WO2013058557A3 - 기판정렬장치 - Google Patents
기판정렬장치 Download PDFInfo
- Publication number
- WO2013058557A3 WO2013058557A3 PCT/KR2012/008504 KR2012008504W WO2013058557A3 WO 2013058557 A3 WO2013058557 A3 WO 2013058557A3 KR 2012008504 W KR2012008504 W KR 2012008504W WO 2013058557 A3 WO2013058557 A3 WO 2013058557A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- substrate
- alignment device
- substrate alignment
- support pins
- loaded
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6734—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders specially adapted for supporting large square shaped substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
Abstract
기판정렬장치가 개시된다. 본 발명에 따른 기판정렬장치는, 기판이 본체에 투입되어 지지핀에 탑재 지지되었을 때, 기판의 테두리부측 부위가 지지핀에 탑재 지지되었는가를 감지하는 수단이 마련되므로, 기판을 이동시켜 정렬할 때, 기판 또는 지지핀이 손상되는 것을 방지할 수 있는 효과가 있다.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110106296A KR101355213B1 (ko) | 2011-10-18 | 2011-10-18 | 기판 정렬 장치 |
KR10-2011-0106296 | 2011-10-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2013058557A2 WO2013058557A2 (ko) | 2013-04-25 |
WO2013058557A3 true WO2013058557A3 (ko) | 2013-06-13 |
Family
ID=48141538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/008504 WO2013058557A2 (ko) | 2011-10-18 | 2012-10-18 | 기판정렬장치 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101355213B1 (ko) |
TW (1) | TW201324671A (ko) |
WO (1) | WO2013058557A2 (ko) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002154648A (ja) * | 2000-11-15 | 2002-05-28 | Fuji Photo Film Co Ltd | 基板カセット |
KR200298915Y1 (ko) * | 2002-09-17 | 2003-01-03 | 아남반도체 주식회사 | Cmp 장비의 웨트 스테이션 |
JP3977481B2 (ja) * | 1997-04-11 | 2007-09-19 | 淀川ヒューテック株式会社 | 基板用トレイカセット |
KR20080066558A (ko) * | 2007-01-12 | 2008-07-16 | 가부시키가이샤 다이후쿠 | 물품 반송 장치와 물품 위치 오차 검출 방법 |
KR20090115002A (ko) * | 2008-04-30 | 2009-11-04 | 주식회사 테라세미콘 | 홀더 스테이지 |
-
2011
- 2011-10-18 KR KR1020110106296A patent/KR101355213B1/ko active IP Right Grant
-
2012
- 2012-10-16 TW TW101138056A patent/TW201324671A/zh unknown
- 2012-10-18 WO PCT/KR2012/008504 patent/WO2013058557A2/ko active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3977481B2 (ja) * | 1997-04-11 | 2007-09-19 | 淀川ヒューテック株式会社 | 基板用トレイカセット |
JP2002154648A (ja) * | 2000-11-15 | 2002-05-28 | Fuji Photo Film Co Ltd | 基板カセット |
KR200298915Y1 (ko) * | 2002-09-17 | 2003-01-03 | 아남반도체 주식회사 | Cmp 장비의 웨트 스테이션 |
KR20080066558A (ko) * | 2007-01-12 | 2008-07-16 | 가부시키가이샤 다이후쿠 | 물품 반송 장치와 물품 위치 오차 검출 방법 |
KR20090115002A (ko) * | 2008-04-30 | 2009-11-04 | 주식회사 테라세미콘 | 홀더 스테이지 |
Also Published As
Publication number | Publication date |
---|---|
KR20130042156A (ko) | 2013-04-26 |
KR101355213B1 (ko) | 2014-01-28 |
WO2013058557A2 (ko) | 2013-04-25 |
TW201324671A (zh) | 2013-06-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG2013083654A (en) | Methods for depositing films on sensitive substrates | |
EP3208828A4 (en) | Method for bonding substrates together, and substrate bonding device | |
WO2010093733A3 (en) | Detecting defects on a wafer | |
WO2014083435A3 (en) | Handling liquid samples | |
HK1209203A1 (en) | Systems and methods for generating biomarker signatures with integrated bias correction and class prediction | |
WO2012116331A3 (en) | Methods and systems for haplotype determination | |
TWI562261B (en) | Substrate position detecting apparatus, substrate processing apparatus using substrate position detecting apparatus, and deposition apparatus | |
EP3021741A4 (en) | Devices, systems, and methods for assessing a vessel with automated drift correction | |
WO2013078416A3 (en) | Apparatus, system, and method to promote behavior change based on mindfulness methodologies | |
EP2584452B8 (en) | Information processing device with detection of holding state | |
SG10201401901WA (en) | Glass for substrate, and glass substrate | |
EP3012714A4 (en) | Substrate for display device, and display device | |
WO2012166425A3 (en) | Methods of amplifying whole genome of a single cell | |
EP2389685A4 (en) | Systems and methods for detecting defects on a wafer | |
WO2012100198A3 (en) | Methods and systems for performing digital measurements | |
SG2014013023A (en) | Retaining system, device and method for handling substrate stacks | |
EP2588161A4 (en) | FLOW-INHIBITION DEVICE FOR AN INTRAVENOUS SET | |
GB201105462D0 (en) | Envelope path processing for envelope tracking amplification stage | |
WO2013135494A3 (en) | Lithographic apparatus | |
EP3183745A4 (en) | Optoelectronic modules having a silicon substrate, and fabrication methods for such modules | |
EP2736022A4 (en) | CURRENCY MANAGEMENT DEVICE, CURRENCY MANAGEMENT SYSTEM, AND CURRENCY MANAGEMENT METHOD | |
WO2013120839A3 (en) | Device for the magnetic-field-compensated positioning of a component | |
GB201108979D0 (en) | Time alignment for an amplification stage | |
EP2785470A4 (en) | PHOTOON COMPONENTS ON FLAT AND CROPPED SUBSTRATES AND METHOD OF MANUFACTURING THEREOF | |
EP2867377A4 (en) | PRIMERS, ASSAYS AND METHOD FOR DETECTING AN E. COLI SUBTYPE |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12841234 Country of ref document: EP Kind code of ref document: A2 |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 12841234 Country of ref document: EP Kind code of ref document: A2 |