CN217951969U - Liquefied gas supply system - Google Patents
Liquefied gas supply system Download PDFInfo
- Publication number
- CN217951969U CN217951969U CN202221245950.7U CN202221245950U CN217951969U CN 217951969 U CN217951969 U CN 217951969U CN 202221245950 U CN202221245950 U CN 202221245950U CN 217951969 U CN217951969 U CN 217951969U
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- China
- Prior art keywords
- valve
- vaporizer
- pipeline
- storage tank
- supply system
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- 239000006200 vaporizer Substances 0.000 claims abstract description 67
- 239000007788 liquid Substances 0.000 claims abstract description 31
- 230000001105 regulatory effect Effects 0.000 claims abstract description 6
- 229910001220 stainless steel Inorganic materials 0.000 claims description 6
- 239000010935 stainless steel Substances 0.000 claims description 6
- 239000007789 gas Substances 0.000 description 74
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000012071 phase Substances 0.000 description 8
- 239000007791 liquid phase Substances 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 230000008016 vaporization Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
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- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
The utility model belongs to the technical field of the chip is made, a liquefied gas supply system is provided, which comprises a storage tank, the play liquid end of storage tank passes through pipeline series connection first valve and second valve, the play liquid end of second valve passes through parallelly connected first vaporizer of pipeline and second vaporizer, the end of giving vent to anger of first vaporizer and second vaporizer is carried pressure gas to the pressure regulating module after joining through the pipeline, storage tank configuration third vaporizer, the feed liquor end of third vaporizer and the end of giving vent to anger communicate the storage tank respectively through the pipeline, the end of giving vent to anger of third vaporizer passes through the parallelly connected third valve of pipeline, the end of giving vent to anger of third valve passes through the play liquid end of the parallelly connected second valve of pipeline, make the reliability and the saving of supply all improve by a wide margin, and provide nimble interim air feed scheme.
Description
Technical Field
The utility model belongs to the technical field of the chip is made, especially, relate to a liquefied gas supply system.
Background
In the high-end electronic manufacturing industries such as chips, electrons, photovoltaics and the like, ppb-level high-purity process gas used in the process is purified by a gas purifier, and the impurity content in the process gas is reduced to 1ppb. Ppm grade gas with the purity of 99.999 percent is required to be used as raw material gas at the inlet of the purifier before the purifier so as to ensure the quality of the gas after the purifier.
Generally, high-end electronics manufacturing industry needs to use a large amount of high-purity industrial gases, such as nitrogen, oxygen, argon, helium and hydrogen, wherein the nitrogen is used in a large amount, and is usually supplied by a high-purity nitrogen generator and a liquid supply system as a backup, helium/hydrogen is usually supplied by a container or a torpedo car under reduced pressure in a gaseous state, and oxygen/argon is usually supplied by vaporizing a low-temperature liquid gas. Because the amount of high-purity oxygen/argon is not very large in high-end electronics manufacturing industry, only one low-temperature liquid oxygen/liquid argon storage tank is usually configured in equipment configuration, and a redundant backup storage tank is not arranged, so that when a valve on storage tank or storage tank management fails, the risk of supply reliability exists. When the rear end gas consumption is small, the temperature difference between the liquid phase pipeline and the external environment temperature can reach more than 180 ℃, the low-temperature liquefied gas is vaporized after heat exchange with the outside through the pipeline outer wall in the liquid phase pipeline, if the terminal gas consumption is small, the vaporized gas in the pipeline finally leads to the continuous rise of the pressure in the storage tank, the gas phase gas in the storage tank has to be discharged to reduce the pressure of the storage tank when necessary, and if negligence exists, the action of a safety valve or the action of a rupture disk can be further led to ensure the safety of the pressure storage tank. The storage tank is used as a pressure container, regular strong inspection is carried out according to the legal requirements, a convenient mode is needed to provide temporary air supply at the moment, and the flexibility provided by a temporary air supply scheme is generally ignored in the design.
Therefore, there is a need for a liquefied gas supply system to solve the above-mentioned problems of reliability risk, safety valve action or burst disk function to ensure safety and temporary gas supply of the pressure tank.
SUMMERY OF THE UTILITY MODEL
In order to solve one or more of the above technical problems, the present invention provides a liquefied gas supply system, including: the storage tank, the end of giving vent to anger of storage tank passes through the first valve of pipeline series connection and second valve, the play liquid end of second valve passes through the parallelly connected first vaporizer of pipeline and second vaporizer, first vaporizer reaches the end of giving vent to anger of second vaporizer is carried pressure gas to the pressure regulating module after converging through the pipeline, the storage tank disposes the third vaporizer, the feed liquor end of third vaporizer and the end of giving vent to anger communicate respectively through the pipeline the storage tank, the end of giving vent to anger of third vaporizer passes through the parallelly connected third valve of pipeline, the end of giving vent to anger of third valve is parallelly connected through the pipeline the play liquid end of second valve.
Optionally, the liquid outlet end of the second valve is connected in parallel with a fourth valve through a pipeline, and the gas inlet end of the fourth valve is connected with the low-temperature liquid gas dewar tank through a pipeline.
Optionally, the first valve and the second valve are both long-handle cryogenic valves.
Optionally, the third valve and the fourth valve are both long-handle cryogenic valves.
Optionally, a fifth valve and a sixth valve are respectively configured at the air inlet end and the air outlet end of the first vaporizer, the fifth valve is a long-handle low-temperature valve, and the sixth valve is a stainless steel valve and is a normally open valve.
Optionally, a seventh valve and an eighth valve are respectively configured at the air inlet end and the air outlet end of the second vaporizer, the seventh valve is a long-handle low-temperature valve, and the eighth valve is a stainless steel valve and is a normally open valve.
Optionally, the first valve is a master control switch valve, the second valve is a normally open valve, and the third valve and the fourth valve are normally closed valves.
Optionally, the first vaporizer and the second vaporizer are both air bath vaporizers.
Optionally, the third vaporizer is an air bath self-pressurizing vaporizer.
Compared with the prior art, the beneficial effects of the utility model reside in that:
the utility model provides a liquefied gas supply system, including the storage tank, the end of giving vent to anger of storage tank passes through pipeline series connection first valve and second valve, the play liquid end of second valve passes through parallelly connected first vaporizer of pipeline and second vaporizer, the end of giving vent to anger of first vaporizer and second vaporizer is carried pressure gas to the pressure regulating module after converging through the pipeline, storage tank configuration third vaporizer, the feed liquor end of third vaporizer and the end of giving vent to anger communicate the storage tank respectively through the pipeline, the end of giving vent to anger of third vaporizer passes through the parallelly connected third valve of pipeline, the end of giving vent to anger of third valve passes through the play liquid end of the parallelly connected second valve of pipeline, make the reliability and the saving of supply all improve by a wide margin, and provide nimble interim air feed scheme.
Drawings
Fig. 1 is a schematic view of the overall layout of the liquefied gas supply system of the present invention.
Illustration of the drawings:
200. a supply system; 201. a storage tank; 202. a first valve; 203. a second valve; 204. a first vaporizer; 205. a second vaporizer; 206. a third vaporizer; 207. a third valve; 208. a liquid phase pipeline; 209. a gas phase pipeline; 210. a fourth valve; 211. a dewar tank; 212. a fifth valve; 213. a sixth valve; 214. a seventh valve; 215. and an eighth valve.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the invention.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
Furthermore, in the description of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and the like are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; the two elements may be directly connected or indirectly connected through an intermediate medium, or may be communicated with each other inside the two elements, or may be wirelessly connected or wired connected. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Furthermore, the technical features mentioned in the different embodiments of the invention described below can be combined with each other as long as they do not conflict with each other.
Referring to fig. 1, an embodiment of the present invention provides a liquefied gas supply system 200, which includes a storage tank 201 for storing liquefied gas, such as oxygen, nitrogen, or hydrogen. The gas outlet end of the storage tank 201 is connected in series with a first valve 202 and a second valve 203 through a pipeline, the first valve 202 and the second valve 203 are both long-handle low-temperature valves, and the first valve 202 and the second valve 203 are used for controlling liquid gas in the storage tank 201 to flow out of the storage tank 201. The first valve 202 is a main control switch valve, the second valve 203 is a standby switch valve, the second valve 203 is a normally open valve, and the gas outlet end of the second valve 203 is connected in parallel with the first vaporizer 204 and the second vaporizer 205 through a pipeline. The first vaporizer 204 and the second vaporizer 205 are both air bath vaporizers, and the first vaporizer 204 and the second vaporizer 205 are used for vaporizing liquid gas for the pressure regulating module. The outlet ends of the first vaporizer 204 and the second vaporizer 205 are converged by a pipeline and then the pressure gas is delivered to the pressure regulating module, and the first vaporizer 204 and the second vaporizer 205 which are arranged in parallel can improve the reliability of the normal operation of the system.
Further, the storage tank 201 is provided with a third vaporizer 206, a liquid inlet end and a gas outlet end of the third vaporizer 206 are respectively communicated with the storage tank 201 through pipelines, the third vaporizer 206 is an air bath type self-pressurization vaporizer, and the third vaporizer 206 vaporizes the liquid gas and then conveys the liquid gas to the storage tank 201, so as to stabilize the gas pressure of the liquefied gas in the storage tank 201. The air inlet end of the third vaporizer 206 is connected in parallel with a third valve 207 through a pipeline, and the third valve 207 is a long-handle low-temperature valve. The third valve 207 is a normally closed valve, and the gas outlet end of the third valve 207 is connected in parallel with the liquid outlet end of the second valve 203 through a pipeline, so that the gas-phase low-temperature gas in the storage tank 201 is directly merged into the supply system 200. When the gas supply is performed by using the gaseous low-temperature gas in the storage tank 201, the third valve 207 is opened, the first valve 202 is closed, and the gaseous low-temperature gas in the storage tank 201 can be accessed to the supply system 200, so that the method is suitable for the situation that the gas supply amount is relatively small during the ramp-up period of the capacity of the gas supply in the high-end electronic manufacturing industry or during the low-valley period of the production order.
When the gas supply amount is small, when the liquid phase pipeline 208 of the storage tank 201 is used for supplying, the low-temperature liquid gas in the liquid phase pipeline 208 exchanges heat with the outside and evaporates but cannot be used downstream, so that the pressure is reversely charged into the storage tank 201 to increase the pressure of the storage tank 201, and in order to ensure the safe operation of the storage tank 201, the pressure in the storage tank 201 needs to be discharged to cause the discharge of high-purity gas with higher price, and the cost is lost. At this time, the third valve 207 is opened, the first valve 202 is closed, and the gas is supplied through the gas phase line 209 of the storage tank 201, so that the storage tank 201 is prevented from being discharged due to the pressure rise of the storage tank 201 caused by self-evaporation and vaporization of the external liquid phase line 208, and the high purity liquid oxygen/liquid argon raw material is saved. The pressure in the tank 201 is continuously decreased while the supply system 200 is supplied through the gas phase line 209 of the tank 201, and when the pressure in the tank 201 is lower than the working pressure set by the third vaporizer 206, the third vaporizer 206 starts to work to maintain the gas pressure in the tank 201 at a stable set pressure. If the evaporation capacity of the third vaporizer 206 is decreased, the third valve 207 is closed, the first valve 202 is opened to switch the liquid phase line 208 for supplying, and the gas phase line 209 for supplying is switched after the third vaporizer 206 has defrosted and recovered the evaporation capacity.
Further, the gas outlet end of the second valve 203 is connected in parallel with a fourth valve 210 through a pipeline, and the fourth valve 210 is a long-handle low-temperature valve. The fourth valve 210 is a normally closed valve, and the air inlet end of the fourth valve 210 is connected to the low-temperature liquid gas dewar 211 through a pipeline, so that the temporary air supply scheme is applicable to the condition that the air supply of the storage tank 201 is interrupted when the storage tank 201 needs maintenance or under other conditions. Since high-end electronics manufacturing gas supplies require 24 hours of continuous uninterrupted gas supply, interruption of the gas supply whenever the gas supply is initiated will result in significant downstream production losses. Therefore, when the tank 201 is in a physical failure or other emergency requiring disconnection and isolation, the third valve 207 is closed, the first valve 202 is closed, the fourth valve 210 is opened, and the cryogenic liquid gas dewar 211 is integrated into the piping system to isolate the tank 201, which facilitates safe control and maintenance without affecting the normal supply of high purity gas. Closing the second valve 203 may also shut off the supply to the tank 201 if the first valve 202 fails to close. The storage tank 201 is maintained and repaired after being isolated, after the normal use state is recovered, the first valve 202 and the second valve 203 are opened, the storage tank 201 is merged into the supply system 200, the fourth valve 210 is closed, and the low-temperature liquid gas dewar tank 211 is supplied and withdrawn, so that a flexible temporary gas supply scheme is realized, and the condition that the gas supply of the supply system 200 is interrupted is prevented.
Furthermore, a fifth valve 212 and a sixth valve 213 are respectively disposed at the inlet end and the outlet end of the first vaporizer 204, the fifth valve 212 is a long-handle low-temperature valve, the sixth valve 213 is a stainless steel valve, and both the fifth valve 212 and the sixth valve 213 are normally open valves, so that the first vaporizer 204 can be replaced or maintained conveniently. The liquid inlet end and the gas outlet end of the second vaporizer 205 are respectively provided with a seventh valve 214 and an eighth valve 215, the seventh valve 214 is a long-handle low-temperature valve, the eighth valve 215 is a stainless steel valve, and the seventh valve 214 and the eighth valve 215 are both normally open valves, so that the second vaporizer 205 can be replaced or maintained conveniently.
By implementing the liquefied gas supply system 200 of the present invention, the reliability of the operation of the storage tank 201 for low-temperature liquid gas can reach nearly 100% for the supply of high-purity oxygen/argon gas in high-end electronic manufacturing industry; and under the condition of low-flow supply, the overpressure discharge is prevented, so that the gas discharge loss can be continuously saved. For example, the supply system 200 discharges gas phase gas due to overpressure, since the daily static evaporation rate of the storage tank 201 and the pipeline is about one percent, a 50 cubic meter high purity oxygen storage tank 201, the surplus gas phase gas generated by daily evaporation in the low flow using state is 120 cubic meters, which is converted into liquid gas of 0.17 ton, and the loss is about 680 yuan/day in terms of 4000 yuan per ton of high purity liquid oxygen.
The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention cannot be limited thereby, and any insubstantial changes and substitutions made by those skilled in the art based on the present invention are all within the protection scope of the present invention.
Claims (9)
1. A liquefied gas supply system, comprising: storage tank (201), the play liquid end of storage tank (201) passes through pipeline series connection first valve (202) and second valve (203), the play liquid end of second valve (203) passes through pipeline parallel first vaporizer (204) and second vaporizer (205), first vaporizer (204) and the end of giving vent to anger of second vaporizer (205) is carried pressure gas to the pressure regulating module after converging through the pipeline, storage tank (201) configuration third vaporizer (206), the inlet liquid end and the end of giving vent to anger of third vaporizer (206) communicate respectively through the pipeline storage tank (201), the end of giving vent to anger of third vaporizer (206) passes through pipeline parallel third valve (207), the end of giving vent to anger of third valve (207) passes through the pipeline parallel the play liquid end of second valve (203).
2. The liquefied gas supply system according to claim 1, wherein the outlet end of the second valve (203) is connected in parallel with a fourth valve (210) through a pipeline, and the inlet end of the fourth valve (210) is connected with the low-temperature liquid gas dewar (211) through a pipeline.
3. A liquefied gas supply system according to claim 1, wherein said first valve (202) and said second valve (203) are each long-handled cryogenic valves.
4. The liquefied gas supply system according to claim 2, wherein the third valve (207) and the fourth valve (210) are each a long-stem cryogenic valve.
5. The liquefied gas supply system according to claim 1, wherein a fifth valve (212) and a sixth valve (213) are respectively disposed at the inlet end and the outlet end of the first vaporizer (204), the fifth valve (212) is a long-handle cryogenic valve, and the sixth valve (213) is a stainless steel valve, both of which are normally open valves.
6. The liquefied gas supply system according to claim 1, wherein a seventh valve (214) and an eighth valve (215) are respectively disposed at an inlet end and an outlet end of the second vaporizer (205), the seventh valve (214) is a long-handle cryogenic valve, and the eighth valve (215) is a stainless steel valve, both of which are normally open valves.
7. The liquefied gas supply system according to claim 2, wherein the first valve (202) is a master switch valve, the second valve (203) is a normally open valve, and the third valve (207) and the fourth valve (210) are normally closed valves.
8. The liquefied gas supply system according to claim 1, wherein the first vaporizer (204) and the second vaporizer (205) are both air bath vaporizers.
9. Liquefied gas supply system according to claim 1, characterized in that the third vaporizer (206) is a self-pressurizing vaporizer of the air bath type.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221245950.7U CN217951969U (en) | 2022-05-23 | 2022-05-23 | Liquefied gas supply system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221245950.7U CN217951969U (en) | 2022-05-23 | 2022-05-23 | Liquefied gas supply system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217951969U true CN217951969U (en) | 2022-12-02 |
Family
ID=84213563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221245950.7U Active CN217951969U (en) | 2022-05-23 | 2022-05-23 | Liquefied gas supply system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217951969U (en) |
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- 2022-05-23 CN CN202221245950.7U patent/CN217951969U/en active Active
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Address after: No. 27-28, 7th floor, building 12, Shenzhen Bay science and technology ecological park, No. 18, South Keji Road, high tech community, Yuehai street, Nanshan District, Shenzhen, Guangdong 518000 Patentee after: Shenzhen Haige Jingu Industrial Technology Co.,Ltd. Address before: No. 27-28, 7th floor, building 12, Shenzhen Bay science and technology ecological park, No. 18, South Keji Road, high tech community, Yuehai street, Nanshan District, Shenzhen, Guangdong 518000 Patentee before: SHENZHEN THRESHOLD INDUSTRIAL TECHNOLOGY CO.,LTD. |