WO2013127149A1 - 释放舱与被测试物接触的表面的处理方法 - Google Patents

释放舱与被测试物接触的表面的处理方法 Download PDF

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Publication number
WO2013127149A1
WO2013127149A1 PCT/CN2012/078931 CN2012078931W WO2013127149A1 WO 2013127149 A1 WO2013127149 A1 WO 2013127149A1 CN 2012078931 W CN2012078931 W CN 2012078931W WO 2013127149 A1 WO2013127149 A1 WO 2013127149A1
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component
test object
contact
processing
intermediate layer
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PCT/CN2012/078931
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English (en)
French (fr)
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夏可瑜
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东莞市升微机电设备科技有限公司
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Application filed by 东莞市升微机电设备科技有限公司 filed Critical 东莞市升微机电设备科技有限公司
Priority to US14/374,916 priority Critical patent/US20160122234A1/en
Priority to JP2014553598A priority patent/JP5938485B2/ja
Priority to EP12870268.5A priority patent/EP2821784B1/en
Publication of WO2013127149A1 publication Critical patent/WO2013127149A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0029—Cleaning of the detector
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/25—Oxides by deposition from the liquid phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/32—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with synthetic or natural resins
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N17/00—Investigating resistance of materials to the weather, to corrosion, or to light
    • G01N17/002—Test chambers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/111—Deposition methods from solutions or suspensions by dipping, immersion
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/113—Deposition methods from solutions or suspensions by sol-gel processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/31—Pre-treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
    • G01N33/0004—Gaseous mixtures, e.g. polluted air
    • G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
    • G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
    • G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
    • G01N33/0047—Organic compounds

Definitions

  • the present invention relates to a method for treating a surface of a gas volatile organic compound (VOC), a semi-volatile organic substance (SVOC), and a test apparatus for detecting a high-boiling organic substance, which is in contact with a test object.
  • VOC gas volatile organic compound
  • SVOC semi-volatile organic substance
  • VOC gas volatile organic compounds
  • SVOC semi-volatile organic compounds
  • high-boiling organic matter testing devices such as the release chamber (also known as the sampler)
  • the cabins the doors connected to the cabin, the intake pipes, The exhaust pipe, the sampling pipe, the agitating fan and the air duct plate (8) installed in the cabin body, and the inner wall of the cabin and the surface of each component contacting the object to be tested have some chemical bonds for adsorbing the test object or
  • the strong surface tension makes it possible for the test object to be adsorbed on the inner wall of the cabin and the surface of each component in contact with the object to be tested, which is difficult to purify.
  • the adsorption force is stronger due to the influence of certain chemical bonds on the inner wall of the chamber and the surface of the components in contact with the test object. Therefore, the inner wall of the cabin and the surface of each component that is in contact with the test object must be treated so that the chemical bonds on the inner surface of the test device, such as hydrogen bonds, silanol groups, and Lewis acid activation points, are covered, and the test object is easily adsorbed on the inner wall of the cabin. And when the components are in contact with the test object, and the content of the test object is sampled and analyzed, the sample taken from the sampling tube of the test device is used for testing, because the inner wall of the cabin and the components are in contact with the test object. The surface adsorbs a large amount of the test object, so that the detection value obtained from the sample is lower than the actual value of the test object in the cabin, and the detection error is large, which cannot effectively meet the high-precision detection requirement.
  • the object of the present invention is to overcome the above-mentioned drawbacks in the prior art: a method for treating a surface in which a release chamber is in contact with a test object, which can greatly reduce the surface of the test object adsorbed on the inner wall of the cabin and the surface of each component in contact with the test object. In the above, the detection accuracy of the release cabin is effectively improved.
  • the technical solution provided by the present invention is as follows: a method for constructing a surface in which a release compartment is in contact with a test object, the release compartment comprising the following components: a cabin, a door connected to the cabin, an intake pipe, Exhaust pipe, sampling pipe, agitating fan installed in the cabin, air duct plate, the method is used for the cabin, the hatch, the intake pipe, the exhaust pipe, the sampling pipe, the stirring fan and the air duct plate Processing the surface of at least one component in contact with the test object, comprising the steps of:
  • the parts are made of stainless steel or glass.
  • the parts are first cleaned to remove contaminants.
  • the parts are made of stainless steel, they are first oxidized with acid, then washed with organic solvent and water, or oxidized for electrolysis. It is then washed with organic solvent and water; when the component is a glass component, it is corroded by HCL or HF, or the surface of the component is roughened by physical means, and other methods can be used to clean and remove contaminants;
  • the pore-forming agent is methyl cellosolve, ethyl cellosolve, glycol-methyl ether acetate, propylene glycol-methyl ether acetate and the like, Polyethylene glycol or polypropylene glycol, the epoxy compound is 2,2,2-tris-(2,3-epoxypropyl)-isocyanurate, and the amine compound is ethylenediamine, diya Ethyltriamine, triethylenetetramine, triethylenediamine, iminodipropylamine/bis(hexamethylene)triamine, 1,3,6-triaminomethylhexane , polymethylene diamine, trimethyl hexamethylene diamine, polyether diamine, isophorone diamine, menthane diamine, N-aminoethyl piperazine, 3,9-double (3 -aminopropyl) 2,4,8,10-tetraoxaspiro, bis
  • the processing of the deactivation layer is performed by coating, dipping or plating an organic compound having a low surface tension on the intermediate layer or on the surface of the component and baking at a high temperature of 300 ° C or higher; the processing of the deactivation layer or After the surface of the component or the intermediate layer after the step (1) is cleaned, immersed or plated with SiO2 sol, baked at a high temperature of 300 ° C or higher, and the solvent is used to remove excess material; the processing of the deactivated layer Or coating, dipping or plating polybenzimidazole (PY), polytetrafluoroethylene, polyfluoroalkane, orthosilicate or orthosilicate on the surface of the component or the intermediate layer after the step (1) cleaning. Baking after baking at a high temperature of 300 ° C or higher.
  • PY polybenzimidazole
  • the processing method of the surface of the release chamber in contact with the test object of the present invention has the beneficial effects of: processing the deactivated layer on the surface of the component after the step (1) cleaning by using the method, or first passing through the step (1)
  • the intermediate layer is processed on the surface of the cleaned component, and then the deactivated layer is processed on the surface of the intermediate layer.
  • the surface tension of the inner wall of the cabin and the surface of each component contacting the object to be tested is reduced, and the object to be tested is adsorbed on the inner wall of the cabin and the surface of each component in contact with the object to be tested, so that the obtained from the sampling tube is obtained.
  • the detected value obtained in the sample is closer to the actual value of the test object in the cabin, thereby effectively improving the detection accuracy of the release capsule.
  • FIG. 1 is a schematic view showing the structure of the release chamber of the present invention in which the release chamber is coated with an intermediate layer and a deactivation layer;
  • Figure 2 is an enlarged cross-sectional view taken along line A-A of Figure 1;
  • Figure 3 is an enlarged cross-sectional view taken along line B-B of Figure 1;
  • Figure 4 is a schematic view showing the structure of the release chamber of the present invention in which the release chamber is coated with a cover layer;
  • Figure 5 is an enlarged cross-sectional view taken along line C-C of Figure 4.
  • Fig. 6 is an enlarged cross-sectional view taken along line D-D of Fig. 4;
  • the preferred embodiment of the method of treating the surface of the release chamber in contact with the test object of the present invention is not intended to limit the scope of the present invention.
  • a method for treating a surface in which a release compartment is in contact with a test object comprising the following components: a cabin 1 and a door 2 connected to the cabin 1 , the intake pipe 4, the exhaust pipe 5, the sampling pipe 6, the agitating fan 7 installed in the cabin 1, the duct plate 8, the method is used for the cabin 1, the door 2, the intake pipe 4,
  • the treatment of the surface of the exhaust pipe 5, the sampling pipe 6, the agitation fan 7, and the duct plate 8 in contact with the object to be tested includes the following steps:
  • the parts are made of stainless steel or glass.
  • the parts are first cleaned to remove contaminants.
  • the parts are made of stainless steel, they are first oxidized with acid, then washed with organic solvent and water, or oxidized for electrolysis. It is then washed with organic solvent and water; when the component is a glass component, it is corroded by HCL or HF, or the surface of the component is roughened by physical means, and other methods can be used to clean and remove contaminants;
  • the intermediate layer 9 is processed on the surface of the component after the step (1) cleaning, and then the deactivated layer 10 is processed on the surface of the intermediate layer 9.
  • the intermediate layer 9 is a SiO 2 layer, or a three-dimensional network or a porous skeleton phase, and has a thickness of submicron to micron thickness.
  • the deactivation layer 10 has a thickness of submicron to micron and is a liquid crystal film structure.
  • the intermediate layer 9 is processed by calcining the component after the step (1) is cleaned by using a monosilane at a high temperature of 500 ° C or higher. 2 layers; or after being coated, immersed or coated with organic silica gel on the surface of the parts after the step (1) cleaning, calcined at a high temperature of 500 ° C or higher to form SiO 2 layers; or coated, immersed or plated with polysiloxanes, cyclodextrin derivatives, calcined at temperatures above 500 °C 2 layers, the polysiloxane is polydimethylsiloxane, phenyl containing polysiloxane, cyano-containing polysiloxane, fluorine-containing polysiloxane, vinyl-added polysiloxane a terminal hydrocarbyl polysiloxane or a polysiloxane in which a spacer is introduced between a molecular chain and a functional group; the intermediate layer 9
  • the epoxy compound and the amine compound are polymerized at 60-200 ° C to form a gel, which is then coated or immersed on the surface of the part after the step (1), and the pore-forming agent is washed with a solvent to leave the skeleton phase and dried.
  • the pore-forming agent is methyl cellosolve, ethyl cellosolve, ethylene glycol-methyl ether acetate, propylene glycol-methyl ether acetate and the like , polyethylene glycol or polypropylene glycol
  • the epoxy compound is 2,2,2-tris-(2,3-epoxypropyl)-isocyanurate
  • the amine compound is ethylenediamine, two Ethylenetriamine, triethylenetetramine, triethylenediamine, iminodipropylamine/bis(hexamethylene)triamine, 1,3,6-triaminomethyl
  • polymethylene diamine trimethyl hexamethylene diamine
  • polyether diamine isophorone diamine, menthane diamine, N-aminoethyl piperazine, 3,9-double (3 -aminopropyl) 2,4,8,10-tetraoxaspiro, bis(4-a
  • the processing of the deactivation layer 10 is performed by coating, dipping or plating an organic compound having a low surface tension on the intermediate layer 9 or on the surface of the member and baking at a high temperature of 300 ° C or higher; the deactivation layer 10
  • the processing is performed by coating, immersing or plating SiO2 sol on the surface of the component or the intermediate layer 9 after the step (1) cleaning, baking at a high temperature of 300 ° C or higher, and removing excess material with a solvent;
  • the processing of the active layer 10 is either coating, dipping or plating polybenzimidazole pyrrolidone (PY), polytetrafluoroethylene, polyfluorocarbons, orthosilicon on the surface of the component or the intermediate layer 9 after the step (1) cleaning.
  • PY polybenzimidazole pyrrolidone
  • the acid fat or the ethyl orthosilicate is baked at a high temperature of 300 ° C or higher.
  • the low surface tension organic compound is a silane compound, a hydrogen-containing silicone oil or polyethylene glycol.
  • the silane compound is trimethylchlorosilane, hexamethyldisilazane, terminal hydrocarbyl polymethylsiloxane, phenyl-dimethylpolysilane, methyltrioxysilane, dimethylpolysilicon. Oxyalkane, diphenyltetramethylsilylamine, polysiloxane or fluoropolysiloxane.
  • Organic compounds having a low surface tension may also employ a fluorinated organic substance.
  • FIG. 5 a method for processing a surface of a release compartment in contact with an object to be tested, the release compartment comprising the following components: a cabin 1 and a door 2 connected to the cabin 1 , the intake pipe 4, the exhaust pipe 5, the sampling pipe 6, the agitating fan 7 installed in the cabin 1, the duct plate 8, the method is used for the cabin 1, the door 2, the intake pipe 4,
  • the treatment of the surface of the exhaust pipe 5, the sampling pipe 6, the agitation fan 7, and the duct plate 8 in contact with the object to be tested includes the following steps:
  • the parts are made of stainless steel or glass. When the parts are made of stainless steel, they are first oxidized with acid, then washed with organic solvent and water, or oxidized for electrolysis, and then washed with organic solvent and water; When it is a glass member, it is washed with an organic solvent and water;
  • the deactivation layer 10 is directly processed on the surface of the component after the step (1) cleaning.
  • the deactivation layer 10 has a thickness of submicron to micron and is a liquid crystal film structure.
  • the processing of the deactivation layer 10 is performed by coating, dipping or plating an organic compound having a low surface tension on the intermediate layer 9 or on the surface of the member and baking at a high temperature of 300 ° C or higher; the deactivation layer 10
  • the processing is performed by coating, immersing or plating SiO2 sol on the surface of the component or the intermediate layer 9 after the step (1) cleaning, baking at a high temperature of 300 ° C or higher, and removing excess material with a solvent;
  • the processing of the active layer 10 is either coating, dipping or plating polybenzimidazole pyrrolidone (PY), polytetrafluoroethylene, polyfluorocarbons, orthosilicon on the surface of the component or the intermediate layer 9 after the step (1) cleaning.
  • PY polybenzimidazole pyrrolidone
  • the acid fat or the ethyl orthosilicate is baked at a high temperature of 300 ° C or higher.
  • the low surface tension organic compound is a silane compound, a hydrogen-containing silicone oil or polyethylene glycol.
  • the silane compound is trimethylchlorosilane, hexamethyldisilazane, terminal hydrocarbyl polymethylsiloxane, phenyl-dimethylpolysilane, methyltrioxysilane, dimethylpolysilicon. Oxyalkane, diphenyltetramethylsilylamine, polysiloxane or fluoropolysiloxane.
  • Organic compounds having a low surface tension may also employ a fluorinated organic substance.

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Abstract

一种释放舱与被测试物接触的表面的处理方法，该方法包括以下步骤：（一）所述各部件由不锈钢或玻璃加工而成，部件为不锈钢构件时，先用酸氧化，再用有机溶剂及水清洗，或者氧化后进行电解，再用有机溶剂及水清洗；部件为玻璃构件时，采用HCL或HF腐蚀，或采用物理方法使部件表面粗糙化；（二）在经过步骤（一）清洗后的部件的表面加工去活层，或者先在经过步骤（一）清洗后的部件的表面加工中间层，然后在中间层的表面加工去活层。该方法降低了接触表面吸附力，大大减少被测试物在舱体内壁及各部件与被测试物接触的表面上的吸附，使得从采样管所取得的样品的检测值更接近于舱体内被测试物的实际值，有效提高释放舱的检测精度。

Description

释放舱与被测试物接触的表面的处理方法
技术领域
本发明涉及一种气体挥发性有机物（VOC）、半挥发性有机物（SVOC）及高沸点有机物检测用测试装置内部与被测试物接触的表面的处理方法。
技术背景
传统气体挥发性有机物（VOC）、半挥发性有机物（SVOC）及高沸点有机物检测用测试装置，如释放舱（也称采样仪）是由舱体，与舱体连接的舱门、进气管、排气管、采样管，装设在舱体内的搅拌风机和风道板（8）等部件构成，其舱体内壁及各部件与被测试物接触的表面，由于存在一些吸附被测试物的化学键或者较强的表面张力，使得被测试物吸附在舱体内壁及各部件与被测试物接触的表面上，很难吹扫下来。对于极性化合物，由于舱体内壁及各部件与被测试物接触的表面某些化学键的影响，吸附力更强。因此舱体内壁及各部件与被测试物接触的表面必须进行处理，使得测试装置内表面化学键，如氢键、硅醇基、路易氏酸活化点被覆盖，被测试物容易吸附在舱体内壁及各部件与被测试物接触的表面上，而取样分析被测试物的含量时，是用从测试装置的采样管的所取得的样品进行检测，由于舱体内壁及各部件与被测试物接触的表面吸附了大量的被测试物，导致从样品中得到的检测值低于舱体内被测试物的实际值，检测误差大，不能有效满足高精度的检测需要。
发明内容
本发明的目的在于克服现有技术中上述缺陷：提供一种释放舱与被测试物接触的表面的处理方法，能大大减少被测试物吸附在舱体内壁及各部件与被测试物接触的表面上，有效提高释放舱的检测精度。
为实现上述目的，本发明提供的技术方案如下：构造一种释放舱与被测试物接触的表面的处理方法，该释放舱包括以下部件：舱体，与舱体连接的舱门、进气管、排气管、采样管，装设在舱体内的搅拌风机，风道板，该方法用于对所述舱体、舱门、进气管、排气管、采样管、搅拌风机及风道板中至少一部件与被测试物接触的表面的进行处理，包括以下步骤：
（一）、所述各部件由不锈钢或玻璃加工而成，先将各部件清洗去除污染物，部件为不锈钢构件时，先用酸氧化，再用有机溶剂及水清洗，或者氧化后进行电解，再用有机溶剂及水清洗；部件为玻璃构件时，采用HCL或HF腐蚀，或采用物理方法使部件表面粗糙化，也可采用其他方法清洗去除污染物；
（二）、在经过步骤（一）清洗后的部件的表面加工去活层，或者先在经过步骤（一）清洗后的部件的表面加工中间层，然后在中间层的表面加工去活层。
部件为不锈钢构件时，所述中间层的加工是将经过步骤（一）清洗后的部件采用通入单硅烷在500℃以上的高温条件下煅烧而成SiO 2层；或者是在经过步骤（一）清洗后的部件的表面涂、浸或镀有机硅胶后在500℃以上的高温条件下煅烧而成SiO 2层；或者涂、浸或镀聚硅氧烷类、环糊精衍生物，高温500度以上煅烧而成SiO 2层，所述聚硅氧烷类是聚二甲基硅氧烷、含苯基聚硅氧烷、含氰基聚硅氧烷、含氟聚硅氧烷、加入乙烯基的聚硅氧烷、端烃基聚硅氧烷或者在分子链与官能团间引入间隔基的聚硅氧烷；所述中间层或者是采用在制孔剂中加入不含来源于芳香族的碳原子及杂环的环氧化合物和胺化合物在60-200℃下发生聚合反应，形成凝胶物，然后涂或浸在经过步骤（一）清洗后的部件表面，用溶剂清洗制孔剂，留下骨架相后干燥处理而成三维网状或孔状骨架相，所述制孔剂为甲基溶纤剂、乙基溶纤剂，乙二醇-甲醚乙酸酯、丙二醇-甲醚乙酸酯等酯类，聚乙二醇或者聚丙二醇，所述环氧化合物为2，2，2-三-（2，3-环氧丙基）-异氰尿酸酯，所述胺化合物为乙二胺、二亚乙基三胺、三亚乙基四胺、三缩四乙二胺、亚氨基双丙胺/双（六亚甲基）三胺、1，3，6-三氨基甲基己烷、聚亚甲基二胺、三甲基六亚甲基二胺、聚醚二胺、异佛尔酮二胺、薄荷烷二胺、N-氨基乙基哌嗪、3，9-双（3-氨丙基）2，4，8，10-四氧螺环、双（4-氨基环己基）甲烷或者由聚胺类与二聚酸构成的脂肪族聚酰胺类；部件为玻璃构件时，采用在部件表面沉积二氧化硅、氯化钠或者石墨碳黑来生成中间层。
所述去活层的加工是采用低表面张力的有机化合物涂、浸或镀在中间层上或者部件表面上并在300℃以上的高温条件下烘烤而成；所述去活层的加工或者是将经过步骤（一）清洗后的部件表面或者中间层表面涂、浸或镀SiO2溶胶后在300℃以上的高温条件下烘烤，用溶剂去除多余物质而成；所述去活层的加工或者是将经过步骤（一）清洗后的部件表面或者中间层表面涂、浸或镀聚苯并咪唑吡咯酮（PY）、聚四氟乙烯、聚氟烷类、正硅酸脂或者正硅酸乙脂类后300℃以上的高温条件下烘烤而成。
本发明所述释放舱与被测试物接触的表面的处理方法的有益效果是：通过采用该方法在经过步骤（一）清洗后的部件的表面加工去活层，或者先在经过步骤（一）清洗后的部件的表面加工中间层，然后在中间层的表面加工去活层。降低了舱体内壁及各部件与被测试物接触的表面的表面张力，能大大减少被测试物吸附在舱体内壁及各部件与被测试物接触的表面上，使得从采样管的所取得的样品中得到的检测值更接近于舱体内被测试物的实际值，从而有效提高释放舱的检测精度。
下面结合附图和实施例对本发明所述的释放舱与被测试物接触的表面的处理方法作进一步说明：
附图说明
图1是本发明释放舱与被测试物接触的表面的处理方法所述的释放舱涂有中间层及去活层的结构示意图；
图2是图1的A-A剖视放大图；
图3是图1的B-B剖视放大图；
图4是本发明释放舱与被测试物接触的表面的处理方法所述的释放舱涂有覆盖层的结构示意图；
图5是图4的C-C剖视放大图；
图6是图4的D-D剖视放大图。
具体实施方式
以下本发明所述释放舱与被测试物接触的表面的处理方法的最佳实施例，并不因此限定本发明的保护范围。
实施例一，参照图1、图2、图3，提供一种释放舱与被测试物接触的表面的处理方法，该释放舱包括以下部件：舱体1，与舱体1连接的舱门2、进气管4、排气管5、采样管6，装设在舱体1内的搅拌风机7，风道板8，该方法用于对所述舱体1、舱门2、进气管4、排气管5、采样管6、搅拌风机7及风道板8中至少一部件与被测试物接触的表面的进行处理，包括以下步骤：
（一）、所述各部件由不锈钢或玻璃加工而成，先将各部件清洗去除污染物，部件为不锈钢构件时，先用酸氧化，再用有机溶剂及水清洗，或者氧化后进行电解，再用有机溶剂及水清洗；部件为玻璃构件时，采用HCL或HF腐蚀，或采用物理方法使部件表面粗糙化，也可采用其他方法清洗去除污染物；
（二）、先在经过步骤（一）清洗后的部件的表面加工中间层9，然后在中间层9的表面加工去活层10。
所述中间层9为SiO 2层，或者为三维网状或孔状骨架相，厚度为亚微米到微米厚度。
所述去活层10的厚度为亚微米到微米厚度，为液晶膜结构。
部件为不锈钢构件时，所述中间层9的加工是将经过步骤（一）清洗后的部件采用通入单硅烷在500℃以上的高温条件下煅烧而成SiO 2层；或者是在经过步骤（一）清洗后的部件的表面涂、浸或镀有机硅胶后在500℃以上的高温条件下煅烧而成SiO 2层；或者涂、浸或镀聚硅氧烷类、环糊精衍生物，高温500度以上煅烧而成SiO 2层，所述聚硅氧烷类是聚二甲基硅氧烷、含苯基聚硅氧烷、含氰基聚硅氧烷、含氟聚硅氧烷、加入乙烯基的聚硅氧烷、端烃基聚硅氧烷或者在分子链与官能团间引入间隔基的聚硅氧烷；所述中间层9或者是采用在制孔剂中加入不含来源于芳香族的碳原子及杂环的环氧化合物和胺化合物在60-200℃下发生聚合反应，形成凝胶物，然后涂或浸在经过步骤（一）清洗后的部件表面，用溶剂清洗制孔剂，留下骨架相后干燥处理而成三维网状或孔状骨架相，所述制孔剂为甲基溶纤剂、乙基溶纤剂，乙二醇-甲醚乙酸酯、丙二醇-甲醚乙酸酯等酯类，聚乙二醇或者聚丙二醇，所述环氧化合物为2，2，2-三-（2，3-环氧丙基）-异氰尿酸酯，所述胺化合物为乙二胺、二亚乙基三胺、三亚乙基四胺、三缩四乙二胺、亚氨基双丙胺/双（六亚甲基）三胺、1，3，6-三氨基甲基己烷、聚亚甲基二胺、三甲基六亚甲基二胺、聚醚二胺、异佛尔酮二胺、薄荷烷二胺、N-氨基乙基哌嗪、3，9-双（3-氨丙基）2，4，8，10-四氧螺环、双（4-氨基环己基）甲烷或者由聚胺类与二聚酸构成的脂肪族聚酰胺类；部件为玻璃构件时，采用在部件表面沉积二氧化硅、氯化钠或者石墨碳黑来生成中间层9。
所述去活层10的加工是采用低表面张力的有机化合物涂、浸或镀在中间层9上或者部件表面上并在300℃以上的高温条件下烘烤而成；所述去活层10的加工或者是将经过步骤（一）清洗后的部件表面或者中间层9表面涂、浸或镀SiO2溶胶后在300℃以上的高温条件下烘烤，用溶剂去除多余物质而成；所述去活层10的加工或者是将经过步骤（一）清洗后的部件表面或者中间层9表面涂、浸或镀聚苯并咪唑吡咯酮（PY）、聚四氟乙烯、聚氟烷类、正硅酸脂或者正硅酸乙脂类后300℃以上的高温条件下烘烤而成。
所述低表面张力的有机化合物为硅烷类化合物、含氢硅油或者聚乙二醇。所述硅烷类化合物为三甲基氯硅烷、六甲基二硅氨烷、端烃基聚甲基硅氧烷、苯基-二甲基聚硅烷、甲基三氧基硅烷、二甲基聚硅氧烷、二苯基四甲基硅胺烷、聚硅氧烷或含氟聚硅氧烷。
低表面张力的有机化合物还可采用氟化有机物。
实施例二，参照图4、图5、图6，提供一种释放舱与被测试物接触的表面的处理方法，该释放舱包括以下部件：舱体1，与舱体1连接的舱门2、进气管4、排气管5、采样管6，装设在舱体1内的搅拌风机7，风道板8，该方法用于对所述舱体1、舱门2、进气管4、排气管5、采样管6、搅拌风机7及风道板8中至少一部件与被测试物接触的表面的进行处理，包括以下步骤：
（一）、所述各部件由不锈钢或玻璃加工而成，部件为不锈钢构件时，先用酸氧化，再用有机溶剂及水清洗，或者氧化后进行电解，再用有机溶剂及水清洗；部件为玻璃构件时，用有机溶剂及水清洗；
（二）直接在经过步骤（一）清洗后的部件的表面加工去活层10。
所述去活层10的厚度为亚微米到微米厚度，为液晶膜结构。
所述去活层10的加工是采用低表面张力的有机化合物涂、浸或镀在中间层9上或者部件表面上并在300℃以上的高温条件下烘烤而成；所述去活层10的加工或者是将经过步骤（一）清洗后的部件表面或者中间层9表面涂、浸或镀SiO2溶胶后在300℃以上的高温条件下烘烤，用溶剂去除多余物质而成；所述去活层10的加工或者是将经过步骤（一）清洗后的部件表面或者中间层9表面涂、浸或镀聚苯并咪唑吡咯酮（PY）、聚四氟乙烯、聚氟烷类、正硅酸脂或者正硅酸乙脂类后300℃以上的高温条件下烘烤而成。
所述低表面张力的有机化合物为硅烷类化合物、含氢硅油或者聚乙二醇。所述硅烷类化合物为三甲基氯硅烷、六甲基二硅氨烷、端烃基聚甲基硅氧烷、苯基-二甲基聚硅烷、甲基三氧基硅烷、二甲基聚硅氧烷、二苯基四甲基硅胺烷、聚硅氧烷或含氟聚硅氧烷。
低表面张力的有机化合物还可采用氟化有机物。
上述实施例为本发明较佳的实施方式，但本发明的实施方式并不受上述实施例的限制，其他的任何未背离本发明的精神实质与原理下所作的改变、修饰、替代、组合、简化，均应为等效的置换方式，都包含在本发明的保护范围之内。

Claims (10)

  1. 一种释放舱与被测试物接触的表面的处理方法，该释放舱包括以下部件：舱体（1），与舱体（1）连接的舱门（2）、进气管（4）、排气管（5）、采样管（6），装设在舱体（1）内的搅拌风机（7），风道板（8），该方法用于对所述舱体（1）、舱门（2）、进气管（4）、排气管（5）、采样管（6）、搅拌风机（7）及风道板（8）中至少一部件与被测试物接触的表面的进行处理，其特征在于，包括以下步骤：
    （一）、所述各部件由不锈钢或玻璃加工而成，先将各部件清洗去除污染物；
    （二）、在经过步骤（一）清洗后的部件的表面加工去活层（10），或者先在经过步骤（一）清洗后的部件的表面加工中间层（9），然后在中间层（9）的表面加工去活层（10）。
  2. 根据权利要求1所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述各部件由不锈钢或玻璃加工而成，部件为不锈钢构件时，先用酸氧化，再用有机溶剂及水清洗，或者氧化后进行电解，再用有机溶剂及水清洗；部件为玻璃构件时，采用HCL或HF腐蚀，或采用物理方法使部件表面粗糙化。
  3. 根据权利要求1所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述中间层（9）为SiO 2层，或者为三维网状或孔状骨架相，厚度为亚微米到微米厚度。
  4. 根据权利要求1所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述去活层（10）的厚度为亚微米到微米厚度，为液晶膜结构。
  5. 根据权利要求3所述的释放舱与被测试物接触的表面的处理方法，其特征在于，部件为不锈钢构件时，所述中间层（9）的加工是将经过步骤（一）清洗后的部件采用通入单硅烷在500℃以上的高温条件下煅烧而成SiO 2层；或者是在经过步骤（一）清洗后的部件的表面涂、浸或镀有机硅胶后在500℃以上的高温条件下煅烧而成SiO 2层；或者涂、浸或镀聚硅氧烷类、环糊精衍生物，高温500度以上煅烧而成SiO 2层，所述聚硅氧烷类是聚二甲基硅氧烷、含苯基聚硅氧烷、含氰基聚硅氧烷、含氟聚硅氧烷、加入乙烯基的聚硅氧烷、端烃基聚硅氧烷或者在分子链与官能团间引入间隔基的聚硅氧烷；所述中间层（9）或者是采用在制孔剂中加入不含来源于芳香族的碳原子及杂环的环氧化合物和胺化合物在60-200℃下发生聚合反应，形成凝胶物，然后涂或浸在经过步骤（一）清洗后的部件表面，用溶剂清洗制孔剂，留下骨架相后干燥处理而成三维网状或孔状骨架相，所述制孔剂为甲基溶纤剂、乙基溶纤剂，乙二醇-甲醚乙酸酯、丙二醇-甲醚乙酸酯等酯类，聚乙二醇或者聚丙二醇，所述环氧化合物为2，2，2-三-（2，3-环氧丙基）-异氰尿酸酯，所述胺化合物为乙二胺、二亚乙基三胺、三亚乙基四胺、三缩四乙二胺、亚氨基双丙胺/双（六亚甲基）三胺、1，3，6-三氨基甲基己烷、聚亚甲基二胺、三甲基六亚甲基二胺、聚醚二胺、异佛尔酮二胺、薄荷烷二胺、N-氨基乙基哌嗪、3，9-双（3-氨丙基）2，4，8，10-四氧螺环、双（4-氨基环己基）甲烷或者由聚胺类与二聚酸构成的脂肪族聚酰胺类；部件为玻璃构件时，采用在部件表面沉积二氧化硅、氯化钠或者石墨碳黑来生成中间层（9）。
  6. 根据权利要求1所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述去活层（10）的加工是采用低表面张力的有机化合物涂、浸或镀在中间层（9）上或者部件表面上并在300℃以上的高温条件下烘烤而成；所述去活层（10）的加工或者是将经过步骤（一）清洗后的部件表面或者中间层（9）表面涂、浸或镀SiO2溶胶后在300℃以上的高温条件下烘烤，用溶剂去除多余物质而成；所述去活层（10）的加工或者是将经过步骤（一）清洗后的部件表面或者中间层（9）表面涂、浸或镀聚苯并咪唑吡咯酮（PY）、聚四氟乙烯、聚氟烷类、正硅酸脂或者正硅酸乙脂类后300℃以上的高温条件下烘烤而成。
  7. 根据权利要求6所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述SiO2溶胶成分为甲基三氧基硅烷和四乙氧基硅烷水解物。
  8. 根据权利要求6所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述低表面张力的有机化合物为氟化有机物。
  9. 根据权利要求6所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述低表面张力的有机化合物为硅烷类化合物、含氢硅油或者聚乙二醇。
  10. 根据权利要求9所述的释放舱与被测试物接触的表面的处理方法，其特征在于，所述硅烷类化合物为三甲基氯硅烷、六甲基二硅氨烷、端烃基聚甲基硅氧烷、苯基-二甲基聚硅烷、甲基三氧基硅烷、二甲基聚硅氧烷、二苯基四甲基硅胺烷、聚硅氧烷或含氟聚硅氧烷。
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