KR100250155B1 - Exposing apparatus - Google Patents

Abstract

An exposure apparatus is disclosed.

The disclosed exposure apparatus includes: an upper and lower masks disposed on upper and lower surfaces of a material to be exposed and having predetermined patterns formed thereon; Upper and lower die plates installed on one side of the upper and lower masks to fix the upper and lower masks; Vacuum suction means for allowing the upper and lower masks to be vacuum-adsorbed and fixed to the upper and lower die plates; Upper and lower die sets coupled to the upper and lower die plates by predetermined fixing means to fix the die plates; Lifting means for allowing the upper die set to be liftable; Alignment detection means installed in proximity to the upper and lower masks to detect an alignment state of the upper and lower masks and the material; And alignment means for allowing the lower mask to be aligned according to the signal of the alignment detecting means.

According to the present invention, since the matching can be performed without disassembling the upper and lower masks, there is an advantage of shortening the processing time.

Description

Exposure device

The present invention relates to an exposure apparatus, and more particularly, to an exposure apparatus that can be applied to lead frames, shadow masks, circuit boards and the like.

In general, semiconductor devices applied to computers and various electronic products, liquid crystal display devices emerging as image display devices, plasma display devices, circuit boards on which electronic components are mounted, filters, components using thin film technology, and the like are fine. Photolithography is used to form patterns. In such photolithography, an exposure apparatus is essentially used to transfer a pattern of a reticle or a mask to a photosensitive film formed on a substrate. In addition, in order to form a semiconductor or a liquid crystal display device, an exposure process may be repeatedly performed using a reticle having a predetermined pattern formed in an exposure apparatus in order to form a circuit pattern on an element material, for example, a wafer or a substrate for a liquid crystal display device. do.

And, the exposure method according to the conventional exposure apparatus is a manual exposure to form a pattern of the object to be exposed to the polyester film on the upper and lower surfaces to form this pattern, and the semi-automatic type to expose the mask fixed to the fixed mask frame Separated by. The mask device of such an exposure apparatus is generally set in the exposure apparatus by performing pattern matching of the upper and lower surfaces prior to the operation by using an adhesive or a fixing device on the mask to proceed the continuous operation. Once the mask is set once, if the pattern matching of the upper and lower surfaces is inconsistent, the mask frame is separated from the die-set, and the matching is performed once again.

However, the exposure apparatus according to the related art has the following problems.

First of all, the fixed mask device affects the process operation because the fixed mask device has to be removed from the die set when there is a mismatch in the vertical alignment. In addition, such a fixed mask device is not replaceable if the mask is broken or any problem occurs in the mask. In addition, when the upper and lower mask pairing, there is a problem that the accuracy is poor.

The present invention has been made to solve the above problems, and an object of the present invention is to provide an exposure apparatus capable of shortening work time by minimizing the influence on process operation by performing matching without disassembling a mask.

1 is a schematic view of an exposure apparatus according to the present invention.

<Description of the code | symbol about the principal part of drawing>

101. Material 102, 102 '. Upper and lower mask

103. Die plates 104, 104 '. Upper, lower die set

105. Support 106. Fixing Pin

107. Guide Post 108. Align Motor

109. Vacuum Groove 110. Sisidi Camera

111.Air cylinder 112.Micrometer

An exposure apparatus of the present invention for achieving the above object, the upper and lower masks are provided on the upper and lower surfaces of the material to be exposed and the predetermined mask is formed; Upper and lower die plates installed on one side of the upper and lower masks to fix the upper and lower masks; Vacuum suction means for allowing the upper and lower masks to be vacuum-adsorbed and fixed to the upper and lower die plates; Upper and lower die sets coupled to the upper and lower die plates by predetermined fixing means to fix the die plates; Lifting means for allowing the upper die set to be liftable; Alignment detection means installed in proximity to the upper and lower masks to detect an alignment state of the upper and lower masks and the material; And alignment means for allowing the lower mask to be aligned according to the signal of the alignment detecting means.

In the present invention, it is provided on one side of the die set further comprises a height adjusting means for adjusting the height of the material and the mask, the height adjusting means includes a micrometer, the vacuum suction means, It is preferable to include a vacuum groove.

In the present invention, the fixing means includes a predetermined fixing pin, and the lifting means includes a guide post for guiding the lifting of the upper die set, and driving means for enabling the lifting of the upper die set. The drive means is preferably one selected from an air cylinder or a cam system.

In the present invention, the alignment detecting means includes a plurality of CD cameras, wherein the CD cameras include two of the CD cameras for detecting the alignment of the material, and two units for detecting the alignment of the mask. The CD camera is installed at one side of the upper and lower masks, respectively, and the alignment unit is coupled to an alignment motor installed at a lower side of the lower mask and a rotation shaft of the alignment motor. It is preferable to include an axis.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 schematically shows an exposure apparatus 100 according to the invention.

Referring to the drawings, with the material 101 to be exposed therebetween, the surface facing the material 101 on the upper and lower surfaces of the material 101 in a clear to opaced portion. Upper and lower masks 102 and 102 'are formed, respectively. Upper and lower die plates 103 and 103 which serve as frames to fix the upper and lower masks 102 and 102 'to ends of the upper and lower masks 102 and 102', respectively. ') Are respectively installed, and the upper and lower die sets 104 for fixing the upper and lower die plates 103 and 103' to one side of the upper and lower die plates 103 and 103 '. , 104 'are respectively installed, and in particular, the upper die set 104 is installed to be liftable. In addition, the support 105 is fixed to one side of the lower die set 104 'by a predetermined connecting pin 105a so as to support the lower die set 104'.

The upper and lower die plates 103 and 103 ′ and the upper and lower die sets 104 and 104 ′ are coupled to each other by using a predetermined fixing means for coupling and fixing the upper and lower die plates 103 and 103 ′. 106). On one side of the lower die set 104 ', the upper die set 104 is capable of opening and closing operation, and elevating means for allowing the upper die set 104' to be elevated is provided. The lifting means is provided with a guide post 107 for supporting and guiding the die set 104, and an air cylinder 111 through which air is sucked in and exhausted is provided in the upper die set ( To one side of 104 or to an external cam system, not shown in the drawing, each is made.

One side of the upper and lower masks 102 and 102 'is provided with alignment detection means for detecting an alignment of the material 101 and the upper and lower masks 102 and 102'. The alignment detection means is equipped with a plurality of CCD cameras (110) to form a vision system (Vision System), which is usually two for the lower mask 102 'alignment, and two for the material 101 alignment Each stand is provided. Below the lower mask 102 ', the upper mask 102 is fixed, and an alignment motor 108 is provided to align the lower mask 102' by the signal of the vision system. The lifting shaft 108a installed on the lower die plate 103 'coupled to the rotation shaft of the alignment motor 108 is installed, and the lower mask 102' is aligned by the rotation of the lifting shaft 108a.

In addition, the upper and lower masks 102 and 102 'are vacuum adsorbing means for adsorbing the upper and lower masks 102 and 102' to the upper and lower die plates 103 and 103 'by vacuum. This vacuum adsorption means is provided and consists of a vacuum grove (Vaccum Groove) 109. And the upper die set 104 is provided with a height adjustment means for adjusting the height interval of the material 101 and the upper and lower masks (102, 102 '), the height adjustment means is a micrometer (Micrometer) 112 are provided respectively.

In the exposure apparatus 100 according to the present invention configured as described above, the upper and lower masks 102 and 102 'are vacuum-adsorbed by using the vacuum groove 109 on the upper and lower die plates 103 and 103'. Thus, the upper and lower masks 102 and 102 'are easily disassembled without the upper and lower die sets 104 and 104' being disassembled. If the upper and lower masks 102 and 102 'are out of control, the disassembly and exchange are necessary. In this case, the upper and lower masks 102 and 102' are not in disassembled state, but in a mating state. It is managed by the vision system or manually to make the matching of the top and bottom patterns more accurate.

The hard contact, soft, and the like are exposed by adjusting the height gap between the material 101 and the upper and lower masks 102 and 102 'by the micrometer 112 installed in the upper die set 104. (Soft) and Off contacts can be used as desired. The hard contact is to expose the material 101 and the upper and lower masks 102 and 102 'so as to be exposed in a vacuum without gaps, and the soft contact is the material 101 and the upper and lower masks 102. , 102 'spaced apart slightly, for example, spaced about 2 mm, and the off-contact is exposed separately from the material 101 and the upper and lower masks 102 and 102'. to be.

The lifting of the upper die set 104 is performed by the air cylinder 111 or the cam system by an external cam system, thereby minimizing a shaking phenomenon such as vibration. The upper mask 104 is fixed to the upper die plate 103 so as not to move, and the lower mask 102 'is moved to perform vertical alignment by the alignment motor 108. The lower mask 102 'is moved left and right by the align motor 108 in accordance with an external control signal.

The exposure apparatus according to the present invention as described above has the following effects.

The mask is vacuum-adsorbed and attached to the die plate by vacuum suction, so that the mask can be easily disassembled without disassembling the die set, and even if the mask is out of control, The state can be managed by vision system or manually, so that the matching of vertical pattern can be performed accurately, which reduces the trouble handling time, and the lifting and lowering of the die set by the air cylinder or the cam system by the external cam system. It has the advantage of minimizing the shaking phenomenon such as vibration.

Although the present invention has been described with reference to one embodiment shown in the drawings, this is merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom.

Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (10)

Upper and lower masks formed on upper and lower surfaces of the material to be exposed and having a predetermined pattern formed thereon; Upper and lower die plates installed on one side of the upper and lower masks to fix the upper and lower masks; Vacuum suction means for allowing the upper and lower masks to be vacuum-adsorbed and fixed to the upper and lower die plates; Upper and lower die sets coupled to the upper and lower die plates by predetermined fixing means to fix the die plates; Lifting means for allowing the upper die set to be liftable; Alignment detection means installed in proximity to the upper and lower masks to detect an alignment state of the upper and lower masks and the material; And alignment means for allowing the lower mask to be aligned in accordance with the signal of the alignment sensing means. The method of claim 1, And a height adjusting means installed on one side of the die set to adjust heights of the material and the mask. The method of claim 2, And the height adjusting means comprises a micrometer. The method of claim 1, And said vacuum adsorption means comprises a vacuum groove. The method of claim 1, The fixing means, the exposure apparatus characterized in that it comprises a predetermined fixing pin. The method of claim 1, And the elevating means includes a guide post for guiding the elevating of the upper die set and driving means for elevating the upper die set. The method of claim 6, The driving means is an exposure apparatus, characterized in that any one selected from the air cylinder or cam system. The method of claim 1, The alignment detecting unit includes a plurality of CD cameras. The method of claim 8, The CD camera may include two CD cameras for detecting an alignment of the material and two CD cameras for detecting an alignment of the mask on one side of the upper and lower masks, respectively. Exposure apparatus. The method of claim 1, And the alignment means includes an alignment motor provided below the lower mask and a lifting shaft coupled to a rotation shaft of the alignment motor and installed on the lower die plate.

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