WO2016127485A1 - 彩膜基板、制造方法及液晶面板 - Google Patents

彩膜基板、制造方法及液晶面板 Download PDF

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WO2016127485A1
WO2016127485A1 PCT/CN2015/076145 CN2015076145W WO2016127485A1 WO 2016127485 A1 WO2016127485 A1 WO 2016127485A1 CN 2015076145 W CN2015076145 W CN 2015076145W WO 2016127485 A1 WO2016127485 A1 WO 2016127485A1
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Prior art keywords
color
layer
substrate
color resist
plastic frame
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English (en)
French (fr)
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陈杰
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/440,845 priority Critical patent/US20160370647A1/en
Publication of WO2016127485A1 publication Critical patent/WO2016127485A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
    • G02F2201/121—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode common or background

Definitions

  • the present invention relates to the field of liquid crystal display manufacturing, and in particular, to a color film substrate, a manufacturing method, and a liquid crystal panel.
  • a liquid crystal display device has been widely used as a display component of an electronic device in a liquid crystal display device of various electronic products.
  • the liquid crystal panel includes an array substrate and a color filter substrate disposed opposite to each other, and is sandwiched between the array substrate and the color filter substrate.
  • the liquid crystal is formed between the color film substrate and the array substrate to form a closed frame of liquid crystal, and a support is disposed between the color film substrate and the array substrate.
  • the fiber is doped during the molding of the plastic frame, but more fiber raw materials and corresponding equipment are required, thus increasing the production cost.
  • the invention provides a color film substrate and a manufacturing method thereof, which can ensure the strength of the plastic frame support and save the cost.
  • the invention also relates to a liquid crystal panel.
  • the present invention provides a color filter substrate comprising a substrate, a black matrix layer, a color resistive unit layer, and a common electrode layer, wherein the black matrix layer and the color resistive unit layer are formed on the same surface of the substrate, the common electrode
  • the layer covers the color resistive unit layer
  • the plastic film substrate is further provided with a plastic frame on the periphery of the substrate, and the plastic frame is embedded with a protrusion, and the protrusion is colored by the color resisting unit layer. Blocking formation.
  • the color resistive unit layer includes a plurality of RGB color resisting units.
  • the protrusion is formed by a color resist or is formed by stacking a plurality of colors.
  • the RGB color resist unit includes a first color resist, a second color resist, and a third color resist.
  • the color resistive unit layer patterning includes three-exposure development, and the protrusion is formed at least once in the three-exposure development.
  • the invention also provides a method for manufacturing a color film substrate, the method comprising: providing a substrate;
  • RGB color resist layer Patterning the RGB color resist layer to form a color resistive unit layer, and forming a bump formed by RGB color resist on the plastic frame region;
  • the step of "patterning the RGB color resist layer to form a color resistive unit layer while forming a bump formed by RGB color resisting on the plastic frame region" is included in the a first color resist layer, a second color resist layer and a third color resist layer are sequentially coated on the substrate, and respectively corresponding to exposure and development to form a color resistive unit layer; and, in the first color resist layer and the second color resist layer The layer and the third color resist layer are subjected to at least one exposure development in exposure development to form the protrusion.
  • the step of forming the protrusion by at least one exposure and development in the first color resist, the second color resist, and the third color resist in the exposure and development includes forming a bump or first after the first color resist exposure development The color resist layer and the second color layer are exposed to form a protrusion after exposure and development, or the first color resist layer, the second color resist layer and the third color resist layer are exposed to form a protrusion after being exposed and developed.
  • the method for manufacturing a color filter substrate further includes the step of forming a plurality of supports on the substrate above the color resistive unit layer.
  • the present invention also provides a liquid crystal panel comprising an array substrate and a color filter substrate disposed opposite to the array substrate, the color film substrate comprising a substrate, a black matrix layer, a color resistive unit layer, a common electrode layer, and the black matrix layer And a color resistive unit layer is formed on the same surface of the substrate, the common electrode layer covers the color resistive unit layer, and the plastic film substrate is further provided with a plastic frame on the periphery of the substrate, in the plastic frame A protrusion is formed, and the protrusion is formed when the color resistive unit layer is patterned; the array substrate is fixed to the color filter substrate, and the plastic frame is clamped to form a cavity for accommodating the liquid crystal.
  • the color film substrate of the invention forms a color resisting unit layer at the same time, and forms a convexity in the plastic frame area through the color resisting deposition, and then inserts into the plastic frame when the plastic frame is formed, and supports the color film substrate together with the plastic frame, not only enhancing the plastic frame
  • the support strength and the formation of bumps when forming through the color resistive unit layer save processing procedures and costs.
  • Figure 1 is a schematic cross-sectional view of a color filter substrate of the present invention.
  • FIG. 2 is a flow chart showing a method of manufacturing the color filter substrate shown in FIG. 1.
  • Figure 3 is a schematic cross-sectional view of a liquid crystal panel of the present invention.
  • the present invention protects a color filter substrate 100 comprising a substrate 10, a black matrix layer 11, a color resistive unit layer 12, and a common electrode layer 13.
  • the black matrix layer 11 and the color resistive unit layer 12 are formed on the same surface of the substrate 10, and the common electrode layer 13 covers the color resistive unit layer 12.
  • a plastic frame 15 is further disposed on the periphery of the substrate 10, and the plastic frame 15 is embedded with a protrusion 16 formed by the color resistance when the color resistive unit layer 12 is formed. .
  • the color resist located in the area of the plastic frame 15 forms a protrusion separated from the color resistive unit layer 12, and the number of the protrusions 16 is according to the color filter substrate. Need to set it up.
  • the black matrix layer 11 is a grid structure composed of a horizontally and vertically linearly intersecting arrangement.
  • the color resistive unit layer 12 includes a plurality of RGB color resisting units.
  • the RGB color resisting unit includes a first color resist 121, a second color resist 122, and a third color resist 123.
  • the first color resist 121, the second color resist 122, and the third pixel layer C are red, green, and yellow color resists, respectively.
  • the plurality of RGB The first color resist 121, the second color resist 122, and the third color resist 123 of the color resisting unit are arranged in a grid shape, and the black matrix layer 11 and the first color resist 121, the second color resist 122, and the first The three color resists 123 are arranged to form a grid-like interpenetration arrangement.
  • the protrusions 16 are formed by a color resist or are formed by a plurality of color resists. Specifically, the protrusion 16 is formed by the first color resist 121, or the first color resist 121 and the second color resist 122 are stacked, or the first color resist 121, the second color resist 122, and the third color resist 123. Two or three of the three are stacked at the same time. In this embodiment, it is preferable that the first color resist 121, the second color resist 122, and the third color resist 123 are stacked and stacked.
  • the patterning of the color resistive unit layer 12 includes three-exposure development, and the protrusions 16 are formed at least once in the three-exposure development.
  • the projections 16 which are stacked by three color resists are formed by three-exposure development.
  • the present invention further provides a method for manufacturing a color filter substrate, the method comprising:
  • step S1 a substrate is provided.
  • Step S2 forming a black matrix on the substrate; wherein the substrate is formed with a surface periphery of the black matrix and a frame region.
  • step S3 an RGB color resist layer is coated on the substrate, and at least one color resist of the RGB color resist layer is deposited on the frame region.
  • step S4 the RGB color resist layer is patterned to form a color resistive unit layer, and a bump formed by RGB color resist is formed on the plastic frame region.
  • Step S5 patterning a common electrode layer on the substrate, the common electrode layer covering the color resistive unit layer.
  • Step S6 injecting a plastic into the plastic frame to form a plastic frame, wherein the protrusion is embedded in the plastic frame.
  • step S7 a plurality of supports are formed on the substrate above the color resistive unit layer.
  • the method further includes a step S41, sequentially applying a first color resist layer, a second color resist layer and a third color resist layer on the substrate, and respectively performing exposure and development to form a color resist a step of unit layer; and step S42, forming the protrusions by at least one exposure and development in exposure development of the first color resist layer, the second color resist layer, and the third color resist layer.
  • step S42 the first color resist layer is further exposed to form a bump or The first color resist layer and the second color resist layer are superimposed to form a protrusion after exposure and development, or the first color resist layer, the second color resist layer and the third color resist layer are exposed to form a protrusion after being exposed and developed.
  • the substrate 10 in this embodiment is a glass plate. It has a surface (not shown).
  • a black matrix layer 11 is formed on the surface of the substrate 10.
  • the base 10 is formed with a surface periphery of the black matrix layer 11 and a bezel region 111.
  • the black matrix layer 11 is formed by a patterning process such as exposure development on a photoresist applied to a surface, and spacers D1, D2, and D3 are interposed between the black matrix layers 11.
  • the RGB color resist layer includes three color resists: a first color resist 121, a second color resist 122, and a third color resist 123.
  • the first color resist 121, the second color resist 122, and the third color resist 123 are red color resist, green color resist, and yellow color resist, respectively.
  • the first color resist layer, the second color resist layer and the third color resist layer are sequentially coated on the substrate 10, and exposed and developed after each coating, and a red color resist is formed in the spacer D1.
  • a green color resist is formed in D2, and a yellow color resist is formed in the spacer D3, so that each of the spacers D1, D2, and D3 constitutes a color resisting unit.
  • the plurality of color resisting units form the color resistive unit layer 12. Separating the color resistance in the frame region 111 from the color resisting unit by development exposure while performing exposure development on the first color resist layer, the second color resist layer, and the third color resist layer, in the frame region A columnar projection 16 is formed in 111.
  • the protrusions 16 are formed by stacking a first color resist, a second color resist, and a third color resist.
  • a common electrode layer 13 is formed on the substrate 10 on which the color resistive unit layer 12 is formed. It is mainly formed by a patterning process such as exposure development. Then, plastic is injected into the plastic frame region 11 to form a plastic frame 15. The protrusion 16 is embedded in the plastic frame 17 . Finally, a plurality of supports (not shown) are formed on the substrate 11 above the color resistive unit layer 12.
  • the color film substrate 100 of the present invention forms a color resistive layer 12 at the same time, and forms a convexity in the plastic frame area by color resisting, and then inserts into the plastic frame when the plastic frame is formed, which not only enhances the supporting strength of the plastic frame, but also passes the color.
  • the bumps are formed when the unit layer is formed, which saves processing procedures and costs.
  • the present invention further provides a liquid crystal panel including an array substrate 200 and the above color film substrate 100 disposed opposite to the array substrate 200 .
  • the array substrate 200 and the color film base The plate 100 is fixed and the plastic frame 15 is clamped to form a cavity for accommodating the liquid crystal.
  • the patterning manufacturing method is formed by a prior art lithography process and a process of etching, a predetermined pattern, a photoresist, a mask, an exposure machine, etc., and will not be described again.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)

Abstract

一种彩膜基板（100）、制造方法及液晶面板。该彩膜基板包括基体（10）、黑矩阵层（11）、色阻单元层（12）、公共电极层（13），所述黑矩阵层（11）及色阻单元层（12）形成于所述基体（10）的同一表面上，所述公共电极层（13）覆盖所述色阻单元层（12），所述彩膜基板（100）上位于所述基体（10）周缘还设有胶框（15），所述胶框（15）内嵌设有凸起（16），所述凸起（16）为色阻单元层（12）被图案化时由色阻（121，122，123）堆积形成。

Description

彩膜基板、制造方法及液晶面板
本发明要求2015年2月13日递交的发明名称为“彩膜基板、制造方法及液晶面板”的申请号201510080747.7的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及液晶显示制造领域，尤其涉及一种彩膜基板、制造方法及液晶面板。
背景技术
目前，液晶显示装置作为电子设备的显示部件已经广泛的应用于各种电子产品中液晶显示装置，液晶面板包括相对设置的阵列基板和彩膜基板、以及夹设在阵列基板和彩膜基板之间的液晶，在所述彩膜基板与阵列基板之间形成封闭液晶的胶框，所述彩膜基板与阵列基板之间设有支撑物。在制造过程中，为了确保胶框具有足够的支撑强度，会在胶框成型时掺杂纤维，但是需要较多的纤维原料以及相应的设备，如此增加了生产成本。
发明内容
本发明提供一种彩膜基板及其制造方法，可以保证胶框支撑强度，并且节省成本。
本发明还涉及一种液晶面板。
本发明提供一种彩膜基板，其包括基体、黑矩阵层、色阻单元层、公共电极层，所述黑矩阵层及色阻单元层形成于所述基体的同一表面上，所述公共电极层覆盖所述色阻单元层，所述彩膜基板上位于所述基体周缘还设有胶框，所述胶框内嵌设有凸起，所述凸起在色阻单元层形成时由色阻堆积形成。
其中，所述色阻单元层包括数个RGB色阻单元。
其中，所述凸起由一种颜色色阻形成或者由多种颜色的色阻堆积形成。
其中，所述RGB色阻单元包括第一色阻、第二色阻及第三色阻。
其中，所述色阻单元层图案化包括三次曝光显影，所述凸起在所述三次曝光显影中的至少一次形成。
本发明还提供一种彩膜基板的制造方法，所述方法包括，提供一基体；
在基体上形成黑矩阵；其中，所述基体形成有黑矩阵的表面周缘与设有胶框区域，
在所述基体上涂布RGB色阻层，所述RGB色阻层中的至少一种色阻堆积于所述胶框区域；
对所述RGB色阻层进行图案化形成色阻单元层，同时在所述胶框区域上形成由RGB色阻堆积而成凸起；
在所述基体上图案化形成公共电极层，所述公共电极层覆盖所述色阻单元层；
在所述胶框区域注入塑胶形成胶框，其中，所述凸起嵌设于所述胶框内。
其中，在所述“对所述RGB色阻层进行图案化形成色阻单元层，同时在所述胶框区域上形成由RGB色阻堆积而成的凸起”的步骤中，包括在所述基体上依次涂布第一色阻层、第二色阻层及第三色阻层，并分别对应进行曝光显影形成色阻单元层的步骤；以及，在第一色阻层、第二色阻层及第三色阻层进行曝光显影中至少一次曝光显影形成所述凸起的步骤。
其中，所述在第一色阻、第二色阻及第三色阻进行曝光显影中至少一次曝光显影形成所述凸起的步骤中包括，第一色阻曝光显影后形成凸起或者第一色阻层及第二色层阻曝光显影后叠加形成凸起，或者第一色阻层、第二色阻层及第三色阻层三种色阻曝光显影后叠加形成凸起。
其中，所述彩膜基板的制造方法还包括在所述基体上位于色阻单元层上方形成数个支撑物的步骤。
本发明还提供一种液晶面板，其包括阵列基板及与阵列基板相对设置的彩膜基板，所述彩膜基板包括基体、黑矩阵层、色阻单元层、公共电极层，所述黑矩阵层及色阻单元层形成于所述基体的同一表面上，所述公共电极层覆盖所述色阻单元层，所述彩膜基板上位于所述基体周缘还设有胶框，所述胶框内嵌设有凸起，所述凸起为色阻单元层被图案化时形成；所述阵列基板与所述彩膜基板固定并将所述胶框夹持形成以空腔，用于收容液晶。
本发明的彩膜基板在形成色阻单元层同时，在胶框区域通过色阻堆积形成凸起，然后再形成胶框时嵌入胶框内，与胶框共同支撑彩膜基板，不仅增强胶框的支撑强度，而且通过色阻单元层成型时形成凸起，节省了加工程序及成本。
附图说明
为了更清楚地说明本发明实施例或现有技术中的技术方案，下面将对实施例或现有技术描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是本发明的彩膜基板的截面示意图。
图2是图1所示的彩膜基板的制造方法流程图。
图3是本发明的液晶面板截面示意图。
具体实施方式
下面将结合本发明实施例中的附图，对本发明实施例中的技术方案进行清楚、完整地描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例，都属于本发明保护的范围。
请参阅图1，本发明保护一种彩膜基板100，其包括基体10、黑矩阵层11、色阻单元层12、公共电极层13。所述黑矩阵层11及色阻单元层12形成于所述基体10的同一表面上，所述公共电极层13覆盖所述色阻单元层12。所述彩膜基板上位于所述基体10周缘还设有胶框15，所述胶框15内嵌设有凸起16，所述凸起16在色阻单元层12形成时由色阻堆积形成。具体的，在所述色阻单元层12被图案化时，位于所述胶框15区域内的色阻形成与所述色阻单元层12分离的凸起，凸起16的数量根据彩膜基板需要而设置。所述黑矩阵层11为横向及纵向线性交叉排列设置构成的网格结构。
进一步的，所述色阻单元层12包括数个RGB色阻单元。所述RGB色阻单元包括第一色阻121、第二色阻122及第三色阻123。所述第一色阻121、第二色阻122及第三像素层C分别为红色、绿色及黄色色阻。所述数个RGB 色阻单元的第一色阻121、第二色阻122及第三色阻123隔排列构成网格状，所述黑矩阵层11与所述第一色阻121、第二色阻122及第三色阻123隔排列构成网格状穿插设置。
进一步的，所述凸起16由一种颜色色阻形成或者由多种颜色的色阻堆积形成。具体的，所述凸起16由第一色阻121形成，或者第一色阻121与第二色阻122堆积形成，又或者第一色阻121、第二色阻122及第三色阻123三种中的两种或者三种同时堆积形成。本实施例中优选为第一色阻121、第二色阻122及第三色阻123三种叠加堆积形成。
进一步的，所述色阻单元层12图案化包括三次曝光显影，所述凸起16在所述三次曝光显影中的至少一次形成。本实施例中，通过三次曝光显影形成由三种颜色色阻堆积而成的所述凸起16。
请参阅图2，本发明还提供一种彩膜基板的制造方法，所述方法包括：
步骤S1，提供一基体。
步骤S2，在所述基体上形成黑矩阵；其中，所述基体形成有黑矩阵的表面周缘与设有胶框区域。
步骤S3，在所述基体上涂布RGB色阻层，所述RGB色阻层中的至少一种色阻堆积于所述胶框区域。
步骤S4，对所述RGB色阻层进行图案化形成色阻单元层，同时在所述胶框区域上形成由RGB色阻堆积而成凸起。
步骤S5，在所述基体上图案化形成公共电极层，所述公共电极层覆盖所述色阻单元层。
步骤S6，在所述胶框区域注入塑胶形成胶框，其中，所述凸起嵌设于所述胶框内。
步骤S7，在所述基体上位于色阻单元层上方形成数个支撑物。
进一步的，在所述步骤S4，中还包括步骤S41，在所述基体上依次涂布第一色阻层、第二色阻层及第三色阻层，并分别对应进行曝光显影形成色阻单元层的步骤；以及步骤S42，在第一色阻层、第二色阻层及第三色阻层进行曝光显影中至少一次曝光显影形成所述凸起。
更进一步的，在步骤S42中，还包括第一色阻层曝光显影后形成凸起或者 第一色阻层及第二色阻层曝光显影后叠加形成凸起，或者第一色阻层、第二色阻层及第三色阻层三种色阻曝光显影后叠加形成凸起。
本实施例中，以图1中所示的彩膜基板100为例，对上述彩膜基板的制造方法进行详细说明。
本实施例中的基体10为玻璃板。其具有一表面(图未标)。
在所述基体10的所述表面上形成黑矩阵层11。其中，所述基体10形成有黑矩阵层11的表面周缘与设有胶框区域111。具体的，所述黑矩阵层11是通过对涂布于表面的光阻进行曝光显影等构图工艺形成，并且黑矩阵层11之间穿插设有间隔区D1、D2及D3。
然后在形成有黑矩阵层11的所述基体10上涂布RGB色阻层，所述RGB色阻层覆盖胶框区域111。所述RGB色阻层包括第一色阻121、第二色阻122及第三色阻123三种色阻。第一色阻121、第二色阻122及第三色阻123分别为红色色阻、绿色色阻及黄色色阻。具体的，在基体10上依次涂布第一色阻层、第二色阻层及第三色阻层，并且在每次涂布后进行曝光显影，在所述的间隔区D1形成红色色阻，在D2形成绿色色阻，在间隔区D3内形成黄色色阻，进而使每一组间隔区D1、D2及D3构成一个色阻单元。多个色阻单元形成色阻单元层12。在第一色阻层、第二色阻层及第三色阻层进行曝光显影的同时，通过显影曝光将所述胶框区域111内的色阻与所述色阻单元分离，在胶框区域111内形成柱状的凸起16。所述凸起16为第一色阻、第二色阻及第三色阻叠加堆积形成。
在形成色阻单元层12的所述基体10上形成公共电极层13。主要通过曝光显影等构图工艺形成。然后在所述胶框区域11注入塑胶形成胶框15。所述凸起16被嵌设于所述胶框17内。最后，在所述基体11上位于色阻单元层12上方形成数个支撑物(图未示)。
本发明的彩膜基板100在形成色阻单元层12同时，在胶框区域通过色阻堆积形成凸起，然后再形成胶框时嵌入胶框内，不仅增强胶框的支撑强度，而且通过色阻单元层成型时形成凸起，节省了加工程序及成本。
请参阅图3，本发明还提供一种液晶面板，其包括阵列基板200及与阵列基板200相对设置的以上所述彩膜基板100。所述阵列基板200与所述彩膜基 板100固定并将所述胶框15夹持形成以空腔，用于收容液晶。
所述的图案化制造方法，均是通过现有技术光刻工艺以及刻蚀、预定图形的工艺、光刻胶、掩模板、曝光机等形成图形等工艺形成，再次不做赘述。
以上所揭露的仅为本发明一种较佳实施例而已，当然不能以此来限定本发明之权利范围，本领域普通技术人员可以理解实现上述实施例的全部或部分流程，并依本发明权利要求所作的等同变化，仍属于发明所涵盖的范围。

Claims (10)

  1. 一种彩膜基板，其包括基体、黑矩阵层、色阻单元层、公共电极层，所述黑矩阵层及色阻单元层形成于所述基体的同一表面上，所述公共电极层覆盖所述色阻单元层，其特征在于，所述彩膜基板上位于所述基体周缘还设有胶框，所述胶框内嵌设有凸起，所述凸起在色阻单元层形成时由色阻堆积形成。
  2. 如权利要求1所述的彩膜基板，其特征在于，所述色阻单元层包括数个RGB色阻单元。
  3. 如权利要求1所述的彩膜基板，其特征在于，所述凸起由一种颜色色阻形成或者由多种颜色的色阻堆积形成。
  4. 如权利要求2所述的彩膜基板，其特征在于，所述RGB色阻单元包括第一色阻、第二色阻及第三色阻。
  5. 如权利要求1所述的彩膜基板，其特征在于，所述色阻单元层图案化包括三次曝光显影，所述凸起在所述三次曝光显影中的至少一次形成。
  6. 一种彩膜基板的制造方法，其特征在于，所述方法包括，提供一基体；
    在基体上形成黑矩阵；其中，所述基体形成有黑矩阵的表面周缘与设有胶框区域，
    在所述基体上涂布RGB色阻层，所述RGB色阻层中的至少一种色阻堆积于所述胶框区域；
    对所述RGB色阻层进行图案化形成色阻单元层，同时在所述胶框区域上形成由RGB色阻堆积而成凸起；
    在所述基体上图案化形成公共电极层，所述公共电极层覆盖所述色阻单元层；
    在所述胶框区域注入塑胶形成胶框，其中，所述凸起嵌设于所述胶框内。
  7. 如权利要求6所述的彩膜基板的制造方法，其特征在于，在所述“对所述RGB色阻层进行图案化形成色阻单元层，同时在所述胶框区域上形成由RGB色阻堆积而成的凸起”的步骤中，包括在所述基体上依次涂布第一色阻层、第二色阻层及第三色阻层，并分别对应进行曝光显影形成色阻单元层的步骤；以及，在第一色阻层、第二色阻层及第三色阻层进行曝光显影中至少一次 曝光显影形成所述凸起的步骤。
  8. 如权利要求7所述的彩膜基板的制造方法，其特征在于，所述在第一色阻、第二色阻及第三色阻进行曝光显影中至少一次曝光显影形成所述凸起的步骤中包括，第一色阻曝光显影后形成凸起或者第一色阻层及第二色层阻曝光显影后叠加形成凸起，或者第一色阻层、第二色阻层及第三色阻层三种色阻曝光显影后叠加形成凸起。
  9. 如权利要求7所述的彩膜基板的制造方法，其特征在于，所述彩膜基板的制造方法还包括在所述基体上位于色阻单元层上方形成数个支撑物的步骤。
  10. 一种液晶面板，其包括阵列基板及与阵列基板相对设置的彩膜基板，所述彩膜基板包括基体、黑矩阵层、色阻单元层、公共电极层，所述黑矩阵层及色阻单元层形成于所述基体的同一表面上，所述公共电极层覆盖所述色阻单元层，其特征在于，所述彩膜基板上位于所述基体周缘还设有胶框，所述胶框内嵌设有凸起，所述凸起为色阻单元层被图案化时形成；所述阵列基板与所述彩膜基板固定并将所述胶框夹持形成以空腔，用于收容液晶。
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