Classifications

• • G—PHYSICS
  • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
  • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
  • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
  • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
• • G—PHYSICS
  • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
  • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
  • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
  • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
  • G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
• • G—PHYSICS
  • G01—MEASURING; TESTING
  • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
  • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
  • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
  • G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
  • G01N23/083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
• • G—PHYSICS
  • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
  • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
  • G21K2201/00—Arrangements for handling radiation or particles
  • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
  • G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal

Definitions

• New techniques for converging X-rays are described. These techniques can be used for the design of an X-ray lens for the converging of X-rays into a focal point or a focal volume using a point source or an extended source.
• the aim of this design is to add important new features over those of the previous suggested patented device.
• the additional features are to provide control of the size and shape of the focal volume, the beam shape, uniformity and quality, and ease of manufacturing.
• Converging X-rays are used in two main fields: Radiotherapy/ Radio-surgery and imaging, but one can find other uses as well.
• the means of converging X-rays are described below as well as the structure of an X-ray converging lens.
• the main idea of this invention is to describe the additional techniques by which such a lens can be manifested in an easier way with better control of the treated volume without harming the surrounding area.
• Ionizing radiation equipment for the use of Radiotherapy and Radio surgery of today are mainly the Linear accelerator (LINAC), proton therapy and radioactive source devices like Gama knife. These devices are being used mainly to cure cancer.
• LINAC Linear accelerator
• Today's existing X-ray equipment use X-ray sources that generate diverging beams. In cases where a narrow beam is needed, the techniques to narrow the beam are done by means of collimation that blocks the beam to create the desired shape. As a result only a thin portion of the beam is used with a small fraction of the generated intensity, which becomes weaker and weaker as the beam progresses. That is why to produce an effective treatment one has to rotate these instruments from many angles around the body.
• the present invention shows an additional way to manufacture a converging X-Rays lens that converges X-Rays to a point or to a volume, where the source can be a point source or an extended source.
• the construction presented here utilizes new methods and principles that have advantages in improved methods of controlling the beam shape, size and uniformity, the beam quality, the focal region shape and size and the simplicity of manufacturing.
• the present invention manifests these ideas in a new simple easy manufacturing way using tiles arranged in a way that allow the deviating from the Roland shape and Johansson and Johann theory due to additional features and considerations as to control the volume and shape of the focal region and to optimize the energy collection efficiency from the source.
• Another object of the invention is to disclose the said X-ray system wherein the lens system consists of single crystal tiles whose tile reflecting surface may be adjusted individually on each tile and/or a group of tiles.
• Another object of the invention is to disclose the said X-ray system wherein the lens system consists of planar single crystal tiles.
• Another object of the invention is to disclose the said X-ray system wherein the lens system consists of part of rings, complete rings, conical rings, barrel shaped rings and any combination thereof.
• Another object of the invention is to disclose the said X-ray system wherein the lens system comprises concentric reflecting rings, coaxial reflecting rings, non-concentric reflecting rings, non-coaxial reflecting rings, and any combination thereof.
• Another object of the invention is to disclose the said X-ray system wherein the lens system comprises symmetrical structures, asymmetrical structures and any combination thereof.
• symmetrical structure we mean the longitudinal midpoints of the rings are half way between the source and the focal region,
• Another object of the invention is to disclose the said X-ray system wherein the lens system
• reflecting rings having tilted longitudinal cross-section, non tilted longitudinal cross- section and any combination thereof.
• Another object of the invention is to disclose the said X-ray system wherein the lens system
• reflecting rings having off-cut angle between the reflecting surface and the desired crystallographic planes , zero degrees and/or different than zero degrees and any combination thereof.
• Another object of the invention is to disclose the said X-ray system wherein the lens system comprises reflecting rings whose longitudinal midpoints are located on Roland circles with the appropriate tilt and off-cut angle in each ring to match the Johansson theory or Johan theory.
• Another object of the invention is to disclose the said X-ray system wherein the lens system comprises reflecting rings whose longitudinal midpoints deviate from Roland circles and/or tile tilts deviate from the Johansson theory and/or Johan theory and/or off-cut angle deviates from the Johansson theory and/or Johan theory and any combination thereof.
• Fig. 1 is a 3 dimensional schematic diagram of an X-ray lens with an example of concentric rings construction.
• Fig. 2a is a 3 dimensional schematic diagram showing several rings in a non concentric arranged in a coaxial structure.
• Fig. 2b is a 3 dimensional schematic diagram showing several rings in a non concentric and non coaxial structure.
• Fig 3 shows a 3 dimensional schematic structure of rings constructed from small single crystal tiles with a magnified description of a single tile.
• Fig. 4a shows a schematic diagram of the cross-section of a general single crystal tile with the internal structure and orientation of the desired crystallographic planes relative to the tile reflecting surface, making an angle between the crystallographic planes and the reflecting surface of the tile .
• Fig. 4b shows a schematic diagram of the special case of the cross-section of a single crystal tile where the internal orientation of the desired crystallographic planes are parallel to the tile reflecting surface.
• Fig. 4c shows a schematic diagram demonstrating a tilt angle of a tile forming rings whose
• longitudinal cross-section form tilted cuts relative to the optical axis.
• Fig. 5a shows a schematic diagram of a two dimensional longitudinal cut of tiles from 4 rings located on an approximate structure of Roland circles whose reflecting surfaces are grinded and polished according to the Johann or Johansson theory - making a relatively small focal region.
• Fig. 5b shows a schematic diagram of a two dimensional longitudinal cut of tiles from 4 rings located on a structure deviating from Roland circles and or the Johann or Johansson theory - making a relatively large focal region.
• symmetric structure refers to a ring whose rotational center is on the optical axis and whose longitudinal midpoint is half way from the source to the focal region.
• the term "longitudinal midpoint” refers to the longitudinal middle point of a tile and/or a ring.
• the term “off-cut angle” refers to the angle between the crystal reflecting surface (31) and the desired crystallographic plane (32) - see ⁇ in figure 4.
• coaxial refers to rings that share a common axis but not necessarily located inside one another.
• tilt angle refers to the angle between the reflecting surface (31) and the optical axis (100) - see a in figure 4c.
• FIG. 1 schematically illustrating a lens system with an example of a structure of concentric rings.
• An X-ray source (13) emits diverging X-rays (11) that enters the lens (10) made of concentric rings (Numbered examples are the outer rings 15a and 15b).
• the rings reflect X-Rays in a converging manner (12) to a focal location (14).
• FIG. 1 shows rings assembled in a coaxial structure (20a) relative to their rotational axis (101).
• Figure 2b shows example of a structure of rings (20b) assembled in a non coaxial and non concentric structure.
• Ring 21 is located in a non coaxial manner whose rotational axis (102) does not coincide with the rotational axis of the other rings (101).
• Ring (22) is an example of a ring whose reflecting surface longitudinal profile is tilted relative to its rotational axis (101). All rotational axes might be parallel and/or coincide or not parallel and/or not coincide to the optical axis (100).
• FIG. 3 schematically illustrating a lens system (10) whose rings are made of tiles.
• a magnified illustration of a tile (30) is shown as well.
• L is the longitudinal dimension parallel to the optical axis (100)
• t is the tile thickness
• w is the tile width whose direction is transversal to the optical axis (100).
• Figure 4-a schematically illustrates a longitudinal cross section along the L direction of a single tile.
• the direction of the cross section of the desired crystallographic planes (32) forms an angle ⁇ with the reflecting surface of the tile (31).
• the longitudinal midpoint (18) of a tile is located at the longitudinal middle (172) of the tile.
• Figure 4-c shows a tilted tile that forms a tilted longitudinal ring profile like the one mentioned in figure 2b (Ring 22). The tilt angle is a in the figure relative to the optical axis (100).
• FIG. 5a schematically illustrating a diagram of a two dimensional longitudinal cut of tiles from 4 rings located on an approximate structure of Roland circles.
• Tiles 15a and 15b are concentric in a symmetric structure with longitudinal midpoint (18) half way between the source (13) and the focal region (14a).
• Tiles 15a, 16a and 17a are coaxial in this example.
• This configuration is an example of a lens configured to form the smallest focal region possible with the particular tiles.
• the rings In order to have the smallest focal region possible the rings have to be assembled to form structures where the longitudinal midpoints are located on the appropriate Roland circles.
• the tiles reflecting surface are tiled in an angle a so as to be tangent to the Roland circle at their longitudinal midpoint and their off-cut angle ⁇ is obtained by grinding the single crystal tiles according to the Johansson or Johann theory calculated at the longitudinal midpoints (18) locations of the tiles on the Roland circle.
• the midpoints (18) of tiles 16a and 17a in this example are located at a different distance to the source (13) than the distance to the targeted location (14a), in this example closer to the target (14a). However in is possible to locate them closer to the source (13).
• FIG. 5b schematically illustrating a diagram of a two dimensional longitudinal cut of tiles from 4 rings made of tiles, where the structure of tiles are deviated from the Roland circles structures and the Johansson and Johann theory.
• Tiles may poses only an off- cut angle and not be tilted.
• the ring 16b is drawn parallel to the optical axis (100) as an extension to ring 15a (originally parallel), and the only difference between them is the off-cut angle ⁇ which is 0 in 15a and different from 0 in 16b.
• Tiles may be only tilted with no off-cut angle. Longitudinal midpoints of the tiles may be located at different radii than those related to the Roland circles. Any combination of radii, tilt angles, off -cut angles may be employed according to the consideration described below.
• the location of the tiles, their dimensions - length width and thickness, as well as their tilt and/or off-cut angles are designed to control the following:
• Tile sizes also controls the energy spectral width and values on the spectrum emitted by the source, for example at the neighborhood of the Ka location of a tungsten spectrum one may control the spectral width to determine whether to include K l and Ka2 or even ⁇ characteristic radiation or not, thus controlling beam quality.
• Adjusting mechanism may be employed for the adjustment of individual tiles, adjusting each single tile, or a group of tiles.

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• Physics & Mathematics (AREA)
• Spectroscopy & Molecular Physics (AREA)
• Engineering & Computer Science (AREA)
• General Engineering & Computer Science (AREA)
• High Energy & Nuclear Physics (AREA)
• Health & Medical Sciences (AREA)
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• Life Sciences & Earth Sciences (AREA)
• Chemical & Material Sciences (AREA)
• Analytical Chemistry (AREA)
• Biochemistry (AREA)
• General Health & Medical Sciences (AREA)
• General Physics & Mathematics (AREA)
• Immunology (AREA)
• Pathology (AREA)
• Analysing Materials By The Use Of Radiation (AREA)
• Lenses (AREA)

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• 2015
  • 2015-12-29 WO PCT/IL2015/051265 patent/WO2016108235A1/en not_active Ceased
• 2017
  • 2017-06-30 US US15/639,315 patent/US20180033513A1/en not_active Abandoned
• 2018
  • 2018-06-28 IL IL271756A patent/IL271756B2/en unknown
  • 2018-06-28 JP JP2020521637A patent/JP2020527240A/ja active Pending
  • 2018-06-28 CN CN201880055518.1A patent/CN111247604B/zh active Active
  • 2018-06-28 WO PCT/IL2018/050708 patent/WO2019003229A1/en not_active Ceased
  • 2018-06-28 EP EP18823905.7A patent/EP3646346A4/en active Pending

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