WO2015100848A1 - Supporting apparatus for microscope, microscope, and microscope carrier - Google Patents

Supporting apparatus for microscope, microscope, and microscope carrier Download PDF

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Publication number
WO2015100848A1
WO2015100848A1 PCT/CN2014/072346 CN2014072346W WO2015100848A1 WO 2015100848 A1 WO2015100848 A1 WO 2015100848A1 CN 2014072346 W CN2014072346 W CN 2014072346W WO 2015100848 A1 WO2015100848 A1 WO 2015100848A1
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WO
WIPO (PCT)
Prior art keywords
microscope
protruding structure
stage
substrate
protruding
Prior art date
Application number
PCT/CN2014/072346
Other languages
French (fr)
Chinese (zh)
Inventor
丁建文
Original Assignee
爱威科技股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 爱威科技股份有限公司 filed Critical 爱威科技股份有限公司
Publication of WO2015100848A1 publication Critical patent/WO2015100848A1/en

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/34Microscope slides, e.g. mounting specimens on microscope slides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L3/00Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
    • B01L3/50Containers for the purpose of retaining a material to be analysed, e.g. test tubes
    • B01L3/508Containers for the purpose of retaining a material to be analysed, e.g. test tubes rigid containers not provided for above
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2200/00Solutions for specific problems relating to chemical or physical laboratory apparatus
    • B01L2200/02Adapting objects or devices to another
    • B01L2200/025Align devices or objects to ensure defined positions relative to each other
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01LCHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
    • B01L2300/00Additional constructional details
    • B01L2300/08Geometry, shape and general structure
    • B01L2300/0809Geometry, shape and general structure rectangular shaped
    • B01L2300/0822Slides

Definitions

  • the present invention relates to the field of microscopy, and more particularly to a support device for a microscope, a microscope, and a microscope stage.
  • a loading device such as a slide or a counting plate is directly placed on the stage of the microscope, and the bottom surface of the loading device is brought into contact with the top surface of the stage to ensure horizontal placement of the loading device. For easy detection.
  • the mirror stage has a large area, and it is difficult to control the flatness error of the entire stage in the micrometer range.
  • the flatness of the stage is poor, it is easy to cause the focus on the stage to be inaccurate; in addition, due to the presence of dust in the air, it is inevitable to accumulate on the stage of the microscope. Dust, so that the slide (or counting plate) cannot be in contact with the stage, and the dust particles will cause the level of the load device to decrease, so that part of the area on the load device is not within the focal length of the microscope. Need to be repeated
  • the present invention provides a support device for a microscope to improve the level of the load device and avoid the cumbersome operation of repeated focus adjustment.
  • the present invention also provides a microscope having the above-described support device for a microscope.
  • a support device for a microscope for supporting a load device A support device for a microscope for supporting a load device
  • the supporting device includes a substrate and a plurality of protruding structures disposed thereon,
  • the protruding structure is located on the same horizontal plane for the top end in contact with the loading device.
  • the protruding structure is a linear protrusion.
  • the protruding structure is a strip-shaped protrusion.
  • the protruding structure is a dot-like projection.
  • the protruding structure is a tapered protrusion.
  • the protruding structure is a columnar protrusion.
  • the present invention also provides a microscope comprising a support device for a microscope on a microscope stage, the support device for the microscope being a support device for a microscope according to any of the above.
  • the support device for the microscope is mounted on the microscope stage.
  • the support device for the microscope is integrally formed with the microscope.
  • the present invention also provides a microscope stage for supporting a load device, comprising a stage body and a plurality of protruding structures disposed on the stage body, the protruding structure being used for loading The top ends of the device contacts are on the same level.
  • the invention also provides a microscope comprising a microscope stage, the microscope stage being a microscope stage as described above.
  • the supporting device for the microscope provided by the embodiment of the present invention has a protruding structure on the substrate; since the top ends of the plurality of protruding structures are located on the same horizontal surface, the loading device is erected In a plurality of protruding structures, the contact area of the protruding structure with the loading device is smaller than the contact area directly placing the loading device on the stage, and the area is as small as possible, so that the dust accumulation probability of the top end of the protruding structure Less, to improve the level of the load device, reduce the level of the load device caused by the accumulation of dust, reduce the level of the load device, so that the load device is not in the same focal length, greatly reduce the tedious operation of repeated focus adjustment, improve the ease of use of the microscope .
  • the invention also provides a microscope and a microscope stage, wherein the microscope and the microscope stage have a protruding structure, and the protruding structure is located at the same horizontal plane for the top end in contact with the loading device. Therefore, the above technical effects should also be provided, and will not be described in detail herein.
  • FIG. 1 is a front elevational view of a microscope according to an embodiment of the present invention.
  • FIG. 2 is a right side view of a microscope according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural view of a first supporting device and a slide for a microscope according to an embodiment of the present invention
  • FIG. 4 is a schematic structural view of a first supporting device for a microscope according to an embodiment of the present invention
  • FIG. 5 is a schematic structural view of a second supporting device and a slide for a microscope according to an embodiment of the present invention
  • FIG. 6 is a schematic structural view of a second supporting device for a microscope according to an embodiment of the present invention
  • FIG. 7 is a schematic structural view of a third supporting device and a slide for a microscope according to an embodiment of the present invention
  • FIG. 8 is a schematic structural view of a third supporting device for a microscope according to an embodiment of the present invention
  • FIG. 9 is a schematic structural view of a fourth supporting device and a slide for a microscope according to an embodiment of the present invention
  • FIG. 10 is a schematic structural view of a fourth supporting device for a microscope according to an embodiment of the present invention
  • FIG. 11 is a schematic structural view of a fifth supporting device for a microscope and a slide according to an embodiment of the present invention
  • FIG. 12 is a schematic structural diagram of a sixth supporting device and a slide for a microscope according to an embodiment of the present invention.
  • FIG. 13 is a top plan view of a microscope according to an embodiment of the present invention.
  • FIG. 14 is a schematic structural diagram of a loading device according to an embodiment of the present invention.
  • Supporting device A first supporting device A1, second supporting device A2, third supporting device A3 , fourth supporting device A4, fifth supporting device A5, sixth supporting device — A6, stage one B, first substrate one B1, second substrate one B2, third substrate one B3, fourth substrate one B4, fifth substrate one B5, sixth substrate one B6
  • the first type of light transmission area is B01
  • the second type of light transmission area is B02
  • the third type of light transmission area is B03
  • the fourth type of light transmission area is B04
  • the loading device is C
  • the guiding block is CO.
  • the present invention discloses a support device for a microscope to improve the levelness of the load device and avoid the cumbersome operation of repeated focus adjustment.
  • the present invention also provides a microscope having the above-described support device for a microscope.
  • a supporting device for a microscope provided by an embodiment of the present invention is used for supporting
  • the supporting device comprises a substrate and a plurality of protruding structures A disposed thereon, and the protruding structures A are located on the same horizontal surface for the top end in contact with the carrier device.
  • the supporting device for the microscope provided by the embodiment of the present invention has a protruding structure A disposed on the substrate; since the top ends of the plurality of protruding structures A are located on the same horizontal surface, the loading device is erected by more than 5 protrusions On the structure A, the contact area of the protruding structure A with the loading device is smaller than the contact area directly placing the loading device on the stage, and the area is as small as possible, so that the dust accumulation probability of the top end of the protruding structure A is small.
  • the loading device is a device such as a slide glass, a slide glass or a counting plate, and is no longer described and is within the scope of protection.
  • the first substrate B1 is provided with a plurality of first protruding structures A1, and the first protruding structures A1 are linear protrusions.
  • the plurality of first protruding structures A1 are uniformly arranged along the longitudinal direction of the first light transmitting region B01 on the first substrate B1.
  • the number of rows of the first protruding structures A1 disposed on one side of the first light transmitting region B01 is one row. That is, the number of rows of the first protruding structures A1 disposed on one side of the first light transmitting region B01 is one row; the number of rows of the first protruding structures A1 disposed on the other side of the first light transmitting region B01 Also for a row. It is also possible to set the number of rows of the first protruding structures A1 disposed on one side of the first light transmitting region B01 to a plurality of rows, or the first protruding structure A1 disposed on one side of the first light transmitting region B01. The number of rows is set to multiple rows, and the number of rows of the first protruding structure A1 disposed on the other side is set to one row, which will not be described in detail herein.
  • the plurality of first protruding structures A1 are uniformly arranged along the length direction of the first light transmitting region B01, that is, the one side of the first light transmitting region B01 is the length of the first light transmitting region B01.
  • the first type of protruding structure A1 may be disposed on the width side of the first type of light transmitting area B01, and it is only necessary to ensure that the first type of protruding structure A1 is erected with the first type of loading device C1.
  • the light transmissive area B01 can be above.
  • the first protruding structure A1 is a supporting piece, and the plane of the supporting piece is perpendicular to the longitudinal direction of the first light transmitting area B01.
  • the dust falls from the adjacent two supporting pieces onto the first substrate B1, which further reduces the amount of dust accumulation at the tip end of the supporting piece, which in turn further improves the level of the first type of loading device C1.
  • the second substrate B2 is provided with a plurality of second protruding structures A2,
  • the two kinds of protruding structures A2 are linear protrusions.
  • the plurality of second protruding structures A2 are uniformly arranged along the longitudinal direction of the second light transmitting region B02 on the second substrate B2.
  • a second protruding structure A2 is disposed on both sides of the second light transmitting area B02.
  • the second One side of the light transmitting area B02 is provided with a second protruding structure A2
  • the other side of the second light transmitting area B02 is provided with a second protruding structure A2.
  • the second substrate B2 assembly provided by the embodiment of the invention only needs to provide two second protruding structures A2 on the second substrate B2, which greatly simplifies the processing steps, thereby facilitating the processing process and reducing the processing. The role of cost.
  • the second protruding structure A2 in the embodiment of the present invention is a supporting piece, the plane of the supporting piece and the second transparent area B02.
  • the length direction is parallel.
  • the support piece is disposed on both sides of the second light-transmissive area B02 in the longitudinal direction, that is, one side of the second light-transmissive area B02 in the longitudinal direction is provided with a support piece, and the second light-transmissive area B02 The other side of the 10 degree direction is provided with another support piece.
  • the third substrate B3 is provided with a plurality of the fifteenth convex structures A3, and the third protruding structure A3 is a strip-shaped projection.
  • a plurality of third protruding structures A3 are uniformly arranged along the longitudinal direction of the third light transmitting region B03 on the third substrate B3.
  • the third supporting device for the microscope provided by the embodiment of the invention only needs to provide two third protruding structures A3 on the third substrate B3, which greatly simplifies the processing steps and facilitates the processing. Process, to reduce the cost of processing.
  • the third protruding structure A3 in the embodiment of the present invention is a supporting block, and the length direction of the supporting block It is parallel to the longitudinal direction of the third light transmitting region B03.
  • the support block is disposed on both sides of the third light-transmissive region B03 in the longitudinal direction, that is, one side of the longitudinal direction of the third five kinds of light-transmitting regions B03 is provided with a support block, and the third light-transmitting region B03 The other side of the length direction is provided with another support block.
  • the third protruding structure A3 is also possible to arrange the third protruding structure A3 on the width side of the third light transmitting area B03, and only need to ensure The third protruding structure A3 is provided with a third type of loading device C3 above the third light transmitting area B03.
  • the fourth substrate B4 is provided with a plurality of fourth projecting structures A4, and the fourth projecting structure A4 is a dot-like bump.
  • the plurality of fourth protruding structures A4 are uniformly arranged along the longitudinal direction of the fourth light transmitting region B04 5 on the fourth substrate B4.
  • the fourth protruding structure A4 disposed on one side of the fourth light-transmitting region B04 has a row of rows. That is, the number of rows of the fourth protruding structures A4 disposed on one side of the fourth light transmitting region B04 is one row; the number of rows of the fourth protruding structures A4 disposed on the other side of the fourth light transmitting region B04 Also for a row. It is also possible to set the number of rows of the fourth protruding structure A4 disposed on one side of the fourth light transmitting region B04 to be more than 10 rows, or the fourth protruding structure disposed on one side of the fourth light transmitting region B04. The number of rows of A4 is set to multiple rows, and the number of rows of the fourth protruding structure A4 disposed on the other side is set to one row, which will not be described in detail herein.
  • the plurality of fourth protruding structures A4 are uniformly arranged along the length direction of the fourth light transmitting region B04, that is, the one side of the fourth light transmitting region B04 is the length direction of the fourth light transmitting region B04.
  • the fourth protruding structure A4 can also be disposed on the width side of the fourth light transmitting area B04, and only need to ensure that the first protruding structure A4 is erected with the fourth type of loading device C4 in the fourth type.
  • the light transmissive area B04 can be above.
  • the fourth projecting structure A4 is a support pin. Since the top area of the support pin is small, and the dust easily falls from the gap between the adjacent two support pins to the fourth substrate B4, the amount of dust accumulation at the tip of the support pin is further reduced, and the fourth load is further improved. The level of the device C4.
  • the fifth protruding structure A5 may be disposed as a cone-shaped protrusion, that is, the diameter of the point-like protrusion is enlarged to form a tapered protrusion, and is disposed on On the fifth substrate B5, in order to arrange the fifth type of loading device C5 on the fifth protruding structure A5, the above technical effects can also be achieved;
  • the sixth protruding structure A6 may be disposed as a columnar protrusion, that is, the diameter of the point protrusion is enlarged to form a columnar protrusion, and is disposed on the sixth substrate.
  • B6 ⁇ 5 in order to set the sixth type of loading device C6 on the sixth protruding structure A6, the above technical effects can also be achieved.
  • the light-transmissive region may not be disposed on the substrate, so that the whole is transparent, and only the light transmittance is required.
  • linear protrusions linear protrusions, tapered protrusions or columnar protrusions, To set in the light transmission area.
  • the protruding structure A and the substrate are of a unitary structure.
  • the protruding structure A is integrally processed with the substrate by injection molding or compression molding, and fixedly disposed on the substrate to form a supporting device for the microscope.
  • the processing of the support device for a microscope provided by the embodiment of the present invention is effectively simplified.
  • an embodiment of the present invention further provides a microscope, comprising a support device for a microscope on a microscope stage, and the support device for the microscope is a support for the microscope as any of the above. Device. Since the above-described support device for a microscope has the above-described technical effects, the microscope having the above-described support device for the microscope should also have the same technical effect, and will not be described in detail herein.
  • the support device for the display is mounted on the display stage.
  • the protruding structure A is disposed on the top surface of the substrate; the bottom surface of the substrate is fixedly connected to the top surface of the stage body B.
  • the substrate is integrally mounted on the top surface of the stage body B to facilitate processing and projecting the arrangement of the structure A with respect to the substrate.
  • the portion of the substrate corresponding to the light-transmitting region of the carrier body B is a transparent structure, which may be a hollow structure disposed on the substrate 15 corresponding to the light-transmitting region, or may be disposed on the substrate corresponding to the light-transmitting region.
  • the transparent plate structure can also process the whole substrate into a transparent plate, which is no longer introduced and is within the scope of protection.
  • the support device for the microscope is integrally formed with the microscope.
  • the microscope provided by the embodiment of the present invention further includes a carrier transport mechanism that should be disposed with respect to the support device for the microscope.
  • the carrier device C is directed to the substrate by the carrier transport mechanism to ensure that the carrier device C is disposed on the protruding structure A, which effectively improves the detection efficiency, and is particularly suitable for the operation of batch detection.
  • the carrier device transport mechanism includes: a conveyor belt 1 for transporting the load device; an output end of the conveyor belt 1 for accommodating the accommodating groove 5 of the load device C; a push rod 7 disposed along a length direction of the stage body B of the support device for the microscope; disposed between the push rod 7 and the support device for the microscope for guiding the projection of the load device C on the substrate Positioning chute 9 on structure A.
  • the conveyor belt 1 It is disposed on one side of the frame 2, and the other side of the frame 2 is provided with a load device storage box 3, and the load device C is transported by the conveyor belt 1 to the output end of the conveyor belt 1, and falls into the receiving groove 5, and is arranged to be accommodated
  • the push rod 7 in the slot 5 pushes the carrier device C into the positioning chute 9 and moves to the stage body B under the guidance of the positioning chute 9, and finally is placed on the protruding structure A of the stage body B.
  • the camera is preferably a CCD (Charge-coupled Device) camera, or an eyepiece can be installed in the adapter interface 4 for manual observation.
  • CCD Charge-coupled Device
  • the substrate is fixed to the stage body B such that the protruding structure A is fixed relative to the stage body B.
  • the carrier device C is fixed relative to the protruding structure A,
  • the movement of the object device C relative to the objective lens 8 of the dynamoscope is completed by the movement of the stage body B in the X direction and the Y direction; the carrier device C can also be moved in the X direction and combined with the stage body B along the stage
  • the movement in the Y direction completes the adjustment of the objective device C relative to the objective lens 8 of the microscope; it is also possible to move the carrier device C in the Y direction and combine the movement of the stage body B in the X direction to complete the carrier device C relative to the microscope. Adjustment of the objective lens 8.
  • the embodiment of the present invention further provides a microscope stage, wherein a plurality of protruding structures A are directly disposed on the stage body B, and the protruding structure A is located at the same level on the top end of the contact with the loading device. Since the microscope stage has a plurality of protruding structures A and the protruding structure A is located on the same horizontal surface with the tip end in contact with the loading device, it has the same technical effect as the above-mentioned supporting device for the microscope, and is not More details.
  • the stage body B and the protruding structure A are arranged in a unitary structure. That is, the protruding structure A and the stage body B are integrally processed by injection molding or compression molding to form a supporting device for the microscope, thereby simplifying the processing of the supporting device for the illuminating mirror provided by the embodiment of the present invention. effect.
  • the form of the chute may not be used.
  • the bottom of the bottom of the loading device C ⁇ 5 is provided with a guiding protrusion CO, and the guiding protrusion CO is combined with the supporting device, thereby The carrier device C is guided.
  • the protruding structure A is located on the stage body B.
  • the embodiment of the present invention further provides a microscope having the above microscope stage. Since the microscope stage has the above technical effects, the microscope having the microscope stage should have the same technical effect, and the details are not detailed here. Introduction. Since the protruding structure A is directly disposed on the stage body B, the protruding structure A is fixed with respect to the stage body B. The focus adjustment process is as described above, and is no longer described here.

Abstract

Provided is a supporting apparatus for a microscope, used for supporting a loading apparatus. The supporting apparatus comprises a substrate (B1) and multiple protruding structures (A1) disposed on the substrate. Top ends, used for being in contact with the loading apparatus (C1), of the protruding structures (A1) are located on the same horizontal plane. According to the provided supporting apparatus, the loading apparatus is erected above the protruding structures, so that the direct contact area of the loading apparatus and a carrier is reduced as small as possible by means of the protruding structures, and accordingly, the probability of accumulating dust on the top ends of the protruding structures is reduced, the levelness of the loading apparatus is improved, the condition that the loading apparatus has different focus lengths due to the fact that the levelness of the loading apparatus is lowered caused by dust accumulation is reduced, the tedious operation of repeated focusing is greatly reduced, and the use convenience of the microscope is improved. Also provided are a microscope carrier and the microscope.

Description

用于显微镜的支撑装置、 显微镜及显微镜载物台  Support device for microscope, microscope and microscope stage
本申请要求于 2013 年 12 月 31 日提交中国专利局、 申请号为 201310752643.7、 发明名称为 "用于显微镜的支撑装置、 显微镜及显微镜载物 台" 的中国专利申请的优先权, 其全部内容通过引用结合在本申请中。  This application claims priority to Chinese Patent Application No. 201310752643.7, entitled "Supporting Device for Microscope, Microscope and Microscope Stage", filed on December 31, 2013, the entire contents of which are hereby incorporated by reference. The citations are incorporated herein by reference.
5  5
技术领域  Technical field
本发明涉及显微镜技术领域, 特别涉及一种用于显微镜的支撑装置、显微 镜及显微镜载物台。  The present invention relates to the field of microscopy, and more particularly to a support device for a microscope, a microscope, and a microscope stage.
10 背景技术 10 BACKGROUND
在使用显微镜的过程中 ,将载物片或计数板等载物装置直接放置于显微镜 的载物台上,通过载物装置的底面与载物台的顶面接触确保载物装置的水平放 置, 以便于检测。  In the process of using the microscope, a loading device such as a slide or a counting plate is directly placed on the stage of the microscope, and the bottom surface of the loading device is brought into contact with the top surface of the stage to ensure horizontal placement of the loading device. For easy detection.
为了使载物台上的载物片准确对焦, 常用的方法是移动载物台。 由于显微 In order to accurately focus the slide on the stage, a common method is to move the stage. Due to microscopic
15 镜载物台面积比较大,要将整个载物台的平整度误差控制在微米级内,难度艮 大。 而载物台的平整度较差时, 极易造成置于载物台上的载物片对焦不准; 另 夕卜, 由于空气中存有灰尘, 不可避免的在显微镜的载物台上积聚灰尘, 而使载 物片 (或者计数板)不能艮好地与载物台接触, 而灰尘微粒会导致载物装置的 水平度降低,致使载物装置上的部分区域不在显微镜的焦距范围内, 需要反复15 The mirror stage has a large area, and it is difficult to control the flatness error of the entire stage in the micrometer range. When the flatness of the stage is poor, it is easy to cause the focus on the stage to be inaccurate; in addition, due to the presence of dust in the air, it is inevitable to accumulate on the stage of the microscope. Dust, so that the slide (or counting plate) cannot be in contact with the stage, and the dust particles will cause the level of the load device to decrease, so that part of the area on the load device is not within the focal length of the microscope. Need to be repeated
^0 调整, 操作繁瑣。 ^0 adjustment, the operation is cumbersome.
因此, 如何提高载物装置的水平度, 避免反复调焦的繁瑣操作, 是本技术 领域人员亟待解决的问题。 发明内容  Therefore, how to improve the level of the loading device and avoid the cumbersome operation of repeated focusing is an urgent problem to be solved by those skilled in the art. Summary of the invention
ί5 有鉴于此, 本发明提供了一种用于显微镜的支撑装置, 以提高载物装置的 水平度,避免反复调焦的繁瑣操作。本发明还提供了一种具有上述用于显微镜 的支撑装置的显微镜。 In view of this, the present invention provides a support device for a microscope to improve the level of the load device and avoid the cumbersome operation of repeated focus adjustment. The present invention also provides a microscope having the above-described support device for a microscope.
为实现上述目的, 本发明提供如下技术方案: 一种用于显微镜的支撑装置, 用于支撑载物装置, To achieve the above object, the present invention provides the following technical solutions: A support device for a microscope for supporting a load device,
所述支撑装置包括基板及设置于其上的多个凸出结构,  The supporting device includes a substrate and a plurality of protruding structures disposed thereon,
所述凸出结构用于与所述载物装置接触的顶端位于同一水平面上。  The protruding structure is located on the same horizontal plane for the top end in contact with the loading device.
优选地, 上述用于显微镜的支撑装置中, 所述凸出结构为线状凸起。 优选地, 上述用于显微镜的支撑装置中, 所述凸出结构为条状凸起。 优选地, 上述用于显微镜的支撑装置中, 所述凸出结构为点状凸起。 优选地, 上述用于显微镜的支撑装置中, 所述凸出结构为锥状凸起。 优选地, 上述用于显微镜的支撑装置中, 所述凸出结构为柱状凸起。 本发明还提供了一种显微镜,包括位于显微镜载物台上用于显微镜的支撑 装置,所述用于显微镜的支撑装置为如上述任意一项所述用于显微镜的支撑装 置。  Preferably, in the above supporting device for a microscope, the protruding structure is a linear protrusion. Preferably, in the above support device for a microscope, the protruding structure is a strip-shaped protrusion. Preferably, in the above supporting device for a microscope, the protruding structure is a dot-like projection. Preferably, in the above support device for a microscope, the protruding structure is a tapered protrusion. Preferably, in the above supporting device for a microscope, the protruding structure is a columnar protrusion. The present invention also provides a microscope comprising a support device for a microscope on a microscope stage, the support device for the microscope being a support device for a microscope according to any of the above.
优选地, 上述显微镜中, 所述用于显微镜的支撑装置装配在显微镜载物台 上。  Preferably, in the above microscope, the support device for the microscope is mounted on the microscope stage.
优选地, 上述显微镜中, 所述用于显微镜的支撑装置与显微镜一体成型。 本发明还提供了一种显微镜载物台, 用于支撑载物装置, 包括载物台本体 及设置于所述载物台本体上的多个凸出结构,所述凸出结构用于与载物装置接 触的顶端位于同一水平面上。  Preferably, in the above microscope, the support device for the microscope is integrally formed with the microscope. The present invention also provides a microscope stage for supporting a load device, comprising a stage body and a plurality of protruding structures disposed on the stage body, the protruding structure being used for loading The top ends of the device contacts are on the same level.
本发明还提供了一种显微镜, 包括显微镜载物台, 所述显微镜载物台为如 上所述的显微镜载物台。  The invention also provides a microscope comprising a microscope stage, the microscope stage being a microscope stage as described above.
从上述的技术方案可以看出, 本发明实施例提供的用于显微镜的支撑装 置, 在基板上设置了凸出结构; 由于多个凸出结构的顶端位于同一水平面上, 通过将载物装置架设于多个凸出结构上,凸出结构与载物装置的接触面积小于 直接将载物装置放置于载物台上的接触面积,且面积尽可能地小,从而凸出结 构的顶端灰尘积聚几率少, 以提高载物装置的水平度, 减少由于灰尘积聚引起 的载物装置水平度降低,致使载物装置不在同一焦距内的情况,极大减少反复 调焦的繁瑣操作, 提高显微镜使用方便度。  It can be seen from the above technical solution that the supporting device for the microscope provided by the embodiment of the present invention has a protruding structure on the substrate; since the top ends of the plurality of protruding structures are located on the same horizontal surface, the loading device is erected In a plurality of protruding structures, the contact area of the protruding structure with the loading device is smaller than the contact area directly placing the loading device on the stage, and the area is as small as possible, so that the dust accumulation probability of the top end of the protruding structure Less, to improve the level of the load device, reduce the level of the load device caused by the accumulation of dust, reduce the level of the load device, so that the load device is not in the same focal length, greatly reduce the tedious operation of repeated focus adjustment, improve the ease of use of the microscope .
本发明还提供了一种显微镜及显微镜载物台,由于上述显微镜及显微镜载 物台均具有凸出结构,且凸出结构用于与载物装置接触的顶端位于同一水平面 上, 因此, 也应具有上述技术效果, 在此不再详细介绍。 附图说明 The invention also provides a microscope and a microscope stage, wherein the microscope and the microscope stage have a protruding structure, and the protruding structure is located at the same horizontal plane for the top end in contact with the loading device. Therefore, the above technical effects should also be provided, and will not be described in detail herein. DRAWINGS
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面将对实施 例或现有技术描述中所需要使用的附图作简单地介绍,显而易见地, 下面描述 中的附图仅仅是本发明的一些实施例, 对于本领域普通技术人员来讲,在不付 出创造性劳动的前提下, 还可以根据这些附图获得其他的附图。  In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the description of the prior art will be briefly described below. Obviously, the drawings in the following description are only It is a certain embodiment of the present invention, and other drawings can be obtained from those skilled in the art without any creative work.
图 1为本发明实施例提供的显微镜的主视示意图;  1 is a front elevational view of a microscope according to an embodiment of the present invention;
图 2为本发明实施例提供的显微镜的右视示意图;  2 is a right side view of a microscope according to an embodiment of the present invention;
图 3为本发明实施例提供的第一种用于显微镜的支撑装置和载玻片的结构 示意图;  3 is a schematic structural view of a first supporting device and a slide for a microscope according to an embodiment of the present invention;
图 4为本发明实施例提供的第一种用于显微镜的支撑装置的结构示意图; 图 5为本发明实施例提供的第二种用于显微镜的支撑装置和载玻片的结构 示意图;  4 is a schematic structural view of a first supporting device for a microscope according to an embodiment of the present invention; FIG. 5 is a schematic structural view of a second supporting device and a slide for a microscope according to an embodiment of the present invention;
图 6为本发明实施例提供的第二种用于显微镜的支撑装置的结构示意图; 图 7为本发明实施例提供的第三种用于显微镜的支撑装置和载玻片的结构 示意图;  6 is a schematic structural view of a second supporting device for a microscope according to an embodiment of the present invention; FIG. 7 is a schematic structural view of a third supporting device and a slide for a microscope according to an embodiment of the present invention;
图 8为本发明实施例提供的第三种用于显微镜的支撑装置的结构示意图; 图 9为本发明实施例提供的第四种用于显微镜的支撑装置和载玻片的结构 示意图;  8 is a schematic structural view of a third supporting device for a microscope according to an embodiment of the present invention; FIG. 9 is a schematic structural view of a fourth supporting device and a slide for a microscope according to an embodiment of the present invention;
图 10为本发明实施例提供的第四种用于显微镜的支撑装置的结构示意图; 图 11为本发明实施例提供的第五种用于显微镜的支撑装置和载玻片的结 构示意图;  10 is a schematic structural view of a fourth supporting device for a microscope according to an embodiment of the present invention; FIG. 11 is a schematic structural view of a fifth supporting device for a microscope and a slide according to an embodiment of the present invention;
图 12为本发明实施例提供的第六种用于显微镜的支撑装置和载玻片的结 构示意图;  FIG. 12 is a schematic structural diagram of a sixth supporting device and a slide for a microscope according to an embodiment of the present invention; FIG.
图 13为本发明实施例提供的显微镜的俯视示意图;  13 is a top plan view of a microscope according to an embodiment of the present invention;
图 14为本发明实施例提供的载物装置的结构示意图。  FIG. 14 is a schematic structural diagram of a loading device according to an embodiment of the present invention.
其中, 支撑装置一 A, 第一种支撑装置一 A1 , 第二种支撑装置一 A2, 第三种支 撑装置一 A3 , 第四种支撑装置一 A4, 第五种支撑装置一 A5 , 第六种支撑装置 — A6, 载物台一 B, 第一种基板一 B1 , 第二种基板一 B2, 第三种基板一 B3 , 第四种基板一 B4, 第五种基板一 B5 , 第六种基板一 B6, 第一种透光区一 B01 , 5 第二种透光区一 B02 , 第三种透光区一 B03 , 第四种透光区一 B04 , 载物装置 一 C, 导向凸块一 CO, 第一种载物装置一 C1 , 第二种载物装置一 C2, 第三种 载物装置一 C3 , 第四种载物装置一 C4, 第五种载物装置一 C5 , 第六种载物装 置一 C6, 传送带一 1 , 机架一 2 , 载物装置存放盒一 3 , 适配接口 容纳槽 —5 , 摄像机一 6, 推动杆一 7, 物镜一 8 , 定位滑槽一 9, 聚光镜一 10。 among them, Supporting device A, first supporting device A1, second supporting device A2, third supporting device A3 , fourth supporting device A4, fifth supporting device A5, sixth supporting device — A6, stage one B, first substrate one B1, second substrate one B2, third substrate one B3, fourth substrate one B4, fifth substrate one B5, sixth substrate one B6 The first type of light transmission area is B01, the second type of light transmission area is B02, the third type of light transmission area is B03, the fourth type of light transmission area is B04, the loading device is C, and the guiding block is CO. The first type of load device C1, the second type of load device C2, the third type of load device C3, the fourth type of load device C4, the fifth type of load device C5, and the sixth type Device one C6, conveyor belt one, rack one 2, load device storage box one 3, adapter interface receiving slot -5, camera one 6, push rod one 7, objective lens one, positioning chute one 9, concentrating mirror one 10.
10  10
具体实施方式  detailed description
本发明公开了一种用于显微镜的支撑装置, 以提高载物装置的水平度,避 免反复调焦的繁瑣操作。本发明还提供了一种具有上述用于显微镜的支撑装置 的显微镜。  The present invention discloses a support device for a microscope to improve the levelness of the load device and avoid the cumbersome operation of repeated focus adjustment. The present invention also provides a microscope having the above-described support device for a microscope.
15 下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清 楚、 完整地描述, 显然, 所描述的实施例仅仅是本发明一部分实施例, 而不是 全部的实施例。基于本发明中的实施例, 本领域普通技术人员在没有做出创造 性劳动前提下所获得的所有其他实施例, 都属于本发明保护的范围。  BRIEF DESCRIPTION OF THE DRAWINGS The technical solutions in the embodiments of the present invention will be described in detail below with reference to the accompanying drawings. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present invention without the creative work are all within the scope of the present invention.
如图 1-图 12所示, 本发明实施例提供的用于显微镜的支撑装置, 用于支 As shown in FIG. 1 to FIG. 12, a supporting device for a microscope provided by an embodiment of the present invention is used for supporting
^0 撑载物装置, ^0 support device,
支撑装置包括基板及设置于其上的多个凸出结构 A,凸出结构 A用于与载 物装置接触的顶端位于同一水平面上。  The supporting device comprises a substrate and a plurality of protruding structures A disposed thereon, and the protruding structures A are located on the same horizontal surface for the top end in contact with the carrier device.
本发明实施例提供的用于显微镜的支撑装置, 在基板上设置了凸出结构 A; 由于多个凸出结构 A的顶端位于同一水平面上, 通过将载物装置架设于多 ^5 个凸出结构 A上, 而凸出结构 A与载物装置的接触面积小于直接将载物装置放 置于载物台上的接触面积, 且面积尽可能地小, 从而凸出结构 A的顶端灰尘积 聚几率少, 以提高载物装置的水平度, 减少由于灰尘积聚引起的载物装置水平 度降低,致使载物装置不在同一焦距内的情况,极大减少反复调焦的繁瑣操作, 提高显微镜使用方便度。 The supporting device for the microscope provided by the embodiment of the present invention has a protruding structure A disposed on the substrate; since the top ends of the plurality of protruding structures A are located on the same horizontal surface, the loading device is erected by more than 5 protrusions On the structure A, the contact area of the protruding structure A with the loading device is smaller than the contact area directly placing the loading device on the stage, and the area is as small as possible, so that the dust accumulation probability of the top end of the protruding structure A is small. , to improve the level of the load device, reduce the level of the load device caused by the accumulation of dust The degree is reduced, causing the load device not to be in the same focal length, greatly reducing the cumbersome operation of repeated focusing, and improving the convenience of use of the microscope.
其中, 需要说明的是, 载物装置为载玻片、 载玻片或计数板等装置, 在此 不再——介绍且均在保护范围之内。  It should be noted that the loading device is a device such as a slide glass, a slide glass or a counting plate, and is no longer described and is within the scope of protection.
如图 3和图 4所示, 在第一种实施例中, 第一种基板 B1上设置有多个第一 种凸出结构 A1 , 第一种凸出结构 A1为线状凸起。  As shown in Fig. 3 and Fig. 4, in the first embodiment, the first substrate B1 is provided with a plurality of first protruding structures A1, and the first protruding structures A1 are linear protrusions.
其中, 使多个第一种凸出结构 A1沿第一种基板 B1上的第一种透光区 B01 的长度方向均匀排列。  Wherein, the plurality of first protruding structures A1 are uniformly arranged along the longitudinal direction of the first light transmitting region B01 on the first substrate B1.
在本实施例中,第一种透光区 B01的单侧设置的第一种凸出结构 A1的排数 均为一排。 即第一种透光区 B01的一侧设置的第一种凸出结构 A1的排数为一 排; 第一种透光区 B01的另一侧设置的第一种凸出结构 A1的排数也为一排。 也 可以将第一种透光区 B01的单侧设置的第一种凸出结构 A1的排数设置为多排, 或第一种透光区 B01的一侧设置的第一种凸出结构 A1的排数设置为多排,其另 一侧设置的第一种凸出结构 A1的排数设置为一排, 在此不再详细介绍。  In the present embodiment, the number of rows of the first protruding structures A1 disposed on one side of the first light transmitting region B01 is one row. That is, the number of rows of the first protruding structures A1 disposed on one side of the first light transmitting region B01 is one row; the number of rows of the first protruding structures A1 disposed on the other side of the first light transmitting region B01 Also for a row. It is also possible to set the number of rows of the first protruding structures A1 disposed on one side of the first light transmitting region B01 to a plurality of rows, or the first protruding structure A1 disposed on one side of the first light transmitting region B01. The number of rows is set to multiple rows, and the number of rows of the first protruding structure A1 disposed on the other side is set to one row, which will not be described in detail herein.
如上所述,多个第一种凸出结构 A1沿第一种透光区 B01的长度方向均匀排 歹l , 即第一种透光区 B01的单侧为第一种透光区 B01的长度方向的一侧, 也可 以将第一种凸出结构 A1设置于第一种透光区 B01的宽度边上,仅需确保第一种 凸出结构 A1架设第一种载物装置 C1于第一种透光区 B01上方即可。  As described above, the plurality of first protruding structures A1 are uniformly arranged along the length direction of the first light transmitting region B01, that is, the one side of the first light transmitting region B01 is the length of the first light transmitting region B01. On the side of the direction, the first type of protruding structure A1 may be disposed on the width side of the first type of light transmitting area B01, and it is only necessary to ensure that the first type of protruding structure A1 is erected with the first type of loading device C1. The light transmissive area B01 can be above.
如图 4所示, 第一种凸出结构 A1为支撑片, 支撑片所在平面与第一种透 光区 B01的长度方向垂直。 灰尘由相邻两个支撑片落到第一种基板 B1上, 进 一步减少了支撑片顶端的灰尘积聚量, 继而进一步提高了第一种载物装置 C1 的水平度。  As shown in Fig. 4, the first protruding structure A1 is a supporting piece, and the plane of the supporting piece is perpendicular to the longitudinal direction of the first light transmitting area B01. The dust falls from the adjacent two supporting pieces onto the first substrate B1, which further reduces the amount of dust accumulation at the tip end of the supporting piece, which in turn further improves the level of the first type of loading device C1.
如图 5和图 6所示, 在第二种实施例为另一种凸出结构为线状凸起的实施 例, 第二种基板 B2上设置有多个第二种凸出结构 A2, 第二种凸出结构 A2为线 状凸起。  As shown in FIG. 5 and FIG. 6, in the second embodiment, another embodiment in which the protruding structure is a linear protrusion, the second substrate B2 is provided with a plurality of second protruding structures A2, The two kinds of protruding structures A2 are linear protrusions.
其中, 使多个第二种凸出结构 A2沿第二种基板 B2上的第二种透光区 B02 的长度方向均匀排列。  Wherein, the plurality of second protruding structures A2 are uniformly arranged along the longitudinal direction of the second light transmitting region B02 on the second substrate B2.
第二种透光区 B02的两侧均设置有一个第二种凸出结构 A2。 即在第二种 透光区 B02的一侧设置有一个第二种凸出结构 A2,在第二种透光区 B02的另 一侧设置有一个第二种凸出结构 A2。 本发明实施例提供的第二种基板 B2组 件, 仅需在第二种基板 B2上设置两个第二种凸出结构 A2, 极大的简化了加 工步骤, 进而方便了加工过程, 达到降低加工成本的作用。 A second protruding structure A2 is disposed on both sides of the second light transmitting area B02. In the second One side of the light transmitting area B02 is provided with a second protruding structure A2, and the other side of the second light transmitting area B02 is provided with a second protruding structure A2. The second substrate B2 assembly provided by the embodiment of the invention only needs to provide two second protruding structures A2 on the second substrate B2, which greatly simplifies the processing steps, thereby facilitating the processing process and reducing the processing. The role of cost.
5 如图 6所示, 为了减少第二种凸出结构 A2的顶部面积, 本发明实施例中 的第二种凸出结构 A2为支撑片,支撑片所在平面与第二种透光区 B02的长度 方向平行。  As shown in FIG. 6, in order to reduce the top area of the second protruding structure A2, the second protruding structure A2 in the embodiment of the present invention is a supporting piece, the plane of the supporting piece and the second transparent area B02. The length direction is parallel.
如上所述, 支撑片设置于第二种透光区 B02 的长度方向的两侧, 即第二 种透光区 B02的长度方向的一侧设置有一个支撑片, 第二种透光区 B02的长 10 度方向的另一侧设置有另一个支撑片, 通过将第二种载物装置 C2架设于两个 支撑片之间,确保第二种透光区 B02的光源可以照射于第二种载物装置 C2上。 也可以将第二种凸出结构 A2设置于第二种透光区 B02的宽度边上,仅需确保 第二种凸出结构 A2架设第二种载物装置 C2于第二种透光区 B02上方即可。  As described above, the support piece is disposed on both sides of the second light-transmissive area B02 in the longitudinal direction, that is, one side of the second light-transmissive area B02 in the longitudinal direction is provided with a support piece, and the second light-transmissive area B02 The other side of the 10 degree direction is provided with another support piece. By arranging the second type of loading device C2 between the two support pieces, it is ensured that the light source of the second transparent area B02 can be irradiated to the second type. On the device C2. The second protruding structure A2 can also be disposed on the width side of the second transparent area B02, and only the second protruding structure A2 is required to erect the second type of loading device C2 in the second transparent area B02. Just above.
如图 7和图 8所示, 在第三种实施例中, 第三种基板 B3上设置有多个第 15 三种凸出结构 A3 , 第三种凸出结构 A3为条状凸起。  As shown in Fig. 7 and Fig. 8, in the third embodiment, the third substrate B3 is provided with a plurality of the fifteenth convex structures A3, and the third protruding structure A3 is a strip-shaped projection.
其中,使多个第三种凸出结构 A3沿第三种基板 B3上的第三种透光区 B03 的长度方向均匀排列。  Among them, a plurality of third protruding structures A3 are uniformly arranged along the longitudinal direction of the third light transmitting region B03 on the third substrate B3.
本发明实施例提供的第三种用于显微镜的支撑装置, 仅需在第三种基板 B3上设置两个第三种凸出结构 A3 , 极大的简化了加工步骤, 进而方便了加工 ^0 过程, 达到降低加工成本的作用。  The third supporting device for the microscope provided by the embodiment of the invention only needs to provide two third protruding structures A3 on the third substrate B3, which greatly simplifies the processing steps and facilitates the processing. Process, to reduce the cost of processing.
如图 8所示, 为了提高第三种载物装置 C3在第三种凸出结构 A3上的平 稳性, 本发明实施例中的第三种凸出结构 A3为支撑块, 支撑块的长度方向与 第三种透光区 B03的长度方向平行。  As shown in FIG. 8, in order to improve the stability of the third type of loading device C3 on the third protruding structure A3, the third protruding structure A3 in the embodiment of the present invention is a supporting block, and the length direction of the supporting block It is parallel to the longitudinal direction of the third light transmitting region B03.
如上所述, 支撑块设置于第三种透光区 B03 的长度方向的两侧, 即第三 5 种透光区 B03的长度方向的一侧设置有一个支撑块, 第三种透光区 B03的长 度方向的另一侧设置有另一个支撑块, 通过将第三种载物装置 C3架设于两个 支撑块之间,确保第三种透光区 B03的光源可以照射于第三种载物装置 C3上。 也可以将第三种凸出结构 A3设置于第三种透光区 B03的宽度边上,仅需确保 第三种凸出结构 A3架设第三种载物装置 C3于第三种透光区 B03上方即可。 As described above, the support block is disposed on both sides of the third light-transmissive region B03 in the longitudinal direction, that is, one side of the longitudinal direction of the third five kinds of light-transmitting regions B03 is provided with a support block, and the third light-transmitting region B03 The other side of the length direction is provided with another support block. By arranging the third type of load device C3 between the two support blocks, it is ensured that the light source of the third light-transmitting area B03 can be irradiated to the third type of load. On device C3. It is also possible to arrange the third protruding structure A3 on the width side of the third light transmitting area B03, and only need to ensure The third protruding structure A3 is provided with a third type of loading device C3 above the third light transmitting area B03.
如图 9和图 10所示, 在第四种实施例中, 第四种基板 B4上设置有多个第四 种凸出结构 A4, 第四种凸出结构 A4为点状凸起。  As shown in Fig. 9 and Fig. 10, in the fourth embodiment, the fourth substrate B4 is provided with a plurality of fourth projecting structures A4, and the fourth projecting structure A4 is a dot-like bump.
其中, 使多个第四种凸出结构 A4沿第四种基板 B4上的第四种透光区 B04 5 的长度方向均匀排列。  Wherein, the plurality of fourth protruding structures A4 are uniformly arranged along the longitudinal direction of the fourth light transmitting region B04 5 on the fourth substrate B4.
在本实施例中,第四种透光区 B04的单侧设置的第四种凸出结构 A4的排 数均为一排。即第四种透光区 B04的一侧设置的第四种凸出结构 A4的排数为 一排;第四种透光区 B04的另一侧设置的第四种凸出结构 A4的排数也为一排。 也可以将第四种透光区 B04的单侧设置的第四种凸出结构 A4的排数设置为多 10 排,或第四种透光区 B04的一侧设置的第四种凸出结构 A4的排数设置为多排, 其另一侧设置的第四种凸出结构 A4的排数设置为一排, 在此不再详细介绍。  In the present embodiment, the fourth protruding structure A4 disposed on one side of the fourth light-transmitting region B04 has a row of rows. That is, the number of rows of the fourth protruding structures A4 disposed on one side of the fourth light transmitting region B04 is one row; the number of rows of the fourth protruding structures A4 disposed on the other side of the fourth light transmitting region B04 Also for a row. It is also possible to set the number of rows of the fourth protruding structure A4 disposed on one side of the fourth light transmitting region B04 to be more than 10 rows, or the fourth protruding structure disposed on one side of the fourth light transmitting region B04. The number of rows of A4 is set to multiple rows, and the number of rows of the fourth protruding structure A4 disposed on the other side is set to one row, which will not be described in detail herein.
如上所述,多个第四种凸出结构 A4沿第四种透光区 B04的长度方向均匀 排列, 即第四种透光区 B04的单侧为第四种透光区 B04的长度方向的一侧, 也可以将第四种凸出结构 A4设置于第四种透光区 B04的宽度边上,仅需确保 15 第四种凸出结构 A4架设第四种载物装置 C4于第四种透光区 B04上方即可。  As described above, the plurality of fourth protruding structures A4 are uniformly arranged along the length direction of the fourth light transmitting region B04, that is, the one side of the fourth light transmitting region B04 is the length direction of the fourth light transmitting region B04. On one side, the fourth protruding structure A4 can also be disposed on the width side of the fourth light transmitting area B04, and only need to ensure that the first protruding structure A4 is erected with the fourth type of loading device C4 in the fourth type. The light transmissive area B04 can be above.
如图 10所示, 第四种凸出结构 A4为支撑针。 由于支撑针的顶部面积较 小, 且灰尘易从相邻两个支撑针的缝隙落到第四种基板 B4上, 进一步减少了 支撑针顶端的灰尘积聚量, 继而进一步提高了第四种载物装置 C4的水平度。  As shown in Fig. 10, the fourth projecting structure A4 is a support pin. Since the top area of the support pin is small, and the dust easily falls from the gap between the adjacent two support pins to the fourth substrate B4, the amount of dust accumulation at the tip of the support pin is further reduced, and the fourth load is further improved. The level of the device C4.
如图 11所示, 第五种实施例中, 也可以将第五种凸出结构 A5设置为锥 ^0 状凸起, 即把上述点状凸起的直径扩大形成锥状凸起, 设置于第五种基板 B5 上, 以便于将第五种载物装置 C5设置于第五种凸出结构 A5上, 同样可以达 到上述技术效果;  As shown in FIG. 11 , in the fifth embodiment, the fifth protruding structure A5 may be disposed as a cone-shaped protrusion, that is, the diameter of the point-like protrusion is enlarged to form a tapered protrusion, and is disposed on On the fifth substrate B5, in order to arrange the fifth type of loading device C5 on the fifth protruding structure A5, the above technical effects can also be achieved;
如图 12所述, 第六种实施例中, 还可以将第六种凸出结构 A6设置为柱 状凸起, 即把上述点状凸起的直径扩大形成柱状凸起, 设置于第六种基板 B6 ^5 上, 以便于将第六种载物装置 C6设置于第六种凸出结构 A6上, 同样可以达 到上述技术效果。  As shown in FIG. 12, in the sixth embodiment, the sixth protruding structure A6 may be disposed as a columnar protrusion, that is, the diameter of the point protrusion is enlarged to form a columnar protrusion, and is disposed on the sixth substrate. On B6^5, in order to set the sixth type of loading device C6 on the sixth protruding structure A6, the above technical effects can also be achieved.
其中需要说明的是, 也可以不在基板上设置透光区, 使其整个为透明, 仅 需确保其透光性即可。 对于点状凸起、 线状凸起、 锥状凸起或柱状凸起, 也可 以设置在透光区。 It should be noted that the light-transmissive region may not be disposed on the substrate, so that the whole is transparent, and only the light transmittance is required. For point protrusions, linear protrusions, tapered protrusions or columnar protrusions, To set in the light transmission area.
凸出结构 A与基板为一体式结构。 通过注塑或压塑等方式将凸出结构 A 与基板整体加工, 并固定设置于基板上, 形成用于显微镜的支撑装置。 有效地 简化了本发明实施例提供的用于显微镜的支撑装置的加工过程。  The protruding structure A and the substrate are of a unitary structure. The protruding structure A is integrally processed with the substrate by injection molding or compression molding, and fixedly disposed on the substrate to form a supporting device for the microscope. The processing of the support device for a microscope provided by the embodiment of the present invention is effectively simplified.
5 如图 13所示, 本发明实施例还提供了一种显微镜, 包括位于显微镜载物 台上用于显微镜的支撑装置,用于显微镜的支撑装置为如上述任一种的用于显 微镜的支撑装置。 由于上述用于显微镜的支撑装置具有上述技术效果, 具有上 述用于显微镜的支撑装置的显微镜也应具有同样的技术效果,在此不再详细介 绍。  5, as shown in FIG. 13, an embodiment of the present invention further provides a microscope, comprising a support device for a microscope on a microscope stage, and the support device for the microscope is a support for the microscope as any of the above. Device. Since the above-described support device for a microscope has the above-described technical effects, the microscope having the above-described support device for the microscope should also have the same technical effect, and will not be described in detail herein.
10 进一步地, 将用于显 镜的支撑装置装配在显 镜载物台上。  10 Further, the support device for the display is mounted on the display stage.
凸出结构 A设置于基板的顶面; 基板的底面与载物台本体 B的顶面固定 连接。 通过将凸出结构 A设置于基板上, 再将基板整体安装于载物台本体 B 的顶面, 以便于加工及凸出结构 A相对于基板的布置。  The protruding structure A is disposed on the top surface of the substrate; the bottom surface of the substrate is fixedly connected to the top surface of the stage body B. By arranging the protruding structure A on the substrate, the substrate is integrally mounted on the top surface of the stage body B to facilitate processing and projecting the arrangement of the structure A with respect to the substrate.
基板与载物台本体 B 的透光区对应的部分为透明结构, 其可以为在基板 15 上加工与透光区对应布置的镂空结构,也可以为在基板上加工与透光区对应布 置的透明板结构,还可以将基板整体加工为透明板,在此不再——介绍且均在 保护范围之内。  The portion of the substrate corresponding to the light-transmitting region of the carrier body B is a transparent structure, which may be a hollow structure disposed on the substrate 15 corresponding to the light-transmitting region, or may be disposed on the substrate corresponding to the light-transmitting region. The transparent plate structure can also process the whole substrate into a transparent plate, which is no longer introduced and is within the scope of protection.
进一步地, 用于显微镜的支撑装置与显微镜一体成型。  Further, the support device for the microscope is integrally formed with the microscope.
进一步地,本发明实施例提供的显微镜还包括与用于显微镜的支撑装置对 ^0 应布置的载物装置传送机构。 通过载物装置传送机构将载物装置 C 向基板方 向, 确保载物装置 C设置于凸出结构 A上, 有效地提高了检测效率, 尤其适 用于批量检测的操作。  Further, the microscope provided by the embodiment of the present invention further includes a carrier transport mechanism that should be disposed with respect to the support device for the microscope. The carrier device C is directed to the substrate by the carrier transport mechanism to ensure that the carrier device C is disposed on the protruding structure A, which effectively improves the detection efficiency, and is particularly suitable for the operation of batch detection.
在本实施例中, 载物装置传送机构包括: 用于传送载物装置的传送带 1 ; 设置于传送带 1的输出端, 用于容纳载物装置 C的容纳槽 5; 设置于容纳槽 5 5 内, 沿用于显微镜的支撑装置的载物台本体 B的长度方向布置的推动杆 7; 设 置于推动杆 7与用于显微镜的支撑装置之间, 用于引导载物装置 C放置于基 板的凸出结构 A上的定位滑槽 9。  In this embodiment, the carrier device transport mechanism includes: a conveyor belt 1 for transporting the load device; an output end of the conveyor belt 1 for accommodating the accommodating groove 5 of the load device C; a push rod 7 disposed along a length direction of the stage body B of the support device for the microscope; disposed between the push rod 7 and the support device for the microscope for guiding the projection of the load device C on the substrate Positioning chute 9 on structure A.
如图 1、 图 2和图 13所示, 在本发明实施例提供的显 镜中, 传送带 1 设置于机架 2的一侧, 机架 2的另一侧设置有载物装置存放盒 3 , 载物装置 C 由传送带 1传送至传送带 1的输出端, 落入容纳槽 5, 通过设置于容纳槽 5内 的推动杆 7推动载物装置 C移动到定位滑槽 9中, 并在定位滑槽 9的引导下 向载物台本体 B移动, 最终置于载物台本体 B的凸出结构 A上; 将摄像机 6As shown in FIG. 1 , FIG. 2 and FIG. 13 , in the display mirror provided by the embodiment of the present invention, the conveyor belt 1 It is disposed on one side of the frame 2, and the other side of the frame 2 is provided with a load device storage box 3, and the load device C is transported by the conveyor belt 1 to the output end of the conveyor belt 1, and falls into the receiving groove 5, and is arranged to be accommodated The push rod 7 in the slot 5 pushes the carrier device C into the positioning chute 9 and moves to the stage body B under the guidance of the positioning chute 9, and finally is placed on the protruding structure A of the stage body B. On; will camera 6
5 设置于适配接口 4内, 调整聚光镜 10的反光角度及物镜 8到载物装置 C的距 离, 以便于在摄像机 6 内成像。 其中, 摄像机优选为 CCD ( Charge-coupled Device, 电荷耦合元件)摄像机, 也可以在适配接口 4内安装目镜,人工观察。 5 Set in the adapter interface 4, adjust the reflection angle of the condenser 10 and the distance from the objective lens 8 to the carrier device C to facilitate imaging in the camera 6. The camera is preferably a CCD (Charge-coupled Device) camera, or an eyepiece can be installed in the adapter interface 4 for manual observation.
其中, 基板固定于载物台本体 B上, 使得凸出结构 A相对于载物台本体 B固定不动。 在对焦调整过程中, 载物装置 C相对于凸出结构 A固定不动, The substrate is fixed to the stage body B such that the protruding structure A is fixed relative to the stage body B. During the focus adjustment process, the carrier device C is fixed relative to the protruding structure A,
10 通过载物台本体 B沿 X方向和 Y方向的运动完成载物装置 C相对于显 镜的 物镜 8的调整; 也可以将载物装置 C沿 X方向运动, 并结合载物台本体 B沿 Y方向的运动完成载物装置 C相对于显微镜的物镜 8的调整; 还可以将载物 装置 C沿 Y方向运动, 并结合载物台本体 B沿 X方向的运动完成载物装置 C 相对于显微镜的物镜 8的调整。 10 The movement of the object device C relative to the objective lens 8 of the dynamoscope is completed by the movement of the stage body B in the X direction and the Y direction; the carrier device C can also be moved in the X direction and combined with the stage body B along the stage The movement in the Y direction completes the adjustment of the objective device C relative to the objective lens 8 of the microscope; it is also possible to move the carrier device C in the Y direction and combine the movement of the stage body B in the X direction to complete the carrier device C relative to the microscope. Adjustment of the objective lens 8.
15 本发明实施例还提供了一种显微镜载物台,将多个凸出结构 A直接设置于 载物台本体 B上, 凸出结构 A用于与载物装置接触的顶端位于同一水平面上。 由于上述显微镜载物台具有多个凸出结构 A且凸出结构 A用于与载物装置接 触的顶端位于同一水平面上,因此具有与上述用于显微镜的支撑装置同样的技 术效果, 在此不再详细介绍。  The embodiment of the present invention further provides a microscope stage, wherein a plurality of protruding structures A are directly disposed on the stage body B, and the protruding structure A is located at the same level on the top end of the contact with the loading device. Since the microscope stage has a plurality of protruding structures A and the protruding structure A is located on the same horizontal surface with the tip end in contact with the loading device, it has the same technical effect as the above-mentioned supporting device for the microscope, and is not More details.
^0 优选将载物台本体 B与凸出结构 A设置为一体式结构。 即通过注塑或压 塑等方式将凸出结构 A与载物台本体 B整体加工, 形成用于显微镜的支撑装 置,进而达到简化本发明实施例提供的用于显 镜的支撑装置的加工过程的作 用。  ^0 Preferably, the stage body B and the protruding structure A are arranged in a unitary structure. That is, the protruding structure A and the stage body B are integrally processed by injection molding or compression molding to form a supporting device for the microscope, thereby simplifying the processing of the supporting device for the illuminating mirror provided by the embodiment of the present invention. effect.
在另一实施例中, 也可以不采用滑槽的形式, 如图 14所示, 载物装置 C ^5 载物装置底部两边设有导向凸块 CO,导向凸块 CO和支撑装置结合,从而对载 物装置 C进行导向。 其中, 凸出结构 A位于载物台本体 B上。  In another embodiment, the form of the chute may not be used. As shown in FIG. 14, the bottom of the bottom of the loading device C^5 is provided with a guiding protrusion CO, and the guiding protrusion CO is combined with the supporting device, thereby The carrier device C is guided. The protruding structure A is located on the stage body B.
本发明实施例还提供了一种具有上述显微镜载物台的显微镜,由于上述显 微镜载物台具有上述技术效果,具有上述显微镜载物台的显微镜也应具有同样 的技术效果, 在此不再详细介绍。 由于凸出结构 A直接设置于载物台本体 B上, 使得凸出结构 A相对于载 物台本体 B固定不动。 其对焦调整过程如上述所述, 在此不再——介绍。 The embodiment of the present invention further provides a microscope having the above microscope stage. Since the microscope stage has the above technical effects, the microscope having the microscope stage should have the same technical effect, and the details are not detailed here. Introduction. Since the protruding structure A is directly disposed on the stage body B, the protruding structure A is fixed with respect to the stage body B. The focus adjustment process is as described above, and is no longer described here.
本说明书中各个实施例采用递进的方式描述,每个实施例重点说明的都是 与其他实施例的不同之处, 各个实施例之间相同相似部分互相参见即可。  The various embodiments in the present specification are described in a progressive manner, and each embodiment focuses on differences from other embodiments, and the same similar parts between the various embodiments can be referred to each other.
对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本 发明。 对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见 的, 本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下, 在 其它实施例中实现。 因此, 本发明将不会被限制于本文所示的这些实施例, 而 是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。  The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments are obvious to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the present invention is not to be limited to the embodiments shown herein, but is to be accorded to the broadest scope of the principles and novel features disclosed herein.

Claims

权 利 要 求 Rights request
1、 一种用于显微镜的支撑装置, 用于支撑载物装置, 其特征在于, 所述支撑装置包括基板及设置于其上的多个凸出结构, 1. A support device for a microscope, used to support a carrier device, characterized in that the support device includes a base plate and a plurality of protruding structures provided on it,
5 所述凸出结构用于与所述载物装置接触的顶端位于同一水平面上。 5 The top end of the protruding structure for contacting the loading device is located on the same horizontal plane.
2、 如权利要求 1所述的用于显微镜的支撑装置, 其特征在于, 所述凸出 结构为线状凸起。 2. The support device for a microscope according to claim 1, wherein the protruding structure is a linear protrusion.
3、 如权利要求 1所述的用于显微镜的支撑装置, 其特征在于, 所述凸出 结构为条状凸起。 3. The support device for a microscope according to claim 1, wherein the protruding structure is a strip-shaped protrusion.
10 4、 如权利要求 1所述的用于显微镜的支撑装置, 其特征在于, 所述凸出 结构为点状凸起。 104. The support device for a microscope according to claim 1, wherein the protruding structure is a point-shaped protrusion.
5、 如权利要求 1所述的用于显微镜的支撑装置, 其特征在于, 所述凸出 结构为锥状凸起。 5. The support device for a microscope according to claim 1, wherein the protruding structure is a cone-shaped protrusion.
6、 如权利要求 1所述的用于显微镜的支撑装置, 其特征在于, 所述凸出 15 结构为柱状凸起。 6. The support device for a microscope according to claim 1, wherein the protruding structure is a columnar protrusion.
7、 一种显微镜, 其特征在于, 包括位于显微镜载物台上用于显微镜的支 撑装置,所述用于显微镜的支撑装置为如权利要求 1-6任意一项所述用于显微 镜的支撑装置。 7. A microscope, characterized in that it includes a support device for a microscope located on a microscope stage, and the support device for a microscope is a support device for a microscope as described in any one of claims 1-6 .
8、 如权利要求 7所述的显微镜, 其特征在于, 所述用于显微镜的支撑装 ^0 置装配在显 镜载物台上。 8. The microscope according to claim 7, wherein the supporting device for the microscope is mounted on a microscope stage.
9、 如权利要求 7所述的显微镜, 其特征在于, 所述用于显微镜的支撑装 置与显微镜一体成型。 9. The microscope according to claim 7, characterized in that the support device for the microscope is integrally formed with the microscope.
10、 一种显微镜载物台, 用于支撑载物装置, 其特征在于, 包括载物台本 体及设置于所述载物台本体上的多个凸出结构,所述凸出结构用于与载物装置 5 接触的顶端位于同一水平面上。 10. A microscope stage used to support a carrier device, characterized in that it includes a stage body and a plurality of protruding structures provided on the stage body, and the protruding structures are used to communicate with the stage body. The contact tops of the loading device 5 are located on the same horizontal plane.
11、 一种显微镜, 包括显微镜载物台, 其特征在于, 所述显微镜载物台为 如权利要求 10所述的显微镜载物台。 11. A microscope, including a microscope stage, characterized in that the microscope stage is the microscope stage as claimed in claim 10.
PCT/CN2014/072346 2013-12-31 2014-02-21 Supporting apparatus for microscope, microscope, and microscope carrier WO2015100848A1 (en)

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