WO2016104223A1 - 波面歪み量測定装置、波面補償装置、光学測定装置、および方法 - Google Patents

波面歪み量測定装置、波面補償装置、光学測定装置、および方法 Download PDF

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WO2016104223A1
WO2016104223A1 PCT/JP2015/084955 JP2015084955W WO2016104223A1 WO 2016104223 A1 WO2016104223 A1 WO 2016104223A1 JP 2015084955 W JP2015084955 W JP 2015084955W WO 2016104223 A1 WO2016104223 A1 WO 2016104223A1
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wavefront
wavefront distortion
light
modulator
distortion amount
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PCT/JP2015/084955
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English (en)
French (fr)
Japanese (ja)
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圭佑 磯部
緑川　克美
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国立研究開発法人理化学研究所
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64—Fluorescence; Phosphorescence
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35—Non-linear optics
    • G02F1/39—Non-linear optics for parametric generation or amplification of light, infrared or ultraviolet waves

Definitions

  • the present invention relates to measurement of wavefront distortion and compensation of wavefront distortion.
  • a wavefront compensator such as a spatial phase modulator may be used to give a wavefront distortion opposite to the wavefront distortion generated inside the sample.
  • the conventional wavefront compensation technology is roughly divided into the following two methods.
  • the first method is a method of measuring wavefront distortion using a wavefront measuring optical system and compensating based on the amount of distortion.
  • a technique using a Shack-Hartmann wavefront sensor Non-Patent Document 1
  • a technique using an interferometer Non-Patent Document 2
  • the second method is a method of searching for an optimal wavefront (Non-Patent Document 3) by repeatedly performing trial and error to determine whether a signal is improved by giving an assumed wavefront without measuring wavefront distortion.
  • the amount of wavefront distortion is measured using light passing through a path different from that of the microscope. Therefore, when a wavefront distortion occurs in the wavefront measurement optical system, or a microscope that is not shared with the wavefront measurement optical system. When wavefront distortion occurs in a portion, the correct amount of wavefront distortion cannot be measured. In addition, since a two-dimensional detector is used to measure the wavefront distortion, if light is scattered inside the sample, it becomes background light and the correct amount of wavefront distortion cannot be measured.
  • the Shack-Hartmann wavefront sensor measures the wavefront using light from a point light source that shines very brightly inside the sample. Therefore, it cannot be used unless there is a bright spot inside the sample.
  • the second method does not require a wavefront measuring optical system, but has the following problems.
  • an object of the present invention is to provide a technique capable of measuring and compensating a wavefront distortion amount accurately and at high speed.
  • the wavefront distortion amount measuring method includes a phase modulation step for changing a phase modulation amount applied to a pupil plane of a lens or a local region of a wavefront modulator disposed at a position conjugate with the pupil plane; A detection step of detecting the intensity of light incident through the wavefront modulator and the lens by a photodetector, and light passing through the local region and other than the local region from a signal obtained from the photodetector An interference component acquisition step of acquiring an interference component of light passing therethrough, and a wavefront distortion amount calculation step of Fourier-transforming the interference component and calculating a phase component of the Fourier-transformed interference component as a wavefront distortion amount.
  • the wavefront modulator Since the wavefront modulator is arranged at the pupil plane of the lens or its conjugate position, the focal plane of the lens and the installation plane of the wavefront modulator have a Fourier transform relationship, and the focal plane of the lens is a real space.
  • the installation surface of the wavefront modulator is a spatial frequency space. Therefore, applying phase modulation to the local region of the wavefront modulator gives delta-function phase modulation only to a narrow spatial frequency band.
  • the intensity distribution of light detected by the photodetector includes an interference component in which light that is not phase-modulated and light that is phase-modulated interfere. By acquiring the intensity distribution by changing the amount of phase modulation applied to the local region of the wavefront modulator, it is possible to extract the interference component. Then, the wavefront distortion amount can be obtained as the phase component of the Fourier transform of the extracted interference component.
  • the acquisition of interference components can be performed by calculation. That is, in the phase modulation step of the present invention, at least three different modulation amounts are given to the local region, and when the at least three different modulation amounts are given to the wavefront modulator in the interference component acquisition step, respectively.
  • the interference component can be calculated by calculation based on at least three intensity distributions. At this time, the modulation amount zero may be included as one of at least three different modulation amounts.
  • an interference component is obtained by calculation from at least three intensity distributions obtained by discretely changing the phase modulation amount.
  • interference components can be acquired by lock-in detection. That is, in the phase modulation step of the present invention, a phase modulation amount given to the local region of the wavefront modulator is periodically changed, and in the interference component acquisition step, a signal output from the photodetector is input.
  • the interference component can be acquired by using a lock-in detector.
  • Interfering components are also modulated at the same frequency by temporally modulating the phase modulation amount. Therefore, the interference component can be obtained by lock-in detection.
  • the light detector can be disposed on the focal plane of the lens to detect the spatial intensity distribution of light incident on the lens from the light source via the wavefront modulator. In this way, it is possible to measure the amount of wavefront distortion of the light emitted from the light source on the photodetector surface.
  • the light detector may be disposed at a position where light generated from the measurement object is imaged via the lens to detect a spatial intensity distribution of the light generated from the measurement object. it can. In this way, it is possible to measure the amount of wavefront distortion on the photodetector surface of the light emitted from the measurement object. Such measurement can be suitably applied to, for example, a wide-field microscope and a telescope.
  • the photodetector is preferably a two-dimensional photodetector such as a CCD camera or a CMOS camera.
  • the detection step includes a signal light detection step of condensing laser light on the measurement object via the lens, and detecting light generated from the measurement object by the light detector, and a laser.
  • a signal intensity distribution acquisition step of scanning light on a measurement object and acquiring a signal intensity distribution can also be configured. In this way, it is possible to measure the amount of wavefront distortion of the laser light on the measurement object. Such a measurement can be suitably applied to a laser scanning microscope.
  • the photodetector is preferably a point photodetector such as a photomultiplier tube or a photodiode.
  • the measurement result also includes phase information of the measurement object. Therefore, the wavefront distortion amount can be measured by excluding the phase information of the measurement object as follows. That is, for each of the first to third local regions of the wavefront modulator, the phase modulation step, the detection step, and the interference component acquisition step are executed to obtain the first to third interference components.
  • the wavefront distortion amount acquisition step the wavefront distortion amount obtained by removing the phase information of the measurement object can be calculated from the phase components of the first to third interference components.
  • the positions of the first to third local regions are preferably as follows. That is, the second local region is a position displaced from the first local region in the first direction, and the third local region is different from the first direction from the first local region. What is necessary is just to set it as the position displaced in the 2nd direction.
  • the first direction and the second direction may be orthogonal to each other.
  • the distance between the first and second local regions and the distance between the second and third local regions are preferably the same minute amount.
  • the phase information of the measurement object is removed from the first and third interference components, and a difference in the wavefront distortion amount in the first direction is obtained.
  • the phase information of the measurement object is removed from the first and second interference components, and the difference in the wavefront distortion amount in the second direction is obtained. From these differences, it is possible to reconstruct the phase information regarding the wavefront distortion from which the phase information of the measurement object is removed.
  • phase modulation step when different local phase modulations are given to the local regions, it is necessary to acquire at least three intensity distributions for each local region, and to acquire a total of nine intensity distributions. I think. However, when the phase modulation amount to be given is zero, the intensity distribution is the same regardless of the position of the local region. Therefore, by including the modulation amount zero in the phase modulation amount to be given to each local region, the acquisition of the intensity distribution is 7 Can be times.
  • the present invention also includes each step of the above-described wavefront distortion amount measurement method, and a wavefront compensation step of applying to the wavefront modulator phase modulation that cancels the wavefront distortion amount acquired in the wavefront distortion amount acquisition step. It can also be regarded as a method.
  • the phase modulation step, the detection step, the interference component acquisition step, and the wavefront distortion amount calculation step in a state where the wavefront distortion amount acquired by the wavefront modulator is applied to the wavefront modulator. It is also preferable to calculate the amount of wavefront distortion and update the amount of phase modulation given to the wavefront modulator in the wavefront compensation step based on the amount of wavefront distortion.
  • One measurement of wavefront distortion may contain errors. Thus, by repeatedly executing the measurement and compensation of the wavefront distortion in this way, more accurate wavefront compensation can be performed.
  • the present invention also includes each step of the above-described wavefront compensation method, and a measurement step of performing measurement using the photodetector in a state where phase modulation that cancels the amount of wavefront distortion is applied to the wavefront modulator. It can also be regarded as an optical measurement method.
  • a photodetector for measuring the amount of wavefront distortion and a photodetector for measuring an object can be shared. As a result, not only the number of components can be reduced, but also light can pass through the same path in the measurement of the wavefront distortion amount and the measurement of the object, so that the wavefront distortion amount can be measured with high accuracy.
  • the present invention is regarded as a wavefront distortion amount measuring device for performing the above-described wavefront distortion measuring method, a compensation optical device for performing the above-described wavefront compensation method, and an optical measuring device for performing the above-described optical measuring method.
  • You can also The present invention also provides a computer program for causing a computer to execute the steps of the wavefront distortion measurement method, the wavefront compensation method, or the optical measurement method, or a computer-readable storage medium in which the computer program is stored non-temporarily. It can also be captured.
  • the present invention it is possible to measure the amount of wavefront distortion at high speed and with high accuracy by a novel method.
  • this wavefront distortion amount measuring method is applied to an optical measurement apparatus, it is not necessary to add a new optical system for measuring the wavefront distortion amount.
  • the wavefront distortion that occurs during measurement can be accurately measured.
  • FIG. 1A is a diagram showing a phase modulation optical system using a wavefront modulator
  • FIGS. 1B and 1C are diagrams for explaining delta function-like phase modulation given to the wavefront modulator.
  • FIG. 2 is a diagram for explaining that the light condensing (left diagram) when the local spatial frequency is phase-modulated is a superposition of the test light (upper right diagram) and the reference light (lower right diagram). is there.
  • FIGS. 3A and 3B are diagrams showing the configuration of an adaptive optics apparatus that performs wavefront distortion measurement processing according to the present invention.
  • FIG. 4 is a flowchart for explaining the flow of wavefront distortion measurement and compensation processing by the adaptive optics apparatus shown in FIGS. FIG.
  • FIG. 5A is a diagram showing a configuration of an adaptive optics device when an interference component is acquired using a lock-in detector
  • FIG. 5B is a flow of wavefront distortion measurement and compensation processing by this device. It is a flowchart explaining these.
  • 6 (A) to 6 (D) are diagrams showing configurations when the wavefront distortion measurement and wavefront compensation method according to the present invention is applied to a laser scanning microscope, a wide-field microscope, a telescope, and a fundus examination apparatus, respectively. is there.
  • FIG. 7 is a flowchart for explaining the flow of wavefront distortion measurement and compensation processing by the apparatus shown in FIGS. 6 (A) to (D).
  • FIG. 8 is a flowchart in the case of repeatedly executing the measurement and compensation processing of the wavefront distortion amount.
  • FIG. 9 is a diagram for explaining an example of the nonlinear optical process.
  • FIG. 10 is a diagram showing a configuration when the wavefront distortion measurement according to the present invention is applied to a nonlinear optical microscope.
  • FIG. 11 is a diagram for explaining the flow of wavefront distortion measurement and compensation processing by the nonlinear optical microscope shown in FIG.
  • FIG. 12A is a diagram showing a device configuration used in an experiment conducted to confirm the principle of wavefront distortion measurement according to the present invention.
  • FIG. 12B is a diagram showing the intensity distribution of laser light obtained by the photodetector when the local spatial frequency is phase-modulated by the spatial phase modulator.
  • FIG. 12C is a diagram showing the amount of wavefront distortion calculated from the intensity distribution shown in FIG. FIG.
  • FIG. 12D is a comparison result of the wavefront distortion measurement result and the wavefront distortion given in the experiment.
  • FIG. 13 is a diagram showing an apparatus configuration when the wavefront distortion measurement according to the invention is applied to a nonlinear optical microscope.
  • FIG. 14A is a diagram illustrating the intensity distribution of the nonlinear signal obtained by the photodetector when the local spatial frequency is phase-modulated by the first wavefront modulator.
  • FIG. 14B shows a comparison result of the wavefront distortion measurement result and the wavefront distortion given in the experiment.
  • FIG. 1A shows a phase modulation optical system using a wavefront modulation element.
  • a spatial phase modulator is disposed on the x c -y c plane, and the x f -y f plane is the focal plane of the lens C.
  • a wavefront modulation element surface such as a spatial phase modulator or a deformable mirror is placed at the exit pupil position (x p -y p plane) of the lens C via the pupil projection lens A and the imaging lens B.
  • the wavefront compensation element surface and the focal plane have a Fourier transform relationship.
  • the wavefront compensation element surface is a spatial frequency space. As shown in FIG.
  • the wavefront compensation device by the wavefront compensation device, the position (x cpr, y cpr) only to provide a phase modulation as regarded as the delta function, position (x cpr, y cpr) to This corresponds to applying phase modulation only to a narrow spatial frequency band of the corresponding center spatial frequency (k prx , k p ry ).
  • the phase modulation function is It is expressed.
  • the focused beam focused by the imaging lens is a beam that is not phase-modulated (a beam having a hole shown in the upper right diagram, a test beam) and a phase-modulated beam (right This can be divided into two types of reference light (shown below).
  • E h (x, y) is an electric field component of the test light
  • E pr (x, y) is an electric field component of the reference light.
  • ⁇ Means a function in the spatial frequency space. Further, ⁇ is a delta function.
  • Equation (3) The intensity distribution at the focal plane is It becomes.
  • * is a complex conjugate.
  • Equation (3) The third term and the fourth term of Equation (3) are the interference components of the test light and the reference light.
  • Equation (3) The intensity distribution in the focal plane of Equation (3) is Fourier transformed as follows.
  • the third and fourth terms in the equation (4) are also interference components of the test light and the reference light.
  • Equations (3) and (4) are both The equation consists of three terms. Therefore, the interference signal can be measured by applying at least three different amounts of phase modulation, and the interference component can be extracted from the three simultaneous equations obtained. For example, as a phase modulation amount, The interference component can be extracted by measuring the intensity distribution of the condensing points and calculating as follows.
  • Expressions (7) and (8) have a Fourier transform relationship, the interference component in the spatial frequency space can be acquired by extracting the interference component in the focal plane and performing the Fourier transform.
  • the phase of equation (8) is The first term on the right side is the wavefront distortion of the test light, and the second term is the offset phase. Therefore, wavefront distortion can be measured from equation (9).
  • At least three intensity distributions on the focal plane are obtained by discretely changing the modulation amount ⁇ m of the delta function phase modulation given to the position (x cpr , y cpr ) of the wavefront modulator.
  • the interference component E h (x, y) E * pr (x, y) between the test light and the reference light can be acquired from these intensity distributions I (x, y, ⁇ m ).
  • the phase modulation amount ⁇ m applied to the wavefront modulator does not necessarily have to be as shown in Equation (6), and may be different.
  • E h (x, y) as an interference component E * pr (x, y) rather than E * h (x, y) E pr (x, y) may be obtained.
  • the interference component can be obtained from the intensity distribution I (x, y, ⁇ m ) when at least three different phase modulation amounts are given.
  • a specific calculation formula for obtaining the interference component varies depending on the phase modulation amount applied to the wavefront modulator.
  • the wavefront distortion amount can be obtained as a phase component after Fourier transform of the interference component.
  • the adaptive optical device 1100 shown in FIG. 3A includes a wavefront modulator 2, a pupil projection lens 3, an imaging lens 4, a lens 5, a two-dimensional photodetector 6, and a control computer 7.
  • the control computer 7 controls the amount of phase modulation given to the wavefront modulator 2 and calculates the amount of wavefront distortion based on the intensity distribution obtained from the two-dimensional photodetector 6.
  • the adaptive optics device 1100 detects light emitted from the light source 1 by the two-dimensional photodetector 6 via the wavefront modulator 2, pupil projection lens 3, imaging lens 4, and lens 5.
  • the light intensity distribution detected by the two-dimensional photodetector 6 is sent to the control computer 7, and the control computer 7 calculates the amount of wavefront distortion.
  • the wavefront modulator 2 is disposed at a position conjugate with the pupil plane of the lens 5. As shown in FIG. 3B, the pupil projection lens 3 and the imaging lens 4 may be omitted, and the wavefront modulator 2 may be disposed near the pupil plane of the lens 5.
  • FIG. 4 is a flowchart showing the flow of processing for measuring the amount of wavefront distortion.
  • the control computer 7 gives the phase modulation ⁇ m only to the position (x cpr , y cpr ) of the wavefront modulator (S101). This corresponds to applying phase modulation only to the spatial frequency (k prx , k p ry ). It is ideal that the phase modulation is applied to the position (x cpr , y cpr ) in a delta function, but in reality, the phase modulation is applied to a local region centered on the position (x cpr , y cpr ). become. In this state, the light intensity distribution Im is acquired by the two-dimensional photodetector 6 (S102).
  • the amount of phase modulation applied to the wavefront modulator 2 is changed, and the acquisition of intensity distribution by the two-dimensional photodetector 6 is repeated M times (loop L1).
  • the number of repetitions M may be three or more.
  • the amount of phase modulation to be given may be arbitrary. However, for example, the following calculation is simplified if the equation (6) is used.
  • the control computer 7 calculates the interference component between the test light and the reference light from the acquired plurality of intensity distributions, for example, according to the equation (7) (S103).
  • the control computer 7 Fourier-transforms the calculated interference component (S104), and calculates the phase as the wavefront distortion amount (S105).
  • step S106 By applying phase modulation for canceling the wavefront distortion amount to the wavefront modulator 2, the wavefront distortion of the light generated from the light source 1 can be compensated (S106). Note that without performing the compensation processing in step S106, the processing may be terminated after the measurement of the amount of wavefront distortion is performed. When compensation processing is not performed, the adaptive optical device 1100 can be regarded as a wavefront distortion amount measuring device. In the flowchart of FIG. 4, step S ⁇ b> 106 is drawn with a dotted line to indicate that step S ⁇ b> 106 can be omitted.
  • the interference component of the test light and the reference light is obtained by calculation from a plurality of intensity distributions obtained by discretely changing the amount of phase modulation given to the wavefront modulator.
  • the interference component E h (x, y) E * pr (x, y) or E * h (x, y) E pr (x, y) can be extracted.
  • equation (3) becomes It becomes.
  • Each of the two-phase lock-in detection signals is It becomes.
  • the interference component E h (x, y) E * pr (x, y) or E * h (x, y) E pr (x, y) can be extracted from the equations (11) and (12). Since two-phase lock-in detection signals can be measured simultaneously, signal measurement may be performed once. The processing after acquiring the interference component is the same as described above.
  • FIG. 5A shows a configuration example of the adaptive optics device 1200 according to this modification.
  • a two-phase lock-in detector 8 is added, and a detection signal of the two-dimensional photodetector 6 is input to the lock-in detector 8.
  • the difference is that a lock-in detection signal is input to the control computer 7.
  • 4A is based on FIG. 3A, but the pupil projection lens 3 and the imaging lens 4 are omitted and the wavefront modulator 2 is replaced with the lens 5 as shown in FIG. It may be arranged near the pupil plane.
  • FIG. 5B is a flowchart showing a flow of processing for measuring the amount of wavefront distortion using the adaptive optical device 1200.
  • the control computer 7 continuously and periodically changes the phase modulation amount ⁇ m applied to the local region of the wavefront modulator 2 at a predetermined frequency f m (S201).
  • it may be changed to a triangular wave or a rectangle other than the sine wave.
  • Detection signals obtained by the two-dimensional photodetector 6 while changing a phase modulation amount phi m is input to a lock-in detector 8, the lock-in detection signals of two phases is obtained by the control computer 7 ( S202).
  • the control computer calculates the interference component between the test light and the reference light from the two-phase lock-in detection signal (S203), Fourier transforms the interference component (S204), and calculates the phase as the amount of wavefront distortion (S205).
  • phase modulation to cancel the wavefront distortion amount to the wavefront modulator 2
  • the wavefront distortion of the light generated from the light source 1 can be compensated (S206).
  • step S206 without performing the compensation process in step S206, the measurement may be performed up to the measurement of the amount of wavefront distortion, and the process may be terminated.
  • the adaptive optics device 1200 can be regarded as a wavefront distortion amount measuring device.
  • step S206 is drawn with a dotted line to indicate that step S206 can be omitted.
  • the interference component is calculated as follows.
  • equation (16) includes the phase information of the sample, in order to acquire the wavefront distortion amount excluding the phase information of the sample, the following is performed.
  • the center spatial frequency to be modulated (k prx , k pry ) is slightly shifted to (k prx + ⁇ k , k pry ) and (k prx , k pry + ⁇ k ), and the phase is acquired in the same manner.
  • the phase modulation function is It becomes.
  • the phase obtained by shifting the center spatial frequency to be modulated is It becomes.
  • FIG. 6A is a diagram showing a configuration of a laser scanning microscope 1300 to which the wavefront distortion measurement and compensation technique described above is applied.
  • the laser scanning microscope 1300 includes a light source 13, a wavefront modulator 14, a pupil projection lens 15, an imaging lens 16, a dichroic mirror 17, a scanner 18, a pupil projection lens 19, an imaging lens 20, an objective lens 21, and a photomultiplier tube. And a point type photodetector 23 such as a photodiode and a control computer 24.
  • the laser light emitted from the light source 13 is phase-modulated by the wavefront modulator 14 and is irradiated onto the sample (measurement object) 22.
  • the wavefront modulator 14 is disposed on the optical path from the light source 13 to the sample and at a position conjugate with the pupil plane of the objective lens 21.
  • Reflected light from the sample 22 is detected by the point-type photodetector 23 via the dichroic mirror 17.
  • the control computer 24 displays the image data of the image of the sample 22 obtained by the measurement on a display device (not shown), stores it in a storage device (not shown), or transmits it to another computer or the like.
  • the said structure is only an example and various deformation
  • a half mirror can be used instead of the dichroic mirror 17.
  • the scanning is performed by changing the condensing position of the laser beam, the sample 22 may be moved while the condensing position of the laser beam is fixed.
  • the scanner 18, the pupil projection lens 19, and the imaging lens 20 are not necessary, and instead a sample moving means such as a three-axis piezo stage is necessary. Such a modification can be similarly applied to the configuration examples described below.
  • FIG. 7 is a flowchart showing the flow of measurement processing using the laser scanning microscope.
  • the processing of steps S301 to S305 is repeated for the first to third local regions to be subjected to phase modulation in the wavefront modulator 14 (loop L2).
  • the first to third local regions are (x cpr , y cpr ), (x cpr + ⁇ r, y cpr ), (x cpr , y cpr + ⁇ r), respectively, and have spatial frequencies (k prx , k pry ), ( k prx + ⁇ k , k pry ), (k prx , k pry + ⁇ k ).
  • step S301 to S305 is the same as the processing from step S101 to S105 in the flowchart of FIG.
  • the intensity distribution acquisition in step S102 is performed by scanning the condensing position of the laser beam on the sample 22 by the scanner 18.
  • the phase information of the interference component between the test light and the reference light obtained in step S305 includes not only the amount of wavefront distortion of the laser light but also the phase information of the sample, as shown in Expression (16).
  • the three phase information is obtained by performing the processing of steps S301 to S305 for the first to third local regions, respectively.
  • the control computer 24 calculates a differential phase (Equations (21) and (22)) from these three phase information (S306), and uses the equation (23) from the differential phase to wavefront distortion of the laser light on the sample 22 surface.
  • the amount is calculated (S307).
  • the control computer 24 applies phase modulation that cancels the calculated wavefront distortion amount to the wavefront modulator 14 to compensate for the wavefront distortion of the laser light (S308). Thereafter, the control computer 24 executes measurement of the sample using the laser light that has been wavefront compensated (S309).
  • the laser scanning microscope 1300 by measuring and compensating the wavefront distortion amount of the laser light at the focal plane inside the sample 22, the diameter of the focused beam can be reduced and measurement can be performed with high resolution. Further, the measurement of the sample and the measurement of the amount of wavefront distortion can be performed using the same photodetector, and it is not necessary to add a new optical system for measuring the amount of wavefront distortion. Furthermore, since light passes through the same path in the measurement of the sample and the measurement of the amount of wavefront distortion, the amount of wavefront distortion of the laser light on the sample 22 can be accurately measured. In addition, there are advantages that the wavefront distortion amount can be measured at high speed and that a bright light source is unnecessary on the sample.
  • phase modulation is applied to a local region having a certain extent. Therefore, it is assumed that the wavefront distortion amount obtained by the above measurement includes an error to some extent. Therefore, in order to improve the accuracy of wavefront compensation, it is preferable to repeatedly measure and compensate the amount of wavefront distortion. This will be described with reference to FIG. First, the phase modulation amount ⁇ c (k x , k y ) to be given to the wavefront modulator 14 is determined (S351), and the wavefront distortion is measured by applying delta function phase modulation to the local region (S352). ).
  • the process of step S352 is a process from S301 to S307 in the flowchart of FIG.
  • the control computer 24 updates the phase modulation applied to the wavefront modulator 14 for wavefront compensation. Specifically, the phase modulation ⁇ (k x , k y ) that cancels the measured wavefront distortion amount to the phase modulation amount ⁇ c (k x , k y ) given in the wavefront distortion amount measurement in step S352.
  • step S354 Is added to determine the phase modulation amount for wavefront compensation ⁇ c (k x , k y ) ⁇ (k x , k y ).
  • the control computer 24 determines whether or not to repeat the wavefront distortion measurement process in step S354, and if so, returns to step S352. In the determination process in step S354, for example, it may be determined that the wavefront distortion amount measured in step S352 is larger than a predetermined threshold value, or the repetition process may be performed periodically. good.
  • the first wavefront distortion amount measurement process (S352) in this iterative process is the same as the process described above with reference to FIG.
  • the phase modulation updated in the immediately preceding process is ⁇ 0 (k x , k y )
  • the phase modulation amount given to the wavefront modulator 14 in step S301 is as follows. Other than that, the rest is the same.
  • FIG. 6B is a diagram showing a configuration of a wide-field microscope 1400 as an example of a wide-field optical device to which the wavefront distortion measurement and compensation technique described above is applied.
  • the wide-field microscope 1400 includes a light source 25, a dichroic mirror 26, a pupil projection lens 27, an imaging lens 28, an objective lens 29, a wavefront modulator 30, an imaging lens 31, a two-dimensional photodetector 32, and a control computer 33.
  • the image of the sample 22 is measured by the two-dimensional photodetector 32 using a CCD camera or a CMOS camera.
  • the control computer 33 Image data of the image of the sample 22 obtained by the measurement is displayed on a display device (not shown), stored in a storage device (not shown), or transmitted to another computer or the like.
  • the wavefront modulator 30 is on the optical path from the sample 22 to the two-dimensional photodetector 32. Thus, it is arranged at a position conjugate with the pupil plane of the objective lens 29.
  • the flow of measurement processing in the wide-field microscope 1400 is almost the same as that in the case of the laser scanning microscope 1300 (the flowchart in FIG. 7), and thus detailed description thereof is omitted.
  • the wavefront distortion of the light generated from the sample 22 and incident on the two-dimensional photodetector 32 can be measured, and the phase modulation that cancels this is applied to the wavefront modulator 30 to perform measurement. High measurement can be performed.
  • the other effects described in the laser scanning microscope can be similarly obtained.
  • FIG. 6C is a diagram showing a configuration of a telescope (astronomical telescope) 1500 as another example of a wide-field optical device to which the wavefront distortion measurement and compensation technique described above is applied.
  • the telescope 1500 includes a wavefront modulator 130, a beam diameter reduction optical system 129, an imaging lens 131, a two-dimensional photodetector 132, and a control computer 133.
  • an image of a measurement object such as the celestial body 122 is measured by a two-dimensional photodetector 132 using a CCD camera or a CMOS camera.
  • the wavefront modulator 130 Since the light from the celestial body 122 can be regarded as parallel light, the wavefront modulator 130 is located on the optical path from the celestial body 122 to the two-dimensional photodetector 132 and on the celestial body 122 side from the imaging lens 131. good. If the wavefront modulator 130 and the imaging lens 131 are sufficiently large, the beam diameter reducing optical system 129 can be omitted.
  • FIG. 6D is a diagram showing a configuration of a fundus examination apparatus 1600 as another example of a wide-field optical apparatus to which the wavefront distortion measurement and compensation technique described above is applied.
  • the fundus examination apparatus 1600 includes a light source 225, a dichroic mirror 226, an objective lens 229, a wavefront modulator 230, an imaging lens 231, a two-dimensional photodetector 232, and a control computer 233.
  • an image of the measurement object (human eye) 222 is measured by a two-dimensional photodetector 232 using a CCD camera or a CMOS camera.
  • the wavefront modulator 230 extends from the measuring object 222 to the two-dimensional photodetector 232. It is arranged on the optical path at a position conjugate with the pupil plane of the objective lens 229.
  • the flow of measurement processing in the telescope 1500 and the fundus examination apparatus 1600 is substantially the same as in the case of the laser scanning microscope 1300 and the wide-field microscope 1400 (flowchart in FIG. 7), detailed description is omitted.
  • the same effect as the wide field microscope 1400 can be obtained.
  • the wide-field optical measurement device a wide-field microscope, a telescope, and a fundus examination device have been described as examples.
  • the wavefront distortion of the present invention is similarly applied to other wide-field optical measurement devices. It will be apparent to those skilled in the art to apply the quantity measurement method and the wavefront compensation method.
  • the interference components of the test light and the reference light are obtained by calculation from a plurality of intensity distributions obtained by discretely changing the amount of phase modulation applied to the wavefront modulator. Similarly, the interference component of the test light and the interference light can be obtained by lock-in detection.
  • the phase phi m giving the wavefront modulator periodically modulated at a frequency f m also by lock-in detection of only a signal light modulated at a frequency f m, the reference and test light shown in equation (14)
  • the light interference component H 1 (x, y) can be acquired.
  • the equation (13) is It becomes.
  • 2-phase lock-in detection signal H 1 (x, y) can be acquired. Therefore, if a two-phase lock-in detection signal is measured at three central spatial frequencies, the wavefront distortion can be measured by equation (23). Since the two-phase lock-in detection signal can be measured simultaneously, the measurement may be performed three times at three central spatial frequencies.
  • Nonlinear Optical Devices Consider the application of the method of the present invention, which modulates only a narrow spatial frequency band with a central spatial frequency (k prx , k p ry ), to a nonlinear optical device.
  • a nonlinear optical microscope nonlinear optical measurement device
  • FSG nonlinear optical process of sum frequency generation
  • Two excitation lights are used for sum frequency generation, only one excitation light is scanned on the sample, and the other excitation light is fixed on the sample.
  • phase modulation is applied only to the excitation light that scans the condensing position of the two excitation lights.
  • a spatial cross-correlation signal of the two excitation lights is detected, and the image can be expressed as follows.
  • At least three signals are acquired by varying the amount of phase modulation given to the position (x cpr , y cpr ) corresponding to the spatial frequency (k prx , k pry ).
  • the interference component of the test light and the reference light can be extracted from these at least three signals. For example, when the phase modulation ⁇ m shown in Equation (6) is given, the interference component is calculated as follows.
  • the center spatial frequency (k prx , k pry ) to be modulated is slightly shifted to (k prx + ⁇ k , k pry ) and (k prx , k pry + ⁇ k ), and the phase of the interference component is acquired in the same manner. It becomes.
  • Nonlinear optical processes that can be used include two-photon excitation fluorescence (FIG. 9A), sum frequency generation (FIG. 9B), and four-wave mixing (FIGS. 9C and 9D), as shown in FIG. (E))
  • Various processes such as two-photon absorption (FIG. 9F), cross-phase modulation (FIG. 9G), stimulated Raman scattering (FIG. 9H), and the like.
  • wavefront distortion can be measured at any position inside the sample, and no fluorescent molecules are required.
  • FIG. 10 shows a configuration example of a nonlinear optical microscope 1700 capable of wavefront compensation by the above method.
  • the laser beams emitted from the first light source 34 and the second light source 53 are superimposed on each other to irradiate the sample 47, and the nonlinear signal generated on the focal plane is applied to a point such as a photomultiplier tube or a photodiode. Detection is performed by the mold photodetector 48.
  • the first excitation laser light emitted from the first light source 34 passes through the first wavefront modulator 35, the pupil projection lens 36, the imaging lens 37, the scanner 38, the pupil projection lens 39, and the imaging lens 40.
  • the light enters the dichroic mirror 41.
  • the first wavefront modulator 35 is arranged on the optical path from the first light source 34 to the sample 47 and at a position conjugate with the pupil plane of the objective lens 46.
  • the second excitation laser light emitted from the second light source 53 is incident on the dichroic mirror 41 via the second wavefront modulator 52, the pupil projection lens 51, and the imaging lens 50.
  • the second wavefront modulator 52 is disposed on the optical path from the second light source 53 to the sample 47 at a position conjugate with the pupil plane of the objective lens 46.
  • the first and second excitation laser beams superimposed by the dichroic mirror 41 are applied to the focal plane inside the sample 47 via the scanner 42, pupil projection lens 43, imaging lens 44, dichroic mirror 45, and objective lens 46.
  • the nonlinear signal generated in the focal plane is detected by the point-type photodetector 48 via the objective lens 46 and the dichroic mirror 45.
  • the nonlinear signal detected by the point photodetector 48 is sent to the control computer 49.
  • the control computer 49 controls the phase modulation amounts of the first wavefront modulator 35 and the second wavefront modulator 52.
  • the control computer 49 also calculates the amount of wavefront distortion in the focal plane inside the sample of the first excitation laser light and the second excitation laser light, and performs phase modulation for canceling the wavefront distortion to the first wavefront modulator 35. And to the second wavefront modulator 52.
  • FIG. 11 is a flowchart showing the flow of measurement processing using the nonlinear optical microscope 1700.
  • phase modulation is applied to the first wavefront modulator 35 without applying phase modulation to the second wavefront modulator 52, and the amount of wavefront distortion of the first excitation laser light is measured (S401).
  • the measurement of the amount of wavefront distortion here is the same as the processing up to step S307 in the flowchart of FIG.
  • the intensity distribution acquisition processing of the signal light (spatial cross-correlation signal) in step S302 is to displace the condensing position of the first excitation laser light while the condensing position of the second excitation laser light is fixed. Is done.
  • the control computer 49 gives the first wavefront modulator 35 phase modulation that cancels the wavefront distortion amount (S402). . Thereby, the wavefront distortion of the first excitation laser is compensated.
  • step S403 the phase modulation is applied to the second wavefront modulator 52, and the amount of wavefront distortion of the second excitation laser light is measured.
  • the control computer 49 applies phase modulation to cancel the wavefront distortion amount to the second wavefront modulator 52 (S404). . This compensates for the wavefront distortion of the second excitation laser.
  • the sample is measured in a state where phase modulation for canceling wavefront distortion is applied to the first wavefront modulator 35 and the second wavefront modulator 52 (S405).
  • the method for measuring the sample is not particularly limited in the present invention.
  • the first excitation laser beam and the second excitation laser beam may be fixed at the same condensing position to measure a nonlinear signal, or the first excitation laser beam and the second excitation laser beam may be measured. Measurement may be performed by relatively modulating the condensing position and extracting a frequency component corresponding to the modulation frequency from the detected nonlinear signal. Details of the latter measurement method are described in International Publication No. 2012/127907, an application by the present inventors.
  • the focused beam diameter can be reduced by measuring and compensating the wavefront distortion amounts of the first and second excitation laser beams in the focal plane inside the sample 47, and measurement is performed with high resolution. be able to. Further, the measurement of the sample and the measurement of the amount of wavefront distortion can be performed using the same photodetector, and it is not necessary to add a new optical system for measuring the amount of wavefront distortion. Furthermore, since light passes through the same path in the measurement of the sample and the measurement of the amount of wavefront distortion, the amount of wavefront distortion of the laser light on the sample 22 can be accurately measured. In addition, there are advantages that the wavefront distortion amount can be measured at high speed and that a bright light source is unnecessary on the sample.
  • the generation region of the nonlinear signal is localized in the vicinity of the condensing point of the excitation laser light, background light generated outside the focal plane can be suppressed, and the influence of scattering is suppressed. Therefore, it is possible to measure the amount of wavefront distortion at the deep part of the sample.
  • the measurement and compensation of the wavefront distortion of the first excitation laser are performed first.
  • the measurement and compensation of the wavefront distortion of the second excitation laser may be performed first. It is also preferable to further improve the accuracy of wavefront compensation by repeatedly performing the processing of steps S401 to S404 with the phase modulation in steps S402 and S404 being applied.
  • the interference component between the test light and the reference light is obtained by calculation from a plurality of cross-correlation signals obtained by discretely changing the amount of phase modulation applied to the wavefront modulator.
  • the interference component H 2 (x, y) of the test light and the interference light represented by the equation (29) can also be obtained by lock-in detection as in the configuration examples 2 and 5.
  • the first phase modulation amount given to the wavefront modulator 35 and the second wavefront modulator 52 periodically modulated at a frequency f m, the point light detector 2-phase cross-correlation signal obtained from the 48 Input to the lock-in detector.
  • An interference component H 2 (x, y) is obtained from the two-phase lock-in detection signal. If two-phase lock-in detection signals are measured at three central spatial frequencies, the wavefront distortion can be measured according to equations (34), (35), and (23).
  • FIG. 12A shows a structure 1800 used in the experiment.
  • Laser light is oscillated using a titanium sapphire laser oscillator 54 as a light source.
  • the laser light is incident on the optical parametric oscillator 57 via the half-wave plate 55 and the polarization beam splitter 56 to be wavelength-converted.
  • the light output from the optical parametric oscillator 57 enters the CCD camera 61 disposed at the focal position of the lens 60 (focal length 300 mm) via the prism pair 58, the spatial light modulator 59, and the lens 60.
  • the CCD camera 61 measures the intensity distribution at the focal point.
  • the wavefronts of the laser beams output from the optical parametric oscillator 57 are uniform, but a known wavefront distortion is given by the spatial light modulator 59.
  • the spatial light modulator 59 is used to provide phase modulation of the local spatial frequency component (phase modulation only in the local region).
  • the spatial light modulator 59 is subjected to both known wavefront distortion and phase modulation of local spatial frequency components. This is the same as applying phase modulation only to the local spatial frequency component to the light having the wavefront distortion.
  • the intensity distribution was measured with the CCD camera 61 with three different amounts of phase modulation applied to the local spatial frequency component.
  • FIG. 12B shows the intensity distribution obtained for each phase modulation amount. From the three intensity distributions obtained, the amount of wavefront distortion was calculated by the control computer 62 based on the method described above.
  • the calculated wavefront distortion amount is shown in FIG. FIG. 12D shows the known wavefront distortion (dotted line) given by the spatial light modulator and the wavefront distortion (black spot) obtained by the measurement. As can be seen from the figure, the wavefront distortion applied by the spatial light modulator can be accurately measured.
  • Laser light is oscillated using a titanium sapphire oscillator 63 as a light source.
  • This laser beam is split by a polarization beam splitter 65 through a half-wave plate 64, one of which is wavelength-converted by an optical parametric oscillator 66 and used as the first excitation light, and the other is used as it is without being wavelength-converted.
  • the first excitation light includes an optical parametric oscillator 66, a prism pair 67, a first spatial light modulator 68, a pupil projection lens 69, an imaging lens 70, a galvano scanner 71, a pupil projection lens 72, an imaging lens 73, and a galvano.
  • the light is incident on the dichroic mirror 77 through the scanner 74, the pupil projection lens 75, and the imaging lens 76, and is superimposed on the second excitation light.
  • the second excitation light is incident on the dichroic mirror 77 via the prism pair 97, the time delay optical system, the second spatial light modulator 98, the pupil projection lens 99, and the imaging lens 100, and the first excitation light.
  • the superimposed first and second excitation lights pass through the galvano scanner 78, the pupil projection lens 79, the imaging lens 80, the galvano scanner 81, the pupil projection lens 82, the imaging lens 83, the dichroic mirror 84, and the objective lens 85.
  • the light is condensed inside the sample 86.
  • the signal light transmitted through the sample 86 is incident on the photomultiplier tube 91 via the objective lens 87, lenses 88 and 89, and the excitation light cut filter (bandpass filter) 90.
  • the signal light reflected from the sample 86 is also incident on the photomultiplier tube 95 through the objective lens 85, the dichroic mirror 84, the lenses 92 and 93, and the excitation light cut filter 94.
  • the upper part of FIG. 14A shows the intensity distribution of the obtained cross correlation signal.
  • the control computer 96 calculates the phase of the interference component from the intensity distribution of the three cross correlation signals obtained by applying phase modulation to each local spatial frequency component.
  • the wavefront distortion can be reconstructed by obtaining the differential phase of the wavefront distortion from the three phases obtained for each local spatial frequency component.
  • FIG. 14B shows the known wavefront distortion applied to the first spatial light modulator 68, and the lower part of FIG. 14B shows the wavefront distortion obtained by the measurement. When both are compared, it can be seen that the wavefront distortion applied by the spatial light modulator can be measured with high accuracy.
  • non-destructive inspection equipment include a fundus inspection device, a pathological inspection device, a food foreign matter contamination inspection device, a semiconductor inspection device, an optical coherence tomography, and the like, in principle, the same configuration as that shown in FIGS. Take.
  • the microscope is not limited to the confocal microscope (CLSM) but can be applied to PALM (Photoactivated Localization Microscopy), STED (Stimulated Emission Depletion), SIM (Structured Illumination Microscopy), and the like.
  • PALM Photoactivated Localization Microscopy
  • STED Stimulated Emission Depletion
  • SIM Structured Illumination Microscopy
  • the wavefront distortion measurement and compensation technique according to the present invention is not limited to an optical measurement apparatus, and can also be applied to a laser irradiation apparatus such as a laser processing apparatus.
  • the measurement of the amount of wavefront distortion and the repeated execution of the compensation process are described only in connection with the laser scanning microscope 1300 in the above description. However, this iterative process can be applied to any optical device. At this time, the measurement processing of the wavefront distortion amount in step S352 is appropriately changed according to a specific optical device. In any case, the accuracy of wavefront compensation can be improved by obtaining the wavefront distortion that could not be compensated for by repeated measurement.
  • the wavelength of light (electromagnetic wave) to be measured is not particularly limited in the present invention.
  • Wavefront distortion can be measured for light in any wavelength region including infrared light, visible light, and ultraviolet light.
  • a dichroic mirror is mainly used to split light, but any light splitting means such as a dichroic prism, a half mirror, and a beam splitter can be used.
  • the control computer described above includes an arithmetic device, a storage device, an input / output device, and the like, and the above processing is executed by reading and executing a computer program stored in the storage device.
  • the number of control computers is one, but a plurality of computers may cooperate to realize the above processing.
  • part or all of the above processing may be implemented using a dedicated logic circuit.
  • the present invention can also be understood as a computer program executed by a control computer or a computer-readable medium in which the computer program is stored temporarily.
  • the present invention provides the above-described wavefront distortion measuring device, wavefront compensation device, or optical measuring device, and peripheral devices such as a display device, a storage device, an input / output device, and a measurement data analysis device (all not shown).
  • peripheral devices such as a display device, a storage device, an input / output device, and a measurement data analysis device (all not shown).
  • a display device such as a liquid crystal display, a liquid crystal display, or a storage device, and a measurement data analysis device (all not shown).
  • a storage device such as a storage device, a storage device, an input / output device, and a measurement data analysis device (all not shown).
  • a measurement data analysis device can also be implemented as an optical system including at least one.
  • 1 light source, 2: wavefront modulator, 3: pupil projection lens, 4: imaging lens, 5: lens, 6: two-dimensional photodetector, 7: control computer, 8: lock-in detector, 13: light source, 14: wavefront modulator, 15: pupil projection lens, 16: imaging lens, 17: dichroic mirror, 18: scanner, 19: pupil projection lens, 20: imaging lens, 21: objective lens, 22: sample, 23: Point type photodetector, 24: control computer, 25: light source, 26: dichroic mirror, 27: pupil projection lens, 28: imaging lens, 29: objective lens, 30: wavefront modulator, 31: imaging lens, 32 : Two-dimensional photodetector, 33: control computer, 34: light source, 35: wavefront modulator, 36: pupil projection lens, 37: imaging lens, 38: scanner, 39: pupil projection lens, 40: imaging lens, 4 : Dichroic mirror, 42: Scanner, 43: Pupil projection lens, 44: Imaging lens, 45: Dichroic mirror, 46: Objective lens, 47:

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