WO2016106798A1 - 光阻涂布设备及光阻涂布方法 - Google Patents

光阻涂布设备及光阻涂布方法 Download PDF

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Publication number
WO2016106798A1
WO2016106798A1 PCT/CN2015/070272 CN2015070272W WO2016106798A1 WO 2016106798 A1 WO2016106798 A1 WO 2016106798A1 CN 2015070272 W CN2015070272 W CN 2015070272W WO 2016106798 A1 WO2016106798 A1 WO 2016106798A1
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WIPO (PCT)
Prior art keywords
nozzle
substrate
controller
change curve
gap change
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PCT/CN2015/070272
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English (en)
French (fr)
Inventor
王松
林佳龙
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/435,703 priority Critical patent/US20160349718A1/en
Publication of WO2016106798A1 publication Critical patent/WO2016106798A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B15/00—Systems controlled by a computer
    • G05B15/02—Systems controlled by a computer electric
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/04—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation
    • B05B13/0405—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads
    • B05B13/041—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work the spray heads being moved during spraying operation with reciprocating or oscillating spray heads with spray heads reciprocating along a straight line
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/70—Arrangements for moving spray heads automatically to or from the working position
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B05C11/1018—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to distance of target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets

Definitions

  • the present invention relates to a coating apparatus and a coating method, and more particularly to a photoresist coating apparatus for coating a photoresist material and a photoresist coating method thereof.
  • the substrate Before the photoresist coating on the panel, the substrate includes different pattern shapes in which the seed film layers are stacked, and the heights may vary from place to place.
  • the slit coating (slit coating) method is mostly used, and the basic structure is a substrate stage and a slit nozzle across the substrate, and the slit nozzle moves in the vertical direction along the crossing direction.
  • the nozzle applies a material such as photoresist to the substrate according to the set pressure, speed and gap parameters.
  • the gap is a fixed value and does not change during the coating process.
  • the shape of the multilayer stack is formed on the substrate before coating, the surface of the substrate is not flat, so that after coating in a slit coating manner, the film thickness of the photoresist is not uniform, thereby affecting the performance of the liquid crystal display device.
  • the technical problem to be solved by the present invention is to provide a photoresist coating device for coating a photoresist material and a photoresist coating method thereof, which can make the film thickness after coating uniform and uniform, and contribute to the liquid crystal display device. Performance improvement.
  • the present invention provides a photoresist coating apparatus for coating a film layer on a substrate, the photoresist coating apparatus comprising a stage, a nozzle, a nozzle driving device, a detecting device, and a controller, Base a plate is placed on the table, the nozzle driving device is configured to drive the nozzle to move over a substrate on the table, the nozzle spans the substrate, the detecting device spans the substrate and Parallel to the nozzle, the detecting device is configured to detect a change in the surface roughness of the substrate and calculate a gap change curve between the nozzle and the substrate, and the controller calculates the gap according to the detecting device
  • the variation curve controls the nozzle driving device such that the nozzle driving device drives the nozzle to move, and adjusts a vertical distance between the nozzle and the substrate according to the gap variation curve.
  • the detecting device is a reflective laser detector
  • the detecting device comprises a transmitter, a receiver and a computing unit
  • the transmitter and the receiver are both disposed above the working table and used for transmitting A laser beam is received, the laser beam traversing the substrate, and the detecting device completes scanning of the substrate during movement from one side of the table to the opposite side.
  • the controller includes an averaging unit, and the averaging unit calculates an average value of gaps between the nozzles and the substrate according to the gap change curve, and the controller sends the average value to the A nozzle driving device that positions the nozzle such that a vertical distance between the nozzle and the substrate is equal to the average value.
  • the controller further includes a curve correction unit and a detection unit, wherein the detection unit is configured to detect a fluctuation condition of the gap change curve, when the sudden change of the gap change curve is detected, The curve correcting unit corrects the gap change curve such that the position of the sudden undulation is smoothed, and the controller operates the nozzle driving device according to the corrected gap change curve.
  • the controller further includes an alarm unit, when the detecting unit detects that a difference between a highest point or a lowest point of the gap change curve and the average value exceeds a predetermined range, Alarm unit.
  • the present invention provides a photoresist coating method comprising: detecting a surface irregularity fluctuation of a substrate by using a detecting device; calculating a gap change curve between the nozzle and the substrate by the detecting device; Receiving the gap change curve information and controlling the operation of the nozzle driving device; the nozzle driving device drives the nozzle to move, and adjusts a vertical distance between the nozzle and the substrate according to the gap change curve.
  • the detecting device is a reflective laser detector
  • the detecting device comprises a transmitter, a receiver and a computing unit
  • the transmitter and the receiver are both disposed above the working table and used for transmitting Receiving a laser beam that traverses the substrate, the detection device moving from one side of the table Scanning of the substrate is completed during the process to the opposite side.
  • the method further includes the following steps: calculating, by the mean unit in the controller, the An average of the gaps between the nozzles and the substrate; the controller transmits the average to the nozzle driving device; and the nozzle driving device positions the nozzles such that the nozzles The vertical distance between the substrates is equal to the average.
  • the method further includes the following steps: detecting, by the detecting unit of the controller, the fluctuation of the gap variation curve, When the sudden change of the gap change curve is detected, the gap change curve is corrected by the curve correction unit of the controller, so that the position of the sudden fluctuation is smoothed, and the controller is based on the corrected The gap change curve manipulates the nozzle drive.
  • the alarm unit in the controller is activated when the detecting unit detects that the difference between the highest point or the lowest point of the gap change curve and the average value exceeds a predetermined range.
  • the detecting device is configured to detect a change in the surface roughness of the substrate and calculate a gap change curve between the nozzle and the substrate, and the controller controls the gap change curve calculated according to the detecting device
  • the nozzle driving device causes the nozzle driving device to drive the nozzle to move, and adjust a vertical distance between the nozzle and the substrate according to the gap variation curve, so that a nozzle can be ensured during coating
  • the vertical distance between the substrates and the substrate is kept uniform, so that the thickness of the coated film layer is uniform, providing the performance of the liquid crystal display device.
  • FIG. 1 is a schematic view of a photoresist coating apparatus according to an embodiment of the present invention.
  • FIG. 2 is a schematic view of a side surface of the photoresist coating apparatus shown in FIG. 1.
  • FIG. 3 is a schematic view of a detecting device of the photoresist coating apparatus shown in FIG. 1 detecting a substrate.
  • FIG. 4 is a schematic diagram of a gap variation curve obtained by the apparatus for detecting a photoresist coating provided by an embodiment of the present invention, which includes a gap change curve before correction by a correction unit and a gap change curve after correction.
  • the photoresist coating apparatus provided by the embodiment of the present invention is used to coat a film layer on the substrate 10.
  • the photoresist coating apparatus includes a table 20, a nozzle 30, a nozzle driving device (not shown), a detecting device 50, and a controller (not shown).
  • the substrate 10 is placed on the table 20.
  • the nozzle driving device is configured to drive the nozzle 30 to move over the substrate 10 on the table 20, the nozzle 30 spanning the substrate 10, specifically, the nozzle 30 spans the entire table 20, working
  • the size of the stage 20 is larger than the size of the substrate 10, so that the table 20 can be adapted to the substrate 10 of different sizes.
  • the detecting device 50 spans the substrate 10 and is parallel to the nozzle 30.
  • the nozzle 30 is a slit coating head, and is coated with a line across the substrate 10, and the detecting device 50 is parallel to the nozzle 30.
  • the detecting device 50 also detects a line on the substrate 10, so that the detecting device 50 moves the one end of the multi-substrate 10 to the other end to complete the detection of the entire substrate 10.
  • different pattern shapes formed by stacking a plurality of film layers on the substrate 10 may be different in height, that is, a varying surface of the substrate 10 is formed with irregularities.
  • the detecting device 50 is configured to detect a change in the surface roughness of the substrate 10, and calculate a gap change curve between the nozzle 30 and the substrate 10.
  • the controller controls the nozzle driving device according to the gap variation curve calculated by the detecting device 50, so that the nozzle driving device drives the nozzle 30 to move, and adjusts the nozzle 30 according to the gap variation curve.
  • the nozzle driving device can provide control of the movement, rise and fall of the nozzle 30, and can adjust the distance between the nozzle 30 and the substrate 10 while driving the nozzle 30 to move forward.
  • the photoresist coating apparatus of the present invention passes the "detection device 50 for detecting the unevenness of the surface of the substrate 10 and calculates a gap change curve between the nozzle 30 and the substrate 10, the control
  • the nozzle driving device is controlled according to the gap change curve calculated by the detecting device 50, so that the nozzle driving device drives the nozzle 30 to move, and the nozzle 30 is adjusted according to the gap change curve.
  • the design of the vertical distance between the substrates 10 can ensure that the vertical distance between the nozzles 30 and the substrate 10 is consistent during the coating process, so that the thickness of the coated film layer is uniform, and the liquid crystal display device is provided. Performance.
  • the detecting device 50 is a reflective laser detector. As shown in FIG. 3, an arrow between the detecting device 50 and the substrate 10 in FIG. 3 indicates light, and the detecting device 50 includes a transmitter and a receiver. And a computing unit, the transmitter and the receiver are both disposed above the table 20 and configured to transmit and receive a laser beam, the laser beam traversing the substrate 10, and the detecting device 50 is from the workbench The scanning of the substrate 10 is completed during the movement of one side of the 20 to the opposite side.
  • the detecting device 50 may also be a distance detector disposed at the same height above the table 20 as the head, so that the vertical distance between the position of the head and the substrate 10 can be detected, and formed thereon. Gap curve.
  • the controller includes an averaging unit, and the averaging unit calculates an average value of a gap between the nozzle 30 and the substrate 10 according to the gap change curve, and the controller The average value is sent to the nozzle drive, which positions the nozzle 30 such that the vertical distance between the nozzle 30 and the substrate 10 is equal to the average.
  • the averaging unit may take a plurality of points on the gap change curve, may take a random point, or average the gap change curve, and take one or more points in each segment.
  • the controller further includes a curve correction unit and a detection unit, wherein the detection unit is configured to detect a fluctuation condition of the gap change curve, and when the sudden change of the gap change curve is detected, The curve correction unit corrects the gap variation curve such that the position of the sudden fluctuation is smoothed, and the controller manipulates the nozzle driving device according to the corrected gap variation curve.
  • the embodiment is directed to a position where the surface of the substrate 10 is undulating, for example, at a position where the film layer is on the interface of the substrate 10, the film layer stack generates a significant height difference on the surface of the substrate 10, and the gap change curve at such a position may be abrupt.
  • the nozzle 30 also rises or falls with such a sudden change curve, causing coating abnormality, for example, causing severe film unevenness and mura phenomenon.
  • the correction unit sets a slow adjustment after a certain distance before the detected higher position, and spreads the gap value to be adjusted to a certain distance. Instead of The point of high and low undulations suddenly changes.
  • FIG. 4 includes a schematic diagram of the detected height change and a calculated gap change.
  • the gap here refers to the gap between the nozzle and the substrate.
  • the detection height change diagram is the actual height change detected, where the A position is a sudden undulation.
  • the calculated gap change diagram is the corrected gap change curve, where the A' position is the gap change curve after the curve of the detected A position is corrected. Controlling the nozzle with the corrected gap change curve can make the adjustment of the nozzle relatively gentle and ensure the coating quality.
  • the controller further includes an alarm unit, when the detecting unit detects that the difference between the highest point or the lowest point of the gap change curve and the average value exceeds a predetermined range , the alarm unit is activated.
  • a predetermined range can be regarded as a safe range to ensure the quality of the coating.
  • an alarm is issued. Manual adjustment by the staff.
  • the present invention also provides a photoresist coating method, comprising: detecting a surface irregularity change of the substrate 10 by using the detecting device 50; calculating a gap change curve between the nozzle 30 and the substrate 10 by the detecting device 50; The device receives the gap change curve information and controls the operation of the nozzle driving device; the nozzle driving device drives the nozzle 30 to move, and adjusts a vertical distance between the nozzle 30 and the substrate 10 according to the gap change curve.
  • the detecting device 50 is a reflective laser detector, and the detecting device 50 includes a transmitter, a receiver and a computing unit, and the transmitter and the receiver are both disposed at the Above the table 20 for transmitting and receiving a laser beam, the laser beam traversing the substrate 10, and the detecting device 50 is completed from the side of the table 20 to the opposite side. The scanning of the substrate 10 is described.
  • the method further includes the following steps: calculating an average unit in the controller according to the gap change curve An average value of the gaps between the nozzles 30 and the substrate 10; the controller transmits the average value to the nozzle driving device; and the nozzle driving device positions the nozzles 30 such that The vertical distance between the nozzle 30 and the substrate 10 is equal to the average value.
  • the method further includes the following steps: detecting, by the detecting unit of the controller, the fluctuation of the gap variation curve
  • the gap change curve is corrected by the curve correction unit of the controller, so that the position of the sudden fluctuation is smoothed, and the controller is corrected according to the situation.
  • the gap change curve manipulates the nozzle drive.
  • the alarm unit in the controller is activated.
  • the vertical distance between the nozzle 30 and the substrate 10 can be kept consistent during the coating process, so that the thickness of the coated film layer is uniform and uniform, and the performance of the liquid crystal display device is provided. .

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Coating Apparatus (AREA)
  • General Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
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Abstract

一种光阻涂布设备和涂布方法。该设备包括工作台(20)、喷嘴(30)、喷嘴驱动装置、检测装置(50)及控制器，待涂布的基板(10)放置于工作台(20)上，喷嘴驱动装置用于驱动喷嘴(30)在基板(10)上方移动，喷嘴(30)横跨基板(10)，检测装置(50)横跨基板(10)且平行于喷嘴(30)，检测装置(50)用于检测基板(10)表面凹凸起伏变化并计算出喷嘴(30)与基板(10)之间的间隙变化曲线，控制器根据间隙变化曲线控制喷嘴驱动装置，使得喷嘴驱动装置带动喷嘴(30)移动，且按照间隙变化曲线调整喷嘴(30)与基板(10)之间的垂直距离。涂布方法能够使涂布后的膜厚均匀一致。

Description

光阻涂布设备及光阻涂布方法
本发明要求2014年12月29日递交的发明名称为“光阻涂布设备及光阻涂布方法”的申请号201410836654.8的在先申请优先权，上述在先申请的内容以引入的方式并入本文本中。
技术领域
本发明涉及一种涂布设备和涂布方法，尤其涉及一种用于涂布光阻材料的光阻涂布设备及其光阻涂布方法。
背景技术
在面板上进行光阻涂布前，基板上包括种膜层堆叠成的不同pattern形状，各处高低会有不同。目前使用较多的是slit涂布(狭缝涂布)方式，其基本结构为基板的载台及横跨基板的狭缝式喷嘴，在狭缝喷嘴沿横跨方向的垂直方向移动过程中，喷嘴按照设定的压力、速度及gap等参数将光阻等材料涂布与基板上，但涂布过程中，其gap为一个固定值，涂布过程中不会变化。由于涂布前基板上就包括多层堆叠的形状导致基板表面不是平坦的，这样以slit涂布的方式涂布后，光阻的膜厚不均匀，从而会影响液晶显示器件的性能。
发明内容
本发明所要解决的技术问题在于提供一种用于涂布光阻材料的光阻涂布设备及其光阻涂布方法，能够使得涂布后的膜厚均匀一致，有助于液晶显示器件的性能的提升。
为了实现上述目的，本发明实施方式提供如下技术方案：
一方面，本发明提供了一种光阻涂布设备，用于在基板上涂布膜层，所述光阻涂布设备包括工作台、喷嘴、喷嘴驱动装置、检测装置及控制器，所述基 板放置于所述工作台上，所述喷嘴驱动装置用于驱动所述喷嘴在所述工作台上的基板上方移动，所述喷嘴横跨所述基板，所述检测装置横跨所述基板且平行于所述喷嘴，所述检测装置用于检测所述基板表面凹凸起伏变化并计算出所述喷嘴与基板之间的间隙变化曲线，所述控制器根据所述检测装置计算出的所述间隙变化曲线控制所述喷嘴驱动装置，使得所述喷嘴驱动装置带动所述喷嘴移动，且按照所述间隙变化曲线调整所述喷嘴与所述基板之间的垂直距离。
其中，所述检测装置为反射式激光侦测器，所述检测装置包括发射器、接收器和计算单元，所述发射器和所述接收器均设于所述工作台的上方且用于发射接收激光束，所述激光束横跨基板，所述检测装置从所述工作台的一侧移动到相对的另一侧的过程中完成对所述基板的扫描。
其中，所述控制器包括均值单元，所述均值单元依据所述间隙变化曲线计算出所述喷嘴与所述基板之间各点间隙的平均值，所述控制器将所述平均值发送给所述喷嘴驱动装置，所述喷嘴驱动装置将所述喷嘴定位，使得所述喷嘴与所述基板之间的垂直距离等于所述平均值。
其中，所述控制器还包括曲线修正单元和侦测单元，所述侦测单元用于侦测所述间隙变化曲线的起伏状况，当侦测到所述间隙变化曲线突然起伏状况时，所述曲线修正单元修正所述间隙变化曲线，使得所述突然起伏的位置处平缓化，所述控制器依据修正后的所述间隙变化曲线操纵所述喷嘴驱动装置。
其中，所述控制器还包括报警单元，当所述侦测单元侦测到所述间隙变化曲线的最高点或最低点与所述平均值之间的差超过一个预定的范围时，启动所述报警单元。
另一方面，本发明还提供一种光阻涂布方法，包括：利用检测装置检测基板的表面凹凸起伏变化；通过所述检测装置计算所述喷嘴与基板之间的间隙变化曲线；通过控制器接收所述间隙变化曲线信息并控制喷嘴驱动装置工作；所述喷嘴驱动装置带动所述喷嘴移动，且按照所述间隙变化曲线调整所述喷嘴与所述基板之间的垂直距离。
其中，所述检测装置为反射式激光侦测器，所述检测装置包括发射器、接收器和计算单元，所述发射器和所述接收器均设于所述工作台的上方且用于发射接收激光束，所述激光束横跨基板，所述检测装置从所述工作台的一侧移动 到相对的另一侧的过程中完成对所述基板的扫描。
其中，通过控制器接收所述间隙变化曲线信息之后，且在所述控制器控制喷嘴驱动装置工作之前，还包括如下步骤：所述控制器中的均值单元依据所述间隙变化曲线计算出所述喷嘴与所述基板之间各点间隙的平均值；所述控制器将所述平均值发送给所述喷嘴驱动装置；及所述喷嘴驱动装置将所述喷嘴定位，使得所述喷嘴与所述基板之间的垂直距离等于所述平均值。
其中，所述控制器计算出所述喷嘴与所述基板之间各点间隙的平均值后，还包括如下步骤：通过所述控制器的侦测单元侦测所述间隙变化曲线的起伏状况，当侦测到所述间隙变化曲线突然起伏状况时，利用所述控制器的曲线修正单元修正所述间隙变化曲线，使得所述突然起伏的位置处平缓化，所述控制器依据修正后的所述间隙变化曲线操纵所述喷嘴驱动装置。
其中，当所述侦测单元侦测到所述间隙变化曲线的最高点或最低点与所述平均值之间的差超过一个预定的范围时，启动所述控制器中的报警单元。
本发明通过所述检测装置用于检测所述基板表面凹凸起伏变化并计算出所述喷嘴与基板之间的间隙变化曲线，所述控制器根据所述检测装置计算出的所述间隙变化曲线控制所述喷嘴驱动装置，使得所述喷嘴驱动装置带动所述喷嘴移动，且按照所述间隙变化曲线调整所述喷嘴与所述基板之间的垂直距离，这样在涂布的过程中，能够保证喷嘴与基板之间的垂直距离保持一致，从而使得涂布的膜层的厚度均匀一致，提供了液晶显示器件的性能。
附图说明
为了更清楚地说明本发明的技术方案，下面将对实施方式中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施方式，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以如这些附图获得其他的附图。
图1是本发明一种实施方式提供的光阻涂布设备的示意图。
图2是图1所示的光阻涂布设备的侧面的示意图。
图3是图1所示的光阻涂布设备的检测装置检测基板的示意图。
图4是本发明一种实施方式提供的光阻涂布设置之检测装置计算所得到的间隙变化曲线的示意图，其中包括通过修正单元修正之前的间隙变化曲线和修正之后的间隙变化曲线。
具体实施方式
下面将结合本发明实施方式中的附图，对本发明实施方式中的技术方案进行清楚、完整地描述。
请参阅图1和图2，图1中的箭头的方向代表喷嘴和检测装置移动的方向。本发明实施方式提供的光阻涂布设备用于在基板10上涂布膜层。所述光阻涂布设备包括工作台20、喷嘴30、喷嘴驱动装置(未图示)、检测装置50及控制器(未图示)。所述基板10放置于所述工作台20上。所述喷嘴驱动装置用于驱动所述喷嘴30在所述工作台20上的基板10上方移动，所述喷嘴30横跨所述基板10，具体而言，喷嘴30横跨整个工作台20，工作台20的尺寸大于基板10的尺寸，以使得工作台20可以适合不同尺寸规格的基板10。所述检测装置50横跨所述基板10且平行于所述喷嘴30，所述喷嘴30为狭缝式的涂布头，同时涂布横跨基板10的一条线，检测装置50平行于喷嘴30，检测装置50也是检测基板10上的一条线，这样检测装置50多基板10的一端移动至另一端就完成了对整块基板10的检测。
在基板10制作工艺中，基板10上会由多种膜层堆叠成的不同pattern形状，各处高低会有不同，也就是在基板10的表面形成了凹凸起伏的变化表面。所述检测装置50用于检测所述基板10表面凹凸起伏变化，并计算出所述喷嘴30与基板10之间的间隙变化曲线。所述控制器根据所述检测装置50计算出的所述间隙变化曲线控制所述喷嘴驱动装置，使得所述喷嘴驱动装置带动所述喷嘴30移动，且按照所述间隙变化曲线调整所述喷嘴30与所述基板10之间的垂直距离。所述喷嘴驱动装置能够提供喷嘴30的移动、升、降的控制，在带动喷嘴30向前移动的同时，能够调节喷嘴30与基板10之间的距离。
本发明的光阻涂布设备通过“所述检测装置50用于检测所述基板10表面凹凸起伏变化并计算出所述喷嘴30与基板10之间的间隙变化曲线，所述控制 器根据所述检测装置50计算出的所述间隙变化曲线控制所述喷嘴驱动装置，使得所述喷嘴驱动装置带动所述喷嘴30移动，且按照所述间隙变化曲线调整所述喷嘴30与所述基板10之间的垂直距离”的设计，在涂布的过程中，能够保证喷嘴30与基板10之间的垂直距离保持一致，从而使得涂布的膜层的厚度均匀一致，提供了液晶显示器件的性能。
具体而言，所述检测装置50为反射式激光侦测器，如图3所示，图3中检测装置50与基板10之间的箭头表示光线，所述检测装置50包括发射器、接收器和计算单元，所述发射器和所述接收器均设于所述工作台20的上方且用于发射接收激光束，所述激光束横跨基板10，所述检测装置50从所述工作台20的一侧移动到相对的另一侧的过程中完成对所述基板10的扫描。其它实施方式中，所述检测装置50也可以为距离检测器，设置在工作台20上方与喷头同样的高度，这样能够检测出喷头所在位置与基板10之间的垂直距离，在此其中上形成间隙变化曲线。
一种实施方式中，所述控制器包括均值单元，所述均值单元依据所述间隙变化曲线计算出所述喷嘴30与所述基板10之间各点间隙的平均值，所述控制器将所述平均值发送给所述喷嘴驱动装置，所述喷嘴驱动装置将所述喷嘴30定位，使得所述喷嘴30与所述基板10之间的垂直距离等于所述平均值。具体而言，均值单元可以在间隙变化曲线上取多个点，可以随机取点，也可以将间隙变化曲线平均分段，每一段中取一个或多个点。
进一步而言，所述控制器还包括曲线修正单元和侦测单元，所述侦测单元用于侦测所述间隙变化曲线的起伏状况，当侦测到所述间隙变化曲线突然起伏状况时，所述曲线修正单元修正所述间隙变化曲线，使得所述突然起伏的位置处平缓化，所述控制器依据修正后的所述间隙变化曲线操纵所述喷嘴驱动装置。本实施方式是针对基板10表面起伏明显的位置，例如在基板10上膜层交界的位置处，膜层堆叠产生基板10表面明显的高度差，这样的位置处的间隙变化曲线会产生突变，若喷嘴30也随着这样突变的曲线升高或降低，会引起涂布异常，例如会造成严重的膜层不均匀，产生mura现象。例如侦测单元侦测到一个较高的位置时，修正单元设定在侦测到的较高位置之前一段距离就开始做缓慢的调整，将所需要调整的间隙值分散到一定的距离范围内，而不是在 高低起伏的点处突然变化。请参阅图4，图4中包括检测高度变化示意图和计算得gap变化示意图，这里的gap就是指喷嘴与基板之间的间隙。检测高度变化示意图就是侦测到的实际高度变化，其中A位置处为突然起伏的位置。计算得gap变化示意图就是修正后的间隙变化曲线，其中A’位置处为将检测出的A位置的曲线修正后的间隙变化曲线。以修正后的间隙变化曲线控制喷嘴能够使喷嘴的调整变得比较平缓，保证涂布质量。
一种实施方式中，所述控制器还包括报警单元，当所述侦测单元侦测到所述间隙变化曲线的最高点或最低点与所述平均值之间的差超过一个预定的范围时，启动所述报警单元。实际操作过程中，按照不同的产品及材料设定不同的预定的范围，这个预定的范围可视为安全范围，以保证涂布的质量，当喷嘴30升降的距离超出安全范围时，发出报警，由工作人员进行手动调整。
本发明还提供一种光阻涂布方法，包括：利用检测装置50检测基板10的表面凹凸起伏变化；通过所述检测装置50计算所述喷嘴30与基板10之间的间隙变化曲线；通过控制器接收所述间隙变化曲线信息并控制喷嘴驱动装置工作；所述喷嘴驱动装置带动所述喷嘴30移动，且按照所述间隙变化曲线调整所述喷嘴30与所述基板10之间的垂直距离。
所述光阻涂布方法中，所述检测装置50为反射式激光侦测器，所述检测装置50包括发射器、接收器和计算单元，所述发射器和所述接收器均设于所述工作台20的上方且用于发射接收激光束，所述激光束横跨基板10，所述检测装置50从所述工作台20的一侧移动到相对的另一侧的过程中完成对所述基板10的扫描。
具体而言，通过控制器接收所述间隙变化曲线信息之后，且在所述控制器控制喷嘴驱动装置工作之前，还包括如下步骤：所述控制器中的均值单元依据所述间隙变化曲线计算出所述喷嘴30与所述基板10之间各点间隙的平均值；所述控制器将所述平均值发送给所述喷嘴驱动装置；及所述喷嘴驱动装置将所述喷嘴30定位，使得所述喷嘴30与所述基板10之间的垂直距离等于所述平均值。
所述控制器计算出所述喷嘴30与所述基板10之间各点间隙的平均值后，还包括如下步骤：通过所述控制器的侦测单元侦测所述间隙变化曲线的起伏状 况，当侦测到所述间隙变化曲线突然起伏状况时，利用所述控制器的曲线修正单元修正所述间隙变化曲线，使得所述突然起伏的位置处平缓化，所述控制器依据修正后的所述间隙变化曲线操纵所述喷嘴驱动装置。
当所述侦测单元侦测到所述间隙变化曲线的最高点或最低点与所述平均值之间的差超过一个预定的范围时，启动所述控制器中的报警单元。
本发明的光阻涂布方法，在涂布的过程中，能够保证喷嘴30与基板10之间的垂直距离保持一致，从而使得涂布的膜层的厚度均匀一致，提供了液晶显示器件的性能。
以上所述是本发明的优选实施方式，应当指出，对于本技术领域的普通技术人员来说，在不脱离本发明原理的前提下，还可以做出若干改进和润饰，这些改进和润饰也视为本发明的保护范围。

Claims (10)

  1. 一种光阻涂布设备，用于在基板上涂布膜层，其特征在于，所述光阻涂布设备包括工作台、喷嘴、喷嘴驱动装置、检测装置及控制器，所述基板放置于所述工作台上，所述喷嘴驱动装置用于驱动所述喷嘴在所述工作台上的基板上方移动，所述喷嘴横跨所述基板，所述检测装置横跨所述基板且平行于所述喷嘴，所述检测装置用于检测所述基板表面凹凸起伏变化并计算出所述喷嘴与基板之间的间隙变化曲线，所述控制器根据所述检测装置计算出的所述间隙变化曲线控制所述喷嘴驱动装置，使得所述喷嘴驱动装置带动所述喷嘴移动，且按照所述间隙变化曲线调整所述喷嘴与所述基板之间的垂直距离。
  2. 如权利要求1所述的光阻涂布设备，其特征在于，所述检测装置为反射式激光侦测器，所述检测装置包括发射器、接收器和计算单元，所述发射器和所述接收器均设于所述工作台的上方且用于发射接收激光束，所述激光束横跨基板，所述检测装置从所述工作台的一侧移动到相对的另一侧的过程中完成对所述基板的扫描。
  3. 如权利要求1所述的光阻涂布设备，其特征在于，所述控制器包括均值单元，所述均值单元依据所述间隙变化曲线计算出所述喷嘴与所述基板之间各点间隙的平均值，所述控制器将所述平均值发送给所述喷嘴驱动装置，所述喷嘴驱动装置将所述喷嘴定位，使得所述喷嘴与所述基板之间的垂直距离等于所述平均值。
  4. 如权利要求3所述的光阻涂布设备，其特征在于，所述控制器还包括曲线修正单元和侦测单元，所述侦测单元用于侦测所述间隙变化曲线的起伏状况，当侦测到所述间隙变化曲线突然起伏状况时，所述曲线修正单元修正所述间隙变化曲线，使得所述突然起伏的位置处平缓化，所述控制器依据修正后的所述间 隙变化曲线操纵所述喷嘴驱动装置。
  5. 如权利要求4所述的光阻涂布设备，其特征在于，所述控制器还包括报警单元，当所述侦测单元侦测到所述间隙变化曲线的最高点或最低点与所述平均值之间的差超过一个预定的范围时，启动所述报警单元。
  6. 一种光阻涂布方法，其特征在于，包括：
    利用检测装置检测基板的表面凹凸起伏变化；
    通过所述检测装置计算所述喷嘴与基板之间的间隙变化曲线；
    通过控制器接收所述间隙变化曲线信息并控制喷嘴驱动装置工作；
    所述喷嘴驱动装置带动所述喷嘴移动，且按照所述间隙变化曲线调整所述喷嘴与所述基板之间的垂直距离。
  7. 如权利要求6所述的光阻涂布方法，其特征在于，所述检测装置为反射式激光侦测器，所述检测装置包括发射器、接收器和计算单元，所述发射器和所述接收器均设于所述工作台的上方且用于发射接收激光束，所述激光束横跨基板，所述检测装置从所述工作台的一侧移动到相对的另一侧的过程中完成对所述基板的扫描。
  8. 如权利要求6所述的光阻涂布方法，其特征在于，通过控制器接收所述间隙变化曲线信息之后，且在所述控制器控制喷嘴驱动装置工作之前，还包括如下步骤：所述控制器中的均值单元依据所述间隙变化曲线计算出所述喷嘴与所述基板之间各点间隙的平均值；所述控制器将所述平均值发送给所述喷嘴驱动装置；及所述喷嘴驱动装置将所述喷嘴定位，使得所述喷嘴与所述基板之间的垂直距离等于所述平均值。
  9. 如权利要求8所述的光阻涂布方法，其特征在于，所述控制器计算出所述喷嘴与所述基板之间各点间隙的平均值后，还包括如下步骤：通过所述控制器的侦测单元侦测所述间隙变化曲线的起伏状况，当侦测到所述间隙变化曲线突然 起伏状况时，利用所述控制器的曲线修正单元修正所述间隙变化曲线，使得所述突然起伏的位置处平缓化，所述控制器依据修正后的所述间隙变化曲线操纵所述喷嘴驱动装置。
  10. 如权利要求9所述的光阻涂布方法，其特征在于，当所述侦测单元侦测到所述间隙变化曲线的最高点或最低点与所述平均值之间的差超过一个预定的范围时，启动所述控制器中的报警单元。
PCT/CN2015/070272 2014-12-29 2015-01-07 光阻涂布设备及光阻涂布方法 Ceased WO2016106798A1 (zh)

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CN108170004A (zh) * 2017-12-27 2018-06-15 深圳市华星光电技术有限公司 光阻实时检测装置、光阻实时检测方法及光阻涂布设备
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CN112221891A (zh) * 2020-09-11 2021-01-15 衡阳华灏新材料科技有限公司 一种cof基板用步进式试验型涂布方法

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