WO2013131852A3 - Verfahren zur herstellung optimierter solarzellen - Google Patents

Verfahren zur herstellung optimierter solarzellen Download PDF

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Publication number
WO2013131852A3
WO2013131852A3 PCT/EP2013/054275 EP2013054275W WO2013131852A3 WO 2013131852 A3 WO2013131852 A3 WO 2013131852A3 EP 2013054275 W EP2013054275 W EP 2013054275W WO 2013131852 A3 WO2013131852 A3 WO 2013131852A3
Authority
WO
WIPO (PCT)
Prior art keywords
solar cells
monochromatic
radiation
solar cell
emitter layer
Prior art date
Application number
PCT/EP2013/054275
Other languages
English (en)
French (fr)
Other versions
WO2013131852A2 (de
Inventor
Uwe Scheit
Zhao Jun
Heiko Mehlich
Original Assignee
Roth & Rau Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roth & Rau Ag filed Critical Roth & Rau Ag
Publication of WO2013131852A2 publication Critical patent/WO2013131852A2/de
Publication of WO2013131852A3 publication Critical patent/WO2013131852A3/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0216—Coatings
    • H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Sustainable Development (AREA)
  • Sustainable Energy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Photovoltaic Devices (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

Es wird ein Verfahren zur Herstellung eines Solarzellenwafers mit einem p-n-Übergang und einer Emitterschicht vorgestellt, bei dem die Emitterschicht nach dem abschließenden Ätz- und Reinigungsschritt und vor dem Aufbringen weiterer Schichten in sauerstoffhaltiger Atmosphäre mit einer monochromen UV-Strahlung (23) von 172 nm +-10 nm bestrahlt wird. Es wird eine geeignete Lichtquelle (2) zur Erzeugung der monochromatischen UV-Strahlung genannt. Die erfindungsgemäße Behandlung des Substrats (1) bewirkt ein verbessertes Aufwachsen von Folgeschichten auf der bestrahlten Fläche der Solarzelle.
PCT/EP2013/054275 2012-03-05 2013-03-04 Verfahren zur herstellung optimierter solarzellen WO2013131852A2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE102012203405 2012-03-05
DE102012203405.6 2012-03-05
DE102012216416A DE102012216416A1 (de) 2012-03-05 2012-09-14 Verfahren zur Herstellung optimierter Solarzellen
DE102012216416.2 2012-09-14

Publications (2)

Publication Number Publication Date
WO2013131852A2 WO2013131852A2 (de) 2013-09-12
WO2013131852A3 true WO2013131852A3 (de) 2013-11-21

Family

ID=48985158

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2013/054275 WO2013131852A2 (de) 2012-03-05 2013-03-04 Verfahren zur herstellung optimierter solarzellen

Country Status (3)

Country Link
DE (1) DE102012216416A1 (de)
TW (1) TW201340366A (de)
WO (1) WO2013131852A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102015104649A1 (de) * 2015-03-26 2016-09-29 Hanwha Q Cells Gmbh Solarzellenherstellungsverfahren
DE102015105049B4 (de) * 2015-04-01 2016-12-15 Von Ardenne Gmbh Transportvorrichtung zum Transportieren eines Substrats in einer Prozesskammer und Prozessieranordnung
CN107611206B (zh) * 2017-09-09 2019-02-12 汕头市华鹰软包装设备总厂有限公司 一种太阳能电池背膜双面涂层加工设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060286775A1 (en) * 2005-06-21 2006-12-21 Singh Kaushal K Method for forming silicon-containing materials during a photoexcitation deposition process
DE102009044052A1 (de) * 2009-09-18 2011-03-24 Schott Solar Ag Kristalline Solarzelle, Verfahren zur Herstellung einer solchen sowie Verfahren zur Herstellung eines Solarzellenmoduls

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61253870A (ja) * 1985-05-07 1986-11-11 Hitachi Ltd 光起電力素子
JP4329183B2 (ja) * 1999-10-14 2009-09-09 ソニー株式会社 単一セル型薄膜単結晶シリコン太陽電池の製造方法、バックコンタクト型薄膜単結晶シリコン太陽電池の製造方法および集積型薄膜単結晶シリコン太陽電池の製造方法
DE102010037355A1 (de) * 2010-09-06 2012-03-08 Schott Solar Ag Kristalline Solarzelle und Verfahren zur Herstellung einer solchen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060286775A1 (en) * 2005-06-21 2006-12-21 Singh Kaushal K Method for forming silicon-containing materials during a photoexcitation deposition process
DE102009044052A1 (de) * 2009-09-18 2011-03-24 Schott Solar Ag Kristalline Solarzelle, Verfahren zur Herstellung einer solchen sowie Verfahren zur Herstellung eines Solarzellenmoduls

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
H. MEHLICH ET AL: "A new method for high resistance against potential induced degradation", 27TH EUROPEAN PHOTOVOLTAIC SOLAR ENERGY CONFERENCE AND EXHIBITION, 24-28 SEPT. 2012, FRANKFURT, GERMANY, 28 September 2012 (2012-09-28), pages 3411 - 3413, XP055081352 *
H. NAGEL ET AL: "Crystalline Si solar cells and modules featuring excellent stability against potential-induced degradation", 26TH EUROPEAN INTERNATIONAL CONFERENCE ON PHOTOVOLTAIC SOLAR ENERGY 5-9 SEPT. 2011 HAMBURG, GERMANY, 9 September 2011 (2011-09-09), pages 3107 - 3112, XP055081349 *
JUNICHI MIYANO ET AL: "Characteristics of thin film deposition by photo-CVD using a Xe2 excimer lamp", ELECTRICAL ENGINEERING IN JAPAN, vol. 147, no. 4, 12 April 2004 (2004-04-12), pages 43 - 50, XP055081341, ISSN: 0424-7760, DOI: 10.1002/eej.10325 *

Also Published As

Publication number Publication date
WO2013131852A2 (de) 2013-09-12
TW201340366A (zh) 2013-10-01
DE102012216416A1 (de) 2013-09-05

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