WO2013004659A1 - Procédé de modification de solides particulaires par photopolymérisation - Google Patents
Procédé de modification de solides particulaires par photopolymérisation Download PDFInfo
- Publication number
- WO2013004659A1 WO2013004659A1 PCT/EP2012/062830 EP2012062830W WO2013004659A1 WO 2013004659 A1 WO2013004659 A1 WO 2013004659A1 EP 2012062830 W EP2012062830 W EP 2012062830W WO 2013004659 A1 WO2013004659 A1 WO 2013004659A1
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- WIPO (PCT)
- Prior art keywords
- radical
- hydrocarbon radical
- particulate
- finely divided
- bonded
- Prior art date
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- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
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- REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical compound [Al+3] REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 1
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- 125000001475 halogen functional group Chemical group 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 125000004836 hexamethylene group Chemical class [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
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- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/12—Polymerisation in non-solvents
- C08F2/14—Organic medium
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
Definitions
- the invention relates to a process for the modification of particulate solids by photopolymerization, the modified particulate solids thus obtained and their use.
- the surface modification can be carried out ex-situ, ie before mixing in of the particles, or in-situ, ie the polymer modifier is added to the corresponding modifier and the unmodified particles are subsequently mixed in, so that the particles are surface-modified during the mixing and compounding process ,
- the fillers are preferably chemically irreversibly modified. That the modifier is chemically attached to the particle surface.
- Typical modifiers that chemically react with the particle surface are organosilanes. These form stable filler-silicon-oxygen bonds with the filler surface.
- R is the same or different and is hydrogen, or optionally substituted with -CN, -NCO, -NR 2 2 , -GOOH, -COOR 2 , -halogen, -acrylic, -epoxy, -SH, -OH or -CONR 2 2 substituted C-linked Ci-C2o ⁇ K ° hlenwasserstoff est, preferably a C ⁇ -CQ-
- Hydrocarbon radical particularly preferably a C -C3-
- organosiloxanes are preferably liquid at the temperature of use.
- organosiloxanes are linear or cyclic dialkylsiloxanes having an average number of dialkylsiloxy units of greater than 2, preferably greater than 5.
- the end groups can be the same or different.
- the silane of the general formula II is preferably used as liquid added added and in particular the powdered metal oxide.
- a gas-supported fluidization can be carried out by all inert gases that do not react with the silane of the general formula II, the solid, and the silylated solid, so do not lead to side reactions, degradation reactions, oxidation processes and flame and explosion phenomena, as preferential N2, Ar, other noble gases, CO2, etc.
- the supply of the gases for fluidization is preferably in the range of Leerrohrgas- speeds of 0.05 to 5 cm / s, more preferably from 0.5 to 2.5 cm / s.
- This recycling is preferably carried out in non-condensed phase, ie as gas or as vapor.
- This recycling can be carried out as mass transfer along a pressure equalization or as controlled material transport with the technically usual systems of gas transport, such as fans, pumps, compressed air membrane pumps. Since the return of the non-condensed phase is preferred, the heating of the returning lines is recommended if appropriate.
- the reaction time is 5 minutes to 48 hours, preferably 10 minutes to 5 hours.
- protic solvents may be added, such as liquid or volatilizable alcohols or water; typical alcohols are iso-propanol, ethanol and methanol. It is also possible to add mixtures of the abovementioned protic solvents. Preferably, 1 to 50% by weight of protic solvent, based on the solid, are added, in particular preferably 5 to 25%. Particularly preferred is water.
- acidic catalysts of acidic character in the sense of a Lewis acid or a Brönsted acid such as hydrogen chloride or basic catalysts, of a basic character, in the sense of a Lewis base or a Brönsted base, such as ammonia, may be added.
- these are added in traces, i.e. less than 1000 ppm. Most preferably, no catalysts are added.
- % By weight, preferably less than 18% by weight and more preferably less than 15% by weight.
- Extractable components in this context are preferably to be understood as meaning components which are separated by means of organic solvents, such as e.g. Extract the THF or toluene extractively from the particle surface and remove it by analytical methods, e.g. Quantify elemental analysis or other methods.
- the proportion of particulate solid which has been dispersed in the vinylic monomer of the general formula (I) is preferably from 0.1 to 50% by weight, preferably from 0.1 to 25% by weight and more preferably from 0.5 to 15% by weight.
- the dispersion can be done e.g. by stirring by means of preferably fast-running stirrers such as dissolvers, rotor-stator systems, or by treatment with ultrasound such as ultrasonic baths or sonotrodes.
- the dispersion is preferably carried out over a period of 10 seconds to 2 hours.
- the inert solvents are preferably used in proportions of 70% to 99% based on the particulate solid.
- a photosensitizer-free reaction mixture is preferably used, ie the reaction mixture contains no photosensitizer such as benzophenone.
- radiation is preferably electromagnetic radiation, preferably electromagnetic radiation in a wavelength range of 1 nm to 10,000 nm, such as light radiation in the visible range of about 400 nm - 800 nm, or UV radiation having a wavelength range of 1 nm to 400 nm, preferably 100 nm to 400 nm and particularly preferably 180 - 380 nm used.
- the radiation source (s) may be introduced into the reaction mixture in the form of a submersion source or externally, i. act on the mixture above the mixture or through the wall of the reaction vessel. Preference is given to an external effect.
- the excess monomer is removed. This can be done by condensation in vacuo or filtration. Preference is given to condensing off in vacuo.
Abstract
L'invention concerne un procédé de préparation de solides finement dispersés particulaires ayant une surface modifiée, caractérisé en ce qu'il consiste à disperser un monomère vinylique de formule générale (I): (R1
aR1
bC=CR1
cR1
d) avec un solide finement dispersé particulaire ayant une grande surface, pour former un mélange, le solide finement dispersé particulaire ayant une grande surface étant silylé par traitement avec des silanes de formule générale (II): X1+x'-SiR4
2-x'-(CH2)v-Y, seul ou dans des mélanges quelconques, et ce mélange étant mis en réaction à l'aide d'un rayonnement par polymérisation radicalaire.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011078613.9 | 2011-07-04 | ||
DE201110078613 DE102011078613A1 (de) | 2011-07-04 | 2011-07-04 | Verfahren zur Modifikation von partikulären Feststoffen durch Photopolymerisation |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2013004659A1 true WO2013004659A1 (fr) | 2013-01-10 |
Family
ID=46466504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2012/062830 WO2013004659A1 (fr) | 2011-07-04 | 2012-07-02 | Procédé de modification de solides particulaires par photopolymérisation |
Country Status (2)
Country | Link |
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DE (1) | DE102011078613A1 (fr) |
WO (1) | WO2013004659A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112689612A (zh) * | 2018-08-27 | 2021-04-20 | 株式会社大阪钛技术 | SiO粉末的制造方法及球形颗粒状SiO粉末 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5426136A (en) * | 1993-03-24 | 1995-06-20 | Ppg Industries, Inc. | Particulate amorphous silica associated with thin polymeric film |
EP0703192A1 (fr) * | 1994-04-11 | 1996-03-27 | Ube-Nitto Kasei Co. Ltd. | Particules fines de silices a enrobage de resine reticule et leur procede de production |
EP1479734A1 (fr) * | 2003-05-20 | 2004-11-24 | DSM IP Assets B.V. | Procede de preparation d'un revetement de surface nanostructure, revetements nanostructures et articles contenant le revetement |
US20060160916A1 (en) | 2004-08-13 | 2006-07-20 | Dyer Daniel J | Process for modifying substrates with grafted polymers |
-
2011
- 2011-07-04 DE DE201110078613 patent/DE102011078613A1/de not_active Withdrawn
-
2012
- 2012-07-02 WO PCT/EP2012/062830 patent/WO2013004659A1/fr active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5426136A (en) * | 1993-03-24 | 1995-06-20 | Ppg Industries, Inc. | Particulate amorphous silica associated with thin polymeric film |
EP0703192A1 (fr) * | 1994-04-11 | 1996-03-27 | Ube-Nitto Kasei Co. Ltd. | Particules fines de silices a enrobage de resine reticule et leur procede de production |
EP1479734A1 (fr) * | 2003-05-20 | 2004-11-24 | DSM IP Assets B.V. | Procede de preparation d'un revetement de surface nanostructure, revetements nanostructures et articles contenant le revetement |
US20060160916A1 (en) | 2004-08-13 | 2006-07-20 | Dyer Daniel J | Process for modifying substrates with grafted polymers |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112689612A (zh) * | 2018-08-27 | 2021-04-20 | 株式会社大阪钛技术 | SiO粉末的制造方法及球形颗粒状SiO粉末 |
CN112689612B (zh) * | 2018-08-27 | 2024-04-19 | 株式会社大阪钛技术 | SiO粉末的制造方法及球形颗粒状SiO粉末 |
Also Published As
Publication number | Publication date |
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DE102011078613A1 (de) | 2013-01-10 |
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