WO2016002618A1 - Slit machining device and slit machining method - Google Patents

Abstract

This slit machining device (100) machines a slit in an optical film (F1) while performing undulation control using a first detection device (106). The first detection device (106) includes: a first support body (111) that supports the first surface of an optical film (F1); a first light source unit (112a) that illuminates light from the second surface side of the optical film (F1) towards the optical film (F1) positioned on a first reflective surface (RS); a first polarizing plate (112c) provided on the optical path of light from the first light source unit (112a) towards the optical film (F1); a first imaging unit (112b) that images the reflected light image of the optical film (F1) positioned on the first reflective surface (RS1) from the second surface side of the optical film (F1); and a first pattern detection unit (114) that detects a plurality of polarized pattern sequences (F14a, F14b) positioned on the first reflective surface (RS) on the basis of the reflected light image of the optical film (F1) imaged by the first imaging unit (112b).

Description

Slit processing apparatus and slit processing method

The present invention relates to a slit processing apparatus and a slit processing method.
This application claims priority based on Japanese Patent Application No. 2014-134629 filed in Japan on June 30, 2014, the contents of which are incorporated herein by reference.

As a method for displaying a stereoscopic image, a method called FPR (Film Patterned Retarder) method is known. In an FPR 3D liquid crystal display, a patterned retardation film called an FPR film is disposed on the surface of a liquid crystal panel in order to separate a right eye image and a left eye image (see Patent Document 1).

The FPR film includes a right-eye polarization pattern array and a left-eye polarization pattern array. The right-eye polarization pattern column and the left-eye polarization pattern column are alternately arranged corresponding to the right-eye pixel column and the left-eye pixel column of the liquid crystal panel. The right-eye polarization pattern sequence and the left-eye polarization pattern sequence are orthogonal to each other in the direction of the slow axis. An alignment polarization pattern array may be disposed outside the active area where the right-eye polarization pattern array and the left-eye polarization pattern array are disposed.

JP 2012-32445 A

In the FPR film, a large number of polarization pattern rows are formed with a fine width. Therefore, when the FPR film is cut into a predetermined width or shape, or when the FPR film is bonded to the liquid crystal panel, the position of the polarization pattern row is accurately detected, and the FPR film is aligned based on the position. There must be.

For example, Patent Literature 1 describes a device for irradiating light from the lower surface side of an FPR film and imaging with a camera from the upper surface side of the FPR film as a polarization pattern array detection device.
A polarizing plate is disposed between the FPR film and the light source, and a retardation plate (¼ wavelength plate) and a polarizing plate are sequentially disposed between the FPR film and the camera from the FPR film side. The right-eye polarization pattern array and the left-eye polarization pattern array extend along the longitudinal direction of the film. These polarization pattern rows are continuously detected as the FPR film is unwound and conveyed.

However, in the configuration of Patent Document 1, since the light source is installed on the lower surface side of the FPR film, the support cannot be disposed on the lower surface side of the FPR film. Therefore, the polarization pattern array must be detected at an unstable position where the FPR film is not supported by the support. Although it is conceivable to provide a through hole in the support, it is not possible to sufficiently illuminate the FPR film with only light passing through the through hole.

Further, a protective film such as a protection film or a separator film is provided on the outermost surface of the FPR film. The protective film has birefringence and causes an unintended retardation. If the protective film is not present, the right-eye polarization pattern array and the left-eye polarization pattern array are displayed as a bright pattern and a dark pattern. However, if the protective film is present, the contrast between the bright pattern and the dark pattern is reduced. The two cannot be clearly distinguished. Therefore, it is necessary to devise such as peeling off the protective film before performing the optical measurement.

The FPR film is bonded to the surface of the polarizing plate on the display surface side of the liquid crystal panel. Recently, a polarizing plate integrated FPR film in which the polarizing plate and the FPR film are integrated is used on the surface of the liquid crystal panel. Bonding is also being considered. In this configuration, the contrast between the bright pattern and the dark pattern is further lowered due to variations in the optical axis in the plane of the polarizing plate, and it becomes more difficult to distinguish the two from each other.

An object of the present invention is to provide a slit machining apparatus and a slit machining method capable of performing slit machining by accurately detecting a polarization pattern array.

The slit processing apparatus according to the first aspect of the present invention includes a retardation layer, a polarizer layer, and a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions. A slit processing apparatus for slitting a long optical film provided in this order from the side toward the second surface side, the film supply unit for feeding out the optical film in the longitudinal direction thereof, and the film Based on the first detection device that detects the plurality of polarization pattern rows of the optical film fed out by the supply unit, and the positions of the plurality of polarization pattern rows detected by the first detection device, A first meandering control unit for controlling the meandering in the width direction, and a position downstream of the position where the first meandering control unit controls the meandering in the width direction of the optical film. A cutting section that cuts along a slit line parallel to the transport direction, and the first detection device has a first support surface that supports the first surface of the optical film, and the first support surface A first support having a first reflecting surface for reflecting light transmitted through the optical film from the second surface side to the first surface side, and at least a part of the first film, and located on the first reflecting surface A first light source unit that irradiates light from the second surface side of the optical film toward the optical film, and a first polarizing plate provided on the optical path of the light from the first light source unit toward the optical film A first imaging unit that captures a reflected light image of the optical film located on the first reflecting surface from the second surface side of the optical film, and the optical film captured by the first imaging unit. Based on the reflected light image, the first reflecting surface Including a first pattern detector for detecting a plurality of polarization pattern sequence located.

In the slit machining apparatus according to the first aspect of the present invention, the first detection device includes a first adjustment unit that adjusts a relative angle between a polarization axis of the first polarizing plate and a slow axis of the polarization pattern array. Can be included.

In the slit machining apparatus according to the first aspect of the present invention, the plurality of polarization pattern rows of the optical film are arranged downstream of the position where the first meandering control unit controls the meandering in the width direction of the optical film. Based on the second detection device to be detected and the positions of the plurality of polarization pattern rows detected by the second detection device, the first meander control unit controls the meandering in the width direction of the optical film. A second meandering control unit that controls meandering in the width direction of the optical film on the downstream side, and the second detection device has a second support surface that supports the first surface of the optical film. A second support having a second reflecting surface for reflecting light transmitted through the optical film from the second surface side to the first surface side at least in a part of the second support surface; Position on reflective surface A second light source unit that irradiates light from the second surface side of the optical film toward the optical film, and a second polarized light provided on an optical path of the light from the second light source unit toward the optical film A plate, a second imaging unit that captures a reflected light image of the optical film located on the second reflecting surface from the second surface side of the optical film, and the optical film imaged by the second imaging unit And a second pattern detecting unit that detects the plurality of polarization pattern rows located on the second reflecting surface based on the reflected light image.

In the slit machining apparatus according to the first aspect of the present invention, the second detection device includes a second adjustment unit that adjusts a relative angle between a polarization axis of the second polarizing plate and a slow axis of the polarization pattern row. Can be included.

In the slit processing apparatus according to the first aspect of the present invention, the first meandering control unit moves the position where the optical film is fed out by the film supply unit in the width direction of the optical film, thereby the optical film. And the second meandering control unit is configured to meander the width direction of the optical film by inclining the direction of the rotation axis of the guide roll supporting the optical film with respect to the transport direction of the optical film. Can be controlled.

The slit processing apparatus according to the second aspect of the present invention includes a retardation layer, a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions, and a polarizer layer, on a first surface. A slit processing apparatus for slitting a long optical film provided in this order from the side toward the second surface side, the film supply unit for feeding out the optical film in the longitudinal direction thereof, and the film Based on the first detection device that detects the plurality of polarization pattern rows of the optical film fed out by the supply unit, and the positions of the plurality of polarization pattern rows detected by the first detection device, A first meandering control unit for controlling meandering in the width direction, and a slip parallel to the transporting direction on the downstream side of the first meandering control unit in the transporting direction of the optical film. A cutting section that cuts along a line, and the first detection device has a first support surface that supports the first surface of the optical film, and is formed on at least a part of the first support surface. The first support having a first reflection surface that reflects light transmitted from the second surface side to the first surface side of the optical film, and toward the optical film located on the first reflection surface A first light source unit for irradiating light from the second surface side of the optical film, and a reflected light image of the optical film located on the first reflecting surface is captured from the second surface side of the optical film. A first pattern detecting unit that detects the plurality of polarization pattern rows located on the first reflecting surface based on the reflected light image of the optical film imaged by the first imaging unit; ,including.

In the slit machining apparatus according to the second aspect of the present invention, the plurality of polarization pattern rows of the optical film are arranged downstream of the position where the first meandering control unit controls the meandering in the width direction of the optical film. Based on the second detection device to be detected and the positions of the plurality of polarization pattern rows detected by the second detection device, the first meander control unit controls the meandering in the width direction of the optical film. A second meandering control unit that controls meandering in the width direction of the optical film on the downstream side, and the second detection device has a second support surface that supports the first surface of the optical film. A second support having a second reflecting surface for reflecting light transmitted through the optical film from the second surface side to the first surface side at least in a part of the second support surface; Position on reflective surface A second light source unit for irradiating light from the second surface side of the optical film toward the optical film, and a reflected light image of the optical film positioned on the second reflecting surface. Based on the second imaging unit that captures images from two surfaces and the reflected light image of the optical film captured by the second imaging unit, the plurality of polarization pattern rows located on the second reflecting surface are detected. And a second pattern detecting unit.

In the slit machining apparatus according to the second aspect of the present invention, the first meandering control unit moves the position where the optical film is fed out by the film supply unit in the width direction of the optical film, thereby the optical film. And the second meandering control unit is configured to meander the width direction of the optical film by inclining the direction of the rotation axis of the guide roll supporting the optical film with respect to the transport direction of the optical film. Can be controlled.

The slit processing method according to the first aspect of the present invention includes a retardation layer, a polarizer layer, and a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions from each other. A slit processing method for slitting a long optical film provided in this order from the side toward the second surface side, the film supply step of feeding out the optical film in its longitudinal direction, and the film Based on the first detection step of detecting the plurality of polarization pattern rows of the optical film fed out by the supply step, and the positions of the plurality of polarization pattern rows detected by the first detection device, A first meandering control step for controlling the meandering in the width direction, and a position downstream of the position for controlling the meandering in the width direction of the optical film by the first meandering control step. A cutting step of cutting the optical film along a slit line parallel to the transport direction, and the first detection step includes a first support surface that supports the first surface of the optical film. And a first support having a first reflection surface that reflects light transmitted from the second surface side to the first surface side on at least part of the first support surface, A first support step for supporting the first surface of the optical film, and light from the second surface side of the optical film through the first polarizing plate toward the optical film located on the first reflecting surface. First imaging step of irradiating, first imaging step of imaging a reflected light image of the optical film located on the first reflecting surface from the second surface side of the optical film, and imaging by the first imaging step Was Serial based on the reflected light image of the optical film, including a first pattern detection step of detecting a plurality of polarization pattern row positioned on the first reflecting surface.

In the slit method according to the first aspect of the present invention, the first detection step includes a first adjustment step of adjusting a relative angle between a polarization axis of the first polarizing plate and a slow axis of the polarization pattern row. be able to.

In the slit method according to the first aspect of the present invention, the plurality of polarization pattern rows of the optical film are detected downstream from the position where the first meander control step controls the meandering of the optical film in the width direction. A second detection step, and a position downstream of the position where the meandering in the width direction of the optical film is controlled by the first meander control step based on the positions of the plurality of polarization pattern rows detected by the second detection step. A second meandering control step for controlling the meandering of the optical film in the width direction, and the second detecting step has a second support surface for supporting the first surface of the optical film, A second support having a second reflection surface that reflects light transmitted through the optical film from the second surface side to the first surface side at least in a part of the second support surface. A second support step for supporting the first surface of the optical film, and a second polarizing plate from the second surface side of the optical film toward the optical film located on the second reflecting surface. A second irradiation step of irradiating light, a second imaging step of imaging a reflected light image of the optical film located on the second reflecting surface from the second surface side of the optical film, and the second imaging A second pattern detecting step of detecting the plurality of polarization pattern rows located on the second reflecting surface based on the reflected light image of the optical film imaged in the step.

In the slit method according to the first aspect of the present invention, the second detection step includes a second adjustment step of adjusting a relative angle between the polarization axis of the second polarizing plate and the slow axis of the polarization pattern array. be able to.

In the slit method according to the first aspect of the present invention, the first meandering control step moves the position where the optical film is fed out by the film supply step in the width direction of the optical film, thereby In the second meandering control step, the meandering in the width direction of the optical film is performed by inclining the direction of the rotation axis of the guide roll supporting the optical film with respect to the transport direction of the optical film. Can be controlled.

In the slit processing method according to the second aspect of the present invention, a retardation layer, a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions, and a polarizer layer are first surfaces. A slit processing method for slitting a long optical film provided in this order from the side toward the second surface side, the film supply step of feeding out the optical film in its longitudinal direction, and the film Based on the first detection step of detecting the plurality of polarization pattern rows of the optical film fed out by the supply step, and the positions of the plurality of polarization pattern rows detected by the first detection step, A first meandering control step for controlling the meandering in the width direction, and a position for controlling the meandering in the width direction of the optical film by the first meandering control step. A cutting step of cutting the optical film along a slit line parallel to the conveying direction on the flow side, and the first detecting step supports the first surface of the optical film. A first support having a first reflection surface that reflects light transmitted through the optical film from the second surface side to the first surface side, at least in part within the first support surface. A first support step for supporting the first surface of the optical film, and a first irradiation for irradiating light from the second surface side of the optical film toward the optical film located on the first reflecting surface. A first imaging step of imaging a reflected light image of the optical film located on the first reflecting surface from the second surface side of the optical film, and the optical film imaged by the first imaging step On the basis of the reflected light image comprises a first pattern detection step of detecting a plurality of polarization pattern row positioned on the first reflecting surface, a.

In the slit processing method according to the second aspect of the present invention, the plurality of polarization pattern rows of the optical film are arranged downstream of the position where the first meandering control step controls the meandering in the width direction of the optical film. Based on the second detection step to detect, and the position of the plurality of polarization pattern rows detected by the second detection step, than the position to control the meandering in the width direction of the optical film by the first meander control step A second meandering control step for controlling meandering in the width direction of the optical film on the downstream side, and the second detecting step has a second support surface for supporting the first surface of the optical film. And a second reflecting surface for reflecting light transmitted through the optical film from the second surface side to the first surface side at least in a part of the second support surface. A second support step for supporting the first surface of the optical film by the holder, and irradiating light from the second surface side of the optical film toward the optical film located on the second reflecting surface. The second imaging step, the second imaging step of imaging the reflected light image of the optical film located on the second reflecting surface from the second surface side of the optical film, and the second imaging step And a second pattern detection step of detecting the plurality of polarization pattern rows located on the second reflection surface based on the reflected light image of the optical film.

In the slit processing method according to the second aspect of the present invention, the first meandering control step moves the position in which the optical film is unwound by the film supply step in the width direction of the optical film, whereby the optical film In the second meander control step, the guide roll supporting the optical film is inclined in the width direction of the optical film by inclining the direction of the rotation axis with respect to the transport direction of the optical film. Can be controlled.

According to the present invention, it is possible to provide a slit processing apparatus and a slit processing method that can detect a polarization pattern row with high accuracy and perform slit processing.

It is the schematic of the slit processing apparatus which concerns on 1st embodiment of this invention. It is the schematic of the 1st detection apparatus with which a slit processing apparatus is equipped. It is a conceptual diagram of a 1st detection apparatus. It is sectional drawing which shows an example of an optical film. It is a top view which shows an example of an optical film. It is a figure which shows the light quantity distribution and color distribution of the reflected light image of an optical film. It is a conceptual diagram of the 1st detection apparatus applied to the slit processing apparatus which concerns on 2nd embodiment of this invention.

[First embodiment]
FIG. 1 is a schematic view of a slit machining apparatus 100 according to the first embodiment of the present invention.
FIG. 2 is a schematic diagram of the first detection device 106 provided in the slit processing device 100.
FIG. 3 is a conceptual diagram of the first detection device 106.
FIG. 4 is a cross-sectional view showing an example of the optical film F1.
FIG. 5 is a plan view showing an example of the optical film F1.

As shown in FIG. 1, the slit processing apparatus 100 of this embodiment includes a film supply unit 101, film winding units 102 and 103, an ear winding unit 104, a first meandering control unit 105, a first detection device 106, A two meandering control unit 107, a second detection device 108, a cutting unit 109 and a control device 110 are included.

The film supply unit 101 holds the original roll R1 around which the optical film F1 is wound, and feeds the optical film F1 in the longitudinal direction thereof. In the transport path FCL of the optical film F1 fed out from the film supply unit 101, the first meander control unit 105, the first detection device 106, the second meander control unit 107, the second detection device 108, and the like The cutting part 109 is arrange | positioned in order.

The slit machining apparatus 100 slits the optical film F1 along the slit lines SL1, SL2, and SL3 (see FIG. 5) while controlling the meandering of the optical film F1 by the first meandering control unit 105 and the second meandering control unit 107. Process.

As shown in FIG. 5, the optical film F1 is a long film including the active area AC and the peripheral area SR alternately in the width direction orthogonal to the longitudinal direction. The active area AC is, for example, a part facing the display area of the liquid crystal panel, and the peripheral area SR is a part facing the peripheral area located in the peripheral part of the display area of the liquid crystal panel.

In the active area AC, a plurality of polarization pattern rows DPAa and DPAb having different slow axis directions are provided corresponding to the plurality of pixel rows of the liquid crystal panel. In the display area of the liquid crystal panel, right-eye pixel columns for displaying right-eye images and left-eye pixel columns for displaying left-eye images are alternately arranged. Therefore, in the active area AC, the right-eye polarization pattern array DPAa corresponding to the right-eye pixel array and the left-eye polarization pattern array DPAb corresponding to the left-eye pixel array are alternately arranged.

In the peripheral area SR, a first polarization pattern array APAa whose slow axis direction is parallel to the right-eye polarization pattern array DPAa, and a second polarization pattern whose slow axis direction is parallel to the left-eye polarization pattern array DPAb. Rows APAb are alternately arranged. The polarization pattern rows APAa and APAb provided in the peripheral area SR can be used alone or together with the polarization pattern rows DPAa and DPAb provided in the active area AC as a reference for detecting the traveling position of the optical film F1. . In order to facilitate the detection of the polarization pattern rows APAa and APAb, for example, of the polarization pattern rows APAa and APAb provided in the peripheral area SR, the width of at least one polarization pattern row is the polarization pattern provided in the active area AC. The width of the columns DPAa and DPAb can be made wider.

The optical film F1 has a width corresponding to a plurality of liquid crystal panels (for example, two in FIG. 5). The optical film F1 is cut along the slit lines SL1, SL2, and SL3 using the slit processing apparatus 100. Slit lines SL1, SL2, and SL3 are set in the peripheral area SR. Thereby, the optical film F1 is divided into a plurality of long films having a width corresponding to one liquid crystal panel. The slit lines SL1, SL2, and SL3 are set, for example, at the positions of the boundary lines of the polarization pattern rows APAa and APAb provided in the peripheral area SR. In addition, the position of the slit line cut | disconnected by the slit process of this embodiment will be cut | disconnected by a thin line, as long as there is no problem on a process (production).

Returning to FIG. 1, the travel position immediately after the feeding of the optical film F <b> 1 fed from the film supply unit 101 is detected using the first detection device 106. The first detection device 106 detects a plurality of polarization pattern rows APAa, APAb, DPAa, and DPAb (see FIG. 5) provided on the optical film F1. The control device 110 is based on the positions of the plurality of polarization pattern rows APAa, APAb, DPAa, and DPAb detected by the first detection device 106 (for example, the positions of the boundary lines of the polarization pattern rows APAa, APAb, DPAa, and DPAb). The shift of the traveling position of the optical film F1 is detected, and the first meandering control unit 105 is controlled to control the meandering of the optical film F1 in the width direction.

The traveling position of the optical film F <b> 1 after the meandering is controlled by the first meandering control unit 105 is detected using the second detection device 108. The second detection device 108 detects a plurality of polarization pattern rows APAa, APAb, DPAa, and DPAb (see FIG. 5) provided on the optical film F1. The control device 110 is based on the positions of the plurality of polarization pattern rows APAa, APAb, DPAa, and DPAb detected by the second detection device 108 (for example, the positions of the boundary lines of the polarization pattern rows APAa, APAb, DPAa, and DPAb). The shift of the running position of the optical film F1 is detected, and the second meandering control unit 107 is controlled to control the meandering of the optical film F1 in the width direction.

For example, the first meandering control unit 105 detects the position (raw material) where the optical film F1 is fed out by the film supply unit 101 based on the shift of the traveling position of the optical film F1 detected by the first detection device 106 and the control device 110. The position of the roll R1) is moved in the width direction of the optical film F2. The first meandering control unit 105 roughly controls the shift of the traveling position of the optical film F1.

For example, the second meandering control unit 107 includes a first guide roll 115 and a second guide that support the optical film F1 based on the shift of the traveling position of the optical film F1 detected by the second detection device 108 and the control device 110. The roll 116 is inclined with respect to the transport direction of the optical film F1. The first guide roll 115 and the second guide roll 116 are arranged with their rotation axes parallel to each other. The second meandering control unit 107 integrally inclines the directions of the rotation axes of the first guide roll 115 and the second guide roll 116 with respect to the traveling direction of the optical film F1. Thereby, the traveling position of the optical film F1 is finely adjusted in the width direction, and the optical film F1 travels at a preset traveling position.

The second meandering control unit 107 may be configured such that one guide roll that supports the optical film F1 is inclined in the direction of the rotation axis with respect to the transport direction of the optical film F1.

The traveling position of the optical film F <b> 1 conveyed to the cutting unit 109 is precisely controlled by the first meandering control unit 105 and the second meandering control unit 107. The configurations of the first meandering control unit 105 and the second meandering control unit 107 are not limited to those described above. The first meandering control unit 105 is preferably one that can adjust the traveling position of the optical film F <b> 1 larger than the second meandering control unit 107. The second meandering control unit 107 is preferably capable of adjusting the traveling position of the optical film F1 more precisely than the first meandering control unit 105.

Further, the arrangement of the first meandering control unit 105, the first detection device 106, the second meandering control unit 107, and the second detection device 108 is not limited to the above. The first detection device 106 may be upstream or downstream of the first meander control unit 105. The second detection device 108 may be upstream or downstream of the second meandering control unit 107. The second detection device 108 is on the downstream side of the position where the first meandering control unit 105 controls the meandering of the optical film F1 in the width direction, and on the upstream side of the position where the cutting unit 109 cuts the optical film F1. Any one that detects a plurality of polarization pattern rows APAa, APAb, DPAa, and DPAb of the optical film F1 may be used.
The second meandering control unit 107 is downstream of the position where the first meandering control unit 105 controls the meandering of the optical film F1 in the width direction, and upstream of the position where the cutting unit 109 cuts the optical film F1. Thus, what is necessary is just to control the meandering in the width direction of the optical film F1.

The cutting part 109 cuts the optical film F1 along the slit lines SL1, SL2, and SL3 shown in FIG. The cutting part 109 can be constituted by, for example, a cutting blade or a laser cutter. A plurality of cutting portions 109 are arranged in the width direction of the optical film F1 at the same intervals as the arrangement intervals of the slit lines SL1, SL2, and SL3. The control device 110 controls the travel position of the optical film F <b> 1 by the first meandering control unit 105 and the second meandering control unit 107 so that the slit lines SL <b> 1, SL <b> 2, SL <b> 3 are arranged immediately below the cutting unit 109. The cutting unit 109 is a slit line parallel to the conveyance direction of the optical film F1 on the downstream side of the position where the first meandering control unit 105 and the second meandering control unit 107 control the meandering in the width direction of the optical film F1. Cut along SL1, SL2, and SL3.

Of the optical film F1 divided in the width direction by the cutting part 109, the part including the active area AC is wound up by the film winding parts 102 and 103, and is a long film having a width corresponding to one liquid crystal panel. Provided as original fabric rolls R2, R3. Of the optical film F1 divided by the cutting unit 109, the part not including the active area AC is wound up by the ear winding unit 104 and discarded.

Hereinafter, the configuration of the first detection device 106 and the second detection device 108 will be described with reference to FIGS. 2 and 3. The configuration of the first detection device 106 and the second detection device 108 is the same. Therefore, in the following description, the configuration of the first detection device 106 will be mainly described.

As shown in FIGS. 2 and 3, the first detection device 106 of the present embodiment includes a first support 111, a first imaging unit 112, a first pattern detection unit 114, a first adjustment unit 113, including. The first detection device 106 detects polarization pattern rows APAa, APAb, DPAa, and DPAb (see FIG. 5) included in the optical film F1.

The optical film F1 includes at least a retardation layer F20, a polarizer layer F16, and a patterned retardation layer F14. The retardation layer F20, the polarizer layer F16, and the patterned retardation layer F14 are provided on the second surface (first support) from the first surface (surface supported by the first support 111) side of the optical film F1. It is provided in this order toward the surface opposite to the side supported by the body 111. Of the optical film F1, the portion excluding the retardation layer F11 is the optical film body F21.

The patterned retardation layer F14 includes a plurality of polarization pattern rows F14a and F14b having different directions of the slow axis RTAX. The patterned retardation layer F14 includes, for example, a first polarization pattern row F14a and a second polarization pattern row F14b whose slow axis RTAX directions are orthogonal to each other. The slow axis RTAX of the first polarization pattern row F14a forms an angle of 45 ° clockwise, for example, with respect to the polarization axis (transmission axis) PLAX1 of the polarizer layer F16 when viewed from the normal direction of the optical film F1. . The slow axis RTAX of the second polarization pattern row F14b is, for example, 45 degrees counterclockwise with respect to the polarization axis PLAX1 of the polarizer layer F16 when viewed from the normal direction of the optical film F1. The first polarization pattern row F14a and the second polarization pattern row F14b are alternately arranged in a direction orthogonal to the longitudinal direction. The first polarization pattern column F14a corresponds to the polarization pattern column APAa and the polarization pattern column DPAa in FIG. 5, and the second polarization pattern column F14b corresponds to the polarization pattern column APAb and the polarization pattern column DPAb in FIG.

The retardation layer F20 is detachably provided on the optical film body F21 as a protective film (separator film) for the optical film body F21. The protective film is usually produced by biaxial stretching and has birefringence. The retardation of the protective film is not sufficiently controlled as compared with the patterned retardation layer F14 and the polarizer layer F16. Therefore, the protective film imparts an unintended retardation to the light transmitted through the patterned retardation layer F14. Such a phase difference should be eliminated in order to reduce the accuracy of optical measurement. In the present embodiment, such a phase difference is positively used to detect the polarization pattern rows F14a and F14b. It is carried out. This point will be described later.

The optical film F1 can include layers other than the retardation layer F20, the polarizer layer F16, and the patterned retardation layer F14. In the present embodiment, for example, a part or all of the optical film F2 shown in FIG. 4 can be used as the optical film F1.

The optical film F2 in FIG. 4 includes a first retardation layer (protection film) F11, a base material layer F12, a photo-alignment layer F13, a patterned retardation layer F14, a first adhesive layer F15, a polarizer layer F16, and a second adhesive. A layer F17, a polarizer protective layer F18, an adhesive layer F19, and a second retardation layer (separator film) F20 are included in this order in the thickness direction. Of the optical film F2, the portion excluding the first retardation layer F11 and the second retardation layer F20 is the optical film main body F21.

Hereinafter, a specific configuration of the optical film F2 will be described.

<Polarizer layer>
The polarizer layer F16 transmits light having a vibration surface in a certain direction out of incident light, and absorbs light having a vibration surface perpendicular to the light. The light emitted through the polarizer layer F16 becomes linearly polarized light.

Examples of the polarizer layer F16 include a step of uniaxially stretching a polyvinyl alcohol resin film, a step of adsorbing a dichroic dye by dyeing the polyvinyl alcohol resin film with a dichroic dye, and a dichroic dye. The polarizing film manufactured through the process of processing the polyvinyl-alcohol-type resin film which adsorb | sucked with a boric-acid aqueous solution, and the process of washing with water after the process by a boric-acid aqueous solution can be used.

The polyvinyl alcohol-based resin can be obtained by saponifying a polyvinyl acetate-based resin. The polyvinyl acetate resin may be a copolymer of vinyl acetate and another monomer copolymerizable therewith in addition to polyvinyl acetate, which is a homopolymer of vinyl acetate. Examples of other monomers copolymerizable with vinyl acetate include unsaturated carboxylic acids, olefins, vinyl ethers, unsaturated sulfonic acids, and acrylamides having an ammonium group.

As the dichroic dye, for example, iodine or a dichroic organic dye is used. When iodine is used as the dichroic dye, a method of immersing and dyeing a polyvinyl alcohol-based resin film in an aqueous solution containing iodine and potassium iodide can be employed.

Uniaxial stretching of the polyvinyl alcohol resin film may be performed before dyeing with the dichroic dye, may be performed simultaneously with dyeing with the dichroic dye, or after dyeing with the dichroic dye, It may be performed during the acid treatment.

The thickness of the polarizer layer F16 can be, for example, 5 μm or more and 40 μm or less in average thickness.

<Pattern retardation layer>
The patterned retardation layer F14 emits incident linearly polarized light as light of two types of polarization states. The patterned retardation layer F14 is formed on the photo-alignment layer F13.

The photo-alignment layer F13 has an alignment regulating force with respect to a material having liquid crystallinity (hereinafter referred to as a liquid crystal material). The photo-alignment layer F13 is formed using a polymerizable photo-alignment material. As the photo-alignment material, a material that exhibits an alignment regulating force when exposed to polarized light is used. The photo-alignment layer F13 which hold | maintained the alignment control force is formed by making it superpose | polymerize after exposing polarized light to the photo-alignment material, and expressing the alignment control force. As such a photo-alignment material, a conventionally known material can be used.

The photo-alignment layer F13 includes, for example, a first alignment region and a second alignment region in which the directions of the alignment regulating force are orthogonal to each other. Each of the first alignment region and the second alignment region extends in a strip shape in a direction parallel to one side of the optical film F2. The first alignment region and the second alignment region are alternately provided in a direction orthogonal to the extending direction of the first alignment region and the second alignment region.

The patterned retardation layer F14 includes a first polarization pattern row F14a corresponding to the first alignment region of the photo-alignment layer F13 and a second polarization pattern row F14b corresponding to the second alignment region. The slow axis of the first polarization pattern row F14a and the second polarization pattern row F14b are orthogonal to each other. The first polarization pattern row F14a changes linearly polarized light to first circularly polarized light. The second polarization pattern row F14b changes linearly polarized light into second circularly polarized light having a rotation direction different from that of the first circularly polarized light.

The patterned retardation layer F14 is formed using a liquid crystal material having a polymerizable functional group. The patterned retardation layer F14 arranges the liquid crystal material in two directions according to the alignment regulating force of the first alignment region and the second alignment region that the photo-alignment layer F13 has, and further, the polymerizable functional group that the liquid crystal material has Is reacted to maintain the liquid crystal phase of the liquid crystal material to be used and cured. As such a polymerizable liquid crystal material, a conventionally known material can be used.

<Base material layer>
The base material layer F12 is used as a base material that supports the photo-alignment layer F13 and the patterned retardation layer F14. The photo-alignment layer F13 and the patterned retardation F14 are formed by applying a photo-alignment material and a liquid crystal material to the surface of the base material layer F12.

Examples of the material for forming the base material layer F12 include triacetyl cellulose (TAC) resin, polycarbonate resin, polyvinyl alcohol resin, polystyrene resin, (meth) acrylate resin, cyclic polyolefin resin, and polypropylene resin. Examples thereof include polyolefin resins, polyarylate resins, polyimide resins, and polyamide resins.

The thickness of the base material layer F12 can be, for example, 40 μm or more and 100 μm or less in average thickness.

<Polarizer protective layer>
As a material for forming the polarizer protective layer F18, the same material as that of the base material layer F12 described above can be used. Examples of such materials include polyolefins including triacetyl cellulose (TAC) resin, polycarbonate resin, polyvinyl alcohol resin, polystyrene resin, (meth) acrylate resin, cyclic polyolefin resin, and polypropylene resin. Resin, polyarylate resin, polyimide resin, polyamide resin and the like.

The thickness of the polarizer protective layer F18 can be, for example, 5 μm or more and 80 μm or less in average thickness.

<Adhesive layer>
A material for forming the first adhesive layer F15 and the second adhesive layer F17 is, for example, a composition using a polyvinyl alcohol-based resin or a urethane resin as a main component, dissolved in water, or a water-based adhesive dispersed in water, A solvent-free photocurable adhesive containing a photocurable resin and a cationic photopolymerization initiator can be used. As a material for forming the first adhesive layer F15 and the second adhesive layer F17, it is preferable to use a photocurable adhesive from the viewpoint that the volume shrinkage during production is small and the thickness can be easily controlled. It is more preferable to use an adhesive.

As the ultraviolet curable adhesive, various materials conventionally used in the production of polarizing plates can be used as long as they are supplied in a liquid-applicable state. The ultraviolet curable adhesive is a cationically polymerizable compound, for example, an epoxy compound, more specifically, an intramolecular molecule as described in JP-A-2004-245925, from the viewpoint of weather resistance, polymerizability, and the like. It preferably contains an epoxy compound having no aromatic ring as one of the ultraviolet curable components.

As such an epoxy compound, for example, a hydrogenation obtained by nuclear hydrogenation of an aromatic polyhydroxy compound, which is a raw material of an aromatic epoxy compound represented by diglycidyl ether of bisphenol A, and converting it to glycidyl ether. Examples thereof include an epoxy compound, an alicyclic epoxy compound having at least one epoxy group bonded to an alicyclic ring in the molecule, and an aliphatic epoxy compound having a glycidyl ether of an aliphatic polyhydroxy compound as a representative example.

In addition to cationically polymerizable compounds such as epoxy compounds as representative examples of ultraviolet curable adhesives, polymerization initiators, particularly to generate cationic species or Lewis acids upon irradiation with ultraviolet rays, initiate polymerization of cationically polymerizable compounds. The photocationic polymerization initiator is blended. Furthermore, the ultraviolet curable adhesive may contain various additives such as a thermal cationic polymerization initiator that initiates polymerization by heating, and other photosensitizers.

The materials for forming the first adhesive layer F15 and the second adhesive layer F17 may be the same or different. However, from the viewpoint of productivity, the first adhesive layer F15 and the second adhesive layer F17 are based on the premise that an appropriate adhesive force can be obtained. The adhesive layer F15 and the second adhesive layer F17 are preferably formed using the same adhesive.

The thickness of the 1st adhesion layer F15 and the 2nd adhesion layer F17 can be 0.5 micrometer or more and 5 micrometers or less by average thickness, for example.

<Adhesive layer>
The adhesive layer F19 is used, for example, to bond the optical film body F21 to the display surface of the liquid crystal panel. Examples of the pressure-sensitive adhesive that forms the pressure-sensitive adhesive layer F19 include those having an acrylic resin, a silicone-based resin, polyester, polyurethane, polyether, or the like as a base resin. Among them, acrylic adhesives based on acrylic resins are excellent in optical transparency, retain moderate wettability and cohesion, and are also excellent in weather resistance and heat resistance. It is preferably used because peeling problems such as floating and peeling hardly occur under the conditions.

The acrylic resin constituting the acrylic pressure-sensitive adhesive includes an acrylic acid alkyl ester having an ester group having an alkyl group having 20 or less carbon atoms such as a methyl group, an ethyl group, a butyl group, or a 2-ethylhexyl group, An acrylic copolymer with a functional group-containing (meth) acrylic monomer such as (meth) acrylic acid and (meth) acrylic acid-2-hydroxyethyl is preferably used.

The pressure-sensitive adhesive layer F19 containing such an acrylic copolymer is relatively free without causing adhesive residue or the like on the glass substrate when it is necessary to peel off after being bonded to the liquid crystal panel. It can be easily peeled off. The acrylic copolymer preferably has a glass transition temperature of 25 ° C. or lower, and more preferably 0 ° C. or lower. The acrylic copolymer usually has a weight average molecular weight of 100,000 or more.

The thickness of the adhesive layer F19 can be, for example, 1 μm or more and 40 μm or less in average thickness.

<First retardation layer>
The first retardation layer (protection film) F11 protects the patterned retardation layer F14 together with the base material layer F12. The first retardation layer F11 is provided to be peelable from the base material layer F12.

The first retardation layer F11 is formed by forming an adhesive / peelable resin layer or an adhesive resin layer on a transparent resin film to give weak adhesiveness. Examples of the transparent resin film include extruded films of thermoplastic resins such as polyethylene terephthalate, polyethylene naphtholate, polyethylene, and polypropylene, co-extruded films combining them, and films obtained by stretching them uniaxially or biaxially. be able to. As the transparent resin film, it is preferable to use polyethylene terephthalate or polyethylene uniaxially or biaxially stretched film which is excellent in transparency and homogeneity and is inexpensive.

Examples of the adhesive / peelable resin layer include acrylic adhesives, natural rubber adhesives, styrene-butadiene copolymer resin adhesives, polyisobutylene adhesives, vinyl ether resin adhesives, and silicone resin adhesives. And so on. Examples of the adhesive resin layer include an ethylene-vinyl acetate copolymer resin. As the adhesive / peelable resin layer, it is preferable to use an acrylic adhesive having excellent transparency.

The thickness of the first retardation layer F11 can be, for example, an average thickness of 15 μm to 75 μm.

<Second retardation layer>
The second retardation layer (separator film) F20 covers the adhesive layer F19 and protects the adhesive layer F19. The second retardation layer F20 is provided to be peelable from the adhesive layer F19. As the second retardation layer F20, a transparent resin film similar to the first retardation layer F11 can be used.

The thickness of the second retardation layer F20 can be, for example, 15 μm or more and 75 μm or less in average thickness.

In this embodiment, for example, the optical film F2 is used as the optical film F1. However, for example, a film obtained by removing the first retardation layer F11 from the optical film F2 may be used as the optical film F1.

2 and 3, the first support 111 has a cylindrical first support surface 111a parallel to the width direction of the optical film F1. The 1st support body 111 is one of the some conveyance rolls which comprise the conveyance path | route FCL (refer FIG. 1) of the optical film F1, for example. The first support 111 rotates with the conveyance of the optical film F1 while supporting the first surface of the optical film F1 (in this embodiment, for example, the upper surface of the second retardation layer F20 in FIG. 4).

The first support 111 has a reflection surface RS (first reflection surface) that reflects light transmitted through the optical film F1 from the second surface side to the first surface side, at least in part within the first support surface 111a. . In the case of this embodiment, the first support 111 is, for example, a mirror-finished metal roll, and the entire first support surface 111a is a reflective surface RS. The configuration is not limited to this. The material and configuration of the reflective surface RS are not particularly limited. The reflective surface RS may be formed by mirror-finishing the surface of the first support 111, and is formed by disposing a reflective member such as a metal reflective film or a reflective polarizing plate on the surface of the first support 111. May be. Further, the entire first support surface 111a may be the reflection surface RS, or only a part of the first support surface 111a may be the reflection surface RS.

The first imaging unit 112 includes a first light source unit 112a, a first imaging unit 112b, and a first polarizing plate 112c. For example, the first imaging unit 112 is configured so that light transmitted through one polarization pattern row and reflected by the reflection surface RS passes through the same polarization pattern row and enters the first imaging unit 112b. The one light source unit 112a and the first imaging unit 112b are held close to each other.

The first light source unit 112a irradiates light from the second surface of the optical film F1 (the lower surface of the first retardation layer F11 in FIG. 4) toward the optical film F1 positioned on the reflection surface. The 1st polarizing plate 112c is provided on the optical path of the light which goes to the optical film F1 from the 1st light source part 112a. The light emitted from the first light source unit 112a passes through the first polarizing plate 112c and is converted into linearly polarized light. As the first light source unit 112a, a known light source such as an LED can be used. For example, the first light source unit 112a emits white light toward the optical film F1, but the light emitted by the first light source unit 112a is not limited thereto. For example, depending on the phase difference and wavelength dispersion characteristics of the retardation layer F20, the patterned retardation layer F14, the polarizer layer F16, and the first polarizing plate 112c included in the optical film F1, the light having an appropriate wavelength is first It can irradiate from the light source part 112a.

The 1st imaging part 112b images the reflected light image of the optical film F1 located on the reflective surface RS from the 2nd surface side of the optical film F1. As the first imaging unit 112b, known imaging means such as a CCD camera can be used.

Based on the reflected light image of the optical film F1, the first pattern detection unit 114 detects the first polarization pattern row F14a (APAa, DPAa) and the second polarization pattern row F14b (APAb, DPAb) located on the reflection surface RS. Then, the position information of the boundary lines of the polarization pattern rows F14a and F14b is extracted. As the first pattern detection unit 114, a known image processing unit can be used. The image signal of the reflected light image captured by the first imaging unit 112b is converted into image data converted into digital data by the first pattern detection unit 114, and known image processing such as color extraction processing and binarization processing is performed. Applied.

The first polarization pattern row F14a and the second polarization pattern row F14b are different from each other in the direction formed by the slow axis RMAX with respect to the polarization axis (transmission axis) PLAX2 of the first polarizing plate 112c. Therefore, the first polarizing plate 112c, the patterned retardation layer F14, the polarizer layer F16, and the retardation layer F20 are transmitted, reflected by the reflective surface RS, and again the retardation layer F20, the polarizer layer F16, and the patterned retardation. The brightness and color of the light transmitted through the layer F14 are different between the light transmitted through the first polarization pattern array F14a and the light transmitted through the second polarization pattern array F14b. Therefore, the first pattern detection unit 114 determines the first polarization pattern row F14a and the second polarization pattern row F14b based on the difference in luminance or color between the reflected light images of the first polarization pattern row F14a and the second polarization pattern row F14b. Is detected.

For example, as shown in FIGS. 6A and 6B, when white light is emitted from the first light source unit 112a, the light that passes through the first polarization pattern array F14a and enters the first imaging unit 112b is as follows. In contrast, the red light R has a large amount of light, whereas the light transmitted through the second polarization pattern array F14b and incident on the first imaging unit 112b has a green color G and a small amount of light. The first pattern detection unit 114 performs known image processing such as color extraction processing and binarization processing on the image data of the reflected light image, thereby the first polarization pattern row F14a and the second polarization pattern row F14b. Is detected. Any one of the color extraction process and the binarization process can be selected and used, or both can be used in combination. For example, the first pattern detection unit 114 extracts a portion having a brighter color (for example, red R in FIG. 6) from the image data of the reflected light image, and further extracts the extracted image data. By performing the digitization process, the first polarization pattern row F14a and the second polarization pattern row F14b are detected as a bright pattern and a dark pattern. Many algorithms for color extraction processing and binarization processing are known and are not limited to specific detection methods.

In order to adjust the contrast of the reflected light images of the plurality of polarization pattern rows F14a and F14b (ratio of the brightness of the reflected light image), the first light source unit 112a may irradiate colored light such as red or green. For example, when the red light R is emitted from the first light source unit 112a, the reflected light image of the second polarization pattern array F14b that hardly includes the red color R is black. Therefore, the ratio between the brightness of the reflected light image of the first polarization pattern array F14a and the brightness of the reflected light image of the second polarization pattern array F14b (hereinafter referred to as “the reflected light image of the first polarization pattern array and the second polarization pattern array). Of the first polarization pattern row F14a and the second polarization pattern row F14b.

The first light source unit 112a can also emit green G light. However, the contrast of the reflected light images of the first polarization pattern row F14a and the second polarization pattern row F14b is better when the first light source unit 112a that emits a brighter color (for example, red R in FIG. 6) is used. It is advantageous in increasing

As described above, the contrast of the reflected light images of the first polarization pattern array F14a and the second polarization pattern array F14b varies depending on the wavelength of light incident on the optical film F1. The wavelength of the light emitted from the first light source unit 112a is such that the contrast of the reflected light images of the first polarization pattern row F14a and the second polarization pattern row F14b is relatively larger than when white light is emitted. Can be set to any wavelength.

The first adjustment unit 113 adjusts the relative angle between the polarization axis PLAX2 of the first polarizing plate 112c and the slow axis RMAX of the polarization pattern rows F14a and F14b. By adjusting the angle formed by the slow axis RMAX of the first polarization pattern row F14a and the second polarization pattern row F14b with respect to the polarization axis PLAX2 of the first polarizing plate 112c by the first adjustment unit 113, the first polarization pattern row Asymmetry (difference in color, brightness, etc.) of the reflected light images of F14a and the second polarization pattern row F14b can be increased. Therefore, the first pattern detection unit 114 can accurately detect the polarization pattern rows F14a and F14b located on the reflection surface.
The relative angle between the polarization axis PLAX2 of the first polarizing plate 112c and the slow axis RMAX of the polarization pattern rows F14a and F14b is adjusted by, for example, rotating the first polarizing plate 112c by the first adjustment unit 113. After being attached to a possible jig, the operator checks the reflected light image of the optical film F1 and rotates the first polarizing plate 112c attached to the rotatable jig together with the jig. be able to. In this case, the operator rotates the jig while confirming the reflected light image of the optical film F1, and at the position where the asymmetry between the first polarization pattern row F14a and the second polarization pattern row F14b is determined to be the largest. The procedure can be to stop the rotation of the tool. On the other hand, the adjustment of the relative angle can be automatically performed by the first adjusting unit 113 by rotating the jig with a motor (not shown). Moreover, although adjustment of said relative angle may be implemented for every process, when the original fabric roll (refer code | symbol R1 in FIG. 1) is replaced | exchanged, the reflected light image of the optical film F1 is confirmed, When the asymmetry in the reflected light image is large, the relative angle may not be adjusted, and may be adjusted only when the asymmetry is small and the pattern recognition is not good.

The control device 110 acquires the position information of the boundary lines of the polarization pattern rows F14a and F14b extracted by the first pattern detection unit 114. The control device 110 confirms the arrangement position of the optical film F1 relative to the first support 111 based on the positional information on the boundary lines of the polarization pattern rows F14a and F14b. Based on the positions of the polarization pattern rows F14a and F14b (for example, the positions of the boundary lines of the polarization pattern rows F14a and F14b), the control device 110 performs the actual travel position of the optical film F1 with respect to the preset travel position. It is detected how much is shifted. The control device 110 moves the film supply unit 101 in the width direction orthogonal to the transport direction of the optical film F1 by the first meandering control unit 105 shown in FIG. 1 so as to reduce the shift of the traveling position of the optical film F1. Let

The control device 110 includes a computer system. The computer system includes an arithmetic processing unit such as a CPU and a storage unit such as a memory and a hard disk. The function of the first pattern detection unit 114 is realized by an arithmetic processing unit. The control device 110 includes an interface capable of executing communication with an external device of the computer system. The film supply unit 101, the film winding units 102 and 103, the ear winding unit 104, the first meandering control unit 105, the first Operations of external devices such as the detection device 106, the second meandering control unit 107, the second detection device 108, and the cutting unit 109 are comprehensively controlled.

The configuration of the second detection device 108 is the same as that of the first detection device 106. The second detection device 108 includes a second support member 117, a second imaging unit 118, a second pattern detection unit 120, and a second adjustment unit 119. The second support 117 has the same configuration as the first support 111, the second imaging unit 118 has the same configuration as the first imaging unit 112, and the second pattern detection unit 120 has the same configuration as the first pattern detection unit 114. The second adjustment unit 119 has the same configuration as the first adjustment unit 113.

Similarly to the first detection device 106, the second detection device 108 captures the reflected light image of the optical film F <b> 1 reflected by the reflection surface RS (second reflection surface) of the second support 117 with the second imaging unit 118. Then, based on the imaging result, the first polarization pattern array F14a (APAa, DPAa) and the second polarization pattern array F14b (APAb, DPAb) located on the reflection surface RS are detected, and the first polarization pattern array F14a The position information of the boundary line with the second polarization pattern row F14b is extracted.

As described above, in the slit machining apparatus 100 of the present embodiment, the first detection apparatus 106 and the second detection apparatus 108 are configured as described above. In the first detection device 106 and the second detection device 108, the light transmitted through the patterned retardation layer F14 and the polarizer layer F16 is incident on the reflection surface RS via the retardation layer F20 and reflected by the reflection surface RS. The light is again incident on the polarizer layer F16 and the patterned retardation layer F14 via the retardation layer F20. Therefore, in the reflected light image captured by the imaging units 112b and 118b, a plurality of pattern rows having different colors and luminances are displayed corresponding to the first polarization pattern row F14a and the second polarization pattern row F14b. Therefore, if image processing such as color extraction processing or binarization processing is performed on the image data of the reflected light image, the first polarization pattern row F14a and the second polarization pattern row F14b can be detected with high accuracy.

If the retardation layer F20 is not provided between the patterned retardation layer F14 and the reflection surface RS, the reflected light image captured by the imaging units 112b and 118b is a black image. Therefore, the first polarization pattern row F14a and the second polarization pattern row F14b cannot be detected. By providing the retardation layer F20 between the patterned retardation layer F14 and the reflecting surface RS, light leaking from the polarizer layer F16 is generated, and the color and brightness of the light are also different from those of the first polarization pattern array F14a. The transmitted light is different from the transmitted light through the second polarization pattern array F14b.

The retardation layer F20 often causes inconveniences in optical measurement because the retardation thereof is not sufficiently controlled as compared with the patterned retardation layer F14 and the polarizer layer F16. Therefore, it is necessary to devise a technique such as peeling the retardation layer in advance before optical measurement. In this embodiment, however, the retardation of the retardation layer F20 is peeled off positively using the retardation of the retardation layer F20. Without detection, the polarization pattern rows F14a and F14b are detected. Therefore, it is possible to provide a detection device and a detection method capable of detecting the polarization pattern rows F14a and F14b with high accuracy and efficiency.

In the present embodiment, the asymmetry of the reflected light images of the first polarization pattern row F14a and the second polarization pattern row F14b can be increased by the adjustment units 113 and 119. Therefore, the detection accuracy of the polarization pattern rows F14a and F14b is increased.

The slit processing apparatus 100 according to the present embodiment is based on the positions of the polarization pattern rows F14a and F14b detected by the first detection device 106 and the second detection device 108 (for example, the positions of the boundary lines of the polarization pattern rows F14a and F14b). Thus, the traveling position of the optical film F1 is controlled. Therefore, the traveling position can be controlled with high accuracy. In addition, since the travel position is controlled in two steps using the first meandering control unit 105 and the second meandering control unit 107, the shift of the travel position of the optical film F1 can be almost eliminated. Therefore, the possibility that the active area AC is accidentally disconnected due to the shift of the traveling position is reduced, and the yield is improved. Moreover, since the width | variety of the surplus part (peripheral area) which considered the shift | offset | difference of driving | running | working position can be narrowed, the waste of the optical film F1 decreases and manufacturing cost is reduced.

[Second Embodiment]
FIG. 7 is a conceptual diagram of the first detection device 130 applied to the slit machining device according to the second embodiment of the present invention.
In the present embodiment, components that are the same as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

In this embodiment, the posture of the optical film F1 supported by the first support 111 is different from that of the first embodiment. Further, based on this difference in posture, the configuration of the first detection device 130 is also different from the first detection device 106 of the first embodiment.

The first detection device 130 of the present embodiment includes a first support 111, a first imaging unit 131, and a first pattern detection unit 114. The first support 111 supports the optical film F1 in such a posture that the patterned retardation layer F21 of the optical film F1 is disposed below the polarizer layer F16. The optical film F1 has a first surface when the surface supported by the first support 111 is a first surface, and a surface opposite to the side supported by the first support 111 is a first surface. A first retardation layer F11, a patterned retardation layer F14, and a polarizer layer F16 are included in this order from the surface side to the second surface side.

The first imaging unit 131 includes a first light source unit 112a and a first imaging unit 112b.
In the present embodiment, since the polarizer layer F16 is disposed between the patterned retardation layer F14 and the first light source unit 112a, a separate polarizing plate is disposed between the first light source unit 112a and the optical film F1. There is no need to do. Therefore, the first polarizing plate 112c and the first adjustment unit 113 shown in the first embodiment are omitted.

The first pattern detection unit 114 detects the polarization pattern rows F14a and F14b located on the reflection surface RS based on the reflected light image of the optical film F1, and extracts the position information of the boundary lines of the polarization pattern rows F14a and F14b. To do. The image signal of the reflected light image captured by the first imaging unit 112b is converted into image data converted into digital data by the first pattern detection unit 114, and known image processing such as color extraction processing and binarization processing is performed. Applied.

The first polarization pattern row F14a and the second polarization pattern row F14b are different from each other in the direction formed by the slow axis RMAX with respect to the polarization axis PLAX of the polarizer layer F16. Therefore, the light transmitted through the polarizer layer F16, the patterned retardation layer F14, and the retardation layer F11, reflected by the reflecting surface RS, and transmitted again through the retardation layer F11, the patterned retardation layer F14, and the polarizer layer F16. The brightness and color of the light beam are different between the light transmitted through the first polarization pattern array F14a and the light transmitted through the second polarization pattern array F14b. Therefore, the first pattern detection unit 114 determines the first polarization pattern row F14a and the second polarization pattern row F14b based on the difference in luminance or color between the reflected light images of the first polarization pattern row F14a and the second polarization pattern row F14b. Is detected.

Although not shown, the configuration of the second detection device is the same as that of the first detection device 130. Also in the second detection apparatus, the second polarizing plate 118c and the second adjustment unit 119 described in the first embodiment are omitted. Also in the second detection device, since the posture of the optical film F1 supported by the second support 117 is different from that of the first embodiment, the first polarization pattern row F14a imaged by the second imaging unit 118b and the first Based on the difference in luminance or color of the reflected light image of the two-polarization pattern row F14b, the first polarization pattern row F14a and the second polarization pattern row F14b can be detected.

Also in the present embodiment, the polarization pattern rows F14a and F14b are detected without actively separating the retardation layer F11 by actively using the retardation of the retardation layer F11. Therefore, it is possible to provide a detection device and a detection method capable of detecting the polarization pattern rows F14a and F14b with high accuracy and efficiency. And by controlling the traveling position of the optical film F1 using such a detecting device and a detecting method, it is possible to provide a slit processing apparatus and a slit processing method capable of accurately controlling the traveling position. .

The preferred embodiments according to the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. Various shapes, combinations, and the like of the constituent members shown in the above-described examples are examples, and various modifications can be made based on design requirements and the like without departing from the gist of the present invention.

In the above-described embodiment, two types of polarization pattern sequences have been described as the polarization pattern sequence included in the patterned retardation layer. However, the number of polarization pattern sequences included in the patterned retardation layer is not limited to two, and may be three or more. Also in this case, the reflected light images of the plurality of polarization pattern rows are different from each other in luminance and color. Therefore, the pattern detection unit can detect the plurality of polarization pattern rows based on the difference in luminance or color of the reflected light images of the plurality of polarization pattern rows.

According to the slit processing apparatus and the slit processing method according to the present invention, it is possible to provide a slit processing apparatus and a slit processing method capable of accurately detecting a polarization pattern array and performing slit processing.

DESCRIPTION OF SYMBOLS 100 ... Slit processing apparatus, 101 ... Film supply part, 105 ... 1st meander control part, 106 ... 1st detection apparatus, 107 ... 2nd meander control part, 108 ... 2nd detection apparatus, 109 ... Cutting part, 111 ... 1st One support, 111a ... first support surface, 112a ... first light source unit, 112b ... first imaging unit, 112c ... first polarizing plate, 113 ... first adjustment unit, 114 ... first pattern detection unit, 115 ... first One guide roll, 116 ... second guide roll, 117 ... second support, 117a ... second support surface, 118a ... second light source unit, 118b ... second imaging unit, 118c ... second polarizing plate, 119 ... second Adjustment unit, 120 ... second pattern detection unit, F1, F2 ... optical film, F11 ... first retardation layer (retardation layer), F14 ... patterned retardation layer, F14a, F14b, APAa, APAb, DPAa, DPA ... polarization pattern sequence, F16 ... polarizer layer, F20 ... second retardation layer (retardation layer), RS ... reflecting surface, SL1, SL2, SL3 ... slit line

Claims (16)

1. A retardation layer, a polarizer layer, and a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions are provided in this order from the first surface side to the second surface side. A slitting device for slitting the obtained long optical film,
   A film supply section for feeding out the optical film in its longitudinal direction;
   A first detector for detecting the plurality of polarization pattern rows of the optical film fed by the film supply unit;
   A first meandering control unit that controls meandering in the width direction of the optical film based on the positions of the plurality of polarization pattern rows detected by the first detection device;
   A cutting unit that cuts the optical film along a slit line parallel to the transport direction on the downstream side of the position where the first meander control unit controls the meandering in the width direction of the optical film,
   Including
   The first detection device includes:
   Light having a first support surface that supports the first surface of the optical film, and having transmitted the optical film from the second surface side to the first surface side in at least a part of the first support surface A first support having a first reflecting surface for reflecting
   A first light source unit that emits light from the second surface side of the optical film toward the optical film located on the first reflecting surface;
   A first polarizing plate provided on the optical path of the light from the first light source part toward the optical film;
   A first imaging unit that images a reflected light image of the optical film located on the first reflecting surface from the second surface side of the optical film;
   A first pattern detection unit that detects the plurality of polarization pattern rows located on the first reflection surface based on the reflected light image of the optical film imaged by the first imaging unit;
   Slitting machine including
2. The slit processing apparatus according to claim 1, wherein the first detection device includes a first adjustment unit that adjusts a relative angle between a polarization axis of the first polarizing plate and a slow axis of the polarization pattern array.
3. A second detection device that detects the plurality of polarization pattern rows of the optical film on the downstream side of the position where the first meandering control unit controls the meandering in the width direction of the optical film;
   Based on the positions of the plurality of polarization pattern rows detected by the second detection device, on the downstream side of the position where the first meandering control unit controls the meandering in the width direction of the optical film, A second meander control unit for controlling the meandering in the width direction;
   Including
   The second detection device is
   Light having a second support surface for supporting the first surface of the optical film, and transmitting the optical film from the second surface side to the first surface side in at least a part of the second support surface A second support having a second reflective surface for reflecting
   A second light source unit that emits light from the second surface side of the optical film toward the optical film located on the second reflecting surface;
   A second polarizing plate provided on the optical path of the light from the second light source part toward the optical film;
   A second imaging unit that images the reflected light image of the optical film located on the second reflecting surface from the second surface side of the optical film;
   A second pattern detection unit that detects the plurality of polarization pattern rows located on the second reflection surface based on the reflected light image of the optical film imaged by the second imaging unit;
   The slit processing apparatus of Claim 1 or 2 containing.
4. The slit processing device according to claim 3, wherein the second detection device includes a second adjustment unit that adjusts a relative angle between a polarization axis of the second polarizing plate and a slow axis of the polarization pattern array.
5. The first meandering control unit controls the meandering of the optical film by moving a position in which the optical film is drawn out by the film supply unit in the width direction of the optical film,
   The second meandering control unit controls meandering in the width direction of the optical film by inclining the direction of the rotation axis of the guide roll supporting the optical film with respect to the transport direction of the optical film. Or the slit processing apparatus of 4.
6. A retardation layer, a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions, and a polarizer layer are provided in this order from the first surface side to the second surface side. A slitting device for slitting the obtained long optical film,
   A film supply section for feeding out the optical film in its longitudinal direction;
   A first detector for detecting the plurality of polarization pattern rows of the optical film fed by the film supply unit;
   A first meandering control unit that controls meandering in the width direction of the optical film based on the positions of the plurality of polarization pattern rows detected by the first detection device;
   A cutting unit that cuts the optical film along a slit line parallel to the transport direction on the downstream side in the transport direction of the optical film from the first meandering control unit,
   Including
   The first detection device includes:
   Light having a first support surface that supports the first surface of the optical film, and having transmitted the optical film from the second surface side to the first surface side in at least a part of the first support surface A first support having a first reflecting surface for reflecting
   A first light source unit that emits light from the second surface side of the optical film toward the optical film located on the first reflecting surface;
   A first imaging unit that images a reflected light image of the optical film located on the first reflecting surface from the second surface side of the optical film;
   A first pattern detection unit that detects the plurality of polarization pattern rows located on the first reflection surface based on the reflected light image of the optical film imaged by the first imaging unit;
   Slitting machine including
7. A second detection device that detects the plurality of polarization pattern rows of the optical film on the downstream side of the position where the first meandering control unit controls the meandering in the width direction of the optical film;
   Based on the positions of the plurality of polarization pattern rows detected by the second detection device, on the downstream side of the position where the first meandering control unit controls the meandering in the width direction of the optical film, A second meander control unit for controlling the meandering in the width direction;
   Including
   The second detection device is
   Light having a second support surface for supporting the first surface of the optical film, and transmitting the optical film from the second surface side to the first surface side in at least a part of the second support surface A second support having a second reflective surface for reflecting
   A second light source unit that emits light from the second surface side of the optical film toward the optical film located on the second reflecting surface;
   A second imaging unit that images the reflected light image of the optical film located on the second reflecting surface from the second surface side of the optical film;
   A second pattern detection unit that detects the plurality of polarization pattern rows located on the second reflection surface based on the reflected light image of the optical film imaged by the second imaging unit;
   The slit processing apparatus of Claim 6 containing.
8. The first meandering control unit controls the meandering of the optical film by moving a position in which the optical film is drawn out by the film supply unit in the width direction of the optical film,
   The second meandering control unit controls meandering in the width direction of the optical film by inclining a direction of a rotation axis of a guide roll supporting the optical film with respect to a transport direction of the optical film. The slit processing apparatus described in 1.
9. A retardation layer, a polarizer layer, and a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions are provided in this order from the first surface side to the second surface side. A slit processing method for slitting a long optical film,
   A film supply step of feeding out the optical film in its longitudinal direction;
   A first detection step of detecting the plurality of polarization pattern rows of the optical film fed out by the film supply step;
   A first meandering control step for controlling the meandering in the width direction of the optical film based on the positions of the plurality of polarization pattern rows detected by the first detection device;
   A cutting step of cutting the optical film along a slit line parallel to the transport direction on the downstream side of the position where the meandering in the width direction of the optical film is controlled by the first meandering control step;
   Including
   The first detection step includes
   Light having a first support surface that supports the first surface of the optical film, and having transmitted the optical film from the second surface side to the first surface side in at least a part of the first support surface A first support step of supporting the first surface of the optical film by a first support having a first reflecting surface that reflects
   A first irradiation step of irradiating light through the first polarizing plate from the second surface side of the optical film toward the optical film located on the first reflecting surface;
   A first imaging step of imaging a reflected light image of the optical film located on the first reflective surface from the second surface side of the optical film;
   A first pattern detecting step for detecting the plurality of polarization pattern rows located on the first reflecting surface based on the reflected light image of the optical film imaged by the first imaging step;
   A slitting method including:
10. The slit processing method according to claim 9, wherein the first detection step includes a first adjustment step of adjusting a relative angle between a polarization axis of the first polarizing plate and a slow axis of the polarization pattern row.
11. A second detection step of detecting the plurality of polarization pattern rows of the optical film on the downstream side of the position where the first meander control step controls the meandering in the width direction of the optical film;
    Based on the positions of the plurality of polarization pattern rows detected by the second detection step, on the downstream side of the position of controlling the meandering in the width direction of the optical film by the first meander control step, A second meandering control step for controlling the meandering in the width direction;
    Including
    The second detection step includes
    Light having a second support surface for supporting the first surface of the optical film, and transmitting the optical film from the second surface side to the first surface side in at least a part of the second support surface A second support step of supporting the first surface of the optical film by a second support having a second reflective surface for reflecting
    A second irradiation step of irradiating light through the second polarizing plate from the second surface side of the optical film toward the optical film located on the second reflecting surface;
    A second imaging step of imaging a reflected light image of the optical film located on the second reflecting surface from the second surface side of the optical film;
    A second pattern detecting step for detecting the plurality of polarization pattern rows located on the second reflecting surface based on the reflected light image of the optical film imaged by the second imaging step;
    The slit processing method of Claim 9 or 10 containing.
12. The slit processing method according to claim 11, wherein the second detection step includes a second adjustment step of adjusting a relative angle between a polarization axis of the second polarizing plate and a slow axis of the polarization pattern row.
13. In the first meandering control step, the meandering of the optical film is controlled by moving the position in which the optical film is drawn out in the film supply step in the width direction of the optical film,
    The second meandering control step controls meandering in the width direction of the optical film by inclining the direction of the rotation axis of the guide roll supporting the optical film with respect to the transport direction of the optical film. Or the slit processing method of 12.
14. A retardation layer, a patterned retardation layer including a plurality of polarization pattern rows having different slow axis directions, and a polarizer layer are provided in this order from the first surface side to the second surface side. A slit processing method for slitting a long optical film,
    A film supply step of feeding out the optical film in its longitudinal direction;
    A first detection step of detecting the plurality of polarization pattern rows of the optical film fed out by the film supply step;
    A first meander control step for controlling meandering in the width direction of the optical film based on the positions of the plurality of polarization pattern rows detected by the first detection step;
    A cutting step of cutting the optical film along a slit line parallel to the transport direction on the downstream side of the position where the meandering in the width direction of the optical film is controlled by the first meandering control step;
    Including
    The first detection step includes
    Light having a first support surface that supports the first surface of the optical film, and having transmitted the optical film from the second surface side to the first surface side in at least a part of the first support surface A first support step of supporting the first surface of the optical film by a first support having a first reflecting surface that reflects
    A first irradiation step of irradiating light from the second surface side of the optical film toward the optical film located on the first reflecting surface;
    A first imaging step of imaging a reflected light image of the optical film located on the first reflective surface from the second surface side of the optical film;
    A first pattern detecting step for detecting the plurality of polarization pattern rows located on the first reflecting surface based on the reflected light image of the optical film imaged by the first imaging step;
    A slitting method including:
15. A second detection step of detecting the plurality of polarization pattern rows of the optical film on the downstream side of the position where the first meander control step controls the meandering in the width direction of the optical film;
    Based on the positions of the plurality of polarization pattern rows detected by the second detection step, on the downstream side of the position of controlling the meandering in the width direction of the optical film by the first meander control step, A second meandering control step for controlling the meandering in the width direction;
    Including
    The second detection step includes
    Light having a second support surface for supporting the first surface of the optical film, and transmitting the optical film from the second surface side to the first surface side in at least a part of the second support surface A second support step of supporting the first surface of the optical film by a second support having a second reflective surface for reflecting
    A second irradiation step of irradiating light from the second surface side of the optical film toward the optical film located on the second reflecting surface;
    A second imaging step of imaging a reflected light image of the optical film located on the second reflecting surface from the second surface side of the optical film;
    A second pattern detecting step for detecting the plurality of polarization pattern rows located on the second reflecting surface based on the reflected light image of the optical film imaged by the second imaging step;
    The slit processing method of Claim 14 containing.
16. In the first meandering control step, the meandering of the optical film is controlled by moving the position in which the optical film is drawn out in the film supply step in the width direction of the optical film,
    16. The second meandering control step controls meandering in the width direction of the optical film by inclining the direction of the rotation axis of the guide roll supporting the optical film with respect to the transport direction of the optical film. The slit processing method of description.

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