WO2013047916A1 - Camera - Google Patents

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Publication number
WO2013047916A1
WO2013047916A1 PCT/KR2011/007065 KR2011007065W WO2013047916A1 WO 2013047916 A1 WO2013047916 A1 WO 2013047916A1 KR 2011007065 W KR2011007065 W KR 2011007065W WO 2013047916 A1 WO2013047916 A1 WO 2013047916A1
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WO
WIPO (PCT)
Prior art keywords
lenticular
film
light source
light
photosensitive agent
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PCT/KR2011/007065
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French (fr)
Korean (ko)
Inventor
성낙훈
김정식
Original Assignee
(주)엔엔피
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Priority to PCT/KR2011/007065 priority Critical patent/WO2013047916A1/en
Publication of WO2013047916A1 publication Critical patent/WO2013047916A1/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Definitions

  • the present invention relates to a lenticular exposure apparatus for constructing a semiconductor circuit or a microcircuit. More particularly, the present invention relates to a photographing apparatus capable of clear exposure of a photosensitive agent by using a condenser function of lenticular.
  • an exposure apparatus is a device that transfers a desired pattern to a photosensitive agent by placing a film having a desired pattern on a substrate, a wafer, a glass, or the like coated with a material that reacts to light (Photo-resist: PR).
  • the conventional exposure machine includes a light source, a flat plate coated with a photosensitive agent and disposed to face the light source, and a film in close contact with an upper surface of the flat plate and composed of a transparent portion and an opaque portion.
  • the transparent part transmits the light and the opaque part blocks the light. Therefore, when the light is exposed through the light source, only the photosensitive agent in the portion where light is transmitted through the transparent portion of the film in the photosensitive agent applied to the flat plate is cured.
  • the uncured portion of the photosensitive agent is removed with water or a developer to form a circuit pattern on the flat plate.
  • Such a conventional exposure machine is often unclear or impossible in the exposure state of the photosensitive agent even if a parallel light exposure machine is used when the thickness of the photosensitive agent applied to the plate becomes thick (for example, 50 microns or more).
  • the present invention has been made to solve the above problems, by using the lenticular condensing function of the exposure machine, even if the thickness of the photosensitive agent is several tens of microns to hundreds of microns, it is possible to clean exposure, the pitch of the circuit 10 ⁇ 20 microns Even if it is, the objective is to provide the lenticular exposure machine which is clean, and does not have a defect, and is possible to comprise a clear circuit.
  • the present invention for achieving the above object, a light source; A film to which light of the light source is irradiated; An exposure apparatus including a flat plate coated with a photosensitive agent that receives light irradiated through the film, characterized in that the lenticular is configured to be in close contact with the film.
  • the lenticular, the film, and the plate coated with the photosensitive agent is characterized in that the pressing means is in close contact.
  • the pressing means is characterized by using a vacuum pressure.
  • the light source is characterized in that the movement in the horizontal direction.
  • the lenticular is characterized by changing the angle of the inclined surface corresponding to the transfer of the light source.
  • the lenticular is in close contact with the film is characterized in that the transfer movement in the horizontal direction relative to the film.
  • the lenticular exposure apparatus uses the light condensing function of the lenticular to the exposure machine, so that even if the thickness of the photosensitive agent is several tens of microns to several hundred microns, clean exposure is possible, even if the circuit pitch is 10 to 20 microns. Clean exposure makes no defects and is clear, making it possible to construct a clean circuit.
  • FIG. 1 is a view showing the structure of a lenticular exposure apparatus according to an embodiment of the present invention
  • FIG. 2 is a perspective view illustrating a lenticular of a lenticular exposure apparatus according to an exemplary embodiment of the present invention.
  • FIG. 3 is a view showing a state in which light passes through the lenticular to expose the photosensitive agent when the light source is stopped.
  • FIG. 4 is a view illustrating a state in which light passes through the lenticular to expose a photosensitive agent when the light source is moved;
  • FIG. 5 is a view showing an operating state of the lenticular exposure apparatus according to an embodiment of the present invention.
  • FIG. 1 is a view showing the structure of a lenticular exposure apparatus according to an embodiment of the present invention
  • Figure 2 is a perspective view showing a lenticular of the lenticular exposure apparatus according to an embodiment of the present invention.
  • the lenticular exposure apparatus has a case 10, a light source 20 provided on an upper portion of the case 10, and left and right sides of the light source 20.
  • a conveying means 30 for conveying in the direction, a flat plate 40 which is disposed to face the light source 20, on which the photosensitive agent 41 is applied, a film 50 in close contact with the upper surface of the flat plate 40, and a film.
  • the lenticular 60 in close contact with the upper surface of the 50, the pressing means 70 for pressing the film 50 and the lenticular 60 laminated on the flat plate 40 to be in close contact with each other, and the flat plate 40 It supports and includes an angle conversion unit 80 for changing the inclination angle of the lenticular 60.
  • the case 10 constitutes an exterior of the lenticular exposure machine, and includes a light source 20, a transfer means 30, a flat plate 40, a film 50, a lenticular 60, a press means 70, and an angle conversion unit. Wrap 80.
  • the light source 20 is positioned above the flat plate 40 to irradiate light to the film 50 and the lenticular 60 stacked on the flat plate 40.
  • the light source 20 is moved by the conveying means 30 in the left and right direction and is irradiated with light evenly to the film 50 and the lenticular 60.
  • the transfer means 30 is a means for transferring the light source 20 to the left and right directions, is provided on the upper portion of the case 10 and supports the light source 20 so as to be movable, and the light source is a rail unit ( It consists of a drive unit 33 for conveying along.
  • the driving unit 33 is built in the light source 20 or attached to the outside, and consists of a drive motor having a drive gear.
  • a rail gear may be formed in the rail part 31 to which the driving gear is engaged. Therefore, the drive gear meshed with the rail gear of the rail by the operation of the drive motor can be rotated to move the light source along the length direction of the rail.
  • the flat plate 40 is a substrate on which a circuit pattern is formed, and a photosensitive agent 41 is coated on the upper surface for an exposure process for generating a circuit pattern.
  • the flat plate 40 is disposed under the light source 20 so that light is irradiated onto the upper surface on which the photosensitive agent 41 is applied.
  • the film 50 is in close contact with the upper surface of the flat plate 40 to which the photosensitive agent 41 is applied.
  • the film 50 includes a transparent part 51 and an opaque part 53. That is, when light is irradiated from the light source 20 to the film 50, the transparent part 51 transmits the light and the opaque part 53 blocks the light. Therefore, when the exposure is performed through the light source 20, only the photosensitive agent 41 in the portion where light is transmitted through the transparent portion 51 of the film 50 is cured. After the exposure operation, an unexposed portion of the photosensitive agent 41, that is, an uncured portion, is removed with water or a developer to form a circuit pattern on the flat plate 40.
  • the lenticular 60 is a transparent plate having a plurality of convex lenses 61 formed in one direction on a surface thereof and is in close contact with the upper surface of the film 50.
  • the lenticular 60 allows the photosensitive agent 41 applied to the flat plate 40 to be exposed cleanly. That is, when the exposure is made through the light source 20 transferred in the horizontal direction by the transfer means 30, the photosensitive agent 41 is condensed evenly by the convex lens 61 of the lenticular 60, the photosensitive agent 41 Can be exposed cleanly.
  • FIG. 3 is a view illustrating a state in which light passes through the lenticular to expose the photosensitive agent when the light source is stopped
  • FIG. 4 illustrates a state in which light passes through the lenticular to expose the photosensitive agent.
  • the convex lens is formed by the convex lens 61 formed on the lenticular 60.
  • the focus area of 61 consists of the exposure area 43.
  • the degree to which the photosensitive agent 41 is focused can be adjusted according to the change of the thickness a between the convex lens 61 and the photosensitive agent 41 of the lenticular 60.
  • the degree to which the photosensitive agent 41 is focused can be adjusted.
  • a plurality of lenticulars 60 having different thicknesses a may be provided and selectively used to adjust the degree of concentration of light on the photosensitive agent 41.
  • the pressing means 70 serves to closely contact the lenticular 60, the film 50, and the flat plate 40 to which the photosensitive agent 41 is applied.
  • the pressing means 70 is formed so as to cover the film 50 and the lenticular 60 laminated on the flat plate 40, the portion facing the upper surface of the lenticular 60 is formed of a transparent glass 71 It is. Therefore, the light irradiated from the light source 20 passes through the transparent glass 71 and is irradiated to the lenticular 60.
  • the shape of the jar bar portion 73 is formed on the edge of the pressing means 70, the air discharge hole 75 for discharging the air inside the pressing means 70 is formed at one side of the pressing means 70. It is.
  • the pressurizing means 70 covers and presses the upper portion of the film 50 and the lenticular 60 laminated on the flat plate 40, thereby the lenticular 60, the film 50, and the photosensitive agent 41. ) Can be applied to the flat plate 40 is in close contact with each other, and after the air is drawn out through the air discharge hole 75 to close the air discharge hole 75 to maintain the interior of the pressurizing means 70 in a vacuum state. Can be.
  • the pressing means 70 may be fixed to the support plate 81 for supporting the flat plate 40 using a vacuum pressure.
  • the pressing means 70 can be fixed to the support plate 81 for supporting the flat plate 40 using an attachment means such as a tape.
  • the angle conversion unit 80 supports the plate 40 and serves to change the inclination angle of the lenticular 60.
  • the angle conversion unit 80 is provided with a pair of support plates 81 for supporting the flat plate 40 and a pair of both sides of the support plate 81, respectively, and cylinder portions 83 and 89 for changing the inclination angle of the support plate 81. Consists of
  • the cylinders 83 and 89 are lifted by the pneumatic or hydraulic pressure from the cylinder body (85,91) and the cylinder body (85,91) supported on the bottom of the case 10, and both sides of the support plate 81 It consists of cylinder rods 87 and 93 respectively supporting.
  • the light irradiated through the light source 20 transferred by the transfer means 30 passes through the lenticular 60 and the film 50 to allow the photosensitive agent 41 to pass through.
  • the light transmitted through the convex lens 61 of the lenticular 60 is condensed evenly on the photosensitive agent 41, so that the photosensitive agent 41 can be exposed to be clean, and between the convex lens 61 and the convex lens 61. Evenly exposed exposure is made to the boundary portion 63 of.
  • the support plate 81 may be provided with an auxiliary transfer means 100 for transferring the lenticular 60.
  • the auxiliary transfer means 100 serves to transfer the lenticular 60 in close contact with the film 50 in the left and right directions with respect to the film 50.
  • the auxiliary transport means 100 may be formed of a motor or a cylinder, and the lenticular 60 is pulled or pushed with respect to the film 50 to move from side to side.
  • the auxiliary transport means 100 has the same role as the transport means 30 for transporting the light source 20, the user selectively operates the transport means 30 or the auxiliary transport means 100 to the photosensitive agent 41 The exposure is performed.
  • FIG. 5 is a view showing an operating state of the lenticular exposure apparatus according to an embodiment of the present invention.
  • the cylinder rod 87 of the left cylinder part 83 descends, the cylinder rod 93 of the right cylinder part 89 rises, and the support plate ( 81 is inclined to the left side, the flat plate 40, the film 50, the lenticular 60 provided on the support plate 81 is inclined to the left.
  • the pressing means 70 is fixed to the support plate 81 while pressing the flat plate 40, the film 50, and the lenticular 60, the flat plate 40, the film 50, the lenticular 60 To the support plate 81.
  • the rod 93 has the same length and supports the support plate 81. That is, the support plate 81 is supported to be parallel to the bottom surface of the case 10.
  • the light irradiated by the moving light source 20 passes through the lenticular 60 whose tilt angle is changed by the pair of cylinders 83 and 89, thereby providing the lenticular 60.
  • the light transmitted through the convex lens 61 (see FIG. 1) of the light is condensed evenly by the photosensitive agent 41, so that the photosensitive agent 41 can be exposed to a clear state.
  • the convex lens 61 (see FIG. 1) and the convex lens 61 Evenly exposed exposure is also made at the boundary portion 63 (see FIG. 1).
  • the lenticular exposure apparatus uses the light condensing function of the lenticular to the exposure machine, so that even if the thickness of the photosensitive agent is several tens of microns to several hundred microns, clean exposure is possible, even if the circuit pitch is 10 to 20 microns. Clean exposure makes no defects and is clear, making it possible to construct a clean circuit.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Stereoscopic And Panoramic Photography (AREA)

Abstract

The present invention relates to lenticular lithography equipment which comprises: a light source; a film irradiated with light emitted from the light source; a plate which receives the irradiated light through the film and on which a photoresist is applied; and a lenticular lens closely adhered to the film. Accordingly, by using a light-collecting function of the lenticular lens in the lithography equipment, clear exposure is possible even though the thickness of the photoresist is tens of microns to hundreds of microns. In addition, a clear and distinct configuration of a circuit is possible without any defects, even though the pitch of the circuit is 10 microns to 20 microns.

Description

촬영기Camera
본 발명은 반도체 회로 또는 미세회로를 구성하기 위한 렌티큘라 노광기에 관한 것으로서, 더욱 상세하게는 렌티큘라의 집광기능을 노광기에 사용함으로써 감광제의 깨끗한 노광이 가능한 촬영기에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lenticular exposure apparatus for constructing a semiconductor circuit or a microcircuit. More particularly, the present invention relates to a photographing apparatus capable of clear exposure of a photosensitive agent by using a condenser function of lenticular.
일반적으로 노광기는 빛에 반응하는 물질(Photo-resist :PR, 감광제)이 도포된 기판, 웨이퍼, 유리 등의 위에 원하는 패턴이 형성된 필름을 올려놓고 자외선을 쬐어주어 감광제에 원하는 패턴을 전사시키는 장치를 말한다.In general, an exposure apparatus is a device that transfers a desired pattern to a photosensitive agent by placing a film having a desired pattern on a substrate, a wafer, a glass, or the like coated with a material that reacts to light (Photo-resist: PR). Say.
종래의 노광기는 광원과, 감광제가 도포되어 있으며 광원에 대향하게 배치되는 평판과, 평판의 상면에 밀착되며 투명부와 불투명부로 이루어진 필름을 포함한다.The conventional exposure machine includes a light source, a flat plate coated with a photosensitive agent and disposed to face the light source, and a film in close contact with an upper surface of the flat plate and composed of a transparent portion and an opaque portion.
즉, 광원으로부터 필름으로 빛이 조사되면 투명부는 빛이 투과되고 불투명부는 빛을 차단하게 된다. 따라서, 광원을 통하여 노광을 시키게 되면 평판에 도포된 감광제에서 필름의 투명부를 통하여 빛이 투과된 부분의 감광제만 경화되어진다.That is, when light is irradiated from the light source to the film, the transparent part transmits the light and the opaque part blocks the light. Therefore, when the light is exposed through the light source, only the photosensitive agent in the portion where light is transmitted through the transparent portion of the film in the photosensitive agent applied to the flat plate is cured.
이러한 노광기를 이용하여 노광작업 후에는 감광제의 경화되지 않은 부분을 물 또는 현상액으로 제거하여 평판에 회로패턴을 형성한다.After the exposure operation using such an exposure machine, the uncured portion of the photosensitive agent is removed with water or a developer to form a circuit pattern on the flat plate.
이러한 종래의 노광기는 평판에 도포되어진 감광제의 두께가 두꺼워지면(예: 50 마이크론 이상) 평행광 노광기를 사용한다 할지라도 감광제의 노광 상태가 깨끗하지 못하거나 불가능한 경우가 많다.Such a conventional exposure machine is often unclear or impossible in the exposure state of the photosensitive agent even if a parallel light exposure machine is used when the thickness of the photosensitive agent applied to the plate becomes thick (for example, 50 microns or more).
또한, 회로의 피치가 10 ~ 20 마이크론의 경우에는 높은 불량률을 야기하였다.In addition, when the pitch of the circuit is 10 to 20 microns, it caused a high failure rate.
본 발명은 상기와 같은 문제점을 해결하기 위해 안출된 것으로서, 렌티큘라의 집광기능을 노광기에 사용함으로써 감광제의 두께가 수십마이크론에서 수백마이크론이 되더라도 깨끗한 노광이 가능하며, 회로의 피치가 10 ~ 20 마이크론 일지라도 깨끗한 노광으로 불량이 없고 선명하여 깨끗한 회로의 구성이 가능한 렌티큘라 노광기를 제공하는데 그 목적이 있다.The present invention has been made to solve the above problems, by using the lenticular condensing function of the exposure machine, even if the thickness of the photosensitive agent is several tens of microns to hundreds of microns, it is possible to clean exposure, the pitch of the circuit 10 ~ 20 microns Even if it is, the objective is to provide the lenticular exposure machine which is clean, and does not have a defect, and is possible to comprise a clear circuit.
상기와 같은 목적을 달성하기 위한 본 발명은, 광원과; 상기 광원의 빛이 조사되어지는 필름과; 상기 필름을 통하여 조사되어진 빛을 받는 감광제가 도포된 평판을 포함하는 노광기에 있어서, 렌티큘라가 상기 필름에 밀착되도록 구성되는 것을 특징으로 한다.The present invention for achieving the above object, a light source; A film to which light of the light source is irradiated; An exposure apparatus including a flat plate coated with a photosensitive agent that receives light irradiated through the film, characterized in that the lenticular is configured to be in close contact with the film.
또한, 상기 렌티큘라와, 상기 필름과, 상기 감광제가 도포된 평판이 가압수단에 의하여 밀착되는 것을 특징으로 한다.In addition, the lenticular, the film, and the plate coated with the photosensitive agent is characterized in that the pressing means is in close contact.
또한, 상기 가압수단이 진공압을 이용하는 것을 특징으로 한다.In addition, the pressing means is characterized by using a vacuum pressure.
또한, 상기 광원은 좌우방향으로 이송운동을 하는 것을 특징으로 한다. In addition, the light source is characterized in that the movement in the horizontal direction.
또한, 상기 광원의 이송에 대응하여 상기 렌티큘라는 경사면의 각도를 변화시키는 것을 특징으로 한다.In addition, the lenticular is characterized by changing the angle of the inclined surface corresponding to the transfer of the light source.
또 다른 실시 예로서, 상기 필름에 밀착되어진 상기 렌티큘라가 상기 필름에 대하여 좌우방향으로 이송운동을 하는 것을 특징으로 한다.As another embodiment, the lenticular is in close contact with the film is characterized in that the transfer movement in the horizontal direction relative to the film.
이상에서 설명한 바와 같이, 본 발명에 따른 렌티큘라 노광기는 렌티큘라의 집광기능을 노광기에 사용함으로써 감광제의 두께가 수십마이크론에서 수백마이크론이 되더라도 깨끗한 노광이 가능하며, 회로의 피치가 10 ~ 20 마이크론 일지라도 깨끗한 노광으로 불량이 없고 선명하여 깨끗한 회로의 구성이 가능하다.As described above, the lenticular exposure apparatus according to the present invention uses the light condensing function of the lenticular to the exposure machine, so that even if the thickness of the photosensitive agent is several tens of microns to several hundred microns, clean exposure is possible, even if the circuit pitch is 10 to 20 microns. Clean exposure makes no defects and is clear, making it possible to construct a clean circuit.
도 1은 본 발명의 일 실시 예에 따른 렌티큘라 노광기의 구조를 보여주는 도면1 is a view showing the structure of a lenticular exposure apparatus according to an embodiment of the present invention
도 2는 본 발명의 일 실시 예에 따른 렌티큘라 노광기의 렌티큘라를 보여주는 사시도2 is a perspective view illustrating a lenticular of a lenticular exposure apparatus according to an exemplary embodiment of the present invention.
도 3은 광원의 정지시 빛이 렌티큘라를 통과하여 감광제를 노광하는 상태를 보여주는 도면 3 is a view showing a state in which light passes through the lenticular to expose the photosensitive agent when the light source is stopped.
도 4는 광원의 이동시 빛이 렌티큘라를 통과하여 감광제를 노광하는 상태를 보여주는 도면4 is a view illustrating a state in which light passes through the lenticular to expose a photosensitive agent when the light source is moved;
도 5는 본 발명의 일 실시 예에 따른 렌티큘라 노광기의 작동상태를 보여주는 도면5 is a view showing an operating state of the lenticular exposure apparatus according to an embodiment of the present invention;
*부호의 설명** Description of the sign *
10: 케이스 20: 광원10: case 20: light source
30: 이송수단 31: 레일부30: transfer means 31: rail portion
33: 구동부 40: 평판33: drive portion 40: flat plate
41: 감광제 50: 필름41: photosensitive agent 50: film
51: 투명부 53: 불투명부51: transparent part 53: opaque part
60: 렌티큘라 61: 볼록렌즈60: lenticular 61: convex lens
63: 경계부 70: 가압수단63: boundary 70: pressing means
71: 투명유리 73: 자바라부71: clear glass 73: bellows
75: 공기 배출공 80: 각도변환부75: air outlet hole 80: angle conversion unit
81: 지지판 83,89: 실린더부81: support plate 83,89: cylinder portion
91,85: 실린더몸체 87,93: 실린더로드91,85: cylinder body 87,93: cylinder rod
100: 보조 이송수단100: auxiliary transport means
이하, 본 발명의 실시예에 대하여 상세히 설명하지만, 본 발명은 그 요지를 이탈하지 않는 한 이하의 실시예에 한정되지 않는다.EMBODIMENT OF THE INVENTION Hereinafter, although the Example of this invention is described in detail, this invention is not limited to a following example, unless the summary is exceeded.
도 1은 본 발명의 일 실시 예에 따른 렌티큘라 노광기의 구조를 보여주는 도면이고, 도 2는 본 발명의 일 실시 예에 따른 렌티큘라 노광기의 렌티큘라를 보여주는 사시도이다. 1 is a view showing the structure of a lenticular exposure apparatus according to an embodiment of the present invention, Figure 2 is a perspective view showing a lenticular of the lenticular exposure apparatus according to an embodiment of the present invention.
도 1 및 도 2에 도시된 바와 같이, 본 발명의 일 실시 예에 따른 렌티큘라 노광기는 케이스(10)와, 케이스(10)의 상부에 마련되는 광원(20)과, 광원(20)을 좌우방향으로 이송시키는 이송수단(30)과, 광원(20)에 대향하게 배치되며 감광제(41)가 도포되어 있는 평판(40)과, 평판(40)의 상면에 밀착되는 필름(50)과, 필름(50)의 상면에 밀착되는 렌티큘라(60)와, 평판(40)에 적층된 필름(50) 및 렌티큘라(60)를 가압하여 상호 밀착시키는 가압수단(70)과, 평판(40)을 지지하며 렌티큘라(60)의 경사각도를 변화시키는 각도변환부(80)를 포함한다.As shown in FIGS. 1 and 2, the lenticular exposure apparatus according to an embodiment of the present invention has a case 10, a light source 20 provided on an upper portion of the case 10, and left and right sides of the light source 20. A conveying means 30 for conveying in the direction, a flat plate 40 which is disposed to face the light source 20, on which the photosensitive agent 41 is applied, a film 50 in close contact with the upper surface of the flat plate 40, and a film. The lenticular 60 in close contact with the upper surface of the 50, the pressing means 70 for pressing the film 50 and the lenticular 60 laminated on the flat plate 40 to be in close contact with each other, and the flat plate 40 It supports and includes an angle conversion unit 80 for changing the inclination angle of the lenticular 60.
케이스(10)는 렌티큘라 노광기의 외관을 구성하며, 광원(20), 이송수단(30), 평판(40), 필름(50), 렌티큘라(60), 가압수단(70) 및 각도변환부(80)를 감싸고 있다.The case 10 constitutes an exterior of the lenticular exposure machine, and includes a light source 20, a transfer means 30, a flat plate 40, a film 50, a lenticular 60, a press means 70, and an angle conversion unit. Wrap 80.
광원(20)은 평판(40)의 상부에 위치하여 평판(40)에 적층된 필름(50) 및 렌티큘라(60)에 빛을 조사한다. 이러한 광원(20)은 이송수단(30)에 의해 좌우방향으로 이송운동을 하며 필름(50) 및 렌티큘라(60)에 고루 빛을 조사하게 된다.The light source 20 is positioned above the flat plate 40 to irradiate light to the film 50 and the lenticular 60 stacked on the flat plate 40. The light source 20 is moved by the conveying means 30 in the left and right direction and is irradiated with light evenly to the film 50 and the lenticular 60.
이송수단(30)은 광원(20)을 좌우방향으로 이송시키는 수단으로서, 케이스(10)의 상부에 마련되며 광원(20)을 이동가능하게 지지하는 레일부(31)와, 광원을 레일부(31)를 따라 이송시키는 구동부(33)로 이루어져 있다.The transfer means 30 is a means for transferring the light source 20 to the left and right directions, is provided on the upper portion of the case 10 and supports the light source 20 so as to be movable, and the light source is a rail unit ( It consists of a drive unit 33 for conveying along.
여기서, 구동부(33)는 광원(20)에 내장되거나 외측에 부착되어 있으며, 구동기어를 갖는 구동모터로 이루어져 있다. 또한, 레일부(31)에는 구동기어가 맞물리는 렉기어가 형성될 수 있다. 따라서, 구동모터의 작동에 의해 레일부의 렉기어에 맞물린 구동기어가 회전하여 광원을 레일부의 길이방향을 따라 이동시킬 수 있다.Here, the driving unit 33 is built in the light source 20 or attached to the outside, and consists of a drive motor having a drive gear. In addition, a rail gear may be formed in the rail part 31 to which the driving gear is engaged. Therefore, the drive gear meshed with the rail gear of the rail by the operation of the drive motor can be rotated to move the light source along the length direction of the rail.
평판(40)은 회로 패턴이 형성되는 기판으로서, 회로 패턴을 생성하기 위한 노광공정을 위해 상면에 감광제(41)가 도포되어 있다. 이러한 평판(40)은 감광제(41)가 도포되어진 상면에 빛이 조사되도록 광원(20)의 하부에 배치된다.The flat plate 40 is a substrate on which a circuit pattern is formed, and a photosensitive agent 41 is coated on the upper surface for an exposure process for generating a circuit pattern. The flat plate 40 is disposed under the light source 20 so that light is irradiated onto the upper surface on which the photosensitive agent 41 is applied.
필름(50)은 감광제(41)가 도포된 평판(40)의 상면에 밀착된다. 상기 필름(50)은 투명부(51)와 불투명부(53)로 이루어져 있다. 즉, 광원(20)으로부터 필름(50)으로 빛이 조사되면 투명부(51)는 빛이 투과되고 불투명부(53)는 빛을 차단하게 된다. 따라서, 광원(20)을 통하여 노광을 시키게 되면 필름(50)의 투명부(51)를 통하여 빛이 투과된 부분의 감광제(41)만 경화되어진다. 노광작업 후에는 감광제(41)의 노광되지 않은 부분 즉, 경화되지 않은 부분을 물 또는 현상액으로 제거하여 평판(40)에 회로 패턴을 형성한다.The film 50 is in close contact with the upper surface of the flat plate 40 to which the photosensitive agent 41 is applied. The film 50 includes a transparent part 51 and an opaque part 53. That is, when light is irradiated from the light source 20 to the film 50, the transparent part 51 transmits the light and the opaque part 53 blocks the light. Therefore, when the exposure is performed through the light source 20, only the photosensitive agent 41 in the portion where light is transmitted through the transparent portion 51 of the film 50 is cured. After the exposure operation, an unexposed portion of the photosensitive agent 41, that is, an uncured portion, is removed with water or a developer to form a circuit pattern on the flat plate 40.
렌티큘라(60)는 표면에 일방향으로 형성된 볼록렌즈(61)가 복수로 구성되어있는 투명판으로서, 필름(50)의 상면에 밀착된다. The lenticular 60 is a transparent plate having a plurality of convex lenses 61 formed in one direction on a surface thereof and is in close contact with the upper surface of the film 50.
상기 렌티큘라(60)는 평판(40)에 도포된 감광제(41)가 깨끗하게 노광될 수 있도록 한다. 즉, 이송수단(30)에 의해 좌우방향으로 이송되는 광원(20)을 통하여 노광을 시키게 되면, 렌티큘라(60)의 볼록렌즈(61)에 의해 감광제(41)가 고루 집광됨으로써 감광제(41)가 깨끗하게 노광될 수 있다.The lenticular 60 allows the photosensitive agent 41 applied to the flat plate 40 to be exposed cleanly. That is, when the exposure is made through the light source 20 transferred in the horizontal direction by the transfer means 30, the photosensitive agent 41 is condensed evenly by the convex lens 61 of the lenticular 60, the photosensitive agent 41 Can be exposed cleanly.
본 발명에 적용되는 렌티큘라의 작용을 설명하면 다음과 같다.Referring to the operation of the lenticular applied to the present invention.
도 3은 광원의 정지시 빛이 렌티큘라를 통과하여 감광제를 노광하는 상태를 보여주는 도면이고, 도 4는 광원의 이동시 빛이 렌티큘라를 통과하여 감광제를 노광하는 상태를 보여주는 도면이다.3 is a view illustrating a state in which light passes through the lenticular to expose the photosensitive agent when the light source is stopped, and FIG. 4 illustrates a state in which light passes through the lenticular to expose the photosensitive agent.
도 3에 도시된 바와 같이, 광원(20)과 렌트큘라(60)가 정지된 상태에서 광원(20)을 통하여 노광을 시키게 되면, 렌티큘라(60)에 형성된 볼록렌즈(61)에 의해 볼록렌즈(61)의 초점 영역이 노광 영역(43)으로 이루어진다.As shown in FIG. 3, when exposure is made through the light source 20 while the light source 20 and the lenticular 60 are stopped, the convex lens is formed by the convex lens 61 formed on the lenticular 60. The focus area of 61 consists of the exposure area 43.
이때, 감광제(41)에 집광되어지는 정도는 렌트큘라(60)의 볼록렌즈(61)와 감광제(41) 사이의 두께(a) 변화에 따라 조절가능하다. At this time, the degree to which the photosensitive agent 41 is focused can be adjusted according to the change of the thickness a between the convex lens 61 and the photosensitive agent 41 of the lenticular 60.
즉, 두께(a)가 상호 다른 렌티큘라(60)를 복수로 마련하여 선택적으로 사용함으로써 감광제(41)에 집광되어지는 정도를 조절할 수 있다.That is, by providing a plurality of lenticular 60 having different thicknesses a and selectively using the plurality of lenticulars 60, the degree to which the photosensitive agent 41 is focused can be adjusted.
도 4에 도시된 바와 같이, 렌티큘라(60)의 상부에서 광원(20)이 좌측에서 우측으로 이동하게 되면, 광원(20)이 이동함에 따라 감광제(41)에 고루 노광이 이루어 지게 된다. 즉, 광원(20)이 이동함에 따라 렌티큘라(60)의 각 볼록렌즈(61)의 초점 영역이 변화되어 감광제(41)에 고루 노광이 이루어 지게 되는 것이다.As shown in FIG. 4, when the light source 20 moves from the left side to the right side of the lenticular 60, the exposure of the photosensitive agent 41 is uniformly performed as the light source 20 moves. That is, as the light source 20 moves, the focal region of each convex lens 61 of the lenticular 60 is changed to evenly expose the photosensitive agent 41.
이때도, 두께(a)가 상호 다른 렌티큘라(60)를 복수로 마련하여 선택적으로 사용함으로써 감광제(41)에 집광되어지는 정도를 조절할 수 있다.In this case, a plurality of lenticulars 60 having different thicknesses a may be provided and selectively used to adjust the degree of concentration of light on the photosensitive agent 41.
한편, 가압수단(70)은 렌티큘라(60)와, 필름(50)과, 감광제(41)가 도포된 평판(40)을 상호 밀착시키는 역할을 한다. 이러한 가압수단(70)은 평판(40)에 적층된 필름(50) 및 렌티큘라(60)를 덮을 수 있도록 형성되며, 렌티큘라(60)의 상면과 대향하는 부분이 투명유리(71)로 형성되어 있다. 따라서, 광원(20)으로부터 조사되는 빛은 투명유리(71)를 투과하여 렌티큘라(60)로 조사된다.On the other hand, the pressing means 70 serves to closely contact the lenticular 60, the film 50, and the flat plate 40 to which the photosensitive agent 41 is applied. The pressing means 70 is formed so as to cover the film 50 and the lenticular 60 laminated on the flat plate 40, the portion facing the upper surface of the lenticular 60 is formed of a transparent glass 71 It is. Therefore, the light irradiated from the light source 20 passes through the transparent glass 71 and is irradiated to the lenticular 60.
더욱이, 가압수단(70)의 가장자리에는 형상변형되는 자라바부(73)가 마련되어 있으며, 가압수단(70)의 일측에는 가압수단(70)의 내부의 공기를 배출시키는 공기 배출공(75)이 형성되어 있다.Furthermore, the shape of the jar bar portion 73 is formed on the edge of the pressing means 70, the air discharge hole 75 for discharging the air inside the pressing means 70 is formed at one side of the pressing means 70. It is.
이러한 구성으로, 가압수단(70)은 평판(40)에 적층된 필름(50) 및 렌티큘라(60)의 상부를 덮고 가압함으로써, 렌티큘라(60)와, 필름(50)과, 감광제(41)가 도포된 평판(40)을 상호 밀착시킬 수 있으며, 공기 배출공(75)을 통해 공기를 뽑아낸 후 공기 배출공(75)을 폐쇄하여 가압수단(70)의 내부를 진공상태로 유지시킬 수 있다. In such a configuration, the pressurizing means 70 covers and presses the upper portion of the film 50 and the lenticular 60 laminated on the flat plate 40, thereby the lenticular 60, the film 50, and the photosensitive agent 41. ) Can be applied to the flat plate 40 is in close contact with each other, and after the air is drawn out through the air discharge hole 75 to close the air discharge hole 75 to maintain the interior of the pressurizing means 70 in a vacuum state. Can be.
이때, 가압수단(70)은 진공압을 이용하여 평판(40)을 지지하는 지지판(81)에 고정할 수 있다. At this time, the pressing means 70 may be fixed to the support plate 81 for supporting the flat plate 40 using a vacuum pressure.
또한, 가압수단(70)은 테이프 등의 부착수단을 이용하여 평판(40)을 지지하는 지지판(81)에 고정할 수 있다.In addition, the pressing means 70 can be fixed to the support plate 81 for supporting the flat plate 40 using an attachment means such as a tape.
각도 변환부(80)는 평판(40)을 지지하며 렌티큘라(60)의 경사각도를 변화시키는 역할을 한다. The angle conversion unit 80 supports the plate 40 and serves to change the inclination angle of the lenticular 60.
상기 각도 변환부(80)는 평판(40)을 지지하는 지지판(81)과, 지지판(81)의 양측부에 각각 한 쌍씩 마련되어 지지판(81)의 경사각도를 변화시키는 실린더부(83,89)로 이루어져 있다.The angle conversion unit 80 is provided with a pair of support plates 81 for supporting the flat plate 40 and a pair of both sides of the support plate 81, respectively, and cylinder portions 83 and 89 for changing the inclination angle of the support plate 81. Consists of
여기서, 실린더부(83,89)는 케이스(10)의 바닥에 지지되는 실린더몸체(85,91)와, 실린더몸체(85,91)로부터 공기압 또는 유압에 의해 승강하며 지지판(81)의 양측부를 각각 지지하는 실린더로드(87,93)로 이루어져 있다.Here, the cylinders 83 and 89 are lifted by the pneumatic or hydraulic pressure from the cylinder body (85,91) and the cylinder body (85,91) supported on the bottom of the case 10, and both sides of the support plate 81 It consists of cylinder rods 87 and 93 respectively supporting.
이러한 구성으로, 좌측 실린더부(83)의 실린더로드(87)가 하강하고 우측 실린더부(89)의 실린더로드(93)가 상승하면, 지지판(81)이 좌측방향으로 기울어지고, 반대로 좌측 실린더부(83)의 실린더로드(87)가 상승하고 우측 실린더부(89)의 실린더로드(93)가 하강하면, 지지판(81)이 우측방향으로 기울어게 된다. 따라서 지지판(81)의 기울어짐에 따라 렌티큘라(60)의 경사각도가 변화하게 되는 것이다.With this configuration, when the cylinder rod 87 of the left cylinder portion 83 is lowered and the cylinder rod 93 of the right cylinder portion 89 is raised, the support plate 81 is inclined in the left direction, and conversely, the left cylinder portion is When the cylinder rod 87 of 83 rises and the cylinder rod 93 of the right cylinder part 89 descends, the support plate 81 inclines to the right direction. Therefore, the inclination angle of the lenticular 60 is changed as the support plate 81 is inclined.
이와 같이, 렌티큘라(60)의 경사각도를 변화시키게 되면 이송수단(30)에 의해 이송되는 광원(20)을 통해 조사되는 빛이 렌티큘라(60) 및 필름(50)을 투과하여 감광제(41)에 고루 노광될 수 있다. 즉, 렌티큘라(60)의 볼록렌즈(61)를 투과한 빛이 감광제(41)에 고루 집광됨으로써 감광제(41)가 깨끗하게 노광될 수 있으며, 더불어 볼록렌즈(61)와 볼록렌즈(61) 사이의 경계부(63)에도 고른 노광이 확실하게 이루어지게 된다.As such, when the inclination angle of the lenticular 60 is changed, the light irradiated through the light source 20 transferred by the transfer means 30 passes through the lenticular 60 and the film 50 to allow the photosensitive agent 41 to pass through. ) Evenly. That is, the light transmitted through the convex lens 61 of the lenticular 60 is condensed evenly on the photosensitive agent 41, so that the photosensitive agent 41 can be exposed to be clean, and between the convex lens 61 and the convex lens 61. Evenly exposed exposure is made to the boundary portion 63 of.
한편, 지지판(81)에는 렌티큘라(60)를 이송시키는 보조 이송수단(100)이 마련될 수 있다. 보조 이송수단(100)은 필름(50)에 밀착되어진 렌티큘라(60)를 필름(50)에 대하여 좌우방향으로 이송시키는 역할을 한다.On the other hand, the support plate 81 may be provided with an auxiliary transfer means 100 for transferring the lenticular 60. The auxiliary transfer means 100 serves to transfer the lenticular 60 in close contact with the film 50 in the left and right directions with respect to the film 50.
즉, 보조 이송수단(100)은 모터 또는 실린더로 이루어질 수 있으며, 렌티귤라(60)를 필름(50)에 대하여 잡아당기거나 밀어 좌우로 이송시키게 된다.That is, the auxiliary transport means 100 may be formed of a motor or a cylinder, and the lenticular 60 is pulled or pushed with respect to the film 50 to move from side to side.
이러한 보조 이송수단(100)은 광원(20)을 이송시키는 이송수단(30)과 동일한 역할을 하며, 사용자가 선택적으로 이송수단(30) 또는 보조 이송수단(100)을 작동시켜 감광제(41)에 노광을 하게 된다.The auxiliary transport means 100 has the same role as the transport means 30 for transporting the light source 20, the user selectively operates the transport means 30 or the auxiliary transport means 100 to the photosensitive agent 41 The exposure is performed.
다음에는 상기와 같이 구성된 본 발명의 일 실시 예에 따른 렌티큘라 노광기의 작동상태에 대해 설명한다.Next, an operating state of the lenticular exposure apparatus according to an exemplary embodiment of the present invention configured as described above will be described.
도 5는 본 발명의 일 실시 예에 따른 렌티큘라 노광기의 작동상태를 보여주는 도면이다.5 is a view showing an operating state of the lenticular exposure apparatus according to an embodiment of the present invention.
광원(20)이 레일부(31)의 우측에 위치한 상태에서는, 좌측 실린더부(83)의 실린더로드(87)가 하강하고, 우측 실린더부(89)의 실린더로드(93)가 상승하여 지지판(81)이 좌측방향으로 기울어지게 되어 지지판(81)에 마련된 평판(40), 필름(50), 렌티큘라(60)가 좌측으로 경사지게 된다.In the state where the light source 20 is located on the right side of the rail part 31, the cylinder rod 87 of the left cylinder part 83 descends, the cylinder rod 93 of the right cylinder part 89 rises, and the support plate ( 81 is inclined to the left side, the flat plate 40, the film 50, the lenticular 60 provided on the support plate 81 is inclined to the left.
이때, 가압수단(70)이 평판(40), 필름(50), 렌티큘라(60)를 가압하면서 지지판(81)에 고정되어 있어, 평판(40), 필름(50), 렌티큘라(60)를 지지판(81)에 밀착 고정한다.At this time, the pressing means 70 is fixed to the support plate 81 while pressing the flat plate 40, the film 50, and the lenticular 60, the flat plate 40, the film 50, the lenticular 60 To the support plate 81.
이어서, 우측에 위치한 광원(20)이 레일부(20)를 따라 레일부(20)의 중앙으로 이동하게 되면, 좌측 실린더부(83)의 실린더로드(87)와 우측 실린더부(89)의 실린더로드(93)가 동일한 길이를 가지며 지지판(81)을 지지한다. 즉 케이스(10)의 바닥면에 대해 평행하도록 지지판(81)을 지지한다.Subsequently, when the light source 20 located on the right side moves to the center of the rail unit 20 along the rail unit 20, the cylinder of the cylinder rod 87 of the left cylinder unit 83 and the cylinder of the right cylinder unit 89 are formed. The rod 93 has the same length and supports the support plate 81. That is, the support plate 81 is supported to be parallel to the bottom surface of the case 10.
계속해서, 중앙에 위치한 광원(20)이 레일부(31)를 따라 레일부(31)의 우측으로 이동하게 되면, 좌측 실린더부(83)의 실린더로드(87)가 상승하고 우측 실린더부(89)의 실린더로드(93)가 하강하여 지지판(81)이 우측방향으로 기울어지게 되어 지지판(81)에 마련된 평판(40), 필름(50), 렌티큘라(60)가 우측으로 경사지게 된다.Then, when the light source 20 located in the center moves to the right side of the rail part 31 along the rail part 31, the cylinder rod 87 of the left cylinder part 83 will raise and the right cylinder part 89 ), The cylinder rod 93 is lowered so that the support plate 81 is inclined in the right direction so that the flat plate 40, the film 50, and the lenticular 60 provided on the support plate 81 are inclined to the right.
이와 같은 도 5의 작동으로, 이동하는 광원(20)에 의해 조사되는 빛이 한 쌍의 실린더부(83,89)에 의해 경사각이 변환되는 렌티큘라(60)를 투과함으로써, 렌티큘라(60)의 볼록렌즈(61,도1 참조)를 투과한 빛이 감광제(41)에 고루 집광됨으로써 감광제(41)가 깨끗하게 노광될 수 있으며, 더불어 볼록렌즈(61,도1 참조)와 볼록렌즈(61,도1 참조) 사이의 경계부(63,도1 참조)에도 고른 노광이 확실하게 이루어지게 된다.In this operation of FIG. 5, the light irradiated by the moving light source 20 passes through the lenticular 60 whose tilt angle is changed by the pair of cylinders 83 and 89, thereby providing the lenticular 60. The light transmitted through the convex lens 61 (see FIG. 1) of the light is condensed evenly by the photosensitive agent 41, so that the photosensitive agent 41 can be exposed to a clear state. In addition, the convex lens 61 (see FIG. 1) and the convex lens 61 ( Evenly exposed exposure is also made at the boundary portion 63 (see FIG. 1).
이상에서 설명한 바와 같이, 본 발명에 따른 렌티큘라 노광기는 렌티큘라의 집광기능을 노광기에 사용함으로써 감광제의 두께가 수십마이크론에서 수백마이크론이 되더라도 깨끗한 노광이 가능하며, 회로의 피치가 10 ~ 20 마이크론 일지라도 깨끗한 노광으로 불량이 없고 선명하여 깨끗한 회로의 구성이 가능하다.As described above, the lenticular exposure apparatus according to the present invention uses the light condensing function of the lenticular to the exposure machine, so that even if the thickness of the photosensitive agent is several tens of microns to several hundred microns, clean exposure is possible, even if the circuit pitch is 10 to 20 microns. Clean exposure makes no defects and is clear, making it possible to construct a clean circuit.
본 발명은, 본 발명에 속하는 기술분야에서 통상의 지식을 가진 자에 있어 본 발명의 기술적 사상을 벗어나지 않는 범위 내에서 여러 가지 치환 변형이 가능하므로 전술한 실시 예 및 첨부된 도면에 한정되는 것은 아니다.As those skilled in the art to which the present invention pertains, the present invention may be modified in various ways without departing from the spirit of the present invention. .

Claims (6)

  1. 광원과; 상기 광원의 빛이 조사되어지는 필름과; 상기 필름을 통하여 조사되어진 빛을 받는 감광제가 도포된 평판을 포함하는 노광기에 있어서,A light source; A film to which light of the light source is irradiated; In the exposure machine including a flat plate coated with a photosensitive agent that receives light irradiated through the film,
    렌티큘라가 상기 필름에 밀착되도록 구성되는 것을 특징으로 하는 촬영기.The lenticular is configured to be in close contact with the film.
  2. 제 1항에 있어서,The method of claim 1,
    상기 렌티큘라와, 상기 필름과, 상기 감광제가 도포된 평판이 가압수단에 의하여 밀착되는 것을 특징으로 하는 촬영기.And the lenticular, the film, and the flat plate coated with the photosensitive agent are in close contact with each other by pressing means.
  3. 제 2항에 있어서,The method of claim 2,
    상기 가압수단이 진공압을 이용하는 것을 특징으로 하는 촬영기And the pressurizing means uses a vacuum pressure.
  4. 제 1항 내지 제 3항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 3,
    상기 광원은 좌우방향으로 이송운동을 하는 것을 특징으로 하는 촬영기. The light source is a camera, characterized in that the movement in the horizontal direction.
  5. 제 4항에 있어서,The method of claim 4, wherein
    상기 광원의 이송에 대응하여 상기 렌티큘라는 경사면의 각도를 변화시키는 것을 특징으로 하는 촬영기.And the lenticular changes an angle of an inclined surface in response to the transfer of the light source.
  6. 제 1항 내지 제 3항 중 어느 한 항에 있어서,The method according to any one of claims 1 to 3,
    상기 필름에 밀착되어진 상기 렌티큘라가 상기 필름에 대하여 좌우방향으로 이송운동을 하는 것을 특징으로 하는 촬영기.And the lenticular in close contact with the film moves in a lateral direction with respect to the film.
PCT/KR2011/007065 2011-09-26 2011-09-26 Camera WO2013047916A1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09179220A (en) * 1995-12-27 1997-07-11 Photo Kurafutoshiya:Kk Photograph using lenticular lens and production of the photograph
JP2003149761A (en) * 2001-11-14 2003-05-21 Fuji Photo Film Co Ltd Direct positive silver halide photographic sensitive material
JP2005099371A (en) * 2003-09-24 2005-04-14 Dainippon Printing Co Ltd Lenticular lens sheet and its manufacturing method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09179220A (en) * 1995-12-27 1997-07-11 Photo Kurafutoshiya:Kk Photograph using lenticular lens and production of the photograph
JP2003149761A (en) * 2001-11-14 2003-05-21 Fuji Photo Film Co Ltd Direct positive silver halide photographic sensitive material
JP2005099371A (en) * 2003-09-24 2005-04-14 Dainippon Printing Co Ltd Lenticular lens sheet and its manufacturing method

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