WO2016019650A1

WO2016019650A1 - Method for manufacturing organic light emitting device and method for manufacturing organic light emitting display panel

Info

Publication number: WO2016019650A1
Application number: PCT/CN2014/090877
Authority: WO
Inventors: 闫光; 孙力
Original assignee: 京东方科技集团股份有限公司
Priority date: 2014-08-07
Filing date: 2014-11-12
Publication date: 2016-02-11
Also published as: CN104157797A; CN104157797B

Abstract

A method for manufacturing an organic light emitting device and a method for manufacturing an organic light emitting display panel. The method for manufacturing the organic light emitting device comprises forming at least one organic functional layer (10) disposed between a cathode (7) and an anode (1). At least one of the at least one organic functional layer (10) is a doped layer, and the doped layer comprising host material and doping material. A method for forming the doped layer comprises sequentially depositing the host material and the doping material to form an host material layer (21) and a doping material layer (22) adjacent to each other, and heating the host material layer (21) and the doping material layer (22). The method solves the problems of complex forming process and apparatus, poor doping uniformity and bad effect of the doped layer.

Description

Method for preparing organic light emitting device, and method for preparing organic light emitting display panel

Technical field

At least one embodiment of the present invention is directed to a method of fabricating an organic light emitting device and a method of fabricating the organic light emitting display panel.

Background technique

OLED (Organic Light Emitting Diode) display is a new generation of display. Compared with liquid crystal display, it has the advantages of self-illumination, fast response, wide viewing angle, etc. It can be used for flexible display, transparent display, 3D display and so on.

Summary of the invention

At least one embodiment of the present invention provides a method of fabricating an organic light emitting device and a method of fabricating the organic light emitting display panel to solve the problem of poor doping uniformity and poor effect of the doped layer.

At least one embodiment of the present invention provides a method of fabricating an organic light emitting device, comprising forming at least one functional layer between a cathode and an anode, at least one of the at least one functional layer being a doped layer . The doped layer includes a host material and a dopant material. The forming method of the at least one doped layer comprises: sequentially depositing a matrix material and a doping material to form an adjacent matrix material layer and a doping material layer; and heating the matrix material layer and the doping material layer.

At least one embodiment of the present invention provides a method of fabricating an organic light emitting display panel comprising preparing an organic light emitting device using the method described above.

DRAWINGS

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings of the embodiments will be briefly described below. It is obvious that the drawings in the following description relate only to some embodiments of the present invention, and are not intended to limit the present invention. .

1 is a schematic structural view of an organic light emitting device;

2 is a schematic structural diagram of a hole injection functional layer according to an embodiment of the present invention;

3 is a sequentially spaced deposition substrate material and dopant material according to an embodiment of the present invention. Method flow chart;

4 is a schematic structural view of a hole injecting functional layer formed by the method shown in FIG. 3;

5 is a flow chart of another method for depositing a matrix material and a doping material in sequence according to an embodiment of the present invention;

6 is a schematic view showing the structure of a hole injecting functional layer formed by the method shown in FIG. 5;

FIG. 7 is a flowchart of a method for forming a hole injecting functional layer and a hole transporting functional layer according to an embodiment of the present invention;

FIG. 8 is a flowchart of a method for forming an electronic transmission function layer and an electron injection function layer according to an embodiment of the present invention;

FIG. 9 is a flowchart of a method for fabricating an organic light emitting device according to an embodiment of the present invention.

Reference mark:

1-anode; 2-hole injection functional layer; 3-hole transport functional layer; 4-light-emitting functional layer; 5-electron transport functional layer; 6-electron injection functional layer; 7-cathode; 10-organic functional layer; 21-matrix material layer; 22-doped material layer; 211-first matrix material layer; 212-second matrix material layer; 213-third matrix material layer; 221-first doping material layer; Doped material layer.

detailed description

The technical solutions of the embodiments of the present invention will be clearly and completely described in the following with reference to the accompanying drawings. It is apparent that the described embodiments are part of the embodiments of the invention, and not all of the embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the described embodiments of the present invention without departing from the scope of the invention are within the scope of the invention.

Unless otherwise defined, technical terms or scientific terms used in the present disclosure are intended to be in the ordinary meaning of those of ordinary skill in the art. The words "first," "second," and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are used to distinguish different components. Similarly, the words "a", "an", "the" The word "comprising" or "comprises" or the like means that the element or item preceding the word is intended to be in the "Connected" or "connected" and the like are not limited to physical or mechanical connections, but may include electrical connections, whether Direct or indirect. "Upper", "lower", "left", "right", etc. are only used to indicate the relative positional relationship, and when the absolute position of the object to be described is changed, the relative positional relationship may also change accordingly.

The OLED display includes an OLED array substrate and an organic light emitting device. The structure of the organic light-emitting device can be as shown in FIG. 1 and includes: an anode 1, a cathode 7 and an organic functional layer 10; the organic functional layer 10 can further comprise: a hole injection functional layer (HIL layer) 2, a hole transport functional layer (HTL layer) 3, a light-emitting function layer (EML layer) 4, an electron transport functional layer (ETL layer) 5, an electron injection functional layer (EIL layer) 6, and the like. The illuminating functional layer is mainly used for illuminating, and the other functional layers are all conductive layers. The main working principle is that the organic functional layer is driven by carrier injection and recombination under the driving of the electric field formed by the anode and the cathode.

The organic functional layer is generally a doped layer, that is, includes a doping material and a matrix material, and the performance of the matrix material is improved by adding a doping material to the matrix material. For example, the hole injection functional layer is a doped layer, and the doping material is generally F4-TCNQ (2,3,5,6-tetrafluoro-7,7',8,8'-tetracyanodimethyl-p-benzoquinone The matrix material is typically ZnPc (zinc zinc cyanide), which enhances the conductivity of the matrix material by adding a dopant material to the matrix material.

The inventors of the present application have noted that the current method for preparing a P/N type doped layer of organic light emission is generally a method of co-evaporation, that is, heating the dopant material and the matrix material by using two evaporation sources respectively to make a dopant material. Evaporation is mixed with the matrix material, so co-evaporation controls the doping ratio by controlling the evaporation rate ratio of the two, but there are many conditions affecting the evaporation rate, such as the evaporation area of the material, the volume of the material, etc., so the evaporation rate is difficult to control, and the evaporation rate is difficult to control. The mixing uniformity of the hybrid material and the matrix material is poor, and the doping effect is not good.

At least one embodiment of the present invention provides a method of fabricating an organic light emitting device, the method comprising forming at least one functional layer between a cathode and an anode, and at least one of the at least one functional layer is doped The impurity layer, the doped layer includes a matrix material and a dopant material. The forming method of the at least one doped layer comprises: sequentially depositing a matrix material and a doping material to form an adjacent matrix material layer and a doping material layer; heating the matrix material layer and the doping material layer.

Since the organic light emitting device includes a single layer device, a double layer device, a three layer device, and a multilayer device, in at least one embodiment, the at least one functional layer includes a light emitting functional layer, or the at least one layer The functional layer includes a light emitting functional layer and a hole transport layer, or the at least one functional layer includes a hole transport layer, a light emitting functional layer, and an electron transport layer, or the at least one layer function The layer includes a hole injection functional layer, a hole transport functional layer, a light-emitting functional layer, an electron transport functional layer, and an electron injection functional layer. The embodiments of the present invention are not limited.

It should be noted that the doped layer is a film layer formed by at least two different materials, which generally includes at least a matrix material and a doping material. As shown in FIG. 1, the following embodiments of the present invention are performed by taking an organic functional layer including a hole injecting functional layer 2, a hole transporting functional layer 3, a light emitting functional layer 4, an electron transporting functional layer 5, and an electron injecting functional layer 6 as an example. Description. In the embodiment of the present invention, the hole injecting functional layer 2, the hole transporting functional layer 3, the light emitting functional layer 4, the electron transporting functional layer 5, and the electron injecting functional layer 6 may each be a doped layer. Of course, the organic functional layer may also include other film or layer structures. In addition, the hole injecting functional layer, the hole transporting functional layer, the light emitting functional layer, the electron transporting functional layer, and the electron injecting functional layer may be undoped layers as long as the hole injecting functional layer, the hole transporting functional layer, and the light emitting function are satisfied. At least one of the layer, the electron transporting functional layer and the electron injecting functional layer may be a doped layer. In the embodiment of the present invention, the method for fabricating the doped layer is mainly described by taking each functional layer as a doped layer.

The hole injection functional layer, the hole transport functional layer, the light-emitting function layer, the electron transport functional layer, and the electron injection functional layer may be a doped layer or an undoped layer, and the at least one doped layer may be formed. The doping layer in the hole injecting functional layer, the hole transporting functional layer, the light emitting functional layer, the electron transporting functional layer, and the electron injecting functional layer may be formed by the method provided by the embodiment of the present invention, or may be doped. The partially doped layer in the layer is formed by the method provided by the embodiment of the present invention.

Since the material generally forming the organic functional layer is an organic material, that is, the hole injecting functional layer, the hole transporting functional layer, the light emitting functional layer, the electron transport functional layer, and the electron injecting functional layer doping material and the matrix material are organic materials, When the matrix material layer and the dopant material layer are sequentially deposited, the atoms of the dopant material and the matrix material are diffused at a high temperature to achieve doping, and the matrix material and the doping material are uniformly mixed in the doped layer formed by atomic diffusion. Good effect.

The matrix material and the doping material are sequentially deposited to form an adjacent matrix material layer and a doping material layer, wherein the deposition order of the matrix material and the doping material is not specifically limited, and the matrix material may be first deposited to form a matrix material layer, and then Depositing the doping material to form a doping material layer; or depositing the doping material to form a doping material layer, and then depositing the matrix material to form a matrix material layer. The matrix material and the dopant material are sequentially deposited in order to form adjacent matrix material layers and dopant material layers, such that diffusion of the host material and the dopant material is facilitated when the matrix material layer and the dopant material layer are heated.

For example, sequentially depositing the matrix material and the dopant material may be sequentially vapor deposited in a coater to form adjacent layers of host material and dopant material. Heating the matrix material layer and the dopant material layer can be carried out by various methods including, but not limited to, heating using a hot plate, an oven, an infrared lamp, a flash lamp, and a laser.

Embodiments of the present invention provide a method of fabricating an organic light emitting display device by sequentially depositing a host material and a dopant material to form adjacent matrix material layers and dopant material layers, and heating the matrix material layer and Doping the material layer to form a doped layer, which can be used to form each functional layer in the organic light emitting display, and the atoms of the doping material and the matrix material are diffused at a high temperature by heating, so the doping uniformity is good, and the doping is performed. The complicated process is simple.

In at least one embodiment, the heating temperature can be from 50 to 350 °C. Of course, depending on the matrix material and the dopant material of the different functional layers, the preferred heating temperatures are also different. For example, the optimum temperature of the different functional layers is near the glass transition point (T _g ) of the functional layer material.

In at least one embodiment, sequentially depositing the matrix material and the dopant material to form adjacent matrix material layers and dopant material layers can include: depositing a matrix material to form a layer of matrix material; depositing a layer on the matrix material layer The hetero-material forms a layer of doped material.

For example, as shown in FIG. 2, a matrix material is deposited on the anode 1 to form a matrix material layer 21; a dopant material is deposited on the matrix material layer 21 to form a dopant material layer 22, through the pair of matrix material layers 21 and dopant materials. The layer 22 is heated to form the hole injecting functional layer 2.

FIG. 2 is only described by taking a hole injecting functional layer and depositing a matrix material first. For the formation of other functional layers, the above method can be referred to.

In at least one embodiment, sequentially depositing the host material and the dopant material to form adjacent matrix material layers and dopant material layers can include depositing the matrix material and the dopant material at intervals to form a plurality of spaced apart matrix materials. Layer and doped material layer.

Depositing the matrix material and the doping material in sequence, that is, depositing the matrix material to form a layer of the matrix material; depositing a doping material on the layer of the matrix material to form a layer of the doping material; A matrix material is deposited thereon to form a layer of matrix material which is sequentially cycled to form a plurality of spaced apart layers of matrix material and dopant material.

For example, the sequentially spaced deposition of the host material and the doping material to form a plurality of spaced apart matrix material layers and dopant material layers, as shown in FIG. 3 and FIG. 4, includes the following steps 301 to 305, which are introduced one by one below. step.

Step 301, depositing a matrix material to form a first matrix material layer (211).

Step 302, depositing a doping material on the first matrix material layer (211) to form a first dopant material layer (221).

Step 303, depositing a matrix material on the first doped material layer (221) to form a second matrix material layer (212).

Step 304, depositing a doping material on the second matrix material layer (212) to form a second dopant material layer (222).

Step 305, depositing a matrix material on the second doped material layer (222) to form a third matrix material layer (213).

That is, the matrix material and the doped material layer are deposited at intervals to form adjacent three-layered matrix material layers and two layers of dopant materials. Of course, the multilayered matrix material layer and the dopant material layer may be the same or different layers of the matrix material layer and the dopant material layer. FIG. 3 illustrates a three-layered matrix material layer and two layers of dopant materials as an example.

In at least one embodiment, as shown in FIG. 5 and FIG. 6, the sequentially spaced deposition matrix material and dopant material, forming a plurality of spaced apart matrix material layers and dopant material layers may include the following steps 501 and 503 These steps are described one by one below.

Step 501, depositing a matrix material to form a first matrix material layer (211).

Step 502, depositing a doping material on the first matrix material layer (211) to form a doping material layer (22).

Step 503, depositing a matrix material on the layer of dopant material (22) to form a second layer of matrix material (212).

That is, the matrix material and the doping material layer are deposited at intervals to form two adjacent matrix material layers and one doping material layer, as shown in FIG. 6, the doping material layer 22 is located in the two layers of the matrix material layer ( Between a matrix material layer 211 and a second matrix material layer 212).

In at least one embodiment, the matrix material and the dopant material of the at least two doped layers may be sequentially deposited, and the deposited matrix material of the at least two doped layers and the deposited dopant material may be heated at a time.

That is, the matrix material and the doping material which sequentially deposit at least two functional layers of the hole injecting functional layer, the hole transporting functional layer, the light emitting functional layer, the electron transporting functional layer, and the electron injecting functional layer may be formed by one heating. At least two functional layers to reduce the number of heating times and simplify production Process.

Hereinafter, the hole injecting functional layer, the hole transporting functional layer, the electron transporting functional layer, and the electron injecting functional layer are formed by using the method provided by the embodiment of the present invention as an example.

For example, as shown in FIG. 7, the formation of the hole injecting functional layer and the hole transporting functional layer may include the following steps 701 to 703.

Step 701, depositing a matrix material and a dopant material of the hole injection functional layer to form a matrix material layer and a dopant material layer of the hole injection functional layer.

Step 702, depositing a matrix material and a dopant material of the hole transport functional layer to form a matrix material layer and a dopant material layer of the hole transport functional layer.

Step 703: heating the deposited hole injecting functional layer and the matrix material layer and the doping material layer of the hole transporting functional layer.

That is, the hole injecting functional layer and the hole transporting functional layer are formed by one heating, and the hole injecting functional layer and the hole transporting functional layer are formed by heating, respectively, and the number of times of primary heating is reduced.

For example, as shown in FIG. 8, forming the electron transport functional layer and the electron injection functional layer may include the following steps 801 to 803.

Step 801, depositing a matrix material and a doping material of the electron transport functional layer to form a matrix material layer and a doping material layer of the electron transport functional layer.

Step 802, depositing a host material and a doping material of the electron injecting functional layer to form a matrix material layer and a doping material layer of the electron injecting functional layer.

Step 803, heating the deposited electron transport functional layer and the host material layer and the doping material layer of the electron injecting functional layer.

That is, the electron transport functional layer and the electron injection functional layer are formed by one heating, and the electron transport functional layer and the electron injection functional layer are formed separately from each other, and the number of times of primary heating is reduced.

A method for fabricating an organic light emitting device according to an embodiment of the present invention will be described below. As shown in FIG. 9, the method includes the following steps 901 to 906, which are described one by one below.

Step 901, depositing ITO on the substrate to form an anode.

For example, ITO can be deposited by sputtering to form an anode. Of course, the anode can also be formed by depositing other materials.

Step 902, depositing ZnPc (zinc zinc phthalocyanine) on the anode to form a matrix material layer, and then sinking F4-TCNQ (2,3,5,6-tetrafluoro-7,7',8,8'-tetracyanodimethyl-p-benzoquinone) to form a layer of dopant material and to heat the layer of matrix material and The layer of dopant material.

For example, the layer of host material and the layer of dopant material may be illuminated with a laser such that the host material and the dopant material complete doping. The hole injecting functional layer can be formed by the above step 902.

Step 903, depositing NPB (N,N'-diphenyl-N,N'-bis(1-naphthyl)-1,1'-biphenyl-4,4'-diamine) to form a hole transport function Floor.

The hole transport functional layer can be formed by the above step 903. It should be noted that the hole transporting functional layer is an undoped layer.

Step 904, depositing Alq ₃ (8-hydroxyquinoline aluminum) to form a light-emitting functional layer and an electron transport functional layer.

The light-emitting functional layer and the electron transport functional layer may be formed at one time by depositing Alq ₃ (8-hydroxyquinoline aluminum), that is, the light-emitting functional layer and the electron transport functional layer may be formed by the above-described step 904. It should be noted that the light-emitting function layer and the electron transport functional layer are undoped layers.

Step 905, depositing LiF (lithium fluoride) to form an electron injecting functional layer.

The electron injection functional layer can be formed by the above step 905. It should be noted that the electron injection functional layer is an undoped layer.

Step 906, depositing Al (aluminum) to form a cathode.

For example, a metal thin film may be formed by depositing a metal material to serve as a cathode.

In the above embodiments, the hole injection functional layer is a doped layer, and the other functional layers are undoped layers. The embodiments of the present invention are described in detail by way of example only, and other functional layers may also be doped layers. A method of producing the above hole injecting functional layer. The manufacturing method provided by the embodiment of the present invention is not limited to the specific steps described above, and the manufacturing method of the organic light emitting device provided by the embodiment of the present invention can be directly used for fabricating an organic light emitting display.

At least one embodiment of the present invention also provides a method of fabricating an organic light emitting display panel comprising preparing an organic light emitting device, and the organic light emitting device is prepared by the method provided by any of the above embodiments. Therefore, the preparation of the organic light-emitting device in the method provided by the embodiment of the present invention can be referred to the related description above, and details are not described herein again.

In addition, the method for fabricating an organic light emitting display panel provided by the embodiment of the present invention further includes: forming a pixel defining layer, the pixel defining layer defining a plurality of organic light emitting units, wherein each of the organic light emitting units is provided with the organic light emitting device; The board is packaged with a substrate on which the organic light emitting device is formed.

The above is only an exemplary embodiment of the present invention, and is not intended to limit the scope of the present invention. The scope of the present invention is defined by the appended claims.

The present application claims the priority of the Chinese Patent Application No. 201410386522.X filed on Aug. 7, 2014, the entire disclosure of which is hereby incorporated by reference.

Claims

A method of fabricating an organic light emitting device, comprising forming at least one functional layer between a cathode and an anode, wherein

At least one of the at least one functional layer is a doped layer, the doped layer comprises a matrix material and a doping material; and the forming method of the at least one doped layer comprises:

Depositing a matrix material and a dopant material in sequence to form adjacent matrix material layers and dopant material layers;

The layer of host material and the layer of dopant material are heated.
The method of claim 1 wherein

The at least one functional layer includes a light emitting functional layer, or

The at least one functional layer includes a light emitting functional layer and a hole transport layer, or

The at least one functional layer includes a hole transport layer, a light emitting functional layer, and an electron transport layer, or

The at least one functional layer includes a hole injection functional layer, a hole transport functional layer, a light emitting functional layer, an electron transport functional layer, and an electron injection functional layer.
The method according to claim 1 or 2, wherein said sequentially depositing a matrix material and a doping material to form adjacent layers of the matrix material and the layer of dopant material comprises:

Depositing a matrix material to form a layer of matrix material;

A dopant material is deposited over the layer of host material to form a layer of dopant material.
The method according to claim 1 or 2, wherein said sequentially depositing a matrix material and a doping material to form adjacent layers of the matrix material and the layer of dopant material comprises:

The sequentially spaced deposition of the host material and the dopant material form a plurality of spaced apart matrix material layers and dopant material layers.
The method of claim 4 wherein said sequentially spaced apart deposition of host material and dopant material to form a plurality of spaced apart matrix material layers and dopant material layers comprises:

Depositing a matrix material to form a first matrix material layer;

Depositing a dopant material on the first matrix material layer to form a dopant material layer;

A matrix material is deposited on the layer of dopant material to form a second layer of matrix material.
The method according to any one of claims 1 to 5, wherein the heating temperature is 50 to 350 °C.
The method according to claim 1, 2, 4 or 5, wherein the matrix material and the doping material of at least two doped layers are sequentially deposited, and the matrix material and the doped layer of the at least two doped layers are thermally deposited at one time. Miscellaneous materials.
The method according to claim 7, wherein the at least two doped layers are a hole injecting functional layer and a hole transporting functional layer; forming the hole injecting functional layer and the hole transporting functional layer include:

Depositing a host material and a doping material of the hole injecting functional layer to form a matrix material layer and a doping material layer of the hole injecting functional layer;

Depositing a matrix material and a doping material of the hole transport functional layer to form a matrix material layer and a doping material layer of the hole transport functional layer;

The hole injecting functional layer and the matrix material layer and the doping material layer of the hole transporting functional layer are heated once.
The method according to claim 7, wherein the at least two doped layers are an electron transport functional layer and an electron injection functional layer; forming the electron transport functional layer and the electron injection functional layer include:

Depositing a host material and a doping material of the electron transport functional layer to form a matrix material layer and a doping material layer of the electron transport functional layer;

Depositing a host material and a doping material of the electron injecting functional layer to form a matrix material layer and a doping material layer of the electron injecting functional layer;

The deposited electron transport functional layer and the electron injecting functional layer matrix material layer and the doping material layer are heated once.
A method of preparing an organic light-emitting display panel, comprising: preparing an organic light-emitting device by the method according to any one of claims 1-9.