WO2013013914A2 - Low-temperature material transfer apparatus and low-temperature liquefied gas supply system using the low-temperature material transfer apparatus - Google Patents

Low-temperature material transfer apparatus and low-temperature liquefied gas supply system using the low-temperature material transfer apparatus Download PDF

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Publication number
WO2013013914A2
WO2013013914A2 PCT/EP2012/062348 EP2012062348W WO2013013914A2 WO 2013013914 A2 WO2013013914 A2 WO 2013013914A2 EP 2012062348 W EP2012062348 W EP 2012062348W WO 2013013914 A2 WO2013013914 A2 WO 2013013914A2
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WIPO (PCT)
Prior art keywords
transfer means
low
transfer
mode
output
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PCT/EP2012/062348
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French (fr)
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WO2013013914A3 (en
Inventor
Koji FUKASE
Hirofumi Kawazoe
Takahiro Ikeda
Shigenori HIRUI
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L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude
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Publication of WO2013013914A2 publication Critical patent/WO2013013914A2/en
Publication of WO2013013914A3 publication Critical patent/WO2013013914A3/en

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B15/00—Pumps adapted to handle specific fluids, e.g. by selection of specific materials for pumps or pump parts
    • F04B15/06—Pumps adapted to handle specific fluids, e.g. by selection of specific materials for pumps or pump parts for liquids near their boiling point, e.g. under subnormal pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B15/00—Pumps adapted to handle specific fluids, e.g. by selection of specific materials for pumps or pump parts
    • F04B15/06—Pumps adapted to handle specific fluids, e.g. by selection of specific materials for pumps or pump parts for liquids near their boiling point, e.g. under subnormal pressure
    • F04B15/08—Pumps adapted to handle specific fluids, e.g. by selection of specific materials for pumps or pump parts for liquids near their boiling point, e.g. under subnormal pressure the liquids having low boiling points
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
    • F17C13/025—Special adaptations of indicating, measuring, or monitoring equipment having the pressure as the parameter
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
    • F17C13/026—Special adaptations of indicating, measuring, or monitoring equipment having the temperature as the parameter
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C9/00—Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C9/00—Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure
    • F17C9/02—Methods or apparatus for discharging liquefied or solidified gases from vessels not under pressure with change of state, e.g. vaporisation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F17C2221/011—Oxygen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F17C2221/014—Nitrogen
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F17C2221/016—Noble gases (Ar, Kr, Xe)
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
    • F17C2223/0146—Two-phase
    • F17C2223/0153—Liquefied gas, e.g. LPG, GPL
    • F17C2223/0161—Liquefied gas, e.g. LPG, GPL cryogenic, e.g. LNG, GNL, PLNG
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
    • F17C2223/033—Small pressure, e.g. for liquefied gas
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/04—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by other properties of handled fluid before transfer
    • F17C2223/042—Localisation of the removal point
    • F17C2223/046—Localisation of the removal point in the liquid
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2225/00—Handled fluid after transfer, i.e. state of fluid after transfer from the vessel
    • F17C2225/01—Handled fluid after transfer, i.e. state of fluid after transfer from the vessel characterised by the phase
    • F17C2225/0107—Single phase
    • F17C2225/0123—Single phase gaseous, e.g. CNG, GNC
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2225/00—Handled fluid after transfer, i.e. state of fluid after transfer from the vessel
    • F17C2225/01—Handled fluid after transfer, i.e. state of fluid after transfer from the vessel characterised by the phase
    • F17C2225/0146—Two-phase
    • F17C2225/0153—Liquefied gas, e.g. LPG, GPL
    • F17C2225/0161—Liquefied gas, e.g. LPG, GPL cryogenic, e.g. LNG, GNL, PLNG
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2225/00—Handled fluid after transfer, i.e. state of fluid after transfer from the vessel
    • F17C2225/03—Handled fluid after transfer, i.e. state of fluid after transfer from the vessel characterised by the pressure level
    • F17C2225/035—High pressure, i.e. between 10 and 80 bars
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/01—Propulsion of the fluid
    • F17C2227/0128—Propulsion of the fluid with pumps or compressors
    • F17C2227/0135—Pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/03—Heat exchange with the fluid
    • F17C2227/0367—Localisation of heat exchange
    • F17C2227/0388—Localisation of heat exchange separate
    • F17C2227/0393—Localisation of heat exchange separate using a vaporiser
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/03—Control means
    • F17C2250/032—Control means using computers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/043—Pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/0439—Temperature
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/0443—Flow or movement of content
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/06—Controlling or regulating of parameters as output values
    • F17C2250/0605—Parameters
    • F17C2250/0636—Flow or movement of content
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2260/00—Purposes of gas storage and gas handling
    • F17C2260/02—Improving properties related to fluid or fluid transfer
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2265/00—Effects achieved by gas storage or gas handling
    • F17C2265/05—Regasification
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2270/00—Applications
    • F17C2270/05—Applications for industrial use
    • F17C2270/0518—Semiconductors

Definitions

  • the low-temperature material transfer apparatus as described above has high energy efficiency and is capable of continual and stable transfer of low-temperature material without the use of special devices or complex operation even during abnormal modes of the low-temperature material transfer means, it is ideal for use in air separation plants for such facilities as semiconductor production processes that consume large volumes of nitrogen, oxygen or argon that is the low-temperature material.
  • transfer means 2a When transfer means 2a is recognized to be in abnormal mode, at the same time the shutdown signal for transfer means 2a is output, an output to switch transfer means 2b to rated mode is output from control section 3. More specifically, the inverter output of transfer means 2b is controlled so that transfer means 2b will be in rated mode, and output to transfer means 2b from control section 3. At the same time, each index value for transfer means 2b that has changed when switching from normal mode (low output mode) to rated mode, is compared with the preset upper and lower limits for each index, and checked to assure it is within that set range.
  • the transfer means in the event any of the outputs from each of the instruments related to the above-mentioned control indexes is outside the ranges set in advance, the transfer means is recognized to be in abnormal mode. Explanation is provided below using an example in which abnormal mode occurs in transfer means 2a that is operated at 50% of the rated output as set in advance, while approximately 10% of the rated output is returned to bypass flow path Ba.
  • the inventive apparatus puts transfer means 2a into shutdown mode, and operates transfer means 2b at 1 00% of its rated output to cover the reduced portion of the transfer rate,
  • second crude argon refers to crude argon composed, for example, of approximately 98% argon and approximately 2% oxygen
  • oxygen-rich liquefied components refer to oxygen-rich l iq u id com posed of, for exa m pl e , a pproxi mately 61 % n itrogen , approximately 2% argon, and approximately 37% oxygen.
  • inventive apparatus 10 of the configuration exam ple 1 is i nsta l l ed i nflow path L 1 4 to transfer h ig h-purity liquefied argon discharged from bottom 54a of refined argon tower 54 to the middle section of refined argon tower 54.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Pipeline Systems (AREA)

Abstract

A low-temperature material transfer apparatus and a low-temperature liquefied gas supply system that uses the low-temperature material transfer apparatus characterized in that transfer means (2a, 2b) capable of output adjustment are installed in parallel, transfer means are operated at a low-output mode that is lower than the rated output so that the total output of transfer means 2a and 2b is controlled to be the desired quantity, and at the same time in the event one or both of the transfer means, or any of or two or more of the instrumentation devices related to the output of transfer means fall(s) into abnormal mode, the transfer means that fell into said abnormal mode is/are switched to shutdown mode, and the output of transfer means other than those that fell into said shutdown mode is/are switched to the rated mode so that the total output of the active transfer means is controlled to be the desired figure.

Description

Low-temperature material transfer apparatus and low-temperature liquefied gas supply system using the low-temperature material transfer apparatus The present invention relates to a low-temperature material transfer a pparatu s a nd a low-temperature liquefied gas supply system using the low-temperature material transfer apparatus as, for example, a low-temperature material transfer apparatus in a low-temperature liquefied gas supply system using the cryogenic distillation method. Here, the "low-temperature material" refers to a material at normal (ambient) temperatures or below and that maintains a transferable stable state under normal temperatures and normal pressure conditions (generally approximately 20 ~ 30°C, and approximately 0.1 MPa), and includes not only liquid but also gas. More specifically, it includes low-temperature liquefied gases such as liquefied nitrogen, liquefied oxygen and liquefied argon.
Conventionally, low-temperature air separation plant has been known widely as a production apparatus liquefied gases such as nitrogen, oxygen and argon, and in general , h igh-pressure liquefied nitrogen, oxygen and argon have been produced as final products by raising the separation efficiency in sequence using multiple distillation towers. In such production apparatuses, rather than using a single rectifying tower with a large tower length, multiple rectifying towers sorted in s u ch m a n n e rs a s a low-pressure tower, a mid-pressure tower and/or a high-pressure tower according to the refinement processes and internal pressures, are being used to extract high-purity liquefied gases. In that process, refluxed liquefied air or product liquefied gas is transferred. Moreover, such liquefied gases are stored in relatively large-capacity low-temperature liquefied gas storage tank and the desired amount is supplied out since they are greatly demanded in various processes including semiconductor production processes.
For example, a low-temperature liquefied gas transfer apparatus as shown in Figure 6 is described in JP-A-2008-75705. More specifically, in said low-temperature liquefied gas transfer apparatus, low-temperature liquefied gas stored in multiple low-temperature liquefied gas storage tanks 1 1 1 is pressurized to the desired pressure using low-temperature liquefied gas pump 112 and transferred to destinations such as a tanker truck, and each low-temperature liquefied gas storage tank 111 is equipped with outlet pipe 113 with outlet valve 113V at the bottom of the tank, pressure-regulating flow path 114 that has manual valve 114V, pressurized evaporator 114E and pressure setting valve 114P, and connects the upper and lower sections of the tank, and pressure release flow path 115 that has pressure setting valve 115P at the top of the tank. Low-temperature liquefied gas pump 112 is equipped with suction pipe 116 that connects the pump's suction side to the aforementioned outlet pipe 1 1 3 at each low-temperature liquefied gas tan k 1 1 1 via suction valve 1 1 6, and l iqu id feed ing pipe 1 1 7 that connects the pump's discharge side to the liquid destination such as a tanker truck via liquid feeding valve 1 17V. From the upstream side of liquid feeding valve 1 17V of liquid feeding pipe 1 17, blow off pipe 1 18 equipped with blowoff valve 1 18V and bypass pipe 1 19 connected to the upper section of each low-temperature liquefied gas tank 1 1 1 via bypass valve 1 19V diverge. Here, 120 is a liquid release reservoir, 120a is an exhaust outlet, and 121 is a pressure switch.
An argon prod uction apparatus as shown in Figu re 7 is described in JP-A-06-307762. More specifically, primary crude argon tower 216 and secondary crude argon tower 228 are installed in parallel on the main rectifying tower 21 0 side. The total number of theoretical stages in both crude argon towers 21 6 and 228 is set to a nu mber that sufficiently lowers the oxygen concentration in the argon-enriched gas refined by main rectifying tower 21 0. The total number of theoretical stages in primary crude argon tower 21 6 is smal ler than the total number of theoretical stages in secondary crude argon tower 228, and both towers 21 6 and 228 are installed so that the bottom of primary crude argon tower 21 6 is higher than the bottom of main rectifying tower 21 0, and the bottom of secondary crude argon tower 228 is lower than the bottom of primary crude argon tower 216. In th is configuration, the lower section of secondary crude argon tower 228 is connected to the top of the above-mentioned primary crude argon tower 21 6 via gas transfer path 222, and the bottom of secondary crude argon tower 228 is connected to the top of the above-mentioned primary crude argon tower 21 6 via reflux liquid supply path 224. Pump 226 is installed in the course of reflux l iquid supply path 224, and a reflux l iquid supply means to pump up the l iquid at the bottom of secondary crude argon tower 228 and supply it to the top of primary crude argon tower 21 6 as reflux liquid is formed by pump 226 and liquid supply path 224. 212 is a lower tower, 21 8 is a gas transfer path, 220 is a liquid supply path, 232 is a gas transfer path, 234 is a refined argon tower, 236 is a tower-bottom re-boiler, and 238 is tower-top condenser 38.
With the low-temperature liquefied gas transfer apparatuses and liquefied gas production apparatuses as described above, however, the following problems have occurred at times.
(i) Since the transfer means such as the low-temperature gas pump described above are important elements for maintaining the function of such transfer apparatuses and prod uction apparatuses, a transfer means of an equivalent standard is generally prepared separately as a back up in many cases. How ever, in the event of switching to the back-up means when an abnormal state of the transfer means or an abnormal state of an instrumentation device related to the output of the transfer means (referred hereinafter as "abnormal mode of transfer means") occurs, a certain duration of time is required to stabilize the transfer condition, especially the temperature condition, of the low-temperature liquefied gas when restarting the system. In such situations, as consequences, there have been problems such as a need to stop the transfer of low-temperature l iquefied gas from the low-temperature liquefied gas tan k, or an unavoidable situation of having to transfer low-temperature liquefied gas under a condition different from the desired condition.
(ii) In order to prevent the situations described above in (i), it is possible to adopt a method of activating multiple transfer means in parallel and having the amount exceeding the necessary amount to bypass or circulate, but such a method lowers the energy efficiency in the transfer, and it has been extremely difficult to limit the efficiency reduction or improve the efficiency.
(iii) Moreover, if there is a method to detect abnormal mode of transfer means in advance, it is possible to consider putting the back-up transfer means on standby, but due to the special nature of the handling of low-temperature liquefied gas, h igh ly practical pred iction of abnormal mode and measu res aga inst abnormal mode have been insufficient.
The object of the present invention is to provide a low-temperature liquefied gas transfer apparatus and a low-temperature l iquefied gas supply system that uses the low-temperature liquefied gas transfer apparatus that are capable of continually and stably transferring low-temperature materials with h igh energy efficiency, and without special devices or complex operation even when abnormal mode of low-temperature material transfer means occurs in the low-temperature material supply system.
In view of the above-described problems, the present inventors conducted intensive research and discovered that the aim can be reached by means of the low-temperature material transfer apparatus and low-temperature liquefied gas supply system using the low-temperature material transfer apparatus described below.
The present invention is a transfer apparatus that uses a transfer means to continually transfer low-temperature materi a l fro m a s u p p l y so u rce to a consumption facility, and is characterized in that multiple units of the aforementioned transfer means capable of output adjustment are installed in parallel, each of the aforementioned transfer means is activated at a low-output mode that is lower than the rated output so that the total output of all transfer means is controlled to be the desired figure, and at the same time in the event one of the aforementioned transfer means or at least two of them, or one or two or more of the instrumentation devices related to the output of the aforementioned transfer means, fall(s) into abnormal mode, the transfer means that fell into said abnormal mode is/are switched to a shutdown mode, and the output of a specified transfer means or multiple transfer means other than those that fell into said shutdown mode is/are changed to the rated mode so that the total output of the active transfer means is controlled to be the aforementioned desired figure.
Since many supply systems of low-temperature material including low-temperature liquefied gas require continual operation, it is difficult to avoid occurrence of abnormal modes in transfer means used in such systems. The present invention solves the above-mentioned problems during the abnormal mode with the configuration described below.
(i) A configuration in which multiple transfer means are installed in parallel
(ii) Activate multiple transfer means at low output mode lower than the rated output in advance
(iii) In the event any or two or more transfer modes fall(s) into the abnormal mode, said transfer means is (are) out to shutdown mode, and the reduced output portion is covered by the other transfer means.
By employing this configuration, it has become possible to provide a transfer apparatus that enables stable transfer of low-temperature material continually with high energy efficiency without necessity of special apparatuses or complex operation.
The present invention is the above-described low-temperature material transfer A, and is characterized in that the output adjustment of each of the aforementioned transfer means is managed via an inverter, the aforementioned transfer means is equipped with a power meter, a sealed gas flow-rate meter, and a casing thermometer, or the supply-out flow path from said transfer means is equipped with any one or more of a thermometer, a pressure meter, and a flow-rate meter, and when any of the indicated value of each of the instruments exceeds the desired preset range, the system classifies it to be in the aforementioned abnormal mode, and output of the aforementioned each transfer means is adjusted.
The abnormal mode of the transfer means can occur not only due to abnormality of the transfer means itself, such for example as lowering of the discharge pressure that accompanies decline in the capacity of the feeding pump, but also due to abnormality in any of the instrumentation members related to output of the transfer means, such for example as abnormal heat build-up in the feeding pump housing case. In particular, in low-temperature material transfer, it was discovered desirable to make assessments not only by the abnormality factors in ordinary transfer means, but also by the addition of outputs from several detection (sensing) terminals as indexes. More specifically, in addition to the temperature, pressure and flow rate of the transfer flow path, that are directly related to the low-temperature material being transferred, by using the power (wattage) related to the transfer means, sealed-gas flow rate and casing temperature as indexes, it is possible to assess the abnormal mode of the actual transfer state from the former, and assess the abnormal mode of the transfer state in the near future from the latter. The present invention makes it possible to assure continual stable transfer of low-temperature material while avoiding operational stoppage, reduction of transfer rate, or temporary temperature rise of the low-temperature material by assessing the abnormal mode based on multifaceted indexes as described above.
The present invention is the above-described low-temperature material tra n sfer a ppa ratu s ch a racte rized i n th at pa rt of th e afore m ention ed low-temperature material transferred is returned (refluxed) to the aforementioned supply source via a bypass flow path diverged from the supply-out flow path from the aforementioned each transfer means, or a collective flow path in which multiple supply-out flow paths from the transfer means installed in parallel are integrated, the reflux flow rate that flows through the aforementioned bypass is adjusted, and the transfer amount of the low-temperature material transferred to the aforementioned consumption facility is controlled to be the desired amount.
In the transfer of low-temperature material, it is desirable to install a bypass flow path at the supply-out flow path from the transfer means, and transfer the desired amount while refluxing part of the low-temperature material back to the supply source from the viewpoint of adjusting the transfer amount corresponding to the operational state of the consumption facility, and preventing such occurrences as pulsation at the supply-out side of such parts as the feeding pump. The present invention is characterized in that the bypass flow path is used not only from the above viewpoint, but also from the viewpoint of promptly eliminating transitional condition during the stabilization process when the abnormal mode occurs. For example, in the event any of the transfer means falls into the abnormal mode, it is possible cover the reduced portion of the output of the transfer means in abnormal mode by putting said transfer means into shutdown mode (the bypass of said transfer means is also stopped) and at the same time transferring part of the bypass of other transfer means as transfer amount to the consumption facility. In this manner, by using the bypass of the transfer means during the abnormal mode, and adjusting the reflux flow rate, it is possible to assure stable transfer rate of low-temperature material.
The present invention is also a low-temperature liquefied gas supply system that uses any of the low-temperature material transfer apparatus described above, and is characterized in that it uses one or more air separation plants as the supply source, it uses liquid-phase nitrogen, oxygen or argon from said air separation plant as the low-temperature liquefied gas that is the low-temperature material, n number of (2 or more) feeding pumps are installed in parallel as the transfer means, each of the aforementioned n feeding pumps are operated at [100 / n] % of the rated value, when 1 or m feeding pumps fall into abnormal mode, said 1 or m feeding pumps are put into shutdown mode, and the other feeding pumps are operated at [100 / (n-1 )] % or [100 / (n-m)] % of the rated value.
Since the low-temperature material transfer apparatus as described above has high energy efficiency and is capable of continual and stable transfer of low-temperature material without the use of special devices or complex operation even during abnormal modes of the low-temperature material transfer means, it is ideal for use in air separation plants for such facilities as semiconductor production processes that consume large volumes of nitrogen, oxygen or argon that is the low-temperature material. More specifically, it has become possible to provide a low-temperature liquefied gas supply system that is capable of continually and stably transfer low-temperature material while preventing such occurrences as temporary decrease in transfer rate and temperature rise of the low-temperature material even with air-separated low-temperature material that requires large transfer volumes, by putting 1 or m feeding pumps into shutdown mode when said 1 or m feeding pumps fall into abnormal mode, and operating the other feeding pumps at [100 / (n-1 )]% or [100 / (n-m)]% of the rated value.
The present invention is the above-mentioned low-temperature liquefied gas supply system characterized in that part of the aforementioned low-temperature liquefied gas is returned (refluxed) to the aforementioned air-separation plant via a bypass flow path diverged from the supply-out flow path from the aforementioned feeding pumps, or a collective flow path in which two or more supply-out flow paths are integrated, the reflux flow rate that flows through the bypass flow path from the feeding pumps related to the aforementioned rated mode is adjusted in stages and at the same time control led automatically by P I or P I D control during the aforementioned abnormal mode.
As described above, installing the bypass flow path to the supply-out flow path of the transfer means is extremely useful for continual and stable transfer of low-temperature material. As a result of further verification, the present inventors discovered that the shutdown operation of the bypass flow path or reduction operation of the bypass flow-rate contributes greatly to stabilizing the transfer. In other words, it was d iscovered that wh ile it is difficult to prevent transient phenomena that accompany overshoot and undershoot corresponding to the transfer rate and temperature of the low-temperature material in the event these operations accompanying the transfer means in abnormal mode are done in stages (referred hereinafter as "pulse control"), it is difficult to prevent such occurrences as lowering of transfer rate and temporary temperature rise of the low-temperature material in the event PI or P I D control with a specified response speed is employed. The present invention makes it possible to drastically reduce transient or temporary abnormal states, and promptly assure stable transfer condition even when the abnormal mode occurs, by combining the pulse control and automatic control using the PI or PID control in response to the abnormal mode.
Figure 1 is a schematic illustration of the first configuration example of the inventive low-temperature material transfer apparatus
Figure 2 is a schematic illustration of the second configuration example of the inventive low-temperature material transfer apparatus
Figure 3 is an explanatory drawing showing an example of fluctuation in the transfer rate accompanying the switch from abnormal mode to rated mode in the second configuration example
Figure 4 is a schematic illustration of configuration example 1 of the inventive low-temperature liquefied gas supply system
Figure 5 is a schematic illustration of another configuration example of the inventive low-temperature liquefied gas supply system
Figure 6 is a schematic illustration of a configuration example of a low-temperature liquefied gas transfer apparatus based on conventional technologies
Figure 7 is a schematic illustration of a configuration example of an argon production apparatus based on conventional technologies
The inventive low-temperature material transfer apparatus (referred hereinafter as "the inventive apparatus") is characterized in that multiple units of transfer means capable of output adjustment are installed in parallel, each of the transfer means is activated at a low-output mode that is lower than the rated output so that the total output of all transfer means is controlled to be the desired figure, and at the same time in the event one of the transfer means, any of or two or more of the transfer means, or any of or two or more of the instrumentation devices related to the output of the transfer means fall(s) into abnormal mode, the transfer means that fell into said abnormal mode is/are switched to shutdown mode, and the output of a specified transfer means or multiple transfer means other than those that fell into said shutdown mode is/are changed to the rated mode so that the total output of the active transfer means is controlled to be the desired figure. Configurations for implementing the present invention are described on the basis of the drawings below.
Figure 1 shows the outl ine of the basic configuration example (first configuration example) of the inventive apparatus. The inventive apparatus is equipped with one supply source 1 in which low-temperature material is stored, two transfer means 2a and 2b that transfer low-temperature material S, and control section 3 that controls transfer of low-temperature material S to continually transfer low-temperature material S to a consumption facility (not shown in Figure). Here, the material for the flow path and members where low-temperature material S passes through are thermally insulated or cold-treated (especially, the part of supply source 1 where low-temperature material S accumulates is cold-treated) to maintain low temperature. A case in which low-temperature liquefied gas is used as low-temperature material S is explained below as an example. Here, an example of using two transfer means is provided, but a configuration in which three or more transfer means are used in parallel is also possible. This is to assure continual and stable transfer of low-temperature material S even when abnormal mode of a particular transfer means occurs. Moreover, vaporizer 4 is installed in the event the liquefied gas is used in gaseous phase in the consumption facility.
Here, as "low-temperature material," not only low-temperature liquefied gas, etc. such as the above-mentioned liquefied nitrogen, etc., but also various other substances including liquefied hydrogen and various hydrocarbons produced in petroleum refining process, or liquefied ammonia and liquefied chlorine produce in various processes can be used. In addition , as stated above, the inventive apparatus is applicable not only to substances that are in liquid form under ambient temperature and pressure conditions, but also to such gaseous substances that require a certain duration to switch from the normal cond ition to a transferable low-temperature condition, such as gases with large heat capacity in particular (e.g. hydrocarbon compounds and carbon dioxide).
The inventive apparatus has a configuration in which low-temperature material S (low-temperature liquefied gas) is transferred from supply source 1 by transfer means 2a and 2b, and vaporizer 4 is installed in collective flow path Lc where supply-out flow paths La and Lb of transfer means 2a and 2b merge. In the event the low-temperature liquefied gas is transferred in liquid state directly or via a transportation means to the consumption facil ity, there may be cases in which vaporizer 4 is not used . Valves Na and Nb that allow flow rate adjustment are installed in the input side of transfer means 2a and 2b. These valves can reduce or prevent such influences as pulsation and back-flow to supply source 1 during activation of transfer means 2a and 2b. On-off valves Va and Vb are installed in supply-out flow paths La and Lb on the output side of transfer means 2a and 2b. These valves make it possible to maintain transfer of low-temperature material S supplied from collective flow path Lc at a constant rate by closing the on-off valves related to said transfer means to shut off said supply-out floe paths, and changing other transfer means in normal mode to rated mode in the event either transfer means 2a or 2b falls into abnormal mode.
In cases supply source 1 is a storage type, it is desirable to select a container with a structure that allows application of insulation material around its outer circumference or enables control of its interior to cool or maintain the desired temperature to stably store low-temperature material S. Here, supply source 1 not only includes tanks that only function as storage tanks, but also includes product storage sections of apparatuses that produce low-temperature material S, such as the air-separation plants described later.
It is desirable that transfer means 2a and 2b are output adjustable, and such pumps, for example, as centrifugal pumps, cryogenic pumps, or such liquefied gas pumps as booster pumps or suction pumps can be used. The output adjustment is made by control section 3 via an inverter (not shown in Figure). In the inventive apparatus, an example in which the inverter is housed inside control section 3 is shown, but it is not limited to this configuration.
To obtain control indexes for transfer means 2a and 2b, the inventive apparatus is equipped with electric power meters Ma and Mb, sealed gas flow meters Ga and casing thermometers Ca and Cb, or in supply-out flow paths La and Lb of transfer means 2a and 2b, one or more of the following types of instruments - thermometers Ta and Tb, manometers Pa and Pb, and flow rate meters Fa and Fb. In the event any of the indicated values of any of the instruments exceeds the specified value set in advance, it is deemed to be in abnormal mode, and the outputs of transfer means 2a and 2b are adjusted . Th is configuration makes it possible to assess not only the abnormality in the transfer means themselves, such as pressure drop on the output side that accompanies decline in the performance of transfer means 2a and 2b, but also the abnormal mode of the actual transfer state as well as the abnormal mode of the transfer state in the near future by assessing the abnormality in any of the instrumentation members related to the outputs of transfer means 2a and 2b, such for example as abnormal heat buildup in the storage container of transfer means 2a and 2b. Each instrument has the following functions related to the control indexes of transfer means in the inventive apparatus. Although an example of using all the control indexes below as indicators is provided for the inventive apparatus, the present invention is not limited to this set up, and using some of these indexes or adding indexes other than those provided below as indicators are also possible.
(1 ) Low-temperature liquefied gas temperature
Thermometers Ta and Tb can detect occurrences of abnormal mode due to such abnormalities as abnormal temperatures of low-temperature liquefied gas on the input side of transfer means 2a and 2b, or overheating in transfer means 2a and 2b, by monitoring the temperatures on the output side of transfer means 2a and 2b. An optimal temperature range is set from the desired temperature condition . This configuration makes it possible to promptly respond to abnormal ities in actual low-temperature liquefied gas transfer.
(2) Low-temperature liquefied gas pressure
Manometers Pa and Pb can detect occurrences of abnormal mode such as performance decline or overpressure in transfer means 2a and 2b, or operational abnormality in the pressure adjustment mechanism in cases said mechanism exists on the output side of transfer means 2a and 2b, by mon itoring the pressure of low-temperature liquefied gas on the output side of transfer means 2a and 2b. An opti ma l pressu re ra ng e is set from the des ired pressu re cond ition . Th is configuration makes it possible to promptly respond to abnormal ities in actual low-temperature liquefied gas transfer.
(3) Low-temperature liquefied gas flow rate
Flow meters Fa and Fb can detect occurrences of abnormal mode such as performance decline or overpressure in transfer means 2a and 2b, or operational abnormality in the flow rate adjustment mechanism in cases said mechanism exists on the input and output sides of transfer means 2a and 2b, by monitoring the flow rate of low-temperature liquefied gas on the output side of transfer means 2a and 2b. An optimal flow rate range is set from the desired flow rate condition . This configuration makes it possible to promptly respond to abnormal ities in actual low-temperature liquefied gas transfer.
(4) Transfer means electric energy supply
Power meters Ma and Mb can detect overload or excessive power supply caused by shorting of internal wiring , etc. , or power supply shortage due to disconnection of internal wiring in transfer means 2a and 2b, by monitoring the electric energy amount supplied to transfer means 2a and 2b. It is possible to detect abnormal mode of transfer means 2a and 2b themselves by setting the optimal electric energy supply range. This configuration makes it possible to prevent occurrences of abnormality in the near future even in cases there is no change in the actual transfer flow rate or pressure, etc. of the low-temperature liquefied gas.
(5) Sealed gas flow rate supplied to storage container of transfer means. Sealed gas flow meters Ga and Gb can detect such abnormal ities as deterioration in the seal function that seals transfer means 2a and 2b from ambient air, by monitoring the flow rate of sealed gas supplied to the container in which transfer means 2a and 2b are housed. By setting the optimal flow rate range, it is possible, for example, to prevent secondary damage (such as corrosion and combustion) during leakage of low-temperature liquefied gas from transfer means 2a and 2b. Even in cases there is no abnormality in reality, it is possible to prevent abnormal situations that may occur in the near future.
(6) Transfer means storage container temperature
Casing thermometers Ca and Cb can detect overheating in transfer means 2a and 2b due to such abnormalities as overload or shorting in internal wiring, or decline in performance due to disconnection of internal wiring, etc., by monitoring the temperature of the container in which transfer means 2a and 2b are housed - in other words, by monitoring the heat emitted from transfer means 2a and 2b. By setting the optimal temperature range, it is possible to assess the operational state of transfer means 2a and 2b themselves. Even in cases there is no abnormality in reality, it is possible to prevent abnormal situations that may occur in the near future.
In the inventive apparatus, low-temperature material S is stored in supply source 1 . In normal mode (low-output mode), low-temperature material S stored is transferred at the respected desired flow rate via supply-out flow paths La and Lb by transfer means 2a and 2b, and then merged at collective flow path Lc, to the consumption facility (includes cases in which it is vaporized by vaporizer 4). At this time, the outputs of transfer means 2a and 2b are adjusted so that approximately the same rate of low-temperature material S flows through supply-out flow paths La and Lb. In other words, they are adjusted so that transfer means 2a and 2b are operated at low output mode that is lower than the rated output (e.g. 50% of the rated output), and the total output of the transfer means is the desired rate (e.g. 100% of the rated output of one transfer means). In cases there is fluctuation in the desired transfer rate, it is possible to assure the desired transfer rate without applying excessive load to the transfer means by setting the maximum transfer rate to 100% of the rated output of one transfer means, and operating transfer means 2a and 2b at, for example, 30 ~ 50% of the rated output at the normal low output mode. At this time, the maximum transfer rate can be set by selecting one transfer means or by setting the number of transfer means.
In the above configuration, the outputs from each of the instruments related to control indexes such as thermometers Ta and Tb, are sent to control section 3. Upon receiving these output signals, control section 3 compares these figures to the upper and lower limits for each index set in advance, and when they are within the preset range, it recogn izes the system to be in normal mode (low-output mode), and proceeds to start operation or continue operation of the inventive apparatus. For example, using liquefied nitrogen as the low-temperature liquefied gas, and setting the temperature range of supply flow paths La and Lb to be -195 ~ -200°C, if the outputs from thermometers Ta and Tb are within that range, for example if it is -196°C (boiling point of liquefied nitrogen), it recognizes it to be in normal mode regarding the "low-temperature liquefied gas temperature" for transfer means 2a. As to the other indexes too, if they are within the preset range, they are recognized to be in normal mode.
In the inventive apparatus, when any of the outputs from the instruments related to the above-mentioned control indexes are not within the preset range, the transfer means is recognized to be in abnormal mode. A case in which transfer means 2a is preset at 50% of its rated output in advance, and abnormal mode occurred in the transfer means is explained below as an example. The inventive apparatus puts transfer means 2a into shutdown mode when abnormal mode occurs, and operates transfer means 2b at 1 00% of its rated output to cover the decreased transfer rate portion of transfer means 2a.
(i) Abnormal mode recognition
Control section 3 that received outputs from each of the instruments related to control indexes for transfer means 2a recognizes transfer means 2a to be in abnormal mode when the output(s) is/are outside the range(s) set in advance. For example, when liquefied nitrogen is used as the low-temperature liquefied gas, the preset temperature range is set at -195 ~ -200°C, and if the output from thermometers Ta is higher than -195°C, say for example -190°C, there is a possibility of bumping (sudden boiling) inside supply flow path La, and hence this may lead to abnormal transfer pressure or transfer flow rate, transfer means 2a is recognized to be in abnormal mode.
(ii) Setting the shutdown mode
When transfer means 2a is recognized to be in abnormal mode, a shutdown signal related to shutdown mode of transfer means 2a is output from control section 3. More specifically, the operational power of transfer means 2a is shutdown, and on-off valve Va is closed . At the same time, each index value of transfer means 2a is checked to assure it is a value that corresponds to that during the shutdown mode, or it has changed to a value that corresponds to that during the shutdown mode. For example, as to the "low-temperature liquefied gas flow rate" of transfer means 2a, if the flow rate is 0 (zero) or has changed to 0, it is recognized to be in shutdown mode.
(iii) Switching to rated mode
When transfer means 2a is recognized to be in abnormal mode, at the same time the shutdown signal for transfer means 2a is output, an output to switch transfer means 2b to rated mode is output from control section 3. More specifically, the inverter output of transfer means 2b is controlled so that transfer means 2b will be in rated mode, and output to transfer means 2b from control section 3. At the same time, each index value for transfer means 2b that has changed when switching from normal mode (low output mode) to rated mode, is compared with the preset upper and lower limits for each index, and checked to assure it is within that set range. For example, as to the "low-temperature liquefied gas flow rate" of transfer means 2b, if the flow rate at low output mode is "a," cases in which the flow rate has changed to "2a" (that is the transfer rate of the "normal mode" of the inventive apparatus) after switching to rated mode, is recognized as rated mode.
Operation in a configuration with two transfer means 2a and 2b are installed is described above as an example, but in configurations with three or more transfer means (n number of transfer means) installed in parallel, the same functions can be secured by adopting the operational procedure as described below. The same applies to any number of transfer means over three. (i) Each of the n transfer means are operated at [100 / n]% of the rated output in normal mode.
(ii) In the event abnormal mode occurs in multiple (m number of) transfer means, m transfer means should be shut down, and the other (n - m) transfer means should be operated at [100 / (n - m)]% of the rated output.
As another configuration example of the inventive apparatus, Figure 2 shows an apparatus with a bypass installed on the output side of the transfer means (Configuration example 2). In cases the inventive apparatus is used for various purposes, there are cases in which it is desirable to install a bypass on the output side of the transfer means to improve stability of transfer pressure and flow rate in normal mode, and also for the purpose of red ucing transient state that may occur accompanying mode changes in the inventive apparatus during abnormal mode. In the configuration example 2, bypass flow paths Ba and Bb are installed in supply-out flow paths La and Lb, respectively, from transportation means 2a and 2b, and part of low-temperature material S being transferred is returned (refluxed) to supply source 1 . Bypass flow paths Ba and Bb are equipped with regulators Ra and Rb that adjust the reflux rate in each flow path. Collective flow path La is equipped with flow meter Fc that detects the transfer rate of low-temperature material S being transferred to the consumption facility (not shown in Figure). During abnormal mode, the transfer rate of low-temperature material S flowing through supply-out flow paths La and Lb is adjusted, and at the same time, the reflux rate that flows through bypass flow paths Ba and Bb is adjusted so that the transfer rate of low-temperature material S transferred to the consumption facility becomes the desired rate. Moreover, in place of the above configuration, it is also possible to adopt a configuration in which collective flow path Lc is diverted to form a single bypass flow path (not shown in Figure) to return part of low-temperature material S being transferred to supply source 1 , or a configuration in which each of supply-out flow paths La and Lb as well as collective flow path Lc is diverted to form a bypass flow path (not shown in Figure) from each of these flow paths to return part of low-temperature material S being transferred to supply source 1 .
By installing bypass flow paths Ba and Bb to transfer the desired amount while returning part of low-temperature material S to supply source 1 , it is possible to make fine adjustments of the transfer rate to suit the operational condition of the consumption facility and prevent pulsation on the supply-out side of transfer means 2a and 2b. Moreover, it drastically reduces possibility of transient state during the stabilization operation in abnormal mode to allow quick switching to rated mode. The operation related to Configuration Example 2 of the inventive apparatus is explained below. Parts that are common to Configuration Example 1 may be omitted.
Operation of the inventive apparatus in normal mode
In the inventive apparatus, low-temperature material S is transferred from supply source 1 via supply-out flow paths La and Lb, each at the desired rate, by transfer means 2a and 2b, merges at collective flow path Lc, while discharging its part into bypass flow paths Ba and Bb, and then transferred to the consumption facility. At this time, the outputs of transfer means 2a and 2b are adjusted so that approximately the same amount of low-temperature material S flows through supply-out flow paths La and Lb, and regulators Ra and Rb adjust part of low-temperature material S that flows through bypass flow paths Ba and Bb to be approximately the same rate. In other words, it is adjusted so that transfer means 2a and 2b are operated at low output mode that is lower than the rated output (e.g. 50% of rated output), and the total output of the transfer means will be the desired rate (e.g. 100% of the rated output of one of the transfer means). Part of the transfer amount (e.g. 10% of the rated output) at low output mode is returned to bypass flow paths Ba and Bb, and the rest (e.g. 80% of the rated output) is transferred to the consumption facility. In cases there is fluctuation in the desired transfer rate, it is possible to assure the desired transfer rate without applying excessive load to the transfer means by setting the maximum transfer rate to 100% of the rated output of one transfer means, operating transfer means 2a and 2b at, for example, 50% of the rated output at normal low output mode, making the reflux rate of bypass flow paths Ba and Bb greater than the maximum fluctuation rate of the desired transfer rate, and at the same time adjusting the fluctuation rate of the desired transfer with that reflux rate. At this time, it is desirable that reflux flow rates of both bypass flow paths Ba and Bb fluctuate approximately equally so that adjustment during abnormal mode is easy.
At this time, since the transfer rate of low-temperature material S being transferred to the consumption facility is detected by flow meter Fc, and the reflux rate of bypass flow paths Ba and Bb is adjusted by regulators Ra and Rb, fine adjustments can be made using regulators Ra and Rb. The output of flow meter Fc becomes a control index for transfer means 2a and 2b. Moreover, also as to the pressure of low-temperature material S being transferred to the consumption facil ity, fine adjustments can be made by detecting it with manometers Pa and Pb and then adjusting it with regulators Ra and Rb. Recognition of normal mode, and launching or continuing operation of the inventive apparatus based on other outputs from each of the instruments related to control indexes for transfer means 2a and 2b, such as thermometers Ta and Tb,are basically the same as in Configuration Example 1 .
In the inventive apparatus, in the event any of the outputs from each of the instruments related to the above-mentioned control indexes is outside the ranges set in advance, the transfer means is recognized to be in abnormal mode. Explanation is provided below using an example in which abnormal mode occurs in transfer means 2a that is operated at 50% of the rated output as set in advance, while approximately 10% of the rated output is returned to bypass flow path Ba. When in abnormal mode of transfer mean 2a, the inventive apparatus puts transfer means 2a into shutdown mode, and operates transfer means 2b at 1 00% of its rated output to cover the reduced portion of the transfer rate,
(i) Abnormal mode recognition
As in Configuration Example 1 , control section 3 upon receiving the outputs from each of the instruments related to the control indexes of transfer means 2a, compares them with the ranges of the indexes set in advance, and if any is outside that range, recognizes transfer means 2a to be in abnormal mode.
(ii) Setting shutdown mode
As in Configuration Example 1 , when transfer means 2a is recognized to be in abnormal mode, a shutdown signal related to shutdown mode of transfer means 2a is output from control section 3 to shutoff the operational power of transfer means 2a, and close on-off valve Va.
(iii) Switching to rated mode
When transfer means 2a is recognized to be in abnormal mode, at the same time the shutdown signal for transfer means 2a is output, an output to switch transfer means 2b to rated mode is output from control section 3. More specifically, the inverter output of transfer means 2b is controlled so that transfer means 2b will be in rated mode, and output to transfer means 2b from control section 3. At the same time, the reduced output portion of transfer means 2a is covered since part of low-temperature material S returned to bypass path Bb is transferred to the consumption facility as the transferred amount.
At the same time, each index value for transfer means 2b that has changed when switching from normal mode to rated mode, is compared with the preset upper and lower limits for each index, and checked to assure it is within that set range. For example, if the flow rate is "a" and the bypass reflux flow rate is "β" at low output mode, cases in which the former has changed to "2a" (that is the transfer rate of the "normal mode" of the inventive apparatus), and the latter has changed to "2 β" after switching to rated mode, is recognized as rated mode.
Transfer rate (flow meter Fc output), transfer means 2a output (flow meter Fa output), transfer means 2b output (flow meter Fb output), and fluctuations in the reflux rate in bypass flow path Bb that accompany switching from low output mode (50% of rated output) to rated mode (100% of rated output) of transfer means 2b that is made at the same time transfer means 2a is put into shutdown mode in the above operation, is described in detail below.
(1 ) In cases transfer means 2b is switched from low output mode to rated mode without operating regulator Rb.
Output of transfer means 2b (output of flow meter Fb) shows the desired response delay and response speed as shown by the dotted line (a) in Figure 3(A), and the flow rate of bypass flow path Bb similarly shows a similar response as shown by the wavy dotted line (b) in Figure 3(A). The output of transfer means 2a (output of flow meter Fa) that has been put into shutdown mode, on the other hand, shows short response delay and response speed as shown by the long-short dotted line (c) in Figure 3(A), and the flow rate of bypass flow path Ba similarly shows a similar response as shown by the long-short dotted line (d) in Figure 3(A). The transfer rate to the consumption facility (output of flow meter Fc) that is calculated by subtracting the reflux flow rate of bypass flow paths Ba and Bb from the output of both transfer means 2a and 2b, shows a response as shown by the solid line (e) in Figure 3(A). Although transient reductions in transfer rate are seen, they do not cause temperature rise of low-temperature material S, and this configuration can resolve the abnormal mode. Moreover, these transient reductions in the transfer rate can be reduced by controlling the output during the shutdown mode of transfer means 2a so that it will have the desired response delay and speed.
(2) In cases transfer means 2b is switched from low output mode to rated mode while automatically controlling regulator Rb as in the same manner as transfer means 2b. Lowering of transfer rate that accompanies shutdown of transfer means is suppressed by operating regulator Rb, and reducing the reflux flow rate or shutting off bypass flow path Bb. By employing automatic control as in transfer means 2b, the desired transfer rate is maintained by reducing the reflux flow rate of bypass flow path Bb as shown in the wavy dotted line (b) in Figure 3(A) to supplement the transfer rate to the consumption facility, and then increase the reflux rate when the transfer rate reaches the desired rate. At this time, the transfer rate to the consumption facility (flow meter Fc output) is the sum of the transfer rate to the consumption facility in (1 ) above (sol id l ine (e) in Figure 3(B)) and the decreased portion of the reflux flow rate of bypass flow path Bb, and it shows a response as shown by solid line (f) in Figure 3(B). By adopting these operations, it is possible to assure the transfer rate that alleviates transient transfer rate drop. Moreover, such transient transfer rate drop can further be alleviated by controlling the output of transfer means 2a in shutdown mode so that it shows the desired response delay and speed.
(3) In cases transfer means 2b is switched from low output mode to rated mode using combination of pulse control and automatic control
Lowering of transfer rate that accompanies shutdown of transfer means is suppressed by adjusting the reflux flow rate of bypass flow path Bb by adjusting regulator Rb in stages using the transfer rate to the consumption facility (flow meter Fc output) as the index, and at the same time by automatically controlling it using Pi or PID control . At the same time of switching to rated mode, regulator Rb is closed in stages to cover the decreased portion of the transfer rate immediately after shutdown of transfer means 2a . At the same time, regulator Rb is immed iately controlled automatically to suppress overshoot of the transfer rate. At this time, as shown by the wavy dotted l ine (b) in Figure 3(C), the refl ux flow rate of bypass flow path Bb decreases once for a short period of time to supplement the transfer rate to the consumption facility, and at the same time the decreased amount is alleviated so that it does not exceed the desired transfer rate. While this configuration provides prompt and step-wise response, it also reduces possibilities of overshoot and undershoot. The reflux flow is shut off thereafter until the desired transfer flow rate is reached, and when that rate is reached, the reflux flow rate is increased to maintain the desired transfer rate. This operation of increasing the reflux flow rate also secures the reflux flow rate faster and provides for stable transfer of low-temperature material S, by combining the pulse control and automatic control . The transfer flow rate to the consumption facility (flow meter Fc output) shows a response as shown by the solid line (f) in Figure 3(C). This configuration assures transfer flow rate with even further alleviated transient transfer-rate drop compared to (1 ) above. Moreover, such transient transfer-rate drop can further be alleviated by controlling the output of transfer means 2a in shutdown mode so that it shows the desired response delay and speed.
Explained below is a low-temperature liquefied gas supply system (referred hereinafter as "the inventive system") that uses any of the inventive apparatus discussed above. An air-separation system that includes an argon refinement process is provided below as a representative implementation form of the inventive system. The inventive system is characterized in that it uses one or two or more air-separation plants as supply a source, uses liquid phase nitrogen, oxygen or argon from said air-separation plants as low-temperature l iquefied gas (low-temperature material, referred hereinafter as "liquefied nitrogen"), is equipped with n (two or more) feeding pumps as transfer means installed in parallel, operates n feeding pumps at [100 / (n - 1 9]% of their rated output in low-output mode, and in abnormal mode of one or m feeding pumps, said one or m feeding pumps are out into shutdown mode, and the other pumps are operated at [100 / (n - 1 )]% or [1 00 / (n - m)]% of their rated output. Even in cases large amounts of liquefied nitrogen transfer is required for use in air-separation plants, it is possible to prevent transient transfer-rate drop and temperature rise of liquefied nitrogen being transferred, and continually and stably transfer liquefied nitrogen with high energy efficiency.
Configuration example 1 of the inventive system
Figure 4 shows a specific implementation format of configuration example 1 of the inventive system (system configuration example 1 ). Inventive apparatus 10 forms the above-mentioned configuration example 2, and transfers liquefied oxygen that is one of the low-temperature materials of system configuration example 1 and extracted from bottom 5b of upper tower section 5a of one of the air-separation plants (rectifying towers) 5, to heat exchanger 6, and uses it in member parts that supply it as product oxygen. The liquefied oxygen from bottom 5b is transferred to feeding pumps (transfer means) 2a and 2b via flow path L1 , and then transferred to heat exchanger 6 via collective flow path Lc to which supply-out flow paths La and Lb merge, and flow path L2. Air that is the material is introduced to heat exchanger 6 to perform heat exchange with liquefied oxygen . Heated liquefied oxygen is discharged as product oxygen . Liquefied air is introduced to the lower part of lower tower section 5c of rectifying tower 5 via flow path L3. Moreover, part of the liquefied oxygen being transferred is also introduced to the upper part of upper tower section 5a of rectifying tower 5 via bypass flow paths Ba and Bb that diverges from supply-out flow paths La and Lb, and via flow path L4 to which bypass flow paths Ba and Bb merge, to form reflux of rectifying tower 5 and produce high-purity liquefied oxygen.
In system configuration example 1 , the inventive apparatus 10 can form a highly efficient air-separation system by not only forming part of the route for the product oxygen from rectifying tower 5 to be discharged, but also by having the following functions.
(i) It prevents damage to the inventive system that accompanies occurrence of abnormality in feeding pumps 2a or 2b during transfer of low-temperature L oxygen.
(ii) It improves the reflux function in rectifying tower 5 by returning part of the high-purity liquefied oxygen from bypass flow paths Ba and Bb via flow path L4 to upper tower section 5a of rectifying tower 5.
Operation of the inventive apparatus in normal mode and Operation of the inventive apparatus in abnormal mode described above regarding the inventive apparatus 10 can also be applied to system configuration example 1 . More specifically, feeding pumps 2a and 2b are operated at 50% of their rated output in low-output mode, and when either one of feeding pumps 2a or 2b fall into abnormal mode, said one feeding pump 2a or 2b is put into shutdown mode, and the other pump 2b or 2a is operated at 1 00% of its rated output. In particular with system configuration example 1 , since not only rectifying tower 5, but also the functions of the entire system and its product quality are assured by the reflux of high-purity oxygen to rectifying tower 5, it is possible to assure stable transfer rate of the product oxygen in abnormal mode, and promptly secure transfer rate by adopting these control operations. At this time, in the stages of switching to the rated mode, drop in reflux flow rate of high purity oxygen to rectifying tower 5, described in (ii) above, influences not only the purity of the product oxygen but also the product nitrogen. In the case of switch ing to rated mode, whether to switch with or without changing the reflux condition at normal mode is determined by the operational conditions of rectifying tower 5.
Figure 5 shows an implementation format of another configuration example of the inventive system (system configurations example 2). High-purity nitrogen, oxygen and argon are produced as products from material air using four air-separation plants (rectifying towers) that are: main rectifying tower 51 , primary crude argon tower 52, secondary crude argon tower 53, and refined argon tower 54. Inventive apparatus 10 forms the above-mentioned configuration example 2, and transfers liquefied crude argon that is one of the low-temperature materials of system configuration example 2 and extracted from bottom 53a of lower tower section 53b of one of secondary crude argon tower 53, and uses it in member parts that transfer it to the upper section of primary crude argon tower 52. In other words, liquefied crude argon from bottom 53a of lower tower section 53b of one of secondary crude argon tower 53 is diverged via flow path L1 and transferred to feeding pumps 2a and 2b, and part of it is transferred to bypass flow paths Ba and Bb, while at the same time, the rest is transferred to the upper section of primary argon tower 52 via flow path L2 and collective flow path Lc with which supply-out flow paths La and Lb merge. Liquefied crude argon transferred to bypass flow paths Ba and Bb of inventive apparatus 1 0 merges crude argon (referred hereinafter as "primary crude argon") discharged from tower top section 52a of primary crude argon tower 52, and then returned to the lower section of lower tower section 53b of secondary crude argon tower 53 via flow path L4. Here, "crude argon" refers to crude argon with a composition of, for example, approximately 98% argon and approximately 2 % nitrogen constantly, and "primary crude argon" refers to crude argon with a composition of, for example, approximately 96% argon and approximately 4 % oxygen. The compositions provided above are naturally examples, and are not limited to them, and the same applies to constituents and compositions provided hereafter.
In system configuration example 2, material air is introduced via flow path L3 to the lower part of lower tower section 51 a (medium-pressure tower) of main rectifying tower 51 that has a 3-tier tower structure. Medium-pressure nitrogen gas is extracted from the upper section of lower tower section 51 b of main rectifying tower 51 via flow path L5, product liquefied oxygen is extracted from the bottom of middle tower section 51 b via flow path L6, and low-pressure nitrogen gas is extracted as product from tower top section 51 d of upper tower section 51 c (low-pressure tower) via flow path L7. At th is time, since argon-rich l iquefied air that contains low concentrations of oxygen and nitrogen is formed at the lower section of upper tower section 51 c, it is extracted via flow path L8 and transferred to the lower section of primary crude argon tower 52. The "argon material" here refers to a material with a composition of, for example, approximately 7% argon and approximately 93% oxygen.
The argon material transferred is rectified in primary argon tower 52, discharged as primary argon from tower top section 52a, and transferred with liquefied crude argon refluxed from inventive apparatus 10 via flow path L4 to the lower section of lower tower section 53b of secondary crude argon tower 53. Moreover, since the liquid formed at bottom 52b of primary crude argon tower 52 has a composition roughly of 92% oxygen and (% argon, this oxygen rich liquid is refluxed to the lower section of upper tower section 51 c of main rectifying tower 51 via flow path L9.
The argon-rich liquefied components (referred hereinafter as "secondary crude argon") rectified in secondary argon tower 53 is transferred from the upper section of lower tower section 53b via flow path 10 to the middle section of refined argon tower 54. Liquefied crude argon formed in lower tower section 53b is refluxed to the upper section of primary crude argon tower 52 via flow path L1 , inventive apparatus 10, and flow path L2. Moreover, oxygen rich components are formed in upper tower section 53c, and their gaseous components are refluxed from tower top section 53d via flow path 1 1 , and their liquid components are refluxed from bottom 53 via flow path L12 to upper tower section 51 c of main rectifying tower 51 . Here, "secondary crude argon" refers to crude argon composed, for example, of approximately 98% argon and approximately 2% oxygen , and "oxygen-rich liquefied components" refer to oxygen-rich l iq u id com posed of, for exa m pl e , a pproxi mately 61 % n itrogen , approximately 2% argon, and approximately 37% oxygen.
Secondary crude argon transferred is then further refined for higher purity in rectifying argon tower 54, and the high-purity liquefied argon is discharged as product argon from tower bottom 54a of rectifying argon tower 54 via flow path 13, while at the same time, part of it is refluxed to the middle section of rectifying argon tower 54 via flow path 14. Nitrogen-enriched gas at the upper section of rectifying argon tower 54 is discharged as waste gas from tower top section 54b via flow path L15.
In system configuration example 2, inventive apparatus 1 0 can form a highly efficient air-separation system by not only forming part of the route for transferring the liquefied crude argon from secondary crude argon tower 53 to primary crude argon tower 52, but also by having the following functions.
(i) It prevents damage to the inventive system that accompanies occurrence of abnormality in feeding pumps 2a or 2b during transfer of low-temperature L crude argon.
(ii) It improves the reflux function in secondary crude argon tower 53 by returning part of the liquefied crude argon from bypass flow paths Ba and Bb via flow path L4 to lower tower section 53b of secondary crude argon tower 53.
Although Figure 5, in regards to system configuration example 2, shows an example of a configuration in wh ich inventive apparatus 1 0 is used to transfer liquefied crude argon formed by secondary crude argon tower 53 to primary crude argon tower 52, it is also possible to adopt configurations in which inventive apparatus 10 (including configuration example 1 ) is used in transfer flow paths of other liquefied components. More specifically, the following configurations can be cited.
(i) A configuration in which inventive apparatus 10 of the configuration example 1 is installed inflow path L12 to transfer air-rich liquefied components formed by upper tower section 53c of secondary crude argon tower 53 to upper tower section 51 c of main rectifying tower 51 .
(ii) A configuration in which inventive apparatus 10 of the configuration exam ple 1 is i nsta l l ed i nflow path L 1 4 to transfer h ig h-purity liquefied argon discharged from bottom 54a of refined argon tower 54 to the middle section of refined argon tower 54.
Operation of the inventive apparatus in normal mode and Operation of the inventive apparatus in abnormal mode described above regarding the inventive apparatus 10 in configuration example 2 can also be applied to system configuration example 2 as in system configuration example 1 . More specifically, feeding pumps 2a and 2b are operated at 50% of their rated output in low-output mode, and when either one of feeding pumps 2a or 2b fall into abnormal mode, said one feeding pump 2a or 2b is put into shutdown mode, and the other pump 2b or 2a is operated at 100% of its rated output. In particular with system configuration example 2, since not only secondary crude argon tower 53, but also the functions of the entire system and its product quality are assured by the reflux of liquefied crude argon to secondary crude argon tower 53 as described in (ii) above, it is possible to assure stable transfer rate of the product argon in abnormal mode, and promptly secure transfer rate by adopting these control operations. At this time, in the stages of switching to the rated mode, drop in reflux flow rate of liquefied crude argon to secondary crude argon tower 53, described in (ii) above, influences not only the purity and yield amount of the product argon but also the product oxygen and product nitrogen . In the case of switching to rated mode, whether to switch with or without changing the reflux condition at normal mode is determined by the operational conditions of main rectifying tower 51 , primary crude argon tower 52, secondary crude argon tower 53 or refined argon tower 54.
Explanation of reference numerals
1 Supply source
2a, 2b Transfer means (feeding pumps)
3 Control section
4 Vaporizer
5,(51 -54) Rectifying tower
51 Main rectifying tower
52 Primary crude argon tower
53 Secondary crude argon tower
54 Refined argon tower
6 Heat exchanger
Ba,Bb Bypass flowpaths
Ca,Cb Casing thermometers
Fa,Fb Flow meters
Ga,Gb Sealed gas flow meters
La,Lb Supply-out flow paths
Lc Collective flow path
Ma,Mb Power meters
Na,Nb Valves
Pa,Pb Manometers
Ra,Rb Regulators
S Low-temperature material
Ta,Tb Thermometers
Va,Vb On-off valves

Claims

Claims
1 . A transfer apparatus that uses a transfer means to continually transfer low-temperature material (S) from a su pply source (1 ) to a consumption facility, characterized in that multiple un its of the aforementioned transfer means (2a, 2b) capable of output adjustment are installed in parallel, each of the aforementioned transfer means is activated at a low-output mode that is lower than the rated output so that the total output of all transfer means is controlled to be the desired value, and at the same time in the event one of the aforementioned transfer means or at least two of them, or one or two or more of the instrumentation devices related to the output of the aforementioned transfer means fall(s) into abnormal mode, the transfer means that fell into said abnormal mode is/are switched to a shutdown mode, and the output of a specified transfer means or multiple transfer means other than those that fell into said shutdown mode is/are switched to rated mode so that the total output of the active transfer means is controlled to be the aforementioned desired value.
2. A low-temperature material transfer apparatus in accordance with Claim 1 , characterized in that the output adjustment of each of the aforementioned transfer means is managed via an inverter, the aforementioned transfer means is equipped with a power meter (Ma, Mb), a sealed gas flow-rate meter (Ga, Gb), and a casing thermometer (Ta, Tb), or the supply-out flow path from said transfer means is equipped with any one or more of a thermometer, a pressure meter, and a flow-rate meter, and when any of the indicated value of each of the instruments exceeds the desired preset range, the system classifies it to be in the aforementioned abnormal mode, and output of the aforementioned each transfer means is adjusted.
3. A low-temperature material transfer apparatus in accordance with Claim 1 or Claim 2, characterized in that part of the aforementioned low-temperature material transferred is returned (refluxed) to the aforementioned supply source via a bypass flow path (Ba; Bb)diverged from a collective flow path in which multiple supply-out flow paths from the transfer means installed in parallel are integrated, the reflux flow rate that flows through the aforementioned bypass is adjusted, and the transfer amount of the low-temperature material transferred to the aforementioned consumption facility is controlled to be the desired amount.
4. A low-temperature liquefied gas supply system that uses any of the low-temperature material transfer apparatus in accordance with Claim 1 , Claim 2 or Claim 3, characterized in that it uses one or more air separation plants (5) as the supply source, uses liquid-phase nitrogen, oxygen or argon from said air separation plant as the low-temperature liquefied gas that is the low-temperature material, n number of (2 or more) feeding pumps (2a, 2b) are installed in parallel as the transfer means, each of the aforementioned n feeding pumps are operated at [100 / n]% of the rated value, when 1 or m feeding pumps fall into abnormal mode, said 1 or m feeding pumps are put into shutdown mode, and the other feeding pumps are operated at [100 / (n-1 )] % or [100 / (n-m)] % of the rated value.
5. A low-temperature liquefied gas supply system in accordance with Claim
4, characterized in that part of the aforementioned low-temperature liquefied gas is returned (refluxed) to the aforementioned air-separation plant via a bypass flow path (Ba, Bb) diverged from the supply-out flow path from the aforementioned feeding pumps, or a collective flow path in which two or more supply-out flow paths are integrated, the reflux flow rate that flows through the bypass flow path from the feeding pumps related to the aforementioned rated mode is adjusted in stages and at the same time controlled automatically by PI or PID control during the aforementioned abnormal mode.
PCT/EP2012/062348 2011-07-25 2012-06-26 Low-temperature material transfer apparatus and low-temperature liquefied gas supply system using the low-temperature material transfer apparatus WO2013013914A2 (en)

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