WO2016085174A1

WO2016085174A1 - Glass substrate corner processing device

Info

Publication number: WO2016085174A1
Application number: PCT/KR2015/012267
Authority: WO
Inventors: 손동진; 김동환; 김종민
Original assignee: 동우화인켐 주식회사
Priority date: 2014-11-25
Filing date: 2015-11-16
Publication date: 2016-06-02
Also published as: TWM533061U; KR20160001896U

Abstract

The present invention is for providing a glass substrate corner processing device that may have the temperature on the contact part of a heating element be uniform. Provided, according to the present invention, is a glass substrate corner processing device comprising: a heating element; and a coil which is disposed on the circumference of the heating element and is connected to a high frequency-inducing heater for heating the heating element, wherein the heating element has a body part and a semi-spherical-type contact part formed on one end part of the body part.

Description

Glass Substrate Edge Processing Equipment

The present invention relates to a glass substrate edge processing apparatus, and more particularly to a glass substrate edge processing apparatus using a high frequency induction heater.

Conventionally, glass substrates used in flat panel displays have been manufactured in such a way that after cutting glass to a desired shape and size, the edges of the cut glass substrate are ground or polished to remove sharp edges.

However, the method of grinding or polishing the edges of the glass substrate has several disadvantages. Firstly, particles generated during edge machining can be a major contaminant on the surface of the glass substrate, requiring an additional process of cleaning and drying the glass substrate after edge machining. Secondly, particles trapped between the transfer device and the glass substrate during the transfer of the glass substrate may damage the surface of the glass substrate, resulting in a higher defect rate of the glass substrate.

In order to prevent the generation of glass dust, as in the Republic of Korea Patent Application No. 2012-0002573, a method and apparatus for processing in a manner that heat treatment of the edge of the glass substrate has been proposed. The glass substrate edge processing apparatus includes a heating element, and a coil wound around the heating element. When the heating element emitting high temperature contacts the edge of the glass substrate, heat is transferred to the glass substrate. The portion of the glass substrate to which the heat is transferred is thermally expanded, resulting in a gap due to a volume difference from the rest of the glass substrate to which the heat is not transferred. Thus, the portion including the edge of the glass substrate is separated from the rest of the glass substrate along the cut surface. The portion including the upper edge of the glass substrate and the portion including the lower edge are subjected to the primary processing, and the portion including the side surface of the glass substrate is subjected to the secondary processing, so that the machining process for the glass substrate is achieved.

By the way, as shown in FIG. 4, in the contact part 15 of the heat generating body 10 of such a glass substrate edge processing apparatus, the temperature on the inclined surface of the contact part 15 is a heat source of each position on the inclined surface. On different distances from (O), it depends on the position on the inclined surface. Therefore, the point of the contact portion 15 in contact with the edge of the glass substrate should be maintained at one point, and if the contact point is changed to another position, for example, change the process conditions such as the feed rate of the heating element 10. shall. In addition, when using only one location of the contact part 15 as a contact point in this way, not only abrasion generate | occur | produces early in one part of the contact part 15, but also as this wear progresses, the contact part 15 continues, A change occurs in the temperature distribution of the phase), or the heat quantity is not supplied properly, the chamfering amount is changed, and the processing stability is deteriorated.

[Preceding technical literature]

[Patent Documents]

Republic of Korea Patent Registration Publication No. 10-1345587 (2013. 12. 27.)

Republic of Korea Patent Registration No. 10-1405442 (2014. 06. 13.)

Embodiments of the present invention provide a glass substrate edge processing apparatus in which the temperature on the contact portion of the heating element can be uniform depending on the position.

In addition, embodiments of the present invention are to provide a glass substrate edge processing apparatus that can be in contact with the glass substrate at various locations on the contact portion without changing the processing conditions, thereby reducing the wear of the heating element.

In addition, embodiments of the present invention is to provide a glass substrate edge processing apparatus capable of maintaining a constant chamfering amount.

However, the technical problem to be achieved by the present invention is not limited to the above-mentioned problem, another task that is not mentioned will be clearly understood by those skilled in the art from the following description.

According to an aspect of the invention, the heating element; And a coil disposed around the heating element and connected to a high frequency induction heater to heat the heating element, wherein the heating element has a body portion and a hemispherical type contact portion formed at one end of the body portion. A processing apparatus is provided.

The one end of the body portion is formed with a horizontal plane orthogonal to the axis of the body portion, the hemispherical type contact portion is a hemispherical shape corresponding to half of the sphere, between the outer surface of the hemisphere type contact portion and the heat source which is the center of the horizontal plane The distance of may be the radius of the sphere.

The one end of the body portion is formed with a horizontal plane orthogonal to the axis of the body portion, the distance between the portion of the outer surface of the hemispherical type contact portion and the heat source which is the center of the horizontal plane is the hemisphere type contact portion connected to the horizontal plane It may be -20% or more to 20% or less than the radius of the horizontal plane.

A point on the portion of the outer surface of the hemispherical type contact portion at which the distance from the heat source is -20% or more to 20% or less than the radius of the circular plane forms an angle of more than 45 ° and 90 ° with the horizontal plane from the heat source. Can be.

The one end of the body portion is formed with a horizontal plane orthogonal to the axis of the body portion, the distance between the portion of the outer surface of the hemispherical type contact portion and the heat source which is the center of the horizontal plane is the hemisphere type contact portion connected to the horizontal plane It may be -10% or more to 10% or less than the horizontal plane side radius.

A point on the portion of the outer surface of the hemispherical type contact portion at which the distance from the heat source is -10% or more to 10% or less than the radius of the circular plane forms an angle of more than 0 ° and 45 ° or less with the horizontal plane from the heat source. Can be.

A transition portion may be formed between the body portion and the contact portion of the hemisphere type.

A horizontal plane orthogonal to an axis of the body part may be formed at the one end of the body part, and the horizontal plane may have a different size or shape from the horizontal plane side of the hemisphere-type contact part connected to the horizontal plane.

The body portion may have a cylindrical shape.

According to embodiments of the present invention, the temperature on the contact portion of the heating element of the glass substrate edge processing apparatus can be kept uniform.

Further, according to embodiments of the present invention, it is possible to contact the glass substrate at various positions on the contact portion without changing the process conditions, thus reducing the wear of the heating element.

In addition, according to embodiments of the present invention, the chamfering amount can be kept constant, and the edge processing of the glass substrate can be stably performed to increase the production yield and efficiency.

1 is a side view schematically showing a conventional glass substrate edge processing apparatus;

2 is a side view showing a glass substrate processed by a corner processing apparatus of a conventional glass substrate;

3 is a side view showing a glass substrate processed by a conventional glass substrate edge processing apparatus;

4 is a schematic partial side view of a heating element of a conventional glass substrate edge processing apparatus;

5 is a schematic partial side view of a glass substrate edge processing apparatus according to an embodiment of the present invention;

6A to 6F are schematic partial cross-sectional views of a heating element of a glass substrate edge processing apparatus according to various embodiments of the present disclosure.

Hereinafter, specific embodiments of the present invention will be described with reference to the drawings. However, this is only an example and the present invention is not limited thereto.

In describing the present invention, when it is determined that the detailed description of the known technology related to the present invention may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted. In addition, terms to be described below are terms defined in consideration of functions in the present invention, which may vary according to the intention or custom of a user or an operator. Therefore, the definition should be made based on the contents throughout the specification.

The technical spirit of the present invention is determined by the claims, and the following embodiments are merely means for efficiently explaining the technical spirit of the present invention to those skilled in the art.

First, the method of processing the edge of a glass substrate by a heat processing method is demonstrated with reference to FIGS. 1 is a view schematically showing a glass substrate edge processing apparatus by a heat treatment method, Figure 2 is a view for explaining a process of processing the edge of the glass substrate by the heat treatment method, Figure 3 is a corner by the heat treatment method It is a figure which shows the processed glass substrate.

Referring to FIG. 1, the glass substrate edge processing apparatus includes a heating element 10 and a coil 20 connected to a high frequency induction heater (not shown) and wound around the heating element 10. The heat generator 10 is made of a material such as MoSi2, for example, and when a current flows therein, the heat generator 10 can generate high temperature heat in a resistive heat generation method. When a current flows through the coil 20 wound around the heating element 10, an eddy current, which is an induced current, is generated in the heating element 10, so that the heating element 10 generates high temperature heat. The heating element 10 has a cylindrical shape as a whole, and a conical contact portion 15 is formed below the heating element 10.

Referring to FIG. 2, when the contact portion 15 of the heating element 10 emitting high temperature heat contacts the edge of the glass substrate 30, the heating element 10 may be formed at a predetermined portion 30a of the glass substrate 30. Heat is transferred from the contact 15 of the. The portion 30a of the glass substrate 30 to which heat is transferred is thermally expanded to generate a gap due to a volume difference from the rest of the glass substrate 30 to which heat is not transferred. Thus, the portion 30a including the edge of the glass substrate 30 is separated from the rest of the glass substrate 30 along the cut surface 35. That is, when the heating element 10 passes along the edge of the glass substrate 30, the edge portion is chamfered and processed from the glass substrate 30 in the form of a strip.

Referring to FIG. 3, the portion 30a including the upper edge and the portion 30b including the lower edge of the glass substrate 30 are first processed, and the portion 30c including the side surface of the glass substrate 30. ) Is subjected to secondary processing, so that the processing step for the glass substrate 30 is performed.

5 is a schematic side view of a glass substrate edge processing apparatus according to an embodiment of the present invention.

As shown in FIG. 5, the glass substrate edge processing apparatus 100 according to the embodiment of the present invention includes a heating element 10 and a coil 20.

The heating element 10 may include, for example, a body portion 160 formed in a cylindrical shape and a hemispherical type contact portion 150 formed at one end of the body portion 160. The outer surface of the contact 15 may be in contact with the edge of the glass substrate (not shown) to transfer heat to the edge of the glass substrate. The other end of the body portion 160 of the heating element 10 may be fixed to the processing unit module 60. Adjacent to the contact portion 150 of the heating element 10, a coil 20 may be disposed around the heating element 10, when a current flows in the coil 20, an eddy current is generated inside the heating element 10, High temperature heat may be generated. The coil 20 may be connected to a high frequency induction heater (not shown).

6 (a) to 6 (e) schematically illustrate cross sections of the hemispherical type contact portion 150 of the heating element 10 of the glass substrate edge processing apparatus 100 according to various embodiments of the present invention.

As shown in FIG. 6A, the contact unit 150 according to the exemplary embodiment of the present invention may be formed in a hemisphere type as described above. The hemispherical type contact portion 150 is formed on a horizontal plane of one end of the body portion 160 of the heating element 10, that is, on a plane perpendicular to the axis of the body portion 160, and on the outer surface of the contact portion 150. Each position has the same distance from the heat source O of the heating element 10, or the distance a and the distance e are the same, and the distances b and d are -10% or more than the distances a and e. 10% or less (i.e., the difference between distances b and d and distances a and e is -10% or more and 10% or less of distances a and e), and distance c is distances a and e Greater than -20% and less than or equal to 20% (ie, the difference between distance c and distances a and e may be greater than or equal to -20% and less than or equal to 20% of distances a and e), where the angle Θ is 45 °. Such a numerical range may be determined to satisfy the uniformity of the temperature within a predetermined range at each point on the outer surface of the contact portion 150, or may be determined in consideration of machining tolerances and the like.

By configuring the contact portion 150 in this manner, the temperature on the outer surface of the contact portion 150 can be made uniform, so that even if the position of the contact portion 150 in contact with the edge of the glass substrate is changed, there is no need to change the process conditions. In comparison with this, the change in the cutting amount according to the contact position of the contact portion can be significantly reduced. In addition, even if the heating element is worn, a large difference does not occur in the temperature distribution. Therefore, the replacement cycle of the heating element can be long, and the number of times of use can be increased.

6B schematically illustrates a cross section of the contact portion 150 of the heating element 10 ′ according to another embodiment of the present invention. As shown, the heating element 10 ′ according to the present embodiment may further include a transition part 140 formed at one end of the body part 160. The transition part 140 is formed between the contact part 150 and the body part 160 of the heating element 10 ′. The shape of the transition part 140 may be a truncated cone or a hemisphere. At one end of the transition part 140 connected to the contact part 150, there is a heat source O ′ coaxial with the heat source O, and the contact part 150 has a center of the heat source O ′ in FIG. 6. It may be formed into a hemisphere type as shown in (a).

6C schematically illustrates a cross section of the contact portion 150 of the heating element 10 "according to another embodiment of the present invention. As shown, the heating element 10" according to this embodiment is The hemisphere type contact portion 150 may have a diameter or width at one end that is connected to the body portion 160 to be smaller than a diameter of one end of the body portion 160.

6D schematically illustrates a cross section of the contact portion 150 of the heating element 10 "'according to another embodiment of the present invention. As shown, the heating element 10"' according to this embodiment. ) May be formed such that the diameter or width of one end of the hemisphere type contact portion 150 is connected to the body portion 160 is larger than the diameter of one end of the body portion 160.

FIG. 6E schematically illustrates a cross section of the contact portion 150 of the heating element 10 ″ ″ according to another embodiment of the present invention. As shown, the heating element 10 "" according to the present embodiment is a part of the hemisphere type contact portion 150 of FIG. Only part is formed, and other parts may have a different shape, for example, a truncated cone, from the contact part 150 of FIG. That is, the transition part 170 may be formed between the contact part 150 and the body part 160. Alternatively, the transition unit 170 may be formed at a portion adjacent to the heat source O or at any predetermined interval between the heat source O and the distal portion.

6 (f) schematically illustrates a cross section of the contact portion 150 of the heating element 10 "" 'according to another embodiment of the present invention. As shown, the heating element 10 "" 'according to the present embodiment is formed for a predetermined portion of the hemisphere type contact portion 150 of Figure 6 (a) adjacent to the heat source (O), the rest The part can be removed.

Experimental Example

A heating element (example) having a contact portion according to an embodiment of the present invention (distance a = e = b = d = c from a heat source) and a heating element (comparative example) having a conventional conical shape were prepared, respectively. The edge of the glass substrate was chamfered accordingly.

-Experimental conditions

1) Do not change the position of the coil.

2) Supply the same current (3.7 V) to the coil.

3) Glass substrate feed rate: 1.5 m / min.

4) Proceed the same machining process by moving the contact position with the glass substrate edge of the contact part downward by 0.5 mm.

The results of the experiment are shown in Table 1 below.

Table 1

As shown in Table 1, in the case of the contact portion 150 of the heating element 10 according to an embodiment of the present invention, even if the contact position with the edge of the glass substrate is changed, the difference in chamfering amount is significantly reduced compared to the comparative example You can see the point.

As described above, the present invention has been described with reference to the embodiments, it will be apparent to those skilled in the art that various modifications are possible without departing from the technical spirit of the present invention.

In addition, it will be apparent to those skilled in the art to replace or modify the components shown in the present invention with technical elements that perform a known similar function.

Therefore, the scope of the present invention should not be limited to the scope of the present invention, but limited to the spirit and equivalents shown in the following claims.

[Description of the code]

10; 10 '; 10 "; 10" '; 10 ""; 10 "" ': heating element

15 contact

20: coil

60: machining unit module

140; 170: transition part

150: contact portion

160: body portion

Claims

Heating element; And

A coil disposed around the heating element and connected to a high frequency induction heater to heat the heating element,

The heating element is a glass substrate edge processing apparatus having a body portion and a hemispherical type contact portion formed at one end of the body portion.
The method according to claim 1,

The one end of the body portion is formed with a horizontal plane orthogonal to the axis of the body portion, the hemispherical type contact portion is a hemispherical shape corresponding to half of the sphere, between the outer surface of the hemisphere type contact portion and the heat source which is the center of the horizontal plane Wherein the distance is the radius of the sphere.
The method according to claim 1,

The one end of the body portion is formed with a horizontal plane orthogonal to the axis of the body portion, the distance between the portion of the outer surface of the hemispherical type contact portion and the heat source which is the center of the horizontal plane is the hemisphere type contact portion connected to the horizontal plane Glass substrate edge processing apparatus which is -20% or more and 20% or less of the radius of the said horizontal surface side.
The method according to claim 3,

The point on the portion of the outer surface of the hemispherical type contact portion at which the distance from the heat source is -20% or more to 20% less than the radius of the circular plane forms an angle of more than 45 ° and 90 ° with the horizontal plane from the heat source. Glass substrate edge processing equipment.
The method according to claim 1,

The one end of the body portion is formed with a horizontal plane orthogonal to the axis of the body portion, the distance between the portion of the outer surface of the hemispherical type contact portion and the heat source which is the center of the horizontal plane is the hemisphere type contact portion connected to the horizontal plane The glass substrate edge processing apparatus of more than -10%-10% of the radius of the said horizontal surface side.
The method according to claim 5,

A point on the portion of the outer surface of the hemispherical type contact portion whose distance from the heat source is -10% or more to 10% or less than the radius of the circular plane forms an angle of 0 ° or more and 45 ° or less with the horizontal plane from the heat source. Glass substrate edge processing equipment.
The method according to claim 1,

And a transition portion is formed between the body portion and the contact portion of the hemisphere type.
The method according to claim 1,

And a horizontal plane orthogonal to an axis of the body part is formed at the one end of the body part, and the horizontal plane is different in size or shape from the horizontal plane side of the hemispherical type contact portion connected to the horizontal plane.
The method according to claim 1,

Glass body edge processing apparatus, the body portion is cylindrical.