WO2016165377A1 - 一种再加工振膜的方法、振膜以及受话器 - Google Patents

一种再加工振膜的方法、振膜以及受话器 Download PDF

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Publication number
WO2016165377A1
WO2016165377A1 PCT/CN2015/097962 CN2015097962W WO2016165377A1 WO 2016165377 A1 WO2016165377 A1 WO 2016165377A1 CN 2015097962 W CN2015097962 W CN 2015097962W WO 2016165377 A1 WO2016165377 A1 WO 2016165377A1
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Prior art keywords
sputtering
ball
diaphragm
area
magnetron sputtering
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Ceased
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PCT/CN2015/097962
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English (en)
French (fr)
Inventor
郭晓冬
祖峰磊
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Goertek Inc
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Goertek Inc
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Priority to US15/507,605 priority Critical patent/US10299043B2/en
Publication of WO2016165377A1 publication Critical patent/WO2016165377A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R7/00—Diaphragms for electromechanical transducers; Cones
    • H04R7/02—Diaphragms for electromechanical transducers; Cones characterised by the construction
    • H04R7/04—Plane diaphragms
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R1/00—Details of transducers, loudspeakers or microphones
    • H04R1/10—Earpieces; Attachments therefor ; Earphones; Monophonic headphones
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R31/00—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor
    • H04R31/003—Apparatus or processes specially adapted for the manufacture of transducers or diaphragms therefor for diaphragms or their outer suspension
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R7/00—Diaphragms for electromechanical transducers; Cones
    • H04R7/16—Mounting or tensioning of diaphragms or cones
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R7/00—Diaphragms for electromechanical transducers; Cones
    • H04R7/16—Mounting or tensioning of diaphragms or cones
    • H04R7/18—Mounting or tensioning of diaphragms or cones at the periphery
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; ELECTRIC HEARING AIDS; PUBLIC ADDRESS SYSTEMS
    • H04R7/00—Diaphragms for electromechanical transducers; Cones
    • H04R7/16—Mounting or tensioning of diaphragms or cones
    • H04R7/24—Tensioning by means acting directly on free portions of diaphragm or cone

Definitions

  • the invention relates to the technical field of electroacoustic products, in particular to a method for reworking a diaphragm, a diaphragm and a receiver.
  • the diaphragm must be designed to be softer to meet the requirements of low frequency sound quality.
  • the softer diaphragm will cause the polarization of the vibration system to increase, making distortion and clutter more difficult to control.
  • the conventional design of the diaphragm cannot meet the requirements of low-frequency sound quality and suppression of system polarization at the same time as the size of the receiver is decreasing.
  • the present invention has been made in order to provide a method, a diaphragm and a receiver for reworking a diaphragm that overcomes the above problems or at least partially solves the above problems, and the technical solution of the present invention is achieved as follows:
  • an embodiment of the present invention provides a method of reworking a diaphragm, the diaphragm including a central portion, a folded portion disposed at an edge of the flat portion, and a peripheral portion of the folded portion. And bonding the fixed portion of the outer casing; the method comprises: performing surface sputtering on a portion of the folded portion by magnetron sputtering.
  • the surface sputtering of the partial region of the folded ring portion by using a magnetron sputtering technique comprises:
  • a first sputter shutter is assembled and positioned on the diaphragm, the first sputter shutter is configured to block a planar portion of the diaphragm and a partial loop portion that blocks the planar portion;
  • the opaque film was placed in a magnetron sputtering apparatus for surface sputtering treatment.
  • the ball top is pasted on the flat portion of the diaphragm, the method further comprising:
  • a partial sputtering of a portion of the top of the ball is performed by magnetron sputtering.
  • the surface sputtering of a portion of the top of the ball by magnetron sputtering comprises:
  • the occluded top of the ball was placed in a magnetron sputtering apparatus for surface sputtering.
  • designing the sputtering area of the top of the ball according to the requirement of acoustic performance includes:
  • the sputtering area is a circular area located at the center of the top of the ball;
  • the sputtering area is a circular area at four corner positions of the top of the ball;
  • the sputtering zone is a cruciform zone located at the center of the top of the ball.
  • the sputter material used in the magnetron sputtering technique comprises iron powder or a liquid glue mixed with iron powder.
  • the technical solution can strengthen the rigidity of the folding ring portion by surface sputtering on a partial region of the diaphragm folding ring portion, thereby strengthening the supporting force of the folding ring portion, thereby suppressing the polarization of the system while not affecting the low-frequency sound quality of the system. purpose.
  • the strength of the local area of the top of the ball is increased without increasing the weight of the vibrating system as much as possible.
  • an embodiment of the present invention provides a diaphragm including a central portion, a folded portion disposed at an edge of the flat portion, and a fixed portion connected to the periphery of the folded portion for bonding the outer casing.
  • a partial region of the folded portion is subjected to surface sputtering by a magnetron sputtering technique.
  • the diaphragm further comprises a ball top adhered to the flat portion, and a partial region of the top of the ball is subjected to surface sputtering by a magnetron sputtering technique.
  • a sputtering region of the top of the ball is designed according to the requirement of acoustic performance, and the sputtering region is a circular region located at the center of the top of the ball;
  • the technical solution performs surface sputtering on a partial region of the diaphragm ring portion, which can strengthen the rigidity of the folding ring portion, thereby strengthening the supporting force of the folding ring portion, thereby achieving the purpose of suppressing system polarization without affecting the low-frequency sound quality of the system. .
  • surface sputtering of a portion of the top of the diaphragm ball increases the strength of the local portion of the top of the ball without increasing the weight of the vibrating system.
  • an embodiment of the present invention provides a receiver including an upper casing and a lower casing, wherein a cavity surrounded by the upper casing and the lower casing houses a vibration system; the diaphragm of the vibration system includes the above technical solution.
  • the folding ring portion and the top of the ball provided by the above technical solution.
  • the receiver of the technical solution performs surface sputtering on the diaphragm ring portion in the vibration system, which can strengthen the supporting force of the folding ring portion, suppress the polarization of the system while not affecting the low-frequency sound quality of the system, and perform the top of the diaphragm ball
  • Surface sputtering increases the intensity of the local area of the top of the ball without increasing the weight of the vibration system to improve the high frequency response characteristics of the receiver and reduce harmonic distortion.
  • FIG. 1 is a schematic view showing the appearance of a surface-sputtered diaphragm according to an embodiment of the present invention
  • FIG. 2 is a schematic view showing a process of performing surface sputtering treatment on a partial region of a folded ring portion according to an embodiment of the present invention
  • FIG. 3 is a schematic view showing a process of performing surface sputtering treatment on a partial region of a top portion of a ball according to an embodiment of the present invention
  • Figure 4-a is a schematic view of a circular sputtering region at the center of the top of the ball according to an embodiment of the present invention
  • FIG. 4 is a schematic diagram of a circular sputtering region at a top corner of a ball according to an embodiment of the present invention
  • Figure 4-c is a schematic view of a cross-shaped sputtering region at the center of the top of the ball according to an embodiment of the present invention.
  • FIG. 5 is a schematic structural diagram of a structure of a receiver according to an embodiment of the present invention.
  • Figure 6 is a cross-sectional side view of a receiver according to an embodiment of the present invention.
  • the conventional design of the diaphragm can not meet the requirements of low-frequency sound quality and the requirement of suppressing the polarization of the system.
  • the invention adopts the increase of the diaphragm ring area without affecting the low-frequency performance of the product.
  • the local rigidity is used to suppress the polarization of the diaphragm, and the optimized design can achieve the purpose of suppressing the polarization of the system without affecting the low-frequency sound quality.
  • the technical solution reworks a part of the diaphragm ring by using a magnetron sputtering process to achieve the purpose of accurately strengthening the local rigidity of the diaphragm, thereby realizing the polarization capability of the diaphragm suppression system.
  • the magnetron sputtering method is a process of controlling metal powder and liquid sputtering to the surface of a workpiece to be processed by a magnetic field, and has the characteristics of high precision and easy control.
  • the diaphragm includes a flat portion 1 at a center, a folded portion 2 disposed at an edge of the flat portion 1, and a periphery of the folded portion 2.
  • a fixing portion 3 for bonding the outer casing is connected.
  • Embodiments of the present invention provide a method of reworking a diaphragm, the method comprising: performing surface sputtering on a partial region of the folded portion by a magnetron sputtering technique.
  • the sputtering tool needs to be processed in advance for sputtering.
  • the sputtering tool for the sputtering diaphragm ring portion is named as the first sputtering tool
  • the sputtering tool for sputtering the top of the ball is named as the first.
  • Two sputtering tooling Two sputtering tooling. The first and second uses are for distinction only and do not represent any order.
  • FIG. 2 is a schematic diagram of a process of surface sputtering treatment on a partial region of a folded ring portion according to an embodiment of the present invention, and a specific process for surface sputtering of a partial region of the folded ring portion by using a magnetron sputtering technique is :
  • the center position of the diaphragm to be sputtered is hollowed out to obtain a diaphragm to be sputtered.
  • the diaphragm to be sputtered is assembled on the first sputtering tool by a hollow structure.
  • the first sputtering tool can assemble a plurality of diaphragms to be sputtered at one time.
  • the first sputter shutter is assembled and positioned on the diaphragm to complete positioning with the first sputter tooling center.
  • the first sputter shutter is for shielding a flat portion of the diaphragm and a partial loop portion that blocks the flat portion.
  • the occluded diaphragm is placed in a magnetron sputtering apparatus for surface sputtering treatment.
  • the diaphragm which blocks the planar portion and the partial folding portion close to the planar portion is schematically illustrated, and only the annular outer annular portion of the diaphragm to be sputtered is exposed, so that the diaphragm is
  • the annular ring portion has only the outer annular region for surface sputtering, and the local rigidity of the folded ring portion is strengthened to further strengthen the supporting force of the folded ring portion, thereby improving the problem of polarization of the system due to insufficient supporting force of the diaphragm folding portion.
  • the first sputter shutter for shielding the planar portion and the partial loop portion close to the flat portion may be designed according to the requirements of acoustic performance.
  • the present embodiment includes, but is not limited to, the first sputtering tool shown in FIG. 2, as long as the sputtering tool can assist the sputtering sputter film in the magnetron sputtering device to complete the designated area of the diaphragm.
  • the surface can be sputtered.
  • the sputtering area and the size of the diaphragm ring portion are controlled by the first sputtering tool, and the thickness of the sputtering material, the sputtering strength, and the sputtering time are controlled by a magnetron sputtering apparatus.
  • the magnetron sputtering technology can accurately control the rigidity of the region of the diaphragm ring portion to be strengthened, and can effectively increase the supporting force of the diaphragm ring portion while suppressing the diaphragm compliantness as much as possible, thereby suppressing System polarization.
  • the method of forming the top of the ball is a common method of reinforcing the strength of the top of the ball without increasing the weight of the top of the ball, but limited by the material of the top of the ball, the strength of the method is limited.
  • the invention performs surface treatment on the top of the diaphragm ball by magnetron sputtering, and can maximize the strength of the top of the ball under the premise of increasing the weight as little as possible.
  • the sputtering area at the top of the diaphragm ball can be designed to meet the needs of different acoustic performance.
  • a circular sputtering area can be designed at the center of the top of the ball; to solve the harmonic distortion problem, the top four corners of the ball or the center cross can be selected according to the polarization of the system. region.
  • different sputter materials can be selected to achieve different local strengthening effects on the top of the ball.
  • iron powder can be used to increase the strength
  • the powder with iron powder can be used to increase the local damping of the top of the ball.
  • the technical solution In order to strengthen the strength of the top of the diaphragm ball, after surface sputtering of a part of the diaphragm ring portion by magnetron sputtering technology, the technical solution also performs a part of the top portion of the diaphragm ball by magnetron sputtering technology. Surface sputtering is performed by sticking the top of the ball after the surface sputtering to the plane portion of the diaphragm.
  • the method for reworking the diaphragm further includes: performing surface sputtering on a partial region of the top of the ball by using a magnetron sputtering technique.
  • FIG. 3 is a schematic diagram of a process of surface sputtering treatment on a partial region of the top of the ball according to an embodiment of the present invention.
  • the top of the ball is first designed according to the requirements of acoustic performance.
  • the hollow region of the second sputtering shield is designed according to the sputtering region, so that only the hollow region can be sputtered.
  • the sputtering region in this embodiment may be a circular region located at the center of the top of the ball, as shown in FIG. 4-a, suppressing the diagonal polarization of the system by providing a circular sputtering region at the center of the top of the ball;
  • the sputtering region in the middle may also be a circular region at the four corner positions of the top of the ball, as shown in Figure 4-b, by providing a circular sputtering region suppression system at the four corner positions of the top of the ball.
  • the sputtering area in this step can also be a cross-shaped area at the center of the top of the ball, as shown in Figure 4-c, by suppressing the split vibration of the system by providing a cross-shaped sputtering area at the center of the top of the ball.
  • the form of the sputtering region can be varied, and the technical solution includes, but is not limited to, the above three forms of sputtering regions.
  • the second sputtering tooling is pre-processed.
  • the specific process of surface sputtering of a portion of the top of the ball by magnetron sputtering is:
  • the present embodiment includes, but is not limited to, the second sputtering tool shown in FIG. 3, as long as the sputtering tool can assist the surface of the ball to be sputtered in the surface of the magnetron sputtering device to complete the designated area on the top of the ball. It can be sputtered.
  • the sputtering area and the size of the top of the diaphragm ball in this embodiment were controlled by the second sputtering tool, and the thickness of the sputtering material, the sputtering intensity, and the sputtering time were controlled by a magnetron sputtering apparatus.
  • surface sputtering is performed on the dome region of the diaphragm by magnetron sputtering, and the strength of the ball top can be maximized without increasing the weight of the vibration system.
  • the embodiment has the controllability with high precision, can locally increase the strength of the top of the ball, and makes the strengthening mode more targeted, and the sputtering material has a wide selection range, and is suitable for the ball top design of different purposes.
  • sputter materials such as iron powder or liquid glue mixed with iron powder may be selected according to the requirements of acoustic performance.
  • the magnetron sputtering technique is a magnetic material-guided process for surface treatment of materials
  • the sputtering material must be a metal material that can be adsorbed by the magnet.
  • the embodiment of the present invention further provides a diaphragm including a planar portion at the center, a folded portion disposed at an edge of the planar portion, and connected to the periphery of the folded portion for the same technical concept as the method for reworking the diaphragm.
  • a portion of the top portion of the diaphragm ball is surface sputtered by a magnetron sputtering technique.
  • the sputtering region at the top of the ball may be designed according to the requirements of acoustic performance, and the sputtering region may be a circular region located at the center of the top of the ball; or, at the top of the ball a circular area at the corner position; or a cross-shaped area at the center of the top of the ball.
  • the partial region of the diaphragm ring portion is subjected to surface sputtering, which can strengthen the rigidity of the folding ring portion, thereby reinforcing the supporting force of the folding ring portion, so as to suppress the system polarization without affecting the low-frequency sound quality of the system. the goal of.
  • surface sputtering of a portion of the top of the diaphragm ball increases the strength of the local portion of the top of the ball without increasing the weight of the vibrating system.
  • the embodiment of the invention further provides a receiver, comprising an upper shell and a lower shell, wherein the cavity enclosed by the upper shell and the lower shell houses a vibration system; the vibration system comprises the diaphragm and the ball top provided by the above technical solution.
  • FIG. 5 and FIG. 6 are schematic diagrams showing a structure of a receiver according to an embodiment of the present invention, where the receiver includes a vibration system, a magnetic circuit system, and an auxiliary system.
  • the auxiliary system includes an upper case 5 and a lower case 11 which are joined together, and a cavity surrounded by the upper case 5 and the lower case 11 houses a vibration system and a magnetic circuit system.
  • the magnetic circuit system includes a diaphragm 6, a voice coil 7 fixed to one side of the diaphragm 6, and a ball top 4 fixed to a plane portion of the diaphragm 6; wherein the voice coil 7 and the ball top 4 can be fixed to the same side of the diaphragm 6, They may also be respectively fixed on both sides of the diaphragm 6; wherein a partial region of the folded portion of the diaphragm 6 is surface-sputtered by a magnetron sputtering technique to enhance the local rigidity of the folded portion, and a part of the ball top portion 4 passes through Magnetron sputtering techniques perform surface sputtering to enhance the local stiffness of the top of the ball.
  • the magnetic circuit system includes a basin frame 10 fixed to the lower casing 11.
  • the basin frame 10 is provided with a magnet 9 near the center of the upper casing 5, and a side of the magnet 9 away from the basin frame 10 is provided with a washer 8.
  • the receiver in the embodiment performs surface sputtering on the diaphragm ring portion of the vibration system, which can strengthen the supporting force of the folding ring portion, suppress the system polarization while not affecting the low-frequency sound quality of the system; and the top of the diaphragm ball Surface sputtering is performed to increase the intensity of the local area of the top of the ball without increasing the weight of the vibration system, so as to improve the high frequency response characteristics of the receiver and reduce harmonic distortion.
  • the embodiment of the present invention provides a method for reworking a diaphragm, a diaphragm, and a receiver, the diaphragm including a planar portion located at a center, a folded portion disposed at an edge of the planar portion, and a folded portion The periphery is connected to a fixing portion for bonding the outer casing.
  • surface sputtering of a portion of the folded portion by magnetron sputtering technology can enhance the local rigidity of the folded portion, thereby reinforcing the supporting force of the folded portion.
  • by surface sputtering the top of the diaphragm ball by surface sputtering the top of the diaphragm ball, the strength of the local area of the top of the ball is increased without increasing the weight of the vibrating system as much as possible.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

本发明公开了一种再加工振膜的方法、振膜以及受话器。所述振膜包括位于中心的平面部、设置于所述平面部边缘的折环部以及与所述折环部外围相连用于粘接外壳的固定部；所述再加工振膜的方法包括采用磁控溅射技术对所述折环部的部分区域进行表面溅射以增强所述折环部的局部刚性，从而加强折环部的支撑力，以达到在不影响系统低频声品质的同时，抑制系统偏振的目的。所述方法还包括对粘贴在平面部上的球顶部采用磁控溅射技术对所述球顶部的部分区域进行表面溅射，在尽量不增加振动系统重量的情况下，增加球顶部局部区域的强度。

Description

一种再加工振膜的方法、振膜以及受话器 技术领域
本发明涉及电声产品技术领域，特别涉及一种再加工振膜的方法、振膜以及受话器。
发明背景
随着受话器尺寸逐步减少，振膜必须设计的更加柔软，才能满足低频声品质的要求。而更加柔软的振膜将导致振动系统偏振加剧，使得失真、杂波更加不易控制。
而在受话器尺寸日渐减小的情况下，振膜的常规设计已经无法同时满足低频声品质及抑制系统偏振的需求。
发明内容
鉴于上述问题，提出了本发明以便提供一种克服上述问题或者至少部分地解决上述问题的一种再加工振膜的方法、振膜以及受话器，本发明的技术方案是这样实现的：
一方面，本发明实施例提供了一种再加工振膜的方法，所述振膜包括位于中心的平面部、设置于所述平面部边缘的折环部以及与所述折环部外围相连用于粘接外壳的固定部；所述方法包括：采用磁控溅射技术对所述折环部的部分区域进行表面溅射。
其中，所述采用磁控溅射技术对所述折环部的部分区域进行表面溅射包括：
将待溅射振膜的中心位置镂空；
通过所述镂空结构将所述振膜装配在第一溅射工装上；
将第一溅射遮挡件装配并定位到所述振膜上，所述第一溅射遮挡件用于遮挡所述振膜的平面部和遮挡靠近所述平面部的部分折环部；
将经遮挡处理的所述振膜放入磁控溅射设备中进行表面溅射处理。
优选地，在所述振膜的平面部上粘贴球顶部，所述方法还包括：
采用磁控溅射技术对所述球顶部的部分区域进行表面溅射。
其中，所述采用磁控溅射技术对所述球顶部的部分区域进行表面溅射包括：
根据声学性能的需求设计所述球顶部的溅射区域；
根据所述溅射区域设计第二溅射遮挡件的镂空区域，保证只有镂空区域才能被溅射到；
将所述球顶部装配并固定在第二溅射工装上；
将所述第二溅射遮挡件装配并定位到所述球顶部上；
将经遮挡处理的所述球顶部放入磁控溅射设备中进行表面溅射。
其中，所述根据声学性能的需求设计所述球顶部的溅射区域包括：
所述溅射区域为位于所述球顶部中心处的圆形区域；
或者，所述溅射区域为位于所述球顶部四个边角位置处的圆形区域；
或者，所述溅射区域为位于所述球顶部中心处的十字形区域。
优选地，所述磁控溅射技术采用的溅射材料包括铁粉或混合铁粉的液态胶。
本技术方案通过对振膜折环部的部分区域进行表面溅射，能够加强折环部的刚性，从而加强折环部的支撑力，达到在不影响系统低频声品质的同时，抑制系统偏振的目的。
在优选方案中通过对振膜球顶部进行表面溅射，在尽量不增加振动系统重量的情况下，增加了球顶部局部区域的强度。
另一方面，本发明实施例提供了一种振膜，包括位于中心的平面部、设置于所述平面部边缘的折环部以及与所述折环部外围相连用于粘接外壳的固定部；所述折环部的部分区域通过磁控溅射技术进行过表面溅射。
优选地，所述振膜还包括粘贴在平面部上的球顶部，所述球顶部的部分区域通过磁控溅射技术进行过表面溅射。
其中，在对所述球顶部的部分区域进行表面溅射时，根据声学性能的需求设计所述球顶部的溅射区域，所述溅射区域为位于所述球顶部中心处的圆形区域；
或者，为位于所述球顶部四个边角位置处的圆形区域；
或者，为位于所述球顶部中心处的十字形区域。
本技术方案对振膜折环部的部分区域进行表面溅射，能够加强折环部的刚性，从而加强折环部的支撑力，达到在不影响系统低频声品质的同时，抑制系统偏振的目的。
在优选方案中对振膜球顶部的部分区域进行表面溅射，在尽量不增加振动系统重量的情况下，增加了球顶部局部区域的强度。
又一方面，本发明实施例提供了一种受话器，包括上壳和下壳，所述上壳和下壳围成的空腔收容有振动系统；所述振动系统的振膜包括上述技术方案提供的折环部和上述技术方案提供的球顶部。
本技术方案的受话器对振动系统中的振膜折环部进行表面溅射，能够加强折环部的支撑力，在不影响系统低频声品质的同时，抑制系统偏振；并且对振膜球顶部进行表面溅射，在尽量不增加振动系统重量的情况下，增加了球顶部局部区域的强度，以提高受话器的高频频响特性，并降低谐波失真。
上述说明仅是本发明技术方案的概述，为了能够更清楚了解本发明的技术手段，以下特举本发明的具体实施方式。
附图简要说明
附图用来提供对本发明的进一步理解，并且构成说明书的一部分，与本发明实施例一起用于解释本发明，并不构成对本发明的限制。在附图中： 图1为本发明实施例提供的一种表面溅射的振膜的外观示意图；
图2为本发明实施例提供的对折环部的部分区域进行表面溅射处理的过程示意图；
图3本发明实施例提供的对球顶部的部分区域进行表面溅射处理的过程示意图；
图4-a为本发明实施例提供的球顶部中心处圆形溅射区域的示意图；
图4-b为本发明实施例提供的球顶部边角处圆形溅射区域的示意图；
图4-c为本发明实施例提供的球顶部中心处十字形溅射区域的示意图；
图5为本发明实施例提供的受话器组成结构示意图；
图6为本发明实施例提供的受话器剖面侧视图；
图中：1、平面部；2、折环部；3、固定部；4、球顶部；5、上壳；6、振膜；7、音圈；8、华司；9、磁铁；10、盆架；11、下壳。
具体实施方式
针对受话器尺寸日渐减小，振膜的常规设计已经无法同时满足低频声品质及抑制系统偏振的需求的现况，本发明在不影响产品的低频性能的情况下，采用增加振膜折环区域的局部刚性来抑制振膜偏振，并通过优化设计，在不影响低频声品质的同时，达到抑制系统偏振的目的。
由于受话器振膜材质选择的局限性导致无法实现振膜分块或局部的优化的技术现状。本技术方案通过采用磁控溅射工艺对振膜折环的部分区域进行再加工，以达到精确加强振膜的局部刚性的目的，从而实现增强振膜抑制系统偏振能力。
磁控溅射方法是通过磁场控制金属粉末、液体溅射至待处理工件表面的一种工艺，具有精度高，易控制等特点。
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明实施方式作进一步地详细描述。
图1为本发明实施例提供的一种表面溅射的振膜的外观示意图，该振膜包括位于中心的平面部1、设置于平面部1边缘的折环部2、与折环部2外围相连用于粘接外壳的固定部3。
本发明实施例提供了一种再加工振膜的方法，所述方法包括：采用磁控溅射技术对折环部的部分区域进行表面溅射。需要说明的是，为进行溅射需要预先加工溅射工装。为区分不同的溅射工装，本发明实施例将用于溅射振膜折环部的溅射工装命名为第一溅射工装，将用于溅射振膜球顶部的溅射工装命名为第二溅射工装。其中第一、第二的使用仅用于区分，不表示任何顺序。
如图2所示，图2为本发明实施例提供的对折环部的部分区域进行表面溅射处理的过程示意图，采用磁控溅射技术对折环部的部分区域进行表面溅射的具体流程为：
S11，将待溅射振膜的中心位置镂空，得到成型待溅射振膜。S12，通过镂空结构将待溅射振膜装配在第一溅射工装上。在实际应用中该第一溅射工装可以一次装配多个待溅射振膜。
S13，将第一溅射遮挡件装配并定位到振膜上，完成与第一溅射工装中心定位。第一溅射遮挡件用于遮挡振膜的平面部和遮挡靠近平面部的部分折环部。
S14，将经遮挡处理的振膜放入磁控溅射设备中进行表面溅射处理。
S15，将表面溅射后的振膜从所述磁控溅射设备取出，将振膜的球顶部粘贴在上述振膜的平面部。
需要说明的是，图2中示意性示出遮挡了平面部和靠近平面部的部分折环部的振膜，待溅射振膜只有环状的外侧折环部显露在外，使得该振膜的折环部只有外侧的环形区域进行表面溅射，通过加强折环部的局部刚性，进而加强折环部的支撑力，改善由于振膜折环部支撑力不足，导致系统偏振的问题。显然，在实际应用中，可以根据声学性能的需求设计用于遮挡平面部和靠近平面部的部分折环部的第一溅射遮挡件。
进一步需要说明的是，本实施例包括但不局限于图2所示的第一溅射工装，只要该溅射工装能够协助带溅射振膜在磁控溅射设备完成对振膜指定区域的表面溅射即可。
本实施例中振膜折环部的溅射区域、大小由第一溅射工装控制，溅射材料的厚度、溅射强度以及溅射时间由磁控溅射设备进行控制。
本实施例通过磁控溅射技术能够精确控制待加强的振膜折环部的区域的刚性，能够在尽量不影响振膜顺性的同时，有效增加振膜折环部的支撑力，从而抑制系统偏振。
在受话器模组中，为提高高频频响特性和降低谐波失真都需要加强振膜球顶部的强度。但在增加球顶部的强度时，往往又不得不采用增加材料厚度和复合新材料的方法，而两者都必将导致振动系统重量的增加。
其中对球顶部成型花纹是不增加球顶部重量而加强球顶部强度的常用方法，但受限于球顶部的材料，该方法加强的强度范围有限。
本发明通过磁控溅射的方法对振膜球顶部进行表面处理，可以在增加尽可能少的重量的前提下，最大程度增加球顶部的强度。基于此处理工艺，可对振膜球顶部的溅射区域进行设计，以满足不同声学性能的需求。如为解决高频问题，抑制球顶部的分割振动，可在球顶部中心处设计圆形的溅射区域；为解决谐波失真问题，可根据系统偏振情况，选择加强球顶部四角还是中心十字形区域。同时，选择不同的溅射材料可达成球顶部不同的局部加强效果，如铁粉可用于增加强度，铁粉带胶的液体可用于增加球顶部局部阻尼。
为加强振膜球顶部的强度，在采用磁控溅射技术对振膜折环部的部分区域进行表面溅射后，本技术方案还通过磁控溅射技术对振膜球顶部的部分区域进行表面溅射，将表面溅射后的球顶部粘贴在上述振膜的平面部。
具体的，上述再加工振膜的方法还包括：采用磁控溅射技术对球顶部的部分区域进行表面溅射。
如图3所示，图3为本发明实施例提供的对球顶部的部分区域进行表面溅射处理的过程示意图，在对球顶部进行表面溅射前，首先根据声学性能的需求设计球顶部的溅射区域，根据溅射区域设计第二溅射遮挡件的镂空区域，保证只有镂空区域才能被溅射到。
本实施例中的溅射区域可以为位于球顶部中心处的圆形区域，如图4-a所示，通过在球顶部中心处设置圆形的溅射区域抑制系统的对角偏振；本步骤中的溅射区域还可以为位于球顶部四个边角位置处的圆形区域，如图4-b所示，通过在球顶部四个边角位置处设置圆形的溅射区域抑制系统的直边偏振；本步骤中的溅射区域还可以为位于球顶部中心处的十字形区域，如图4-c所示，通过在球顶部中心处设置十字形的溅射区域抑制系统的分割振动。显然，溅射区域的形式可以是多样的，本技术方案包括但不局限于上述三种形式的溅射区域。
预先加工第二溅射工装。采用磁控溅射技术对球顶部的部分区域进行表面溅射的具体流程为：
S21，将球顶部装配并固定在第二溅射工装上。
S22，将第二溅射遮挡件装配并定位到球顶部上，完成与第二溅射工装中心定位。
S23，将经遮挡处理的所述球顶部放入磁控溅射设备中进行表面溅射。
S24，将表面溅射后的球顶部从所述磁控溅射设备取出，将该球顶部粘贴在振膜的平面部。
需要说明的是，本实施例包括但不局限于图3所示的第二溅射工装，只要该溅射工装能够协助待溅射球顶部在磁控溅射设备完成对球顶部指定区域的表面溅射即可。
本实施例中的振膜球顶部的溅射区域、大小由第二溅射工装控制，溅射材料的厚度、溅射强度以及溅射时间由磁控溅射设备进行控制。
本技术方案通过磁控溅射的方法对振膜球顶区域进行表面溅射，可以在尽量不增加振动系统重量的情况下，最大程度增加球顶部的强度。本实施例具有精度较高的可控性，可以局部增加球顶部的强度，使其加强方式更有针对性，且溅射材料选择范围较广，适用于不同用途的球顶部设计。
在实际应用中，在对振膜的折环部和球顶部的部分区域进行表面溅射时，可根据声学性能的需求选用不同的溅射材料，例如铁粉或混合铁粉的液态胶。
需要说明的是，由于磁控溅射技术是一种由磁场引导的进行材料表面处理的工艺，因此，溅射材料必须是可被磁铁吸附的金属材料。
基于与再加工振膜的方法相同的技术构思，本发明实施例还提供了一种振膜，包括位于中心的平面部、设置于平面部边缘的折环部以及与折环部外围相连用于粘接外壳的固定部；其中，折环部的部分区域通过磁控溅射技术进行表面溅射以增强折环部的局部刚性。
本实施例的一优选方案中，该振膜球顶部的部分区域通过磁控溅射技术进行表面溅射。
在对球顶部的部分区域进行表面溅射时，可根据声学性能的需求设计球顶部的溅射区域，该溅射区域可以为位于球顶部中心处的圆形区域；或者，为位于球顶部四个边角位置处的圆形区域；或者，为位于球顶部中心处的十字形区域。
本实施例中的振膜折环部的部分区域进行表面溅射，能够加强折环部的刚性，从而加强折环部的支撑力，以达到在不影响系统低频声品质的同时，抑制系统偏振的目的。在优选方案中对振膜球顶部的部分区域进行表面溅射，在尽量不增加振动系统重量的情况下，增加了球顶部局部区域的强度。
本发明实施例还提供了一种受话器，包括上壳和下壳，所述上壳和下壳围成的空腔收容有振动系统；该振动系统包括上述技术方案提供的振膜和球顶部。
具体的，如图5与图6共同所示，图5与图6为本发明实施例提供的一种受话器组成结构示意图，该受话器包括振动系统、磁路系统和辅助系统。
辅助系统包括结合在一起的上壳5和下壳11，上壳5和下壳11围成的空腔收容有振动系统和磁路系统。
磁路系统包括振膜6、固定于振膜6一侧的音圈7以及固定于振膜6平面部的球顶部4；其中音圈7与球顶部4可以固定于振膜6的同侧，也可以分别固定于振膜6的两侧；其中，振膜6的折环部的部分区域通过磁控溅射技术进行表面溅射以增强折环部的局部刚性，球顶部4的部分区域通过磁控溅射技术进行表面溅射以增强球顶部的局部刚性。
磁路系统包括与下壳11固定的盆架10，盆架10靠近上壳5的中心位置设置磁铁9，磁铁9远离盆架10的一侧设置有华司8。
本实施例中的受话器对振动系统中的振膜折环部进行表面溅射，能够加强折环部的支撑力，在不影响系统低频声品质的同时，抑制系统偏振；并且对振膜球顶部进行表面溅射，在尽量不增加振动系统重量的情况下，增加了球顶部局部区域的强度，以提高受话器的高频频响特性，并降低谐波失真。
综上所述，本发明实施例提供了一种再加工振膜的方法、振膜以及受话器，所述振膜包括位于中心的平面部、设置于平面部边缘的折环部以及与折环部外围相连用于粘接外壳的固定部。在所述再加工振膜的方法中，采用磁控溅射技术对所述折环部的部分区域进行表面溅射，能够增强折环部的局部刚性，从而加强折环部的支撑力，达到在不影响系统低频声品质的同时，抑制系统偏振的目的。在优选方案中通过对振膜球顶部进行表面溅射，在尽量不增加振动系统重量的情况下，增加了球顶部局部区域的强度。
以上所述仅为本发明的较佳实施例而已，并非用于限定本发明的保护范围。凡在本发明的精神和原则之内所作的任何修改、等同替换、改进等，均包含在本发明的保护范围内。

Claims (10)

  1. 一种再加工振膜的方法，所述振膜包括位于中心的平面部、设置于所述平面部边缘的折环部以及与所述折环部外围相连用于粘接外壳的固定部；其特征在于，采用磁控溅射技术对所述折环部的部分区域进行表面溅射。
  2. 根据权利要求1所述的方法，其特征在于，所述采用磁控溅射技术对所述折环部的部分区域进行表面溅射包括：
    将待溅射振膜的中心位置镂空；
    通过所述镂空结构将所述振膜装配在第一溅射工装上；
    将第一溅射遮挡件装配并定位到所述振膜上，所述第一溅射遮挡件用于遮挡所述振膜的平面部和遮挡靠近所述平面部的部分折环部；
    将经遮挡处理的所述振膜放入磁控溅射设备中进行表面溅射处理。
  3. 根据权利要求1所述的方法，其特征在于，在所述振膜的平面部上粘贴球顶部，所述方法还包括：
    采用磁控溅射技术对所述球顶部的部分区域进行表面溅射。
  4. 根据权利要求3所述的方法，其特征在于，所述采用磁控溅射技术对所述球顶部的部分区域进行表面溅射包括：
    根据声学性能的需求设计所述球顶部的溅射区域；
    根据所述溅射区域设计第二溅射遮挡件的镂空区域，保证只有镂空区域才能被溅射到；
    将所述球顶部装配并固定在第二溅射工装上；
    将所述第二溅射遮挡件装配并定位到所述球顶部上；
    将经遮挡处理的所述球顶部放入磁控溅射设备中进行表面溅射。
  5. 根据权利要求4所述的方法，其特征在于，所述根据声学性能的需求设计所述球顶部的溅射区域包括：
    所述溅射区域为位于所述球顶部中心处的圆形区域；
    或者，所述溅射区域为位于所述球顶部四个边角位置处的圆形区域；
    或者，所述溅射区域为位于所述球顶部中心处的十字形区域。
  6. 根据权利要求1-5任一项所述的方法，其特征在于，所述磁控溅射技术采用的溅射材料包括铁粉或混合铁粉的液态胶。
  7. 一种振膜，包括位于中心的平面部、设置于所述平面部边缘的折环部以及与所述折环部外围相连用于粘接外壳的固定部；其特征在于，所述折环部的部分区域通过磁控溅射技术进行过表面溅射。
  8. 根据权利要求7所述的振膜，其特征在于，所述振膜还包括粘贴在平面部上的球顶部，所述球顶部的部分区域通过磁控溅射技术进行过表面溅射。
  9. 根据权利要求8所述的振膜，其特征在于，在对所述球顶部的部分区域进行表面溅射时，根据声学性能的需求设计所述球顶部的溅射区域，所述溅射区域为位于所述球顶部中心处的圆形区域；
    或者，为位于所述球顶部四个边角位置处的圆形区域；
    或者，为位于所述球顶部中心处的十字形区域。
  10. 一种受话器，包括上壳和下壳，所述上壳和下壳围成的空腔收容有振动系统；其特征在于，所述振动系统的振膜包括权利要求7所述的折环部和权利要求8或9所述的球顶部。
PCT/CN2015/097962 2015-04-14 2015-12-18 一种再加工振膜的方法、振膜以及受话器 Ceased WO2016165377A1 (zh)

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