WO2014083746A1 - Optical device and method for production of optical device - Google Patents

Optical device and method for production of optical device Download PDF

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Publication number
WO2014083746A1
WO2014083746A1 PCT/JP2013/006012 JP2013006012W WO2014083746A1 WO 2014083746 A1 WO2014083746 A1 WO 2014083746A1 JP 2013006012 W JP2013006012 W JP 2013006012W WO 2014083746 A1 WO2014083746 A1 WO 2014083746A1
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WO
WIPO (PCT)
Prior art keywords
electrode
optical
resin
optical device
optical element
Prior art date
Application number
PCT/JP2013/006012
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French (fr)
Japanese (ja)
Inventor
裕貴 山下
赤星 年隆
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パナソニック株式会社
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Publication of WO2014083746A1 publication Critical patent/WO2014083746A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14618Containers
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N25/00Circuitry of solid-state image sensors [SSIS]; Control thereof
    • H04N25/70SSIS architectures; Circuits associated therewith
    • H04N25/79Arrangements of circuitry being divided between different or multiple substrates, chips or circuit boards, e.g. stacked image sensors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation

Definitions

  • the present disclosure relates to an optical device mounted on a digital device or the like and a manufacturing method thereof.
  • Patent Document 1 discloses a board module in which an electronic component is mounted on a board having a through electrode.
  • the board module includes a board, an electronic component provided on the first surface of the board or inside the board, and a connection provided on the first surface of the board while being electrically connected to the electronic component.
  • An electrode a first through-hole portion penetrating in the thickness direction of the substrate so as to reach the back surface of the connection electrode, and the substrate provided from the inside of the first through-hole portion while being provided inside the first through-hole portion
  • a through electrode provided on the second surface of the substrate, a wiring electrode provided on the second surface of the substrate and electrically connected to the through electrode on the second surface of the substrate, and a wiring And an insulating layer provided on the second surface of the substrate so as to cover the surface of the electrode.
  • Patent Document 2 discloses a wafer level image sensor module.
  • the image sensor module includes an optical filter that removes a specific wavelength from light flowing into the image sensor, a glass layer that is attached to the optical filter to protect the filter coating layer, and a pad electrode is formed on the rear surface thereof.
  • An image sensor attached to the pad electrode of the glass layer and having a redistribution pad formed on the rear surface thereof from the pad electrode, and a solder ball disposed on the rear surface side of the image sensor and electrically connected to the pad electrode.
  • the image sensor is sealed with an insulating sealing resin.
  • the insulating sealing resin protects only one side of the joint at the joint between the electrode of the image sensor and the pad of the glass layer. This causes a problem of poor connection. Further, when the resin enters the light receiving part side of the image sensor from the gap of the joint part, the inflow of light is hindered.
  • the optical device according to the present disclosure is effective for reinforcing the connection portion while preventing the resin from entering the optical region.
  • An optical device includes an optical element having an optical region and a first electrode disposed on an outer periphery of the optical region on a main surface, and a first surface disposed to face the main surface of the optical element.
  • a transparent member having a second electrode, a bonding member disposed between the optical element and the transparent member, and electrically connecting the first electrode and the second electrode; an optical element and the transparent member; And a resin that covers the optical element and the bonding member, and the resin is bonded to the first resin portion that seals the side surface of the optical element.
  • the present disclosure it is effective to obtain a highly reliable optical device in which the connection between the transparent member and the optical element is reinforced while preventing the resin from entering the optical region.
  • FIG. 1A is a diagram illustrating the configuration of the optical device according to the first embodiment, and is a cross-sectional view taken along line Ia-Ia illustrated in FIG. 1B.
  • FIG. 1B is a plan view showing the configuration of the optical device according to the first embodiment.
  • FIG. 2A is a cross-sectional view illustrating an example of a method for manufacturing the optical device according to the first embodiment.
  • FIG. 2B is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment.
  • FIG. 2C is a cross-sectional view showing an example of a method for manufacturing the optical device according to the first embodiment.
  • FIG. 2D is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment.
  • FIG. 3A is a cross-sectional view illustrating an example of a method for manufacturing the optical device according to the first embodiment.
  • FIG. 3B is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment.
  • FIG. 3C is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment.
  • FIG. 4A is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment.
  • FIG. 4B is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment.
  • FIG. 4C is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment.
  • FIG. 4A is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment.
  • FIG. 4B is a cross-sectional view showing a part of
  • FIG. 4D is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment.
  • FIG. 4E is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment.
  • FIG. 5A is a cross-sectional view for comparison between the optical device according to the first embodiment and Modification 1 thereof.
  • FIG. 5B is a cross-sectional view for comparison between the optical device according to the first embodiment and Modification 1 thereof.
  • FIG. 6 is a cross-sectional view illustrating a part of a second modification of the configuration of the optical device according to the first embodiment.
  • FIG. 7 is a plan view showing Modification Example 3 of the configuration of the optical device according to the first embodiment.
  • optical device of the present disclosure and the manufacturing method thereof will be described with reference to the drawings.
  • detailed description may be omitted.
  • detailed descriptions of already well-known matters and repeated descriptions for substantially the same configuration may be omitted. This is to avoid the following description from becoming unnecessarily redundant and to facilitate understanding by those skilled in the art.
  • (First embodiment) 1A and 1B are a cross-sectional view and a plan view schematically showing the optical device according to the present embodiment.
  • 1A includes an optical element 1, a transparent member 2 disposed so as to cover the optical element 1, and a sealing resin 3 for sealing the optical element 1.
  • the optical element 1 includes an optical region 5 that photoelectrically converts incident light on the main surface 4, and includes a first electrode 6 in a region different from the optical region 5 on the main surface 4.
  • the first electrode 6 is a conductive terminal that outputs an electrical signal obtained by photoelectrically converting incident light to the outside of the optical element 1, and is formed of a metal such as aluminum or copper as a main material. .
  • the transparent member 2 is made of a translucent material such as glass or synthetic resin, and is disposed so as to cover the optical region 5 of the optical element 1. Light outside the optical device 100 is incident from the first surface 7 of the transparent member 2, passes through the transparent member 2, and is received by the optical region 5 of the optical element 1.
  • the second surface 8 of the transparent member 2 is electrically connected to the second electrode 9, the first wiring 10 that is continuous with the second electrode 9, and the second electrode 9 through the first wiring 10. And a third electrode 11 connected thereto.
  • the second electrode 9 of the transparent member 2 and the first electrode 6 of the optical element 1 are connected by a bonding member 12.
  • An electrical signal obtained by photoelectric conversion in the optical region 5 is transmitted from the first electrode 6 of the optical element 1 to the second electrode 9 of the transparent member via the bonding member 12 and further to the second electrode 9 by the first wiring 10. It is transmitted to the third electrode 11 routed outside the second electrode 9.
  • the bonding member 12 any one of a bump, a conductive sheet, a conductive adhesive, or a composite of them is used.
  • the sealing resin 3 includes a through electrode 13 that seals a part of the second surface 8 of the transparent member 2 and the optical element 1 and is electrically connected to the third electrode 11 of the transparent member 2.
  • the through electrode 13 penetrates the sealing resin 3 in the thickness direction, and is connected to the second wiring 14 on the side opposite to the third electrode 11.
  • the second wiring 14 is covered with an insulating layer 15 such as solder resist or polyimide, and is insulated and protected except for a portion that conducts with the fourth electrode 16.
  • An external electrode terminal 17 is connected to the fourth electrode 16, and electrical connection with the outside of the optical device 100 is performed by the external electrode terminal 17.
  • the through electrode 13 is formed by covering or filling a through hole formed in the sealing resin 3 with a conductive material such as copper or solder.
  • a conductive material such as copper or solder.
  • the sealing resin 3 is also filled in the outer periphery of the bonding member 12, that is, the bonding portion between the optical element 1 and the transparent member 2 is protected from both the optical region 5 side and the through electrode 13 side. Therefore, the electrical reliability of the joint is improved, and an electrical signal can be transmitted from the optical element 1 to the outside with high reliability.
  • a step 18 is disposed between the optical element 1 and the transparent member 2 on the optical region 5 side of the bonding member 12. Since the stepped portion 18 serves as a dam and prevents the resin from entering the optical region 5, the sealing resin 3 does not exist inside the stepped portion 18 and does not reach the optical region 5. Therefore, it is possible to prevent problems caused by the resin entering the optical region 5. Further, since the resin does not enter inside the step portion 18 on the second surface 8 of the transparent member 2, it is possible to prevent the incident light to the optical region 5 from being blocked by the resin.
  • the stepped portion 18 is desirably formed continuously on the outer periphery of the optical region 5 as shown in FIG. 1B, but may be intermittent as long as the purpose of preventing the infiltration of the resin can be achieved.
  • the interval when intermittently arranged is determined by the viscosity of the resin, the distance between the optical region 5 and the bonding member 12, and the like. Further, even when the tip of the step portion 18 is not in contact with the first surface 8 of the transparent member 2, the step portion 18 functions as a dam, and the optical region 5 or incident light received by the optical region 5 is received. The effect of preventing the sealing resin 3 from entering the path is limited.
  • the step portion 18 is formed of the same material as the bonding member 12, but the present invention is not limited to this, and the step portion 18 may be formed of another conductive material or a non-conductive material such as a resin. . Further, an antireflection film (not shown) may be provided on the surface of the stepped portion 18, particularly on the side close to the optical region 5. Thereby, irregular reflection of incident light is prevented, and efficient condensing on the optical region 5 becomes possible.
  • the connection portion can be reinforced while preventing the resin from entering the optical region 5. Further, it is possible to prevent the incident light to the optical region 5 from being blocked by the resin on the second surface 8 of the transparent member 2. That is, the reliability as the optical device 100 can be improved.
  • 2A to 3C are cross-sectional views schematically showing an example of a method for manufacturing the optical device according to the present embodiment.
  • a second electrode 9 and a third electrode 11 are formed on the second surface 8 of the transparent member 2. More specifically, although not shown in the figure, a seed metal is formed on the second surface 8 of the transparent member 2 by sputtering using, for example, a PVD (Physical Vapor Deposition) method.
  • the seed metal material can be selected from TiW, Al, Cu, Ni, and the like.
  • patterning is performed by etching, and a main metal is formed thereon by plating to form the second electrode 9, the first wiring 10, and the third electrode 11.
  • Au is formed on Ni, and PVD sputtering is used, or in the case of mass production, electrolytic plating is used.
  • a step 18 is formed on the second surface 8 of the transparent member 2, and a bonding member 12 is formed on the second electrode 9, respectively.
  • the step portion 18 and the joining member 12 are preferably made of the same material and in the same process. For example, a structure in which solder is plated on Cu or Ni, or a stud bump of Au is applied.
  • the height of the bonding member 12 may be made higher than the stepped portion 18 by covering the stepped portion 18 with a film such as a resist (not shown).
  • the optical element 1 is connected to the transparent member 2 by a flip chip bonding method.
  • the bonding member 12 provided on the transparent member 2 side and the first electrode 6 of the optical element 1 are connected, and the optical region 5 and the second surface 8 of the transparent member face each other.
  • an underfill (not shown) may be filled around the joint. In that case, an optimum material can be selected for each of the protection of the joint and the protection of the chip. For the optical element 1, if only non-defective products are selected and bonded, the production cost can be reduced.
  • a sealing resin 3 that protects the outer periphery of the optical element 1 and the joint between the optical element 1 and the transparent member 2 is formed.
  • a resin filling method an appropriate method can be selected depending on the viscosity and wettability of the resin, such as a compression mold method, a transfer mold method, and a method in which a resin is applied in a dotted manner and is spread and filled by capillary action.
  • the surface opposite to the optical region 5 of the optical element 1 is also covered with the sealing resin 3.
  • the optical element 1 is back-ground and the sealing resin 3 is used. You may expose from.
  • a through electrode 13 is formed in the sealing resin 3.
  • a cavity for forming a through electrode is formed in the sealing resin 3, and then a conductive layer is formed on the inner wall of the cavity by plating or the like, or the cavity is filled with a conductor to function as an electrode.
  • etching the cavity such as formation by laser, formation by RIE (Reactive Ion Etching), and exposure using a mask using a photosensitive resin.
  • the wiring 14 is formed on the surface of the sealing resin 3 opposite to the surface facing the transparent member 2 so as to be connected to one end of the through electrode 13 exposed from the sealing resin 3.
  • the fourth electrode 16 is formed continuously with the wiring 14.
  • an insulating layer 15 that covers the wiring 14 and the fourth electrode 16 is formed.
  • An opening 19 is formed in the insulating layer 15 so as to expose a part of the fourth electrode 16 that becomes an electrical conduction portion with the outside.
  • an external electrode terminal 17 for electrical connection with the outside of the optical device 100 is formed on the fourth electrode 16 and separated into individual pieces by dicing.
  • Individual optical devices 100 as shown in FIG. Dicing may be performed from either direction A or B, or from both directions.
  • the end portions of the transparent member 2 and the sealing resin 3 are formed flush with each other. “Flush” means a substantial flush and includes some manufacturing errors.
  • the external electrode terminal 17 is generally formed of a solder ball, but may have a ball shape as shown in FIG. 3C with a composition other than solder, or a pillar-shaped conductor other than the ball shape. I do not care.
  • the external electrode terminal 17 is not provided on the optical device 100 side, and a sheet-like adhesive or conductive adhesive is provided on a substrate (not shown) on which the optical device 100 is mounted, so that the fourth electrode 16 is electrically connected. It can also be connected. In that case, after carrying out to the process of FIG. 3B, singulation is performed and the optical device 100 is obtained.
  • the bonding member 12 is formed on the electrode 9 of the transparent member 2 as shown in FIG. 2B, but may instead be formed on the electrode 6 of the optical element 1. In that case, the bonding member 12 formed on the electrode 6 of the optical element 1 is bonded to the electrode 9 of the transparent member 2 to perform flip chip bonding.
  • the stepped portion 18 disposed between the optical region 5 and the first electrode 6 is formed in a convex shape on the second surface 8 of the transparent member 2.
  • This configuration has the advantage that the step 18 can be formed in the same process as the electrode formation on the transparent member 2, and the process is simple and easy to manufacture.
  • the stepped portion 18 is a technical effect in which priority is given to functioning as a dam so that the sealing resin 3 does not enter the optical region 5, and other shapes may be adopted as long as this effect is obtained.
  • 4A to 4E are cross-sectional views schematically showing modified examples of the step portion 18 of the optical device 100 according to the present embodiment.
  • a convex step 18a is disposed on the optical element 1a side.
  • the transparent member 2 is made of glass, synthetic resin, or the like, it is more resistant to damage at the time of bonding than the main surface 4 side of the optical element 1 having a fragile configuration such as a circuit element that is easily broken. Therefore, in the configuration of FIG. 4A, damage to the optical element can be reduced compared to the configuration in which the tip of the stepped portion 18 formed in the transparent member 2 is in contact with the optical element 1 as shown in FIG. 1A.
  • convex step portions 18b and 18c are arranged on the optical element 1c side and the transparent member 2b side.
  • the bonding gap between the optical element and the transparent member can be easily closed as compared with the configuration in which the step portion is disposed only in one of the optical element 1 and the transparent member 2.
  • the tip of the stepped portion 18b does not contact the main surface 4 of the optical element 1c, damage to the optical element can be reduced as compared with the structure of FIG. 1A.
  • the bonding member 12 may be formed on the optical element 1a or 1c side in the same process as the stepped portion 18a or 18c.
  • the stepped portion is mounted as a concave shape instead of a convex shape.
  • a concave step portion 18d in which a part of the second surface 8 of the transparent member 2d is recessed is provided.
  • the sealing resin 3 that has entered inside the bonding member 12 falls into the stepped portion 18d, so that the stepped portion 18d serves as a dam and prevents light incident on the optical region 5 from being blocked by the resin. it can. Further, since excess sealing resin 3 flows toward the stepped portion 18d, an effect of preventing the sealing resin 3 from entering the optical region 5 is produced even on the optical element 1 side where the stepped portion 18d is not provided.
  • a concave-shaped stepped portion 18e in which a part of the main surface 4 of the optical element 1e is recessed is provided.
  • the sealing resin 3 even if the sealing resin 3 enters the main surface 4 to the inside of the bonding member 12, it falls into the stepped portion 18 e before the optical region 5. Therefore, it is possible to more reliably prevent the sealing resin 3 from entering the optical region 5 as compared with the configuration of FIG. 4C. Further, since excess sealing resin 3 flows toward the stepped portion 18e, the flow of the sealing resin 3 is relaxed even on the transparent member 2 side where the stepped portion 18e is not provided, and incident light to the optical region 5 is resinated. It can also be prevented from being blocked by.
  • concave step portions 18e and 18f are provided on both the main surface 4 of the optical element 1d and the second surface 8 of the transparent member 2f.
  • This configuration includes a dam structure that prevents the sealing resin 3 from entering on both the optical element 1 side and the transparent member 2 side, and has both the structures disclosed in FIGS. 4C and 4D. Therefore, intrusion of the sealing resin 3 can be more reliably prevented as compared with FIGS. 4C and 4D.
  • the mode of the stepped portion 18 is not limited to that shown in FIGS. 4A to 4E, but may be a convex shape with a root diameter smaller than the tip diameter, or a concave shape with a larger bottom diameter. Also, there are combinations of a convex stepped portion and a concave stepped portion. As an example, a convex stepped portion 18 is provided on the transparent member 2 side, a concave stepped portion 18d is provided on the optical element 1 side, and a stepped portion 18d is disposed on the optical region 5 side of the stepped portion 18 in the sectional view. There is a configuration to do.
  • the stepped portion 18 d in front of the optical region 5 can be stopped.
  • the location where the step portion is arranged is determined as appropriate depending on the material of the sealing resin 3 and the filling method.
  • the convex stepped portion is disclosed as a stepped portion 18a that widens toward the optical element 1 as shown in FIG. 5A and a stepped portion 18 that spreads out toward the transparent member 2 as shown in FIG. 5B.
  • the opening area on the second surface 8 of the transparent member 2 becomes wider when the optical element 1 side is provided with a stepped portion that widens toward the end. That is, the incident angle ⁇ to the optical region 5 is widened, the light L transmitted through the transparent member 2 can be received more efficiently, and the performance of the optical device 100 is improved.
  • the stepped portion 18a whose optical element 1 side is widened is formed by, for example, the difference in the amount of light entering between the upper side and the lower side of the resist when exposing only the portion where the resist is applied and plating is grown.
  • the stepped portion 18 is desirably formed in the step of forming the bonding member 12, and the composition is the same conductor as the bonding member 12. Therefore, damage due to the tip of the stepped portion 18 coming into contact with the main surface 4 side of the optical element 1 having a fragile configuration that is easily destroyed, such as a circuit element, was assumed.
  • FIG. 6 is a cross-sectional view schematically showing a modification of the step portion 18 of the optical device 100 according to the present embodiment.
  • the stepped portion 18g provided on the transparent member 2 includes a metal material 20 and an insulating material 21 that covers the metal material 20.
  • the material of the metal material 20 is selected from, for example, copper and gold
  • the insulating material 21 is a material such as solder resist or polyimide.
  • the insulating material 21 covers the upper surface and side surfaces of the metal material 20.
  • the present invention is not limited to this. If only the upper portion of the metal material 20 is covered with the insulating material 21, damage at the time of bonding is achieved. The effect of reducing is obtained.
  • the arrangement pitch of the second electrodes 9 is larger than the arrangement pitch of the third electrodes 11 as shown in FIG. 1B.
  • the accuracy required when performing processing for establishing electrical continuity with the third electrode 11 such as the through electrode 13 connected to the third electrode is relaxed, and a simpler apparatus and process can be used. Can be manufactured. There are other designs that can alleviate this machining accuracy.
  • FIG. 7 is a plan view schematically showing a modification of the third electrode 11 of the optical device 100 according to the present embodiment.
  • the area of the third electrode 11 b is larger than the area of the second electrode 9.
  • the first surface 7 of the transparent member 2 is a light incident surface from the outside of the optical device 100.
  • an optical filter (not shown) that selectively removes a specific wavelength of light is further laminated on the transparent member 2 to form a camera module.
  • the optical filter can be formed by separating the optical device 100 into individual pieces and then individually pasting on the transparent member 2, but before making the optical device 100 into individual pieces, the optical filter is laminated on the transparent member 2, If batch cutting is performed in a state of being bonded to the optical device 100, manufacturing can be performed with a simpler process. In addition, the height of the camera module can be reduced.
  • the second electrode 9 formed on the second surface 8 of the transparent member 2 is the same as the first wiring 10, the third electrode 11, and the sealing formed on the second surface 8. It was connected to the fourth electrode 16 through the through electrode 13 penetrating the stop resin 3 in the thickness direction and the second wiring 14.
  • the external connection terminal is electrically connected from the second electrode 9 without using the third electrode 11 and the through electrode 13.
  • the first wiring 10 connected to the second electrode 9 is formed up to the side end of the transparent member 2, and the second wiring 14 connected to the fourth electrode 16 is also used as the sealing resin 3. It forms to the side edge part.
  • a conductor for connecting the first wiring 10 and the second wiring 14 is formed on the side end face of the sealing resin 3. In this configuration, the width of the optical device can be reduced as compared with the configuration in which the third electrode 11 and the through electrode 13 are provided outside the optical element 1, and the size of the camera module can be reduced.
  • the through electrode 13 is disposed inside the sealing resin 3.
  • the through electrode 13 is exposed from the side end surface of the sealing resin 3.
  • the third electrode 11 and the through electrode 13 are cut in the thickness direction to obtain a cross section of the through electrode 13.
  • the width of the optical device can be reduced as compared with the configuration in which the through electrode 13 is disposed inside the sealing resin, and the camera module can be downsized.
  • the through electrode exposed from the side surface of the optical device can be used as an external connection electrode of the optical device, and the degree of freedom in mounting can be increased. In that case, since the second wiring 14, the fourth electrode 16, and the external electrode terminal 17 are not formed on the back surface of the sealing resin 3, the height of the optical device and the camera module can be reduced.
  • the optical region 5 has been described as a light receiving region that receives incident light and performs photoelectric conversion.
  • the optical element 1 having the light receiving region is mainly assumed to be a CCD image sensor chip or a CMOS image sensor chip, but may be another imaging element or sensor.
  • the optical region 5 may be a light emitting region that emits light upon receiving a signal from the outside of the optical element 1 or the optical device 100. If it is the optical element 1 which has a light emission area
  • the first embodiment and its modifications have been described as examples of the technology disclosed in the present application.
  • the technology in the present disclosure is not limited to this, and can also be applied to an embodiment in which changes, replacements, additions, omissions, and the like are appropriately performed.
  • This disclosure is applicable to optical devices such as image sensors. Since a function when a TSV (Through Silicon Via) is formed on the optical element can be obtained without a special design of the optical element, the optical element is suitable for an apparatus that wants to reduce chip design costs and manufacturing costs.
  • TSV Thin Silicon Via

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Abstract

The purpose of the present invention is to obtain an optical device in which connected portions of a transparent member and an optical element are reinforced, while preventing resin from infiltrating into the optical region. The optical device is provided with: an optical element having on a principal surface an optical region and a first electrode arranged at the outside perimeter of the optical region; a transparent member having a second electrode on a first surface arranged to face towards a principal surface of the optical element; a joining member arranged between the optical element and the transparent member, for electrically connecting the first electrode and the second electrode; a step portion arranged between the optical element and the transparent member, and closer to the optical region side from the joining member; and a resin covering the optical element and the joining member. The resin includes a first resin portion for sealing the side surfaces of the optical element, and a second resin portion for covering the joint member from both sides of the step portion and the side edge portions of the optical element, while avoiding the optical region.

Description

光学装置および光学装置の製造方法Optical device and method of manufacturing optical device
 本開示は、デジタル機器等に搭載される光学装置とその製造方法に関する。 The present disclosure relates to an optical device mounted on a digital device or the like and a manufacturing method thereof.
 特許文献1は、貫通電極を有する基板に電子部品を搭載した基板モジュールを開示する。この基板モジュールは、基板と、基板の第一の表面上あるいは基板の内部に設けられた電子部品と、電子部品に電気的に接続されているとともに基板の第一の表面上に設けられた接続電極と、接続電極の裏面に達するように基板の厚み方向に貫通する第一の貫通孔部と、第一の貫通孔部の内部に設けられているとともに第一の貫通孔部の内部から基板の第二の表面上へ延びるように設けられた貫通電極と、基板の第二の表面上に設けられ、基板の第二の表面上において貫通電極と電気的に接続された配線電極と、配線電極の表面を覆うように基板の第二の表面上に設けられた絶縁層とを備える。 Patent Document 1 discloses a board module in which an electronic component is mounted on a board having a through electrode. The board module includes a board, an electronic component provided on the first surface of the board or inside the board, and a connection provided on the first surface of the board while being electrically connected to the electronic component. An electrode, a first through-hole portion penetrating in the thickness direction of the substrate so as to reach the back surface of the connection electrode, and the substrate provided from the inside of the first through-hole portion while being provided inside the first through-hole portion A through electrode provided on the second surface of the substrate, a wiring electrode provided on the second surface of the substrate and electrically connected to the through electrode on the second surface of the substrate, and a wiring And an insulating layer provided on the second surface of the substrate so as to cover the surface of the electrode.
 特許文献2は、ウエハレベルのイメージセンサモジュールを開示する。このイメージセンサモジュールは、イメージセンサに流入される光から特定波長を除去させる光学フィルター、光学フィルターに付着されてフィルターコーティング層を保護し、その後面にはパッド電極らが形成されるガラス層、及びガラス層のパッド電極に付着され、パッド電極からその後面に再分配パッドが形成されるイメージセンサ、及びイメージセンサの後面側に配置され、パッド電極に電気的に連結されるソルダボールとを備える。 Patent Document 2 discloses a wafer level image sensor module. The image sensor module includes an optical filter that removes a specific wavelength from light flowing into the image sensor, a glass layer that is attached to the optical filter to protect the filter coating layer, and a pad electrode is formed on the rear surface thereof. An image sensor attached to the pad electrode of the glass layer and having a redistribution pad formed on the rear surface thereof from the pad electrode, and a solder ball disposed on the rear surface side of the image sensor and electrically connected to the pad electrode.
特許第4713602号公報Japanese Patent No. 4713602 特開2006-216935号公報JP 2006-216935 A
 特許文献1に開示された技術では、基板を貫通する電極が必要であり、その製造工程が複雑である。 In the technique disclosed in Patent Document 1, an electrode penetrating the substrate is required, and the manufacturing process is complicated.
 特許文献2に開示された技術では、絶縁封止樹脂でイメージセンサを封止するが、イメージセンサの電極とガラス層のパッドとの接合部において、絶縁封止樹脂は接合部の片側しか保護しておらず、接続不良の問題が生じる。また、接合部の隙間から樹脂がイメージセンサの受光部側に進入した場合に、光の流入を妨げる。 In the technique disclosed in Patent Document 2, the image sensor is sealed with an insulating sealing resin. However, the insulating sealing resin protects only one side of the joint at the joint between the electrode of the image sensor and the pad of the glass layer. This causes a problem of poor connection. Further, when the resin enters the light receiving part side of the image sensor from the gap of the joint part, the inflow of light is hindered.
 本開示における光学装置は、光学領域への樹脂の浸入を防ぎつつ、接続部を補強するのに有効である。 The optical device according to the present disclosure is effective for reinforcing the connection portion while preventing the resin from entering the optical region.
 本開示における光学装置は、主面に、光学領域と、光学領域の外周に配置された第1の電極とを有する光学素子と、光学素子の主面と向かい合って配置された第1の面に、第2の電極と、を有する透明部材と、光学素子と透明部材の間に配置され、第1の電極と第2の電極とを電気的に接続する接合部材と、光学素子と透明部材との間において、接合部材よりも光学領域側に配置された段差部と、光学素子および接合部材を覆う樹脂と、を備え、樹脂は、光学素子の側面を封止する第1の樹脂部と接合部材を光学素子の側端部および段差部の両側から覆う第2の樹脂とを含み、光学領域を避けて存在する。 An optical device according to the present disclosure includes an optical element having an optical region and a first electrode disposed on an outer periphery of the optical region on a main surface, and a first surface disposed to face the main surface of the optical element. A transparent member having a second electrode, a bonding member disposed between the optical element and the transparent member, and electrically connecting the first electrode and the second electrode; an optical element and the transparent member; And a resin that covers the optical element and the bonding member, and the resin is bonded to the first resin portion that seals the side surface of the optical element. And a second resin that covers the member from both sides of the optical element and from both sides of the step portion, and is present while avoiding the optical region.
 本開示によれば、光学領域への樹脂の浸入を防ぎつつ、透明部材と光学素子の接続部を補強した、信頼性の高い光学装置を得るのに有効である。 According to the present disclosure, it is effective to obtain a highly reliable optical device in which the connection between the transparent member and the optical element is reinforced while preventing the resin from entering the optical region.
図1Aは、第1の実施形態に係る光学装置の構成を示した図であり、図1Bに示すIa-Ia線に沿った断面図である。FIG. 1A is a diagram illustrating the configuration of the optical device according to the first embodiment, and is a cross-sectional view taken along line Ia-Ia illustrated in FIG. 1B. 図1Bは、第1の実施形態に係る光学装置の構成を示した平面図である。FIG. 1B is a plan view showing the configuration of the optical device according to the first embodiment. 図2Aは、第1の実施形態に係る光学装置の製造方法の一例を示した断面図である。FIG. 2A is a cross-sectional view illustrating an example of a method for manufacturing the optical device according to the first embodiment. 図2Bは、第1の実施形態に係る光学装置の製造方法の一例を示した断面図である。FIG. 2B is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment. 図2Cは、第1の実施形態に係る光学装置の製造方法の一例を示した断面図である。FIG. 2C is a cross-sectional view showing an example of a method for manufacturing the optical device according to the first embodiment. 図2Dは、第1の実施形態に係る光学装置の製造方法の一例を示した断面図である。FIG. 2D is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment. 図3Aは、第1の実施形態に係る光学装置の製造方法の一例を示した断面図である。FIG. 3A is a cross-sectional view illustrating an example of a method for manufacturing the optical device according to the first embodiment. 図3Bは、第1の実施形態に係る光学装置の製造方法の一例を示した断面図である。FIG. 3B is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment. 図3Cは、第1の実施形態に係る光学装置の製造方法の一例を示した断面図である。FIG. 3C is a cross-sectional view illustrating an example of the method for manufacturing the optical device according to the first embodiment. 図4Aは、第1の実施形態に係る光学装置の構成の変形例1の一部分を示した断面図である。FIG. 4A is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment. 図4Bは、第1の実施形態に係る光学装置の構成の変形例1の一部分を示した断面図である。FIG. 4B is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment. 図4Cは、第1の実施形態に係る光学装置の構成の変形例1の一部分を示した断面図である。FIG. 4C is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment. 図4Dは、第1の実施形態に係る光学装置の構成の変形例1の一部分を示した断面図である。FIG. 4D is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment. 図4Eは、第1の実施形態に係る光学装置の構成の変形例1の一部分を示した断面図である。FIG. 4E is a cross-sectional view showing a part of Modification 1 of the configuration of the optical device according to the first embodiment. 図5Aは、第1の実施形態に係る光学装置とその変形例1との比較のための断面図である。FIG. 5A is a cross-sectional view for comparison between the optical device according to the first embodiment and Modification 1 thereof. 図5Bは、第1の実施形態に係る光学装置とその変形例1との比較のための断面図である。FIG. 5B is a cross-sectional view for comparison between the optical device according to the first embodiment and Modification 1 thereof. 図6は、第1の実施形態に係る光学装置の構成の変形例2の一部分を示した断面図である。FIG. 6 is a cross-sectional view illustrating a part of a second modification of the configuration of the optical device according to the first embodiment. 図7は、第1の実施形態に係る光学装置の構成の変形例3を示した平面図である。FIG. 7 is a plan view showing Modification Example 3 of the configuration of the optical device according to the first embodiment.
 以下、本開示の光学装置およびその製造方法について図面を参照しながら説明する。但し、詳細な説明は省略する場合がある。例えば、既によく知られた事項の詳細説明や実質的に同一の構成に対する重複説明を省略する場合がある。これは、以下の説明が不必要に冗長になるのを避け、当業者の理解を容易にするためである。 Hereinafter, the optical device of the present disclosure and the manufacturing method thereof will be described with reference to the drawings. However, detailed description may be omitted. For example, detailed descriptions of already well-known matters and repeated descriptions for substantially the same configuration may be omitted. This is to avoid the following description from becoming unnecessarily redundant and to facilitate understanding by those skilled in the art.
 なお、添付図面および以下の説明は当業者が本開示を十分に理解するためのものであって、これらによって請求の範囲に記載の主題を限定することを意図するものではない。 It should be noted that the accompanying drawings and the following description are intended to enable those skilled in the art to fully understand the present disclosure, and are not intended to limit the subject matter described in the claims.
 (第1の実施形態)
 図1Aおよび図1Bは、本実施形態にかかる光学装置を模式的に示す断面図と平面図である。
(First embodiment)
1A and 1B are a cross-sectional view and a plan view schematically showing the optical device according to the present embodiment.
 図1Aに示す光学装置100は、光学素子1と、光学素子1を覆うように配置された透明部材2と、光学素子1を封止する封止樹脂3とを有する。 1A includes an optical element 1, a transparent member 2 disposed so as to cover the optical element 1, and a sealing resin 3 for sealing the optical element 1.
 光学素子1は、主面4に入射光を光電変換する光学領域5を備え、同じく主面4の光学領域5とは異なる領域に、第1の電極6を備える。第1の電極6は、入射光を光電変換して得られた電気信号を光学素子1の外部に出力する導電性の端子であり、例えばアルミニウムや銅等の金属を主材料に形成されている。 The optical element 1 includes an optical region 5 that photoelectrically converts incident light on the main surface 4, and includes a first electrode 6 in a region different from the optical region 5 on the main surface 4. The first electrode 6 is a conductive terminal that outputs an electrical signal obtained by photoelectrically converting incident light to the outside of the optical element 1, and is formed of a metal such as aluminum or copper as a main material. .
 透明部材2は、ガラス、合成樹脂等の透光性材料からなり、光学素子1の光学領域5を覆うように配置される。光学装置100外部の光は、透明部材2の第1の面7から入射し、透明部材2を通過した後、光学素子1の光学領域5で受光される。透明部材2の第2の面8は、第2の電極9と、第2の電極9と連続した第1の配線10と、第1の配線10を介して第2の電極9と電気的に接続された第3の電極11とを備える。透明部材2の第2の電極9と、光学素子1の第1の電極6とは、接合部材12によって接続されている。光学領域5において光電変換して得られた電気信号は、光学素子1の第1の電極6から接合部材12を介して透明部材の第2の電極9に、さらには第1の配線10により第2の電極9より外側に引き回された第3の電極11に伝わる。接合部材12にはバンプ、導電性シート、導電性接着剤のいずれか、またはそれらを複合したものが用いられる。 The transparent member 2 is made of a translucent material such as glass or synthetic resin, and is disposed so as to cover the optical region 5 of the optical element 1. Light outside the optical device 100 is incident from the first surface 7 of the transparent member 2, passes through the transparent member 2, and is received by the optical region 5 of the optical element 1. The second surface 8 of the transparent member 2 is electrically connected to the second electrode 9, the first wiring 10 that is continuous with the second electrode 9, and the second electrode 9 through the first wiring 10. And a third electrode 11 connected thereto. The second electrode 9 of the transparent member 2 and the first electrode 6 of the optical element 1 are connected by a bonding member 12. An electrical signal obtained by photoelectric conversion in the optical region 5 is transmitted from the first electrode 6 of the optical element 1 to the second electrode 9 of the transparent member via the bonding member 12 and further to the second electrode 9 by the first wiring 10. It is transmitted to the third electrode 11 routed outside the second electrode 9. As the bonding member 12, any one of a bump, a conductive sheet, a conductive adhesive, or a composite of them is used.
 封止樹脂3は、透明部材2の第2の面8の一部と光学素子1とを封止し、透明部材2の第3の電極11と電気的に接続された貫通電極13を備える。貫通電極13は、封止樹脂3を厚み方向に貫通し、第3の電極11と反対側で第2の配線14と接続されている。第2の配線14は、ソルダーレジストやポリイミドのような絶縁層15により覆われており、第4の電極16と導通を取る部分を除いては、絶縁保護されている。第4の電極16には、外部電極端子17が接続されており、光学装置100の外部との電気的な接続は外部電極端子17により行われる。光学領域5において光電変換して得られた電気信号は、第3の電極11から貫通電極13を介して、封止樹脂3の裏面の配線14に伝わり、さらに第4の電極16と外部電極端子17を介して光学装置100外部に引き出される。貫通電極13は、封止樹脂3に形成された貫通孔を銅やはんだといった導電性材料により被覆または充填されて形成される。封止樹脂3に形成した貫通電極13を採用した光学装置100では、半導体基板を貫通して形成するシリコン貫通電極と比較して、絶縁膜を形成する必要がなく、またエッチングが容易である為、簡易な工程で形成でき、さらに製造コストを抑えることができる。 The sealing resin 3 includes a through electrode 13 that seals a part of the second surface 8 of the transparent member 2 and the optical element 1 and is electrically connected to the third electrode 11 of the transparent member 2. The through electrode 13 penetrates the sealing resin 3 in the thickness direction, and is connected to the second wiring 14 on the side opposite to the third electrode 11. The second wiring 14 is covered with an insulating layer 15 such as solder resist or polyimide, and is insulated and protected except for a portion that conducts with the fourth electrode 16. An external electrode terminal 17 is connected to the fourth electrode 16, and electrical connection with the outside of the optical device 100 is performed by the external electrode terminal 17. An electrical signal obtained by photoelectric conversion in the optical region 5 is transmitted from the third electrode 11 to the wiring 14 on the back surface of the sealing resin 3 through the through electrode 13, and further to the fourth electrode 16 and the external electrode terminal. 17 is pulled out to the outside of the optical device 100. The through electrode 13 is formed by covering or filling a through hole formed in the sealing resin 3 with a conductive material such as copper or solder. In the optical device 100 employing the through electrode 13 formed in the sealing resin 3, it is not necessary to form an insulating film and etching is easy as compared with the silicon through electrode formed through the semiconductor substrate. It can be formed by a simple process, and the manufacturing cost can be reduced.
 封止樹脂3はまた、接合部材12の外周に充填されており、すなわち、光学素子1と透明部材2との接合部を光学領域5側と貫通電極13側の両方から保護している。その為、接合部の電気的信頼性が向上し、光学素子1から外部へ電気信号を信頼性高く伝えることができる。 The sealing resin 3 is also filled in the outer periphery of the bonding member 12, that is, the bonding portion between the optical element 1 and the transparent member 2 is protected from both the optical region 5 side and the through electrode 13 side. Therefore, the electrical reliability of the joint is improved, and an electrical signal can be transmitted from the optical element 1 to the outside with high reliability.
 さらに、光学素子1と透明部材2との間において、接合部材12よりも光学領域5側に段差部18が配置されている。この段差部18がダムの役割を果たし、光学領域5への樹脂の浸入が防止されるため、封止樹脂3は段差部18より内側には存在せず、光学領域5まで達していない。その為、光学領域5まで樹脂が浸入することによる不具合を防止できる。また、透明部材2の第2の面8において段差部18より内側に樹脂が浸入しないため、光学領域5への入射光が樹脂により遮られることも防止できる。 Furthermore, a step 18 is disposed between the optical element 1 and the transparent member 2 on the optical region 5 side of the bonding member 12. Since the stepped portion 18 serves as a dam and prevents the resin from entering the optical region 5, the sealing resin 3 does not exist inside the stepped portion 18 and does not reach the optical region 5. Therefore, it is possible to prevent problems caused by the resin entering the optical region 5. Further, since the resin does not enter inside the step portion 18 on the second surface 8 of the transparent member 2, it is possible to prevent the incident light to the optical region 5 from being blocked by the resin.
 段差部18は、図1Bに示すように光学領域5の外周に連続的に形成されるのが望ましいが、樹脂の浸入を防止する目的を果たせれば断続的であってもよい。断続的に配置される場合の間隔は、樹脂の粘度や光学領域5と接合部材12との距離などにより決定される。さらに、段差部18の先端が透明部材2の第1の面8と接触していない場合にも、段差部18はダムとして機能し、光学領域5や、光学領域5で受光される入射光の経路への封止樹脂3の浸入を防ぐ効果は、限定的に生じる。また、段差部18は接合部材12と同じ材料で形成されるのが製造工程上望ましいが、これに限るものではなく、他の導電材料や、樹脂等の非導電材料で形成されても構わない。さらに、段差部18の表面、特に、光学領域5に近い側に、反射防止膜(図示せず)を備えてもよい。これにより、入射光の乱反射を防止し、光学領域5への効率的な集光が可能になる。 The stepped portion 18 is desirably formed continuously on the outer periphery of the optical region 5 as shown in FIG. 1B, but may be intermittent as long as the purpose of preventing the infiltration of the resin can be achieved. The interval when intermittently arranged is determined by the viscosity of the resin, the distance between the optical region 5 and the bonding member 12, and the like. Further, even when the tip of the step portion 18 is not in contact with the first surface 8 of the transparent member 2, the step portion 18 functions as a dam, and the optical region 5 or incident light received by the optical region 5 is received. The effect of preventing the sealing resin 3 from entering the path is limited. In addition, it is desirable in the manufacturing process that the step portion 18 is formed of the same material as the bonding member 12, but the present invention is not limited to this, and the step portion 18 may be formed of another conductive material or a non-conductive material such as a resin. . Further, an antireflection film (not shown) may be provided on the surface of the stepped portion 18, particularly on the side close to the optical region 5. Thereby, irregular reflection of incident light is prevented, and efficient condensing on the optical region 5 becomes possible.
 以上、本実施形態の光学装置100では、光学素子1と透明部材2とを電気的に接合する接合部材12の外周に封止樹脂3を配置する構成、および、接合部材12より光学領域5側に段差部18を設ける構成により、光学領域5への樹脂の浸入を防ぎつつ、接続部を補強することが可能になる。また、透明部材2の第2の面8において、光学領域5への入射光が樹脂により遮られることも防止できる。すなわち、光学装置100としての信頼性を向上することができる。 As described above, in the optical device 100 of the present embodiment, the configuration in which the sealing resin 3 is disposed on the outer periphery of the bonding member 12 that electrically bonds the optical element 1 and the transparent member 2, and the optical region 5 side from the bonding member 12. With the configuration in which the step portion 18 is provided, the connection portion can be reinforced while preventing the resin from entering the optical region 5. Further, it is possible to prevent the incident light to the optical region 5 from being blocked by the resin on the second surface 8 of the transparent member 2. That is, the reliability as the optical device 100 can be improved.
 図2A~図3Cは、本実施形態にかかる光学装置の製造方法の一例を模式的に示す断面図である。 2A to 3C are cross-sectional views schematically showing an example of a method for manufacturing the optical device according to the present embodiment.
 ここでは、大判の透明部材2上に複数の光学装置の構成要素を一括形成し、その後ダイシングで個々の光学装置100に個片化する製造方法を示す。 Here, a manufacturing method in which components of a plurality of optical devices are collectively formed on a large transparent member 2 and then separated into individual optical devices 100 by dicing will be described.
 まず、図2Aに示すように、透明部材2の第2の面8上に、第2の電極9と第3の電極11を形成する。より詳しくは、図示を省略するが、透明部材2の第2の面8上に、例えばPVD(Physical Vapor Deposition)方式を利用してスパッタリングでシードメタル(Seed metal)を形成する。シードメタルの材料は、TiW、Al、Cu、Niなどから採用できる。その後、エッチングによりパターニングを行い、その上にめっきにより本メタルを形成し、第2の電極9、第1の配線10、および第3の電極11を形成する。めっきはNiの上にAuを形成するのが一般的であり、PVD方式のスパッタリングを用いるか、大量生産の場合は電解めっきを用いる。 First, as shown in FIG. 2A, a second electrode 9 and a third electrode 11 are formed on the second surface 8 of the transparent member 2. More specifically, although not shown in the figure, a seed metal is formed on the second surface 8 of the transparent member 2 by sputtering using, for example, a PVD (Physical Vapor Deposition) method. The seed metal material can be selected from TiW, Al, Cu, Ni, and the like. Thereafter, patterning is performed by etching, and a main metal is formed thereon by plating to form the second electrode 9, the first wiring 10, and the third electrode 11. In general, Au is formed on Ni, and PVD sputtering is used, or in the case of mass production, electrolytic plating is used.
 次に、図2Bに示すように、透明部材2の第2の面8上に段差部18を、第2の電極9上に接合部材12をそれぞれ形成する。段差部18と接合部材12は、同一材料で、同じ工程で形成されることが望ましく、例えばCuやNiの上にはんだをめっきした構成やAuのスタッドバンプが適用される。この時、段差部18にレジスト等の膜(図示せず)で蓋をすることで、段差部18より接合部材12の高さを高くしてもよい。 Next, as shown in FIG. 2B, a step 18 is formed on the second surface 8 of the transparent member 2, and a bonding member 12 is formed on the second electrode 9, respectively. The step portion 18 and the joining member 12 are preferably made of the same material and in the same process. For example, a structure in which solder is plated on Cu or Ni, or a stud bump of Au is applied. At this time, the height of the bonding member 12 may be made higher than the stepped portion 18 by covering the stepped portion 18 with a film such as a resist (not shown).
 次に、図2Cに示すように、光学素子1をフリップチップボンディング方式により、透明部材2と接続する。このとき、透明部材2側に設けられた接合部材12と光学素子1の第1の電極6とが接続され、光学領域5と透明部材の第2の面8とは向かい合っている。なお、この時点で、接合部周辺にアンダーフィル(図示せず)を充填しておいてもよい。その場合、接合部の保護、チップの保護それぞれに、最適な材料を選択することができる。また、光学素子1については、良品のみを選択してボンディングすれば、生産コストを抑えることが可能である。 Next, as shown in FIG. 2C, the optical element 1 is connected to the transparent member 2 by a flip chip bonding method. At this time, the bonding member 12 provided on the transparent member 2 side and the first electrode 6 of the optical element 1 are connected, and the optical region 5 and the second surface 8 of the transparent member face each other. At this time, an underfill (not shown) may be filled around the joint. In that case, an optimum material can be selected for each of the protection of the joint and the protection of the chip. For the optical element 1, if only non-defective products are selected and bonded, the production cost can be reduced.
 次に、図2Dに示すように、光学素子1の外周と、光学素子1と透明部材2との接合部を保護する封止樹脂3を形成する。樹脂の充填方法としては、コンプレッションモールド方式やトランスファーモールド方式、点状に樹脂を塗布して毛細管現象により広げて充填する方法など、樹脂の粘度や濡れ広がり性により適切な方法を選択することができる。なお、図2Dでは、光学素子1の光学領域5と反対側の面も封止樹脂3により被覆しているが、さらに薄化の為に、光学素子1に対するバックグラインドを行って封止樹脂3から露出させてもよい。 Next, as shown in FIG. 2D, a sealing resin 3 that protects the outer periphery of the optical element 1 and the joint between the optical element 1 and the transparent member 2 is formed. As a resin filling method, an appropriate method can be selected depending on the viscosity and wettability of the resin, such as a compression mold method, a transfer mold method, and a method in which a resin is applied in a dotted manner and is spread and filled by capillary action. . In FIG. 2D, the surface opposite to the optical region 5 of the optical element 1 is also covered with the sealing resin 3. However, for further thinning, the optical element 1 is back-ground and the sealing resin 3 is used. You may expose from.
 次に、図3Aに示すように、封止樹脂3内に貫通電極13を形成する。まず、封止樹脂3に貫通電極形成用の空洞を形成し、その後、空洞の内壁にめっき等で導電層を形成するか、空洞内を導電体で充填して電極として機能するようにする。空洞をエッチングする方法は様々あり、例えば、レーザーによる形成、RIE(Reactive Ion Etching)による形成、感光性の樹脂を用いマスクを利用して露光する、などがある。 Next, as shown in FIG. 3A, a through electrode 13 is formed in the sealing resin 3. First, a cavity for forming a through electrode is formed in the sealing resin 3, and then a conductive layer is formed on the inner wall of the cavity by plating or the like, or the cavity is filled with a conductor to function as an electrode. There are various methods for etching the cavity, such as formation by laser, formation by RIE (Reactive Ion Etching), and exposure using a mask using a photosensitive resin.
 次に図3Bに示すように、封止樹脂3の、透明部材2と向かい合う面とは反対側の面に、封止樹脂3から露出した貫通電極13の一端と接続するように配線14を形成し、配線14と連続して第4の電極16を形成する。その後、配線14と第4の電極16を被覆する絶縁層15を形成する。絶縁層15には、外部との電気的導通部となる第4の電極16の一部を露出するように開口19を形成する。 Next, as shown in FIG. 3B, the wiring 14 is formed on the surface of the sealing resin 3 opposite to the surface facing the transparent member 2 so as to be connected to one end of the through electrode 13 exposed from the sealing resin 3. Then, the fourth electrode 16 is formed continuously with the wiring 14. Thereafter, an insulating layer 15 that covers the wiring 14 and the fourth electrode 16 is formed. An opening 19 is formed in the insulating layer 15 so as to expose a part of the fourth electrode 16 that becomes an electrical conduction portion with the outside.
 最後に、図3Cに示すように、第4の電極16上に、光学装置100の外部との電気的接続用の外部電極端子17を形成し、ダイシングにより個片化して、図1Aおよび図1Bに示したような個々の光学装置100を得る。ダイシングは、A、Bいずれの方向から行ってもよいし、両方から行ってもよい。このようにして得た光学装置100において、透明部材2と封止樹脂3の端部は面一に形成される。面一とは実質的な面一を意味し、製造上の多少の誤差は含むものとする。なお、外部電極端子17は半田ボールで形成するのが一般的であるが、半田以外の組成で図3Cのようなボール形状を採ってもよいし、ボール形状以外のピラー状の導電体などでも構わない。また、光学装置100側に外部電極端子17を設けず、光学装置100を実装する基板(図示せず)にシート状の接着剤や導電性接着剤を設け、第4の電極16と電気的に接続させることもできる。その場合は、図3Bの工程まで実施した後、個片化を行って光学装置100を得る。 Finally, as shown in FIG. 3C, an external electrode terminal 17 for electrical connection with the outside of the optical device 100 is formed on the fourth electrode 16 and separated into individual pieces by dicing. Individual optical devices 100 as shown in FIG. Dicing may be performed from either direction A or B, or from both directions. In the optical device 100 obtained in this way, the end portions of the transparent member 2 and the sealing resin 3 are formed flush with each other. “Flush” means a substantial flush and includes some manufacturing errors. The external electrode terminal 17 is generally formed of a solder ball, but may have a ball shape as shown in FIG. 3C with a composition other than solder, or a pillar-shaped conductor other than the ball shape. I do not care. Further, the external electrode terminal 17 is not provided on the optical device 100 side, and a sheet-like adhesive or conductive adhesive is provided on a substrate (not shown) on which the optical device 100 is mounted, so that the fourth electrode 16 is electrically connected. It can also be connected. In that case, after carrying out to the process of FIG. 3B, singulation is performed and the optical device 100 is obtained.
 なお、前述の製造方法では、接合部材12は図2Bに示すように透明部材2の電極9上に形成したが、代わりに、光学素子1の電極6上に形成してもよい。その場合は、光学素子1の電極6上に形成された接合部材12を、透明部材2の電極9に接合してフリップチップボンディングを行う。 In the above-described manufacturing method, the bonding member 12 is formed on the electrode 9 of the transparent member 2 as shown in FIG. 2B, but may instead be formed on the electrode 6 of the optical element 1. In that case, the bonding member 12 formed on the electrode 6 of the optical element 1 is bonded to the electrode 9 of the transparent member 2 to perform flip chip bonding.
 (第1の実施形態の変形例1)
 前述の光学装置100では、光学領域5と第1の電極6の間に配置された段差部18は、透明部材2の第2の面8に凸形状で形成されている。この構成では、透明部材2上の電極形成と同じ工程で段差部18を形成でき、工程が簡易で製造が容易であるという利点がある。しかし、段差部18は、封止樹脂3が光学領域5へ浸入しないようダムとして機能することが優先される技術的効果であり、この効果を得られれば他の形状を採ってもよい。
(Modification 1 of the first embodiment)
In the optical device 100 described above, the stepped portion 18 disposed between the optical region 5 and the first electrode 6 is formed in a convex shape on the second surface 8 of the transparent member 2. This configuration has the advantage that the step 18 can be formed in the same process as the electrode formation on the transparent member 2, and the process is simple and easy to manufacture. However, the stepped portion 18 is a technical effect in which priority is given to functioning as a dam so that the sealing resin 3 does not enter the optical region 5, and other shapes may be adopted as long as this effect is obtained.
 図4A~図4Eは、本実施形態にかかる光学装置100の段差部18の変形例を模式的に示す断面図である。 4A to 4E are cross-sectional views schematically showing modified examples of the step portion 18 of the optical device 100 according to the present embodiment.
 図4Aに示す変形例では、光学素子1a側に凸形状の段差部18aを配置する。前述のとおり、透明部材2はガラスや合成樹脂等からなるため、回路素子など破壊され易い脆弱な構成を備えた光学素子1の主面4側よりも接合時のダメージに強い。そのため、図4Aの構成では、図1Aのように透明部材2に形成された段差部18の先端が光学素子1に接する構成に比べ、光学素子に与えるダメージを軽減できる。 In the modification shown in FIG. 4A, a convex step 18a is disposed on the optical element 1a side. As described above, since the transparent member 2 is made of glass, synthetic resin, or the like, it is more resistant to damage at the time of bonding than the main surface 4 side of the optical element 1 having a fragile configuration such as a circuit element that is easily broken. Therefore, in the configuration of FIG. 4A, damage to the optical element can be reduced compared to the configuration in which the tip of the stepped portion 18 formed in the transparent member 2 is in contact with the optical element 1 as shown in FIG. 1A.
 図4Bに示す変形例では、光学素子1c側および透明部材2b側に凸形状の段差部18b、18cを配置する。この構成では、光学素子1または透明部材2のいずれか一方だけに段差部を配置する構成に比べ、光学素子と透明部材との間の接合ギャップを容易に塞ぐことができる。また、段差部18bの先端が光学素子1cの主面4に接しない構成のため、図1Aの構成と比べて光学素子に与えるダメージを軽減できる。 4B, convex step portions 18b and 18c are arranged on the optical element 1c side and the transparent member 2b side. In this configuration, the bonding gap between the optical element and the transparent member can be easily closed as compared with the configuration in which the step portion is disposed only in one of the optical element 1 and the transparent member 2. Further, since the tip of the stepped portion 18b does not contact the main surface 4 of the optical element 1c, damage to the optical element can be reduced as compared with the structure of FIG. 1A.
 光学素子1aまたは1c側に凸形状の段差部18aまたは18cを形成する変形例では、接合部材12を、段差部18aまたは18cと同じ工程で光学素子1aまたは1c側に形成してもよい。 In a modification in which the convex stepped portion 18a or 18c is formed on the optical element 1a or 1c side, the bonding member 12 may be formed on the optical element 1a or 1c side in the same process as the stepped portion 18a or 18c.
 図4C~図4Eに示す変形例では、段差部は、凸形状ではなく凹形状として実装されている。 In the modification shown in FIGS. 4C to 4E, the stepped portion is mounted as a concave shape instead of a convex shape.
 図4Cでは、透明部材2dの第2の面8の一部を窪ませた凹形状の段差部18dを備える。この構成では、接合部材12より内側に浸入した封止樹脂3が段差部18dに落ち込むことで、段差部18dがダムの役割を果たし、光学領域5への入射光が樹脂により遮られることも防止できる。また、余分な封止樹脂3が段差部18d側に流れるので、段差部18dが設けられていない光学素子1側でも、封止樹脂3の光学領域5への浸入を防ぐ効果を生じる。 In FIG. 4C, a concave step portion 18d in which a part of the second surface 8 of the transparent member 2d is recessed is provided. In this configuration, the sealing resin 3 that has entered inside the bonding member 12 falls into the stepped portion 18d, so that the stepped portion 18d serves as a dam and prevents light incident on the optical region 5 from being blocked by the resin. it can. Further, since excess sealing resin 3 flows toward the stepped portion 18d, an effect of preventing the sealing resin 3 from entering the optical region 5 is produced even on the optical element 1 side where the stepped portion 18d is not provided.
 図4Dでは、光学素子1eの主面4の一部を窪ませた凹形状の段差部18eを備える。この構成では、封止樹脂3は、主面4上を接合部材12の内側まで浸入しても、光学領域5の手前で段差部18eに落ち込むことになる。そのため、図4Cの構成に比べ、光学領域5への封止樹脂3の浸入をより確実に防止することができる。また、余分な封止樹脂3が段差部18e側に流れるので、段差部18eが設けられていない透明部材2側でも、封止樹脂3の流れが緩和され、光学領域5への入射光が樹脂により遮られることも防止できる。 In FIG. 4D, a concave-shaped stepped portion 18e in which a part of the main surface 4 of the optical element 1e is recessed is provided. In this configuration, even if the sealing resin 3 enters the main surface 4 to the inside of the bonding member 12, it falls into the stepped portion 18 e before the optical region 5. Therefore, it is possible to more reliably prevent the sealing resin 3 from entering the optical region 5 as compared with the configuration of FIG. 4C. Further, since excess sealing resin 3 flows toward the stepped portion 18e, the flow of the sealing resin 3 is relaxed even on the transparent member 2 side where the stepped portion 18e is not provided, and incident light to the optical region 5 is resinated. It can also be prevented from being blocked by.
 図4Eでは、光学素子1dの主面4および透明部材2fの第2の面8の両方に、凹形状の段差部18e、18fを設ける。この構成では、光学素子1側、透明部材2側の両方で封止樹脂3の浸入を食い止めるダム構造を備え、図4Cおよび図4Dに開示の構造を両方有している。そのため、図4Cおよび図4Dに比べ、より確実に封止樹脂3の浸入を防ぐことができる。 4E, concave step portions 18e and 18f are provided on both the main surface 4 of the optical element 1d and the second surface 8 of the transparent member 2f. This configuration includes a dam structure that prevents the sealing resin 3 from entering on both the optical element 1 side and the transparent member 2 side, and has both the structures disclosed in FIGS. 4C and 4D. Therefore, intrusion of the sealing resin 3 can be more reliably prevented as compared with FIGS. 4C and 4D.
 段差部18の態様は図4A~図4Eに示す限りではなく、凸形状で根元の径が先端の径より小さい形状や、凹形状で底面の径のほうが大きいもの等でもよい。また、凸形状の段差部と凹形状の段差部を組み合わせなどもある。一例として、透明部材2側に凸形状の段差部18を設け、光学素子1側に凹形状の段差部18dを設け、断面図において、段差部18よりも光学領域5側に段差部18dを配置する構成がある。この構成では、もし段差部18を越えて封止樹脂3が浸入した場合にも、光学領域5の手前の段差部18dで食い止められる。他の例として、光学素子1側に複数の凹形状の段差部18dを、断面図において横に並べて配置する構成がある。この構成では、一段目の段差部18dから封止樹脂3が溢れた場合にも、二段目の段差部18dで食い止めることができる。段差部を配置する箇所については、封止樹脂3の材料や充填方法により適宜決められる。 The mode of the stepped portion 18 is not limited to that shown in FIGS. 4A to 4E, but may be a convex shape with a root diameter smaller than the tip diameter, or a concave shape with a larger bottom diameter. Also, there are combinations of a convex stepped portion and a concave stepped portion. As an example, a convex stepped portion 18 is provided on the transparent member 2 side, a concave stepped portion 18d is provided on the optical element 1 side, and a stepped portion 18d is disposed on the optical region 5 side of the stepped portion 18 in the sectional view. There is a configuration to do. In this configuration, even if the sealing resin 3 has entered beyond the stepped portion 18, the stepped portion 18 d in front of the optical region 5 can be stopped. As another example, there is a configuration in which a plurality of concave step portions 18d are arranged side by side in the cross-sectional view on the optical element 1 side. In this configuration, even when the sealing resin 3 overflows from the first step 18d, the second step 18d can stop it. The location where the step portion is arranged is determined as appropriate depending on the material of the sealing resin 3 and the filling method.
 凸形状の段差部は、図5Aのような光学素子1側に末広がりの段差部18aと、図5Bのような透明部材2側に末広がりの段差部18とが開示された。光学装置100においては、光学素子1側が末広がりの段差部を備えたほうが、透明部材2の第2の面8における開口面積が広くなる。すなわち、光学領域5への入射角θが広がり、透明部材2を透過してきた光Lをより効率的に受光することができ、光学装置100の性能が向上する。光学素子1側が末広がりの段差部18aは、例えば、レジストを塗布しめっきを成長させる部分のみ露光する際に、レジストの上辺と下辺での光の進入量の差により形成される。 The convex stepped portion is disclosed as a stepped portion 18a that widens toward the optical element 1 as shown in FIG. 5A and a stepped portion 18 that spreads out toward the transparent member 2 as shown in FIG. 5B. In the optical device 100, the opening area on the second surface 8 of the transparent member 2 becomes wider when the optical element 1 side is provided with a stepped portion that widens toward the end. That is, the incident angle θ to the optical region 5 is widened, the light L transmitted through the transparent member 2 can be received more efficiently, and the performance of the optical device 100 is improved. The stepped portion 18a whose optical element 1 side is widened is formed by, for example, the difference in the amount of light entering between the upper side and the lower side of the resist when exposing only the portion where the resist is applied and plating is grown.
 (第1の実施形態の変形例2)
 前述の光学装置100では、段差部18は、接合部材12を形成する工程で形成するのが望ましく、組成も接合部材12と同じ導電体であった。そのため、段差部18の先端が、回路素子など破壊され易い脆弱な構成を備えた光学素子1の主面4側に接することによるダメージが想定された。
(Modification 2 of the first embodiment)
In the optical device 100 described above, the stepped portion 18 is desirably formed in the step of forming the bonding member 12, and the composition is the same conductor as the bonding member 12. Therefore, damage due to the tip of the stepped portion 18 coming into contact with the main surface 4 side of the optical element 1 having a fragile configuration that is easily destroyed, such as a circuit element, was assumed.
 図6は、本実施形態にかかる光学装置100の段差部18の変形例を模式的に示す断面図である。 FIG. 6 is a cross-sectional view schematically showing a modification of the step portion 18 of the optical device 100 according to the present embodiment.
 図6に示す変形例では、透明部材2に設けられた段差部18gは、金属材料20と、金属材料20を覆う絶縁材料21とで構成される。この構成により、透明部材2を光学素子1と接合した際に、光学素子1の主面4に段差部18gが接することによるダメージを軽減することができる。金属材料20の材料は、例えば銅や金などから選択し、絶縁材料21は、ソルダーレジストやポリイミドのような材料を使用する。なお、図6では金属材料20の上面および側面を絶縁材料21が覆っているが、これに限られるものではなく、金属材料20の上部のみ絶縁材料21に覆われていれば、接合時のダメージを軽減する効果は得られる。 6, the stepped portion 18g provided on the transparent member 2 includes a metal material 20 and an insulating material 21 that covers the metal material 20. With this configuration, when the transparent member 2 is bonded to the optical element 1, damage due to the stepped portion 18g coming into contact with the main surface 4 of the optical element 1 can be reduced. The material of the metal material 20 is selected from, for example, copper and gold, and the insulating material 21 is a material such as solder resist or polyimide. In FIG. 6, the insulating material 21 covers the upper surface and side surfaces of the metal material 20. However, the present invention is not limited to this. If only the upper portion of the metal material 20 is covered with the insulating material 21, damage at the time of bonding is achieved. The effect of reducing is obtained.
 (第1の実施形態の変形例3)
 前述の光学装置100では、図1Bに示すように、第2の電極9の配列ピッチは第3の電極11の配列ピッチよりも大きくとられていた。これにより、第3の電極と接続する貫通電極13などの、第3の電極11との電気的導通をとるための加工を行う際に要求される精度が緩和され、より簡易な装置、工程での製造が可能となる。この加工精度を緩和できる設計は他にもある。
(Modification 3 of the first embodiment)
In the optical device 100 described above, the arrangement pitch of the second electrodes 9 is larger than the arrangement pitch of the third electrodes 11 as shown in FIG. 1B. As a result, the accuracy required when performing processing for establishing electrical continuity with the third electrode 11 such as the through electrode 13 connected to the third electrode is relaxed, and a simpler apparatus and process can be used. Can be manufactured. There are other designs that can alleviate this machining accuracy.
 図7は、本実施形態にかかる光学装置100の第3の電極11の変形例を模式的に示す平面図である。 FIG. 7 is a plan view schematically showing a modification of the third electrode 11 of the optical device 100 according to the present embodiment.
 図7に示す変形例では、第3の電極11bの面積は第2の電極9の面積よりも大きい。これにより、第3の電極と接続する貫通電極13などの、第3の電極11との電気的導通をとるための加工を行う際に要求される精度が緩和され、より簡易な装置、工程での製造が可能となる。 7, the area of the third electrode 11 b is larger than the area of the second electrode 9. As a result, the accuracy required when performing processing for establishing electrical continuity with the third electrode 11 such as the through electrode 13 connected to the third electrode is relaxed, and a simpler apparatus and process can be used. Can be manufactured.
 (その他の変形例1)
 前述の光学装置100では、透明部材2の第1の面7が、光学装置100外部からの光の入射面であった。本変形例では、透明部材2上にさらに、光の特定波長を選択的に除去する光学フィルタ(図示せず)を積層し、カメラモジュールとする。光学フィルタは、光学装置100を個片化した後に、個別に透明部材2上に貼り付けて形成することもできるが、光学装置100を個片にする前に、透明部材2上に積層し、光学装置100に貼り合わせた状態で一括カッティングを行えば、より簡易な工程で製造が可能である。また、カメラモジュールとしての低背化も可能となる。
(Other variations 1)
In the optical device 100 described above, the first surface 7 of the transparent member 2 is a light incident surface from the outside of the optical device 100. In this modification, an optical filter (not shown) that selectively removes a specific wavelength of light is further laminated on the transparent member 2 to form a camera module. The optical filter can be formed by separating the optical device 100 into individual pieces and then individually pasting on the transparent member 2, but before making the optical device 100 into individual pieces, the optical filter is laminated on the transparent member 2, If batch cutting is performed in a state of being bonded to the optical device 100, manufacturing can be performed with a simpler process. In addition, the height of the camera module can be reduced.
 (その他の変形例2)
 前述の光学装置100では、透明部材2の第2の面8に形成された第2の電極9は、同じく第2の面8に形成された第1の配線10、第3の電極11、封止樹脂3を厚み方向に貫通する貫通電極13、第2の配線14とを介して、第4の電極16と接続されていた。本変形例では、第3の電極11および貫通電極13を用いずに第2の電極9から外部接続端子電気的に接続する。具体的には、第2の電極9と接続された第1の配線10を透明部材2の側端部まで形成し、第4の電極16と接続された第2の配線14も封止樹脂3の側端部まで形成する。さらに、封止樹脂3の側端面に、第1の配線10と第2の配線14とを接続する導体を形成する。この構成では、光学素子1の外側に第3の電極11、貫通電極13を設ける構成と比して、光学装置の幅を小さくすることができ、カメラモジュールとしての小型化も可能になる。
(Other modification 2)
In the optical device 100 described above, the second electrode 9 formed on the second surface 8 of the transparent member 2 is the same as the first wiring 10, the third electrode 11, and the sealing formed on the second surface 8. It was connected to the fourth electrode 16 through the through electrode 13 penetrating the stop resin 3 in the thickness direction and the second wiring 14. In this modification, the external connection terminal is electrically connected from the second electrode 9 without using the third electrode 11 and the through electrode 13. Specifically, the first wiring 10 connected to the second electrode 9 is formed up to the side end of the transparent member 2, and the second wiring 14 connected to the fourth electrode 16 is also used as the sealing resin 3. It forms to the side edge part. Further, a conductor for connecting the first wiring 10 and the second wiring 14 is formed on the side end face of the sealing resin 3. In this configuration, the width of the optical device can be reduced as compared with the configuration in which the third electrode 11 and the through electrode 13 are provided outside the optical element 1, and the size of the camera module can be reduced.
 (その他の変形例3)
 前述の光学装置100では、貫通電極13は封止樹脂3の内部に配置されていた。本変形例では、貫通電極13を封止樹脂3の側端面から露出させる。例えば、光学装置100を個片にする際に、第3の電極11および貫通電極13を厚み方向に切断し、貫通電極13の断面を得る。この構成では、貫通電極13が封止樹脂の内部に配置された構成に比して、光学装置の幅を小さくすることができ、カメラモジュールとしての小型化も可能になる。また、光学装置の側面から露出した貫通電極を、光学装置の外部接続用の電極として用いることもでき、実装の自由度を高められる。その場合は、封止樹脂3の裏面に、第2の配線14や第4の電極16、外部電極端子17は形成しないため、光学装置およびカメラモジュールとしての低背化も可能となる。
(Other modification 3)
In the optical device 100 described above, the through electrode 13 is disposed inside the sealing resin 3. In this modification, the through electrode 13 is exposed from the side end surface of the sealing resin 3. For example, when the optical device 100 is divided into pieces, the third electrode 11 and the through electrode 13 are cut in the thickness direction to obtain a cross section of the through electrode 13. In this configuration, the width of the optical device can be reduced as compared with the configuration in which the through electrode 13 is disposed inside the sealing resin, and the camera module can be downsized. Further, the through electrode exposed from the side surface of the optical device can be used as an external connection electrode of the optical device, and the degree of freedom in mounting can be increased. In that case, since the second wiring 14, the fourth electrode 16, and the external electrode terminal 17 are not formed on the back surface of the sealing resin 3, the height of the optical device and the camera module can be reduced.
 以上、第1の実施形態および変形例では、光学領域5について、入射光を受けて光電変換を行う受光領域として説明した。受光領域を有する光学素子1は、主に、CCDイメージセンサチップやCMOSイメージセンサチップを想定しているが、他の撮像素子やセンサでも構わない。また、光学領域5は、光学素子1または光学装置100外部からの信号を受けて発光を行う、発光領域であってもよい。発光領域を有する光学素子1であれば、主に半導体レーザやLEDのチップが想定される。 As described above, in the first embodiment and the modification, the optical region 5 has been described as a light receiving region that receives incident light and performs photoelectric conversion. The optical element 1 having the light receiving region is mainly assumed to be a CCD image sensor chip or a CMOS image sensor chip, but may be another imaging element or sensor. The optical region 5 may be a light emitting region that emits light upon receiving a signal from the outside of the optical element 1 or the optical device 100. If it is the optical element 1 which has a light emission area | region, the chip | tip of a semiconductor laser or LED will mainly be assumed.
 以上のように、本出願において開示する技術の例示として、第1の実施形態とその変形例を説明した。しかしながら、本開示における技術は、これに限定されず、適宜、変更、置き換え、付加、省略などを行った実施の形態にも適用可能である。また、上記第1の実施形態および変形例で説明した各構成要素を組み合わせて、新たな実施の形態とすることも可能である。 As described above, the first embodiment and its modifications have been described as examples of the technology disclosed in the present application. However, the technology in the present disclosure is not limited to this, and can also be applied to an embodiment in which changes, replacements, additions, omissions, and the like are appropriately performed. Moreover, it is also possible to combine each component demonstrated in the said 1st Embodiment and the modification, and can be set as a new embodiment.
 本開示は、イメージセンサなどの光学装置に適用可能である。光学素子に特別な設計をすることなく、光学素子にTSV(Though Silicon Via)を形成した場合の機能を得ることができるので、チップ設計費や製造コストを抑えたい装置に適している。 This disclosure is applicable to optical devices such as image sensors. Since a function when a TSV (Through Silicon Via) is formed on the optical element can be obtained without a special design of the optical element, the optical element is suitable for an apparatus that wants to reduce chip design costs and manufacturing costs.
 1 光学素子
 2 透明部材
 3 封止樹脂
 5 光学領域
 6,9,11,16 電極
 10,14 配線
 12 接合部材
 13 貫通電極
 18,18a,18b,18c,18d,18e,18f,18g 段差部
 100 光学装置
DESCRIPTION OF SYMBOLS 1 Optical element 2 Transparent member 3 Sealing resin 5 Optical area 6, 9, 11, 16 Electrode 10, 14 Wiring 12 Joining member 13 Through electrode 18, 18a, 18b, 18c, 18d, 18e, 18f, 18g Step part 100 Optical apparatus

Claims (23)

  1.  主面に、光学領域と、前記光学領域の外周に配置された第1の電極とを有する光学素子と、
     前記光学素子の前記主面と向かい合って配置された第1の面に、第2の電極と、を有する透明部材と、
     前記光学素子と前記透明部材の間に配置され、前記第1の電極と前記第2の電極とを電気的に接続する接合部材と、
     前記光学素子と前記透明部材との間において、前記接合部材よりも前記光学領域側に配置された段差部と、
     前記光学素子および前記接合部材を覆う樹脂と、
    を備え、
     前記樹脂は、前記光学素子の側面を封止する第1の樹脂部と前記接合部材を前記光学素子の側端部および前記段差部の両側から覆う第2の樹脂とを含み、前記光学領域を避けて存在することを特徴とする光学装置。
    An optical element having an optical region on the main surface and a first electrode disposed on the outer periphery of the optical region;
    A transparent member having a second electrode on a first surface disposed to face the main surface of the optical element;
    A bonding member that is disposed between the optical element and the transparent member and electrically connects the first electrode and the second electrode;
    Between the optical element and the transparent member, a step portion disposed on the optical region side with respect to the bonding member,
    A resin covering the optical element and the bonding member;
    With
    The resin includes a first resin portion that seals a side surface of the optical element, and a second resin that covers the bonding member from the side end portion of the optical element and both sides of the stepped portion, and the optical region. An optical device characterized by being avoided.
  2.  前記樹脂の、前記透明部材の第1の面に対向する面の裏面において、第3の電極を備え、
     前記第2の電極と前記第3の電極とが電気的に接続されていることを特徴とする請求項1に記載の光学装置。
    In the back surface of the surface of the resin that faces the first surface of the transparent member, a third electrode is provided,
    The optical apparatus according to claim 1, wherein the second electrode and the third electrode are electrically connected.
  3.  前記第3の電極に接続し、光学装置外部との接続点となる外部電極端子をさらに備えることを特徴とする請求項2に記載の光学装置。 The optical apparatus according to claim 2, further comprising an external electrode terminal connected to the third electrode and serving as a connection point with the outside of the optical apparatus.
  4.  前記第2の電極の外方に配置され、前記第2の電極と電気的に接続された第4の電極をさらに有し、一端で前記第3の電極と接続し、前記第1の樹脂部を厚み方向に貫通する貫通電極をさらに備えることを特徴とする請求項2または3に記載の光学装置。 The first resin portion further includes a fourth electrode disposed outside the second electrode and electrically connected to the second electrode, and connected to the third electrode at one end. The optical device according to claim 2, further comprising a through electrode penetrating through the substrate in the thickness direction.
  5.  前記第2の電極と前記第4の電極は、前記透明部材の前記第1の面上に形成された第一の配線により接続され、
     前記貫通電極の前記他の一端と、前記第3の電極は、前記樹脂の前記裏面上に形成された第二の配線により接続されていることを特徴とする請求項4に記載の光学装置。
    The second electrode and the fourth electrode are connected by a first wiring formed on the first surface of the transparent member,
    The optical device according to claim 4, wherein the other end of the through electrode and the third electrode are connected by a second wiring formed on the back surface of the resin.
  6.  前記第4の電極の配列ピッチは、前記第2の電極の配列ピッチよりも大きいことを特徴とする請求項4または5に記載の光学装置。 6. The optical device according to claim 4, wherein an arrangement pitch of the fourth electrodes is larger than an arrangement pitch of the second electrodes.
  7.  前記第4の電極の面積は、前記第2の電極の面積よりも大きいことを特徴とする請求項4または5に記載の光学装置。 6. The optical apparatus according to claim 4, wherein an area of the fourth electrode is larger than an area of the second electrode.
  8.  前記樹脂の前記第1の樹脂部と前記第2の樹脂部とは、異なる材料で形成されていることを特徴とする請求項1~7のいずれか1項に記載の光学装置。 8. The optical device according to claim 1, wherein the first resin portion and the second resin portion of the resin are formed of different materials.
  9.  前記樹脂の前記第1の樹脂部と前記第2の樹脂部とは、同じ材料で一体に形成されていることを特徴とする請求項1~7のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 7, wherein the first resin portion and the second resin portion of the resin are integrally formed of the same material.
  10.  前記段差部は、前記透明部材の前記第1の面に形成されることを特徴とする請求項1~9のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 9, wherein the step portion is formed on the first surface of the transparent member.
  11.  前記段差部は、前記光学素子の前記主面に形成されることを特徴とする請求項1~9のいずれか1項に記載の光学装置。 10. The optical apparatus according to claim 1, wherein the step portion is formed on the main surface of the optical element.
  12.  前記段差部は、凸形状であることを特徴とする請求項1~11のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 11, wherein the step portion has a convex shape.
  13.  前記段差部は、凹形状であることを特徴とする請求項1~11のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 11, wherein the step portion has a concave shape.
  14.  前記段差部は、前記光学領域の周囲に連続的に形成されることを特徴とする請求項1~13のいずれか1項に記載の光学装置。 The optical apparatus according to any one of claims 1 to 13, wherein the stepped portion is continuously formed around the optical region.
  15.  前記段差部は、表面に反射防止膜を有することを特徴とする請求項1~14のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 14, wherein the stepped portion has an antireflection film on a surface thereof.
  16.  前記段差部は、金属材料と、前記金属材料の表面を覆う絶縁材料を有することを特徴とする請求項1~15のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 15, wherein the stepped portion includes a metal material and an insulating material that covers a surface of the metal material.
  17.  前記段差部は、前記光学素子の主面と前記透明部材の第1の面との両方に接していることを特徴とする請求項1~15のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 15, wherein the stepped portion is in contact with both the main surface of the optical element and the first surface of the transparent member.
  18. 前記段差部は、前記接合部材と同じ組成であることを特徴とする請求項1~17のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 17, wherein the step portion has the same composition as the bonding member.
  19.  前記接合部材はバンプであることを特徴とする請求項1~18のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 18, wherein the bonding member is a bump.
  20.  前記透明部材と前記樹脂の側面は面一であることを特徴とする請求項1~19のいずれか1項に記載の光学装置。 The optical device according to any one of claims 1 to 19, wherein a side surface of the transparent member and the resin is flush with each other.
  21.  前記光学領域は受光領域であることを特徴とする請求項1~20のいずれか1項に記載の光学装置。 21. The optical device according to claim 1, wherein the optical area is a light receiving area.
  22.  主面に、光学領域と、前記光学領域の外周に配置された第1の電極とを有する光学素子を準備する工程と、
     第1の面に、第2の電極と、前記第2の電極よりも内側に配置された段差部と、を有する透明部材を準備する工程と、
     前記光学素子の第1の電極と、前記透明部材の第2の電極とを、接合部材により接合する工程と、
     前記光学領域を避けて、前記段差部と前記接合部材の間まで樹脂で覆う工程と、
    を備えることを特徴とする光学装置の製造方法。
    Providing an optical element having an optical region and a first electrode disposed on an outer periphery of the optical region on a main surface;
    Preparing a transparent member having, on the first surface, a second electrode and a stepped portion disposed on the inner side of the second electrode;
    Bonding the first electrode of the optical element and the second electrode of the transparent member with a bonding member;
    Avoiding the optical region and covering with resin between the stepped portion and the bonding member;
    An optical device manufacturing method comprising:
  23.  前記樹脂の、前記透明部材の第1の面に対向する面の裏面において、第3の電極を備える工程と、
     前記第2の電極と前記第3の電極とを電気的に接続する導電体を前記樹脂に形成する工程と、
    をさらに備えることを特徴とする請求項22に記載の光学装置の製造方法。
    A step of providing a third electrode on the back surface of the resin facing the first surface of the transparent member;
    Forming a conductor in the resin for electrically connecting the second electrode and the third electrode;
    The method of manufacturing an optical device according to claim 22, further comprising:
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