WO2015161731A1 - Encapsulation method and device for flip chip - Google Patents

Encapsulation method and device for flip chip Download PDF

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WO2015161731A1
WO2015161731A1 PCT/CN2015/075218 CN2015075218W WO2015161731A1 WO 2015161731 A1 WO2015161731 A1 WO 2015161731A1 CN 2015075218 W CN2015075218 W CN 2015075218W WO 2015161731 A1 WO2015161731 A1 WO 2015161731A1
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柯全
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Abstract

An encapsulation method and device for a flip chip. The method comprises the following steps: S1, bonding a chip (100) to a substrate (101), wherein the chip (100) comprises at least two electrodes (102, 105), at least one insulating region (104) used for insulating the electric connection between the electrodes is arranged between the electrodes (102, 105), the substrate (101) comprises at least one conducting region, and after the chip (100) is bonded to the substrate (101), and the electrodes (102, 105) are electrically connected through the conducting region; and S2, separating the conducting region from a region in which the conducting region is overlapped with the insulating region (104), to form several conducting sub-regions which are insulated from each other. By arranging a conducting region on a substrate (101) and bonding same to all electrodes (102, 105) on a chip at the same time, and separating the conducting region to form conducting sub-regions which are bonded to the electrodes (102, 105) on the chip (100) in one-to-one correspondence and are insulated from each other, the problem in the encapsulation technique that the spacing between bumps on the substrate is limited and the problem that the accuracy of alignment of a substrate electrode and a chip electrode is difficult to control are solved at a lower cost.

Description

倒装芯片的封装方法及装置Flip chip packaging method and device
本申请要求申请日为2014年4月22日的中国专利申请CN201410163880.4的优先权。本申请引用上述中国专利申请的全文。The present application claims priority from Chinese Patent Application No. CN201410163880.4, filed on Apr. 22, 2014. This application cites the entire text of the above-mentioned Chinese patent application.
技术领域Technical field
本发明涉及一种半导体封装技术,特别涉及一种倒装芯片的封装方法及装置。The present invention relates to a semiconductor packaging technology, and in particular to a flip chip packaging method and apparatus.
背景技术Background technique
在本领域中,为了将裸芯片设置于基板上,可通过位于裸芯片及基板上的多个接合焊点来实现,在此过程中,可应用多种芯片封装技术,如球栅阵列(BallGrid Array,BGA)、线结合、倒装芯片等。为了确保电子产品或通信装置的小型化及功能多样化,半导体封装需要尺寸小、多引脚连接、高速率、高功率及多功能化。In the art, in order to dispose the bare chip on the substrate, it can be realized by a plurality of bonding pads on the bare chip and the substrate. In the process, various chip packaging technologies such as a ball grid array (BallGrid) can be applied. Array, BGA), wire bonding, flip chip, etc. In order to ensure the miniaturization and diversification of electronic products or communication devices, semiconductor packages require small size, multi-pin connection, high speed, high power, and multi-function.
输入输出(Input-Output,I/O)引脚数目的增加、高性能IC需求的增加以及LED高功率需求的增加,促进了倒装芯片封装技术的发展。倒装芯片技术使用位于芯片的多个接合焊盘上的多个凸点(bumps)与封装介质直接互连。芯片通过最短路径面向接合封装介质。该技术不仅可应用于单芯片封装,也可应用于更高整合水平的尺寸较大的封装,以及可容纳几个芯片以形成较大功能单元的更加精密的基板。倒装芯片技术使用区域阵列,具有实现与装置的互连密度最高与封装的互连电感较低的优点。The increase in the number of input-output (I/O) pins, the increase in demand for high-performance ICs, and the increased demand for high-power LEDs have contributed to the development of flip-chip packaging technology. Flip-chip technology uses a plurality of bumps located on multiple bond pads of the chip to directly interconnect with the package medium. The chip faces the packaged medium through the shortest path. This technology can be applied not only to single-chip packages, but also to larger integrated packages of higher integration levels, as well as more sophisticated substrates that can accommodate several chips to form larger functional units. Flip-chip technology uses an area array that has the advantage of achieving the highest interconnect density with the device and lower interconnect inductance of the package.
然而,传统倒装芯片技术面临基板上的凸点间距限制的挑战。另外,高性能FCBGA封装因昂贵的芯片载体基板(典型的芯片载体基板包含1+2+1层构建材料或更多层构建材料)而价格不菲。由于倒装芯片技术的发展与凸点间距缩小远比裸芯片缩小与引脚数目的增长慢得多,因此,基板的凸点间 距成为倒装芯片线路图的瓶颈所在。即便未来裸芯片缩小将超越基板载体的凸点间距分辨率的缩小。为了克服此技术差距,硅中介层(silicon interposer)技术与硅片直通孔技术(Through Silicon Via,TSV)技术是目前唯一且昂贵的解决方案。因此,产业界强烈需求一种改进型倒装芯片封装技术,以符合成本效益并解决基板上的凸点间距限制。However, conventional flip chip technology faces the challenge of bump spacing limitations on the substrate. In addition, high performance FCBGA packages are expensive due to the expensive chip carrier substrate (a typical chip carrier substrate containing 1+2+1 layer build material or more layers of build material). Due to the development of flip chip technology and the reduction of bump pitch, it is much slower than the shrinkage of the bare chip and the number of pins. Therefore, the bump between the substrates The distance is the bottleneck of the flip chip circuit diagram. Even if the shrinking of the bare chip in the future will exceed the resolution of the bump pitch of the substrate carrier. To overcome this technology gap, silicon interposer technology and through silicon via (TSV) technology are currently the only and expensive solutions. Therefore, there is a strong need in the industry for an improved flip chip packaging technology that is cost effective and addresses the bump spacing limitations on the substrate.
另外一点,随着半导体LED照明的普及,半导体LED芯片使用倒装封装已经成为趋势,目前除了共晶这种常见的倒装芯片封装的键合方式外,还有新近出现的电磁脉冲焊接键合方式,如专利CN103094135 A(本申请要引用该文献的全文)中所述;这种键合方式的好处是芯片电极和基板电极之间是原子级连接,非常有助于大功率芯片的散热,但是在研制的过程中发现,使用电磁脉冲焊接方式键合时,芯片电极和基板电极对准精度成为影响封装效率和成品的关键因素。In addition, with the popularity of semiconductor LED lighting, the use of flip-chip packaging for semiconductor LED chips has become a trend. In addition to the common flip-chip package bonding method of eutectic, there are also newly emerging electromagnetic pulse solder bonding. The method is as described in the patent CN103094135 A (the full text of which is incorporated herein by reference); the advantage of this bonding method is that the chip electrode and the substrate electrode are atomically connected, which is very helpful for heat dissipation of the high power chip. However, in the process of development, it was found that the alignment accuracy of the chip electrode and the substrate electrode became a key factor affecting the packaging efficiency and the finished product when bonded by electromagnetic pulse welding.
发明内容Summary of the invention
本发明的目的是为了解决现有技术中芯片电极与基板电极对准精度较差、基板上凸点存在间距限制且成本过高的缺陷,提供一种芯片电极与基板电极对准精度更高,且成本较低的倒装芯片的封装方法及装置。The purpose of the invention is to solve the defects that the alignment precision of the chip electrode and the substrate electrode is poor, the pitch of the bump on the substrate is limited, and the cost is too high, and the alignment precision between the chip electrode and the substrate electrode is higher. And a lower cost flip chip packaging method and device.
为了实现上述目的,本发明采用以下技术方案:In order to achieve the above object, the present invention adopts the following technical solutions:
一种倒装芯片的封装方法,其特点在于,其包括有以下步骤:A flip chip packaging method is characterized in that it comprises the following steps:
S1、将一芯片与一基板键合,其中,所述芯片包括有至少两个电极,所述电极之间包括有至少一用于隔绝所述电极之间电连接的绝缘区域,所述基板包括有至少一导电区域,在所述芯片和所述基板键合后,所述电极之间通过所述导电区域电连接;S1, bonding a chip to a substrate, wherein the chip comprises at least two electrodes, and the electrodes include at least one insulating region for isolating electrical connection between the electrodes, the substrate comprises Having at least one conductive region, after the chip and the substrate are bonded, the electrodes are electrically connected through the conductive region;
S2、从所述导电区域与所述绝缘区域重叠的区域将所述导电区域分离形成若干个相互绝缘的导电分区。S2, separating the conductive region from the region where the conductive region overlaps the insulating region to form a plurality of electrically conductive regions that are insulated from each other.
此处,现有技术通常在用于倒装的芯片的电极上都会植入若干个金属的 凸点,然后再将植入有凸点的一面对准基板上的电极进行键合,精度受到凸点间距的限制。本发明的方案中,由于在基板上设置有导电区域,导电区域在芯片与基板键合后覆盖了芯片的电极之间的绝缘区域,使得在键合过程中对精度的要求大幅降低(因为芯片上凸点与基板的电极之间的点对点以及芯片与基板上的绝缘区域的对准的方式对精度要求非常高)。另外,在键合后由于芯片的电极之间通过基板上的导电区域电连接,需要沿着芯片上的电极之间的绝缘区域,将芯片的电极之间的电连接切断,因此可以选择导电区域与芯片的绝缘区域重叠的区域上的线段,沿着这些线段将导电区域分离成与芯片的电极一一对应的若干个相互绝缘的导电分区。Here, the prior art usually implants several metals on the electrodes of the chip for flip chip. The bumps are then bonded to the electrodes on the substrate by the bumped side, and the accuracy is limited by the pitch of the bumps. In the solution of the present invention, since the conductive region is disposed on the substrate, the conductive region covers the insulating region between the electrodes of the chip after the chip is bonded to the substrate, so that the precision requirement in the bonding process is greatly reduced (because the chip The point-to-point between the upper bump and the electrode of the substrate and the alignment of the chip with the insulating region on the substrate are very high in accuracy. In addition, after the bonding, since the electrodes of the chip are electrically connected through the conductive regions on the substrate, it is necessary to cut the electrical connection between the electrodes of the chip along the insulating region between the electrodes on the chip, so that the conductive region can be selected. A line segment on a region overlapping the insulating region of the chip, along which the conductive region is separated into a plurality of mutually insulated conductive segments that correspond one-to-one with the electrodes of the chip.
也就是说,由于需要降低芯片与基板键合时相互对准的精度要求,而将芯片上的绝缘区域与基板上的绝缘区域相互对准对精度的要求较高,本发明的方案无视基板上的绝缘区域,直接在基板上设置导电区域覆盖芯片上的绝缘区域。这样一来,键合时的精度要求被大大降低,但是带来的副作用是芯片的电极之间会存在电连接,无法使用。为了消除这一副作用,在键合后,需要将芯片的电极之间的电连接切断。换言之,切断芯片的电极之间的电连接所需要的切割/阻断的精度相对于芯片上的绝缘区域与基板上的绝缘区域的对准的精度(也可以理解为基板电极和芯片电极对准精度)更容易达到。That is to say, since it is required to reduce the accuracy requirement of mutual alignment when the chip is bonded to the substrate, the alignment between the insulating region on the chip and the insulating region on the substrate requires high precision, and the solution of the present invention ignores the substrate. The insulating region is provided with a conductive region directly on the substrate to cover the insulating region on the chip. As a result, the accuracy requirements for bonding are greatly reduced, but the side effect is that there is an electrical connection between the electrodes of the chip, which cannot be used. In order to eliminate this side effect, it is necessary to cut off the electrical connection between the electrodes of the chip after bonding. In other words, the precision of the cutting/blocking required to cut the electrical connection between the electrodes of the chip is relative to the precision of the alignment of the insulating region on the chip with the insulating region on the substrate (it can also be understood as the alignment of the substrate electrode and the chip electrode). Accuracy) is easier to achieve.
此外,还可以本方案还可以理解为选用单一电极的基板与芯片键合后,再将基板的单一电极分离为若干个与芯片的电极一一对应的键合的电极。In addition, the present invention can also be understood that after the substrate with a single electrode is bonded to the chip, the single electrode of the substrate is separated into a plurality of bonded electrodes that correspond one-to-one with the electrodes of the chip.
较佳的,所述基板为单层金属基板。Preferably, the substrate is a single layer metal substrate.
较佳的,所述基板为多层金属基板。Preferably, the substrate is a multilayer metal substrate.
也就是说,使用金属制成的基板,则整个基板都是导电区域。且金属制成的基板相对于现有技术的陶瓷基板,具有散热快的优点。That is to say, when a substrate made of metal is used, the entire substrate is a conductive region. Moreover, the substrate made of metal has the advantage of quick heat dissipation compared to the ceramic substrate of the prior art.
较佳的,所述S2为:使用激光将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。Preferably, the S2 is: cutting a region where the conductive region overlaps the insulating region by using a laser, so that the conductive region is divided to form a plurality of mutually insulated conductive regions.
激光束加工(LBM,Laser Beam Machining)是利用能量密度很高的激光 束使工件材料熔化、汽化和蒸发而予以去除的高能束加工。激光是单色光,强度高、相干性和方向性好,通过一系列的光学系统,可将激光束聚焦成光斑直径小到几微米、能量密度高达108~109W/cm2,并能在千分之几秒甚至更短的时间内使任何可熔化、不可分解的材料熔化、蒸发、汽化而达到加工的目的。激光束加工主要用于打孔、切割、焊接和表面处理等材料成形和改性等一系列加工工艺中。在过去二十多年时间里,激光束加工技术得到了异常迅速的发展,而且得到了广泛的工业应用。Laser Beam Machining (LBM) is a high-energy beam processing that uses a laser beam with a high energy density to melt, vaporize, and evaporate the workpiece material. The laser is monochromatic light with high intensity, coherence and directionality. Through a series of optical systems, the laser beam can be focused to a spot diameter as small as a few microns, an energy density of up to 108-109 W/cm 2 , and In a few seconds or even less, any meltable, indecomposable material is melted, evaporated, vaporized for processing purposes. Laser beam processing is mainly used in a series of processing processes such as forming, modifying and other materials such as punching, cutting, welding and surface treatment. In the past two decades, laser beam processing technology has developed very rapidly and has been widely used in industrial applications.
此处,激光切割更容易达到一个较高的精度,或者说,激光切割达到一个较高精度的成本相对于增加芯片贴片键合的对准精度所增加的成本要低很多。而切割形成相互绝缘的导电分区,旨在断开芯片的电极之间的电连接。Here, laser cutting is easier to achieve a higher precision, or the cost of laser cutting to a higher precision is much lower than the cost of increasing the alignment accuracy of chip-chip bonding. The cutting forms a conductive partition that is insulated from each other in order to break the electrical connection between the electrodes of the chip.
较佳的,所述S2为:Preferably, the S2 is:
以机械磨削或切割的方式将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。The region where the conductive region overlaps the insulating region is cut by mechanical grinding or cutting such that the conductive region is divided to form a plurality of mutually insulated conductive regions.
此处,采用机械磨削或切割的方式也是可行的。Here, mechanical grinding or cutting is also possible.
较佳的,所述S2为:Preferably, the S2 is:
采用显影的方式将所述导电区域与所述绝缘区域重叠的区域腐蚀,暴露所述绝缘区域,使得所述导电区域分离形成若干个相互绝缘的导电分区。A region in which the conductive region overlaps the insulating region is etched by development to expose the insulating region such that the conductive region separates to form a plurality of mutually insulated conductive regions.
此处,还可以使用如显影等方式,将基板与芯片键合后在基板上涂抹防腐蚀的图层,并暴露导电区域与芯片上的绝缘区域重叠的位置,在腐蚀掉导电区域与芯片上的绝缘区域重叠的位置上的导体后,芯片的电极之间的电连接也可以断开。Here, it is also possible to apply a corrosion-resistant layer on the substrate after bonding the substrate and the chip, such as development, and expose the position where the conductive region overlaps with the insulating region on the chip, and etch away the conductive region and the chip. After the conductors at the overlapping locations of the insulating regions, the electrical connections between the electrodes of the chip can also be broken.
较佳的,所述导电区域上开设有至少一通槽,所述通槽用于暴露所述芯片与所述基板的键合的一面上的图形识别特征。Preferably, the conductive region is provided with at least one through groove for exposing the pattern recognition feature on the bonding side of the chip and the substrate.
此处,由于进行机械切割或激光切割基板时,需要对芯片上的绝缘区域的位置进行精确定位,因此设置通槽后,从基板未键合芯片的一面,可以使用图形识别技术,在通槽的位置对芯片上的图形识别特征进行辨识。例如, 当绝缘区域为一条细直线时,可以设置两个通槽分别暴露该细直线的一段以供图形识别,也可以通过通槽暴露芯片上其他位置上的图形识别点,间接的将绝缘区域的位置定位。Here, since the position of the insulating region on the chip needs to be accurately positioned when performing mechanical cutting or laser cutting of the substrate, after the through groove is provided, the side of the substrate from which the chip is not bonded can be used in the through-channel. The location identifies the graphical recognition features on the chip. E.g, When the insulating region is a thin straight line, two through grooves may be respectively disposed to expose a segment of the thin straight line for pattern recognition, or the through-groove may be used to expose the pattern identification point at other positions on the chip to indirectly position the insulating region. Positioning.
本发明还涉及一种倒装芯片的封装装置,其包括有一将芯片键合于一基板的键合装置,其特点在于,所述倒装芯片的封装装置使用如上所述的倒装芯片的封装方法,所述芯片包括有至少两个电极,所述电极之间包括有至少一用于隔绝所述电极之间电连接的绝缘区域,所述基板包括有至少一导电区域,在所述芯片和所述基板键合后,所述电极之间通过所述导电区域电连接;The invention further relates to a flip chip packaging device comprising a bonding device for bonding a chip to a substrate, characterized in that the flip chip packaging device uses a flip chip package as described above The method includes at least two electrodes including at least one insulating region for isolating an electrical connection between the electrodes, the substrate including at least one conductive region, and the chip and After the substrate is bonded, the electrodes are electrically connected through the conductive region;
此处,键合装置可以是采用共晶或者回流焊等工艺的装置,由于共晶或回流焊等工艺为现有技术的常用手段,此处不再赘述。Here, the bonding device may be a device adopting a process such as eutectic or reflow soldering, and the processes such as eutectic or reflow soldering are common means of the prior art, and are not described herein again.
所述倒装芯片的封装装置还包括有一用于从所述导电区域与所述绝缘区域重叠的区域将所述导电区域分离形成若干个相互绝缘的导电分区的分离装置。The flip chip packaging apparatus further includes a separating device for separating the conductive regions from the conductive region and the insulating region to form a plurality of mutually insulated conductive regions.
较佳的,所述分离装置用于使用激光将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。Preferably, the separating device is configured to cut a region where the conductive region overlaps the insulating region using a laser, such that the conductive region is divided to form a plurality of mutually insulated conductive regions.
较佳的,所述分离装置用于以机械磨削或切割的方式将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。Preferably, the separating device is configured to cut a region where the conductive region overlaps the insulating region by mechanical grinding or cutting, so that the conductive region is divided to form a plurality of mutually insulated conductive regions.
本发明的积极进步效果在于:通过在基板上设置导电区域同时与芯片上的所有电极键合,再将该导电区域分离形成与芯片上的电极一一对应的键合且相互绝缘的导电分区,以较低成本解决封装技术中基板上的凸点间距限制的问题,以及基板电极和芯片电极对准精度难以控制的问题。The positive progress of the present invention is that by providing a conductive region on the substrate while bonding with all the electrodes on the chip, the conductive region is separated to form a conductive partition which is bonded and insulated from each other in one-to-one correspondence with the electrodes on the chip. The problem of the bump spacing limitation on the substrate in the packaging technology is solved at a lower cost, and the problem that the substrate electrode and the chip electrode alignment precision are difficult to control.
附图说明DRAWINGS
图1为本发明实施例1的多个芯片放置在基板上的仰视透视结构示意图。1 is a bottom perspective view showing a plurality of chips placed on a substrate according to Embodiment 1 of the present invention.
图2为本发明实施例1的芯片的结构示意图。 2 is a schematic structural view of a chip according to Embodiment 1 of the present invention.
图3为本发明实施例1的单个芯片与基板键合后的结构示意图。FIG. 3 is a schematic structural view of a single chip bonded to a substrate according to Embodiment 1 of the present invention.
图4为本发明实施例1的基板延芯片电极之间绝缘部位的对应位置处分割开后的结构示意图。4 is a schematic structural view showing a state in which a corresponding position of an insulating portion between substrate extension chip electrodes is divided according to Embodiment 1 of the present invention.
图5为本发明实施例1的倒装芯片的封装方法的流程图。FIG. 5 is a flowchart of a method for packaging a flip chip according to Embodiment 1 of the present invention.
具体实施方式detailed description
下面通过实施例的方式进一步说明本发明,但并不因此将本发明限制在所述的实施例范围之中。The invention is further illustrated by the following examples, which are not intended to limit the invention.
实施例1Example 1
图5为本实施例的倒装芯片的封装方法的流程图,如图5所示,本实施例涉及的倒装芯片的封装方法包括有以下步骤:FIG. 5 is a flowchart of a method for packaging a flip chip according to the embodiment. As shown in FIG. 5, the method for packaging a flip chip according to the embodiment includes the following steps:
步骤1、将一芯片与一基板键合,其中,芯片包括有至少两个电极,电极之间包括有至少一用于隔绝电极之间电连接的绝缘区域,基板包括有至少一导电区域,在芯片和基板键合后,电极之间通过导电区域电连接; Step 1. Bonding a chip to a substrate, wherein the chip includes at least two electrodes, and the electrodes include at least one insulating region for isolating electrical connection between the electrodes, and the substrate includes at least one conductive region. After the chip and the substrate are bonded, the electrodes are electrically connected through the conductive region;
步骤2、使用激光将导电区域与绝缘区域重叠的区域切割,使得导电区域分割形成若干个相互绝缘的导电分区。Step 2: Cutting a region where the conductive region and the insulating region overlap by using a laser, so that the conductive region is divided to form a plurality of mutually insulated conductive regions.
其中,导电区域上开设有至少一通槽,通槽用于暴露芯片与基板的键合的一面上的图形识别特征。Wherein, the conductive region is provided with at least one through groove for exposing the pattern recognition feature on the bonding side of the chip and the substrate.
以下对上述倒装芯片的封装方法进行进一步说明。The above-described flip chip packaging method will be further described below.
图1为本实施例的多个芯片放置在基板上的仰视透视结构示意图,图2为本实施例的芯片的结构示意图,图3为本实施例的单个芯片与基板键合后的结构示意图,图4为本实施例的基板延芯片电极之间绝缘部位的对应位置处分割开后的结构示意图。1 is a bottom perspective view of a plurality of chips placed on a substrate in the embodiment, FIG. 2 is a schematic structural view of the chip according to the embodiment, and FIG. 3 is a schematic structural view of the single chip bonded to the substrate in the embodiment; FIG. 4 is a schematic structural view showing the substrate at the corresponding position of the insulating portion between the extended chip electrodes of the embodiment.
如图1~4所示,芯片100的尺寸为长1000微米,宽1000微米,厚度335微米,底部为电极区域,正电极102的尺寸为945×75微米,负电极105的尺寸为945×795微米,正电极102和负电极105之间间隔距离为75微米。 As shown in FIGS. 1 to 4, the chip 100 has a size of 1000 μm, a width of 1000 μm, a thickness of 335 μm, a bottom electrode region, a positive electrode 102 having a size of 945×75 μm, and a negative electrode 105 having a size of 945×795. The micrometers have a separation distance between the positive electrode 102 and the negative electrode 105 of 75 micrometers.
首先,准备基板,基板上包括有若干个表面金锡合金AuSn20镀层厚度为15微米的150微米厚的铜片101,每一铜片101均与一颗芯片100对应,铜片101平面尺寸为2000微米×2000微米的正方形,以下以此为一个单元进行描述。First, a substrate is prepared. The substrate includes a plurality of 150 μm thick copper sheets 101 having a thickness of 15 μm. Each copper sheet 101 corresponds to a chip 100. The plane size of the copper sheet 101 is 2000. A square of micron x 2000 microns is described below as a unit.
将基板放入激光切割工作台,确认此基板上每一铜片101的中心点(即,2000微米×2000微米单元的中心点),延此中心点向平行单元正方形边的方向割开长400微米,宽20微米的通槽103,再在此通槽103两侧(槽中心线)相距250微米处平行割出相同尺寸的通槽103。(便于后续放置芯片100以及激光切割电极时的识别定位)。The substrate is placed in a laser cutting table, and the center point of each copper piece 101 on the substrate (ie, the center point of the 2000 micrometer x 2000 micrometer unit) is confirmed, and the center point is cut to a length of 400 in the direction of the square side of the parallel unit. The through-holes 103 of micrometers and widths of 20 micrometers are parallel cut out of the same-sized through-grooves 103 at 250 micrometers apart from each other on the sides of the through-grooves 103. (It is convenient for the positioning and positioning of the chip 100 and the laser cutting electrode).
也就是说,将铜制的基板划分为若干个铜片101单元,在每一铜片101上用激光切割出三条用于暴露芯片100的电极间隔104的图形识别特征的通槽103(见图4)。That is, the copper substrate is divided into a plurality of copper plate 101 units, and three through grooves 103 for exposing the pattern recognition features of the electrode spaces 104 of the chip 100 are laser-cutted on each of the copper sheets 101 (see FIG. 4).
将芯片100的电极面放置在铜片101的金锡合金镀层面上,芯片100中心对准铜片101中心,且使作为芯片100上的绝缘区域的电极间隔104垂直于三个通槽103。The electrode surface of the chip 100 is placed on the gold-tin alloy plating layer of the copper sheet 101, the center of the chip 100 is aligned with the center of the copper sheet 101, and the electrode spacing 104 as an insulating region on the chip 100 is perpendicular to the three through grooves 103.
将放置有芯片的基板放入共晶炉,实现键合,由于共晶工艺已存在成熟工艺,在此不再赘述。The substrate on which the chip is placed is placed in a eutectic furnace to achieve bonding, and since the eutectic process already has a mature process, it will not be described herein.
将已经完成键合的芯片和基板放入激光切割工作台,芯片在下,基板在上面。具体到每一单元的铜片101,激光切割台根据透过每一铜片101上的通槽103抓取芯片100的正电极102和负电极105之间的电极间隔104的位置,将铜片101沿电极间隔104切割开,使得铜片101被割裂为分别与芯片100的正电极102和负电极105电连接且相互绝缘的导电分区111和导电分区112。最后将多个铜片101之间的连接割断,形成芯片与基板封装的独立单元。由于激光切割的辨识与切割精度等已有成熟工艺,在此不再重复。The chip and substrate that have been bonded are placed in a laser cutting table with the chip under and the substrate on top. Specifically, to the copper piece 101 of each unit, the laser cutting table grabs the position of the electrode spacing 104 between the positive electrode 102 and the negative electrode 105 of the chip 100 through the through groove 103 on each copper piece 101. The 101 is cut along the electrode spacing 104 such that the copper sheet 101 is split into conductive segments 111 and conductive segments 112 that are electrically connected to the positive and negative electrodes 102, 105, respectively, of the chip 100 and are insulated from each other. Finally, the connection between the plurality of copper sheets 101 is cut to form a separate unit of the chip and the substrate package. Due to the mature process of laser cutting identification and cutting precision, it will not be repeated here.
另外,本实施例还涉及一种倒装芯片的封装装置,该封装装置包括有一共晶装置和一激光切割装置,并使用如上所述倒装芯片的封装方法。 In addition, the embodiment further relates to a flip chip packaging device including a eutectic device and a laser cutting device, and using the flip chip packaging method as described above.
实施例2Example 2
实施例2提供一种倒装芯片的封装方法及装置,实施例2与实施例1的区别在于: Embodiment 2 provides a flip chip packaging method and apparatus, and Embodiment 2 differs from Embodiment 1 in that:
在基板与芯片100键合后,根据通槽103对芯片100上的电极间隔104进行定位后,在基板上的每一在铜片101对应电极间隔104的位置上铺设一条阻隔带,然后在基板上涂抹防腐蚀的图层。After the substrate is bonded to the chip 100, after the electrode spacing 104 on the chip 100 is positioned according to the through-groove 103, a barrier tape is laid on each position of the copper wafer 101 corresponding to the electrode spacing 104 on the substrate, and then on the substrate. Apply a corrosion-resistant layer to it.
之后,将阻隔带揭开,这样就暴露了铜片101与芯片100上的电极间隔104重叠的位置,在腐蚀掉导上述暴露的位置上的导体(即铜)后,芯片100的电极之间的电连接处于断开的状态。Thereafter, the barrier strip is uncovered, thus exposing the position where the copper sheet 101 overlaps the electrode spacing 104 on the chip 100, and after etching the conductor (ie, copper) at the exposed position, the electrodes of the chip 100 are interposed between the electrodes The electrical connection is in an open state.
虽然以上描述了本发明的具体实施方式,但是本领域的技术人员应当理解,这仅是举例说明,本发明的保护范围是由所附权利要求书限定的。本领域的技术人员在不背离本发明的原理和实质的前提下,可以对这些实施方式做出多种变更或修改,例如,不使用激光切割铜片,而采用机械切割等方式分离基板上的导电区域,或者采用其他金属/合金等制成的基板,再或者不采用共晶键合而采用回流焊工艺等,但这些变更和修改均落入本发明的保护范围。 While the invention has been described with respect to the embodiments of the present invention, it is understood that the scope of the invention is defined by the appended claims. A person skilled in the art can make various changes or modifications to these embodiments without departing from the principles and spirit of the invention, for example, by using a laser to cut a copper sheet, and mechanically cutting or the like to separate the substrate. The conductive region, or a substrate made of other metals/alloys or the like, or a reflow soldering process or the like without using eutectic bonding, etc., is within the scope of the present invention.

Claims (10)

  1. 一种倒装芯片的封装方法,其特征在于,其包括有以下步骤:A flip chip packaging method is characterized in that it comprises the following steps:
    S1、将一芯片与一基板键合,其中,所述芯片包括有至少两个电极,所述电极之间包括有至少一用于隔绝所述电极之间电连接的绝缘区域,所述基板包括有至少一导电区域,在所述芯片和所述基板键合后,所述电极之间通过所述导电区域电连接;S1, bonding a chip to a substrate, wherein the chip comprises at least two electrodes, and the electrodes include at least one insulating region for isolating electrical connection between the electrodes, the substrate comprises Having at least one conductive region, after the chip and the substrate are bonded, the electrodes are electrically connected through the conductive region;
    S2、从所述导电区域与所述绝缘区域重叠的区域将所述导电区域分离形成若干个相互绝缘的导电分区。S2, separating the conductive region from the region where the conductive region overlaps the insulating region to form a plurality of electrically conductive regions that are insulated from each other.
  2. 如权利要求1所述的倒装芯片的封装方法,其特征在于,所述基板为单层金属基板。The method of packaging a flip chip according to claim 1, wherein the substrate is a single-layer metal substrate.
  3. 如权利要求1所述的倒装芯片的封装方法,其特征在于,所述基板为多层金属基板。The method of packaging a flip chip according to claim 1, wherein the substrate is a multilayer metal substrate.
  4. 如权利要求1-3中至少一项所述的倒装芯片的封装方法,其特征在于,所述S2为:The method of packaging a flip chip according to at least one of claims 1 to 3, wherein the S2 is:
    使用激光将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。A region where the conductive region overlaps the insulating region is cut using a laser such that the conductive region is divided to form a plurality of mutually insulated conductive regions.
  5. 如权利要求1-3中至少一项所述的倒装芯片的封装方法,其特征在于,所述S2为:The method of packaging a flip chip according to at least one of claims 1 to 3, wherein the S2 is:
    以机械磨削或切割的方式将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。The region where the conductive region overlaps the insulating region is cut by mechanical grinding or cutting such that the conductive region is divided to form a plurality of mutually insulated conductive regions.
  6. 如权利要求1-3中至少一项所述的倒装芯片的封装方法,其特征在于,所述S2为:The method of packaging a flip chip according to at least one of claims 1 to 3, wherein the S2 is:
    采用显影的方式将所述导电区域与所述绝缘区域重叠的区域腐蚀,暴露所述绝缘区域,使得所述导电区域分离形成若干个相互绝缘的导电分区。A region in which the conductive region overlaps the insulating region is etched by development to expose the insulating region such that the conductive region separates to form a plurality of mutually insulated conductive regions.
  7. 如权利要求1~6中至少一项所述的倒装芯片的封装方法,其特征在 于,所述导电区域上开设有至少一通槽,所述通槽用于暴露所述芯片与所述基板的键合的一面上的图形识别特征。A method of packaging a flip chip according to at least one of claims 1 to 6, characterized in that The conductive region is provided with at least one through groove for exposing the pattern recognition feature on the bonding side of the chip and the substrate.
  8. 一种倒装芯片的封装装置,其包括有一将芯片键合于一基板的键合装置,其特征在于,所述倒装芯片的封装装置使用如权利要求1~7中至少一项所述的倒装芯片的封装方法,所述芯片包括有至少两个电极,所述电极之间包括有至少一用于隔绝所述电极之间电连接的绝缘区域,所述基板包括有至少一导电区域,在所述芯片和所述基板键合后,所述电极之间通过所述导电区域电连接;A flip chip packaging device comprising a bonding device for bonding a chip to a substrate, wherein the flip chip packaging device uses the device according to at least one of claims 1 to 7 a flip chip packaging method, the chip includes at least two electrodes, and the electrodes include at least one insulating region for isolating electrical connection between the electrodes, and the substrate includes at least one conductive region. After the chip and the substrate are bonded, the electrodes are electrically connected through the conductive region;
    所述倒装芯片的封装装置还包括有一用于从所述导电区域与所述绝缘区域重叠的区域将所述导电区域分离形成若干个相互绝缘的导电分区的分离装置。The flip chip packaging apparatus further includes a separating device for separating the conductive regions from the conductive region and the insulating region to form a plurality of mutually insulated conductive regions.
  9. 如权利要求8所述的倒装芯片的封装装置,其特征在于,所述分离装置用于使用激光将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。The package device of a flip chip according to claim 8, wherein the separating means is for cutting a region where the conductive region overlaps the insulating region by using a laser, so that the conductive region is divided into a plurality of sections. Conductive partitions that are insulated from each other.
  10. 如权利要求8所述的倒装芯片的封装装置,其特征在于,所述分离装置用于以机械磨削或切割的方式将所述导电区域与所述绝缘区域重叠的区域切割,使得所述导电区域分割形成若干个相互绝缘的导电分区。 A package device for flip chip according to claim 8, wherein said separating means is for cutting a region in which said conductive region overlaps said insulating region by mechanical grinding or cutting, such that said The conductive region is divided to form a plurality of electrically conductive regions that are insulated from each other.
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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7049177B1 (en) * 2004-01-28 2006-05-23 Asat Ltd. Leadless plastic chip carrier with standoff contacts and die attach pad
CN101350381A (en) * 2007-07-18 2009-01-21 晶科电子(广州)有限公司 Salient point LED and manufacturing method thereof
CN101601133A (en) * 2006-10-27 2009-12-09 宇芯(毛里求斯)控股有限公司 Partially patterned lead frame and the method for in semiconductor packages, making and use it
CN102386106A (en) * 2010-09-03 2012-03-21 宇芯(毛里求斯)控股有限公司 Partially patterned lead frames and methods of making and using the same in semiconductor packaging
CN103094135A (en) * 2011-11-01 2013-05-08 柯全 Encapsulation method for flip chip
US20140141567A1 (en) * 2012-11-16 2014-05-22 Lei Shi Flip-chip Semiconductor Chip Packing Method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4215306B2 (en) * 1998-08-27 2009-01-28 シチズン電子株式会社 Semiconductor package and manufacturing method thereof
US6797530B2 (en) * 2001-09-25 2004-09-28 Kabushiki Kaisha Toshiba Semiconductor device-manufacturing method for manufacturing semiconductor devices with improved heat radiating efficiency and similar in size to semiconductor elements
JP4159431B2 (en) * 2002-11-15 2008-10-01 株式会社ルネサステクノロジ Manufacturing method of semiconductor device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7049177B1 (en) * 2004-01-28 2006-05-23 Asat Ltd. Leadless plastic chip carrier with standoff contacts and die attach pad
CN101601133A (en) * 2006-10-27 2009-12-09 宇芯(毛里求斯)控股有限公司 Partially patterned lead frame and the method for in semiconductor packages, making and use it
CN101350381A (en) * 2007-07-18 2009-01-21 晶科电子(广州)有限公司 Salient point LED and manufacturing method thereof
CN102386106A (en) * 2010-09-03 2012-03-21 宇芯(毛里求斯)控股有限公司 Partially patterned lead frames and methods of making and using the same in semiconductor packaging
CN103094135A (en) * 2011-11-01 2013-05-08 柯全 Encapsulation method for flip chip
US20140141567A1 (en) * 2012-11-16 2014-05-22 Lei Shi Flip-chip Semiconductor Chip Packing Method

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