WO2015163136A1

WO2015163136A1 - Abrasive pad

Info

Publication number: WO2015163136A1
Application number: PCT/JP2015/060803
Authority: WO
Inventors: 太志柏田; 伸徳重; 高橋　大介
Original assignee: 富士紡ホールディングス株式会社
Priority date: 2014-04-23
Filing date: 2015-04-07
Publication date: 2015-10-29
Also published as: KR20160148565A; CN106232296B; JP2015208782A; KR102383987B1; JP6292397B2; CN106232296A

Abstract

This abrasive pad (13) is used to abrade a convex curving surface portion (1a) of an abraded article (1) having a convex curving surface portion, wherein the abrasive pad is characterized in that an annular concave abrading portion (13a) for contacting the convex curving surface portion of the abraded article while driven to rotate in the circumferential direction about an axis at the center of the circle of a disk is arranged on the side surface of a disk-shaped elastic body having thickness, the compressive stress of the elastic body constituting the annular concave abrading portion being in the range of 50-150 gf/cm2 at 0.1 mm compression, and the ratio of compressive stress (compressive stress at 0.5 mm compression/compressive stress at 0.1 mm compressive stress) being in the range of 5-30. The convex curving surface portion of the abraded article can thus be abraded to a mirror finish with high accuracy.

Description

Polishing pad

The present invention relates to a polishing pad for polishing the convex curved surface portion of an object to be polished having a convex curved surface portion. More specifically, the center of a circle of the disk is pivoted on a side surface of a disk-shaped elastic body. An annular concave polishing portion that is brought into contact with the convex curved surface portion of the object to be polished while being rotationally driven in the circumferential direction is provided, and the object to be polished in which the convex curved surface portion is formed by the rotational driving, particularly convex on the outer periphery. The present invention relates to a polishing pad suitable for mirror-finishing a workpiece having a curved surface portion with high accuracy.

Conventionally, when polishing the curved surface portion of an object to be polished having a convex curved surface portion, a disk-shaped polishing member having a thickness has been used. Specifically, a circular disk of a disk is provided on the side surface of the polishing member. A polishing member is known in which the convex curved surface portion of an object to be polished is brought into contact while being rotationally driven in the circumferential direction around the center of the shaft (Patent Document 1).

JP 2007-5661 A

However, although the polishing member of Patent Document 1 is suitable for removing unnecessary film formation attached to the edge portion of the semiconductor wafer intended by Patent Document 1, the convex curved surface portion is highly accurate. There is no idea of mirror finishing polishing, for example, when the convex curved surface portion of a member having a convex curved surface portion formed on the outer peripheral edge is mirror-finished with high accuracy, a polishing member caused by vibration of a rotational drive, etc. The uneven contact with the object to be polished cannot be sufficiently absorbed, resulting in uneven polishing, and it is extremely inappropriate for mirror finishing of a curved surface with high accuracy without unevenness.
Moreover, in the said patent document 1, when the convex curved surface part of a to-be-polished object is grind | polished, the boundary of the convex curved surface part which the grinding | polishing member contact | abutted and the plane part which did not contact | abut remains, and finish quality is improved. There was also a problem of lowering.
In view of such a problem, the present invention provides a polishing pad capable of mirror-finishing a convex curved surface portion of an object having a convex curved surface portion with high accuracy.

That is, the present invention provides a polishing pad for polishing the convex curved surface portion of an object having a convex curved surface portion, and the center of a circle of the disk on a side surface of a disk-shaped elastic body An annular concave polishing portion that is brought into contact with the convex curved surface portion of the object to be polished while being driven to rotate in the circumferential direction about the axis is arranged, and the compressive stress at the time of 0.1 mm compression of the elastic body constituting the annular concave polishing portion is A polishing pad having a range of 50 to 150 gf / cm ² and a compressive stress ratio (compressive stress at 0.5 mm compression / compressive stress at 0.1 mm compression) of 5 to 30. ing.
In addition, the elastic body constituting the annular concave polished portion has an initial load of 20 g, a strain range of 1.0%, a temperature of 40 ° C., a frequency of 60 Hz, and a loss coefficient tan δ of 0.150 to 0.420 when measured in a compression mode. It may be a range.
Furthermore, an opening may be formed on the surface of the annular concave polished portion.
Furthermore, the annular concave polishing portion is larger in diameter than the convex curved portion of the object to be polished, and the annular concave polishing portion is brought into contact with the top of the object to be polished and the bottom of the annular concave polishing portion. The annular projections located at both ends in the thickness direction of the workpiece are separated from the plane portion adjacent to the convex curved surface portion of the object to be polished, and the object to be polished sinks into the annular concave polishing portion by the pressing force at the time of polishing. The annular concave polishing portion may be deformed so that the annular protrusion is in close contact with the planar portion of the object to be polished.
The annular protrusion may be provided with a notch portion at a predetermined interval along the circumferential direction of at least one of both end portions in the thickness direction.

That is, according to the above invention, the annular concave polishing portion of the polishing pad is compressed and deformed along the shape of the convex curved surface portion of the object to be polished by the pressing force during polishing, and an appropriate stress at that time is applied to the object to be polished. Since it can be given to the convex curved surface portion, the convex curved surface portion can be mirror-finished with high accuracy.
Further, the ratio of compressive stress in the elastic body constituting the polishing pad (compressive stress at 0.5 mm compression / compressive stress at 0.1 mm compression) is set in the range of 5 to 30, so that the polishing pad rotates. Even if the amount of compressive deformation of the annular concave polishing portion fluctuates due to vibration or unevenness formed on the surface of the object to be polished, stable stress can be applied to the convex curved surface portion of the object to be polished. Generation | occurrence | production of a grinding | polishing part can be suppressed.
Since the hole is formed on the surface of the annular concave polishing portion, the slurry as the polishing liquid can be held in the annular concave polishing portion, so that stable polishing efficiency can be obtained.
Furthermore, the annular concave polishing portion is larger in diameter than the convex curved portion of the object to be polished, and the annular concave polishing portion is brought into contact with the top of the object to be polished and the bottom of the annular concave polishing portion. The annular projections located at both end portions in the thickness direction of the part are separated from the plane portion adjacent to the convex curved surface portion of the object to be polished.
From this state, the object to be polished sinks into the annular concave polishing part by the pressing force during polishing, and the annular concave polishing part is deformed, so that the annular protrusion is adjacent to the convex curved surface part of the object to be polished. It comes in close contact with the flat part. By setting it as such a structure, the boundary of a convex curved surface part and a plane part does not remain, but a high-quality to-be-polished object can be obtained.
Furthermore, by arranging a notch in the annular projection and adjusting the size, shape, number, and interval of the notch as appropriate, adjustment of the slurry supply / drainage amount, promotion of discharge of polishing waste, polishing Adjustments can be made so that the boundary between the convex curved surface portion and the flat surface portion of the object does not remain.

The top view of the polish device concerning a present Example. The side view of the said polishing apparatus. It is an expanded sectional view of a polishing pad and a thing to be polished, (a) shows the state before polish, and (b) shows the state under polish, respectively. The top view of a polishing pad. A table showing experimental results.

The illustrated embodiment will be described below. FIGS. 1 and 2 show a plan view and a cross-sectional view of a polishing apparatus 2 for polishing a convex curved surface portion 1a formed on the outer peripheral edge of an object 1 to be polished.
The polishing apparatus 2 supplies slurry between the holding table 3 for holding the object to be polished 1, the polishing means 4 having the polishing pad 13 according to the present invention, and the polishing pad 13 and the object to be polished 1. The slurry supply means 5 is provided.
The object to be polished 1 has a substantially rectangular shape as shown in FIG. 1, and a convex curved surface portion 1 a is formed on the outer peripheral edge of the object to be polished 1.
Since the convex curved surface portion 1a has been subjected only to rough grinding in the previous step or is not yet processed, irregularities such as grinding flaws and burrs are formed on the surface.
In addition, as the to-be-polished object 1, the planar shape may have other shapes, such as a circle, and a metal, glass, a plastic, a ceramic, a sapphire etc. are mentioned as a raw material.

The holding table 3 has a structure for holding the workpiece 1 horizontally. The holding table 3 is prepared to be smaller than the workpiece 1 so that the convex curved portion 1a protrudes outward from the holding table 3 side from the end of the holding table 3.
The polishing means 4 includes a polishing jig 11 provided at a position facing the holding table 3 and a moving means 12 for moving the polishing jig 11 in the direction in which the object to be polished 1 is located, The moving means 12 is controlled by a control means (not shown).
The moving means 12 is configured to move along the outer peripheral edge while the polishing jig 11 is in contact with the outer peripheral edge of the workpiece 1 by a driving means (not shown).
The polishing jig 11 is provided with a disk-shaped polishing pad 13, and the polishing pad 13 is disposed so that its axial direction is vertical, and is rotated at a high speed of, for example, 1000 rpm to 6000 rpm by a driving means (not shown). It has become.
In addition, a vibration absorbing mechanism such as a cushion material or a spring that absorbs vibration due to the operation of the driving unit may be disposed inside the through hole of the polishing pad 13 and between the polishing pad 13 and the polishing jig 11. .
Thus, as shown in FIG. 3, even when the polishing pad 13 is pressed against the convex curved surface portion 1 a of the workpiece 1, the displacement of the workpiece 1 is suppressed, and the workpiece 1 is polished. It is preferable that it can sink more stably.
More preferably, the spring is appropriately set in accordance with the material of the object 1 to be polished and the required processing accuracy of the convex curved portion 1a by adjusting the biasing force.
In the present embodiment, the means for holding the workpiece 1 horizontally by the holding table 3 has been described. However, the present invention is not limited to this. For example, the workpiece 1 may be held vertically and horizontally, and the polishing jig 11 may be moved along the outer peripheral edge while contacting the outer peripheral edge of the workpiece 1, or the polishing jig 11 is fixed and the holding table is fixed. The workpiece 1 may be polished by moving 3.

The polishing pad 13 according to the present embodiment has a disk shape as shown in FIGS. 3 and 4, and an annular recess for polishing the convex curved surface portion 1 a of the workpiece 1 on the side surface. An annular protrusion 13b is provided at both end portions in the thickness direction of the annular concave polishing portion 13a.
The polishing pad 13 is made of a material (elastic body) having elasticity. Specifically, the polishing pad 13 is made of a non-woven fabric impregnated with a polyurethane resin manufactured using the manufacturing method described below, or a material such as foamed polyurethane. It is constituted by. And by comprising by these raw materials, the elastic body which comprises the said cyclic | annular concave grinding | polishing part 13a has an open cell and / or a closed cell, and innumerable micropores are formed in the surface.
The diameter of the polishing pad 13 can be 35 to 250 mm depending on the object 1 to be polished, and the thickness of the object 1 to be polished is 3.0 to 30.0 mm. The dimensions are possible.
Further, the annular concave polishing portion 13a of the polishing pad 13 is formed in accordance with the shape of the convex curved surface portion 1a of the object 1 to be polished, and has, for example, a semicircular shape with a substantially sectional radius of 1.5 to 15.0 mm. The convex curved surface portion 1a can be polished.
The convex curved surface portion 1a of the object to be polished 1 does not necessarily have a perfect semicircular shape, and the annular concave polishing portion 13a is compressed and deformed during polishing corresponding to the shape of the convex curved surface portion 1a. It is only necessary to have a structure capable of applying an appropriate stress.
Furthermore, in the present embodiment, the amount of protrusion of the annular protrusion 13b can be made different, so that the planar portion of the workpiece 1 is within a range of 1.0 to 30.0 mm from the position adjacent to the convex curved surface portion 1a. 1b can also be polished.

FIG. 3A shows a state before the workpiece 1 contacts the polishing pad 13, and the annular concave polishing portion 13 a has a slightly larger diameter than the convex curved surface portion 1 a of the workpiece 1. Is formed.
Therefore, when the apex of the convex curved portion 1a of the workpiece 1 and the bottom of the annular concave polishing portion 13a are brought into contact with each other, the annular projection 13b is brought into contact with the convex curved portion 1a of the workpiece 1. It is separated from the adjacent planar portion 1b.
In addition, when the convex curved surface part 1a of the to-be-polished object 1 is not perfect semicircle shape, for example, when the convex curved surface part 1a is formed of two or more convex parts, the said large diameter is the convex shape. It means that it has a shape that is greatly formed at a required magnification according to the number of convex portions of the curved surface portion 1a.
When the workpiece 1 is pressed against the annular concave polishing portion 13a from this state, the workpiece 1 sinks against the material of the polishing pad 13, and the annular concave polishing portion 13a is formed as shown in FIG. It deform | transforms and it adhere | attaches along the shape of the convex curved surface part 1a.
Further, when the annular concave polishing portion 13a is in close contact with the convex curved surface portion 1a, the annular projection 13b approaches the flat surface portion 1b and closely adheres with a weak stress, and the flat surface portion 1b is also convexly curved by the annular projection 13b. Polishing is possible with a lower polishing amount than the portion 1a. As a result, the boundary between the convex curved surface portion 1a and the flat surface portion 1b does not remain, and a high-quality workpiece 1 can be obtained.
Further, a chamfered shape 13c is formed on the annular protrusion 13b, so that the object to be polished 1 can be easily inserted between the annular protrusion 13b and the annular protrusion 13b when polishing. In addition, by appropriately adjusting the length, chamfering angle, and shape of the chamfered shape 13c, it is possible to perform adjustment so that the boundary between the convex curved surface portion 1a and the flat surface portion 1b of the workpiece 1 does not remain. .
Further, as shown in FIG. 4, notches 13d are formed at predetermined intervals in the annular protrusion 13b, and the slurry supplied from the slurry supply means 5 is used as the annular concave polishing portion 13a and the object 1 to be polished. Good supply in between.
Here, since an opening is formed in the surface of the annular concave polishing portion 13b, the supplied slurry is held by the opening, and good polishing performance by the slurry can be obtained. .
Note that only one of the upper and lower annular protrusions 13b may be provided, and the notched part 13d may be omitted for either one of the annular protrusions 13b. Further, the size of the notch 13d is not particularly limited, and the shape is not particularly limited. It may be a semicircular shape, a polygon such as a substantially triangular shape or a substantially rectangular shape. Although the number and interval are not particularly limited, it is preferably formed at intervals of 30 to 60 ° in a plan view of the annular protrusion 13b at 6 to 12 locations.
As described above, by appropriately adjusting the size, shape, number, and interval of the notch portions 13d provided in the annular protrusion 13b, not only the supply amount of slurry but also the adjustment of the drainage amount and the promotion of the discharge of polishing waste, It is also possible to make adjustments such that the boundary between the convex curved surface portion 1a and the flat surface portion 1b of the object to be polished does not remain.

As described above, the polishing pad 13 of this embodiment is made of a material such as a nonwoven fabric impregnated with polyurethane resin or foamed polyurethane, and these materials have the following properties.
The material constituting the polishing pad 13 has a compressive stress in the range of 50 to 150 gf / cm ² when compressed to 0.1 mm, and a ratio of compressive stress (compressed stress at 0.5 mm compressed / 0.1 mm compressed). The compressive stress is in the range of 5-30.
Further, the loss coefficient tan δ in the material constituting the polishing pad 13 is set in the range of 0.150 to 0.420. In particular, the range of the loss coefficient tan δ is the initial load 20 g, the strain range 1.0%, the temperature 40 ° C., and the frequency 60 Hz. More preferably, it is obtained in compressed mode. The loss coefficient tan δ represents the ratio of storage elastic modulus (E ′) and loss elastic modulus (E ″), E ″ / E ′.

According to the polishing pad 13 having the above configuration, the following effects can be obtained.
First, in the material constituting the polishing pad 13, the compression stress at 0.1mm compression is preferably 50 ~ 150gf / cm ^2, more preferably 60 ~ 150gf / cm ^2. Within the above numerical range, an appropriate stress can be applied to the convex curved surface portion 1a of the workpiece 1 submerged in the polishing pad 13, so that highly accurate mirror finish polishing can be performed.
When the compressive stress at the time of 0.1 mm compression is less than 50 gf / cm ² , the stress applied to the object to be polished is too small, so that sufficient polishing cannot be performed, resulting in uneven polishing, and when greater than 150 gf / cm ² , This is not preferable because the polishing load increases and scratches are easily generated.
The ratio of compressive stress (compressive stress at 0.5 mm compression / compressive stress at 0.1 mm compression) is preferably 5 to 30, and more preferably 5 to 20. Even if the sinking amount of the object to be polished 1 fluctuates, it is possible to stably apply stress to the object 1 to be polished, and to reduce polishing unevenness and unpolished portions.
If the ratio of compressive stress is less than 5, minute irregularities cannot be polished, resulting in uneven polishing. On the other hand, if it is larger than 30, stable stress cannot be applied to the workpiece 1 and uneven polishing occurs. End up.
More specifically, since the convex curved surface portion 1a of the workpiece 1 before polishing is subjected only to rough grinding in advance in the previous step or is not yet processed, grinding marks or Fine irregularities such as burrs remain, and the surface roughness is, for example, about 0.4 mm.
Since the polishing pad 13 and the workpiece 1 are relatively moved during polishing, the unevenness of the convex curved surface portion 1 a reaches the contact portion between the polishing pad 13 and the workpiece 1. The sinking amount of the object 1 to be polished into the annular concave polishing portion 13b varies.
Further, when the polishing pad 13 is rotated at a high speed as in the present embodiment, the vibration increases due to the operation of the driving means and the like, and the amount of subsidence also varies due to this vibration.
Even if the sinking amount fluctuates due to the unevenness or vibration of the convex curved surface portion 1a in this way, the material of the polishing pad 13 of the present example has the above-described properties. It is possible to keep the stress applied stably and reduce polishing unevenness.

Next, the loss factor tan δ of the material constituting the polishing pad 13 of this embodiment is preferably 0.15 to 0.420, more preferably 0.350 to 0.420. When the value of tan δ is in the above range, polishing with excellent polishing uniformity is possible.
More specifically, the polishing pad 13 rotates about an axis perpendicular to the direction in which the workpiece 1 sinks into the annular concave polishing portion 13a. The top tends to be excessively polished.
Therefore, by setting the range of the loss factor tan δ, the stress received from the workpiece 1 when the workpiece 1 sinks into the polishing pad 13 is appropriately absorbed, whereby the entire convex curved surface portion 1a is absorbed. Polish uniformly.
On the other hand, when the loss coefficient tan δ is smaller than 0.150, the polishing pad 13 cannot absorb the displacement, the top of the convex curved surface portion 1a is excessively polished, and an unpolished portion is generated at a location away from the top. Moreover, since stress is not uniformly applied to the entire convex curved surface portion 1a, polishing unevenness occurs.
On the other hand, when the loss coefficient tan δ is larger than 0.420, the viscosity of the polishing pad 13 is increased, the polishing grains are easily embedded in the polishing pad 13, and the grinding force is reduced.
In this embodiment, particularly, by setting the range of the loss factor tan δ to the above range at the actual polishing heat temperature of the polishing portion, that is, 40 ° C., good polishing performance at the time of actual polishing can be obtained. .

FIG. 5 shows the experimental results of the inventive products 1 to 3 according to the present invention and the

comparative products

1 and 2 prepared for comparison. In this experiment, the inventive products 1 to 3 and the

comparative products

1 and 2 are shown. Compression stress (gf / cm ² ) at 0.1 mm compression, ratio of compression stress (compression stress at 0.5 mm compression / compression stress at 0.1 mm compression), loss factor tan δ, The presence / absence, the presence / absence of visual scratches, and the presence / absence of visual unpolished parts were measured.
The procedure for obtaining the invention products 1 to 3 and the

comparison products

1 and 2 will be described below.

First, the polishing pad according to Invention 1 was made of foamed polyurethane, and specifically manufactured by the following manufacturing process.
First, as a prepolymer of the first component, an isocyanate group-containing urethane prepolymer (288 parts by mass) obtained by reacting 2,4-TDI with PTMG having a number average molecular weight of about 1000 is heated to 50 ° C. under reduced pressure. Defoamed. This prepolymer had an isocyanate content of 7.7%.
The second component is crude MOCA (50 parts by mass), PTMG (50 parts by mass) having a number average molecular weight of about 1000, water (0.52 parts by mass), a catalyst (0.3 parts by mass), a silicon-based surfactant. (0.3 parts by mass) was added and stirred and mixed at 50 ° C., and then degassed under reduced pressure.
Then, the first component: second component is supplied to the mixer at a flow rate of 36 kg / min at a mass ratio of 100: 43, and air is supplied from the nozzle provided in the stirring rotor of the mixer to 35 L / It was supplied at a flow rate of min.
Subsequently, the obtained mixed liquid was poured into a mold (890 mm × 890 mm) and cured, and then the formed polyurethane resin foam was extracted from the frame.
Finally, this foam is sliced to a thickness of 9.0 mm to produce a urethane sheet, which is cut into a disk shape with an outer diameter of 40.0 mm and a semicircular annular recess with a radius of 3.5 mm on its side. A polishing portion 13a is provided, and semicircular cutout portions 13d having a radius of 2.5 mm are provided at two upper and lower annular projections 13b corresponding to the annular concave polishing portion 13a at intervals of 60 ° in plan view, that is, six locations each. In addition, a polishing pad 13 having the above shape was obtained by providing a through hole for fixing to the polishing jig 11 at the center of the disk. The notch 13d was provided at the same position in plan view both in the thickness direction of the annular protrusion 13b.

The polishing pad 13 according to the invention product 2 is made of a nonwoven fabric impregnated with a polyurethane resin, and specifically manufactured by the following manufacturing process.
First, a resin solution was prepared by adding 53 parts by mass of DMF as a solvent to 53 parts by mass of a DMF solution containing 30% by mass of a polyether-based polyurethane resin having a 100% modulus of 6 MPa.
The modulus is an index representing the repulsive force of the resin, and the load applied when the non-foamed resin sheet is stretched 100% (when stretched to twice the original length) is the cross-sectional area before stretching. The divided value is called 100% modulus. A higher value means that the resin is more difficult to deform.
On the other hand, a sheet-like fiber base material is prepared, and the fiber base material is a non-woven fabric whose fiber material is PET, and the fineness and fiber length are 2.2 dtex × 51 mm, 3.3 dtex × 51 mm mass ratio 1: 2 and having a thickness of 12 mm and a basis weight of 1500 g / m ² .
Subsequently, after the fiber base material is immersed in the adjusted resin solution, the resin solution is squeezed out using a mangle roller capable of pressurizing between a pair of rollers, so that the resin solution is substantially uniformly applied to the fiber base material. Impregnated.
Further, the fibrous base material impregnated with the resin solution is immersed in a coagulating liquid composed of water at room temperature, the polyether polyurethane resin is coagulated and regenerated to obtain a precursor sheet, and the precursor sheet is taken out from the coagulating liquid. Then, the DMF was removed by dipping in a cleaning solution made of water, and after further drying, the skin layer on the surface was removed by slicing to obtain a 9.0 mm thick polishing pad sheet. Next, this is cut out into a disk shape having an outer diameter of 40.0 mm, and a semicircular annular concave polishing portion 13 a having a radius of 3.5 mm is provided on the side surface, and the two annular projections 13 b corresponding to the annular concave polishing portion 13 a have a radius. The 2.5 mm semi-circular cutouts 13d are provided at intervals of 60 ° in plan view, that is, at six points each, and by providing a through hole for fixing to the polishing jig 11 at the center of the disk. A polishing pad 13 having a shape was obtained. The notch 13d was provided at the same position in plan view both in the thickness direction of the annular protrusion 13b.

Next, the polishing pad 13 according to the inventive product 3 was different from the inventive product 2 in that the 100% modulus of the resin was changed to 9 MPa, and the polishing pad 13 was obtained by the same process except that.

And the comparative product 1 obtained the polishing pad 13 by the method similar to the invention product 1 except having changed the isocyanate group content of the prepolymer to 6.3%.
Moreover, the comparative product 2 obtained the polishing pad 13 by the method similar to the invention product 2 except having changed the 100% modulus of resin into 34 MPa.

In measuring the compressive stress of the polishing pad 13, the material constituting the polishing pad 13 is first cut into 12 mm × 12 mm × 15 mm, and the test piece is mounted on a test machine (manufactured by Shimadzu Corporation, Micro Autograph, MST-I). In the upper center, the compression direction was set to 15 mm, and a circular pressure plate (flat plate) having a diameter of 20 mm was applied with a load of 0 to 8000 gf / cm ² at a speed of 0.1 mm / min. In addition, when the thickness of the sample piece in the compression direction was less than 1.5 cm, a plurality of test pieces were stacked so that the total thickness was 15 mm.
Then, the compressive stress when the pressure plate sinks 0.1 mm into the test piece and when the press plate sinks 0.5 mm is obtained, and the ratio of the compressive stress (compressive stress at the time of 0.5 mm compression) is calculated from the calculated compressive stress. / Compressive stress at 0.1 mm compression).
As a result, the compression stress at 0.1 mm compression in Invention 1 was 64 gf / cm ² , and the compression stress ratio (compression stress at 0.5 mm compression / compression stress at 0.1 mm compression) was 8.0. Met.
Inventive product 2 had a compressive stress of 104 gf / cm ² at the time of 0.1 mm compression, and the ratio of compressive stress (compressive stress at 0.5 mm compression / compressive stress at 0.1 mm compression) was 17.7. .
Inventive product 3 had a compression stress of 128 gf / cm ² at 0.1 mm compression, and the compression stress ratio (compression stress at 0.5 mm compression / compression stress at 0.1 mm compression) was 23.4. .
In the comparative product 1, the compression stress at the time of 0.1 mm compression was 39 gf / cm ² , and the compression stress ratio (compression stress at the time of 0.5 mm compression / compression stress at the time of 0.1 mm compression) was 4.8. .
In the comparative product 2, the compression stress at the time of 0.1 mm compression was 192 gf / cm ² , and the ratio of the compression stress (compression stress at the time of 0.5 mm compression / compression stress at the time of 0.1 mm compression) was 32.1. .

The loss coefficient (tan δ) of the polishing pad 13 was measured using a dynamic viscoelasticity measuring apparatus (RSA-III, manufactured by TA Instruments Japan Co., Ltd.).
Specifically, a test piece of 5 mm × 5 mm was taken from the polishing pad 13 of the invention and the comparative product, and this test piece was subjected to an initial load of 20 g and a strain range of 1.0% using a dynamic viscoelasticity measuring device. The storage elastic modulus E ′ and the loss elastic modulus E ″ when the frequency is gradually changed in the frequency range of 1 to 70 Hz at a temperature of 40 ° C. are measured by the compression mode, and the loss coefficient tan δ at 60 Hz is further calculated from these values. Was calculated.
The set frequency was set to 60 Hz corresponding to the number of rotations of the polishing pad 13 (3000 rpm).
As a result, the loss factor tan δ of Invention 1 was 0.390, Invention 2 was 0.153, and Invention 3 was 0.169.
On the other hand, the loss factor tan δ of the comparative product 1 was 0.262, and the comparative product 2 was 0.147.

The evaluation of polishing unevenness of the polishing pad 13, the evaluation of scratches, and the evaluation of the presence or absence of unpolished portions were performed by observing the polished object 1 that was actually polished under the following polishing conditions.
As the object to be polished 1, a stainless steel plate having a curved surface ground on the outer periphery is used, and a 100% alumina slurry having a pH of 10 is supplied as a slurry between the object to be polished 1 and the polishing pad 13 at a flow rate of 90 cc / min. While the polishing pad 13 was rotated at a rotational speed of 3000 rpm, the outer periphery of the workpiece 1 was moved at a speed of 80 mm / min for polishing. During polishing, the polishing pad 13 was always submerged in the object to be polished by about 0.1 mm for polishing.
And about the to-be-polished object 1 which grinding | polishing was complete | finished, the visual confirmation was performed about grinding | polishing unevenness. Specifically, the case where the degree of gloss was not different depending on the location on the surface of the object 1 to be polished was evaluated as ◯, and the case where the difference was seen in the gloss level was evaluated as x.
As a result, the invention products 1 to 3 were evaluated as “good”, and the

comparative products

1 and 2 were evaluated as “x”.
On the other hand, the scratch was visually confirmed with respect to the polished object 1 after polishing. The case where no linear flaw was confirmed was evaluated as ◯, and the case where one or more flaws were confirmed was evaluated as x.
Further, the presence or absence of an unpolished portion is visually confirmed as an unpolished portion in the vicinity of the boundary between the convex curved surface portion 1a and the flat surface portion 1b of the workpiece 1 that is not polished and appears wrinkled. The case where the unpolished part could not be confirmed was designated as “none”, and the confirmed part was designated as “present”.
As a result, the inventive products 1 to 3 were evaluated as “good” and “none” for polishing unevenness, scratches, and unpolished portions, while the comparative product 1 was evaluated as “good” for polishing unevenness and scratches. However, the evaluation for the unpolished part was “Yes”, and the comparative product 2 was evaluated as “Poor” and “Poor” for the polishing unevenness, scratch, and unpolished part. .

DESCRIPTION OF SYMBOLS 1 To-be-polished object 1a Convex-curved surface part 2 Polishing apparatus 13 Polishing pad 13a Annular concave polishing part 13b Annular protrusion 13d Notch

Claims

A polishing pad for polishing the convex curved surface portion of an object to be polished having a convex curved surface portion, on a side surface of an elastic body having a disk shape and a thickness, and a circumferential direction about the center of the circle of the disk An annular concave polishing portion that is brought into contact with the convex curved surface portion of the workpiece while being rotationally driven is arranged, and the compressive stress at the time of 0.1 mm compression of the elastic body constituting the annular concave polishing portion is 50 to 150 gf / cm 2. And a ratio of compressive stress (compressive stress at 0.5 mm compression / compressive stress at 0.1 mm compression) is in the range of 5-30.
The elastic body constituting the annular concave polished portion has an initial load of 20 g, a strain range of 1.0%, a temperature of 40 ° C., a frequency of 60 Hz, and a loss coefficient tan δ of 0.150 to 0.420 when measured in a compression mode. The polishing pad according to claim 1, wherein
3. The polishing pad according to claim 1, wherein an opening is formed in the surface of the annular concave polishing portion.
The annular concave polishing portion is larger in diameter than the convex curved surface portion of the object to be polished, and when the vertex of the object to be polished and the bottom of the annular concave polishing portion are brought into contact, the thickness of the annular concave polishing portion The annular projections located at both ends in the direction are separated from the plane portion adjacent to the convex curved portion of the object to be polished,
The object to be polished sinks into the annular concave polishing part by a pressing force during polishing, and the annular concave polishing part is deformed, whereby the annular protrusion is in close contact with the planar portion of the object to be polished. The polishing pad according to any one of claims 1 to 3.
The notch part is distribute | arranged to the said cyclic | annular protrusion at predetermined intervals along the circumferential direction of at least any one of the thickness direction both ends, The Claim 1 thru | or 4 characterized by the above-mentioned. Polishing pad.