecular weight (Mw, g/mol) | 8,500 | 11,000 | 8,900 | 7,600 |
| Acid value (mgKOH/g) | 110 | 90 | 120 | 101 |
(preparation of photosensitive polymer combination)
Example 1 is to example 7 and comparative example 1 to comparative example 3
Using following components respectively by the photoresist group according to example 1 to example 7 and comparative example 1 to comparative example 3
Object is closed to be prepared into each composition shown in table 2.
Specifically, after accurately the content of Photoepolymerizationinitiater initiater is measured, solvent is with the addition of thereto, and to described
Mixture is sufficiently stirred, and (is greater than or equal to 30 minutes) wherein until Photoepolymerizationinitiater initiater is completely dissolved.Then, to
It is wherein sequentially with the addition of acrylic adhesive resin, epoxy adhesive resin and photopolymerizable monomer, and will be obtained again
Mixture has stirred one hour.Then, colorant and other additives are sequentially with the addition of thereto, and it is finally mixed by what is obtained
When conjunction object has stirred small more than or equal to 2, to prepare photosensitive polymer combination respectively.
Each component used in photosensitive polymer combination is as follows.
(A) adhesive resin
(A-1) acrylic adhesive resin of synthesis example 1
(A-2) acrylic adhesive resin of synthesis example 2
(A-3) epoxy adhesive resin (epoxide equivalent：177g/eq) (EHPE-3150, Daicel chemical company (DAICEL
CHEMICAL))
(A-4) acrylic adhesive resin of synthesis example 3
(A-5) acrylic adhesive resin of synthesis example 4
(A-6) acrylic adhesive resin (Si Kai (SKY) -095, Samsung SDI Co., Ltd (Samsung SDI
Co., Ltd.))
(A-7) acrylic adhesive resin (SKY-141, Samsung SDI Co., Ltd)
(A-8) acrylic adhesive resin (BX-04, Japanese catalyst Co., Ltd (Nippon Shokubai Co.,
Ltd.))
(B) photopolymerizable monomer
(B-1) KAYARAD DPCA-120 (Japanese chemical drug Co., Ltd)
(B-2) DPHA (Japanese chemical drug Co., Ltd)
(B-3) it is micro- to regard (Viscoat) 1000 (Osaka organic chemical industry company (OSAKA YUKI))
(C) Photoepolymerizationinitiater initiater
(C-1) oxime series initiators (NCI-930, Chinese mugwort Dicon A/S (ADEKA Corp.))
(C-2) oxime series initiators (OXE-02, BASF AG (BASF Corp.))
(D) colorant
(D-1) green colouring material represented by chemical formula 11-1
[chemical formula 11-1]
(D-2) viridine green dispersion liquid (G58, Yi Enfu company (ENF))
(D-3) viridine green dispersion liquid (G59, Yi Enfu company)
(D-4) secondary yellow dispersible pigment dispersion (SC-P541-2236 yellow-M, Co., Ltd of Japan (TOYO Ink
LLC.))
(E) solvent
Propylene glycol methyl ether acetate (propylene glycol monomethylether acetate, PGMEA)
(F) other additives
Fluorine system interfacial agent (F-554 (10% through dilute solution), DIC Co., Ltd)
(table 2)
(unit：Weight %)
Assessment 1：Color characteristics
Using coating machine (Ao Bikate (Opticoat) MS-A150, three large bamboo hat with a conical crown and broad brim Co., Ltds (Mikasa Co., Ltd.s)) with
The revolutions per minute (rpm) of predetermined thickness can be obtained respectively to according to example 1 to example 7 and comparative example 1 to comparative example 3
Photosensitive polymer combination is coated with, and prebake conditions have then been carried out on 90 DEG C of hot plate.Then, exposure machine is utilized
(HB-50110AA, You Zhiwang company (Ushio Inc.)) is in 50 millijoules/square centimeter (mj/cm2) under conditions of respectively will
The whole surface of composition through prebake conditions is exposed, and has then toasted 20 minutes in 230 DEG C of baking oven with respectively
Manufacture sample.Using 3000 equipment of MCPD to the color characteristics of sample before toasting in an oven and afterwards (color coordinate (Gx,
Gy), brightness (Y), contrast (contrast ratio, CR)) it is measured, and the results are shown in table 3.
(table 3)
| Gx | Gy | Brightness (Y) | Contrast (CR) | |
| Example 1 | 0.2840 | 0.649 | 55.70 | 12415 |
| Example 2 | 0.2840 | 0.649 | 55.73 | 12225 |
| Example 3 | 0.2841 | 0.649 | 55.72 | 12315 |
| Example 4 | 0.2841 | 0.649 | 55.78 | 12921 |
| Example 5 | 0.2840 | 0.649 | 55.55 | 12185 |
| Example 6 | 0.2841 | 0.649 | 55.60 | 12235 |
| Example 7 | 0.2841 | 0.649 | 55.61 | 12312 |
| Comparative example 1 | 0.2841 | 0.649 | 55.33 | 12133 |
| Comparative example 2 | 0.2841 | 0.649 | 55.42 | 12284 |
| Comparative example 3 | 0.2838 | 0.649 | 55.42 | 12484 |
Assessment 2：Pattern fold, water stain, intimate contact force and taper
Using coating machine (Opticoat MS-A150, three large bamboo hat with a conical crown and broad brim Co., Ltds) so as to obtaining per minute turn of predetermined thickness
Number (rpm) according to photosensitive polymer combination of the example 1 to example 7 and comparative example 1 to comparative example 3 respectively to being applied
Cloth, and then spontaneously dried 30 minutes under room temperature (15 DEG C to 25 DEG C).Then, exposure machine (HB-50110AA, excellent will are utilized
Prosperous company) in 50mj/cm2Under conditions of, dried photosensitive polymer combination is carried out respectively with pattern mask patterned
Exposure, under the pressure of 1.5kgf as developer solution through 20 times of diluted Na2CO3In developed, and 1.0kgf's
It is washed under pressure, the fold, water stain, intimate contact force and taper of pattern is examined followed by light microscope
It surveys, and the results are shown in table 4 and Fig. 1 into Figure 21.
Pattern fold assesses benchmark
○：Pattern-free fold
x：Pattern fold
The water stain assessment benchmark of pattern
○：Pattern-free is water stain
△：Some patterns are water stain
x：Many patterns are water stain
(table 4)
| Pattern fold | Pattern is water stain | Intimate contact force (μm) | Cone angle (°) | |
| Example 1 | ○ | △ | 14 | 54.14 |
| Example 2 | ○ | ○ | 14 | 50.25 |
| Example 3 | ○ | △ | 12 | 61.53 |
| Example 4 | ○ | ○ | 12 | 48.10 |
| Example 5 | △ | △ | 15 | 55.44 |
| Example 6 | △ | △ | 15 | 54.35 |
| Example 7 | ○ | △ | 16 | 58.12 |
| Comparative example 1 | x | x | 18 | - |
| Comparative example 2 | x | x | 18 | - |
| Comparative example 3 | x | x | 18 | - |
Reference table 3 and table 4 and Fig. 1 to Figure 21, with the photosensitive polymer combination phase according to comparative example 1 to comparative example 3
Than, according to the photosensitive polymer combination of example 1 to example 7 show it is excellent can developability, intimate contact force, pattern it is special
Property, conical properties etc. and excellent color characteristics (such as brightness etc.).Specifically, when with the first acrylic adhesive tree
When the total amount meter of fat includes the repetitive unit represented by chemical formula 2 with the amount of 15 weight % to 25 weight %, brightness and closely connect
Touch is more excellent, and pattern fold further improves.
Although having combined the exemplary embodiment for being presently believed to be practical to be set forth the present invention, should manage
Solution, the present invention is not limited only to the disclosed embodiments, but on the contrary, it is contemplated that covers included in appended claims
Various modifications form and equivalent in spirit and scope.Therefore, above-described embodiment be interpreted as it is exemplary rather than with appoint
Where formula limitation is of the invention.
Claims (19)
1. a kind of photosensitive polymer combination, which is characterized in that include
First acrylic adhesive resin, the repetition list represented comprising the repetitive unit represented by chemical formula 1, by chemical formula 2
Member, the repetitive unit represented by chemical formula 3 and the repetitive unit represented by chemical formula 4；
Second acrylic adhesive resin, the repetition list represented comprising the repetitive unit represented by chemical formula 1, by chemical formula 5
Member, the repetitive unit represented by chemical formula 6, the repetitive unit represented by chemical formula 7 and the repetitive unit represented by chemical formula 8；
Photopolymerizable monomer；
Photoepolymerizationinitiater initiater；
Colorant；And
Solvent,
[chemical formula 1]
[chemical formula 2]
[chemical formula 3]
[chemical formula 4]
[chemical formula 5]
[chemical formula 6]
[chemical formula 7]
[chemical formula 8]
Wherein, in chemical formula 1 into chemical formula 8,
R1For the C1 that is substituted or is unsubstituted to C10 alkyl,
R2To R5And R7Hydrogen atom independently is to R9 or the C1 that is substituted or is unsubstituted is to C10 alkyl, and R6For through taking
Generation or the C11 that is unsubstituted are to C20 alkyl.
2. photosensitive polymer combination according to claim 1, it is characterised in that
In terms of the total amount of first acrylic adhesive resin,
The repetitive unit represented by chemical formula 1 is included with the amount of 15 weight % to 25 weight %,
The repetitive unit represented by chemical formula 2 is included with the amount of 15 weight % to 25 weight %,
The repetitive unit represented by chemical formula 3 is included with the amount of 10 weight % to 20 weight %, and
The repetitive unit represented by chemical formula 4 is included with the amount of 40 weight % to 50 weight %.
3. photosensitive polymer combination according to claim 1, it is characterised in that
In terms of the total amount of second acrylic adhesive resin,
The repetitive unit represented by chemical formula 1 is included with the amount of 15 weight % to 25 weight %,
The repetitive unit represented by chemical formula 5 is included with the amount of 5 weight % to 15 weight %,
The repetitive unit represented by chemical formula 6 is included with the amount of 15 weight % to 25 weight %,
The repetitive unit represented by chemical formula 7 is included with the amount of 35 weight % to 45 weight %, and
The repetitive unit represented by chemical formula 8 is included with the amount of 5 weight % to 15 weight %.
4. photosensitive polymer combination according to claim 1, which is characterized in that the first acrylic adhesive tree
The weight average molecular weight of fat is 2,000g/mol to 9,000g/mol.
5. photosensitive polymer combination according to claim 1, which is characterized in that the first acrylic adhesive tree
The acid value of fat is 100mgKOH/g to 120mgKOH/g.
6. photosensitive polymer combination according to claim 1, which is characterized in that the second acrylic adhesive tree
The weight average molecular weight of fat is 10,000g/mol to 17,000g/mol.
7. photosensitive polymer combination according to claim 1, which is characterized in that the second acrylic adhesive tree
The acid value of fat is 80mgKOH/g to 99mgKOH/g.
8. photosensitive polymer combination according to claim 1, which is characterized in that first acrylic acid series included
The amount of adhesive resin is less than second acrylic adhesive resin.
9. photosensitive polymer combination according to claim 1, which is characterized in that the photosensitive polymer combination is into one
Step includes epoxy adhesive resin.
10. photosensitive polymer combination according to claim 1, which is characterized in that the photopolymerizable monomer include by
The compound that chemical formula 9 represents：
[chemical formula 9]
Wherein, in chemical formula 9,
R10To R15Independently represented by chemical formula 10,
[chemical formula 10]
Wherein, in chemical formula 10,
N is 1 or 2 integer.
11. photosensitive polymer combination according to claim 10, which is characterized in that the n is 2 integer.
12. photosensitive polymer combination according to claim 1, which is characterized in that the colorant include pigment and by
The dyestuff that chemical formula 11 represents：
[chemical formula 11]
Wherein, in chemical formula 11,
Y1To Y12C1 or Br independently is,
R16To R19The C1 for independently be halogen atom, being substituted or being unsubstituted is to C20 alkyl, the C3 being substituted to C20 alcoxyls
Base, the C6 for being substituted or being unsubstituted to C20 aryl or the C6 for being substituted or being unsubstituted to C20 aryloxy group, and
R16To R19In it is at least one represented by chemical formula 12,
[chemical formula 12]
Wherein, in chemical formula 12,
R20And R21It independently is without generation or through the alkyl-substituted C1 of C1 to C5 to C10 alkyl,
O and p independently is the integer in the range of 0 to 5, and 1≤o+p≤5.
13. photosensitive polymer combination according to claim 12, which is characterized in that the dye represented by chemical formula 11
Material is by an expression in chemical formula 11-1 to chemical formula 11-8：
[chemical formula 11-1]
[chemical formula 11-2]
[chemical formula 11-3]
[chemical formula 11-4]
[chemical formula 11-5]
[chemical formula 11-6]
[chemical formula 11-7]
[chemical formula 11-8]
14. photosensitive polymer combination according to claim 12, which is characterized in that the pigment include viridine green and
Yellow uitramarine.
15. photosensitive polymer combination according to claim 1, which is characterized in that the Photoepolymerizationinitiater initiater include by
The compound that chemical formula 13 represents：
[chemical formula 13]
Wherein, in chemical formula 13,
R22And R23It independently is hydrogen atom or the C1 that is substituted or is unsubstituted is to C10 alkyl, and
L1For the C1 that is substituted or is unsubstituted to C10 alkylidenes.
16. photosensitive polymer combination according to claim 1, which is characterized in that with the photosensitive polymer combination
Total amount meter, the photosensitive polymer combination includes：
The acrylic adhesive resin of 1 weight % to 10 weight %；
The acrylic adhesive resin of 5 weight % to 15 weight %；
The photopolymerizable monomer of 1 weight % to 10 weight %；
The Photoepolymerizationinitiater initiater of 0.1 weight % to 5 weight %；
The colorant of 30 weight % to 55 weight %；And
Surplus is the solvent.
17. photosensitive polymer combination according to claim 1, which is characterized in that the photosensitive polymer combination into
One step includes following additive：Malonic acid, 3- amino -1,2-PD, silane system coupling agent, levelling agent, fluorine system surface-active
Agent, radical polymerization initiator or its combination.
18. a kind of photo-sensitive resin, which is characterized in that use is according to any one of claim 1 to claim 17
Photosensitive polymer combination manufacture.
19. a kind of colored filter, which is characterized in that including photo-sensitive resin according to claim 18.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020160158441A KR102067083B1 (en) | 2016-11-25 | 2016-11-25 | Photosensitive resin composition and photosensitive resin layer using the same and color filter |
| KR10-2016-0158441 | 2016-11-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108107674A true CN108107674A (en) | 2018-06-01 |
| CN108107674B CN108107674B (en) | 2021-03-09 |
Family
ID=62206308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711060733.4A Active CN108107674B (en) | 2016-11-25 | 2017-11-01 | Photosensitive resin composition, and photosensitive resin layer and color filter using same |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR102067083B1 (en) |
| CN (1) | CN108107674B (en) |
| TW (1) | TWI655260B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111308859A (en) * | 2018-12-12 | 2020-06-19 | 三星Sdi株式会社 | Photosensitive resin composition, photosensitive resin layer using same, and color filter |
| CN115637060A (en) * | 2021-07-19 | 2023-01-24 | 三星Sdi株式会社 | Pigment dispersion, photosensitive resin composition comprising same, photosensitive resin layer, color filter, and display device |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102586093B1 (en) * | 2020-04-16 | 2023-10-05 | 삼성에스디아이 주식회사 | Photosensitive resin composition, photosensitive resin layer using the same and color filter |
| KR102618632B1 (en) * | 2020-08-26 | 2023-12-27 | 삼성에스디아이 주식회사 | Photosensitive resin composition and photosensitive resin layer using the same and color filter |
| KR102595852B1 (en) * | 2020-10-21 | 2023-10-27 | 삼성에스디아이 주식회사 | Photosensitive resin composition, photosensitive resin layer using the same and color filter and cmos image sensor |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103717625A (en) * | 2011-08-04 | 2014-04-09 | 株式会社Lg化学 | Fluororesin and photosensitive resin composition including same |
| KR20150001166A (en) * | 2013-06-26 | 2015-01-06 | 제일모직주식회사 | Photosensitive resin composition and color filter using the same |
| KR20160078126A (en) * | 2014-12-24 | 2016-07-04 | 삼성에스디아이 주식회사 | Photosensitive resin composition and color filter using the same |
| WO2016175390A1 (en) * | 2015-04-30 | 2016-11-03 | 삼성에스디아이 주식회사 | Novel compound, photosensitive resin composition containing same and color filter |
| US9494859B1 (en) * | 2015-08-27 | 2016-11-15 | Samsung Sdi Co., Ltd. | Photosensitive resin composition and color filter using the same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6098113B2 (en) * | 2011-11-09 | 2017-03-22 | 住友化学株式会社 | Colored photosensitive resin composition |
| KR101674990B1 (en) | 2012-12-07 | 2016-11-10 | 제일모직 주식회사 | Photosensitive resin composition for color filter, and color filter using the same |
| KR101661672B1 (en) * | 2014-02-11 | 2016-09-30 | 제일모직 주식회사 | Photosensitive resin composition and color filter using the same |
| KR101788092B1 (en) * | 2014-03-26 | 2017-10-19 | 제일모직 주식회사 | Photosensitive resin composition, black matrix and color filter using the same |
| KR101819656B1 (en) * | 2014-05-13 | 2018-01-17 | 제일모직 주식회사 | Photosensitive resin composition and color filter using the same |
-
2016
- 2016-11-25 KR KR1020160158441A patent/KR102067083B1/en active IP Right Grant
-
2017
- 2017-10-18 TW TW106135571A patent/TWI655260B/en active
- 2017-11-01 CN CN201711060733.4A patent/CN108107674B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103717625A (en) * | 2011-08-04 | 2014-04-09 | 株式会社Lg化学 | Fluororesin and photosensitive resin composition including same |
| KR20150001166A (en) * | 2013-06-26 | 2015-01-06 | 제일모직주식회사 | Photosensitive resin composition and color filter using the same |
| KR20160078126A (en) * | 2014-12-24 | 2016-07-04 | 삼성에스디아이 주식회사 | Photosensitive resin composition and color filter using the same |
| WO2016175390A1 (en) * | 2015-04-30 | 2016-11-03 | 삼성에스디아이 주식회사 | Novel compound, photosensitive resin composition containing same and color filter |
| US9494859B1 (en) * | 2015-08-27 | 2016-11-15 | Samsung Sdi Co., Ltd. | Photosensitive resin composition and color filter using the same |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111308859A (en) * | 2018-12-12 | 2020-06-19 | 三星Sdi株式会社 | Photosensitive resin composition, photosensitive resin layer using same, and color filter |
| CN111308859B (en) * | 2018-12-12 | 2023-08-01 | 三星Sdi株式会社 | Photosensitive resin composition, photosensitive resin layer using same, and color filter |
| CN115637060A (en) * | 2021-07-19 | 2023-01-24 | 三星Sdi株式会社 | Pigment dispersion, photosensitive resin composition comprising same, photosensitive resin layer, color filter, and display device |
| CN115637060B (en) * | 2021-07-19 | 2024-10-01 | 三星Sdi株式会社 | Pigment dispersion, photosensitive resin composition comprising same, photosensitive resin layer, color filter, and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102067083B1 (en) | 2020-01-16 |
| CN108107674B (en) | 2021-03-09 |
| TWI655260B (en) | 2019-04-01 |
| KR20180059183A (en) | 2018-06-04 |
| TW201819580A (en) | 2018-06-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106019826B (en) | Photosensitive resin composition, black column spacer using same, and color filter | |
| CN108107674A (en) | Photosensitive polymer combination and use its photo-sensitive resin and colored filter | |
| CN102540717B (en) | Photosensitive resin composition and light blocking layer using same | |
| CN102566265A (en) | Photosensitive resin composition and color filter using the same | |
| CN102445841A (en) | Photosensitive resin composition and light blocking layer using the same | |
| TWI541240B (en) | Compound and photosensitive resin composition comprising the same and color filter prepared using the same | |
| CN105467754A (en) | Photosensitive Resin Composition and Color Filter Using the Same | |
| CN106483767B (en) | Photosensitive polymer combination and the colored filter for using it | |
| CN103869621A (en) | Photosensitive Resin Composition for Color Filter, and Color Filter Using Same | |
| CN103885291A (en) | Photosensitive resin composition and light blocking layer using the same | |
| CN104865795B (en) | Photosensitive resin composition, light blocking layer and colour filter using it | |
| KR20140008033A (en) | Colored photosensitive resin composition and color filter using the same | |
| TWI472878B (en) | Photosensitive resin composition for color filter and color filter using the same | |
| CN108445712A (en) | Photosensitive polymer combination defines layer and display device using its black picture element | |
| CN108003593A (en) | Photosensitive polymer combination, black-colored photosensitive resin bed and colored filter | |
| KR20140089001A (en) | Colored photosensitive resin composition for green pixel | |
| KR20150012521A (en) | Colored photosensitive resin composition, color filter and liquid crystal display having the same | |
| KR20150028463A (en) | A black photosensitive resin composition, color filter and display device comprising the same | |
| CN103913952B (en) | For filter Photosensitve resin composition and utilize its filter | |
| KR20180023249A (en) | Colored photosensitive resin composition, color filter and image display device produced using the same | |
| KR100930671B1 (en) | Photosensitive resin composition for color filters and color filter using same | |
| KR20150109099A (en) | A colored photosensitive resin composition for color filter, color filter and liquid crystal display device having the same | |
| KR20190086877A (en) | Colored photosensitive resin composition, color filter and image display device using the same | |
| KR20150109106A (en) | A colored photosensitive resin composition for color filter, color filter and liquid crystal display device having the same | |
| CN108475018A (en) | Photosensitve resin composition and use its black column spacer and colored filter |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |