TWI665774B - Electronic package and manufacturing method thereof - Google Patents

Electronic package and manufacturing method thereof Download PDF

Info

Publication number
TWI665774B
TWI665774B TW107128450A TW107128450A TWI665774B TW I665774 B TWI665774 B TW I665774B TW 107128450 A TW107128450 A TW 107128450A TW 107128450 A TW107128450 A TW 107128450A TW I665774 B TWI665774 B TW I665774B
Authority
TW
Taiwan
Prior art keywords
electronic package
electrical contact
manufacturing
conductive
conductive bump
Prior art date
Application number
TW107128450A
Other languages
Chinese (zh)
Other versions
TW202010078A (en
Inventor
李泳達
Original Assignee
矽品精密工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 矽品精密工業股份有限公司 filed Critical 矽品精密工業股份有限公司
Priority to TW107128450A priority Critical patent/TWI665774B/en
Priority to CN201811095185.3A priority patent/CN110838477B/en
Application granted granted Critical
Publication of TWI665774B publication Critical patent/TWI665774B/en
Publication of TW202010078A publication Critical patent/TW202010078A/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/14Structure, shape, material or disposition of the bump connectors prior to the connecting process of a plurality of bump connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8119Arrangement of the bump connectors prior to mounting
    • H01L2224/81191Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on the semiconductor or solid-state body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8134Bonding interfaces of the bump connector
    • H01L2224/81345Shape, e.g. interlocking features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • H01L2224/8138Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/81385Shape, e.g. interlocking features
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/91Methods for connecting semiconductor or solid state bodies including different methods provided for in two or more of groups H01L2224/80 - H01L2224/90
    • H01L2224/92Specific sequence of method steps
    • H01L2224/921Connecting a surface with connectors of different types
    • H01L2224/9212Sequential connecting processes
    • H01L2224/92122Sequential connecting processes the first connecting process involving a bump connector
    • H01L2224/92125Sequential connecting processes the first connecting process involving a bump connector the second connecting process involving a layer connector

Abstract

一種電子封裝件及其製法,係在承載結構之電性接點形成複數尖部,以於覆晶製程中,該尖部會插穿電子元件之導電凸塊,故無需使用助銲劑,即可有效接合該導電凸塊與該電性接點。 An electronic package and a manufacturing method thereof are formed with a plurality of pointed portions at electrical contacts of a load-bearing structure, so that during the flip-chip manufacturing process, the pointed portions will penetrate the conductive bumps of the electronic components, so there is no need to use a flux. Effectively bonding the conductive bump and the electrical contact.

Description

電子封裝件及其製法 Electronic package and manufacturing method thereof

本發明係有關一種電子封裝件,尤指一種覆晶式電子封裝件及其製法。 The invention relates to an electronic package, in particular to a flip-chip electronic package and a method for manufacturing the same.

習知半導體晶圓用之自動化測試設備,如配置有測試組件之設備,其可快速進行測量並產生測試結果,並可針對測試結果進行分析。此外,隨著電子產業的發達,現今的電子產品已趨向輕薄短小與功能多樣化的方向設計,半導體封裝技術亦隨之開發出不同的封裝型態。因此,為滿足半導體裝置之高積集度(Integration)以及微型化(Miniaturization)需求,除傳統打線式(Wire bonding)之半導體封裝技術外,業界主要採用覆晶(Flip chip)式半導體封裝技術,以提升半導體封裝結構之佈線密度。 Known automated test equipment for semiconductor wafers, such as equipment equipped with test components, can quickly measure and produce test results, and can analyze the test results. In addition, with the development of the electronics industry, today's electronic products have been designed to be light, thin, short, and diversified in function. Semiconductor packaging technology has also developed different packaging types. Therefore, in order to meet the high integration and miniaturization requirements of semiconductor devices, in addition to the traditional wire bonding semiconductor packaging technology, the industry mainly uses flip chip semiconductor packaging technology. In order to improve the wiring density of the semiconductor package structure.

第1A至1B圖係為習知覆晶式封裝結構1之製法之剖視示意圖。如第1A圖所示,先將一半導體晶片11藉由複數銲錫凸塊13結合至一封裝基板10之電性接觸墊100上,再回銲該銲錫凸塊13。接著,如第1B圖所示,形成底膠14於該半導體晶片11與該封裝基板10之間,以包覆該些 銲錫凸塊13。 Figures 1A to 1B are schematic cross-sectional views of a conventional manufacturing method of a flip-chip package structure 1. As shown in FIG. 1A, a semiconductor wafer 11 is first bonded to the electrical contact pad 100 of a package substrate 10 through a plurality of solder bumps 13, and then the solder bump 13 is re-soldered. Next, as shown in FIG. 1B, a primer 14 is formed between the semiconductor wafer 11 and the package substrate 10 to cover the substrates. Solder bumps 13.

前述製程中,於結合該銲錫凸塊13至該電性接觸墊100之前,該銲錫凸塊13之外表面通常會形成氧化層,故於回銲該銲錫凸塊13的過程中,需使用助銲劑(圖略)移除該氧化物。 In the aforementioned process, before combining the solder bump 13 to the electrical contact pad 100, an oxide layer is usually formed on the outer surface of the solder bump 13; therefore, during the process of resoldering the solder bump 13, an auxiliary Flux (not shown) removes this oxide.

然而,習知覆晶式封裝結構1之製法中,由於需使用助銲劑,因而會增加回銲製程的時間,且會殘留助銲劑之部分材料於該封裝結構1上,因而產生粗大銲接空隙,致使該銲錫凸塊13與該電性接觸墊100之間的接合失效,造成該封裝結構1的可靠性不佳。 However, in the conventional manufacturing method of the flip-chip packaging structure 1, since a flux is required, the time for the reflow process is increased, and a part of the flux remains on the packaging structure 1, thereby generating a large soldering gap. As a result, the bonding between the solder bump 13 and the electrical contact pad 100 fails, resulting in poor reliability of the packaging structure 1.

再者,若該銲錫凸塊13之直徑極小,則在沾附助銲劑時,部分該銲錫凸塊13會有沾附不完全的問題。 In addition, if the diameter of the solder bump 13 is extremely small, there is a problem that part of the solder bump 13 is incompletely adhered when the flux is adhered.

另一方面,雖可藉由受控環境以還原氧化物,再進行回銲製程,因而毋需使用助銲劑,但此方式之製程繁雜,尤其是於大量生產該封裝結構1之過程更為麻煩。 On the other hand, although the oxide can be reduced by a controlled environment and then reflow soldering is performed, there is no need to use flux, but the process of this method is complicated, especially the process of mass producing the packaging structure 1 is more troublesome .

因此,如何克服上述習知技術之種種問題,實已成為目前業界亟待克服之難題。 Therefore, how to overcome the problems of the above-mentioned conventional technologies has become an urgent problem to be overcome in the industry.

鑑於上述習知技術之種種缺失,本發明提供一種電子封裝件,係包括:一承載結構,係具有複數電性接點;以及一電子元件,係具有複數導電凸塊,以令該電子元件藉由該導電凸塊結合至該承載結構之電性接點,其中,該電性接點或該導電凸塊之其中一者係形成有複數尖部,以插入至該電性接點或該導電凸塊之另一者中。 In view of the above-mentioned shortcomings of the conventional technologies, the present invention provides an electronic package including: a carrying structure having a plurality of electrical contacts; and an electronic component having a plurality of conductive bumps, so that the electronic component can borrow The conductive bumps are coupled to the electrical contacts of the load-bearing structure, wherein one of the electrical contacts or the conductive bumps is formed with a plurality of tips for insertion into the electrical contacts or the conductive In the other of the bumps.

本發明復提供一種電子封裝件之製法,係包括:提供一具有複數電性接點之承載結構及一具有複數導電凸塊之電子元件,其中,該電性接點或該導電凸塊之其中一者係形成有複數尖部;以及將該電子元件藉由該些導電凸塊結合至該承載結構之該電性接點,以令該電性接點或該導電凸塊之其中一者之該尖部插入至該電性接點或該導電凸塊之另一者中。 The invention further provides a method for manufacturing an electronic package, which includes: providing a bearing structure having a plurality of electrical contacts and an electronic component having a plurality of conductive bumps, wherein the electrical contact or one of the conductive bumps is One is formed with a plurality of pointed portions; and the electronic component is coupled to the electrical contacts of the carrier structure through the conductive bumps, so that one of the electrical contacts or the conductive bumps The tip is inserted into the electrical contact or the other of the conductive bump.

前述之電子封裝件及其製法中,該導電凸塊之最大平面寬度係小於25微米。 In the aforementioned electronic package and its manufacturing method, the maximum planar width of the conductive bump is less than 25 microns.

前述之電子封裝件及其製法中,該電性接點或該導電凸塊之其中一者係形成粗糙面,其具有複數該尖部。例如,該些尖部之間係具有高度差,如小於1.5微米。 In the aforementioned electronic package and its manufacturing method, one of the electrical contact or the conductive bump forms a rough surface, which has a plurality of the pointed portions. For example, there is a height difference between the tips, such as less than 1.5 microns.

前述之電子封裝件及其製法中,復包括形成表面處理層於該尖部上。 In the aforementioned electronic package and its manufacturing method, the method further includes forming a surface treatment layer on the tip portion.

由上可知,本發明之電子封裝件及其製法,主要藉由該電性接點或該導電凸塊之其中一者係形成有複數尖部之設計,以於該電子元件接合該承載結構時,該尖部可插入該電性接點或該導電凸塊之另一者中,因而該導電凸塊無需沾附助銲劑,故相較於習知技術,本發明因無需使用助銲劑而能減少製程及縮減製程的時間,且不會殘留助銲劑於該電子封裝件上,因而不會產生粗大銲接空隙,進而能避免該導電凸塊與該電性接點之間的接合失效之問題,以達到提升該電子封裝件的可靠性之目的。 It can be known from the above that the electronic package and the manufacturing method thereof of the present invention mainly adopt a design in which a plurality of pointed portions are formed in one of the electrical contact or the conductive bump, so that when the electronic component is bonded to the supporting structure The tip can be inserted into the electrical contact or the other of the conductive bump, so the conductive bump does not need to be affixed with a flux. Therefore, compared with the conventional technology, the present invention can eliminate the need for a flux. Reducing the manufacturing process and shortening the manufacturing process time, and there is no residue of flux on the electronic package, so no coarse soldering gap is generated, and the problem of failure of the bonding between the conductive bump and the electrical contact can be avoided, In order to achieve the purpose of improving the reliability of the electronic package.

再者,當該導電凸塊之最大平面尺寸很小(如小於25 微米)時,於回銲該導電凸塊後,該尖部會轉變成介面合金共化物,使該導電凸塊與電性接點之間形成層結構而完整結合,故能避免該導電凸塊沾附不完全的問題。 Furthermore, when the maximum planar size of the conductive bump is small (such as less than 25 Micron), after the conductive bump is re-soldered, the tip portion will be transformed into an interface alloy composite, so that the conductive bump and the electrical contact form a layer structure and complete integration, so the conductive bump can be avoided Problems with incomplete attachment.

又,本發明之製法不需還原該氧化物,因而製程簡易,故適合應用於大量生產該電子封裝件之生產線上。 In addition, the manufacturing method of the present invention does not need to reduce the oxide, so the manufacturing process is simple, so it is suitable for a production line for mass-producing the electronic package.

1‧‧‧封裝結構 1‧‧‧ package structure

10‧‧‧封裝基板 10‧‧‧ package substrate

100,200‧‧‧電性接觸墊 100,200‧‧‧electric contact pad

11‧‧‧半導體晶片 11‧‧‧Semiconductor wafer

13‧‧‧銲錫凸塊 13‧‧‧solder bump

14‧‧‧底膠 14‧‧‧ primer

2‧‧‧電子封裝件 2‧‧‧electronic package

20‧‧‧承載結構 20‧‧‧ bearing structure

20a‧‧‧第一表面 20a‧‧‧first surface

20b‧‧‧第二表面 20b‧‧‧Second surface

21‧‧‧電子元件 21‧‧‧Electronic components

21a‧‧‧作用面 21a‧‧‧active surface

21b‧‧‧非作用面 21b‧‧‧ non-active surface

210‧‧‧電極墊 210‧‧‧ electrode pad

22‧‧‧電性接點 22‧‧‧electric contact

22a,43a,43b‧‧‧粗糙面 22a, 43a, 43b‧‧‧Rough surface

22b‧‧‧介面合金共化物 22b‧‧‧Interface alloy

220,420‧‧‧尖部 220,420‧‧‧tip

23,43,43’‧‧‧導電凸塊 23,43,43 ’‧‧‧ conductive bump

230‧‧‧金屬部 230‧‧‧Metal Department

231,431‧‧‧銲錫部 231,431‧‧‧Soldering Department

232‧‧‧氧化層 232‧‧‧oxide

24‧‧‧包覆層 24‧‧‧ cladding

300‧‧‧絕緣保護層 300‧‧‧Insulation protective layer

31‧‧‧表面處理層 31‧‧‧Surface treatment layer

d‧‧‧寬度 d‧‧‧width

t‧‧‧高度差 t‧‧‧height difference

第1A至1B圖係為習知覆晶式封裝結構之製法的剖視示意圖。 1A to 1B are schematic cross-sectional views of a conventional method for manufacturing a flip-chip package structure.

第2A至2C圖係為本發明之電子封裝件之製法之剖視示意圖。 Figures 2A to 2C are schematic cross-sectional views of the manufacturing method of the electronic package of the present invention.

第2A’圖係為第2A圖之局部放大剖視圖。 Figure 2A 'is a partially enlarged sectional view of Figure 2A.

第2B’圖係為第2B圖之局部放大剖視圖。 Figure 2B 'is a partially enlarged sectional view of Figure 2B.

第2C’圖係為第2C圖之局部放大剖視圖。 Figure 2C 'is a partially enlarged sectional view of Figure 2C.

第3A及3B圖係為第2A圖之承載結構之不同實施例之局部放大剖視圖。 Figures 3A and 3B are partial enlarged cross-sectional views of different embodiments of the bearing structure of Figure 2A.

第4A及4B圖係為第2A圖之電子元件之不同實施例之局部放大剖視圖。 4A and 4B are partial enlarged cross-sectional views of different embodiments of the electronic component of FIG. 2A.

以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The following describes the implementation of the present invention through specific embodiments. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.

須知,本說明書所附圖式所繪示之結構、比例、大小等,均僅用以配合說明書所揭示之內容,以供熟悉此技藝之人士之瞭解與閱讀,並非用以限定本發明可實施之限定 條件,故不具技術上之實質意義,任何結構之修飾、比例關係之改變或大小之調整,在不影響本發明所能產生之功效及所能達成之目的下,均應仍落在本發明所揭示之技術內容得能涵蓋之範圍內。同時,本說明書中所引用之如“第一”、“第二”、“上”、及“一”等之用語,亦僅為便於敘述之明瞭,而非用以限定本發明可實施之範圍,其相對關係之改變或調整,在無實質變更技術內容下,當亦視為本發明可實施之範疇。 It should be noted that the structures, proportions, sizes, etc. shown in the drawings in this specification are only used to match the content disclosed in the specification for the understanding and reading of those skilled in the art, and are not intended to limit the implementation of the present invention. Limitation Conditions, so it does not have technical significance, any structural modification, proportional relationship change, or size adjustment should still fall within the scope of the present invention without affecting the effects and goals that can be achieved by the present invention. The technical content disclosed must be within the scope. At the same time, the terms such as "first", "second", "upper", and "one" cited in the present specification are only for the convenience of description, and are not intended to limit the scope of the present invention. The change or adjustment of the relative relationship shall also be regarded as the scope in which the present invention can be implemented without substantially changing the technical content.

第2A至2C圖係為本發明之電子封裝件2之製法之剖視示意圖。 2A to 2C are schematic cross-sectional views of a method for manufacturing the electronic package 2 according to the present invention.

如第2A及2A’圖所示,提供一電子元件21及一具有複數電性接點22之承載結構20,其中,該電子元件21上形成有複數導電凸塊23。 As shown in FIGS. 2A and 2A ′, an electronic component 21 and a supporting structure 20 having a plurality of electrical contacts 22 are provided, wherein a plurality of conductive bumps 23 are formed on the electronic component 21.

於本實施例中,該承載結構20例如為具有核心層與線路結構之封裝基板(substrate)或無核心層(coreless)之線路結構,其係於介電材上形成線路層,如扇出(fan out)型重佈線路層(redistribution layer,簡稱RDL),且具有相對之第一表面20a與第二表面20b,且該第一表面20a可為絕緣保護層300(如第3A及3B圖所示之防銲層)之表面。具體地,該電性接點22(如凸塊)係設於該第一表面20a上,且突出該第一表面20a,即先製作該電性接點22,再形成該絕緣保護層300,且該絕緣保護層300之高度可依需求設計(如第3A及3B圖所示之不同高度)。應可理解地,該承載結構20亦可為其它可供承載如晶片等電子元件之 承載單元,例如導線架(leadframe)或矽中介板(silicon interposer),並不限於上述。 In this embodiment, the carrier structure 20 is, for example, a packaging substrate with a core layer and a circuit structure or a coreless circuit structure, which forms a circuit layer on a dielectric material, such as a fan-out ( fan out) redistribution layer (RDL), and has a first surface 20a and a second surface 20b opposite to each other, and the first surface 20a may be an insulating protection layer 300 (as shown in FIGS. 3A and 3B). (Shown as solder mask). Specifically, the electrical contact 22 (such as a bump) is provided on the first surface 20a and protrudes from the first surface 20a, that is, the electrical contact 22 is first made, and then the insulating protection layer 300 is formed. And the height of the insulation protection layer 300 can be designed according to requirements (as shown in the different heights in Figures 3A and 3B). It should be understood that the supporting structure 20 can also be other electronic components that can be used to support electronic components such as wafers. The carrying unit, such as a leadframe or a silicon interposer, is not limited to the above.

再者,於該電性接點22上進行電漿預處理(Plasma pre-treatment)製程,使該電性接點22之表面成為具有複數尖部220之粗糙面22a,且各該尖部220之高度不一致,使最高之尖部220與最低之尖部220具有1.5微米(um)以下之高度差t,如1至1.5微米之間。具體地,該電性接點22係為墊狀(如第2A’圖所示)。進一步,如第3A圖所示,該電性接點22藉由電漿處理(Plasma treatment)製程形成粗糙面22a後可再形成一表面處理層31,如化學鎳鈀浸金(ENEPIG)。 Furthermore, a plasma pre-treatment process is performed on the electrical contacts 22, so that the surface of the electrical contacts 22 becomes a rough surface 22a having a plurality of pointed portions 220, and each of the pointed portions 220 The heights are inconsistent, so that the highest tip 220 and the lowest tip 220 have a height difference t below 1.5 microns (um), such as between 1 and 1.5 microns. Specifically, the electrical contact 22 is pad-shaped (as shown in FIG. 2A '). Further, as shown in FIG. 3A, the electrical contact 22 is formed into a rough surface 22a by a plasma treatment process, and then a surface treatment layer 31 such as chemical nickel palladium immersion gold (ENEPIG) can be formed.

又,該電子元件21係為主動元件、被動元件或其組合者,且該主動元件係例如半導體晶片,而該被動元件係例如電阻、電容及電感。例如,該電子元件21係為半導體晶片,其具有作用面21a與相對該作用面21a之非作用面21b,該作用面21a上具有複數電極墊210,並於該些電極墊210上形成有導電凸塊23。 In addition, the electronic element 21 is an active element, a passive element, or a combination thereof, and the active element is, for example, a semiconductor wafer, and the passive element is, for example, a resistor, a capacitor, and an inductor. For example, the electronic component 21 is a semiconductor wafer, which has an active surface 21a and a non-active surface 21b opposite to the active surface 21a. The active surface 21a has a plurality of electrode pads 210, and conductive is formed on the electrode pads 210. Convex block 23.

另外,如第2A及2A’圖所示,該導電凸塊23係具有接觸結合該電極墊210之金屬部230(如銅柱)及形成於該金屬柱230上之銲錫部231,且該些銲錫部231之表面形成有氧化層232,其中,該導電凸塊23之最大平面寬度d係小於25微米。 In addition, as shown in FIGS. 2A and 2A ′, the conductive bump 23 has a metal portion 230 (such as a copper pillar) that is in contact with the electrode pad 210 and a solder portion 231 formed on the metal pillar 230. An oxide layer 232 is formed on the surface of the solder portion 231. The maximum planar width d of the conductive bump 23 is less than 25 microns.

如第2B及2B’圖所示,將該電子元件21以該導電凸塊23覆晶接合於該承載結構20上的電性接點22。 As shown in FIGS. 2B and 2B ', the electronic component 21 is flip-chip bonded to the electrical contact 22 on the supporting structure 20 with the conductive bump 23.

於本實施例中,該電性接點22之尖部220會插穿該氧化層232而插入該銲錫部231中。 In this embodiment, the tip portion 220 of the electrical contact 22 is inserted through the oxide layer 232 and inserted into the solder portion 231.

如第2C及2C’圖所示,回銲該導電凸塊23之銲錫部231,再形成包覆層24於該承載結構20之第一表面20a上以包覆該些電性接點22與該些導電凸塊23。 As shown in FIGS. 2C and 2C ′, the solder portion 231 of the conductive bump 23 is re-soldered, and then a coating layer 24 is formed on the first surface 20 a of the carrier structure 20 to cover the electrical contacts 22 and The conductive bumps 23.

於本實施例中,該包覆層24可為底膠或封裝膠體等絕緣材,並無特別限制。 In this embodiment, the coating layer 24 may be an insulating material such as a primer or a sealing gel, and is not particularly limited.

再者,如第2C’圖所示,於回銲該銲錫部231後,該些尖部220與部分該銲錫部231會變成介面合金共化物(Inter-Metallic Compound,簡稱IMC)22b,使該些電性接點22之尖部220因與銲錫部231反應而形成層結構,其厚度約1.5微米以下,如1至1.5微米之間。 Furthermore, as shown in FIG. 2C ′, after re-soldering the solder portion 231, the pointed portions 220 and a portion of the solder portion 231 will become an inter-metallic compound (IMC) 22b, so that The tip portions 220 of the electrical contacts 22 form a layer structure due to the reaction with the solder portion 231, and have a thickness of about 1.5 micrometers or less, such as between 1 and 1.5 micrometers.

因此,本發明之製法係藉由該電性接點22具有複數尖部220之粗糙面22a之設計,以於該電子元件21接合該承載結構20時,該電性接點22之尖部220會插入導電凸塊23之銲錫部231中,因而該導電凸塊23無需沾附助銲劑,故相較於習知技術,本發明之製法因無需使用助銲劑而能減少製程並縮減製程的時間,且不會殘留助銲劑之部分材料於該電子封裝件2上,因而不會產生粗大銲接空隙,進而能避免該導電凸塊23與該電性接點22之間的接合失效之問題,以達到提升該電子封裝件2的可靠性之目的。 Therefore, the manufacturing method of the present invention is based on the design of the rough surface 22a of the electrical contact 22 having a plurality of pointed portions 220, so that when the electronic component 21 engages the bearing structure 20, the pointed portion 220 of the electrical contact 22 Will be inserted into the solder portion 231 of the conductive bump 23, so the conductive bump 23 does not need to be affixed with a flux. Compared with the conventional technology, the manufacturing method of the present invention can reduce the manufacturing process and shorten the processing time because no flux is required. , And a part of the flux does not remain on the electronic package 2, so no large soldering gap is generated, thereby avoiding the problem of the failure of the bonding between the conductive bump 23 and the electrical contact 22. The purpose of improving the reliability of the electronic package 2 is achieved.

再者,當該導電凸塊23之最大平面寬度d很小(如小於25微米)時,於回銲該銲錫部231後,該些尖部220與部分該銲錫部231會變成介面合金共化物22b,使該導電 凸塊23與電性接點22之間形成層結構而完整結合,故能避免該導電凸塊23沾附不完全的問題。 Furthermore, when the maximum planar width d of the conductive bump 23 is small (for example, less than 25 microns), after re-soldering the solder portion 231, the pointed portions 220 and a portion of the solder portion 231 will become interface alloy composites 22b, make this conductive A layer structure is formed between the bumps 23 and the electrical contacts 22 for complete integration, so the problem of incomplete adhesion of the conductive bumps 23 can be avoided.

又,本發明之製法不需還原該氧化層232,因而製程簡易,故適合應用於大量生產該電子封裝件2之生產線上。 In addition, the manufacturing method of the present invention does not need to reduce the oxide layer 232, so the manufacturing process is simple, so it is suitable for being applied to a production line for mass-producing the electronic package 2.

另外,如第4A及4B圖所示,本發明之另一實施例中,電性接點並未形成有粗糙面,而係將粗糙面43a,43b形成於導電凸塊43,43’上。具體地,如第4A圖所示,該導電凸塊43之銲錫部431形成有一包含複數尖部420之粗糙面43a;或者,如第4B圖所示,該導電凸塊43’係僅由金屬部230構成,其形成有一包含複數尖部420之粗糙面43b,且於該電性接點22上形成有銲錫材料(表面有氧化層),以令該導電凸塊43,43’之尖部420插入至該銲錫材料中。 In addition, as shown in FIGS. 4A and 4B, in another embodiment of the present invention, the electrical contacts are not formed with a rough surface, but the rough surfaces 43a, 43b are formed on the conductive bumps 43, 43 '. Specifically, as shown in FIG. 4A, the solder portion 431 of the conductive bump 43 is formed with a rough surface 43 a including a plurality of pointed portions 420; or, as shown in FIG. 4B, the conductive bump 43 ′ is made of metal only. The portion 230 is formed with a rough surface 43b including a plurality of pointed portions 420, and a solder material (an oxide layer is formed on the surface) is formed on the electrical contact 22, so that the conductive bumps 43,43 'have pointed portions. 420 is inserted into the solder material.

本發明提供一種電子封裝件2,係包括:一承載結構20以及一電子元件21。 The present invention provides an electronic package 2 comprising: a carrying structure 20 and an electronic component 21.

所述之承載結構20係具有複數電性接點22。 The supporting structure 20 has a plurality of electrical contacts 22.

所述之電子元件21係具有複數導電凸塊23,43,43’,使該電子元件21藉由該導電凸塊23,43,43’覆晶接合該電性接點22,其中,該電性接點22與該導電凸塊23,43,43’之其中一者係具有複數尖部220,420,以插入該電性接點22與該導電凸塊23,43,43’之另一者中。 The electronic component 21 has a plurality of conductive bumps 23,43,43 ', so that the electronic component 21 is bonded to the electrical contact 22 through the conductive bumps 23,43,43'. One of the electrical contact 22 and the conductive bump 23,43,43 'has a plurality of tips 220,420 to be inserted into the other of the electrical contact 22 and the conductive bump 23,43,43' .

於一實施例中,該導電凸塊23,43,43’之最大平面寬度d係小於25微米。 In one embodiment, the maximum planar width d of the conductive bumps 23,43,43 'is less than 25 microns.

於一實施例中,該電性接點22與該導電凸塊23,43,43’之其中一者係形成粗糙面22a,43a,43b,其具有複數該尖部220,420。具體地,該些尖部220,420之間係具有高度差t,例如,該高度差t係小於1.5微米。 In one embodiment, one of the electrical contact 22 and the conductive bump 23,43,43 'forms a rough surface 22a, 43a, 43b, which has a plurality of the tips 220,420. Specifically, there is a height difference t between the tips 220, 420. For example, the height difference t is less than 1.5 micrometers.

於一實施例中,所述之電子封裝件2復包括表面處理層31,係形成於該尖部220上。 In one embodiment, the electronic package 2 includes a surface treatment layer 31 formed on the tip 220.

綜上所述,本發明之電子封裝件及其製法,藉由該尖部之設計,使其製程無需使用助銲劑或還原氧化層製程,而能避免該導電凸塊與該電性接點之間的接合不佳之問題,故本發明能提高產品之可靠度。 In summary, the electronic package and its manufacturing method of the present invention, by the design of the tip, makes it unnecessary to use a flux or a reduction oxide process in the manufacturing process, and can avoid the conductive bump and the electrical contact. The problem of poor joints between the two is therefore to improve the reliability of the product.

上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are used to exemplify the principle of the present invention and its effects, but not to limit the present invention. Anyone skilled in the art can modify the above embodiments without departing from the spirit and scope of the present invention. Therefore, the scope of protection of the rights of the present invention should be listed in the scope of patent application described later.

Claims (10)

一種電子封裝件,係包括:一承載結構,係具有複數電性接點;以及一電子元件,係具有複數導電凸塊,以令該電子元件藉由該導電凸塊結合至該承載結構之該電性接點,其中,該導電凸塊之最大平面寬度係小於25微米,且該電性接點或該導電凸塊之其中一者係形成有複數尖部,以插入至該電性接點或該導電凸塊之另一者中。An electronic package includes: a bearing structure having a plurality of electrical contacts; and an electronic component having a plurality of conductive bumps, so that the electronic component is coupled to the bearing structure through the conductive bumps. An electrical contact, wherein the maximum planar width of the conductive bump is less than 25 microns, and one of the electrical contact or the conductive bump is formed with a plurality of pointed portions for insertion into the electrical contact Or in the other of the conductive bumps. 如申請專利範圍第1項所述之電子封裝件,其中,該電性接點或該導電凸塊之其中一者係形成有粗糙面,其中,該粗糙面具有複數該尖部。According to the electronic package of claim 1, wherein one of the electrical contact or the conductive bump is formed with a rough surface, wherein the rough surface has a plurality of the pointed portions. 如申請專利範圍第1項所述之電子封裝件,其中,該複數尖部之間係具有高度差。The electronic package according to item 1 of the scope of patent application, wherein there is a height difference between the plurality of tips. 如申請專利範圍第3項所述之電子封裝件,其中,該高度差係小於1.5微米。The electronic package according to item 3 of the scope of patent application, wherein the height difference is less than 1.5 micrometers. 如申請專利範圍第1項所述之電子封裝件,其中,該尖部上形成有表面處理層。The electronic package according to item 1 of the scope of patent application, wherein a surface treatment layer is formed on the tip portion. 一種電子封裝件之製法,係包括:提供一具有複數電性接點之承載結構及一具有複數導電凸塊之電子元件,其中,該電性接點或該導電凸塊之其中一者係形成有複數尖部,且該導電凸塊之最大平面寬度係小於25微米;以及將該電子元件藉由該導電凸塊結合該承載結構之該電性接點,以令該電性接點或該導電凸塊之其中一者之該尖部插入該電性接點或該導電凸塊之另一者中。An electronic package manufacturing method includes: providing a bearing structure having a plurality of electrical contacts and an electronic component having a plurality of conductive bumps, wherein one of the electrical contacts or the conductive bumps is formed There are a plurality of pointed portions, and the maximum plane width of the conductive bump is less than 25 micrometers; and the electronic component is combined with the electrical contact of the bearing structure through the conductive bump to make the electrical contact or the The tip of one of the conductive bumps is inserted into the electrical contact or the other of the conductive bumps. 如申請專利範圍第6項所述之電子封裝件之製法,其中,該電性接點或該導電凸塊之其中一者係形成有粗糙面,其中,該粗糙面具有複數該尖部。According to the method for manufacturing an electronic package as described in item 6 of the scope of the patent application, wherein one of the electrical contact or the conductive bump is formed with a rough surface, wherein the rough surface has a plurality of the pointed portions. 如申請專利範圍第6項所述之電子封裝件之製法,其中,該複數尖部之間係具有高度差。According to the manufacturing method of the electronic package described in item 6 of the patent application scope, there is a height difference between the plurality of tips. 如申請專利範圍第8項所述之電子封裝件之製法,其中,該高度差係小於1.5微米。According to the manufacturing method of the electronic package described in item 8 of the scope of the patent application, wherein the height difference is less than 1.5 micrometers. 如申請專利範圍第6項所述之電子封裝件之製法,復包括形成表面處理層於該尖部上。According to the method for manufacturing an electronic package described in item 6 of the scope of patent application, the method further includes forming a surface treatment layer on the tip portion.
TW107128450A 2018-08-15 2018-08-15 Electronic package and manufacturing method thereof TWI665774B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW107128450A TWI665774B (en) 2018-08-15 2018-08-15 Electronic package and manufacturing method thereof
CN201811095185.3A CN110838477B (en) 2018-08-15 2018-09-19 Electronic package and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW107128450A TWI665774B (en) 2018-08-15 2018-08-15 Electronic package and manufacturing method thereof

Publications (2)

Publication Number Publication Date
TWI665774B true TWI665774B (en) 2019-07-11
TW202010078A TW202010078A (en) 2020-03-01

Family

ID=68049632

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107128450A TWI665774B (en) 2018-08-15 2018-08-15 Electronic package and manufacturing method thereof

Country Status (2)

Country Link
CN (1) CN110838477B (en)
TW (1) TWI665774B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI825790B (en) * 2022-06-17 2023-12-11 矽品精密工業股份有限公司 Electronic package and manufacturing method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1697148A (en) * 2004-05-12 2005-11-16 富士通株式会社 Semiconductor device and method of manufacturing the semiconductor device
CN103745933A (en) * 2013-12-05 2014-04-23 南通富士通微电子股份有限公司 Packaging structure forming method
TW201618256A (en) * 2014-11-12 2016-05-16 矽品精密工業股份有限公司 Semiconductor package structure and fabrication method thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006294650A (en) * 2005-04-05 2006-10-26 Oki Electric Ind Co Ltd Method of mounting electronic component
CN101414596A (en) * 2007-10-19 2009-04-22 南茂科技股份有限公司 Chip encapsulation substrate assembly and chip encapsulation construct
US8409979B2 (en) * 2011-05-31 2013-04-02 Stats Chippac, Ltd. Semiconductor device and method of forming interconnect structure with conductive pads having expanded interconnect surface area for enhanced interconnection properties
US20170365569A1 (en) * 2013-12-02 2017-12-21 Smartrac Technology Gmbh Contact Bumps and Methods of Making Contact Bumps on Flexible Electronic Devices
US20170162536A1 (en) * 2015-12-03 2017-06-08 International Business Machines Corporation Nanowires for pillar interconnects

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1697148A (en) * 2004-05-12 2005-11-16 富士通株式会社 Semiconductor device and method of manufacturing the semiconductor device
CN103745933A (en) * 2013-12-05 2014-04-23 南通富士通微电子股份有限公司 Packaging structure forming method
TW201618256A (en) * 2014-11-12 2016-05-16 矽品精密工業股份有限公司 Semiconductor package structure and fabrication method thereof

Also Published As

Publication number Publication date
TW202010078A (en) 2020-03-01
CN110838477B (en) 2021-11-26
CN110838477A (en) 2020-02-25

Similar Documents

Publication Publication Date Title
US10510731B2 (en) Package-on-package (PoP) structure including stud bulbs
TWI496259B (en) Flip chip package assembly and process for making same
US10461052B2 (en) Copper structures with intermetallic coating for integrated circuit chips
US20090065943A1 (en) Microelectronic Assembly Having Second Level Interconnects Including Solder Joints Reinforced with Crack Arrester Elements and Method of Forming Same
TWI446508B (en) Coreless package substrate and method of making same
US20090206480A1 (en) Fabricating low cost solder bumps on integrated circuit wafers
JP2015106617A (en) Substrate bonding method, bump forming method, and semiconductor device
TWI665774B (en) Electronic package and manufacturing method thereof
TWI647769B (en) Electronic package manufacturing method
TW200408095A (en) Chip size semiconductor package structure
TW201820554A (en) Substrate structure and method of manufacture
TWI500129B (en) Semiconductor flip-chip bonding structure and process
JP2010123676A (en) Manufacturing method of semiconductor device and semiconductor device
TW201508877A (en) Semiconductor package and manufacturing method thereof
TW201413903A (en) Semiconductor package and method of forming the same
TW201729372A (en) Substrate structure
TWI760629B (en) Electronic package and conductive substrate and manufacturing method thereof
TWI719866B (en) Electronic package, supporting structure and manufacturing method thereof
TWI642133B (en) Mounting method for electronic component and carrying jig applying the mounting method
TW201318113A (en) Package substrate and fabrication method thereof
US11824037B2 (en) Assembly of a chip to a substrate
TWI418276B (en) Method for making package substrate with wingless conductive bump
KR100871067B1 (en) Method for manufacturing high strength solder bump through forming copper post
TWI338945B (en) Flip chip packaging structure and manufacturing method thereof
TW202306069A (en) Electronic package and manufacturing method thereof