WO2014142193A1 - Adhesive sheet - Google Patents

Adhesive sheet Download PDF

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Publication number
WO2014142193A1
WO2014142193A1 PCT/JP2014/056549 JP2014056549W WO2014142193A1 WO 2014142193 A1 WO2014142193 A1 WO 2014142193A1 JP 2014056549 W JP2014056549 W JP 2014056549W WO 2014142193 A1 WO2014142193 A1 WO 2014142193A1
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WO
WIPO (PCT)
Prior art keywords
pressure
sensitive adhesive
region
adhesive
acrylate
Prior art date
Application number
PCT/JP2014/056549
Other languages
French (fr)
Japanese (ja)
Inventor
高正 平山
和寛 北山
Original Assignee
日東電工株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日東電工株式会社 filed Critical 日東電工株式会社
Priority to KR1020157024749A priority Critical patent/KR102207511B1/en
Priority to JP2015505527A priority patent/JPWO2014142193A1/en
Priority to CN201480016007.0A priority patent/CN105073929A/en
Publication of WO2014142193A1 publication Critical patent/WO2014142193A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J5/00Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
    • C09J5/06Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving heating of the applied adhesive
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836Wafer tapes, e.g. grinding or dicing support tapes
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/40Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/412Additional features of adhesives in the form of films or foils characterized by the presence of essential components presence of microspheres
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/50Additional features of adhesives in the form of films or foils characterized by process specific features
    • C09J2301/502Additional features of adhesives in the form of films or foils characterized by process specific features process for debonding adherents
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68318Auxiliary support including means facilitating the separation of a device or wafer from the auxiliary support
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68381Details of chemical or physical process used for separating the auxiliary support from a device or wafer

Definitions

  • the present invention relates to an adhesive sheet.
  • a pressure-sensitive adhesive sheet for fixing a workpiece (substrate) for preventing a reduction in cutting accuracy due to stress and vibration during processing is used.
  • the pressure-sensitive adhesive sheet is required to have a sufficient adhesive force with respect to the workpiece during processing, and after processing, it is required that the cut workpiece (electronic component) can be easily peeled off.
  • an adhesive sheet containing thermally expandable microspheres in an adhesive is known (for example, Patent Document 1).
  • the pressure-sensitive adhesive sheet containing the heat-expandable microspheres exhibits sufficient pressure-sensitive adhesive force during the above-mentioned processing because the heat-expandable microspheres are expanded by heating or foamed to reduce the pressure-sensitive adhesive force.
  • the electronic component can be easily peeled off.
  • the thermally expandable microspheres protrude from the adhesive, which is inferior in adhesion to the base material or processing base. There is a problem that the remarkably decreases.
  • the present invention has been made in order to solve the above-described conventional problems, and an object of the present invention is to realize excellent cutting accuracy and reduction of cutting waste when cutting a small part such as an electronic part. It is to provide an adhesive sheet.
  • the pressure-sensitive adhesive sheet of the present invention has a pressure-sensitive adhesive surface whose adhesive strength is reduced by heating only on one side, and the elastic modulus by a nanoindentation method at 25 ° C. of the surface opposite to the pressure-sensitive adhesive surface is 1 MPa or more.
  • the pressure-sensitive adhesive region includes the pressure-sensitive adhesive surface as a surface, and a covering material region adjacent to the pressure-sensitive adhesive region on the side opposite to the pressure-sensitive adhesive surface. , Including an adhesive and thermally expandable microspheres.
  • region is 50 micrometers or less.
  • the adhesive force at the time of sticking the said adhesive surface side to a polyethylene terephthalate film is 0.2 N / 20mm or more.
  • the ratio (a2 / a1) of the pressure-sensitive adhesive force (a1) before heating to the pressure-sensitive adhesive force (a2) after heating is 0.0001 to 0.5.
  • the surface roughness Ra of the adhesive surface after heating is 3 ⁇ m or more.
  • a base material is further provided on the opposite side to the said adhesive surface.
  • the present invention has a pressure-sensitive adhesive surface whose adhesive strength is reduced by heating, and the elastic modulus of the surface opposite to the pressure-sensitive adhesive surface is relatively high.
  • An adhesive sheet capable of realizing excellent cutting accuracy can be obtained. More specifically, in the present invention, a pressure-sensitive adhesive region including a pressure-sensitive adhesive and thermally expandable microspheres and having a pressure-sensitive adhesive surface as a surface is formed, and the pressure-sensitive adhesive region on the side opposite to the pressure-sensitive adhesive surface is relatively high.
  • A. 1 is a schematic sectional view of a pressure-sensitive adhesive sheet according to a preferred embodiment of the present invention.
  • the pressure-sensitive adhesive sheet 100 has the pressure-sensitive adhesive surface 11 only on one side thereof.
  • the pressure-sensitive adhesive sheet 100 has a surface 21 having an elastic modulus of 1 MPa or more at 25 ° C. as a surface 21 opposite to the pressure-sensitive adhesive surface 11.
  • a surface having such an elastic modulus can be formed, for example, by providing a covering material region 20 as described below.
  • the pressure-sensitive adhesive sheet 100 preferably includes thermally expandable microspheres 13 that can expand or foam by heating.
  • the pressure-sensitive adhesive sheet 100 has a pressure-sensitive adhesive region 10 including a pressure-sensitive adhesive surface 11 as a surface, and a coating material region 20 adjacent to the pressure-sensitive adhesive region 10 opposite to the pressure-sensitive adhesive surface 11.
  • the adhesive region 10 preferably includes an adhesive 12 and thermally expandable microspheres 13.
  • the pressure-sensitive adhesive region 10 refers to a region from the pressure-sensitive adhesive surface 11 to the interface 1 between the pressure-sensitive adhesive 12 constituting the pressure-sensitive adhesive region 10 and the material constituting the coating material region 20.
  • the covering material region 20 is a region from the interface 1 between the adhesive 12 constituting the adhesive region 10 and the material constituting the covering material region 20 to the surface 21 opposite to the adhesive surface 11.
  • the thermally expandable microsphere 13 may protrude from the adhesive region 10 to the covering material region 20.
  • the thermally expandable microspheres 13 protruding from the pressure-sensitive adhesive region 10 can be covered with the covering material region 20, and as a result, the influence of unevenness due to the thermally expandable microspheres 13 can be eliminated.
  • the outer surface (lower surface in the illustrated example) of the covering material region 20 is a surface 21 having an elastic modulus of 1 MPa or more by the nanoindentation method.
  • the adhesive surface 11 may be protected by disposing a release paper outside the adhesive surface 11 until the adhesive sheet is put to practical use.
  • the interface 1 is clearly illustrated, but the interface may be an interface that is difficult to distinguish visually or with a microscope.
  • the interface that is difficult to discriminate visually or with a microscope can be discriminated by analyzing the composition of each region (details will be described later).
  • the thermally expandable microsphere 13 protrudes from the adhesive region 10 by forming the coating material region 20 having an elastic modulus appropriately adjusted on the side opposite to the adhesive surface 11. Allowing the adhesive region 10 to be thinned. If the pressure-sensitive adhesive region 10 which is a low elastic region is thinned, it can contribute to the realization of excellent cutting accuracy as a temporary fixing sheet when cutting an electronic component or the like. More specifically, if an electronic component or the like is cut using a pressure-sensitive adhesive sheet having a thin pressure-sensitive adhesive region 10 as a temporary fixing sheet, the chip after cutting is reattached because the pressure-sensitive adhesive sheet is less deformed. It is possible to prevent the cutting surface from becoming slanted or S-shaped, and preventing chipping during cutting.
  • the pressure-sensitive adhesive sheet of the present invention has the above-mentioned effect in cutting with a rotary blade frequently used in a dicing process, and also has the above-mentioned effect in cutting with a flat blade adopted to reduce cutting loss. It is particularly useful. Further, even when cutting under heating (for example, 30 ° C. to 150 ° C.), the cutting can be performed with high accuracy as described above.
  • the adhesive sheet of this invention removes a to-be-adhered body (for example, chip
  • a to-be-adhered body for example, chip
  • the adhesive strength when the adhesive surface of the adhesive sheet of the present invention is attached to a polyethylene terephthalate film is preferably 0.2 N / 20 mm or more, more preferably 0.2 N / 20 mm to 20 N / 20 mm, more preferably 2 N / 20 mm to 10 N / 20 mm. If it is such a range, the adhesive sheet useful as a temporary fixing sheet at the time of cutting an electronic component etc. can be obtained.
  • the adhesion is an adhesion measured by a method according to JIS Z 0237: 2000 (measurement temperature: 23 ° C., bonding condition: 2 kg roller 1 reciprocation, peeling speed: 300 mm / min, peeling angle 180 °). I say power.
  • the pressure-sensitive adhesive strength of the pressure-sensitive adhesive sheet of the present invention is preferably 0.2 N / 20 mm or less, more preferably 0.1 N / 20 mm, after the pressure-sensitive adhesive surface of the pressure-sensitive adhesive sheet is adhered to a polyethylene terephthalate film (for example, 25 ⁇ m thick) and heated. It is as follows.
  • the heating of the pressure-sensitive adhesive sheet refers to heating at a temperature and time at which the heat-expandable microspheres expand or foam and the adhesive force is reduced. The heating is, for example, heating at 70 to 270 ° C. for 1 to 10 minutes.
  • the adhesive force when adhering the adhesive surface of the adhesive sheet of the present invention to a polyethylene terephthalate film (for example, 25 ⁇ m thick) (that is, the adhesive force before heating (a1)) and the adhesive force after heating (a2)
  • the ratio (a2 / a1) is preferably 0.5 or less, more preferably 0.1 or less.
  • the lower limit of (a2 / a1) is preferably 0.0001, and more preferably 0.0005.
  • the pressure-sensitive adhesive sheet of the present invention is uneven at the pressure-sensitive adhesive surface when heated at a predetermined temperature.
  • the surface roughness Ra of the pressure-sensitive adhesive surface after heating the pressure-sensitive adhesive sheet of the present invention is preferably 3 ⁇ m or more, more preferably 5 ⁇ m or more. Within such a range, a pressure-sensitive adhesive sheet can be obtained in which the adhesive strength decreases or disappears after heating and the adherend can be easily peeled off.
  • the surface roughness Ra of the pressure-sensitive adhesive surface refers to the surface roughness Ra of the pressure-sensitive adhesive surface of the pressure-sensitive adhesive sheet after heating without an adherend.
  • the surface roughness Ra can be measured according to JIS B 0601: 1994.
  • FIG. 2 is a schematic cross-sectional view of an adhesive sheet according to another preferred embodiment of the present invention.
  • the pressure-sensitive adhesive sheet 200 further includes a base material 30 on the side opposite to the pressure-sensitive adhesive surface 11.
  • any appropriate pressure-sensitive adhesive layer or adhesive layer may be provided on the opposite side of the base material 30 from the covering material region 20.
  • the release sheet may be arrange
  • the release paper can be attached to the substrate via any suitable adhesive.
  • the adhesive region 10 and the covering material region 20 are formed on one side of the base material 30, but the adhesive region 10 and the covering material region 20 are formed on both sides of the base material 30.
  • a configuration of adhesive region / coating material region / base material / coating material region / adhesive region may be employed.
  • the pressure-sensitive adhesive sheet of the present invention has an elastic modulus at 25 ° C. on the surface opposite to the pressure-sensitive adhesive surface of 1 MPa or more, preferably 1 MPa to 5000 MPa, more preferably as described above. Is from 1 MPa to 3500 MPa, more preferably from 1 MPa to 1000 MPa, and particularly preferably from 10 MPa to 600 MPa.
  • the pressure-sensitive adhesive sheet having a surface exhibiting such an elastic modulus can be obtained, for example, by forming a covering material region formed of a material different from the pressure-sensitive adhesive region.
  • the elastic modulus of the coating material region by the nanoindentation method may correspond to the elastic modulus of the surface opposite to the adhesive surface by the nanoindentation method.
  • the modulus of elasticity by the nanoindentation method is obtained by continuously measuring the load and depth of indentation when the indenter is pushed into the sample (for example, adhesive surface) during loading and unloading.
  • the elastic modulus by the nanoindentation method means an elastic modulus measured as described above under the measurement conditions of load: 1 mN, load / unloading speed: 0.1 mN / s, and holding time: 1 s.
  • an electronic component or the like can be obtained by forming a surface having an elastic modulus of 1 MPa or more by the nanoindentation method on the side opposite to the adhesive surface, that is, by forming a covering material region exhibiting the elastic modulus. It is possible to provide an adhesive sheet that can contribute to the realization of excellent cutting accuracy as a temporary fixing sheet for cutting. Further, by setting the elastic modulus of the coating material region by the nanoindentation method to 5000 MPa or less, the coating material region can follow the unevenness of the thermally expandable microsphere protruding from the adhesive region, and the thermally expandable micro The thermally expandable microsphere can be coated in a form in which a sphere is embedded. In addition, it is possible to provide a pressure-sensitive adhesive sheet that can contribute to the realization of excellent cutting accuracy without impairing the flexibility required for the whole pressure-sensitive adhesive sheet (for example, flexibility enough to follow the adherend).
  • the tensile elastic modulus at 25 ° C. of the coating material region is preferably 1 MPa or more, more preferably 1 MPa to 5000 MPa, and further preferably 1 MPa to 1000 MPa. If it is such a range, the effect similar to the effect demonstrated above about the elasticity modulus by a nanoindentation method can be acquired.
  • the tensile elastic modulus can be measured according to JIS K 7161: 2008.
  • the bending elastic modulus at 25 ° C. of the coating material region is preferably 1 MPa or more, more preferably 1 MPa to 5000 MPa, and further preferably 1 MPa to 1000 MPa. If it is such a range, the effect similar to the effect demonstrated above about the elasticity modulus by a nanoindentation method can be acquired.
  • the flexural modulus can be measured according to JIS K 7171: 2008.
  • the thickness of the covering material region can be set to any appropriate value according to the unevenness (size) of the thermally expandable microsphere protruding from the adhesive region.
  • the thickness of the coating material region is preferably a thickness that can cover all the thermally expandable microspheres protruding from the pressure-sensitive adhesive region, for example, 0.1 ⁇ m to 200 ⁇ m, and preferably 0.1 ⁇ m to 100 ⁇ m. More preferably, the thickness is 0.1 ⁇ m to 45 ⁇ m.
  • the thickness of the covering material region is defined as the covering material from the interface 1 between the covering material constituting the covering material region 20 and the adhesive 12 constituting the adhesive region 10, as shown in FIG. This refers to the distance to the surface 21 on the opposite side of the region from the interface 1.
  • the portion where the heat-expandable microsphere 13 protrudes from the adhesive region 10 is excluded from the evaluation target of the thickness of the coating material region.
  • the thickness of the covering material region can be measured using a ruler, a caliper, and a micrometer.
  • Raman spectroscopic analysis for example, Raman spectroscopic analysis, infrared spectroscopic analysis, X-ray electron spectroscopic analysis, etc .; matrix-assisted laser desorption ionization time-of-flight mass spectrometer (MALDI-TOFMS) and time-of-flight secondary ion mass spectrometer (TOF-SIMS) ), Etc., to analyze the composition of the coating material constituting the coating material region and the pressure sensitive adhesive constituting the pressure sensitive adhesive region, and to determine the interface according to the difference in the composition to measure the thickness of the coating material region. Can do.
  • the method of discriminating the interface by spectroscopic analysis or mass spectrometry is useful when it is difficult to discriminate the interface visually or by observation with a microscope.
  • the material constituting the coating material region examples include a silicone polymer, an epoxy polymer, a polycarbonate polymer, a vinyl polymer, an acrylic polymer, a urethane polymer, a polyester polymer (for example, polyethylene terephthalate), and a polyolefin polymer.
  • Polymer materials such as polyamide-based polymers, polyimide-based polymers, and unsaturated hydrocarbon-based polymers. By using these polymer materials, it is possible to easily form a coating material region having the above elastic modulus by appropriately selecting a monomer type, a crosslinking agent, a polymerization degree, and the like.
  • the polymer material is excellent in affinity with the thermally expandable microsphere, the pressure-sensitive adhesive constituting the pressure-sensitive adhesive region, and the base material. You may use said polymer material individually or in combination of 2 or more types.
  • the material constituting the covering material region a resin material that can be cured (increased elastic modulus) by irradiation with active energy rays may be used. If the covering material region is formed of such a material, the elastic modulus in the above range can be obtained by irradiating active energy rays after application, with low elasticity, high flexibility and excellent handleability when the adhesive sheet is applied. A pressure-sensitive adhesive sheet that can be adjusted to be obtained can be obtained.
  • the active energy rays include gamma rays, ultraviolet rays, visible rays, infrared rays (heat rays), radio waves, alpha rays, beta rays, electron beams, plasma flows, ionizing rays, particle rays and the like.
  • the elastic modulus according to the nanoindentation method after irradiation with active energy rays falls within the above range.
  • the said tensile elastic modulus and / or bending elastic modulus after irradiation of an active energy ray become the said range for the coating
  • resin materials that can be cured (increased elastic modulus) by irradiation with active energy rays include, for example, an ultraviolet curing system (written by Kiyomi Kato, published by General Technology Center, (1989)), photocuring technology (Technical Information Association ( 2000)), JP-A-2003-292916, JP-A-4151850 and the like. More specifically, a resin material (R1) containing a polymer as a base material and an active energy ray reactive compound (monomer or oligomer), a resin material (R2) containing an active energy ray reactive polymer, and the like can be mentioned.
  • Examples of the base polymer include natural rubber, polyisobutylene rubber, styrene / butadiene rubber, styrene / isoprene / styrene block copolymer rubber, recycled rubber, butyl rubber, polyisobutylene rubber, and nitrile rubber (NBR).
  • Examples thereof include rubber polymers; silicone polymers; acrylic polymers. These polymers may be used alone or in combination of two or more.
  • Examples of the active energy ray reactive compound include photoreactive monomers or oligomers having a functional group having a carbon-carbon multiple bond such as acryloyl group, methacryloyl group, vinyl group, allyl group, and acetylene group.
  • photoreactive monomer or oligomer examples include trimethylolpropane tri (meth) acrylate, tetramethylolmethanetetra (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipenta Erythritol monohydroxypenta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, polyethylene glycol di (meth) acrylate, etc. (Meth) acryloyl group-containing compounds; dimer to pentamer of the (meth) acryloyl group-containing compounds;
  • the active energy ray-reactive compound monomers such as epoxidized butadiene, glycidyl methacrylate, acrylamide, and vinyl siloxane; or oligomers composed of the monomers may be used.
  • the resin material (R1) containing these compounds can be cured by high energy rays such as ultraviolet rays and electron beams.
  • an organic salt such as an onium salt and a compound having a plurality of heterocyclic rings in the molecule
  • an organic salt is cleaved by irradiation with active energy rays (for example, ultraviolet rays and electron beams) to generate ions, which act as starting species to cause a ring opening reaction of the heterocyclic ring to form a three-dimensional network structure.
  • active energy rays for example, ultraviolet rays and electron beams
  • examples of the organic salts include iodonium salts, phosphonium salts, antimonium salts, sulfonium salts, and borate salts.
  • the heterocyclic ring in the compound having a plurality of heterocyclic rings in the molecule include oxirane, oxetane, oxolane, thiirane, aziridine and the like.
  • the content ratio of the active energy ray-reactive compound is preferably 0.00 with respect to 100 parts by weight of the polymer as the base material. 1 to 500 parts by weight, more preferably 1 to 300 parts by weight, still more preferably 10 to 200 parts by weight.
  • the resin material (R1) containing the polymer as the base material and the active energy ray-reactive compound can contain any appropriate additive as necessary.
  • the additive include an active energy ray polymerization initiator, an active energy ray polymerization accelerator, a crosslinking agent, a plasticizer, and a vulcanizing agent. Any appropriate initiator may be used as the active energy ray polymerization initiator depending on the type of active energy ray used.
  • the active energy ray polymerization initiators may be used alone or in combination of two or more.
  • the content ratio of the active energy ray polymerization initiator is preferably 0.1 with respect to 100 parts by weight of the polymer as the base material. Parts by weight to 10 parts by weight, more preferably 1 part by weight to 5 parts by weight.
  • the active energy ray-reactive polymer examples include polymers having a functional group having a carbon-carbon multiple bond such as an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, and an acetylene group.
  • Specific examples of the polymer having an active energy ray-reactive functional group include a polymer composed of a polyfunctional (meth) acrylate; a photocationic polymerization type polymer; a cinnamoyl group-containing polymer such as polyvinyl cinnamate; a diazotized amino novolak Resin; polyacrylamide; and the like.
  • the resin material (R2) containing an active energy ray-reactive polymer a mixture of an active energy ray-reactive polymer having an allyl group and a compound having a thiol group can also be used.
  • region precursor which has practical hardness (viscosity) can be formed before hardening by active energy ray irradiation (for example, when sticking an adhesive sheet)
  • active energy ray reactive functional group An oligomer having an active energy ray-reactive functional group can also be used in addition to a polymer having a.
  • the resin material (R2) containing the active energy ray-reactive polymer may further contain the active energy ray-reactive compound (monomer or oligomer). Moreover, the resin material (R2) containing the said active energy ray reactive polymer may contain arbitrary appropriate additives as needed.
  • the specific example of an additive is the same as that of the additive which can be contained in the resin material (R1) containing the polymer used as a base material, and an active energy ray reactive compound.
  • the content ratio of the active energy ray polymerization initiator is preferably 0.1 to 10 parts by weight with respect to 100 parts by weight of the active energy ray reactive polymer. More preferably, it is 1 to 5 parts by weight.
  • the dressing region may further include beads.
  • the beads include glass beads and resin beads. If such beads are added to the covering material region, the elastic modulus of the covering material region can be improved, and an adhesive sheet capable of processing the workpiece with higher accuracy can be obtained.
  • the average particle diameter of the beads is, for example, 0.01 ⁇ m to 50 ⁇ m.
  • the amount of beads added is, for example, 10 to 200 parts by weight, preferably 20 to 100 parts by weight, with respect to 100 parts by weight of the entire covering material region.
  • region The said adhesive area
  • the thickness of the pressure-sensitive adhesive region is preferably 50 ⁇ m or less, more preferably 1 ⁇ m to 50 ⁇ m, still more preferably 1 ⁇ m to 25 ⁇ m, and particularly preferably 1 ⁇ m to 15 ⁇ m.
  • the adhesive area is thicker than 50 ⁇ m, when used as a temporary fixing sheet when cutting electronic parts, etc., the chip after reattaching, the cut surface becomes unstable, the chip is missing at the time of cutting There is a risk of problems such as occurrence of cuttings and generation of cutting waste.
  • the covering material region in which the elastic modulus is appropriately adjusted it is possible to allow the heat-expandable microspheres to protrude from the pressure-sensitive adhesive region, and to thin the pressure-sensitive adhesive region.
  • the thickness of the pressure-sensitive adhesive region refers to the pressure-sensitive adhesive surface 11 from the interface 1 between the coating material constituting the coating material region 20 and the pressure-sensitive adhesive constituting the pressure-sensitive adhesive region 10 as shown in FIG. The distance to. That is, the portion where the heat-expandable microsphere 13 protrudes from the adhesive region 10 is excluded from the evaluation target of the thickness of the adhesive region.
  • the method for determining the interface 1 is as described in the above section B.
  • the elastic modulus according to the nanoindentation method of the pressure-sensitive adhesive surface at the temperature at which the pressure-sensitive adhesive sheet is stuck is preferably less than 100 MPa, more preferably 0.1 MPa to 50 MPa, The pressure is preferably 0.1 MPa to 10 MPa.
  • the elastic modulus of the adhesive region by the nanoindentation method corresponds to the elastic modulus of the adhesive surface by the nanoindentation method.
  • the elastic modulus of the adhesive surface by the nanoindentation method means the elastic modulus measured by the measurement method described in the above section B by selecting a portion where no thermally expandable microspheres exist, that is, the elastic modulus of the adhesive.
  • the temperature at the time of sticking the pressure-sensitive adhesive sheet is, for example, 10 to 80 ° C. when an acrylic pressure-sensitive adhesive is used as the pressure-sensitive adhesive, and when a styrene-diene block copolymer pressure-sensitive adhesive is used as the pressure-sensitive adhesive. 40 ° C to 120 ° C.
  • the pressure-sensitive adhesive is preferably one that does not restrain expansion or foaming of the thermally expandable microspheres during heating.
  • the adhesive include acrylic adhesives, rubber adhesives, vinyl alkyl ether adhesives, silicone adhesives, polyester adhesives, polyamide adhesives, urethane adhesives, and styrene-diene block co-polymers.
  • an acrylic pressure-sensitive adhesive or a rubber-based pressure-sensitive adhesive is preferable.
  • acrylic pressure-sensitive adhesive examples include, for example, an acrylic pressure-sensitive adhesive based on an acrylic polymer (homopolymer or copolymer) using one or more (meth) acrylic acid alkyl esters as monomer components.
  • alkyl (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, (meth ) Isobutyl acrylate, s-butyl (meth) acrylate, t-butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate , 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate
  • the acrylic polymer is a unit corresponding to another monomer component copolymerizable with the (meth) acrylic acid alkyl ester, if necessary, for the purpose of modifying cohesion, heat resistance, crosslinkability and the like. May be included.
  • monomer components include carboxyl group-containing monomers such as acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid; maleic anhydride, itaconic anhydride Acid anhydride monomers such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, hydroxyhexyl (meth) acrylate, hydroxyoctyl (meth) acrylate, (meth) Hydroxyl group-containing monomers such as hydroxydecyl acrylate, hydroxylauryl (meth)
  • the rubber-based adhesive examples include natural rubber; polyisoprene rubber, styrene / butadiene (SB) rubber, styrene / isoprene (SI) rubber, styrene / isoprene / styrene block copolymer (SIS) rubber, and styrene / butadiene.
  • SBS Styrene block copolymer
  • SEBS styrene / ethylene / butylene / styrene block copolymer
  • SEPS styrene / ethylene / propylene / styrene block copolymer
  • SEP rubber-based pressure-sensitive adhesives based on polymer
  • the pressure-sensitive adhesive may contain any appropriate additive as necessary.
  • the additive include a crosslinking agent, a tackifier, a plasticizer (for example, trimellitic acid ester plasticizer, pyromellitic acid ester plasticizer), pigment, dye, filler, anti-aging agent, conductive material.
  • a plasticizer for example, trimellitic acid ester plasticizer, pyromellitic acid ester plasticizer
  • pigment for example, trimellitic acid ester plasticizer, pyromellitic acid ester plasticizer
  • dye for example, tackifier
  • filler filler
  • anti-aging agent for example, pyromellitic acid ester plasticizer
  • tackifier Any appropriate tackifier may be used as the tackifier.
  • a tackifier resin is used as the tackifier.
  • Specific examples of tackifying resins include rosin tackifying resins (eg, unmodified rosin, modified rosin, rosin phenolic resin, rosin ester resin, etc.), terpene tackifying resins (eg, terpene resins, terpene phenols).
  • Resin for example, aliphatic hydrocarbon resin, aliphatic cyclic hydrocarbon resin, aromatic resin
  • hydrocarbon resins for example, aliphatic hydrocarbon resin, aliphatic cyclic hydrocarbon resin, aromatic resin
  • Hydrocarbon resins eg, styrene resins, xylene resins, etc.
  • aliphatic / aromatic petroleum resins e.g., styrene resins, xylene resins, etc.
  • aliphatic / aromatic petroleum resins aliphatic / alicyclic petroleum resins, hydrogenated hydrocarbon resins, coumarone resins, coumarone indene resins Etc.
  • phenolic tackifying resins eg, alkylphenolic resins, xyleneformaldehyde resins, resoles, novos
  • ketone-based tackifying resins such as an elastomer-based tackifying resins.
  • rosin-based tackifier resins, terpene-based tackifier resins, or hydrocarbon-based tackifier resins such as styrene resins are preferable. You may use a tackifier individually or in combination of 2 or more types.
  • tackifiers include terpene phenol resins such as “YS Polystar S145” and “Mighty Ace K140” manufactured by Yasuhara Chemical Co., Ltd. and “Tamanor 901” manufactured by Arakawa Chemical Co., Ltd .; Sumitomo Bakelite Rosin phenolic resin such as “Sumilite Resin PR-12603” manufactured by Arakawa Chemical Co., Ltd .; Alkylphenol resin such as “Tamanol 1010R” and “Tamanol 200N” manufactured by Arakawa Chemical Co., Ltd. An alicyclic saturated hydrocarbon resin such as “Arcon P-140” manufactured by Arakawa Chemical Co., Ltd.
  • the addition amount of the tackifier is preferably 5 to 100 parts by weight, more preferably 10 to 50 parts by weight with respect to 100 parts by weight of the base polymer.
  • crosslinking agent examples include an isocyanate crosslinking agent, an epoxy crosslinking agent, a melamine crosslinking agent, a peroxide crosslinking agent, a urea crosslinking agent, a metal alkoxide crosslinking agent, a metal chelate crosslinking agent, and a metal.
  • examples thereof include salt-based crosslinking agents, carbodiimide-based crosslinking agents, oxazoline-based crosslinking agents, aziridine-based crosslinking agents, and amine-based crosslinking agents. Of these, an isocyanate-based crosslinking agent or an epoxy-based crosslinking agent is preferable.
  • isocyanate-based crosslinking agent examples include lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; alicyclic isocyanates such as cyclopentylene diisocyanate, cyclohexylene diisocyanate and isophorone diisocyanate; 2,4- Aromatic isocyanates such as tolylene diisocyanate, 4,4′-diphenylmethane diisocyanate, xylylene diisocyanate; trimethylolpropane / tolylene diisocyanate trimer adduct (trade name “Coronate L” manufactured by Nippon Polyurethane Industry Co., Ltd.) Methylolpropane / hexamethylene diisocyanate trimer adduct (trade name “Coronate HL” manufactured by Nippon Polyurethane Industry Co., Ltd.), isoform of hexamethylene diisocyanate
  • isocyanate adducts of the like under the trade name "Coronate HX" isocyanate adducts of the like; and the like.
  • the content of the isocyanate-based crosslinking agent can be set to any appropriate amount depending on the desired adhesive strength, and is typically 0.1 to 20 parts by weight with respect to 100 parts by weight of the base polymer. More preferably, it is 0.5 to 10 parts by weight.
  • epoxy crosslinking agent examples include N, N, N ′, N′-tetraglycidyl-m-xylenediamine, diglycidylaniline, 1,3-bis (N, N-glycidylaminomethyl) cyclohexane (Mitsubishi Gas).
  • thermally expandable microsphere any appropriate thermally expandable microsphere can be used as long as it is a microsphere that can expand or foam by heating.
  • thermally expandable microsphere for example, a microsphere in which a substance that easily expands by heating is encapsulated in an elastic shell can be used.
  • thermally expandable microspheres can be produced by any appropriate method, for example, a coacervation method, an interfacial polymerization method, or the like.
  • Examples of the material that easily expands when heated include propane, propylene, butene, normal butane, isobutane, isopentane, neopentane, normal pentane, normal hexane, isohexane, heptane, octane, petroleum ether, methane halide, tetraalkylsilane.
  • low-boiling-point liquids such as azodicarbonamide that is gasified by thermal decomposition.
  • Examples of the material constituting the shell include nitrile monomers such as acrylonitrile, methacrylonitrile, ⁇ -chloroacrylonitrile, ⁇ -ethoxyacrylonitrile, fumaronitrile; acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, Carboxylic acid monomers such as citraconic acid; vinylidene chloride; vinyl acetate; methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, (Meth) acrylic esters such as isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, ⁇ -carboxyethyl acrylate; styrene mono, such as styrene, ⁇
  • the polymer composed of these monomers may be a homopolymer or a copolymer.
  • the copolymer include vinylidene chloride-methyl methacrylate-acrylonitrile copolymer, methyl methacrylate-acrylonitrile-methacrylonitrile copolymer, methyl methacrylate-acrylonitrile copolymer, acrylonitrile-methacrylonitrile-itaconic acid copolymer.
  • a polymer etc. are mentioned.
  • An inorganic foaming agent or an organic foaming agent may be used as the thermally expandable microsphere.
  • the inorganic foaming agent include ammonium carbonate, ammonium hydrogen carbonate, sodium hydrogen carbonate, ammonium nitrite, sodium borohydride, various azides and the like.
  • the organic foaming agent include chlorofluorinated alkane compounds such as trichloromonofluoromethane and dichloromonofluoromethane; azo compounds such as azobisisobutyronitrile, azodicarbonamide, and barium azodicarboxylate.
  • Hydrazine compounds such as para-toluenesulfonyl hydrazide, diphenylsulfone-3,3′-disulfonyl hydrazide, 4,4′-oxybis (benzenesulfonyl hydrazide), allyl bis (sulfonyl hydrazide); p-toluylene sulfonyl semicarbazide, 4, Semicarbazide compounds such as 4′-oxybis (benzenesulfonyl semicarbazide); Triazole compounds such as 5-morpholyl-1,2,3,4-thiatriazole; N, N′-dinitrosopentamethylenetetramine, N, '- dimethyl -N, N'-dinitrosoterephthalamide; etc. N- nitroso compounds, and the like.
  • thermally expandable microspheres Commercially available products may be used as the above-mentioned thermally expandable microspheres. Specific examples of commercially available thermally expandable microspheres include “Matsumoto Microsphere” (grade: F-30, F-30D, F-36D, F-36LV, F-50) manufactured by Matsumoto Yushi Seiyaku Co., Ltd.
  • the particle diameter of the thermally expandable microsphere before heating is preferably 0.5 ⁇ m to 80 ⁇ m, more preferably 5 ⁇ m to 45 ⁇ m, still more preferably 10 ⁇ m to 20 ⁇ m, and particularly preferably 10 ⁇ m to 15 ⁇ m. . Therefore, the particle size before heating of the thermally expandable microspheres is preferably 6 ⁇ m to 45 ⁇ m, more preferably 15 ⁇ m to 35 ⁇ m, in terms of average particle size.
  • the above particle diameter and average particle diameter are values obtained by the particle size distribution measurement method in the laser scattering method.
  • the thermally expandable microspheres have an appropriate strength that does not rupture until the volume expansion coefficient is preferably 5 times or more, more preferably 7 times or more, and even more preferably 10 times or more.
  • the adhesive force can be efficiently reduced by heat treatment.
  • the content ratio of the heat-expandable microspheres in the pressure-sensitive adhesive region can be appropriately set according to the desired decrease in adhesive strength.
  • the content ratio of the heat-expandable microspheres is, for example, 1 part by weight to 150 parts by weight, preferably 10 parts by weight to 130 parts by weight, and more preferably 25 parts by weight with respect to 100 parts by weight of the base polymer forming the pressure-sensitive adhesive region. ⁇ 100 parts by weight.
  • Base material examples include resin sheets, nonwoven fabrics, paper, metal foils, woven fabrics, rubber sheets, foamed sheets, and laminates thereof (particularly, laminates including resin sheets).
  • the resin constituting the resin sheet include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), polyethylene (PE), polypropylene (PP), ethylene-propylene copolymer, ethylene- Vinyl acetate copolymer (EVA), polyamide (nylon), wholly aromatic polyamide (aramid), polyimide (PI), polyvinyl chloride (PVC), polyphenylene sulfide (PPS), fluororesin, polyether ether ketone (PEEK) ) And the like.
  • the nonwoven fabric include nonwoven fabrics made of natural fibers having heat resistance such as nonwoven fabrics including manila hemp; synthetic resin nonwoven fabrics such as polypropylene resin nonwoven fabrics, polyethylene resin nonwoven fabrics and ester resin nonwoven fabrics
  • the thickness of the base material can be set to any appropriate thickness depending on the desired strength or flexibility, the purpose of use, and the like.
  • the thickness of the substrate is preferably 1000 ⁇ m or less, more preferably 1 ⁇ m to 1000 ⁇ m, still more preferably 1 ⁇ m to 500 ⁇ m, particularly preferably 3 ⁇ m to 300 ⁇ m, and most preferably 5 ⁇ m to 250 ⁇ m.
  • the surface of the substrate may be subjected to surface treatment.
  • the surface treatment include corona treatment, chromic acid treatment, ozone exposure, flame exposure, high piezoelectric impact exposure, ionizing radiation treatment, and coating treatment with a primer.
  • a coating treatment with an organic coating material is preferable because it improves adhesion and the coating material region is less likely to be thrown and destroyed during heat peeling.
  • the organic coating material examples include materials described in Plastic Hard Coat Material II (CMC Publishing, (2004)).
  • a urethane-based polymer more preferably polyacryl urethane, polyester urethane, or a precursor thereof is used. This is because coating and application to the base material are simple, and various industrial products can be selected and obtained at low cost.
  • the urethane polymer is, for example, a polymer composed of a reaction mixture of an isocyanate monomer and an alcoholic hydroxyl group-containing monomer (for example, a hydroxyl group-containing acrylic compound or a hydroxyl group-containing ester compound).
  • the organic coating material may contain a chain extender such as polyamine, an anti-aging agent, an oxidation stabilizer and the like as optional additives.
  • the thickness of the organic coating layer is not particularly limited, but for example, about 0.1 ⁇ m to 10 ⁇ m is suitable, preferably about 0.1 ⁇ m to 5 ⁇ m, and more preferably about 0.5 ⁇ m to 5 ⁇ m.
  • a pressure-sensitive adhesive coating layer is formed by applying the pressure-sensitive adhesive on a release film (release paper); A method of forming an adhesive region by embedding the thermally expandable microspheres in a coating layer by pressing or the like, and forming (laminating) a coating material region on the adhesive region, (2) on the release film, A method of forming a pressure-sensitive adhesive coating layer by applying a pressure-sensitive adhesive region-forming composition containing a pressure-sensitive adhesive and thermally expandable microspheres, and forming (laminating) a coating material region on the pressure-sensitive adhesive coating layer; ) After applying the above-mentioned pressure-sensitive adhesive on the release film to form a pressure-sensitive adhesive coating layer, a coating material region is formed (laminated) on the pressure-sensitive adhesive coating layer, and then the release film is peeled off to adhere The thermally expandable microspheres are pre-coated from the surface
  • the pressure-sensitive adhesive layer can be formed by drying the pressure-sensitive adhesive coating layer formed by applying the pressure-sensitive adhesive.
  • the drying is performed at any appropriate timing. Can be broken.
  • the drying may be performed before or after embedding the thermally expandable microspheres. Further, it may be before or after the coating material region is formed.
  • the release film may be peeled off, and the adhesive surface is protected leaving the release film until the adhesive sheet is put to practical use. Also good.
  • the pressure-sensitive adhesive sheet of the present invention comprises a substrate
  • the pressure-sensitive adhesive sheet is a surface opposite to the pressure-sensitive adhesive region in the covering material region after the operations (1) to (4) (the side opposite to the pressure-sensitive adhesive surface).
  • region may be produced separately, and these laminated bodies may be bonded together.
  • the polymer material or resin material described in the above section B is thermally melted to obtain a molded body in a film shape by extrusion molding, and the molded body is formed into the pressure-sensitive adhesive region ( Or a method of laminating on a pressure-sensitive adhesive coating layer) or a substrate, (ii) applying a resin solution containing the polymer material or resin material to the pressure-sensitive adhesive region (or pressure-sensitive adhesive coating layer) or substrate, and then drying.
  • a coating material region forming composition containing a monomer, oligomer, or macromer capable of forming the polymer material or resin material is applied to the pressure-sensitive adhesive region (or pressure-sensitive adhesive coating layer) or substrate and coated.
  • Examples thereof include a method of polymerizing the material region forming composition (for example, polymerization by heating, active energy ray irradiation, or the like). According to the method (iii), the amount of solvent and / or heat energy used can be reduced.
  • the resin solution is applied onto another release film and then dried to obtain a film-like molded article, and then the molded article is applied to the pressure-sensitive adhesive region (or pressure-sensitive adhesive applied). Layer) or a substrate.
  • the composition for forming a coating material region is applied onto another release film, and then dried to form a coating material region precursor. Alternatively, it may be laminated on a pressure-sensitive adhesive coating layer) or a substrate and then polymerized.
  • an isocyanate compound such as lylene diisocyanate and hexamethylene diisocyanate and a polyol compound such as polyether polyol and polyester polyol are included.
  • a method of heating for example, 60 ° C. to 120 ° C. after applying the composition for forming a covering material region may be employed.
  • a composition for forming a coating material region comprising a vinyl compound such as vinyl chloride or styrene and any appropriate initiator Can be used.
  • composition for forming a coating material region may contain additives such as an initiator, a catalyst, an ultraviolet absorber, and an antioxidant as necessary. Moreover, the said bead may be included.
  • the active energy rays can be irradiated at any appropriate timing to obtain an adhesive sheet.
  • the irradiation with the active energy ray is performed, for example, after attaching an adherend (workpiece).
  • the irradiation with the active energy ray may be performed stepwise. For example, it may be semi-cured before adhering the adherend and may be fully cured after adhering.
  • the type and amount of the active energy ray can be set to any appropriate type and amount depending on the type of resin material constituting the covering material region.
  • the surface of the pressure-sensitive adhesive region on the release film side becomes the pressure-sensitive adhesive surface. Since the adhesive surface is formed in contact with the release film, there is no protrusion of the heat-expandable microsphere and it is flat. On the other hand, thermally expandable microspheres protrude on the surface of the adhesive region opposite to the adhesive surface.
  • both surfaces of the pressure-sensitive adhesive sheet are flattened, and therefore the thickness of the pressure-sensitive adhesive region can be reduced.
  • Such a pressure-sensitive adhesive sheet of the present invention can contribute to excellent cutting accuracy and reduction of cutting waste as a temporary fixing sheet when cutting an electronic component or the like.
  • a method for manufacturing an electronic component includes sticking the electronic component material (board
  • Examples of the electronic parts include parts for semiconductor devices such as silicon wafers; multilayer capacitors: transparent electrodes;
  • the pressure-sensitive adhesive sheet is placed on a processing table, and an electronic component material obtained in a large area is stuck on the pressure-sensitive adhesive sheet.
  • the electronic component material can be cut by any appropriate method to obtain an electronic component.
  • the cutting method include a method using a blade such as a rotary blade and a flat blade, a method using a laser beam, and the like.
  • the generation of cutting waste is suppressed and the yield is improved.
  • the adhesive region can be made thin, even if the electronic component material is cut by pressing with a flat blade, the chip after cutting is reattached, the cut surface becomes slanted, or S It is possible to prevent the character from becoming unstable when it becomes a character, or chipping from occurring during cutting.
  • the present invention even when a thin blade is used for cutting, the above-described effects can be obtained, and manufacturing loss caused by the thickness of the blade (loss due to a gap generated between chips after cutting) can be reduced. it can.
  • the present invention that can reduce the manufacturing loss as described above is particularly useful.
  • cutting may be performed under heating.
  • the processing table may be heated to 30 ° C. to 150 ° C. for cutting.
  • the surface where the abundance of the component added only in the coating material region is clearly different is the interface 1, the distance from the adhesive surface 11 to the interface 1 is the thickness of the adhesive region, and the surface on the opposite side of the adhesive surface from the interface 1 The distance up to 21 was defined as the thickness of the covering material region.
  • the measurement conditions for Raman mapping measurement are as follows. Excitation wavelength: 532 nm Measurement wave number range: 300 to 3600 cm -1 ⁇ Grating: 600 gr / mm Objective lens: x100 ⁇ Measurement time: 0.2 sec / 1 spectrum ⁇ Measurement range: 20 ⁇ 40 ⁇ m -Number of measurements: 100 x 200 points-Detector: EMCCD
  • FIG. 4 shows an SEM image of a cross section of the pressure-sensitive adhesive sheet with Example 11 as a representative example.
  • the measurement conditions for SEM observation are as follows. -Observation image: ESED image-Acceleration voltage: 10 kV ⁇ Magnification: 600 times
  • the elastic modulus measured on the surface of the cut surface separated by about 3 ⁇ m from the surface is shown (average value of three measurements).
  • the nanoindenter apparatus and measurement conditions are as follows. Apparatus and measurement conditions / apparatus: Nanoindenter; Tribodenter manufactured by Hystron Inc. ⁇ Measurement method: Single indentation method ⁇ Measurement temperature: 25 ° C ⁇ Push-in speed: about 1000nm / sec ⁇ Indentation depth: about 800nm ⁇ Tip: Diamond, Berkovich type (triangular pyramid type)
  • Adhesive strength measurement (adhesive strength before heating (before expanding thermally expandable microspheres))
  • the pressure-sensitive adhesive sheets obtained in Examples and Comparative Examples were cut into a size of 20 mm in width and 140 mm in length, and a polyethylene terephthalate film (trade name “Lumirror S-10” Toray Industries, Inc.) as an adherend on the pressure-sensitive adhesive surface.
  • a polyethylene terephthalate film trade name “Lumirror S-10” Toray Industries, Inc.
  • the measurement sample was set in a tensile tester with a thermostatic bath (trade name “Shimadzu Autograph AG-120kN”, manufactured by Shimadzu Corporation) and left for 30 minutes. Thereafter, the load was measured when the adherend was peeled from the pressure-sensitive adhesive sheet in the length direction under the conditions of peeling angle: 180 °, peeling speed (tensile speed): 300 mm / min, and the maximum load ( The maximum value of the load excluding the peak top at the initial stage of measurement was determined, and the maximum load divided by the tape width was defined as the adhesive strength (N / 20 mm width). The above operation was performed in an atmosphere of temperature: 23 ⁇ 3 ° C. and humidity: 65 ⁇ 5% RH.
  • a measurement sample was prepared in the same manner as described above, and the measurement sample was put into a hot air dryer. After leaving still for 1 minute under the maximum expansion temperature (after-mentioned) of a thermally expansible microsphere in a hot air dryer, the to-be-adhered body was peeled similarly to the above, and the adhesive force was measured. The operation before and after the charging into the hot air dryer was performed in an atmosphere of temperature: 23 ⁇ 3 ° C. and humidity: 65 ⁇ 5% RH.
  • the number of chips with no separation between the chips was counted.
  • the number obtained by dividing the number of non-separated chips by 100% when completely separated was used as an index of separability.
  • the index is less than 2%, the index is 2% or more and less than 5%, the index is 5% or more and less than 15%, and the index is 15% or more.
  • a plurality of the obtained ceramic sheets were laminated so as to have a thickness of 500 ⁇ m to obtain a laminated ceramic sheet.
  • Cutting temperature 60 ° C.
  • cutting depth remaining amount from the table surface
  • cutting blade “U-BLADE2” manufactured by UHT
  • blade thickness 50 ⁇ m
  • blade edge angle 15 °
  • the multilayer ceramic sheet was cut into a square shape so as to be a small piece of 1 mm x 0.5 mm. Select any 10 pieces from among the cut pieces, observe the cut surface with a magnifying glass at 50 magnification, check for chipping (lamination of the laminated ceramic sheet generated by the cutting process), and check the chipping generated in 10 pieces. The average of the total number was used as an index. The index is 0 to less than 10 places, ⁇ , 10 to less than 20 places, ⁇ , 20 to less than 40 places, and 40 or more places to x.
  • Example 1 (Formation of adhesive region precursor layer) Toluene solution of polymer 2 prepared in Production Example 2 (polymer 2: 100 parts), 1 part of an isocyanate-based crosslinking agent (trade name “Coronate L”, manufactured by Nippon Polyurethane Co., Ltd.), and a terpene phenol resin ( Sumitomo Bakelite Co., Ltd., trade name “Sumilite Resin PR12603” 5 parts, thermally expandable microspheres (Matsumoto Yushi Seiyaku Co., Ltd., trade name “Matsumoto Microsphere F-50D”, foaming (expansion) start temperature: 95 (40 ° C. to 105 ° C., maximum expansion temperature: 125 ° C.
  • a toluene solution of polymer 1 prepared in Production Example 1 (polymer 1: 100 parts) and a mixture of dipentaerythritol pentaacrylate and hexaacrylate as an active energy ray-reactive oligomer (trade name “Aronix M404” manufactured by Toagosei Co., Ltd.) ) 20 parts, 2 parts of an isocyanate-based crosslinking agent (trade name “Coronate L” manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts of energy ray polymerization initiator (trade name “Irgacure 651” manufactured by BASF Japan Ltd.) To prepare a mixed solution.
  • polymer 1 100 parts
  • a mixture of dipentaerythritol pentaacrylate and hexaacrylate as an active energy ray-reactive oligomer (trade name “Aronix M404” manufactured by Toagosei Co., Ltd.) ) 20 parts, 2 parts of an isocyan
  • ultraviolet irradiator “UM810 (high pressure mercury lamp light source)” (manufactured by Nitto Seiki Co., Ltd.)
  • ultraviolet irradiation with an integrated light amount of 300 mJ / cm 2 was performed from the precursor layer side of the coating material region.
  • the polyethylene terephthalate film with a silicone release agent-treated surface was peeled off to obtain a pressure-sensitive adhesive sheet 1 (pressure-sensitive adhesive region thickness: 10 ⁇ m, covering material region thickness: 25 ⁇ m).
  • Examples 2 to 15, Comparative Example 1 The type of polymer, cross-linking agent, tackifier, and thermally expandable microsphere when forming the pressure-sensitive adhesive region precursor layer and the amount of the compound are set as shown in Table 1, and the polymer when forming the coating material region precursor layer A pressure-sensitive adhesive sheet was obtained in the same manner as in Example 1 except that the types and blending amounts of the active energy ray-reactive oligomer, the crosslinking agent and the energy ray polymerization initiator were set as shown in Table 1.
  • a PET film (thickness) was used instead of the polyethylene terephthalate film with a silicone release agent-treated surface when forming the coating material region precursor layer.
  • Example 4 100 ⁇ m
  • the mixed solution was applied to obtain an adhesive sheet having a PET film (base material) without peeling off the PET film.
  • the adhesive sheet was obtained without performing ultraviolet irradiation.
  • the details of the crosslinking agent, tackifier, thermally expandable microsphere, active energy ray reactive oligomer, and energy ray polymerization initiator described in Table 1 are as follows.
  • PR51732 Product name “Sumilite Resin PR51732” manufactured by Sumitomo Bakelite Co., Ltd.
  • F-260D Matsumoto Yushi Seiyaku Co., Ltd., trade name “Matsumoto Microsphere F-260D”, foaming (expansion) start temperature: 190 ° C. to 200 ° C., maximum expansion temperature: 250 ° C.
  • UV1700B manufactured by Nippon Synthetic Chemical Co., Ltd., trade name “purple light UV-1700B”, UV curable urethane acrylate UV7620EA: manufactured by Nippon Synthetic Chemical Co., Ltd., trade name “purple UV-7620EA”, UV curable urethane acrylate UV3000B: Nippon Synthetic Chemical Co., Ltd.
  • UV curable urethane acrylate M321 manufactured by Toagosei Co., Ltd., product name “Aronix M321”, trimethylolpropane PO-modified triacrylate (average added moles of propylene oxide (PO): 2) Mole)
  • UV7630B manufactured by Nippon Synthetic Chemical Co., Ltd., trade name “purple light UV-7630B”, UV curable urethane acrylate ⁇ energy ray polymerization initiator>
  • I184 BASF Corporation, trade name “Irgacure 184”
  • I2959 BASF
  • trade name “Irgacure 2959” I6511: BASF, trade name “Irgacure 651”
  • Example 16 Toluene solution of polymer 1 prepared in Production Example 1 (polymer 1: 100 parts), epoxy-based cross-linking agent (manufactured by Mitsubishi Gas Chemical Company, trade name “Tetrad C”) 0.8 parts, and terpene as a tackifier 30 parts of phenolic resin (trade name “YS Polystar S145” manufactured by Yashara Chemical Co., Ltd.) and thermally expandable microspheres (trade name “Matsumoto Microsphere F-50D” manufactured by Matsumoto Yushi Seiyaku Co., Ltd.), foaming (expansion) start temperature : 95 ° C. to 105 ° C., maximum expansion temperature: 125 ° C.
  • the pressure-sensitive adhesive surface of the pressure-sensitive adhesive region precursor layer was bonded to a mat-treated surface of a polyethylene terephthalate film (trade name “Lumirror type X42”, manufactured by Toray Industries, Inc., thickness: 50 ⁇ m) as a coating material region with a hand roller.
  • An autoclaving treatment (40 ° C., 5 kgf / cm 2, 10 minutes) gave an adhesive sheet (adhesive region (thickness: 30 ⁇ m) / covering material region (polyethylene terephthalate, thickness: 50 ⁇ m)).
  • Example 17 Toluene solution of polymer 4 prepared in Production Example 4 (polymer 4: 100 parts), epoxy cross-linking agent (trade name “Tetrad C” manufactured by Mitsubishi Gas Chemical Co., Ltd.) 0.8 parts, and terpene as a tackifier 5 parts of phenolic resin (trade name “YS Polystar S145” manufactured by Yashara Chemical Co., Ltd.) and thermally expandable microspheres (trade name “Matsumoto Microsphere F-50D” manufactured by Matsumoto Yushi Seiyaku Co., Ltd.), foaming (expansion) start temperature : 95 ° C. to 105 ° C., maximum expansion temperature: 125 ° C.
  • Ethyl: dimethylformamide 1: 10 (volume%) was applied, and the adhesive surface of the adhesive region precursor layer was bonded to the coated surface with a hand roller, and dried with a hot air dryer at 80 ° C. for 3 minutes.
  • an adhesive sheet adheresive region (thickness: 40 ⁇ m) / covering region (polyethylene terephthalate, thickness: 200 ⁇ m) was obtained.
  • the pressure-sensitive adhesive sheet of the present invention can reduce the adhesive strength by heating, and can achieve excellent cutting accuracy when the adherend is cut.
  • the production method and pressure-sensitive adhesive sheet of the present invention can be suitably used for the production of chip-shaped electronic components such as semiconductor chips.

Abstract

Provided is an adhesive sheet which is able to realize excellent cutting precision and a reduction in cutting debris when cutting microcomponents such as electronic components. This adhesive sheet is provided only on one side with an adhesive surface in which the adhesive strength decreases when heated, with the elastic modulus of the surface on the opposite side of the adhesive surface measured by nanoindentation being at least 1 MPa. In a preferred embodiment, the sheet is provided with an adhesive region having the adhesive surface as one surface thereof and a coating region which abuts the side of the adhesive region opposite the adhesive surface in a cross-sectional view, with the adhesive region including an adhesive and thermally expandable microspheres.

Description

粘着シートAdhesive sheet
 本発明は、粘着シートに関する。 The present invention relates to an adhesive sheet.
 シリコンウエハ、積層コンデンサ、透明電極などの電子部品の製造においては、大面積で一括して必要機能を作り込んで得られた基板を、切断加工により所望の大きさに微小化するということが行われる。切断加工の際、加工時の応力および振動による切断精度の低下を防止するための被加工物(基板)固定用の粘着シートが用いられている。該粘着シートは、加工時には被加工物に対する十分な粘着力が求められ、加工後には切断された被加工物(電子部品)を容易に剥離させ得ることが求められる。このような粘着シートとして、粘着剤中に熱膨張性微小球を含む粘着シートが知られている(例えば、特許文献1)。熱膨張性微小球を含む粘着シートは、加熱により熱膨張性微小球を膨張させるか、あるいは発泡させることにより粘着力が低下するので、上記加工時には十分な粘着力を示し、加工後には加熱することにより電子部品を容易に剥離させることができる。 In the manufacture of electronic components such as silicon wafers, multilayer capacitors, and transparent electrodes, it is necessary to reduce the size of a substrate obtained by creating necessary functions in a large area to a desired size by cutting. Is called. At the time of cutting, a pressure-sensitive adhesive sheet for fixing a workpiece (substrate) for preventing a reduction in cutting accuracy due to stress and vibration during processing is used. The pressure-sensitive adhesive sheet is required to have a sufficient adhesive force with respect to the workpiece during processing, and after processing, it is required that the cut workpiece (electronic component) can be easily peeled off. As such an adhesive sheet, an adhesive sheet containing thermally expandable microspheres in an adhesive is known (for example, Patent Document 1). The pressure-sensitive adhesive sheet containing the heat-expandable microspheres exhibits sufficient pressure-sensitive adhesive force during the above-mentioned processing because the heat-expandable microspheres are expanded by heating or foamed to reduce the pressure-sensitive adhesive force. Thus, the electronic component can be easily peeled off.
 近年、電子部品の軽量・小型化が進み、より高い精度の切断加工を実現し得る被加工物固定用の粘着シートが求められている。また、切断加工時に生じる加工屑(切削屑)の減少も求められている。これらの要求に対して、粘着シートを構成する粘着剤を薄くすれば、より高い切断精度および切削屑の低減を実現し得る粘着シートが得られ得ると考えられる。しかしながら、熱膨張性微小球を含む粘着シートにおいては、熱膨張性微小球を含むため粘着剤の厚みが制約されるという問題がある。より具体的には、熱膨張性微小球を含む粘着シートにおいては、粘着剤を薄くすると熱膨張性微小球が粘着剤から突出してしまい、基材または加工台との密着性に劣るなど実用性が著しく低下するという問題がある。 In recent years, electronic parts have been reduced in weight and size, and pressure-sensitive adhesive sheets for fixing a workpiece capable of realizing cutting with higher accuracy have been demanded. Moreover, reduction of the processing waste (cutting waste) produced at the time of a cutting process is also calculated | required. In response to these requirements, it is considered that a pressure-sensitive adhesive sheet that can achieve higher cutting accuracy and reduced cutting waste can be obtained if the pressure-sensitive adhesive constituting the pressure-sensitive adhesive sheet is thinned. However, the pressure-sensitive adhesive sheet containing thermally expandable microspheres has a problem that the thickness of the adhesive is restricted because it contains thermally expandable microspheres. More specifically, in the pressure-sensitive adhesive sheet containing thermally expandable microspheres, if the adhesive is thinned, the thermally expandable microspheres protrude from the adhesive, which is inferior in adhesion to the base material or processing base. There is a problem that the remarkably decreases.
特開2002-121510号公報JP 2002-121510 A
 本発明は上記従来の課題を解決するためになされたものであり、その目的とするところは、電子部品等の微小部品の切断加工の際、優れた切断精度および切削屑の低減を実現し得る粘着シートを提供することにある。 The present invention has been made in order to solve the above-described conventional problems, and an object of the present invention is to realize excellent cutting accuracy and reduction of cutting waste when cutting a small part such as an electronic part. It is to provide an adhesive sheet.
 本発明の粘着シートは、加熱によって粘着力が低下する粘着面を、片面にのみ有し、該粘着面とは反対側の面の25℃におけるナノインデンテーション法による弾性率が、1MPa以上である。
 好ましい実施形態においては、断面視において、表面として上記粘着面を含む粘着剤領域と、該粘着剤領域の該粘着面とは反対側に隣接する被覆材領域とを有し、該粘着剤領域が、粘着剤と熱膨張性微小球とを含む。
 好ましい実施形態においては、上記粘着剤領域の厚みが、50μm以下である。
 好ましい実施形態においては、上記粘着面側をポリエチレンテレフタレートフィルムに貼着した際の粘着力が、0.2N/20mm以上である。
 好ましい実施形態においては、本発明の粘着シートは、加熱前の粘着力(a1)と加熱した後の粘着力(a2)との比(a2/a1)が、0.0001~0.5である。
 好ましい実施形態においては、加熱した後の上記粘着面の表面粗さRaが3μm以上である。
 好ましい実施形態においては、上記粘着面とは反対側に、基材をさらに備える。
 本発明の別の局面によれば、電子部品の製造方法が提供される。この製造方法は、上記粘着シート上に、電子部品材料を貼着した後、該電子部品材料を切断加工することを含む。
The pressure-sensitive adhesive sheet of the present invention has a pressure-sensitive adhesive surface whose adhesive strength is reduced by heating only on one side, and the elastic modulus by a nanoindentation method at 25 ° C. of the surface opposite to the pressure-sensitive adhesive surface is 1 MPa or more. .
In a preferred embodiment, in a cross-sectional view, the pressure-sensitive adhesive region includes the pressure-sensitive adhesive surface as a surface, and a covering material region adjacent to the pressure-sensitive adhesive region on the side opposite to the pressure-sensitive adhesive surface. , Including an adhesive and thermally expandable microspheres.
In preferable embodiment, the thickness of the said adhesive area | region is 50 micrometers or less.
In preferable embodiment, the adhesive force at the time of sticking the said adhesive surface side to a polyethylene terephthalate film is 0.2 N / 20mm or more.
In a preferred embodiment, in the pressure-sensitive adhesive sheet of the present invention, the ratio (a2 / a1) of the pressure-sensitive adhesive force (a1) before heating to the pressure-sensitive adhesive force (a2) after heating is 0.0001 to 0.5. .
In a preferred embodiment, the surface roughness Ra of the adhesive surface after heating is 3 μm or more.
In preferable embodiment, a base material is further provided on the opposite side to the said adhesive surface.
According to another aspect of the present invention, a method for manufacturing an electronic component is provided. This manufacturing method includes cutting the electronic component material after attaching the electronic component material on the pressure-sensitive adhesive sheet.
 本発明によれば、加熱によって粘着力が低下する粘着面を有し、該粘着面とは反対側の面の弾性率を比較的高くすることにより、電子部品等の微小部品の切断加工の際、優れた切断精度を実現し得る粘着シートを得ることができる。より詳細には、本発明においては、粘着剤と熱膨張性微小球とを含み表面としての粘着面を有する粘着剤領域を形成し、該粘着剤領域の粘着面とは反対側に比較的高弾性な被覆材領域を形成し、該粘着剤領域から該被覆材領域に突出した熱膨張性微小球を埋め込むことにより、粘着剤領域から突出する熱膨張性微小球による凹凸の影響なく低弾性領域である粘着剤領域を薄くし得、その結果、優れた切断精度を実現し得る粘着シートを得ることができる。また、本発明によれば、粘着剤領域を薄くし得るので、本発明の粘着シートを用いて電子部品等の微小部品の切断加工を行えば、切削屑の発生を抑制することができる。 According to the present invention, it has a pressure-sensitive adhesive surface whose adhesive strength is reduced by heating, and the elastic modulus of the surface opposite to the pressure-sensitive adhesive surface is relatively high. An adhesive sheet capable of realizing excellent cutting accuracy can be obtained. More specifically, in the present invention, a pressure-sensitive adhesive region including a pressure-sensitive adhesive and thermally expandable microspheres and having a pressure-sensitive adhesive surface as a surface is formed, and the pressure-sensitive adhesive region on the side opposite to the pressure-sensitive adhesive surface is relatively high. Low elastic region without influence of irregularities due to thermally expandable microspheres protruding from the adhesive region by forming an elastic coating material region and embedding the thermally expandable microspheres protruding from the adhesive region into the coating material region As a result, a pressure-sensitive adhesive sheet capable of realizing excellent cutting accuracy can be obtained. In addition, according to the present invention, since the pressure-sensitive adhesive region can be made thin, the generation of cutting waste can be suppressed by performing a cutting process on a micro component such as an electronic component using the pressure-sensitive adhesive sheet of the present invention.
本発明の好ましい実施形態による粘着シートの概略断面図である。It is a schematic sectional drawing of the adhesive sheet by preferable embodiment of this invention. 本発明の別の好ましい実施形態による粘着シートの概略断面図である。It is a schematic sectional drawing of the adhesive sheet by another preferable embodiment of this invention. 実施例3における厚みの測定により得られたラマンマッピングを示す図である。It is a figure which shows the Raman mapping obtained by the measurement of the thickness in Example 3. 実施例11における粘着シートの断面のSEM画像を示す図である。It is a figure which shows the SEM image of the cross section of the adhesive sheet in Example 11. FIG.
A.粘着シートの全体構成
 図1は、本発明の好ましい実施形態による粘着シートの概略断面図である。粘着シート100は、その片面にのみ粘着面11を有する。また、粘着シート100は、粘着面11とは反対側の面21として、25℃におけるナノインデンテーション法による弾性率が1MPa以上である面21を有する。このような弾性率を有する面は、例えば、下記のように、被覆材領域20を設けることにより、形成することができる。粘着シート100は、好ましくは加熱により膨張または発泡し得る熱膨張性微小球13を含む。
A. 1 is a schematic sectional view of a pressure-sensitive adhesive sheet according to a preferred embodiment of the present invention. The pressure-sensitive adhesive sheet 100 has the pressure-sensitive adhesive surface 11 only on one side thereof. In addition, the pressure-sensitive adhesive sheet 100 has a surface 21 having an elastic modulus of 1 MPa or more at 25 ° C. as a surface 21 opposite to the pressure-sensitive adhesive surface 11. A surface having such an elastic modulus can be formed, for example, by providing a covering material region 20 as described below. The pressure-sensitive adhesive sheet 100 preferably includes thermally expandable microspheres 13 that can expand or foam by heating.
 粘着シート100は、表面としての粘着面11を含む粘着剤領域10と、粘着剤領域10の粘着面11とは反対側に隣接する被覆材領域20とを有する。粘着剤領域10は、好ましくは、粘着剤12と熱膨張性微小球13とを含む。粘着剤領域10とは、粘着面11から、粘着剤領域10を構成する粘着剤12と被覆材領域20を構成する材料との界面1までの領域をいう。また、被覆材領域20とは、粘着剤領域10を構成する粘着剤12と被覆材領域20を構成する材料との界面1から、粘着面11とは反対側の面21までの領域をいう。熱膨張性微小球13は、粘着剤領域10から被覆材領域20へ突出していてもよい。粘着剤領域10から突出した熱膨張性微小球13は、被覆材領域20により被覆され得、その結果、熱膨張性微小球13による凹凸の影響をなくすことができる。被覆材領域20の外面(図示例では、下面)が、ナノインデンテーション法による弾性率が1MPa以上である面21となる。なお、図示していないが、粘着シートが実用に供されるまでの間、粘着面11の外側に剥離紙が配置されて粘着面11が保護されていてもよい。また、図示例においては、界面1を明確に図示しているが、界面は目視、顕微鏡等で判別し難い界面であってもよい。目視、顕微鏡等で判別し難い界面は、例えば、各領域の組成を分析して判別することができる(詳細は後述)。 The pressure-sensitive adhesive sheet 100 has a pressure-sensitive adhesive region 10 including a pressure-sensitive adhesive surface 11 as a surface, and a coating material region 20 adjacent to the pressure-sensitive adhesive region 10 opposite to the pressure-sensitive adhesive surface 11. The adhesive region 10 preferably includes an adhesive 12 and thermally expandable microspheres 13. The pressure-sensitive adhesive region 10 refers to a region from the pressure-sensitive adhesive surface 11 to the interface 1 between the pressure-sensitive adhesive 12 constituting the pressure-sensitive adhesive region 10 and the material constituting the coating material region 20. The covering material region 20 is a region from the interface 1 between the adhesive 12 constituting the adhesive region 10 and the material constituting the covering material region 20 to the surface 21 opposite to the adhesive surface 11. The thermally expandable microsphere 13 may protrude from the adhesive region 10 to the covering material region 20. The thermally expandable microspheres 13 protruding from the pressure-sensitive adhesive region 10 can be covered with the covering material region 20, and as a result, the influence of unevenness due to the thermally expandable microspheres 13 can be eliminated. The outer surface (lower surface in the illustrated example) of the covering material region 20 is a surface 21 having an elastic modulus of 1 MPa or more by the nanoindentation method. Although not shown, the adhesive surface 11 may be protected by disposing a release paper outside the adhesive surface 11 until the adhesive sheet is put to practical use. In the illustrated example, the interface 1 is clearly illustrated, but the interface may be an interface that is difficult to distinguish visually or with a microscope. The interface that is difficult to discriminate visually or with a microscope can be discriminated by analyzing the composition of each region (details will be described later).
 本発明においては、粘着面11とは反対側に、弾性率が適切に調整された被覆材領域20が形成されていることにより、熱膨張性微小球13が粘着剤領域10から突出することを許容して、粘着剤領域10を薄くすることができる。低弾性領域である粘着剤領域10を薄くすれば、電子部品等を切断加工する際の仮固定用シートとして、優れた切断精度の実現に寄与し得る。より具体的には、粘着剤領域10が薄い粘着シートを仮固定用シートとして用いて電子部品等を切断加工すれば、該粘着シートの変形が少ないために、切断後のチップが再付着すること、切断面が斜めになったりS字になったりと不安定になること、切断時にチップ欠けが発生すること等を防止することができる。また、粘着剤領域10が薄い粘着シートを、電子部品等を切断加工する際の仮固定用シートとして用いた場合、切削屑の発生を抑制することもできる。本発明の粘着シートは、ダイシング工程で多用される回転刃による切断において上記の効果を奏することは勿論、切削ロス低減のために採用される平刃での押切りによる切断においても、上記の効果を奏し、特に有用である。また、加温下(例えば、30℃~150℃)で、切断する場合においても、上記のように精度よく切断することができる。 In the present invention, the thermally expandable microsphere 13 protrudes from the adhesive region 10 by forming the coating material region 20 having an elastic modulus appropriately adjusted on the side opposite to the adhesive surface 11. Allowing the adhesive region 10 to be thinned. If the pressure-sensitive adhesive region 10 which is a low elastic region is thinned, it can contribute to the realization of excellent cutting accuracy as a temporary fixing sheet when cutting an electronic component or the like. More specifically, if an electronic component or the like is cut using a pressure-sensitive adhesive sheet having a thin pressure-sensitive adhesive region 10 as a temporary fixing sheet, the chip after cutting is reattached because the pressure-sensitive adhesive sheet is less deformed. It is possible to prevent the cutting surface from becoming slanted or S-shaped, and preventing chipping during cutting. Moreover, when the adhesive sheet with the thin adhesive area | region 10 is used as a temporary fixing sheet | seat at the time of cutting an electronic component etc., generation | occurrence | production of cutting waste can also be suppressed. The pressure-sensitive adhesive sheet of the present invention has the above-mentioned effect in cutting with a rotary blade frequently used in a dicing process, and also has the above-mentioned effect in cutting with a flat blade adopted to reduce cutting loss. It is particularly useful. Further, even when cutting under heating (for example, 30 ° C. to 150 ° C.), the cutting can be performed with high accuracy as described above.
 また、本発明の粘着シートは、粘着面11側(粘着剤領域10)に熱膨張性微小球13が存在しているため、被着体(例えば、切断加工した後のチップ)を粘着シートから剥離する際には、熱膨張性微小球13が膨張または発泡し得る程度の温度で加熱することにより、粘着面に凹凸が生じて、該粘着面の粘着力を低下または消失させることができる。 Moreover, since the heat-expandable microsphere 13 exists in the adhesive surface 11 side (adhesive area | region 10), the adhesive sheet of this invention removes a to-be-adhered body (for example, chip | tip after cutting) from an adhesive sheet. At the time of peeling, by heating at a temperature at which the thermally expandable microspheres 13 can expand or foam, unevenness is generated on the adhesive surface, and the adhesive force of the adhesive surface can be reduced or eliminated.
 本発明の粘着シートの粘着面をポリエチレンテレフタレートフィルム(例えば、厚み25μm)に貼着した際の粘着力は、好ましくは0.2N/20mm以上であり、より好ましくは0.2N/20mm~20N/20mmであり、さらに好ましくは2N/20mm~10N/20mmである。このような範囲であれば、電子部品等を切断加工する際の仮固定用シートとして有用な粘着シートを得ることができる。本明細書において粘着力とは、JIS Z 0237:2000に準じた方法(測定温度:23℃、貼り合わせ条件:2kgローラー1往復、剥離速度:300mm/min、剥離角度180°)により測定した粘着力をいう。 The adhesive strength when the adhesive surface of the adhesive sheet of the present invention is attached to a polyethylene terephthalate film (for example, thickness 25 μm) is preferably 0.2 N / 20 mm or more, more preferably 0.2 N / 20 mm to 20 N / 20 mm, more preferably 2 N / 20 mm to 10 N / 20 mm. If it is such a range, the adhesive sheet useful as a temporary fixing sheet at the time of cutting an electronic component etc. can be obtained. In the present specification, the adhesion is an adhesion measured by a method according to JIS Z 0237: 2000 (measurement temperature: 23 ° C., bonding condition: 2 kg roller 1 reciprocation, peeling speed: 300 mm / min, peeling angle 180 °). I say power.
 本発明の粘着シートの粘着面をポリエチレンテレフタレートフィルム(例えば、厚み25μm)に貼着し、加熱した後の粘着力は、好ましくは0.2N/20mm以下であり、より好ましくは0.1N/20mm以下である。本明細書において、粘着シートに対する加熱とは、熱膨張性微小球が膨張または発泡して粘着力が低下する温度・時間での加熱をいう。該加熱は、例えば、70℃~270℃で1分~10分間の加熱である。 The pressure-sensitive adhesive strength of the pressure-sensitive adhesive sheet of the present invention is preferably 0.2 N / 20 mm or less, more preferably 0.1 N / 20 mm, after the pressure-sensitive adhesive surface of the pressure-sensitive adhesive sheet is adhered to a polyethylene terephthalate film (for example, 25 μm thick) and heated. It is as follows. In the present specification, the heating of the pressure-sensitive adhesive sheet refers to heating at a temperature and time at which the heat-expandable microspheres expand or foam and the adhesive force is reduced. The heating is, for example, heating at 70 to 270 ° C. for 1 to 10 minutes.
 本発明の粘着シートの粘着面をポリエチレンテレフタレートフィルム(例えば、厚み25μm)に貼着した際の粘着力(すなわち加熱前の粘着力(a1))と、加熱した後の粘着力(a2)との比(a2/a1)は、好ましくは0.5以下であり、より好ましくは0.1以下である。(a2/a1)の下限は、好ましくは0.0001であり、より好ましくは0.0005である。 The adhesive force when adhering the adhesive surface of the adhesive sheet of the present invention to a polyethylene terephthalate film (for example, 25 μm thick) (that is, the adhesive force before heating (a1)) and the adhesive force after heating (a2) The ratio (a2 / a1) is preferably 0.5 or less, more preferably 0.1 or less. The lower limit of (a2 / a1) is preferably 0.0001, and more preferably 0.0005.
 上記のとおり、本発明の粘着シートは、所定の温度で加熱することにより、粘着面に凹凸が生じる。本発明の粘着シートを加熱した後の粘着面の表面粗さRaは、好ましくは3μm以上であり、より好ましくは5μm以上である。このような範囲であれば、加熱後に粘着力が低下または消失して、被着体を容易に剥離させ得る粘着シートを得ることができる。なお、粘着面の表面粗さRaとは、被着体のない状態で加熱した後の粘着シートの粘着面の表面粗さRaをいう。表面粗さRaは、JIS B 0601:1994に準じて測定することができる。 As described above, the pressure-sensitive adhesive sheet of the present invention is uneven at the pressure-sensitive adhesive surface when heated at a predetermined temperature. The surface roughness Ra of the pressure-sensitive adhesive surface after heating the pressure-sensitive adhesive sheet of the present invention is preferably 3 μm or more, more preferably 5 μm or more. Within such a range, a pressure-sensitive adhesive sheet can be obtained in which the adhesive strength decreases or disappears after heating and the adherend can be easily peeled off. The surface roughness Ra of the pressure-sensitive adhesive surface refers to the surface roughness Ra of the pressure-sensitive adhesive surface of the pressure-sensitive adhesive sheet after heating without an adherend. The surface roughness Ra can be measured according to JIS B 0601: 1994.
 図2は、本発明の別の好ましい実施形態による粘着シートの概略断面図である。粘着シート200は、粘着面11とは反対側に、基材30をさらに備える。なお、図示していないが、基材30の被覆材領域20とは反対側に、任意の適切な粘着剤層または接着剤層が設けられていてもよい。また、本発明の粘着シートは、実用に供されるまでの間、基材30の外側に剥離紙が配置されていてもよい。基材30の外側に剥離紙を配置する場合、該剥離紙は、任意の適切な粘着剤を介して基材に貼着され得る。図2においては、基材30の片側に粘着剤領域10および被覆材領域20が形成されている形態を示しているが、基材30の両側に粘着剤領域10および被覆材領域20が形成され、例えば、粘着剤領域/被覆材領域/基材/被覆材領域/粘着剤領域という構成であってもよい。 FIG. 2 is a schematic cross-sectional view of an adhesive sheet according to another preferred embodiment of the present invention. The pressure-sensitive adhesive sheet 200 further includes a base material 30 on the side opposite to the pressure-sensitive adhesive surface 11. Although not shown, any appropriate pressure-sensitive adhesive layer or adhesive layer may be provided on the opposite side of the base material 30 from the covering material region 20. Moreover, the release sheet may be arrange | positioned on the outer side of the base material 30 until the adhesive sheet of this invention is put to practical use. When disposing release paper on the outside of the substrate 30, the release paper can be attached to the substrate via any suitable adhesive. In FIG. 2, the adhesive region 10 and the covering material region 20 are formed on one side of the base material 30, but the adhesive region 10 and the covering material region 20 are formed on both sides of the base material 30. For example, a configuration of adhesive region / coating material region / base material / coating material region / adhesive region may be employed.
B.被覆材領域
 本発明の粘着シートは、粘着面とは反対側の面の25℃におけるナノインデンテーション法による弾性率が、上記のとおり1MPa以上であり、好ましくは1MPa~5000MPaであり、よりに好ましくは1MPa~3500MPaであり、さらに好ましくは1MPa~1000MPaであり、特に好ましくは10MPa~600MPaである。このような弾性率を示す面を有する粘着シートは、例えば、粘着剤領域とは異なる材料で形成された被覆材領域を形成することにより得ることができる。上記被覆材領域のナノインデンテーション法による弾性率は、粘着面とは反対側の面のナノインデンテーション法による弾性率に相当し得る。ナノインデンテーション法による弾性率とは、圧子を試料(例えば、粘着面)に押し込んだときの、圧子への負荷荷重と押し込み深さとを負荷時、除荷時にわたり連続的に測定し、得られた負荷荷重-押し込み深さ曲線から求められる弾性率をいう。本明細書において、ナノインデンテーション法による弾性率とは、測定条件を荷重:1mN、負荷・除荷速度:0.1mN/s、保持時間:1sとして上記のように測定した弾性率をいう。
B. Covering material region The pressure-sensitive adhesive sheet of the present invention has an elastic modulus at 25 ° C. on the surface opposite to the pressure-sensitive adhesive surface of 1 MPa or more, preferably 1 MPa to 5000 MPa, more preferably as described above. Is from 1 MPa to 3500 MPa, more preferably from 1 MPa to 1000 MPa, and particularly preferably from 10 MPa to 600 MPa. The pressure-sensitive adhesive sheet having a surface exhibiting such an elastic modulus can be obtained, for example, by forming a covering material region formed of a material different from the pressure-sensitive adhesive region. The elastic modulus of the coating material region by the nanoindentation method may correspond to the elastic modulus of the surface opposite to the adhesive surface by the nanoindentation method. The modulus of elasticity by the nanoindentation method is obtained by continuously measuring the load and depth of indentation when the indenter is pushed into the sample (for example, adhesive surface) during loading and unloading. The elastic modulus obtained from the applied load-indentation depth curve. In this specification, the elastic modulus by the nanoindentation method means an elastic modulus measured as described above under the measurement conditions of load: 1 mN, load / unloading speed: 0.1 mN / s, and holding time: 1 s.
 本発明においては、粘着面とは反対側に、ナノインデンテーション法による弾性率が1MPa以上である面を有すること、すなわち、該弾性率を示す被覆材領域を形成することにより、電子部品等を切断加工する際の仮固定用シートとして優れた切断精度の実現に寄与し得る粘着シートを提供することができる。さらに、被覆材領域のナノインデンテーション法による弾性率を5000MPa以下とすることにより、該被覆材領域は、粘着剤領域から突出した熱膨張性微小球の凹凸に追従し得、該熱膨張性微小球が埋め込まれたような形態で、該熱膨張性微小球を被覆することができる。また、粘着シート全体として必要な柔軟性(例えば、被着体に追従し得る程度の柔軟性)を損なうことなく、優れた切断精度の実現に寄与し得る粘着シートを提供することができる。 In the present invention, an electronic component or the like can be obtained by forming a surface having an elastic modulus of 1 MPa or more by the nanoindentation method on the side opposite to the adhesive surface, that is, by forming a covering material region exhibiting the elastic modulus. It is possible to provide an adhesive sheet that can contribute to the realization of excellent cutting accuracy as a temporary fixing sheet for cutting. Further, by setting the elastic modulus of the coating material region by the nanoindentation method to 5000 MPa or less, the coating material region can follow the unevenness of the thermally expandable microsphere protruding from the adhesive region, and the thermally expandable micro The thermally expandable microsphere can be coated in a form in which a sphere is embedded. In addition, it is possible to provide a pressure-sensitive adhesive sheet that can contribute to the realization of excellent cutting accuracy without impairing the flexibility required for the whole pressure-sensitive adhesive sheet (for example, flexibility enough to follow the adherend).
 上記被覆材領域の25℃における引っ張り弾性率は、好ましくは1MPa以上であり、より好ましくは1MPa~5000MPaであり、さらに好ましくは1MPa~1000MPaである。このような範囲であれば、ナノインデンテーション法による弾性率について上記で説明した効果と同様の効果を得ることができる。なお、引っ張り弾性率は、JIS K 7161:2008に準じて測定することができる。 The tensile elastic modulus at 25 ° C. of the coating material region is preferably 1 MPa or more, more preferably 1 MPa to 5000 MPa, and further preferably 1 MPa to 1000 MPa. If it is such a range, the effect similar to the effect demonstrated above about the elasticity modulus by a nanoindentation method can be acquired. The tensile elastic modulus can be measured according to JIS K 7161: 2008.
 上記被覆材領域の25℃における曲げ弾性率は、好ましくは1MPa以上であり、より好ましくは1MPa~5000MPaであり、さらに好ましくは1MPa~1000MPaである。このような範囲であれば、ナノインデンテーション法による弾性率について上記で説明した効果と同様の効果を得ることができる。なお、曲げ弾性率は、JIS K 7171:2008に準じて測定することができる。 The bending elastic modulus at 25 ° C. of the coating material region is preferably 1 MPa or more, more preferably 1 MPa to 5000 MPa, and further preferably 1 MPa to 1000 MPa. If it is such a range, the effect similar to the effect demonstrated above about the elasticity modulus by a nanoindentation method can be acquired. The flexural modulus can be measured according to JIS K 7171: 2008.
 上記被覆材領域の厚みは、粘着剤領域から突出した熱膨張性微小球の凹凸量(大きさ)に応じて、任意の適切な値に設定され得る。被覆材領域の厚みは、粘着剤領域から突出した熱膨張性微小球を全て被覆し得る厚さであることが好ましく、例えば、0.1μm~200μmであり、好ましくは0.1μm~100μmであり、より好ましくは0.1μm~45μmである。なお、本明細書において、被覆材領域の厚みとは、図1に示すように、被覆材領域20を構成する被覆材料と粘着剤領域10を構成する粘着剤12との界面1から、被覆材領域の該界面1とは反対側の面21までの距離をいう。すなわち、粘着剤領域10から熱膨張性微小球13が突出している部分については、被覆材領域の厚みの評価対象外とする。粘着シートを割断して割断面を目視した際に、上記界面1が明確である場合は、被覆材領域の厚みは、定規、ノギス、マイクロメータを用いて測定され得る。また、電子顕微鏡、光学顕微鏡、原子間力顕微鏡等の顕微鏡を用いて被覆材領域の厚みを測定してもよい。さらに、被覆材領域と粘着剤領域との組成の相違により界面を判別して被覆材領域の厚みを測定してもよい。例えば、ラマン分光分析、赤外分光分析、X線電子分光分析等の分光分析;マトリックス支援レーザー脱離イオン化飛行時間質量分析計(MALDI―TOFMS)や飛行時間2次イオン質量分析計(TOF-SIMS)などの質量分析等により、被覆材領域を構成する被覆材料および粘着剤領域を構成する粘着剤の組成を分析し、該組成の相違により界面を判別して被覆材領域の厚みを測定することができる。このように、分光分析または質量分析により界面を判別する方法は、目視あるいは顕微鏡を用いた観察では界面を判別し難い場合に有用である。 The thickness of the covering material region can be set to any appropriate value according to the unevenness (size) of the thermally expandable microsphere protruding from the adhesive region. The thickness of the coating material region is preferably a thickness that can cover all the thermally expandable microspheres protruding from the pressure-sensitive adhesive region, for example, 0.1 μm to 200 μm, and preferably 0.1 μm to 100 μm. More preferably, the thickness is 0.1 μm to 45 μm. In the present specification, the thickness of the covering material region is defined as the covering material from the interface 1 between the covering material constituting the covering material region 20 and the adhesive 12 constituting the adhesive region 10, as shown in FIG. This refers to the distance to the surface 21 on the opposite side of the region from the interface 1. That is, the portion where the heat-expandable microsphere 13 protrudes from the adhesive region 10 is excluded from the evaluation target of the thickness of the coating material region. When the interface 1 is clear when the adhesive sheet is cut and the cut section is visually observed, the thickness of the covering material region can be measured using a ruler, a caliper, and a micrometer. Moreover, you may measure the thickness of a coating | covering material area | region using microscopes, such as an electron microscope, an optical microscope, and an atomic force microscope. Further, the thickness of the covering material region may be measured by discriminating the interface based on the difference in composition between the covering material region and the adhesive region. For example, Raman spectroscopic analysis, infrared spectroscopic analysis, X-ray electron spectroscopic analysis, etc .; matrix-assisted laser desorption ionization time-of-flight mass spectrometer (MALDI-TOFMS) and time-of-flight secondary ion mass spectrometer (TOF-SIMS) ), Etc., to analyze the composition of the coating material constituting the coating material region and the pressure sensitive adhesive constituting the pressure sensitive adhesive region, and to determine the interface according to the difference in the composition to measure the thickness of the coating material region. Can do. Thus, the method of discriminating the interface by spectroscopic analysis or mass spectrometry is useful when it is difficult to discriminate the interface visually or by observation with a microscope.
 上記被覆材領域を構成する材料としては、例えば、シリコーン系ポリマー、エポキシ系ポリマー、ポリカーボネート系ポリマー、ビニル系ポリマー、アクリル系ポリマー、ウレタン系ポリマー、ポリエステル系ポリマー(例えば、ポリエチレンテレフタレート)、ポリオレフィン系ポリマー、ポリアミド系ポリマー、ポリイミド系ポリマー、不飽和炭化水素系ポリマー等のポリマー材料が挙げられる。これらのポリマー材料を用いれば、モノマー種、架橋剤、重合度等を適宜選択して、上記弾性率を有する被覆材領域を容易に形成することができる。また、上記ポリマー材料は、熱膨張性微小球、粘着剤領域を構成する粘着剤および基材との親和性に優れる。上記のポリマー材料は、単独で、または2種以上組み合わせて用いてもよい。 Examples of the material constituting the coating material region include a silicone polymer, an epoxy polymer, a polycarbonate polymer, a vinyl polymer, an acrylic polymer, a urethane polymer, a polyester polymer (for example, polyethylene terephthalate), and a polyolefin polymer. , Polymer materials such as polyamide-based polymers, polyimide-based polymers, and unsaturated hydrocarbon-based polymers. By using these polymer materials, it is possible to easily form a coating material region having the above elastic modulus by appropriately selecting a monomer type, a crosslinking agent, a polymerization degree, and the like. Moreover, the polymer material is excellent in affinity with the thermally expandable microsphere, the pressure-sensitive adhesive constituting the pressure-sensitive adhesive region, and the base material. You may use said polymer material individually or in combination of 2 or more types.
 上記被覆材領域を構成する材料として、活性エネルギー線の照射により硬化(高弾性率化)し得る樹脂材料を用いてもよい。このような材料により被覆材領域を形成すれば、粘着シートの貼り付け時には低弾性で柔軟性が高く取り扱い性に優れ、貼り付け後には、活性エネルギー線を照射することにより、上記範囲の弾性率に調整し得る粘着シートを得ることができる。活性エネルギー線としては、例えば、ガンマ線、紫外線、可視光線、赤外線(熱線)、ラジオ波、アルファ線、ベータ線、電子線、プラズマ流、電離線、粒子線等が挙げられる。活性エネルギー線の照射により硬化し得る樹脂材料から構成される被覆材領域は、活性エネルギー線の照射後の上記ナノインデンテーション法による弾性率が上記範囲となる。また、活性エネルギー線の照射により硬化し得る樹脂材料から構成される被覆材領域は、活性エネルギー線の照射後の上記引っ張り弾性率および/または曲げ弾性率が上記範囲となることが好ましい。 As the material constituting the covering material region, a resin material that can be cured (increased elastic modulus) by irradiation with active energy rays may be used. If the covering material region is formed of such a material, the elastic modulus in the above range can be obtained by irradiating active energy rays after application, with low elasticity, high flexibility and excellent handleability when the adhesive sheet is applied. A pressure-sensitive adhesive sheet that can be adjusted to be obtained can be obtained. Examples of the active energy rays include gamma rays, ultraviolet rays, visible rays, infrared rays (heat rays), radio waves, alpha rays, beta rays, electron beams, plasma flows, ionizing rays, particle rays and the like. In the covering material region composed of a resin material that can be cured by irradiation with active energy rays, the elastic modulus according to the nanoindentation method after irradiation with active energy rays falls within the above range. Moreover, it is preferable that the said tensile elastic modulus and / or bending elastic modulus after irradiation of an active energy ray become the said range for the coating | covering material area | region comprised from the resin material which can be hardened | cured by irradiation of an active energy ray.
 活性エネルギー線の照射により硬化(高弾性率化)し得る樹脂材料としては、例えば、紫外線硬化システム(加藤清視著、総合技術センター発行、(1989))、光硬化技術(技術情報協会編(2000))、特開2003-292916号公報、特許4151850号等に記載されている樹脂材料が挙げられる。より具体的には、母剤となるポリマーと活性エネルギー線反応性化合物(モノマーまたはオリゴマー)とを含む樹脂材料(R1)、活性エネルギー線反応性ポリマーを含む樹脂材料(R2)等が挙げられる。 Examples of resin materials that can be cured (increased elastic modulus) by irradiation with active energy rays include, for example, an ultraviolet curing system (written by Kiyomi Kato, published by General Technology Center, (1989)), photocuring technology (Technical Information Association ( 2000)), JP-A-2003-292916, JP-A-4151850 and the like. More specifically, a resin material (R1) containing a polymer as a base material and an active energy ray reactive compound (monomer or oligomer), a resin material (R2) containing an active energy ray reactive polymer, and the like can be mentioned.
 上記母剤となるポリマーとしては、例えば、天然ゴム、ポリイソブチレンゴム、スチレン・ブタジエンゴム、スチレン・イソプレン・スチレンブロック共重合体ゴム、再生ゴム、ブチルゴム、ポリイソブチレンゴム、ニトリルゴム(NBR)等のゴム系ポリマー;シリコーン系ポリマー;アクリル系ポリマー等が挙げられる。これらのポリマーは、単独で、または2種以上組み合わせて用いてもよい。 Examples of the base polymer include natural rubber, polyisobutylene rubber, styrene / butadiene rubber, styrene / isoprene / styrene block copolymer rubber, recycled rubber, butyl rubber, polyisobutylene rubber, and nitrile rubber (NBR). Examples thereof include rubber polymers; silicone polymers; acrylic polymers. These polymers may be used alone or in combination of two or more.
 上記活性エネルギー線反応性化合物としては、例えば、アクリロイル基、メタクリロイル基、ビニル基、アリル基、アセチレン基等の炭素-炭素多重結合を有する官能基を有する光反応性のモノマーまたはオリゴマーが挙げられる。該光反応性のモノマーまたはオリゴマーの具体例としては、トリメチロールプロパントリ(メタ)アクリレート、テトラメチロールメタンテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトールモノヒドロキシペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート等の(メタ)アクリロイル基含有化合物;該(メタ)アクリロイル基含有化合物の2~5量体;等が挙げられる。 Examples of the active energy ray reactive compound include photoreactive monomers or oligomers having a functional group having a carbon-carbon multiple bond such as acryloyl group, methacryloyl group, vinyl group, allyl group, and acetylene group. Specific examples of the photoreactive monomer or oligomer include trimethylolpropane tri (meth) acrylate, tetramethylolmethanetetra (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipenta Erythritol monohydroxypenta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, polyethylene glycol di (meth) acrylate, etc. (Meth) acryloyl group-containing compounds; dimer to pentamer of the (meth) acryloyl group-containing compounds;
 また、上記活性エネルギー線反応性化合物として、エポキシ化ブタジエン、グリシジルメタクリレート、アクリルアミド、ビニルシロキサン等のモノマー;または該モノマーから構成されるオリゴマーを用いてもよい。これらの化合物を含む樹脂材料(R1)は、紫外線、電子線等の高エネルギー線により硬化することができる。 Further, as the active energy ray-reactive compound, monomers such as epoxidized butadiene, glycidyl methacrylate, acrylamide, and vinyl siloxane; or oligomers composed of the monomers may be used. The resin material (R1) containing these compounds can be cured by high energy rays such as ultraviolet rays and electron beams.
 さらに、上記活性エネルギー線反応性化合物として、オニウム塩等の有機塩類と、分子内に複数の複素環を有する化合物との混合物を用いてもよい。該混合物は、活性エネルギー線(例えば、紫外線、電子線)の照射により有機塩が開裂してイオンを生成し、これが開始種となって複素環の開環反応を引き起こして3次元網目構造を形成し得る。上記有機塩類としては、例えば、ヨードニウム塩、フォスフォニウム塩、アンチモニウム塩、スルホニウム塩、ボレート塩等が挙げられる。上記分子内に複数の複素環を有する化合物における複素環としては、オキシラン、オキセタン、オキソラン、チイラン、アジリジン等が挙げられる。 Furthermore, as the active energy ray reactive compound, a mixture of an organic salt such as an onium salt and a compound having a plurality of heterocyclic rings in the molecule may be used. In the mixture, an organic salt is cleaved by irradiation with active energy rays (for example, ultraviolet rays and electron beams) to generate ions, which act as starting species to cause a ring opening reaction of the heterocyclic ring to form a three-dimensional network structure. Can do. Examples of the organic salts include iodonium salts, phosphonium salts, antimonium salts, sulfonium salts, and borate salts. Examples of the heterocyclic ring in the compound having a plurality of heterocyclic rings in the molecule include oxirane, oxetane, oxolane, thiirane, aziridine and the like.
 上記母剤となるポリマーと活性エネルギー線反応性化合物とを含む樹脂材料(R1)において、活性エネルギー線反応性化合物の含有割合は、母剤となるポリマー100重量部に対して、好ましくは0.1重量部~500重量部であり、より好ましくは1重量部~300重量部であり、さらに好ましくは10重量部~200重量部である。 In the resin material (R1) containing the polymer as the base material and the active energy ray-reactive compound, the content ratio of the active energy ray-reactive compound is preferably 0.00 with respect to 100 parts by weight of the polymer as the base material. 1 to 500 parts by weight, more preferably 1 to 300 parts by weight, still more preferably 10 to 200 parts by weight.
 上記母剤となるポリマーと活性エネルギー線反応性化合物とを含む樹脂材料(R1)は、必要に応じて、任意の適切な添加剤を含み得る。添加剤としては、例えば、活性エネルギー線重合開始剤、活性エネルギー線重合促進剤、架橋剤、可塑剤、加硫剤等が挙げられる。活性エネルギー線重合開始剤としては、用いる活性エネルギー線の種類に応じて、任意の適切な開始剤が用いられ得る。活性エネルギー線重合開始剤は、単独で、または2種以上組み合わせて用いてもよい。母剤となるポリマーと活性エネルギー線反応性化合物とを含む樹脂材料(R1)において、活性エネルギー線重合開始剤の含有割合は、母剤となるポリマー100重量部に対して、好ましくは0.1重量部~10重量部であり、より好ましくは1重量部~5重量部である。 The resin material (R1) containing the polymer as the base material and the active energy ray-reactive compound can contain any appropriate additive as necessary. Examples of the additive include an active energy ray polymerization initiator, an active energy ray polymerization accelerator, a crosslinking agent, a plasticizer, and a vulcanizing agent. Any appropriate initiator may be used as the active energy ray polymerization initiator depending on the type of active energy ray used. The active energy ray polymerization initiators may be used alone or in combination of two or more. In the resin material (R1) containing the polymer as the base material and the active energy ray-reactive compound, the content ratio of the active energy ray polymerization initiator is preferably 0.1 with respect to 100 parts by weight of the polymer as the base material. Parts by weight to 10 parts by weight, more preferably 1 part by weight to 5 parts by weight.
 上記活性エネルギー線反応性ポリマーとしては、例えば、アクリロイル基、メタクリロイル基、ビニル基、アリル基、アセチレン基等の炭素-炭素多重結合を有する官能基を有するポリマーが挙げられる。活性エネルギー線反応性官能基を有するポリマーの具体例としては、多官能(メタ)アクリレートから構成されるポリマー;光カチオン重合型ポリマー;ポリビニルシンナマート等のシンナモイル基含有ポリマー;ジアゾ化されたアミノノボラック樹脂;ポリアクリルアミド;等が挙げられる。また、活性エネルギー線反応性ポリマーを含む樹脂材料(R2)として、アリル基を有する活性エネルギー線反応性ポリマーとチオール基を有する化合物との混合物を用いることもできる。なお、活性エネルギー線照射による硬化の前(例えば、粘着シートを貼り付ける際)に、実用可能な硬さ(粘度)を有する被覆材領域前駆体を形成し得る限り、活性エネルギー線反応性官能基を有するポリマーの他、活性エネルギー線反応性官能基を有するオリゴマーを用いることもできる。 Examples of the active energy ray-reactive polymer include polymers having a functional group having a carbon-carbon multiple bond such as an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, and an acetylene group. Specific examples of the polymer having an active energy ray-reactive functional group include a polymer composed of a polyfunctional (meth) acrylate; a photocationic polymerization type polymer; a cinnamoyl group-containing polymer such as polyvinyl cinnamate; a diazotized amino novolak Resin; polyacrylamide; and the like. Further, as the resin material (R2) containing an active energy ray-reactive polymer, a mixture of an active energy ray-reactive polymer having an allyl group and a compound having a thiol group can also be used. In addition, as long as the coating material area | region precursor which has practical hardness (viscosity) can be formed before hardening by active energy ray irradiation (for example, when sticking an adhesive sheet), active energy ray reactive functional group An oligomer having an active energy ray-reactive functional group can also be used in addition to a polymer having a.
 上記活性エネルギー線反応性ポリマーを含む樹脂材料(R2)は、上記活性エネルギー線反応性化合物(モノマーまたはオリゴマー)をさらに含んでいてもよい。また、上記活性エネルギー線反応性ポリマーを含む樹脂材料(R2)は、必要に応じて、任意の適切な添加剤を含み得る。添加剤の具体例は、母剤となるポリマーと活性エネルギー線反応性化合物とを含む樹脂材料(R1)に含まれ得る添加剤と同様である。活性エネルギー線反応性ポリマーを含む樹脂材料(R2)において、活性エネルギー線重合開始剤の含有割合は、活性エネルギー線反応性ポリマー100重量部に対して、好ましくは0.1重量部~10重量部であり、より好ましくは1重量部~5重量部である。 The resin material (R2) containing the active energy ray-reactive polymer may further contain the active energy ray-reactive compound (monomer or oligomer). Moreover, the resin material (R2) containing the said active energy ray reactive polymer may contain arbitrary appropriate additives as needed. The specific example of an additive is the same as that of the additive which can be contained in the resin material (R1) containing the polymer used as a base material, and an active energy ray reactive compound. In the resin material (R2) containing the active energy ray reactive polymer, the content ratio of the active energy ray polymerization initiator is preferably 0.1 to 10 parts by weight with respect to 100 parts by weight of the active energy ray reactive polymer. More preferably, it is 1 to 5 parts by weight.
 上記被覆材領域は、ビーズをさらに含み得る。該ビーズとしては、例えば、ガラスビーズ、樹脂ビーズ等が挙げられる。被覆材領域にこのようなビーズを添加すれば、被覆材領域の弾性率を向上させることができ、より精度良く被加工物を加工することができる粘着シートが得られ得る。ビーズの平均粒径は、例えば0.01μm~50μmである。ビーズの添加量は、被覆材領域全体100重量部に対して、例えば10重量部~200重量部、好ましくは20重量部~100重量部である。 The dressing region may further include beads. Examples of the beads include glass beads and resin beads. If such beads are added to the covering material region, the elastic modulus of the covering material region can be improved, and an adhesive sheet capable of processing the workpiece with higher accuracy can be obtained. The average particle diameter of the beads is, for example, 0.01 μm to 50 μm. The amount of beads added is, for example, 10 to 200 parts by weight, preferably 20 to 100 parts by weight, with respect to 100 parts by weight of the entire covering material region.
C.粘着剤領域
 上記粘着剤領域は、好ましくは、粘着剤と熱膨張性微小球とを含む。
C. Adhesive area | region The said adhesive area | region preferably contains an adhesive and a thermally expansible microsphere.
 上記粘着剤領域の厚みは、好ましく50μm以下であり、より好ましくは1μm~50μmであり、さらに好ましくは1μm~25μmであり、特に好ましくは1μm~15μmである。粘着剤領域の厚みが50μmより厚い場合、電子部品等を切断加工する際の仮固定用シートとして用いた場合、切断後のチップが再付着する、切断面が不安定になる、切断時にチップ欠けが発生する、切削屑が発生する等の不具合が生じるおそれがある。本発明においては、弾性率が適切に調整された被覆材領域が形成されていることにより、熱膨張性微小球が粘着剤領域から突出することを許容して、粘着剤領域を薄くすることができる。一方、粘着剤領域の厚みが1μm未満の場合、十分な粘着力が得られないおそれがある。なお、本明細書において、粘着剤領域の厚みとは、図1に示すように、被覆材領域20を構成する被覆材料と粘着剤領域10を構成する粘着剤との界面1から、粘着面11までの距離をいう。すなわち、粘着剤領域10から熱膨張性微小球13が突出している部分については、粘着剤領域の厚みの評価対象外とする。なお、界面1の判別方法としては、上記B項で説明したとおりである。 The thickness of the pressure-sensitive adhesive region is preferably 50 μm or less, more preferably 1 μm to 50 μm, still more preferably 1 μm to 25 μm, and particularly preferably 1 μm to 15 μm. When the adhesive area is thicker than 50 μm, when used as a temporary fixing sheet when cutting electronic parts, etc., the chip after reattaching, the cut surface becomes unstable, the chip is missing at the time of cutting There is a risk of problems such as occurrence of cuttings and generation of cutting waste. In the present invention, by forming the covering material region in which the elastic modulus is appropriately adjusted, it is possible to allow the heat-expandable microspheres to protrude from the pressure-sensitive adhesive region, and to thin the pressure-sensitive adhesive region. it can. On the other hand, when the thickness of the pressure-sensitive adhesive region is less than 1 μm, there is a possibility that sufficient adhesive force cannot be obtained. In the present specification, the thickness of the pressure-sensitive adhesive region refers to the pressure-sensitive adhesive surface 11 from the interface 1 between the coating material constituting the coating material region 20 and the pressure-sensitive adhesive constituting the pressure-sensitive adhesive region 10 as shown in FIG. The distance to. That is, the portion where the heat-expandable microsphere 13 protrudes from the adhesive region 10 is excluded from the evaluation target of the thickness of the adhesive region. The method for determining the interface 1 is as described in the above section B.
 本発明の粘着シートは、該粘着シートを貼着する際の温度における、粘着面のナノインデンテーション法による弾性率が、好ましくは100MPa未満であり、より好ましくは0.1MPa~50MPaであり、さらに好ましくは0.1MPa~10MPaである。上記粘着剤領域のナノインデンテーション法による弾性率は、粘着面のナノインデンテーション法による弾性率に相当する。粘着面のナノインデンテーション法による弾性率とは、熱膨張性微小球が存在しない部分を選んで上記B項で説明した測定方法により測定された弾性率、すなわち粘着剤の弾性率をいう。上記粘着シートを貼着する際の温度とは、例えば、粘着剤としてアクリル系粘着剤を用いる場合、10℃~80℃であり、粘着剤としてスチレン-ジエンブロック共重合体系粘着剤を用いる場合、40℃~120℃である。 In the pressure-sensitive adhesive sheet of the present invention, the elastic modulus according to the nanoindentation method of the pressure-sensitive adhesive surface at the temperature at which the pressure-sensitive adhesive sheet is stuck is preferably less than 100 MPa, more preferably 0.1 MPa to 50 MPa, The pressure is preferably 0.1 MPa to 10 MPa. The elastic modulus of the adhesive region by the nanoindentation method corresponds to the elastic modulus of the adhesive surface by the nanoindentation method. The elastic modulus of the adhesive surface by the nanoindentation method means the elastic modulus measured by the measurement method described in the above section B by selecting a portion where no thermally expandable microspheres exist, that is, the elastic modulus of the adhesive. The temperature at the time of sticking the pressure-sensitive adhesive sheet is, for example, 10 to 80 ° C. when an acrylic pressure-sensitive adhesive is used as the pressure-sensitive adhesive, and when a styrene-diene block copolymer pressure-sensitive adhesive is used as the pressure-sensitive adhesive. 40 ° C to 120 ° C.
(粘着剤)
 上記粘着剤としては、加熱時に熱膨張性微小球の膨張または発泡を拘束しないものが好ましい。該粘着剤としては、例えば、アクリル系粘着剤、ゴム系粘着剤、ビニルアルキルエーテル系粘着剤、シリコーン系粘着剤、ポリエステル系粘着剤、ポリアミド系粘着剤、ウレタン系粘着剤、スチレン-ジエンブロック共重合体系粘着剤、放射線硬化型、これらの粘着剤に融点が約200℃以下の熱溶融性樹脂を配合したクリ-プ特性改良型粘着剤等が挙げられる(例えば、特開昭56-61468号公報、特開昭63-17981号公報等参照)。なかでも好ましくは、アクリル系粘着剤またはゴム系粘着剤である。なお、上記粘着剤は、単独で、または2種以上組み合わせて用いてもよい。
(Adhesive)
The pressure-sensitive adhesive is preferably one that does not restrain expansion or foaming of the thermally expandable microspheres during heating. Examples of the adhesive include acrylic adhesives, rubber adhesives, vinyl alkyl ether adhesives, silicone adhesives, polyester adhesives, polyamide adhesives, urethane adhesives, and styrene-diene block co-polymers. Polymer-based pressure-sensitive adhesives, radiation-curable adhesives, and creep characteristics-improving pressure-sensitive adhesives in which a hot-melt resin having a melting point of about 200 ° C. or less is blended with these pressure-sensitive adhesives (for example, JP-A-56-61468) Gazette, JP-A 63-17981, etc.). Among these, an acrylic pressure-sensitive adhesive or a rubber-based pressure-sensitive adhesive is preferable. In addition, you may use the said adhesive individually or in combination of 2 or more types.
 上記アクリル系粘着剤としては、例えば、(メタ)アクリル酸アルキルエステルの1種または2種以上を単量体成分として用いたアクリル系ポリマー(ホモポリマーまたはコポリマー)をベースポリマーとするアクリル系粘着剤等が挙げられる。(メタ)アクリル酸アルキルエステルの具体例としては、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸プロピル、(メタ)アクリル酸イソプロピル、(メタ)アクリル酸ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸s-ブチル、(メタ)アクリル酸t-ブチル、(メタ)アクリル酸ペンチル、(メタ)アクリル酸ヘキシル、(メタ)アクリル酸ヘプチル、(メタ)アクリル酸オクチル、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸イソオクチル、(メタ)アクリル酸ノニル、(メタ)アクリル酸イソノニル、(メタ)アクリル酸デシル、(メタ)アクリル酸イソデシル、(メタ)アクリル酸ウンデシル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸トリデシル、(メタ)アクリル酸テトラデシル、(メタ)アクリル酸ペンタデシル、(メタ)アクリル酸ヘキサデシル、(メタ)アクリル酸ヘプタデシル、(メタ)アクリル酸オクタデシル、(メタ)アクリル酸ノナデシル、(メタ)アクリル酸エイコシル等の(メタ)アクリル酸C1-20アルキルエステルが挙げられる。なかでも、炭素数が4~18の直鎖状もしくは分岐状のアルキル基を有する(メタ)アクリル酸アルキルエステルが好ましく用いられ得る。 Examples of the acrylic pressure-sensitive adhesive include, for example, an acrylic pressure-sensitive adhesive based on an acrylic polymer (homopolymer or copolymer) using one or more (meth) acrylic acid alkyl esters as monomer components. Etc. Specific examples of alkyl (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate, (meth ) Isobutyl acrylate, s-butyl (meth) acrylate, t-butyl (meth) acrylate, pentyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate , 2-ethylhexyl (meth) acrylate, isooctyl (meth) acrylate, nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate, isodecyl (meth) acrylate, (meth) acrylic acid Undecyl, dodecyl (meth) acrylate, tridecyl (meth) acrylate, (me ) Tetradecyl acrylate, pentadecyl (meth) acrylate, hexadecyl (meth) acrylate, heptadecyl (meth) acrylate, octadecyl (meth) acrylate, nonadecyl (meth) acrylate, eicosyl (meth) acrylate (meta) ) C1-20 alkyl ester of acrylic acid. Among them, (meth) acrylic acid alkyl esters having a linear or branched alkyl group having 4 to 18 carbon atoms can be preferably used.
 上記アクリル系ポリマーは、凝集力、耐熱性、架橋性等の改質を目的として、必要に応じて、上記(メタ)アクリル酸アルキルエステルと共重合可能な他の単量体成分に対応する単位を含んでいてもよい。このような単量体成分として、例えば、アクリル酸、メタクリル酸、カルボキシエチルアクリレート、カルボキシペンチルアクリレート、イタコン酸、マレイン酸、フマル酸、クロトン酸等のカルボキシル基含有モノマー;無水マレイン酸、無水イタコン酸等の酸無水物モノマー;(メタ)アクリル酸ヒドロキシエチル、(メタ)アクリル酸ヒドロキシプロピル、(メタ)アクリル酸ヒドロキシブチル、(メタ)アクリル酸ヒドロキシヘキシル、(メタ)アクリル酸ヒドロキシオクチル、(メタ)アクリル酸ヒドロキシデシル、(メタ)アクリル酸ヒドロキシラウリル、(4-ヒドロキシメチルシクロヘキシル)メチルメタクリレート等のヒドロキシル基含有モノマー;スチレンスルホン酸、アリルスルホン酸、2-(メタ)アクリルアミド-2-メチルプロパンスルホン酸、(メタ)アクリルアミドプロパンスルホン酸、スルホプロピル(メタ)アクリレート、(メタ)アクリロイルオキシナフタレンスルホン酸等のスルホン酸基含有モノマー;(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N-ブチル(メタ)アクリルアミド、N-メチロール(メタ)アクリルアミド、N-メチロールプロパン(メタ)アクリルアミド等の(N-置換)アミド系モノマー;(メタ)アクリル酸アミノエチル、(メタ)アクリル酸N,N-ジメチルアミノエチル、(メタ)アクリル酸t-ブチルアミノエチル等の(メタ)アクリル酸アミノアルキル系モノマー;(メタ)アクリル酸メトキシエチル、(メタ)アクリル酸エトキシエチル等の(メタ)アクリル酸アルコキシアルキル系モノマー;N-シクロヘキシルマレイミド、N-イソプロピルマレイミド、N-ラウリルマレイミド、N-フェニルマレイミド等のマレイミド系モノマー;N-メチルイタコンイミド、N-エチルイタコンイミド、N-ブチルイタコンイミド、N-オクチルイタコンイミド、N-2-エチルヘキシルイタコンイミド、N-シクロヘキシルイタコンイミド、N-ラウリルイタコンイミド等のイタコンイミド系モノマー;N-(メタ)アクリロイルオキシメチレンスクシンイミド、N-(メタ)アクルロイル-6-オキシヘキサメチレンスクシンイミド、N-(メタ)アクリロイル-8-オキシオクタメチレンスクシンイミド等のスクシンイミド系モノマー;酢酸ビニル、プロピオン酸ビニル、N-ビニルピロリドン、メチルビニルピロリドン、ビニルピリジン、ビニルピペリドン、ビニルピリミジン、ビニルピペラジン、ビニルピラジン、ビニルピロール、ビニルイミダゾール、ビニルオキサゾール、ビニルモルホリン、N-ビニルカルボン酸アミド類、スチレン、α-メチルスチレン、N-ビニルカプロラクタム等のビニル系モノマー;アクリロニトリル、メタクリロニトリル等のシアノアクリレートモノマー;(メタ)アクリル酸グリシジル等のエポキシ基含有アクリル系モノマー;(メタ)アクリル酸ポリエチレングリコール、(メタ)アクリル酸ポリプロピレングリコール、(メタ)アクリル酸メトキシエチレングリコール、(メタ)アクリル酸メトキシポリプロピレングリコール等のグリコール系アクリルエステルモノマー;(メタ)アクリル酸テトラヒドロフルフリル、フッ素(メタ)アクリレート、シリコーン(メタ)アクリレート等の複素環、ハロゲン原子、ケイ素原子等を有するアクリル酸エステル系モノマー;ヘキサンジオールジ(メタ)アクリレート、(ポリ)エチレングリコールジ(メタ)アクリレート、(ポリ)プロピレングリコールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、ペンタエリスリトールジ(メタ)アクリレート、トリメチロールプロパントリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート、エポキシアクリレート、ポリエステルアクリレート、ウレタンアクリレート等の多官能モノマー;イソプレン、ブタジエン、イソブチレン等のオレフィン系モノマー;ビニルエーテル等のビニルエーテル系モノマー等が挙げられる。これらの単量体成分は、単独で、または2種以上組み合わせて用いてもよい。 The acrylic polymer is a unit corresponding to another monomer component copolymerizable with the (meth) acrylic acid alkyl ester, if necessary, for the purpose of modifying cohesion, heat resistance, crosslinkability and the like. May be included. Examples of such monomer components include carboxyl group-containing monomers such as acrylic acid, methacrylic acid, carboxyethyl acrylate, carboxypentyl acrylate, itaconic acid, maleic acid, fumaric acid, and crotonic acid; maleic anhydride, itaconic anhydride Acid anhydride monomers such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, hydroxyhexyl (meth) acrylate, hydroxyoctyl (meth) acrylate, (meth) Hydroxyl group-containing monomers such as hydroxydecyl acrylate, hydroxylauryl (meth) acrylate, (4-hydroxymethylcyclohexyl) methyl methacrylate; styrene sulfonic acid, allyl sulfonic acid, 2- (meth) acrylamide Sulfonic acid group-containing monomers such as 2-methylpropanesulfonic acid, (meth) acrylamidepropanesulfonic acid, sulfopropyl (meth) acrylate, (meth) acryloyloxynaphthalenesulfonic acid; (meth) acrylamide, N, N-dimethyl (meta ) Acrylamide, N-butyl (meth) acrylamide, N-methylol (meth) acrylamide, (N-substituted) amide monomers such as N-methylolpropane (meth) acrylamide; aminoethyl (meth) acrylate, (meth) acrylic (Meth) acrylic acid aminoalkyl monomers such as N, N-dimethylaminoethyl acid and t-butylaminoethyl (meth) acrylate; (meth) acrylic acid (meth) acrylate, ) Alkoxy acrylate Rutile monomers; maleimide monomers such as N-cyclohexylmaleimide, N-isopropylmaleimide, N-laurylmaleimide, N-phenylmaleimide; N-methylitaconimide, N-ethylitaconimide, N-butylitaconimide, N-octyl Itaconimide monomers such as itaconimide, N-2-ethylhexylitaconimide, N-cyclohexylitaconimide, N-laurylitaconimide; N- (meth) acryloyloxymethylenesuccinimide, N- (meth) acryloyl-6-oxyhexamethylene Succinimide monomers such as succinimide and N- (meth) acryloyl-8-oxyoctamethylene succinimide; vinyl acetate, vinyl propionate, N-vinyl pyrrolidone, methyl vinyl pyro Vinyl such as lidone, vinylpyridine, vinylpiperidone, vinylpyrimidine, vinylpiperazine, vinylpyrazine, vinylpyrrole, vinylimidazole, vinyloxazole, vinylmorpholine, N-vinylcarboxylic amides, styrene, α-methylstyrene, N-vinylcaprolactam Cyanoacrylate monomers such as acrylonitrile and methacrylonitrile; epoxy group-containing acrylic monomers such as glycidyl (meth) acrylate; polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, (meth) acrylic acid Glycol acrylic ester monomers such as methoxyethylene glycol and (meth) acrylic acid methoxypolypropylene glycol; (meth) acrylic acid tetrahydrofur Acrylic acid ester monomers having heterocycles such as ril, fluorine (meth) acrylate, silicone (meth) acrylate, halogen atoms, silicon atoms, etc .; hexanediol di (meth) acrylate, (poly) ethylene glycol di (meth) acrylate , (Poly) propylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, pentaerythritol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate, dipentaerythritol hexa Polyfunctional monomers such as (meth) acrylates, epoxy acrylates, polyester acrylates, urethane acrylates; olefinic monomers such as isoprene, butadiene, isobutylene; And vinyl ether monomers such as vinyl ether. These monomer components may be used alone or in combination of two or more.
 上記ゴム系粘着剤としては、例えば、天然ゴム;ポリイソプレンゴム、スチレン・ブタジエン(SB)ゴム、スチレン・イソプレン(SI)ゴム、スチレン・イソプレン・スチレンブロック共重合体(SIS)ゴム、スチレン・ブタジエン・スチレンブロック共重合体(SBS)ゴム、スチレン・エチレン・ブチレン・スチレンブロック共重合体(SEBS)ゴム、スチレン・エチレン・プロピレン・スチレンブロック共重合体(SEPS)ゴム、スチレン・エチレン・プロピレンブロック共重合体(SEP)ゴム、再生ゴム、ブチルゴム、ポリイソブチレン、これらの変性体等の合成ゴム;等をベースポリマーとするゴム系粘着剤が挙げられる。 Examples of the rubber-based adhesive include natural rubber; polyisoprene rubber, styrene / butadiene (SB) rubber, styrene / isoprene (SI) rubber, styrene / isoprene / styrene block copolymer (SIS) rubber, and styrene / butadiene.・ Styrene block copolymer (SBS) rubber, styrene / ethylene / butylene / styrene block copolymer (SEBS) rubber, styrene / ethylene / propylene / styrene block copolymer (SEPS) rubber, styrene / ethylene / propylene block copolymer Examples thereof include rubber-based pressure-sensitive adhesives based on polymer (SEP) rubber, recycled rubber, butyl rubber, polyisobutylene, synthetic rubbers such as modified products thereof, and the like.
 上記粘着剤は、必要に応じて、任意の適切な添加剤を含み得る。該添加剤としては、例えば、架橋剤、粘着付与剤、可塑剤(例えば、トリメリット酸エステル系可塑剤、ピロメリット酸エステル系可塑剤)、顔料、染料、充填剤、老化防止剤、導電材、帯電防止剤、紫外線吸収剤、光安定剤、剥離調整剤、軟化剤、界面活性剤、難燃剤、酸化防止剤等が挙げられる。 The pressure-sensitive adhesive may contain any appropriate additive as necessary. Examples of the additive include a crosslinking agent, a tackifier, a plasticizer (for example, trimellitic acid ester plasticizer, pyromellitic acid ester plasticizer), pigment, dye, filler, anti-aging agent, conductive material. , Antistatic agents, ultraviolet absorbers, light stabilizers, release modifiers, softeners, surfactants, flame retardants, antioxidants and the like.
 上記粘着付与剤としては、任意の適切な粘着付与剤が用いられる。粘着付与剤としては、例えば、粘着付与樹脂が用いられる。粘着付与樹脂の具体例としては、ロジン系粘着付与樹脂(例えば、未変性ロジン、変性ロジン、ロジンフェノール系樹脂、ロジンエステル系樹脂など)、テルペン系粘着付与樹脂(例えば、テルペン系樹脂、テルペンフェノール系樹脂、スチレン変性テルペン系樹脂、芳香族変性テルペン系樹脂、水素添加テルペン系樹脂)、炭化水素系粘着付与樹脂(例えば、脂肪族系炭化水素樹脂、脂肪族系環状炭化水素樹脂、芳香族系炭化水素樹脂(例えば、スチレン系樹脂、キシレン系樹脂など)、脂肪族・芳香族系石油樹脂、脂肪族・脂環族系石油樹脂、水素添加炭化水素樹脂、クマロン系樹脂、クマロンインデン系樹脂など)、フェノール系粘着付与樹脂(例えば、アルキルフェノール系樹脂、キシレンホルムアルデヒド系樹脂、レゾール、ノボラックなど)、ケトン系粘着付与樹脂、ポリアミド系粘着付与樹脂、エポキシ系粘着付与樹脂、エラストマー系粘着付与樹脂などが挙げられる。なかでも好ましくは、ロジン系粘着付与樹脂、テルペン系粘着付与樹脂または炭化水素系粘着付与樹脂(スチレン系樹脂など)である。粘着付与剤は、単独で、または2種以上組み合わせて用いてもよい。 Any appropriate tackifier may be used as the tackifier. As the tackifier, for example, a tackifier resin is used. Specific examples of tackifying resins include rosin tackifying resins (eg, unmodified rosin, modified rosin, rosin phenolic resin, rosin ester resin, etc.), terpene tackifying resins (eg, terpene resins, terpene phenols). Resin, styrene modified terpene resin, aromatic modified terpene resin, hydrogenated terpene resin), hydrocarbon tackifier resin (for example, aliphatic hydrocarbon resin, aliphatic cyclic hydrocarbon resin, aromatic resin) Hydrocarbon resins (eg, styrene resins, xylene resins, etc.), aliphatic / aromatic petroleum resins, aliphatic / alicyclic petroleum resins, hydrogenated hydrocarbon resins, coumarone resins, coumarone indene resins Etc.), phenolic tackifying resins (eg, alkylphenolic resins, xyleneformaldehyde resins, resoles, novos) Tsu, etc. h), ketone-based tackifying resins, polyamide-based tackifying resins, epoxy-based tackifying resins, such as an elastomer-based tackifying resins. Among these, rosin-based tackifier resins, terpene-based tackifier resins, or hydrocarbon-based tackifier resins (such as styrene resins) are preferable. You may use a tackifier individually or in combination of 2 or more types.
 上記粘着付与剤は市販品を用いてもよい。市販品の粘着付与剤の具体例としては、ヤスハラケミカル社製の商品名「YSポリスターS145」、「マイティエースK140」、荒川化学社製の商品名「タマノル901」等のテルペンフェノール樹脂;住友ベークライト社製の商品名「スミライトレジン PR-12603」、荒川化学社製の商品名「タマノル361」等のロジンフェノール樹脂;荒川化学社製の商品名「タマノル1010R」、「タマノル200N」等のアルキルフェノール樹脂;荒川化学社製の商品名「アルコンP-140」等の脂環族系飽和炭化水素樹脂等が挙げられる。 Commercially available products may be used as the tackifier. Specific examples of commercially available tackifiers include terpene phenol resins such as “YS Polystar S145” and “Mighty Ace K140” manufactured by Yasuhara Chemical Co., Ltd. and “Tamanor 901” manufactured by Arakawa Chemical Co., Ltd .; Sumitomo Bakelite Rosin phenolic resin such as “Sumilite Resin PR-12603” manufactured by Arakawa Chemical Co., Ltd .; Alkylphenol resin such as “Tamanol 1010R” and “Tamanol 200N” manufactured by Arakawa Chemical Co., Ltd. An alicyclic saturated hydrocarbon resin such as “Arcon P-140” manufactured by Arakawa Chemical Co., Ltd.
 上記粘着付与剤の添加量は、ベースポリマー100重量部に対して、好ましくは5重量部~100重量部であり、より好ましくは10重量部~50重量部である。 The addition amount of the tackifier is preferably 5 to 100 parts by weight, more preferably 10 to 50 parts by weight with respect to 100 parts by weight of the base polymer.
 上記架橋剤としては、例えば、イソシアネート系架橋剤、エポキシ系架橋剤、メラミン系架橋剤、過酸化物系架橋剤の他、尿素系架橋剤、金属アルコキシド系架橋剤、金属キレート系架橋剤、金属塩系架橋剤、カルボジイミド系架橋剤、オキサゾリン系架橋剤、アジリジン系架橋剤、アミン系架橋剤などが挙げられる。なかでも好ましくは、イソシアネート系架橋剤またはエポキシ系架橋剤である。 Examples of the crosslinking agent include an isocyanate crosslinking agent, an epoxy crosslinking agent, a melamine crosslinking agent, a peroxide crosslinking agent, a urea crosslinking agent, a metal alkoxide crosslinking agent, a metal chelate crosslinking agent, and a metal. Examples thereof include salt-based crosslinking agents, carbodiimide-based crosslinking agents, oxazoline-based crosslinking agents, aziridine-based crosslinking agents, and amine-based crosslinking agents. Of these, an isocyanate-based crosslinking agent or an epoxy-based crosslinking agent is preferable.
 上記イソシアネート系架橋剤の具体例としては、ブチレンジイソシアネート、ヘキサメチレンジイソシアネート等の低級脂肪族ポリイソシアネート類;シクロペンチレンジイソシアネート、シクロへキシレンジイソシアネート、イソホロン ジイソシアネート等の脂環族イソシアネート類;2,4-トリレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、キシリレンジイソシアネート等の芳香族イソシアネート類;トリメチロールプロパン/トリレンジイソシアネート3量体付加物(日本ポリウレタン工業社製、商品名「コロネートL」)、トリメチロールプロパン/へキサメチレンジイソシアネート3量体付加物(日本ポリウレタン工業社製、商品名「コロネートHL」)、ヘキサメチレンジイソシアネートのイソシアヌレート体(日本ポリウレタン工業社製、商品名「コロネートHX」)等のイソシアネート付加物;等が挙げられる。イソシアネート系架橋剤の含有量は、所望とする粘着力に応じて、任意の適切な量に設定され得、ベースポリマー100重量部に対して、代表的には0.1重量部~20重量部であり、より好ましくは0.5重量部~10重量部である。 Specific examples of the isocyanate-based crosslinking agent include lower aliphatic polyisocyanates such as butylene diisocyanate and hexamethylene diisocyanate; alicyclic isocyanates such as cyclopentylene diisocyanate, cyclohexylene diisocyanate and isophorone diisocyanate; 2,4- Aromatic isocyanates such as tolylene diisocyanate, 4,4′-diphenylmethane diisocyanate, xylylene diisocyanate; trimethylolpropane / tolylene diisocyanate trimer adduct (trade name “Coronate L” manufactured by Nippon Polyurethane Industry Co., Ltd.) Methylolpropane / hexamethylene diisocyanate trimer adduct (trade name “Coronate HL” manufactured by Nippon Polyurethane Industry Co., Ltd.), isoform of hexamethylene diisocyanate Cyanurate body (Nippon Polyurethane Industry Co., Ltd. under the trade name "Coronate HX") isocyanate adducts of the like; and the like. The content of the isocyanate-based crosslinking agent can be set to any appropriate amount depending on the desired adhesive strength, and is typically 0.1 to 20 parts by weight with respect to 100 parts by weight of the base polymer. More preferably, it is 0.5 to 10 parts by weight.
 前記エポキシ系架橋剤としては、例えば、N,N,N’,N’-テトラグリシジル-m-キシレンジアミン、ジグリシジルアニリン、1,3-ビス(N,N-グリシジルアミノメチル)シクロヘキサン(三菱ガス化学社製、商品名「テトラッドC」)、1,6-ヘキサンジオールジグリシジルエーテル(共栄社化学社製、商品名「エポライト1600」)、ネオペンチルグリコールジグリシジルエーテル(共栄社化学社製、商品名「エポライト1500NP」)、エチレングリコールジグリシジルエーテル(共栄社化学社製、商品名「エポライト40E」)、プロピレングリコールジグリシジルエーテル(共栄社化学社製、商品名「エポライト70P」)、ポリエチレングリコールジグリシジルエーテル(日本油脂社製、商品名「エピオールE-400」)、ポリプロピレングリコールジグリシジルエーテル(日本油脂社製、商品名「エピオールP-200」)、ソルビトールポリグリシジルエーテル(ナガセケムテックス社製、商品名「デナコール EX-611」)、グリセロールポリグリシジルエーテル(ナガセケムテックス社製、商品名「デナコール EX-314」)、ペンタエリスリトールポリグリシジルエーテル、ポリグリセロールポリグリシジルエーテル(ナガセケムテックス社製、商品名「デナコール EX-512」)、ソルビタンポリグリシジルエーテル、トリメチロールプロパンポリグリシジルエーテル、アジピン酸ジグリシジルエステル、o-フタル酸ジグリシジルエステル、トリグリシジル-トリス(2-ヒドロキシエチル)イソシアヌレート、レゾルシンジグリシジルエーテル、ビスフェノール-S-ジグリシジルエーテル、分子内にエポキシ基を2つ以上有するエポキシ系樹脂等が挙げられる。エポキシ系架橋剤の含有量は、所望とする粘着力に応じて、任意の適切な量に設定され得、ベースポリマー100重量部に対して、代表的には0.01重量部~10重量部であり、より好ましくは0.03重量部~5重量部である。 Examples of the epoxy crosslinking agent include N, N, N ′, N′-tetraglycidyl-m-xylenediamine, diglycidylaniline, 1,3-bis (N, N-glycidylaminomethyl) cyclohexane (Mitsubishi Gas). Chemical name, “Tetrad C”), 1,6-hexanediol diglycidyl ether (manufactured by Kyoeisha Chemical Co., trade name “Epolite 1600”), neopentyl glycol diglycidyl ether (manufactured by Kyoeisha Chemical Co., Ltd., trade name “ Epolite 1500NP "), ethylene glycol diglycidyl ether (manufactured by Kyoeisha Chemical Co., trade name" Epolite 40E "), propylene glycol diglycidyl ether (manufactured by Kyoeisha Chemical Co., trade name" Epolite 70P "), polyethylene glycol diglycidyl ether (Japan) Product name "Epior" E-400 "), polypropylene glycol diglycidyl ether (manufactured by NOF Corporation, trade name" Epiol P-200 "), sorbitol polyglycidyl ether (manufactured by Nagase ChemteX Corporation, trade name" Denacol EX-611 "), glycerol poly Glycidyl ether (manufactured by Nagase ChemteX Corporation, trade name “Denacol EX-314”), pentaerythritol polyglycidyl ether, polyglycerol polyglycidyl ether (manufactured by Nagase ChemteX Corporation, trade name “Denacol EX-512”), sorbitan polyglycidyl Ether, trimethylolpropane polyglycidyl ether, adipic acid diglycidyl ester, o-phthalic acid diglycidyl ester, triglycidyl-tris (2-hydroxyethyl) isocyanurate, Le Shinji glycidyl ethers, bisphenol -S- diglycidyl ether, epoxy resins having two or more epoxy groups in the molecule. The content of the epoxy-based crosslinking agent can be set to any appropriate amount depending on the desired adhesive strength, and is typically 0.01 to 10 parts by weight with respect to 100 parts by weight of the base polymer. More preferably, it is 0.03 to 5 parts by weight.
(熱膨張性微小球)
 上記熱膨張性微小球としては、加熱により膨張または発泡し得る微小球である限りにおいて、任意の適切な熱膨張性微小球を用いることができる。上記熱膨張性微小球としては、例えば、加熱により容易に膨張する物質を、弾性を有する殻内に内包させた微小球が用いられ得る。このような熱膨張性微小球は、任意の適切な方法、例えば、コアセルベーション法、界面重合法等により製造できる。
(Thermally expandable microsphere)
As the thermally expandable microsphere, any appropriate thermally expandable microsphere can be used as long as it is a microsphere that can expand or foam by heating. As the thermally expandable microsphere, for example, a microsphere in which a substance that easily expands by heating is encapsulated in an elastic shell can be used. Such thermally expandable microspheres can be produced by any appropriate method, for example, a coacervation method, an interfacial polymerization method, or the like.
 加熱により容易に膨張する物質としては、例えば、プロパン、プロピレン、ブテン、ノルマルブタン、イソブタン、イソペンタン、ネオペンタン、ノルマルペンタン、ノルマルヘキサン、イソヘキサン、ヘプタン、オクタン、石油エーテル、メタンのハロゲン化物、テトラアルキルシラン等の低沸点液体;熱分解によりガス化するアゾジカルボンアミド;等が挙げられる。 Examples of the material that easily expands when heated include propane, propylene, butene, normal butane, isobutane, isopentane, neopentane, normal pentane, normal hexane, isohexane, heptane, octane, petroleum ether, methane halide, tetraalkylsilane. And low-boiling-point liquids such as azodicarbonamide that is gasified by thermal decomposition.
 上記殻を構成する物質としては、例えば、アクリロニトリル、メタクリロニトリル、α-クロルアクリロニトリル、α-エトキシアクリロニトリル、フマロニトリル等のニトリル単量体;アクリル酸、メタクリル酸、イタコン酸、マレイン酸、フマル酸、シトラコン酸等のカルボン酸単量体;塩化ビニリデン;酢酸ビニル;メチル(メタ)アクリレート、エチル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、t-ブチル(メタ)アクリレート、イソボルニル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、β-カルボキシエチルアクリレート等の(メタ)アクリル酸エステル;スチレン、α-メチルスチレン、クロロスチレン等のスチレンモノマー;アクリルアミド、置換アクリルアミド、メタクリルアミド、置換メタクリルアミド等のアミド単量体;等から構成されるポリマーが挙げられる。これらの単量体から構成されるポリマーは、ホモポリマーであってもよく、コポリマーであってもよい。該コポリマーとしては、例えば、塩化ビニリデン-メタクリル酸メチル-アクリロニトリル共重合体、メタクリル酸メチル-アクリロニトリル-メタクリロニトリル共重合体、メタクリル酸メチル-アクリロニトリル共重合体、アクリロニトリル-メタクリロニトリル-イタコン酸共重合体等が挙げられる。 Examples of the material constituting the shell include nitrile monomers such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile, α-ethoxyacrylonitrile, fumaronitrile; acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, Carboxylic acid monomers such as citraconic acid; vinylidene chloride; vinyl acetate; methyl (meth) acrylate, ethyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, (Meth) acrylic esters such as isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, β-carboxyethyl acrylate; styrene mono, such as styrene, α-methylstyrene, chlorostyrene Chromatography; and the polymer composed like; acrylamides, substituted acrylamides, methacrylamide, amide monomers such as substituted methacrylamide. The polymer composed of these monomers may be a homopolymer or a copolymer. Examples of the copolymer include vinylidene chloride-methyl methacrylate-acrylonitrile copolymer, methyl methacrylate-acrylonitrile-methacrylonitrile copolymer, methyl methacrylate-acrylonitrile copolymer, acrylonitrile-methacrylonitrile-itaconic acid copolymer. A polymer etc. are mentioned.
 上記熱膨張性微小球として、無機系発泡剤または有機系発泡剤を用いてもよい。無機系発泡剤としては、例えば、炭酸アンモニウム、炭酸水素アンモニウム、炭酸水素ナトリウム、亜硝酸アンモニウム、水酸化ホウ素ナトリウム、各種アジド類等が挙げられる。また、有機系発泡剤としては、例えば、トリクロロモノフルオロメタン、ジクロロモノフルオロメタン等の塩フッ化アルカン系化合物;アゾビスイソブチロニトリル、アゾジカルボンアミド、バリウムアゾジカルボキシレート等のアゾ系化合物;パラトルエンスルホニルヒドラジド、ジフェニルスルホン-3,3´-ジスルホニルヒドラジド、4,4´-オキシビス(ベンゼンスルホニルヒドラジド)、アリルビス(スルホニルヒドラジド)等のヒドラジン系化合物;p-トルイレンスルホニルセミカルバジド、4,4´-オキシビス(ベンゼンスルホニルセミカルバジド)等のセミカルバジド系化合物;5-モルホリル-1,2,3,4-チアトリアゾール等のトリアゾール系化合物;N,N´-ジニトロソペンタメチレンテトラミン、N,N´-ジメチル-N,N´-ジニトロソテレフタルアミド;等のN-ニトロソ系化合物などが挙げられる。 An inorganic foaming agent or an organic foaming agent may be used as the thermally expandable microsphere. Examples of the inorganic foaming agent include ammonium carbonate, ammonium hydrogen carbonate, sodium hydrogen carbonate, ammonium nitrite, sodium borohydride, various azides and the like. Examples of the organic foaming agent include chlorofluorinated alkane compounds such as trichloromonofluoromethane and dichloromonofluoromethane; azo compounds such as azobisisobutyronitrile, azodicarbonamide, and barium azodicarboxylate. Hydrazine compounds such as para-toluenesulfonyl hydrazide, diphenylsulfone-3,3′-disulfonyl hydrazide, 4,4′-oxybis (benzenesulfonyl hydrazide), allyl bis (sulfonyl hydrazide); p-toluylene sulfonyl semicarbazide, 4, Semicarbazide compounds such as 4′-oxybis (benzenesulfonyl semicarbazide); Triazole compounds such as 5-morpholyl-1,2,3,4-thiatriazole; N, N′-dinitrosopentamethylenetetramine, N, '- dimethyl -N, N'-dinitrosoterephthalamide; etc. N- nitroso compounds, and the like.
 上記熱膨張性微小球は市販品を用いてもよい。市販品の熱膨張性微小球の具体例としては、松本油脂製薬社製の商品名「マツモトマイクロスフェアー」(グレード:F-30、F-30D、F-36D、F-36LV、F-50、F-50D、F-65、F-65D、FN-100SS、FN-100SSD、FN-180SS、FN-180SSD、F-190D、F-260D、F-2800D)、日本フィライト社製の商品名「エクスパンセル」(グレード:053-40、031-40、920-40、909-80、930-120)、呉羽化学工業社製「ダイフォーム」(グレード:H750、H850、H1100、S2320D、S2640D、M330、M430、M520)、積水化学工業社製「アドバンセル」(グレード:EML101、EMH204、EHM301、EHM302、EHM303、EM304、EHM401、EM403、EM501)等が挙げられる。 Commercially available products may be used as the above-mentioned thermally expandable microspheres. Specific examples of commercially available thermally expandable microspheres include “Matsumoto Microsphere” (grade: F-30, F-30D, F-36D, F-36LV, F-50) manufactured by Matsumoto Yushi Seiyaku Co., Ltd. F-50D, F-65, F-65D, FN-100SS, FN-100SSD, FN-180SS, FN-180SSD, F-190D, F-260D, F-2800D), trade names “Nippon Philite” "Expansel" (grade: 053-40, 031-40, 920-40, 909-80, 930-120), "Die Form" (grade: H750, H850, H1100, S2320D, S2640D, manufactured by Kureha Chemical Industry Co., Ltd.) M330, M430, M520), “ADVANCEL” manufactured by Sekisui Chemical Co., Ltd. (grade: EML101, EMH204, EHM3) 1, EHM302, EHM303, EM304, EHM401, EM403, EM501) and the like.
 上記熱膨張性微小球の加熱前の粒子径は、好ましくは0.5μm~80μmであり、より好ましくは5μm~45μmであり、さらに好ましくは10μm~20μmであり、特に好ましくは10μm~15μmである。よって、上記熱膨張性微小球の加熱前の粒子サイズを平均粒子径で言えば、好ましくは6μm~45μmであり、より好ましくは15μm~35μmである。上記の粒子径と平均粒子径はレーザー散乱法における粒度分布測定法によって求められる値である。 The particle diameter of the thermally expandable microsphere before heating is preferably 0.5 μm to 80 μm, more preferably 5 μm to 45 μm, still more preferably 10 μm to 20 μm, and particularly preferably 10 μm to 15 μm. . Therefore, the particle size before heating of the thermally expandable microspheres is preferably 6 μm to 45 μm, more preferably 15 μm to 35 μm, in terms of average particle size. The above particle diameter and average particle diameter are values obtained by the particle size distribution measurement method in the laser scattering method.
 上記熱膨張性微小球は、体積膨張率が好ましくは5倍以上、より好ましくは7倍以上、さらに好ましくは10倍以上となるまで破裂しない適度な強度を有することが好ましい。このような熱膨張性微小球を用いる場合、加熱処理により粘着力を効率よく低下させることができる。 It is preferable that the thermally expandable microspheres have an appropriate strength that does not rupture until the volume expansion coefficient is preferably 5 times or more, more preferably 7 times or more, and even more preferably 10 times or more. When such a heat-expandable microsphere is used, the adhesive force can be efficiently reduced by heat treatment.
 上記粘着剤領域における熱膨張性微小球の含有割合は、所望とする粘着力の低下性等に応じて適切に設定し得る。熱膨張性微小球の含有割合は、粘着剤領域を形成するベースポリマー100重量部に対して、例えば1重量部~150重量部、好ましくは10重量部~130重量部、さらに好ましくは25重量部~100重量部である。 The content ratio of the heat-expandable microspheres in the pressure-sensitive adhesive region can be appropriately set according to the desired decrease in adhesive strength. The content ratio of the heat-expandable microspheres is, for example, 1 part by weight to 150 parts by weight, preferably 10 parts by weight to 130 parts by weight, and more preferably 25 parts by weight with respect to 100 parts by weight of the base polymer forming the pressure-sensitive adhesive region. ~ 100 parts by weight.
D.基材
 上記基材としては、例えば、樹脂シート、不織布、紙、金属箔、織布、ゴムシート、発泡シート、これらの積層体(特に、樹脂シートを含む積層体)等が挙げられる。樹脂シートを構成する樹脂としては、例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリブチレンテレフタレート(PBT)、ポリエチレン(PE)、ポリプロピレン(PP)、エチレン-プロピレン共重合体、エチレン-酢酸ビニル共重合体(EVA)、ポリアミド(ナイロン)、全芳香族ポリアミド(アラミド)、ポリイミド(PI)、ポリ塩化ビニル(PVC)、ポリフェニレンサルファイド(PPS)、フッ素系樹脂、ポリエーテルエーテルケトン(PEEK)等が挙げられる。不織布としては、マニラ麻を含む不織布等の耐熱性を有する天然繊維による不織布;ポリプロピレン樹脂不織布、ポリエチレン樹脂不織布、エステル系樹脂不織布等の合成樹脂不織布等が挙げられる。
D. Base material Examples of the base material include resin sheets, nonwoven fabrics, paper, metal foils, woven fabrics, rubber sheets, foamed sheets, and laminates thereof (particularly, laminates including resin sheets). Examples of the resin constituting the resin sheet include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), polyethylene (PE), polypropylene (PP), ethylene-propylene copolymer, ethylene- Vinyl acetate copolymer (EVA), polyamide (nylon), wholly aromatic polyamide (aramid), polyimide (PI), polyvinyl chloride (PVC), polyphenylene sulfide (PPS), fluororesin, polyether ether ketone (PEEK) ) And the like. Examples of the nonwoven fabric include nonwoven fabrics made of natural fibers having heat resistance such as nonwoven fabrics including manila hemp; synthetic resin nonwoven fabrics such as polypropylene resin nonwoven fabrics, polyethylene resin nonwoven fabrics and ester resin nonwoven fabrics.
 上記基材の厚さは、所望とする強度または柔軟性、ならびに使用目的等に応じて、任意の適切な厚みに設定され得る。基材の厚みは、好ましくは1000μm以下であり、より好ましくは1μm~1000μmであり、さらに好ましくは1μm~500μmであり、特に好ましくは3μm~300μmであり、最も好ましくは5μm~250μmである。 The thickness of the base material can be set to any appropriate thickness depending on the desired strength or flexibility, the purpose of use, and the like. The thickness of the substrate is preferably 1000 μm or less, more preferably 1 μm to 1000 μm, still more preferably 1 μm to 500 μm, particularly preferably 3 μm to 300 μm, and most preferably 5 μm to 250 μm.
 上記基材は、表面処理が施されていてもよい。表面処理としては、例えば、コロナ処理、クロム酸処理、オゾン暴露、火炎暴露、高圧電撃暴露、イオン化放射線処理、下塗り剤によるコーティング処理等が挙げられる。このような表面処理を行えば、被覆材領域と基材との密着性を高めることができる。特に有機コーティング材料によるコーティング処理は、密着性を高め、かつ、加熱剥離時に被覆材領域が投錨破壊しにくいことから好ましい。 The surface of the substrate may be subjected to surface treatment. Examples of the surface treatment include corona treatment, chromic acid treatment, ozone exposure, flame exposure, high piezoelectric impact exposure, ionizing radiation treatment, and coating treatment with a primer. By performing such a surface treatment, the adhesion between the covering material region and the substrate can be enhanced. In particular, a coating treatment with an organic coating material is preferable because it improves adhesion and the coating material region is less likely to be thrown and destroyed during heat peeling.
 上記有機コーティング材料としては、例えば、プラスチックハードコート材料II(CMC出版、(2004))に記載される材料が挙げられる。好ましくはウレタン系ポリマー、より好ましくはポリアクリルウレタン、ポリエステルウレタンまたはこれらの前駆体が用いられる。基材への塗工・塗布が簡便であり、かつ、工業的に多種のものが選択でき安価に入手できるからである。該ウレタン系ポリマーは、例えば、イソシアナートモノマーとアルコール性水酸基含有モノマー(例えば、水酸基含有アクリル化合物又は水酸基含有エステル化合物)との反応混合物からなるポリマーである。有機コーティング材料は、任意の添加剤として、ポリアミンなどの鎖延長剤、老化防止剤、酸化安定剤等を含んでいてもよい。有機コーティング層の厚みは特に限定されないが、例えば、0.1μm~10μm程度が適しており、0.1μm~5μm程度が好ましく、0.5μm~5μm程度がより好ましい。 Examples of the organic coating material include materials described in Plastic Hard Coat Material II (CMC Publishing, (2004)). Preferably, a urethane-based polymer, more preferably polyacryl urethane, polyester urethane, or a precursor thereof is used. This is because coating and application to the base material are simple, and various industrial products can be selected and obtained at low cost. The urethane polymer is, for example, a polymer composed of a reaction mixture of an isocyanate monomer and an alcoholic hydroxyl group-containing monomer (for example, a hydroxyl group-containing acrylic compound or a hydroxyl group-containing ester compound). The organic coating material may contain a chain extender such as polyamine, an anti-aging agent, an oxidation stabilizer and the like as optional additives. The thickness of the organic coating layer is not particularly limited, but for example, about 0.1 μm to 10 μm is suitable, preferably about 0.1 μm to 5 μm, and more preferably about 0.5 μm to 5 μm.
E.粘着シートの製造方法
 本発明の粘着シートの製造方法としては、例えば、(1)離型フィルム(剥離紙)上に、上記粘着剤を塗布して粘着剤塗布層を形成した後、該粘着剤塗布層中に上記熱膨張性微小球をプレス等により埋め込んで粘着剤領域を形成し、該粘着剤領域上に被覆材領域を形成(積層)する方法、(2)離型フィルム上に、上記粘着剤と熱膨張性微小球とを含む粘着剤領域形成用組成物を塗布して粘着剤塗布層を形成し、該粘着剤塗布層上に被覆材領域を形成(積層)する方法、(3)離型フィルム上に、上記粘着剤を塗布して粘着剤塗布層を形成した後、該粘着剤塗布層上に被覆材領域を形成(積層)し、次いで、離型フィルムを剥離し、粘着剤塗布層の被覆材領域とは反対側の面(粘着面)側から上記熱膨張性微小球をプレス等により埋め込む方法、(4)離型フィルム上に被覆材領域を形成し、その一方の面に熱膨張性微小球を設置、さらにその設置面上に粘着剤を塗布する方法等が挙げられる。上記(1)~(4)の方法において、粘着剤を塗布して形成された粘着剤塗布層を乾燥することにより、粘着剤領域が形成され得るが、該乾燥は任意の適切なタイミングで行われ得る。該乾燥は、熱膨張性微小球を埋め込む前でもよく、埋め込んだ後でもよい。また、被覆材領域を形成する前でもよく、形成した後でもよい。熱膨張性微小球を埋め込んだ後に乾燥する場合、熱膨張性微小球が膨張または発泡し難い温度で乾燥することが好ましい。上記(1)および(2)に示した操作の後、離型フィルムを剥離してもよく、粘着シートが実用に供されるまでの間、離型フィルムを残して粘着面が保護されていてもよい。
E. Production method of pressure-sensitive adhesive sheet As a method for producing the pressure-sensitive adhesive sheet of the present invention, for example, (1) a pressure-sensitive adhesive coating layer is formed by applying the pressure-sensitive adhesive on a release film (release paper); A method of forming an adhesive region by embedding the thermally expandable microspheres in a coating layer by pressing or the like, and forming (laminating) a coating material region on the adhesive region, (2) on the release film, A method of forming a pressure-sensitive adhesive coating layer by applying a pressure-sensitive adhesive region-forming composition containing a pressure-sensitive adhesive and thermally expandable microspheres, and forming (laminating) a coating material region on the pressure-sensitive adhesive coating layer; ) After applying the above-mentioned pressure-sensitive adhesive on the release film to form a pressure-sensitive adhesive coating layer, a coating material region is formed (laminated) on the pressure-sensitive adhesive coating layer, and then the release film is peeled off to adhere The thermally expandable microspheres are pre-coated from the surface (adhesive surface) side opposite to the coating material region of the agent coating layer (4) A method of forming a coating material region on a release film, installing thermally expandable microspheres on one surface thereof, and further applying an adhesive on the installation surface. . In the above methods (1) to (4), the pressure-sensitive adhesive layer can be formed by drying the pressure-sensitive adhesive coating layer formed by applying the pressure-sensitive adhesive. The drying is performed at any appropriate timing. Can be broken. The drying may be performed before or after embedding the thermally expandable microspheres. Further, it may be before or after the coating material region is formed. When drying after embedding the thermally expandable microspheres, it is preferable to dry at a temperature at which the thermally expandable microspheres are difficult to expand or foam. After the operations shown in (1) and (2) above, the release film may be peeled off, and the adhesive surface is protected leaving the release film until the adhesive sheet is put to practical use. Also good.
 本発明の粘着シートが基材を備える場合、該粘着シートは、上記(1)~(4)の操作の後、被覆材領域の粘着剤領域とは反対側の面(粘着面とは反対側の面)に、任意の適切な接着剤または粘着剤を介して、基材を貼着して得ることができる。また、基材と被覆材領域との積層体と、離型フィルムと粘着剤領域(または粘着剤塗布層)との積層体を別々に作製し、これらの積層体を貼り合わせてもよい。 When the pressure-sensitive adhesive sheet of the present invention comprises a substrate, the pressure-sensitive adhesive sheet is a surface opposite to the pressure-sensitive adhesive region in the covering material region after the operations (1) to (4) (the side opposite to the pressure-sensitive adhesive surface). Can be obtained by adhering the base material to any surface via any appropriate adhesive or pressure-sensitive adhesive. Moreover, the laminated body of a base material and a coating | covering material area | region and the laminated body of a release film and an adhesive area | region (or adhesive coating layer) may be produced separately, and these laminated bodies may be bonded together.
 上記被覆材領域を形成する方法としては、(i)上記B項で説明したポリマー材料または樹脂材料を熱溶融させて押し出し成形によりフィルム状に成形体を得、該成形体を上記粘着剤領域(または粘着剤塗布層)あるいは基材に積層する方法、(ii)上記ポリマー材料または樹脂材料を含む樹脂溶液を、上記粘着剤領域(または粘着剤塗布層)あるいは基材に塗布し、その後乾燥させる方法、(iii)上記ポリマー材料または樹脂材料を形成し得るモノマー、オリゴマーまたはマクロマーを含む被覆材領域形成用組成物を、上記粘着剤領域(または粘着剤塗布層)あるいは基材に塗布し、被覆材領域形成用組成物を重合させる(例えば、加熱、活性エネルギー線照射等による重合)方法等が挙げられる。該(iii)の方法によれば、溶剤、および/または熱エネルギーの使用量を低減することができる。なお、(ii)の方法においては、樹脂溶液を別の離型フィルム上に塗布し、その後乾燥させてフィルム状の成形体を得た後、該成形体を上記粘着剤領域(または粘着剤塗布層)あるいは基材に積層してもよい。また、(iii)の方法においては、被覆材領域形成用組成物を別の離型フィルム上に塗布し、その後乾燥させて被覆材領域前駆体を形成し、該前駆体を記粘着剤領域(または粘着剤塗布層)あるいは基材に積層し、その後、重合させてもよい。 As a method of forming the covering material region, (i) the polymer material or resin material described in the above section B is thermally melted to obtain a molded body in a film shape by extrusion molding, and the molded body is formed into the pressure-sensitive adhesive region ( Or a method of laminating on a pressure-sensitive adhesive coating layer) or a substrate, (ii) applying a resin solution containing the polymer material or resin material to the pressure-sensitive adhesive region (or pressure-sensitive adhesive coating layer) or substrate, and then drying. (Iii) A coating material region forming composition containing a monomer, oligomer, or macromer capable of forming the polymer material or resin material is applied to the pressure-sensitive adhesive region (or pressure-sensitive adhesive coating layer) or substrate and coated. Examples thereof include a method of polymerizing the material region forming composition (for example, polymerization by heating, active energy ray irradiation, or the like). According to the method (iii), the amount of solvent and / or heat energy used can be reduced. In the method (ii), the resin solution is applied onto another release film and then dried to obtain a film-like molded article, and then the molded article is applied to the pressure-sensitive adhesive region (or pressure-sensitive adhesive applied). Layer) or a substrate. In the method (iii), the composition for forming a coating material region is applied onto another release film, and then dried to form a coating material region precursor. Alternatively, it may be laminated on a pressure-sensitive adhesive coating layer) or a substrate and then polymerized.
 例えば、上記(iii)の方法において、エポキシ系ポリマーから構成される被覆材領域を形成する場合、2,2-(4-ヒドロキシフェニル)プロパンジグリシジルエーテル、ビス(4-ヒドロキシフェニル)メタン等のエポキシ化合物と任意の適切な硬化剤とを含む被覆材領域形成用組成物を塗布した後、加熱(例えば、60℃~120℃)する方法が採用され得る。 For example, in the above method (iii), when forming a coating material region composed of an epoxy polymer, 2,2- (4-hydroxyphenyl) propanediglycidyl ether, bis (4-hydroxyphenyl) methane, etc. A method of applying a composition for forming a coating material region containing an epoxy compound and any appropriate curing agent and then heating (for example, 60 ° C. to 120 ° C.) may be employed.
 例えば、上記(iii)の方法において、ウレタン系ポリマーから構成される被覆材領域を形成する場合、リレンジイソシアネート、ヘキサメチレンジイソシアネート等のイソシアネート化合物と、ポリエーテルポリオール、ポリエステルポリオール等のポリオール化合物とを含む被覆材領域形成用組成物を塗布した後、加熱(例えば、60℃~120℃)する方法が採用され得る。 For example, in the method (iii), when forming a coating material region composed of a urethane polymer, an isocyanate compound such as lylene diisocyanate and hexamethylene diisocyanate and a polyol compound such as polyether polyol and polyester polyol are included. A method of heating (for example, 60 ° C. to 120 ° C.) after applying the composition for forming a covering material region may be employed.
 例えば、上記(iii)の方法において、ビニル系ポリマーから構成される被覆材領域を形成する場合、塩化ビニル、スチレン等のビニル化合物と任意の適切な開始剤とを含む被覆材領域形成用組成物が用いられ得る。 For example, in the method of (iii) above, when forming a coating material region composed of a vinyl polymer, a composition for forming a coating material region comprising a vinyl compound such as vinyl chloride or styrene and any appropriate initiator Can be used.
 上記被覆材領域形成用組成物は、必要に応じて、開始剤、触媒、紫外線吸収剤、酸化防止剤等の添加剤を含み得る。また、上記ビーズを含んでいてもよい。 The composition for forming a coating material region may contain additives such as an initiator, a catalyst, an ultraviolet absorber, and an antioxidant as necessary. Moreover, the said bead may be included.
 上記被覆材領域が、活性エネルギー線の照射により硬化し得る樹脂材料から構成される場合、任意の適切なタイミングで活性エネルギー線の照射が行われて、粘着シートが得られ得る。活性エネルギー線の照射は、例えば、被着体(被加工物)を貼着した後に行われる。活性エネルギー線の照射は段階的に行われてもよい。例えば、被着体の貼着前に半硬化させ、貼着後に本硬化させてもよい。活性エネルギー線の種類および照射量は、被覆材領域を構成する樹脂材料の種類に応じて、任意の適切な種類および量に設定され得る。 When the covering material region is composed of a resin material that can be cured by irradiation with active energy rays, the active energy rays can be irradiated at any appropriate timing to obtain an adhesive sheet. The irradiation with the active energy ray is performed, for example, after attaching an adherend (workpiece). The irradiation with the active energy ray may be performed stepwise. For example, it may be semi-cured before adhering the adherend and may be fully cured after adhering. The type and amount of the active energy ray can be set to any appropriate type and amount depending on the type of resin material constituting the covering material region.
 上記の製造方法によれば、粘着剤領域の離型フィルム側(被覆材領域とは反対側)の面が粘着面となる。粘着面は、離型フィルムと接した状態で形成されるので、熱膨張性微小球の突出がなく平坦である。一方、粘着剤領域の粘着面とは反対側の面においては、熱膨張性微小球が突出する。本発明においては、上記被覆材領域により、この突出した熱膨張性微小球が被覆されるため、粘着シートとしては両面が平坦となり、そのため、粘着剤領域の厚みを薄くすることができる。このような本発明の粘着シートは、電子部品等を切断加工する際の仮固定用シートとして、優れた切断精度、および切削屑の低減に寄与し得る。 According to the above manufacturing method, the surface of the pressure-sensitive adhesive region on the release film side (the side opposite to the coating material region) becomes the pressure-sensitive adhesive surface. Since the adhesive surface is formed in contact with the release film, there is no protrusion of the heat-expandable microsphere and it is flat. On the other hand, thermally expandable microspheres protrude on the surface of the adhesive region opposite to the adhesive surface. In the present invention, since the protruding heat-expandable microspheres are covered by the covering material region, both surfaces of the pressure-sensitive adhesive sheet are flattened, and therefore the thickness of the pressure-sensitive adhesive region can be reduced. Such a pressure-sensitive adhesive sheet of the present invention can contribute to excellent cutting accuracy and reduction of cutting waste as a temporary fixing sheet when cutting an electronic component or the like.
F.粘着シートの使用方法(電子部品の製造方法)
 本発明の別の局面によれば、電子部品の製造方法が提供される。本発明の電子部品の製造方法は、上記粘着シート上に大面積で得られた電子部品材料(基板)を貼着し、該電子部品材料を切断加工することを含む。
F. How to use adhesive sheet (manufacturing method of electronic parts)
According to another aspect of the present invention, a method for manufacturing an electronic component is provided. The manufacturing method of the electronic component of this invention includes sticking the electronic component material (board | substrate) obtained by the large area on the said adhesive sheet, and cut | disconnecting this electronic component material.
 上記電子部品としては、例えば、シリコンウエハ等の半導体装置用の部品;積層コンデンサ:透明電極;等が挙げられる。 Examples of the electronic parts include parts for semiconductor devices such as silicon wafers; multilayer capacitors: transparent electrodes;
 上記製造方法においては、まず、加工台上に上記粘着シートを載せ、該粘着シート上に大面積で得られた電子部品材料を貼着する。 In the above manufacturing method, first, the pressure-sensitive adhesive sheet is placed on a processing table, and an electronic component material obtained in a large area is stuck on the pressure-sensitive adhesive sheet.
 その後、任意の適切な方法により上記電子部品材料を切断して、電子部品が得られ得る。上記切断加工の方法としては、例えば、回転刃、平刃等の刃物を用いた方法、レーザー光を用いた方法等が挙げられる。平刃を用いた押切りにより電子部品材料を切断した場合、切削屑の発生が抑制されて、歩留まりが向上する。本発明においては、粘着剤領域を薄くすることができるので、平刃での押切りにより電子部品材料を切断しても、切断後のチップが再付着すること、切断面が斜めになったりS字になったりと不安定になること、切断時にチップ欠けが発生すること等を防止することができる。また、本発明においては、薄い刃を用いて切断した場合においても、上記効果を得ることができ、刃の厚みにより生じる製造ロス(切断後のチップ間に生じるギャップによるロス)を低減することができる。より小型化された電子部品の製造においては、切断面の数が多いため、上記のような製造ロスを低減し得る本発明が特に有用となる。 Thereafter, the electronic component material can be cut by any appropriate method to obtain an electronic component. Examples of the cutting method include a method using a blade such as a rotary blade and a flat blade, a method using a laser beam, and the like. When the electronic component material is cut by pressing with a flat blade, the generation of cutting waste is suppressed and the yield is improved. In the present invention, since the adhesive region can be made thin, even if the electronic component material is cut by pressing with a flat blade, the chip after cutting is reattached, the cut surface becomes slanted, or S It is possible to prevent the character from becoming unstable when it becomes a character, or chipping from occurring during cutting. Further, in the present invention, even when a thin blade is used for cutting, the above-described effects can be obtained, and manufacturing loss caused by the thickness of the blade (loss due to a gap generated between chips after cutting) can be reduced. it can. In the manufacture of a more miniaturized electronic component, since the number of cut surfaces is large, the present invention that can reduce the manufacturing loss as described above is particularly useful.
 上記切断加工においては、加温下で切断を行ってもよい。例えば、上記加工台を30℃~150℃に加温して切断加工を行ってもよい。 In the above cutting process, cutting may be performed under heating. For example, the processing table may be heated to 30 ° C. to 150 ° C. for cutting.
 以下、実施例によって本発明を具体的に説明するが、本発明はこれら実施例によって限定されるものではない。実施例における評価方法は以下のとおりである。また、実施例において、特に明記しない限り、「部」および「%」は重量基準である。 Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to these examples. The evaluation methods in the examples are as follows. In Examples, unless otherwise specified, “parts” and “%” are based on weight.
(1)ラマンマッピングでの粘着剤領域および被覆材領域の厚みの測定
 実施例1~3、5、6および12~15で得た粘着シートをミクロトームにて切片化して測定試料を準備した。該測定試料の断面について、WITec社製alpha300RSAを用いてラマンスペクトルによる分光分析を行い、被覆材領域にのみ添加した成分由来のピーク(例えば、実施例3においては活性エネルギー線反応性オリゴマー(UV1700B)の1640cm-1のピーク)のピーク強度に基づき、被覆材領域および粘着剤領域の厚みを測定した。実施例3を代表例として、該測定におけるラマンマッピングを図3に示す。被覆材領域にのみ添加した成分の存在量が明確に異なる面を界面1として、粘着面11から該界面1までの距離を粘着剤領域の厚み、該界面1から粘着面とは反対側の面21までの距離を被覆材領域の厚みとした。
 なお、ラマンマッピング測定の測定条件は下記のとおりである。
・励起波長   :532nm
・測定波数範囲 :300~3600cm-1
・Grating:600gr/mm
・対物レンズ  :x100
・測定時間   :0.2sec/1スペクトル
・測定範囲   :20x40μm
・測定数    :100x200点
・検出器    :EMCCD
(1) Measurement of thickness of pressure-sensitive adhesive region and coating material region by Raman mapping The pressure-sensitive adhesive sheets obtained in Examples 1 to 3, 5, 6 and 12 to 15 were sectioned with a microtome to prepare measurement samples. The cross section of the measurement sample was subjected to spectroscopic analysis by Raman spectrum using alpha300RSA manufactured by WITec, and a peak derived from a component added only to the coating material region (for example, active energy ray reactive oligomer (UV1700B) in Example 3). The thickness of the coating material region and the pressure-sensitive adhesive region was measured based on the peak intensity of 1640 cm −1 . Using Example 3 as a representative example, Raman mapping in the measurement is shown in FIG. The surface where the abundance of the component added only in the coating material region is clearly different is the interface 1, the distance from the adhesive surface 11 to the interface 1 is the thickness of the adhesive region, and the surface on the opposite side of the adhesive surface from the interface 1 The distance up to 21 was defined as the thickness of the covering material region.
The measurement conditions for Raman mapping measurement are as follows.
Excitation wavelength: 532 nm
Measurement wave number range: 300 to 3600 cm -1
・ Grating: 600 gr / mm
Objective lens: x100
・ Measurement time: 0.2 sec / 1 spectrum ・ Measurement range: 20 × 40 μm
-Number of measurements: 100 x 200 points-Detector: EMCCD
(2)SEMでの粘着剤領域および被覆材領域の厚みの測定
 実施例4、7~11、16、17および比較例1で得た粘着シートを、厚み方向にトリミングカッターで切断し、Pt-Pdスパッタリング処理を施した後、切断面を日立ハイテクノロジーズ社製S3400N低真空走査電子顕微鏡(SEM)を用いて観察して界面1を判別し、粘着面11から該界面1までの距離を粘着剤領域の厚み、該界面1から粘着面とは反対側の面21を被覆材領域の厚みとした。実施例11を代表例として、粘着シートの断面のSEM画像を図4に示す。
 なお、SEM観察の測定条件は下記のとおりである。
・観察像 :ESED像
・加速電圧:10kV
・倍率     :600倍
(2) Measurement of thickness of adhesive region and coating material region with SEM The adhesive sheets obtained in Examples 4, 7 to 11, 16, 17 and Comparative Example 1 were cut in the thickness direction with a trimming cutter, and Pt- After performing the Pd sputtering treatment, the cut surface is observed using an S3400N low-vacuum scanning electron microscope (SEM) manufactured by Hitachi High-Technologies Corporation to determine the interface 1 and the distance from the adhesive surface 11 to the interface 1 is determined as an adhesive. The thickness of the region, the surface 21 opposite to the adhesive surface from the interface 1 was taken as the thickness of the covering material region. FIG. 4 shows an SEM image of a cross section of the pressure-sensitive adhesive sheet with Example 11 as a representative example.
The measurement conditions for SEM observation are as follows.
-Observation image: ESED image-Acceleration voltage: 10 kV
・ Magnification: 600 times
(3)弾性率測定
 実施例ならびに比較例で得た粘着シートを、ミクロトームにて厚み方向に切断し、その切断面についてナノインデンターで弾性率を測定した。
 より詳細には、被覆材領域について、切断面とはほぼ垂直をなす被覆材領域の表面(粘着面とは反対側の面)、および該表面から3μm程度離れた切断面表面を測定対象とした。測定対象に探針(圧子)を押し当てることで得られる変位―荷重ヒステリシス曲線を、測定装置付帯のソフトウェア(triboscan)で数値処理することで弾性率を得た。なお、表1中には、表面から3μm程度離れた切断面表面にて測定した弾性率を示す(3回測定の平均値)。
 ナノインデンター装置ならびに測定条件は下記のとおりである。
装置および測定条件
・装置:ナノインデンター;Hysitron Inc社製 Triboindenter
・測定方法:単一押し込み法
・測定温度:25℃
・押し込み速度:約1000nm/sec
・押し込み深さ:約800nm
・探針:ダイヤモンド製、Berkovich型(三角錐型)
(3) Measurement of elastic modulus The pressure-sensitive adhesive sheets obtained in Examples and Comparative Examples were cut in the thickness direction with a microtome, and the elastic modulus of the cut surface was measured with a nanoindenter.
More specifically, with respect to the covering material region, the surface of the covering material region that is substantially perpendicular to the cut surface (the surface opposite to the adhesive surface) and the cut surface that is about 3 μm away from the surface were measured. . An elastic modulus was obtained by numerically processing a displacement-load hysteresis curve obtained by pressing a probe (indenter) against an object to be measured using software (triboscan) attached to the measuring device. In Table 1, the elastic modulus measured on the surface of the cut surface separated by about 3 μm from the surface is shown (average value of three measurements).
The nanoindenter apparatus and measurement conditions are as follows.
Apparatus and measurement conditions / apparatus: Nanoindenter; Tribodenter manufactured by Hystron Inc.
・ Measurement method: Single indentation method ・ Measurement temperature: 25 ° C
・ Push-in speed: about 1000nm / sec
・ Indentation depth: about 800nm
・ Tip: Diamond, Berkovich type (triangular pyramid type)
(4)粘着力測定
(加熱前(熱膨張性微小球を膨張させる前)の粘着力)
 実施例ならびに比較例で得た粘着シートを幅:20mm、長さ:140mmのサイズに切断し、粘着面上に、被着体としてのポリエチレンテレフタレートフィルム(商品名「ルミラーS-10」東レ株式会社製;厚さ:25μm、幅:30mm)を幅方向に左右5mmずつはみ出した状態で、JIS Z 0237:2009に準じ、2kgのローラーを1往復させて貼り合わせて測定試料を準備した。該測定試料を恒温槽付き引張試験機(商品名「島津オートグラフAG-120kN」島津製作所社製)にセットし、30分間放置した。その後、被着体を、剥離角度:180°、剥離速度(引張速度):300mm/minの条件で、長さ方向に粘着シートから引き剥がした時の荷重を測定し、その際の最大荷重(測定初期のピークトップを除いた荷重の最大値)を求め、この最大荷重をテープ幅で除したものを粘着力(N/20mm幅)とした。なお、上記操作は、温度:23±3℃および湿度:65±5%RHの雰囲気下で行った。
(加熱後(熱膨張性微小球を膨張または発泡させた後)の粘着力)
 上記と同様にして測定試料を準備し、該測定試料を熱風乾燥器に投入した。熱風乾燥器中、熱膨張性微小球の最大膨張温度(後述)下で1分間静置した後、上記と同様にして被着体を剥離し、粘着力を測定した。なお、熱風乾燥器への投入前後の操作は、温度:23±3℃および湿度:65±5%RHの雰囲気下で行った。
(4) Adhesive strength measurement (adhesive strength before heating (before expanding thermally expandable microspheres))
The pressure-sensitive adhesive sheets obtained in Examples and Comparative Examples were cut into a size of 20 mm in width and 140 mm in length, and a polyethylene terephthalate film (trade name “Lumirror S-10” Toray Industries, Inc.) as an adherend on the pressure-sensitive adhesive surface. Manufactured in a thickness of 25 μm and a width of 30 mm) in a state of protruding by 5 mm on the left and right sides in accordance with JIS Z 0237: 2009, a 2 kg roller was reciprocated once to prepare a measurement sample. The measurement sample was set in a tensile tester with a thermostatic bath (trade name “Shimadzu Autograph AG-120kN”, manufactured by Shimadzu Corporation) and left for 30 minutes. Thereafter, the load was measured when the adherend was peeled from the pressure-sensitive adhesive sheet in the length direction under the conditions of peeling angle: 180 °, peeling speed (tensile speed): 300 mm / min, and the maximum load ( The maximum value of the load excluding the peak top at the initial stage of measurement was determined, and the maximum load divided by the tape width was defined as the adhesive strength (N / 20 mm width). The above operation was performed in an atmosphere of temperature: 23 ± 3 ° C. and humidity: 65 ± 5% RH.
(Adhesive strength after heating (after expanding or foaming thermally expandable microspheres))
A measurement sample was prepared in the same manner as described above, and the measurement sample was put into a hot air dryer. After leaving still for 1 minute under the maximum expansion temperature (after-mentioned) of a thermally expansible microsphere in a hot air dryer, the to-be-adhered body was peeled similarly to the above, and the adhesive force was measured. The operation before and after the charging into the hot air dryer was performed in an atmosphere of temperature: 23 ± 3 ° C. and humidity: 65 ± 5% RH.
(5)表面粗さ測定
 実施例ならびに比較例で得た粘着シートについて、熱膨張性微小球を膨張または発泡させた後、粘着面の表面粗さRaを測定した。熱膨張性微小球の膨張または発泡は、熱風乾燥器中、熱膨張性微小球の最大膨張温度(後述)下で1分間静置して行った。なお、表面粗さの測定はオリンパス社製レーザー顕微鏡「OLS4000」で行った。
(5) Surface roughness measurement About the adhesive sheet obtained by the Example and the comparative example, after expanding or foaming a thermally expansible microsphere, surface roughness Ra of the adhesive surface was measured. The expansion or foaming of the heat-expandable microspheres was performed by standing in a hot air dryer for 1 minute at the maximum expansion temperature (described later) of the heat-expandable microspheres. The surface roughness was measured using a laser microscope “OLS4000” manufactured by Olympus.
(6)切断後小片分離性評価
 実施例ならびに比較例で得た粘着シートに40mm×50mm(厚み500μm)の積層セラミックシートを貼り合わせた。UHT社製切断装置「G-CUT8AA」で粘着シート上の積層セラミックシートを1mm×0.5mmの小片となるよう賽の目状に切断した。粘着シート上の積層セラミックシートを、直径30mmの円柱の側面に沿わせて設置した。円柱に設置した状態で所定の温度(熱膨張性微小球の最大膨張温度(後述))で加熱処理を行い、熱膨張性微小球を膨張させることで小片を粘着シートから剥離し、切断個所のチップ間が分離していないチップ個数を数えた。分離していないチップ個数を100%完全に分離した場合のチップ個数で除した数を分離性の指標とした。指標が2%未満を◎、指標が2%以上5%未満○、指標が5%以上15%未満を△、指標が15%以上を×とした。
 積層セラミックシートの組成ならびに切断装置の切断条件の詳細は下記のとおりである。
(積層セラミックシート)
 トルエン溶媒にチタン酸バリウム粉末100部と、ポリビニルブチラール樹脂15部と、フタル酸ビス(2-エチルヘキシル)6部と、ジクリセリンステアレート2部とを加えてボールミル分散機で混合及び分散することにより誘電体のトルエン溶液を得た。この溶液をシリコーン離型剤処理面付きポリエチレンテレフタレートフィルム(三菱ポリエステルフィルム社製、商品名「MRF38」、厚み:38μm)のシリコン離型剤処理面に溶剤揮発後の厚みが50μmになるようアプリケーターを用いて塗布し、乾燥してセラミックシートを得た。得られたセラミックシートを厚みが500μmになるように複数枚積層して、積層セラミックシートを得た。
(切断条件)
・切断温度:60℃、切断深さ(テーブル面からの残し量):約20μm
・切断刃:UHT社製「U-BLADE2」、刃厚:50μm、刃先角度:15°
(6) Evaluation of small piece separability after cutting A laminated ceramic sheet of 40 mm × 50 mm (thickness 500 μm) was bonded to the pressure-sensitive adhesive sheets obtained in Examples and Comparative Examples. The multilayer ceramic sheet on the adhesive sheet was cut into a 1 mm × 0.5 mm piece shape with a cutting device “G-CUT8AA” manufactured by UHT. The laminated ceramic sheet on the pressure-sensitive adhesive sheet was placed along the side of a cylinder having a diameter of 30 mm. A heat treatment is performed at a predetermined temperature (maximum expansion temperature of the thermally expandable microsphere (described later)) in a state where it is installed on the cylinder, and the thermally expandable microsphere is expanded to peel off the small pieces from the adhesive sheet. The number of chips with no separation between the chips was counted. The number obtained by dividing the number of non-separated chips by 100% when completely separated was used as an index of separability. The index is less than 2%, the index is 2% or more and less than 5%, the index is 5% or more and less than 15%, and the index is 15% or more.
Details of the composition of the multilayer ceramic sheet and the cutting conditions of the cutting apparatus are as follows.
(Laminated ceramic sheet)
By adding 100 parts of barium titanate powder, 15 parts of polyvinyl butyral resin, 6 parts of bis (2-ethylhexyl) phthalate, and 2 parts of diglycerin stearate to a toluene solvent, and mixing and dispersing by a ball mill disperser. A dielectric toluene solution was obtained. Apply this solution to the silicone release agent-treated surface of a polyethylene terephthalate film with a silicone release agent-treated surface (manufactured by Mitsubishi Polyester Film Co., Ltd., trade name “MRF38”, thickness: 38 μm) so that the thickness after evaporation of the solvent is 50 μm. It was applied and dried to obtain a ceramic sheet. A plurality of the obtained ceramic sheets were laminated so as to have a thickness of 500 μm to obtain a laminated ceramic sheet.
(Cutting conditions)
Cutting temperature: 60 ° C., cutting depth (remaining amount from the table surface): about 20 μm
Cutting blade: “U-BLADE2” manufactured by UHT, blade thickness: 50 μm, blade edge angle: 15 °
(7)切断面カット性評価
 上記(6)と同様にして、積層セラミックシートを1mm×0.5mmの小片となるよう賽の目状に切断した。切断された小片のうち任意の10個を選び出し、切断面を50倍率の拡大鏡で観察してチッピング(切断加工によって発生する積層セラミックシートの欠け)有無を確認し、小片10個に発生したチッピング総数の平均を指標とした。指標が0~10か所未満を◎、10以上20か所未満を○、20以上40か所未満を△、40か所以上を×とした。
(7) Cut surface cut property evaluation In the same manner as in the above (6), the multilayer ceramic sheet was cut into a square shape so as to be a small piece of 1 mm x 0.5 mm. Select any 10 pieces from among the cut pieces, observe the cut surface with a magnifying glass at 50 magnification, check for chipping (lamination of the laminated ceramic sheet generated by the cutting process), and check the chipping generated in 10 pieces. The average of the total number was used as an index. The index is 0 to less than 10 places, ◎, 10 to less than 20 places, ◯, 20 to less than 40 places, and 40 or more places to x.
 以下にポリマー調製法を記載する。なおここで部とは断りない限り重量部とする。
[製造例1]ポリマー1の調製
 トルエン中に、ブチルアクリレート100部と、アクリル酸5部と、重合開始剤として過酸化ベンゾイル0.2部とを加えた後、加熱して、アクリル系共重合体(ポリマー1)のトルエン溶液を得た。
The polymer preparation method is described below. In addition, unless it refuses with a part here, let it be a weight part.
[Production Example 1] Preparation of polymer 1 In toluene, 100 parts of butyl acrylate, 5 parts of acrylic acid, and 0.2 part of benzoyl peroxide as a polymerization initiator were added and then heated to prepare an acrylic copolymer. A toluene solution of the combined polymer 1 was obtained.
[製造例2]ポリマー2の調製
 トルエン中に、2-エチルヘキシルアクリレート30部と、エチルアクリレート70部と、2-ヒドロキシエチルアクリレート4部と、N-フェニルマレイミド5部と、重合開始剤として過酸化ベンゾイル0.2部とを加えた後、加熱して、アクリル系共重合体(ポリマー2)のトルエン溶液を得た。
[Production Example 2] Preparation of polymer 2 In toluene, 30 parts of 2-ethylhexyl acrylate, 70 parts of ethyl acrylate, 4 parts of 2-hydroxyethyl acrylate, 5 parts of N-phenylmaleimide, and peroxide as a polymerization initiator After adding 0.2 part of benzoyl, the mixture was heated to obtain a toluene solution of an acrylic copolymer (polymer 2).
[製造例3]ポリマー3の調製
 トルエン中に、2-エチルヘキシルアクリレート30部と、エチルアクリレート70部と、2-ヒドロキシエチルアクリレート4部と、メチルメタクリレート5部と、重合開始剤として過酸化ベンゾイル0.2部とを加えた後、加熱して、アクリル系共重合体(ポリマー3)のトルエン溶液を得た。
[Production Example 3] Preparation of polymer 3 In toluene, 30 parts of 2-ethylhexyl acrylate, 70 parts of ethyl acrylate, 4 parts of 2-hydroxyethyl acrylate, 5 parts of methyl methacrylate, and benzoyl peroxide 0 as a polymerization initiator After adding 2 parts, the mixture was heated to obtain a toluene solution of an acrylic copolymer (polymer 3).
[製造例4]ポリマー4の調製
 トルエン中に、ブチルアクリレート50部と、エチルアクリレート50部と、アクリル酸5部と、2-ヒドロキシエチルアクリレート0.1部と、重合開始剤として過酸化ベンゾイル0.2部とを加えた後、加熱して、アクリル系共重合体(ポリマー4)のトルエン溶液を得た。
[Production Example 4] Preparation of polymer 4 In toluene, 50 parts of butyl acrylate, 50 parts of ethyl acrylate, 5 parts of acrylic acid, 0.1 part of 2-hydroxyethyl acrylate, and benzoyl peroxide 0 as a polymerization initiator After adding 2 parts, the mixture was heated to obtain a toluene solution of an acrylic copolymer (polymer 4).
[製造例5]ポリマー5の調製
 酢酸エチル中に、メチルアクリレート70部と、2-エチルヘキシルアクリレート30部と、アクリル酸10部と、重合開始剤として過酸化ベンゾイル0.2部とを加えた後、加熱して、アクリル系共重合体(ポリマー5)の酢酸エチル溶液を得た。
[Production Example 5] Preparation of polymer 5 In ethyl acetate, 70 parts of methyl acrylate, 30 parts of 2-ethylhexyl acrylate, 10 parts of acrylic acid and 0.2 part of benzoyl peroxide as a polymerization initiator were added. To obtain an ethyl acetate solution of an acrylic copolymer (Polymer 5).
[製造例6]ポリマー6の調製
 トルエン中に、ブチルアクリレート50モルと、エチルアクリレート50モルと、2-ヒドロキシエチルアクリレート22モルと、重合開始剤として過酸化ベンゾイル(ブチルアクリレート、エチルアクリレートおよび2-ヒドロキシエチルアクリレートの合計100部に対して0.2部)とを加えた後、加熱して共重合体溶液を得た。この共重合体溶液に、該溶液中の2-ヒドロキシエチルアクリレート由来の水酸基の80モル%に相当する量の2-イソシアナトエチルアクリレートを加えた後、加熱して、該2-ヒドロキシエチルアクリレート由来の水酸基に2-イソシアナトエチルメタクリレートを付加することにより、側鎖にメタクリレート基を有するアクリル系共重合体(ポリマー6)のトルエン溶液を得た。
[Production Example 6] Preparation of polymer 6 In toluene, 50 mol of butyl acrylate, 50 mol of ethyl acrylate, 22 mol of 2-hydroxyethyl acrylate, and benzoyl peroxide (butyl acrylate, ethyl acrylate and 2-hydroxyethyl acrylate) as a polymerization initiator. After adding 0.2 part) to a total of 100 parts of hydroxyethyl acrylate, the mixture was heated to obtain a copolymer solution. To this copolymer solution was added 2-isocyanatoethyl acrylate in an amount corresponding to 80 mol% of the hydroxyl groups derived from 2-hydroxyethyl acrylate in the solution, and then heated to derive the 2-hydroxyethyl acrylate By adding 2-isocyanatoethyl methacrylate to the hydroxyl group, a toluene solution of an acrylic copolymer (polymer 6) having a methacrylate group in the side chain was obtained.
[製造例7]ポリマー7の調製
 トルエン中に、ブチルアクリレート80モルと、アクリロイルモルホリン30モルと、2-ヒドロキシエチルアクリレート20モルと、重合開始剤として過酸化ベンゾイル(ブチルアクリレート、アクリロイルモルホリンおよび2-ヒドロキシエチルアクリレートの合計100部に対して0.2部)とを加えた後、加熱して、共重合体溶液を得た。この共重合体溶液に、該溶液中の2-ヒドロキシエチルアクリレート由来の水酸基の50モル%に相当する量の2-イソシアナトエチルアクリレートを加えた後、加熱して、該2-ヒドロキシエチルアクリレート由来の水酸基に2-イソシアナトエチルメタクリレートを付加することにより、側鎖にメタクリレート基を有するアクリル系共重合体(ポリマー7)のトルエン溶液を得た。
[Production Example 7] Preparation of polymer 7 In toluene, 80 moles of butyl acrylate, 30 moles of acryloyl morpholine, 20 moles of 2-hydroxyethyl acrylate, and benzoyl peroxide (butyl acrylate, acryloyl morpholine and 2-mol. After adding 0.2 part) to a total of 100 parts of hydroxyethyl acrylate, the mixture was heated to obtain a copolymer solution. To this copolymer solution, 2-isocyanatoethyl acrylate in an amount corresponding to 50 mol% of the hydroxyl groups derived from 2-hydroxyethyl acrylate in the solution was added, and then heated to derive from the 2-hydroxyethyl acrylate By adding 2-isocyanatoethyl methacrylate to the hydroxyl group, a toluene solution of an acrylic copolymer (polymer 7) having a methacrylate group in the side chain was obtained.
[実施例1]
(粘着剤領域前駆層の形成)
 製造例2で調製したポリマー2のトルエン溶液(ポリマー2:100部)と、イソシアネート系架橋剤(日本ポリウレタン社製、商品名「コロネートL」)1部と、粘着付与剤としてテルペンフェノール系樹脂(住友ベークライト社製、商品名「スミライトレジンPR12603」)5部と、熱膨張性微小球(松本油脂製薬社製、商品名「マツモトマイクロスフェアー F-50D」、発泡(膨張)開始温度:95℃~105℃、最大膨張温度:125℃~135℃、平均粒径10μm~18μm)40部とを混合して混合液を調製した。該混合液に、該混合液中の溶剤と同じ溶剤(トルエン)をさらに加えて塗布しやすい粘度にまで粘度調整を行った。この混合液を、シリコーン離型剤処理面付きポリエチレンテレフタレートフィルム(三菱化学ポリエステルフィルム社製、商品名「MRF38」、厚み:38μm)に、溶剤揮発(乾燥)後の厚みが10μmとなるようにアプリケーターを用いて塗布し、その後、乾燥して、該ポリエチレンテレフタレートフィルム上に粘着剤領域前駆層を形成した。
(被覆材領域前駆層の形成)
 製造例1で調製した上記ポリマー1のトルエン溶液(ポリマー1:100部)と、活性エネルギー線反応性オリゴマーとしてジペンタエリスリトールペンタとヘキサアクリレートとの混合物(東亜合成社製、商品名「アロニックスM404」)20部と、イソシアネート系架橋剤(日本ポリウレタン社製、商品名「コロネートL」)2部と、エネルギー線重合開始剤(BASFジャパン社製、商品名「イルガキュア651」)3部とを混合して混合液を調製した。該混合液に、該混合液中の溶剤と同じ溶剤(トルエン)をさらに加えて塗布しやすい粘度にまで粘度調整を行った。シリコーン離型剤処理面付きポリエチレンテレフタレートフィルム(三菱化学ポリエステルフィルム社製、商品名「MRF38」、厚み:38μm)に、溶剤揮発(乾燥)後の厚みが25μmとなるようにアプリケーターを用いて塗布し、その後、乾燥して、該ポリエチレンテレフタレートフィルム上に被覆材領域前駆層を形成した。
(粘着シート1の形成)
 上記粘着剤領域前駆層と、被覆材領域前駆層とを貼り合わせた。次いで、紫外線照射機「UM810(高圧水銀灯光源)」(日東精機社製)を用いて、被覆剤領域の前駆層側から積算光量300mJ/cm2の紫外線照射を行った。その後、シリコーン離型剤処理面付きポリエチレンテレフタレートフィルムを剥離して、粘着シート1(粘着剤領域の厚み:10μm、被覆材領域の厚み:25μm)を得た。
[Example 1]
(Formation of adhesive region precursor layer)
Toluene solution of polymer 2 prepared in Production Example 2 (polymer 2: 100 parts), 1 part of an isocyanate-based crosslinking agent (trade name “Coronate L”, manufactured by Nippon Polyurethane Co., Ltd.), and a terpene phenol resin ( Sumitomo Bakelite Co., Ltd., trade name “Sumilite Resin PR12603” 5 parts, thermally expandable microspheres (Matsumoto Yushi Seiyaku Co., Ltd., trade name “Matsumoto Microsphere F-50D”, foaming (expansion) start temperature: 95 (40 ° C. to 105 ° C., maximum expansion temperature: 125 ° C. to 135 ° C., average particle size: 10 μm to 18 μm) were mixed to prepare a mixed solution. The same solvent (toluene) as the solvent in the mixed solution was further added to the mixed solution to adjust the viscosity to a viscosity that was easy to apply. This mixed solution is applied to a polyethylene terephthalate film with a silicone release agent-treated surface (trade name “MRF38”, manufactured by Mitsubishi Chemical Polyester Film Co., Ltd., thickness: 38 μm) so that the thickness after solvent evaporation (drying) is 10 μm. And then dried to form an adhesive region precursor layer on the polyethylene terephthalate film.
(Formation of coating material region precursor layer)
A toluene solution of polymer 1 prepared in Production Example 1 (polymer 1: 100 parts) and a mixture of dipentaerythritol pentaacrylate and hexaacrylate as an active energy ray-reactive oligomer (trade name “Aronix M404” manufactured by Toagosei Co., Ltd.) ) 20 parts, 2 parts of an isocyanate-based crosslinking agent (trade name “Coronate L” manufactured by Nippon Polyurethane Co., Ltd.) and 3 parts of energy ray polymerization initiator (trade name “Irgacure 651” manufactured by BASF Japan Ltd.) To prepare a mixed solution. The same solvent (toluene) as the solvent in the mixed solution was further added to the mixed solution to adjust the viscosity to a viscosity that was easy to apply. Apply to a polyethylene terephthalate film with a silicone release agent-treated surface (Mitsubishi Chemical Polyester Film, trade name “MRF38”, thickness: 38 μm) using an applicator so that the thickness after solvent evaporation (drying) is 25 μm. Then, it was dried to form a coating material region precursor layer on the polyethylene terephthalate film.
(Formation of adhesive sheet 1)
The pressure-sensitive adhesive region precursor layer and the coating material region precursor layer were bonded together. Next, using an ultraviolet irradiator “UM810 (high pressure mercury lamp light source)” (manufactured by Nitto Seiki Co., Ltd.), ultraviolet irradiation with an integrated light amount of 300 mJ / cm 2 was performed from the precursor layer side of the coating material region. Then, the polyethylene terephthalate film with a silicone release agent-treated surface was peeled off to obtain a pressure-sensitive adhesive sheet 1 (pressure-sensitive adhesive region thickness: 10 μm, covering material region thickness: 25 μm).
[実施例2~15、比較例1]
 粘着剤領域前駆層を形成する際のポリマー、架橋剤、粘着付与剤および熱膨張性微小球の種類および配合量を表1に示すように設定し、被覆材領域前駆層を形成する際のポリマー、活性エネルギー線反応性オリゴマー、架橋剤およびエネルギー線重合開始剤の種類および配合量を表1に示すように設定した以外は、実施例1と同様にして粘着シートを得た。
 なお、実施例2~5、8、10、13~15および比較例1においては、被覆材領域前駆層を形成する際に、シリコーン離型剤処理面付きポリエチレンテレフタレートフィルムに代えてPETフィルム(厚み:100μm)上に混合液を塗布し、該PETフィルムは剥離せずにPETフィルム(基材)を有する粘着シートを得た。また、実施例4および比較例1においては、紫外線照射を行わずに粘着シート得た。
 表1中に記載の架橋剤、粘着付与剤、熱膨張性微小球、活性エネルギー線反応性オリゴマー、エネルギー線重合開始剤の詳細は以下のとおりである。
<架橋剤>
 テトラッドC:三菱ガス化学社製、商品名「テトラッドC」、エポキシ系架橋剤
<粘着付与剤>
 PR51732:住友ベークライト社製、商品名「スミライトレジンPR51732」
 S145:ヤスハラケミカル社製、商品名「YSポリスターS145」
 U130:ヤスハラケミカル社製、商品名「YSポリスターU130」
 T160:ヤスハラケミカル社製、商品名「YSポリスターT160」
<熱膨張性微小球>
 F-30D:松本油脂製薬社製、商品名「マツモトマイクロスフェアー F-30D」、発泡(膨張)開始温度:70℃~80℃、最大膨張温度:110℃~120℃、平均粒径10μm~18μm
 F-65D:松本油脂製薬社製、商品名「マツモトマイクロスフェアー F-65D」、発泡(膨張)開始温度:105℃~115℃、最大膨張温度:145℃~155℃、平均粒径12μm~18μm
 FN-180SSD:松本油脂製薬社製、商品名「マツモトマイクロスフェアー FN-180SSD」、発泡(膨張)開始温度:135℃~150℃、最大膨張温度:165℃~180℃、平均粒径15μm~25μm
 F-260D:松本油脂製薬社製、商品名「マツモトマイクロスフェアー F-260D」、発泡(膨張)開始温度:190℃~200℃、最大膨張温度:250℃~260℃、平均粒径20μm~35μm
<活性エネルギー線反応性オリゴマー>
 UV1700B:日本合成化学社製、商品名「紫光UV-1700B」、紫外線硬化型ウレタンアクリレート
 UV7620EA:日本合成化学社製、商品名「紫光UV-7620EA」、紫外線硬化型ウレタンアクリレート
 UV3000B:日本合成化学社製、商品名「紫光UV-3000B」、紫外線硬化型ウレタンアクリレート
 M321:東亜合成社製、商品名「アロニックスM321」、トリメチロールプロパンPO変性トリアクリレート(プロピレンオキサイド(PO)の平均付加モル数:2モル)
 UV7630B:日本合成化学社製、商品名「紫光UV-7630B」、紫外線硬化型ウレタンアクリレート
<エネルギー線重合開始剤>
 I184:BASF社製、商品名「イルガキュア184」
 I2959:BASF社製、商品名「イルガキュア2959」
 I651:BASF社製、商品名「イルガキュア651」
[Examples 2 to 15, Comparative Example 1]
The type of polymer, cross-linking agent, tackifier, and thermally expandable microsphere when forming the pressure-sensitive adhesive region precursor layer and the amount of the compound are set as shown in Table 1, and the polymer when forming the coating material region precursor layer A pressure-sensitive adhesive sheet was obtained in the same manner as in Example 1 except that the types and blending amounts of the active energy ray-reactive oligomer, the crosslinking agent and the energy ray polymerization initiator were set as shown in Table 1.
In Examples 2 to 5, 8, 10, 13 to 15 and Comparative Example 1, a PET film (thickness) was used instead of the polyethylene terephthalate film with a silicone release agent-treated surface when forming the coating material region precursor layer. : 100 μm), the mixed solution was applied to obtain an adhesive sheet having a PET film (base material) without peeling off the PET film. Moreover, in Example 4 and Comparative Example 1, the adhesive sheet was obtained without performing ultraviolet irradiation.
The details of the crosslinking agent, tackifier, thermally expandable microsphere, active energy ray reactive oligomer, and energy ray polymerization initiator described in Table 1 are as follows.
<Crosslinking agent>
Tetrad C: Mitsubishi Gas Chemical Company, trade name “Tetrad C”, epoxy cross-linking agent <tackifier>
PR51732: Product name “Sumilite Resin PR51732” manufactured by Sumitomo Bakelite Co., Ltd.
S145: Product name “YS Polystar S145” manufactured by Yasuhara Chemical Co., Ltd.
U130: Product name “YS Polystar U130” manufactured by Yasuhara Chemical Co., Ltd.
T160: Yasuhara Chemical Co., Ltd., trade name “YS Polystar T160”
<Thermal expandable microsphere>
F-30D: Matsumoto Yushi Seiyaku Co., Ltd., trade name “Matsumoto Microsphere F-30D”, foaming (expansion) start temperature: 70 ° C. to 80 ° C., maximum expansion temperature: 110 ° C. to 120 ° C., average particle size 10 μm to 18 μm
F-65D: manufactured by Matsumoto Yushi Seiyaku Co., Ltd., trade name “Matsumoto Microsphere F-65D”, foaming (expansion) start temperature: 105 ° C. to 115 ° C., maximum expansion temperature: 145 ° C. to 155 ° C., average particle size 12 μm to 18 μm
FN-180SSD: manufactured by Matsumoto Yushi Seiyaku Co., Ltd., trade name “Matsumoto Microsphere FN-180SSD”, foaming (expansion) start temperature: 135 ° C. to 150 ° C., maximum expansion temperature: 165 ° C. to 180 ° C., average particle size 15 μm to 25 μm
F-260D: Matsumoto Yushi Seiyaku Co., Ltd., trade name “Matsumoto Microsphere F-260D”, foaming (expansion) start temperature: 190 ° C. to 200 ° C., maximum expansion temperature: 250 ° C. to 260 ° C., average particle size 20 μm to 35 μm
<Active energy ray reactive oligomer>
UV1700B: manufactured by Nippon Synthetic Chemical Co., Ltd., trade name “purple light UV-1700B”, UV curable urethane acrylate UV7620EA: manufactured by Nippon Synthetic Chemical Co., Ltd., trade name “purple UV-7620EA”, UV curable urethane acrylate UV3000B: Nippon Synthetic Chemical Co., Ltd. Product name “purple light UV-3000B”, UV curable urethane acrylate M321: manufactured by Toagosei Co., Ltd., product name “Aronix M321”, trimethylolpropane PO-modified triacrylate (average added moles of propylene oxide (PO): 2) Mole)
UV7630B: manufactured by Nippon Synthetic Chemical Co., Ltd., trade name “purple light UV-7630B”, UV curable urethane acrylate <energy ray polymerization initiator>
I184: BASF Corporation, trade name “Irgacure 184”
I2959: BASF, trade name “Irgacure 2959”
I6511: BASF, trade name “Irgacure 651”
[実施例16]
 製造例1で調製したポリマー1のトルエン溶液(ポリマー1:100部)と、エポキシ系架橋剤(:三菱ガス化学社製、商品名「テトラッドC」)0.8部と、粘着付与剤としてテルペンフェノール系樹脂(ヤスハラケミカル社製、商品名「YSポリスターS145」)30部と、熱膨張性微小球(松本油脂製薬社製、商品名「マツモトマイクロスフェアー F-50D」、発泡(膨張)開始温度:95℃~105℃、最大膨張温度:125℃~135℃、平均粒径10μm~18μm)30部とを混合して混合液を調製した。該混合液に、該混合液中の溶剤と同じ溶剤(トルエン)をさらに加えて塗布しやすい粘度にまで粘度調整を行った。この混合液を、シリコーン離型剤処理面付きポリエチレンテレフタレートフィルム(三菱化学ポリエステルフィルム社製、商品名「MRF38」、厚み:38μm)に、溶剤揮発(乾燥)後の厚みが30μmとなるようにアプリケーターを用いて塗布し、その後、乾燥して、該ポリエチレンテレフタレートフィルム上に粘着剤領域前駆層を形成した。
 被覆材領域としてのポリエチレンテレフタレートフィルム(東レ社製、商品名「ルミラータイプX42」、厚み:50μm)のマット処理面に前記粘着剤領域前駆層の粘着面をハンドローラーで貼り合わせた。オートクレーブ処理(40℃、5Kgf/cm2、10分)して粘着シート(粘着剤領域(厚み:30μm)/被覆材領域(ポリエチレンテレフタレート、厚み:50μm))を得た。
[Example 16]
Toluene solution of polymer 1 prepared in Production Example 1 (polymer 1: 100 parts), epoxy-based cross-linking agent (manufactured by Mitsubishi Gas Chemical Company, trade name “Tetrad C”) 0.8 parts, and terpene as a tackifier 30 parts of phenolic resin (trade name “YS Polystar S145” manufactured by Yashara Chemical Co., Ltd.) and thermally expandable microspheres (trade name “Matsumoto Microsphere F-50D” manufactured by Matsumoto Yushi Seiyaku Co., Ltd.), foaming (expansion) start temperature : 95 ° C. to 105 ° C., maximum expansion temperature: 125 ° C. to 135 ° C., average particle size of 10 μm to 18 μm) was mixed with 30 parts to prepare a mixed solution. The same solvent (toluene) as the solvent in the mixed solution was further added to the mixed solution to adjust the viscosity to a viscosity that was easy to apply. This mixed solution is applied to a polyethylene terephthalate film with a silicone release agent-treated surface (trade name “MRF38”, thickness: 38 μm, manufactured by Mitsubishi Chemical Polyester Film Co., Ltd.) so that the thickness after solvent evaporation (drying) is 30 μm. And then dried to form an adhesive region precursor layer on the polyethylene terephthalate film.
The pressure-sensitive adhesive surface of the pressure-sensitive adhesive region precursor layer was bonded to a mat-treated surface of a polyethylene terephthalate film (trade name “Lumirror type X42”, manufactured by Toray Industries, Inc., thickness: 50 μm) as a coating material region with a hand roller. An autoclaving treatment (40 ° C., 5 kgf / cm 2, 10 minutes) gave an adhesive sheet (adhesive region (thickness: 30 μm) / covering material region (polyethylene terephthalate, thickness: 50 μm)).
[実施例17]
 製造例4で調製したポリマー4のトルエン溶液(ポリマー4:100部)と、エポキシ系架橋剤(:三菱ガス化学社製、商品名「テトラッドC」)0.8部と、粘着付与剤としてテルペンフェノール系樹脂(ヤスハラケミカル社製、商品名「YSポリスターS145」)5部と、熱膨張性微小球(松本油脂製薬社製、商品名「マツモトマイクロスフェアー F-50D」、発泡(膨張)開始温度:95℃~105℃、最大膨張温度:125℃~135℃、平均粒径10μm~18μm)30部とを混合して混合液を調製した。該混合液に、該混合液中の溶剤と同じ溶剤(トルエン)をさらに加えて塗布しやすい粘度にまで粘度調整を行った。この混合液を、シリコーン離型剤処理面付きポリエチレンテレフタレートフィルム(三菱化学ポリエステルフィルム社製、商品名「MRF38」、厚み:38μm)に、溶剤揮発(乾燥)後の厚みが40μmとなるようにアプリケーターを用いて塗布し、その後、乾燥して、該ポリエチレンテレフタレートフィルム上に粘着剤領域前駆層を形成した。
 被覆材領域としてのポリエチレンテレフタレートフィルム(三菱樹脂社製ディアフィクス(PG-CHI(FG、厚み200μm))の一方の面にワイヤーバー(10番手)で酢酸エチルとジメチルフォルアミドとの混合溶媒(酢酸エチル:ジメチルフォルアミド=1:10(体積%))を塗布して、その塗布面に前記粘着剤領域前駆層の粘着面をハンドローラーで貼り合わせた。80℃、3分間熱風乾燥機で乾燥して粘着シート(粘着剤領域(厚み:40μm)/被覆材領域(ポリエチレンテレフタレート、厚み:200μm))を得た。
[Example 17]
Toluene solution of polymer 4 prepared in Production Example 4 (polymer 4: 100 parts), epoxy cross-linking agent (trade name “Tetrad C” manufactured by Mitsubishi Gas Chemical Co., Ltd.) 0.8 parts, and terpene as a tackifier 5 parts of phenolic resin (trade name “YS Polystar S145” manufactured by Yashara Chemical Co., Ltd.) and thermally expandable microspheres (trade name “Matsumoto Microsphere F-50D” manufactured by Matsumoto Yushi Seiyaku Co., Ltd.), foaming (expansion) start temperature : 95 ° C. to 105 ° C., maximum expansion temperature: 125 ° C. to 135 ° C., average particle diameter of 10 μm to 18 μm) was mixed with 30 parts to prepare a mixed solution. The same solvent (toluene) as the solvent in the mixed solution was further added to the mixed solution to adjust the viscosity to a viscosity that was easy to apply. This mixed solution is applied to a polyethylene terephthalate film with a silicone release agent-treated surface (trade name “MRF38”, thickness: 38 μm, manufactured by Mitsubishi Chemical Polyester Film Co., Ltd.) so that the thickness after solvent evaporation (drying) is 40 μm. And then dried to form an adhesive region precursor layer on the polyethylene terephthalate film.
A mixed solvent of ethyl acetate and dimethylformamide (acetic acid) with a wire bar (10th) on one side of a polyethylene terephthalate film (Mitsubishi Resin Diafix (PG-CHI (FG, thickness 200 μm)) as a coating material region. Ethyl: dimethylformamide = 1: 10 (volume%) was applied, and the adhesive surface of the adhesive region precursor layer was bonded to the coated surface with a hand roller, and dried with a hot air dryer at 80 ° C. for 3 minutes. Thus, an adhesive sheet (adhesive region (thickness: 40 μm) / covering region (polyethylene terephthalate, thickness: 200 μm)) was obtained.
Figure JPOXMLDOC01-appb-T000001
 
Figure JPOXMLDOC01-appb-T000001
 
 表1から明らかなように、本発明の粘着シートは、加熱により粘着力を低下させることができ、かつ、被着体を切断加工する際に、優れた切断精度を実現し得る。 As is apparent from Table 1, the pressure-sensitive adhesive sheet of the present invention can reduce the adhesive strength by heating, and can achieve excellent cutting accuracy when the adherend is cut.
 本発明の製造方法および粘着シートは、半導体チップ等のチップ状電子部品の製造に好適に用いられ得る。 The production method and pressure-sensitive adhesive sheet of the present invention can be suitably used for the production of chip-shaped electronic components such as semiconductor chips.
 10       粘着剤領域
 11       粘着面
 12       粘着剤
 13       熱膨張性微小球
 20       被覆材領域
 30       基材
 100、200  粘着シート
 
DESCRIPTION OF SYMBOLS 10 Adhesive area | region 11 Adhesive surface 12 Adhesive 13 Thermally expansible microsphere 20 Coating | covering material area | region 30 Base material 100,200 Adhesive sheet

Claims (8)

  1.  加熱によって粘着力が低下する粘着面を、片面にのみ有し、
     該粘着面とは反対側の面の25℃におけるナノインデンテーション法による弾性率が、1MPa以上である、
     粘着シート。
    It has an adhesive surface whose adhesive strength is reduced by heating, only on one side,
    The elastic modulus of the surface opposite to the adhesive surface by a nanoindentation method at 25 ° C. is 1 MPa or more.
    Adhesive sheet.
  2.  断面視において、表面として前記粘着面を含む粘着剤領域と、該粘着剤領域の該粘着面とは反対側に隣接する被覆材領域とを有し、
     該粘着剤領域が、粘着剤と熱膨張性微小球とを含む、
     請求項1に記載の粘着シート。
    In a cross-sectional view, it has a pressure-sensitive adhesive region including the pressure-sensitive adhesive surface as a surface, and a covering material region adjacent to the pressure-sensitive adhesive region opposite to the pressure-sensitive adhesive surface,
    The adhesive region comprises an adhesive and thermally expandable microspheres;
    The pressure-sensitive adhesive sheet according to claim 1.
  3.  前記粘着剤領域の厚みが、50μm以下である、請求項1または2に記載の粘着シート。 The pressure-sensitive adhesive sheet according to claim 1 or 2, wherein the pressure-sensitive adhesive region has a thickness of 50 µm or less.
  4.  前記粘着面側をポリエチレンテレフタレートフィルムに貼着した際の粘着力が、0.2N/20mm以上である、請求項1から3のいずれかに記載の粘着シート。 The pressure-sensitive adhesive sheet according to any one of claims 1 to 3, wherein the pressure-sensitive adhesive strength when the pressure-sensitive adhesive side is bonded to a polyethylene terephthalate film is 0.2 N / 20 mm or more.
  5.  加熱前の粘着力(a1)と加熱した後の粘着力(a2)との比(a2/a1)が、0.0001~0.5である、請求項1から4のいずれかに記載の粘着シート。 The pressure-sensitive adhesive according to any one of claims 1 to 4, wherein a ratio (a2 / a1) between the pressure-sensitive adhesive force (a1) before heating and the pressure-sensitive adhesive force (a2) after heating is 0.0001 to 0.5. Sheet.
  6.  加熱した後の前記粘着面の表面粗さRaが3μm以上である、請求項1から5のいずれかに記載の粘着シート。 The pressure-sensitive adhesive sheet according to any one of claims 1 to 5, wherein the surface roughness Ra of the pressure-sensitive adhesive surface after heating is 3 µm or more.
  7.  前記粘着面とは反対側に、基材をさらに備える、請求項1から6のいずれかに記載の粘着シート。 The pressure-sensitive adhesive sheet according to any one of claims 1 to 6, further comprising a base material on a side opposite to the pressure-sensitive adhesive surface.
  8.  請求項1から7のいずれかに記載の粘着シート上に、電子部品材料を貼着した後、
     該電子部品材料を切断加工することを含む、
     電子部品の製造方法。
    After sticking an electronic component material on the pressure-sensitive adhesive sheet according to claim 1,
    Cutting the electronic component material,
    Manufacturing method of electronic components.
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JP2020012044A (en) * 2018-07-17 2020-01-23 王子ホールディングス株式会社 Adhesive sheet, adhesive sheet with release sheet, adhesive sheet with transparent film, laminate and production method of laminate
JP2020167258A (en) * 2019-03-29 2020-10-08 日東電工株式会社 Back grind tape
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JP2017132995A (en) * 2016-01-22 2017-08-03 東レ株式会社 Laminate
JP2018009050A (en) * 2016-07-11 2018-01-18 日東電工株式会社 Pressure sensitive adhesive sheet
JP2020007407A (en) * 2018-07-04 2020-01-16 王子ホールディングス株式会社 Adhesive sheet, adhesive sheet with release sheet, adhesive sheet with transparent film, laminate and method for manufacturing laminate
JP2020012044A (en) * 2018-07-17 2020-01-23 王子ホールディングス株式会社 Adhesive sheet, adhesive sheet with release sheet, adhesive sheet with transparent film, laminate and production method of laminate
JP2020167258A (en) * 2019-03-29 2020-10-08 日東電工株式会社 Back grind tape
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JPWO2014142193A1 (en) 2017-02-16
CN113652174A (en) 2021-11-16
TW201443192A (en) 2014-11-16

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