WO2015026139A1 - 유기물 마스크를 포함하는 적층체 및 이를 이용한 유기 발광 소자의 제조방법 - Google Patents
유기물 마스크를 포함하는 적층체 및 이를 이용한 유기 발광 소자의 제조방법 Download PDFInfo
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- WO2015026139A1 WO2015026139A1 PCT/KR2014/007698 KR2014007698W WO2015026139A1 WO 2015026139 A1 WO2015026139 A1 WO 2015026139A1 KR 2014007698 W KR2014007698 W KR 2014007698W WO 2015026139 A1 WO2015026139 A1 WO 2015026139A1
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- substrate
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- organic
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- organic material
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/211—Changing the shape of the active layer in the devices, e.g. patterning by selective transformation of an existing layer
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
- H10K71/221—Changing the shape of the active layer in the devices, e.g. patterning by lift-off techniques
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
Definitions
- the present application relates to a laminate including an organic mask and a method of manufacturing an organic light emitting device using the same.
- a method of forming a pattern indirectly through a photo mask process after forming a thin film by deposition or spin coating, or directly printing a pattern to be formed on a substrate In general, in order to form a patterned film, there is a method of forming a pattern indirectly through a photo mask process after forming a thin film by deposition or spin coating, or directly printing a pattern to be formed on a substrate.
- an alignment mark In order to pattern, an alignment mark must exist at a predetermined position on the substrate, and the alignment mark is aligned with the alignment hole position of the mask and then patterning is performed.
- the alignment mark which is the alignment standard of the mask and the substrate, is formed separately before the pattern processing step on the substrate.
- a metal film is deposited and then patterned in a cross, circle, and square form through a photo process, and another method is to print ink
- an alignment mark may be formed directly on the substrate with a laser.
- the present application is to provide a method of manufacturing an organic light emitting device using a laminate comprising an organic mask with improved process characteristics.
- It provides a method of manufacturing an organic light emitting device comprising the step of forming at least one of the first electrode, the organic material layer and the second electrode using the laminate.
- the alignment system in the vacuum evaporator is unnecessary during the deposition process of the organic material on the substrate, thereby reducing the load on the logistics system. Because of this, there is a feature that can reduce the cost in the process.
- the organic mask may move in a state where an organic mask is attached to the substrate, the mask does not occur when the substrate is moved.
- the present application may be more preferably applied in the use of large substrates, and more preferably in roll to roll deposition systems.
- FIG. 1 is a schematic view showing a deposition process system using a shadow mask of the prior art.
- FIG. 2 is a view schematically showing a laminate including a shadow mask according to an exemplary embodiment of the present application.
- FIG. 1 A deposition process system using a conventional shadow mask is schematically illustrated in FIG. 1.
- a deposition process system using a conventional shadow mask uses a system in which a substrate 20 is attached to a substrate holder 10 and a shadow mask 40 is attached to a shadow mask tray 50. .
- the laminate according to the exemplary embodiment of the present application includes a substrate; And a mask provided on the substrate and including an organic material.
- the organic material mask is directly provided on the substrate without using a separate shadow mask system. That is, the organic mask provided on the substrate may serve as a shadow mask.
- the material of the substrate may be appropriately selected according to the field to which the laminate according to the present application is to be applied, and preferred examples thereof include glass, an inorganic material substrate, a plastic substrate, and other flexible substrates. There is, but is not limited to this.
- the organic mask may be formed on a substrate by a printing method. More specifically, the printing method may be performed by transferring the material forming the organic mask to a desired pattern form on a substrate and then baking.
- the transfer method is not particularly limited, but a pattern may be formed on a pattern transfer medium such as an intaglio or a screen, and a desired pattern may be transferred onto the conductive film by using the pattern.
- the method of forming a pattern shape on the pattern transfer medium may use a method known in the art.
- the printing method is not particularly limited, and printing methods such as offset printing, reverse offset printing, screen printing, and gravure printing may be used.
- Offset printing may be performed by filling a paste on a patterned intaglio and then performing a primary transfer with a silicone rubber called a blanket, and then performing a secondary transfer by bringing the blanket and the substrate into close contact with each other.
- Screen printing can be performed by placing the paste on the patterned screen and then placing the paste on the substrate directly through the screen where the space is empty while pushing the squeegee.
- Gravure printing may be performed by winding a blanket engraved with a pattern on a roll, filling a paste into a pattern, and then transferring the result to a substrate.
- the above schemes may be used alone, or the above schemes may be used in combination.
- other printing methods known to those skilled in the art may be used.
- the intaglio may be manufactured by precisely etching the substrate.
- the intaglio may be prepared by etching a metal plate, or may be prepared through optical patterning through a polymer resin.
- the material capable of forming the organic mask any material known in the art may be used as long as it is a material capable of forming the mask by a printing method, and is not particularly limited. More specifically, the organic mask may include at least one of polyimide, polyethylene, polyvinyl chloride, and the like, but is not limited thereto.
- a laminate according to an exemplary embodiment of the present application includes a substrate 20; And a mask 30 provided on the substrate 20 and including an organic material.
- the mask including the organic material may be in the form of a pattern, and the mask including the organic material may have a shape having an inverse taper angle, but is not limited thereto.
- the shape having the reverse taper angle may be manufactured through two or more printing processes, but is not limited thereto.
- the method of manufacturing an organic light emitting diode includes forming at least one of a first electrode, an organic material layer, and a second electrode by using the laminate.
- the method of manufacturing an organic light emitting diode includes forming a mask including an organic material on a substrate. Since the material of the organic material, the method of forming the mask including the organic material and the like are the same as described above, a detailed description thereof will be omitted.
- the method may include forming a first electrode, an organic material layer, a second electrode, and the like on a laminate including the substrate and the mask by a deposition process.
- a laminate including the substrate and the mask may be used in the process of forming the first electrode, the organic material layer, or the second electrode by a deposition process.
- the organic material layer and the second electrode after forming one or more of the first electrode, the organic material layer and the second electrode, it may further comprise the step of removing the mask containing the organic material.
- the mask including the organic material may be removed.
- the removal method of the mask including the organic material may use a method known in the art, and more specifically, may use a film delamination method, but is not limited thereto.
- the mask including the organic material may be removed. Thereafter, the organic light emitting device may be manufactured by sequentially forming the organic material layer and the second electrode on the first electrode by using a method known in the art.
- the first electrode may be formed of one or more selected from magnesium, calcium, sodium, potassium, titanium, indium, yttrium, lithium, gadolinium, aluminum, platinum, gold, tungsten, tantalum, copper, silver, tin, and lead. .
- the first electrode may be formed of a transparent conductive oxide.
- the transparent conductive oxide may be formed of indium (In), tin (Sn), zinc (Zn), gallium (Ga), cerium (Ce), cadmium (Cd), magnesium (Mg), beryllium (Be), and silver (Ag). ), Molybdenum (Mo), vanadium (V), copper (Cu), iridium (Ir), rhodium (Rh), ruthenium (Ru), tungsten (W), cobalt (Co), nickel (Ni), manganese ( Mn), at least one oxide selected from aluminum (Al), and lanthanum (La).
- the first electrode is sputtering, e-beam evaporation, thermal evaporation, laser molecular beam epitaxy, L-MBE, and pulsed laser deposition.
- Laser Vapor Deposition selected from any one of Physical Vapor Deposition (PVD); Thermal Chemical Vapor Deposition, Plasma-Enhanced Chemical Vapor Deposition (PECVD), Light Chemical Vapor Deposition, Laser Chemical Vapor Deposition, Metal- Chemical Vapor Deposition selected from any one of an Organic Chemical Vapor Deposition (MOCVD) and a Hydride Vapor Phase Epitaxy (HVPE); Or it may be formed using an atomic layer deposition method (ALD).
- PVD Physical Vapor Deposition
- PECVD Plasma-Enhanced Chemical Vapor Deposition
- MOCVD Metal- Chemical Vapor Deposition
- HVPE Hydride Vapor Phase Epitaxy
- ALD atomic layer deposition method
- the auxiliary electrode may be further included to improve resistance of the first electrode.
- the auxiliary electrode may be formed of at least one selected from the group consisting of a conductive sealant and a metal using a deposition process or a printing process. More specifically, the auxiliary electrode may include Cr, Mo, Al, Cu, alloys thereof, and the like, but is not limited thereto.
- An insulating layer may be further included on the auxiliary electrode.
- the insulating layer may be formed using materials and methods known in the art. More specifically, common photoresist materials; Polyimide; Polyacrylic; Silicon nitride; Silicon oxide; Aluminum oxide; Aluminum nitride; Alkali metal oxides; It may be formed using an alkaline earth metal oxide or the like, but is not limited thereto.
- the thickness of the insulating layer may be 10 nm to 10 ⁇ m, but is not limited thereto.
- organic material layer is not particularly limited, and materials and formation methods well known in the art may be used.
- the organic layer may be formed into a smaller number of layers by using a variety of polymer materials, but not by a deposition process such as spin coating, dip coating, doctor blading, screen printing, inkjet printing or thermal transfer. It can manufacture.
- the organic material layer may include a light emitting layer, and may have a stacked structure including at least one selected from a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer.
- the hole injection material As a material capable of forming the hole injection layer, a material having a large work function is usually preferred to facilitate hole injection into the organic material layer.
- the hole injection material include metals such as vanadium, chromium, copper, zinc and gold or alloys thereof; Metal oxides such as zinc oxide, indium oxide, indium tin oxide (ITO), indium zinc oxide (IZO); A combination of a metal and an oxide such as ZnO: Al or SnO 2 : Sb; Conductive polymers such as poly (3-methylthiophene), poly [3,4- (ethylene-1,2-dioxy) thiophene] (PEDT), polypyrrole and polyaniline, and the like, but are not limited thereto.
- the material capable of forming the electron injection layer it is usually preferable that the material has a small work function to facilitate electron injection into the organic material layer.
- the electron injection material include metals such as magnesium, calcium, sodium, potassium, titanium, indium, yttrium, lithium, gadolinium, aluminum, silver, tin, and lead or alloys thereof; Multilayer structure materials such as LiF / Al or LiO 2 / Al, and the like, and the same material as the hole injection electrode material may be used, but is not limited thereto.
- a material capable of forming the light emitting layer a material capable of emitting light in the visible region by transporting and combining holes and electrons from the hole transporting layer and the electron transporting layer, respectively, is preferably a material having good quantum efficiency with respect to fluorescence or phosphorescence.
- Specific examples thereof include 8-hydroxyquinoline aluminum complex (Alq 3 ); Carbazole series compounds; Dimerized styryl compounds; BAlq; 10-hydroxybenzoquinoline-metal compound; Benzoxazole, benzthiazole and benzimidazole series compounds; Poly (p-phenylenevinylene) (PPV) -based polymers; Spiro compounds; Polyfluorene, rubrene; Phosphorescent host CBP [[4,4'-bis (9-carbazolyl) biphenyl]; Etc., but is not limited thereto.
- the light emitting material may further include a phosphorescent dopant or a fluorescent dopant to improve fluorescence or phosphorescent properties.
- a phosphorescent dopant include ir (ppy) (3) (fac tris (2-phenylpyridine) iridium) or F2Irpic [iridium (III) bis (4,6-di-fluorophenyl-pyridinato-N, C2) picolinate] Etc.
- the fluorescent dopant those known in the art may be used.
- the material capable of forming the electron transport layer a material capable of injecting electrons well from the electron injection layer and transferring the electrons to the light emitting layer is suitable.
- Specific examples include Al complexes of 8-hydroxyquinoline; Complexes including Alq 3 ; Organic radical compounds; Hydroxyflavone-metal complexes and the like, but are not limited thereto.
- the second electrode may include at least one of Al, Ag, Ca, Mg, Au, Mo, Ir, Cr, Ti, Pd, alloys thereof, and the like, but is not limited thereto.
- the method may further include encapsulating the organic light emitting device.
- the encapsulation is to prevent foreign substances such as oxygen and moisture from penetrating into the organic light emitting device, and may be performed using materials, methods, and the like known in the art.
- the encapsulation process may be performed by forming a sealing part covering the outside of the organic light emitting device.
- the material is not specifically limited.
- the outside of the organic light emitting device may be pressed with an encapsulation film, or a metal or metal oxide may be deposited to form a seal, or the resin composition may be coated and cured to form a seal.
- the sealing part may be formed by depositing a metal or a metal oxide by atomic layer deposition.
- the metal layer or the metal oxide layer formed may have a structure of two or more layers.
- an exemplary embodiment of the present application provides an organic light emitting device manufactured by the method of manufacturing the organic light emitting device.
- the organic light emitting diode may be a flexible organic light emitting diode.
- the organic light emitting device may include a light extraction structure. More specifically, the light extraction layer may be further included between the substrate and the organic light emitting device.
- the light extraction layer is not particularly limited so long as it has a structure capable of inducing light scattering to improve the light extraction efficiency of the organic light emitting device. More specifically, the light extraction layer may have a structure in which scattering particles are dispersed in a binder.
- the light extraction layer may be formed directly on the substrate by a method such as spin coating, bar coating, slit coating, or the like by forming and attaching a film.
- the light extraction layer may further include a flat layer.
- an exemplary embodiment of the present application provides a display device including the organic light emitting device.
- the organic light emitting diode may serve as a pixel or a backlight.
- Other configurations of the display apparatus may include those known in the art.
- an exemplary embodiment of the present application provides a lighting device including the organic light emitting device.
- the organic light emitting element serves as a light emitting unit.
- Other configurations required for the lighting device may be applied to those known in the art.
- the organic mask may serve as a conventional shadow mask. Accordingly, the alignment system in the vacuum evaporator is unnecessary during the deposition process of the organic material on the substrate, and the load of the logistics system can be reduced, thereby reducing the process costs.
- the organic mask may move in a state where an organic mask is attached to the substrate, the mask does not occur when the substrate is moved.
- the present application may be more preferably applied in the use of large substrates, and more preferably in roll to roll deposition systems.
Abstract
Description
Claims (7)
- 기판; 및상기 기판 상에 구비되고, 유기물을 포함하는 마스크를 포함하는 적층체.
- 청구항 1에 있어서, 상기 기판은 유리, 무기 재료 기판, 플라스틱 기판 또는 플렉시블 기판인 것을 특징으로 하는 적층체.
- 청구항 1에 있어서, 상기 유기물은 폴리이미드, 폴리에틸렌 및 폴리비닐클로라이드로 이루어진 군으로부터 선택되는 1종 이상을 포함하는 것을 특징으로 하는 적층체.
- 청구항 1에 있어서, 상기 유기물을 포함하는 마스크는 인쇄방법에 의하여 기판 상에 형성되는 것을 특징으로 하는 적층체.
- 청구항 1 내지 4 중 어느 한 항의 적층체를 이용하여, 제1 전극, 유기물층 및 제2 전극 중 1종 이상을 형성하는 단계를 포함하는 유기 발광 소자의 제조방법.
- 청구항 5에 있어서, 상기 제1 전극, 유기물층 및 제2 전극 중 1종 이상을 형성하는 단계는 증착공정을 이용하는 것을 특징으로 하는 유기 발광 소자의 제조방법.
- 청구항 5에 있어서, 상기 제1 전극, 유기물층 및 제2 전극 중 1종 이상을 형성한 후, 상기 유기물을 포함하는 마스크를 제거하는 단계를 추가로 포함하는 것을 특징으로 하는 유기 발광 소자의 제조방법.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14837570.2A EP3016170B1 (en) | 2013-08-19 | 2014-08-19 | Laminate having organic mask and method for manufacturing organic electroluminescent device using same |
CN201480045519.XA CN105453298B (zh) | 2013-08-19 | 2014-08-19 | 包括有机材料掩模的层压体以及使用其的有机发光装置的制造方法 |
US14/908,451 US9722181B2 (en) | 2013-08-19 | 2014-08-19 | Laminate having organic mask and method for manufacturing organic electroluminescent device using same |
JP2016531547A JP6487436B2 (ja) | 2013-08-19 | 2014-08-19 | 有機物マスクを含む積層体およびそれを用いた有機発光素子の製造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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KR10-2013-0097702 | 2013-08-19 | ||
KR20130097702 | 2013-08-19 |
Publications (1)
Publication Number | Publication Date |
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WO2015026139A1 true WO2015026139A1 (ko) | 2015-02-26 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/KR2014/007698 WO2015026139A1 (ko) | 2013-08-19 | 2014-08-19 | 유기물 마스크를 포함하는 적층체 및 이를 이용한 유기 발광 소자의 제조방법 |
Country Status (7)
Country | Link |
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US (1) | US9722181B2 (ko) |
EP (1) | EP3016170B1 (ko) |
JP (1) | JP6487436B2 (ko) |
KR (2) | KR20150021009A (ko) |
CN (1) | CN105453298B (ko) |
TW (1) | TWI622494B (ko) |
WO (1) | WO2015026139A1 (ko) |
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2014
- 2014-08-19 CN CN201480045519.XA patent/CN105453298B/zh active Active
- 2014-08-19 US US14/908,451 patent/US9722181B2/en active Active
- 2014-08-19 KR KR20140107883A patent/KR20150021009A/ko active Application Filing
- 2014-08-19 TW TW103128477A patent/TWI622494B/zh active
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JPH07235016A (ja) * | 1994-02-23 | 1995-09-05 | Hitachi Ltd | 薄膜磁気ヘッドの製造方法 |
US20110169399A1 (en) * | 2010-01-14 | 2011-07-14 | Canon Kabushiki Kaisha | Organic electroluminescent element and light-emitting apparatus using the same |
KR20110088427A (ko) * | 2010-01-28 | 2011-08-03 | 후지필름 가부시키가이샤 | 유기 전계 발광 소자 및 전하 수송 재료 |
KR20120076940A (ko) * | 2010-12-30 | 2012-07-10 | 엘지디스플레이 주식회사 | 유기 발광장치 및 제조방법 |
KR20130066271A (ko) * | 2011-12-12 | 2013-06-20 | 한국전자통신연구원 | 유기발광다이오드의 제조 방법 |
Non-Patent Citations (1)
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Also Published As
Publication number | Publication date |
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TWI622494B (zh) | 2018-05-01 |
KR20150066510A (ko) | 2015-06-16 |
KR101719123B1 (ko) | 2017-03-23 |
EP3016170A4 (en) | 2017-03-08 |
JP2016531396A (ja) | 2016-10-06 |
EP3016170B1 (en) | 2021-12-08 |
KR20150021009A (ko) | 2015-02-27 |
CN105453298B (zh) | 2018-07-27 |
TW201527092A (zh) | 2015-07-16 |
US20160197276A1 (en) | 2016-07-07 |
EP3016170A1 (en) | 2016-05-04 |
JP6487436B2 (ja) | 2019-03-20 |
US9722181B2 (en) | 2017-08-01 |
CN105453298A (zh) | 2016-03-30 |
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