WO2014084188A1 - Fluorine-containing polymerizable monomer and polymer compound using same - Google Patents

Fluorine-containing polymerizable monomer and polymer compound using same Download PDF

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WO2014084188A1
WO2014084188A1 PCT/JP2013/081701 JP2013081701W WO2014084188A1 WO 2014084188 A1 WO2014084188 A1 WO 2014084188A1 JP 2013081701 W JP2013081701 W JP 2013081701W WO 2014084188 A1 WO2014084188 A1 WO 2014084188A1
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group
atom
fluorine
atoms
hydrogen
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山中 一広
健資 須田
大樹 魚山
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セントラル硝子株式会社
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    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C215/00Compounds containing amino and hydroxy groups bound to the same carbon skeleton
    • C07C215/68Compounds containing amino and hydroxy groups bound to the same carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings and hydroxy groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton
    • C07C215/70Compounds containing amino and hydroxy groups bound to the same carbon skeleton having amino groups bound to carbon atoms of six-membered aromatic rings and hydroxy groups bound to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings of the same carbon skeleton with rings other than six-membered aromatic rings being part of the carbon skeleton
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/02Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids
    • C08G69/26Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids
    • C08G69/32Polyamides derived from amino-carboxylic acids or from polyamines and polycarboxylic acids derived from polyamines and polycarboxylic acids from aromatic diamines and aromatic dicarboxylic acids with both amino and carboxylic groups aromatically bound
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    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/42Polyamides containing atoms other than carbon, hydrogen, oxygen, and nitrogen
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    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
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    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1039Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046Polyimides containing oxygen in the form of ether bonds in the main chain
    • C08G73/1053Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the tetracarboxylic moiety
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    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1057Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
    • C08G73/1064Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C08G73/1071Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
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    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/22Polybenzoxazoles
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D177/00Coating compositions based on polyamides obtained by reactions forming a carboxylic amide link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D177/10Polyamides derived from aromatically bound amino and carboxyl groups of amino carboxylic acids or of polyamines and polycarboxylic acids
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
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    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D179/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
    • C09D179/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C09D179/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00Systems containing at least three condensed rings
    • C07C2603/02Ortho- or ortho- and peri-condensed systems
    • C07C2603/04Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18Fluorenes; Hydrogenated fluorenes

Definitions

  • the present invention relates to a novel fluorine-containing polymer compound useful as a material for a protective film for an electronic circuit substrate, a protective film for a semiconductor, or a gas separation film. Furthermore, the present invention relates to a fluorine-containing polymerizable monomer for producing the fluorine-containing polymer compound.
  • the aromatic diamine compound is useful as a raw material for heat resistant polymers represented by polyamide, polyimide, polybenzoxazole and the like.
  • These polymer materials are used in fields such as automobiles, aerospace, and fire protection clothing because of their high heat resistance.
  • these polymer materials often have poor solubility in organic solvents and poor moldability. Therefore, in the case of polyimide or polybenzoxazole, after forming into a desired shape using an organic solvent-soluble precursor polymer (polyamide acid, polyamide phenol), dehydration cyclization is performed at a high temperature of 300 ° C. to 350 ° C. The final molded body is modified by polyimide or polybenzoxazole.
  • the molding process as described above is a molding process for use in display members using organic dyes that have relatively low heat resistance and laminated members for semiconductors having different thermal expansion coefficients that are likely to generate residual thermal stress. Unsuitable because the temperature is too high. Therefore, organic solvent-soluble polyimides and polybenzoxazoles that can be molded at a temperature at which the organic solvent is evaporated are attracting attention.
  • a bent structure such as an ether bond or a methylene bond is introduced into the main chain skeleton, and a bulky structure such as a tert-butyl group or a trifluoromethyl group is used as a side chain. It is known to introduce and destroy the symmetry of the main chain skeleton. Among them, a technique using a fluorene structure is known as a technique for improving the solubility in organic solvents without sacrificing heat resistance.
  • Patent Documents 1 and 2 Polymers having a fluorene structure are not only solubilized in organic solvents, but also have the effect of lowering the dielectric constant and increasing gas permeability due to their unique structure.
  • Patent Documents 1 and 2 There are examples of reports as protective films for semiconductors and gas separation films.
  • a polymer having a fluorene structure has drawbacks that it is highly hydrophobic and has poor applicability to a hydrophilic substrate and poor mechanical strength due to low intermolecular interaction.
  • a hydrophilic group such as phenolic hydroxyl group or carboxyl group
  • a synthesis process for introducing a hydrophilic group such as phenolic hydroxyl group or carboxyl group Is multistage and the operation is complicated Patent Documents 3, 4, and 8).
  • Patent Document 3 discloses a method for producing a phenolic hydroxyl group-containing fluorenediamine.
  • this production method after introducing a phenolic hydroxyl group into the fluorene skeleton, nitration followed by a hydrogen reduction step yields the objective phenolic hydroxyl group-containing fluorenediamine.
  • each process has a target with a relatively high yield (85 to 90%), but there is a problem of waste due to the use of a large amount of nitric acid, use of an expensive palladium catalyst, high pressure Hydrogen is necessary and it is difficult to say that it is an industrially easy method.
  • Patent Document 4 discloses a method for producing a carboxyl group-containing fluorenediamine.
  • diphenic acid is heated in sulfuric acid to form fluorenone carboxylic acid, and subsequently a target carboxy group-containing fluorenediamine is obtained by a reaction at a high temperature that requires a dehydration step with anilines.
  • This reaction also requires a problem of waste due to the use of a large amount of sulfuric acid, and an additional facility for co-dehydration in the presence of toluene in the dehydration process, which is also not an industrially easy method.
  • Patent Document 8 discloses a method for producing a phenolic hydroxyl group-containing fluorenediamine in which the substitution positions of a phenolic hydroxyl group and an amino group are reversed as compared with Patent Document 3.
  • this production method general-purpose 2-benzoxazoline is used.
  • separation and purification operations from by-products by silica gel chromatography are necessary, which is not an industrially easy method.
  • Japanese Patent Laid-Open No. 11-343414 Japanese Unexamined Patent Publication No. 63-190607 JP 2002-105034 A JP 05-194338 A JP 2007-119503 A JP 2007-119504 A JP 2008-150534 A JP 2009-235048 A
  • the present invention relates to an aromatic diamine compound having a fluorene structure and a 2-hydroxy-1,1,1,3,3,3-hexafluoroisopropyl group (hereinafter referred to as “HFIP group” or “—C (CF 3 ) 2 OH”.
  • HFIP group-containing fluorenediamine having introduced thereinto
  • polyamide compounds, polyimide compounds, and fluorine-containing heterocyclic-containing polymer compounds having a polybenzoxazole-like structure synthesized from HFIP group-containing fluorenediamine. provide.
  • a hydrophilic group such as a phenolic hydroxyl group or a carboxyl group
  • a hydrophilic group such as a phenolic hydroxyl group or a carboxyl group
  • the HFIP group can be introduced into the fluorene skeleton.
  • the present inventors synthesized a fluorine-containing heterocyclic ring-containing polymer compound having a polyamide compound, a polyimide compound, and a polybenzoxazole-like structure from an HFIP group-containing fluorenediamine to complete the present invention.
  • the present invention is as follows.
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group,
  • the fluorine-containing fluorenediamine according to invention 1 represented by formula (3-1): (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C ⁇ C—C (CH 3 ) 2 OH group, —C ⁇ C—
  • the fluorine-containing diamine according to any one of the inventions 1 to 3 is a dicarboxylic acid or dicarboxylic acid derivative represented by the formula (10) or (11), or a tetracarboxylic dianhydride represented by the formula (14).
  • A is a divalent organic group containing one or more selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom, Any number of hydrogen atoms may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and each R 4 is independently a hydrogen atom or a carbon number of 1 to 10
  • A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and is an oxygen atom, a sulfur atom, or a nitrogen atom.
  • R 5 is a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom and a nitrogen atom.
  • any number of hydrogen atoms may be substituted with an alkyl group, a fluoroalkyl group, a carboxyl group, a hydroxy group, or a cyano group.
  • a polymer compound containing at least a repeating unit represented by formula (6) (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C ⁇ C—C (CH 3 ) 2 OH group, —C ⁇ C—C 6 H
  • the polymer compound according to invention 5 comprising at least a repeating unit represented by formula (19).
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group,
  • the polymer compound according to invention 5 or 6, comprising at least a repeating unit represented by formula (6A).
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • 1 represents a substituent selected from the group consisting of phenyl group, methoxy group and nitro group
  • A is a divalent organic group containing one or more selected from alicyclic, aromatic and alkylene groups
  • oxygen May contain atoms, sulfur atoms, or nitrogen atoms, and any number of hydrogen atoms may be substituted with alkyl groups, fluorine atoms, chlorine atoms, fluoroalkyl groups, carboxyl groups, hydroxy groups, or cyano groups
  • HFIP represents a —C (CF 3 )
  • [Invention 8] A polymer compound containing at least a repeating unit represented by formula (9).
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluorinated alkyl having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • 1 represents a substituent selected from the group consisting of a group, a phenyl group, a methoxy group, and a nitro group
  • R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, or a biphenyl group.
  • Sulfonic acid group —C ⁇ C—C (CH 3 ) 2 OH group, —C ⁇ C—C 6 H 5 group, —C ⁇ C—Si (CH 3 ) 3 group
  • A represents a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom;
  • the number of hydrogen atoms is an alkyl group, a fluorine atom, a chlorine atom, Kill group, a carboxyl group, may be substituted by a hydroxy group or a cyano group.
  • the polymer compound according to invention 8 which contains at least a repeating unit represented by formula (9B).
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluorinated alkyl having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • 1 represents a substituent selected from the group consisting of a group, a phenyl group, a methoxy group, and a nitro group
  • A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, It may contain oxygen, sulfur, or nitrogen atoms, and any number of hydrogen atoms are substituted with alkyl, fluorine, chlorine, fluoroalkyl, carboxyl, hydroxy or cyano groups May be good.
  • a polymer compound containing at least a repeating unit represented by formula (7) (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C ⁇ C—C (CH 3 ) 2 OH group, —C ⁇ C—C 6 H
  • Any number of hydrogen atoms may be alkyl groups, fluoroalkyl Optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2; m + n is 1 or more and 4 or less.
  • the polymer compound according to invention 10 comprising at least a repeating unit represented by formula (7A).
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group,
  • Any number of hydrogen atoms may be alkyl groups, fluoroalkyl And optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group.
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • R 5 represents a tetravalent organic group containing one or more substituents selected from the group consisting of a phenyl group, a methoxy group and a nitro group, wherein R 5 is one or more selected from an alicyclic ring, an aromatic ring and an alkylene group; Fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom may be contained, and any number of hydrogen atoms may be substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano
  • a polymer compound containing at least a repeating unit represented by formula (8) (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C ⁇ C—C (CH 3 ) 2 OH group, —C ⁇ C—C 6 H
  • Any number of hydrogen atoms may be alkyl groups, fluoroalkyl Optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2; m + n is 1 or more and 4 or less.
  • the polymer compound according to invention 13 comprising at least a repeating unit represented by formula (8A).
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group,
  • Any number of hydrogen atoms may be alkyl groups, fluoroalkyl And optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group.
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • R 5 represents a tetravalent organic group containing one or more substituents selected from the group consisting of a phenyl group, a methoxy group and a nitro group, wherein R 5 is one or more selected from an alicyclic ring, an aromatic ring and an alkylene group; Fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom may be contained, and any number of hydrogen atoms may be substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano
  • an HFIP group-containing fluorenediamine Furthermore, according to the present invention, it is possible to provide a polyamide compound, a polyimide compound, and a fluorine-containing heterocyclic-containing polymer compound having a polybenzoxazole-like structure synthesized from HFIP group-containing fluorenediamine.
  • 9,9-bis (4-aminophenyl) fluorene represented by the following formula (1) is referred to as “fluor orange amine”. It may have a substituent. However, when it has a HFIP group as a substituent, it distinguishes and calls as "HFIP group containing fluorene amine”.
  • HFIP group-containing fluoreneamine according to the present invention, HFIP group-containing fluoreneamine as monomers, polyamide compound obtained by polymerization reaction, polyimide compound, fluorine-containing heterocyclic ring-containing polymer compound having a polybenzoxazole-like structure in this order It explains along.
  • the HFIP group-containing fluorenediamine according to the present invention is represented by the formula (2).
  • R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms
  • R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group,
  • HFIP group-containing fluorenediamine (2) the compounds represented by the formulas (3-1) and (3-2) HFIP group-containing fluorenediamine is preferred.
  • R 1 , R 2 and HFIP have the same meaning as in formula (2).
  • alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, and a tert-butyl group.
  • fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl Group, perfluoro tert-butyl group and the like.
  • HFIP group-containing fluorenediamine examples include compounds represented by the following formulas (4-1) to (4-12).
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • Me represents a methyl group.
  • Ph represents a phenyl group.
  • HFIP has the same meaning as in formula (2).
  • the HFIP group-containing fluorenediamines represented by the general formulas (4-1) and (4-2) are particularly preferable because of the availability of fluoreneamine as a raw material for synthesizing the HFIP group-containing fluorenediamine.
  • the HFIP group-containing fluorenediamine (2) according to the present invention is obtained by replacing fluorediamine represented by the formula (5) (hereinafter sometimes referred to as “fluorangeamine” (5)) with hexafluoroacetone or hexafluoroacetone. -It is obtained by making it react with a trihydrate (refer patent document 5, 6, 7). (In formula (5), R 1 and R 2 have the same meaning as in formula (2).)
  • This reaction can be carried out without solvent, but a solvent can also be used.
  • the solvent used is not particularly limited as long as it does not participate in the reaction, but is preferably an aromatic hydrocarbon such as xylene, toluene, benzene, anisole, diphenyl ether, nitrobenzene, benzonitrile, or water.
  • the amount of the solvent to be used is not particularly limited, but it is not preferable to use a large amount because the yield per volume decreases.
  • the reactor to be used is not particularly limited. However, when a sealed reactor (autoclave) is used, the mode differs depending on whether hexafluoroacetone or hexafluoroacetone trihydrate is used. . In the case of using hexafluoroacetone, first, fluorenediamine (5) and, if necessary, a catalyst and / or a solvent are charged into the reactor. Subsequently, it is preferable to introduce hexafluoroacetone successively while raising the temperature so that the internal pressure of the reactor does not exceed 0.5 MPa.
  • the reaction time of this reaction is not particularly limited, but the optimum reaction time varies depending on the temperature and the amount of catalyst used. Therefore, it is preferable to complete this step after confirming that the raw material has been sufficiently consumed by carrying out the reaction while measuring the progress of the reaction by a general-purpose analysis means such as gas chromatography.
  • the HFIP group-containing fluorenediamine (2) can be obtained by ordinary means such as extraction, distillation, and crystallization. Moreover, it can also refine
  • polyamide compound (6) a polyamide compound containing at least a repeating unit represented by the general formula (6) obtained by a polymerization reaction
  • polyamide compound (7) a polyamide compound containing at least the repeating unit represented by the general formula (7)
  • polyimide compound (8) A polymer compound such as a polyimide compound containing at least a repeating unit (hereinafter sometimes referred to as “polyimide compound (8)”) will be described in order.
  • fluorine-containing heterocyclic ring-containing polymer compound having a polybenzoxazole-like structure containing at least the repeating unit represented by the general formula (9) hereinafter referred to as “fluorinated heterocyclic ring-containing polymer compound (9)”)
  • the polyamide compound (6) is an HFIP-containing fluorenediamine (2), a carboxylic acid or a carboxylic acid represented by formula (10) or formula (11). It can be obtained by reacting with a derivative.
  • R 1 , R 2 , HFIP, m and n are as defined in formula (2).
  • R 4 independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or a benzyl group.
  • dicarboxylic acid or dicarboxylic acid derivative represented by the general formulas (10) and (11) any of aliphatic dicarboxylic acid, aromatic dicarboxylic acid, or these dicarboxylic acid derivatives may be used.
  • Examples of the aliphatic dicarboxylic acid and derivatives thereof include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, dicarboxylic acid compounds of sebacic acid or their dicarboxylic acid derivatives. It is done.
  • aromatic dicarboxylic acids and derivatives thereof include phthalic acid, isophthalic acid, terephthalic acid, 4,4′-dicarboxybiphenyl, 3,3′-dicarboxybiphenyl, 3,3′-dicarboxyldiphenyl ether, 3, 4'-dicarboxyldiphenyl ether, 4,4'-dicarboxyldiphenyl ether, 3,3'-dicarboxyldiphenylmethane, 3,4'-dicarboxyldiphenylmethane, 4,4'-dicarboxyldiphenylmethane, 4,4'-dicarboxyldiphenylmethane, 3,3'-dicarboxyl Diphenyldifluoromethane, 3,4'-dicarboxyldiphenyldifluoromethane, 4,4'-dicarboxyldiphenyldifluoromethane, 3,3'-dicarboxyldiphenylsulfone
  • terephthalic acid, isophthalic acid, 4,4′-dicarboxybiphenyl, 2,2′-ditrifluoromethyl-4 are easy to obtain, easy to polycondensation reaction, and excellent in transparency.
  • 4,4′-dicarboxybiphenyl and 2,2-bis (4-carboxyphenyl) hexafluoropropane are preferred.
  • a polyamide compound containing at least a repeating unit represented by any of the following formulas (12-1) to (12-5) is preferable.
  • R 1 , R 2 and HFIP have the same meaning as in formula (2).
  • a polyamide compound containing at least a repeating unit represented by any of the following formulas (13-1) to (13-10) can be given.
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group.
  • HFIP has the same meaning as in formula (2).
  • a polyamide compound containing at least a repeating unit represented by any one of the formulas (13-1) to (13-5) is particularly preferred because of the availability of fluoreneamine as a raw material for the synthesis of HFIP group-containing fluoreneamine. preferable.
  • the weight average molecular weight of the polyamide compound (6) is preferably 10,000 or more, more preferably 20,000 or more.
  • the upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less.
  • the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor.
  • the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult.
  • the weight average molecular weight here is determined as a converted value based on standard polystyrene by gel permeation chromatography (hereinafter sometimes referred to as “GPC”) analysis (the same applies hereinafter). Detailed analysis conditions for the analysis are described in the examples of the present application.
  • the method for synthesizing the polyamide compound (6) is not particularly limited, and a known method for synthesizing a polyamide compound from a diamine compound and a carboxylic acid compound or a derivative thereof can be employed.
  • a composition having HFIP group-containing fluorenediamine (2) and a dicarboxylic acid or dicarboxylic acid derivative represented by the general formulas (10) and (11) is melted together at 150 ° C. or higher and condensed without solvent.
  • Examples thereof include a polymerization reaction method, a condensation polymerization reaction in a solvent at 150 ° C. or higher, and a polymerization reaction in a solvent at a temperature of ⁇ 20 to 80 ° C.
  • a solvent can be used.
  • the solvent to be used is not particularly limited as long as the reaction substrate dissolves and does not freeze at the reaction temperature, and examples thereof include amides, aromatics, halogens, lactones and the like.
  • the polyamide compound (7) reacts the HFIP-containing fluorenediamine (2) with the tetracarboxylic dianhydride represented by the formula (14). Can be obtained.
  • R 1 , R 2 , HFIP, m and n are as defined in formula (2).
  • R 5 is a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group.
  • tetracarboxylic dianhydride represented by the general formula (14)
  • those having any of aliphatic, alicyclic and aromatic structures in R 5 can be used.
  • benzenetetracarboxylic dianhydride pyromellitic dianhydride
  • trifluoromethylbenzenetetracarboxylic dianhydride bistrifluoromethylbenzenetetracarboxylic dianhydride, difluorobenzenetetracarboxylic dianhydride
  • Naphthalenetetracarboxylic dianhydride biphenyltetracarboxylic dianhydride, terphenyltetracarboxylic dianhydride, 1,1-bis (3,4-dicarboxyphenyl) ketonic dianhydride, oxydiphthalic acid
  • polyamide compounds (7) polyamide compounds containing at least any of the repeating units represented by the following formulas (15-1) to (15-6) are preferable.
  • R 1 , R 2 and HFIP have the same meaning as in formula (2).
  • Specific examples include polyamide compounds containing at least any of the repeating units represented by the following formulas (16-1) to (16-12).
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group.
  • HFIP has the same meaning as in formula (2).
  • polyamide compounds containing at least any one of the repeating units represented by the formulas (16-1) to (16-6) are obtained because of the availability of fluorenediamine as a raw material for the synthesis of HFIP group-containing fluorenediamine, Particularly preferred.
  • the weight average molecular weight of the polyamide compound (7) is preferably 10,000 or more, more preferably 20,000 or more.
  • the upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less. When the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor. When the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult.
  • the method for synthesizing the polyamide compound (7) is not particularly limited, and for example, a composition having a HFIP group-containing fluorenediamine (2) and a dicarboxylic acid derivative represented by the general formula (14) at 150 ° C. or higher.
  • a composition having a HFIP group-containing fluorenediamine (2) and a dicarboxylic acid derivative represented by the general formula (14) at 150 ° C. or higher examples thereof include a method in which they are melted together and subjected to a polycondensation reaction without solvent, a method in which a polycondensation reaction is performed at 150 ° C. or higher in a solvent, and a method in which a polymerization reaction is performed in a solvent at a temperature of ⁇ 20 to 80 ° C.
  • a solvent can be used in the synthesis of the polyamide compound (7).
  • the solvent to be used is not particularly limited as long as the reaction substrate dissolves and does not freeze at the reaction temperature, and examples thereof include amides, aromatics, halogens, lactones and the like.
  • the polyimide compound represented by the formula (8) is synthesized from the polyamide compound (7).
  • R 1 , R 2 , HFIP, m and n are as defined in formula (2).
  • R 5 is a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group. Yes, it may contain fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom, and any number of hydrogen atoms are substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano group May be.
  • a polyimide compound containing at least any one of the repeating units represented by the following formulas (17-1) to (17-6) is preferable.
  • R 1 , R 2 and HFIP have the same meaning as in formula (2).
  • Specific examples include polyimide compounds containing at least one of the repeating units represented by the following formulas (18-1) to (18-12).
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group.
  • HFIP has the same meaning as in formula (2).
  • polyimide compounds containing at least any one of the repeating units represented by formulas (18-1) to (18-6) are particularly preferred because of the availability of fluoreneamine as a raw material for the synthesis of HFIP group-containing fluoreneamine. preferable.
  • the weight average molecular weight of the polyimide compound (8) is preferably 10,000 or more, more preferably 20,000 or more.
  • the upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less. When the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor. When the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult.
  • the synthesis reaction of the polyimide (8) that is, the dehydration cyclization reaction of the polyamide compound (7) is carried out under the condition that the reaction is promoted only by heating or by the combined use of an additive such as acid or base and heat.
  • the polyamide compound (7) solution can be imidized at a high temperature of 150 ° C. or higher and 250 ° C. or lower to prepare a polyimide solution containing an HFIP group.
  • pyridine, triethylamine, acetic anhydride or the like may be used as an additive.
  • the concentration of the polyimide containing HFIP groups in the solution is preferably 5% by mass or more and 50% by mass or less. If it is less than 5% by mass, it is too thin to be industrially practical. If it exceeds 50% by mass, it is difficult to dissolve. Furthermore, it is preferably 10% by mass or more and 40% by mass or less.
  • the solvent used in preparing the solution of the polyamide compound (7) is not particularly limited as long as the reaction substrate dissolves.
  • N, N-dimethylformamide, N, N-dimethylacetamide, hexa Methylphosphoric triamide or N-methyl-2-pyrrolidone aromatic solvents benzene, anisole, diphenyl ether, nitrobenzene or benzonitrile, halogenated solvents chloroform, dichloromethane, 1,2-dichloroethane or 1,1,2 , 2-tetrachloroethane, lactones ⁇ -butyrolactone, ⁇ -valerolactone, ⁇ -valerolactone, ⁇ -caprolactone, ⁇ -caprolactone or ⁇ -methyl- ⁇ -butyrolactone.
  • These solvents may be used alone or as a mixed solvent of two or more.
  • a method for synthesizing the polyimide (8) a method in which the reaction solution immediately after the synthesis of the polyamide compound (7) is directly subjected to a dehydration cyclization reaction is also applicable.
  • the above-mentioned temperature range, additive, concentration and solvent can be used.
  • the fluorine-containing heterocyclic ring-containing polymer compound (9) is a polyamide compound containing at least a repeating unit represented by the formula (19) (hereinafter “polyamide”).
  • Compound (19) may be obtained by dehydrating cyclization.
  • R 1 , R 2 and HFIP are as defined in formula (2).
  • A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group, It may contain a sulfur atom or a nitrogen atom, and any number of hydrogen atoms may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group.
  • A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom, and any number
  • the hydrogen atom may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and the line segment intersecting with the wavy line represents the bonding position.
  • a fluorine-containing heterocyclic ring-containing polymer compound containing at least any one of the repeating units represented by the following formulas (20-1) to (20-5) is preferable.
  • R 1 , R 2 and HFIP have the same meaning as in formula (2).
  • Specific examples include fluorine-containing heterocyclic ring-containing polymer compounds containing at least any one of the repeating units represented by the following formulas (21-1) to (21-10).
  • R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group.
  • a fluorine-containing heterocyclic ring containing at least any one of the repeating units represented by formulas (21-1) to (21-5) because of the availability of fluoreneamine as a raw material for the synthesis of HFIP group-containing fluorenediamine.
  • the containing polymer compound is particularly preferable.
  • the weight average molecular weight of the fluorine-containing heterocyclic ring-containing polymer compound (9) is preferably 10,000 or more, more preferably 20,000 or more.
  • the upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less. When the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor. When the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult.
  • reaction conditions such as heating, use of an acid catalyst, and a base catalyst can be selected.
  • reaction conditions in the similar dehydration cyclization reaction disclosed in Patent Documents 6 and 7 can be applied mutatis mutandis.
  • the polyamide compound (19) is heated in a solvent at 150 to 250 ° C., whereby the dehydration cyclization of the polyamide compound (19) proceeds, and the fluorine-containing heterocyclic ring-containing polymer compound (9) Produces.
  • pyridine, triethylamine, acetic anhydride and the like may be added for the purpose of allowing the reaction to proceed efficiently.
  • a solvent can be used.
  • the solvent to be used is not particularly limited as long as the reaction substrate dissolves and does not freeze at the reaction temperature, and examples thereof include amides, aromatics, halogens, lactones and the like.
  • acid acceptors such as pyridine and triethylamine
  • a polyamide compound (6) for the purpose of improving the heat resistance of the polymer compound and obtaining solubility in a desired organic solvent, a polyamide compound (6), a polyamide compound (7), a polyimide obtained from the HFIP group-containing fluorenediamine (2)
  • a diamine compound not containing an HFIP group may be added as a polymerization component.
  • the diamine compound includes 3,5-diaminobenzotrifluoride, 2,5-diaminobenzotrifluoride, 3,3′-bistrifluoromethyl-4,4′-diaminobiphenyl, 2,2′- Bistrifluoromethyl-4,4′-diaminobiphenyl, 3,3′-bistrifluoromethyl-5,5′-diaminobiphenyl, bis (trifluoromethyl) -4,4′-diaminobiphenyl, bis (fluorinated alkyl) -4,4'-diaminobiphenyl, dichloro-4,4'-diaminobiphenyl, dibromo-4,4'-diaminobiphenyl, bis (fluorinated alkoxy) -4,4'-diaminobiphenyl, diphenyl-4,4 ' -Diaminobiphenyl, 4,4'-bis (4-aminotetrafluorophenoxy) tetrafluor
  • the polymer compound of the present invention can be used in a varnish state, a powder state, a film state, or a solid state dissolved in an organic solvent.
  • the obtained polymer compound may contain additives such as an oxidation stabilizer, a filler, a silane coupling agent, a photosensitizer, a photopolymerization initiator, and a sensitizer as necessary. Absent.
  • in varnish When using in varnish, apply it on a substrate such as glass, silicon wafer, metal, metal oxide, ceramics, resin, etc. by usual methods such as spin coating, spray coating, flow coating, impregnation coating, brush coating. Can do.
  • the physical property evaluation of the polymer compound using the HFIP group-containing fluorenediamine and the HFIP group-containing fluorenediamine obtained in the present invention was performed by the following methods.
  • NMR (nuclear magnetic resonance) measurement The structure of the compound was confirmed by 1 H-NMR and 19 F-NMR measurements using an NMR (nuclear magnetic resonance) apparatus (JNM-AL400 or JNM-ECA400; manufactured by JEOL Ltd.) having a resonance frequency of 400 MHz.
  • the weight average molecular weight (hereinafter sometimes referred to as “Mw”) is a value determined by gel permeation chromatography (HLC-8320 manufactured by Tosoh Corporation, tetrahydrofuran is used) with polystyrene as a standard product.
  • Example 5 ⁇ Film-forming experiment of polymer P1-1>
  • the polymer P1-1 (3 g) obtained in Example 4 was dissolved in N, N-dimethylacetamide (12 g), and then the obtained solution was spin-coated on a glass substrate to obtain N, N-dimethyl.
  • the upper limit temperature was 180 ° C. close to the boiling point of acetamide, and heating was performed at 100 ° C. for 1 hour and 180 ° C. for 1 hour. On the glass substrate, no peeling or cracking was observed visually, and a uniform film having a thickness of 25 ⁇ m was obtained.
  • Example 8 ⁇ Film-forming experiment of polymer P2-1> After the polymer P2-1 (3 g) obtained in Example 7 was dissolved in N-methylpyrrolidone (12 g), the obtained solution was spin-coated on a glass substrate and was close to the boiling point of N-methylpyrrolidone. 200 ° C. was the upper limit temperature, and heating was performed at 100 ° C. for 1 hour and at 200 ° C. for 1 hour. On the glass substrate, no peeling or cracking was observed visually, and a uniform film having a thickness of 23 ⁇ m was obtained.
  • Example 27 to 35 ⁇ Film formation experiment of polymers P3-1 to P11-1>
  • the polymers P3-1 to P7-1 were spin-coated on the glass substrate by the same method as in Example 5, and the polymers P8-1 to P11-1 were formed by the same method as in Example 8. The results are shown in Table 5.
  • the coating film of the HFIP group-containing polymer compound according to the present invention can be used as a coating material for a flat panel display, a protective film for a substrate body for an electronic circuit, a protective film for a semiconductor, and the like.

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Abstract

Provided are: an HFIP-group-containing fluorine diamine represented by formula (2) and obtained by introducing an HFIP group to a fluorine diamine compound; and an HFIP-group-containing polymer compound. (In the formula, R1 represents one type of substituent group selected from a group consisting of a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a C1-4 alkyl group, a C1-4 fluoroalkyl group in which an arbitrary number of hydrogen atoms are replaced with fluorine atoms, a phenyl group, a methoxy group, and a nitro group. R2 represents one type of substituent group selected from a group consisting of a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, a sulfonic acid group, a -C≡C-C(CH3)2OH group, a -C≡C-C6H5 group, and a -C≡C-Si(CH3)3 group. HFIP represents a -C(CF3)2OH group. m and n each independently represent an integer of 0-2. 1≤m+n≤4.)

Description

含フッ素重合性単量体およびそれを用いた高分子化合物Fluorine-containing polymerizable monomer and polymer compound using the same
 本発明は、電子回路用基板用保護膜、半導体用保護膜、またはガス分離膜向けの材料として有用な新規な含フッ素高分子化合物に関する。さらに、本発明は、該含フッ素高分子化合物製造のための含フッ素重合性単量体に関する。 The present invention relates to a novel fluorine-containing polymer compound useful as a material for a protective film for an electronic circuit substrate, a protective film for a semiconductor, or a gas separation film. Furthermore, the present invention relates to a fluorine-containing polymerizable monomer for producing the fluorine-containing polymer compound.
 芳香族ジアミン化合物は、ポリアミド、ポリイミド、ポリベンゾオキサゾールなどに代表される耐熱性高分子の原料として有用である。これらの高分子材料はその高度な耐熱性から、自動車、航空宇宙、防火服等の分野に使用されている。しかしながら、これらの高分子材料は、多くの場合、有機溶媒に対する溶解性が乏しく、成型性が悪い。そのため、ポリイミドやポリベンゾオキサゾールの場合、有機溶媒可溶性の前駆体高分子(ポリアミド酸、ポリアミドフェノール)を用いて所望の形状に成型した後、300℃から350℃の高温下で脱水環化させることで、ポリイミドやポリベンゾオキサゾールに変性させて最終成型体としている。 The aromatic diamine compound is useful as a raw material for heat resistant polymers represented by polyamide, polyimide, polybenzoxazole and the like. These polymer materials are used in fields such as automobiles, aerospace, and fire protection clothing because of their high heat resistance. However, these polymer materials often have poor solubility in organic solvents and poor moldability. Therefore, in the case of polyimide or polybenzoxazole, after forming into a desired shape using an organic solvent-soluble precursor polymer (polyamide acid, polyamide phenol), dehydration cyclization is performed at a high temperature of 300 ° C. to 350 ° C. The final molded body is modified by polyimide or polybenzoxazole.
 但し、前記のような成型工程は、有機系色素を使用した比較的耐熱性の低いディスプレイ用部材や、残留熱応力が発生しやすい熱膨張係数が異なる半導体用の積層部材に用いるには、成型温度が高すぎるため不適である。そのため、有機溶媒を蒸発揮散する程度の温度で成型可能な有機溶媒可溶型のポリイミドやポリベンゾオキサゾールが注目されている。 However, the molding process as described above is a molding process for use in display members using organic dyes that have relatively low heat resistance and laminated members for semiconductors having different thermal expansion coefficients that are likely to generate residual thermal stress. Unsuitable because the temperature is too high. Therefore, organic solvent-soluble polyimides and polybenzoxazoles that can be molded at a temperature at which the organic solvent is evaporated are attracting attention.
 これらの高分子を有機溶媒に可溶化させる手法として、エーテル結合やメチレン結合などの屈曲構造を主鎖骨格に導入すること、tert-ブチル基やトリフルオロメチル基などの嵩高い構造を側鎖に導入すること、主鎖骨格の対称性を崩すことが知られている。中でも、耐熱性を犠牲にすること無く、有機溶媒に対する溶解性を向上させる手法として、フルオレン構造を用いる手法が知られている。 As a method for solubilizing these polymers in an organic solvent, a bent structure such as an ether bond or a methylene bond is introduced into the main chain skeleton, and a bulky structure such as a tert-butyl group or a trifluoromethyl group is used as a side chain. It is known to introduce and destroy the symmetry of the main chain skeleton. Among them, a technique using a fluorene structure is known as a technique for improving the solubility in organic solvents without sacrificing heat resistance.
 フルオレン構造を有する高分子は、有機溶剤に可溶化するだけでなく、その特異な構造により低誘電率化やガス透過性を高める効果があり、半導体用保護膜やガス分離膜としての報告例がある(特許文献1,2)。 Polymers having a fluorene structure are not only solubilized in organic solvents, but also have the effect of lowering the dielectric constant and increasing gas permeability due to their unique structure. There are examples of reports as protective films for semiconductors and gas separation films. (Patent Documents 1 and 2).
 しかしながら、フルオレン構造を有する高分子は、疎水性が高く親水性基材への塗布性に乏しいことや、分子間相互作用が低いことによる機械強度が乏しい欠点を有する。フェノール性水酸基やカルボキシル基などの親水性基をフルオレン骨格に導入することで当該欠点の解消を試みた報告例があるが、フェノール性水酸基やカルボキシル基などの親水性基の導入のための合成工程が多段階になり、かつ操作が煩雑であった(特許文献3、4、8)。 However, a polymer having a fluorene structure has drawbacks that it is highly hydrophobic and has poor applicability to a hydrophilic substrate and poor mechanical strength due to low intermolecular interaction. There is a report example of trying to eliminate the disadvantage by introducing a hydrophilic group such as phenolic hydroxyl group or carboxyl group into the fluorene skeleton, but a synthesis process for introducing a hydrophilic group such as phenolic hydroxyl group or carboxyl group Is multistage and the operation is complicated (Patent Documents 3, 4, and 8).
 特許文献3では、フェノール性水酸基含有フルオレンジアミンの製法が開示されている。当該製法では、フェノール性水酸基をフルオレン骨格に導入した後、ニトロ化、続いて水素還元工程により目的物であるフェノール性水酸基含有フルオレンジアミンを得ている。実施例記載内容によると、各工程は比較的高収率(85~90%)で目的物を得ているものの、大量の硝酸の使用による廃棄物の問題や、高価なパラジウム触媒の使用、高圧水素が必要であり、工業的に容易な手法とは言い難い。 Patent Document 3 discloses a method for producing a phenolic hydroxyl group-containing fluorenediamine. In this production method, after introducing a phenolic hydroxyl group into the fluorene skeleton, nitration followed by a hydrogen reduction step yields the objective phenolic hydroxyl group-containing fluorenediamine. According to the description of the examples, each process has a target with a relatively high yield (85 to 90%), but there is a problem of waste due to the use of a large amount of nitric acid, use of an expensive palladium catalyst, high pressure Hydrogen is necessary and it is difficult to say that it is an industrially easy method.
 特許文献4では、カルボキシル基含有フルオレンジアミンの製法が開示されている。当該製法では、ジフェン酸を硫酸中で加熱しフルオレノンカルボン酸とし、引き続きアニリン類との脱水工程を必要とする高温下での反応により目的物であるカルボキシル基含有フルオレンジアミンを得ている。本反応も大量の硫酸使用による廃棄物の問題や、脱水工程に伴うトルエン共存下の共弗脱水の付帯設備が必要で、これも工業的に容易な手法とは言い難い。 Patent Document 4 discloses a method for producing a carboxyl group-containing fluorenediamine. In this production method, diphenic acid is heated in sulfuric acid to form fluorenone carboxylic acid, and subsequently a target carboxy group-containing fluorenediamine is obtained by a reaction at a high temperature that requires a dehydration step with anilines. This reaction also requires a problem of waste due to the use of a large amount of sulfuric acid, and an additional facility for co-dehydration in the presence of toluene in the dehydration process, which is also not an industrially easy method.
 特許文献8では、特許文献3と比較して、フェノール性水酸基とアミノ基の置換位置が逆転している、フェノール性水酸基含有フルオレンジアミンの製法が開示されている。当該製法では汎用の2-ベンゾオキサゾリンを使用しているが、反応後にシリカゲルクロマトグラフによる副生物との分離精製操作が必要で、これも工業的に容易な手法とは言い難い。 Patent Document 8 discloses a method for producing a phenolic hydroxyl group-containing fluorenediamine in which the substitution positions of a phenolic hydroxyl group and an amino group are reversed as compared with Patent Document 3. In this production method, general-purpose 2-benzoxazoline is used. However, after the reaction, separation and purification operations from by-products by silica gel chromatography are necessary, which is not an industrially easy method.
 このように、フェノール性水酸基やカルボキシル基、もしくは両官能基とは異なる親水性基をフルオレン骨格に簡便に導入することが期待されていた。 Thus, it was expected that a phenolic hydroxyl group, a carboxyl group, or a hydrophilic group different from both functional groups would be easily introduced into the fluorene skeleton.
 また、フルオレン構造を有する芳香族ジアミン化合物に2-ヒドロキシ-1,1,1,3,3,3-ヘキサフルオロイソプロピル基を導入した化合物は知られていない。 Further, a compound in which a 2-hydroxy-1,1,1,3,3,3-hexafluoroisopropyl group is introduced into an aromatic diamine compound having a fluorene structure is not known.
特開平11-343414号公報Japanese Patent Laid-Open No. 11-343414 特開昭63-190607号公報Japanese Unexamined Patent Publication No. 63-190607 特開2002-105034号公報JP 2002-105034 A 特開平05-194338号公報JP 05-194338 A 特開2007-119503号公報JP 2007-119503 A 特開2007-119504号公報JP 2007-119504 A 特開2008-150534号公報JP 2008-150534 A 特開2009-235048号公報JP 2009-235048 A
 本発明は、フルオレン構造を有する芳香族ジアミン化合物に2-ヒドロキシ-1,1,1,3,3,3-ヘキサフルオロイソプロピル基(以下、「HFIP基」または「-C(CF32OH基」と呼ぶことがある。)を導入したHFIP基含有フルオレンジアミン、およびHFIP基含有フルオレンジアミンから合成されるポリアミド化合物、ポリイミド化合物、ポリベンゾオキサゾール類似構造を有する含フッ素複素環含有高分子化合物を提供する。 The present invention relates to an aromatic diamine compound having a fluorene structure and a 2-hydroxy-1,1,1,3,3,3-hexafluoroisopropyl group (hereinafter referred to as “HFIP group” or “—C (CF 3 ) 2 OH”. HFIP group-containing fluorenediamine having introduced thereinto), and polyamide compounds, polyimide compounds, and fluorine-containing heterocyclic-containing polymer compounds having a polybenzoxazole-like structure synthesized from HFIP group-containing fluorenediamine. provide.
 本発明者らは、上記課題を解決するため鋭意検討を重ねた結果、フェノール性水酸基やカルボキシル基などの親水性基をフルオレン骨格へ導入する従来の方法よりも簡便な合成方法により、親水性基であるHFIP基をフルオレン骨格に導入できることを見出した。さらに、本発明者らは、HFIP基含有フルオレンジアミンから、ポリアミド化合物、ポリイミド化合物、ポリベンゾオキサゾール類似構造を有する含フッ素複素環含有高分子化合物を合成し、本発明を完成させた。 As a result of intensive studies to solve the above-mentioned problems, the present inventors have found that a hydrophilic group such as a phenolic hydroxyl group or a carboxyl group can be synthesized by a simpler synthesis method than the conventional method of introducing a hydrophilic group such as a phenolic hydroxyl group or a carboxyl group into a fluorene skeleton. It was found that the HFIP group can be introduced into the fluorene skeleton. Furthermore, the present inventors synthesized a fluorine-containing heterocyclic ring-containing polymer compound having a polyamide compound, a polyimide compound, and a polybenzoxazole-like structure from an HFIP group-containing fluorenediamine to complete the present invention.
 すなわち、本発明は以下の通りである。 That is, the present invention is as follows.
 [発明1]
 式(2)で表される含フッ素フルオレンジアミン。
Figure JPOXMLDOC01-appb-C000019
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
[Invention 1]
A fluorine-containing fluorenediamine represented by the formula (2).
Figure JPOXMLDOC01-appb-C000019
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group Represents a substituent, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2, and m + n is from 1 to 4.
 [発明2]
 式(3-1)で表される発明1に記載の含フッ素フルオレンジアミン。
Figure JPOXMLDOC01-appb-C000020
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。HFIPは-C(CF32OH基を表す。)
[Invention 2]
The fluorine-containing fluorenediamine according to invention 1 represented by formula (3-1):
Figure JPOXMLDOC01-appb-C000020
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group Represents a substituent, and HFIP represents a —C (CF 3 ) 2 OH group.)
 [発明3]
 式(2B)で表される発明1または2に記載の含フッ素フルオレンジアミン。
Figure JPOXMLDOC01-appb-C000021
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。HFIPは-C(CF32OH基を表す。)
[Invention 3]
The fluorine-containing fluorenediamine according to invention 1 or 2 represented by formula (2B).
Figure JPOXMLDOC01-appb-C000021
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) And represents one kind of substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and HFIP represents a —C (CF 3 ) 2 OH group.)
 [発明4]
 発明1~3のいずれかに記載の含フッ素ジアミンを、式(10)、(11)で表されるジカルボン酸もしくはジカルボン酸誘導体、または、式(14)で表されるテトラカルボン酸二無水物と接触させ、反応させることで得られる高分子化合物。
Figure JPOXMLDOC01-appb-C000022
(式(10)中、Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよく、R4はそれぞれ独立に水素原子、炭素数1~10のアルキル基またはベンジル基を表す。式(11)中、Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよく、Xはフッ素原子、塩素原子、臭素原子またはヨウ素原子を表す。)
Figure JPOXMLDOC01-appb-C000023
(式(14)中、R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
[Invention 4]
The fluorine-containing diamine according to any one of the inventions 1 to 3 is a dicarboxylic acid or dicarboxylic acid derivative represented by the formula (10) or (11), or a tetracarboxylic dianhydride represented by the formula (14). A polymer compound obtained by contacting with and reacting with.
Figure JPOXMLDOC01-appb-C000022
(In Formula (10), A is a divalent organic group containing one or more selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom, Any number of hydrogen atoms may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and each R 4 is independently a hydrogen atom or a carbon number of 1 to 10 In formula (11), A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and is an oxygen atom, a sulfur atom, or a nitrogen atom. Any number of hydrogen atoms may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and X is Tsu atom, a chlorine atom, a bromine atom or an iodine atom.)
Figure JPOXMLDOC01-appb-C000023
(In the formula (14), R 5 is a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom and a nitrogen atom. And any number of hydrogen atoms may be substituted with an alkyl group, a fluoroalkyl group, a carboxyl group, a hydroxy group, or a cyano group.)
 [発明5]
 式(6)で表される繰り返し単位を少なくとも含有する高分子化合物。
Figure JPOXMLDOC01-appb-C000024
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
[Invention 5]
A polymer compound containing at least a repeating unit represented by formula (6).
Figure JPOXMLDOC01-appb-C000024
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group A represents a substituent, A is a divalent organic group containing one or more selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom; Several hydrogen atoms are alkyl, fluorine, chlorine, fluoro Kill group, a carboxyl group, may .HFIP be substituted by a hydroxy group or a cyano group is -C (CF 3) 2 .m and n represents an OH group each independently represents an integer of 0 to 2 M + n is 1 or more and 4 or less.)
 [発明6]
 式(19)で表される繰り返し単位を少なくとも含有する、発明5に記載の高分子化合物。
Figure JPOXMLDOC01-appb-C000025
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
[Invention 6]
The polymer compound according to invention 5, comprising at least a repeating unit represented by formula (19).
Figure JPOXMLDOC01-appb-C000025
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group A represents a substituent, A is a divalent organic group containing one or more selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom; Several hydrogen atoms are alkyl, fluorine, chlorine, fluoro Kill group, a carboxyl group, may .HFIP be substituted by a hydroxy group or a cyano group is -C (CF 3) 2 OH group.)
 [発明7]
 式(6A)で表される繰り返し単位を少なくとも含有する、発明5または6に記載の高分子化合物。
Figure JPOXMLDOC01-appb-C000026
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
[Invention 7]
The polymer compound according to invention 5 or 6, comprising at least a repeating unit represented by formula (6A).
Figure JPOXMLDOC01-appb-C000026
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) 1 represents a substituent selected from the group consisting of phenyl group, methoxy group and nitro group, A is a divalent organic group containing one or more selected from alicyclic, aromatic and alkylene groups, and oxygen May contain atoms, sulfur atoms, or nitrogen atoms, and any number of hydrogen atoms may be substituted with alkyl groups, fluorine atoms, chlorine atoms, fluoroalkyl groups, carboxyl groups, hydroxy groups, or cyano groups HFIP represents a —C (CF 3 ) 2 OH group.)
 [発明8]
 式(9)で表される繰り返し単位を少なくとも含有する高分子化合物。
Figure JPOXMLDOC01-appb-C000027
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフッ素化アルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
[Invention 8]
A polymer compound containing at least a repeating unit represented by formula (9).
Figure JPOXMLDOC01-appb-C000027
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluorinated alkyl having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) 1 represents a substituent selected from the group consisting of a group, a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, or a biphenyl group. , Sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group A represents a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom; The number of hydrogen atoms is an alkyl group, a fluorine atom, a chlorine atom, Kill group, a carboxyl group, may be substituted by a hydroxy group or a cyano group.)
 [発明9]
 式(9B)で表される繰り返し単位を少なくとも含有する、発明8に記載の高分子化合物。
Figure JPOXMLDOC01-appb-C000028
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフッ素化アルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
[Invention 9]
The polymer compound according to invention 8, which contains at least a repeating unit represented by formula (9B).
Figure JPOXMLDOC01-appb-C000028
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluorinated alkyl having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) 1 represents a substituent selected from the group consisting of a group, a phenyl group, a methoxy group, and a nitro group, A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, It may contain oxygen, sulfur, or nitrogen atoms, and any number of hydrogen atoms are substituted with alkyl, fluorine, chlorine, fluoroalkyl, carboxyl, hydroxy or cyano groups May be good.)
 [発明10]
 式(7)で表される繰り返し単位を少なくとも含有する高分子化合物。
Figure JPOXMLDOC01-appb-C000029
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
[Invention 10]
A polymer compound containing at least a repeating unit represented by formula (7).
Figure JPOXMLDOC01-appb-C000029
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl Optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2; m + n is 1 or more and 4 or less.)
 [発明11]
 式(7A)で表される繰り返し単位を少なくとも含有する、発明10に記載の高分子化合物。
Figure JPOXMLDOC01-appb-C000030
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
[Invention 11]
The polymer compound according to invention 10, comprising at least a repeating unit represented by formula (7A).
Figure JPOXMLDOC01-appb-C000030
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl And optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group.)
 [発明12]
 式(7B)で表される繰り返し単位を少なくとも含有する、発明10または11に記載の高分子化合物。
Figure JPOXMLDOC01-appb-C000031
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
[Invention 12]
The polymer compound according to invention 10 or 11, comprising at least a repeating unit represented by formula (7B).
Figure JPOXMLDOC01-appb-C000031
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) R 5 represents a tetravalent organic group containing one or more substituents selected from the group consisting of a phenyl group, a methoxy group and a nitro group, wherein R 5 is one or more selected from an alicyclic ring, an aromatic ring and an alkylene group; Fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom may be contained, and any number of hydrogen atoms may be substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano group HFIP represents a —C (CF 3 ) 2 OH group.)
 [発明13]
 式(8)で表される繰り返し単位を少なくとも含有する高分子化合物。
Figure JPOXMLDOC01-appb-C000032
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
[Invention 13]
A polymer compound containing at least a repeating unit represented by formula (8).
Figure JPOXMLDOC01-appb-C000032
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl Optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2; m + n is 1 or more and 4 or less.)
 [発明14]
 式(8A)で表される繰り返し単位を少なくとも含有する、発明13に記載の高分子化合物。
Figure JPOXMLDOC01-appb-C000033
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
[Invention 14]
The polymer compound according to invention 13, comprising at least a repeating unit represented by formula (8A).
Figure JPOXMLDOC01-appb-C000033
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl And optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group.)
 [発明15]
 式(8B)で表される繰り返し単位を少なくとも含有する、発明13または14に記載の高分子化合物。
Figure JPOXMLDOC01-appb-C000034
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
[Invention 15]
The polymer compound according to invention 13 or 14, comprising at least a repeating unit represented by formula (8B).
Figure JPOXMLDOC01-appb-C000034
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) R 5 represents a tetravalent organic group containing one or more substituents selected from the group consisting of a phenyl group, a methoxy group and a nitro group, wherein R 5 is one or more selected from an alicyclic ring, an aromatic ring and an alkylene group; Fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom may be contained, and any number of hydrogen atoms may be substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano group HFIP represents a —C (CF 3 ) 2 OH group.)
 [発明16]
 発明5~9のいずれかに記載の高分子化合物であって、2価の有機基Aが、式(25)~(29)から選ばれる1種以上であることを特徴とする高分子化合物。
Figure JPOXMLDOC01-appb-C000035
(式中、波線と交差する線分は結合位置を表す。)
[Invention 16]
The polymer compound according to any one of Inventions 5 to 9, wherein the divalent organic group A is at least one selected from the formulas (25) to (29).
Figure JPOXMLDOC01-appb-C000035
(In the formula, the line that intersects the wavy line represents the coupling position.)
 [発明17]
 発明10~15のいずれかに記載の高分子化合物であって、R5が、式(30)~(35)から選ばれる1種以上であることを特徴とする高分子化合物。
Figure JPOXMLDOC01-appb-C000036
(式中、波線と交差する線分は結合位置を表す。)
[Invention 17]
The polymer compound according to any one of Inventions 10 to 15, wherein R 5 is one or more selected from formulas (30) to (35).
Figure JPOXMLDOC01-appb-C000036
(In the formula, the line that intersects the wavy line represents the coupling position.)
 本発明により、HFIP基含有フルオレンジアミンを提供することが可能である。さらに、本発明により、HFIP基含有フルオレンジアミンから合成されるポリアミド化合物、ポリイミド化合物、ポリベンゾオキサゾール類似構造を有する含フッ素複素環含有高分子化合物を提供することが可能である。 According to the present invention, it is possible to provide an HFIP group-containing fluorenediamine. Furthermore, according to the present invention, it is possible to provide a polyamide compound, a polyimide compound, and a fluorine-containing heterocyclic-containing polymer compound having a polybenzoxazole-like structure synthesized from HFIP group-containing fluorenediamine.
 以下、本発明について説明するが、本発明は以下の実施態様に限定されるものではない。 Hereinafter, the present invention will be described, but the present invention is not limited to the following embodiments.
 本明細書において、フルオレン構造を有する芳香族ジアミン化合物のうち、下記式(1)で表される9,9-ビス(4-アミノフェニル)フルオレンを「フルオレンジアミン」と呼び、「フルオレンジアミン」は置換基を有していてもよい。
Figure JPOXMLDOC01-appb-C000037
但し、HFIP基を置換基として有する場合には、「HFIP基含有フルオレンジアミン」として区別して呼ぶ。
In the present specification, among aromatic diamine compounds having a fluorene structure, 9,9-bis (4-aminophenyl) fluorene represented by the following formula (1) is referred to as “fluor orange amine”. It may have a substituent.
Figure JPOXMLDOC01-appb-C000037
However, when it has a HFIP group as a substituent, it distinguishes and calls as "HFIP group containing fluorene amine".
 本発明に係るHFIP基含有フルオレンジアミン、およびHFIP基含有フルオレンジアミンを単量体として、重合反応によって得られるポリアミド化合物、ポリイミド化合物、ポリベンゾオキサゾール類似構造を有する含フッ素複素環含有高分子化合物の順に沿って説明する。 HFIP group-containing fluoreneamine according to the present invention, HFIP group-containing fluoreneamine as monomers, polyamide compound obtained by polymerization reaction, polyimide compound, fluorine-containing heterocyclic ring-containing polymer compound having a polybenzoxazole-like structure in this order It explains along.
 <HFIP基含有フルオレンジアミン>
 本発明にかかるHFIP基含有フルオレンジアミンは、式(2)で表される。
Figure JPOXMLDOC01-appb-C000038
(式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
<HFIP group-containing full orange amine>
The HFIP group-containing fluorenediamine according to the present invention is represented by the formula (2).
Figure JPOXMLDOC01-appb-C000038
(Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group Represents a substituent, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2, and m + n is from 1 to 4.
 式(2)で表されるHFIP基含有フルオレンジアミン(以下、「HFIP基含有フルオレンジアミン(2)」と表すことがある。)のうち、式(3-1)、(3-2)で表されるHFIP基含有フルオレンジアミンが好ましい。
Figure JPOXMLDOC01-appb-C000039
(式中、R1、R2およびHFIPは式(2)と同義を表す。)
Of the HFIP group-containing fluorenediamine represented by the formula (2) (hereinafter sometimes referred to as “HFIP group-containing fluorenediamine (2)”), the compounds represented by the formulas (3-1) and (3-2) HFIP group-containing fluorenediamine is preferred.
Figure JPOXMLDOC01-appb-C000039
(In the formula, R 1 , R 2 and HFIP have the same meaning as in formula (2).)
 炭素数1~4のアルキル基としては、具体的には、メチル基、エチル基、プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、tert-ブチル基が挙げられる。 Specific examples of the alkyl group having 1 to 4 carbon atoms include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, and a tert-butyl group.
 任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基としては、トリフルオロメチル基、ペルフルオロエチル基、ペルフルオロプロピル基、ペルフルオロイソプロピル基、ペルフルオロブチル基、ペルフルオロsec-ブチル基、ペルフルオロtert-ブチル基などが挙げられる。 Examples of the fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms include trifluoromethyl group, perfluoroethyl group, perfluoropropyl group, perfluoroisopropyl group, perfluorobutyl group, perfluorosec-butyl Group, perfluoro tert-butyl group and the like.
 HFIP基含有フルオレンジアミンは、具体的には、下記式(4-1)~(4-12)で表される化合物などが挙げられる。
Figure JPOXMLDOC01-appb-C000040
(式中、R3は水素原子または炭素数1~4のアルキル基を表す。Meはメチル基を表す。Phはフェニル基を表す。HFIPは式(2)と同義を表す。)
中でも、HFIP基含有フルオレンジアミンの合成原料となるフルオレンジアミンの入手の容易性から、一般式(4-1)、(4-2)で表されるHFIP基含有フルオレンジアミンが特に好ましい。
Specific examples of the HFIP group-containing fluorenediamine include compounds represented by the following formulas (4-1) to (4-12).
Figure JPOXMLDOC01-appb-C000040
(In the formula, R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group. HFIP has the same meaning as in formula (2).)
Among them, the HFIP group-containing fluorenediamines represented by the general formulas (4-1) and (4-2) are particularly preferable because of the availability of fluoreneamine as a raw material for synthesizing the HFIP group-containing fluorenediamine.
 本発明にかかるHFIP基含有フルオレンジアミン(2)は、式(5)で表されるフルオレンジアミン(以下、「フルオレンジアミン」(5)と表すことがある。)を、ヘキサフルオロアセトンまたはヘキサフルオロアセトン・三水和物と反応させることで得られる(特許文献5、6、7参照)。
Figure JPOXMLDOC01-appb-C000041
(式(5)中、R1、R2は式(2)と同義を表す。)
The HFIP group-containing fluorenediamine (2) according to the present invention is obtained by replacing fluorediamine represented by the formula (5) (hereinafter sometimes referred to as “fluorangeamine” (5)) with hexafluoroacetone or hexafluoroacetone. -It is obtained by making it react with a trihydrate (refer patent document 5, 6, 7).
Figure JPOXMLDOC01-appb-C000041
(In formula (5), R 1 and R 2 have the same meaning as in formula (2).)
 本反応は無溶媒でも行うことができるが、溶媒を使用することもできる。使用される溶媒としては、反応に関与しないものなら特に制限は無いが、キシレン、トルエン、ベンゼン、アニソール、ジフェニルエーテル、ニトロベンゼン、ベンゾニトリルなどの芳香族炭化水素類または水が好ましい。使用する溶媒の量には特に制限が無いが、多量に使用することは容積あたりの収量が減少するので好ましくない。 This reaction can be carried out without solvent, but a solvent can also be used. The solvent used is not particularly limited as long as it does not participate in the reaction, but is preferably an aromatic hydrocarbon such as xylene, toluene, benzene, anisole, diphenyl ether, nitrobenzene, benzonitrile, or water. The amount of the solvent to be used is not particularly limited, but it is not preferable to use a large amount because the yield per volume decreases.
 本反応において、使用する反応器は特に限定されないが、密封反応器(オートクレーブ)を使用して行う場合には、ヘキサフルオロアセトンとヘキサフルオロアセトン・三水和物のいずれを用いるかによって態様が異なる。ヘキサフルオロアセトンを用いる場合には最初にフルオレンジアミン(5)と、必要に応じて触媒および/または溶媒を反応器内に仕込む。次いで、反応器内圧が0.5MPaを越えないように、温度を上げつつ、ヘキサフルオロアセトンを逐次導入していくことが好ましい。 In this reaction, the reactor to be used is not particularly limited. However, when a sealed reactor (autoclave) is used, the mode differs depending on whether hexafluoroacetone or hexafluoroacetone trihydrate is used. . In the case of using hexafluoroacetone, first, fluorenediamine (5) and, if necessary, a catalyst and / or a solvent are charged into the reactor. Subsequently, it is preferable to introduce hexafluoroacetone successively while raising the temperature so that the internal pressure of the reactor does not exceed 0.5 MPa.
 ヘキサフルオロアセトン・三水和物を用いる場合には、最初にフルオレンジアミン(5)と必要量のヘキサフルオロアセトン・三水和物を仕込むことが可能であり、さらに必要に応じて触媒および/または溶媒を反応器内に仕込んで反応を行うことができる。 When hexafluoroacetone trihydrate is used, it is possible to initially charge fluorenediamine (5) and the required amount of hexafluoroacetone trihydrate, and if necessary, a catalyst and / or The reaction can be carried out by charging the solvent into the reactor.
 本反応の反応時間に特別な制限はないが、温度や、用いる触媒の量等に依存して最適の反応時間は異なる。従って、ガスクロマトグラフィーなど、汎用の分析手段により、反応の進行状況を測定しつつ反応を実施し、原料が十分消費されたことを確認した後、本工程を終了することが好ましい。 反応終了後、抽出、蒸留、晶析などの通常の手段により、HFIP基含有フルオレンジアミン(2)を得ることができる。また、必要によりカラムクロマトグラフィー、再結晶などにより精製することもできる。 The reaction time of this reaction is not particularly limited, but the optimum reaction time varies depending on the temperature and the amount of catalyst used. Therefore, it is preferable to complete this step after confirming that the raw material has been sufficiently consumed by carrying out the reaction while measuring the progress of the reaction by a general-purpose analysis means such as gas chromatography. After completion of the reaction, the HFIP group-containing fluorenediamine (2) can be obtained by ordinary means such as extraction, distillation, and crystallization. Moreover, it can also refine | purify by column chromatography, recrystallization, etc. as needed.
 <高分子化合物>
 次に、HFIP基含有フルオレンジアミン(2)を単量体として、重合反応によって得られる一般式(6)で表される繰り返し単位を少なくとも含有するポリアミド化合物(以下、「ポリアミド化合物(6)」と表すことがある。)、一般式(7)で表される繰り返し単位を少なくとも含有するポリアミド化合物(以下、「ポリアミド化合物(7)」と表すことがある。)および一般式(8)で表される繰り返し単位を少なくとも含有するポリイミド化合物(以下、「ポリイミド化合物(8)」と表すことがある。)などの高分子化合物について、順に沿って説明する。さらに、一般式(9)で表される繰り返し単位を少なくとも含有するポリベンゾオキサゾール類似構造を有する含フッ素複素環含有高分子化合物(以下、「含フッ素複素環含有高分子化合物(9)」と表すことがある。)についても説明する。
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000045
<Polymer compound>
Next, using a HFIP group-containing fluorenediamine (2) as a monomer, a polyamide compound (hereinafter referred to as “polyamide compound (6)”) containing at least a repeating unit represented by the general formula (6) obtained by a polymerization reaction A polyamide compound containing at least the repeating unit represented by the general formula (7) (hereinafter sometimes referred to as “polyamide compound (7)”) and the general formula (8). A polymer compound such as a polyimide compound containing at least a repeating unit (hereinafter sometimes referred to as “polyimide compound (8)”) will be described in order. Furthermore, the fluorine-containing heterocyclic ring-containing polymer compound having a polybenzoxazole-like structure containing at least the repeating unit represented by the general formula (9) (hereinafter referred to as “fluorinated heterocyclic ring-containing polymer compound (9)”) )).
Figure JPOXMLDOC01-appb-C000042
Figure JPOXMLDOC01-appb-C000043
Figure JPOXMLDOC01-appb-C000044
Figure JPOXMLDOC01-appb-C000045
 [ポリアミド化合物(6)]
 本発明に係るHFIP基含有フルオレンジアミンの高分子化合物のうち、ポリアミド化合物(6)は、HFIP含有フルオレンジアミン(2)を、式(10)、式(11)で表されるカルボン酸またはカルボン酸誘導体と反応させることで得られる。
Figure JPOXMLDOC01-appb-C000046
(式中、R1、R2、HFIP、mおよびnは式(2)と同義を表す。R4はそれぞれ独立に水素原子、炭素数1~10のアルキル基またはベンジル基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。Xはフッ素原子、塩素原子、臭素原子またはヨウ素原子を表す。)
[Polyamide compound (6)]
Among the HFIP group-containing fluorenediamine polymer compounds according to the present invention, the polyamide compound (6) is an HFIP-containing fluorenediamine (2), a carboxylic acid or a carboxylic acid represented by formula (10) or formula (11). It can be obtained by reacting with a derivative.
Figure JPOXMLDOC01-appb-C000046
(Wherein R 1 , R 2 , HFIP, m and n are as defined in formula (2). R 4 independently represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or a benzyl group. It is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group, may contain an oxygen atom, a sulfur atom or a nitrogen atom, and any number of hydrogen atoms is an alkyl group, (It may be substituted with a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and X represents a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.)
 一般式(10)、(11)で表されるジカルボン酸またはジカルボン酸誘導体は、脂肪族ジカルボン酸、芳香族ジカルボン酸またはこれらのジカルボン酸誘導体のいずれを用いてもよい。 As the dicarboxylic acid or dicarboxylic acid derivative represented by the general formulas (10) and (11), any of aliphatic dicarboxylic acid, aromatic dicarboxylic acid, or these dicarboxylic acid derivatives may be used.
 脂肪族ジカルボン酸とその誘導体としては、例えば、シュウ酸、マロン酸、コハク酸、グルタル酸、アジピン酸、ピメリン酸、スベリン酸、アゼライン酸、セバシン酸のジカルボン酸化合物またはこれらのジカルボン酸誘導体が挙げられる。 Examples of the aliphatic dicarboxylic acid and derivatives thereof include oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, dicarboxylic acid compounds of sebacic acid or their dicarboxylic acid derivatives. It is done.
 芳香族ジカルボン酸とその誘導体としては、例えば、フタル酸、イソフタル酸、テレフタル酸、4,4’-ジカルボキシビフェニル、3,3’-ジカルボキシビフェニル、3,3’-ジカルボキシルジフェニルエーテル、3,4’-ジカルボキシルジフェニルエーテル、4,4’-ジカルボキシルジフェニルエーテル、3,3’-ジカルボキシルジフェニルメタン、3,4’-ジカルボキシルジフェニルメタン、4,4’-ジカルボキシルジフェニルメタン、3,3’-ジカルボキシルジフェニルジフルオロメタン、3,4’-ジカルボキシルジフェニルジフルオロメタン、4,4’-ジカルボキシルジフェニルジフルオロメタン、3,3’-ジカルボキシルジフェニルスルホン、3,4’-ジカルボキシルジフェニルスルホン、4,4’-ジカルボキシルジフェニルスルホン、3,3’-ジカルボキシルジフェニルスルフィド、3,4’-ジカルボキシルジフェニルスルフィド、4,4’-ジカルボキシルジフェニルスルフィド、3,3’-ジカルボキシルジフェニルケトン、3,4’-ジカルボキシルジフェニルケトン、4,4’-ジカルボキシルジフェニルケトン、2,2-ビス(3-カルボキシフェニル)プロパン、2,2-ビス(3,4’-ジカルボキシフェニル)プロパン、2,2-ビス(4-カルボキシフェニル)プロパン、2,2-ビス(3-カルボキシフェニル)ヘキサフルオロプロパン、2,2-ビス(3,4’-ジカルボキシフェニル)ヘキサフルオロプロパン、2,2-ビス(4-カルボキシフェニル)ヘキサフルオロプロパン、1,3-ビス(3-カルボキシフェノキシ)ベンゼン、1,4-ビス(3-カルボキシフェノキシ)ベンゼン、1,4-ビス(4-カルボキシフェノキシ)ベンゼン、3,3’-(1,4-フェニレンビス(1-メチルエチリデン))ビス安息香酸、3,4’-(1,4-フェニレンビス(1-メチルエチリデン))ビス安息香酸、4,4’-(1,4-フェニレンビス(1-メチルエチリデン))ビス安息香酸、2,2-ビス(4-(3-カルボキシフェノキシ)フェニル)プロパン、2,2-ビス(4-(4-カルボキシフェノキシ)フェニル)プロパン、2,2-ビス(4-(3-カルボキシフェノキシ)フェニル)ヘキサフルオロプロパン、2,2-ビス(4-(4-カルボキシフェノキシ)フェニル)ヘキサフルオロプロパン、ビス(4-(3-カルボキシフェノキシ)フェニル)スルフィド、ビス(4-(4-カルボキシフェノキシ)フェニル)スルフィド、ビス(4-(3-カルボキシフェノキシ)フェニル)スルホンまたはビス(4-(4-カルボキシフェノキシ)フェニル)スルホン、パーフルオロノネニルオキシ基含有のジカルボン酸である5-(パーフルオロノネニルオキシ)イソフタル酸、4-(パーフルオロノネニルオキシ)フタル酸、2-(パーフルオロノネニルオキシ)テレフタル酸または4-メトキシ-5-(パーフルオロノネニルオキシ)イソフタル酸、パーフルオロヘキセニルオキシ基含有のジカルボン酸である、5-(パーフルオロヘキセニルオキシ)イソフタル酸、4-(パーフルオロヘキセニルオキシ)フタル酸、2-(パーフルオロヘキセニルオキシ)テレフタル酸または4-メトキシ-5-(パーフルオロヘキセニルオキシ)イソフタル酸、2,2’-ジートリフルオロメチル-4,4’-ジカルボキシビフェニルまたはこれらのジカルボン酸誘導体が挙げられる。 Examples of aromatic dicarboxylic acids and derivatives thereof include phthalic acid, isophthalic acid, terephthalic acid, 4,4′-dicarboxybiphenyl, 3,3′-dicarboxybiphenyl, 3,3′-dicarboxyldiphenyl ether, 3, 4'-dicarboxyldiphenyl ether, 4,4'-dicarboxyldiphenyl ether, 3,3'-dicarboxyldiphenylmethane, 3,4'-dicarboxyldiphenylmethane, 4,4'-dicarboxyldiphenylmethane, 3,3'-dicarboxyl Diphenyldifluoromethane, 3,4'-dicarboxyldiphenyldifluoromethane, 4,4'-dicarboxyldiphenyldifluoromethane, 3,3'-dicarboxyldiphenylsulfone, 3,4'-dicarboxyldiphenylsulfone, 4,4 ' Dicarboxyl diphenyl sulfone, 3,3′-dicarboxyl diphenyl sulfide, 3,4′-dicarboxyl diphenyl sulfide, 4,4′-dicarboxyl diphenyl sulfide, 3,3′-dicarboxyl diphenyl ketone, 3,4′- Dicarboxyl diphenyl ketone, 4,4'-dicarboxyl diphenyl ketone, 2,2-bis (3-carboxyphenyl) propane, 2,2-bis (3,4'-dicarboxyphenyl) propane, 2,2-bis (4-carboxyphenyl) propane, 2,2-bis (3-carboxyphenyl) hexafluoropropane, 2,2-bis (3,4'-dicarboxyphenyl) hexafluoropropane, 2,2-bis (4- Carboxyphenyl) hexafluoropropane, 1,3-bis (3-carboxy Boxyphenoxy) benzene, 1,4-bis (3-carboxyphenoxy) benzene, 1,4-bis (4-carboxyphenoxy) benzene, 3,3 ′-(1,4-phenylenebis (1-methylethylidene) ) Bisbenzoic acid, 3,4 ′-(1,4-phenylenebis (1-methylethylidene)) bisbenzoic acid, 4,4 ′-(1,4-phenylenebis (1-methylethylidene)) bisbenzoic acid 2,2-bis (4- (3-carboxyphenoxy) phenyl) propane, 2,2-bis (4- (4-carboxyphenoxy) phenyl) propane, 2,2-bis (4- (3-carboxyphenoxy) ) Phenyl) hexafluoropropane, 2,2-bis (4- (4-carboxyphenoxy) phenyl) hexafluoropropane, bis (4- (3-carboxy) Ciphenoxy) phenyl) sulfide, bis (4- (4-carboxyphenoxy) phenyl) sulfide, bis (4- (3-carboxyphenoxy) phenyl) sulfone or bis (4- (4-carboxyphenoxy) phenyl) sulfone, per 5- (perfluorononenyloxy) isophthalic acid, 4- (perfluorononenyloxy) phthalic acid, 2- (perfluorononenyloxy) terephthalic acid or 4-methoxy which is a dicarboxylic acid containing a fluorononenyloxy group -5- (perfluorononenyloxy) isophthalic acid, a dicarboxylic acid containing a perfluorohexenyloxy group, 5- (perfluorohexenyloxy) isophthalic acid, 4- (perfluorohexenyloxy) phthalic acid, 2- ( Perfluorohexenyloxy) tele Tal acid or 4-methoxy-5- (perfluoroalkyl hexenyloxy) isophthalic acid, 2,2'-di-trifluoromethyl-4,4'-dicarboxylate biphenyl or their dicarboxylic acid derivatives.
 中でも入手の容易さ、縮重合反応のし易さ、および重合物が透明性に優れることから、テレフタル酸、イソフタル酸、4,4’-ジカルボキシビフェニル、2,2’-ジトリフルオロメチル-4,4’-ジカルボキシビフェニル、2,2-ビス(4-カルボキシフェニル)ヘキサフルオロプロパンが好ましい。 Among these, terephthalic acid, isophthalic acid, 4,4′-dicarboxybiphenyl, 2,2′-ditrifluoromethyl-4 are easy to obtain, easy to polycondensation reaction, and excellent in transparency. 4,4′-dicarboxybiphenyl and 2,2-bis (4-carboxyphenyl) hexafluoropropane are preferred.
 ポリアミド化合物(6)のうち、下記式(12-1)~(12-5)のいずれかで表される繰り返し単位を少なくとも含有するポリアミド化合物が好ましい。
Figure JPOXMLDOC01-appb-C000047
(式中、R1、R2およびHFIPは式(2)と同義を表す。)
具体的には、下記式(13-1)~(13-10)のいずれかで表される繰り返し単位を少なくとも含有するポリアミド化合物が挙げられる。
Figure JPOXMLDOC01-appb-C000048
(式中、R3は、水素原子または炭素数1~4のアルキル基を表す。Meはメチル基を表す。Phはフェニル基を表す。HFIPは式(2)と同義を表す。)
Of the polyamide compounds (6), a polyamide compound containing at least a repeating unit represented by any of the following formulas (12-1) to (12-5) is preferable.
Figure JPOXMLDOC01-appb-C000047
(In the formula, R 1 , R 2 and HFIP have the same meaning as in formula (2).)
Specifically, a polyamide compound containing at least a repeating unit represented by any of the following formulas (13-1) to (13-10) can be given.
Figure JPOXMLDOC01-appb-C000048
(In the formula, R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group. HFIP has the same meaning as in formula (2).)
 中でも、HFIP基含有フルオレンジアミンの合成原料となるフルオレンジアミンの入手の容易性から、式(13-1)~(13-5)のいずれかで表される繰り返し単位を少なくとも含有するポリアミド化合物が特に好ましい。 Among these, a polyamide compound containing at least a repeating unit represented by any one of the formulas (13-1) to (13-5) is particularly preferred because of the availability of fluoreneamine as a raw material for the synthesis of HFIP group-containing fluoreneamine. preferable.
 ポリアミド化合物(6)の重量平均分子量は、好ましくは10,000以上であり、より好ましくは20,000以上である。当該重量平均分子量の上限は、500,000以下が好ましく、300,000以下がさらに好ましい。重量平均分子量が10,000未満だと、得られる高分子膜の強度が乏しい。重量平均分子量が500,000超だと、得られる高分子溶液の粘度が高くなりすぎて取り扱いが難しくなる。ここでいう重量平均分子量は、ゲルパーミエーションクロマトグラフィー(以下、「GPC」と表すことがある。)分析により、標準ポリスチレン基準の換算値として求められるものである(本願において以下同じ。)。当該分析の詳細な分析条件は、本願の実施例で記述する。 The weight average molecular weight of the polyamide compound (6) is preferably 10,000 or more, more preferably 20,000 or more. The upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less. When the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor. When the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult. The weight average molecular weight here is determined as a converted value based on standard polystyrene by gel permeation chromatography (hereinafter sometimes referred to as “GPC”) analysis (the same applies hereinafter). Detailed analysis conditions for the analysis are described in the examples of the present application.
 ポリアミド化合物(6)の合成方法については、特に制限されず、ジアミン化合物とカルボン酸化合物またはその誘導体からポリアミド化合物を合成するための公知の方法を採用できる。例えば、HFIP基含有フルオレンジアミン(2)と、一般式(10)、(11)で表されるジカルボン酸またはジカルボン酸誘導体を有する組成物を、150℃以上で相互に溶融させて無溶媒で縮重合反応させる方法、溶媒中にて150℃以上で縮重合反応させる方法、-20~80℃の温度で溶媒中にて重合反応させる方法などが挙げられる。 The method for synthesizing the polyamide compound (6) is not particularly limited, and a known method for synthesizing a polyamide compound from a diamine compound and a carboxylic acid compound or a derivative thereof can be employed. For example, a composition having HFIP group-containing fluorenediamine (2) and a dicarboxylic acid or dicarboxylic acid derivative represented by the general formulas (10) and (11) is melted together at 150 ° C. or higher and condensed without solvent. Examples thereof include a polymerization reaction method, a condensation polymerization reaction in a solvent at 150 ° C. or higher, and a polymerization reaction in a solvent at a temperature of −20 to 80 ° C.
 ポリアミド化合物(6)の合成において、溶媒を用いることができる。用いる溶媒としては、反応基質が溶解し、また反応温度において凍結しなければ特に限定されず、例えば、アミド類、芳香族類、ハロゲン類、ラクトン類などの溶媒が挙げられる。具体的には、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、ヘキサメチルリン酸トリアミド、N-メチル-2-ピロリドン、ベンゼン、アニソール、ジフェニルエーテル、ニトロベンゼン、ベンゾニトリル、クロロホルム、ジクロロメタン、1,2-ジクロロエタン、1,1,2,2-テトラクロロエタン、γ-ブチロラクトン、γ-バレロラクトン、δ-バレロラクトン、γ-カプロラクトン、ε-カプロラクトン、α-メチル-γ-ブチロラクトンなどが使用できる。これらの溶媒は、単独でも2種以上の混合液として使用されてもよい。 In the synthesis of the polyamide compound (6), a solvent can be used. The solvent to be used is not particularly limited as long as the reaction substrate dissolves and does not freeze at the reaction temperature, and examples thereof include amides, aromatics, halogens, lactones and the like. Specifically, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylformamide, hexamethylphosphoric triamide, N-methyl-2-pyrrolidone, benzene, anisole, diphenyl ether, nitrobenzene, benzonitrile , Chloroform, dichloromethane, 1,2-dichloroethane, 1,1,2,2-tetrachloroethane, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone, α-methyl-γ- Butyrolactone can be used. These solvents may be used alone or as a mixture of two or more.
 さらに、これらの溶媒とともに、ピリジン、トリエチルアミンなどの酸受容体を共存させて反応を行うことが効果的である。 Furthermore, it is effective to carry out the reaction in the presence of acid acceptors such as pyridine and triethylamine together with these solvents.
 [ポリアミド化合物(7)]
 さらに、本発明に係るHFIP基含有フルオレンジアミンの高分子化合物のうち、ポリアミド化合物(7)は、HFIP含有フルオレンジアミン(2)を、式(14)で表されるテトラカルボン酸二無水物と反応させることで得られる。
Figure JPOXMLDOC01-appb-C000049
(式中、R1、R2、HFIP、mおよびnは式(2)と同義を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
[Polyamide compound (7)]
Furthermore, among the HFIP group-containing fluorinated amine polymer compounds according to the present invention, the polyamide compound (7) reacts the HFIP-containing fluorenediamine (2) with the tetracarboxylic dianhydride represented by the formula (14). Can be obtained.
Figure JPOXMLDOC01-appb-C000049
(Wherein R 1 , R 2 , HFIP, m and n are as defined in formula (2). R 5 is a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group. Yes, it may contain fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom, and any number of hydrogen atoms are substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano group May be.)
 一般式(14)で表されるテトラカルボン酸二無水物としては、R5において、脂肪族、脂環、芳香族のいずれかの構造を持つものを用いることができる。具体的には、ベンゼンテトラカルボン酸二無水物(ピロメリット酸二無水物)、トリフルオロメチルベンゼンテトラカルボン酸二無水物、ビストリフルオロメチルベンゼンテトラカルボン酸二無水物、ジフルオロベンゼンテトラカルボン酸二無水物、ナフタレンテトラカルボン酸二無水化物、ビフェニルテトラカルボン酸二無水物、ターフェニルテトラカルボン酸二無水物、1,1-ビス(3,4-ジカルボキシフェニル)ケトン酸二無水物、オキシジフタル酸二無水物、ビシクロ(2,2,2)オクト-7-エン-2,3,5,6-テトラカルボン酸二無水物、2,2-ビス(3,4-ジカルボキシフェニル)ヘキサフルオロプロパン酸二無水物、2,3,4,5-チオフェンテトラカルボン酸二無水化物、2,5,6,2≡,5≡,6≡-ヘキサフルオロ-3,3’,4,4’-ビフェニルテトラカルボン酸二無水化物、ビス(3,4-ジカルボキシフェニル)スルホン酸二無水化物、3,4,9,10-ペリレンテトラカルボン酸二無水化物が挙げられ、これらを2種以上併用することもできる。 As the tetracarboxylic dianhydride represented by the general formula (14), those having any of aliphatic, alicyclic and aromatic structures in R 5 can be used. Specifically, benzenetetracarboxylic dianhydride (pyromellitic dianhydride), trifluoromethylbenzenetetracarboxylic dianhydride, bistrifluoromethylbenzenetetracarboxylic dianhydride, difluorobenzenetetracarboxylic dianhydride , Naphthalenetetracarboxylic dianhydride, biphenyltetracarboxylic dianhydride, terphenyltetracarboxylic dianhydride, 1,1-bis (3,4-dicarboxyphenyl) ketonic dianhydride, oxydiphthalic acid Anhydride, bicyclo (2,2,2) oct-7-ene-2,3,5,6-tetracarboxylic dianhydride, 2,2-bis (3,4-dicarboxyphenyl) hexafluoropropanoic acid Dianhydride, 2,3,4,5-thiophenetetracarboxylic dianhydride, 2,5,6,2≡, 5≡, 6≡ Hexafluoro-3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, bis (3,4-dicarboxyphenyl) sulfonic acid dianhydride, 3,4,9,10-perylenetetracarboxylic acid dianhydride Anhydrides may be mentioned, and two or more of these may be used in combination.
 ポリアミド化合物(7)のうち、下記式(15-1)~(15-6)で表されるいずれかの繰り返し単位を少なくとも含有するポリアミド化合物が好ましい。
Figure JPOXMLDOC01-appb-C000050
(式中、R1、R2およびHFIPは式(2)と同義を表す。)
具体的には、下記式(16-1)~(16-12)で表されるいずれかの繰り返し単位を少なくとも含有するポリアミド化合物などが挙げられる。
Figure JPOXMLDOC01-appb-C000051
(式中、R3は、水素原子または炭素数1~4のアルキル基を表す。Meはメチル基を表す。Phはフェニル基を表す。HFIPは式(2)と同義を表す。)
Of the polyamide compounds (7), polyamide compounds containing at least any of the repeating units represented by the following formulas (15-1) to (15-6) are preferable.
Figure JPOXMLDOC01-appb-C000050
(In the formula, R 1 , R 2 and HFIP have the same meaning as in formula (2).)
Specific examples include polyamide compounds containing at least any of the repeating units represented by the following formulas (16-1) to (16-12).
Figure JPOXMLDOC01-appb-C000051
(In the formula, R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group. HFIP has the same meaning as in formula (2).)
 中でも、HFIP基含有フルオレンジアミンの合成原料となるフルオレンジアミンの入手の容易性から、式(16-1)~(16-6)で表されるいずれかの繰り返し単位を少なくとも含有するポリアミド化合物が、特に好ましい。 Among these, polyamide compounds containing at least any one of the repeating units represented by the formulas (16-1) to (16-6) are obtained because of the availability of fluorenediamine as a raw material for the synthesis of HFIP group-containing fluorenediamine, Particularly preferred.
 ポリアミド化合物(7)の重量平均分子量は、好ましくは10,000以上であり、より好ましくは20,000以上である。当該重量平均分子量の上限は、500,000以下が好ましく、300,000以下がさらに好ましい。重量平均分子量が10,000未満だと、得られる高分子膜の強度が乏しい。重量平均分子量が500,000超だと、得られる高分子溶液の粘度が高くなりすぎて取り扱いが難しくなる。 The weight average molecular weight of the polyamide compound (7) is preferably 10,000 or more, more preferably 20,000 or more. The upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less. When the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor. When the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult.
 ポリアミド化合物(7)の合成方法については、特に制限されず、例えば、HFIP基含有フルオレンジアミン(2)と、一般式(14)で表されるジカルボン酸誘導体を有する組成物を、150℃以上で相互に溶融させて無溶媒で縮重合反応させる方法、溶媒中にて150℃以上で縮重合反応させる方法、-20~80℃の温度で溶媒中にて重合反応させる方法などが挙げられる。 The method for synthesizing the polyamide compound (7) is not particularly limited, and for example, a composition having a HFIP group-containing fluorenediamine (2) and a dicarboxylic acid derivative represented by the general formula (14) at 150 ° C. or higher. Examples thereof include a method in which they are melted together and subjected to a polycondensation reaction without solvent, a method in which a polycondensation reaction is performed at 150 ° C. or higher in a solvent, and a method in which a polymerization reaction is performed in a solvent at a temperature of −20 to 80 ° C.
 また、ポリアミド化合物(7)の合成において、溶媒を用いることができる。用いる溶媒としては、反応基質が溶解し、また反応温度において凍結しなければ特に限定されず、例えば、アミド類、芳香族類、ハロゲン類、ラクトン類などの溶媒が挙げられる。具体的には、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、ヘキサメチルリン酸トリアミド、N-メチル-2-ピロリドン、ベンゼン、アニソール、ジフェニルエーテル、ニトロベンゼン、ベンゾニトリル、クロロホルム、ジクロロメタン、1,2-ジクロロエタン、1,1,2,2-テトラクロロエタン、γ-ブチロラクトン、γ-バレロラクトン、δ-バレロラクトン、γ-カプロラクトン、ε-カプロラクトン、α-メチル-γ-ブチロラクトンなどが使用できる。これらの溶媒は、単独でも2種以上の混合液として使用されてもよい。 In addition, a solvent can be used in the synthesis of the polyamide compound (7). The solvent to be used is not particularly limited as long as the reaction substrate dissolves and does not freeze at the reaction temperature, and examples thereof include amides, aromatics, halogens, lactones and the like. Specifically, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylformamide, hexamethylphosphoric triamide, N-methyl-2-pyrrolidone, benzene, anisole, diphenyl ether, nitrobenzene, benzonitrile , Chloroform, dichloromethane, 1,2-dichloroethane, 1,1,2,2-tetrachloroethane, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone, α-methyl-γ- Butyrolactone can be used. These solvents may be used alone or as a mixture of two or more.
 [ポリイミド化合物]
 本発明に係るHFIP基含有フルオレンジアミンの高分子化合物のうち、式(8)で表されるポリイミド化合物は、ポリアミド化合物(7)から合成される。
Figure JPOXMLDOC01-appb-C000052
(式中、R1、R2、HFIP、mおよびnは式(2)と同義を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
[Polyimide compound]
Among the HFIP group-containing fluorenediamine polymer compounds according to the present invention, the polyimide compound represented by the formula (8) is synthesized from the polyamide compound (7).
Figure JPOXMLDOC01-appb-C000052
(Wherein R 1 , R 2 , HFIP, m and n are as defined in formula (2). R 5 is a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group. Yes, it may contain fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom, and any number of hydrogen atoms are substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano group May be.)
 ポリイミド化合物(8)のうち、下記式(17-1)~(17-6)で表されるいずれかの繰り返し単位を少なくとも含有するポリイミド化合物が好ましい。
Figure JPOXMLDOC01-appb-C000053
(式中、R1、R2およびHFIPは式(2)と同義を表す。)
具体的には、下記式(18-1)~(18-12)で表されるいずれかの繰り返し単位を少なくとも含有するポリイミド化合物などが挙げられる。
Figure JPOXMLDOC01-appb-C000054
(式中、R3は、水素原子、または炭素数1~4のアルキル基を表す。Meはメチル基を表す。Phはフェニル基を表す。HFIPは式(2)と同義を表す。)
Of the polyimide compound (8), a polyimide compound containing at least any one of the repeating units represented by the following formulas (17-1) to (17-6) is preferable.
Figure JPOXMLDOC01-appb-C000053
(In the formula, R 1 , R 2 and HFIP have the same meaning as in formula (2).)
Specific examples include polyimide compounds containing at least one of the repeating units represented by the following formulas (18-1) to (18-12).
Figure JPOXMLDOC01-appb-C000054
(In the formula, R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group. HFIP has the same meaning as in formula (2).)
 中でも、HFIP基含有フルオレンジアミンの合成原料となるフルオレンジアミンの入手の容易性から、式(18-1)~(18-6)で表されるいずれかの繰り返し単位を少なくとも含有するポリイミド化合物が特に好ましい。 Among these, polyimide compounds containing at least any one of the repeating units represented by formulas (18-1) to (18-6) are particularly preferred because of the availability of fluoreneamine as a raw material for the synthesis of HFIP group-containing fluoreneamine. preferable.
 ポリイミド化合物(8)の重量平均分子量は、好ましくは10,000以上であり、より好ましくは20,000以上である。当該重量平均分子量の上限は、500,000以下が好ましく、300,000以下がさらに好ましい。重量平均分子量が10,000未満だと、得られる高分子膜の強度が乏しい。重量平均分子量が500,000超だと、得られる高分子溶液の粘度が高くなりすぎて取り扱いが難しくなる。 The weight average molecular weight of the polyimide compound (8) is preferably 10,000 or more, more preferably 20,000 or more. The upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less. When the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor. When the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult.
 ポリイミド(8)の合成反応、すなわち、ポリアミド化合物(7)の脱水閉環反応は、加熱するのみ、もしくは、酸や塩基などの添加剤と熱の併用により当該反応が促進する条件により行う。 The synthesis reaction of the polyimide (8), that is, the dehydration cyclization reaction of the polyamide compound (7) is carried out under the condition that the reaction is promoted only by heating or by the combined use of an additive such as acid or base and heat.
 一般的には、ポリアミド化合物(7)の溶液を150℃以上、250℃以下の高温でイミド化し、HFIP基を含むポリイミド溶液に調製することができる。その際、ピリジン、トリエチルアミン、無水酢酸等を添加剤として用いてもよい。溶液中のHFIP基を含むポリイミドの濃度は、5質量%以上、50質量%以下が好ましい。5質量%より少ないと、薄すぎて工業的に実用的ではない。50質量%を超えると溶解し難い。さらに、好ましくは10質量%以上、40質量%以下である。 Generally, the polyamide compound (7) solution can be imidized at a high temperature of 150 ° C. or higher and 250 ° C. or lower to prepare a polyimide solution containing an HFIP group. At that time, pyridine, triethylamine, acetic anhydride or the like may be used as an additive. The concentration of the polyimide containing HFIP groups in the solution is preferably 5% by mass or more and 50% by mass or less. If it is less than 5% by mass, it is too thin to be industrially practical. If it exceeds 50% by mass, it is difficult to dissolve. Furthermore, it is preferably 10% by mass or more and 40% by mass or less.
 ポリアミド化合物(7)の溶液を調製する際に用いる溶媒としては、反応基質が溶解すれば特に限定されず、例えば、アミド系溶媒であるN,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、ヘキサメチルリン酸トリアミドまたはN-メチル-2-ピロリドン、芳香族系溶媒であるベンゼン、アニソール、ジフェニルエーテル、ニトロベンゼンまたはベンゾニトリル、ハロゲン系溶媒であるクロロホルム、ジクロロメタン、1,2-ジクロロエタンまたは1,1,2,2-テトラクロロエタン、ラクトン類であるγ-ブチロラクトン、γ-バレロラクトン、δ-バレロラクトン、γ-カプロラクトン、ε-カプロラクトンまたはα-メチル-γ-ブチロラクトンなどが挙げられる。これらの溶媒は、単独でも2種以上の混合溶媒として使用されてもよい。 The solvent used in preparing the solution of the polyamide compound (7) is not particularly limited as long as the reaction substrate dissolves. For example, N, N-dimethylformamide, N, N-dimethylacetamide, hexa Methylphosphoric triamide or N-methyl-2-pyrrolidone, aromatic solvents benzene, anisole, diphenyl ether, nitrobenzene or benzonitrile, halogenated solvents chloroform, dichloromethane, 1,2-dichloroethane or 1,1,2 , 2-tetrachloroethane, lactones γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone or α-methyl-γ-butyrolactone. These solvents may be used alone or as a mixed solvent of two or more.
 ポリイミド(8)を合成する方法として、ポリアミド化合物(7)の合成直後の反応溶液をそのまま脱水閉環反応に供する方法も適用可能である。この場合、前述の温度範囲、添加剤、濃度、溶媒を使用可能である。 As a method for synthesizing the polyimide (8), a method in which the reaction solution immediately after the synthesis of the polyamide compound (7) is directly subjected to a dehydration cyclization reaction is also applicable. In this case, the above-mentioned temperature range, additive, concentration and solvent can be used.
 [含フッ素複素環含有高分子化合物]
 本発明に係るHFIP基含有フルオレンジアミンの高分子化合物のうち、含フッ素複素環含有高分子化合物(9)は、式(19)で表される繰り返し単位を少なくとも含有するポリアミド化合物(以下、「ポリアミド化合物(19)」と表すことがある。)を脱水環化することで得られる。
Figure JPOXMLDOC01-appb-C000055
(式中、R1、R2およびHFIPは式(2)と同義を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
[Fluorine-containing heterocyclic ring-containing polymer compound]
Among the HFIP group-containing fluoreneamine polymer compounds according to the present invention, the fluorine-containing heterocyclic ring-containing polymer compound (9) is a polyamide compound containing at least a repeating unit represented by the formula (19) (hereinafter “polyamide”). Compound (19) ”may be obtained by dehydrating cyclization.
Figure JPOXMLDOC01-appb-C000055
(In the formula, R 1 , R 2 and HFIP are as defined in formula (2). A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group, It may contain a sulfur atom or a nitrogen atom, and any number of hydrogen atoms may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group. )
 具体的には、以下の反応式に示される脱水環化反応が進行して複素環が形成される。
Figure JPOXMLDOC01-appb-C000056
(式中、Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。波線と交差する線分は結合位置を表す。)
Specifically, the dehydration cyclization reaction shown in the following reaction formula proceeds to form a heterocyclic ring.
Figure JPOXMLDOC01-appb-C000056
(In the formula, A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom, and any number The hydrogen atom may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and the line segment intersecting with the wavy line represents the bonding position.)
 含フッ素複素環含有高分子化合物(9)のうち、下記式(20-1)~(20-5)で表されるいずれかの繰り返し単位を少なくとも含有する含フッ素複素環含有高分子化合物が好ましい。
Figure JPOXMLDOC01-appb-C000057
(式中、R1、R2およびHFIPは式(2)と同義を表す。)
具体的には、下記式(21-1)~(21-10)で表されるいずれかの繰り返し単位を少なくとも含有する含フッ素複素環含有高分子化合物などが挙げられる。
Figure JPOXMLDOC01-appb-C000058
(式中、R3は、水素原子または炭素数1~4のアルキル基を表す。Meはメチル基を表す。Phはフェニル基を表す。)
Of the fluorine-containing heterocyclic ring-containing polymer compound (9), a fluorine-containing heterocyclic ring-containing polymer compound containing at least any one of the repeating units represented by the following formulas (20-1) to (20-5) is preferable. .
Figure JPOXMLDOC01-appb-C000057
(In the formula, R 1 , R 2 and HFIP have the same meaning as in formula (2).)
Specific examples include fluorine-containing heterocyclic ring-containing polymer compounds containing at least any one of the repeating units represented by the following formulas (21-1) to (21-10).
Figure JPOXMLDOC01-appb-C000058
(In the formula, R 3 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Me represents a methyl group. Ph represents a phenyl group.)
 中でも、HFIP基含有フルオレンジアミンの合成原料となるフルオレンジアミンの入手の容易性から、式(21-1)~(21-5)で表されるいずれかの繰り返し単位を少なくとも含有する含フッ素複素環含有高分子化合物が特に好ましい。 Among these, a fluorine-containing heterocyclic ring containing at least any one of the repeating units represented by formulas (21-1) to (21-5) because of the availability of fluoreneamine as a raw material for the synthesis of HFIP group-containing fluorenediamine. The containing polymer compound is particularly preferable.
 含フッ素複素環含有高分子化合物(9)の重量平均分子量は、好ましくは10,000以上であり、より好ましくは20,000以上である。当該重量平均分子量の上限は、500,000以下が好ましく、300,000以下がさらに好ましい。重量平均分子量が10,000未満だと、得られる高分子膜の強度が乏しい。重量平均分子量が500,000超だと、得られる高分子溶液の粘度が高くなりすぎて取り扱いが難しくなる。 The weight average molecular weight of the fluorine-containing heterocyclic ring-containing polymer compound (9) is preferably 10,000 or more, more preferably 20,000 or more. The upper limit of the weight average molecular weight is preferably 500,000 or less, and more preferably 300,000 or less. When the weight average molecular weight is less than 10,000, the strength of the resulting polymer film is poor. When the weight average molecular weight is more than 500,000, the viscosity of the resulting polymer solution becomes too high and handling becomes difficult.
 ポリアミド化合物(19)の脱水環化による含フッ素複素環含有高分子化合物(9)の合成手法としては、加熱、酸触媒、塩基触媒の使用などの反応条件を選択することができる。 As a synthesis method of the fluorine-containing heterocyclic-containing polymer compound (9) by dehydration cyclization of the polyamide compound (19), reaction conditions such as heating, use of an acid catalyst, and a base catalyst can be selected.
 例えば、特許文献6、7に開示されている類似の脱水環化反応における反応条件を準用することができる。 For example, the reaction conditions in the similar dehydration cyclization reaction disclosed in Patent Documents 6 and 7 can be applied mutatis mutandis.
 さらに一例を挙げると、ポリアミド化合物(19)を溶媒中にて150~250℃で加熱することでポリアミド化合物(19)の脱水環化が進行して、含フッ素複素環含有高分子化合物(9)が生成する。その際、反応を効率的に進行させることを目的に、ピリジン、トリエチルアミン、無水酢酸などを加えてもよい。 As another example, the polyamide compound (19) is heated in a solvent at 150 to 250 ° C., whereby the dehydration cyclization of the polyamide compound (19) proceeds, and the fluorine-containing heterocyclic ring-containing polymer compound (9) Produces. At that time, pyridine, triethylamine, acetic anhydride and the like may be added for the purpose of allowing the reaction to proceed efficiently.
 含フッ素複素環含有高分子化合物(9)の合成において、溶媒を用いることができる。用いる溶媒としては、反応基質が溶解し、また反応温度において凍結しなければ特に限定されず、例えば、アミド類、芳香族類、ハロゲン類、ラクトン類などの溶媒が挙げられる。具体的には、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジメチルホルムアミド、ヘキサメチルリン酸トリアミド、N-メチル-2-ピロリドン、ベンゼン、アニソール、ジフェニルエーテル、ニトロベンゼン、ベンゾニトリル、クロロホルム、ジクロロメタン、1,2-ジクロロエタン、1,1,2,2-テトラクロロエタン、γ-ブチロラクトン、γ-バレロラクトン、δ-バレロラクトン、γ-カプロラクトン、ε-カプロラクトン、α-メチル-γ-ブチロラクトンなどが使用できる。これらの溶媒は、単独でも2種以上の混合液として使用されてもよい。さらに、これらの溶媒とともに、ピリジン、トリエチルアミンなどの酸受容体を共存させて反応を行うことが効果的である。 In the synthesis of the fluorine-containing heterocyclic ring-containing polymer compound (9), a solvent can be used. The solvent to be used is not particularly limited as long as the reaction substrate dissolves and does not freeze at the reaction temperature, and examples thereof include amides, aromatics, halogens, lactones and the like. Specifically, N, N-dimethylformamide, N, N-dimethylacetamide, N, N-dimethylformamide, hexamethylphosphoric triamide, N-methyl-2-pyrrolidone, benzene, anisole, diphenyl ether, nitrobenzene, benzonitrile , Chloroform, dichloromethane, 1,2-dichloroethane, 1,1,2,2-tetrachloroethane, γ-butyrolactone, γ-valerolactone, δ-valerolactone, γ-caprolactone, ε-caprolactone, α-methyl-γ- Butyrolactone can be used. These solvents may be used alone or as a mixture of two or more. Furthermore, it is effective to carry out the reaction in the presence of acid acceptors such as pyridine and triethylamine together with these solvents.
 [重合成分]
 また、高分子化合物の耐熱性の改善や所望の有機溶剤への溶解性を得ることを目的として、HFIP基含有フルオレンジアミン(2)から得られるポリアミド化合物(6)、ポリアミド化合物(7)、ポリイミド化合物(8)、含フッ素複素環含有高分子化合物(9)の合成において、HFIP基を含有していないジアミン化合物を重合成分として加えてもよい。
[Polymerization component]
Further, for the purpose of improving the heat resistance of the polymer compound and obtaining solubility in a desired organic solvent, a polyamide compound (6), a polyamide compound (7), a polyimide obtained from the HFIP group-containing fluorenediamine (2) In the synthesis of the compound (8) and the fluorine-containing heterocyclic ring-containing polymer compound (9), a diamine compound not containing an HFIP group may be added as a polymerization component.
 当該ジアミン化合物は、具体的には、3,5-ジアミノベンゾトリフルオリド、2,5-ジアミノベンゾトリフルオリド、3,3’-ビストリフルオロメチル-4,4’-ジアミノビフェニル、2,2’-ビストリフルオロメチル-4,4’-ジアミノビフェニル、3,3’-ビストリフルオロメチル-5,5’-ジアミノビフェニル、ビス(トリフルオロメチル)-4,4’-ジアミノビフェニル、ビス(フッ素化アルキル)-4,4’-ジアミノビフェニル、ジクロロ-4,4’-ジアミノビフェニル、ジブロモ-4,4’-ジアミノビフェニル、ビス(フッ素化アルコキシ)-4,4’-ジアミノビフェニル、ジフェニル-4,4’-ジアミノビフェニル、4,4’-ビス(4-アミノテトラフルオロフェノキシ)テトラフルオロベンゼン、4,4’-ビス(4-アミノテトラフルオロフェノキシ)オクタフルオロビフェニル、4,4’-ビナフチルアミン、o-フェニレンジアミン、m-フェニレンジアミン、p-フェニレンジアミン、2,4-ジアミノトルエン、2,5-ジアミノトルエン、2,4-ジアミノキシレン、2,4-ジアミノジュレン、1,4-キシリレンジアミン、ジメチル-4,4’-ジアミノビフェニル、ジアルキル-4,4’-ジアミノビフェニル、2,2’-ジメチル-4,4’-ジアミノビフェニル、3,3’-ジメチル-4,4’-ジアミノビフェニル、ジメトキシ-4,4’-ジアミノビフェニル、ジエトキシ-4,4’-ジアミノビフェニル、4,4’-ジアミノジフェニルメタン、3,4’-ジアミノジフェニルメタン、2,4’-ジアミノジフェニルメタン、3,3’-ジメチルージアミノジフェニルメタン、3,3’-ジエチルージアミノジフェニルメタン、9、9-ビス(4-アミノフェニル)フルオレン、4,4’-ジアミノジフェニルエーテル、3,4’-ジアミノジフェニルエーテル、2,4’-ジアミノジフェニルエーテル、4,4’-ジアミノジフェニルスルフィド、3,4’-ジアミノジフェニルスルフィド、4,4’-ジアミノジフェニルスルホン、3,3’-ジアミノジフェニルスルホン、4,4’-ジアミノベンゾフェノン、3,3’-ジアミノベンゾフェノン、1,3-ビス(3-アミノフェノキシ)ベンゼン、1,3-ビス(4-アミノフェノキシ)ベンゼン、1,4-ビス(4-アミノフェノキシ)ベンゼン、4,4’-ビス(4-アミノフェノキシ)ビフェニル、ビス(4-(3-アミノフェノキシ)フェニル)スルホン、ビス(4-(4-アミノフェノキシ)フェニル)スルホン、2,2-ビス(4-(4-アミノフェノキシ)フェニル)プロパン、2,2-ビス(4-(4-アミノフェノキシ)フェニル)ヘキサフルオロプロパン、2,2-ビス(4-(3-アミノフェノキシ)フェニル)プロパン、2,2-ビス(4-(3-アミノフェノキシ)フェニル)ヘキサフルオロプロパン、2,2-ビス(4-(4-アミノ-2-トリフルオロメチルフェノキシ)フェニル)ヘキサフルオロプロパン、2,2-ビス(4-(3-アミノ-5-トリフルオロメチルフェノキシ)フェニル)ヘキサフルオロプロパン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパン、2,2-ビス(3-アミノフェニル)ヘキサフルオロプロパン、2,2-ビス(3-アミノ-4-ヒドロキシフェニル)ヘキサフルオロプロパン、2,2-ビス(3-アミノ-4-メチルフェニル)ヘキサフルオロプロパン、4,4’-ビス(4-アミノフェノキシ)オクタフルオロビフェニルまたは4,4’-ジアミノベンズアニリドなどが例示でき、これらを2種以上併用することもできる。 Specifically, the diamine compound includes 3,5-diaminobenzotrifluoride, 2,5-diaminobenzotrifluoride, 3,3′-bistrifluoromethyl-4,4′-diaminobiphenyl, 2,2′- Bistrifluoromethyl-4,4′-diaminobiphenyl, 3,3′-bistrifluoromethyl-5,5′-diaminobiphenyl, bis (trifluoromethyl) -4,4′-diaminobiphenyl, bis (fluorinated alkyl) -4,4'-diaminobiphenyl, dichloro-4,4'-diaminobiphenyl, dibromo-4,4'-diaminobiphenyl, bis (fluorinated alkoxy) -4,4'-diaminobiphenyl, diphenyl-4,4 ' -Diaminobiphenyl, 4,4'-bis (4-aminotetrafluorophenoxy) tetrafluorobe Zen, 4,4′-bis (4-aminotetrafluorophenoxy) octafluorobiphenyl, 4,4′-binaphthylamine, o-phenylenediamine, m-phenylenediamine, p-phenylenediamine, 2,4-diaminotoluene, 2,5-diaminotoluene, 2,4-diaminoxylene, 2,4-diaminodurene, 1,4-xylylenediamine, dimethyl-4,4′-diaminobiphenyl, dialkyl-4,4′-diaminobiphenyl, 2,2′-dimethyl-4,4′-diaminobiphenyl, 3,3′-dimethyl-4,4′-diaminobiphenyl, dimethoxy-4,4′-diaminobiphenyl, diethoxy-4,4′-diaminobiphenyl, 4,4'-diaminodiphenylmethane, 3,4'-diaminodiphenylmethane, 2,4'- Aminodiphenylmethane, 3,3'-dimethyl-diaminodiphenylmethane, 3,3'-diethyl-diaminodiphenylmethane, 9,9-bis (4-aminophenyl) fluorene, 4,4'-diaminodiphenyl ether, 3,4'-diamino Diphenyl ether, 2,4'-diaminodiphenyl ether, 4,4'-diaminodiphenyl sulfide, 3,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, 3,3'-diaminodiphenyl sulfone, 4,4 ' -Diaminobenzophenone, 3,3'-diaminobenzophenone, 1,3-bis (3-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,4-bis (4-aminophenoxy) benzene 4,4′-bis (4-aminophen Enoxy) biphenyl, bis (4- (3-aminophenoxy) phenyl) sulfone, bis (4- (4-aminophenoxy) phenyl) sulfone, 2,2-bis (4- (4-aminophenoxy) phenyl) propane, 2,2-bis (4- (4-aminophenoxy) phenyl) hexafluoropropane, 2,2-bis (4- (3-aminophenoxy) phenyl) propane, 2,2-bis (4- (3-amino) Phenoxy) phenyl) hexafluoropropane, 2,2-bis (4- (4-amino-2-trifluoromethylphenoxy) phenyl) hexafluoropropane, 2,2-bis (4- (3-amino-5-tri) Fluoromethylphenoxy) phenyl) hexafluoropropane, 2,2-bis (4-aminophenyl) hexafluoropropane, 2 2-bis (3-aminophenyl) hexafluoropropane, 2,2-bis (3-amino-4-hydroxyphenyl) hexafluoropropane, 2,2-bis (3-amino-4-methylphenyl) hexafluoropropane 4,4′-bis (4-aminophenoxy) octafluorobiphenyl, 4,4′-diaminobenzanilide, etc., and two or more of these may be used in combination.
 <高分子化合物の使用における態様>
 本発明の高分子化合物は、有機溶媒に溶解したワニス状態、粉末状態、フィルム状態、固体状態で使用に供することが可能である。その際、得られた高分子化合物中には、必要に応じて酸化安定剤、フィラー、シランカップリング剤、感光剤、光重合開始剤および増感剤等の添加物が混合されていても差し支えない。
<Aspect in Use of Polymer Compound>
The polymer compound of the present invention can be used in a varnish state, a powder state, a film state, or a solid state dissolved in an organic solvent. At that time, the obtained polymer compound may contain additives such as an oxidation stabilizer, a filler, a silane coupling agent, a photosensitizer, a photopolymerization initiator, and a sensitizer as necessary. Absent.
 ワニスで使用する場合は、ガラス、シリコンウエーハ、金属、金属酸化物、セラミックス、樹脂などの基材上にスピンコート、スプレーコート、フローコート、含浸コート、ハケ塗りなど通常用いられる方法で塗布することができる。 When using in varnish, apply it on a substrate such as glass, silicon wafer, metal, metal oxide, ceramics, resin, etc. by usual methods such as spin coating, spray coating, flow coating, impregnation coating, brush coating. Can do.
 以下に実施例を挙げて、本発明をさらに具体的に説明するが、本発明はこれらの実施例によって限定されるものではない。 Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited to these examples.
 本発明で得られたHFIP基含有フルオレンジアミンおよびHFIP基含有フルオレンジアミンを用いた高分子化合物の物性評価は、以下に示す方法で行った。 The physical property evaluation of the polymer compound using the HFIP group-containing fluorenediamine and the HFIP group-containing fluorenediamine obtained in the present invention was performed by the following methods.
 [NMR(核磁気共鳴)測定]
 化合物の構造は、共鳴周波数400MHzのNMR(核磁気共鳴)装置(JNM-AL400またはJNM-ECA400;日本電子製)を使用し、1H-NMR、19F-NMRの測定で確認した。
[NMR (nuclear magnetic resonance) measurement]
The structure of the compound was confirmed by 1 H-NMR and 19 F-NMR measurements using an NMR (nuclear magnetic resonance) apparatus (JNM-AL400 or JNM-ECA400; manufactured by JEOL Ltd.) having a resonance frequency of 400 MHz.
 [重量平均分子量測定]
 重量平均分子量(以下、「Mw」と表すことがある。)は、ポリスチレンを標準品として、ゲルパーミエーションクロマトグラフィー(東ソー株式会社製HLC-8320、溶媒はテトラヒドロフラン)により求めた値である。
[Weight average molecular weight measurement]
The weight average molecular weight (hereinafter sometimes referred to as “Mw”) is a value determined by gel permeation chromatography (HLC-8320 manufactured by Tosoh Corporation, tetrahydrofuran is used) with polystyrene as a standard product.
 [実施例1]
 <式(22)で表されるHFIP基含有フルオレンジアミン(HFIP-FL)の合成>
 300mLオートクレーブに9,9-ビス(4-アミノフェニル)フルオレン(25g、0.072mol、東京化成品)、ヘキサフルオロアセトン三水和物(70g、0.32mol)、パラトルエンスルホン酸一水和物(0.68g、3.6mmol)を加え、オートクレーブを密閉し、オイルバスで130℃にて17時間撹拌した。室温(特に加熱または冷却しない雰囲気温度をいい、通常約15~30℃である。以下同じ。)に冷却後、反応溶液にトルエン(50g)を加え、得られた固体をろ過、水洗した後、さらにクロロホルム(100ml)で洗浄した。得られた固体をろ過、減圧乾燥することで白色粉末を得た(11.6g、0.017mol、収率25%)。NMR解析から、前記白色粉体は、式(22)で表されるHFIP基含有フルオレンジアミン(以下、「HFIP-FL」と表すことがある。)であることを確認した。
[NMR測定]
1H-NMR(DMSO-d6):δ9.19(brs,2H),7.87(d,J=7.6Hz,2H),7.35(m,2H),7.26(m,4H),7.02(s,2H),6.80(dd,J=8.5,1.7Hz,2H),6.60(d,J=8.5Hz,2H),5.55(brs,4H);
19F-NMR(DMSO-d6):δ-72.65(s)
Figure JPOXMLDOC01-appb-C000059
[Example 1]
<Synthesis of HFIP group-containing fluorenediamine represented by formula (22) (HFIP-FL)>
9,9-bis (4-aminophenyl) fluorene (25 g, 0.072 mol, Tokyo Chemicals), hexafluoroacetone trihydrate (70 g, 0.32 mol), paratoluenesulfonic acid monohydrate in a 300 mL autoclave (0.68 g, 3.6 mmol) was added, the autoclave was sealed, and the mixture was stirred in an oil bath at 130 ° C. for 17 hours. After cooling to room temperature (especially the ambient temperature without heating or cooling, usually about 15 to 30 ° C., the same applies hereinafter), toluene (50 g) is added to the reaction solution, and the resulting solid is filtered and washed with water. Further, it was washed with chloroform (100 ml). The obtained solid was filtered and dried under reduced pressure to obtain a white powder (11.6 g, 0.017 mol, yield 25%). From the NMR analysis, it was confirmed that the white powder was a HFIP group-containing fluorenediamine represented by the formula (22) (hereinafter sometimes referred to as “HFIP-FL”).
[NMR measurement]
1 H-NMR (DMSO-d 6 ): δ 9.19 (brs, 2H), 7.87 (d, J = 7.6 Hz, 2H), 7.35 (m, 2H), 7.26 (m, 4H), 7.02 (s, 2H), 6.80 (dd, J = 8.5, 1.7 Hz, 2H), 6.60 (d, J = 8.5 Hz, 2H), 5.55 ( brs, 4H);
19 F-NMR (DMSO-d 6 ): δ-72.65 (s)
Figure JPOXMLDOC01-appb-C000059
 [実施例2]
 <式(23)で表されるHFIP基含有フルオレンジアミン(HFIP-MeFL)の合成>
 300mLオートクレーブに、9,9-ビス(4-アミノ-3-メチルフェニル)フルオレン(70g、0.186mol)、ヘキサフルオロアセトン三水和物(220g、1.000mol)、パラトルエンスルホン酸一水和物(1.77g、9.3mmol)を加え、オートクレーブを密閉し、オイルバスで130℃にて24時間撹拌した。室温に冷却後、反応溶液にメタノール(200mL)を加え、得られた固体をろ過した後、さらにクロロホルム(100ml)で洗浄した。得られた固体をろ過、減圧乾燥することで白色粉末を得た(15.2g、0.022mol、収率20%)。NMR解析から、前記白色粉体は、式(23)で表されるHFIP基含有フルオレンジアミン(以下、「HFIP-MeFL」と表すことがある。)であることを確認した。
[NMR測定]
1H-NMR(DMSO-d6):δ10.11(brs,2H),7.86(d,J=7.2Hz,2H),7.35(m,2H),7.26(m,4H),6.97(s,2H),6.79(s,2H),5.24(brs,4H),1.98(s,6H);
19F-NMR(DMSO-d6):δ-72.92(s)
Figure JPOXMLDOC01-appb-C000060
[Example 2]
<Synthesis of HFIP group-containing fluorenediamine represented by formula (23) (HFIP-MeFL)>
In a 300 mL autoclave, 9,9-bis (4-amino-3-methylphenyl) fluorene (70 g, 0.186 mol), hexafluoroacetone trihydrate (220 g, 1.000 mol), paratoluenesulfonic acid monohydrate The product (1.77 g, 9.3 mmol) was added, the autoclave was sealed, and the mixture was stirred in an oil bath at 130 ° C. for 24 hours. After cooling to room temperature, methanol (200 mL) was added to the reaction solution, and the resulting solid was filtered and further washed with chloroform (100 ml). The obtained solid was filtered and dried under reduced pressure to obtain a white powder (15.2 g, 0.022 mol, yield 20%). From the NMR analysis, it was confirmed that the white powder was a HFIP group-containing fluorenediamine represented by the formula (23) (hereinafter sometimes referred to as “HFIP-MeFL”).
[NMR measurement]
1 H-NMR (DMSO-d 6 ): δ 10.11 (brs, 2H), 7.86 (d, J = 7.2 Hz, 2H), 7.35 (m, 2H), 7.26 (m, 4H), 6.97 (s, 2H), 6.79 (s, 2H), 5.24 (brs, 4H), 1.98 (s, 6H);
19 F-NMR (DMSO-d 6 ): δ-72.92 (s)
Figure JPOXMLDOC01-appb-C000060
 [実施例3]
 <HFIP-FLと6FDAの重合反応によるポリマーP1の合成>
 300-mL三口フラスコ中に、HFIP-FL(10.01g、14.7mmol)、4,4’-(ヘキサフルオロイソプロピリデン)ジフタル酸無水物(以下、「6FDA」と表すことがある。)(6.533g、14.7mmol)、N,N-ジメチルアセトアミド(38.57g)を加え、窒素雰囲気下、室温にて18時間撹拌した。得られた反応液を、水、メタノール混合溶媒(混合体積比は1:1)に投入し、白色沈殿を得た。得られた白色沈殿をろ過、回収後、室温にて12時間真空乾燥させることで、ポリマーP1を得た(収量14.89g、収率90%)。GPC測定の結果、Mwは51,000であった。下記式において、nは繰り返し単位の数を表す(実施例の項において同じ。)。
Figure JPOXMLDOC01-appb-C000061
[Example 3]
<Synthesis of polymer P1 by polymerization reaction of HFIP-FL and 6FDA>
In a 300-mL three-neck flask, HFIP-FL (10.01 g, 14.7 mmol), 4,4 ′-(hexafluoroisopropylidene) diphthalic anhydride (hereinafter sometimes referred to as “6FDA”) ( 6.533 g (14.7 mmol) and N, N-dimethylacetamide (38.57 g) were added, and the mixture was stirred at room temperature for 18 hours under a nitrogen atmosphere. The obtained reaction liquid was thrown into water and methanol mixed solvent (mixing volume ratio is 1: 1), and white precipitation was obtained. The obtained white precipitate was filtered, collected, and then vacuum dried at room temperature for 12 hours to obtain polymer P1 (yield 14.89 g, yield 90%). As a result of GPC measurement, Mw was 51,000. In the following formula, n represents the number of repeating units (the same applies to the Examples section).
Figure JPOXMLDOC01-appb-C000061
 [実施例4]
 <ポリマーP1のイミド化によるポリマーP1-1の合成、およびP1-1の溶剤溶解性>
 100mL-ナスフラスコ中に、ポリマーP1(5g)、無水酢酸(0.998g、9.78mmol)、トリエチルアミン(1.08g、10.66mmol)を加え、N,N-ジメチルアセトアミド(20g)に溶解させた後、110℃、24時間反応させた。得られた反応液を、水、メタノール混合溶媒(混合体積比は1:1)に投入し、白色沈殿を得た。得られた白色沈殿をろ過、回収後、室温にて12時間真空乾燥させることで、ポリマーP1-1を得た(収量4.11g、収率85%)。GPC測定の結果、Mwは31,000であった。IR測定から、1,780cm-1、1,720cm-1にイミド基特有の吸収を確認出来たことから、ポリマーP1-1であることが判った。得られたポリマーP1-1は、テトラヒドロフラン、N,N-ジメチルホルムアミドに可溶(ポリマー固体を5wt%濃度にて溶媒中、室温下で撹拌し、目視で判断。以下同じ。)であった。
Figure JPOXMLDOC01-appb-C000062
[Example 4]
<Synthesis of polymer P1-1 by imidization of polymer P1, and solvent solubility of P1-1>
In a 100 mL eggplant flask, polymer P1 (5 g), acetic anhydride (0.998 g, 9.78 mmol) and triethylamine (1.08 g, 10.66 mmol) were added and dissolved in N, N-dimethylacetamide (20 g). And then reacted at 110 ° C. for 24 hours. The obtained reaction liquid was thrown into water and methanol mixed solvent (mixing volume ratio is 1: 1), and white precipitation was obtained. The resulting white precipitate was filtered, collected, and then vacuum dried at room temperature for 12 hours to obtain polymer P1-1 (yield 4.11 g, yield 85%). As a result of GPC measurement, Mw was 31,000. From IR measurement, 1,780 cm -1, from that confirmed the absorption of the specific imide group to 1,720 cm -1, it was found that a polymer P1-1. The obtained polymer P1-1 was soluble in tetrahydrofuran and N, N-dimethylformamide (the polymer solid was stirred at room temperature in a solvent at a concentration of 5 wt% at the room temperature, the same applies hereinafter).
Figure JPOXMLDOC01-appb-C000062
 [実施例5]
 <ポリマーP1-1の製膜実験>
 実施例4で得られたポリマーP1-1(3g)を、N,N-ジメチルアセトアミド(12g)に溶解させた後、得られた溶液を硝子基板上にスピンコート塗布し、N,N-ジメチルアセトアミドの沸点に近い180℃を上限温度とし、100℃で1時間、180℃で1時間加熱した。硝子基板上にて、剥がれやクラックなどは目視で観測されず、25μm膜厚の均一膜が得られた。
[Example 5]
<Film-forming experiment of polymer P1-1>
The polymer P1-1 (3 g) obtained in Example 4 was dissolved in N, N-dimethylacetamide (12 g), and then the obtained solution was spin-coated on a glass substrate to obtain N, N-dimethyl. The upper limit temperature was 180 ° C. close to the boiling point of acetamide, and heating was performed at 100 ° C. for 1 hour and 180 ° C. for 1 hour. On the glass substrate, no peeling or cracking was observed visually, and a uniform film having a thickness of 25 μm was obtained.
 [実施例6]
 <HFIP-MeFLとイソフタル酸クロリドの重合反応によるポリマーP2の合成>
 300-mL三口フラスコ中に、HFIP-MeFL(9.00g、12.7mmol)、イソフタル酸クロリド(2.52g、12.7mmol)、N,N-ジメチルアセトアミド(46g)を加え、窒素雰囲気下、室温にて18時間撹拌した。得られた反応液を、水、メタノール混合溶媒(混合体積比は1:1)に投入し、白色沈殿を得た。得られた白色沈殿をろ過、回収後、室温にて12時間真空乾燥させることで、ポリマーP2を得た(収量8.73g、収率83%)。GPC測定の結果、Mwは25,000であった。
Figure JPOXMLDOC01-appb-C000063
[Example 6]
<Synthesis of polymer P2 by polymerization reaction of HFIP-MeFL and isophthalic acid chloride>
In a 300-mL three-necked flask, HFIP-MeFL (9.00 g, 12.7 mmol), isophthalic acid chloride (2.52 g, 12.7 mmol), N, N-dimethylacetamide (46 g) were added, and under a nitrogen atmosphere, Stir at room temperature for 18 hours. The obtained reaction liquid was thrown into water and methanol mixed solvent (mixing volume ratio is 1: 1), and white precipitation was obtained. The obtained white precipitate was filtered, collected, and then vacuum dried at room temperature for 12 hours to obtain polymer P2 (yield 8.73 g, yield 83%). As a result of GPC measurement, Mw was 25,000.
Figure JPOXMLDOC01-appb-C000063
 [実施例7]
 <ポリマーP2の加熱脱水反応によるポリマーP2-1の合成、およびP2-1の溶剤溶解性>
 ポリマーP2(5g)をN-メチルピロリドン(20g)に溶解させた後、得られた溶液を、200℃で12時間撹拌した。得られた反応液を、水、メタノール混合溶媒(混合体積比は1:1)に投入し、白色沈殿を得た。得られた白色沈殿をろ過、回収後、室温にて12時間真空乾燥させることで、ポリマーP2-1を得た(収量3.83g、収率80%)。GPC測定の結果、Mwは23,000であった。IR測定から、1,650cm-1にC(=N)基特有の吸収を確認出来たことから、ポリマーP2-1であることが判った。得られたポリマーP2-1は、N-メチルピロリドンに可溶であった。
Figure JPOXMLDOC01-appb-C000064
[Example 7]
<Synthesis of Polymer P2-1 by Heat Dehydration Reaction of Polymer P2 and Solvent Solubility of P2-1>
Polymer P2 (5 g) was dissolved in N-methylpyrrolidone (20 g), and the resulting solution was stirred at 200 ° C. for 12 hours. The obtained reaction liquid was thrown into water and methanol mixed solvent (mixing volume ratio is 1: 1), and white precipitation was obtained. The obtained white precipitate was filtered, collected, and then vacuum dried at room temperature for 12 hours to obtain polymer P2-1 (yield 3.83 g, yield 80%). As a result of GPC measurement, Mw was 23,000. From IR measurement, absorption peculiar to C (= N) group could be confirmed at 1,650 cm −1, and it was found to be polymer P2-1. The obtained polymer P2-1 was soluble in N-methylpyrrolidone.
Figure JPOXMLDOC01-appb-C000064
 [実施例8]
 <ポリマーP2-1の製膜実験>
 実施例7で得られたポリマーP2-1(3g)をN―メチルピロリドン(12g)に溶解させた後、得られた溶液を硝子基板上にスピンコート塗布し、N―メチルピロリドンの沸点に近い200℃を上限温度とし、100℃で1時間、200℃で1時間加熱した。硝子基板上にて、剥がれやクラックなどは目視で観測されず、23μm膜厚の均一膜が得られた。
[Example 8]
<Film-forming experiment of polymer P2-1>
After the polymer P2-1 (3 g) obtained in Example 7 was dissolved in N-methylpyrrolidone (12 g), the obtained solution was spin-coated on a glass substrate and was close to the boiling point of N-methylpyrrolidone. 200 ° C. was the upper limit temperature, and heating was performed at 100 ° C. for 1 hour and at 200 ° C. for 1 hour. On the glass substrate, no peeling or cracking was observed visually, and a uniform film having a thickness of 23 μm was obtained.
 [実施例9~13]
 <ポリマーP3~P7の合成>
 実施例3と同様の手法にて、HFIP-FLもしくはHFIP-MeFLと、下記の各種テトラカルボン酸二無水物である、PMDA、BPDA、BTDA、DSDA、ODPAとの重合反応を行い、下記のポリマーP3~P7を得た。結果を表1に示す。
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-T000067
[Examples 9 to 13]
<Synthesis of polymers P3 to P7>
In the same manner as in Example 3, HFIP-FL or HFIP-MeFL and the following various tetracarboxylic dianhydrides, PMDA, BPDA, BTDA, DSDA, and ODPA, were polymerized to form the following polymer: P3 to P7 were obtained. The results are shown in Table 1.
Figure JPOXMLDOC01-appb-C000065
Figure JPOXMLDOC01-appb-C000066
Figure JPOXMLDOC01-appb-T000067
 [実施例14~17]
 <ポリマーP8~P11の合成>
 実施例6と同様の手法にて、HFIP-FLもしくはHFIP-MeFLと、下記の各種ジカルボン酸ジクロリドである、TPC、BPDC、6FDC、6FBDCとの重合反応を行い、下記のポリマーP8~P11を得た。結果を表2に示す。
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-T000070
[Examples 14 to 17]
<Synthesis of polymers P8 to P11>
Polymerization reaction of HFIP-FL or HFIP-MeFL with the following various dicarboxylic acid dichlorides, TPC, BPDC, 6FDC, 6FBDC, was performed in the same manner as in Example 6 to obtain the following polymers P8 to P11. It was. The results are shown in Table 2.
Figure JPOXMLDOC01-appb-C000068
Figure JPOXMLDOC01-appb-C000069
Figure JPOXMLDOC01-appb-T000070
 [実施例18~22]
 <ポリマーP3-1~P7-1の合成、およびそれらの溶剤溶解性>
 実施例4と同様の手法にて、ポリアミド酸であるポリマーP3~P7からそれぞれ、下記のポリイミド化合物であるポリマーP3-1~P7-1を得た。結果を表3に示した。得られたP3-1~P7-1はいずれも、テトラヒドロフラン、N,N-ジメチルアセトアミドに可溶であった。
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-T000072
[Examples 18 to 22]
<Synthesis of polymers P3-1 to P7-1 and their solvent solubility>
In the same manner as in Example 4, the following polymers P3-1 to P7-1, which are polyimide compounds, were obtained from the polymers P3 to P7, which were polyamic acids, respectively. The results are shown in Table 3. The obtained P3-1 to P7-1 were all soluble in tetrahydrofuran and N, N-dimethylacetamide.
Figure JPOXMLDOC01-appb-C000071
Figure JPOXMLDOC01-appb-T000072
 [実施例23~26]
 <ポリマーP8-1~P11-1の合成、およびそれらの溶剤溶解性>
 実施例7と同様の手法にて、HFIP基含有ポリアミドであるポリマーP8~P11からそれぞれ、脱水閉環反応にて下記のポリマーP8-1~P11-1を得た。結果を表4に示した。得られたP8-1~P11-1はいずれも、N-メチルピロリドンに可溶であった。
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-T000074
[Examples 23 to 26]
<Synthesis of polymers P8-1 to P11-1 and their solvent solubility>
In the same manner as in Example 7, the following polymers P8-1 to P11-1 were obtained from the polymers P8 to P11, which are polyamides containing HFIP groups, respectively by a dehydration ring-closing reaction. The results are shown in Table 4. The obtained P8-1 to P11-1 were all soluble in N-methylpyrrolidone.
Figure JPOXMLDOC01-appb-C000073
Figure JPOXMLDOC01-appb-T000074
 [実施例27~35]
 <ポリマーP3-1~P11-1の製膜実験>
 ポリマーP3-1~P7-1に関しては実施例5と同様の手法にて、ポリマーP8-1~P11-1に関しては実施例8と同様の手法にて、硝子基板上にスピンコート製膜した。結果を表5に示した。
Figure JPOXMLDOC01-appb-T000075
[Examples 27 to 35]
<Film formation experiment of polymers P3-1 to P11-1>
The polymers P3-1 to P7-1 were spin-coated on the glass substrate by the same method as in Example 5, and the polymers P8-1 to P11-1 were formed by the same method as in Example 8. The results are shown in Table 5.
Figure JPOXMLDOC01-appb-T000075
 本発明に係るHFIP基含有高分子化合物のコーティング膜は、フラットパネルディスプレイ用のコーティング材、電子回路用基板本体用保護膜、半導体用保護膜などに使用され得る。 The coating film of the HFIP group-containing polymer compound according to the present invention can be used as a coating material for a flat panel display, a protective film for a substrate body for an electronic circuit, a protective film for a semiconductor, and the like.

Claims (17)

  1. 式(2)で表される含フッ素フルオレンジアミン。
    Figure JPOXMLDOC01-appb-C000001
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
    A fluorine-containing fluorenediamine represented by the formula (2).
    Figure JPOXMLDOC01-appb-C000001
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group Represents a substituent, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2, and m + n is from 1 to 4.
  2. 式(3-1)で表される請求項1に記載の含フッ素フルオレンジアミン。
    Figure JPOXMLDOC01-appb-C000002
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH3)2OH基、-C≡C-C65基、-C≡C-SI(CH3)3基からなる群から選ばれる1種の置換基を表す。HFIPは-C(CF3)2OH基を表す。)
    The fluorine-containing fluorenediamine according to claim 1, which is represented by the formula (3-1).
    Figure JPOXMLDOC01-appb-C000002
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—SI (CH 3 ) 3 group Represents a substituent, and HFIP represents a —C (CF 3 ) 2 OH group.)
  3. 式(2B)で表される請求項1または2に記載の含フッ素フルオレンジアミン。
    Figure JPOXMLDOC01-appb-C000003
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。HFIPは-C(CF32OH基を表す。)
    The fluorine-containing fluorenediamine according to claim 1 or 2 represented by the formula (2B).
    Figure JPOXMLDOC01-appb-C000003
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) And represents one kind of substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and HFIP represents a —C (CF 3 ) 2 OH group.)
  4. 請求項1~3のいずれかに記載の含フッ素ジアミンを、式(10)、(11)で表されるジカルボン酸もしくはジカルボン酸誘導体、または、式(14)で表されるテトラカルボン酸二無水物と接触させ、反応させることで得られる高分子化合物。
    Figure JPOXMLDOC01-appb-C000004
    (式(10)中、Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよく、R4はそれぞれ独立に水素原子、炭素数1~10のアルキル基またはベンジル基を表す。式(11)中、Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよく、Xはフッ素原子、塩素原子、臭素原子またはヨウ素原子を表す。)
    Figure JPOXMLDOC01-appb-C000005
    (式(14)中、R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
    The fluorinated diamine according to any one of claims 1 to 3, wherein the dicarboxylic acid or dicarboxylic acid derivative represented by the formula (10) or (11) or the tetracarboxylic dianhydride represented by the formula (14) is used. A polymer compound obtained by contacting and reacting with a product.
    Figure JPOXMLDOC01-appb-C000004
    (In Formula (10), A is a divalent organic group containing one or more selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom, Any number of hydrogen atoms may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and each R 4 is independently a hydrogen atom or a carbon number of 1 to 10 In formula (11), A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and is an oxygen atom, a sulfur atom, or a nitrogen atom. Any number of hydrogen atoms may be substituted with an alkyl group, a fluorine atom, a chlorine atom, a fluoroalkyl group, a carboxyl group, a hydroxy group or a cyano group, and X is Tsu atom, a chlorine atom, a bromine atom or an iodine atom.)
    Figure JPOXMLDOC01-appb-C000005
    (In the formula (14), R 5 is a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom and a nitrogen atom. And any number of hydrogen atoms may be substituted with an alkyl group, a fluoroalkyl group, a carboxyl group, a hydroxy group, or a cyano group.)
  5. 式(6)で表される繰り返し単位を少なくとも含有する高分子化合物。
    Figure JPOXMLDOC01-appb-C000006
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
    A polymer compound containing at least a repeating unit represented by formula (6).
    Figure JPOXMLDOC01-appb-C000006
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group A represents a substituent, A is a divalent organic group containing one or more selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom; Several hydrogen atoms are alkyl, fluorine, chlorine, fluoro Kill group, a carboxyl group, may .HFIP be substituted by a hydroxy group or a cyano group is -C (CF 3) 2 .m and n represents an OH group each independently represents an integer of 0 to 2 M + n is 1 or more and 4 or less.)
  6. 式(19)で表される繰り返し単位を少なくとも含有する、請求項5に記載の高分子化合物。
    Figure JPOXMLDOC01-appb-C000007
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
    The polymer compound according to claim 5, comprising at least a repeating unit represented by formula (19).
    Figure JPOXMLDOC01-appb-C000007
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group A represents a substituent, A is a divalent organic group containing one or more selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom; Several hydrogen atoms are alkyl, fluorine, chlorine, fluoro Kill group, a carboxyl group, may .HFIP be substituted by a hydroxy group or a cyano group is -C (CF 3) 2 OH group.)
  7. 式(6A)で表される繰り返し単位を少なくとも含有する、請求項5または6に記載の高分子化合物。
    Figure JPOXMLDOC01-appb-C000008
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
    The polymer compound according to claim 5 or 6, comprising at least a repeating unit represented by formula (6A).
    Figure JPOXMLDOC01-appb-C000008
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) 1 represents a substituent selected from the group consisting of phenyl group, methoxy group and nitro group, A is a divalent organic group containing one or more selected from alicyclic, aromatic and alkylene groups, and oxygen May contain atoms, sulfur atoms, or nitrogen atoms, and any number of hydrogen atoms may be substituted with alkyl groups, fluorine atoms, chlorine atoms, fluoroalkyl groups, carboxyl groups, hydroxy groups, or cyano groups HFIP represents a —C (CF 3 ) 2 OH group.)
  8. 式(9)で表される繰り返し単位を少なくとも含有する高分子化合物。
    Figure JPOXMLDOC01-appb-C000009
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフッ素化アルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
    A polymer compound containing at least a repeating unit represented by formula (9).
    Figure JPOXMLDOC01-appb-C000009
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluorinated alkyl having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) 1 represents a substituent selected from the group consisting of a group, a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, or a biphenyl group. , Sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group A represents a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and may contain an oxygen atom, a sulfur atom, or a nitrogen atom; The number of hydrogen atoms is an alkyl group, a fluorine atom, a chlorine atom, Kill group, a carboxyl group, may be substituted by a hydroxy group or a cyano group.)
  9. 式(9B)で表される繰り返し単位を少なくとも含有する、請求項8に記載の高分子化合物。
    Figure JPOXMLDOC01-appb-C000010
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフッ素化アルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。Aは脂環、芳香環、アルキレン基から選ばれる一種以上を含有した2価の有機基であり、酸素原子、硫黄原子、または窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フッ素原子、塩素原子、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。)
    The high molecular compound of Claim 8 containing the repeating unit represented by Formula (9B) at least.
    Figure JPOXMLDOC01-appb-C000010
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluorinated alkyl having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) 1 represents a substituent selected from the group consisting of a group, a phenyl group, a methoxy group, and a nitro group, A is a divalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, It may contain oxygen, sulfur, or nitrogen atoms, and any number of hydrogen atoms are substituted with alkyl, fluorine, chlorine, fluoroalkyl, carboxyl, hydroxy or cyano groups May be good.)
  10. 式(7)で表される繰り返し単位を少なくとも含有する高分子化合物。
    Figure JPOXMLDOC01-appb-C000011
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
    A polymer compound containing at least a repeating unit represented by formula (7).
    Figure JPOXMLDOC01-appb-C000011
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl Optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2; m + n is 1 or more and 4 or less.)
  11. 式(7A)で表される繰り返し単位を少なくとも含有する、請求項10に記載の高分子化合物。
    Figure JPOXMLDOC01-appb-C000012
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
    The polymer compound according to claim 10, comprising at least a repeating unit represented by formula (7A).
    Figure JPOXMLDOC01-appb-C000012
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl And optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group.)
  12. 式(7B)で表される繰り返し単位を少なくとも含有する、請求項10または11に記載の高分子化合物。
    Figure JPOXMLDOC01-appb-C000013
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
    The polymer compound according to claim 10 or 11, comprising at least a repeating unit represented by formula (7B).
    Figure JPOXMLDOC01-appb-C000013
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) R 5 represents a tetravalent organic group containing one or more substituents selected from the group consisting of a phenyl group, a methoxy group and a nitro group, wherein R 5 is one or more selected from an alicyclic ring, an aromatic ring and an alkylene group; Fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom may be contained, and any number of hydrogen atoms may be substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano group HFIP represents a —C (CF 3 ) 2 OH group.)
  13. 式(8)で表される繰り返し単位を少なくとも含有する高分子化合物。
    Figure JPOXMLDOC01-appb-C000014
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。mおよびnはそれぞれ独立に0~2のいずれかの整数を表し、m+nは1以上4以下である。)
    A polymer compound containing at least a repeating unit represented by formula (8).
    Figure JPOXMLDOC01-appb-C000014
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl Optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group, m and n each independently represents an integer of 0 to 2; m + n is 1 or more and 4 or less.)
  14. 式(8A)で表される繰り返し単位を少なくとも含有する、請求項13に記載の高分子化合物。
    Figure JPOXMLDOC01-appb-C000015
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R2は水素原子、フッ素原子、塩素原子、臭素原子、ヨウ素原子、フェニル基、ナフチル基、ビフェニル基、スルホン酸基、-C≡C-C(CH32OH基、-C≡C-C65基、-C≡C-Si(CH33基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
    The high molecular compound of Claim 13 containing the repeating unit represented by Formula (8A) at least.
    Figure JPOXMLDOC01-appb-C000015
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) Represents a substituent selected from the group consisting of a phenyl group, a methoxy group, and a nitro group, and R 2 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, One kind selected from the group consisting of a sulfonic acid group, —C≡C—C (CH 3 ) 2 OH group, —C≡C—C 6 H 5 group, —C≡C—Si (CH 3 ) 3 group R 5 represents a tetravalent organic group containing at least one selected from an alicyclic ring, an aromatic ring, and an alkylene group, and contains a fluorine atom, a chlorine atom, an oxygen atom, a sulfur atom, and a nitrogen atom. Any number of hydrogen atoms may be alkyl groups, fluoroalkyl And optionally substituted with a group, a carboxyl group, a hydroxy group or a cyano group, HFIP represents a —C (CF 3 ) 2 OH group.)
  15. 式(8B)で表される繰り返し単位を少なくとも含有する、請求項13または14に記載の高分子化合物。
    Figure JPOXMLDOC01-appb-C000016
    (式中、R1は水素原子、フッ素原子、塩素原子、臭素原子、炭素数1~4のアルキル基、任意の数の水素原子がフッ素原子に置換された炭素数1~4のフルオロアルキル基、フェニル基、メトキシ基、ニトロ基からなる群から選ばれる1種の置換基を表す。R5は脂環、芳香環、アルキレン基から選ばれる一種以上を含有した4価の有機基であり、フッ素原子、塩素原子、酸素原子、硫黄原子、窒素原子を含有していてもよく、任意の数の水素原子がアルキル基、フルオロアルキル基、カルボキシル基、ヒドロキシ基またはシアノ基で置換されていてもよい。HFIPは-C(CF32OH基を表す。)
    The high molecular compound of Claim 13 or 14 containing the repeating unit represented by Formula (8B) at least.
    Figure JPOXMLDOC01-appb-C000016
    (Wherein R 1 is a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an alkyl group having 1 to 4 carbon atoms, or a fluoroalkyl group having 1 to 4 carbon atoms in which any number of hydrogen atoms are substituted with fluorine atoms) R 5 represents a tetravalent organic group containing one or more substituents selected from the group consisting of a phenyl group, a methoxy group and a nitro group, wherein R 5 is one or more selected from an alicyclic ring, an aromatic ring and an alkylene group; Fluorine atom, chlorine atom, oxygen atom, sulfur atom, nitrogen atom may be contained, and any number of hydrogen atoms may be substituted with alkyl group, fluoroalkyl group, carboxyl group, hydroxy group or cyano group HFIP represents a —C (CF 3 ) 2 OH group.)
  16. 請求項5~9のいずれかに記載の高分子化合物であって、2価の有機基Aが、式(25)~(29)から選ばれる1種以上であることを特徴とする高分子化合物。
    Figure JPOXMLDOC01-appb-C000017
    (式中、波線と交差する線分は結合位置を表す。)
    10. The polymer compound according to claim 5, wherein the divalent organic group A is one or more selected from formulas (25) to (29). .
    Figure JPOXMLDOC01-appb-C000017
    (In the formula, the line that intersects the wavy line represents the coupling position.)
  17. 請求項10~15のいずれかに記載の高分子化合物であって、R5が、式(30)~(35)から選ばれる1種以上であることを特徴とする高分子化合物。
    Figure JPOXMLDOC01-appb-C000018
    (式中、波線と交差する線分は結合位置を表す。)
    The polymer compound according to any one of claims 10 to 15, wherein R 5 is one or more selected from the formulas (30) to (35).
    Figure JPOXMLDOC01-appb-C000018
    (In the formula, the line that intersects the wavy line represents the coupling position.)
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