WO2015147095A1 - Dimension measurement device and dimension measurement method - Google Patents

Dimension measurement device and dimension measurement method Download PDF

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Publication number
WO2015147095A1
WO2015147095A1 PCT/JP2015/059226 JP2015059226W WO2015147095A1 WO 2015147095 A1 WO2015147095 A1 WO 2015147095A1 JP 2015059226 W JP2015059226 W JP 2015059226W WO 2015147095 A1 WO2015147095 A1 WO 2015147095A1
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WO
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Prior art keywords
dimension
measuring
distance
measured
inclination
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PCT/JP2015/059226
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French (fr)
Japanese (ja)
Inventor
健太 古川
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日本精工株式会社
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Application filed by 日本精工株式会社 filed Critical 日本精工株式会社
Priority to CN201590000323.9U priority Critical patent/CN206609370U/en
Publication of WO2015147095A1 publication Critical patent/WO2015147095A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/02Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/12Measuring arrangements characterised by the use of electric or magnetic techniques for measuring diameters

Definitions

  • the present invention relates to a dimension measuring apparatus and a dimension measuring method for measuring a dimension of an object to be measured.
  • a pair of elongated measuring elements parallel to each other are moved relatively on both sides of the object to be measured, and the object to be measured is brought into contact with the tip of the measuring element. It is widely known to detect the distance between the probe at that time.
  • the measuring element may be easily bent due to the contact force with the object to be measured, and the dimension may be measured while the measuring element is tilted.
  • the measuring element when measuring the radial thickness of a ring-shaped object having a long axial length, the measuring element must be longer than the axial length because the measuring element is inserted into the ring of the object to be measured. is there. In that case, the influence of the inclination of the probe on the detection result of the distance becomes large, and it becomes difficult to measure with high accuracy particularly for a large object to be measured.
  • a measuring element drive unit having a rail extending along the moving direction of the measuring element and a slider movably supported by the rail is provided above the object to be measured, and the measuring element is attached below the slider.
  • a dimension measuring device that minimizes the length of the probe has been proposed (see Patent Document 1). According to this apparatus, the length of the probe can be shortened, and the influence of inclination can be suppressed.
  • the measuring element when the object to be measured is large and it is necessary to insert the measuring element to a deep position of the object to be measured, the measuring element must be lengthened, and the error due to the inclination of the measuring element becomes large.
  • the measuring element In addition to the method of contacting the measuring element directly connected to the guide as described above to the object to be measured, the measuring element is supported by a mechanism that can float by an elastic body, thereby suppressing the measuring pressure on the object to be measured.
  • a dimension measuring device that reduces the inclination of (see Patent Document 2).
  • the dimension measuring apparatus of the cited document 2 has a structure in which the measuring element is floated and supported while preventing the play that causes the inclination of the measuring element, the measuring element support structure is disadvantageous. There is. Therefore, it is difficult to increase the degree of freedom of design and to reduce the size. Accordingly, the present invention is capable of measuring with high accuracy even when measuring a large object to be measured using a long measuring element, and having a structure suitable for downsizing without complicating the apparatus configuration.
  • An object of the present invention is to provide a measuring apparatus and a dimension measuring method.
  • the present invention has the following configuration. (1) a mounting table on which the object to be measured is mounted; A measuring element having an arm portion extending toward the mounting table, wherein a contact-type displacement detection unit is disposed at a tip portion of the arm portion; A linear motion mechanism that supports a base end portion of the arm portion of the measuring element, moves the measuring element in a uniaxial direction, and contacts the displacement detecting unit with the object to be measured; An inclination detection unit for detecting an inclination angle formed between the extending direction of the arm part of the measuring element and an orthogonal plane of the uniaxial direction; A distance detection signal output from the displacement detection unit and an inclination angle detection signal output from the inclination detection unit are input while the displacement detection unit is in contact with the object to be measured, and the displacement detection unit The amount of positional deviation in the uniaxial direction caused by the inclination of the arm portion at the arrangement position in the extending direction is determined using the inclination angle of the input inclination angle detection signal, and is output from the displacement detection section.
  • a control unit that outputs information of a correction distance obtained by correcting the measurement distance of the distance detection signal by the positional deviation amount;
  • a dimension measuring apparatus comprising: (2) The dimension measuring apparatus according to (1), wherein the displacement detection unit is an electric micrometer. (3) The pair of measuring elements are arranged side by side in the uniaxial direction so that the contact side of the displacement detection unit with the object to be measured faces each other. The dimension measuring apparatus according to (1) or (2), wherein the linear motion mechanism supports the pair of measuring elements so as to be independently movable in the uniaxial direction. (4) The dimension measuring apparatus according to (3), wherein two pairs of the measuring elements are arranged along the uniaxial direction.
  • the tilt detection unit detects positions in the uniaxial direction at at least two locations along the extending direction of the probe, and detects the detected positions in the uniaxial direction and the at least two locations of the extension.
  • the dimension measuring apparatus according to any one of (1) to (4), wherein the inclination angle is detected from a relationship with a position in an outgoing direction.
  • the tilt detection unit includes a linear scale arranged along the uniaxial direction, and a detection head that is provided in the measuring element and detects position information from the linear scale (5) ) Dimension measuring device.
  • a dimension measuring method for measuring a dimension of an object to be measured using the dimension measuring apparatus Obtaining a correction distance using a master body having a known dimension as the object to be measured, and setting the correction distance as a first distance; Measuring the object to be measured as a dimension measurement object to determine the correction distance, and setting the correction distance as a second distance; Adding the difference of the second distance with respect to the first distance to a known dimension of the master body to obtain the dimension of the object to be measured.
  • the measurement object has a cylindrical shape, The dimension measurement method according to (7), wherein the dimension is a dimension in a radial direction of the object to be measured. (9) The dimensions according to (7) or (8), wherein the mounting table is rotated by a predetermined angle, and the dimension of the object to be measured placed on the mounting table is obtained at each rotation position. Measuring method.
  • the present invention it is possible to measure with high accuracy even when measuring a large object to be measured using a long measuring element, and to make the structure suitable for miniaturization without complicating the apparatus configuration. it can.
  • FIG. 1 is a diagram for explaining an embodiment of the present invention and is an overall configuration diagram of a dimension measuring apparatus.
  • the dimension measuring apparatus 100 includes a gantry 11, a mounting table 13 on the gantry 11 on which a workpiece W as a measurement object is placed, a pair of measuring elements 15A and 15B, and a pair of measuring elements 17A and 17B.
  • the X direction linear motion mechanism 21 provided on the mounting plate 19, the Z direction linear motion mechanism 25 provided on the frame 23, and the Y direction linear motion mechanism 27 provided on the gantry 11.
  • the dimension measuring apparatus 100 is provided with the inclination detection part which measures the inclination angle of each measuring element 15A, 15B, 17A, 17B although the detail is mentioned later.
  • the mounting table 13 is directly connected to a rotating shaft (not shown) installed in the gantry 11 and supports the workpiece W in a rotatable manner.
  • a rotating shaft not shown
  • the workpiece W can be rotated at an arbitrary rotation angle with the center of the cylinder of the workpiece W fixed to the mounting table 13 as the rotation center.
  • Each of the pair of measuring elements 15A and 15B and the pair of measuring elements 17A and 17B is connected to the X-direction linear motion mechanism 21 at each base end, and each measuring element is independently movable in the X direction (uniaxial direction). It is supported by. These two pairs of measuring elements have the same structure.
  • the X direction linear motion mechanism 21 includes a ball screw nut portion 31 and a linear guide portion 33.
  • the ball screw nut portion 31 includes a ball screw 35 disposed on the mounting plate 19 along the X direction, a servo motor 37 that rotationally drives the ball screw 35, and nut portions 39A and 39B.
  • the nut part 39A supports the measuring element 15A
  • the nut part 39B supports the measuring element 17A. Both of these nut portions 39A and 39B are inserted into the ball screw 35 and moved in the X direction by the rotation of the ball screw 35.
  • the linear guide portion 33 includes a guide rail 41 and sliders 43A, 43B, 45A, and 45B that move in the X direction along the guide rail 41.
  • a measuring element 15A is fixed to the slider 43A, and a measuring element 15B is fixed to the slider 43B.
  • the measuring element 17A is fixed to the slider 45A, and the measuring element 17B is fixed to the slider 45B.
  • the pair of measuring elements 15A and 15B and the pair of measuring elements 17A and 17B have the same configuration, the pair of measuring elements 15A and 15B will be described below as an example.
  • FIG. 2 is a partial configuration diagram showing an X-direction linear motion mechanism 21 that moves the measuring elements 15A and 15B, and an inclination detector that will be described in detail later.
  • the measuring element 15A functions as a measuring element for measuring the outer diameter
  • the measuring element 15B functions as a measuring element for measuring the inner diameter.
  • Each measuring element 15A, 15B has long arm portions 47A, 47B extending downwardly from the X-direction linear motion mechanism 21 side toward the workpiece W.
  • Electric micrometers 49A and 49B serving as displacement detection units for measuring the distance from the workpiece W are disposed at the distal ends of the arms 47A and 47B on the workpiece W side.
  • the contacts 51, 51 of the electric micrometers 49A, 49B are arranged on the contact side with the workpiece W of the arm portions 47A, 47B facing each other.
  • the electric micrometers 49A and 49B are comparative length measuring devices that have a contact-type contact 51 and convert a minute displacement of the contact 51 into an electrical quantity for measurement.
  • the contact 51 is provided so as to protrude from the main body of the electric micrometers 49A and 49B along the distance detection direction, and is elastically biased and supported in the protruding direction.
  • the electric micrometers 49A and 49B output the position of the contact 51 within a predetermined length of detectable stroke as distance information.
  • an electric actuator 53 connected to the proximal end portion of the measuring element 15B is connected between the nut portion 39A of the measuring element 15A and the slider 43A.
  • the electric actuator 53 is provided on the measuring element 15B, and moves the measuring element 15B closer to or away from the measuring element 15A along the X direction.
  • the first linear scale 55 is disposed on the ball screw 35 side of the guide rail 41 on the mounting plate 19, and the second linear scale 57 is disposed on the workpiece W side.
  • a first detection head 59 is disposed at a position facing the first linear scale 55 of the probe 15A, and a second detection head 61 is disposed at a position facing the second linear scale 57. Yes.
  • the first detection head 63 is disposed at a position facing the first linear scale 55 of the probe 15B, and the second detection head 65 is disposed at a position facing the second linear scale 57. Yes.
  • the first detection head 59 of the probe 15A detects the position of the arm portion 47A in the X direction from the first linear scale 55 facing, and the second detection head 61 detects the arm from the second linear scale 57 facing. The position of the part 47B in the X direction is detected.
  • the first detection head 63 of the probe 15B detects the position of the arm portion 47B in the X direction from the first linear scale 55 facing, and the second detection head 65 is the second linear scale facing. 57, the position of the arm portion 47B in the X direction is detected.
  • the linear scale position detection method an optical method or a magnetic method is preferable.
  • a laser distance meter or an electric micrometer having a long measurement range may be used.
  • the first linear scale 55, the second linear scale 57, the first detection heads 59, 63, and the second detection heads 61, 63, 65 constitute an inclination detection unit.
  • first detection head 63 is disposed at a position facing the first linear scale 55 of the probe 15B
  • second detection head 65 is disposed at a position facing the second linear scale 57. ing.
  • the first detection head 63 and the second detection head 65 detect the position of the arm portion 47B in the X direction from the first and second linear scales 55 and 57 facing each other.
  • the dimension measuring apparatus 100 having the above configuration detects the position of the workpiece W in the X direction while the tips of the measuring elements 15A and 15B sandwich the outer circumferential surface 73 and the inner circumferential surface 75 of the workpiece W and are in contact with the workpiece W. At that time, the arm portions 47A and 47B may be bent by the contact force received from the workpiece W by the tip portions of the measuring elements 15A and 15B. When the arm portions 47A and 47B are bent, the output of the electric micrometers 49A and 49B includes a bending error in the X direction position, and the accurate X direction position of the workpiece W cannot be detected.
  • the inclination angle in the extending direction of the arm portion 47A with respect to the plane orthogonal to the X direction is obtained by the first detection head 59 and the second detection head 61 provided in the arm portion 47A. Then, based on the measured inclination angle, a deviation amount ⁇ xA in the X direction generated at the position (position in the Z-axis direction) where the electric micrometer 49A at the tip of the arm portion 47A is disposed is obtained.
  • the deviation output signal ⁇ XA is used to correct the distance output signal from the electric micrometer 49A.
  • electric micrometers 49A and 49B are used as distance detectors, and when the toucher 51 comes into contact with the workpiece W, the toucher 51 is pushed into the electric micrometer along the contact direction. Since this pushing force is generally a minute force, it is possible to prevent the arm portions 47A and 47B from being greatly bent during distance detection. As a result, the deflection of the arm portions 47A and 47B can be accommodated in a light load region where the linearity between the contact force and the arm displacement amount is high, and the generated displacement amount in the X direction can be obtained with high accuracy.
  • FIG. 3 is a control block diagram of the dimension measuring apparatus 100 configured as described above.
  • the control unit 71 that performs overall control of the dimension measuring apparatus 100 is configured by a PC (personal computer), a PLC (programmable logic controller), or the like.
  • the control unit 71 receives the measurement start signal input to the input unit 77, and each of the ball screw nut unit 31, the electric actuator 53, the Z direction linear motion mechanism 25, and the Y direction linear motion mechanism 27 of the X direction linear motion mechanism 21.
  • a driving signal is output to the measuring elements 15A and 51B to move them to desired positions in the space.
  • control part 71 makes the contact 51 contact the workpiece
  • the control unit 71 obtains the inclination angle of each measuring element 15A, 15B from the acquired inclination angle detection signal, and obtains the amount of deviation in the X direction generated at the tip of each measuring element 51A, 15B according to this inclination angle. And the control part 71 correct
  • the corrected distance information is information used for measuring the dimension of the workpiece W, is subjected to predetermined processing, and is output to the output unit 79 as a dimension measurement result signal. Although explanation is omitted, the above signals are similarly taken in the measuring elements 17A and 17B, and a signal of a dimension measurement result based on the correction distance information is output to the output unit 79.
  • the control unit 71 When the average value of the dimension is obtained by performing the measurement a plurality of times, the control unit 71 temporarily stores the dimension measurement result of each time in the storage unit 81, and appropriately calculates the stored dimension measurement result. To do.
  • the dimension measurement of the dimension measuring apparatus 100 is to obtain a relative dimensional difference between a master body (hereinafter referred to as a master work) having a known dimension and the work W, that is, the dimension of the master work and the dimension of the work W. This is done by measuring and calculating the difference between the two.
  • a master body hereinafter referred to as a master work
  • the work W that is, the dimension of the master work and the dimension of the work W.
  • the master work has been measured to have a specified dimension by a precise measuring instrument, and has the same shape as or a shape close to the work W that is the object to be measured.
  • the dimension information of the master work is registered in advance in the storage unit 81 or separately registered before the dimension measurement so that the control unit 71 can refer to it.
  • control unit 71 drives the X-direction linear motion mechanism 21, the Z-direction linear motion mechanism 25, and the Y-direction linear motion mechanism 27 shown in FIG. (S11). The operator fixes the master work to the mounting table 13 in this state.
  • a master work measurement start signal is input to the input unit 77 by a button pressing signal (not shown) or a signal from an external device.
  • the control unit 71 receives the master work measurement start signal, determines that the master work has been fixed (S2), and starts measuring the dimensions of the master work.
  • the control unit 71 drives the X-direction linear motion mechanism 21, the Z-direction linear motion mechanism 25, and the Y-direction linear motion mechanism 27 according to the shape of the master work based on manual operation or a pre-registered algorithm.
  • Each measuring element 15A, 15B is moved close to a desired measurement position (S3).
  • the measurement position is a position where the electric micrometers 49A and 49B of the measuring elements 15A and 15B are in contact with the master work, which is obtained from the dimensions of the master work, and can be obtained by calculation.
  • the control unit 71 moves the measuring element 15A to the outside of the outer surface (the surface corresponding to the outer peripheral surface 73 of the workpiece W in the illustrated example) in the dimension measurement portion of the master workpiece.
  • the probe 15B is also moved to the inside of the inner side surface (the surface corresponding to the inner peripheral surface 75) in the dimension measurement portion of the master work.
  • control unit 71 drives the ball screw nut unit 31 to move the measuring element 15A in the X direction until the contact 51 of the electric micrometer 49A comes into contact with the master work. Further, the control unit 71 drives the electric actuator 53 to move the measuring element 15B toward the measuring element 15A until the contact 51 of the electric micrometer 49B comes into contact with the master work.
  • the contact operation of each of the touch elements 51 and 51 with the master work may be sequential or simultaneous.
  • the outer peripheral surface and the inner peripheral surface of the master work are sandwiched between the electric micrometers 49A and 49B.
  • the controller 71 detects the distance from the master work (the amount by which the toucher 51 is pushed) by the electric micrometers 49A and 49B with the master work sandwiched at the measurement position. Further, the X-direction absolute position of the first linear scale 55 is read by the first detection heads 59 and 63, and the X-direction absolute position of the second linear scale 57 is read by the second detection heads 61 and 65 (S14). .
  • control unit 71 stores the detected output values from the electric micrometers 49A and 49B and the output values from the first detection heads 59 and 63 and the second detection heads 61 and 65 as reference values. 81 (S15). Each output value at this time becomes an output value corresponding to a reference point (origin) when the workpiece W is measured.
  • control unit 71 drives the X-direction linear motion mechanism 21, the Z-direction linear motion mechanism 25, and the Y-direction linear motion mechanism 27 to move the measuring elements 15A and 15B to the retracted position again. (S16).
  • the operator removes the master workpiece from the mounting table 13 and fixes the workpiece W, which is the object to be measured, to the mounting table 13.
  • the workpiece measurement start signal is input to the input unit 77 as described above.
  • the control unit 71 determines that the workpiece W has been fixed (S17), and starts measuring the dimension of the workpiece W.
  • the controller 71 drives the X-direction linear movement mechanism 21, the Z-direction linear movement mechanism 25, and the Y-direction linear movement mechanism 27 in the same manner as the measurement of the master workpiece, and puts the measuring elements 15A and 15B at desired measurement positions. Move (S18). And the control part 71 detects the distance (the amount by which the touch element 51 was pushed in) with the electric micrometer 49A, 49B in the state which the measurement elements 15A and 15B moved to this measurement position. Further, the X-direction absolute position of the first linear scale 55 is read by the first detection heads 59 and 63, and the X-direction absolute position of the second linear scale 57 is read by the second detection heads 61 and 65 (S19). .
  • the control unit 71 causes the storage unit 81 to store the detected output values from the electric micrometers 49A and 49B and the output values from the first detection heads 59 and 63 and the second detection heads 61 and 65 ( S20).
  • control unit 71 obtains the inclination angles of the arm portions 47A and 47B of the measuring elements 15A and 51B during the master work measurement and the work W measurement using the detected output values, respectively.
  • a correction value in the X direction corresponding to is obtained (S21).
  • the control part 71 correct
  • FIG. 5 is an explanatory diagram showing the positional relationship between the electric micrometer 49A, the first detection head 59, and the second detection head 61 in a neutral state where no contact force is applied to the probe 15A.
  • FIG. 6 shows the contact force applied to the probe 15A.
  • FIG. 6 is an explanatory diagram showing a positional relationship among the electric micrometer 49A, the first detection head 59, and the second detection head 61 in a state where a load is applied.
  • the distance in the Z direction from the first detection head 59 facing the first linear scale to the second detection head 61 facing the second linear scale is L 1 , the second detection head. 61 and Z-direction distance L 2 to the center axis of the electric micrometer 49A of probe 51 from.
  • the X-direction distance detected by the first detection head 59 (X-direction distance from the linear scale origin to the first detection head 59) is X s1
  • the X-direction distance detected by the second detection head 61 ( The distance in the X direction from the linear scale origin to the second detection head 61 is defined as Xs2 .
  • the arm axis Ax is orthogonal to the X direction, which is the moving direction of the probe 51A.
  • a deviation amount ⁇ x in the X direction due to the inclination angle ⁇ generated at the position in the Z direction of the electric micrometer 49A is expressed by the following equation (2).
  • ⁇ x X S2 + L 2 ⁇ tan ⁇ (2)
  • a reference value which is a measurement result for the master work stored in the storage unit 81 in S15 described above, is defined as follows.
  • the distance detected by the electric micrometer 49A of the probe 15A is the reference distance D Da
  • the distance detected by the first detection head 59 of the probe 15A is the inclination reference distance X Da1
  • the distance detected by the second detection head 61 of the probe 15A is the inclination reference distance X Da2
  • the distance detected by the electric micrometer 49B of the probe 15B is the reference distance D Db
  • the distance detected by the first detection head 63 of the probe 15B is the inclination reference distance X Db1
  • the distance detected by the second detection head 65 of the probe 15B is defined as a tilt reference distance XDb2 .
  • storage part 81 by above-mentioned S20 is defined as follows.
  • the distance detected by the electric micrometer 49A of the probe 15A is the detection distance D Sa
  • the distance detected by the first detection head 59 of the measuring element 15A is the inclination detection distance XSa1
  • the distance detected by the second detection head 61 of the probe 15A is the inclination detection distance X Sa2
  • the distance detected by the electric micrometer 49B of the probe 15B is the detection distance DSb
  • the distance detected by the first detection head 63 of the probe 15B is the inclination detection distance X Sb1
  • the distance detected by the second detection head 65 of the probe 15B is defined as a tilt detection distance X Sb2 .
  • the reference distance D Da and detection distance D Sa detected by the electric micrometer 49A of the probe 15A, and the reference distance D Db and detection distance D Sb detected by the electric micrometer 49B of the probe 15B are expressed by the following equation (2).
  • the amount of deviation in the X direction according to the tilt angle is included. Therefore, correction distances obtained by correcting the deviation amount in the X direction are obtained for the reference distance D Da , the detection distance D Sa , the reference distance D Db , and the detection distance D Sb as shown in the equation (3).
  • the reference distance D Da , the detection distance D Sa , the correction distance for the reference distance D Db , and the detection distance D Sb are respectively set as a correction reference distance CD Da , a correction detection distance CD Sa , a correction reference distance CD Db , and a correction detection distance CD Sb.
  • CD Da ⁇ CD Sa ) and (CD Db ⁇ CD Sb ) are added to the known dimension WL 0 of the master work to obtain the dimension WL of the work W.
  • the accuracy may be insufficient by measuring the distance WL only at one place in the circumferential direction.
  • the measuring elements 17A and 17B shown in FIG. 1 the corresponding positions on the opposite side across the center of the workpiece W from the measuring positions of the measuring elements 15A and 15B are simultaneously measured.
  • the measurement accuracy can be improved by averaging the measurement results of these two measurement sites.
  • the mounting table 13 is rotated at a predetermined constant angle, different circumferential positions of the workpiece W are measured, and each measurement result is averaged. For example, two circumferential directions orthogonal to each other are measured and the measured values are averaged.
  • the dimension measuring apparatus 100 of this configuration it is also possible to continuously measure the diameter of the workpiece W while rotating the workpiece W.
  • the diameter of the workpiece W can be obtained with high accuracy by measuring the dimension in the radial direction at a pitch of 1 °, for example, and obtaining the average value of the obtained measured values.
  • the dimension measuring apparatus 100 of the present configuration is obtained by measuring the inclination angle due to the deflection of the measuring element, even when measuring a large object to be measured with a long measuring element.
  • the dimension measurement result is corrected according to the inclination angle. For this reason, even when the measuring element is bent, the workpiece dimensions can be measured with high accuracy without complicating the structure of the dimension measuring apparatus.
  • the size measuring device can be easily miniaturized, and the degree of freedom in design can be increased.
  • the dimension measuring apparatus 100 having this configuration obtains the dimension of the workpiece W by comparison with the master workpiece. Therefore, even when the object to be measured is affected by thermal expansion or contraction due to the environmental temperature, the dimensional error can be made smaller than the method of measuring the absolute dimension. That is, if the master work and the work W are placed under the same environmental temperature, if the master work is the same material and shape as the work W, thermal expansion and contraction should occur to the same extent. By comparing the relative dimensions of these, high-precision measurement independent of temperature becomes possible.
  • the present invention is not limited to the above-described embodiments, and those skilled in the art can make changes and applications based on combinations of the configurations of the embodiments, descriptions in the specification, and well-known techniques. This is also the scope of the present invention, and is included in the scope for which protection is sought.
  • a linear scale is used as the tilt detection unit.
  • the present invention is not limited thereto, and other types of angle sensors such as a tilt sensor using a MEMS element may be used.
  • the position information of a plurality of locations may be detected in addition to the two locations in the extending direction of the probe. In that case, the measurement accuracy of the tilt angle can be further improved.
  • the extending direction of the probe is not limited to the vertical direction, and may be configured to extend in the horizontal direction or an arbitrary inclination angle.
  • the dimension of the workpiece W is obtained by a pair of measuring elements, but it may be configured to measure only by a single measuring element. In that case, a configuration may be adopted in which one end portion of the workpiece W is brought into contact with the abutting portion and the other end portion is detected with a measuring element. With this configuration, the dimensional difference between the master workpiece and the workpiece W can be measured with a single measuring element, and the dimensional measurement can be performed more easily.

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  • General Physics & Mathematics (AREA)
  • A Measuring Device Byusing Mechanical Method (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)

Abstract

This dimension measurement device is provided with a pedestal for a measurement object, a probe in which a displacement detection unit is disposed at the tip of an arm section, a linear motion mechanism for moving the probe in a uniaxial direction, an inclination detection unit that detects the inclination angle formed by the extension direction of the probe arm section and the orthogonal plane in the uniaxial direction, and a control unit. The control unit finds the deviation amount in the uniaxial direction produced by the inclination of the arm section using the inputted inclination angle, and outputs corrected distance information which comprises measurement distance information that has been corrected using the deviation amount.

Description

寸法測定装置及び寸法測定方法Dimension measuring apparatus and dimension measuring method
 本発明は、被測定物の寸法を測定する寸法測定装置及び寸法測定方法に関する。 The present invention relates to a dimension measuring apparatus and a dimension measuring method for measuring a dimension of an object to be measured.
 一般に、被測定物の寸法を測定する手法として、長尺状に形成され互いに平行な一対の測定子を被測定物の両脇側で相対移動させ、測定子の先端に被測定物を接触させて、そのときの測定子間の距離を検出することが広く知られている。この手法では、測定子が被測定物と接触した際、被測定物との接触力によって測定子が撓みやすく、測定子が傾いた状態のままで寸法測定することがある。例えば、軸長の長いリング状の被測定物に対して径方向肉厚を測定する場合は、測定子を被測定物のリング内に挿入するため、測定子を軸長以上に長くする必要がある。その場合、測定子の傾きが距離の検出結果に及ぼす影響が大きくなり、特に大型の被測定物に対しては高精度な測定が困難になる。 In general, as a method for measuring the dimension of the object to be measured, a pair of elongated measuring elements parallel to each other are moved relatively on both sides of the object to be measured, and the object to be measured is brought into contact with the tip of the measuring element. It is widely known to detect the distance between the probe at that time. In this method, when the measuring element comes into contact with the object to be measured, the measuring element may be easily bent due to the contact force with the object to be measured, and the dimension may be measured while the measuring element is tilted. For example, when measuring the radial thickness of a ring-shaped object having a long axial length, the measuring element must be longer than the axial length because the measuring element is inserted into the ring of the object to be measured. is there. In that case, the influence of the inclination of the probe on the detection result of the distance becomes large, and it becomes difficult to measure with high accuracy particularly for a large object to be measured.
 そこで、被測定物の上方に、測定子の移動方向に沿って伸びるレールと、レールに移動自在に支持されるスライダとを有する測定子駆動ユニットを設け、測定子をスライダの下方に取り付けることで測定子長を最小限にした寸法測定装置が提案されている(特許文献1参照)。この装置によれば、測定子の長さを短くでき、傾きの影響を抑えることができる。しかしながら、被測定物が大きく、測定子を被測定物の深い位置まで挿入する必要がある場合には、測定子を長くせざるを得ず、測定子の傾きによる誤差が大きくなってしまう。 Therefore, a measuring element drive unit having a rail extending along the moving direction of the measuring element and a slider movably supported by the rail is provided above the object to be measured, and the measuring element is attached below the slider. A dimension measuring device that minimizes the length of the probe has been proposed (see Patent Document 1). According to this apparatus, the length of the probe can be shortened, and the influence of inclination can be suppressed. However, when the object to be measured is large and it is necessary to insert the measuring element to a deep position of the object to be measured, the measuring element must be lengthened, and the error due to the inclination of the measuring element becomes large.
 また、測定子を直動移動させる直動機構によって被測定物の寸法の絶対値を測定するには、要求される精度よりも高い精度で測定子を移動、位置決めする必要がある。ところが、このような直動機構においては、位置決め誤差(リニアガイド等の直動ガイドには真直度誤差、ボールネジなどの送り機構には送り誤差)があり、これらの対策は、十分には考慮されていないのが実情である。 Also, in order to measure the absolute value of the dimension of the object to be measured by the linear movement mechanism that linearly moves the probe, it is necessary to move and position the probe with higher accuracy than required. However, in such a linear motion mechanism, there is a positioning error (straightness error in a linear motion guide such as a linear guide and feed error in a feed mechanism such as a ball screw), and these countermeasures are sufficiently considered. The fact is not.
 上記のようなガイドに直結された測定子を被測定物に接触させる方法以外にも、測定子を弾性体によってフローティング可能な機構で支持することで、被測定物に対する測定圧を抑え、測定子の傾きを軽減する寸法測定装置が提案されている(特許文献2参照)。 In addition to the method of contacting the measuring element directly connected to the guide as described above to the object to be measured, the measuring element is supported by a mechanism that can float by an elastic body, thereby suppressing the measuring pressure on the object to be measured. There has been proposed a dimension measuring device that reduces the inclination of (see Patent Document 2).
日本国特開平10-307018号公報Japanese Laid-Open Patent Publication No. 10-307018 日本国特開2007-240339号公報Japanese Unexamined Patent Publication No. 2007-240339
 しかしながら、引用文献2の寸法測定装置は、測定子の傾きの原因となるガタの発生を防止しつつ、測定子をフローティングさせて支持する構造であるため、測定子の支持構造が複雑になる不利がある。そのため、設計自由度を高めにくく小型化しにくい構成となっている。
 そこで本発明は、長尺状の測定子を用いて大きな被測定物を寸法測定する場合であっても高精度に測定でき、しかも装置構成を複雑化することなく小型化に適した構造の寸法測定装置及び寸法測定方法を提供することを目的とする。
However, since the dimension measuring apparatus of the cited document 2 has a structure in which the measuring element is floated and supported while preventing the play that causes the inclination of the measuring element, the measuring element support structure is disadvantageous. There is. Therefore, it is difficult to increase the degree of freedom of design and to reduce the size.
Accordingly, the present invention is capable of measuring with high accuracy even when measuring a large object to be measured using a long measuring element, and having a structure suitable for downsizing without complicating the apparatus configuration. An object of the present invention is to provide a measuring apparatus and a dimension measuring method.
 本発明は下記構成からなる。
(1) 被測定物が載置される載置台と、
 前記載置台に向けて延出されるアーム部を有し、該アーム部の先端部に接触式の変位検出部が配置された測定子と、
 前記測定子の前記アーム部の基端部を支持し、前記測定子を一軸方向に移動させて前記変位検出部を前記被測定物に接触させる直動機構と、
 前記測定子の前記アーム部の延出方向と前記一軸方向の直交面とのなす傾斜角を検出する傾斜検出部と、
 前記変位検出部を前記被測定物に接触させた状態で、前記変位検出部から出力される距離検出信号、及び前記傾斜検出部から出力される傾斜角検出信号がそれぞれ入力され、前記変位検出部の前記延出方向における配置位置で前記アーム部の傾斜によって生じる前記一軸方向の位置ずれ量を、入力された前記傾斜角検出信号の傾斜角を用いて求め、前記変位検出部から出力された前記距離検出信号の測定距離を前記位置ずれ量で補正した補正距離の情報を出力する制御部と、
を備えることを特徴とする寸法測定装置。
(2) 前記変位検出部が、電気マイクロメータであることを特徴とする(1)に記載の寸法測定装置。
(3) 一対の前記測定子が、前記変位検出部の前記被測定物との接触側を対面させて前記一軸方向に並んで配置されており、
 前記直動機構が、一対の前記測定子をそれぞれ独立して前記一軸方向へ移動可能に支持することを特徴とする(1)又は(2)に記載の寸法測定装置。
(4) 一対の前記測定子が、前記一軸方向に沿って2組配置されたことを特徴とする(3)に記載の寸法測定装置。
(5) 前記傾斜検出部が、前記測定子の前記延出方向に沿った少なくとも2箇所における前記一軸方向の位置をそれぞれ検出し、該検出した一軸方向の位置と、前記少なくとも2箇所の前記延出方向の位置との関係から前記傾斜角を検出することを特徴とする(1)乃至(4)のいずれか一つに記載の寸法測定装置。
(6) 前記傾斜検出部が、前記一軸方向に沿って配置されたリニアスケールと、前記測定子に設けられ前記リニアスケールから位置情報を検出する検出ヘッドと、を有することを特徴とする(5)に記載の寸法測定装置。
(7) (1)乃至(6)のいずれか一つに記載の寸法測定装置を用いて被測定物の寸法を測定する寸法測定方法であって、
 既知の寸法のマスター体を前記被測定物として前記補正距離を求め、当該補正距離を第1の距離とする工程と、
 寸法測定対象である前記被測定物を測定して前記補正距離を求め、当該補正距離を第2の距離とする工程と、
 前記第1の距離に対する前記第2の距離の差分を前記マスター体の既知の寸法に加算して前記被測定物の寸法を求める工程と、を含むことを特徴とする寸法測定方法。
(8) 前記被測定物が円筒形状であり、
 前記寸法が前記被測定物の径方向の寸法であることを特徴とする(7)に記載の寸法測定方法。
(9) 前記載置台を一定角度毎に回転させ、各回転位置で前記載置台に載置された前記被測定物の寸法を求めることを特徴とする(7)又は(8)に記載の寸法測定方法。
The present invention has the following configuration.
(1) a mounting table on which the object to be measured is mounted;
A measuring element having an arm portion extending toward the mounting table, wherein a contact-type displacement detection unit is disposed at a tip portion of the arm portion;
A linear motion mechanism that supports a base end portion of the arm portion of the measuring element, moves the measuring element in a uniaxial direction, and contacts the displacement detecting unit with the object to be measured;
An inclination detection unit for detecting an inclination angle formed between the extending direction of the arm part of the measuring element and an orthogonal plane of the uniaxial direction;
A distance detection signal output from the displacement detection unit and an inclination angle detection signal output from the inclination detection unit are input while the displacement detection unit is in contact with the object to be measured, and the displacement detection unit The amount of positional deviation in the uniaxial direction caused by the inclination of the arm portion at the arrangement position in the extending direction is determined using the inclination angle of the input inclination angle detection signal, and is output from the displacement detection section. A control unit that outputs information of a correction distance obtained by correcting the measurement distance of the distance detection signal by the positional deviation amount;
A dimension measuring apparatus comprising:
(2) The dimension measuring apparatus according to (1), wherein the displacement detection unit is an electric micrometer.
(3) The pair of measuring elements are arranged side by side in the uniaxial direction so that the contact side of the displacement detection unit with the object to be measured faces each other.
The dimension measuring apparatus according to (1) or (2), wherein the linear motion mechanism supports the pair of measuring elements so as to be independently movable in the uniaxial direction.
(4) The dimension measuring apparatus according to (3), wherein two pairs of the measuring elements are arranged along the uniaxial direction.
(5) The tilt detection unit detects positions in the uniaxial direction at at least two locations along the extending direction of the probe, and detects the detected positions in the uniaxial direction and the at least two locations of the extension. The dimension measuring apparatus according to any one of (1) to (4), wherein the inclination angle is detected from a relationship with a position in an outgoing direction.
(6) The tilt detection unit includes a linear scale arranged along the uniaxial direction, and a detection head that is provided in the measuring element and detects position information from the linear scale (5) ) Dimension measuring device.
(7) A dimension measuring method for measuring a dimension of an object to be measured using the dimension measuring apparatus according to any one of (1) to (6),
Obtaining a correction distance using a master body having a known dimension as the object to be measured, and setting the correction distance as a first distance;
Measuring the object to be measured as a dimension measurement object to determine the correction distance, and setting the correction distance as a second distance;
Adding the difference of the second distance with respect to the first distance to a known dimension of the master body to obtain the dimension of the object to be measured.
(8) The measurement object has a cylindrical shape,
The dimension measurement method according to (7), wherein the dimension is a dimension in a radial direction of the object to be measured.
(9) The dimensions according to (7) or (8), wherein the mounting table is rotated by a predetermined angle, and the dimension of the object to be measured placed on the mounting table is obtained at each rotation position. Measuring method.
 本発明によれば、長尺状の測定子を用いて大きな被測定物を寸法測定する場合であっても高精度に測定でき、しかも装置構成を複雑化することなく小型化に適した構造にできる。 According to the present invention, it is possible to measure with high accuracy even when measuring a large object to be measured using a long measuring element, and to make the structure suitable for miniaturization without complicating the apparatus configuration. it can.
本発明の実施形態を説明するための図で、寸法測定装置の全体構成図である。It is a figure for demonstrating embodiment of this invention, and is a whole block diagram of a dimension measuring apparatus. 測定子を移動させるX方向直動機構、及び傾斜検出部の構成を示す部分構成図である。It is a partial block diagram which shows the structure of the X direction linear motion mechanism which moves a measuring element, and the inclination detection part. 寸法測定装置の制御ブロック図である。It is a control block diagram of a dimension measuring device. ワークの寸法測定手順を示すフローチャートである。It is a flowchart which shows the dimension measurement procedure of a workpiece | work. 測定子に接触力が負荷されない中立状態における電気マイクロメータ、第1の検出ヘッド、第2の検出ヘッドの位置関係を示す説明図である。It is explanatory drawing which shows the positional relationship of the electric micrometer, the 1st detection head, and the 2nd detection head in the neutral state where a contact force is not loaded to a measuring element. 測定子に接触力が負荷された状態における電気マイクロメータ、第1の検出ヘッド、第2の検出ヘッドの位置関係を示す説明図である。It is explanatory drawing which shows the positional relationship of the electric micrometer, the 1st detection head, and the 2nd detection head in the state in which the contact force was loaded on the measuring element.
 以下、本発明の実施形態について、図面を参照して詳細に説明する。
 図1は本発明の実施形態を説明するための図で、寸法測定装置の全体構成図である。
 寸法測定装置100は、架台11と、架台11上に設けられ被測定物であるワークWが載置される載置台13と、一対の測定子15A、15B、及び一対の測定子17A,17Bと、取付板19に設けたX方向直動機構21と、フレーム23に設けたZ方向直動機構25と、架台11上に設けたY方向直動機構27とを有する。また、寸法測定装置100は、詳細は後述するが、各測定子15A,15B,17A,17Bの傾斜角度を測定する傾斜検出部を備えている。
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
FIG. 1 is a diagram for explaining an embodiment of the present invention and is an overall configuration diagram of a dimension measuring apparatus.
The dimension measuring apparatus 100 includes a gantry 11, a mounting table 13 on the gantry 11 on which a workpiece W as a measurement object is placed, a pair of measuring elements 15A and 15B, and a pair of measuring elements 17A and 17B. The X direction linear motion mechanism 21 provided on the mounting plate 19, the Z direction linear motion mechanism 25 provided on the frame 23, and the Y direction linear motion mechanism 27 provided on the gantry 11. Moreover, the dimension measuring apparatus 100 is provided with the inclination detection part which measures the inclination angle of each measuring element 15A, 15B, 17A, 17B although the detail is mentioned later.
 載置台13は、架台11内部に設置された図示しない回転軸に直結され、ワークWを回転可能に支持する。例えば、ワークWが円筒状であれば、載置台13に固定したワークWの円筒中心を回転中心とする任意の回転角度にワークWを回転できる。 The mounting table 13 is directly connected to a rotating shaft (not shown) installed in the gantry 11 and supports the workpiece W in a rotatable manner. For example, if the workpiece W is cylindrical, the workpiece W can be rotated at an arbitrary rotation angle with the center of the cylinder of the workpiece W fixed to the mounting table 13 as the rotation center.
 一対の測定子15A,15B及び一対の測定子17A,17Bは、それぞれの基端部がX方向直動機構21に接続され、各測定子がそれぞれ独立してX方向(一軸方向)に移動自在に支持されている。これら2組の測定子の対は、互いに等しい構造となっている。 Each of the pair of measuring elements 15A and 15B and the pair of measuring elements 17A and 17B is connected to the X-direction linear motion mechanism 21 at each base end, and each measuring element is independently movable in the X direction (uniaxial direction). It is supported by. These two pairs of measuring elements have the same structure.
 X方向直動機構21は、ボールネジナット部31と、リニアガイド部33とを有する。ボールネジナット部31は、取付板19にX方向に沿って配置されたボールネジ35と、ボールネジ35を回転駆動するサーボモータ37と、ナット部39A,39Bとを有する。ナット部39Aは測定子15Aを支持し、ナット部39Bは測定子17Aを支持する。これらナット部39A,39Bは、共にボールネジ35に挿通され、ボールネジ35の回転によってX方向に移動する。 The X direction linear motion mechanism 21 includes a ball screw nut portion 31 and a linear guide portion 33. The ball screw nut portion 31 includes a ball screw 35 disposed on the mounting plate 19 along the X direction, a servo motor 37 that rotationally drives the ball screw 35, and nut portions 39A and 39B. The nut part 39A supports the measuring element 15A, and the nut part 39B supports the measuring element 17A. Both of these nut portions 39A and 39B are inserted into the ball screw 35 and moved in the X direction by the rotation of the ball screw 35.
 リニアガイド部33は、ガイドレール41と、ガイドレール41に沿ってX方向に移動するスライダ43A,43B,45A,45Bとを有する。スライダ43Aには測定子15Aが固定され、スライダ43Bには測定子15Bが固定されている。また、スライダ45Aには測定子17Aが固定され、スライダ45Bには測定子17Bが固定されている。 The linear guide portion 33 includes a guide rail 41 and sliders 43A, 43B, 45A, and 45B that move in the X direction along the guide rail 41. A measuring element 15A is fixed to the slider 43A, and a measuring element 15B is fixed to the slider 43B. In addition, the measuring element 17A is fixed to the slider 45A, and the measuring element 17B is fixed to the slider 45B.
 ここで、測定子15A,15Bの対、及び測定子17A,17Bの対は、それぞれ同一の構成であるため、以降は測定子15A,15Bの対を例に説明することにする。 Here, since the pair of measuring elements 15A and 15B and the pair of measuring elements 17A and 17B have the same configuration, the pair of measuring elements 15A and 15B will be described below as an example.
 図2は、測定子15A,15Bを移動させるX方向直動機構21、及び詳細を後述する傾斜検出部を示す部分構成図である。ワークWが円筒形状である場合、測定子15Aは外径測定用の測定子、測定子15Bは内径測定用の測定子となって寸法測定を行う。 FIG. 2 is a partial configuration diagram showing an X-direction linear motion mechanism 21 that moves the measuring elements 15A and 15B, and an inclination detector that will be described in detail later. When the workpiece W has a cylindrical shape, the measuring element 15A functions as a measuring element for measuring the outer diameter, and the measuring element 15B functions as a measuring element for measuring the inner diameter.
 各測定子15A,15Bは、X方向直動機構21側からワークWに向けて垂下して延設される長尺状のアーム部47A,47Bを有する。アーム部47A,47BのワークW側の先端部には、ワークWとの距離を測定する変位検出部としての電気マイクロメータ(electric micrometer)49A,49Bが配置されている。各電気マイクロメータ49A,49Bの触子51,51は、アーム部47A,47Bの互いに対面し合う、ワークWとの接触側に配置される。 Each measuring element 15A, 15B has long arm portions 47A, 47B extending downwardly from the X-direction linear motion mechanism 21 side toward the workpiece W. Electric micrometers 49A and 49B serving as displacement detection units for measuring the distance from the workpiece W are disposed at the distal ends of the arms 47A and 47B on the workpiece W side. The contacts 51, 51 of the electric micrometers 49A, 49B are arranged on the contact side with the workpiece W of the arm portions 47A, 47B facing each other.
 電気マイクロメータ49A,49Bは、接触式の触子51を有し、触子51の微小変位を電気的量に変換して測定する比較測長器である。触子51は、距離の検出方向に沿って電気マイクロメータ49A,49Bの本体部から突出して設けられ、突出する向きに弾性付勢されて支持される。この電気マイクロメータ49A,49Bは、所定長の検出可能ストローク内における触子51の位置を距離情報として出力する。 The electric micrometers 49A and 49B are comparative length measuring devices that have a contact-type contact 51 and convert a minute displacement of the contact 51 into an electrical quantity for measurement. The contact 51 is provided so as to protrude from the main body of the electric micrometers 49A and 49B along the distance detection direction, and is elastically biased and supported in the protruding direction. The electric micrometers 49A and 49B output the position of the contact 51 within a predetermined length of detectable stroke as distance information.
 また、測定子15Aのナット部39Aとスライダ43Aとの間には、測定子15Bの基端部に接続される電動アクチュエータ53の一端が接続されている。電動アクチュエータ53は、測定子15Bに設けられ、測定子15Bを測定子15Aに対してX方向に沿って相対的に接近又は離反させる。 Also, one end of an electric actuator 53 connected to the proximal end portion of the measuring element 15B is connected between the nut portion 39A of the measuring element 15A and the slider 43A. The electric actuator 53 is provided on the measuring element 15B, and moves the measuring element 15B closer to or away from the measuring element 15A along the X direction.
 取付板19上におけるガイドレール41のボールネジ35側には第1のリニアスケール55が配置され、ワークW側には第2のリニアスケール57が配置されている。そして、測定子15Aの第1のリニアスケール55に対面する位置には第1の検出ヘッド59が配置され、第2のリニアスケール57に対面する位置には第2の検出ヘッド61が配置されている。また、測定子15Bの第1のリニアスケール55に対面する位置には第1の検出ヘッド63が配置され、第2のリニアスケール57に対面する位置には第2の検出ヘッド65が配置されている。 The first linear scale 55 is disposed on the ball screw 35 side of the guide rail 41 on the mounting plate 19, and the second linear scale 57 is disposed on the workpiece W side. A first detection head 59 is disposed at a position facing the first linear scale 55 of the probe 15A, and a second detection head 61 is disposed at a position facing the second linear scale 57. Yes. In addition, the first detection head 63 is disposed at a position facing the first linear scale 55 of the probe 15B, and the second detection head 65 is disposed at a position facing the second linear scale 57. Yes.
 測定子15Aの第1の検出ヘッド59は、対面する第1のリニアスケール55からアーム部47AのX方向位置を検出し、第2の検出ヘッド61は、対面する第2のリニアスケール57からアーム部47BのX方向位置を検出する。同様に、測定子15Bの第1の検出ヘッド63は、対面する第1のリニアスケール55からアーム部47BのX方向位置を検出し、第2の検出ヘッド65は、対面する第2のリニアスケール57からアーム部47BのX方向位置を検出する。 The first detection head 59 of the probe 15A detects the position of the arm portion 47A in the X direction from the first linear scale 55 facing, and the second detection head 61 detects the arm from the second linear scale 57 facing. The position of the part 47B in the X direction is detected. Similarly, the first detection head 63 of the probe 15B detects the position of the arm portion 47B in the X direction from the first linear scale 55 facing, and the second detection head 65 is the second linear scale facing. 57, the position of the arm portion 47B in the X direction is detected.
 リニアスケールの位置検出方式としては、光学式又は磁気式が好ましい。また、リニアスケール以外にも、測定レンジの長いレーザ距離計や電気マイクロメータを用いて構成してもよい。これらの第1のリニアスケール55,第2のリニアスケール57と、第1の検出ヘッド59、63、第2の検出ヘッド61,63,65は、傾斜検出部を構成する。 As the linear scale position detection method, an optical method or a magnetic method is preferable. In addition to the linear scale, a laser distance meter or an electric micrometer having a long measurement range may be used. The first linear scale 55, the second linear scale 57, the first detection heads 59, 63, and the second detection heads 61, 63, 65 constitute an inclination detection unit.
 また、測定子15Bの第1のリニアスケール55に対面する位置には第1の検出ヘッド63が配置され、第2のリニアスケール57に対面する位置には、第2の検出ヘッド65が配置されている。これら第1の検出ヘッド63、第2の検出ヘッド65は、対面する第1,第2のリニアスケール55,57からアーム部47BのX方向位置をそれぞれ検出する。 In addition, the first detection head 63 is disposed at a position facing the first linear scale 55 of the probe 15B, and the second detection head 65 is disposed at a position facing the second linear scale 57. ing. The first detection head 63 and the second detection head 65 detect the position of the arm portion 47B in the X direction from the first and second linear scales 55 and 57 facing each other.
 上記構成の寸法測定装置100は、測定子15A,15Bの先端部がワークWの外周面73と内周面75とを挟み込み、ワークWに接触した状態でワークWのX方向位置を検出する。その際、測定子15A,15Bの先端部がワークWから受ける接触力によって、アーム部47A,47Bが撓むことがある。アーム部47A,47Bが撓むと、電気マイクロメータ49A,49Bの出力にX方向位置の撓み誤差が含まれて、ワークWの正確なX方向位置を検出できなくなる。 The dimension measuring apparatus 100 having the above configuration detects the position of the workpiece W in the X direction while the tips of the measuring elements 15A and 15B sandwich the outer circumferential surface 73 and the inner circumferential surface 75 of the workpiece W and are in contact with the workpiece W. At that time, the arm portions 47A and 47B may be bent by the contact force received from the workpiece W by the tip portions of the measuring elements 15A and 15B. When the arm portions 47A and 47B are bent, the output of the electric micrometers 49A and 49B includes a bending error in the X direction position, and the accurate X direction position of the workpiece W cannot be detected.
 そこで、測定子15Aにおいては、アーム部47Aに設けた第1の検出ヘッド59と第2の検出ヘッド61により、X方向の直交面に対するアーム部47Aの延出方向の傾斜角を求める。そして、この傾斜角測定値に基づいて、アーム部47Aの先端部の電気マイクロメータ49Aが配置される位置(Z軸方向の位置)で生じるX方向のずれ量δxAを求める。このずれ量δXAを用いて電気マイクロメータ49Aからの距離出力信号を補正する。 Therefore, in the measuring element 15A, the inclination angle in the extending direction of the arm portion 47A with respect to the plane orthogonal to the X direction is obtained by the first detection head 59 and the second detection head 61 provided in the arm portion 47A. Then, based on the measured inclination angle, a deviation amount δ xA in the X direction generated at the position (position in the Z-axis direction) where the electric micrometer 49A at the tip of the arm portion 47A is disposed is obtained. The deviation output signal δ XA is used to correct the distance output signal from the electric micrometer 49A.
 測定子15Bについても同様に、アーム部47Bの撓みによるX方向のずれ量δxBを求め、このずれ量δxBを用いて電気マイクロメータ49Bからの距離出力信号を補正する。これにより、アーム部47A,47Bの傾斜によらず、ワークWのX方向距離を高精度で検出できる。なお、ワークWの詳細な寸法測定手順については後述する。 Similarly, for the measuring element 15B, a deviation amount δ xB in the X direction due to the bending of the arm portion 47B is obtained, and the distance output signal from the electric micrometer 49B is corrected using this deviation amount δ xB . Thereby, the X direction distance of the workpiece | work W is detectable with high precision irrespective of the inclination of arm part 47A, 47B. The detailed dimension measurement procedure of the workpiece W will be described later.
 本構成では、距離検出器として電気マイクロメータ49A,49Bを用いており、触子51がワークWに接触した際、触子51が接触方向に沿って電気マイクロメータ内に押し込まれる。この押し込み力は一般に微小な力であるため、距離検出時におけるアーム部47A,47Bの大きな撓みを防止できる。これにより、アーム部47A,47Bの撓みを、接触力とアーム変位量との線形性が高い軽負荷領域内に収めることができ、発生したX方向のずれ量を高精度に求めることができる。 In this configuration, electric micrometers 49A and 49B are used as distance detectors, and when the toucher 51 comes into contact with the workpiece W, the toucher 51 is pushed into the electric micrometer along the contact direction. Since this pushing force is generally a minute force, it is possible to prevent the arm portions 47A and 47B from being greatly bent during distance detection. As a result, the deflection of the arm portions 47A and 47B can be accommodated in a light load region where the linearity between the contact force and the arm displacement amount is high, and the generated displacement amount in the X direction can be obtained with high accuracy.
 図3は、上記構成の寸法測定装置100の制御ブロック図である。
 寸法測定装置100の全体制御を行う制御部71は、PC(パーソナルコンピュータ)やPLC(プログラマブルロジックコントローラ)等で構成される。
FIG. 3 is a control block diagram of the dimension measuring apparatus 100 configured as described above.
The control unit 71 that performs overall control of the dimension measuring apparatus 100 is configured by a PC (personal computer), a PLC (programmable logic controller), or the like.
 制御部71は、入力部77に入力される測定開始信号を受けて、X方向直動機構21のボールネジナット部31、電動アクチュエータ53、Z方向直動機構25、Y方向直動機構27のそれぞれに駆動信号を出力して、測定子15A,51Bを空間内の所望の位置に移動させる。 The control unit 71 receives the measurement start signal input to the input unit 77, and each of the ball screw nut unit 31, the electric actuator 53, the Z direction linear motion mechanism 25, and the Y direction linear motion mechanism 27 of the X direction linear motion mechanism 21. A driving signal is output to the measuring elements 15A and 51B to move them to desired positions in the space.
 そして、制御部71は、触子51をワークWに接触させた状態にして、測定子15Aの電気マイクロメータ49Aが出力する距離検出信号と、第1の検出ヘッド59及び第2の検出ヘッド61が出力する傾斜角検出信号とを取り込む。また、測定子15Bの電気マイクロメータ49Bが出力する距離検出信号と、第1の検出ヘッド63及び第2の検出ヘッド65が出力する傾斜角検出信号とを取り込む。 And the control part 71 makes the contact 51 contact the workpiece | work W, the distance detection signal which the electric micrometer 49A of the measurement element 15A outputs, the 1st detection head 59, and the 2nd detection head 61. And the tilt angle detection signal output from the. Further, the distance detection signal output from the electric micrometer 49B of the probe 15B and the tilt angle detection signal output from the first detection head 63 and the second detection head 65 are captured.
 制御部71は、取り込んだ傾斜角検出信号から各測定子15A,15Bの傾斜角を求め、この傾斜角に応じて各測定子51A,15Bの先端部に生じるX方向のずれ量を求める。そして制御部71は、このずれ量を用いて、電気マイクロメータ49A,49Bが出力する距離検出信号により得られる測定距離を補正する。 The control unit 71 obtains the inclination angle of each measuring element 15A, 15B from the acquired inclination angle detection signal, and obtains the amount of deviation in the X direction generated at the tip of each measuring element 51A, 15B according to this inclination angle. And the control part 71 correct | amends the measurement distance obtained by the distance detection signal which electric micrometer 49A, 49B outputs using this deviation | shift amount.
 補正後の補正距離の情報は、ワークWの寸法測定に供する情報となり、所定の処理が施されて寸法測定結果の信号として出力部79に出力される。なお、説明は省略するが、測定子17A,17Bに対しても同様に、上記各信号が取り込まれ、補正距離情報に基づく寸法測定結果の信号が出力部79に出力される。 The corrected distance information is information used for measuring the dimension of the workpiece W, is subjected to predetermined processing, and is output to the output unit 79 as a dimension measurement result signal. Although explanation is omitted, the above signals are similarly taken in the measuring elements 17A and 17B, and a signal of a dimension measurement result based on the correction distance information is output to the output unit 79.
 なお、複数回の測定を行って寸法の平均値を求める場合には、制御部71は、各回の寸法測定結果を記憶部81に一旦記憶して、記憶された各寸法測定結果を適宜演算処理する。 When the average value of the dimension is obtained by performing the measurement a plurality of times, the control unit 71 temporarily stores the dimension measurement result of each time in the storage unit 81, and appropriately calculates the stored dimension measurement result. To do.
 次に、上記構成の寸法測定装置100によるワークWの具体的な寸法測定手順について、図4のフローチャートを用いて詳細に説明する。ここでも測定子15A,15BによるワークWの寸法測定について説明する。本寸法測定装置100の寸法測定は、寸法が既知であるマスター体(以降、マスターワークと称する)とワークWとの寸法相対差を求めること、つまり、マスターワークの寸法とワークWの寸法とを測定し、双方の差分を求めることで行う。 Next, a specific procedure for measuring the dimension of the workpiece W by the dimension measuring apparatus 100 having the above configuration will be described in detail with reference to the flowchart of FIG. Here, the dimension measurement of the workpiece W by the measuring elements 15A and 15B will be described. The dimension measurement of the dimension measuring apparatus 100 is to obtain a relative dimensional difference between a master body (hereinafter referred to as a master work) having a known dimension and the work W, that is, the dimension of the master work and the dimension of the work W. This is done by measuring and calculating the difference between the two.
 マスターワークとは、精密な測定器によって規定通りの寸法となっていることが測定済みのものであり、寸法測定対象の被測定物であるワークWと同一形状又はこれに近い形状を有する。マスターワークの寸法情報は、予め記憶部81に登録されているか、寸法測定前に別途に登録して、制御部71が参照可能な状態にされている。 The master work has been measured to have a specified dimension by a precise measuring instrument, and has the same shape as or a shape close to the work W that is the object to be measured. The dimension information of the master work is registered in advance in the storage unit 81 or separately registered before the dimension measurement so that the control unit 71 can refer to it.
 まず、制御部71は、図1に示すX方向直動機構21、Z方向直動機構25、Y方向直動機構27を駆動して、測定子15A,15Bを載置台13から離間した待機位置に移動させる(S11)。操作者は、この状態でマスターワークを載置台13に固定する。 First, the control unit 71 drives the X-direction linear motion mechanism 21, the Z-direction linear motion mechanism 25, and the Y-direction linear motion mechanism 27 shown in FIG. (S11). The operator fixes the master work to the mounting table 13 in this state.
 操作者が載置台13へのマスターワークの固定を完了すると、図示しないボタンの押下信号や外部機器からの信号によるマスターワーク測定開始信号を入力部77に入力する。制御部71は、このマスターワーク測定開始信号を受信することによりマスターワークの固定完了を判断して(S2)、マスターワークの寸法測定を開始する。 When the operator completes the fixing of the master work to the mounting table 13, a master work measurement start signal is input to the input unit 77 by a button pressing signal (not shown) or a signal from an external device. The control unit 71 receives the master work measurement start signal, determines that the master work has been fixed (S2), and starts measuring the dimensions of the master work.
 制御部71は、手動操作、又は予め登録されたアルゴリズムに基づいて、マスターワークの形状に応じてX方向直動機構21、Z方向直動機構25、Y方向直動機構27を駆動して、各測定子15A,15Bを所望の測定位置の近くに移動させる(S3)。測定位置とは、マスターワークの寸法から求めた、各測定子15A,15Bの電気マイクロメータ49A,49Bがマスターワークに接触する位置であり、計算により求めることができる。 The control unit 71 drives the X-direction linear motion mechanism 21, the Z-direction linear motion mechanism 25, and the Y-direction linear motion mechanism 27 according to the shape of the master work based on manual operation or a pre-registered algorithm. Each measuring element 15A, 15B is moved close to a desired measurement position (S3). The measurement position is a position where the electric micrometers 49A and 49B of the measuring elements 15A and 15B are in contact with the master work, which is obtained from the dimensions of the master work, and can be obtained by calculation.
 図2に示すように、制御部71は、測定子15Aをマスターワークの寸法測定部分における外側面(図示例のワークWの外周面73に相当する面)の外側へ移動させる。このとき測定子15Bも同時に、マスターワークの寸法測定部分における内側面(内周面75に相当する面)の内側に移動させる。 As shown in FIG. 2, the control unit 71 moves the measuring element 15A to the outside of the outer surface (the surface corresponding to the outer peripheral surface 73 of the workpiece W in the illustrated example) in the dimension measurement portion of the master workpiece. At this time, the probe 15B is also moved to the inside of the inner side surface (the surface corresponding to the inner peripheral surface 75) in the dimension measurement portion of the master work.
 そして、制御部71は、ボールネジナット部31を駆動して、電気マイクロメータ49Aの触子51がマスターワークに接触するまで測定子15AをX方向に移動させる。また、制御部71は、電動アクチュエータ53を駆動して、電気マイクロメータ49Bの触子51がマスターワークに接触するまで測定子15Bを測定子15A側に向けて移動させる。これら各触子51,51のマスターワークとの接触動作は、順次又は同時であってもよい。 Then, the control unit 71 drives the ball screw nut unit 31 to move the measuring element 15A in the X direction until the contact 51 of the electric micrometer 49A comes into contact with the master work. Further, the control unit 71 drives the electric actuator 53 to move the measuring element 15B toward the measuring element 15A until the contact 51 of the electric micrometer 49B comes into contact with the master work. The contact operation of each of the touch elements 51 and 51 with the master work may be sequential or simultaneous.
 これにより、マスターワークの外周面と内周面とが、電気マイクロメータ49A,49Bで挟まれた状態となる。制御部71は、この測定位置でマスターワークを挟んだ状態で、電気マイクロメータ49A,49Bによりマスターワークとの距離(触子51が押し込まれた量)を検出する。また、第1の検出ヘッド59,63により第1のリニアスケール55のX方向絶対位置を読み取り、第2の検出ヘッド61,65により第2のリニアスケール57のX方向絶対位置を読み取る(S14)。 Thus, the outer peripheral surface and the inner peripheral surface of the master work are sandwiched between the electric micrometers 49A and 49B. The controller 71 detects the distance from the master work (the amount by which the toucher 51 is pushed) by the electric micrometers 49A and 49B with the master work sandwiched at the measurement position. Further, the X-direction absolute position of the first linear scale 55 is read by the first detection heads 59 and 63, and the X-direction absolute position of the second linear scale 57 is read by the second detection heads 61 and 65 (S14). .
 そして、制御部71は、検出された電気マイクロメータ49A,49Bからの出力値と、第1の検出ヘッド59,63及び第2の検出ヘッド61,65からの出力値とを基準値として記憶部81に記憶させる(S15)。このときの各出力値が、ワークWを測定する際の基準点(原点)に相当する出力値となる。 Then, the control unit 71 stores the detected output values from the electric micrometers 49A and 49B and the output values from the first detection heads 59 and 63 and the second detection heads 61 and 65 as reference values. 81 (S15). Each output value at this time becomes an output value corresponding to a reference point (origin) when the workpiece W is measured.
 基準値の設定を完了すると、制御部71は、X方向直動機構21、Z方向直動機構25、Y方向直動機構27を駆動して、測定子15A,15Bを退避位置に再び移動させる(S16)。 When the setting of the reference value is completed, the control unit 71 drives the X-direction linear motion mechanism 21, the Z-direction linear motion mechanism 25, and the Y-direction linear motion mechanism 27 to move the measuring elements 15A and 15B to the retracted position again. (S16).
 次に、操作者は、マスターワークを載置台13から取り外し、被測定物であるワークWを載置台13に固定する。操作者が載置台13へのワークWの固定を完了すると、前述同様にワーク測定開始信号を入力部77に入力する。制御部71は、このワーク測定開始信号を受信すると、ワークWの固定完了と判断して(S17)、ワークWの寸法測定を開始する。 Next, the operator removes the master workpiece from the mounting table 13 and fixes the workpiece W, which is the object to be measured, to the mounting table 13. When the operator completes the fixing of the workpiece W to the mounting table 13, the workpiece measurement start signal is input to the input unit 77 as described above. When receiving the workpiece measurement start signal, the control unit 71 determines that the workpiece W has been fixed (S17), and starts measuring the dimension of the workpiece W.
 制御部71は、マスターワークの測定と同様に、X方向直動機構21、Z方向直動機構25、Y方向直動機構27を駆動して、各測定子15A,15Bを所望の測定位置に移動させる(S18)。そして、制御部71は、測定子15A,15Bがこの測定位置に移動した状態で、電気マイクロメータ49A,49Bによりマスターワークとの距離(触子51が押し込まれた量)を検出する。また、第1の検出ヘッド59,63により第1のリニアスケール55のX方向絶対位置を読み取り、第2の検出ヘッド61,65により第2のリニアスケール57のX方向絶対位置を読み取る(S19)。 The controller 71 drives the X-direction linear movement mechanism 21, the Z-direction linear movement mechanism 25, and the Y-direction linear movement mechanism 27 in the same manner as the measurement of the master workpiece, and puts the measuring elements 15A and 15B at desired measurement positions. Move (S18). And the control part 71 detects the distance (the amount by which the touch element 51 was pushed in) with the electric micrometer 49A, 49B in the state which the measurement elements 15A and 15B moved to this measurement position. Further, the X-direction absolute position of the first linear scale 55 is read by the first detection heads 59 and 63, and the X-direction absolute position of the second linear scale 57 is read by the second detection heads 61 and 65 (S19). .
 制御部71は、検出された電気マイクロメータ49A,49Bからの出力値と、第1の検出ヘッド59,63及び第2の検出ヘッド61,65からの出力値とを記憶部81に記憶させる(S20)。 The control unit 71 causes the storage unit 81 to store the detected output values from the electric micrometers 49A and 49B and the output values from the first detection heads 59 and 63 and the second detection heads 61 and 65 ( S20).
 次に、制御部71は、検出された各出力値を用いて、マスターワーク測定時とワークW測定時における、測定子15A,51Bのアーム部47A,47Bの傾斜角をそれぞれ求め、この傾斜角に応じたX方向の補正値を求める(S21)。そして、制御部71は、検出された電気マイクロメータ49A,49Bからの距離情報の出力値を、求めたX方向の補正値を用いて補正する(S22)。 Next, the control unit 71 obtains the inclination angles of the arm portions 47A and 47B of the measuring elements 15A and 51B during the master work measurement and the work W measurement using the detected output values, respectively. A correction value in the X direction corresponding to is obtained (S21). And the control part 71 correct | amends the output value of the detected distance information from electric micrometer 49A, 49B using the calculated | required correction value of the X direction (S22).
 ここで、X方向の補正値の求め方と、距離情報の基本的な補正方法を説明する。
 図5は測定子15Aに接触力が負荷されない中立状態における電気マイクロメータ49A、第1の検出ヘッド59、第2の検出ヘッド61の位置関係を示す説明図、図6は測定子15Aに接触力が負荷された状態における電気マイクロメータ49A、第1の検出ヘッド59、第2の検出ヘッド61の位置関係を示す説明図である。
Here, a method for obtaining a correction value in the X direction and a basic correction method for distance information will be described.
FIG. 5 is an explanatory diagram showing the positional relationship between the electric micrometer 49A, the first detection head 59, and the second detection head 61 in a neutral state where no contact force is applied to the probe 15A. FIG. 6 shows the contact force applied to the probe 15A. FIG. 6 is an explanatory diagram showing a positional relationship among the electric micrometer 49A, the first detection head 59, and the second detection head 61 in a state where a load is applied.
 図5に示すように、第1のリニアスケールに対面する第1の検出ヘッド59から第2のリニアスケールに対面する第2の検出ヘッド61までのZ方向距離をL、第2の検出ヘッド61から電気マイクロメータ49Aの触子51の中心軸までのZ方向距離Lとする。 As shown in FIG. 5, the distance in the Z direction from the first detection head 59 facing the first linear scale to the second detection head 61 facing the second linear scale is L 1 , the second detection head. 61 and Z-direction distance L 2 to the center axis of the electric micrometer 49A of probe 51 from.
 また、第1の検出ヘッド59により検出されるX方向距離(リニアスケール原点から第1の検出ヘッド59までのX方向距離)をXs1、第2の検出ヘッド61により検出されるX方向距離(リニアスケール原点から第2の検出ヘッド61までのX方向距離)をXs2とする。アーム軸Axは、測定子51Aの移動方向であるX方向に直交する。 Further, the X-direction distance detected by the first detection head 59 (X-direction distance from the linear scale origin to the first detection head 59) is X s1 , and the X-direction distance detected by the second detection head 61 ( The distance in the X direction from the linear scale origin to the second detection head 61 is defined as Xs2 . The arm axis Ax is orthogonal to the X direction, which is the moving direction of the probe 51A.
 電気マイクロメータ49Aに被測定物(ワークWとして示す)が接触すると、図6に示すように、アーム部47Aの先端部には、ワークWからの接触力Fが負荷されて、アーム部47がスライダ43Aの中心位置Oを中心として傾斜する。このアーム部47Aの中立状態におけるアーム軸Axと、傾斜した状態のアーム軸Axiとのなす角を傾斜角θとする。 When an object to be measured (shown as a workpiece W) comes into contact with the electric micrometer 49A, as shown in FIG. 6, the contact force F from the workpiece W is applied to the tip of the arm portion 47A, and the arm portion 47 is The slider 43A tilts around the center position O. The angle formed by the arm axis Ax in the neutral state of the arm portion 47A and the arm axis Axi in the inclined state is defined as an inclination angle θ.
 図6に示す状態においては、傾斜角θは(1)式で表される。
 θ = tan-1{(XS2-Xs1)/L}  ・・・(1)
In the state shown in FIG. 6, the inclination angle θ is expressed by equation (1).
θ = tan −1 {(X S2 −X s1 ) / L 1 } (1)
 そして、電気マイクロメータ49AのZ方向の位置において生じる、傾斜角θによるX方向のずれ量δxは(2)式で表される。
 δx = XS2 + L・tanθ   ・・・(2)
A deviation amount δx in the X direction due to the inclination angle θ generated at the position in the Z direction of the electric micrometer 49A is expressed by the following equation (2).
δx = X S2 + L 2 · tan θ (2)
 つまり、測定子15Aが傾斜することによって、電気マイクロメータ49Aの出力は、本来得られるべき検出値からδxだけ小さくなる。そこで、電気マイクロメータ49Aの出力値Xaから、ずれ量δxを減じた値を電気マイクロメータ49Aからの出力値とするように補正する。つまり、電気マイクロメータ49Aによる出力値Xaを補正した補正出力値Xcは、(3)式で表される。
 Xc = Xa - δx   ・・・(3)
That is, when the measuring element 15A is inclined, the output of the electric micrometer 49A is reduced by δx from the detection value to be originally obtained. Therefore, the value obtained by subtracting the deviation amount δx from the output value Xa of the electric micrometer 49A is corrected so as to be the output value from the electric micrometer 49A. That is, the corrected output value Xc obtained by correcting the output value Xa from the electric micrometer 49A is expressed by the equation (3).
Xc = Xa−δx (3)
 次に、上述したX方向補正値の求め方と、距離情報の補正方法に基づいて、測定子15Aの傾斜によるずれ量を求める具体的な手順(S21)を説明する。
 ここで、前述のS15で記憶部81に記憶させたマスターワークに対する測定結果である基準値を次の通り定義する。
 測定子15Aの電気マイクロメータ49Aで検出される距離を基準距離DDa
 測定子15Aの第1の検出ヘッド59で検出される距離を傾斜基準距離XDa1
 測定子15Aの第2の検出ヘッド61で検出される距離を傾斜基準距離XDa2
 測定子15Bの電気マイクロメータ49Bで検出される距離を基準距離DDb
 測定子15Bの第1の検出ヘッド63で検出される距離を傾斜基準距離XDb1
 測定子15Bの第2の検出ヘッド65で検出される距離を傾斜基準距離XDb2とする。
Next, a specific procedure (S21) for obtaining the deviation amount due to the inclination of the measuring element 15A based on the above-described method for obtaining the X direction correction value and the method for correcting the distance information will be described.
Here, a reference value, which is a measurement result for the master work stored in the storage unit 81 in S15 described above, is defined as follows.
The distance detected by the electric micrometer 49A of the probe 15A is the reference distance D Da ,
The distance detected by the first detection head 59 of the probe 15A is the inclination reference distance X Da1 ,
The distance detected by the second detection head 61 of the probe 15A is the inclination reference distance X Da2 ,
The distance detected by the electric micrometer 49B of the probe 15B is the reference distance D Db ,
The distance detected by the first detection head 63 of the probe 15B is the inclination reference distance X Db1 ,
The distance detected by the second detection head 65 of the probe 15B is defined as a tilt reference distance XDb2 .
 また、前述のS20で記憶部81に記憶させたワークWに対する測定結果を次の通り定義する。
 測定子15Aの電気マイクロメータ49Aで検出される距離を検出距離DSa
 測定子15Aの第1の検出ヘッド59で検出される距離を傾斜検出距離XSa1
 測定子15Aの第2の検出ヘッド61で検出される距離を傾斜検出距離XSa2
 測定子15Bの電気マイクロメータ49Bで検出される距離を検出距離DSb
 測定子15Bの第1の検出ヘッド63で検出される距離を傾斜検出距離XSb1
 測定子15Bの第2の検出ヘッド65で検出される距離を傾斜検出距離XSb2とする。
Moreover, the measurement result with respect to the workpiece | work W memorize | stored in the memory | storage part 81 by above-mentioned S20 is defined as follows.
The distance detected by the electric micrometer 49A of the probe 15A is the detection distance D Sa ,
The distance detected by the first detection head 59 of the measuring element 15A is the inclination detection distance XSa1 ,
The distance detected by the second detection head 61 of the probe 15A is the inclination detection distance X Sa2 ,
The distance detected by the electric micrometer 49B of the probe 15B is the detection distance DSb ,
The distance detected by the first detection head 63 of the probe 15B is the inclination detection distance X Sb1 ,
The distance detected by the second detection head 65 of the probe 15B is defined as a tilt detection distance X Sb2 .
 マスターワーク測定時における、測定子15Aの傾斜角度を基準傾斜角θDa、測定子15Bの傾斜角度を基準傾斜角θDbとすると、基準傾斜角θDa,θDbは(4)、(5)式で表される。
 θDa = tan-1{(XDa2-XDa1)/L}  ・・・(4)
 θDb = tan-1{(XDb2-XDb1)/L}  ・・・(5)
Assuming that the inclination angle of the measuring element 15A at the time of master work measurement is the reference inclination angle θ Da and the inclination angle of the measuring element 15B is the reference inclination angle θ Db , the reference inclination angles θ Da and θ Db are (4) and (5). It is expressed by a formula.
θ Da = tan −1 {(X Da2 −X Da1 ) / L 1 } (4)
θ Db = tan −1 {(X Db2 −X Db1 ) / L 1 } (5)
 ワークW測定時における、測定子15Aの傾斜角度を検出傾斜角θSa、測定子15Bの傾斜角度を検出傾斜角θSbとすると、検出傾斜角θSa,θSbは(6)、(7)式で表される。
 θSa = tan-1{(XSa2-XSa1)/L}  ・・・(6)
 θSb = tan-1{(XSb2-XSb1)/L}  ・・・(7)
Assuming that the tilt angle of the probe 15A at the time of workpiece W measurement is the detected tilt angle θ Sa and the tilt angle of the probe 15B is the detected tilt angle θ Sb , the detected tilt angles θ Sa and θ Sb are (6) and (7). It is expressed by a formula.
θ Sa = tan −1 {(X Sa2 −X Sa1 ) / L 1 } (6)
θ Sb = tan −1 {(X Sb2 −X Sb1 ) / L 1 } (7)
 測定子15Aの電気マイクロメータ49Aが検出した基準距離DDa、検出距離DSa、及び測定子15Bの電気マイクロメータ49Bが検出した基準距離DDb、検出距離DSbには、(2)式に示すように、上記傾斜角度に応じたX方向のずれ量が含まれる。そこで、基準距離DDa、検出距離DSa、及び基準距離DDb、検出距離DSbに対して、(3)式に示すようにX方向のずれ量を補正した補正距離をそれぞれ求める。基準距離DDa、検出距離DSa、及び基準距離DDb、検出距離DSbに対する各補正距離を、それぞれ補正基準距離CDDa、補正検出距離CDSa、補正基準距離CDDb、補正検出距離CDSbとして、(8)~(11)式で表す。 The reference distance D Da and detection distance D Sa detected by the electric micrometer 49A of the probe 15A, and the reference distance D Db and detection distance D Sb detected by the electric micrometer 49B of the probe 15B are expressed by the following equation (2). As shown, the amount of deviation in the X direction according to the tilt angle is included. Therefore, correction distances obtained by correcting the deviation amount in the X direction are obtained for the reference distance D Da , the detection distance D Sa , the reference distance D Db , and the detection distance D Sb as shown in the equation (3). The reference distance D Da , the detection distance D Sa , the correction distance for the reference distance D Db , and the detection distance D Sb are respectively set as a correction reference distance CD Da , a correction detection distance CD Sa , a correction reference distance CD Db , and a correction detection distance CD Sb. Are expressed by the equations (8) to (11).
 CDDa = DDa -(XDa2 + L・tanθDa)  ・・・(8)
 CDSa = DSa -(XSa2 + L・tanθSa)  ・・・(9)
 CDDb = DDb -(XDb2 + L・tanθDb)  ・・・(10)
 CDSb = DSb -(XSb2 + L・tanθSb)  ・・・(11)
CD Da = D Da - (X Da2 + L 2 · tanθ Da) ··· (8)
CD Sa = D Sa − (X Sa2 + L 2 tan θ Sa ) (9)
CD Db = D Db - (X Db2 + L 2 · tanθ Db) ··· (10)
CD Sb = D Sb - (X Sb2 + L 2 · tanθ Sb) ··· (11)
 次に、求めた補正基準距離CDDa、補正検出距離CDSa、補正基準距離CDDb、補正検出距離CDSbにより、ワークWの外周面73と内周面75(図2参照)との間の径方向の距離WLを求める(S23)。マスターワークにおける外周面73と内周面75との間の距離に対応する既知の距離をWLとすると、距離WLは(12)式で求められる。
 WL = WL + {(CDDa- CDSa) + (CDDb - CDSb)}
  ・・・(12)
Next, between the outer peripheral surface 73 and the inner peripheral surface 75 (see FIG. 2) of the workpiece W based on the obtained correction reference distance CD Da , correction detection distance CD Sa , correction reference distance CD Db , and correction detection distance CD Sb . The distance WL in the radial direction is obtained (S23). When the known distance corresponding to the distance between the outer peripheral surface 73 and the inner peripheral surface 75 in the master work is WL 0 , the distance WL can be obtained by Expression (12).
WL = WL 0 + {(CD Da −CD Sa ) + (CD Db −CD Sb )}
(12)
 つまり、既知の寸法のマスターワークを測定して求めた補正距離である第1の距離CDDa、CDDbと、ワークWを測定して求めた補正距離である第2の距離CDSa、CDSbとの差分(CDDa- CDSa)及び(CDDb - CDSb)を求め、これら差分をマスターワークの既知の寸法WLに加算することで、ワークWの寸法WLが求められる。 That is, the first distances CD Da and CD Db that are correction distances obtained by measuring a master workpiece having a known dimension, and the second distances CD Sa and CD Sb that are correction distances obtained by measuring the workpiece W. (CD Da −CD Sa ) and (CD Db −CD Sb ) are added to the known dimension WL 0 of the master work to obtain the dimension WL of the work W.
 ワークWが円筒形状である場合、距離WLを周方向一箇所のみ測定することでは精度が不十分なことがある。その場合、図1に示す測定子17A,17Bを用いて、測定子15A,15Bの測定位置からワークWの中心を挟んだ反対側の対応位置を同時に測定する。これら2箇所の測定部位の測定結果を平均することで、測定精度を向上できる。 When the workpiece W has a cylindrical shape, the accuracy may be insufficient by measuring the distance WL only at one place in the circumferential direction. In that case, using the measuring elements 17A and 17B shown in FIG. 1, the corresponding positions on the opposite side across the center of the workpiece W from the measuring positions of the measuring elements 15A and 15B are simultaneously measured. The measurement accuracy can be improved by averaging the measurement results of these two measurement sites.
 また、正確な寸法を求めるには、載置台13を所定の一定角度毎に回転させ、ワークWの異なる周方向位置をそれぞれ測定し、各測定結果を平均化する。例えば、互いに直交する周方向2箇所を測定して測定値を平均化する。 In addition, in order to obtain an accurate dimension, the mounting table 13 is rotated at a predetermined constant angle, different circumferential positions of the workpiece W are measured, and each measurement result is averaged. For example, two circumferential directions orthogonal to each other are measured and the measured values are averaged.
 さらに、ワークWの各回転位置で測定することを繰り返し、これにより得られるワークWの1回転分の測定値を平均化することでもよい。 Furthermore, it is also possible to repeat the measurement at each rotational position of the workpiece W and average the measured values for one rotation of the workpiece W obtained thereby.
 本構成の寸法測定装置100によれば、ワークWを回転させながら、ワークWの直径を連続して測定することも可能である。その場合、1周を例えば1°ピッチで径方向の寸法測定を行い、得られた測定値の平均値を求めることで、高精度にワークWの径を求めることができる。 According to the dimension measuring apparatus 100 of this configuration, it is also possible to continuously measure the diameter of the workpiece W while rotating the workpiece W. In that case, the diameter of the workpiece W can be obtained with high accuracy by measuring the dimension in the radial direction at a pitch of 1 °, for example, and obtaining the average value of the obtained measured values.
 以上説明したように、本構成の寸法測定装置100は、大きな被測定物を長尺状の測定子により寸法測定する場合であっても、測定子の撓みによる傾斜角を測定して求め、この傾斜角に応じて寸法測定結果を補正する。このため、測定子が撓んだ状態となっても、寸法測定装置の構造を複雑化することなく、高精度にワーク寸法の測定が可能となる。 As described above, the dimension measuring apparatus 100 of the present configuration is obtained by measuring the inclination angle due to the deflection of the measuring element, even when measuring a large object to be measured with a long measuring element. The dimension measurement result is corrected according to the inclination angle. For this reason, even when the measuring element is bent, the workpiece dimensions can be measured with high accuracy without complicating the structure of the dimension measuring apparatus.
 また、本構成では、測定子の先端部に電気マイクロメータを直接配置することにより、測定子を弾性支持する機構を別途に設ける必要がなく、装置構造の簡略化が図れる。また、小型の電気マイクロメータを使用することで、寸法測定時の測定圧が極めて小さくなり、測定子の撓みにより生じる傾斜を最小限に抑えることができる。さらに、複数のリニアスケールを用いて測定子の位置や姿勢を検出するため、リニアスケールの各部材を他の部材との干渉を気にすることなく配置できる。よって、寸法測定装置が小型化しやすくなり、設計自由度を高めることができる。 Further, in this configuration, by directly disposing the electric micrometer at the tip of the probe, it is not necessary to separately provide a mechanism for elastically supporting the probe, and the structure of the apparatus can be simplified. Further, by using a small electric micrometer, the measurement pressure at the time of dimension measurement becomes extremely small, and the inclination caused by the deflection of the probe can be minimized. Furthermore, since the position and orientation of the probe are detected using a plurality of linear scales, each member of the linear scale can be arranged without worrying about interference with other members. Therefore, the size measuring device can be easily miniaturized, and the degree of freedom in design can be increased.
 また、本構成の寸法測定装置100は、ワークWの寸法をマスターワークとの比較によって求めている。そのため、被測定物が環境温度による熱膨張や収縮による影響を受ける場合でも、絶対寸法を測定する方式比べて寸法誤差をより小さくできる。即ち、マスターワークとワークWとを同じ環境温度下に置けば、マスターワークがワークWと同じ材質、形状であれば、熱膨張や収縮が同程度に生じる筈であり、マスターワークとワークWとの相対的な寸法比較によって、温度によらない高精度な測定が可能となる。 Further, the dimension measuring apparatus 100 having this configuration obtains the dimension of the workpiece W by comparison with the master workpiece. Therefore, even when the object to be measured is affected by thermal expansion or contraction due to the environmental temperature, the dimensional error can be made smaller than the method of measuring the absolute dimension. That is, if the master work and the work W are placed under the same environmental temperature, if the master work is the same material and shape as the work W, thermal expansion and contraction should occur to the same extent. By comparing the relative dimensions of these, high-precision measurement independent of temperature becomes possible.
 このように、本発明は上記の実施形態に限定されるものではなく、実施形態の各構成を相互に組み合わせることや、明細書の記載、並びに周知の技術に基づいて、当業者が変更、応用することも本発明の予定するところであり、保護を求める範囲に含まれる。 As described above, the present invention is not limited to the above-described embodiments, and those skilled in the art can make changes and applications based on combinations of the configurations of the embodiments, descriptions in the specification, and well-known techniques. This is also the scope of the present invention, and is included in the scope for which protection is sought.
 例えば、本寸法測定装置100の構成では、傾斜検出部としてリニアスケールを用いたが、これに限らず、MEMS素子を用いた傾斜センサ等、他の方式の角度センサを用いてもよい。また、測定子の延出方向2箇所に限らず、更に複数の箇所の位置情報を検出してもよい。その場合、傾斜角の測定精度を更に向上できる。 For example, in the configuration of the dimension measuring apparatus 100, a linear scale is used as the tilt detection unit. However, the present invention is not limited thereto, and other types of angle sensors such as a tilt sensor using a MEMS element may be used. In addition, the position information of a plurality of locations may be detected in addition to the two locations in the extending direction of the probe. In that case, the measurement accuracy of the tilt angle can be further improved.
 また、測定子の延出方向は、垂直方向に限らず水平方向や任意の傾斜角度に延出された構成としてもよい。 Further, the extending direction of the probe is not limited to the vertical direction, and may be configured to extend in the horizontal direction or an arbitrary inclination angle.
 また、本寸法測定装置100では、一対の測定子によりワークWの寸法を求めているが、単一の測定子だけで測定する構成であってもよい。その場合、ワークWの一端部を突き当て部等に当接させ、他端部を測定子により距離検出する構成とすればよい。この構成であれば、単一の測定子でマスターワークとワークWとの寸法差を測定することができ、より簡単に寸法測定が可能となる。 Further, in the dimension measuring apparatus 100, the dimension of the workpiece W is obtained by a pair of measuring elements, but it may be configured to measure only by a single measuring element. In that case, a configuration may be adopted in which one end portion of the workpiece W is brought into contact with the abutting portion and the other end portion is detected with a measuring element. With this configuration, the dimensional difference between the master workpiece and the workpiece W can be measured with a single measuring element, and the dimensional measurement can be performed more easily.
 本出願は2014年3月27日出願の日本国特許出願(特願2014-65892)に基づくものであり、その内容はここに参照として取り込まれる。 This application is based on a Japanese patent application (Japanese Patent Application No. 2014-65892) filed on March 27, 2014, the contents of which are incorporated herein by reference.
 13 載置台
 15A,15B,17A,17B 測定子
 21 X方向直動機構
 31 ボールネジナット部(直動機構)
 33 リニアガイド部
 41 ガイドレール
 43A,43B、45A,45B スライダ
 47A,47B アーム部
 49A,49B 電気マイクロメータ(変位検出部)
 51 触子
 53 電動アクチュエータ
 55 第1のリニアスケール(傾斜検出部)
 57 第2のリニアスケール(傾斜検出部)
 59,63 第1の検出ヘッド(傾斜検出部)
 61,65 第2の検出ヘッド(傾斜検出部)
 71 制御部
100 寸法測定装置
 W ワーク 
13 Mounting base 15A, 15B, 17A, 17B Measuring element 21 X direction linear motion mechanism 31 Ball screw nut part (linear motion mechanism)
33 Linear guide part 41 Guide rail 43A, 43B, 45A, 45B Slider 47A, 47B Arm part 49A, 49B Electric micrometer (displacement detection part)
51 Tactile 53 Electric Actuator 55 First Linear Scale (Tilt Detection Unit)
57 Second linear scale (tilt detector)
59, 63 First detection head (tilt detection unit)
61, 65 Second detection head (tilt detection unit)
71 Control Unit 100 Dimension Measurement Device W Workpiece

Claims (9)

  1.  被測定物が載置される載置台と、
     前記載置台に向けて延出されるアーム部を有し、該アーム部の先端部に接触式の変位検出部が配置された測定子と、
     前記測定子の前記アーム部の基端部を支持し、前記測定子を一軸方向に移動させて前記変位検出部を前記被測定物に接触させる直動機構と、
     前記測定子の前記アーム部の延出方向と前記一軸方向の直交面とのなす傾斜角を検出する傾斜検出部と、
     前記変位検出部を前記被測定物に接触させた状態で、前記変位検出部から出力される距離検出信号、及び前記傾斜検出部から出力される傾斜角検出信号がそれぞれ入力され、前記変位検出部の前記延出方向における配置位置で前記アーム部の傾斜によって生じる前記一軸方向の位置ずれ量を、入力された前記傾斜角検出信号の傾斜角を用いて求め、前記変位検出部から出力された前記距離検出信号の測定距離を前記位置ずれ量で補正した補正距離の情報を出力する制御部と、
    を備えることを特徴とする寸法測定装置。
    A mounting table on which the object to be measured is mounted;
    A measuring element having an arm portion extending toward the mounting table, wherein a contact-type displacement detection unit is disposed at a tip portion of the arm portion;
    A linear motion mechanism that supports a base end portion of the arm portion of the measuring element, moves the measuring element in a uniaxial direction, and contacts the displacement detecting unit with the object to be measured;
    An inclination detection unit for detecting an inclination angle formed between the extending direction of the arm part of the measuring element and an orthogonal plane of the uniaxial direction;
    A distance detection signal output from the displacement detection unit and an inclination angle detection signal output from the inclination detection unit are input while the displacement detection unit is in contact with the object to be measured, and the displacement detection unit The amount of positional deviation in the uniaxial direction caused by the inclination of the arm portion at the arrangement position in the extending direction is determined using the inclination angle of the input inclination angle detection signal, and is output from the displacement detection section. A control unit that outputs information of a correction distance obtained by correcting the measurement distance of the distance detection signal by the positional deviation amount;
    A dimension measuring apparatus comprising:
  2.  前記変位検出部が、電気マイクロメータであることを特徴とする請求項1に記載の寸法測定装置。 2. The dimension measuring apparatus according to claim 1, wherein the displacement detection unit is an electric micrometer.
  3.  一対の前記測定子が、前記変位検出部の前記被測定物との接触側を対面させて前記一軸方向に並んで配置されており、
     前記直動機構が、一対の前記測定子をそれぞれ独立して前記一軸方向へ移動可能に支持することを特徴とする請求項1又は請求項2に記載の寸法測定装置。
    A pair of the measuring elements are arranged side by side in the uniaxial direction so that the contact side of the displacement detection unit with the object to be measured faces each other.
    The dimension measuring apparatus according to claim 1, wherein the linear movement mechanism supports the pair of measuring elements so as to be independently movable in the uniaxial direction.
  4.  一対の前記測定子が、前記一軸方向に沿って2組配置されたことを特徴とする請求項3に記載の寸法測定装置。 The dimension measuring device according to claim 3, wherein two pairs of the measuring elements are arranged along the uniaxial direction.
  5.  前記傾斜検出部が、前記測定子の前記延出方向に沿った少なくとも2箇所における前記一軸方向の位置をそれぞれ検出し、該検出した一軸方向の位置と、前記少なくとも2箇所の前記延出方向の位置との関係から前記傾斜角を検出することを特徴とする請求項1乃至請求項4のいずれか一項に記載の寸法測定装置。 The inclination detection unit detects the position in the uniaxial direction at at least two positions along the extending direction of the measuring element, and the detected position in the uniaxial direction and the at least two positions in the extending direction. The dimension measuring device according to any one of claims 1 to 4, wherein the inclination angle is detected from a relationship with a position.
  6.  前記傾斜検出部が、前記一軸方向に沿って配置されたリニアスケールと、前記測定子に設けられ前記リニアスケールから位置情報を検出する検出ヘッドと、を有することを特徴とする請求項5に記載の寸法測定装置。 The said inclination detection part has a linear scale arrange | positioned along the said uniaxial direction, and a detection head provided in the said measuring element and detecting position information from the said linear scale. Dimension measuring device.
  7.  請求項1乃至請求項6のいずれか一項に記載の寸法測定装置を用いて被測定物の寸法を測定する寸法測定方法であって、
     既知の寸法のマスター体を前記被測定物として前記補正距離を求め、当該補正距離を第1の距離とする工程と、
     寸法測定対象である前記被測定物を測定して前記補正距離を求め、当該補正距離を第2の距離とする工程と、
     前記第1の距離に対する前記第2の距離の差分を前記マスター体の既知の寸法に加算して前記被測定物の寸法を求める工程と、を含むことを特徴とする寸法測定方法。
    A dimension measuring method for measuring a dimension of an object to be measured using the dimension measuring apparatus according to any one of claims 1 to 6,
    Obtaining a correction distance using a master body having a known dimension as the object to be measured, and setting the correction distance as a first distance;
    Measuring the object to be measured as a dimension measurement object to determine the correction distance, and setting the correction distance as a second distance;
    Adding the difference of the second distance with respect to the first distance to a known dimension of the master body to obtain the dimension of the object to be measured.
  8.  前記被測定物が円筒形状であり、
     前記寸法が前記被測定物の径方向の寸法であることを特徴とする請求項7に記載の寸法測定方法。
    The object to be measured has a cylindrical shape,
    The dimension measuring method according to claim 7, wherein the dimension is a dimension in a radial direction of the object to be measured.
  9.  前記載置台を一定角度毎に回転させ、各回転位置で前記載置台に載置された前記被測定物の寸法を求めることを特徴とする請求項7又は請求項8に記載の寸法測定方法。 9. The dimension measuring method according to claim 7, wherein the mounting table is rotated at every predetermined angle, and the dimension of the object to be measured placed on the mounting table is obtained at each rotation position.
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