WO2014148149A1 - Miroir et procédé de fabrication de ce dernier - Google Patents

Miroir et procédé de fabrication de ce dernier Download PDF

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Publication number
WO2014148149A1
WO2014148149A1 PCT/JP2014/053164 JP2014053164W WO2014148149A1 WO 2014148149 A1 WO2014148149 A1 WO 2014148149A1 JP 2014053164 W JP2014053164 W JP 2014053164W WO 2014148149 A1 WO2014148149 A1 WO 2014148149A1
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WO
WIPO (PCT)
Prior art keywords
mirror
sic
support layer
layer
support
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Application number
PCT/JP2014/053164
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English (en)
Japanese (ja)
Inventor
淳仁 長田
コンスタンドポウロス・アタナシオス・ジー
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イビデン株式会社
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Publication of WO2014148149A1 publication Critical patent/WO2014148149A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24S—SOLAR HEAT COLLECTORS; SOLAR HEAT SYSTEMS
    • F24S23/00—Arrangements for concentrating solar-rays for solar heat collectors
    • F24S23/70—Arrangements for concentrating solar-rays for solar heat collectors with reflectors
    • F24S23/82—Arrangements for concentrating solar-rays for solar heat collectors with reflectors characterised by the material or the construction of the reflector
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/40—Solar thermal energy, e.g. solar towers

Definitions

  • the present invention relates to a mirror and a manufacturing method thereof.
  • the new energy sources there is solar power generation that collects sunlight and uses it as energy. Since the use of solar heat does not use a semiconductor, the cost per unit area can be reduced as compared with a solar cell, and the initial investment for use in a large area can be kept low.
  • This power generator condenses sunlight to heat water, chlorofluorocarbon, and the like, and generates power by rotating a turbine with superheated steam or the like.
  • the trough condensing method is a method in which sunlight is reflected by a semi-cylindrical mirror (trough), condensed and collected on a pipe passing through the center of the cylinder, and the temperature of the heat medium passing through the pipe is increased.
  • a semi-cylindrical mirror trough
  • the uniaxial control changes the direction of the mirror so as to track the sunlight, a high temperature rise of the heat medium cannot be expected.
  • the tower condensing method is a heliostat (solar condensing system) that surrounds the periphery of the tower part while arranging the solar heat receiver on the tower part (supporting part) erected from the ground. ), A plurality of reflected light control mirrors for collecting light are arranged, and the sunlight reflected by these heliostats is led to a solar heat receiver to collect and collect heat.
  • heliostat solar condensing system
  • the heliostat that collects sunlight is composed of a plurality of mirrors, and is configured to reflect and collect sunlight on a heat receiving portion or the like, and to generate power with the heat.
  • a reflective film such as Ag is formed on glass and used as a mirror for solar power generation.
  • Patent Document 1 it is described that when used in a dental dental mirror, a solar power collector, etc., the surface is hardly damaged and excellent characteristics can be maintained over a long period of time.
  • Sand is composed of various components.
  • a mirror having a reflective film such as Ag on a conventional glass the surface is damaged by sand when used for a long period of time, and the reflectivity is lowered or cracking is caused.
  • the ceramic mirror described in Patent Document 1 is a mirror mainly used in precision optical equipment such as a camera and a laser, and there is no specific description in a solar power generation application.
  • desert areas suitable for power generation often have no means of transportation, and a large amount of necessary mirror transportation means becomes a problem. For this reason, it is desirable that the mirror be lightweight, and if it is a lightweight mirror, a large amount of mirrors can be transported at one time, and the burden on the control device that drives the mirror can be reduced.
  • the present invention has been made in consideration of such circumstances, and an object of the present invention is to provide a mirror that is lightweight, hardly damaged, and has long-term reliability.
  • the solving means of the present invention for solving the above problems comprises a support layer made of SiC, a reflective layer provided under the support layer, and a protective layer provided under the reflective layer. To do.
  • the reflective layer is protected from both sides by the support layer made of SiC and the protective layer.
  • SiC is harder than many components contained in sand, so that the surface is hardly damaged and long-term reliability can be ensured.
  • the support layer made of SiC has a high transmittance region in the visible light to infrared region, and therefore can be suitably used as a mirror in combination with the reflection layer.
  • the support layer made of SiC has high strength and hardness, it is difficult to be damaged, and even if it is thin, it can be made difficult to crack. For this reason, the mirror using this as a support layer can be reduced in weight.
  • up indicates the direction on the side of the mirror and “down” indicates the opposite direction. That is, when light travels through the reflective layer at an incident angle of 0 °, the direction is from top to bottom, and after reflection, the light travels from bottom to top.
  • light means electromagnetic waves, and is not limited to visible light, but in particular, infrared and visible light that easily transmit thermal energy are mainly targeted.
  • the mirror of the present invention comprises a support layer made of SiC, a reflection layer provided under the support layer, and a protective layer provided under the reflection layer.
  • the support layer made of SiC of the mirror of the present invention is disposed on the surface of the mirror that is exposed to light, and may be a flat surface or a curved surface. In the case of a curved surface, the curved surface may be formed by bending a flat surface.
  • the material of the support layer made of SiC of the mirror of the present invention is not particularly limited, but CVD-SiC or SiC single crystal can be used.
  • the crystal form and crystal direction are not particularly limited.
  • ⁇ type, ⁇ type, ⁇ - ⁇ mixed type can be used in the crystal form, and (111), (200), (220) planes can be used in the crystal direction.
  • the mirror of the present invention is made of CVD-SiC
  • the crystal form and the crystal direction are not particularly limited, but those having high crystallinity are preferably used. When the crystallinity is high, there are few portions that obstruct light transmission inside, and light scattering can be made difficult. High crystallinity is characterized by having a sharp peak in the X-ray diffraction spectrum. Specific features will be described later.
  • the support layer made of SiC of the mirror of the present invention is preferably transparent. Specifically, it is desirable to have a transmittance of 5% or more for light with a wavelength of 660 nm. When the transmittance is 5% or more, light can be efficiently reflected. Further, the transmittance for light having a wavelength of 660 nm is 40% or more. If it is 40% or more, light can be reflected more efficiently.
  • the reflectance of the support layer made of SiC can be adjusted by appropriately adjusting the thickness.
  • the support layer made of SiC of the mirror of the present invention preferably has a thickness of 1 to 100 ⁇ m.
  • the support layer made of SiC is 1 ⁇ m or more, even if scattered sand hits the surface, cracks hardly occur, so that deterioration of the reflective surface under the SiC coating layer can be prevented.
  • the thickness of the support layer made of SiC is 100 ⁇ m or less, the light transmission distance can be shortened, so that the light absorption can be reduced.
  • the support layer made of SiC of the mirror of the present invention preferably has a surface roughness Ra of 100 nm or less on both the upper side surface and the lower side surface.
  • Ra a surface roughness of 100 nm or less on both the upper side surface and the lower side surface.
  • the support layer made of SiC of the mirror of the present invention preferably has high crystallinity.
  • (111) shows the strongest peak
  • the intensity ratio is preferably 40 or more.
  • the (111) / (311) intensity ratio is the ratio of peak heights.
  • the crystallinity increases, so that the crystal is less disturbed, the scattering of light passing through the interior is reduced, and the transmittance can be increased.
  • a more preferable (111) / (311) intensity ratio is 400 or more.
  • the support layer made of SiC of the mirror of the present invention is preferably made of only ⁇ -SiC or ⁇ -SiC.
  • SiC includes high temperature type ⁇ -SiC and low temperature type ⁇ -SiC depending on the generation temperature.
  • ⁇ -SiC has crystal structure isomers such as 6H, 4H and 2H due to the difference in the repetition period of the layered arrangement of Si and C.
  • ⁇ -SiC has a cubic crystal structure with only one type of crystal structure.
  • the crystal structure is composed only of ⁇ -SiC or ⁇ -SiC.
  • ⁇ -SiC having various crystal structures does not coexist so that light can be hardly scattered, and since it is a low-temperature type, it can be easily manufactured.
  • the support layer made of SiC of the mirror of the present invention preferably has a (111) peak half-width of 0.19 ° or less in an X-ray diffraction spectrum using Cu—K ⁇ rays.
  • the half width of the (111) peak is 0.19 °, the crystal orientation is less disturbed, the scattering of light passing through the interior is reduced, and the transmittance can be increased.
  • the reflective layer of the mirror of the present invention is preferably composed of one or more selected from tungsten, molybdenum, aluminum, silver, gold, zirconium, titanium, and a dielectric multilayer film. Since these metals have a high reflectance in the visible light to infrared region, which is easily converted into thermal energy, they can be suitably used as a reflective layer of a mirror that can be used for solar thermal power generation. Having a plurality of reflective layers means a multilayer film. Moreover, when a reflection layer consists of metals, it can utilize regardless of a pure metal and an alloy.
  • the protective layer of the mirror of the present invention is not particularly limited as long as it has more corrosion resistance and weather resistance than the reflective layer. Ceramics such as low melting point glass and water glass, metals such as gold, silver, tin and nickel, and resins can be used. Especially, it is preferable that the protective layer of a mirror consists of resin. Since the resin can be formed thick and is soft, it does not cause thermal distortion in the mirror and can be used suitably.
  • the resin used for the protective layer of the mirror of the present invention is not particularly limited, such as a thermosetting resin or a thermoplastic resin. Various resins such as polyolefins such as polyethylene and polypropylene, epoxy resins, phenol resins, silicone resins, and fluorine resins can be used.
  • the mirror of the present invention preferably has a support for supporting the mirror further under the protective layer.
  • the support is for holding the mirror and has a function of preventing deformation due to its own weight, wind pressure, and the like.
  • a plate-like body, a truss structure, a ramen structure, an arch structure, or the like can be used. Further, a plate-like support and other structures may be used in combination. By using these supports, a light and high-strength mirror can be obtained.
  • a protective layer can also have a function as an adhesive layer.
  • the support is a plate-like body
  • the support can cover the entire protective layer, the corrosion resistance and weather resistance required for the adhesive layer are reduced, so the degree of freedom in selecting the adhesive layer is widened.
  • a protective layer having a high adhesion can be used.
  • the mirror of the present invention can be suitably used as a mirror for photovoltaic power generation.
  • Examples 1 to 3 of the mirror of the present invention will be described in order. Items common to Examples 1 to 3 will be described first, and a support layer made of SiC, which is a difference from Examples 1 to 3, will be described in detail later.
  • ⁇ Polishing process of support layer made of SiC> S2 Perform double-sided mirror polishing of SiC plate material. Starting with rough cutting, the final finish is a double-sided polishing finish using a polishing sheet having a particle size range of 0 to 3 ⁇ m and having a surface roughness Ra of 100 nm or less. Simultaneously with the surface finishing process, the film thickness of the SiC plate material is also finished to 100 ⁇ m or less. Polishing is finished when the thickness of the SiC plate is 100 ⁇ m or less and the surface roughness Ra is 100 nm or less, and the substrate is used as a support layer made of SiC.
  • a silver reflective layer is formed by sputtering.
  • a protective layer that covers the reflective layer is formed.
  • the protective layer can be obtained by applying an epoxy resin to the protective layer and curing it.
  • a support is affixed to a mirror obtained by sequentially forming a reflective layer and a protective layer on a support layer made of SiC.
  • the support may be attached to the mirror before the protective layer in the previous protective layer forming step is cured, or after the protective layer is formed, a new adhesive may be applied. good.
  • Example 1 A single CVD-SiC film manufactured by Admap is prepared and used as a SiC plate material.
  • Example 2 A CVD-SiC coated graphite material is formed using a CVD furnace. CH 3 SiCl 3 as a source gas and H 2 as a carrier gas are supplied into the CVD furnace. The CVD furnace is formed at a temperature of 1200 ° C. and a pressure of atmospheric pressure. The film formation time was 25 hours. When removed from the CVD furnace, the thickness of the CVD-SiC was 1000 ⁇ m. Graphite is removed from the obtained CVD-SiC coated graphite material, and this is used as a SiC plate material.
  • Example 3 A fine crystal SiC film manufactured by Interface Co., Ltd. is prepared and used as a SiC plate material.
  • a quartz glass having a thickness of 1500 ⁇ m and a surface roughness Ra of 20 nm is prepared, and a mirror is formed by sputtering silver on the lower surface.
  • the thickness of the obtained support layer made of SiC of Examples 1 to 3 and the surface roughness Ra of the lower surface which is the side on which the reflective layer is formed are measured. Further, an X-ray diffraction spectrum using Cu—K ⁇ rays is measured, and the plane direction showing the strongest peak (maximum peak), the (111) / (311) intensity ratio, and the half width of the (111) peak are measured. (Table 1)
  • the spectral transmittance is measured using a self-recording spectrophotometer UV3150 manufactured by Shimadzu Corporation.
  • a self-recording spectrophotometer UV3150 manufactured by Shimadzu Corporation.
  • an Rigaku X-ray diffractometer Ultima IV is used for the measurement of the X-ray diffraction spectrum.
  • FIGS. 6 shows the pattern of the first embodiment
  • FIG. 7 shows the pattern of the second embodiment
  • FIG. 8 shows the pattern of the third embodiment.
  • Example 1 and Example 2 since there was no 33.6 ° peak based on ⁇ -SiC beside the (111) peak, the mixture of ⁇ -SiC was suppressed, and it was made of SiC. It can be confirmed that the support layer is composed only of ⁇ -SiC. In Example 3, a 33.6 ° peak based on ⁇ -SiC next to the (111) peak exists, and it is confirmed that ⁇ -SiC and ⁇ -SiC are mixed.
  • the spectral transmittance and spectral reflectance of the support layers made of SiC of Examples 1 to 3 are measured at wavelengths of 220 to 850 nm.
  • quartz glass is also measured simultaneously.
  • the spectral reflectance of the mirrors of Examples 1 to 3 is measured in the wavelength range of 220 to 850 nm.
  • the protective layer is not formed because it does not affect the measurement.
  • the spectral reflectance is measured using a Shimadzu auto-recorded spectrophotometer UV3150 using a ⁇ 60 integrating sphere under the conditions of 220-850 nm detection, an incident angle of 8 °, and a slit width of 20 nm.
  • FIG. 3 shows spectral reflectances of the support layers made of SiC of Examples 1 to 3 and the silica glass of the comparative example.
  • the spectral reflectance of only the support layer made of SiC and quartz glass is shown.
  • the support layer made of SiC is higher than quartz in the measured wavelength range.
  • Example 1 and Example 2 with high crystallinity have a reflectance higher than that of Example 3 in the wavelength region of approximately 500 nm or more, and the higher crystallinity is particularly in the infrared region. It turns out that it is advantageous to a reflectance.
  • FIG. 4 shows spectral transmittances of the support layers made of SiC of Examples 1 to 3 and the quartz glass of the comparative example.
  • the thickness of the sample is 100 ⁇ m in Examples 1 to 3 (SiC) and 1500 ⁇ m in the comparative example (quartz glass).
  • the transmittance of the support layer made of SiC is lower than that of quartz glass.
  • the difference becomes smaller in the support layers made of SiC of Examples 1 and 2 having higher crystallinity.
  • the support layer made of SiC having high crystallinity has a high transmittance of visible light and infrared rays on the side having a long wavelength at which heat energy is easily transmitted.
  • the spectral transmittance is 57% in Example 1, 49% in Example 2, 5% in Example 3, and 94% in the comparative example (quartz glass) with respect to the electromagnetic wave having a wavelength of 660 nm.
  • FIG. 5 shows the spectral reflectance of mirrors using the mirrors of Examples 1 to 3 and the comparative example of quartz glass.
  • the light incident on the samples of Examples and Comparative Examples passes through the support layer (or quartz glass), is reflected by the reflection layer, and is reflected by passing through the support layer (or quartz glass).
  • the thickness of the sample is 100 ⁇ m in Examples 1 to 3 (SiC) and 1500 ⁇ m in the comparative example (quartz glass).
  • Example 1 and Example 2 in which the support layer made of SiC has a high degree of crystallinity, it is confirmed that the reflectance in the visible light to infrared region from infrared is high.
  • the spectral reflectance is 72% in Example 1, 54% in Example 2, 22% in Example 3, and 94% in the comparative example (quartz glass) with respect to the electromagnetic wave having a wavelength of 660 nm.
  • the mirror using the support layer made of SiC harder than the sand component that can exist in the desert can reflect light in the visible to infrared region and can be used as a mirror.
  • (111) shows the strongest peak, and the (111) / (311) intensity ratio is 40 or more, and the support layer is made of highly crystalline CVD-SiC. Since it has a high transmittance in the visible light to infrared region, it is confirmed that a high reflectance can be obtained by combining with a reflective layer.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Sustainable Energy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Sustainable Development (AREA)
  • General Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

La présente invention se rapporte à un miroir léger qui présente une fiabilité à long terme. Le miroir comprend une couche de support (1) composée de carbure de silicium (SiC), une couche réfléchissante (2) agencée sous la couche de support et une couche de protection (3) agencée sous la couche réfléchissante. La couche réfléchissante est protégée sur les deux côtés par la couche de support composée de carbure de silicium (SiC) et par la couche de protection. Il s'ensuit que, lorsqu'il est utilisé comme miroir pour permettre une production d'énergie solaire, la surface est difficile à endommager et une fiabilité à long terme est assurée parce que la couche de carbure de silicium (SiC) est plus dure que la plupart des substances contenues dans le sable. De même, selon la présente invention, la couche de support composée de carbure de silicium (SiC) comporte une zone ayant une transmissivité élevée dans une zone allant de la lumière visible à la lumière infrarouge et, donc, en combinaison avec la couche réfléchissante, peut être utilisée de manière appropriée comme miroir. De plus, la couche de support composée de carbure de silicium (SiC) présente un haut degré de résistance et de dureté et, donc, il est difficile de l'endommager et il est difficile de la fissurer même s'il est mince. Par conséquent, il est possible de réduire le poids d'un miroir en utilisant cette dernière comme couche de support.
PCT/JP2014/053164 2013-03-22 2014-02-12 Miroir et procédé de fabrication de ce dernier WO2014148149A1 (fr)

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JP2013-059336 2013-03-22
JP2013059336 2013-03-22

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015033806A1 (fr) * 2013-09-06 2015-03-12 イビデン株式会社 Miroir réfléchissant

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661536A (en) * 1979-10-22 1981-05-27 Agency Of Ind Science & Technol Reflection type heat collecting plate and method of manufacturing and using the same
JPS574003A (en) * 1980-06-11 1982-01-09 Toshiba Electric Equip Corp Solar energy absorber
JPS63210276A (ja) * 1987-02-26 1988-08-31 Mitsui Eng & Shipbuild Co Ltd ミラー
JPH04114971A (ja) * 1990-09-05 1992-04-15 Nippon Pillar Packing Co Ltd 複合材
JPH06239609A (ja) * 1992-11-23 1994-08-30 Cvd Inc 新規な光透過性の自立β−ＳｉＣとその製造方法
JP2003068594A (ja) * 2001-08-29 2003-03-07 Tokai Carbon Co Ltd ＳｉＣダミーウエハ及びその製造方法
JP2012251695A (ja) * 2011-06-01 2012-12-20 Konica Minolta Advanced Layers Inc 太陽光集光システム及びミラー

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5661536A (en) * 1979-10-22 1981-05-27 Agency Of Ind Science & Technol Reflection type heat collecting plate and method of manufacturing and using the same
JPS574003A (en) * 1980-06-11 1982-01-09 Toshiba Electric Equip Corp Solar energy absorber
JPS63210276A (ja) * 1987-02-26 1988-08-31 Mitsui Eng & Shipbuild Co Ltd ミラー
JPH04114971A (ja) * 1990-09-05 1992-04-15 Nippon Pillar Packing Co Ltd 複合材
JPH06239609A (ja) * 1992-11-23 1994-08-30 Cvd Inc 新規な光透過性の自立β−ＳｉＣとその製造方法
JP2003068594A (ja) * 2001-08-29 2003-03-07 Tokai Carbon Co Ltd ＳｉＣダミーウエハ及びその製造方法
JP2012251695A (ja) * 2011-06-01 2012-12-20 Konica Minolta Advanced Layers Inc 太陽光集光システム及びミラー

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015033806A1 (fr) * 2013-09-06 2015-03-12 イビデン株式会社 Miroir réfléchissant

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