WO2015085829A1 - 一种快速形成气体水合物的喷雾装置 - Google Patents

一种快速形成气体水合物的喷雾装置 Download PDF

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WO2015085829A1
WO2015085829A1 PCT/CN2014/089123 CN2014089123W WO2015085829A1 WO 2015085829 A1 WO2015085829 A1 WO 2015085829A1 CN 2014089123 W CN2014089123 W CN 2014089123W WO 2015085829 A1 WO2015085829 A1 WO 2015085829A1
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gas
liquid mixing
hydrate
sprayer
liquid
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PCT/CN2014/089123
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English (en)
French (fr)
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李小森
徐纯刚
陈朝阳
李刚
张郁
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中国科学院广州能源研究所
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Priority to US14/765,463 priority Critical patent/US20160271579A1/en
Publication of WO2015085829A1 publication Critical patent/WO2015085829A1/zh

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/30Controlling by gas-analysis apparatus
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/21Mixing gases with liquids by introducing liquids into gaseous media
    • B01F23/213Mixing gases with liquids by introducing liquids into gaseous media by spraying or atomising of the liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2321Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles by moving liquid and gas in counter current
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2326Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles adding the flowing main component by suction means, e.g. using an ejector
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/21Measuring
    • B01F35/211Measuring of the operational parameters
    • B01F35/2111Flow rate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/22Control or regulation
    • B01F35/2201Control or regulation characterised by the type of control technique used
    • B01F35/2209Controlling the mixing process as a whole, i.e. involving a complete monitoring and controlling of the mixing process during the whole mixing cycle
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/90Heating or cooling systems
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices
    • B01J4/001Feed or outlet devices as such, e.g. feeding tubes
    • B01J4/002Nozzle-type elements
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10LFUELS NOT OTHERWISE PROVIDED FOR; NATURAL GAS; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BY SUBCLASSES C10G, C10K; LIQUEFIED PETROLEUM GAS; ADDING MATERIALS TO FUELS OR FIRES TO REDUCE SMOKE OR UNDESIRABLE DEPOSITS OR TO FACILITATE SOOT REMOVAL; FIRELIGHTERS
    • C10L3/00Gaseous fuels; Natural gas; Synthetic natural gas obtained by processes not covered by subclass C10G, C10K; Liquefied petroleum gas
    • C10L3/06Natural gas; Synthetic natural gas obtained by processes not covered by C10G, C10K3/02 or C10K3/04
    • C10L3/10Working-up natural gas or synthetic natural gas
    • C10L3/108Production of gas hydrates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/90Heating or cooling systems
    • B01F2035/98Cooling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23762Carbon dioxide
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00002Chemical plants
    • B01J2219/00004Scale aspects
    • B01J2219/00006Large-scale industrial plants
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00054Controlling or regulating the heat exchange system
    • B01J2219/00056Controlling or regulating the heat exchange system involving measured parameters
    • B01J2219/00058Temperature measurement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00054Controlling or regulating the heat exchange system
    • B01J2219/00056Controlling or regulating the heat exchange system involving measured parameters
    • B01J2219/00065Pressure measurement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00051Controlling the temperature
    • B01J2219/00054Controlling or regulating the heat exchange system
    • B01J2219/00056Controlling or regulating the heat exchange system involving measured parameters
    • B01J2219/00069Flow rate measurement
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00191Control algorithm
    • B01J2219/00193Sensing a parameter
    • B01J2219/00195Sensing a parameter of the reaction system
    • B01J2219/00198Sensing a parameter of the reaction system at the reactor inlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00191Control algorithm
    • B01J2219/00211Control algorithm comparing a sensed parameter with a pre-set value
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049Controlling or regulating processes
    • B01J2219/00191Control algorithm
    • B01J2219/00222Control algorithm taking actions
    • B01J2219/00227Control algorithm taking actions modifying the operating conditions
    • B01J2219/00229Control algorithm taking actions modifying the operating conditions of the reaction system
    • B01J2219/00231Control algorithm taking actions modifying the operating conditions of the reaction system at the reactor inlet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/04Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
    • B05B7/0483Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with gas and liquid jets intersecting in the mixing chamber
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10LFUELS NOT OTHERWISE PROVIDED FOR; NATURAL GAS; SYNTHETIC NATURAL GAS OBTAINED BY PROCESSES NOT COVERED BY SUBCLASSES C10G, C10K; LIQUEFIED PETROLEUM GAS; ADDING MATERIALS TO FUELS OR FIRES TO REDUCE SMOKE OR UNDESIRABLE DEPOSITS OR TO FACILITATE SOOT REMOVAL; FIRELIGHTERS
    • C10L2290/00Fuel preparation or upgrading, processes or apparatus therefore, comprising specific process steps or apparatus units
    • C10L2290/18Spraying or sprinkling

Definitions

  • the present invention relates to a spray device for rapidly forming a gas hydrate.
  • Gas Hydrate is a mixture of ice-like crystals formed by small molecules of water molecules and guest gases. It is usually formed under low temperature and high pressure conditions. Water molecules are connected by hydrogen bonds to form a series of different sizes and structures. Polyhedral pores, in which different size guest molecules enter these pores and are stably present under the action of van der Waals forces. Different guest molecules form gas hydrates with different phase equilibrium conditions.
  • hydrates are selective for different guest molecules, and phase equilibrium conditions of milder guest molecules can preferentially enter gas hydrate formation, resulting in
  • the change of the gas component in the hydrate phase and the gas phase is more likely to form a gas hydrate component in the hydrate phase, and is thinner in the gas phase, so that the hydrate method can be used to separate from the gas mixture.
  • Gas and purify the gas Compared with traditional gas separation technologies (such as chemical absorption, physical adsorption, membrane separation, etc.), hydrate separation gas technology has the advantages of lower energy consumption and more environmental protection. Therefore, research on hydrate synthesis gas technology is in the world. The scope has become a hot spot, and the process and application of gas separation by hydrate method is the key to the technology's shift to industrial application.
  • the process research of gas separation by hydrate method is subject to gas hydrate formation rate and gas separation efficiency.
  • the formation rate of gas hydrate is a key factor that restricts the separation process of hydrate method.
  • one of the key factors affecting gas hydrate formation is the gas-water contact area. The larger the contact surface area of gas and water, the more favorable the dissolution of gas in the water phase, and the fugacity of gas in the water phase will increase accordingly, thereby further increasing the driving force for gas hydrate formation, providing a rapid gas hydrate formation. condition.
  • the gas hydrate is usually formed by a stirring method, a spraying method, a bubbling method, etc., and the purpose of these methods is to promote the thorough mixing of the gas and water and to increase the gas-water contact area.
  • the stirring method has two kinds of mechanical stirring and electromagnetic stirring.
  • the mechanical stirring is suitable for the larger volume reactor, the stirring speed can always be maintained, and the electromagnetic stirring is limited by the magnetic work. It is only suitable for small reactors, and the stirring speed is The formation of hydrates and the increase in the consistency of the system decrease. However, magnetic stirring makes it easier to seal the system, which is especially important in high pressure environments.
  • the spraying method is to spray water into a gas-filled reaction vessel through a spray pipe, form a water-in-water form in space, and promote gas-water contact; bubbling method
  • the gas is passed through the bubble generating disc and entered into the reaction vessel containing water in the form of bubbles to form a water-inflated form to promote gas-water contact.
  • gas-water contact caused by the stirring method, the spray method, and the bubbling method is much larger than the microscopic nucleation scale in scale, resulting in gas-water contact.
  • the area is not large enough, and the gas-water contact is not sufficient, which is not enough to significantly increase the gas hydrate formation rate to meet the demand for process production.
  • the present invention is directed to a key problem that restricts the rapid formation of gas hydrates - full contact of gas and water, and provides a spray device for rapidly forming a gas hydrate, which is atomized into 5-10 ⁇ m droplets by thoroughly mixing the gas and water.
  • the gas-water contact surface area is significantly increased, the fugacity of the gas in the water phase is improved, the gas hydrate formation driving force is improved, the gas hydrate formation induction time is shortened, and the gas hydrate formation speed is improved.
  • a gas hydrate-forming spray device mainly comprises a stable gas supply system connected by a pipeline or a line, a saturated solution preparation system, a gas-liquid mixed sprayer, a temperature control system and a data acquisition and processing system;
  • the system consists of a test gas cylinder, a CO 2 gas cylinder, a pressure reducing valve and a booster pump, the stable gas supply system supplying gas to the saturated solution preparation system and the gas-liquid mixed atomizer;
  • the saturated solution preparation system is from the solution tank and the pressurization a pump composition, the saturated solution preparation system provides a saturated solution to the gas-liquid mixing atomizer;
  • the gas-liquid mixing atomizer mainly comprises a high-speed fluid chamber and a gas-liquid mixing chamber communicating with the high-speed fluid chamber, and is disposed in the gas-liquid mixing chamber.
  • the atomizer is connected to the gas-liquid mixing chamber of the gas-liquid mixed sprayer through a pressure reducing valve and a gas flow meter; two gas lines are arranged at the top of the CO 2 gas cylinder, and one of the gas lines is
  • the booster pump is in communication with the bottom of the solution tank, and the other gas line is in communication with the top of the solution tank; the solution tank is connected to the high-speed fluid chamber of the gas-liquid mixing sprayer by the booster pump
  • the temperature control system includes a temperature control cooling system and a constant temperature chamber disposed at the periphery of the solution tank and the gas-liquid mixed sprayer, and the temperature control system controls temperature changes of the solution tank and the gas-liquid mixed sprayer;
  • the data collection and processing comprises a liquid flow meter, a gas flow meter, a data collector and a computer processing system, wherein the data acquisition and processing system is used for controlling, collecting, storing and analyzing the stable gas supply system, the saturated solution preparation system, and the gas-liquid mixed sprayer. And temperature control
  • the gas-liquid mixing sprayer is hollow inside, and the inner wall is symmetrically provided with a trapezoidal protrusion to divide the interior of the gas-liquid mixing atomizer into a high-speed fluid chamber and a gas-liquid mixing chamber which are connected to each other; and the convexity of the gas-liquid mixing chamber close to the high-speed fluid chamber
  • the gas supply inlet is provided at the beginning, and the gas-liquid mixing atomizer further comprises a spray head disposed at the outer end of the atomizer and a distributor distributed on the spray head.
  • the atomizer is fixedly coupled to the wall of the gas-liquid mixing sprayer via a threaded joint and a gasket.
  • the spray head is annular and detachable, and the spray head is preferably connected to the atomizer through an inner spiral.
  • the distributor has an inner diameter of 0.04 to 1.0 mm.
  • the present invention also protects the application of the rapid gas hydrate forming spray device for thermodynamic and kinetic experiments in rapid continuous hydrate gas separation and rapid gas hydrate formation.
  • the upper working pressure of the device can reach 8MPa, and high-pressure gas-liquid mixing can be performed;
  • the device realizes pressure atomization, and the atomization speed is fast.
  • the atomized droplets are distributed in the range of 5-10 ⁇ m, and the droplets are enclosed in the gas environment in the device to form a water-in-water contact mode.
  • the gas-water contact surface area is effectively improved, and the induction time of gas hydrate formation is significantly shortened under appropriate temperature and pressure conditions, and the gas hydrate can be formed instantaneously, and can be widely applied to rapid continuous hydrate gas separation and gas hydrate rapid formation. Thermodynamic and kinetic experiments.
  • the device realizes the full mixing of gas and liquid in the gas-liquid mixing chamber by spraying, does not need to consume energy, effectively reduces the total energy consumption of gas hydrate formation, and improves the energy consumption efficiency of gas hydrate formation.
  • the device is easy to use, the annular spray head is detachable and replaceable, and the internal rotary thread type connection mode can not only realize the change of the ring diameter according to the process requirement, but also can clean the nozzle at any time to prevent the nozzle from being blocked.
  • Figure 1 is a schematic view of a spray device of the present invention
  • Figure 2 is a cross-sectional view of the gas-liquid mixing sprayer of the present invention.
  • Figure 3 is a schematic view of a distributor of an annular spray head
  • test cylinder 1, test cylinder; 3, booster pump; 4, CO 2 cylinder; 2 , 5, 6, 10, 12, 14, 17, 19, 20, 21, 24, valve; 7, constant temperature room; 8, solution tank; 9, deionized water; 11, booster pump; 13, liquid flow meter; 15, gas-liquid mixed sprayer; 16, temperature control cooling system; 18, pressure reducing valve; 22, gas flow meter; , data collector; 25, computer processing system; 26, high-speed fluid chamber; 27, gas-liquid mixing chamber; 28, threaded joint; 29, spray head; 30, distributor; 31, gas flow inlet; 33; washers.
  • a rapid gas hydrate forming spray device mainly comprises a stable gas supply system connected by a pipeline or a line, a saturated solution preparation system, a gas-liquid mixed atomizer 15, a temperature control system, and data acquisition and processing.
  • a system comprising: a test gas cylinder containing a test gas, a CO 2 gas cylinder 4 for preparing a saturated solution, a pressure reducing valve 18, and a booster pump 3; the saturated solution preparation system is composed of a solution
  • the tank 8 and the booster pump 11 are composed;
  • the gas-liquid mixing sprayer 15 mainly includes a high-speed fluid chamber 26, a gas-liquid mixing chamber 27 communicating with the high-speed fluid chamber 26, and an atomizer 32 disposed in the gas-liquid mixing chamber 27.
  • the test gas cylinder 1 is connected to the gas-liquid mixing chamber 27 of the gas-liquid mixing sprayer 15 via a pressure reducing valve 18 and a gas flow meter 22; two gas lines, one of which is disposed at the top of the CO 2 gas cylinder 4
  • the pipeline communicates with the bottom of the solution tank 8 via the booster pump 3, and the other gas pipeline communicates with the top of the solution tank 8 via the valve 21; the solution tank 8 passes through the valve 10, the booster pump 11, the valve 12, and the liquid in sequence.
  • the flow meter 13 is in communication with the high velocity fluid chamber 26 of the gas-liquid mixing nebulizer 15
  • the temperature control system includes a temperature control cooling system 16 and a thermostatic chamber 7 disposed at the periphery of the solution tank 8 and the gas-liquid mixing nebulizer 15, the temperature control system controlling the temperature change of the solution tank 8 and the gas-liquid mixing nebulizer 15;
  • the data acquisition and processing system includes a liquid flow meter 13, a gas flow meter 22, a data collector 23, and a computer processing system 25.
  • the stabilized gas supply system supplies a gas to a saturated solution preparation system or a gas-liquid mixed atomizer 15, which supplies a saturated solution to the gas-liquid mixing atomizer 15, which controls the solution tank 8 and the gas-liquid mixed sprayer 15 Temperature change, the data acquisition and processing system is used to control, collect, store and analyze the temperature, pressure, gas flow, liquid of the stable gas supply system, the saturated solution preparation system, the gas-liquid mixed sprayer 15 and the temperature control system Traffic data.
  • the gas-liquid mixing sprayer 15 is hollow inside, the inner wall is symmetrically provided with trapezoidal protrusions to divide the interior of the gas-liquid mixing sprayer 15 into a high-speed fluid chamber 26 and a gas-liquid mixing chamber 27 that communicate with each other;
  • a gas inflow port 31 is disposed in the gas-liquid mixing chamber 27 near the convex end of the high-speed fluid chamber 26, and the gas-liquid mixing nebulizer 15 further includes an atomizer 32 disposed in the gas-liquid mixing chamber 27, and is disposed in the mist.
  • the spray head 29 at the outer end of the chemist 32 and the distributor 30 are evenly distributed on the spray head 29.
  • the atomizer 32 is fixedly coupled to the wall of the gas-liquid mixing sprayer 15 via a threaded joint 28 and a gasket 33.
  • the spray head 29 is annular and is detachable from the atomizer 32 by an inner spiral.
  • the distributor 30 has an inner diameter of 0.04 to 1.0 mm.
  • CO 2 cylinder 4 CO 2 pressurized gas enters at the booster pump 3 from the bottom of the solution tank 8, 8 and the solution tank 9 built some of deionized water and mixed thoroughly dissolved, then the solution tank 8 The top outlet flows back into the CO 2 cylinder 4 via valve 21 to effect a cycle of CO 2 . After 3 hours, the solution tank is formed inside.
  • test gas in the test cylinder 1 directly enters the gas-liquid mixing chamber 27 of the gas-liquid mixing sprayer 15 under the action of a vacuum valve 18 through the pressure reducing valve 18, the valve 20, and the gas flow meter 22 to realize gas supply; the stable gas supply
  • the test gas supplied by the system and the saturated solution of CO 2 provided by the saturated solution preparation system are fully mixed in the gas-liquid mixing chamber 27, and the fully mixed gas-liquid system enters the atomizer 32 to form a spray of 5-10 ⁇ m.
  • the mist droplets enter the spray head 29, and are injected into the gas hydrate reactor at a constant pressure through a distributor 30 having an inner diameter of 0.04 to 1.0 mm.
  • the temperature control system controls temperature changes of the solution tank 8 and the gas-liquid mixed sprayer 15; the data acquisition and processing system controls, collects, stores and analyzes the stable gas supply system, the saturated solution preparation system, the gas-liquid mixed sprayer 15 and Temperature, pressure, gas flow, and liquid flow data of the temperature control system.
  • the CO 2 gas circulates in the solution tank 8, and is sufficiently mixed with the 0.29 mol% TBAB solution, and after three hours, a CO 2 saturated TBAB aqueous solution is formed.
  • the saturated TBAB aqueous solution is pressurized to 3.5 MPa by the booster pump 11 and then enters the high-speed fluid chamber 26 of the gas-liquid mixing sprayer 15 at a high speed to form a vacuum in the gas-liquid mixing chamber 27, and the test gas in the gas cylinder 1 is tested (volume ratio is 40.0).
  • the induction time of gas hydrate formation by the same gas and solution system is nearly 10 times shorter than that of mechanical agitation.
  • test gas in the test cylinder 1 was a CO 2 /H 2 mixture having a volume ratio of 18.0/82.0%.
  • the induction time of gas hydrate formation by the same gas and solution system is nearly 18 times shorter than that of mechanical agitation.

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Abstract

一种快速形成气体水合物的喷雾装置,包括稳定供气系统、饱和溶液制备系统、气液混合喷雾器(15),气液混合喷雾器(15)内部中空,内壁对称设有梯形凸起将气液混合喷雾器(15)内部分割为互相连通的高速流体腔(26)和气液混合腔(27),气液混合腔(27)内靠近高速流体腔(26)的凸起端设有气体流入口(31),气液混合喷雾器(15)还包括设在雾化器(32)外端的喷雾头(29)、喷雾头(29)上均布的分布器(30)。

Description

一种快速形成气体水合物的喷雾装置 技术领域:
本发明涉及一种快速形成气体水合物的喷雾装置。
背景技术:
气体水合物(Gas Hydrate)是一种由水分子和客体气体小分子形成的类冰状晶体混合物,通常在低温高压条件下形成,水分子通过氢键相连,形成一系列大小不同、结构不同的多面体孔穴,不同大小的客体分子进入到这些孔穴中,在范德华力的作用下而稳定存在。不同的客体分子形成气体水合物的相平衡条件不同,由此,在相同条件下,水合物对不同的客体分子具有选择性,相平衡条件更温和的客体分子能优先进入形成气体水合物,导致水合物相和气相中的气体组分的变化,在水合物相中,更易形成气体水合物的组分富集,在气相中,则变稀薄,因此可以实现利用水合物法从混合气中分离气体并提纯气体。相对于传统的气体分离技术(如化学吸收、物理吸附、膜分离,等),水合物法分离气体技术具有能耗更低、更环保等优点,因此关于水合物法分离气体技术的研究在世界范围内已成为热点,水合物法分离气体的工艺及应用是该技术转向工业化应用的关键。
当前,水合物法分离气体的工艺研究受制于气体水合物形成速度以及气体分离效率,尤其在工艺化过程中,气体水合物的形成速度是制约水合物法分离技术的关键因素。从水合物形成热力学和动力学两方面分析,影响气体水合物形成的关键因素之一在于气水接触面积。气水接触表面积越大,越有利于气体在水相中的溶解,气体在水相中的逸度会相应增加,从而进一步提高了气体水合物形成的驱动力,为快速形成气体水合物提供了条件。气体水合物的形成方式通常有搅拌法、喷淋法、鼓泡法等,这些方法运用的目的是为了促进气水的充分混合,提高气水接触面积。搅拌法有机械搅拌和电磁搅拌两种,机械搅拌适用于较大体积反应器,搅拌速度始终能维持不变,而电磁搅拌受限于磁力做功,仅适用于小型反应器,而且搅拌速度随着水合物的形成以及体系稠度的增加而下降。但磁力搅拌可更易实现体系的密封,这在高压环境下尤其重要。喷淋法是通过喷淋管,将水喷洒在充满气体的反应釜内,在空间上形成气包水形式,促进气水接触;鼓泡法 则相反,是将气体通过气泡发生碟,以气泡形式进入装有水的反应釜内,形成水包气的形式,以促进气水接触。这些方法,相对于静置体系,显然有助于促进气体在水中的溶解,增加气水接触表面,能相对地缩短水合物形成诱导时间,提高水合物形成速度,并且在大量的实验研究中得到验证。然而,由于气体水合物的形成是一个微观晶核的成长过程,搅拌法、喷淋法以及鼓泡法等造成的气水接触,在尺度上都远大于微观成核尺度,导致的气水接触面积不够大,气水接触并不充分,不足以显著提高气体水合物的形成速度以满足工艺化生产需求。
发明内容:
本发明针对制约气体水合物快速形成的关键问题——气水充分接触,提供一种快速形成气体水合物的喷雾装置,这种装置通过将气水充分混合后雾化成5-10μm的雾滴,从而显著增加了气水接触表面积,提高了气体在水相中的逸度,从而提高了气体水合物形成驱动力,缩短了气体水合物形成诱导时间,提高了气体水合物形成速度。
本发明是通过以下技术方案予以实现的:
一种快速形成气体水合物的喷雾装置,主要包括由管路或线路连接的稳定供气系统、饱和溶液制备系统、气液混合喷雾器、控温系统和数据采集及处理系统;所述稳定供气系统由试验气瓶、CO2气瓶、减压阀和增压泵组成,所述稳定供气系统向饱和溶液制备系统和气液混合喷雾器提供气体;所述饱和溶液制备系统由溶液罐和增压泵组成,所述饱和溶液制备系统向气液混合喷雾器提供饱和溶液;所述气液混合喷雾器内部主要包括高速流体腔、跟高速流体腔连通的气液混合腔,设在气液混合腔内的雾化器;所述试验气瓶经减压阀、气体流量计跟气液混合喷雾器的气液混合腔连通;所述CO2气瓶顶端设有两气体管路,其中的一气体管路经增压泵跟溶液罐的底部连通,另一气体管路跟溶液罐的顶部连通;所述溶液罐经增压泵跟气液混合喷雾器的高速流体腔连通;所述控温系统包括温控制冷系统和设在所述溶液罐、气液混合喷雾器外围的恒温室,所述控温系统控制溶液罐和气液混合喷雾器的温度变化;所述数据采集及处理系统包括液体流量计、气体流量计、数据采集器和电脑处理系统,所述数据采集及处理系统用来控制、采集、保存和分析所述稳定供气系统、饱和溶液制备系统、气液混合喷雾器和控 温系统的温度、压力、气体流量、液体流量数据。
所述气液混合喷雾器内部中空,内壁对称设有梯形凸起将所述气液混合喷雾器内部分割为互相连通的高速流体腔和气液混合腔;所述气液混合腔内靠近高速流体腔的凸起端设有气体流入口,所述气液混合喷雾器还包括设在雾化器外端的喷雾头、喷雾头上均布的分布器。
所述雾化器经螺纹连接头和垫圈跟气液混合喷雾器的壁固定连接。
所述喷雾头为环形,可拆卸,喷雾头优选为跟雾化器通过内螺旋纹连接。
所述分布器内径为0.04~1.0mm。
本发明还保护所述快速形成气体水合物的喷雾装置的应用,应用于快速连续水合物法气体分离和气体水合物快速形成的热力学和动力学实验。
本发明具有如下有益效果:
(1)本装置的工作上限压力可达8MPa,可进行高压气液混合;
(2)本装置实现了压力式雾化,雾化速度快,雾化的雾滴均分布在5-10μm尺度范围,雾滴在装置内被包围在气体环境中,形成气包水接触模式,有效地提高了气水接触表面积,在适当温压条件下,显著缩短形成气体水合物的诱导时间,气体水合物可瞬间形成,可广泛应用于快速连续水合物法气体分离和气体水合物快速形成的热力学和动力学实验。
(3)本装置通过喷雾的方式实现气液在气液混合腔内的充分混合,不需要消耗能量,有效地降低了气体水合物形成的总能耗,提高了气体水合物形成能耗效率。
(4)本装置使用方便,环形喷雾头可拆卸、可更换,采用内旋螺纹式接通方式不仅可以根据工艺需求实现环径的变换,也可以对喷头进行随时清理,防止喷头堵塞。
附图说明:
图1是本发明的喷雾装置示意图;
图2是本发明的气液混合喷雾器的剖面图;
图3是环形喷雾头的分布器示意图;
其中,1、试验气瓶;3、增压泵;4、CO2气瓶;2、5、6、10、12、14、17、19、 20、21、24、阀门;7、恒温室;8、溶液罐;9、去离子水;11、增压泵;13、液体流量计;15、气液混合喷雾器;16、温控制冷系统;18、减压阀;22、气体流量计;23、数据采集器;25、电脑处理系统;26、高速流体腔;27、气液混合腔;28、螺纹连接头;29、喷雾头;30、分布器;31、气体流入口;32、雾化器;33、垫圈。
具体实施方式:
以下是对本发明的进一步说明,而不是对本发明的限制。
如图1所示,一种快速形成气体水合物的喷雾装置,主要包括由管路或线路连接的稳定供气系统、饱和溶液制备系统、气液混合喷雾器15、控温系统和数据采集及处理系统;所述稳定供气系统由装有试验用气的试验气瓶1、制备饱和溶液用的CO2气瓶4、减压阀18和增压泵3组成;所述饱和溶液制备系统由溶液罐8和增压泵11组成;所述气液混合喷雾器15内部主要包括高速流体腔26、跟高速流体腔26连通的气液混合腔27、设在气液混合腔27内的雾化器32;所述试验气瓶1经减压阀18、气体流量计22跟气液混合喷雾器15的气液混合腔27连通;所述CO2气瓶4顶端设有两气体管路,其中的一气体管路经增压泵3跟溶液罐8的底部连通,另一气体管路经阀门21跟溶液罐8的顶部连通;所述溶液罐8依次经阀门10、增压泵11、阀门12、液体流量计13跟气液混合喷雾器15的高速流体腔26连通;所述控温系统包括温控制冷系统16和设在所述溶液罐8、气液混合喷雾器15外围的恒温室7,所述控温系统控制溶液罐8和气液混合喷雾器15的温度变化;所述数据采集及处理系统包括液体流量计13、气体流量计22、数据采集器23和电脑处理系统25。
所述稳定供气系统向饱和溶液制备系统或气液混合喷雾器15提供气体,所述饱和溶液制备系统向气液混合喷雾器15提供饱和溶液,所述控温系统控制溶液罐8和气液混合喷雾器15的温度变化,所述数据采集及处理系统用来控制、采集、保存和分析所述稳定供气系统、饱和溶液制备系统、气液混合喷雾器15和控温系统的温度、压力、气体流量、液体流量数据。
如图2所示,所述气液混合喷雾器15内部中空,内壁对称设有梯形凸起将所述气液混合喷雾器15内部分割为互相连通的高速流体腔26和气液混合腔27; 所述气液混合腔27内靠近高速流体腔26的凸起端设有气体流入口31,所述气液混合喷雾器15还包括设在气液混合腔27内的雾化器32、设在雾化器32外端的喷雾头29、喷雾头29上均布的分布器30。
所述雾化器32经螺纹连接头28和垫圈33跟气液混合喷雾器15的壁固定连接。
所述喷雾头29为环形,跟雾化器32通过内螺旋纹连接,可拆卸。
所述分布器30的内径为0.04~1.0mm。
工作时,CO2气瓶4中的CO2气体在增压泵3的增压下从溶液罐8底部进入,与溶液罐8内装有的去离子水9充分混合并溶解,然后从溶液罐8顶部流出经阀门21回到CO2气瓶4内,实现CO2的循环。经过3个小时后,溶液罐8内形成CO2饱和溶液,CO2饱和溶液经增压泵11增压后高速进入气液混合喷雾器15的高速流体腔26,在气液混合腔27内形成真空,试验气瓶1内的试验气通过减压阀18、阀门20、气体流量计22在负压作用下直接进入气液混合喷雾器15的气液混合腔27,实现气流供给;所述稳定供气系统供给的试验气和所述饱和溶液制备系统提供的CO2饱和溶液在气液混合腔27内实现气液充分混合,充分混合后的气液体系进入雾化器32雾化形成5-10μm的雾滴,之后雾滴进入喷雾头29,通过内径为0.04~1.0mm的分布器30,以一定的压力喷入气体水合物反应器。所述控温系统控制溶液罐8和气液混合喷雾器15的温度变化;所述数据采集及处理系统控制、采集、保存和分析所述稳定供气系统、饱和溶液制备系统、气液混合喷雾器15和控温系统的温度、压力、气体流量、液体流量数据。
应用实施例1
在温度为277.15K条件下,CO2气体在溶液罐8内循环流动,充分与0.29mol%TBAB溶液混合,三小时后,形成CO2饱和TBAB水溶液。饱和TBAB水溶液经增压泵11增压至3.5MPa后高速进入气液混合喷雾器15的高速流体腔26,在气液混合腔27内形成真空,试验气瓶1内的试验气体(体积比为40.0/60.0%的CO2/H2混合气)通过减压阀18、气体流量计22在负压作用下直接进入气液混合喷雾器15的气液混合腔27,试验气体和饱和水溶液在气液混合腔27内充分混合后,进入雾化器32被雾化成5-10μm的雾滴。雾滴经过内径为0.5mm的分布器30进入充满试验气且压力为3.0Mpa的水合物反应釜,雾滴进入水合 物反应釜后在半分钟内大量形成气体水合物。在同等温压条件下,相同气体和溶液体系形成气体水合物的诱导时间较机械搅拌缩短了近10倍。
本案例说明,利用此快速形成气体水合物的喷雾装置能显著缩短IGCC合成气形成气体水合物的诱导时间。
应用实施例2
与应用实施例1相同,不同之处在于试验气瓶1内的试验气体为体积比为18.0/82.0%的CO2/H2混合气。在同等温压条件下,相同气体和溶液体系形成气体水合物的诱导时间较机械搅拌缩短了近18倍。
本案例说明,利用本发明能显著缩短含CO2浓度较低的CO2/H2混合气形成气体水合物的诱导时间。
应用实施例3
与应用实施例1相同,不同之处在于分布器的内径为0.1mm,在同等温压条件下,相同气体和溶液体系形成气体水合物的诱导时间较机械搅拌缩短了近12倍。本案例说明,利用此快速形成气体水合物的喷雾装置能显著缩短IGCC合成气形成气体水合物的诱导时间,而且分布器尺寸越小对缩短诱导时间有利。
应用实施例4
与应用实施例1相同,不同之处在于分布器的内径为0.04mm,在同等温压条件下,相同气体和溶液体系形成气体水合物的诱导时间较机械搅拌缩短了近23倍。本案例说明,利用此快速形成气体水合物的喷雾装置能显著缩短IGCC合成气形成气体水合物的诱导时间,而且分布器尺寸越小对缩短诱导时间有利。
应用实施例5
与应用实施例1相同,不同之处在于分布器的内径为1.0mm,在同等温压条件下,相同气体和溶液体系形成气体水合物的诱导时间较机械搅拌缩短了近3倍。本案例说明,利用此快速形成气体水合物的喷雾装置能显著缩短IGCC合成气形成气体水合物的诱导时间,而且分布器尺寸越小对缩短诱导时间有利。

Claims (7)

  1. 一种快速形成气体水合物的喷雾装置,其特征在于,主要包括由管路或线路连接的稳定供气系统、饱和溶液制备系统、气液混合喷雾器(15)、控温系统和数据采集及处理系统;所述稳定供气系统由试验气瓶(1)、CO2气瓶(4)、减压阀(18)和增压泵(3)组成,所述稳定供气系统向饱和溶液制备系统和气液混合喷雾器(15)提供气体;所述饱和溶液制备系统由溶液罐(8)和增压泵(11)组成,所述饱和溶液制备系统向气液混合喷雾器(15)提供饱和溶液;所述气液混合喷雾器(15)内部主要包括高速流体腔(26)、跟高速流体腔(26)连通的气液混合腔(27),设在气液混合腔(27)内的雾化器(32);所述试验气瓶(1)经减压阀(18)、气体流量计(22)跟气液混合喷雾器(15)的气液混合腔(27)连通;所述CO2气瓶(4)顶端设有两气体管路,其中的一气体管路经增压泵(3)跟溶液罐(8)的底部连通,另一气体管路跟溶液罐(8)的顶部连通;所述溶液罐经增压泵(11)跟气液混合喷雾器(15)的高速流体腔(26)连通;所述控温系统包括温控制冷系统(16)和设在所述溶液罐(8)、气液混合喷雾器(15)外围的恒温室(7),所述控温系统控制溶液罐(8)和气液混合喷雾器(15)的温度变化;所述数据采集及处理系统包括液体流量计(13)、气体流量计(22)、数据采集器(23)和电脑处理系统(25),所述数据采集及处理系统用来控制、采集、保存和分析所述稳定供气系统、饱和溶液制备系统、气液混合喷雾器和控温系统的温度、压力、气体流量、液体流量数据。
  2. 根据权利要求1所述的快速形成气体水合物的喷雾装置,其特征在于,所述气液混合喷雾器(15)内部中空,内壁对称设有梯形凸起将所述气液混合喷雾器(15)内部分割为互相连通的高速流体腔(26)和气液混合腔(27);所述气液混合腔(27)内靠近高速流体腔(26)的凸起端设有气体流入口(31),所述气液混合喷雾器(15)还包括设在雾化器(32)外端的喷雾头(29)、喷雾头(29)上均布的分布器(30)。
  3. 根据权利要求2所述的快速形成气体水合物的喷雾装置,其特征在于,所述喷雾头(29)为环形,可拆卸。
  4. 根据权利要求2或3所述的快速形成气体水合物的喷雾装置,其特征在于,所述喷雾头(29)跟雾化器(32)通过内螺旋纹连接。
  5. 根据权利要求2或3所述的快速形成气体水合物的喷雾装置,其特征在于,所述分布器(30)内径为0.04~1.0mm。
  6. 根据权利要求1所述的快速形成气体水合物的喷雾装置,其特征在于,所述雾化器(32)经螺纹连接头(28)和垫圈(33)跟气液混合喷雾器(15)的壁固定连接。
  7. 上述任一权利要求所述的快速形成气体水合物的喷雾装置的应用,其特征在于应用于快速连续水合物法气体分离和气体水合物快速形成的热力学和动力学实验。
PCT/CN2014/089123 2013-12-10 2014-10-22 一种快速形成气体水合物的喷雾装置 WO2015085829A1 (zh)

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