WO2013032289A2 - Alkali-free glass and method for manufacturing same - Google Patents

Alkali-free glass and method for manufacturing same Download PDF

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Publication number
WO2013032289A2
WO2013032289A2 PCT/KR2012/007013 KR2012007013W WO2013032289A2 WO 2013032289 A2 WO2013032289 A2 WO 2013032289A2 KR 2012007013 W KR2012007013 W KR 2012007013W WO 2013032289 A2 WO2013032289 A2 WO 2013032289A2
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glass
alkali
according
free
method
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PCT/KR2012/007013
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French (fr)
Korean (ko)
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WO2013032289A3 (en
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이동권
방정식
김상국
임원배
김수환
김다정
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주식회사 엘지화학
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Priority to KR20110089046 priority Critical
Priority to KR10-2011-0089046 priority
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to KR1020120096358A priority patent/KR101384743B1/en
Priority to KR10-2012-0096358 priority
Priority claimed from JP2014528290A external-priority patent/JP5806406B2/en
Publication of WO2013032289A2 publication Critical patent/WO2013032289A2/en
Publication of WO2013032289A3 publication Critical patent/WO2013032289A3/en

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • C03C3/076Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

Abstract

Disclosed are a structure for alkali-free glass which does not comprise alkali metal oxides, and a method for manufacturing such glass. The alkali-free glass according to the present invention contains 46-57% SiO2, 3.5-7.5% B2O3, 21-29% Al2O3, 3-14% MgO, 11-16% CaO, and 1-5% SrO, in terms of weight % of oxides, and does not substantially contain alkali metal oxides.

Description

The alkali-free glass and a method of manufacturing the same

This application claims priority to an application for the Korea Patent Application No. 10-2012-0096358 filed with the Korea Patent Application No. 10-2011-0089046 and No. 31 August 2012, filed dated 2 September 2011 , all contents disclosed in the specification and drawings of that application are incorporated in this application by reference.

The present invention relates to glass manufacturing techniques, and more particularly relates to a method of producing an alkali-free glass compositions and such glass contains no alkali metal oxide.

Glass, flat glass plates (flat glass) among them is the window glass, such as a window screen, a mirror of a vehicle, and is used in various fields, the type also being used are very variously developed according to the application.

In particular, flat panel displays such as LCD and PDP, the organic EL device, the non-alkali glass substrate is widely used. For alkali metal oxide, an alkali glass substrate containing component, since the alkali metal ions in the glass substrate can degrade the film properties is diffused in the thin film, as for the display has been widely used rather than a non-alkali glass-alkali glass.

However, such a case of a glass substrate for a flat panel display, there is a need for a variety of product characteristics.

For example, for a glass for a flat panel display, the weight is to be secured. In particular, in recent years, going a display device such as TV or monitor is gradually enlarged, becoming also increases the area of ​​the glass substrates used therein. In this case, since the number is even greater warpage of the glass substrate due to a load of the glass substrate itself, it is necessary to manufacture the glass substrate so as to have a lighter weight in order to prevent this. Further, such a glass substrate is may be used for small portable display devices such as mobile phones or PDP, a laptop, a weight reduction of the glass substrate is required to increase the portability even when.

In addition, it should be the case of glass for a flat panel display substrate is appropriate melting property (melting properties) obtained. If it is the melting property of the glass decreases, as well as also the energy and time required for melting of the glass increases, it is easy to defects such as bubbles or foreign materials generated in the glass. And, this air bubble or foreign matter in the glass, such as may be due to hinder the transmission of light, a significant loss of quality as a glass for a display apparatus.

In the case of a glass substrate for a flat panel display, to be obtained in heat resistance. For example, in the manufacturing process of flat panel display devices such as TFT-LCD it may be performed a variety of heat treatment processes, in the process, the glass substrate may be exposed to rapid heating and rapid cooling environment. If in such a situation, that the heat resistance is not secured to the glass, may lead to deformation and warpage of the glass, a glass substrate may be broken due to the tensile stress due to heat. Furthermore, in the case of a glass for TFT-LCD, if the heat resistance is low and a difference of thermal expansion material and a pixel pitch of TFT blossomed TFT can slip out, thereby may cause a display failure.

Therefore, the invention as an object to light and a good melting ability to provide a non-alkali glass and a method of manufacturing an easy to process designed to solve the above problems.

It may be understood by the following description of Other objects and advantages of the present invention will be appreciated more clearly by the embodiment of the present invention. Also, the objects and advantages of the invention will be readily appreciated that this can be realized by the means as claimed and combinations thereof.

Glass according to the present invention for achieving the above object is, in a non-alkali glass, an oxide based on weight percentages, SiO 2 46 ~ 57%; B 2 O 3 3.5 ~ 7.5% ; Al 2 O 3 21 ~ 29% ; MgO 3 ~ 14%; CaO 11 ~ 16%; SrO and containing 1 to 5%, and does not substantially free of alkali metal oxide.

Preferably, the alkali-free glass, contains no BaO substantially.

Also, preferably, the alkali-free glass has a density of less than 2.6 g / cm 3, the thermal expansion coefficient is 3.2 × 10 -6 / K ~ 4.2 × 10 -6, and / K, a temperature at viscosity 10 2 dPas 1550 ℃ is less than a, and / or a viscosity of 10 4 temperature is less than 1230 dPas at ℃.

In addition, the display device according to the present invention for achieving the above object, includes the above-described glass.

Preferably, the display device is a liquid crystal display device.

In addition, the glass production process according to the present invention for achieving the above object is a method for producing an alkali-free glass, oxide-based weight percentages, SiO 2 46 ~ 57%; B 2 O 3 3.5 ~ 7.5% ; Al 2 O 3 21 ~ 29% ; MgO 3 ~ 14%; CaO 11 ~ 16%; And a step of SrO containing 1 to 5%, and a combination of a glass material substantially not containing the alkali metal oxide.

Preferably, the glass raw material combination step combines the glass materials not containing BaO substantially.

In addition, preferably, the alkali-free glass is manufactured by the glass-making method, a density of less than 2.6 g / cm 3, a thermal expansion coefficient of 3.2 × 10 -6 / K ~ 4.2 × 10 -6 / K, viscosity 10 2, and the temperature is less than 1550 dPas at ℃, the addition / or viscosity 10 4 temperature is less than 1230 dPas at ℃.

According to the present invention, the alkali-free alkali metal oxide component is not substantially contained in, is provided.

In particular, according to one embodiment of the invention, may be provided with a non-alkaline glass has a low density. Therefore, even in a wide area of ​​the glass substrate, it is possible to reduce the warpage by its own weight, it is possible to meet the trend of large-sized display device such as a TV or a monitor. In addition, it is possible to reduce the weight even in the case of small portable devices, such as a glass substrate, a mobile phone or a laptop that is used can be improved portability.

Further, according to one embodiment of the present invention, can improve the melting property of the glass, the temperature of T 2 on the viscosity of 10 2 dPas low, and the viscosity lowering the processing temperature of the glass temperature of T 4 is lower in the 10 4 dPas the process by which the glass can be facilitated. In addition, since this way can lower the melting temperature and working temperature of the glass, it is possible to save energy and time and the like required for the melting and processing of the glass.

And, according to one embodiment of the invention, the thermal expansion coefficient may be provided with a low non-alkali glass. Therefore, even when the glass is exposed to various thermal processing environment in the manufacturing process of flat panel display devices such as TFT-LCD, it is possible to prevent the phenomenon of thermal shrinkage and deformation, warping, cracking occurs. In addition, these non-thermal expansion coefficients of alkali-free glass may be a pixel pitch of effectively preventing display failure such as resulting from the deviation, by analogy to the thermal expansion coefficient of a TFT material.

Therefore, in the case of alkali-free glass according to the present invention, it is more preferable to be used in a substrate for a flat panel display such as a liquid crystal display (LCD) or PDP, an organic EL display.

Following figures attached to this specification is intended to illustrate preferred embodiments of the present invention, the components which serve to further understand the spirit of the invention and together with the description of which will be described later invention, the details of this invention is described in such figures be construed as limited only is not.

1 is a flow chart schematically showing the method for producing an alkali-free glass according to one embodiment of the present invention.

With reference to the accompanying drawings will be described a preferred embodiment of the present invention; Prior to this, the specification and are should not be construed as limited to the term general and dictionary meanings used in the claims, the inventor accordingly the concept of a term to describe his own invention in the best way It interpreted based on the meanings and concepts corresponding to technical aspects of the present invention on the basis of the principle that can be defined.

Thus, embodiments described herein are various equivalents and modifications that can be made, not intended to in the technical idea of ​​the present invention merely nothing but a preferable embodiment of the invention, made thereto according to the application time point were it should be understood that there may be.

Glass in accordance with the present invention, the alkali-free glass containing substantially no alkali metal oxide. Here, it does not substantially free of alkali metal oxide, or it is not an alkali metal oxide is contained at all in the glass, even if a part including the content thereof is extremely mimihayeo compared to the other components amount to the extent that can be ignored in the proportion component of the glass It refers to such cases, including. For example, it may be said Li 2 O, Na 2 O and K 2 O as alkali metal oxide is not contained in the alkali metal oxide is substantially, if contained more than 0.2% by weight, the glass composition components such.

The alkali-free glass according to the present invention include SiO 2, B 2 O 3, Al 2 O 3, MgO, CaO , and SrO in the composition components.

In particular, alkali-free glass according to the invention may contain 46-57% of SiO 2 as an oxide based on weight percentages. SiO 2 may serve to create a network structure body oxide to form the glass, and increase the chemical resistance of glass, so as to have an appropriate coefficient of thermal expansion. However, when the SiO 2 containing too high a thermal expansion coefficient is too low it can cause poor devitrification property of the glass. On the other hand, it grows and has chemical resistance is reduced when the density of the SiO 2 contained too low, increasing the thermal expansion coefficient can be lowered strain point. Accordingly, the alkali-free glass, comprising the SiO 2 of 46 ~ 57% by weight according to the present invention. Preferably, the SiO 2 is preferably contained in 49-54% by weight. More preferably, the SiO 2 is preferably contained in 50-53% by weight.

Further, the alkali-free glass according to the invention may contain 3.5 ~ 7.5% of B 2 O 3 as oxides based on weight percentages. B 2 O 3 may serve as a network structure produced body oxide of glass, improve the dissolution reactivity of the glass, and decrease the coefficient of thermal expansion, improving the seal teeming and and improve the chemical resistance of the BHF performance, to lower the density. However, B, and the acid resistance of glass may deteriorate if the containing too high 2 O 3, to increase the amount density can be low transformation point deteriorated in heat resistance. On the other hand, if the B 2 O 3 contained is too low it can be less, such as resistance to melting property and the transmission loss of the glass. Accordingly, the alkali-free glass, comprising 3.5 ~ 7.5 wt% of B 2 O 3 in accordance with the present invention. Preferably, the B 2 O 3 is preferably contained 4-6% by weight.

Further, the alkali-free glass according to the invention may contain 21-29% of Al 2 O 3 as oxides based on weight percentages. Al 2 O 3 may contribute to enhance the like increases the high temperature viscosity of the glass, the chemical stability, thermal shock resistance, such as the strain point and the Young's modulus. However, when the Al 2 O 3 containing too high dropping the devitrification property, the hydrochloric acid resistance and the BHF resistance can increase the viscosity. On the other hand, when the Al 2 O 3 contained is too low, it is possible to lower the elastic modulus. Accordingly, the alkali-free glass comprises Al 2 O 3 of 21-29% by weight according to the present invention. Preferably, the Al 2 O 3 is preferably contained in 25-29% by weight. More preferably, the Al 2 O 3 is preferably contained in 26-29% by weight.

Here, the alkali-free glass according to the present invention, preferably containing SiO 2 and Al 2 O 3 the total content of SiO 2 + Al 2 O 3 of 74-83% by weight. In this concentration range it can be improved than the containing effect of SiO 2 and Al 2 O 3, because the deterioration of the devitrification property, such as thermal expansion coefficient and can be prevented.

Further, the alkali-free glass according to the present invention, it is the MgO in oxide-based weight percentages may contain 3-14%. MgO is an alkaline earth metal oxide, it does not increase the thermal expansion coefficient, and can contribute to lowering the transformation point without significantly improve the melting property. In particular, MgO may contribute it is possible to reduce the density of glass, larger in weight of the glass. However, when MgO is contained too high, the devitrification property of the glass is lowered and the acid resistance may be deteriorated and the BHF resistance. On the other hand, when MgO is contained is too low, it is difficult to achieve the above-mentioned MgO added characteristics. Accordingly, the alkali-free glass according to the present invention comprises 3 to 14% by weight MgO. Preferably, the MgO is preferably contained 3-8% by weight. More preferably, the MgO is preferably contained 3-5% by weight.

Further, the alkali-free glass according to the invention may contain 11-16% of CaO in oxide-based weight percentages. CaO is an alkaline earth oxide as with MgO, to lower the density and thermal expansion coefficient does not significantly degrade the strain point can contribute to improve the melting property. However, when CaO is contained too high, it can increase the density and thermal expansion coefficient, and can degrade the chemical resistance and the BHF like. On the other hand, when CaO is contained excessively low, it is difficult to properly achieve the characteristic improvement effect by the addition of the above-mentioned CaO. Accordingly, the alkali-free glass according to the present invention comprises CaO 11 to 16% by weight. Preferably, the CaO may be contained 11-14% by weight. More preferably, the CaO is preferably contained 11 to 12% by weight.

Further, the alkali-free glass according to the invention may contain 1 to 5% of SrO as oxide basis weight percentages. SrO is an alkaline earth metal oxide, it can contribute to the improvement of the devitrification property and the acid resistance of the glass. However, in the case where SrO is containing too high, and the coefficient of thermal expansion and density can be increased, the devitrification property may be deteriorated. On the other hand, when SrO are contained too low, it is difficult to properly achieve the effect of addition of SrO as described above. Accordingly, the alkali-free glass according to the present invention include 1-5% by weight of SrO. Preferably, the SrO is preferably contained 1-3% by weight. More preferably, the SrO is preferably contained 1-2% by weight.

Here, the alkali-free glass according to the present invention, MgO, preferably containing CaO and the total content of MgO + CaO + SrO of 15 ~ 23% by weight of SrO. And at such a concentration range the effect of containing the alkaline earth metal oxide can be improved, because it can not fall devitrification property. More preferably, the MgO + CaO + SrO is preferably of 16 ~ 21% by weight. Most preferably, the MgO + CaO + SrO is preferably of 17-19% by weight.

Preferably, the alkali-free glass according to the present invention can be free of substantially free of BaO. BaO but may serve to increase the chemical resistance and devitrification property, increasing the density of the glass and is not preferable from the environmental aspect. For the alkali-free glass according to one embodiment of the present invention, does not contain such BaO, it is possible to manufacture the environmentally friendly glass lower than the density of the glass.

Also preferably, the alkali-free glass according to the present invention may be less than a density of 2.6 g / cm 3. According to this aspect, it is easy to achieve a weight reduction of the glass product, the density of the glass decreases. In particular, it is possible in a situation in which the area of ​​the glass gradually increases with increase in size of the device to be applied to the glass, the density of the glass decreases, reducing the warpage due to the own weight of the glass, to reduce the weight of the device is applied to the glass. In addition, it is possible to reduce the weight of the glass itself, even for small portable devices, or device, it is possible to improve the portability.

In addition, preferably, the alkali-free glass according to the present invention, thermal expansion coefficients, can be a (CTE Coefficinet of Thermal Expansion) is 3.2 × 10 -6 / K ~ 4.2 × 10 -6 / K. According to this embodiment, the thermal expansion coefficient and excellent thermal shock resistance is lowered. Therefore, even if a variety of heat treatment processes to the glass substrate repeatedly carried out can be prevented a problem such as heat shrinking or bending, deformation occurs. Further, such a thermal expansion coefficient can be prevented and it is because the thermal expansion coefficient of a TFT material, using a glass according to the invention is produced, such as TFT-LCD manufacture of TFT display defect material and owing to differential thermal expansion.

In addition, preferably, the alkali-free glass according to the present invention, the temperature of T 2 in the viscosity can be less than 10 2 dPas 1550 ℃. More preferably, the alkali-free glass according to the present invention, the temperature of T 2 in the viscosity can be less than 10 2 dPas 1510 ℃. According to this embodiment, since the T 2 associated with the melting (melting) temperature of the glass is low, and can improve the melting property of the glass, it is possible to reduce the energy and time required to melt the glass. Therefore, it can contribute to improve the productivity of glass and lowering the manufacturing cost.

In addition, preferably, the alkali-free glass according to the present invention, the viscosity 10 4, the temperature of T 4 in dPas be less than 1230 ℃. More preferably, the alkali-free glass according to the present invention, the temperature of T 4 at the viscosity 10 4 dPas may be less than 1210 ℃. According to this embodiment, may be due to a T 4 associated with the processing temperature of the glass is low, and the machining of the glass can be facilitated, saving energy and time in processing into the glass.

Display device in accordance with the present invention, may include the above-mentioned non-alkali glass. For example, the display device according to the invention comprising a glass substrate, such a glass substrate with a non-alkali glass substrate, an oxide based on weight percentages, SiO 2 46 ~ 57%, B 2 O 3 3.5 ~ 7.5%, Al 2 O 3 21 ~ 29%, MgO 3 ~ 14%, CaO 11 ~ 16%, SrO containing 1 to 5%, and does not substantially free of alkali metal oxide. Furthermore, this alkali-free glass substrate can not be free of BaO substantially, and the density was 2.6 g / cm 3 may be less than, the thermal expansion coefficient may be 3.2 ~ 4.2 [× 10 -6 / K]. In addition, such an alkali-free glass substrate is less than T 2 is 1550 ℃, it may be less than T 4 is 1230 ℃.

In particular, the display device according to the present invention is preferably a liquid crystal display (LCD) device. That is, the liquid crystal display device such as a TFT-LCD may include a glass substrate (panel), such a glass substrate may have the above-mentioned composition and physical properties. However, the display device according to the invention In addition to these LCD devices, may include a variety of display devices such as PDP devices.

Hereinafter, the method for producing the above-mentioned alkali-free glass according to an embodiment of the present invention.

1 is a flowchart schematically showing the manufacturing method of the alkali-free glass according to one embodiment of the present invention.

1, are combined so that the target composition of a raw material of each component contained in the first glass (S110). At this time, in the S110 step, with no alkali metal oxide component is not substantially contained, the oxide basis weight percentages SiO 2 is 46 ~ 57%, B 2 O 3 is 3.5 ~ 7.5%, Al 2 O 3 is 21-29 %, MgO is 3 ~ 14%, CaO is 11-16%, the combination of ingredients that contains SrO 1-5%. Preferably, the S110 step is SiO 2 is 49 ~ 54%, B 2 O 3 is 4-6%, the Al 2 O 3 25 ~ 29% , MgO has 3 ~ 8%, CaO is 11-14%, the combination of ingredients that contains SrO 1-3%. More preferably, the S110 step is SiO 2 50 to 53%, the Al 2 O 3 26 ~ 29% , MgO is 3 ~ 5%, CaO is 11-12%, the raw material so that SrO is included 1-2% the combination of the components. In addition, the step S110, the MgO + CaO + SrO is possible to combine the ingredients to contain 15 ~ 23% by weight. More preferably, the step S110, the MgO + CaO + SrO is a combination of ingredients that contains 16 ~ 21% by weight. Most preferably, the step S110, the MgO + CaO + SrO and combinations of ingredients that contain 17-19% by weight.

On the other hand, such a glass raw material component, it is desirable not to contain BaO substantially.

Next, this a combination of glass raw material at a predetermined temperature, such as, for example, heated to 1500 ~ 1600 ℃ melt and (S120), forming the molten glass to a glass raw material (S130). In this case, the step S130 is not intended to be performed by a float (float) method using the float bath (float bath), but the present invention be limited by such a molding method. For example, the step S130, that is, the molding step of the glass may be carried out by the draw-down (down draw) method or a fusion method.

Once this way the glass is molded in the step S130, the shaped glass is subjected to a process of slow cooling is transferred to a slow cooling (S140). Then, the glass gradual cooling may be made as of glass is cut into a desired size, a processing such as polishing is further carried out through such a series of processes.

As described above, the alkali-free glass produced by the method for producing glass according to one embodiment of the present invention is that the density can be 2.6 g / cm 3 below. Then, the thermal expansion coefficient of the resulting alkali-free glass can be 3.2 ~ 4.2 [× 10 -6 / K]. Further, the thus prepared non-alkali glass is a T 2 of less than 1550 ℃, may be less than T 4 is 1230 ℃. More preferably, the alkali-free glass produced by the glass production process according to the present invention is a T 2 of less than 1510 ℃, may be less than T 4 is 1210 ℃.

It will be described below in Examples and Comparative Examples in detail to illustrate the present invention more specifically. However, embodiments according to the present invention can be modified in many different forms and is not to be in the range of the present invention is construed as being limited to the embodiments set forth herein. Embodiment of the invention that are provided in order to explain the present invention to those skilled in the art more fully.

Table 1 shows the embodiment of the glass composition and physical properties in accordance with the invention, Table 2 shows the comparative example, the glass composition and physical properties for comparison with this embodiment.

Example

Combined so that a composition (wt% basis) as shown the material of the respective components in Table 1, using a platinum crucible melt was heated for 3 hours at a temperature of 1600 ℃. At the time of melting a platinum stirrer was inserted (stirrer) and homogenized with a glass stirring for 1 hour. Then obtain a glass of each example by slow cooling from the molten glass 730 ℃. On the other hand, its composition was confirmed by fluorescent X ray analysis for the obtained glass.

Further, as physical properties for each example of glass, by measuring the density, the thermal expansion coefficient, T 2 and T 4 in the following manner, the results are shown in Table 1.

(density)

For each example of glass, using the Archimedes method to measure the density.

(CTE) (CTE)

For each example of glass, using a Dilatometer meter measured the average thermal expansion coefficient.

(T 2)

For each example the glass, and measuring the viscosity by using a high-temperature viscometer to measure the temperature T 2 at the time the viscosity to be 10 2 dPa · s. At this time, there was obtained through the calculation from the Vogel-Fulcher-Tammann equation is not less than a temperature 1600 ℃.

(T 4)

For each example of glass, using a high-temperature viscometer to measure the viscosity was measured the temperature T 4 at the time the viscosity to be 10 4 dPa · s.

Comparative Example

The composition as described in which the raw materials are represented by the respective components shown in Table 2 (weight% basis) were combined and heated 3 hours to melt at a temperature of 1600 ~ 1700 ℃ using a platinum crucible to be. Upon melting has been inserted into a platinum stirrer to homogenize the glass and stirred for 1 hour. Then, each of the comparative example was obtained by slow cooling of the molten glass in a glass 730 ℃.

Further, as physical properties of each glass comparative examples, the above-described embodiment and measuring the density, the thermal expansion coefficient, T 2 and T 4 in the same way, the results are shown in Table 2.

Table 1

Figure PCTKR2012007013-appb-T000001

Table 2

Figure PCTKR2012007013-appb-T000002

As shown in Table 1 and Table 2, Examples (Examples 1 to 11) for the glass, a density of less than 2.6 g / cm 3, an average coefficient of thermal expansion (CTE) is 3.2 ~ 4.2 (× 10 -6 / it is K) was confirmed. In the case of the embodiment of the glass, T 2 is less than 1550 ℃ and T 4 have been confirmed to be less than 1230 ℃. In particular, it was confirmed that a more desirable embodiment of the composition according to the range for example 7 to 11, these characteristics more excellent.

On the other hand, comparative examples (Comparative Examples 1 to 12), it was confirmed that a high density, the average coefficient of thermal expansion, T 2 and / or T 4, compared with the embodiment for the glass.

Thus, when viewed through such an embodiment and a comparative example comparing results, it can be seen that the invention if of a, a characteristic can be obtained an excellent glass, glass having excellent properties as a glass substrate for a particular display. Further, that the glass according to the present invention, T 2 and T 4 can be the melting property of the lower glass excellent in reducing not only the machining of the glass can be facilitated, such as energy and time during processing or melt processing Able to know.

As it described above, but it should be understood that the detailed description and specific examples, the invention is not limited thereto under the technical scope of the present invention by one of ordinary skill in the art various modifications and variations within the equivalent scope of the claims to be described is possible as a matter of course.

Claims (20)

  1. An oxide based on weight percentages,
    SiO 2 46 ~ 57%;
    B 2 O 3 3.5 ~ 7.5% ;
    Al 2 O 3 21 ~ 29% ;
    MgO 3 ~ 14%;
    CaO 11 ~ 16%; And
    SrO 1 ~ 5%
    Containing and non-alkali glass, it characterized in that that is substantially free of alkali metal oxide.
  2. According to claim 1,
    That containing no BaO is substantially alkali-free glass according to claim.
  3. According to claim 1,
    An oxide based on weight percentages,
    SiO 2 49 ~ 54%;
    B 2 O 3 4 ~ 6% ;
    Al 2 O 3 25 ~ 29% ;
    MgO 3 ~ 8%;
    CaO 11 ~ 14%; And
    SrO 1 ~ 3%
    The alkali-free glass comprising a.
  4. According to claim 1,
    An oxide based on weight percentages,
    MgO + CaO + SrO 15 ~ 23%
    The alkali-free glass comprising a.
  5. According to claim 1,
    An oxide based on weight percentages,
    MgO + CaO + SrO 16 ~ 21%
    The alkali-free glass comprising a.
  6. According to claim 1,
    An oxide based on weight percentages,
    SiO 2 + Al 2 O 3 74 ~ 83%
    The alkali-free glass comprising a.
  7. According to claim 1,
    A density of less than 2.6 g / cm 3, a thermal expansion coefficient of the non-alkali glass, characterized in that 3.2 × 10 -6 / K ~ 4.2 × 10 -6 / K.
  8. According to claim 1,
    2, and the viscosity 10 dPas at a temperature of less than 1550 ℃, non-alkali glass, characterized in that the temperature at the viscosity 10 4 dPas of less than 1230 ℃.
  9. According to claim 1,
    2, and the viscosity 10 dPas at a temperature of less than 1510 ℃, non-alkali glass, characterized in that the temperature at the viscosity 10 4 dPas of less than 1210 ℃.
  10. The display device including the alkali-free glass according to any one of the preceding claims.
  11. 11. The method of claim 10,
    The display device is a display device, characterized in that the liquid crystal display device.
  12. An oxide based on weight percentages,
    SiO 2 46 ~ 57%;
    B 2 O 3 3.5 ~ 7.5% ;
    Al 2 O 3 21 ~ 29% ;
    MgO 3 ~ 14%;
    CaO 11 ~ 16%; And
    SrO 1 ~ 5%
    Containing and non-alkali glass manufacturing method comprising the steps of: combining a glass material substantially not containing the alkali metal oxide to.
  13. 13. The method of claim 12,
    The glass raw material combination step is an alkali-free glass manufacturing method characterized in that it does not contain BaO substantially.
  14. 13. The method of claim 12,
    The glass raw material combination comprises:
    An oxide based on weight percentages,
    SiO 2 49 ~ 54%;
    B 2 O 3 4 ~ 6% ;
    Al 2 O 3 25 ~ 29% ;
    MgO 3 ~ 8%;
    CaO 11 ~ 14%; And
    SrO 1 ~ 3%
    The alkali-free glass production method characterized in that to contain.
  15. 13. The method of claim 12,
    The glass raw material combination comprises:
    An oxide based on weight percentages,
    MgO + CaO + SrO 15 ~ 23%
    The alkali-free glass production method characterized in that to contain.
  16. 13. The method of claim 12,
    The glass raw material combination comprises:
    An oxide based on weight percentages,
    MgO + CaO + SrO 16 ~ 21%
    The alkali-free glass production method characterized in that to contain.
  17. 13. The method of claim 12,
    The glass raw material combination comprises:
    An oxide based on weight percentages,
    SiO 2 + Al 2 O 3 74 ~ 83%
    The alkali-free glass production method characterized in that to contain.
  18. 13. The method of claim 12,
    And the density of the glass produced is less than 2.6 g / cm 3, the alkali-free glass production method, it characterized in that the thermal expansion coefficient of the resulting glass is 3.2 × 10 -6 / K ~ 4.2 × 10 -6 / K.
  19. 13. The method of claim 12,
    A temperature of less than 1550 ℃ in the viscosity of the produced glass 10 2 dPas, alkali-free glass production method, characterized in that the temperature at the viscosity 10 4 dPas of the glass produced is less than 1230 ℃.
  20. 13. The method of claim 12,
    A temperature of less than 1510 ℃ in the viscosity of the produced glass 10 2 dPas, alkali-free glass production method, characterized in that the temperature at the viscosity 10 4 dPas of the glass produced is less than 1210 ℃.
PCT/KR2012/007013 2011-09-02 2012-08-31 Alkali-free glass and method for manufacturing same WO2013032289A2 (en)

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JP2014528290A JP5806406B2 (en) 2011-09-02 2012-08-31 Alkali-free glass and a manufacturing method thereof
CN201280037583.4A CN103717543B (en) 2011-09-02 2012-08-31 Alkali-free glass and preparation method
US14/018,030 US8895462B2 (en) 2011-09-02 2013-09-04 Alkali-free glass and preparation thereof

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050025279A (en) * 2003-09-02 2005-03-14 니폰 덴키 가라스 가부시키가이샤 Nonalkaline glass substrate
KR20060102332A (en) * 2003-12-26 2006-09-27 아사히 가라스 가부시키가이샤 No alkali glass, method for production thereof and liquid crystalline display panel
KR20080109868A (en) * 2006-07-13 2008-12-17 아사히 가라스 가부시키가이샤 Alkali-free glass substrate, process for production of the same and liquid crystal display panels
KR20090029785A (en) * 2006-07-07 2009-03-23 아사히 가라스 가부시키가이샤 Process for producing alkali-free glass substrate
WO2011078258A1 (en) * 2009-12-25 2011-06-30 旭硝子株式会社 Method for vacuum-degassing molten glass and process for producing glass product

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050025279A (en) * 2003-09-02 2005-03-14 니폰 덴키 가라스 가부시키가이샤 Nonalkaline glass substrate
KR20060102332A (en) * 2003-12-26 2006-09-27 아사히 가라스 가부시키가이샤 No alkali glass, method for production thereof and liquid crystalline display panel
KR20090029785A (en) * 2006-07-07 2009-03-23 아사히 가라스 가부시키가이샤 Process for producing alkali-free glass substrate
KR20080109868A (en) * 2006-07-13 2008-12-17 아사히 가라스 가부시키가이샤 Alkali-free glass substrate, process for production of the same and liquid crystal display panels
WO2011078258A1 (en) * 2009-12-25 2011-06-30 旭硝子株式会社 Method for vacuum-degassing molten glass and process for producing glass product

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