WO2015107290A3 - Procédé de placement et de collage de puces sur un substrat récepteur en utilisant un plot a l'aide d'une force d'attraction magnétique, électrostatique ou électromagnétique. - Google Patents
Procédé de placement et de collage de puces sur un substrat récepteur en utilisant un plot a l'aide d'une force d'attraction magnétique, électrostatique ou électromagnétique. Download PDFInfo
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- WO2015107290A3 WO2015107290A3 PCT/FR2015/050052 FR2015050052W WO2015107290A3 WO 2015107290 A3 WO2015107290 A3 WO 2015107290A3 FR 2015050052 W FR2015050052 W FR 2015050052W WO 2015107290 A3 WO2015107290 A3 WO 2015107290A3
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/93—Batch processes
- H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
- H01L2224/97—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10157—Shape being other than a cuboid at the active surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15158—Shape the die mounting substrate being other than a cuboid
- H01L2924/15159—Side view
Abstract
Un procédé de placement et de collage de puces (4) sur un substrat récepteur (6), ce procédé comportant : a) la fourniture (44, 98) de plusieurs puces (4), chaque puce (4) comportant une face de collage et une couche de transfert (36), b) le placement (70, 100, 126) des puces (4) à des emplacements prédéfinis en attirant la couche de transfert (36) à l'aide d'un plot (58), la force d'attraction entre la couche de transfert (36) et le plot (58) étant une force choisie dans le groupe composé d'une force magnétique, d'une force électrostatique et d'une force électromagnétique, c) le collage (74, 100, 126) des faces de collage des puces (4) ainsi placées sur des zones de réception respectives d'une face active (10) du substrat récepteur (6), chaque zone de réception ayant la même surface que la face de collage collée sur cette zone de réception et chaque zone de réception étant lisse et directement bordée par une zone périphérique lisse et au même niveau pour prolonger cette zone de réception dans un même plan ou par une zone périphérique en retrait à l'intérieur du substrat (6), dans lequel : - les faces de collage et les zones de réception sont préparées pour permettre un collage sans apport de matière adhésive entre les faces de collage et les zones de réception correspondantes, puis - lors de l'étape c), chaque face de collage est mise en contact direct avec sa zone de réception respective pour obtenir ainsi un collage sans apport de matière adhésive (un collage direct) des puces (4) sur le substrat récepteur (6).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1450293 | 2014-01-14 | ||
FR1450293A FR3016474A1 (fr) | 2014-01-14 | 2014-01-14 | Procede de placement et de collage de puces sur un substrat recepteur |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2015107290A2 WO2015107290A2 (fr) | 2015-07-23 |
WO2015107290A3 true WO2015107290A3 (fr) | 2015-09-11 |
Family
ID=50829062
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/FR2015/050052 WO2015107290A2 (fr) | 2014-01-14 | 2015-01-09 | Procédé de placement et de collage de puces sur un substrat récepteur |
Country Status (2)
Country | Link |
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FR (1) | FR3016474A1 (fr) |
WO (1) | WO2015107290A2 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3248226B1 (fr) * | 2015-11-04 | 2020-02-26 | Goertek Inc. | Procédé de transfert de micro-dels et procédé de fabrication d'un dispositif à micro-dels |
DE102017101966A1 (de) | 2017-02-01 | 2018-08-02 | Osram Opto Semiconductors Gmbh | Verfahren zum Transfer zumindest eines Halbleiterchips auf einen Zielträger |
JP7137571B2 (ja) | 2017-03-02 | 2022-09-14 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | チップを接合する方法および装置 |
FR3102771B1 (fr) * | 2019-10-31 | 2021-10-08 | Commissariat Energie Atomique | Procédé de collage de deux surfaces hydrophiles |
CN112992878B (zh) * | 2021-02-05 | 2023-01-13 | 惠州市聚飞光电有限公司 | 一种芯片转移方法及显示装置 |
CN113053793B (zh) * | 2021-03-19 | 2023-02-03 | 江西乾照光电有限公司 | 一种Micro LED阵列器件巨量转移装置及转移方法 |
CN114335260A (zh) * | 2021-12-27 | 2022-04-12 | 深圳市思坦科技有限公司 | 一种led芯片转移方法、转移基板制备方法及显示器件 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56152243A (en) * | 1980-04-26 | 1981-11-25 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
EP1209735A2 (fr) * | 2000-10-24 | 2002-05-29 | Shinko Electric Industries Co. Ltd. | Dispositif semi-conducteur et son procédé de fabrication |
WO2007021639A2 (fr) * | 2005-08-11 | 2007-02-22 | Ziptronix, Inc. | Procédé et dispositif d’éléments d’intégration tridimensionnels |
US20080121724A1 (en) * | 2005-05-12 | 2008-05-29 | Infineon Technologies Ag | Semiconductor Chips for TAG Applications, Devices for Mounting the Same, and Mounting Method |
WO2011072373A1 (fr) * | 2009-12-17 | 2011-06-23 | Cooledge Lighting Inc. | Procédé et tampon de transfert magnétique pour transférer des puces semi-conductrices à l'aide de techniques d'impression à transfert magnétique |
WO2012133760A1 (fr) * | 2011-03-30 | 2012-10-04 | ボンドテック株式会社 | Procédé et système de montage de composants électroniques, et substrat |
FR2979167A1 (fr) * | 2011-08-19 | 2013-02-22 | Soitec Silicon On Insulator | Formation de structures semi-conductrices liées dans des processus d’intégration tridimensionnelle en utilisant des substrats récupérables |
FR2980036A1 (fr) * | 2011-09-12 | 2013-03-15 | St Microelectronics Crolles 2 | Procede de realisation d'une structure integree tridimensionnelle et structure correspondante |
-
2014
- 2014-01-14 FR FR1450293A patent/FR3016474A1/fr not_active Withdrawn
-
2015
- 2015-01-09 WO PCT/FR2015/050052 patent/WO2015107290A2/fr active Application Filing
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56152243A (en) * | 1980-04-26 | 1981-11-25 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
EP1209735A2 (fr) * | 2000-10-24 | 2002-05-29 | Shinko Electric Industries Co. Ltd. | Dispositif semi-conducteur et son procédé de fabrication |
US20080121724A1 (en) * | 2005-05-12 | 2008-05-29 | Infineon Technologies Ag | Semiconductor Chips for TAG Applications, Devices for Mounting the Same, and Mounting Method |
WO2007021639A2 (fr) * | 2005-08-11 | 2007-02-22 | Ziptronix, Inc. | Procédé et dispositif d’éléments d’intégration tridimensionnels |
WO2011072373A1 (fr) * | 2009-12-17 | 2011-06-23 | Cooledge Lighting Inc. | Procédé et tampon de transfert magnétique pour transférer des puces semi-conductrices à l'aide de techniques d'impression à transfert magnétique |
WO2012133760A1 (fr) * | 2011-03-30 | 2012-10-04 | ボンドテック株式会社 | Procédé et système de montage de composants électroniques, et substrat |
FR2979167A1 (fr) * | 2011-08-19 | 2013-02-22 | Soitec Silicon On Insulator | Formation de structures semi-conductrices liées dans des processus d’intégration tridimensionnelle en utilisant des substrats récupérables |
FR2980036A1 (fr) * | 2011-09-12 | 2013-03-15 | St Microelectronics Crolles 2 | Procede de realisation d'une structure integree tridimensionnelle et structure correspondante |
Also Published As
Publication number | Publication date |
---|---|
FR3016474A1 (fr) | 2015-07-17 |
WO2015107290A2 (fr) | 2015-07-23 |
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