WO2013099744A1

WO2013099744A1 - Display device

Info

Publication number: WO2013099744A1
Application number: PCT/JP2012/083010
Authority: WO
Inventors: 伸一川戸; 菊池　克浩; 学二星; 越智　貴志; 優人塚本; 知裕小坂
Original assignee: シャープ株式会社
Priority date: 2011-12-27
Filing date: 2012-12-20
Publication date: 2013-07-04

Abstract

An organic EL display device (1) is provided with: reflective anodes (31), which are respectively disposed for sub-pixels (50R, 50G, 50B, 50W); a semi-transmissive cathode (35), which is disposed to face the reflective anodes (31); a light emitting organic layer (36), which is disposed between the reflective anodes (31) and the semi-transmissive cathode (35); and an edge cover (17), which covers edges of the reflective anodes (31). The edge cover (17) is provided with openings (18a, 18b), the organic layer (36) and the semi-transmissive cathode (35) are disposed in the openings (18a, 18b), a distance between the reflective anodes (31) and the semi-transmissive cathode (35) is set to a distance at which peak wavelengths of visible light resonate, and an aperture ratio of the edge cover (17) in the sub-pixel (50W) is smaller than that of the edge cover (17) in the sub-pixels (50R, 50G, 50B). Consequently, unnecessary coloring of light outputted from the sub-pixels where wavelength resonance is not necessary is suppressed without causing significant reduction of productivity.

Description

Display device

The present invention relates to a display device having a microcavity effect.

In recent years, organic EL (Electroluminescence) display devices have been developed.

The configuration of the organic EL display device is roughly divided into a configuration in which an RGB sub-pixel is obtained using an EL layer that emits red (R), green (G), and blue (B), and white (W). A configuration in which an RGB sub-pixel is obtained using an EL layer that emits color and a color filter (CF) that transmits red, green, and blue light (hereinafter may be referred to as a W + CF method) can be given.

Since the W + CF method does not require a separate process for EL layers that emit R, G, and B using a metal mask, it is extremely difficult to realize a high-definition display or a very large display. It is an effective method.

Non-Patent Document 1 discloses a technique using a microcavity technique in the W + CF method.

FIG. 6 is a cross-sectional view showing the configuration of an organic EL display panel to which the microcavity technology is applied.

As shown in FIG. 6, an organic EL display panel 101 includes a TFT substrate 102, an anode 103, an ITO (Indium Tin Oxide) layer 104, an organic layer 105, and a transflective electrode 106 that is a cathode in this order. Is arranged. A CF 107 is disposed apart from the semi-transmissive electrode 106.

The anode 103 and the ITO layer 104 are arranged for each of the sub-pixels 110R, 110G, and 110B. The CF 107 includes a CF 107R that transmits red light arranged in the sub-pixel 110R, a CF 107G that transmits green light arranged in the sub-pixel 110G, and a CF 107B that transmits blue light arranged in the sub-pixel 110B. I have. The organic layer 106 and the semi-transmissive electrode 106 are formed across the subpixels 110R, 110G, and 110B.

In the sub-pixel 110R, the light emitted from the organic layer 105 passes through the CF 107R. Thereby, red light is emitted from the sub-pixel 110R. In the sub-pixel 110G, the light emitted from the organic layer 105 passes through the CF 107G. Thereby, green light is emitted from the sub-pixel 110G. In the sub-pixel 110B, the light emitted from the organic layer 105 passes through the CF 107B. Thereby, blue light is emitted from the sub-pixel 110B.

Furthermore, a microcavity technique is used for the organic EL display panel 101. Specifically, by adjusting the film thickness of the ITO layer 104, in the subpixel 110R, the distance between the anode 103 and the semi-transmissive electrode 106 is set to an optical path length in which the red wavelength resonates, and in the subpixel 110G, the anode 103 The sub-pixel 110B has a distance between the anode 103 and the semi-transmissive electrode 106, and an optical path length at which the blue wavelength resonates.

Thereby, in the subpixel 110R, the red wavelength resonates between the anode 103 and the semi-transmissive electrode 106, in the subpixel 110G, the green wavelength resonates between the anode 103 and the semi-transmissive electrode 106, and in the subpixel 110B, the anode 103 and The blue wavelength resonates between the semi-transmissive electrodes 106. This is called the so-called microcavity effect.

As a result, in the organic EL display panel 101, the color purity of each of the red light emitted from the subpixel 110R, the green light emitted from the subpixel 110G, and the blue light emitted from the subpixel 110B is increased and reduced. Power consumption can be realized.

In addition to the microcavity technology, a method of constructing one pixel from four color subpixels, in which the W subpixel is added to the RGB subpixel, is also very effective as a technique for obtaining the power consumption reduction effect. Is.

However, it is difficult to achieve both the microcavity technology and the technology for forming one pixel from RGBW subpixels. In particular, it is very difficult for a top emission type organic EL display panel.

As described with reference to FIG. 6, the transflective electrode 106 serving as a cathode is formed over the entire panel across the sub-pixels 110R, 110G, and 110B. If the W subpixel is provided, the transflective electrode is formed in the W subpixel with the same film thickness. For this reason, unless the ITO layer in the W subpixel is made extremely different in thickness from the other subpixels, the cavity effect is also applied in the W subpixel, and the emitted light from the W subpixel is colored. End up.

Even if an ITO layer having such a thickness is formed in the W sub-pixel, a large burden is imposed on the manufacturing process, resulting in a significant reduction in productivity.

Therefore, Patent Document 1 discloses a method in which the W sub-pixel is further composed of a plurality of sub-sub-pixels that emit RGB color lights.

FIG. 7 is a cross-sectional view showing the configuration of one pixel of the display device described in Patent Document 1.

As shown in FIG. 7, one pixel of the display device includes an R subpixel, a G subpixel, a B subpixel, and a W subpixel. The W subpixel is composed of an R subpixel, a G subsubpixel, and a B subsubpixel.

On the substrate 231, a light reflecting electrode 234 is formed for each R, G, B subpixel. The white organic electroluminescent layer 235, the transparent electrode 236, the optical path length adjusting layer 237, the light transflective layer 232, and the adhesive layer are sequentially formed on the light reflective electrode 234 across the R, G, and B subpixels. 238 are stacked. On the adhesive layer 238, the CF layer 233 and the transparent substrate 239 are sequentially arranged.

The CF layer 233 includes an R filter, a G filter, and a B filter. The R subpixel is provided with an R filter, the G subpixel is provided with a G filter, and the B subpixel is provided with a B filter. In the W sub-pixel, an R filter is disposed on the R sub-subpixel, a G filter is disposed on the G sub-subpixel, and a B filter is disposed on the B sub-subpixel.

The optical path length adjusting layer 237 is arranged with the thickness changed corresponding to the emission wavelength of each of the R, G, B subpixels and the R, G, B subpixels. The thickness of the optical path length adjusting layer 237 is set so that the distance between the light reflecting electrode 234 and the light transflective layer 232 is an optical distance at which R, G, B light resonates.

As a result, the light emitted from the white organic electroluminescent layer 235 is repeatedly reflected between the light reflecting electrode 234 and the light semi-transmissive reflective layer 232, and R, G, and B light having resonance wavelengths are respectively reflected in the light semi-transmissive reflective layer. After passing through 232, the light passes through the transparent substrate 239 through the R, G, and B filters, and is emitted to the outside. In the W sub-pixel, white light is observed by mixing R, G, and B light.

According to the display device of FIG. 7, the required wavelength resonates between the light reflecting electrode 234 and the light transflective layer 232 in each R • G • B subpixel and each R • G • B subsubpixel. Therefore, since the intensity of the necessary wavelength is amplified, light with high luminance can be extracted.

Japanese Patent Publication “Japanese Patent Laid-Open No. 2010-80423 (published Apr. 08, 2010)”

However, in the display device of FIG. 7, one subpixel is further divided into a plurality of subsubpixels, and it is necessary to manufacture a high-resolution display device, which increases the burden of the manufacturing process and increases productivity. It drops significantly.

Also, for example, it is conceivable to set the film thickness of the ITO layer so as to satisfy the resonance conditions of all the colors of RGB. However, in this case, it is necessary to control the film thickness with very high accuracy, which also causes a significant decrease in productivity.

The present invention has been made to solve the above-described problems, and its purpose is to provide unnecessary coloring of light emitted from subpixels that do not require wavelength resonance without causing a significant decrease in productivity. It is to suppress.

In order to solve the above problems, a display device of the present invention includes a first electrode disposed for each of a plurality of subpixels constituting one pixel, and a second electrode disposed to face the first electrode. A display device comprising: a first electrode; an organic layer that emits light between the first and second electrodes; and an insulating layer that covers an edge of the first electrode. An opening is provided, and the organic layer and the second electrode are disposed in the opening, and the plurality of sub-pixels emit first and second sub-lights that emit light of different colors. The pixel has a pixel, the distance between the first and second electrodes in the opening is a distance at which the peak wavelength of visible light resonates, and the aperture ratio of the insulating layer in the second subpixel is The aperture ratio of the insulating layer in the first subpixel is small.

The display device of the present invention includes a first electrode disposed for each of a plurality of subpixels constituting one pixel, a second electrode disposed to face the first electrode, and the first and first electrodes. A display device comprising: an organic layer that emits light disposed between the two electrodes; and an insulating layer that covers an edge of the first electrode, the opening being provided in the insulating layer. The organic layer and the second electrode are disposed in a portion, and the plurality of sub-pixels include first and second sub-pixels that emit light of different colors, and the opening in the opening The distance between the first and second electrodes is a distance at which the peak wavelength of visible light resonates, and the aperture ratio of the insulating layer in the second subpixel is the insulating ratio in the first subpixel. Small compared to the aperture ratio of the layer.

As a result, there is an effect of suppressing unnecessary coloring of light emitted from a sub-pixel that does not require wavelength resonance without causing a significant decrease in productivity.

It is a top view showing the structure of one pixel of the organic electroluminescence display of one Embodiment. FIG. 2A is a cross-sectional view taken along line X-X ′ of FIG. 1, and FIG. 2B is a cross-sectional view taken along line Y-Y ′ of FIG. 1. It is sectional drawing showing the structure of the organic electroluminescence display panel with which the organic electroluminescence display of one Embodiment is provided. It is sectional drawing which shows the modification of the 2nd opening part of the W subpixel of the organic electroluminescence display of one Embodiment. It is sectional drawing showing the modification of each sub pixel of the organic electroluminescence display of one Embodiment. It is sectional drawing showing the structure of the conventional organic electroluminescent display panel to which the microcavity technique is applied. It is sectional drawing showing the structure of one pixel of the conventional display apparatus.

(Outline of organic EL display device)
First, the outline of the configuration of the organic EL display device (display device) 1 according to the present invention will be described with reference to FIG.

FIG. 3 is a cross-sectional view illustrating a configuration of an organic EL display panel included in the organic EL display device according to the present embodiment.

The organic EL display device 1 includes an organic EL display panel 2 for displaying an image, and a circuit unit 3 provided with a drive circuit for driving the organic EL display panel 2 and the like.

A plurality of pixels are arranged in a matrix in the image display area of the organic EL display panel 2. One pixel is composed of a plurality of sub-pixels that emit light of different colors.

The circuit unit 3 is provided with wiring such as a flexible film cable, a driving circuit such as a driver, and the like. The circuit unit 3 is connected to the organic EL display panel 2 through electric wiring terminals.

The organic EL display panel 2 includes a support substrate 10, a sealing substrate 20, a sealing resin 41, and a filling resin 42.

The support substrate 10 and the sealing substrate 20 are arranged to be opposed to each other while being separated from each other. The sealing resin 41 and the filling resin 42 are disposed between the support substrate 10 and the sealing substrate 20.

The sealing resin 41 is arranged in a frame shape along the periphery of the support substrate 10 and the sealing substrate 20. The space between the support substrate 10 and the sealing substrate 20 is sealed by the sealing resin 41.

The filling resin 42 contains a desiccant or the like and fills a space formed by the support substrate 10, the sealing substrate 20, and the sealing resin 41.

A TFT (thin film transistor), which is a switching element for driving the subpixel, and a pixel electrode for driving the subpixel are arranged on the support substrate 10 for each subpixel. Yes. An organic layer having a light emitting layer is directly or indirectly stacked on the pixel electrode. In addition, on the outside of the sealing resin 41 arranged in a frame shape on the support substrate 10, electrical wiring terminals (electrical connection portions, connection terminals) and the like are provided.

In this embodiment, the organic EL display panel 2 transmits light emitted from the organic layer of the support substrate 10 through the filling resin 42 and the sealing substrate 20, and the surface of the sealing substrate 20 (with the support substrate 10 and the support substrate 10). It is assumed that this is a top emission type organic EL display panel that emits light as outgoing light on the side opposite to the opposite surface.

Note that the organic EL display panel 2 is not limited to this, and a bottom that emits light emitted from the organic layer as outgoing light on the back surface (the side opposite to the surface facing the sealing substrate 20) of the support substrate 10. It may be an emission type. When the bottom emission type organic EL display panel 2 is configured, the CF may be provided on the support substrate 10 instead of the sealing substrate 20.

In order to improve the sealing performance of the organic layer, an inorganic film or a mixed organic / inorganic laminated film may be laminated on the support substrate 10. Further, the sealing resin 41, the sealing substrate 20, and the filling resin 42 may be omitted as long as the sealing performance of the organic layer is sufficient with only an inorganic film or an organic / inorganic mixed laminated film.

(Pixel structure)
Next, the structure of one pixel of the organic EL display device 1 will be described with reference to FIGS.

FIG. 1 is a plan view showing the configuration of one pixel of the organic EL display device 1. 2A is a cross-sectional view taken along the line X-X ′ of FIG. 1, and FIG. 2B is a cross-sectional view taken along the line Y-Y ′ of FIG. 1.

In the image display area of the organic EL display device 1, pixels 50 each of which is composed of a plurality of sub-pixels 50R, 50G, 50B, and 50W that emit light of different colors and are arranged side by side in order. Is formed.

The subpixel 50 (first subpixel) R emits red light, the subpixel 50 (first subpixel) G emits green light, and the subpixel (first subpixel) 50B emits blue light. The sub-pixel 50 (second sub-pixel) W emits white light.

The arrangement of the sub-pixels 50R, 50G, 50B, and 50W is not particularly limited, but in the present embodiment, a stripe arrangement in which sub-pixels of the same color are continuously arranged in one direction between the pixels 50. It is assumed that

Between the plurality of pixels 50, sub-pixels of the same color are continuously arranged in the longitudinal direction of the sub-pixels 50R, 50G, 50B, and 50W. Further, the sub-pixels 50R, 50G, 50B, and 50W are arranged in this order in a short direction that is a direction orthogonal to the longitudinal direction of each of the sub-pixels 50R, 50G, 50B, and 50W.

Note that the arrangement of the sub-pixels 50R, 50G, 50B, and 50W is not limited to the stripe, and may be another arrangement.

Further, the color of light emitted from sub-pixels other than the sub-pixel 50 W constituting one pixel 50 is not limited to the three colors RGB, for example, four colors including a sub-pixel that emits yellow (Y) light. Or two or less colors.

Although not shown, the display unit of the organic EL display device 1 includes a plurality of source wirings arranged in parallel to each other and a plurality of gate wirings orthogonal to each of the plurality of source wirings and arranged in parallel to each other. And are arranged.

In this embodiment, each of the sub-pixels 50R, 50G, 50B, and 50W is a region partitioned by a plurality of adjacent source lines and a plurality of adjacent gate lines when viewed in plan.

The sealing substrate 20 includes an insulating substrate 21,

CFs

22R, 22G, and 22B constituting the CF 22, and a BM (black matrix) 22BM.

The insulating substrate 21 is a base substrate and is made of an insulating material. The insulating substrate 21 can be made of a transparent insulating material such as non-alkali glass or plastic.

CF22R / 22G / 22B / 22W are arranged on the back surface of the insulating substrate 21 (the surface facing the support substrate 10).

CF22R is a CF that transmits red light, and is arranged in the sub-pixel 50R. The CF 22G is a CF that transmits green light, and is disposed in the sub-pixel 50G. The CF 22B is a CF that transmits blue light, and is disposed in the sub-pixel 50B. The CF 22W is made of a transparent resin material that transmits white light, that is, light emitted from the organic EL element 30 as it is. The CF 22W is disposed in the sub pixel 50W.

BM22BM is the back surface of the insulating substrate 21 (the surface facing the support substrate 10) and is arranged between CF22R, 22G, 22B, and 22W. That is, one of CF22R, 22G, 22B, and 22W is arranged in the opening of BM22BM.

The longitudinal direction of each of CF22R, 22G, 22B, and 22W is parallel to the longitudinal direction of each of the sub-pixels 50R, 50G, 50B, and 50W. Further, the lateral direction orthogonal to the longitudinal direction of each of the

CF

22R, 22G, 22B, and 22W is parallel to the lateral direction orthogonal to the longitudinal direction of each of the sub-pixels 50R, 50G, 50B, and 50W.

The support substrate 10 includes a TFT substrate 11, a reflective anode (first electrode) 31,

transparent layers

37R, 37G, 37B, and 37W, an edge cover (insulating layer) 17, an organic layer 36, and a transflective cathode ( Second electrode) 35.

Although not shown, the TFT substrate 11 is an insulating substrate, the plurality of source wirings and the plurality of gate wirings, and the TFT disposed in the vicinity of a region where the plurality of source wirings and the plurality of gate wirings intersect. And a plurality of source wirings, the plurality of gate wirings, and an interlayer insulating film covering the TFT.

The reflective anode 31 is for injecting (supplying) holes into the organic layer 36 and for reflecting the light emitted from the organic layer 36 toward the sealing substrate 20 and emitting it out of the organic EL display panel 2. is there.

The reflective anode 31 is patterned on the TFT substrate 11 for each of the sub-pixels 50R, 50G, 50B, and 50W. The reflective anode 31 is connected to the TFT through a contact hole provided in the interlayer insulating film.

As the reflective anode 31, a metal material having a high reflectance can be used. Examples of the material constituting the reflective anode 31 include Ag or an Ag alloy, Al or an Al alloy, and the like.

The

transparent layers

37R, 37G, 37B, and 37W are for adjusting the distance between the reflective anode 31 and the transflective cathode 35, respectively. The film thicknesses of the

transparent layers

37R, 37G, 37B, and 37W are appropriately changed or omitted depending on the thickness of another film disposed between the reflective anode 31 and the semi-transmissive cathode 35.

The

transparent layers

37R, 37G, 37B, and 37W are made of a transparent conductive material. As an example, in the present embodiment, the

transparent layers

37R, 37G, 37B, and 37W have a desired film thickness for each color by etching ITO. The constituent material of the

transparent layers

37R, 37G, 37B, and 37W is not limited to ITO, and may be any transparent conductive material such as IZO (IndiumＺZinc Oxide) or gallium-doped zinc oxide (GZO). Good.

The transparent layer 37R is in the sub-pixel 50R and is patterned on the reflective anode 31. The transparent layer 37G is in the subpixel 50G and is patterned on the reflective anode 31. The transparent layer 37B is formed in a pattern on the reflective anode 31 in the sub-pixel 50B. The transparent layer 37 W is in the sub-pixel 50 W and is patterned on the reflective anode 31.

The transparent layer 37R has a thickness such that the distance between the reflective anode 31 and the semi-transmissive cathode 35 sandwiching the transparent layer 37R is an optical path length at which the red peak wavelength resonates.

When the organic layer 36 is formed with the same film thickness in the sub-pixels 50R, 50G, 50B, and 50W, the film thickness of the transparent layer 37R needs to be thicker than the transparent layer 37G, the transparent layer 37B, and the transparent layer 37W. is there. As an example, when the organic layer 36 has a thickness of 200 nm, the transparent layer 37R has a thickness of about 100 nm.

The transparent layer 37G has a film thickness such that the distance between the reflective anode 31 and the semi-transmissive cathode 35 sandwiching the transparent layer 37G is an optical path length at which the green peak wavelength resonates.

When the organic layer 36 is formed with the same film thickness in the sub-pixels 50R, 50G, 50B, and 50W, the transparent layer 37G is thinner than the transparent layer 37R and thicker than the transparent layer 37B and the transparent layer 37W. There is a need. As an example, when the organic layer 36 has a thickness of 200 nm, the transparent layer 37G has a thickness of about 50 nm.

The transparent layer 37B has a thickness such that the distance between the reflective anode 31 and the semi-transmissive cathode 35 sandwiching the transparent layer 37B is an optical path length at which the blue peak wavelength resonates.

When the organic layer 36 is formed with the same film thickness in the sub-pixels 50R, 50G, 50B, and 50W, the film thickness of the transparent layer 37B needs to be thinner than the transparent layer 37R and the transparent layer 37G. As an example, when the organic layer 36 is formed with a film thickness of 200 nm, the transparent layer 37B can be omitted.

The transparent layer 37W can have the same thickness as the transparent layer 37B. As an example, when the organic layer 36 has a thickness of 200 nm, the transparent layer 37W can be omitted.

The edge cover 17 is formed so that the organic layer 36 becomes thin or the electric field concentration occurs at the edges (end portions) of the reflective anode 31, that is, the

transparent layers

37R, 37G, 37B, and 37W. This is an insulating layer for preventing the transmission cathode 35 from being short-circuited.

The edge cover 17 is disposed so as to cover the edges of the reflective anode 31 and the

transparent layers

37R, 37G, 37B, and 37W.

The edge cover 17 has openings formed in the sub-pixels 50R, 50G, 50B, and 50W. However, the aperture ratio of the edge cover 17 in the sub-pixels 50R, 50G, and 50B is different from the aperture ratio of the edge cover 17 in the sub-pixel 50W.

In each of the sub-pixels 50R, 50G, and 50B, an opening (first opening) 18a is formed in the edge cover 17. On the other hand, in the sub-pixel 50W, a plurality of openings (second openings) 18b having a smaller area than the openings 18a are formed in the edge cover 17.

As an example, in the present embodiment, the edge cover 17 is formed by applying a photosensitive acrylic insulating film using a coating technique such as spin coating, and using a normal photolithography technique to each of the sub-pixels 50R, 50G, It is obtained by forming the opening 18a and the opening 18b in 50B and 50W. As an example, the film thickness of the edge cover 17 is about 2 μm.

Various materials can be used as the material of the edge cover 17. For example, resin materials such as acrylic, imide, and siloxane, organic materials, inorganic materials such as silicon oxide and silicon nitride, and the like can be used as the material for the edge cover 17.

The edge cover 17 is made of a transparent material, and almost entirely covers the transparent layer 37W of the sub-pixel 50W.

In the present embodiment, each of the sub-pixels 50R, 50G, and 50B is provided with one opening 18a over substantially the entire surface of each of the sub-pixels 50R, 50G, and 50B.

When viewed in plan, the area of the opening 18a of the edge cover 17 in each of the sub-pixels 50R, 50G, and 50B is approximately the same as the area of each of the

CFs

22R, 22G, and 22B, or the sealing substrate 20 and the support substrate 10 The area of CF22R / 22G / 22B is slightly larger in consideration of the bonding margin.

In the sub-pixel 50R, the edge cover 17 covers the edge of the transparent layer 37R and exposes the transparent layer 37R through the opening 18a. In other words, in the subpixel 50R, the edge cover 17 is disposed along the peripheral edge of the transparent layer 37R. The transparent layer 37R has a larger area exposed by the opening 18a than the area covered by the edge cover 17.

In the subpixel 50G, the edge cover 17 covers the edge of the transparent layer 37G and exposes the transparent layer 37G through the opening 18a. In other words, in the sub-pixel 50G, the edge cover 17 is disposed along the peripheral edge of the transparent layer 37G. The transparent layer 37G has a larger area exposed by the opening 18a than an area covered by the edge cover 17.

In the sub-pixel 50B, the edge cover 17 covers the edge of the transparent layer 37B and exposes the transparent layer 37B through the opening 18a. In other words, in the subpixel 50B, the edge cover 17 is disposed along the peripheral edge of the transparent layer 37B. The transparent layer 37 B has a larger area exposed by the opening 18 a than the area covered by the edge cover 17.

As will be described later, the organic layer 36 is laminated on each of the

transparent layers

37R, 37G, and 37B whose surfaces are exposed through the openings 18a of the sub-pixels 50R, 50G, and 50B. Among the sub-pixels 50R, 50G, and 50B, the inside of each opening 18a is a light emitting portion of each sub-pixel 50R, 50G, and 50B.

The longitudinal directions of the openings 18a of the edge cover 17 of the

subpixels

50R, 50G, and 50B are parallel to the longitudinal directions of the

subpixels

50R, 50G, and 50B. The short direction perpendicular to the respective longitudinal directions of the openings 18a of the edge covers 17 of the sub-pixels 50R, 50G, and 50B is parallel to the short direction perpendicular to the respective longitudinal directions of the sub-pixels 50R, 50G, and 50B. is there.

In the sub-pixel 50W, the edge cover 17 covers not only the edge of the transparent layer 37W but also the substantially entire surface of the transparent layer 37W. A plurality of minute openings 18b are formed in the edge cover 17 covering substantially the entire surface of the transparent layer 37W. Each of the plurality of openings 18b is a minute opening smaller than the area of the opening 18a. The transparent layer 37W is exposed through the plurality of openings 18b.

The area covered with the edge cover 17 of the transparent layer 37W is wider than the area exposed by the plurality of openings 18b.

In the subpixel 50W, a plurality of openings 18b are formed so that the aperture ratio of the edge cover 17 is smaller than the aperture ratio of the edge cover 17 in the

subpixels

50R, 50G, and 50B.

In the present embodiment, as an example, the plurality of openings 18b are formed in the edge cover 17 of the sub-pixel 50W in a line along the longitudinal direction of the sub-pixel 50W.

The organic layer 36 is a layer that emits light by recombining holes injected from the reflective anode 31 side and electrons injected from the transflective cathode 35 side. In the present embodiment, the organic layer 36 emits white light.

After the

openings

18a and 18b are formed in the edge cover 17, the organic layer 36 is laminated in the edge cover 17 and the

openings

18a and 18b using, for example, a vacuum deposition method.

The organic layer 36 is formed across the sub-pixels 50R, 50G, 50B, and 50W, and is further formed over the entire image display area of the organic EL display panel 2. The organic layer 36 covers the edge cover 17 and the

transparent layers

37R, 37G, 37B, and 37W.

The organic layer 36 is in contact with the transparent layer 37R in the opening 18a in the subpixel 50R, is in contact with the transparent layer 37G in the opening 18a in the subpixel 50G, and is transparent in the opening 18a in the subpixel 50B. 37B, and the sub-pixel 50W is in contact with the transparent layer 37W in the opening 18b.

Thus, in the organic EL display device 1, the organic layer 36 that emits white light and the CF 22 that transmits R, G, B, and W color light are used. Thereby, it is not necessary to form a layer emitting light of each color by vapor deposition or the like in each of the sub-pixels 50R, 50G, 50B, and 50W.

For this reason, the organic layer 36 that emits white light can be formed by vapor deposition or the like, and the high-definition for separately coating the RGB light-emitting layers on the sub-pixels 50R, 50G, 50B, and 50W. No mask is needed. As a result, the manufacturing cost can be reduced.

In place of the organic layer 36, an organic layer that emits R-color light is disposed in the subpixel 50R, an organic layer that emits G-color light is disposed in the subpixel 50G, and an organic layer that emits B-color light is disposed in the subpixel 50B. An organic layer that emits W color light may be disposed in the sub-pixel 50W. In this case, the CF 22 can be omitted.

The transflective cathode 35 is a layer having a function of injecting electrons into the lower organic layer 36. The transflective cathode 35 has a function of reflecting or transmitting part of the light emitted from the organic layer 36.

The transflective cathode 35 extends over the sub-pixels 50R, 50G, 50B, and 50W, and is formed over the entire image display area of the organic EL display panel 2. The transflective cathode 35 is stacked on the organic layer 36.

The transflective cathode 35 is made of, for example, Ag or the like, and is formed on the entire surface of the organic layer 36 by vapor deposition or the like.

Since the organic EL display device 1 has a top emission structure that extracts light emitted upward, the transflective cathode 35 needs to transmit light. However, in order to obtain a microcavity effect between the transflective cathode 35 and the reflective anode 31, the transflective cathode 35 also needs to have a certain degree of reflectivity.

As an example, the transflective cathode 35 is made of Ag and has a thickness of about 20 nm. Note that the material and film thickness of the transflective cathode 35 are not limited to this, and can be composed of a metal thin film having a film thickness of about 10 nm to 30 nm, for example. In addition to Ag, the transflective cathode 35 can be made of Al, an alloy of Ag and Al, or the like.

In addition, the cathode and the anode may be reversed between the semi-transmissive cathode 35 and the reflective anode 31. That is, instead of the semi-transmissive cathode 35, a semi-transmissive anode may be stacked on the organic layer 36, and the reflective cathode may be disposed below the organic layer 36 instead of the reflective anode 31.

Further, if necessary, a hole injection layer, a hole transport layer, an electron transport layer, an electron injection layer, and the like may be disposed between the reflective anode 31 and the semi-transmissive cathode 35.

(Operation effect of organic EL display device)
Next, main functions and effects of the organic EL display device 1 will be described with reference to FIGS.

In the organic EL display device 1, the organic layer 36 and the transflective cathode 35 are not provided for each of the

subpixels

50R, 50G, 50B, and 50W, but straddle the

subpixels

50R, 50G, 50B, and 50W, It is provided on the entire image display area of the organic EL display device 1.

For this reason, the organic layer 36 and the transflective cathode 35 are stacked not only in the openings 18a of the

subpixels

50R, 50G, and 50B and the openings 18b of the subpixel 50W but also on the edge cover 17. Yes.

Thus, by providing the organic layer 36 and the transflective cathode 35 across the sub-pixels 50R, 50G, 50B, and 50W, each of the sub-pixels 50R, 50G, 50B, and 50W, such as performing separate deposition, etc. There is no need to form them separately. For this reason, the manufacturing process can be simplified.

According to the pixel 50 of the organic EL display device 1, current is injected from the reflective anode 31 into the organic layer 36. The organic layer 36 emits white light in the

openings

18a and 18b in the sub-pixels 50R, 50G, 50B, and 50W.

Here, the sub-pixels 50R, 50G, and 50B have a cavity structure for obtaining a cavity effect.

That is, in the sub-pixel 50R, by providing the transparent layer 37R between the organic layer 36 and the reflective anode 31, the distance between the reflective anode 31 in the opening 18a and the semi-transmissive cathode 35 is reduced. Is the distance at which the peak wavelength of the R-color light, which is the visible light emitted from, resonates.

As an example, the thickness of the organic layer 36 is 200 nm, the thickness of the transparent layer 37R is 100 nm, and the distance between the reflective anode 31 and the transflective cathode 35 is 300 nm.

Thereby, in the sub-pixel 50R, the red peak wavelength resonates between the reflective anode 31 and the semi-transmissive cathode 35 among the wavelengths of the W color light emitted from the organic layer 36 in the opening 18a. As a result, the W color light emitted from the organic layer 36 is colored red, passes through the semi-transmissive cathode 35, and further passes through the CF 22R, and is emitted from the subpixel 50R to the outside as R color light with high color purity. .

In the subpixel 50G, by providing the transparent layer 37G between the organic layer 36 and the reflective anode 31, the distance between the reflective anode 31 in the opening 18a and the semi-transmissive cathode 35 is emitted from the subpixel 50G. The peak wavelength of the G color light, which is visible light, is a distance at which resonance occurs.

As an example, the thickness of the organic layer 36 is 200 nm, the thickness of the transparent layer 37G is 50 nm, and the distance between the reflective anode 31 and the transflective cathode 35 is 250 nm.

Therefore, in the sub-pixel 50G, the green peak wavelength resonates between the reflective anode 31 and the semi-transmissive cathode 35 among the wavelengths of the W color light emitted from the organic layer 36 in the opening 18a. As a result, the W color light emitted from the organic layer 36 is colored green, passes through the semi-transmissive cathode 35, and further passes through the CF 22G, and is emitted from the subpixel 50G to the outside as G color light with high color purity. .

In the sub-pixel 50B, by providing the transparent layer 37B between the organic layer 36 and the reflective anode 31, the distance between the reflective anode 31 in the opening 18a and the semi-transmissive cathode 35 is emitted from the sub-pixel 50B. The peak wavelength of the B-color light that is visible light is the distance at which resonance occurs.

As an example, when the film thickness of the organic layer 36 is 200 nm, the transparent layer 37B is omitted, and the distance between the reflective anode 31 and the transflective cathode 35 is 200 nm.

Therefore, in the sub-pixel 50B, the blue peak wavelength resonates between the reflective anode 31 and the semi-transmissive cathode 35 among the wavelengths of the W color light emitted from the organic layer 36 in the opening 18a. As a result, the W color light emitted from the organic layer 36 is colored blue, passes through the semi-transmissive cathode 35, and further passes through the CF 22B, and is emitted from the subpixel 50B to the outside as B color light with high color purity. .

Even if the transparent layer 37B is not provided, the transparent layer 37B may be omitted when the distance between the reflective anode 31 and the semi-transmissive cathode 35 is a distance at which the peak wavelength of the B color light resonates. .

As described above, since light with high color purity can be emitted from each of the sub-pixels 50R, 50G, and 50B, the high-definition organic EL display device 1 can be obtained.

On the other hand, in the sub-pixel 50W, the edge cover 17 is provided with a plurality of openings 18b having a smaller area than the openings 18a. In the subpixel 50W, a plurality of openings 18b are formed so that the aperture ratio of the edge cover 17 is smaller than the aperture ratio of the edge cover 17 in the

subpixels

50R, 56G, and 50B.

For this reason, even if any wavelength in the visible light region of the white light emitted from the organic layer 36 resonates between the reflective anode 31 in the opening 18b and the transflective cathode 35, The amount of light is a small amount of the amount of light emitted from the sub-pixel 50W.

Thus, since the resonance of the wavelength of visible light is suppressed in the sub-pixel 50W, it is possible to emit white light whose coloring is suppressed.

In the sub-pixel 50W, by providing the transparent layer 37W between the organic layer 36 and the reflective anode 31, the distance between the reflective anode 31 in the opening 18b and the transflective cathode 35 can be adjusted to the image observer. The wavelength of visible light that is easily visible is a distance at which resonance is difficult.

As an example, in the present embodiment, the distance between the reflective anode 31 in the opening 18b of the subpixel 50W and the semi-transmissive cathode 35 is the distance at which the peak wavelength of blue light resonates, as in the subpixel 50B. ing.

That is, when the film thickness of the organic layer 36 is 200 nm, the transparent layer 37W is omitted, and the distance between the reflective anode 31 and the transflective cathode 35 is 200 nm.

As a result, in the sub-pixels 50R, 50G, and 50B, the organic layer 36 in the opening 18a emits white light.

On the other hand, since a plurality of openings 18b are arranged in the subpixel 50W, the current injected from the reflective anode 31 into the organic layer 36 is generated in the openings 18b as shown by an arrow CA in FIG. The organic layer 36 extends along the side wall of the opening 18b and also extends to the organic layer 36 on the edge cover 17 between the openings 18b. As a result, not only the organic layer 36 in the opening 18b but also the organic layer 36 on the edge cover 17 can emit light, so that white light with a uniform luminance distribution can be emitted from the sub-pixel 50W.

Since this edge cover 17 is for functioning as an insulating layer, it is formed thick. As an example, it is about 2 μm (that is, 2000 nm).

For this reason, the distance between the reflective anode 31 and the transflective cathode 35 in the subpixel 50W in the region where the edge cover 17 and the stacked organic layer 36 are formed is 2200 nm, and the wavelength of a specific visible light The effect of resonating is very weak.

On the other hand, as described above, in the sub-pixel 50W, the area where the plurality of openings 18b are formed is very small.

As a result, in the sub-pixel 50W, the microcavity effect hardly occurs, and white light with a uniform luminance distribution can be emitted with coloring suppressed.

The number of the openings 18b, the arrangement position, and the like can be arbitrarily set based on the size of the sub-pixel 50W.

In the present embodiment, in the sub-pixel 50W, the plurality of openings 18b are provided such that the area of the plurality of openings 18b is smaller than the area where the edge cover 17 covers the reflective anode 31. Thereby, coloring of W color light radiate | emitted from the subpixel 50W can be suppressed.

On the other hand, in the sub-pixels 50R, 50G, and 50B, the opening 18a is provided so that the area of the opening 18a is larger than the area where the edge cover 17 covers the reflective anode 31. Thereby, R color light, G color light, and B color light with high color purity can be obtained by the cavity effect.

Note that the aperture ratio of the edge cover 17 of the

subpixels

50R, 50G, 50B, and 50W is not limited to that described above, and the edge cover of the subpixel 50W is determined based on the aperture ratio of the edge cover 17 of the

subpixels

50R, 50G, and 50B. The aperture ratio of 17 should just become small.

For example, the aperture ratio of the edge cover 17 of the sub-pixels 50R, 50G, and 50B is about 10% to 80%, and the aperture ratio of the edge cover 17 of the sub-pixel 50W is the same as that of the edge cover 17 of the sub-pixels 50R, 50G, and 50B. The aperture ratio may be about 1/4 to 1/10.

Of the light emitted from the sub-pixel 50W, for example, light of a color whose peak wavelength is resonated at the opening 18b, such as B color light, is mixed slightly. As described above, when W light having a slight blue color is obtained from the sub-pixel 50W, the display driving circuit may be designed according to the emission color, and the power consumption by using the original RGBW sub-pixel is reduced. The reduction effect is not impaired.

Further, when the aperture ratio of the edge cover 17 of the subpixel 50W is large, a region where the microcavity effect is suppressed, that is, a region other than the opening 18b in the subpixel 50W is relatively large. The outgoing light of 50 W tends to be biased to a specific color. On the other hand, if the aperture ratio of the edge cover 17 of the sub-pixel 50W is too small, the manufacturing process becomes difficult and the mass productivity may be reduced.

(Modification of opening)
FIG. 4 is a cross-sectional view showing a modification of the opening 18b of the subpixel 50W.

As shown in FIG. 4, the side surfaces of the edge cover 17 in the plurality of openings 18b of the sub-pixel 50W are tapered, so that the reflection anode 31 can be removed from the reflective anode 31 in the opening 18b as shown by an arrow CB in FIG. The current injected into the organic layer 36 easily spreads along the side wall of the edge cover 17 and easily reaches the organic layer 36 on the edge cover 17.

Further, the organic layer 36 can be prevented from being stepped by forming the side wall of the edge cover 17 in the plurality of openings 18b of the sub-pixel 50W into a tapered shape. Thereby, the organic layer 36 arranged on the edge cover 17 can be made to emit light reliably.

As a result, it is possible to obtain outgoing light with a uniform luminance distribution.

In addition, even if the side wall of the edge cover 17 is tapered, if the angle is steep, the organic layer 36 is stepped at the corner of the tapered shape, and the current path is disconnected or high. It becomes a resistance state. For this reason, the current does not spread laterally (that is, along the organic layer 36).

The taper angle of the side wall of the edge cover 17 (an angle between the side wall of the edge cover 17 and the transparent layer 37 W) at which the organic layer 36 is disconnected or the resistance is increased depends on the formation conditions of the organic layer 36. For example, in the case where the organic layer 36 is formed by vacuum vapor deposition, it varies depending on conditions such as the angle between the substrate and the vapor deposition source.

However, it is preferable that the taper angle at which the step breakage or the increase in resistance does not occur is 60 ° or less by a generally used technique.

It is preferable that the edge cover 17 is made of a resin material. Although depending on the formation conditions, the taper angle of the side wall of the edge cover 17 can be easily set to 60 ° or less by a normal wet photolithography process or the like.

Note that not only the side wall of the edge cover 17 in the opening 18b but also the side wall of the edge cover 17 in the opening 18a may be tapered.

(Subpixel variation)
FIG. 5 is a cross-sectional view illustrating a modification of the sub-pixels 50R, 50G, 50B, and 50W. FIG. 5 shows only the TFT substrate.

Each of the sub-pixels 50R, 50G, 50B, and 50W of the organic EL display device 1 may have a so-called tandem structure.

The organic EL display device 1 may include a support substrate 10 a instead of the support substrate 10.

The support substrate 10a is different from the support substrate 10 in that the organic layer 36 is two layers of the support substrate 10 and the charge generation layer 38 is provided therebetween. Other configurations of the support substrate 10 a are the same as those of the support substrate 10.

In the support substrate 10a, the organic layer 36a, the charge generation layer 38, and the organic layer 36b are laminated in order from the lower layer to the upper layer, covering the edge cover 17, the opening 18a, and the opening 18b (not shown in FIG. 5). Has been. A semi-transmissive cathode 35 is provided on the organic layer 36b.

The organic layer 36a, the charge generation layer 38, and the organic layer 36b are provided across the sub-pixels 50R, 50G, 50B, and 50W, and are provided over the entire image display area.

The organic layers 36a and 36b are layers that emit light that is white when the two layers are combined, although the emission color is not particularly limited. The organic layer is not limited to two layers, and may have a tandem structure including three or more layers.

The charge generation layer 38 can generate holes and electrons, and can efficiently inject carriers into the organic layers 36a and 36b. Further, it is a layer made of a material having a relatively lower resistance value than the organic layers 36a and 36b. As the charge generation layer 38, for example, an alkali metal such as Li, Ca, or Sr, an alkaline earth metal, or a material in which these and an organic substance are co-deposited can be used.

As described above, according to the sub-pixels 50R, 50G, 50B, and 50W in FIG. 5, the charge generation layer 38 is provided between the organic layer 36a and the organic layer 36b, so that each of the

pixels

50R, 50G, 50B, and 50B. The conductivity between 50W is improved. That is, the current injected from the reflective anode 31 into the organic layer 36a in each of the

openings

18a and 18b can be easily spread by the charge generation layer 38 as indicated by the arrow CC in FIG.

Therefore, even if the organic layers 36a and 36b are stacked on the edge cover 17 in the sub-pixel 50W, the organic layers 36a and 36b on the edge cover 17 can emit light more reliably. As a result, emitted light having a uniform luminance distribution can be obtained from the sub-pixel 50W.

The present invention is not limited to the above-described embodiments, and various modifications can be made within the scope of the claims, and embodiments obtained by appropriately combining technical means disclosed in different embodiments. Is also included in the technical scope of the present invention.

As described above, the display device of the present invention includes the first electrode disposed for each of the plurality of subpixels constituting one pixel, the second electrode disposed to face the first electrode, A display device comprising: an organic layer that emits light between the first and second electrodes; and an insulating layer that covers an edge of the first electrode, wherein an opening is provided in the insulating layer. The organic layer and the second electrode are disposed in the opening, and the plurality of subpixels include first and second subpixels that emit light of different colors. The distance between the first and second electrodes in the opening is a distance at which the peak wavelength of visible light resonates, and the aperture ratio of the insulating layer in the second subpixel is the first aperture. The aperture ratio of the insulating layer in the subpixel is small.

According to the above configuration, the distance between the first and second electrodes in the opening is a distance at which the peak wavelength of visible light resonates. For this reason, visible light with high color purity can be emitted from the first subpixel. As a result, a high-definition display device can be obtained.

The aperture ratio of the insulating layer in the second subpixel is smaller than the aperture ratio of the insulating layer in the first subpixel. For this reason, it can suppress that a wavelength resonates within a 2nd subpixel. As a result, the coloring of the light emitted from the second subpixel can be suppressed.

In this way, according to the above configuration, the aperture ratio of the insulating layer in the second subpixel can be made smaller than the aperture ratio of the insulating layer in the first subpixel by simply reducing the aperture ratio of the second subpixel. Therefore, it is possible to suppress unnecessary coloring of the emitted light from the sub-pixels that do not require wavelength resonance without causing a significant decrease in productivity.

The opening includes a first opening and a second opening having a smaller area than the first opening, and the first opening is the insulation in the first subpixel. Preferably, the second opening is provided in the insulating layer of the second subpixel.

With the above configuration, the aperture ratio of the insulating layer in the second subpixel can be made smaller than the aperture ratio of the insulating layer in the first subpixel.

Further, it is preferable that a plurality of the second openings are provided in the second subpixel. With the above structure, the organic layer of the second subpixel can be made to emit light uniformly. As a result, the occurrence of color unevenness can be prevented.

In the first subpixel, the area of the first opening is larger than the area where the insulating layer covers the first electrode. In the second subpixel, the insulating layer is The area of the second opening is preferably smaller than the area covering the first electrode.

With the above configuration, it is possible to emit light with high color purity from the first subpixel, and it is possible to suppress coloring of the light emitted from the second subpixel.

The organic layer is preferably provided across the first and second subpixels. With the above configuration, it is not necessary to form the organic layer separately for each of the first and second subpixels, so that the manufacturing process can be simplified.

The organic layer preferably covers the insulating layer. With the above configuration, it is not necessary to pattern the organic layer only in the first and second openings, so that the manufacturing process can be simplified. Furthermore, by providing a plurality of openings in the second subpixel, the organic layer on the insulating layer can also emit light in the second subpixel. Thus, it is possible to obtain emitted light having a uniform luminance distribution from the second subpixel.

In addition, each of the first and second openings is preferably tapered. With the above configuration, the organic layer can be prevented from being stepped at the side walls of the first and second openings of the insulating layer. Thereby, even if the organic layer is arranged on the insulating layer, the organic layer can emit light reliably. As a result, emitted light having a uniform luminance distribution can be obtained from the second sub-pixel.

The organic layer includes a first organic layer and a second organic layer provided on the first organic layer, the first organic layer and the second organic layer. It is preferable that a charge generation layer made of a material having a relatively lower resistance value than the first and second organic layers is provided between the first and second organic layers.

According to the above configuration, since the charge generation layer is provided between the first and second organic layers, the conductivity can be improved. Thereby, even if the first and second organic layers are provided on the insulating layer, the first and second organic layers on the insulating layer can emit light more reliably. As a result, emitted light having a uniform luminance distribution can be obtained from the second sub-pixel.

As an embodiment of the first and second subpixels, the first subpixel emits a red subpixel that emits red light, a green subpixel that emits green light, and a blue light. The second sub-pixel may have a white sub-pixel that emits white light.

In the red subpixel, the distance between the first and second electrodes in the first opening is a distance at which the peak wavelength of red light resonates. In the green subpixel, The distance between the first and second electrodes in one opening is a distance at which the peak wavelength of green light resonates. In the blue subpixel, the first and second electrodes in the first opening are resonated. The distance between the two electrodes is a distance at which the peak wavelength of blue light resonates. In the white subpixel, the distance between the first and second electrodes in the second opening is blue light. It is preferable that the peak wavelength is a resonating distance.

With the above configuration, it is possible to obtain red light / green light / blue light with high color purity and white light with suppressed coloring.

The present invention can be used for a display device having a microcavity effect, such as an organic EL display device.

1 Organic EL display device (display device)
10.10a Support substrate 17 Edge cover (insulating layer)
18a opening (first opening)
18b opening (second opening)
30 Organic EL element 31 Reflective anode (first electrode)
35 Transflective cathode (second electrode)
36 Organic layer 36a Organic layer (first organic layer)
36b Organic layer (second organic layer)
37R / 37G / 37B / 37W Transparent layer 38 Charge generation layer 50 Pixel 50R / 50G / 50B Sub-pixel (first sub-pixel)
50W sub-pixel (second sub-pixel)

Claims

A first electrode disposed for each of a plurality of sub-pixels constituting one pixel, a second electrode disposed opposite to the first electrode, and the first and second electrodes. A display device comprising: an organic layer that emits light; and an insulating layer that covers an edge of the first electrode.
An opening is provided in the insulating layer, and the organic layer and the second electrode are arranged in the opening,
The plurality of sub-pixels include first and second sub-pixels that emit light of different colors,
The distance between the first and second electrodes in the opening is a distance at which the peak wavelength of visible light resonates,
The display device, wherein an aperture ratio of the insulating layer in the second subpixel is smaller than an aperture ratio of the insulating layer in the first subpixel.
The opening includes a first opening and a second opening having a smaller area than the first opening.
The first opening is provided in the insulating layer in the first subpixel,
The display device according to claim 1, wherein the second opening is provided in the insulating layer in the second subpixel.
3. The display device according to claim 2, wherein a plurality of the second openings are provided in the second subpixel.
In the first subpixel, the area of the first opening is larger than the area where the insulating layer covers the first electrode,
3. The display device according to claim 2, wherein, in the second subpixel, an area of the second opening is smaller than an area where the insulating layer covers the first electrode.
The display device according to any one of claims 1 to 4, wherein the organic layer is provided across the first and second subpixels.
The display device according to claim 5, wherein the organic layer covers the insulating layer.
7. The display device according to claim 1, wherein each of the first and second openings has a tapered shape.
The organic layer includes a first organic layer and a second organic layer provided on an upper layer of the first organic layer,
A charge generation layer made of a material having a relatively lower resistance than the first and second organic layers is provided between the first organic layer and the second organic layer. The display device according to any one of claims 1 to 7, characterized in that:
The first sub-pixel includes a red sub-pixel that emits red light, a green sub-pixel that emits green light, and a blue sub-pixel that emits blue light, and the second sub-pixel is white 9. The display device according to claim 1, further comprising a white sub-pixel that emits light.
In the red sub-pixel, the distance between the first and second electrodes in the first opening is a distance at which the peak wavelength of red light resonates,
In the green subpixel, the distance between the first and second electrodes in the first opening is a distance at which the peak wavelength of green light resonates,
In the blue subpixel, the distance between the first and second electrodes in the first opening is a distance at which the peak wavelength of blue light resonates,
10. The white subpixel according to claim 9, wherein the distance between the first electrode and the second electrode in the second opening is a distance at which a peak wavelength of blue light resonates. Display device.