WO2016051465A1 - Dispositif plasma couplé de manière inductive à pression atmosphérique - Google Patents

Dispositif plasma couplé de manière inductive à pression atmosphérique Download PDF

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Publication number
WO2016051465A1
WO2016051465A1 PCT/JP2014/075901 JP2014075901W WO2016051465A1 WO 2016051465 A1 WO2016051465 A1 WO 2016051465A1 JP 2014075901 W JP2014075901 W JP 2014075901W WO 2016051465 A1 WO2016051465 A1 WO 2016051465A1
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WO
WIPO (PCT)
Prior art keywords
coil
frequency power
switch
plasma
power source
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Application number
PCT/JP2014/075901
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English (en)
Japanese (ja)
Inventor
隆司 岩▲崎▼
藤本　直也
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株式会社日立国際電気
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Publication date
Application filed by 株式会社日立国際電気 filed Critical 株式会社日立国際電気
Priority to JP2016551353A priority Critical patent/JP6261100B2/ja
Priority to PCT/JP2014/075901 priority patent/WO2016051465A1/fr
Publication of WO2016051465A1 publication Critical patent/WO2016051465A1/fr

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the present disclosure relates to an atmospheric pressure inductively coupled plasma apparatus, and can be applied to, for example, a plasma ignition method of an atmospheric pressure inductively coupled plasma apparatus.
  • ICP Inductively Coupled Plasma
  • V the voltage (V) at which spark discharge occurs between parallel electrodes is a function of the product of gas pressure (p) (density) and electrode spacing (d). Since the gas density is high, it is difficult to cause dielectric breakdown of the plasma gas for generating initial electrons (the voltage at which spark discharge is generated becomes high).
  • An object of the present disclosure is to provide a technique that makes plasma ignition easier in an atmospheric pressure inductively coupled plasma apparatus.
  • an atmospheric pressure inductively coupled plasma device includes a high-frequency power source that generates high-frequency power, a matching unit connected to the high-frequency power source, a first coil wound around a torch and connected to the matching unit, A second coil connected to the first coil, a connection point between the first coil and the second coil, a first switch connected to GND, and the other of the second coil and GND A second switch connected; and a control unit connected to the first switch, the second switch, the high-frequency power source, and the matching unit.
  • the first switch Before plasma ignition, the first switch is opened, the second switch is short-circuited, and after plasma ignition, the first switch is short-circuited, and the second switch is opened, The coil voltage generated in the first coil before plasma ignition is increased to cause plasma gas dielectric breakdown.
  • FIG. 6 is a diagram for explaining an inductively coupled plasma apparatus according to Comparative Example 2.
  • the inductively coupled plasma apparatus 0R1 is connected to the high-frequency power source 1 for generating high-frequency power, the matching unit 2 connected to the high-frequency power source 1, the plasma generating unit 3, and the matching unit 2 wound around the plasma generating unit 3.
  • a coil 5 and a control unit 9 connected to the high frequency power source 1 and the matching unit 2 are provided. Magnetic flux is generated when a high-frequency current flows through the coil 5, and an electric field is generated in the plasma generator 3 by the generated magnetic flux to generate plasma.
  • the coil voltage (effective voltage generated in the coil) will be considered.
  • the effective voltage (V L ) generated in the coil 5 is expressed by the following equation using the impedance (Z L ) of the coil 5. It is represented by (1).
  • V L (P ⁇ Z L ) 1/2 [V] (1)
  • the impedance (Z L ) of the coil 5 is expressed by the following equation (2) using the inductance (L) of the coil 5.
  • V L (P ⁇ 2 ⁇ fL) 1/2 [V] (3) That is, in order to increase the effective voltage (V L ) generated in the coil 5 to cause the dielectric breakdown of the plasma gas, the power (P), the frequency (f), and the inductance (L) of the coil 5 are calculated from the equation (3). You need to make at least one of them bigger.
  • the discharge start voltage (spark voltage) in low-pressure plasma (for example, 100 Pa) and atmospheric pressure plasma (0.1 MPa) is compared.
  • the spark voltage is 120 V for low-pressure plasma and 20 kV for atmospheric pressure plasma.
  • the electrodes of the inductively coupled plasma device are not parallel electrodes, but the tendency is the same.
  • the spark voltage of the atmospheric pressure plasma is higher than the spark voltage of the low pressure plasma, and the atmospheric pressure plasma is harder to ignite than the low pressure plasma.
  • the inductively coupled plasma device 0R1 includes an igniter 20 including a high voltage generator 21 and a discharge unit 22 in addition to the inductively coupled plasma device 0R, and the igniter 20 generates initial electrons. generate.
  • the igniter 20 since one end of the discharge unit 22 is connected to the GND, unnecessary discharge occurs at the GND end of the coil 5 and the discharge unit 22 even after the plasma is generated, and sufficient energy is supplied to the plasma. There is no problem.
  • the inductively coupled plasma apparatus 0R2 inserts an ignition rod 30 such as graphite into the torch 3 and discharges it to generate initial electrons.
  • the inductively coupled plasma apparatus 0R2 has the same configuration as the inductively coupled plasma apparatus 0R except for the ignition rod 30.
  • the ignition rod 30 When the ignition rod 30 is used, it is necessary to move the ignition rod 30 away from the plasma after plasma ignition. However, since it involves a mechanical operation, it takes time. While the ignition rod 30 is in the plasma range, electrons in the plasma are ignited. There is a problem that the plasma state changes by reaching the rod 30.
  • An atmospheric pressure inductively coupled plasma apparatus 0 is wound around a high frequency power source 1 that generates high frequency power, a matching unit 2 connected to the high frequency power source 1, a plasma generating unit 3, and a plasma generating unit 3. And a control unit 9 connected to the high-frequency power source 1 and the matching unit 2.
  • the first coil 5 is connected to the matching unit 2.
  • the atmospheric pressure inductively coupled plasma apparatus 0 includes a second coil 6 connected to the first coil 5, a connection point between the first coil 5 and the second coil 6, and a first switch connected to GND. 7 and the second switch 8 connected to the other of the second coil 6 and GND.
  • the first switch 7 and the second switch 8 are connected to the control unit 9.
  • the plasma generating unit 3 is formed of a dielectric material such as cylindrical quartz or alumina called a torch, and has an input unit for plasma gas at the top.
  • the diameter of the plasma generator 3 is, for example, 35 mm.
  • the frequency of the high-frequency power source 1 preferably uses an ISM (Industry, Science, Medical) frequency band, for example, 13.56 MHz, 27.12 MHz, 40.68 MHz, 2.45 GHz, or the like.
  • the matching unit 2 is mechanically configured and has a slower response than that formed of a semiconductor or the like.
  • the first switch 7 is opened and the second switch 8 is short-circuited, so that the first coil 5 and the second coil 6 are electrically connected as shown in FIG. Equivalent circuit.
  • the first switch 7 is short-circuited and the second switch 8 is opened, so that the first coil 5 and the second coil 6 are electrically connected as shown in FIG. It becomes an equivalent circuit.
  • the inductance of the first coil 5 is L1
  • the inductance of the second coil 6 is L2
  • the inductance before plasma ignition is Lb
  • the inductance after plasma ignition is La.
  • La L1
  • both L1 and L2 are positive values.
  • Lb> La Therefore, since the inductance (Lb) before plasma ignition can be increased, the effective voltage generated in the first coil 5 can be increased from Equation (3). Therefore, dielectric breakdown of plasma gas is likely to occur at atmospheric pressure, and plasma ignition becomes easier. Therefore, plasma processing can be performed under atmospheric pressure, so that no equipment such as a vacuum chamber or a vacuum pump is necessary. If the inductance after the plasma ignition is kept high, the impedance viewed from the high frequency power source 1 becomes high, that is, impedance matching with the high frequency power source 1 cannot be obtained and the power source efficiency is lowered. Is low.
  • the inductance L of a cylindrical coil is expressed by the following formula (4).
  • L k ⁇ ⁇ ⁇ n 2 ⁇ ⁇ ⁇ a 2 / len [H] (4)
  • k is the Nagaoka coefficient
  • ⁇ is the magnetic permeability
  • n is the number of coil turns
  • a is the radius of the coil
  • len is the length of the coil.
  • the effective shape of the second coil 6 for causing dielectric breakdown of the plasma gas is to increase the number of coil turns (n), increase the coil radius (a), or length of the coil. At least one of shortening (len) may be performed.
  • the Nagaoka coefficient is determined by the value of 2a / len, it is necessary to determine the coil radius (a) and the coil length (len) so as not to reduce the coil inductance.
  • the diameter of the plasma generating unit 3 is increased, a increases, but the plasma intensity in the plasma generating unit 3 tends to decrease near the center.
  • the power of the high frequency power source 1 is increased to increase the power (P) applied to the coil, or the frequency of the high frequency power source 1 is increased to make the coil By simultaneously performing at least one of increasing the applied frequency (f), dielectric breakdown of the plasma gas can be more effectively caused.
  • the atmospheric pressure inductively coupled plasma apparatus can be applied to, for example, an apparatus for decomposing and removing pollutants in the atmosphere.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)

Abstract

L'invention concerne un dispositif plasma couplé de manière inductive à pression atmosphérique qui comprend un bloc d'alimentation à haute fréquence permettant de générer une énergie électrique à haute fréquence, une boîte d'adaptation connectée au bloc d'alimentation à haute fréquence, une première bobine enroulée autour d'un chalumeau et connectée à la boîte d'adaptation, une seconde bobine connectée à la première bobine, un premier commutateur connecté à la masse (GND) et au point de connexion entre la première bobine et la seconde bobine, un second commutateur connecté à la masse (GND) et à l'autre côté de la seconde bobine, et une unité de commande connectée au premier commutateur, au second commutateur, au bloc d'alimentation à haute fréquence, et à la boîte d'adaptation. En ouvrant le premier commutateur et en court-circuitant le second commutateur avant l'allumage du plasma tout en court-circuitant le premier commutateur et en ouvrant le second commutateur après l'allumage du plasma, la tension de bobine générée dans la première bobine avant l'allumage du plasma est augmentée de manière à provoquer un claquage du gaz plasma.
PCT/JP2014/075901 2014-09-29 2014-09-29 Dispositif plasma couplé de manière inductive à pression atmosphérique WO2016051465A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2016551353A JP6261100B2 (ja) 2014-09-29 2014-09-29 大気圧誘導結合プラズマ装置
PCT/JP2014/075901 WO2016051465A1 (fr) 2014-09-29 2014-09-29 Dispositif plasma couplé de manière inductive à pression atmosphérique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2014/075901 WO2016051465A1 (fr) 2014-09-29 2014-09-29 Dispositif plasma couplé de manière inductive à pression atmosphérique

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WO2016051465A1 true WO2016051465A1 (fr) 2016-04-07

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4345845A1 (fr) * 2022-09-30 2024-04-03 Handa, Janak H. Appareil de séparation pour déchets nucléaires de haut niveau

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01176700A (ja) * 1987-12-29 1989-07-13 Nippon Koshuha Kk 熱プラズマ発生装置
JPH0712729A (ja) * 1993-06-29 1995-01-17 Hitachi Ltd 誘導結合プラズマ発生装置
JPH09250986A (ja) * 1996-03-16 1997-09-22 Horiba Ltd Ｉｃｐ発光分光分析装置の点火回路
JPH10228997A (ja) * 1996-12-05 1998-08-25 Applied Materials Inc プラズマトーチ生成用装置及び方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6187072B1 (en) * 1995-09-25 2001-02-13 Applied Materials, Inc. Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions
JP4998361B2 (ja) * 2008-04-17 2012-08-15 パナソニック株式会社 大気圧プラズマ発生装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01176700A (ja) * 1987-12-29 1989-07-13 Nippon Koshuha Kk 熱プラズマ発生装置
JPH0712729A (ja) * 1993-06-29 1995-01-17 Hitachi Ltd 誘導結合プラズマ発生装置
JPH09250986A (ja) * 1996-03-16 1997-09-22 Horiba Ltd Ｉｃｐ発光分光分析装置の点火回路
JPH10228997A (ja) * 1996-12-05 1998-08-25 Applied Materials Inc プラズマトーチ生成用装置及び方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4345845A1 (fr) * 2022-09-30 2024-04-03 Handa, Janak H. Appareil de séparation pour déchets nucléaires de haut niveau

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JPWO2016051465A1 (ja) 2017-08-03

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