WO2016101356A1 - Boa阵列基板的制作方法及boa阵列基板 - Google Patents

Boa阵列基板的制作方法及boa阵列基板 Download PDF

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Publication number
WO2016101356A1
WO2016101356A1 PCT/CN2015/070495 CN2015070495W WO2016101356A1 WO 2016101356 A1 WO2016101356 A1 WO 2016101356A1 CN 2015070495 W CN2015070495 W CN 2015070495W WO 2016101356 A1 WO2016101356 A1 WO 2016101356A1
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WIPO (PCT)
Prior art keywords
array substrate
photoresist
display area
boa
color
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Ceased
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PCT/CN2015/070495
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English (en)
French (fr)
Inventor
许勇
熊源
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Priority to US14/417,103 priority Critical patent/US20160178959A1/en
Publication of WO2016101356A1 publication Critical patent/WO2016101356A1/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Definitions

  • the present invention relates to the field of liquid crystal display, and in particular to a method for fabricating a BOA array substrate and a BOA array substrate.
  • the color matrix array integration technology (BOA, Black Matrix ON Array) can reduce the deviation of the alignment of the two substrates, increase the aperture ratio of the liquid crystal display panel, and reduce the parasitic capacitance of the liquid crystal display panel, and is widely used in the production of liquid crystal display panels. in.
  • the black matrix When the black matrix is fabricated on the array substrate, since the black matrix does not have translucency, when the black matrix is exposed, the alignment deviation between the array substrate and the black matrix is easily caused, thereby affecting the BOA array substrate. The quality of the production, which in turn affects the picture display quality of the liquid crystal display panel.
  • the object of the present invention is to provide a BOA array substrate and a BOA array substrate which are not easy to cause alignment deviation between the array substrate and the color filter, and to solve the problem that the existing BOA array substrate is easy to generate the array substrate and the color filter.
  • the alignment deviation which in turn affects the technical quality of the screen display quality of the liquid crystal display panel.
  • Embodiments of the present invention provide a method for fabricating a BOA array substrate, including:
  • the array substrate includes a display area and a non-display area, and a metal layer is disposed on the non-display area of the array substrate to block light leakage of the non-display area;
  • the step of performing the patterning process on the black matrix further comprises the steps of:
  • a color photoresist layer is coated on the array substrate, and the color photoresist layer is patterned to form a color photoresist on the array substrate.
  • the color photoresist includes a red photoresist, a blue photoresist, and a green photoresist.
  • the step of providing a color photoresist on the array substrate comprises:
  • the color photoresist for shielding light is disposed in the non-display area of the array substrate.
  • the color photoresist for light shielding is a stacked structure of a red photoresist, a green photoresist, and a blue photoresist.
  • the color photoresist for light shielding is a stacked structure of a red photoresist and a blue photoresist.
  • the color photoresist for shielding light is a laminated structure of a red photoresist and a green photoresist.
  • the invention also provides a method for fabricating a BOA array substrate, comprising:
  • the array substrate comprises a display area and a non-display area
  • a color photoresist is disposed on the array substrate, wherein the color photoresist for shielding is disposed in a non-display area of the array substrate to block light leakage of the non-display area.
  • the step of providing a color photoresist on the array substrate comprises:
  • a color photoresist layer is coated on the array substrate, and the color photoresist layer is patterned to form a color photoresist on the array substrate.
  • the color photoresist includes a red photoresist, a blue photoresist, and a green photoresist.
  • the color photoresist for light shielding is a stacked structure of a red photoresist, a green photoresist, and a blue photoresist.
  • the color photoresist for light shielding is a stacked structure of a red photoresist and a blue photoresist.
  • the color photoresist for shielding light is a laminated structure of a red photoresist and a green photoresist.
  • the invention also provides a BOA array substrate, comprising:
  • An array substrate layer including a display area for displaying an image and a non-display area for spacing different pixels;
  • a black matrix disposed in the display area of the array substrate layer for absorbing light emitted from the non-display area of the array substrate layer;
  • non-display area of the array substrate layer is provided with a metal layer for blocking non-display light leakage.
  • the BOA array substrate further includes:
  • a color photoresist layer disposed on the display area of the array substrate layer for converting the emitted light of the BOA array substrate into various monochromatic lights, wherein the color photoresist layer comprises a red photoresist and a blue light Resistance and green photoresist;
  • a light-shielding color resist layer disposed on the metal layer of the non-display area of the array substrate layer.
  • the light-shielding color resist layer is a laminated structure of a red photoresist, a green photoresist, and a blue photoresist.
  • the light-shielding color resist layer is a laminated structure of a red photoresist and a blue photoresist.
  • the light-shielding color resist layer is a laminated structure of a red photoresist and a green photoresist.
  • the BOA array substrate manufacturing method and the BOA array substrate of the present invention are provided with black moments only in the display area of the BOA array substrate.
  • Array which is not easy to cause the alignment deviation of the array substrate and the color filter; solve the existing BOA array substrate manufacturing method and the BOA array substrate is easy to produce the alignment deviation of the array substrate and the black matrix, thereby affecting the liquid crystal display panel
  • the screen shows the technical problems of quality.
  • FIG. 1 is a flow chart of a first preferred embodiment of a method for fabricating a BOA array substrate of the present invention
  • FIG. 2 is a flow chart of a second preferred embodiment of a method for fabricating a BOA array substrate of the present invention
  • FIG. 3 is a flow chart of a third preferred embodiment of a method for fabricating a BOA array substrate of the present invention.
  • FIG. 4A is a schematic structural view of a first preferred embodiment of a BOA array substrate of the present invention.
  • Figure 4B is a cross-sectional view taken along line A-A' of Figure 4A;
  • FIG. 5A is a schematic structural view of a second preferred embodiment of a BOA array substrate of the present invention.
  • Figure 5B is a cross-sectional view taken along line B-B' of Figure 5A;
  • FIG. 6A is a schematic structural view of a third preferred embodiment of a BOA array substrate of the present invention.
  • Fig. 6B is a cross-sectional view taken along line C-C' of Fig. 6A.
  • FIG. 1 is a flow chart of a first preferred embodiment of a method for fabricating a BOA array substrate according to the present invention.
  • the manufacturing method of the BOA array substrate of the preferred embodiment includes:
  • Step S101 the array substrate is prepared, wherein the array substrate includes a display area and a non-display area, and a metal layer is disposed on the non-display area of the array substrate to block light leakage of the non-display area;
  • Step S102 applying a black matrix to the display area of the array substrate, and performing pattern processing on the black matrix
  • Step S103 setting a color photoresist on the array substrate
  • an array substrate is formed, which may include data lines, scan lines, thin film transistors, pixel electrodes, and the like.
  • the array substrate includes a display area for displaying an image and a non-display area for spacing or distinguishing different pixels.
  • the metal layer such as the first metal layer of the data line or the second metal layer of the scan line, is also disposed in the non-display area of the array substrate, so as to block the light from being non- The display area leaks out to avoid the occurrence of light leakage; then it proceeds to step S102.
  • step S102 a black matrix is applied on the display area of the array substrate by using a slit coating machine, so that the lithography machine can align the black matrix area through the non-display area of the array substrate, thereby The black matrix is accurately patterned; then it proceeds to step S103.
  • a color photoresist is disposed on the display area of the array substrate. Specifically, a color photoresist layer is coated on the array substrate, and then the color photoresist layer is patterned by using a corresponding photoresist plate to form a corresponding color photoresist on the display region of the array substrate, and the color photoresist includes Red, blue, and green photoresist.
  • the color photoresist can also be directly disposed on the counter substrate, wherein the cell substrate and the array substrate form a liquid crystal cell.
  • the black matrix is disposed only on the display area of the array substrate, the black matrix can be well patterned and the corresponding color photoresist can be set.
  • a corresponding metal layer is disposed in the non-display area of the array substrate, which can effectively block the emitted light of the backlight from leaking out of the non-display area, thereby avoiding the occurrence of light leakage.
  • the manufacturing method of the BOA array substrate of the preferred embodiment only provides a black matrix in the display area of the BOA array substrate, so that the alignment deviation between the array substrate and the color filter is not easily caused.
  • a metal layer is disposed in the non-display area of the BOA array substrate to avoid the occurrence of light leakage.
  • FIG. 2 is a flow chart of a second preferred embodiment of the method for fabricating the BOA array substrate of the present invention.
  • the manufacturing method of the BOA array substrate of the preferred embodiment includes:
  • Step S201 the array substrate is prepared, wherein the array substrate includes a display area and a non-display area, and a metal layer is disposed on the non-display area of the array substrate to block light leakage of the non-display area;
  • Step S202 applying a black matrix to the display area of the array substrate, and patterning the black matrix Reason
  • Step S203 providing a color photoresist on the array substrate, wherein a color photoresist for shielding is disposed in a non-display area of the array substrate;
  • step S201 an array substrate is fabricated, which may include data lines, scan lines, thin film transistors, pixel electrodes, and the like.
  • the array substrate includes a display area for displaying an image and a non-display area for spacing or distinguishing different pixels.
  • the metal layer such as the first metal layer of the data line or the second metal layer of the scan line, is also disposed in the non-display area of the array substrate, so as to block the light from being non- The display area leaks out to avoid the occurrence of light leakage; then it proceeds to step S202.
  • step S202 a black matrix is applied on the display area of the array substrate by using a slit coating machine, so that the lithography machine can align the black matrix area through the non-display area of the array substrate, thereby The black matrix is accurately patterned; then it proceeds to step S203.
  • a color photoresist is disposed on the display area of the array substrate. Specifically, a color photoresist layer is coated on the array substrate, and then the color photoresist layer is patterned by using a corresponding photoresist plate to form a corresponding color photoresist on the display region of the array substrate, and the color photoresist includes Red, blue, and green photoresist.
  • a color photoresist for shielding is disposed on the metal layer of the non-display area of the array substrate, and the color photoresist can better absorb the light emitted from the backlight to avoid metal. The reflection of the layer's outgoing light from the backlight.
  • the color photoresist for shading includes, but is not limited to, a three-layer structure of a red photoresist, a green photoresist, and a blue photoresist; a laminated structure on both sides of a red photoresist and a blue photoresist; or a red photoresist and a green light The laminated structure on both sides of the barrier. If the shaded color photoresist is set to a three-layer structure of red photoresist, green photoresist and blue photoresist, the light emitted from the full band can be better absorbed.
  • the color photoresist for shading is a laminated structure of photoresist
  • the color photoresist of the display region has only one monochromatic photoresist layer, so the height of the color photoresist for shading is greater than the height of the color photoresist of the display region. This can reduce the liquid crystal usage of the corresponding liquid crystal display panel.
  • the BOA array substrate of the preferred embodiment is provided with a color photoresist for shielding light on the metal layer of the non-display area of the BOA array substrate, thereby avoiding the reflected light of the metal layer.
  • the influence on the outgoing light further improves the picture display quality of the corresponding liquid crystal display panel.
  • FIG. 3 is a flow chart of a third preferred embodiment of a method for fabricating a BOA array substrate according to the present invention.
  • the manufacturing method of the BOA array substrate of the preferred embodiment includes:
  • Step S301 fabricating an array substrate, wherein the array substrate includes a display area and a non-display area;
  • Step S302 applying a black matrix to the display area of the array substrate, and performing pattern processing on the black matrix
  • Step S303 a color photoresist is disposed on the array substrate, wherein the color photoresist for shielding is disposed in a non-display area of the array substrate to block non-display leakage;
  • step S301 an array substrate is formed.
  • the array substrate may include a data line, a scan line, a thin film transistor, a pixel electrode, and the like.
  • the array substrate includes a display area for displaying an image and a non-display area for spacing or distinguishing different pixels. Then it proceeds to step S302.
  • step S302 a black matrix is applied on the display area of the array substrate by using a slit coating machine, so that the lithography machine can align the black matrix area through the non-display area of the array substrate, thereby The black matrix is accurately patterned; then it proceeds to step S303.
  • a color photoresist is disposed on the display area of the array substrate. Specifically, a color photoresist layer is coated on the array substrate, and then the color photoresist layer is patterned by using a corresponding photoresist plate to form a corresponding color photoresist on the display region of the array substrate, and the color photoresist includes Red, blue, and green photoresist.
  • a color photoresist for shielding is disposed on the non-display area of the array substrate, and the color photoresist can absorb the light emitted from the backlight to avoid the non-array of the array substrate. Light leakage occurs in the display area.
  • the color photoresist for shading includes, but is not limited to, a three-layer structure of a red photoresist, a green photoresist, and a blue photoresist; a laminated structure on both sides of a red photoresist and a blue photoresist; or a red photoresist and a green light The laminated structure on both sides of the barrier.
  • the shaded color photoresist is set to a three-layer structure of red photoresist, green photoresist and blue photoresist, the full-band outgoing light can be better Absorbs to achieve the best effect of blocking non-display light leakage.
  • the color photoresist for shading is a laminated structure of photoresist
  • the color photoresist of the display region has only one monochromatic photoresist layer, so the height of the color photoresist for shading is greater than the height of the color photoresist of the display region. This can reduce the liquid crystal usage of the corresponding liquid crystal display panel.
  • the manufacturing method of the BOA array substrate of the preferred embodiment only provides a black matrix in the display area of the BOA array substrate, so that the alignment deviation between the array substrate and the color filter is not easily caused. At the same time, a color photoresist for shading is disposed in the non-display area of the BOA array substrate, thereby avoiding the occurrence of light leakage.
  • FIG. 4A is a schematic structural view of a first preferred embodiment of the BOA array substrate of the present invention
  • FIG. 4B is a cross-sectional view along the line A-A' of FIG. 4A. Sectional view.
  • the BOA array substrate 40 of the preferred embodiment includes an array substrate layer 41 and a color filter layer 42 (the color filter layer includes a black matrix and a color photoresist layer), and the array substrate layer 41 includes a display region 411 for displaying an image and a non-display area 412 for spacing different pixels; a color filter layer 42 disposed on the display area of the array substrate layer 41 for converting the outgoing light of the BOA array substrate 40 into various monochromatic lights and absorbing the array substrate layer 40
  • the light exiting the non-display area 412, the color filter layer 42 includes a red photoresist, a blue photoresist, a green photoresist, and a black matrix.
  • the non-display area 412 of the array substrate layer 41 is further provided with a metal layer 413 for blocking light leakage of the non-display area.
  • the BOA array substrate 40 of the preferred embodiment is provided with the color filter layer 42 only on the display region 411, so that the black matrix can be well patterned and the corresponding color photoresist can be disposed.
  • the non-display area 412 is provided with a corresponding metal layer, which can effectively block the emitted light of the backlight from leaking out of the non-display area 412, thereby avoiding the occurrence of light leakage.
  • the BOA array substrate of the preferred embodiment only provides a color filter layer in the display area of the BOA array substrate, so that the alignment deviation of the array substrate and the color filter is not easily caused.
  • a metal layer is disposed in the non-display area of the BOA array substrate to avoid the occurrence of light leakage.
  • FIG. 5A is a schematic structural view of a second preferred embodiment of the BOA array substrate of the present invention
  • FIG. 5B is a cross-sectional view taken along line B-B' of FIG. 4A
  • the BOA array substrate 50 of the preferred embodiment includes an array substrate layer 51, a color filter layer 52 (the color filter layer includes a black matrix and a color photoresist layer), and a light-shielding color resist layer 53 including an array substrate layer 51 for display a display area 511 of an image and a non-display area 512 for spacing different pixels; a color filter layer 52 is disposed on the display of the array substrate layer 51
  • the area 511 is configured to convert the emitted light of the BOA array substrate 50 into various monochromatic lights and the emitted light of the non-display area 512 of the absorption array substrate layer 50.
  • the color filter layer 52 includes a red photoresist, a blue photoresist, and a green color.
  • a light-shielding color resist layer 53 (color resist) for shielding light is disposed on the metal layer 513 of the non-display area 512, and the light-shielding color resist layer 53 can be better for the backlight.
  • the emitted light is absorbed to avoid reflection of the emitted light of the metal layer 513 to the backlight.
  • the light-shielding color resist layer 53 includes, but is not limited to, a three-layered layer structure of a red photoresist, a green photoresist, and a blue photoresist; a laminated structure of two sides of a red photoresist and a blue photoresist; or a red photoresist and a green photoresist Laminated structure on both sides, etc. If the light-shielding color resist layer 53 is provided as a three-layer structure of red photoresist, green photoresist and blue photoresist, the light emitted from the full-wavelength band can be better absorbed to achieve the best effect of blocking non-display light leakage.
  • the color filter layer 52 of the display region has only one monochromatic photoresist layer, so the height of the light-shielding color resist layer 53 is greater than the height of the color filter layer 52, so that Reduce the liquid crystal usage of the corresponding liquid crystal display panel.
  • the BOA array substrate of the preferred embodiment is provided with a light-shielding color resist layer for shielding light on the metal layer of the non-display area of the BOA array substrate, thereby avoiding the reflected light pair of the metal layer.
  • the influence of light further improves the picture display quality of the corresponding liquid crystal display panel.
  • FIG. 6A is a schematic structural view of a third preferred embodiment of the BOA array substrate of the present invention
  • FIG. 6B is a cross-sectional view taken along line C-C' of FIG. 6A.
  • the BOA array substrate 60 of the preferred embodiment includes an array substrate layer 61, a color filter layer 62 (the color filter layer includes a black matrix and a color photoresist layer), and a light-shielding color resist layer 63.
  • the array substrate layer 61 includes a display for display.
  • a shading color for shading is provided on the non-display area 612 of the BOA array substrate 60 of the preferred embodiment.
  • the resist layer 63, the light-shielding color resist layer 63 can better absorb the light emitted from the backlight, and avoid the light leakage phenomenon in the non-display area 612 of the BOA array substrate 60.
  • the light-shielding color resist layer 63 includes, but is not limited to, a three-layered layer structure of a red photoresist, a green photoresist, and a blue photoresist; a laminated structure of two sides of a red photoresist and a blue photoresist; or a red photoresist and a green photoresist Laminated structure on both sides, etc.
  • the light-shielding color resist layer 63 is provided as a three-layer structure of red photoresist, green photoresist and blue photoresist, the light emitted from the full-wavelength band can be better absorbed to achieve the best effect of blocking non-display light leakage.
  • the light-shielding color resist layer 63 is a laminated structure of photoresist, the color filter layer 62 of a certain region has only one monochromatic photoresist layer, so the height of the light-shielding color resist layer 63 is greater than the height of the color filter layer 62.
  • the liquid crystal usage of the corresponding liquid crystal display panel can be reduced.
  • the BOA array substrate of the preferred embodiment only provides a black matrix in the display area of the BOA array substrate, so that the alignment deviation between the array substrate and the color filter is not easily caused.
  • a non-display area of the BOA array substrate is provided with a light-shielding color resist layer for shielding, thereby avoiding the occurrence of light leakage.
  • the method for fabricating the BOA array substrate of the present invention and the BOA array substrate are provided with a black matrix only in the display region of the BOA array substrate, so that the alignment deviation between the array substrate and the color filter is not easily caused; and the existing BOA array substrate is solved.
  • the manufacturing method and the BOA array substrate tend to cause a misalignment between the array substrate and the color filter, and further affect the technical problem of the screen display quality of the liquid crystal display panel.

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Abstract

一种BOA阵列基板（40，50，60）的制作方法，其包括制作阵列基板（40，50，60），在阵列基板（40，50，60）的非显示区域（412，512，612）设置金属层（413，513）；在阵列基板（40，50，60）的显示区域涂布黑色矩阵，并对黑色矩阵进行图形化处理；以及在阵列基板（40，50，60）上设置彩色光阻（53，63）。本发明还提供一种BOA阵列基板（40，50，60）。BOA阵列基板（40，50，60）的制作方法及BOA阵列基板（40，50，60）可提高BOA阵列基板（40，50，60）的制作质量，进而提高液晶显示面板的画面显示品质。

Description

BOA阵列基板的制作方法及BOA阵列基板 技术领域
本发明涉及液晶显示领域，特别是涉及一种BOA阵列基板的制作方法及BOA阵列基板。
背景技术
彩膜阵列集成技术(BOA，Black Matrix ON Array)，能减少两个基板对位时的偏差，增加液晶显示面板的开口率，降低液晶显示面板的寄生电容，被广泛应用于液晶显示面板的制作中。
在阵列基板上制作黑色矩阵(Black Matrix)时，由于黑色矩阵不具有透光性，因此在对黑色矩阵进行曝光时，容易造成阵列基板和黑色矩阵的对位偏差，从而影响该BOA阵列基板的制作质量，进而影响液晶显示面板的画面显示品质。
故，有必要提供一种BOA阵列基板的制作方法及BOA阵列基板，以解决现有技术所存在的问题。
对发明的公开
技术问题
本发明的目的在于提供一种不易造成阵列基板和彩色滤光片对位偏差的BOA阵列基板的制作方法及BOA阵列基板；以解决现有的BOA阵列基板容易产生阵列基板和彩色滤光片的对位偏差，进而影响液晶显示面板的画面显示品质的技术问题。
问题的解决方案
技术解决方案
本发明实施例提供一种BOA阵列基板的制作方法，其包括：
制作阵列基板，其中所述阵列基板包括显示区域以及非显示区域，在所述阵列基板的所述非显示区域设置金属层，以阻挡所述非显示区域的漏光；以及
在所述阵列基板的所述显示区域涂布黑色矩阵，并对所述黑色矩阵进行图形化 处理。
在本发明所述的BOA阵列基板的制作方法中，所述对所述黑色矩阵进行图形化处理的步骤之后还包括步骤：
在所述阵列基板上涂布彩色光阻层，对所述彩色光阻层进行图形化处理，以在所述阵列基板上形成彩色光阻。
在本发明所述的BOA阵列基板的制作方法中，所述彩色光阻包括红色光阻、蓝色光阻以及绿色光阻。
在本发明所述的BOA阵列基板的制作方法中，所述在所述阵列基板上设置彩色光阻的步骤包括：
在所述阵列基板的所述非显示区域设置用于遮光的所述彩色光阻。
在本发明所述的BOA阵列基板的制作方法中，所述用于遮光的所述彩色光阻为红色光阻、绿色光阻和蓝色光阻的叠层结构。
在本发明所述的BOA阵列基板的制作方法中，所述用于遮光的所述彩色光阻为红色光阻和蓝色光阻的叠层结构。
在本发明所述的BOA阵列基板的制作方法中，所述用于遮光的所述彩色光阻为红色光阻和绿色光阻的叠层结构。
本发明还提供一种BOA阵列基板的制作方法，其包括：
制作阵列基板，其中所述阵列基板包括显示区域以及非显示区域；
在所述阵列基板的所述显示区域涂布黑色矩阵，并对所述黑色矩阵进行图形化处理；以及
在所述阵列基板上设置彩色光阻，其中在所述阵列基板的非显示区域设置用于遮光的所述彩色光阻，以阻挡所述非显示区域的漏光。
在本发明所述的BOA阵列基板的制作方法中，所述在所述阵列基板上设置彩色光阻的步骤包括：
在所述阵列基板上涂布彩色光阻层，对所述彩色光阻层进行图形化处理，以在所述阵列基板上形成彩色光阻。
在本发明所述的BOA阵列基板的制作方法中，所述彩色光阻包括红色光阻、蓝色光阻以及绿色光阻。
在本发明所述的BOA阵列基板的制作方法中，所述用于遮光的所述彩色光阻为红色光阻、绿色光阻和蓝色光阻的叠层结构。
在本发明所述的BOA阵列基板的制作方法中，所述用于遮光的所述彩色光阻为红色光阻和蓝色光阻的叠层结构。
在本发明所述的BOA阵列基板的制作方法中，所述用于遮光的所述彩色光阻为红色光阻和绿色光阻的叠层结构。
本发明还提供一种BOA阵列基板，其包括：
阵列基板层，包括用于显示图像的显示区域以及用于间隔不同像素的非显示区域；以及
黑色矩阵，设置在所述阵列基板层的所述显示区域，用于吸收所述阵列基板层的所述非显示区域的出射光；
其中在所述阵列基板层的所述非显示区域设置有用于阻挡非显示漏光的金属层。
在本发明所述的BOA阵列基板中，所述BOA阵列基板还包括：
彩色光阻层，设置在所述阵列基板层的所述显示区域，用于将所述BOA阵列基板的出射光转换为各种单色光，所述彩色光阻层包括红色光阻、蓝色光阻以及绿色光阻；以及
遮光色阻层，设置在所述阵列基板层的所述非显示区域的所述金属层上。
在本发明所述的BOA阵列基板中，所述遮光色阻层为红色光阻、绿色光阻和蓝色光阻的叠层结构。
在本发明所述的BOA阵列基板中，所述遮光色阻层为红色光阻和蓝色光阻的叠层结构。
在本发明所述的BOA阵列基板中，所述遮光色阻层为红色光阻和绿色光阻的叠层结构。
发明的有益效果
有益效果
相较于现有的BOA阵列基板的制作方法及BOA阵列基板，本发明的BOA阵列基板的制作方法及BOA阵列基板通过仅在BOA阵列基板的显示区域设置黑色矩 阵，从而不易造成阵列基板和彩色滤光片的对位偏差；解决了现有的BOA阵列基板的制作方法及BOA阵列基板容易产生阵列基板和黑色矩阵的对位偏差，进而影响液晶显示面板的画面显示品质的技术问题。
对附图的简要说明
附图说明
图1为本发明的BOA阵列基板的制作方法的第一优选实施例的流程图；
图2为本发明的BOA阵列基板的制作方法的第二优选实施例的流程图；
图3为本发明的BOA阵列基板的制作方法的第三优选实施例的流程图；
图4A为本发明的BOA阵列基板的第一优选实施例的结构示意图；
图4B为沿图4A的A-A’截面线的截面图；
图5A为本发明的BOA阵列基板的第二优选实施例的结构示意图；
图5B为沿图5A的B-B’截面线的截面图；
图6A为本发明的BOA阵列基板的第三优选实施例的结构示意图；
图6B为沿图6A的C-C’截面线的截面图。
实施该发明的最佳实施例
本发明的最佳实施方式
以下各实施例的说明是参考附加的图式，用以例示本发明可用以实施的特定实施例。本发明所提到的方向用语，例如「上」、「下」、「前」、「后」、「左」、「右」、「内」、「外」、「侧面」等，仅是参考附加图式的方向。因此，使用的方向用语是用以说明及理解本发明，而非用以限制本发明。
在图中，结构相似的单元是以相同标号表示。
请参照图1，图1为本发明的BOA阵列基板的制作方法的第一优选实施例的流程图。本优选实施例的BOA阵列基板的制作方法包括：
步骤S101，制作阵列基板，其中阵列基板包括显示区域以及非显示区域，在阵列基板的非显示区域设置金属层，以阻挡非显示区域的漏光；
步骤S102，在阵列基板的显示区域涂布黑色矩阵，并对黑色矩阵进行图形化处理；
步骤S103，在阵列基板上设置彩色光阻；
下面详细说明本优选实施例的BOA阵列基板的制作方法的各步骤的具体流程。
在步骤S101中，制作阵列基板，该阵列基板可包括数据线、扫描线、薄膜晶体管以及像素电极等。该阵列基板包括用于显示图像的显示区域以及用于间隔或区分不同像素的非显示区域。使用金属层制作阵列基板的数据线或扫描线时，在阵列基板的非显示区域也设置该金属层，如数据线的第一金属层或扫描线的第二金属层，这样可阻挡光线从非显示区域漏出，避免漏光现象的产生；随后转到步骤S102。
在步骤S102中，使用狭缝式涂布(Slit Coating)机台在阵列基板的显示区域涂布黑色矩阵，这样光刻机可通过阵列基板的非显示区域对黑色矩阵区域进行对位，从而可对黑色矩阵进行准确的图形化处理；随后转到步骤S103。
在步骤S103中，对阵列基板的显示区域上设置彩色光阻。具体为，在阵列基板上涂布彩色光阻层，然后使用相应的光刻板对彩色光阻层进行图形化处理，以在阵列基板的显示区域上形成相应的彩色光阻，该彩色光阻包括红色光阻、蓝色光阻以及绿色光阻。当然也可将彩色光阻直接设置在对盒基板上，其中对盒基板和阵列基板形成液晶盒。
这样即完成了本优选实施例的BOA阵列基板的制作过程。
由于只在阵列基板的显示区域上设置有黑色矩阵，因此可以很好的对黑色矩阵进行图形化处理以及设置相应的彩色光阻。同时在阵列基板的非显示区域设置有相应的金属层，可有效的阻挡背光源的出射光线从非显示区域漏出，避免漏光现象的产生。
本优选实施例的BOA阵列基板的制作方法仅在BOA阵列基板的显示区域设置黑色矩阵，从而不易造成阵列基板和彩色滤光片的对位偏差。同时在BOA阵列基板的非显示区域设置有金属层，避免了漏光现象的产生。
请参照图2，图2为本发明的BOA阵列基板的制作方法的第二优选实施例的流程图。本优选实施例的BOA阵列基板的制作方法包括：
步骤S201，制作阵列基板，其中阵列基板包括显示区域以及非显示区域，在阵列基板的非显示区域设置金属层，以阻挡非显示区域的漏光；
步骤S202，在阵列基板的显示区域涂布黑色矩阵，并对黑色矩阵进行图形化处 理；
步骤S203，在阵列基板上设置彩色光阻，其中在阵列基板的非显示区区域设置用于遮光的彩色光阻；
下面详细说明本优选实施例的BOA阵列基板的制作方法的各步骤的具体流程。在步骤S201中，制作阵列基板，该阵列基板可包括数据线、扫描线、薄膜晶体管以及像素电极等。该阵列基板包括用于显示图像的显示区域以及用于间隔或区分不同像素的非显示区域。使用金属层制作阵列基板的数据线或扫描线时，在阵列基板的非显示区域也设置该金属层，如数据线的第一金属层或扫描线的第二金属层，这样可阻挡光线从非显示区域漏出，避免漏光现象的产生；随后转到步骤S202。
在步骤S202中，使用狭缝式涂布(Slit Coating)机台在阵列基板的显示区域涂布黑色矩阵，这样光刻机可通过阵列基板的非显示区域对黑色矩阵区域进行对位，从而可对黑色矩阵进行准确的图形化处理；随后转到步骤S203。
在步骤S203中，对阵列基板的显示区域上设置彩色光阻。具体为，在阵列基板上涂布彩色光阻层，然后使用相应的光刻板对彩色光阻层进行图形化处理，以在阵列基板的显示区域上形成相应的彩色光阻，该彩色光阻包括红色光阻、蓝色光阻以及绿色光阻。
由于设置在阵列基板的非显示区域的金属层可能反射背光源的出射光，从而影响背光源的出射光。在本优选实施例的步骤S203中，同时在阵列基板的非显示区域的金属层上设置用于遮光的彩色光阻，该彩色光阻可以较好的对背光源的出射光进行吸收，避免金属层对背光源的出射光的反射。该用于遮光的彩色光阻包括但不限于红色光阻、绿色光阻和蓝色光阻的三层叠层结构；红色光阻和蓝色光阻的两侧叠层结构；或红色光阻和绿色光阻的两侧叠层结构等。如将遮光的彩色光阻设置为红色光阻、绿色光阻和蓝色光阻的三层叠层结构，可较好的对全波段的出射光进行吸收。
同时由于用于遮光的彩色光阻为光阻的叠层结构，显示区域的彩色光阻只有一个单色光阻层，因此用于遮光的彩色光阻的高度大于显示区域的彩色光阻的高度，这样可以减少相应的液晶显示面板的液晶使用量。
在第一优选实施例的基础上，本优选实施例的BOA阵列基板的制作方法同时在BOA阵列基板的非显示区域的金属层上设置有用于遮光的彩色光阻，避免了金属层的反射光对出射光线的影响，进一步提高了相应的液晶显示面板的画面显示品质。
请参照图3，图3为本发明的BOA阵列基板的制作方法的第三优选实施例的流程图。本优选实施例的BOA阵列基板的制作方法包括：
步骤S301，制作阵列基板，其中阵列基板包括显示区域以及非显示区域；
步骤S302，在阵列基板的显示区域涂布黑色矩阵，并对黑色矩阵进行图形化处理；
步骤S303，在阵列基板上设置彩色光阻，其中在阵列基板的非显示区域设置用于遮光的所述彩色光阻，以阻挡非显示漏光；
下面详细说明本优选实施例的BOA阵列基板的制作方法的各步骤的具体流程，在步骤S301中，制作阵列基板，该阵列基板可包括数据线、扫描线、薄膜晶体管以及像素电极等。该阵列基板包括用于显示图像的显示区域以及用于间隔或区分不同像素的非显示区域。随后转到步骤S302。
在步骤S302中，使用狭缝式涂布(Slit Coating)机台在阵列基板的显示区域涂布黑色矩阵，这样光刻机可通过阵列基板的非显示区域对黑色矩阵区域进行对位，从而可对黑色矩阵进行准确的图形化处理；随后转到步骤S303。
在步骤S303中，对阵列基板的显示区域上设置彩色光阻。具体为，在阵列基板上涂布彩色光阻层，然后使用相应的光刻板对彩色光阻层进行图形化处理，以在阵列基板的显示区域上形成相应的彩色光阻，该彩色光阻包括红色光阻、蓝色光阻以及绿色光阻。
在本优选实施例的步骤S303中，同时在阵列基板的非显示区域上设置用于遮光的彩色光阻，该彩色光阻可以较好的对背光源的出射光进行吸收，避免阵列基板的非显示区域产生漏光现象。该用于遮光的彩色光阻包括但不限于红色光阻、绿色光阻和蓝色光阻的三层叠层结构；红色光阻和蓝色光阻的两侧叠层结构；或红色光阻和绿色光阻的两侧叠层结构等。如将遮光的彩色光阻设置为红色光阻、绿色光阻和蓝色光阻的三层叠层结构，可较好的对全波段的出射光进行 吸收，达到最佳的阻挡非显示漏光的效果。
同时由于用于遮光的彩色光阻为光阻的叠层结构，显示区域的彩色光阻只有一个单色光阻层，因此用于遮光的彩色光阻的高度大于显示区域的彩色光阻的高度，这样可以减少相应的液晶显示面板的液晶使用量。
本优选实施例的BOA阵列基板的制作方法仅在BOA阵列基板的显示区域设置黑色矩阵，从而不易造成阵列基板和彩色滤光片的对位偏差。同时在BOA阵列基板的非显示区域设置有用于遮光的彩色光阻，避免了漏光现象的产生。
本发明还提供一种BOA阵列基板，请参照图4A和图4B，图4A为本发明的BOA阵列基板的第一优选实施例的结构示意图；图4B为沿图4A的A-A’截面线的截面图。本优选实施例的BOA阵列基板40包括阵列基板层41以及彩色滤光层42(该彩色滤光层包括黑色矩阵以及彩色光阻层)，阵列基板层41包括用于显示图像的显示区域411以及用于间隔不同像素的非显示区域412；彩色滤光层42设置在阵列基板层41的显示区域，用于将BOA阵列基板40的出射光转换为各种单色光以及吸收阵列基板层40的非显示区域412的出射光，彩色滤光层42包括红色光阻、蓝色光阻、绿色光阻以及黑色矩阵。其中在阵列基板层41的非显示区域412还设置有用于阻挡非显示区域的漏光的金属层413。
本优选实施例的BOA阵列基板40只在显示区域411上设置有彩色滤光层42，因此可以很好的对黑色矩阵进行图形化处理以及设置相应的彩色光阻。同时在非显示区域412设置有相应的金属层，可有效的阻挡背光源的出射光线从非显示区域412漏出，避免漏光现象的产生。
本优选实施例的BOA阵列基板仅在BOA阵列基板的显示区域设置彩色滤光层，从而不易造成阵列基板和彩色滤光片的对位偏差。同时在BOA阵列基板的非显示区域设置有金属层，避免了漏光现象的产生。
请参照图5A和图5B，图5A为本发明的BOA阵列基板的第二优选实施例的结构示意图；图5B为沿图4A的B-B’截面线的截面图。本优选实施例的BOA阵列基板50包括阵列基板层51、彩色滤光层52(该彩色滤光层包括黑色矩阵以及彩色光阻层)以及遮光色阻层53，阵列基板层51包括用于显示图像的显示区域511以及用于间隔不同像素的非显示区域512；彩色滤光层52设置在阵列基板层51的显示 区域511，用于将BOA阵列基板50的出射光转换为各种单色光以及吸收阵列基板层50的非显示区域512的出射光，彩色滤光层52包括红色光阻、蓝色光阻、绿色光阻以及黑色矩阵，其中在阵列基板层51的非显示区域512还设置有用于阻挡非显示漏光的金属层513；遮光色阻层53设置在阵列基板层51的非显示区域512的金属层513上。
由于设置在非显示区域512的金属层513可能反射背光源的出射光，从而影响背光源的出射光。在本优选实施例的BOA阵列基板20同时在非显示区域512的金属层513上设置用于遮光的遮光色阻层53(彩色光阻)，该遮光色阻层53可以较好的对背光源的出射光进行吸收，避免金属层513对背光源的出射光的反射。该遮光色阻层53包括但不限于红色光阻、绿色光阻和蓝色光阻的三层叠层结构；红色光阻和蓝色光阻的两侧叠层结构；或红色光阻和绿色光阻的两侧叠层结构等。如将遮光色阻层53设置为红色光阻、绿色光阻和蓝色光阻的三层叠层结构，可较好的对全波段的出射光进行吸收，达到最佳的阻挡非显示漏光的效果。
同时由于遮光色阻层53为光阻的叠层结构，显示区域的彩色滤光层52只有一个单色光阻层，因此遮光色阻层53的高度大于彩色滤光层52的高度，这样可以减少相应的液晶显示面板的液晶使用量。
在第一优选实施例的基础上，本优选实施例的BOA阵列基板同时在BOA阵列基板的非显示区域的金属层上设置有用于遮光的遮光色阻层，避免了金属层的反射光对出射光线的影响，进一步提高了相应的液晶显示面板的画面显示品质。
请参照图6A和图6B，图6A为本发明的BOA阵列基板的第三优选实施例的结构示意图；图6B为沿图6A的C-C’截面线的截面图。本优选实施例的BOA阵列基板60包括阵列基板层61、彩色滤光层62(该彩色滤光层包括黑色矩阵以及彩色光阻层)以及遮光色阻层63，阵列基板层61包括用于显示图像的显示区域611以及用于间隔不同像素的非显示区域612；彩色滤光层62设置在阵列基板层61的显示区域611，用于将BOA阵列基板60的出射光转换为各种单色光以及吸收阵列基板层60的非显示区域612的出射光，彩色滤光层62包括红色光阻、蓝色光阻、绿色光阻以及黑色矩阵；遮光色阻层63设置在阵列基板层61的非显示区域612上。
在本优选实施例的BOA阵列基板60的非显示区域612上设置用于遮光的遮光色 阻层63，该遮光色阻层63可以较好的对背光源的出射光进行吸收，避免BOA阵列基板60的非显示区域612产生漏光现象。该遮光色阻层63包括但不限于红色光阻、绿色光阻和蓝色光阻的三层叠层结构；红色光阻和蓝色光阻的两侧叠层结构；或红色光阻和绿色光阻的两侧叠层结构等。如将遮光色阻层63设置为红色光阻、绿色光阻和蓝色光阻的三层叠层结构，可较好的对全波段的出射光进行吸收，达到最佳的阻挡非显示漏光的效果。
同时由于遮光色阻层63为光阻的叠层结构，某个区域的彩色滤光层62只有一个单色光阻层，因此遮光色阻层63的高度大于彩色滤光层62的高度，这样可以减少相应的液晶显示面板的液晶使用量。
本优选实施例的BOA阵列基板仅在BOA阵列基板的显示区域设置黑色矩阵，从而不易造成阵列基板和彩色滤光片的对位偏差。同时在BOA阵列基板的非显示区域设置有用于遮光的遮光色阻层，避免了漏光现象的产生。
本发明的BOA阵列基板的制作方法及BOA阵列基板通过仅在BOA阵列基板的显示区域设置黑色矩阵，从而不易造成阵列基板和彩色滤光片的对位偏差；解决了现有的BOA阵列基板的制作方法及BOA阵列基板容易产生阵列基板和彩色滤光片的对位偏差，进而影响液晶显示面板的画面显示品质的技术问题。
综上所述，虽然本发明已以优选实施例揭露如上，但上述优选实施例并非用以限制本发明，本领域的普通技术人员，在不脱离本发明的精神和范围内，均可作各种更动与润饰，因此本发明的保护范围以权利要求界定的范围为准。

Claims (18)

  1. 一种BOA阵列基板的制作方法，其包括：
    制作阵列基板，其中所述阵列基板包括显示区域以及非显示区域，在所述阵列基板的所述非显示区域设置金属层，以阻挡所述非显示区域的漏光；以及
    在所述阵列基板的所述显示区域涂布黑色矩阵，并对所述黑色矩阵进行图形化处理。
  2. 根据权利要求1所述的BOA阵列基板的制作方法，其中所述对所述黑色矩阵进行图形化处理的步骤之后还包括步骤：
    在所述阵列基板上涂布彩色光阻层，对所述彩色光阻层进行图形化处理，以在所述阵列基板上形成彩色光阻。
  3. 根据权利要求2所述的BOA阵列基板的制作方法，其中所述彩色光阻包括红色光阻、蓝色光阻以及绿色光阻。
  4. 根据权利要求2所述的BOA阵列基板的制作方法，其中所述在所述阵列基板上设置彩色光阻的步骤包括：
    在所述阵列基板的所述非显示区域设置用于遮光的所述彩色光阻。
  5. 根据权利要求4所述的BOA阵列基板的制作方法，其中所述用于遮光的所述彩色光阻为红色光阻、绿色光阻和蓝色光阻的叠层结构。
  6. 根据权利要求4所述的BOA阵列基板的制作方法，其中所述用于遮光的所述彩色光阻为红色光阻和蓝色光阻的叠层结构。
  7. 根据权利要求4所述的BOA阵列基板的制作方法，其中所述用于遮光的所述彩色光阻为红色光阻和绿色光阻的叠层结构。
  8. 一种BOA阵列基板的制作方法，其包括：
    制作阵列基板，其中所述阵列基板包括显示区域以及非显示区域；
    在所述阵列基板的所述显示区域涂布黑色矩阵，并对所述黑色矩 阵进行图形化处理；以及
    在所述阵列基板上设置彩色光阻，其中在所述阵列基板的非显示区域设置用于遮光的所述彩色光阻，以阻挡所述非显示区域的漏光。
  9. 根据权利要求8所述的BOA阵列基板的制作方法，其中所述在所述阵列基板上设置彩色光阻的步骤包括：
    在所述阵列基板上涂布彩色光阻层，对所述彩色光阻层进行图形化处理，以在所述阵列基板上形成彩色光阻。
  10. 根据权利要求9所述的BOA阵列基板的制作方法，其中所述彩色光阻包括红色光阻、蓝色光阻以及绿色光阻。
  11. 根据权利要求9所述的BOA阵列基板的制作方法，其特征在于，所述用于遮光的所述彩色光阻为红色光阻、绿色光阻和蓝色光阻的叠层结构。
  12. 根据权利要求9所述的BOA阵列基板的制作方法，其特征在于，所述用于遮光的所述彩色光阻为红色光阻和蓝色光阻的叠层结构。
  13. 根据权利要求9所述的BOA阵列基板的制作方法，其特征在于，所述用于遮光的所述彩色光阻为红色光阻和绿色光阻的叠层结构。
  14. 一种BOA阵列基板，其包括：
    阵列基板层，包括用于显示图像的显示区域以及用于间隔不同像素的非显示区域；以及
    黑色矩阵，设置在所述阵列基板层的所述显示区域，用于吸收所述阵列基板层的所述非显示区域的出射光；
    其中在所述阵列基板层的所述非显示区域设置有用于阻挡非显示漏光的金属层。
  15. 根据权利要求14所述的BOA阵列基板，其中所述BOA阵列基板还包括：
    彩色光阻层，设置在所述阵列基板层的所述显示区域，用于将所述BOA阵列基板的出射光转换为各种单色光，所述彩色光阻层包 括红色光阻、蓝色光阻以及绿色光阻；以及
    遮光色阻层，设置在所述阵列基板层的所述非显示区域的所述金属层上。
  16. 根据权利要求15所述的BOA阵列基板，其中所述遮光色阻层为红色光阻、绿色光阻和蓝色光阻的叠层结构。
  17. 根据权利要求15所述的BOA阵列基板，其中所述遮光色阻层为红色光阻和蓝色光阻的叠层结构。
  18. 根据权利要求15所述的BOA阵列基板，其中所述遮光色阻层为红色光阻和绿色光阻的叠层结构。
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1556421A (zh) * 2004-01-05 2004-12-22 友达光电股份有限公司 彩色滤光片及其制造方法
US20070040974A1 (en) * 2005-08-18 2007-02-22 Kisako Ninomiya Liquid crystal display panel
CN101101401A (zh) * 2006-07-07 2008-01-09 中华映管股份有限公司 遮光结构、彩色滤光基板、主动元件阵列基板及液晶面板
CN101598866A (zh) * 2009-07-06 2009-12-09 友达光电股份有限公司 显示面板
CN103048827A (zh) * 2012-12-24 2013-04-17 京东方科技集团股份有限公司 一种液晶显示模组

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1556421A (zh) * 2004-01-05 2004-12-22 友达光电股份有限公司 彩色滤光片及其制造方法
US20070040974A1 (en) * 2005-08-18 2007-02-22 Kisako Ninomiya Liquid crystal display panel
CN101101401A (zh) * 2006-07-07 2008-01-09 中华映管股份有限公司 遮光结构、彩色滤光基板、主动元件阵列基板及液晶面板
CN101598866A (zh) * 2009-07-06 2009-12-09 友达光电股份有限公司 显示面板
CN103048827A (zh) * 2012-12-24 2013-04-17 京东方科技集团股份有限公司 一种液晶显示模组

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