WO2015080538A3 - 선광원 발생장치와 이를 구비한 노광기 - Google Patents

선광원 발생장치와 이를 구비한 노광기 Download PDF

Info

Publication number
WO2015080538A3
WO2015080538A3 PCT/KR2014/011643 KR2014011643W WO2015080538A3 WO 2015080538 A3 WO2015080538 A3 WO 2015080538A3 KR 2014011643 W KR2014011643 W KR 2014011643W WO 2015080538 A3 WO2015080538 A3 WO 2015080538A3
Authority
WO
WIPO (PCT)
Prior art keywords
light source
linear light
parallel
parallel surface
conversion system
Prior art date
Application number
PCT/KR2014/011643
Other languages
English (en)
French (fr)
Other versions
WO2015080538A2 (ko
Inventor
성낙훈
Original Assignee
성낙훈
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 성낙훈 filed Critical 성낙훈
Priority to KR1020167017134A priority Critical patent/KR20160101941A/ko
Publication of WO2015080538A2 publication Critical patent/WO2015080538A2/ko
Publication of WO2015080538A3 publication Critical patent/WO2015080538A3/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength

Abstract

본 발명의 평행 선광원 발생창치는, 광원과; 상기 광원을 평행 면광원으로 변환시키는 평행 면광원 변환시스템과; 상기 평행 면광원을 선광원으로 변환시키는 선광원 변환시스템과; 상기 선광원을 평행 선광원으로 변환시키는 평행 선광원 변환시스템으로 구성된다. 경우에 따라서는 광원이 평행 면광원이 아닌 일반 산란광 또는 반 평행광도 기능이 가능하므로 광원을 평행 면광원으로 변환시키는 평행 면광원 변환시스템은 생략을 하는 경우가 많다. 그러나 보다 효율적인 제품을 얻기 위하여서는 평행 면광원 변환시스템이 있는 것이 유리하다.
PCT/KR2014/011643 2013-11-29 2014-12-01 선광원 발생장치와 이를 구비한 노광기 WO2015080538A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020167017134A KR20160101941A (ko) 2013-11-29 2014-12-01 선광원 발생장치와 이를 구비한 노광기

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
KR10-2013-0147321 2013-11-29
KR20130147321 2013-11-29
KR20130151489 2013-12-06
KR10-2013-0151489 2013-12-06
KR20140093966 2014-07-24
KR10-2014-0093966 2014-07-24

Publications (2)

Publication Number Publication Date
WO2015080538A2 WO2015080538A2 (ko) 2015-06-04
WO2015080538A3 true WO2015080538A3 (ko) 2015-08-13

Family

ID=53199703

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2014/011643 WO2015080538A2 (ko) 2013-11-29 2014-12-01 선광원 발생장치와 이를 구비한 노광기

Country Status (2)

Country Link
KR (1) KR20160101941A (ko)
WO (1) WO2015080538A2 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101792051B1 (ko) * 2016-06-03 2017-10-31 (주) 고송이엔지 대면적 자외선 엘이디 노광 장치
CN107091807B (zh) * 2017-07-03 2023-08-15 苏州康鸿智能装备股份有限公司 一种3d曲面玻璃屏检测面光源
KR102151134B1 (ko) * 2018-12-14 2020-09-02 한국기계연구원 평행빔을 이용한 포토리소그래피 장치 및 방법
CN112987414A (zh) * 2021-03-05 2021-06-18 深圳市华星光电半导体显示技术有限公司 一种液晶显示面板、其制备方法及光线调节系统
CN114217511B (zh) * 2021-12-29 2022-12-13 杭州芯微影半导体有限公司 一种光刻机中近距离步进照明结构
CN117054056B (zh) * 2023-10-11 2023-12-22 江苏优立光学眼镜有限公司 一种眼镜镜片检测设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0146610B1 (ko) * 1995-03-15 1998-10-01 원우연 플렉시블 프린트 배선판의 회로패턴 연속노광장치
JP2006504987A (ja) * 2002-10-24 2006-02-09 マイクロシャープ コーポレイション リミテッド 略平行化された光を生成するための装置及びこの装置を使用して光重合可能な層を硬化する方法
JP2009016574A (ja) * 2007-07-04 2009-01-22 Panasonic Corp 固体撮像装置およびその製造方法
US20130301140A1 (en) * 2011-01-21 2013-11-14 Fujifilm Corporation Stack-type lens array and lens module
KR20130127136A (ko) * 2012-05-14 2013-11-22 성낙훈 선광원 발생장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0146610B1 (ko) * 1995-03-15 1998-10-01 원우연 플렉시블 프린트 배선판의 회로패턴 연속노광장치
JP2006504987A (ja) * 2002-10-24 2006-02-09 マイクロシャープ コーポレイション リミテッド 略平行化された光を生成するための装置及びこの装置を使用して光重合可能な層を硬化する方法
JP2009016574A (ja) * 2007-07-04 2009-01-22 Panasonic Corp 固体撮像装置およびその製造方法
US20130301140A1 (en) * 2011-01-21 2013-11-14 Fujifilm Corporation Stack-type lens array and lens module
KR20130127136A (ko) * 2012-05-14 2013-11-22 성낙훈 선광원 발생장치

Also Published As

Publication number Publication date
WO2015080538A2 (ko) 2015-06-04
KR20160101941A (ko) 2016-08-26

Similar Documents

Publication Publication Date Title
WO2015080538A3 (ko) 선광원 발생장치와 이를 구비한 노광기
CY1118168T1 (el) Διπλα ειδικα αντισωματα εναντι cd3εψιλον και bcma
EP3533794A3 (de) Materialien für elektronische vorrichtungen
EP3152616A4 (en) Efficient, dynamic, high contrast lensing with applications to imaging, illumination and projection
TR201900786T4 (tr) Nem alma aparatı.
TWD201816S (zh) 太陽能模組
JP2015513329A5 (ja) 手指衛生順守の決定方法
TWD202286S (zh) 太陽能模組
EP3417515A4 (en) HIGHLY EFFICIENT LASER SYSTEM FOR GENERATING A THIRD HARMONIOUS
MX2017002633A (es) Composicion polimerica para capa de elemento de capa.
BR112015008389A2 (pt) compostos úteis na síntese de compostos de benzamida
MX2017003344A (es) Composicion de polimero para capa de un elemento de capa.
WO2015061686A3 (en) Retinoid x receptor-gamma agonists and retinoid x receptor-alpha antagonists for treatment of cancer
IN2014DN11078A (ko)
CL2015002358A1 (es) Compuestos bicíclicos.
AR102469A1 (es) Bicicleta de cartón
MA37097A1 (fr) Conduction d'energie solaire en utilisant thermoplastics pour des applications agricoles
WO2015075426A3 (en) Thermoelectric generator
BR112018069435A2 (pt) composição de polímero de etileno, artigo, e, processo para produzir um artigo.
MX2016007158A (es) Empaque que comprende un elemento tactil.
WO2015024237A8 (en) Improved daily task tools that interface with backend systems
ES2570278A2 (es) Procedimientos para convertir residuos celulosicos en bioproductos
ES2486890A1 (es) Capa electroluminiscente para un dispositivo optoelectrónico
UA114603U (uk) Накісткова пластина для остеосинтезу з приливками та дротяним серкляжем
UY4331Q (es) La mesita

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14865581

Country of ref document: EP

Kind code of ref document: A2

NENP Non-entry into the national phase

Ref country code: DE

ENP Entry into the national phase

Ref document number: 20167017134

Country of ref document: KR

Kind code of ref document: A

122 Ep: pct application non-entry in european phase

Ref document number: 14865581

Country of ref document: EP

Kind code of ref document: A2