WO2015093171A1 - Dispositif de mesure de la distribution de l'intensité lumineuse, dispositif de dessin et procédé de mesure de distribution d'intensité lumineuse - Google Patents

Dispositif de mesure de la distribution de l'intensité lumineuse, dispositif de dessin et procédé de mesure de distribution d'intensité lumineuse Download PDF

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Publication number
WO2015093171A1
WO2015093171A1 PCT/JP2014/079361 JP2014079361W WO2015093171A1 WO 2015093171 A1 WO2015093171 A1 WO 2015093171A1 JP 2014079361 W JP2014079361 W JP 2014079361W WO 2015093171 A1 WO2015093171 A1 WO 2015093171A1
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WO
WIPO (PCT)
Prior art keywords
light
linear
irradiation
irradiation surface
transmission region
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PCT/JP2014/079361
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English (en)
Japanese (ja)
Inventor
北村　藤和
小久保　正彦
Original Assignee
株式会社Ｓｃｒｅｅｎホールディングス
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Publication of WO2015093171A1 publication Critical patent/WO2015093171A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0437—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using masks, aperture plates, spatial light modulators, spatial filters, e.g. reflective filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G01J2001/4261—Scan through beam in order to obtain a cross-sectional profile of the beam

Definitions

  • the present invention relates to a technique for measuring a light amount distribution of linear light and a drawing apparatus using the technique.
  • a drawing apparatus direct drawing type pattern drawing apparatus
  • a substrate such as a semiconductor substrate or a glass substrate provided with a photosensitive material
  • linear light is irradiated to a diffraction grating type spatial light modulator, and the spatially modulated light is guided onto the substrate.
  • the amount of signal light corresponding to each light modulation element of a light modulation device provided with a plurality of light modulation elements is acquired by a line sensor, A correction parameter for correcting the output light amount of each light modulation element is corrected.
  • the acquisition of the light amount of the signal light and the correction of the correction parameter are repeated until the variation in the light amount of the signal light is within the allowable range.
  • Reference 1 also discloses a method of acquiring the amount of signal light corresponding to each light modulation element while moving the slit.
  • the pattern drawn on the substrate has been miniaturized, and the number of light modulation elements provided in the spatial light modulator has also increased (for example, in a diffraction grating type spatial light modulator, 8000). Therefore, when the line sensor is used when acquiring the light amount distribution of the linear light, it is not easy to position the linear light irradiation area and the line sensor. Further, when the area corresponding to one light modulation element is smaller than one detection element on the light receiving surface of the line sensor, the resolution in measuring the light amount distribution of the linear light becomes insufficient. In order to facilitate positioning with the irradiation area of the linear light, it may be possible to use an area sensor in which detection elements are arranged two-dimensionally instead of the line sensor, but to improve the resolution in measuring the light quantity distribution. It is difficult.
  • the present invention is directed to a light amount distribution measuring apparatus for measuring a light amount distribution of linear light, and has an object of repeatedly measuring the light amount distribution of linear light with a simple configuration with high accuracy.
  • the light quantity distribution measuring apparatus has an irradiation surface to which the linear light from the head unit that emits linear light is irradiated, and the irradiation surface that is a plane is centered on an axis perpendicular to the plane.
  • the area element passes through a plurality of different positions of the linear irradiation area of the linear light on the irradiation surface at different timings, and the amount of light received by the light transmitted through each transmission area element of the mask section A measurement unit.
  • the plurality of transmission region elements are included in the linear transmission region.
  • the linear transmission region passes through all positions of the linear irradiation region.
  • another linear transmission region similar to the linear transmission region is formed on the irradiation surface, and the rotation range of the irradiation surface is such that the linear transmission region passes through the linear irradiation region.
  • the angle range in which the other linear transmission region passes through the linear irradiation region may be different.
  • the linear light from another head unit that emits linear light is irradiated onto the irradiation surface, and a light amount distribution measuring device is configured to transmit the line from the other head unit.
  • a light quantity measurement unit that receives light transmitted through each of the transmission region elements of the mask unit is further included.
  • the present invention is also directed to a drawing apparatus.
  • the drawing apparatus according to the present invention is directed to an emission unit that emits linear light, a spatial light modulator that is irradiated with the linear light from the emission unit, and light that is spatially modulated by the spatial light modulator.
  • a projection optical system for guiding the light onto the object, a moving mechanism for moving the irradiation position of the spatially modulated light on the object, and controlling the spatial light modulator in synchronization with the movement of the irradiation position by the moving mechanism A control unit; and the light amount distribution measuring device on which the linear light is incident via the spatial light modulator and the projection optical system when measuring the light amount distribution of the linear light on an object.
  • the present invention is also directed to a light amount distribution measuring method for measuring a light amount distribution of linear light.
  • the light quantity distribution measuring method according to the present invention includes: a) emitting linear light from the head part and irradiating the irradiation surface of the mask part with the linear light; and b) the irradiation surface being a plane as the plane. By rotating about an axis perpendicular to the rotation surface, or by rotating the irradiation surface, which is at least part of a rotation surface that is a cylindrical surface or a conical surface, about the central axis of the rotation surface.
  • FIG. 1 It is a figure which shows the structure of the drawing apparatus which concerns on 1st Embodiment. It is a figure which shows the internal structure of a head part. It is a figure which shows a some head part and a some light quantity distribution measuring apparatus. It is a figure which shows a light quantity distribution measuring apparatus. It is a figure which shows the slit on an irradiation surface. It is a figure which shows the flow of the process which correct
  • FIG. 1 is a diagram showing a configuration of a drawing apparatus 1 according to the first embodiment of the present invention.
  • the drawing apparatus 1 is a direct drawing apparatus that draws a pattern by irradiating the surface of a substrate 9 such as a semiconductor substrate or a glass substrate, to which a photosensitive material is applied, with a light beam.
  • a substrate 9 such as a semiconductor substrate or a glass substrate
  • a photosensitive material is applied, with a light beam.
  • FIG. 1 the X, Y, and Z directions orthogonal to each other are indicated by arrows.
  • the drawing apparatus 1 includes a stage 21, a moving mechanism 22, a plurality of head units 3, a plurality of light quantity distribution measuring devices 4, and a control unit 11.
  • the stage 21 holds the substrate 9.
  • the moving mechanism 22 is provided on the base 20 and includes an X-direction moving mechanism 221 and a Y-direction moving mechanism 222.
  • the stage 21 is fixed to a moving body of the X direction moving mechanism 221, and the stage 21 moves in the X direction along the main surface of the substrate 9 by the X direction moving mechanism 221.
  • the X direction moving mechanism 221 is fixed to the moving body of the Y direction moving mechanism 222, and the Y direction moving mechanism 222 moves the X direction moving mechanism 221 in the Y direction along the main surface of the substrate 9.
  • the moving mechanism 22 may rotate the substrate 9 about an axis perpendicular to the main surface (an axis extending in the Z direction in FIG. 1).
  • a support base 30 is provided on the base 20 so as to straddle the moving mechanism 22.
  • the plurality of head portions 3 are fixed to the support base 30 and arranged in the X direction above the stage 21.
  • the plurality of light quantity distribution measuring devices 4 are fixed to the moving body of the Y direction moving mechanism 222 and move in the Y direction together with the stage 21. With respect to the X direction, the plurality of light quantity distribution measuring devices 4 are arranged at the same positions as the plurality of head units 3, respectively. Details of the light quantity distribution measuring device 4 will be described later.
  • FIG. 2 is a diagram showing an internal configuration of the head unit 3.
  • the head unit 3 includes an emitting unit 31, a spatial light modulator 32, and a projection optical system 33.
  • the emitting unit 31 emits linear light and irradiates the spatial light modulator 32 with the linear light via the mirror 39.
  • the spatial light modulator 32 is, for example, a diffraction grating type and a reflection type, and is a diffraction grating capable of changing the depth of the grating.
  • the spatial light modulator 32 is manufactured using a semiconductor device manufacturing technique.
  • the diffraction grating type optical modulator used in the present embodiment is, for example, GLV (Grating Light Valve) (registered trademark of Silicon Light Machines (Sunnyvale, Calif.)).
  • the spatial light modulator 32 has a plurality of grating elements (ribbon pairs) arranged in a line, and each grating element emits first-order diffracted light and zero-order diffracted light (0th-order light). Transition between states. In this way, the spatially modulated light is emitted from the spatial light modulator 32.
  • one grating element is referred to as “light modulation element”.
  • Several lattice elements adjacent to each other may be regarded as one light modulation element.
  • the projection optical system 33 includes a light shielding plate 331, a lens 332, a lens 333, a diaphragm plate 334, and a focusing lens 335.
  • the light shielding plate 331 shields part of the ghost light and the high-order diffracted light and allows the light from the spatial light modulator 32 to pass through.
  • the lenses 332 and 333 constitute a zoom unit.
  • the diaphragm plate 334 shields the ( ⁇ 1) order diffracted light (and higher order diffracted light) and allows the 0th order diffracted light to pass through.
  • the light that has passed through the diaphragm plate 334 is guided onto the main surface of the substrate 9 by the focusing lens 335.
  • the diaphragm plate 334 may block only the 0th order diffracted light and allow the ( ⁇ 1) order diffracted light (and higher order diffracted light) to pass therethrough.
  • the drawing apparatus 1 is connected to a plurality of head units 3, a moving mechanism 22, and a plurality of light quantity distribution measuring devices 4, and controls these configurations.
  • the moving mechanism 22 moves the stage 21, the irradiation position on the substrate 9 of the light from the spatial light modulator 32 moves.
  • the control unit 11 controls the spatial light modulator 32 in synchronization with the movement of the irradiation position by the moving mechanism 22. Thereby, a desired pattern is drawn on the photosensitive material on the substrate 9.
  • FIG. 3 is a diagram showing a state in which the plurality of head units 3 and the plurality of light quantity distribution measuring devices 4 are viewed from the ( ⁇ Y) side toward the (+ Y) direction.
  • the plurality of light quantity distribution measuring devices 4 in the X direction are arranged at the same positions as the plurality of head units 3, respectively.
  • the plurality of light amount distribution measuring devices 4 are moved in the Y direction by the moving mechanism 22 and are respectively disposed directly below the plurality of head units 3. .
  • the linear light that has passed through the spatial light modulator 32 and the projection optical system 33 in each head unit 3 is incident on the light amount distribution measuring device 4 that is disposed directly below the head unit 3.
  • FIG. 4 is a diagram showing a state in which one light quantity distribution measuring device 4 is viewed from the ( ⁇ X) side in the (+ X) direction.
  • each light quantity distribution measuring device 4 includes a mask part 41, a light quantity measuring part 42, and a motor 43.
  • the mask portion 41 has a cylindrical shape with a lid, and a shaft of a motor 43 that is a rotation mechanism is connected to the center of the lid portion 411.
  • the mask part 41 is made of metal, for example.
  • the motors 43 of the plurality of light quantity distribution measuring devices 4 are fixed with respect to one support part 40.
  • the support part 40 is fixed to the moving body of the Y-direction moving mechanism 222 described above.
  • the outer peripheral surface 412 of the mask portion 41 is a cylindrical surface centered on the central axis J1.
  • the linear light from the head unit 3 is irradiated on the outer peripheral surface 412 along the optical axis J2 of the projection optical system 33 (see FIG. 2).
  • the outer peripheral surface 412 is referred to as an “irradiation surface 412”.
  • the optical axis J2 and the central axis J1 are arranged on the same plane.
  • a linear irradiation region 415 of linear light on the irradiation surface 412 is parallel to the central axis J1. 3 and 4, the linear irradiation region 415 is indicated by a thick solid line.
  • the linear irradiation region 415 is formed at the uppermost portion 413 (the most (+ Z) side portion) of the irradiation surface 412.
  • the uppermost part 413 of the irradiation surface 412 has the same height as the main surface of the substrate 9 which is the drawing surface. That is, the uppermost part 413 of the irradiation surface 412 is a position equivalent to the drawing surface in the drawing apparatus 1.
  • the irradiation surface 412 is formed with slits 414 that are linear through holes.
  • the slit 414 extends in a direction inclined with respect to the central axis J1 and the linear irradiation region 415.
  • the light quantity measuring unit 42 is disposed inside the mask unit 41 between the head unit 3 and the central axis J1. That is, the light quantity measuring unit 42 is disposed between the uppermost part 413 of the irradiation surface 412 and the central axis J1.
  • the light quantity measuring unit 42 is disposed close to the inner peripheral surface of the mask unit 41.
  • the light quantity measuring unit 42 has a light receiving surface longer than the linear irradiation region 415, and if the mask unit 41 is omitted, almost the entire linear light is received by the light quantity measuring unit 42. Is incident on.
  • the light quantity measurement unit 42 is supported with respect to the support unit 40 by a support member (not shown).
  • a diffusion plate, a lens, or the like may be provided between the light amount measurement unit 42 and the mask unit 41 as necessary.
  • FIG. 5 is a view showing the slit 414 in a state where the irradiation surface 412 is developed.
  • the linear irradiation region 415 is also illustrated, and the linear irradiation region 415 is indicated by parallel oblique lines.
  • the vertical direction in FIG. 5 corresponds to the circumferential direction centering on the central axis J1
  • the horizontal direction in FIG. 5 is the X direction.
  • the slit 414 is linear, and the position in the X direction changes as the position in the circumferential direction changes.
  • the slits 414 that are linear transmission regions are regarded as a set of a plurality of transmission region elements that are continuously arranged in a line
  • the plurality of transmission region elements are arranged at different positions in both the X direction and the circumferential direction.
  • the linear light irradiated on the irradiation surface 412 only the light passing through the slit 414 enters the mask portion 41 and is guided to the light amount measuring portion 42.
  • the linear light is partially cut out by a part of the slit 414 that passes through the uppermost part 413, and the cut-out light is received by the light quantity measuring unit 42.
  • cutout region 419 a region 419 where the slit 414 and the linear irradiation region 415 overlap (hereinafter referred to as “cutout region 419”) is surrounded by a thick solid line and is internally cross-hatched.
  • the shape of the cutout region 419 in FIG. 5 is a parallelogram.
  • FIG. 6 is a diagram showing a flow of processing for correcting the light amount distribution of the linear light from the head unit 3 using the light amount distribution measuring device 4.
  • emission of linear light from the head unit 3 is started by setting all the light modulation elements to emit 0th-order diffracted light by the control unit 11 (step S11).
  • step S11 linear light is irradiated to the irradiation surface 412 of the mask part 41 of FIG. 3, and the linear irradiation area
  • an image of the spatial light modulator 32 is formed on the uppermost part 413 of the irradiation surface 412.
  • a plurality of positions in the X direction (longitudinal direction) in the linear irradiation region 415 correspond to a plurality of light modulation elements in the spatial light modulator 32, respectively. That is, light (0th-order diffracted light) that respectively passes through the plurality of light modulation elements of the spatial light modulator 32 is irradiated to a plurality of positions in the linear irradiation region 415.
  • the correction parameter values are individually set for all the light modulation elements, and the output light amount from each light modulation element is adjusted according to the correction parameter values.
  • step S12 rotation of the mask unit 41 is started by driving the motor 43 (step S12).
  • the irradiation surface 412 which is a cylindrical surface rotates around the central axis J1 at a high speed (for example, at a rotation speed of several hundred rpm), and the irradiation surface 412 together with the slit 414 in the vertical direction (circumferential direction) in FIG. Move to. Therefore, the cutout region 419 moves continuously in the X direction in the linear irradiation region 415 according to the rotation angle of the irradiation surface 412.
  • the light amount of the light transmitted through the slit 414 of the mask unit 41 is repeatedly measured by the light amount measuring unit 42 (step S13).
  • the light amounts output from the plurality of light modulation elements are sequentially acquired by the single light amount measuring unit 42 according to the rotation angle of the irradiation surface 412.
  • the light quantity acquired by the light quantity measuring unit 42 is referred to as “measured light quantity”.
  • an ideal light amount distribution for accurately drawing a pattern on the substrate 9 is acquired in advance, and the measurement light amount corresponding to each light modulation element is irradiated with light from the light modulation element. Compared to an ideal light amount distribution at a certain position (hereinafter referred to as “ideal light amount”). Then, in the light modulation element in which the difference between the measurement light quantity and the ideal light quantity (absolute value of the difference) is larger than a predetermined threshold value, the value of the correction parameter for correcting the output light quantity of the light modulation element is corrected (step). S14, S15). For example, when the measured light amount is smaller than the ideal light amount, the correction parameter value is corrected to a larger value in order to increase the output light amount.
  • the correction parameter value is corrected to a smaller value in order to reduce the output light quantity.
  • the amount of light (0th-order diffracted light) actually output from each light modulation element also changes according to the corrected correction parameter value.
  • the value of the correction parameter is not corrected (may be corrected) in the light modulation element in which the difference between the measured light amount and the ideal light amount is equal to or less than the threshold value.
  • the measurement light quantity of each light modulation element is acquired (without waiting for acquisition of the measurement light quantity of other light modulation elements), the measurement light quantity and the ideal light quantity are compared, and light is emitted as necessary.
  • the value of the correction parameter of the modulation element is corrected. That is, the measurement light quantity acquisition in step S13 and the correction parameter value correction in step S15 are performed partially in parallel in the plurality of light modulation elements. Then, when the mask portion 41 rotates once and the cutout region 419 is arranged at the irradiation position of the light from the light modulation element, the measurement light quantity of the light modulation element is acquired (step S13). In the light modulation element in which the difference between the measured light amount and the ideal light amount is larger than the threshold value, the correction parameter value is corrected (steps S14 and S15).
  • steps S13 and S15 are repeated until the difference between the measured light quantity and the ideal light quantity is less than or equal to the threshold value in all the light modulation elements (step S14).
  • the mask unit 41 is continuously rotated, so that the measured light quantity is acquired in step S13 for each position of the linear irradiation region 415 in the immediately preceding step S13. It becomes possible to carry out in a short time from acquisition of the measurement light quantity.
  • step S14 When the difference between the measured light amount and the ideal light amount is less than or equal to the threshold value in all the light modulation elements (step S14), the rotation of the mask unit 41 is stopped (step S16). Further, all the light modulation elements are in a state of emitting the first-order diffracted light, and the emission of the linear light from the head unit 3 is stopped (step S17). Thereby, the process which correct
  • the length of the slit 414, the length of the irradiation surface 412 in the circumferential direction, and the area of the cutout region 419 will be described with reference to FIG.
  • the length of the linear irradiation region 415 in the longitudinal direction is L
  • the width in the circumferential direction (beam width) is W
  • the width of the slit 414 is S
  • the inclination of the slit 414 with respect to the X direction is ⁇ .
  • any position of the slit 414 passes through each position of the linear irradiation region 415, that is, the length m of the slit 414 is (L / cos ⁇ ).
  • the length P of the slit 414 in the circumferential direction around the central axis J1 is expressed as (m ⁇ sin ⁇ ). Therefore, the length (circumference) of the irradiation surface 412 in the circumferential direction needs to be not less than (m ⁇ sin ⁇ ).
  • the width k in the X direction of each right triangle is expressed as (W / tan ⁇ )
  • the width n in the X direction of the rectangle is It is expressed as ( ⁇ k + (S / sin ⁇ ))
  • the area A of the cutout region 419 is expressed as ((k + n) ⁇ W).
  • the linear irradiation region 415 is provided. It is possible to measure the amount of light transmitted through the cut-out region 419 having an area A constant ((k + n) ⁇ W) at almost all positions.
  • 8000 light modulation elements are densely arranged in a predetermined arrangement direction in the spatial light modulator 32.
  • the width of each light modulation element in the arrangement direction is 5 micrometers ( ⁇ m), and linear light long in the arrangement direction is irradiated to the plurality of light modulation elements.
  • the width of the linear light in the direction perpendicular to the arrangement direction is 15 ⁇ m.
  • images of a plurality of light modulation elements are formed on the main surface of the substrate 9 by 0th-order diffracted light from the spatial light modulator 32 at a magnification of 0.2 times.
  • the length L in the X direction (longitudinal direction) of the linear irradiation region 415 on the drawing surface is 8000 ⁇ m
  • the width W in the Y direction is 3 ⁇ m.
  • the image of one light modulation element, that is, the width of one pixel is 1 ⁇ m.
  • the width S of the slit 414 in the mask portion 41 is 5 ⁇ m, and the inclination ⁇ of the slit 414 with respect to the X direction is 60 degrees.
  • the length m of the slit 414 is 16000 ⁇ m or more, it is possible to measure the light amount distribution in the entire linear irradiation region 415.
  • the length P of the irradiation surface 412 in the circumferential direction needs to be 13856 ⁇ m or more.
  • the width k in the X direction of each right triangle is 1.73 ⁇ m
  • the width n in the X direction of the rectangle is 4.04 ⁇ m. It is. Therefore, the area A of the cutout region 419 is 17.32 ⁇ m 2 .
  • one cutout area 419 has a width corresponding to several pixels, a measurement light quantity that exactly corresponds to one light modulation element is not necessarily acquired. Therefore, for example, the light amount acquired when the center of the cutout region 419 is located at the irradiation position corresponding to each light modulation element in the linear irradiation region 415 is treated as the measurement light amount of the light modulation element, and the light modulation is performed. The value of the measurement parameter of the element is modified. Further, the light amount distribution may be corrected using the same correction parameter value for several light modulation elements, and even in this case, the light amount distribution of the linear light can be corrected with a certain degree of accuracy. is there.
  • the light quantity distribution measuring device 4 includes the mask part 41 having the irradiation surface 412 that is a cylindrical surface, and the light quantity measuring part 42 provided inside the mask part 41.
  • the irradiation surface 412 is irradiated with linear light from the head unit 3 that emits linear light, and the irradiation surface 412 continuously rotates about the central axis J1.
  • the irradiation surface 412 is provided with a slit 414 that is a linear transmission region inclined with respect to the central axis J1.
  • the slit 414 which is a set of a plurality of transmission region elements arranged in a row
  • the plurality of transmission region elements pass through a plurality of different positions of the linear irradiation region 415 at different timings, and transmitted through each transmission region element.
  • Light is received by the light quantity measuring unit 42.
  • the drawing apparatus 1 having the light quantity distribution measuring device 4 can draw a pattern on the substrate 9 with high accuracy.
  • the slit 414 passes through all the positions of the linear irradiation region 415, whereby the light amount distribution of the linear light can be acquired in the entire linear irradiation region 415.
  • the drawing apparatus 1 is provided with a plurality of light quantity distribution measuring devices 4 respectively corresponding to the plurality of head units 3. Thereby, the correction of the light amount distribution of the linear light can be performed in parallel in the plurality of head units 3, and the productivity in the drawing apparatus 1 is improved.
  • FIG. 7 is a view showing another example of the light quantity distribution measuring device 4.
  • a plurality of slits 414 are formed on the irradiation surface 412 of the mask portion 41.
  • the plurality of slits 414 are separated from each other in the circumferential direction with the central axis J1 as the center.
  • each slit 414 which is a set of a plurality of transmission region elements arranged continuously, the plurality of transmission region elements are arranged at different positions in both the direction of the central axis J1 and the circumferential direction.
  • a plurality of slits 414 having the same shape are formed on the irradiation surface 412 as a plurality of linear transmission regions.
  • an angle range in which one slit 414 passes through the linear irradiation region 415 and an angle in which the other slit 414 passes through the linear irradiation region 415 is different (that is, the plurality of slits 414 exist in different ranges in the circumferential direction).
  • the position where the linear irradiation region 415 is formed is not limited to the uppermost part 413 of the irradiation surface 412, and linear irradiation is performed at a position close to the uppermost part 413. Region 415 may be formed. For example, when the thickness of the substrate 9 changes, the stage 21 is moved slightly in the Y direction without moving in the Z direction, so that the linear irradiation region 415 is formed on the irradiation surface 412.
  • FIG. 8 is a perspective view showing a light quantity distribution measuring apparatus 4a according to the second embodiment of the present invention
  • FIG. 9 is a plan view showing a mask portion 41a of the light quantity distribution measuring apparatus 4a.
  • a disc-shaped mask portion 41a centering on the central axis J1 is provided, and the mask portion 41a is rotated about the central axis J1 by the motor 43.
  • the central axis J1 is parallel to the optical axis J2 of the projection optical system 33 (see FIG. 2), and the linear light is linear on the irradiation surface 412 that is the upper surface (upper surface in FIG. 8) of the mask portion 41a.
  • An irradiation region 415 is formed.
  • the irradiation surface 412 is a plane extending perpendicular to the central axis J1 and the optical axis J2, and is disposed at a position equivalent to the drawing surface in the Z direction (the direction of the central axis J1).
  • a light amount measurement unit 42 is provided below the mask unit 41a. When viewed in the ( ⁇ Z) direction from the (+ Z) side, the entire linear irradiation region 415 overlaps with the light receiving surface of the light quantity measuring unit 42. In the mask portion 41a, a spiral slit 414 is formed.
  • FIG. 10 is a diagram showing Archimedean spirals.
  • the slit 414 of the mask portion 41a has a shape obtained by extracting a part of Archimedean spirals (parts continuous in an angle range slightly smaller than 360 degrees) indicated by a broken line in FIG. In FIG. 10, a portion corresponding to the slit 414 is indicated by a solid line.
  • the distance from the central axis J1 changes as the circumferential position around the central axis J1 changes.
  • the slit 414 that is a linear transmission region is regarded as a set of a plurality of transmission region elements arranged in a line continuously, a plurality of transmission region elements are provided in both the radial direction and the circumferential direction centering on the central axis J1. Are arranged at different positions.
  • the linear light irradiated onto the irradiation surface 412 only the light passing through the slit 414 reaches the lower part of the mask part 41 and is guided to the light quantity measuring part 42.
  • the linear light is partially cut out by the slit 414, and the cut-out light is received by the light quantity measuring unit 42.
  • one end of the slit 414 is positioned slightly inside (center axis J1 side) from the linear irradiation region 415, and the other end is positioned slightly outside the linear irradiation region 415.
  • the emission of the linear light from the head unit 3 is started, so that the X direction on the irradiation surface 412 is started.
  • region 415 extended in (FIG. 6: step S11) is formed.
  • the rotation of the mask portion 41a is started by driving the motor 43 (step S12).
  • the irradiation surface 412 which is a plane rotates around the central axis J1, and the cut-out region where the linear irradiation region 415 and the slit 414 overlap moves in the X direction according to the rotation angle of the irradiation surface 412.
  • the light quantity of the light transmitted through the slit 414 is repeatedly measured by the light quantity measuring part 42 (step S13). That is, a plurality of measured light amounts respectively corresponding to a plurality of positions in the X direction in the linear irradiation region 415 are acquired. Then, in the light modulation element corresponding to the position where the difference between the measured light quantity and the ideal light quantity is larger than the predetermined threshold value, the correction parameter value of the light modulation element is corrected (steps S14 and S15).
  • the acquisition of the measurement light quantity in step S13 and the correction parameter value correction in step S15 are performed partially in parallel in the plurality of light modulation elements. Further, the processes in steps S13 and S15 are repeated until the difference between the measured light amount and the ideal light amount is less than or equal to the threshold value in all the light modulation elements (step S14). At this time, in the light quantity distribution measuring device 4a, the mask part 41a is continuously rotated, so that the measured light quantity is obtained in step S13 for each position of the linear irradiation region 415 in the immediately preceding step S13. It becomes possible to carry out in a short time from acquisition of the measurement light quantity.
  • step S14 When the difference between the measured light amount and the ideal light amount is less than or equal to the threshold value in all the light modulation elements (all positions in the linear irradiation region 415) (step S14), the rotation of the mask unit 41a is stopped and the head unit 3 The emission of the linear light is stopped (steps S16 and S17).
  • the diameter of the mask portion 41a of the light amount distribution measuring device 4a is smaller than the arrangement pitch of the head portions 3, and when correcting the light amount distribution, a plurality of light amount distribution measuring devices 4a are provided below the plurality of head portions 3. Each is arranged. The light quantity distribution is corrected in parallel in the plurality of head units 3.
  • the mask part 41a having the irradiation surface 412 which is a plane is provided, and the irradiation surface 412 is provided with the spiral slit 414 which is a linear transmission region. .
  • the slit 414 which is a set of a plurality of transmission region elements arranged in a row, the plurality of transmission region elements pass through a plurality of different positions of the linear irradiation region 415 at different timings, and transmitted through each transmission region element.
  • Light is received by the light quantity measuring unit 42.
  • the drawing apparatus 1 having the light quantity distribution measuring device 4a can draw a pattern on the substrate 9 with high accuracy.
  • FIG. 11 is a perspective view showing another example of the light quantity distribution measuring device 4a
  • FIG. 12 is a plan view showing the mask portion 41a.
  • a plurality of slits 414 having the same shape are formed on the irradiation surface 412.
  • the plurality of slits 414 have a spiral shape (spiral shape).
  • FIG. 13 is a diagram showing Archimedean spirals.
  • Each slit 414 of the mask portion 41a in FIG. 12 has a shape obtained by extracting a part of the Archimedean spiral shown by a broken line in FIG. 13 (a portion continuous in an angle range slightly smaller than 90 degrees). .
  • a portion corresponding to the slit 414 is indicated by a solid line.
  • the plurality of slits 414 are separated from each other in the circumferential direction around the central axis J1.
  • the plurality of transmission region elements are arranged at different positions in both the radial direction and the circumferential direction.
  • a plurality of slits 414 having the same shape are formed on the irradiation surface 412 as a plurality of linear transmission regions.
  • an angle range in which one slit 414 passes through the linear irradiation region 415 and an angle in which the other slit 414 passes through the linear irradiation region 415 is different.
  • FIG. 14 is a diagram showing another example of the drawing apparatus 1 and shows a state in which a plurality of head units 3 and a plurality of light quantity distribution measuring apparatuses 4a are viewed from the ( ⁇ Y) side in the (+ Y) direction.
  • the diameter of the mask part 41a of the light quantity distribution measuring device 4a shown in FIG. 14 is larger than the arrangement pitch of the head parts 3 and smaller than twice the arrangement pitch.
  • One light quantity distribution measuring device 4a is provided below the two head portions 3 adjacent to each other.
  • FIG. 15 is a perspective view showing the light quantity distribution measuring device 4a
  • FIG. 16 is a plan view showing the mask portion 41a.
  • a plurality of slits 414 having the same shape are formed on the irradiation surface 412 as in the examples of FIGS.
  • the linear light from the two head units 3 is irradiated onto the irradiation surface 412, and two linear irradiation regions 415 are formed on the irradiation surface 412.
  • two light quantity measuring units 42 are provided below the mask unit 41a with the central axis J1 interposed therebetween. As shown in FIG.
  • the two light quantity measuring units 42 are arranged apart from each other by the arrangement pitch of the head units 3.
  • one entire linear irradiation region 415 overlaps the light receiving surface of one light quantity measurement unit 42, and the other linear irradiation region 415 It overlaps with the light receiving surface of the other light quantity measuring unit 42.
  • the linear light from the two head units 3 is irradiated onto the irradiation surface 412 to form two linear irradiation regions 415.
  • two light quantity measuring units 42 are provided below the mask unit 41a at positions corresponding to the two linear irradiation regions 415, respectively. Then, when each slit 414 is regarded as a set of a plurality of transmission region elements arranged in a line continuously, the transmission region element of the mask portion 41a is transmitted through the linear light from one head portion 3.
  • the light is received by one light quantity measurement unit 42, and the light transmitted through each transmission region element of the mask part 41 a among the linear light from the other head part 3 is received by the other light quantity measurement unit 42.
  • the light quantity distribution of the plurality of head units 3 can be measured using one mask unit 41a, and the manufacturing cost of the drawing apparatus 1 can be reduced.
  • the light amount distribution measuring device 4a provided with a plurality of light amount measuring units 42, only one slit 414 may be provided in the mask unit 41a.
  • the drawing apparatus 1 and the light quantity distribution measuring apparatuses 4 and 4a can be variously modified.
  • the shape of the slit 414 that is the linear transmission region may be appropriately changed.
  • linear slits 414 having both ends arranged at different positions in the radial direction and the circumferential direction are provided. May be.
  • a plurality of dot-like through holes may be formed as a plurality of transmission region elements.
  • a plurality of transmission region elements 416 that are discretely arranged in a row are used as the element row 417, and the two element rows 417 are separated in the circumferential direction (vertical direction in FIG. 17). Formed.
  • One transmissive region element 416 included in the other element row 417 is arranged.
  • a plurality of transmission region elements 416 pass through a plurality of different positions of the linear irradiation region 415 on the irradiation surface 412 at different timings, respectively.
  • the light that has passed through the transmission region element 416 is received by the light quantity measurement unit 42.
  • the light amount distribution of the linear light can be repeatedly measured with high accuracy.
  • it is preferably 1/20 or more, more preferably 1/10 or more of the number of light modulation elements included in the spatial light modulator 32 (for example, light modulation elements). Or less) of dot-like transmission region elements 416 are provided.
  • the light amount distribution of the linear light is measured with high resolution according to the sampling frequency in the light amount measurement unit 42. Is possible.
  • a conical (including a truncated cone) mask portion 41 may be provided instead of the cylindrical mask portion 41.
  • the central axis J1 of the mask portion 41b is disposed on a plane including the optical axis J2 of the head portion 3 and parallel to the longitudinal direction of the linear light.
  • the central axis J1 of the mask portion 41b is inclined with respect to the X direction so that the upper portion of the cross section of the irradiation surface 412 of the mask portion 41b by the plane is orthogonal to the optical axis J2.
  • the light quantity distribution measuring device 4 may be provided with a semi-cylindrical mask part 41. Even in this case, when the irradiation surface 412 passes between the head part 3 and the light quantity measuring part 42, a linear shape is provided. The light quantity distribution of light can be measured.
  • the irradiation surface that is a plane rotates around an axis perpendicular to the plane, or the irradiation surface that is at least part of a rotation surface that is a cylindrical surface or a conical surface corresponds to the rotation surface. Rotate around the center axis.
  • the plurality of transmission region elements formed on the irradiation surface pass through a plurality of different positions of the linear irradiation region of the linear light on the irradiation surface at different timings. This makes it possible to repeatedly measure the light amount distribution of the linear light with high accuracy.
  • the mask portions 41 and 41a may be formed of a material that transmits light from the head portion 3 (for example, transparent glass).
  • a film that shields the light is formed in the mask portions 41 and 41a, and a plurality of transmission region elements are formed by removing the film in a part of the region.
  • FIG. 19 in the mask portion 41, at a position facing the slit 414 across the central axis J1 (for example, at a position symmetrical to the slit 414 with respect to the central axis J1), in the circumferential direction.
  • An opening 418 having a width larger than that of the slit 414 may be provided, and the light amount measurement unit 42 may be disposed below the mask unit 41.
  • the light passing through the opening 418 and the slit 414 is received by the light quantity measuring unit 42.
  • the light amount measuring unit 42 is easily supported as compared with the case where the light amount measuring unit 42 is provided inside the mask unit 41. Is possible.
  • the central axis J1 may be inclined with respect to the optical axis J2 in a plane parallel to the YZ plane.
  • the central axis J1 may be slightly inclined in an arbitrary direction with respect to the optical axis J1.
  • the cylindrical mask portion 41 of FIGS. 3 and 7 is elongated in the direction of the central axis J1, and a plurality of light quantity measuring portions 42 are arranged along the direction, thereby using a plurality of mask portions 41.
  • the light quantity distribution of the head unit 3 may be measured.
  • the mask part 41 may rotate by providing the site
  • FIG. Furthermore, the mask portions 41 and 41a in the plurality of light quantity distribution measuring devices 4 and 4a may be rotated by one rotating mechanism.
  • a spatial light modulator 32 using an acousto-optic deflector (AOD) or a set of minute mirrors may be provided.
  • AOD acousto-optic deflector
  • a substrate 9 such as a semiconductor substrate, a glass substrate for a liquid crystal display device, or a printed wiring board is an object for pattern drawing. A pattern may be drawn.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

L'invention concerne un dispositif de mesure de distribution de l'intensité lumineuse (4), comprenant une unité de masque (41) présentant une surface d'exposition cylindrique (412) et une unité de mesure d'intensité lumineuse (42) disposée à l'intérieur de l'unité de masque (41). Une lumière linéaire provenant une unité de tête (3), qui émet une lumière linéaire, éclaire la surface d'exposition (412), et une zone d'exposition linéaire (415) parallèle à l'axe central (J1) de la surface d'exposition (412) est formée La surface d'exposition (412) tourne en continu autour de l'axe central (J1). La surface d'exposition (412) est pourvue d'une fente (414) inclinée par rapport à l'axe central (J1). Si la fente (414), qui est une région de transmission linéaire, est interprétée comme étant un ensemble d'une pluralité de régions de transmission partielles disposées en continu le long d'une ligne, la pluralité des régions de transmission partielles passent par une pluralité de positions différentes sur la zone d'exposition linéaire (415) à des moments différents, et la lumière transmise à travers les régions de transmission partielles est reçue par l'unité de mesure d'intensité lumineuse (42). La distribution d'intensité d'une lumière linéaire peut ainsi être mesurée de manière répétée à l'aide d'une structure simple.
PCT/JP2014/079361 2013-12-18 2014-11-05 Dispositif de mesure de la distribution de l'intensité lumineuse, dispositif de dessin et procédé de mesure de distribution d'intensité lumineuse WO2015093171A1 (fr)

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JP2013261109A JP6113064B2 (ja) 2013-12-18 2013-12-18 光量分布測定装置、描画装置および光量分布測定方法

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CN106768316A (zh) * 2017-03-07 2017-05-31 西北核技术研究所 基于平板渐开线孔取样的激光光束质量测量装置和方法
WO2017101895A3 (fr) * 2015-12-16 2017-11-23 Primes Gmbh Sonde de mesure transparente pour balayage de rayonnement
WO2018054405A1 (fr) * 2016-09-26 2018-03-29 Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Mesure rapide de faisceaux dans plusieurs plans

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JP6486167B2 (ja) * 2015-03-30 2019-03-20 株式会社オーク製作所 露光装置、露光装置用測光装置、および露光方法
JP6984228B2 (ja) * 2016-11-17 2021-12-17 東京エレクトロン株式会社 露光装置、露光装置の調整方法及び記憶媒体
US10558125B2 (en) 2016-11-17 2020-02-11 Tokyo Electron Limited Exposure apparatus, exposure apparatus adjustment method and storage medium

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JPH0493728A (ja) * 1990-08-09 1992-03-26 Ando Electric Co Ltd Ｌｅｄアレイの光ビーム径測定装置
JPH05223633A (ja) * 1992-02-14 1993-08-31 Ricoh Co Ltd ビーム形状測定方法及びその装置

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Publication number Priority date Publication date Assignee Title
WO2017101895A3 (fr) * 2015-12-16 2017-11-23 Primes Gmbh Sonde de mesure transparente pour balayage de rayonnement
US10508950B2 (en) 2015-12-16 2019-12-17 Primes Gmbh Mebtechnik Fur Die Produktion Mit Laserstrahlung Transparent measuring probe for beam scanning
WO2018054405A1 (fr) * 2016-09-26 2018-03-29 Primes GmbH Meßtechnik für die Produktion mit Laserstrahlung Mesure rapide de faisceaux dans plusieurs plans
US10908018B2 (en) 2016-09-26 2021-02-02 Primes Gmbh Messtechnik Fur Die Produktion Mit Las Rapid beam measuring in several planes
CN106768316A (zh) * 2017-03-07 2017-05-31 西北核技术研究所 基于平板渐开线孔取样的激光光束质量测量装置和方法
CN106768316B (zh) * 2017-03-07 2019-05-07 西北核技术研究所 基于平板渐开线孔取样的激光光束质量测量装置和方法

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