WO2013032290A2 - Alkali-free glass and method for manufacturing same - Google Patents

Alkali-free glass and method for manufacturing same Download PDF

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Publication number
WO2013032290A2
WO2013032290A2 PCT/KR2012/007014 KR2012007014W WO2013032290A2 WO 2013032290 A2 WO2013032290 A2 WO 2013032290A2 KR 2012007014 W KR2012007014 W KR 2012007014W WO 2013032290 A2 WO2013032290 A2 WO 2013032290A2
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Prior art keywords
glass
alkali
free glass
mgo
sro
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PCT/KR2012/007014
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French (fr)
Korean (ko)
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WO2013032290A3 (en
Inventor
김상국
임원배
황두선
이동권
김수환
김다정
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주식회사 엘지화학
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Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to JP2014528291A priority Critical patent/JP5798688B2/en
Priority to CN201280042857.9A priority patent/CN103781735B/en
Priority claimed from KR1020120096357A external-priority patent/KR101383607B1/en
Publication of WO2013032290A2 publication Critical patent/WO2013032290A2/en
Publication of WO2013032290A3 publication Critical patent/WO2013032290A3/en
Priority to US14/055,412 priority patent/US8962502B2/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

Definitions

  • This invention relates to the glass manufacturing technique. More specifically, it is related with the alkali free glass composition which does not contain the alkali metal oxide, and the manufacturing method of such glass.
  • Glass especially flat glass, is used in various fields such as window glass, window screens of vehicles, mirrors, and the like, and its type is also being developed and used in various ways.
  • alkali-free glass substrates are widely used in flat panel display devices such as LCDs, PDPs, and organic ELs.
  • alkali glass substrate containing an alkali metal oxide component since alkali metal ions in a glass substrate can diffuse in a thin film and deteriorate a film
  • the substrate glass may be used in a small portable display device such as a mobile phone, a PDP, a notebook computer, and even in this case, it is required to reduce the weight of the substrate glass.
  • meltability melting property
  • energy and time required for melting the glass are increased, and defects such as bubbles and foreign matters are likely to occur in the glass.
  • bubbles or foreign matter in the glass interfere with light transmission, the quality of the glass for the display device may be greatly degraded.
  • heat resistance in the case of glass for flat panel display substrates, heat resistance must be ensured.
  • various heat treatment processes may be performed. In this process, the glass substrate may be exposed to rapid heating and quenching environments. In this situation, when the heat resistance is not secured to the glass, deformation or warping of the glass may occur, and the glass substrate may be broken due to the tensile stress caused by the heat.
  • the glass for TFT-LCD when the heat resistance is low, a difference in thermal expansion may occur between the TFT material and the pixel pitch of the TFT may be shifted, which may cause display defects.
  • an object of the present invention is to provide an alkali free glass and a method of manufacturing the same, which are light, have good meltability, and are easy to process.
  • Glass according to the present invention for achieving the above object is an alkali-free glass, in the basis of the oxide-based weight% display, SiO 2 61-73%; B 2 O 3 0.5-3.9%; Al 2 O 3 3.5-13.5%; MgO 9-13%; CaO 1-8%; And 4-10% of SrO and substantially no alkali metal oxide.
  • the said alkali free glass does not contain BaO substantially.
  • the alkali free glass has a density of less than 2.55 g / cm 3 , a coefficient of thermal expansion of 3.0 ⁇ 10 ⁇ 6 / K to 4.5 ⁇ 10 ⁇ 6 / K, and a temperature at viscosity 10 2 dPas of 1600 And a temperature at a viscosity of 10 4 dPas is less than 1250 ° C.
  • the display device according to the present invention for achieving the above object includes the above-described glass.
  • the display device is a liquid crystal display device.
  • the glass manufacturing method according to the present invention for achieving the above object, as an alkali-free glass manufacturing method, in terms of the oxide-based weight% display, SiO 2 61-73%; B 2 O 3 0.5-3.9%; Al 2 O 3 3.5-13.5%; MgO 9-13%; CaO 1-8%; And combining the glass raw material so as to contain 4-10% of SrO and substantially no alkali metal oxide.
  • the glass raw material combining step combines the glass raw materials so as not to substantially contain BaO.
  • the alkali free glass produced by the glass manufacturing method has a density of less than 2.55 g / cm 3 , a thermal expansion coefficient of 3.0 ⁇ 10 ⁇ 6 / K to 4.5 ⁇ 10 ⁇ 6 / K, and a viscosity of 10
  • the temperature at 2 dPas is less than 1600 ° C and / or the temperature at viscosity 10 4 dPas is less than 1250 ° C.
  • the alkali free glass which does not contain the alkali metal oxide component substantially is provided.
  • a low density alkali free glass may be provided. Therefore, even in a glass substrate having a large area, it is possible to reduce the warping phenomenon due to its own weight, thereby meeting the trend of increasing the size of display devices such as TVs and monitors. In addition, even in the case of a small portable device such as a mobile phone or a notebook using a glass substrate, the weight can be reduced, so that portability can be improved.
  • the T2 which is a temperature at a viscosity of 10 2 dPas
  • the T4 which is a temperature at a viscosity of 10 4 dPas
  • Processing can be facilitated.
  • the melting temperature and processing temperature of the glass can be lowered in this way, the energy, time, etc. required for melting and processing the glass can be reduced.
  • an alkali free glass having a low coefficient of thermal expansion may be provided. Therefore, even if the glass is exposed to various heat treatment environments during the manufacturing process of the flat panel display device such as the TFT-LCD, it is possible to prevent the phenomenon such as heat shrinkage, deformation, warpage, and cracking.
  • the thermal expansion coefficient of the alkali free glass is similar to the thermal expansion coefficient of the TFT material, thereby effectively preventing display defects and the like caused by the pixel pitch shifting.
  • FIG. 1 is a flowchart schematically showing a method for producing an alkali free glass according to an embodiment of the present invention.
  • the glass which concerns on this invention is an alkali free glass which does not contain an alkali metal oxide substantially.
  • substantially free of an alkali metal oxide means that the content of the alkali metal oxide is not included in the glass at all, or even partially contained, so that its content is extremely small compared to the other components and can be neglected as a composition component of the glass. If so, it means.
  • an alkali metal oxide such as Li 2 O, Na 2 O and K 2 O is contained in an amount of 0.2 wt% or less as the glass composition component, it can be said that the alkali metal oxide is not substantially contained.
  • the alkali-free glass according to the present invention include SiO 2, B 2 O 3, Al 2 O 3, MgO, CaO , and SrO in the composition components.
  • alkali-free glass according to the invention may contain 61-73% of SiO 2 as an oxide based on weight percentages.
  • SiO 2 is a network structure oxide that forms glass and may contribute to increasing the chemical resistance of the glass and to having an adequate coefficient of thermal expansion.
  • the coefficient of thermal expansion may be too low and the devitrification characteristics of the glass may be deteriorated.
  • the alkali-free glass according to the present invention include SiO 2 for 61-73% by weight.
  • the SiO 2 is preferably contained 64 to 72% by weight. More preferably, the SiO 2 is preferably contained 66 to 71% by weight.
  • the alkali-free glass according to the invention may contain 0.5 ⁇ 3.9% of B 2 O 3 as oxides based on weight percentages.
  • B 2 O 3 is a network structure oxide of glass, which can contribute to improving the dissolution reactivity of the glass, reducing the coefficient of thermal expansion, improving the devitrification, improving chemical resistance such as BHF resistance, and lowering the density.
  • B 2 O 3 is contained too high, the acid resistance of the glass may be lowered, the density may be increased, and the strain point may be lowered, thereby deteriorating heat resistance.
  • B 2 O 3 is contained too low, the effect of addition is difficult to achieve properly.
  • the alkali-free glass comprising 0.5 to 3.9% by weight of B 2 O 3 in accordance with the present invention.
  • the B 2 O 3 is preferably contained 1 to 3.9% by weight. More preferably, the B 2 O 3 It is preferably contained 3 to 3.9% by weight.
  • the alkali-free glass according to the invention may contain 3.5 ⁇ 13.5%, an Al 2 O 3 as oxides based on weight percentages.
  • Al 2 O 3 increases the high temperature viscosity, chemical stability, thermal shock resistance and the like of the glass and may contribute to increase the strain point and Young's modulus.
  • Al 2 O 3 is contained too high, it is possible to reduce the devitrification characteristics, hydrochloric acid resistance and BHF resistance and increase the viscosity.
  • Al 2 O 3 when Al 2 O 3 is contained too low, its addition effect is difficult to achieve properly and the elastic modulus may be low.
  • Al 2 O 3 is preferably contained 4 to 12% by weight. More preferably, the Al 2 O 3 is preferably contained 4 to 9% by weight.
  • the alkali-free glass according to the present invention it is preferable to contain an SiO 2 + Al 2 O 3 the total content of SiO 2 and Al 2 O 3 72 ⁇ 79% by weight. This is because the effect of containing SiO 2 and Al 2 O 3 can be further improved in such a concentration range, and deterioration of the thermal expansion coefficient and devitrification characteristics can be prevented.
  • the alkali free glass which concerns on this invention can contain 9 to 13% of MgO by oxide-based weight% display.
  • MgO is an alkaline earth metal oxide and does not increase the coefficient of thermal expansion and can contribute to improving meltability without significantly lowering the strain point.
  • MgO can reduce the density of the glass, which can greatly contribute to the weight reduction of the glass.
  • the alkali free glass according to the present invention comprises 9 to 13% by weight of MgO.
  • the MgO is preferably contained in 9.5 to 12% by weight. More preferably, the MgO is contained 10 to 11% by weight.
  • the alkali free glass which concerns on this invention can contain CaO 1 to 8% by an oxide reference weight% display.
  • CaO like MgO, is an alkaline earth metal oxide that can contribute to lowering the density and coefficient of thermal expansion, not significantly reducing the strain point, and improving meltability.
  • the alkali free glass according to the present invention contains 1 to 8% by weight of CaO.
  • the CaO is preferably contained 4 to 8% by weight. More preferably, the CaO is contained 5 to 7.5% by weight.
  • the alkali free glass which concerns on this invention can contain 4-10% of SrO by the oxide basis weight% display.
  • SrO is an alkaline earth metal oxide and can contribute to improvement of the devitrification property and acid resistance of glass.
  • the alkali free glass according to the present invention comprises 4 to 10% by weight of SrO.
  • the SrO is preferably contained 4 to 8% by weight. More preferably, the SrO is preferably contained 4 to 6% by weight.
  • the alkali free glass which concerns on this invention contains 15-26 weight% of MgO + CaO + SrO which is a total content of MgO, CaO, and SrO.
  • MgO + CaO + SrO is preferably 17 to 24% by weight.
  • MgO + CaO + SrO is 19 to 22% by weight.
  • the alkali free glass according to the present invention may be substantially free of BaO.
  • BaO may play a role of improving chemical resistance and devitrification characteristics, but it is not preferable in terms of increasing the density of glass and environmentally.
  • the alkali-free glass according to an embodiment of the present invention since it does not contain such BaO, it is possible to lower the density of the glass and to manufacture more environmentally friendly glass.
  • the alkali free glass according to the present invention may have a density of less than 2.55 g / cm 3 .
  • the density of the glass may be low and it may be easy to achieve the weight reduction of the glass article.
  • the density of the glass in a situation where the glass area is gradually increased due to the enlargement of the apparatus to which the glass is applied, when the density of the glass is lowered, it is possible to reduce the warpage phenomenon due to the glass's own load and to reduce the weight of the apparatus to which the glass is applied.
  • the weight of the glass itself can also be reduced for small portable devices and devices, thereby improving portability.
  • the alkali free glass according to the present invention may have a coefficient of thermal expansion (CTE) of 3.0 ⁇ 10 ⁇ 6 / K to 4.5 ⁇ 10 ⁇ 6 / K.
  • CTE coefficient of thermal expansion
  • the thermal expansion coefficient is low, and the thermal shock resistance is excellent. Therefore, even if various heat treatment processes are repeatedly performed on the glass substrate, problems such as heat shrinkage, warpage, and deformation can be prevented from occurring.
  • the thermal expansion coefficient is similar to that of the TFT material, it is possible to prevent display defects due to the TFT material and the thermal expansion difference and the like during TFT-LCD manufacture using the glass according to the present invention.
  • T 2 which is a temperature at a viscosity of 10 2 dPas
  • the temperature of T 2 in the viscosity can be less than 10 2 dPas 1550 °C.
  • T 4 which is a temperature at a viscosity of 10 4 dPas
  • the alkali free glass according to the present invention may have a T 4 of a temperature at a viscosity of 10 4 dPas of less than 1240 ° C. According to this embodiment, since the T 4 associated with the processing temperature of the glass is low, the processing of the glass can be facilitated, and energy and time required for processing the glass can be saved.
  • the display device may include the alkali-free glass described above.
  • the display device according to the present invention includes a glass substrate, but the glass substrate is an alkali-free glass substrate, expressed in terms of weight percent of oxide, SiO 2 61-73%, B 2 O 3 0.5-3.9%, Al 2 O 3 3.5 ⁇ 13.5%, MgO containing 9 ⁇ 13%, CaO 1 ⁇ 8%, SrO 4 ⁇ 10% , and does not substantially free of alkali metal oxide.
  • such an alkali free glass substrate may be substantially free of BaO, the density may be less than 2.55 g / cm 3 , and the coefficient of thermal expansion may be 3.0 to 4.5 [ ⁇ 10 ⁇ 6 / K].
  • such an alkali free glass substrate may have a T 2 of less than 1600 ° C and a T 4 of less than 1250 ° C.
  • the display device according to the present invention is preferably a liquid crystal display (LCD) device. That is, a liquid crystal display device such as a TFT-LCD includes a glass substrate (panel), which may have the composition and physical properties described above.
  • the display device according to the present invention may include various display devices such as a PDP device in addition to the LCD device.
  • FIG. 1 is a flowchart schematically showing a method for producing an alkali free glass according to an embodiment of the present invention.
  • the raw materials of the respective components contained in the glass are combined to be the target composition (S110).
  • the alkali metal oxide component is substantially not included, SiO 2 61-73%, B 2 O 3 0.5-3.9%, Al 2 O 3 3.5-13.5 in terms of the oxide-based weight% display %, MgO is 9-13%, CaO is 1-8%, SrO 4-10% is combined so that the raw material components are combined.
  • SiO 2 is 64 to 72%
  • B 2 O 3 is 1 to 3.9%
  • Al 2 O 3 is 4 to 12%
  • MgO is 9.5 to 12%
  • CaO is 4 to 8%
  • the S110 step is SiO 2 66 ⁇ 71%, B 2 O 3 3 ⁇ 3.9%, Al 2 O 3 4 ⁇ 9%, MgO 10 ⁇ 11%, CaO 5 ⁇ 7.5% Combine the raw materials so that SrO is contained 4-6%.
  • MgO + CaO + SrO may be combined with the raw material components to contain 15 to 26% by weight. More preferably, in step S110, the raw material components are combined to contain 17 to 24% by weight of MgO + CaO + SrO. Most preferably, the step S110, the raw material components are combined to contain 19 to 22% by weight of MgO + CaO + SrO.
  • step S130 may be performed by a float method using a float bath, but the present invention is not necessarily limited to such a molding method.
  • the step S130 that is, the shaping of the glass may be performed by a down draw method or a fusion method.
  • the molded glass is subjected to a slow cooling process is transferred to a slow cooling furnace (S140).
  • the annealed glass is then cut to the desired size, and further processing such as polishing can be performed and made into a glass article through this series of processes.
  • the density may be less than 2.55 g / cm 3 .
  • the thermal expansion coefficient of the produced alkali free glass may be 3.0-4.5 [* 10 ⁇ -6> / K].
  • the alkali free glass produced as described above may have a T 2 of less than 1600 ° C and a T 4 of less than 1250 ° C. More preferably, the alkali free glass produced by the glass manufacturing method according to the present invention may have a T 2 of less than 1550 ° C. and a T 4 of less than 1240 ° C.
  • Table 1 shows the glass composition and physical properties of the examples according to the present invention
  • Table 2 shows the glass composition and physical properties of the comparative example for comparison with these examples.
  • each component was combined so that it might become a composition (weight-% basis) as shown in Table 1, and it heated and fuse
  • a platinum stirrer was inserted and stirred for 1 hour to homogenize the glass.
  • the molten glass was slowly cooled at 730 ° C to obtain the glass of each example.
  • the composition was confirmed through the fluorescent X-ray analysis.
  • each component was combined so as to have a composition (based on weight percent) as shown in Table 2, and heated and melted at a temperature of 1600 to 1800 ° C. for 3 hours using a platinum crucible. At the time of melting, a platinum stirrer was inserted and stirred for 1 hour to homogenize the glass. Subsequently, the molten glass was slowly cooled at 730 ° C to obtain the glass of each comparative example.
  • the density was less than 2.55 g / cm 3 , and the average thermal expansion coefficient (CTE) was 3.0 to 4.5 ( ⁇ 10 ⁇ 6 / K) was confirmed.
  • T 2 is less than 1600 °C and T 4 have been confirmed to be less than 1250 °C.
  • Comparative Examples 1 to 11 was determined to be a high density, the average coefficient of thermal expansion, T 2 and / or T 4, compared with the embodiment for the glass.
  • the glass according to the present invention has a low T 2 and T 4 is excellent in the meltability of the glass and can be easily processed, as well as energy and time required during the processing or melting process can be reduced. Able to know.

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Abstract

Disclosed are a composition for alkali-free glass which contains no alkali metal oxides, and a method for manufacturing said glass. By weight % on the basis of oxides, the alkali-free glass according to the present invention contains: 61 to 73% of SiO2; 0.5 to 3.9% of B2O3; 3.5 to 13.5% of Al2O3; 9 to 13% of MgO; 1 to 8% of CaO; and 4 to 10% of SrO, and contains substantially no alkali metal oxides.

Description

무알칼리 유리 및 그 제조 방법Alkali-free glass and its manufacturing method
본 출원은 2011년 9월 2일자로 출원된 한국 특허출원 번호 제10-2011-0089112호 및 2012년 8월 31일자로 출원된 한국 특허출원 번호 제10-2012-0096357호에 대한 우선권주장출원으로서, 해당 출원의 명세서 및 도면에 개시된 모든 내용은 인용에 의해 본 출원에 원용된다.This application is a priority application for Korean Patent Application No. 10-2011-0089112, filed September 2, 2011, and Korean Patent Application No. 10-2012-0096357, filed August 31, 2012. All the contents disclosed in the specification and drawings of this application are incorporated in this application by reference.
본 발명은 유리 제조 기술에 관한 것으로, 보다 상세하게는 알칼리 금속 산화물이 포함되어 있지 않은 무알칼리 유리 조성물 및 그러한 유리의 제조 방법에 관한 것이다.TECHNICAL FIELD This invention relates to the glass manufacturing technique. More specifically, it is related with the alkali free glass composition which does not contain the alkali metal oxide, and the manufacturing method of such glass.
유리, 그 중에서도 평판 유리(flat glass)는 창유리, 차량의 윈도 스크린, 거울 등과 같이 다양한 분야에서 이용되고 있으며, 그 종류 또한 용도에 맞게 매우 다양하게 개발되어 이용되고 있다. Glass, especially flat glass, is used in various fields such as window glass, window screens of vehicles, mirrors, and the like, and its type is also being developed and used in various ways.
특히, LCD나 PDP, 유기 EL과 같은 평판 디스플레이 장치에는 무알칼리 유리 기판이 널리 사용된다. 알칼리 금속 산화물 성분이 함유된 알칼리 유리 기판의 경우, 유리 기판 중의 알칼리 금속 이온이 박막 중에 확산되어 막 특성을 열화시킬 수 있기 때문에, 디스플레이용으로서는 알칼리 유리보다는 무알칼리 유리가 널리 이용되고 있다.In particular, alkali-free glass substrates are widely used in flat panel display devices such as LCDs, PDPs, and organic ELs. In the case of the alkali glass substrate containing an alkali metal oxide component, since alkali metal ions in a glass substrate can diffuse in a thin film and deteriorate a film | membrane characteristic, alkali free glass is widely used for display rather than alkali glass.
그런데, 이와 같은 평판 디스플레이 기판용 유리의 경우, 다양한 제품 특성이 요구되고 있다.By the way, in the case of such a glass for flat panel display substrates, various product characteristics are calculated | required.
예를 들어, 평판 디스플레이용 유리의 경우, 경량화가 확보되어야 한다. 특히, 최근에는, TV나 모니터 등과 같은 디스플레이 장치가 점차 대형화되어 가면서, 이에 사용되는 기판 유리의 면적 또한 커져 가고 있다. 이 경우, 기판 유리 자체의 하중에 의한 기판 유리의 휨 현상은 더욱 커질 수 있기 때문에, 이를 방지하기 위해 기판 유리는 보다 가벼운 무게를 갖도록 제조될 필요가 있다. 뿐만 아니라, 이러한 기판 유리는 휴대전화나 PDP, 노트북과 같은 소형 휴대용 디스플레이 장치에도 사용될 수 있는데, 이 경우에도 휴대성을 높이기 위해 기판 유리의 경량화가 요구된다.For example, in the case of glass for flat panel displays, weight reduction should be ensured. In particular, in recent years, as display devices such as TVs and monitors are gradually enlarged, the area of the substrate glass used therein is also increasing. In this case, since the warping phenomenon of the substrate glass due to the load of the substrate glass itself can be further increased, in order to prevent this, the substrate glass needs to be manufactured to have a lighter weight. In addition, the substrate glass may be used in a small portable display device such as a mobile phone, a PDP, a notebook computer, and even in this case, it is required to reduce the weight of the substrate glass.
또한, 평판 디스플레이 기판용 유리의 경우 적절한 용융성(융해성)이 확보되어야 한다. 만일, 유리의 용융성이 저하되면 유리의 용융에 소요되는 에너지 및 시간이 증가함은 물론, 유리 속에 기포나 이물질과 같은 결함이 발생하기 쉽다. 그리고, 이와 같은 유리 속의 기포나 이물질은 빛의 투과를 방해하기 때문에, 디스플레이 장치용 유리로서 품질이 크게 저하될 수 있다.In addition, in the case of glass for flat panel display substrates, appropriate meltability (melting property) must be ensured. If the meltability of the glass is lowered, energy and time required for melting the glass are increased, and defects such as bubbles and foreign matters are likely to occur in the glass. In addition, since bubbles or foreign matter in the glass interfere with light transmission, the quality of the glass for the display device may be greatly degraded.
또한, 평판 디스플레이 기판용 유리의 경우, 내열성이 확보되어야 한다. 예를 들어, TFT-LCD와 같은 평판 디스플레이 장치의 제조 공정에서는 다양한 열처리 공정이 수행될 수 있는데, 이 과정에서, 유리 기판은 급가열과 급랭 환경에 노출될 수 있다. 만일 이러한 상황에서, 유리에 내열성이 확보되지 않은 경우, 유리의 변형이나 휨 현상 등이 일어날 수 있고, 열에 의한 인장 응력으로 인해 유리 기판이 깨질 수도 있다. 더욱이, TFT-LCD용 유리의 경우, 내열성이 낮으면 TFT 재료와 열팽창차가 생겨 TFT의 화소 피치가 어긋날 수 있으며, 이로 인해 표시 불량이 발생할 수 있다.In addition, in the case of glass for flat panel display substrates, heat resistance must be ensured. For example, in the manufacturing process of a flat panel display device such as a TFT-LCD, various heat treatment processes may be performed. In this process, the glass substrate may be exposed to rapid heating and quenching environments. In this situation, when the heat resistance is not secured to the glass, deformation or warping of the glass may occur, and the glass substrate may be broken due to the tensile stress caused by the heat. Moreover, in the case of the glass for TFT-LCD, when the heat resistance is low, a difference in thermal expansion may occur between the TFT material and the pixel pitch of the TFT may be shifted, which may cause display defects.
따라서, 본 발명은 상기와 같은 문제점을 해결하기 위해 창안된 것으로서, 가볍고 용융성이 좋으며 가공하기에 용이한 무알칼리 유리 및 그 제조 방법을 제공하는 것을 목적으로 한다.Accordingly, the present invention has been made to solve the above problems, and an object of the present invention is to provide an alkali free glass and a method of manufacturing the same, which are light, have good meltability, and are easy to process.
본 발명의 다른 목적 및 장점들은 하기의 설명에 의해서 이해될 수 있으며, 본 발명의 실시예에 의해 보다 분명하게 알게 될 것이다. 또한, 본 발명의 목적 및 장점들은 특허 청구 범위에 나타낸 수단 및 그 조합에 의해 실현될 수 있음을 쉽게 알 수 있을 것이다.Other objects and advantages of the present invention can be understood by the following description, and will be more clearly understood by the embodiments of the present invention. Also, it will be readily appreciated that the objects and advantages of the present invention may be realized by the means and combinations thereof indicated in the claims.
상기와 같은 목적을 달성하기 위한 본 발명에 따른 유리는, 무알칼리 유리로서, 산화물 기준 중량% 표시로, SiO2 61~73%; B2O3 0.5~3.9%; Al2O3 3.5~13.5%; MgO 9~13%; CaO 1~8%; 및 SrO 4~10%를 함유하고, 알칼리 금속 산화물을 실질적으로 함유하지 않는다.Glass according to the present invention for achieving the above object is an alkali-free glass, in the basis of the oxide-based weight% display, SiO 2 61-73%; B 2 O 3 0.5-3.9%; Al 2 O 3 3.5-13.5%; MgO 9-13%; CaO 1-8%; And 4-10% of SrO and substantially no alkali metal oxide.
바람직하게는, 상기 무알칼리 유리는, BaO를 실질적으로 함유하지 않는다.Preferably, the said alkali free glass does not contain BaO substantially.
또한 바람직하게는, 상기 무알칼리 유리는, 밀도가 2.55 g/cm3 미만이고, 열팽창 계수가 3.0×10-6/K ~ 4.5×10-6/K이며, 점도 102dPas에서의 온도가 1600℃ 미만이고, 또한/또는 점도 104dPas에서의 온도가 1250℃ 미만이다.Also preferably, the alkali free glass has a density of less than 2.55 g / cm 3 , a coefficient of thermal expansion of 3.0 × 10 −6 / K to 4.5 × 10 −6 / K, and a temperature at viscosity 10 2 dPas of 1600 And a temperature at a viscosity of 10 4 dPas is less than 1250 ° C.
또한 상기와 같은 목적을 달성하기 위한 본 발명에 따른 디스플레이 장치는, 상술한 유리를 포함한다.In addition, the display device according to the present invention for achieving the above object includes the above-described glass.
바람직하게는, 상기 디스플레이 장치는 액정 디스플레이 장치이다.Preferably, the display device is a liquid crystal display device.
또한 상기와 같은 목적을 달성하기 위한 본 발명에 따른 유리 제조 방법은, 무알칼리 유리 제조 방법으로서, 산화물 기준 중량% 표시로, SiO2 61~73%; B2O3 0.5~3.9%; Al2O3 3.5~13.5%; MgO 9~13%; CaO 1~8%; 및 SrO 4~10%를 함유하고, 알칼리 금속 산화물을 실질적으로 함유하지 않도록 유리 원료를 조합하는 단계를 포함한다.In addition, the glass manufacturing method according to the present invention for achieving the above object, as an alkali-free glass manufacturing method, in terms of the oxide-based weight% display, SiO 2 61-73%; B 2 O 3 0.5-3.9%; Al 2 O 3 3.5-13.5%; MgO 9-13%; CaO 1-8%; And combining the glass raw material so as to contain 4-10% of SrO and substantially no alkali metal oxide.
바람직하게는, 상기 유리 원료 조합 단계는 BaO를 실질적으로 함유하지 않도록 유리 원료를 조합한다.Preferably, the glass raw material combining step combines the glass raw materials so as not to substantially contain BaO.
또한 바람직하게는, 상기 유리 제조 방법에 의해 제조된 무알칼리 유리는, 밀도가 2.55 g/cm3 미만이고, 열팽창 계수가 3.0×10-6/K ~ 4.5×10-6/K이며, 점도 102dPas에서의 온도가 1600℃ 미만이고, 또한/또는 점도 104dPas에서의 온도가 1250℃ 미만이다.Also preferably, the alkali free glass produced by the glass manufacturing method has a density of less than 2.55 g / cm 3 , a thermal expansion coefficient of 3.0 × 10 −6 / K to 4.5 × 10 −6 / K, and a viscosity of 10 The temperature at 2 dPas is less than 1600 ° C and / or the temperature at viscosity 10 4 dPas is less than 1250 ° C.
본 발명에 의하면, 알칼리 금속 산화물 성분이 실질적으로 포함되어 있지 않은 무알칼리 유리가 제공된다.According to this invention, the alkali free glass which does not contain the alkali metal oxide component substantially is provided.
특히, 본 발명의 일 실시예에 의하면, 밀도가 낮은 무알칼리 유리가 제공될 수 있다. 따라서, 면적이 넓은 유리 기판이라 하더라도 자체 중량에 의한 휨 현상을 감소시킬 수 있어, TV나 모니터와 같은 디스플레이 장치의 대형화 추세에 부응할 수 있다. 뿐만 아니라, 유리 기판이 사용되는 휴대전화나 노트북 등과 같은 소형 휴대용 장치의 경우에도 그 중량을 감소시킬 수 있어, 휴대성이 향상될 수 있다.In particular, according to one embodiment of the present invention, a low density alkali free glass may be provided. Therefore, even in a glass substrate having a large area, it is possible to reduce the warping phenomenon due to its own weight, thereby meeting the trend of increasing the size of display devices such as TVs and monitors. In addition, even in the case of a small portable device such as a mobile phone or a notebook using a glass substrate, the weight can be reduced, so that portability can be improved.
또한, 본 발명의 일 실시예에 의하면, 점도 102dPas에서의 온도인 T2가 낮아 유리의 용융성이 좋아질 수 있으며, 점도 104dPas에서의 온도인 T4가 낮아 유리의 가공 온도를 낮춤으로써 유리의 가공이 용이해질 수 있다. 또한, 이와 같이 유리의 용융 온도 및 가공 온도를 낮출 수 있으므로, 유리의 용융 및 가공을 위해 소요되는 에너지나 시간 등을 절감할 수 있다. In addition, according to an embodiment of the present invention, the T2, which is a temperature at a viscosity of 10 2 dPas, may be lowered, thereby improving the meltability of the glass, and the T4, which is a temperature at a viscosity of 10 4 dPas, is lowered, thereby lowering the processing temperature of the glass. Processing can be facilitated. In addition, since the melting temperature and processing temperature of the glass can be lowered in this way, the energy, time, etc. required for melting and processing the glass can be reduced.
그리고, 본 발명의 일 실시예에 의하면, 열팽창 계수가 낮은 무알칼리 유리가 제공될 수 있다. 따라서, TFT-LCD와 같은 평판 디스플레이 장치의 제조 공정 중에 유리가 다양한 열처리 환경에 노출되더라도, 열수축이나 변형, 휨, 깨짐 등의 현상이 발생하는 것을 방지할 수 있다. 또한, 이러한 무알칼리 유리의 열팽창 계수는 TFT 재료의 열팽창 계수와 유사함으로써 화소 피치가 어긋남으로 인해 발생하는 표시 불량 등을 효과적으로 방지할 수 있다.And, according to an embodiment of the present invention, an alkali free glass having a low coefficient of thermal expansion may be provided. Therefore, even if the glass is exposed to various heat treatment environments during the manufacturing process of the flat panel display device such as the TFT-LCD, it is possible to prevent the phenomenon such as heat shrinkage, deformation, warpage, and cracking. In addition, the thermal expansion coefficient of the alkali free glass is similar to the thermal expansion coefficient of the TFT material, thereby effectively preventing display defects and the like caused by the pixel pitch shifting.
그러므로, 본 발명에 따른 무알칼리 유리의 경우, 액정 디스플레이(LCD)나 PDP, 유기 EL 디스플레이와 같은 평판 디스플레이용 기판에 이용되는 것이 보다 바람직하다.Therefore, in the case of the alkali free glass which concerns on this invention, it is more preferable to be used for flat panel displays, such as a liquid crystal display (LCD), a PDP, and an organic electroluminescent display.
본 명세서에 첨부되는 다음의 도면은 본 발명의 바람직한 실시예를 예시하는 것이며, 후술하는 발명의 상세한 설명과 함께 본 발명의 기술사상을 더욱 이해시키는 역할을 하는 것이므로, 본 발명은 그러한 도면에 기재된 사항에만 한정되어 해석되어서는 아니 된다.The following drawings, which are attached to this specification, illustrate exemplary embodiments of the present invention, and together with the detailed description of the present invention, serve to further understand the technical spirit of the present invention. It should not be construed as limited to.
도 1은, 본 발명의 일 실시예에 따른 무알칼리 유리 제조 방법을 개략적으로 나타내는 흐름도이다.1 is a flowchart schematically showing a method for producing an alkali free glass according to an embodiment of the present invention.
이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시예를 상세히 설명하기로 한다. 이에 앞서, 본 명세서 및 청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정해서 해석되어서는 아니되며, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야만 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. Prior to this, terms or words used in the specification and claims should not be construed as having a conventional or dictionary meaning, and the inventors should properly explain the concept of terms in order to best explain their own invention. Based on the principle that can be defined, it should be interpreted as meaning and concept corresponding to the technical idea of the present invention.
따라서, 본 명세서에 기재된 실시예는 본 발명의 가장 바람직한 일 실시예에 불과할 뿐이고 본 발명의 기술적 사상에 모두 대변하는 것은 아니므로, 본 출원시점에 있어서 이들을 대체할 수 있는 다양한 균등물과 변형예들이 있을 수 있음을 이해하여야 한다.Therefore, the embodiments described herein are only the most preferred embodiments of the present invention and do not represent all of the technical idea of the present invention, and various equivalents and modifications that may substitute them at the time of the present application may be used. It should be understood that there may be.
본 발명에 따른 유리는, 알칼리 금속 산화물을 실질적으로 함유하지 않는 무알칼리 유리이다. 여기서, 알칼리 금속 산화물을 실질적으로 함유하지 않는다는 것은, 유리 중에 알칼리 금속 산화물이 전혀 포함되어 있지 않거나, 일부 포함되어 있더라도 다른 성분에 비해 그 함유량이 극히 미미하여 유리의 조성 성분으로 무시할 수 있을 정도의 양을 포함한 경우 등을 의미한다. 예를 들어, Li2O, Na2O 및 K2O와 같은 알칼리 금속 산화물이 유리 조성 성분으로 0.2 중량% 이하 함유된 경우, 알칼리 금속 산화물이 실질적으로 함유되어 있지 않다고 할 수 있다.The glass which concerns on this invention is an alkali free glass which does not contain an alkali metal oxide substantially. Here, substantially free of an alkali metal oxide means that the content of the alkali metal oxide is not included in the glass at all, or even partially contained, so that its content is extremely small compared to the other components and can be neglected as a composition component of the glass. If so, it means. For example, when an alkali metal oxide such as Li 2 O, Na 2 O and K 2 O is contained in an amount of 0.2 wt% or less as the glass composition component, it can be said that the alkali metal oxide is not substantially contained.
본 발명에 따른 무알칼리 유리는, SiO2, B2O3, Al2O3, MgO, CaO 및 SrO를 조성 성분으로 포함한다.The alkali-free glass according to the present invention include SiO 2, B 2 O 3, Al 2 O 3, MgO, CaO , and SrO in the composition components.
특히, 본 발명에 따른 무알칼리 유리는, SiO2를 산화물 기준 중량% 표시로 61~73% 함유할 수 있다. SiO2는 유리를 형성하는 네트워크 구조 생성체 산화물로서, 유리의 화학적 내성을 증가시키고, 적절한 열팽창률을 가지도록 하는데 기여할 수 있다. 하지만, SiO2가 지나치게 높게 함유되는 경우 열팽창 계수가 지나치게 낮아지고 유리의 실투 특성이 나빠질 수 있다. 반면, SiO2가 지나치게 낮게 함유되는 경우 화학적 내성이 감소되고 밀도가 커지며, 열팽창 계수가 커지고 변형점이 저하될 수 있다. 따라서, 본 발명에 따른 무알칼리 유리는, 61~73 중량%의 SiO2를 포함한다. 바람직하게는, 상기 SiO2는 64~72 중량% 함유되는 것이 좋다. 더욱 바람직하게는, 상기 SiO2는 66~71 중량% 함유되는 것이 좋다.In particular, alkali-free glass according to the invention may contain 61-73% of SiO 2 as an oxide based on weight percentages. SiO 2 is a network structure oxide that forms glass and may contribute to increasing the chemical resistance of the glass and to having an adequate coefficient of thermal expansion. However, when SiO 2 is contained too high, the coefficient of thermal expansion may be too low and the devitrification characteristics of the glass may be deteriorated. On the other hand, when SiO 2 is contained too low, the chemical resistance may decrease, the density may increase, the coefficient of thermal expansion may increase, and the strain point may decrease. Accordingly, the alkali-free glass according to the present invention include SiO 2 for 61-73% by weight. Preferably, the SiO 2 is preferably contained 64 to 72% by weight. More preferably, the SiO 2 is preferably contained 66 to 71% by weight.
또한, 본 발명에 따른 무알칼리 유리는, B2O3를 산화물 기준 중량% 표시로 0.5~3.9% 함유할 수 있다. B2O3는 유리의 네트워크 구조 생성체 산화물로서, 유리의 용해 반응성을 좋게 하고, 열팽창 계수를 작게 하며, 실투성을 향상시키고 내BHF성과 같은 화학적 내성을 좋게 하며, 밀도를 낮추는데 기여할 수 있다. 하지만, B2O3가 지나치게 높게 함유되는 경우 유리의 내산성이 떨어질 수 있고, 밀도가 높아지며 변형점이 낮아져 내열성이 열화될 수 있다. 반면, B2O3가 지나치게 낮게 함유되는 경우 첨가 효과가 제대로 달성되기 어렵다. 따라서, 본 발명에 따른 무알칼리 유리는, 0.5~3.9 중량%의 B2O3를 포함한다. 바람직하게는, 상기 B2O3는 1~3.9 중량% 함유되는 것이 좋다. 더욱 바람직하게는, 상기 B2O3는 3~3.9 중량% 함유되는 것이 좋다.Further, the alkali-free glass according to the invention may contain 0.5 ~ 3.9% of B 2 O 3 as oxides based on weight percentages. B 2 O 3 is a network structure oxide of glass, which can contribute to improving the dissolution reactivity of the glass, reducing the coefficient of thermal expansion, improving the devitrification, improving chemical resistance such as BHF resistance, and lowering the density. However, when B 2 O 3 is contained too high, the acid resistance of the glass may be lowered, the density may be increased, and the strain point may be lowered, thereby deteriorating heat resistance. On the other hand, when B 2 O 3 is contained too low, the effect of addition is difficult to achieve properly. Accordingly, the alkali-free glass, comprising 0.5 to 3.9% by weight of B 2 O 3 in accordance with the present invention. Preferably, the B 2 O 3 is preferably contained 1 to 3.9% by weight. More preferably, the B 2 O 3 It is preferably contained 3 to 3.9% by weight.
또한, 본 발명에 따른 무알칼리 유리는, Al2O3를 산화물 기준 중량% 표시로 3.5~13.5% 함유할 수 있다. Al2O3는 유리의 고온 점도, 화학 안정성, 내열충격성 등을 증가시키며 변형점 및 영률 등을 높이는데 기여할 수 있다. 하지만, Al2O3가 지나치게 높게 함유되는 경우 실투 특성, 내염산성 및 내BHF성을 떨어뜨리고 점도를 증가시킬 수 있다. 반면, Al2O3가 지나치게 낮게 함유되는 경우, 그 첨가 효과가 제대로 달성되기 어렵고 탄성 계수가 낮아질 수 있다. 따라서, 본 발명에 따른 무알칼리 유리는, 3.5~13.5 중량%의 Al2O3를 포함한다. 바람직하게는, 상기 Al2O3는 4~12 중량% 함유되는 것이 좋다. 더욱 바람직하게는, 상기 Al2O3는 4~9 중량% 함유되는 것이 좋다.Further, the alkali-free glass according to the invention may contain 3.5 ~ 13.5%, an Al 2 O 3 as oxides based on weight percentages. Al 2 O 3 increases the high temperature viscosity, chemical stability, thermal shock resistance and the like of the glass and may contribute to increase the strain point and Young's modulus. However, when Al 2 O 3 is contained too high, it is possible to reduce the devitrification characteristics, hydrochloric acid resistance and BHF resistance and increase the viscosity. On the other hand, when Al 2 O 3 is contained too low, its addition effect is difficult to achieve properly and the elastic modulus may be low. Accordingly, the alkali-free glass, comprising 3.5 ~ 13.5% by weight of Al 2 O 3 in accordance with the present invention. Preferably, Al 2 O 3 is preferably contained 4 to 12% by weight. More preferably, the Al 2 O 3 is preferably contained 4 to 9% by weight.
여기서, 본 발명에 따른 무알칼리 유리는, SiO2 및 Al2O3의 합계 함유량인 SiO2+Al2O3를 72~79 중량% 함유하는 것이 좋다. 이러한 농도 범위에서 SiO2 및 Al2O3의 함유 효과가 보다 향상될 수 있고, 열팽창 계수 및 실투 특성 등의 저하가 방지될 수 있기 때문이다.Here, the alkali-free glass according to the present invention, it is preferable to contain an SiO 2 + Al 2 O 3 the total content of SiO 2 and Al 2 O 3 72 ~ 79% by weight. This is because the effect of containing SiO 2 and Al 2 O 3 can be further improved in such a concentration range, and deterioration of the thermal expansion coefficient and devitrification characteristics can be prevented.
또한, 본 발명에 따른 무알칼리 유리는, MgO를 산화물 기준 중량% 표시로 9~13% 함유할 수 있다. MgO는 알칼리 토금속 산화물로서, 열팽창 계수를 높이지 않으며, 변형점을 크게 저하시키지 않고 용융성을 향상시키는데 기여할 수 있다. 특히, MgO는 유리의 밀도를 감소시킬 수 있어, 유리의 경량화에 크게 기여할 수 있다. 하지만, MgO가 지나치게 높게 함유되는 경우, 유리의 실투 특성이 저하되고, 내산성 및 내BHF성이 떨어질 수 있다. 반면, MgO가 지나치게 낮게 함유되는 경우 상술한 MgO 첨가 특성을 달성하기 어렵다. 따라서, 본 발명에 따른 무알칼리 유리는 9~13 중량%의 MgO를 포함한다. 바람직하게는, 상기 MgO는 9.5~12 중량% 함유되는 것이 좋다. 더욱 바람직하게는, 상기 MgO는 10~11 중량% 함유되는 것이 좋다.In addition, the alkali free glass which concerns on this invention can contain 9 to 13% of MgO by oxide-based weight% display. MgO is an alkaline earth metal oxide and does not increase the coefficient of thermal expansion and can contribute to improving meltability without significantly lowering the strain point. In particular, MgO can reduce the density of the glass, which can greatly contribute to the weight reduction of the glass. However, when MgO is contained too high, the devitrification characteristic of glass may fall, and acid resistance and BHF resistance may fall. On the other hand, when MgO is contained too low, it is difficult to achieve the above-mentioned MgO addition characteristic. Thus, the alkali free glass according to the present invention comprises 9 to 13% by weight of MgO. Preferably, the MgO is preferably contained in 9.5 to 12% by weight. More preferably, the MgO is contained 10 to 11% by weight.
또한, 본 발명에 따른 무알칼리 유리는, CaO를 산화물 기준 중량% 표시로 1~8% 함유할 수 있다. CaO는 MgO와 마찬가지로 알칼리 토금속 산화물로서, 밀도와 열팽창 계수를 낮추고 변형점을 크게 저하시키지 않으며 용융성을 향상시키는데 기여할 수 있다. 하지만, CaO가 지나치게 높게 함유되는 경우, 밀도 및 열팽창 계수가 커질 수 있고 내BHF성과 같은 내화학성을 떨어뜨릴 수 있다. 반면, CaO가 지나치게 낮게 함유되는 경우, 상술한 CaO의 첨가로 인한 특성 향상 효과를 제대로 달성하기 어렵다. 따라서, 본 발명에 따른 무알칼리 유리는 1~8 중량%의 CaO를 포함한다. 바람직하게는, 상기 CaO는 4~8 중량% 함유되는 것이 좋다. 더욱 바람직하게는, 상기 CaO는 5~7.5 중량% 함유되는 것이 좋다.In addition, the alkali free glass which concerns on this invention can contain CaO 1 to 8% by an oxide reference weight% display. CaO, like MgO, is an alkaline earth metal oxide that can contribute to lowering the density and coefficient of thermal expansion, not significantly reducing the strain point, and improving meltability. However, when CaO is contained too high, the density and the coefficient of thermal expansion can be large and the chemical resistance such as BHF resistance can be degraded. On the other hand, when CaO is contained too low, the characteristic improvement effect by addition of CaO mentioned above is hard to achieve correctly. Therefore, the alkali free glass according to the present invention contains 1 to 8% by weight of CaO. Preferably, the CaO is preferably contained 4 to 8% by weight. More preferably, the CaO is contained 5 to 7.5% by weight.
또한, 본 발명에 따른 무알칼리 유리는, SrO를 산화물 기준 중량% 표시로 4~10% 함유할 수 있다. SrO는 알칼리 토금속 산화물로서, 유리의 실투 특성 및 내산성의 향상에 기여할 수 있다. 하지만, SrO가 지나치게 높게 함유되는 경우, 열팽창 계수나 밀도가 상승할 수 있고, 실투 특성이 열화될 수 있다. 반면, SrO가 지나치게 낮게 함유되는 경우, 상술한 바와 같은 SrO의 첨가 효과가 제대로 달성되기 어렵다. 따라서, 본 발명에 따른 무알칼리 유리는 4~10 중량%의 SrO를 포함한다. 바람직하게는, 상기 SrO는 4~8 중량% 함유되는 것이 좋다. 더욱 바람직하게는, 상기 SrO는 4~6 중량% 함유되는 것이 좋다.In addition, the alkali free glass which concerns on this invention can contain 4-10% of SrO by the oxide basis weight% display. SrO is an alkaline earth metal oxide and can contribute to improvement of the devitrification property and acid resistance of glass. However, when SrO is contained too high, the coefficient of thermal expansion or density may increase, and devitrification characteristics may deteriorate. On the other hand, when SrO is contained too low, the effect of adding SrO as described above is difficult to be properly achieved. Thus, the alkali free glass according to the present invention comprises 4 to 10% by weight of SrO. Preferably, the SrO is preferably contained 4 to 8% by weight. More preferably, the SrO is preferably contained 4 to 6% by weight.
여기서, 본 발명에 따른 무알칼리 유리는, MgO, CaO 및 SrO의 합계 함유량인 MgO+CaO+SrO를 15~26 중량% 함유하는 것이 좋다. 이러한 농도 범위에서 알칼리 토금속 산화물들의 함유 효과가 향상될 수 있고, 실투 특성도 떨어지지 않을 수 있기 때문이다. 더욱 바람직하게는, 상기 MgO+CaO+SrO는 17~24 중량%인 것이 좋다. 가장 바람직하게는, 상기 MgO+CaO+SrO는 19~22 중량%인 것이 좋다.Here, it is preferable that the alkali free glass which concerns on this invention contains 15-26 weight% of MgO + CaO + SrO which is a total content of MgO, CaO, and SrO. This is because the effect of containing alkaline earth metal oxides in this concentration range can be improved, and the devitrification property may not be degraded. More preferably, the MgO + CaO + SrO is preferably 17 to 24% by weight. Most preferably, the MgO + CaO + SrO is 19 to 22% by weight.
바람직하게는, 본 발명에 따른 무알칼리 유리는, BaO를 실질적으로 함유하지 않을 수 있다. BaO는 내약품성이나 실투 특성을 향상시키는 역할을 할 수 있으나, 유리의 밀도를 크게 하고 또한 환경면에서 바람직하지 않다. 본 발명의 일 실시예에 따른 무알칼리 유리의 경우, 이러한 BaO를 함유하지 않으므로, 유리의 밀도를 낮추고 보다 친환경적인 유리의 제조가 가능하다.Preferably, the alkali free glass according to the present invention may be substantially free of BaO. BaO may play a role of improving chemical resistance and devitrification characteristics, but it is not preferable in terms of increasing the density of glass and environmentally. In the case of the alkali-free glass according to an embodiment of the present invention, since it does not contain such BaO, it is possible to lower the density of the glass and to manufacture more environmentally friendly glass.
또한 바람직하게는, 본 발명에 따른 무알칼리 유리는 밀도가 2.55 g/cm3 미만일 수 있다. 이러한 실시예에 의하면, 유리의 밀도가 낮아 유리 제품의 경량화를 달성하는데 용이할 수 있다. 특히, 유리가 적용되는 장치의 대형화로 유리의 면적이 점차 증가하고 있는 상황에서, 유리의 밀도가 낮아지면 유리의 자체 하중에 의한 휨 현상을 줄이고, 유리가 적용된 장치의 무게를 줄일 수 있다. 또한, 소형 휴대용 기기나 장치에 대해서도 유리 자체의 무게를 낮출 수 있어, 휴대성을 향상시킬 수 있다.Also preferably, the alkali free glass according to the present invention may have a density of less than 2.55 g / cm 3 . According to this embodiment, the density of the glass may be low and it may be easy to achieve the weight reduction of the glass article. In particular, in a situation where the glass area is gradually increased due to the enlargement of the apparatus to which the glass is applied, when the density of the glass is lowered, it is possible to reduce the warpage phenomenon due to the glass's own load and to reduce the weight of the apparatus to which the glass is applied. In addition, the weight of the glass itself can also be reduced for small portable devices and devices, thereby improving portability.
또한 바람직하게는, 본 발명에 따른 무알칼리 유리는, 열팽창 계수(CTE; Coefficinet of Thermal Expansion)가 3.0×10-6/K ~ 4.5×10-6/K 일 수 있다. 이러한 실시예에 의하면, 열팽창 계수가 낮아 내열충격성이 우수하다. 따라서, 유리 기판에 다양한 열처리 공정이 반복적으로 수행되더라도 열수축이나 휨, 변형과 같은 문제점이 일어나는 것을 막을 수 있다. 뿐만 아니라, 이러한 열팽창 계수는 TFT 재료와의 열팽창 계수와 유사하므로, 본 발명에 따른 유리를 이용하여 TFT-LCD 제조시 TFT 재료와 열팽창차로 인한 표시 불량 등이 생기는 것을 방지할 수 있다.Also preferably, the alkali free glass according to the present invention may have a coefficient of thermal expansion (CTE) of 3.0 × 10 −6 / K to 4.5 × 10 −6 / K. According to this embodiment, the thermal expansion coefficient is low, and the thermal shock resistance is excellent. Therefore, even if various heat treatment processes are repeatedly performed on the glass substrate, problems such as heat shrinkage, warpage, and deformation can be prevented from occurring. In addition, since the thermal expansion coefficient is similar to that of the TFT material, it is possible to prevent display defects due to the TFT material and the thermal expansion difference and the like during TFT-LCD manufacture using the glass according to the present invention.
또한 바람직하게는, 본 발명에 따른 무알칼리 유리는, 점도 102dPas에서의 온도인 T2가 1600℃ 미만일 수 있다. 더욱 바람직하게는, 본 발명에 따른 무알칼리 유리는, 점도 102dPas에서의 온도인 T2가 1550℃ 미만일 수 있다. 이러한 실시예에 의하면, 유리의 용융(융해) 온도와 관련된 T2가 낮기 때문에 유리의 용융성이 좋아질 수 있고, 유리를 용융시키는데 소요되는 에너지 및 시간을 줄일 수 있다. 따라서, 유리 제품의 생산성을 향상시키고 제조 비용을 낮추는데 기여할 수 있다.Also preferably, in the alkali free glass according to the present invention, T 2, which is a temperature at a viscosity of 10 2 dPas, may be less than 1600 ° C. More preferably, the alkali-free glass according to the present invention, the temperature of T 2 in the viscosity can be less than 10 2 dPas 1550 ℃. According to this embodiment, since the T 2 associated with the melting (melting) temperature of the glass is low, the melting property of the glass can be improved, and the energy and time required to melt the glass can be reduced. Thus, it can contribute to improving the productivity of the glass product and lowering the manufacturing cost.
또한 바람직하게는, 본 발명에 따른 무알칼리 유리는, 점도 104dPas에서의 온도인 T4가 1250℃ 미만일 수 있다. 더욱 바람직하게는, 본 발명에 따른 무알칼리 유리는, 점도 104dPas에서의 온도인 T4가 1240℃ 미만일 수 있다. 이러한 실시예에 의하면, 유리의 가공 온도와 관련된 T4가 낮기 때문에 유리의 가공이 용이해질 수 있으며, 유리를 가공하는데 들어가는 에너지 및 시간을 절감할 수 있다.Also preferably, in the alkali free glass according to the present invention, T 4, which is a temperature at a viscosity of 10 4 dPas, may be less than 1250 ° C. More preferably, the alkali free glass according to the present invention may have a T 4 of a temperature at a viscosity of 10 4 dPas of less than 1240 ° C. According to this embodiment, since the T 4 associated with the processing temperature of the glass is low, the processing of the glass can be facilitated, and energy and time required for processing the glass can be saved.
본 발명에 따른 디스플레이 장치는, 상술한 무알칼리 유리를 포함할 수 있다. 이를테면, 본 발명에 따른 디스플레이 장치는 유리 기판을 포함하되, 이러한 유리 기판은 무알칼리 유리 기판으로서, 산화물 기준 중량% 표시로, SiO2 61~73%, B2O3 0.5~3.9%, Al2O3 3.5~13.5%, MgO 9~13%, CaO 1~8%, SrO 4~10%를 함유하고, 알칼리 금속 산화물을 실질적으로 함유하지 않는다. 더욱이, 이러한 무알칼리 유리 기판은 BaO를 실질적으로 함유하지 않을 수 있고, 밀도는 2.55 g/cm3 미만일 수 있으며, 열팽창 계수는 3.0 ~ 4.5 [×10-6/K] 일 수 있다. 또한, 이러한 무알칼리 유리 기판은 T2가 1600℃ 미만이고, T4가 1250℃ 미만일 수 있다.The display device according to the present invention may include the alkali-free glass described above. For example, the display device according to the present invention includes a glass substrate, but the glass substrate is an alkali-free glass substrate, expressed in terms of weight percent of oxide, SiO 2 61-73%, B 2 O 3 0.5-3.9%, Al 2 O 3 3.5 ~ 13.5%, MgO containing 9 ~ 13%, CaO 1 ~ 8%, SrO 4 ~ 10% , and does not substantially free of alkali metal oxide. Moreover, such an alkali free glass substrate may be substantially free of BaO, the density may be less than 2.55 g / cm 3 , and the coefficient of thermal expansion may be 3.0 to 4.5 [× 10 −6 / K]. In addition, such an alkali free glass substrate may have a T 2 of less than 1600 ° C and a T 4 of less than 1250 ° C.
특히, 본 발명에 따른 디스플레이 장치는, 액정 디스플레이(LCD) 장치인 것이 바람직하다. 즉, TFT-LCD와 같은 액정 디스플레이 장치는 유리 기판(패널)을 포함하는데, 이러한 유리 기판은 상술한 조성 및 물성을 가질 수 있다. 다만, 본 발명에 따른 디스플레이 장치는 이러한 LCD 장치 이외에도, PDP 장치와 같은 다양한 디스플레이 장치를 포함할 수 있다.In particular, the display device according to the present invention is preferably a liquid crystal display (LCD) device. That is, a liquid crystal display device such as a TFT-LCD includes a glass substrate (panel), which may have the composition and physical properties described above. However, the display device according to the present invention may include various display devices such as a PDP device in addition to the LCD device.
이하, 본 발명의 바람직한 실시예에 따른 상술한 무알칼리 유리를 제조하는 방법을 설명한다.Hereinafter, a method for producing the above-mentioned alkali free glass according to a preferred embodiment of the present invention will be described.
도 1은, 본 발명의 일 실시예에 따른 무알칼리 유리의 제조 방법을 개략적으로 나타내는 흐름도이다.1 is a flowchart schematically showing a method for producing an alkali free glass according to an embodiment of the present invention.
도 1을 참조하면, 먼저 유리에 함유되는 각 성분의 원료를 목표 조성이 되도록 조합한다(S110). 이때, 상기 S110 단계에서는, 알칼리 금속 산화물 성분이 실질적으로 포함되지 않고, 산화물 기준 중량% 표시로 SiO2가 61~73%, B2O3가 0.5~3.9%, Al2O3가 3.5~13.5%, MgO가 9~13%, CaO가 1~8%, SrO가 4~10% 포함되도록 원료 성분을 조합한다. 바람직하게는, 상기 S110 단계는 SiO2가 64~72%, B2O3가 1~3.9%, Al2O3가 4~12%, MgO가 9.5~12%, CaO가 4~8%, SrO가 4~8% 포함되도록 원료 성분을 조합한다. 더욱 바람직하게는, 상기 S110 단계는 SiO2가 66~71%, B2O3가 3~3.9%, Al2O3가 4~9%, MgO가 10~11%, CaO가 5~7.5%, SrO가 4~6% 포함되도록 원료 성분을 조합한다. 또한, 상기 S110 단계는, MgO+CaO+SrO가 15~26 중량% 함유되도록 원료 성분을 조합할 수 있다. 더욱 바람직하게는, 상기 S110 단계는, MgO+CaO+SrO가 17~24 중량% 함유되도록 원료 성분을 조합한다. 가장 바람직하게는, 상기 S110 단계는, MgO+CaO+SrO가 19~22 중량% 함유되도록 원료 성분을 조합한다.Referring to Figure 1, first, the raw materials of the respective components contained in the glass are combined to be the target composition (S110). At this time, in the step S110, the alkali metal oxide component is substantially not included, SiO 2 61-73%, B 2 O 3 0.5-3.9%, Al 2 O 3 3.5-13.5 in terms of the oxide-based weight% display %, MgO is 9-13%, CaO is 1-8%, SrO 4-10% is combined so that the raw material components are combined. Preferably, in the step S110, SiO 2 is 64 to 72%, B 2 O 3 is 1 to 3.9%, Al 2 O 3 is 4 to 12%, MgO is 9.5 to 12%, CaO is 4 to 8%, Combine the raw materials so that SrO is contained 4-8%. More preferably, the S110 step is SiO 2 66 ~ 71%, B 2 O 3 3 ~ 3.9%, Al 2 O 3 4 ~ 9%, MgO 10 ~ 11%, CaO 5 ~ 7.5% Combine the raw materials so that SrO is contained 4-6%. In addition, in the step S110, MgO + CaO + SrO may be combined with the raw material components to contain 15 to 26% by weight. More preferably, in step S110, the raw material components are combined to contain 17 to 24% by weight of MgO + CaO + SrO. Most preferably, the step S110, the raw material components are combined to contain 19 to 22% by weight of MgO + CaO + SrO.
한편, 이러한 유리 원료 성분에는 BaO를 실질적으로 함유하지 않도록 하는 것이 좋다.On the other hand, it is good not to contain BaO substantially in such glass raw material components.
다음으로, 이와 같이 조합된 유리 원료를 소정 온도로, 이를테면 1500~1600℃로 가열하여 유리 원료를 용융하고(S120), 용융된 유리를 성형한다(S130). 이때, 상기 S130 단계는 플로트 배스(float bath)를 이용하는 플로트(float) 법에 의해 수행될 수 있으나, 본 발명이 반드시 이러한 성형 방식에 의해 한정되는 것은 아니다. 예를 들어, 상기 S130 단계, 즉 유리의 성형 단계는 다운드로우(down draw) 방식이나 퓨전 방식에 의해 수행될 수도 있다.Next, the glass raw material thus combined is heated to a predetermined temperature, for example, 1500-1600 ° C. to melt the glass raw material (S120), and the molten glass is molded (S130). In this case, step S130 may be performed by a float method using a float bath, but the present invention is not necessarily limited to such a molding method. For example, the step S130, that is, the shaping of the glass may be performed by a down draw method or a fusion method.
이와 같이 S130 단계에서 유리가 성형되면, 성형된 유리는 서냉로로 이송되어 서냉되는 과정을 거치게 된다(S140). 그리고 나서, 서냉된 유리는 원하는 크기로 절단되어, 연마 등의 가공이 더 수행되고, 이러한 일련의 과정을 통해 유리 제품으로 제조될 수 있다.As such, when the glass is molded in step S130, the molded glass is subjected to a slow cooling process is transferred to a slow cooling furnace (S140). The annealed glass is then cut to the desired size, and further processing such as polishing can be performed and made into a glass article through this series of processes.
상술한 바와 같이, 본 발명의 일 실시예에 따른 유리 제조 방법에 의해 제조된 무알칼리 유리는, 그 밀도가 2.55 g/cm3 미만일 수 있다. 그리고, 제조된 무알칼리 유리의 열팽창 계수는 3.0 ~ 4.5 [×10-6/K] 일 수 있다. 또한, 이와 같이 제조된 무알칼리 유리는 T2가 1600℃ 미만이고, T4가 1250℃ 미만일 수 있다. 더욱 바람직하게는, 본 발명에 따른 유리 제조 방법에 의해 제조된 무알칼리 유리는 T2가 1550℃ 미만이고, T4가 1240℃ 미만일 수 있다.As described above, the alkali-free glass produced by the glass manufacturing method according to an embodiment of the present invention, the density may be less than 2.55 g / cm 3 . And the thermal expansion coefficient of the produced alkali free glass may be 3.0-4.5 [* 10 <-6> / K]. In addition, the alkali free glass produced as described above may have a T 2 of less than 1600 ° C and a T 4 of less than 1250 ° C. More preferably, the alkali free glass produced by the glass manufacturing method according to the present invention may have a T 2 of less than 1550 ° C. and a T 4 of less than 1240 ° C.
이하, 본 발명을 보다 구체적으로 설명하기 위해 실시예 및 비교예를 들어 상세하게 설명하기로 한다. 다만, 본 발명에 따른 실시예는 여러 가지 다른 형태로 변형될 수 있으며, 본 발명의 범위가 아래에서 상술하는 실시예에 한정되는 것으로 해석되어져서는 안 된다. 본 발명의 실시예는 당업계에서 평균적인 지식을 가진 자에게 본 발명을 보다 완전하게 설명하기 위해서 제공되어지는 것이다.Hereinafter, the present invention will be described in detail with reference to Examples and Comparative Examples. However, the embodiment according to the present invention may be modified in various other forms, and the scope of the present invention should not be construed as being limited to the embodiments described below. The embodiments of the present invention are provided to more completely explain the present invention to those skilled in the art.
표 1은 본 발명에 따른 실시예의 유리 조성 및 물성을 나타내고, 표 2는 이러한 실시예와 비교하기 위한 비교예의 유리 조성 및 물성을 나타낸다.Table 1 shows the glass composition and physical properties of the examples according to the present invention, Table 2 shows the glass composition and physical properties of the comparative example for comparison with these examples.
실시예EXAMPLE
각 성분의 원료를 표 1에 나타낸 바와 같은 조성(중량% 기준)이 되도록 조합하고, 백금 도가니를 사용하여 1600℃의 온도에서 3시간 가열하여 융융시켰다. 용융시에는 백금 스터러(stirrer)를 삽입하고 1시간 교반하여 유리를 균질화하였다. 이어서 용융 유리를 730℃에서 서냉하여 각 실시예의 유리를 얻었다. 한편, 얻어진 유리에 대해서는 형광 X선 분석을 통해 그 조성을 확인하였다.The raw material of each component was combined so that it might become a composition (weight-% basis) as shown in Table 1, and it heated and fuse | melted for 3 hours at the temperature of 1600 degreeC using the platinum crucible. At the time of melting, a platinum stirrer was inserted and stirred for 1 hour to homogenize the glass. Next, the molten glass was slowly cooled at 730 ° C to obtain the glass of each example. In addition, about the obtained glass, the composition was confirmed through the fluorescent X-ray analysis.
또한, 각 실시예 유리에 대한 물성으로서, 밀도, 열팽창 계수, T2 및 T4를 다음과 같은 방법으로 측정하여, 그 결과를 표 1에 나타내었다.In addition, as physical properties for each Example glass, density, thermal expansion coefficient, T 2 and T 4 were measured by the following method, and the results are shown in Table 1.
(밀도)(density)
각 실시예 유리에 대하여, 아르키메데스법을 사용하여 밀도를 측정하였다.About each Example glass, the density was measured using the Archimedes method.
(열팽창 계수)(CTE)(Coefficient of Thermal Expansion) (CTE)
각 실시예 유리에 대하여, 딜라토미터를 사용하여 평균 열팽창 계수를 측정하였다.About each Example glass, the average coefficent of thermal expansion was measured using the dilatometer.
(T2)(T 2 )
각 실시예 유리에 대하여, 고온 점도계를 사용하여 점도를 측정하고, 점도가 102 dPa·s가 될 때의 온도 T2를 측정하였다. 이때, 온도가 1600℃ 이상인 경우에는 Vogel-Fulcher-Tammann 식으로부터 계산을 통해서 구하였다.For each example the glass, and measuring the viscosity by using a high-temperature viscometer to measure the temperature T 2 at the time the viscosity to be 10 2 dPa · s. At this time, when the temperature is 1600 ℃ or more was calculated through the calculation from the Vogel-Fulcher-Tammann equation.
(T4)(T 4 )
각 실시예 유리에 대하여, 고온 점도계를 사용하여 점도를 측정하고, 점도가 104 dPa·s가 될 때의 온도 T4를 측정하였다.For each example of glass, using a high-temperature viscometer to measure the viscosity was measured the temperature T 4 at the time the viscosity to be 10 4 dPa · s.
비교예Comparative example
각 성분의 원료를 표 2에 나타낸 바와 같은 조성(중량% 기준)이 되도록 조합하고 백금 도가니를 사용하여 1600~1800℃의 온도에서 3시간 가열하여 용융시켰다. 용융시에는 백금 스터러를 삽입하고 1시간 교반하여 유리를 균질화하였다. 이어서 용융 유리를 730℃에서 서냉하여 각 비교예의 유리를 얻었다.The raw materials of each component were combined so as to have a composition (based on weight percent) as shown in Table 2, and heated and melted at a temperature of 1600 to 1800 ° C. for 3 hours using a platinum crucible. At the time of melting, a platinum stirrer was inserted and stirred for 1 hour to homogenize the glass. Subsequently, the molten glass was slowly cooled at 730 ° C to obtain the glass of each comparative example.
또한, 각 비교예 유리에 대한 물성으로서, 상기 실시예와 마찬가지 방식으로 밀도, 열팽창 계수, T2 및 T4를 측정하여, 그 결과를 표 2에 나타내었다.Further, as physical properties of each glass comparative examples, the above-described embodiment and measuring the density, the thermal expansion coefficient, T 2 and T 4 in the same way, the results are shown in Table 2.
표 1
Figure PCTKR2012007014-appb-T000001
Table 1
Figure PCTKR2012007014-appb-T000001
표 2
Figure PCTKR2012007014-appb-T000002
TABLE 2
Figure PCTKR2012007014-appb-T000002
표 1 및 표 2에 기재된 바와 같이, 실시예(실시예 1~10)의 유리에 대해서는, 밀도가 2.55 g/cm3 미만이고, 평균 열팽창 계수(CTE)가 3.0~4.5(×10-6/K)인 것이 확인되었다. 또한, 실시예의 유리의 경우, T2가 1600℃ 미만이고 T4가 1250℃ 미만으로 확인되었다.As shown in Table 1 and Table 2, for the glass in Examples (Examples 1 to 10), the density was less than 2.55 g / cm 3 , and the average thermal expansion coefficient (CTE) was 3.0 to 4.5 (× 10 −6 / K) was confirmed. In the case of the embodiment of the glass, T 2 is less than 1600 ℃ and T 4 have been confirmed to be less than 1250 ℃.
그에 반해, 비교예(비교예 1~11)의 유리에 대해서는, 실시예에 비해, 밀도, 평균 열팽창 계수, T2 및/또는 T4가 높은 것으로 측정되었다.On the other hand, in Comparative Examples (Comparative Examples 1 to 11), was determined to be a high density, the average coefficient of thermal expansion, T 2 and / or T 4, compared with the embodiment for the glass.
따라서, 이러한 실시예와 비교예의 비교 결과를 통해 볼 때, 본 발명에 의할 경우, 특성이 우수한 유리, 특히 디스플레이용 기판 유리로서 특성이 우수한 유리를 얻을 수 있다는 것을 알 수 있다. 또한, 본 발명에 따른 유리는 T2 및 T4가 낮아 유리의 용융성이 우수하고 유리의 가공이 용이해질 수 있을 뿐만 아니라, 가공이나 용융 공정 중 소요되는 에너지 및 시간 등이 절감될 수 있음을 알 수 있다.Therefore, it can be seen from the comparative results of these examples and the comparative example that, according to the present invention, it is possible to obtain glass having excellent properties, particularly glass having excellent properties as a substrate glass for display. In addition, the glass according to the present invention has a low T 2 and T 4 is excellent in the meltability of the glass and can be easily processed, as well as energy and time required during the processing or melting process can be reduced. Able to know.
이상과 같이, 본 발명은 비록 한정된 실시예와 도면에 의해 설명되었으나, 본 발명은 이것에 의해 한정되지 않으며 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자에 의해 본 발명의 기술사상과 아래에 기재될 특허청구범위의 균등범위 내에서 다양한 수정 및 변형이 가능함은 물론이다.As described above, although the present invention has been described by way of limited embodiments and drawings, the present invention is not limited thereto and is intended by those skilled in the art to which the present invention pertains. Of course, various modifications and variations are possible within the scope of equivalents of the claims to be described.

Claims (20)

  1. 산화물 기준 중량% 표시로,In terms of weight percent oxide,
    SiO2 61~73%;SiO 2 61-73%;
    B2O3 0.5~3.9%;B 2 O 3 0.5-3.9%;
    Al2O3 3.5~13.5%;Al 2 O 3 3.5-13.5%;
    MgO 9~13%;MgO 9-13%;
    CaO 1~8%; 및CaO 1-8%; And
    SrO 4~10%SrO 4 ~ 10%
    를 함유하고, 알칼리 금속 산화물을 실질적으로 함유하지 않는 것을 특징으로 하는 무알칼리 유리.And an alkali metal oxide substantially free of alkali free glass.
  2. 제1항에 있어서,The method of claim 1,
    BaO를 실질적으로 함유하지 않는 것을 특징으로 하는 무알칼리 유리.Alkali-free glass, which is substantially free of BaO.
  3. 제1항에 있어서,The method of claim 1,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    SiO2 64~72%;SiO 2 64-72%;
    B2O3 1~3.9%;B 2 O 3 1-3.9%;
    Al2O3 4~12%;Al 2 O 3 4-12%;
    MgO 9.5~12%;MgO 9.5-12%;
    CaO 4~8%; 및CaO 4-8%; And
    SrO 4~8%SrO 4 ~ 8%
    를 함유하는 것을 특징으로 하는 무알칼리 유리.An alkali free glass comprising a.
  4. 제1항에 있어서,The method of claim 1,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    MgO+CaO+SrO 15~26%MgO + CaO + SrO 15 ~ 26%
    를 함유하는 것을 특징으로 하는 무알칼리 유리.An alkali free glass comprising a.
  5. 제1항에 있어서,The method of claim 1,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    MgO+CaO+SrO 17~24%MgO + CaO + SrO 17 ~ 24%
    를 함유하는 것을 특징으로 하는 무알칼리 유리.An alkali free glass comprising a.
  6. 제1항에 있어서,The method of claim 1,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    SiO2+Al2O3 72~79%SiO 2 + Al 2 O 3 72 ~ 79%
    를 함유하는 것을 특징으로 하는 무알칼리 유리.An alkali free glass comprising a.
  7. 제1항에 있어서,The method of claim 1,
    밀도가 2.55 g/cm3 미만이고, 열팽창 계수가 3.0×10-6/K ~ 4.5×10-6/K인 것을 특징으로 하는 무알칼리 유리.An alkali free glass having a density of less than 2.55 g / cm 3 and a coefficient of thermal expansion of 3.0 × 10 −6 / K to 4.5 × 10 −6 / K.
  8. 제1항에 있어서,The method of claim 1,
    점도 102dPas에서의 온도가 1600℃ 미만이고, 점도 104dPas에서의 온도가 1250℃ 미만인 것을 특징으로 하는 무알칼리 유리.An alkali free glass, wherein the temperature at a viscosity of 10 2 dPas is less than 1600 ° C and the temperature at a viscosity of 10 4 dPas is less than 1250 ° C.
  9. 제1항에 있어서,The method of claim 1,
    점도 102dPas에서의 온도가 1550℃ 미만이고, 점도 104dPas에서의 온도가 1240℃ 미만인 것을 특징으로 하는 무알칼리 유리.The alkali free glass characterized by the temperature in viscosity 10 2 dPas being less than 1550 degreeC, and the temperature in viscosity 10 4 dPas being less than 1240 degreeC.
  10. 제1항 내지 제9항 중 어느 한 항에 따른 무알칼리 유리를 포함하는 디스플레이 장치.A display device comprising the alkali free glass according to any one of claims 1 to 9.
  11. 제10항에 있어서,The method of claim 10,
    상기 디스플레이 장치는 액정 디스플레이 장치인 것을 특징으로 하는 디스플레이 장치.And the display device is a liquid crystal display device.
  12. 산화물 기준 중량% 표시로,In terms of weight percent oxide,
    SiO2 61~73%;SiO 2 61-73%;
    B2O3 0.5~3.9%;B 2 O 3 0.5-3.9%;
    Al2O3 3.5~13.5%;Al 2 O 3 3.5-13.5%;
    MgO 9~13%;MgO 9-13%;
    CaO 1~8%; 및CaO 1-8%; And
    SrO 4~10%SrO 4 ~ 10%
    를 함유하고, 알칼리 금속 산화물을 실질적으로 함유하지 않도록 유리 원료를 조합하는 단계를 포함하는 것을 특징으로 하는 무알칼리 유리 제조 방법.And a step of combining the glass raw materials so as to contain substantially no alkali metal oxides.
  13. 제12항에 있어서,The method of claim 12,
    상기 유리 원료 조합 단계는 BaO를 실질적으로 함유하지 않도록 하는 것을 특징으로 하는 무알칼리 유리 제조 방법.The glass raw material combining step is a method for producing an alkali-free glass, characterized in that it contains substantially no BaO.
  14. 제12항에 있어서,The method of claim 12,
    상기 유리 원료 조합 단계는,The glass raw material combination step,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    SiO2 64~72%;SiO 2 64-72%;
    B2O3 1~3.9%;B 2 O 3 1-3.9%;
    Al2O3 4~12%;Al 2 O 3 4-12%;
    MgO 9.5~12%;MgO 9.5-12%;
    CaO 4~8%; 및CaO 4-8%; And
    SrO 4~8%SrO 4 ~ 8%
    를 함유하도록 하는 것을 특징으로 하는 무알칼리 유리 제조 방법.An alkali free glass production method characterized by containing a.
  15. 제12항에 있어서,The method of claim 12,
    상기 유리 원료 조합 단계는,The glass raw material combination step,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    MgO+CaO+SrO 15~26%MgO + CaO + SrO 15 ~ 26%
    를 함유하도록 하는 것을 특징으로 하는 무알칼리 유리 제조 방법.An alkali free glass production method characterized by containing a.
  16. 제12항에 있어서,The method of claim 12,
    상기 유리 원료 조합 단계는,The glass raw material combination step,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    MgO+CaO+SrO 17~24%MgO + CaO + SrO 17 ~ 24%
    를 함유하도록 하는 것을 특징으로 하는 무알칼리 유리 제조 방법.An alkali free glass production method characterized by containing a.
  17. 제12항에 있어서,The method of claim 12,
    상기 유리 원료 조합 단계는,The glass raw material combination step,
    산화물 기준 중량% 표시로,In terms of weight percent oxide,
    SiO2+Al2O3 72~79%SiO 2 + Al 2 O 3 72 ~ 79%
    를 함유하도록 하는 것을 특징으로 하는 무알칼리 유리 제조 방법.An alkali free glass production method characterized by containing a.
  18. 제12항에 있어서,The method of claim 12,
    제조된 유리의 밀도가 2.55 g/cm3 미만이고, 제조된 유리의 열팽창 계수가 3.0×10-6/K ~ 4.5×10-6/K인 것을 특징으로 하는 무알칼리 유리 제조 방법.The density of the produced glass is less than 2.55 g / cm 3 , the thermal expansion coefficient of the produced glass is 3.0 × 10 -6 / K ~ 4.5 × 10 -6 / K characterized in that the alkali-free glass production method.
  19. 제12항에 있어서,The method of claim 12,
    제조된 유리의 점도 102dPas에서의 온도가 1600℃ 미만이고, 제조된 유리의 점도 104dPas에서의 온도가 1250℃ 미만인 것을 특징으로 하는 무알칼리 유리 제조 방법.The temperature at viscosity 10 2 dPas of the produced glass is less than 1600 ° C, and the temperature at viscosity 10 4 dPas of the produced glass is less than 1250 ° C.
  20. 제12항에 있어서,The method of claim 12,
    제조된 유리의 점도 102dPas에서의 온도가 1550℃ 미만이고, 제조된 유리의 점도 104dPas에서의 온도가 1240℃ 미만인 것을 특징으로 하는 무알칼리 유리 제조 방법.A method for producing an alkali free glass, wherein the temperature at the viscosity 10 2 dPas of the produced glass is less than 1550 ° C., and the temperature at the viscosity 10 4 dPas of the glass is less than 1240 ° C.
PCT/KR2012/007014 2011-09-02 2012-08-31 Alkali-free glass and method for manufacturing same WO2013032290A2 (en)

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CN201280042857.9A CN103781735B (en) 2011-09-02 2012-08-31 Non-alkali glass and preparation method thereof
US14/055,412 US8962502B2 (en) 2011-09-02 2013-10-16 Alkali-free glass and preparation thereof

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010070025A (en) * 1999-08-21 2001-07-25 게르하르트 암라인, 루드비히 비르스 Alkali-free aluminoborosilicate glass, and uses thereof
JP2005172881A (en) * 2003-12-08 2005-06-30 Nippon Electric Glass Co Ltd Substrate for liquid crystal display
US20090129061A1 (en) * 2007-11-21 2009-05-21 Jorg Fechner Alkali-free aluminoborosilicate glasses for lighting means with external or internal contacting
JP2010047477A (en) * 2009-12-01 2010-03-04 Asahi Glass Co Ltd Method for clarifying alkali-free glass
KR100994095B1 (en) * 2003-12-26 2010-11-12 아사히 가라스 가부시키가이샤 No alkali glass, method for production thereof and liquid crystalline display panel
JP2011121841A (en) * 2009-12-14 2011-06-23 Nippon Electric Glass Co Ltd Method for manufacturing glass sheet

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010070025A (en) * 1999-08-21 2001-07-25 게르하르트 암라인, 루드비히 비르스 Alkali-free aluminoborosilicate glass, and uses thereof
JP2005172881A (en) * 2003-12-08 2005-06-30 Nippon Electric Glass Co Ltd Substrate for liquid crystal display
KR100994095B1 (en) * 2003-12-26 2010-11-12 아사히 가라스 가부시키가이샤 No alkali glass, method for production thereof and liquid crystalline display panel
US20090129061A1 (en) * 2007-11-21 2009-05-21 Jorg Fechner Alkali-free aluminoborosilicate glasses for lighting means with external or internal contacting
JP2010047477A (en) * 2009-12-01 2010-03-04 Asahi Glass Co Ltd Method for clarifying alkali-free glass
JP2011121841A (en) * 2009-12-14 2011-06-23 Nippon Electric Glass Co Ltd Method for manufacturing glass sheet

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