WO2013001771A1 - Display device manufacturing method - Google Patents

Display device manufacturing method Download PDF

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Publication number
WO2013001771A1
WO2013001771A1 PCT/JP2012/004069 JP2012004069W WO2013001771A1 WO 2013001771 A1 WO2013001771 A1 WO 2013001771A1 JP 2012004069 W JP2012004069 W JP 2012004069W WO 2013001771 A1 WO2013001771 A1 WO 2013001771A1
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WO
WIPO (PCT)
Prior art keywords
substrate
display device
manufacturing
terminal
terminal portion
Prior art date
Application number
PCT/JP2012/004069
Other languages
French (fr)
Japanese (ja)
Inventor
信介 齋田
Original Assignee
シャープ株式会社
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Publication date
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Publication of WO2013001771A1 publication Critical patent/WO2013001771A1/en

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133305Flexible substrates, e.g. plastics, organic film
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1345Conductors connecting electrodes to cell terminals
    • G02F1/13456Cell terminals located on one side of the display only

Definitions

  • the present invention relates to a method for manufacturing a display device, and more particularly to measures for preventing damage to terminal portions in a display device using a plastic substrate.
  • a liquid crystal display device which is a kind of display device, includes an element substrate on which a switching element such as a TFT (Thin Film Transistor) and a pixel electrode are formed, and a counter substrate on which a common electrode facing the element substrate is formed.
  • a switching element such as a TFT (Thin Film Transistor) and a pixel electrode are formed
  • a counter substrate on which a common electrode facing the element substrate is formed.
  • a structure in which a liquid crystal layer is sealed inside the sealing material between the two substrates is bonded to each other through a frame-shaped sealing material that surrounds the electrode pair.
  • a portion in which the liquid crystal layer is interposed constitutes a display unit that displays an image.
  • the element substrate is protruded to the side of the counter substrate and the side edge of the element substrate exposed from the counter substrate is used as a terminal portion, and the terminal portion is provided outside the display portion. is there.
  • the terminal portion is configured by exposing the element substrate from the counter substrate outside the sealing material, it is necessary to remove the counter substrate portion extending above the terminal portion in the manufacturing process.
  • the counter substrate portion to be removed is referred to as a material removal portion, and the step of removing the material removal portion is referred to as a terminal extraction step.
  • a liquid crystal display device instead of an element substrate using a glass substrate and a counter substrate, a flexible plastic substrate is used, and an element substrate capable of reducing the overall weight and thickness of the device, and A liquid crystal display device including a counter substrate is known.
  • the plastic substrate has a property that is more flexible and has higher tensile strength than a glass substrate, so the so-called scribe break method, that is, the element substrate and the counter substrate.
  • the scribe groove is put on the design dividing line with a diamond cutter etc.
  • the substrate is divided by applying a pressing force to the dividing line and the material removal part is folded. It is difficult to apply the method to take.
  • Patent Document 1 as a terminal extraction process, a diamond cutter performs a half cut that leaves a predetermined thickness on the cutting line of the material removal portion of the counter substrate, and the element substrate is bent at the terminal portion and the terminal portion.
  • a method for removing a material removal portion by separating the material removal portion after causing the material removal portion to be raised by a removal head is disclosed.
  • a scribe groove is formed in a parting line of a material removal portion in a counter substrate by laser light irradiation, and then a peripheral side surface is formed of an elastic body and the peripheral side surface is adhesive.
  • a cylindrical rotating body having a scribe groove is adhered to the outer surface of the counter substrate on which a scribe groove is formed, and the counter substrate is bent by the rotation of the rotating body and is broken along the scribe groove. A method of tearing off the part is disclosed.
  • Patent Document 3 a reflection metal film that reflects laser light is formed on the parting line of the material removal portion on the surface of the counter substrate that faces the element substrate as a terminal extraction step.
  • a method of cutting the material removal portion by irradiation is disclosed. According to the document 3, according to the method, when the material removal part is cut by laser light irradiation, the reflection metal film blocks the irradiation of the laser light to the terminal part, and the damage to the terminal part can be reduced. Is described.
  • the material removal part is torn along the scribe groove, so that burrs are generated on the fracture surface.
  • the substrate with burrs becomes a cause of defects in the subsequent process, it takes time to chamfer the burrs, and the manufacturing efficiency decreases.
  • a scribe groove is formed in a plastic substrate by laser light irradiation, a relatively thick substrate must be adopted as the plastic substrate in order to avoid a situation in which the laser light penetrates the plastic substrate. If it does so, the advantage of the plastic substrate which enables thickness reduction and weight reduction cannot fully be utilized.
  • the reflective metal film is melted by the irradiation energy of the laser beam, and the metal piece is scattered on the terminal part, and the adjacent wiring and terminals on the terminal part connect the metal piece.
  • the cut-side end portion bends toward the terminal portion side, so that the remaining portion of the reflective metal film remaining on the cut-side end portion is a terminal.
  • the present invention has been made in view of such a point, and the object of the present invention is to cut the substrate portion extending above the terminal portion without generating burrs, without damaging the terminal portion. It is to expose in a good state with no poor conductivity.
  • the cutting means is completely cut in a curved state in which the material removal portion is bent and separated from the terminal portion.
  • the method for manufacturing a display device according to the present invention has a structure in which a pair of substrates are bonded together with a sealing material, and one substrate has a terminal portion for connecting an external circuit at a side end.
  • the present invention is directed to a method for manufacturing a display device in which at least the other substrate has flexibility, and the following solution is taken.
  • the first invention is A first substrate having a terminal portion for connecting an external circuit at a side end portion and a second substrate having flexibility are opposed to each other, and the second substrate extends to an opposing region of the terminal portion. Displayed between the first substrate and the second substrate with or after being bonded via a sealing material located inside the terminal portion so that at least a part of the terminal portion is covered by the extending portion.
  • a display panel manufacturing process for manufacturing a display panel by interposing a medium layer The extended portion of the second substrate is bent so as to be separated from the terminal portion, so that the space between the terminal portion and the extended portion is in a curved state, and the extended portion of the second substrate in the curved state And cutting out the outer side of the sealing material by a cutting means to expose the terminal portion from the second substrate.
  • the material removal portion of the second substrate bonded to the first substrate is bent in a terminal drawing step so as to be separated from the terminal portion, thereby forming a curved state.
  • the space between the material removal portion and the terminal portion is widened, and the surface of the material removal portion facing the first substrate faces the outside of the terminal portion, so that the cutting means is applied to the terminal portion.
  • the material removal portion can be cut without any problems. Thereby, even if it is a case where a laser beam is used as a cutting
  • the curved state is a state in which the surface facing the first substrate in the extended portion of the second substrate faces the outside of the terminal portion so that the normal line does not pass through the terminal portion.
  • the material removal part is set in a curved state in which the normal line of the surface facing the first substrate does not pass through the terminal part in the terminal taking-out step.
  • the material removal portion can be cut in a direction perpendicular to the surface of the second substrate without applying a cutting means to the terminal portion. If the material removal part is cut in an oblique direction with respect to the surface of the second substrate, the cut-side end of the second substrate remains in a relatively long and excessively protruding state on the outside of the sealing material, causing a defect in a later process. It becomes.
  • the material removal portion can be cut in a direction perpendicular to the surface of the second substrate, occurrence of defects in the subsequent process can be suppressed.
  • the first substrate also has flexibility
  • the first substrate portion on the terminal portion side is also bent so as to be separated from the second substrate.
  • the first substrate portion on the terminal side is also bent away from the second substrate so that it is also curved.
  • the material removal portion and the first substrate portion on the terminal portion side are separated from each other.
  • the first substrate portion on the terminal portion side is also in the curved state between the material removal portion and the terminal portion. Can fully expand the space. Thereby, it becomes much easier to perform the cutting process of the material removal part without applying the cutting means to the terminal part.
  • the bending angle for bending the material removal portion is smaller than in the case where only the material removal portion is in a curved state, the stress applied to the bonding surface between the second substrate and the sealing material is suppressed, and The two substrates are prevented from peeling off from the sealing material. Furthermore, as in the second aspect of the invention, it is possible to easily realize a curved state in which the surface facing the first substrate in the material removal portion faces the outside of the terminal portion so that the normal line does not pass through the terminal portion. Therefore, it is possible to easily suppress the occurrence of defects in the subsequent process.
  • the display panel In the terminal pulling-out step, the display panel is placed on a curved stage having a convex curved surface with suction means for fixing the display panel by suction so that the first substrate is located on the stage side.
  • the first substrate portion on the terminal side is bent so as to be separated from the second substrate by the suction operation of the curved stage.
  • a curved surface stage is employed as the stage on which the display panel is placed, and the first substrate portion on the terminal portion side is bent so as to be separated from the second substrate side by the suction means provided in the curved surface stage.
  • the first substrate portion on the terminal side is simplified. The curved state can be obtained.
  • a fifth invention is a method of manufacturing a display device according to any one of the first to fourth inventions, In the terminal extracting step, a laser beam is used as the cutting means.
  • laser light is used as the cutting means. Since the cutting process by laser light irradiation can be performed at high speed, the manufacturing efficiency of the display device can be improved.
  • a sixth invention is a method of manufacturing a display device according to the fifth invention, wherein In the terminal projecting step, in the curved state, the second substrate is irradiated with laser light from the first substrate side.
  • the second substrate is irradiated with laser light from the first substrate side.
  • the laser beam is transmitted through the second substrate when the second substrate is irradiated with the laser light.
  • the light emission direction faces the terminal portion side due to refraction or scattering, and the laser light is irradiated to the terminal portion.
  • a seventh invention is the method of manufacturing a display device according to any one of the first to fourth inventions, In the terminal drawing step, an ultrasonic cutter or a heat cutter is used as the cutting means.
  • the ultrasonic cutter or the heat cutter is used as the cutting means, the stress applied to the bonding surface between the second substrate and the sealing material when cutting the material removal portion is suppressed, and the second substrate is It is prevented from peeling off from the sealing material.
  • the material removal part when cutting the material removal part by laser light irradiation, there is a possibility that the laser light may be scattered around, and when equipment for protection is required, an ultrasonic cutter or a heat cutter is used. Since the cutting means itself is not scattered around like the laser beam, the material removal part can be cut more safely.
  • An eighth invention is the method of manufacturing a display device according to any one of the first to seventh inventions,
  • a pulling jig having an adhesive layer is used, the adhesive layer is adhered to the surface of the extended end portion of the extended portion of the second substrate, and the second jig is lifted by the pulling operation of the pulling jig.
  • the extending portion of the substrate is bent so as to be separated from the terminal portion.
  • a pulling jig having an adhesive layer is used.
  • This lifting jig does not need to be inserted between the material removal portion and the terminal portion, and is attached to the surface of the extended end portion of the material removal portion to use the material removal portion in a curved state. Therefore, the terminal portion is not damaged even when the material removal portion is bent.
  • a ninth invention is a method of manufacturing a display device according to any one of the first to eighth inventions,
  • the second substrate includes a plastic substrate as a base substrate.
  • the second substrate can be reduced in weight and thickness, and as a result, the entire device can be reduced in weight and thickness.
  • a tenth aspect of the invention is a method for manufacturing a display device according to the ninth aspect of the invention,
  • the thickness of the plastic substrate included in the second substrate is 5 ⁇ m or more and 50 ⁇ m or less.
  • the plastic substrate used for the second substrate is relatively thin with a thickness of 5 ⁇ m to 50 ⁇ m, the second substrate can be reduced in weight and thickness, and the second substrate can be realized.
  • the substrate can have excellent flexibility, and the second substrate can be easily bent in the terminal drawing process.
  • An eleventh aspect of the invention is a method for manufacturing the ninth or tenth display device,
  • the first substrate also includes a plastic substrate as a base substrate.
  • the entire device can be reduced in weight and thickness, and a display device with excellent flexibility is manufactured. be able to.
  • a twelfth aspect of the invention is a method for manufacturing a display device according to the eleventh aspect of the invention,
  • the plastic substrate included in the first substrate has a thickness of 5 ⁇ m or more and 50 ⁇ m or less.
  • the plastic substrate used for the first substrate is relatively thin with a thickness of 5 ⁇ m to 50 ⁇ m, the first substrate can be reduced in weight and thickness, and the first substrate can be realized.
  • the substrate can be provided with excellent flexibility, and the first substrate can be easily bent in the terminal drawing process.
  • a thirteenth invention is a method of manufacturing a display device according to any one of the first to twelfth inventions, In the display panel manufacturing step, the sealing material is formed in a frame shape, and a liquid crystal layer is sealed as the display medium layer inside the sealing material.
  • the frame shape here includes not only a completely closed frame shape but also a frame shape having a cut in part.
  • a liquid crystal display device is manufactured by enclosing a liquid crystal layer inside a frame-shaped sealing material between the first substrate and the second substrate.
  • the material removal portion is bent to be separated from the terminal portion, and the material removal portion is completely cut by the cutting means in the curved state, so that the terminal portion can be formed without generating burrs.
  • substrate part can be cut
  • FIG. 1 is a plan view schematically showing the liquid crystal display device according to the first embodiment.
  • 2 is a cross-sectional view showing a cross-sectional structure taken along the line II-II in FIG. 3A and 3B are plan views showing a bonding step in the method for manufacturing a liquid crystal display device according to Embodiment 1.
  • FIG. 4A to 4D are cross-sectional views illustrating a liquid crystal injection step in the method of manufacturing the liquid crystal display device according to the first embodiment.
  • FIG. 5 is a plan view showing a sealing step in the method of manufacturing the liquid crystal display device according to the first embodiment.
  • 6A to 6D are cross-sectional views illustrating a terminal lead-out process in the method for manufacturing the liquid crystal display device according to the first embodiment.
  • FIGS. 7A and 7B are cross-sectional views illustrating a terminal lead-out process in the method of manufacturing the liquid crystal display device according to the second embodiment.
  • FIGS. 8A to 8C are cross-sectional views showing a terminal lead-out process in the method of manufacturing the liquid crystal display device according to the third embodiment.
  • Embodiment 1 of the Invention a liquid crystal display device S of an active matrix driving method (TFT driving method) will be described as an example of an application target of the method for manufacturing a display device according to the present invention.
  • TFT driving method active matrix driving method
  • FIG. 1 is a schematic plan view of the liquid crystal display device S.
  • FIG. FIG. 2 is a schematic cross-sectional view showing a cross-sectional structure taken along the line II-II in FIG. In FIG. 1, illustration of the polarizing plate 37 on the counter substrate 20 is omitted.
  • the liquid crystal display device S includes a liquid crystal panel P which is a display panel in which a pair of substrates 10 and 20 are bonded together and a liquid crystal layer 32 is sealed as a display medium layer between the substrates 10 and 20. More specifically, the liquid crystal panel P includes a TFT substrate 10 that is a first substrate, a counter substrate 20 that is a second substrate disposed to face the TFT substrate 10, and the TFT substrate 10 and the counter substrate 20. A frame-shaped sealing material 30 for adhering both outer peripheral edge portions and a liquid crystal layer 32 surrounded and sealed by the sealing material 30 between the TFT substrate 10 and the counter substrate 20 are provided. In addition, in the case where the liquid crystal display device S is a transmissive liquid crystal display device, a backlight unit configured to emit planar light to the liquid crystal panel P side on the back side of the liquid crystal panel P ( (Not shown).
  • This liquid crystal panel P is an area where the TFT substrate 10 and the counter substrate 20 overlap, and has, for example, a rectangular display area D for displaying an image on the inner side of the sealing material 30, that is, the area where the liquid crystal layer 32 is provided. is doing.
  • the display area D is composed of a plurality of pixels, which are the minimum unit of an image, arranged in a matrix.
  • the liquid crystal panel P has a frame region F which is a non-display region having a rectangular frame shape, for example, around the display region D.
  • a protruding portion 10a in which the TFT substrate 10 protrudes from the counter substrate 20 and the surface of the counter substrate 20 is exposed to the outside.
  • a plurality of terminals 12a arranged along the edge of the TFT substrate 10 and lead wires 14 connected thereto and extending to the display region D side are formed.
  • the terminal part 12 for circuit connection is comprised.
  • a wiring board (not shown) such as FPC (Flexible Printed Circuit) is connected to the terminal portion 12, and an image corresponding to an image to be displayed from an external driver IC (Integrated Circuit) via the wiring substrate.
  • a display signal including data is input.
  • the terminal portion 12 on the protruding portion 10a is exposed to the outside by cutting and removing the extended portion of the counter substrate 20 facing the protruding portion 10a as a material removal portion.
  • S is manufactured by connecting the wiring board after cutting the material removal portion.
  • the TFT substrate 10 and the counter substrate 20 are formed in, for example, a rectangular shape, and alignment films 34 and 35 are provided on inner surfaces facing each other, and polarizing plates 36 and 37 are provided on outer surfaces, respectively.
  • the transmission axis of the polarizing plate 36 on the TFT substrate 10 and the polarizing plate 37 on the counter substrate 20 differ by 90 °.
  • the sealing material 30 is formed in a rectangular frame shape having a cut line 30a in a portion along the side opposite to the side on the terminal portion 12 arrangement side, for example.
  • a sealing material 33 is filled in the cut portion 30 a of the sealing material 30.
  • the sealing material 30 and the sealing material 33 are made of a photocurable resin, a combined photocuring and thermosetting resin, or a thermosetting resin.
  • the liquid crystal layer 32 is made of, for example, a nematic liquid crystal material having electro-optical characteristics.
  • the TFT substrate 10 includes a film-like flexible plastic substrate 11 formed of a resin material as a base substrate.
  • the thickness of the plastic substrate 11 is preferably 200 ⁇ m or less, and more preferably 5 ⁇ m or more and 50 ⁇ m or less, from the viewpoint of ensuring flexibility.
  • the resin material for forming the plastic substrate 11 for example, organic materials such as acrylic, polyimide, polyetherimide, polyamideimide, polyethersulfone, cyanate ester, cyclic polyolefin, and copolymers thereof can be used.
  • the resin material forming the plastic substrate 11 needs to be transparent.
  • the plastic substrate 11 has a glass transition temperature of 200 ° C. or higher and can be used to form a driving TFT element.
  • Other resins such as polyester, polyamide, and polycarbonate, a lubricant, and a heat stabilizer , A weather stabilizer, a pigment, a dye, an inorganic filler and the like may be appropriately contained.
  • the material for forming the plastic substrate 11 is not limited to the glass transition temperature of the above condition (200 ° C. or higher).
  • the TFT substrate 10 includes a plurality of gate wirings (not shown) provided on the plastic substrate 11 so as to extend in parallel with each other, and a gate insulating film (not shown) provided so as to cover the gate wirings.
  • TFT (not shown), an interlayer insulating film (not shown) provided so as to cover each source wiring and each TFT, and a plurality of pixel electrodes 16 provided in a matrix on the interlayer insulating film. ing. In FIG. 2, for convenience, the plurality of pixel electrodes 16 are illustrated as one layer.
  • the gate wiring and the source wiring are formed in a lattice shape as a whole so as to partition each pixel, and the TFT and the pixel electrode 16 are provided for each pixel.
  • Each TFT includes a gate electrode connected to a corresponding gate wiring and covered with a gate insulating film, an island-shaped semiconductor layer overlapping the gate electrode through the gate insulating film, and a part on one side of the semiconductor layer And a source electrode connected to the corresponding source wiring, and a drain electrode partially connected to the other side of the semiconductor layer so as to face the source electrode.
  • Each pixel electrode 16 is connected to the drain electrode of the corresponding TFT through a contact hole formed in the interlayer insulating film, and is covered with the alignment film 34.
  • the counter substrate 20 also includes a film-like flexible plastic substrate 21 formed of a resin material as a base substrate.
  • the thickness of the plastic substrate 21 is preferably 200 ⁇ m or less, and more preferably 5 ⁇ m or more and 50 ⁇ m or less, from the same viewpoint as the plastic substrate 11 constituting the TFT substrate.
  • the plastic substrate 21 needs transparency, and as its forming material, for example, an organic material such as acrylic, epoxy, polyethersulfone, polycarbonate, cyclic polyolefin, and polyimide can be used.
  • an organic material such as acrylic, epoxy, polyethersulfone, polycarbonate, cyclic polyolefin, and polyimide can be used.
  • the counter substrate 20 has a black matrix (not shown) provided on the plastic substrate 21 so as to partition each pixel so as to correspond to the gate wiring and the source wiring, and between the grids of the black matrix.
  • a plurality of color filters including a red layer, a green layer, and a blue layer provided so as to be periodically arranged, and a common electrode 22 provided so as to cover these black matrix and each color filter, Photo spacers (not shown) provided in a columnar shape on the common electrode 22 are provided.
  • the counter substrate 20 is provided with a photo spacer.
  • the photo spacer may be formed on the TFT substrate 10 side.
  • a plastic ball having a uniform particle diameter or the like may be used.
  • a configuration may be adopted in which a spherical spacer made of is sandwiched between both substrates 10 and 20.
  • ⁇ Operation of the liquid crystal display device S In the liquid crystal display device S configured as described above, in each pixel, a gate signal is sent to the gate electrode via the gate wiring based on the display signal input from the external driver IC via the terminal portion 12, and the TFT is When the transistor is turned on, a source signal is sent to the source electrode through the source wiring, and a predetermined charge is written into the pixel electrode 16 through the semiconductor layer and the drain electrode. At this time, a potential difference is generated between each pixel electrode 16 of the TFT substrate 10 and the common electrode 22 of the counter substrate 20, and a predetermined voltage is applied to the liquid crystal layer 32. Then, in each pixel, an image is displayed by changing the alignment state of the liquid crystal molecules according to the magnitude of the voltage applied to the liquid crystal layer 32 and adjusting the transmittance of light incident from the backlight unit, for example, with the liquid crystal layer 32.
  • a TFT substrate 10 and a counter substrate 20 are manufactured one by one, and a single wafer manufacturing method for manufacturing the liquid crystal panel P by bonding the two substrates 10 and 20 will be described as an example. Also, a mother panel including a plurality of cell units constituting the liquid crystal panel P is manufactured, and the mother panel is divided into cell units, thereby being applied to a multi-chamfer manufacturing method in which a plurality of the liquid crystal panels P are simultaneously manufactured. can do.
  • the manufacturing method of the liquid crystal display device S includes a TFT substrate manufacturing process, a counter substrate manufacturing process, a display panel manufacturing process, a terminal extraction process, and a mounting process.
  • the terminal portion 12 (terminal 12a), the lead wiring 14, the gate wiring, the gate insulating film, the source wiring, the TFT, the interlayer insulating film, and the pixel electrode 16 are formed by a CVD (Chemical Vapor Deposition) method.
  • the TFT substrate 10 is manufactured by forming by a known method of repeatedly performing film formation processing such as sputtering or photolithography.
  • the black matrix, the color filter, the common electrode 22 and the photo spacer are repeatedly formed on the plastic substrate 21 having the same size as that of the TFT substrate 10 by repeatedly performing a film forming process by spin coating or sputtering or photolithography.
  • the counter substrate 20 is fabricated by forming the method.
  • the display panel manufacturing process to be performed includes a bonding step, a liquid crystal injection step, and a sealing step.
  • ⁇ Bonding step> The procedure of the bonding step is shown in FIGS. 3 (A) and 3 (B).
  • alignment films 34 and 35 are formed by a printing method on the surfaces of the TFT substrate 10 and the counter substrate 20 on the side where the electrodes 16 and 22 are formed, and then a rubbing process is performed as necessary.
  • a sealing material 30 made of a thermosetting resin is drawn in a frame shape along the periphery of the substrate on the surface of the counter substrate 20 on the alignment film 35 side, as shown in FIG.
  • the sealing material 30 is not formed into a completely closed frame shape, but is formed into a frame shape having a cut 30a in a portion along one side (the right side in FIG. 3A).
  • a blank area 20a located outside the sealing material 30 is left on the opposite side (the left side in FIG. 3A) of the position where the cut 30a is formed on the counter substrate 20.
  • the sealing material 30 is drawn on the surface of the counter substrate 20.
  • the present invention is not limited to this, and the sealing material 30 may be drawn on the surface of the TFT substrate 10 on the alignment film 34 side. Good.
  • the sealing material 30 is drawn in a frame shape having a cut 30 a on the opposite side portion of the side on the terminal portion 12 arrangement side so as to be positioned inside the substrate 10 relative to the terminal portion 12.
  • the TFT substrate 10 and the counter substrate 20 are opposed to each other, and are bonded through the sealing material 30 in a state where the formation surfaces of the alignment films 34 and 35 face each other so that the electrodes 16 and 22 face each other.
  • the sealing material 30 is heated to be cured, and as shown in FIG. 3 (B), a liquid crystal having a gap portion 31 inside the sealing material 30 and constituted by the cuts 30a of the sealing material 30.
  • the bonding panel P ′ having the inlet 30b is configured.
  • the opposing substrate 20 portion on the opposite side to the cut 30a of the sealing material 30, that is, the blank area 20a is located on the terminal portion 12 so that the cut 30a of the sealing material 30 is located on the opposite side of the terminal portion 12
  • the TFT substrate 10 and the counter substrate 20 are bonded together so as to extend upward and cover the terminal portion 12 with the extended portion 20a.
  • the above-mentioned bonding panel P ′ is put into the vacuum chamber 50 together with the container 51 storing the liquid crystal material 32a as shown in FIG. 4A, and the vacuum chamber 50 is evacuated to a high vacuum state. And in this vacuum environment, as shown in FIG.4 (B), the liquid-crystal injection hole 30b of the bonding panel P 'is immersed in the said liquid-crystal material 32a.
  • the inside of the vacuum chamber 50 is opened to atmospheric pressure by leaking air.
  • the liquid crystal material 32a is injected into the gap 31 from the liquid crystal injection port 30b. If it is left for a predetermined time in this state, as shown in FIG. 4D, the liquid crystal material 32 a is filled in the entire gap portion 31 to form the liquid crystal layer 32. Thereafter, the bonding panel P ′ is taken out from the vacuum chamber 50.
  • FIG. 5 shows the liquid crystal panel P in a state where the liquid crystal inlet 30b is sealed in the subsequent sealing step.
  • a sealing material 33 made of an ultraviolet curable resin is applied to the injection port 30b. And this sealing material 33 is hardened by irradiation of an ultraviolet-ray, and as shown in FIG. 5, the liquid-crystal injection hole 30b is sealed. Thus, the liquid crystal panel P is manufactured.
  • ⁇ Terminal extraction process> 6A to 6D show the procedure of the terminal extraction process to be performed next.
  • the extended portion 20a of the counter substrate shown in FIG. 6A is cut outside the sealing material 30 with the material removal portion.
  • a broken line 24 shown in FIG. 6A indicates a design cutting line of the material removal portion 20a.
  • the liquid crystal panel P is placed on a curved surface stage 52 having a convex curved surface.
  • the curved surface stage 52 is provided with suction means such as a vacuum chuck or an electrostatic chuck, and the liquid crystal panel P is sucked and fixed by the suction operation of the suction means.
  • suction means such as a vacuum chuck or an electrostatic chuck
  • the liquid crystal panel P is sucked and fixed by the suction operation of the suction means.
  • the suction operation of the curved surface stage 52 the liquid crystal panel P is placed on the curved surface stage 52 and then bent along the placement surface, and the TFT substrate 10 portion on the terminal portion 12 side is separated from the material removal portion 20a of the counter substrate 20. To be bent.
  • the material removal portion 20a of the counter substrate 20 is bent using a pulling jig 54 having an L-shaped claw 54a.
  • the tip of the claw 54a of the pulling jig 54 is inserted between the terminal portion 12 and the material removal portion 20a as shown in FIG. 6 (B). Subsequently, as shown in FIG. 6C, the tip of the claw 54 a is hooked on the material removal portion 20 a, and the material removal portion 20 a is pulled up by the pulling up operation of the lifting jig 54. Then, the material removal portion 20 a of the counter substrate 20 is bent so as to be separated from the terminal portion 12, so that a space between the terminal portion 12 and the space is widened.
  • This curved state is a state in which the surface facing the TFT substrate 10 in the material removal portion 20a of the counter substrate 20 is directed outward to the extent that the normal line does not pass through the terminal portion 12. .
  • the material removal portion 20 a is pulled up too much, an excessive stress is applied to the bonding surface between the counter substrate 20 and the sealing material 30, and the counter substrate 20 may be peeled off from the sealing material 30.
  • the TFT substrate 10 portion on the terminal portion 12 side is also in a curved state that is bent away from the material removal portion 20a, only the material removal portion 20a of the counter substrate 20 is in a curved state.
  • the space between the material removal portion 20a and the terminal portion 12 is as much as the TFT substrate 10 portion on the terminal portion 12 side is also in a curved state.
  • the curved portion of the material removal portion 20a that is, the surface of the material removal portion 20a facing the TFT substrate 10 is outside the terminal portion 12 so that the normal line does not pass through the terminal portion 12. Can be easily realized.
  • substrate 20 may be small, the stress concerning the adhesion surface of the opposing board
  • the laser beam L as the cutting means is applied to the cutting substrate 24 on the counter substrate 20 from the TFT substrate 10 side with respect to the cutting line 24 of the material removal portion 20a.
  • the material removal portion 20a is cut outside the sealing material 30 by irradiating at an angle perpendicular to or close to the opposite surface of the material. As a result, the material removal portion 20a can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state with no conductive failure without being damaged.
  • the space between the material removal portion 20a of the counter substrate 20 and the terminal portion 12 is widened, and the entire surface of the material removal portion 20a facing the TFT substrate 10 extends outside the terminal portion 12. It is suitable. And since the laser beam L is irradiated to the material removal portion 20a in such a curved state at an angle perpendicular to or close to the surface of the TFT substrate 10, the laser beam L is not irradiated to the terminal portion 12.
  • the material removal portion 20a can be cut. Then, since there is no need to form a reflective metal film on the cutting line 24 of the material removal portion 20a as in Patent Document 3 described above, the adjacent terminals on the terminal portion 12 by cutting the material removal portion 20a. It is not necessary to cause a failure in the terminal portion 12 due to a short circuit between the wiring 12a and the wiring 14. In addition, since the material removal portion 20a is completely cut by the laser beam L, burrs are not generated on the cut surface.
  • the opposite substrate 20 when the opposite substrate 20 is irradiated with the laser light L from the side opposite to the TFT substrate 10, when the opposite substrate 20 is irradiated with the laser light L, the opposite substrate 20 There is a possibility that the laser beam L is transmitted through the inside, the emission direction of the transmitted light is directed toward the terminal portion 12 due to refraction or scattering, and the terminal portion 12 is irradiated with the laser light L.
  • the laser light L is irradiated from the TFT substrate 10 side, the cause of the laser light L being applied to the terminal portion 12 is eliminated, and damage to the terminal portion 12 is reliably prevented. be able to.
  • the laser beam L when used as the cutting means of the material removal portion 20a, high-speed processing is possible while reliably preventing damage to the terminal portion 12, so that the manufacturing efficiency of the liquid crystal display device S is enhanced.
  • the laser beam L an Ar laser, a YAG (Yttrium-Aluminum-Garnet) laser, a CO2 laser, or the like can be suitably used.
  • the suction operation of the curved stage 52 is stopped, and the liquid crystal panel P is separated from the curved stage 52.
  • the TFT substrate 10 portion on the terminal portion 12 side with respect to the counter substrate 20 is protruded to form the protrusion 10 a, and the terminal portion 12 is exposed from the counter substrate 20.
  • polarizing plates 36 and 37 are attached to both sides of the liquid crystal panel P, respectively.
  • a wiring board such as an FPC connected to an external driver IC is connected to the terminal portion 12 of the liquid crystal panel P via an anisotropic conductive film or the like. Thereafter, a backlight unit or the like is mounted on the liquid crystal panel P as necessary.
  • the liquid crystal display device S shown in FIGS. 1 and 2 can be manufactured.
  • the material removal portion 20a of the counter substrate 20 is bent to be separated from the terminal portion 12, and the material removal portion 20a is completely cut by irradiation with the laser light L in the curved state. Therefore, the material removal portion 20a of the counter substrate 20 extending above the terminal portion 12 can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state without any conductive failure without being damaged. .
  • Embodiment 2 of the Invention the configuration of the liquid crystal display device S and other steps in the manufacturing method thereof are the same as those of the first embodiment except that the terminal lead-out process is partially different from the first embodiment. Only the terminal drawing process will be described. In the following embodiments, the same components as those in FIGS. 1 to 6 are denoted by the same reference numerals, and the detailed description thereof will be omitted.
  • ⁇ Terminal extraction process> 7A and 7B show the procedure of the terminal extraction process in this embodiment.
  • the pulling jig 54 having the L-shaped claw 54a is used as a means for bringing the material removal portion 20a into a curved state.
  • a jig 56 is used.
  • the liquid crystal panel P is placed on the curved surface stage 52, and the liquid crystal panel P is sucked and fixed by the suction operation of the curved surface stage 52.
  • the liquid crystal panel P is bent along the mounting surface of the curved surface stage 52, and the TFT substrate 10 portion on the terminal portion 12 side is bent so as to be separated from the material removal portion 20a to be in a curved state.
  • the material removal portion 20a of the counter substrate 20 is bent using the pulling jig 56 having the weak adhesive layer 56a at the bottom.
  • the weak adhesive layer 56a is adhered to the surface of the extended end portion of the material removal portion 20a in the counter substrate 20, and as shown in FIG. By removing the jig 56, the material removal portion 20a is pulled up. Then, the material removal portion 20a of the counter substrate 20 is bent so as to be separated from the terminal portion 12, and a curved state in which a space between the terminal portion 12 is widened at an angle similar to that of the first embodiment, To do.
  • the laser beam L as the cutting means is applied from the TFT substrate 10 side to the TFT substrate 10 side of the counter substrate 20 with respect to the cutting line 24 of the material removal portion 20a.
  • the material removal portion 20 a is cut outside the sealing material 30.
  • the material removal portion 20a can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state with no conductive failure without being damaged.
  • the suction operation of the curved stage 52 is stopped and the liquid crystal panel P is separated from the curved stage 52.
  • the portion of the TFT substrate 10 closer to the terminal portion 12 than the counter substrate 20 is protruded to form the protruding portion 10a, and the terminal portion 12 is exposed from the counter substrate 20.
  • Embodiment 2- According to the second embodiment, the same effects as those of the first embodiment can be obtained, and the pulling jig 56 having the weak adhesive layer 56a is used. Therefore, a part of the pulling jig 54 as in the first embodiment is used. Is not required to be inserted between the material removal portion 20a of the counter substrate 20 and the terminal portion 12, and the material removal portion 20a is curved by adhering to the surface of the extended end portion of the material removal portion 20a. The terminal portion 12 can be prevented from being damaged even when the material removal portion 20a is in a curved state.
  • Embodiment 3 of the Invention Since the third embodiment is the same as the first embodiment except for the terminal putting out process, only the terminal putting out process having a different configuration will be described.
  • ⁇ Terminal extraction process> 8A to 8C show the procedure of the terminal extraction process in this embodiment.
  • the laser beam L is used as a cutting means for cutting the material removal portion 20a.
  • an ultrasonic cutter 58 is used as the same means.
  • the liquid crystal panel P is placed on the curved stage 52, and the liquid crystal panel P is sucked and fixed by the sucking operation of the curved stage 52.
  • the liquid crystal panel P is bent following the mounting surface of the curved stage 52, and the TFT substrate 10 portion on the terminal portion 12 side is bent away from the material removal portion 20a to be bent at the same angle as in the first embodiment.
  • the material removal portion 20a of the counter substrate 20 is bent using a pulling jig 56 having a weak adhesive layer 56a at the bottom.
  • the material removal portion 20a of the counter substrate 20 is cut from the surface side of the liquid crystal panel P by an ultrasonic cutter 58 as cutting means, as shown in FIGS. Cut along the line 24 on the outside of the sealing material 30.
  • the material removal portion 20a can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state with no conductive failure without being damaged.
  • the suction operation of the curved stage 52 is stopped and the liquid crystal panel P is separated from the curved stage 52.
  • the portion of the TFT substrate 10 closer to the terminal portion 12 than the counter substrate 20 is protruded to form the protruding portion 10a, and the terminal portion 12 is exposed from the counter substrate 20.
  • the same effect as in the first embodiment can be obtained, and the ultrasonic cutter 58 is used as a cutting means. Therefore, when the material removal portion 20a is cut, the counter substrate 20 and the sealing material 30 are used. It is possible to prevent the counter substrate 20 from being peeled off from the sealing material 30 by suppressing the stress applied to the adhesive surface.
  • the material removal portion 20a when the material removal portion 20a is cut by irradiation with the laser beam L, the laser beam L may be scattered around, and a protection facility is required. On the other hand, the ultrasonic cutter 58 is used. In this case, since the cutting means itself is not scattered around like the laser beam L, the material removal portion 20a can be cut more safely.
  • the ultrasonic cutter 58 is used as the cutting means in place of the laser beam L.
  • the same effect can be obtained even if a heat cutter is used.
  • the TFT substrate 10 includes the plastic substrate 11 as a base substrate.
  • the present invention is not limited to this, and the TFT substrate 10 may be a glass substrate or a silicon substrate instead of the plastic substrate 11. May be provided.
  • the pulling jig 54 having the L-shaped claw 54a is used, and in the second embodiment, the pulling jig 56 having the weak adhesive layer 56a is used to pull up the material removal portion 20a of the counter substrate 20 and bend it.
  • the present invention is not limited to this, and the material removal portion 20a may be curved using a pulling jig having a suction function such as vacuum tweezers.
  • a pulling mechanism that sandwiches and lifts both ends of the extending end of the material removal portion 20a may be employed.
  • a means such as a blower that raises the material removal portion 20a by its air pressure and makes it curved may be employed.
  • the bonding panel P ' which has the space
  • the liquid crystal material 32a is injected into the gap portion 31 'by using a pressure difference caused by evacuation from the liquid crystal injection port 30b formed by the cut 30a of the sealing material 30, and then the liquid crystal injection port 30b is formed by the sealing material 33.
  • the liquid crystal panel P is manufactured by a so-called vacuum injection method for sealing, the present invention is not limited to this.
  • the sealing material 30 is drawn in a completely closed frame shape on the surface of the TFT substrate 10 or the counter substrate 20, and a predetermined amount of the liquid crystal material 32a is dropped inside the sealing material 30. Then, the TFT substrate 10 and the counter substrate 20 are bonded together under a vacuum environment through the sealing material 30 and the liquid crystal material 32a, and finally the sealing material 30 is cured, so that a liquid crystal panel P is manufactured by a so-called drop injection method. Also good.
  • the active matrix driving type liquid crystal display device S using TFTs has been described as an example.
  • the present invention is not limited to this, and is not limited to three-terminal elements such as TFTs.
  • the present invention is also applicable to an active matrix liquid crystal display device using a two-terminal element such as MIM (Metal Insulator Metal) as a drive element.
  • MIM Metal Insulator Metal
  • the display device manufacturing method according to the present invention can be applied not only to the active drive type liquid crystal display device S but also to the passive (multiplex) drive type liquid crystal display device.
  • the method for manufacturing a display device according to the present invention can be applied to any type of display panel of transmissive type, reflective type, and transmissive / reflective type.
  • the display device manufacturing method includes not only the liquid crystal display device S but also an organic EL (Electro Luminescence) display device, an inorganic EL display device, and a display medium each having an EL (Electro Luminescence) layer as a display medium layer. It can be applied to a plasma display device having a gas layer such as neon gas or xenon gas as a layer.
  • FED Field-Emission Display
  • SED Surface-conduction Electron-emitter Display
  • And can be widely applied as a manufacturing method of various display devices such as an electrowetting display device.
  • the present invention has a structure in which a pair of substrates are bonded to each other with a sealing material, one substrate is provided with a terminal portion for connecting an external circuit at a side end, and the other substrate is acceptable. It is useful for a method of manufacturing a display device having flexibility, and in particular, a substrate portion extending above the terminal portion without generating burrs is cut, and there is no poor conduction without damaging the terminal portion. It is suitable for a manufacturing method of a display device that is required to be exposed in a state.
  • S Liquid crystal display device 10 TFT substrate (first substrate) DESCRIPTION OF SYMBOLS 11, 21 Plastic substrate 12 Terminal part 12a Terminal 14 Lead-out wiring 16 Pixel electrode 20 Opposite substrate (2nd substrate) 20a Material removal part (extension part of second substrate, blank area) 22 Common electrode 24 Cutting line 30 Sealing material 30a Cut 30b Liquid crystal injection port 31 Void portion 32 Liquid crystal layer 32a Liquid crystal material 33 Sealing material 34, 35 Alignment film 36, 37 Polarizing plate 50 Vacuum chamber 51 Container 52 Curved stage 54, 56 Pulling up Jig 54a Claw 56a Weak adhesive layer 58 Ultrasonic cutter (cutting means)

Abstract

In the present invention, a TFT substrate (10) provided with, on a side edge section of the TFT substrate, a terminal section (12) for connecting an outer circuit, and a flexible opposing substrate (20) are caused to oppose each other and be bonded together via a sealing material (30) inward from the terminal section (12) so that the opposing substrate (20) extends out to a region opposite to the terminal section (12) and at least a portion of the terminal section (12) is covered by an extension portion (20a) of the opposing substrate (20), after which the extension portion (20a) the opposing substrate (20) is bent so as to turn away from the terminal section (12) and is made into a curved state with an expanded space therebetween with the terminal section (12), and in this curved state, the extension portion (20a) of the opposite substrate (20) is cut off on the outer side of the seal material (30) by laser light (L) to expose the terminal section (12) with respect to the opposite substrate (20).

Description

表示装置の製造方法Manufacturing method of display device
 本発明は、表示装置の製造方法に関し、特にプラスチック基板を用いた表示装置における端子部の損傷防止対策に関するものである。 The present invention relates to a method for manufacturing a display device, and more particularly to measures for preventing damage to terminal portions in a display device using a plastic substrate.
 表示装置の一種である液晶表示装置は、TFT(Thin Film Transistor)などのスイッチング素子及び画素電極が形成された素子基板と、これに対向する共通電極が形成された対向基板とが、互いの電極同士を対向させた状態で該電極対を囲む枠状のシール材を介して貼り合わされ、これら両基板の間でシール材の内側に液晶層が封入された構造を備えており、両基板の電極間に液晶層が介在する部分が画像表示を行う表示部を構成している。 A liquid crystal display device, which is a kind of display device, includes an element substrate on which a switching element such as a TFT (Thin Film Transistor) and a pixel electrode are formed, and a counter substrate on which a common electrode facing the element substrate is formed. A structure in which a liquid crystal layer is sealed inside the sealing material between the two substrates is bonded to each other through a frame-shaped sealing material that surrounds the electrode pair. A portion in which the liquid crystal layer is interposed constitutes a display unit that displays an image.
 そして、液晶表示装置では、素子基板を対向基板よりも側方に突出させ対向基板から露出した素子基板の側端部を端子部として、上記表示部の外側に端子部を設ける構成が一般的である。このように端子部はシール材の外側で素子基板を対向基板から露出させて構成されるので、当該端子部の上方に延出する対向基板部分は製造過程で除去する必要がある。なお、以下、この除去する対向基板部分を除材部と称すると共に、該除材部を除去する工程を端子出し工程と称する。 In a liquid crystal display device, the element substrate is protruded to the side of the counter substrate and the side edge of the element substrate exposed from the counter substrate is used as a terminal portion, and the terminal portion is provided outside the display portion. is there. Thus, since the terminal portion is configured by exposing the element substrate from the counter substrate outside the sealing material, it is necessary to remove the counter substrate portion extending above the terminal portion in the manufacturing process. Hereinafter, the counter substrate portion to be removed is referred to as a material removal portion, and the step of removing the material removal portion is referred to as a terminal extraction step.
 このような液晶表示装置としては、ガラス基板を用いた素子基板及び対向基板に代えて、可撓性を有するプラスチック基板を用い、装置全体の軽量化及び薄型化を図ることが可能な素子基板及び対向基板を備えた液晶表示装置が知られている。 As such a liquid crystal display device, instead of an element substrate using a glass substrate and a counter substrate, a flexible plastic substrate is used, and an element substrate capable of reducing the overall weight and thickness of the device, and A liquid crystal display device including a counter substrate is known.
 プラスチック基板を用いた液晶表示装置の製造における端子出し工程では、プラスチック基板がガラス基板よりもフレキシブル性に優れて且つ引っ張り強度が高い性質を有するため、いわゆるスクライブブレイク法、すなわち、素子基板と対向基板とを貼り合わせた状態にて対向基板に対しダイヤモンドカッターなどにより設計上の分断ラインにスクライブ溝を入れた後、該分断ラインに押圧力を加えることにより基板を分断して、除材部を折り取る方法を適用することが困難である。 In the terminal drawing process in the manufacture of a liquid crystal display device using a plastic substrate, the plastic substrate has a property that is more flexible and has higher tensile strength than a glass substrate, so the so-called scribe break method, that is, the element substrate and the counter substrate. After the scribe groove is put on the design dividing line with a diamond cutter etc., the substrate is divided by applying a pressing force to the dividing line and the material removal part is folded. It is difficult to apply the method to take.
 そこで、プラスチック基板を用いた液晶表示装置の製造における端子出し工程について種々の方法が提案されている。 Therefore, various methods have been proposed for the terminal drawing process in the manufacture of a liquid crystal display device using a plastic substrate.
 例えば、特許文献1には、端子出し工程として、ダイヤモンドカッターにより対向基板における除材部の分断ラインに所定厚さだけ切り残すハーフカットを行い、素子基板を端子部にて曲げて該端子部と除材部とを引き離した後、除材部を除去ヘッドにて引き起こして折り取ることで、除材部を除去する方法が開示されている。 For example, in Patent Document 1, as a terminal extraction process, a diamond cutter performs a half cut that leaves a predetermined thickness on the cutting line of the material removal portion of the counter substrate, and the element substrate is bent at the terminal portion and the terminal portion. A method for removing a material removal portion by separating the material removal portion after causing the material removal portion to be raised by a removal head is disclosed.
 また、特許文献2には、端子出し工程として、レーザー光の照射により対向基板における除材部の分断ラインにスクライブ溝を形成した後、周側面が弾性体で形成され且つ該周側面が粘着性を有する円柱状の回転体を、スクライブ溝が形成された対向基板の外表面に粘着させ、当該回転体の回転により該対向基板を屈曲させて上記スクライブ溝に沿って破断することにより、除材部をちぎり取る方法が開示されている。 Further, in Patent Document 2, as a terminal extracting step, a scribe groove is formed in a parting line of a material removal portion in a counter substrate by laser light irradiation, and then a peripheral side surface is formed of an elastic body and the peripheral side surface is adhesive. A cylindrical rotating body having a scribe groove is adhered to the outer surface of the counter substrate on which a scribe groove is formed, and the counter substrate is bent by the rotation of the rotating body and is broken along the scribe groove. A method of tearing off the part is disclosed.
 またその他、特許文献3には、端子出し工程として、対向基板の素子基板との対向面において除材部の分断ライン上にレーザー光を反射させる反射用金属膜を形成しておき、レーザー光の照射により除材部を切断する方法が開示されている。そして同文献3には、当該方法によれば、レーザー光の照射による除材部の切断時に反射用金属膜によってレーザー光の端子部への照射が遮断され、端子部が受けるダメージを軽減できる旨が記載されている。 In addition, in Patent Document 3, a reflection metal film that reflects laser light is formed on the parting line of the material removal portion on the surface of the counter substrate that faces the element substrate as a terminal extraction step. A method of cutting the material removal portion by irradiation is disclosed. According to the document 3, according to the method, when the material removal part is cut by laser light irradiation, the reflection metal film blocks the irradiation of the laser light to the terminal part, and the damage to the terminal part can be reduced. Is described.
特開2001-0255518号公報JP 2001-0255518 A 特開2010-2435556号公報JP 2010-2435556 A 特開2009-0098425号公報JP 2009-0098425 A
 しかしながら、特許文献1の端子出し工程では、プラスチック基板の薄型化に伴い、該プラスチック基板をダイヤモンドカッターを使用してハーフカットすること自体が困難であり、プラスチック基板をハーフカットしようとすると、該プラスチック基板が完全に切断されてしまいやすい。そうなると、除材部と端子部とは互いに近接した位置関係にあるので、ダイヤモンドカッターが端子部にまで達して端子部上の配線や端子を傷つけてしまい、端子部が損傷するおそれがある。 However, in the terminal extraction process of Patent Document 1, it is difficult to half-cut the plastic substrate using a diamond cutter as the plastic substrate becomes thinner. The substrate is likely to be completely cut. In this case, since the material removal portion and the terminal portion are in a positional relationship close to each other, the diamond cutter reaches the terminal portion and damages the wiring and terminals on the terminal portion, which may damage the terminal portion.
 また、特許文献2の端子出し工程では、スクライブ溝に沿って除材部を引きちぎるため、その破断面にバリを生成してしまう。バリ付きの基板は後工程で不良の原因となるが、バリを面取りするには手間がかかり、製造効率が低下する。その上、レーザー光の照射によりプラスチック基板にスクライブ溝を形成する場合には、レーザー光がプラスチック基板を貫通する事態を避けるべく該プラスチック基板には比較的厚い基板を採用せざるを得ないが、そうすると、薄型化及び軽量化を可能にするというプラスチック基板の利点を十分に活かしきれない。 Also, in the terminal pulling out process of Patent Document 2, the material removal part is torn along the scribe groove, so that burrs are generated on the fracture surface. Although the substrate with burrs becomes a cause of defects in the subsequent process, it takes time to chamfer the burrs, and the manufacturing efficiency decreases. In addition, when a scribe groove is formed in a plastic substrate by laser light irradiation, a relatively thick substrate must be adopted as the plastic substrate in order to avoid a situation in which the laser light penetrates the plastic substrate. If it does so, the advantage of the plastic substrate which enables thickness reduction and weight reduction cannot fully be utilized.
 また、特許文献3の端子出し工程では、レーザー光の照射エネルギーにより反射用金属膜が溶融してその金属片が端子部に飛散し、端子部上で隣接する配線や端子同士が上記金属片を介して短絡するおそれがある。さらに、対向基板を構成するプラスチック基板が極めて高いフレキシブル性を有する場合には、その切断側端部が端子部側に撓ることによって、当該切断側端部に残った反射金属膜の残部が端子部に接触し、端子部に導電不良を招くおそれもある。 In addition, in the terminal extraction process of Patent Document 3, the reflective metal film is melted by the irradiation energy of the laser beam, and the metal piece is scattered on the terminal part, and the adjacent wiring and terminals on the terminal part connect the metal piece. There is a risk of short circuit. Further, when the plastic substrate constituting the counter substrate has extremely high flexibility, the cut-side end portion bends toward the terminal portion side, so that the remaining portion of the reflective metal film remaining on the cut-side end portion is a terminal. There is also a risk of contact with the part, leading to poor conductivity in the terminal part.
 上述した諸問題は、当然ながら対向基板のみにプラスチック基板を用いた液晶表示装置においても同様に生じる。 Of course, the above-mentioned problems also occur in a liquid crystal display device using a plastic substrate only for the counter substrate.
 本発明は、斯かる点に鑑みてなされたものであり、その目的とするところは、バリを生成することなく端子部の上方に延出する基板部分を切断し、端子部を損傷させずに導電不良のない良好な状態で露出させることにある。 The present invention has been made in view of such a point, and the object of the present invention is to cut the substrate portion extending above the terminal portion without generating burrs, without damaging the terminal portion. It is to expose in a good state with no poor conductivity.
 上記の目的を達成するために、この発明では、除材部を撓らせて端子部から離反させた湾曲状態で切断手段により完全に切断しきるようにした。 In order to achieve the above object, in the present invention, the cutting means is completely cut in a curved state in which the material removal portion is bent and separated from the terminal portion.
 具体的には、本発明に係る表示装置の製造方法は、一対の基板がシール材を介して貼り合わされた構造を有し、一方の基板が側端部に外部回路接続用の端子部を備え、少なくとも他方の基板が可撓性を有する表示装置の製造方法を対象とし、以下の解決手段を講じたものである。 Specifically, the method for manufacturing a display device according to the present invention has a structure in which a pair of substrates are bonded together with a sealing material, and one substrate has a terminal portion for connecting an external circuit at a side end. The present invention is directed to a method for manufacturing a display device in which at least the other substrate has flexibility, and the following solution is taken.
 すなわち、第1の発明は、
 外部回路接続用の端子部を側端部に備えた第1基板と、可撓性を有する第2基板とを、互いに対向させて、上記第2基板が上記端子部の対向領域に延出し該延出部分によって上記端子部の少なくとも一部が覆われるように上記端子部よりも内側に位置するシール材を介して貼り合わせると共に又はその後に、当該第1基板と第2基板との間に表示媒体層を介在させることにより、表示パネルを作製する表示パネル作製工程と、
 上記第2基板の延出部分を、上記端子部から離反するように撓らせて、上記端子部との間の空間を広げた湾曲状態とし、該湾曲状態において上記第2基板の延出部分を切断手段により上記シール材の外側で切断して、上記第2基板から上記端子部を露出させる端子出し工程とを含む
ことを特徴とする。
That is, the first invention is
A first substrate having a terminal portion for connecting an external circuit at a side end portion and a second substrate having flexibility are opposed to each other, and the second substrate extends to an opposing region of the terminal portion. Displayed between the first substrate and the second substrate with or after being bonded via a sealing material located inside the terminal portion so that at least a part of the terminal portion is covered by the extending portion. A display panel manufacturing process for manufacturing a display panel by interposing a medium layer;
The extended portion of the second substrate is bent so as to be separated from the terminal portion, so that the space between the terminal portion and the extended portion is in a curved state, and the extended portion of the second substrate in the curved state And cutting out the outer side of the sealing material by a cutting means to expose the terminal portion from the second substrate.
 この第1の発明では、端子出し工程にて、第1基板と貼り合わせた第2基板の除材部を端子部から離反するように撓らせて湾曲状態とする。この湾曲状態では、除材部と端子部との間の空間が広げられ、且つ該除材部の第1基板との対向面が端子部の外側方を向くので、切断手段を端子部に当てることなく除材部を切断することが可能になる。これにより、切断手段としてレーザー光を用いる場合であっても、レーザー光が端子部に照射されることを回避可能である。そうすると、上述した特許文献3の如く切断ライン上に反射用金属膜を形成しておく必要性がそもそもないので、除材部の切断によって、端子部上で隣接する端子や配線同士が短絡するなどして端子部に導電不良が生じる事態を招かずに済む。しかも、除材部を切断手段により完全に切断しきるので、その切断面にバリが生成されることもない。 In the first aspect of the present invention, the material removal portion of the second substrate bonded to the first substrate is bent in a terminal drawing step so as to be separated from the terminal portion, thereby forming a curved state. In this curved state, the space between the material removal portion and the terminal portion is widened, and the surface of the material removal portion facing the first substrate faces the outside of the terminal portion, so that the cutting means is applied to the terminal portion. The material removal portion can be cut without any problems. Thereby, even if it is a case where a laser beam is used as a cutting | disconnection means, it can avoid irradiating a laser beam to a terminal part. Then, since there is no need to form a reflective metal film on the cutting line as in Patent Document 3 described above, adjacent terminals and wirings on the terminal portion are short-circuited by cutting the material removal portion. Thus, it is possible to avoid a situation in which poor conductivity occurs in the terminal portion. Moreover, since the material removal portion can be completely cut by the cutting means, no burrs are generated on the cut surface.
 第2の発明は、第1の発明の表示装置の製造方法において、
 上記湾曲状態は、上記第2基板の延出部分における上記第1基板との対向面を、その法線が上記端子部を通らないように該端子部の外側方に向けた状態である
ことを特徴とする。
According to a second aspect of the present invention, in the method for manufacturing the display device of the first aspect,
The curved state is a state in which the surface facing the first substrate in the extended portion of the second substrate faces the outside of the terminal portion so that the normal line does not pass through the terminal portion. Features.
 この第2の発明では、端子出し工程にて、除材部を第1基板との対向面の法線が端子部を通らない湾曲状態とする。この湾曲状態では、切断手段を端子部に当てることなく除材部を第2基板の表面に対して垂直な方向に切断することが可能になる。仮に、除材部を第2基板の表面に対して斜め方向に切断すると、第2基板の切断側端部がシール材外側に比較的長く余分に突出した状態で残り、後工程で不良の原因となる。これに対して、この第2の発明によれば、上述したように除材部を第2基板の表面に対して垂直な方向に切断可能であるので、後工程での不良発生を抑えられる。 In the second aspect of the invention, the material removal part is set in a curved state in which the normal line of the surface facing the first substrate does not pass through the terminal part in the terminal taking-out step. In this curved state, the material removal portion can be cut in a direction perpendicular to the surface of the second substrate without applying a cutting means to the terminal portion. If the material removal part is cut in an oblique direction with respect to the surface of the second substrate, the cut-side end of the second substrate remains in a relatively long and excessively protruding state on the outside of the sealing material, causing a defect in a later process. It becomes. On the other hand, according to the second invention, as described above, since the material removal portion can be cut in a direction perpendicular to the surface of the second substrate, occurrence of defects in the subsequent process can be suppressed.
 第3の発明は、第1又は第2の発明の表示装置の製造方法において、
 上記第1基板も可撓性を有し、
 上記端子出し工程では、上記端子部側の第1基板部分も上記第2基板から離反するように撓らせる
ことを特徴とする。
According to a third aspect of the present invention, in the method for manufacturing the display device of the first or second aspect,
The first substrate also has flexibility,
In the terminal extraction step, the first substrate portion on the terminal portion side is also bent so as to be separated from the second substrate.
 この第3の発明では、第2基板を湾曲状態とするのに併せて端子部側の第1基板部分も第2基板から離反するように撓らせて同じく湾曲状態とする。このように除材部と端子部側の第1基板部分との両方を湾曲状態とした場合には、これら除材部と端子部側の第1基板部分とが互いに離反するので、除材部のみを湾曲状態とする場合に比べて、除材部を撓らせる湾曲角度が小さくても、端子部側の第1基板部分も湾曲状態としている分だけこれら除材部と端子部との間の空間を十分に広げられる。これにより、切断手段を端子部に当てずに除材部の切断処理を行うことがよりいっそう簡単になる。 In the third aspect of the invention, in addition to making the second substrate curved, the first substrate portion on the terminal side is also bent away from the second substrate so that it is also curved. In this way, when both the material removal portion and the first substrate portion on the terminal portion side are in a curved state, the material removal portion and the first substrate portion on the terminal portion side are separated from each other. Compared to the case where only the curved portion is curved, even if the bending angle for bending the material removal portion is small, the first substrate portion on the terminal portion side is also in the curved state between the material removal portion and the terminal portion. Can fully expand the space. Thereby, it becomes much easier to perform the cutting process of the material removal part without applying the cutting means to the terminal part.
 その上、除材部のみを湾曲状態とする場合に比べて除材部を撓らせる湾曲角度が小さくて済むので、第2基板とシール材との接着面にかかる応力が抑えられて、第2基板がシール材から剥がれることが防止される。さらに、第2の発明の如く除材部における第1基板との対向面をその法線が上記端子部を通らないように該端子部の外側方に向けた湾曲状態を容易に実現可能になるので、後工程での不良発生を簡単に抑えられる。 In addition, since the bending angle for bending the material removal portion is smaller than in the case where only the material removal portion is in a curved state, the stress applied to the bonding surface between the second substrate and the sealing material is suppressed, and The two substrates are prevented from peeling off from the sealing material. Furthermore, as in the second aspect of the invention, it is possible to easily realize a curved state in which the surface facing the first substrate in the material removal portion faces the outside of the terminal portion so that the normal line does not pass through the terminal portion. Therefore, it is possible to easily suppress the occurrence of defects in the subsequent process.
 第4の発明は、第3の発明の表示装置の製造方法において、
 上記端子出し工程では、上記表示パネルを吸着固定するための吸着手段を備え凸状の曲面を呈する曲面ステージ上に、上記表示パネルを上記第1基板が当該ステージ側に位置するように載置し、上記曲面ステージの吸着動作により、上記端子部側の第1基板部分を上記第2基板から離反するように撓らせる
ことを特徴とする。
According to a fourth aspect of the present invention, in the method for manufacturing the display device according to the third aspect of the present invention,
In the terminal pulling-out step, the display panel is placed on a curved stage having a convex curved surface with suction means for fixing the display panel by suction so that the first substrate is located on the stage side. The first substrate portion on the terminal side is bent so as to be separated from the second substrate by the suction operation of the curved stage.
 この第4の発明では、表示パネルを載置するステージに曲面ステージを採用し、該曲面ステージが備える吸着手段によって端子部側の第1基板部分を第2基板側から離反させるように撓らせて湾曲状態とするので、表示パネルを載置するステージとは別の他のツールを別途用いて若しくはそれを同ステージと組み合わせて用いる場合に比べて、端子部側の第1基板部分を簡単に上記湾曲状態にすることができる。 In the fourth aspect of the invention, a curved surface stage is employed as the stage on which the display panel is placed, and the first substrate portion on the terminal portion side is bent so as to be separated from the second substrate side by the suction means provided in the curved surface stage. Compared to the case where a tool other than the stage on which the display panel is placed is used separately or in combination with the same stage, the first substrate portion on the terminal side is simplified. The curved state can be obtained.
 第5の発明は、第1~第4の発明のいずれか1つの表示装置の製造方法において、
 上記端子出し工程では、上記切断手段としてレーザー光を用いる
ことを特徴とする。
A fifth invention is a method of manufacturing a display device according to any one of the first to fourth inventions,
In the terminal extracting step, a laser beam is used as the cutting means.
 この第5の発明では、切断手段としてレーザー光を用いる。レーザー光の照射による切断処理は高速処理が可能であるので、表示装置の製造効率が高められる。 In the fifth invention, laser light is used as the cutting means. Since the cutting process by laser light irradiation can be performed at high speed, the manufacturing efficiency of the display device can be improved.
 第6の発明は、第5の発明の表示装置の製造方法において、
 上記端子出し工程では、上記湾曲状態において、上記第2基板に対して第1基板側からレーザー光を照射する
ことを特徴とする。
A sixth invention is a method of manufacturing a display device according to the fifth invention, wherein
In the terminal projecting step, in the curved state, the second substrate is irradiated with laser light from the first substrate side.
 この第6の発明では、第2基板に対して第1基板側からレーザー光を照射する。逆に、第2基板に対して第1基板とは反対側からレーザー光を照射する場合には、レーザー光が第2基板に照射された際に該第2基板の内部を透過し、その透過光の出射方向が屈折や散乱などにより端子部側を向いて、レーザー光が端子部に照射されるおそれがある。これに対して、この第6の発明によれば、端子部にレーザー光が照射される要因を無くして、該端子部の損傷を確実に防止することが可能になる。 In the sixth invention, the second substrate is irradiated with laser light from the first substrate side. Conversely, when the second substrate is irradiated with laser light from the opposite side of the first substrate, the laser beam is transmitted through the second substrate when the second substrate is irradiated with the laser light. There is a possibility that the light emission direction faces the terminal portion side due to refraction or scattering, and the laser light is irradiated to the terminal portion. On the other hand, according to the sixth aspect of the invention, it is possible to reliably prevent damage to the terminal portion by eliminating a factor that the terminal portion is irradiated with laser light.
 第7の発明は、第1~第4の発明のいずれか1つの表示装置の製造方法において、
 上記端子出し工程では、上記切断手段として、超音波カッター又はヒートカッターを用いる
ことを特徴とする表示装置の製造方法。
A seventh invention is the method of manufacturing a display device according to any one of the first to fourth inventions,
In the terminal drawing step, an ultrasonic cutter or a heat cutter is used as the cutting means.
 この第7の発明では、切断手段として超音波カッター又はヒートカッターを用いるので、除材部を切断する際に第2基板とシール材との接着面にかかる応力が抑えられて、第2基板がシール材から剥がれることが防止される。 In this seventh invention, since the ultrasonic cutter or the heat cutter is used as the cutting means, the stress applied to the bonding surface between the second substrate and the sealing material when cutting the material removal portion is suppressed, and the second substrate is It is prevented from peeling off from the sealing material.
 また、レーザー光の照射により除材部を切断する場合には、レーザー光が周囲に飛散するおそれがあり、防護用の設備が必要となるのに対して、超音波カッター又はヒートカッターを用いる場合には、レーザー光のように周囲にその切断手段自体が飛散することはないので、より安全に除材部を切断することが可能である。 Also, when cutting the material removal part by laser light irradiation, there is a possibility that the laser light may be scattered around, and when equipment for protection is required, an ultrasonic cutter or a heat cutter is used. Since the cutting means itself is not scattered around like the laser beam, the material removal part can be cut more safely.
 第8の発明は、第1~第7の発明のいずれか1つの表示装置の製造方法において、
 上記端子出し工程では、粘着層を有する引上げ治具を用い、上記第2基板の延出部分の延出端部表面に上記粘着層を粘着させて、上記引上げ治具の引上げ操作により上記第2基板の延出部分を上記端子部から離反するように撓らせる
ことを特徴とする。
An eighth invention is the method of manufacturing a display device according to any one of the first to seventh inventions,
In the terminal pulling-out step, a pulling jig having an adhesive layer is used, the adhesive layer is adhered to the surface of the extended end portion of the extended portion of the second substrate, and the second jig is lifted by the pulling operation of the pulling jig. The extending portion of the substrate is bent so as to be separated from the terminal portion.
 この第8の発明では、粘着層を有する引上げ治具を用いる。この引上げ治具は、除材部と端子部との間に挿入することを要さず、除材部の延出端部表面に貼着させて使用することで該除材部を湾曲状態とするので、除材部を湾曲状態とする際にも端子部を損傷させることがない。 In the eighth invention, a pulling jig having an adhesive layer is used. This lifting jig does not need to be inserted between the material removal portion and the terminal portion, and is attached to the surface of the extended end portion of the material removal portion to use the material removal portion in a curved state. Therefore, the terminal portion is not damaged even when the material removal portion is bent.
 第9の発明は、第1~第8の発明のいずれか1つの表示装置の製造方法において、
 上記第2基板は、ベース基板としてプラスチック基板を備えている
ことを特徴とする。
A ninth invention is a method of manufacturing a display device according to any one of the first to eighth inventions,
The second substrate includes a plastic substrate as a base substrate.
 この第9の発明よると、第2基板の軽量化及び薄型化、ひいては装置全体の軽量化及び薄型化を実現することが可能になる。 According to the ninth aspect, the second substrate can be reduced in weight and thickness, and as a result, the entire device can be reduced in weight and thickness.
 第10の発明は、第9の発明の表示装置の製造方法において、
 上記第2基板が備えるプラスチック基板の厚さは、5μm以上且つ50μm以下である
ことを特徴とする。
A tenth aspect of the invention is a method for manufacturing a display device according to the ninth aspect of the invention,
The thickness of the plastic substrate included in the second substrate is 5 μm or more and 50 μm or less.
 この第10の発明では、第2基板に用いられたプラスチック基板の厚さが5μm~50μmと比較的薄いので、第2基板の軽量化及び薄型化を良好に実現可能である上に、第2基板に優れたフレキシブル性を持たせることができ、端子出し工程にて、第2基板を湾曲状態とすることが容易になる。 In the tenth aspect of the invention, since the plastic substrate used for the second substrate is relatively thin with a thickness of 5 μm to 50 μm, the second substrate can be reduced in weight and thickness, and the second substrate can be realized. The substrate can have excellent flexibility, and the second substrate can be easily bent in the terminal drawing process.
 第11の発明は、第9又は第10の表示装置の製造方法において、
 上記第1基板も、ベース基板としてプラスチック基板を備えている
ことを特徴とする。
An eleventh aspect of the invention is a method for manufacturing the ninth or tenth display device,
The first substrate also includes a plastic substrate as a base substrate.
 この第11の発明では、第1基板及び第2基板の両方にプラスチック基板が用いられているので、装置全体の軽量化及び薄型化を実現できる上に、フレキシブル性に優れた表示装置を製造することができる。 In the eleventh aspect, since the plastic substrate is used for both the first substrate and the second substrate, the entire device can be reduced in weight and thickness, and a display device with excellent flexibility is manufactured. be able to.
 第12の発明は、第11の発明の表示装置の製造方法において、
 上記第1基板が備えるプラスチック基板の厚さは、5μm以上且つ50μm以下である
ことを特徴とする。
A twelfth aspect of the invention is a method for manufacturing a display device according to the eleventh aspect of the invention,
The plastic substrate included in the first substrate has a thickness of 5 μm or more and 50 μm or less.
 この第12の発明では、第1基板に用いられたプラスチック基板の厚さが5μm~50μmと比較的薄いので、第1基板の軽量化及び薄型化を良好に実現可能である上に、第1基板に優れたフレキシブル性を持たせることができ、端子出し工程にて、第1基板を湾曲状態とすることが容易になる。 In the twelfth aspect of the invention, since the plastic substrate used for the first substrate is relatively thin with a thickness of 5 μm to 50 μm, the first substrate can be reduced in weight and thickness, and the first substrate can be realized. The substrate can be provided with excellent flexibility, and the first substrate can be easily bent in the terminal drawing process.
 第13の発明は、第1~第12の発明のいずれか1つの表示装置の製造方法において、
 上記表示パネル作製工程では、上記シール材を枠状に形成し、該シール材の内側に上記表示媒体層として液晶層を封入する
ことを特徴とする。
A thirteenth invention is a method of manufacturing a display device according to any one of the first to twelfth inventions,
In the display panel manufacturing step, the sealing material is formed in a frame shape, and a liquid crystal layer is sealed as the display medium layer inside the sealing material.
 なお、ここでいう枠状には、完全に閉じた枠形状は勿論、一部に切れ目を有する枠形状も含む。 In addition, the frame shape here includes not only a completely closed frame shape but also a frame shape having a cut in part.
 この第13の発明では、第1基板と第2基板との間で枠状のシール材の内側に液晶層を封入することにより、液晶表示装置が製造される。このように液晶表示装置を製造する場合にも、本発明の作用効果は有効に奏される。 In the thirteenth invention, a liquid crystal display device is manufactured by enclosing a liquid crystal layer inside a frame-shaped sealing material between the first substrate and the second substrate. Thus, also when manufacturing a liquid crystal display device, the effect of this invention is show | played effectively.
 本発明によれば、除材部を撓らせて端子部から離反させた湾曲状態とし、該湾曲状態において除材部を切断手段により完全に切断しきるので、バリを生成することなく端子部に対向する基板部分を切断し、端子部を損傷させずに導電不良のない良好な状態で露出させることができる。 According to the present invention, the material removal portion is bent to be separated from the terminal portion, and the material removal portion is completely cut by the cutting means in the curved state, so that the terminal portion can be formed without generating burrs. The opposing board | substrate part can be cut | disconnected and it can expose in the favorable state without a conductive defect, without damaging a terminal part.
図1は、実施形態1に係る液晶表示装置を概略的に示す平面図である。FIG. 1 is a plan view schematically showing the liquid crystal display device according to the first embodiment. 図2は、図1のII-II線における断面構造を示す断面図である。2 is a cross-sectional view showing a cross-sectional structure taken along the line II-II in FIG. 図3(A),(B)は、実施形態1に係る液晶表示装置の製造方法における貼合工程を示す平面図である。3A and 3B are plan views showing a bonding step in the method for manufacturing a liquid crystal display device according to Embodiment 1. FIG. 図4(A)~(D)は、実施形態1に係る液晶表示装置の製造方法における液晶注入工程を示す断面図である。4A to 4D are cross-sectional views illustrating a liquid crystal injection step in the method of manufacturing the liquid crystal display device according to the first embodiment. 図5は、実施形態1に係る液晶表示装置の製造方法における封止工程を示す平面図である。FIG. 5 is a plan view showing a sealing step in the method of manufacturing the liquid crystal display device according to the first embodiment. 図6(A)~(D)は、実施形態1に係る液晶表示装置の製造方法における端子出し工程を示す断面図である。6A to 6D are cross-sectional views illustrating a terminal lead-out process in the method for manufacturing the liquid crystal display device according to the first embodiment. 図7(A),(B)は、実施形態2に係る液晶表示装置の製造方法における端子出し工程を示す断面図である。7A and 7B are cross-sectional views illustrating a terminal lead-out process in the method of manufacturing the liquid crystal display device according to the second embodiment. 図8(A)~(C)は、実施形態3に係る液晶表示装置の製造方法における端子出し工程を示す断面図である。FIGS. 8A to 8C are cross-sectional views showing a terminal lead-out process in the method of manufacturing the liquid crystal display device according to the third embodiment.
 以下、本発明の実施形態を図面に基づいて詳細に説明する。なお、本発明は、以下の各実施形態に限定されるものではない。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. The present invention is not limited to the following embodiments.
 《発明の実施形態1》
 この実施形態1では、本発明に係る表示装置の製造方法の適用対象として、アクティブマトリクス駆動方式(TFT駆動方式)の液晶表示装置Sを例に挙げて説明する。
Embodiment 1 of the Invention
In the first embodiment, a liquid crystal display device S of an active matrix driving method (TFT driving method) will be described as an example of an application target of the method for manufacturing a display device according to the present invention.
  -液晶表示装置Sの構成-
 液晶表示装置Sの構成を図1及び図2に示す。図1は、液晶表示装置Sの概略平面図である。図2は、図1のII-II線における断面構造を示す概略断面図である。なお、図1では、対向基板20上の偏光板37の図示を省略している。
-Configuration of liquid crystal display device S-
The configuration of the liquid crystal display device S is shown in FIGS. FIG. 1 is a schematic plan view of the liquid crystal display device S. FIG. FIG. 2 is a schematic cross-sectional view showing a cross-sectional structure taken along the line II-II in FIG. In FIG. 1, illustration of the polarizing plate 37 on the counter substrate 20 is omitted.
 <液晶表示装置Sの概略構成>
 液晶表示装置Sは、一対の基板10,20が貼り合わされて両基板10,20の間に表示媒体層として液晶層32が封入されてなる表示パネルである液晶パネルPを備えている。より詳細には、液晶パネルPは、第1基板であるTFT基板10と、該TFT基板10に対向して配置された第2基板である対向基板20と、これらTFT基板10及び対向基板20の両外周縁部同士を接着する枠状のシール材30と、TFT基板10と対向基板20との間にシール材30により囲まれて封入された液晶層32とを備えている。またその他、液晶表示装置Sが透過型の液晶表示装置である場合には、上記液晶パネルPの背面側に、該液晶パネルP側に面状光を出射するように構成されたバックライトユニット(不図示)をさらに備えている。
<Schematic configuration of liquid crystal display device S>
The liquid crystal display device S includes a liquid crystal panel P which is a display panel in which a pair of substrates 10 and 20 are bonded together and a liquid crystal layer 32 is sealed as a display medium layer between the substrates 10 and 20. More specifically, the liquid crystal panel P includes a TFT substrate 10 that is a first substrate, a counter substrate 20 that is a second substrate disposed to face the TFT substrate 10, and the TFT substrate 10 and the counter substrate 20. A frame-shaped sealing material 30 for adhering both outer peripheral edge portions and a liquid crystal layer 32 surrounded and sealed by the sealing material 30 between the TFT substrate 10 and the counter substrate 20 are provided. In addition, in the case where the liquid crystal display device S is a transmissive liquid crystal display device, a backlight unit configured to emit planar light to the liquid crystal panel P side on the back side of the liquid crystal panel P ( (Not shown).
 この液晶パネルPは、TFT基板10と対向基板20とが重なる領域であって、シール材30の内側、つまり液晶層32が設けられた領域に画像表示を行う例えば矩形状の表示領域Dを有している。この表示領域Dは、画像の最小単位である複数の画素がマトリクス状に配列されてなる。 This liquid crystal panel P is an area where the TFT substrate 10 and the counter substrate 20 overlap, and has, for example, a rectangular display area D for displaying an image on the inner side of the sealing material 30, that is, the area where the liquid crystal layer 32 is provided. is doing. The display area D is composed of a plurality of pixels, which are the minimum unit of an image, arranged in a matrix.
 また、液晶パネルPは、上記表示領域Dの周囲に例えば矩形枠状の非表示領域である額縁領域Fを有している。この額縁領域Fの例えば1辺側(図1及び図2で左側)には、TFT基板10が対向基板20から突出してその対向基板20側表面が外部に露出した突出部10aが設けられている。 Further, the liquid crystal panel P has a frame region F which is a non-display region having a rectangular frame shape, for example, around the display region D. For example, on one side (left side in FIGS. 1 and 2) of the frame region F, there is provided a protruding portion 10a in which the TFT substrate 10 protrudes from the counter substrate 20 and the surface of the counter substrate 20 is exposed to the outside. .
 この突出部10a上には、TFT基板10の端縁に沿って並ぶ複数の端子12a及びこれに接続されて表示領域D側に延びる引出配線14が形成されており、上記端子12aの群が外部回路接続用の端子部12を構成している。この端子部12には、FPC(Flexible Printed Circuit)などの配線基板(不図示)が接続されており、該配線基板を介して外部のドライバIC(Integrated Circuit)から表示すべき画像に応じた画像データを含む表示用信号が入力されるようになっている。 On the protruding portion 10a, a plurality of terminals 12a arranged along the edge of the TFT substrate 10 and lead wires 14 connected thereto and extending to the display region D side are formed. The terminal part 12 for circuit connection is comprised. A wiring board (not shown) such as FPC (Flexible Printed Circuit) is connected to the terminal portion 12, and an image corresponding to an image to be displayed from an external driver IC (Integrated Circuit) via the wiring substrate. A display signal including data is input.
 上記突出部10a上の端子部12は、後に詳述するが、これに対向する対向基板20の延出部分を除材部として切断し除去することで、外部に露出しており、液晶表示装置Sは、この除材部切断後に配線基板を接続して製造される。 As will be described in detail later, the terminal portion 12 on the protruding portion 10a is exposed to the outside by cutting and removing the extended portion of the counter substrate 20 facing the protruding portion 10a as a material removal portion. S is manufactured by connecting the wiring board after cutting the material removal portion.
 TFT基板10及び対向基板20は、例えば矩形状に形成され、互いに対向する内側表面に配向膜34,35がそれぞれ設けられていると共に、外側表面に偏光板36,37がそれぞれ設けられている。TFT基板10上の偏光板36と対向基板20上の偏光板37とは、透過軸が90°異なっている。 The TFT substrate 10 and the counter substrate 20 are formed in, for example, a rectangular shape, and alignment films 34 and 35 are provided on inner surfaces facing each other, and polarizing plates 36 and 37 are provided on outer surfaces, respectively. The transmission axis of the polarizing plate 36 on the TFT substrate 10 and the polarizing plate 37 on the counter substrate 20 differ by 90 °.
 シール材30は、例えば上記端子部12配置側の辺とは反対側の辺に沿う部分に切れ目30aを有する矩形枠状に形成されている。シール材30の切れ目30a部分には封止材33が充填されている。これらシール材30及び封止材33は、光硬化型樹脂、光硬化及び熱硬化併用型樹脂、又は熱硬化型樹脂からなる。また、液晶層32は、例えば電気光学特性を有するネマチックの液晶材料などにより構成されている。 The sealing material 30 is formed in a rectangular frame shape having a cut line 30a in a portion along the side opposite to the side on the terminal portion 12 arrangement side, for example. A sealing material 33 is filled in the cut portion 30 a of the sealing material 30. The sealing material 30 and the sealing material 33 are made of a photocurable resin, a combined photocuring and thermosetting resin, or a thermosetting resin. The liquid crystal layer 32 is made of, for example, a nematic liquid crystal material having electro-optical characteristics.
 <TFT基板10の構成>
 TFT基板10は、樹脂材料により形成されたフィルム状の可撓性を有するプラスチック基板11をベース基板として備えている。プラスチック基板11の厚さは、フレキシブル性を確保する観点から、200μm以下であることが好ましく、さらに5μm以上且つ50μm以下であることがよりいっそう好ましい。
<Configuration of TFT substrate 10>
The TFT substrate 10 includes a film-like flexible plastic substrate 11 formed of a resin material as a base substrate. The thickness of the plastic substrate 11 is preferably 200 μm or less, and more preferably 5 μm or more and 50 μm or less, from the viewpoint of ensuring flexibility.
 このプラスチック基板11を形成する樹脂材料としては、例えば、アクリル、ポリイミド、ポリエーテルイミド、ポリアミドイミド、ポリエーテルスルホン、シアネートエステル、環状ポリオレフィン、及びそのコポリマーなどの有機材料を用いることができる。液晶表示装置Sが透過型である場合には、このプラスチック基板11を形成する樹脂材料は透明性を必要とする。 As the resin material for forming the plastic substrate 11, for example, organic materials such as acrylic, polyimide, polyetherimide, polyamideimide, polyethersulfone, cyanate ester, cyclic polyolefin, and copolymers thereof can be used. When the liquid crystal display device S is a transmissive type, the resin material forming the plastic substrate 11 needs to be transparent.
 なお、上記プラスチック基板11は、ガラス転移温度が200℃以上であり、駆動用のTFT素子の形成が可能な材料であれば、ポリエステル、ポリアミド、ポリカーボネイトなどの他の樹脂や、滑剤、耐熱安定剤、耐候安定剤、顔料、染料、無機質充填剤などを適宜含有する構成としてもよい。また、セグメント表示を行う表示パネルなどのTFT素子を備えない液晶パネルの場合には、プラスチック基板11を形成する材料は、ガラス転移温度が上記条件(200℃以上)のものに限られない。 The plastic substrate 11 has a glass transition temperature of 200 ° C. or higher and can be used to form a driving TFT element. Other resins such as polyester, polyamide, and polycarbonate, a lubricant, and a heat stabilizer , A weather stabilizer, a pigment, a dye, an inorganic filler and the like may be appropriately contained. In the case of a liquid crystal panel that does not include a TFT element such as a display panel that performs segment display, the material for forming the plastic substrate 11 is not limited to the glass transition temperature of the above condition (200 ° C. or higher).
 さらに、TFT基板10は、プラスチック基板11上に、互いに平行に延びるように設けられた複数のゲート配線(不図示)と、該各ゲート配線を覆うように設けられたゲート絶縁膜(不図示)と、該ゲート絶縁膜上に各ゲート配線と直交する方向に互いに平行に延びるように設けられた複数のソース配線(不図示)と、各ゲート配線と各ソース配線との交差部分毎に設けられたTFT(不図示)と、各ソース配線及び各TFTを覆うように設けられた層間絶縁膜(不図示)と、該層間絶縁膜上にマトリクス状に設けられた複数の画素電極16とを備えている。なお、図2では、便宜上、これら複数の画素電極16を1つの層として図示している。 Further, the TFT substrate 10 includes a plurality of gate wirings (not shown) provided on the plastic substrate 11 so as to extend in parallel with each other, and a gate insulating film (not shown) provided so as to cover the gate wirings. A plurality of source wirings (not shown) provided on the gate insulating film so as to extend in parallel to each other in a direction orthogonal to the gate wirings, and provided at each intersection of the gate wirings and the source wirings. TFT (not shown), an interlayer insulating film (not shown) provided so as to cover each source wiring and each TFT, and a plurality of pixel electrodes 16 provided in a matrix on the interlayer insulating film. ing. In FIG. 2, for convenience, the plurality of pixel electrodes 16 are illustrated as one layer.
 上記ゲート配線及びソース配線は各画素を区画するように全体として格子状に形成され、TFT及び画素電極16は各画素毎に設けられている。各TFTは、対応するゲート配線に接続され且つゲート絶縁膜によって覆われたゲート電極と、該ゲート電極にゲート絶縁膜を介して重なる島状の半導体層と、該半導体層の一方側に一部を重ねて接続されると共に対応するソース配線に接続されたソース電極と、該ソース電極と対峙するように半導体層の他方側に一部を重ねて接続されたドレイン電極とを備えている。各画素電極16は、層間絶縁膜に形成されたコンタクトホールを介して対応するTFTのドレイン電極に接続され、上記配向膜34によって覆われている。 The gate wiring and the source wiring are formed in a lattice shape as a whole so as to partition each pixel, and the TFT and the pixel electrode 16 are provided for each pixel. Each TFT includes a gate electrode connected to a corresponding gate wiring and covered with a gate insulating film, an island-shaped semiconductor layer overlapping the gate electrode through the gate insulating film, and a part on one side of the semiconductor layer And a source electrode connected to the corresponding source wiring, and a drain electrode partially connected to the other side of the semiconductor layer so as to face the source electrode. Each pixel electrode 16 is connected to the drain electrode of the corresponding TFT through a contact hole formed in the interlayer insulating film, and is covered with the alignment film 34.
 <対向基板20の構成>
 対向基板20も、TFT基板10と同様に、樹脂材料により形成されたフィルム状の可撓性を有するプラスチック基板21をベース基板として備えている。プラスチック基板21の厚さは、上記TFT基板を構成するプラスチック基板11と同様な観点から、200μm以下であることが好ましく、さらに5μm以上且つ50μm以下であることがよりいっそう好ましい。
<Configuration of counter substrate 20>
Similarly to the TFT substrate 10, the counter substrate 20 also includes a film-like flexible plastic substrate 21 formed of a resin material as a base substrate. The thickness of the plastic substrate 21 is preferably 200 μm or less, and more preferably 5 μm or more and 50 μm or less, from the same viewpoint as the plastic substrate 11 constituting the TFT substrate.
 このプラスチック基板21は、透明性を必要とし、その形成材料としては、例えば、アクリル、エポキシ、ポリエーテルスルホン、ポリカーボネイト、環状ポリオレフィン、及びポリイミドなどの有機材料を用いることができる。 The plastic substrate 21 needs transparency, and as its forming material, for example, an organic material such as acrylic, epoxy, polyethersulfone, polycarbonate, cyclic polyolefin, and polyimide can be used.
 また、対向基板20は、プラスチック基板21上に、上記ゲート配線及びソース配線に対応するように各画素を区画する格子状に設けられたブラックマトリクス(不図示)と、該ブラックマトリクスの格子間に周期的に配列するように設けられた赤色層、緑色層及び青色層を含む複数色のカラーフィルタ(不図示)と、これらブラックマトリクス及び各カラーフィルタを覆うように設けられた共通電極22と、該共通電極22上に柱状に設けられたフォトスペーサ(不図示)とを備えている。 The counter substrate 20 has a black matrix (not shown) provided on the plastic substrate 21 so as to partition each pixel so as to correspond to the gate wiring and the source wiring, and between the grids of the black matrix. A plurality of color filters (not shown) including a red layer, a green layer, and a blue layer provided so as to be periodically arranged, and a common electrode 22 provided so as to cover these black matrix and each color filter, Photo spacers (not shown) provided in a columnar shape on the common electrode 22 are provided.
 なお、本実施形態では、対向基板20がフォトスペーサを備えているとしたが、フォトスペーサはTFT基板10側に形成されていてもよく、フォトスペーサに代えて、粒径の揃ったプラスチックボールなどからなる球形スペーサを両基板10,20の間に挟み込む構成が採用されていても構わない。 In the present embodiment, the counter substrate 20 is provided with a photo spacer. However, the photo spacer may be formed on the TFT substrate 10 side. Instead of the photo spacer, a plastic ball having a uniform particle diameter or the like may be used. A configuration may be adopted in which a spherical spacer made of is sandwiched between both substrates 10 and 20.
 <液晶表示装置Sの作動>
 上記構成の液晶表示装置Sでは、端子部12を介して外部のドライバICから入力された表示用信号に基づき、各画素において、ゲート信号がゲート配線を介してゲート電極に送られて、TFTがオン状態となったときに、ソース信号がソース配線を介してソース電極に送られて、半導体層及びドレイン電極を介して画素電極16に所定の電荷が書き込まれる。このとき、TFT基板10の各画素電極16と対向基板20の共通電極22との間において電位差が生じ、液晶層32に所定の電圧が印加される。そして、各画素において、液晶層32に印加する電圧の大きさによって液晶分子の配向状態を変えて、例えばバックライトユニットから入射する光の透過率を液晶層32で調整することにより画像が表示される。
<Operation of the liquid crystal display device S>
In the liquid crystal display device S configured as described above, in each pixel, a gate signal is sent to the gate electrode via the gate wiring based on the display signal input from the external driver IC via the terminal portion 12, and the TFT is When the transistor is turned on, a source signal is sent to the source electrode through the source wiring, and a predetermined charge is written into the pixel electrode 16 through the semiconductor layer and the drain electrode. At this time, a potential difference is generated between each pixel electrode 16 of the TFT substrate 10 and the common electrode 22 of the counter substrate 20, and a predetermined voltage is applied to the liquid crystal layer 32. Then, in each pixel, an image is displayed by changing the alignment state of the liquid crystal molecules according to the magnitude of the voltage applied to the liquid crystal layer 32 and adjusting the transmittance of light incident from the backlight unit, for example, with the liquid crystal layer 32. The
  -液晶表示装置Sの製造方法-
 次に、上記液晶表示装置Sの製造方法について一例を挙げて説明する。
-Manufacturing method of liquid crystal display device S-
Next, an example is given and demonstrated about the manufacturing method of the said liquid crystal display device S. FIG.
 本実施形態では、TFT基板10と対向基板20とを一枚ずつ作製し、それら両基板10,20を貼り合わせて液晶パネルPを作製する枚葉方式の製造方法を例に挙げて説明するが、上記液晶パネルPを構成するセル単位を複数含むマザーパネルを作製し、該マザーパネルをセル単位毎に分断することにより、上記液晶パネルPを複数同時に作製する多面取り方式の製造方法にも適用することができる。 In this embodiment, a TFT substrate 10 and a counter substrate 20 are manufactured one by one, and a single wafer manufacturing method for manufacturing the liquid crystal panel P by bonding the two substrates 10 and 20 will be described as an example. Also, a mother panel including a plurality of cell units constituting the liquid crystal panel P is manufactured, and the mother panel is divided into cell units, thereby being applied to a multi-chamfer manufacturing method in which a plurality of the liquid crystal panels P are simultaneously manufactured. can do.
 液晶表示装置Sの製造方法は、TFT基板作製工程と、対向基板作製工程と、表示パネル作製工程と、端子出し工程と、実装工程とを含む。 The manufacturing method of the liquid crystal display device S includes a TFT substrate manufacturing process, a counter substrate manufacturing process, a display panel manufacturing process, a terminal extraction process, and a mounting process.
 <TFT基板作製工程>
 予め準備したプラスチック基板11上に、上記端子部12(端子12a)、引出配線14、ゲート配線、ゲート絶縁膜、ソース配線、TFT、層間絶縁膜及び画素電極16を、CVD(Chemical Vapor Deposition)法又はスパッタリングなどによる成膜処理やフォトリソグラフィーを繰り返し行う周知の方法で形成することにより、TFT基板10を作製する。
<TFT substrate manufacturing process>
On the plastic substrate 11 prepared in advance, the terminal portion 12 (terminal 12a), the lead wiring 14, the gate wiring, the gate insulating film, the source wiring, the TFT, the interlayer insulating film, and the pixel electrode 16 are formed by a CVD (Chemical Vapor Deposition) method. Alternatively, the TFT substrate 10 is manufactured by forming by a known method of repeatedly performing film formation processing such as sputtering or photolithography.
 <対向基板作製工程>
 上記TFT基板10と同サイズの予め準備したプラスチック基板21上に、上記ブラックマトリクス、カラーフィルタ、共通電極22及びフォトスペーサを、スピンコート法又はスパッタリングなどによる成膜処理やフォトリソグラフィーを繰り返し行う周知の方法で形成することにより、対向基板20を作製する。
<Opposite substrate manufacturing process>
The black matrix, the color filter, the common electrode 22 and the photo spacer are repeatedly formed on the plastic substrate 21 having the same size as that of the TFT substrate 10 by repeatedly performing a film forming process by spin coating or sputtering or photolithography. The counter substrate 20 is fabricated by forming the method.
 <表示パネル作製工程>
 次いで行う表示パネル作製工程は、貼合ステップと、液晶注入ステップと、封止ステップとを含む。
<Display panel manufacturing process>
Next, the display panel manufacturing process to be performed includes a bonding step, a liquid crystal injection step, and a sealing step.
 <貼合ステップ>
 貼合ステップの手順を図3(A),(B)に示す。
<Bonding step>
The procedure of the bonding step is shown in FIGS. 3 (A) and 3 (B).
 まず、TFT基板10及び対向基板20の電極16,22形成側の表面に対して、印刷法により配向膜34,35を形成し、その後に、必要に応じてラビング処理を行う。次いで、対向基板20の配向膜35側表面に対して、図3(A)に示すように、ディスペンサなどにより熱硬化型樹脂からなるシール材30を基板周縁に沿って枠状に描画する。このとき、シール材30は、完全に閉じた枠状でなく、一辺側(図3(A)で右辺側)に沿う部分に切れ目30aを有する枠状に形成する。また、対向基板20の切れ目30a形成箇所の対辺側(図3(A)で左辺側)には、シール材30外側に位置する余白領域20aを残しておく。 First, alignment films 34 and 35 are formed by a printing method on the surfaces of the TFT substrate 10 and the counter substrate 20 on the side where the electrodes 16 and 22 are formed, and then a rubbing process is performed as necessary. Next, as shown in FIG. 3A, a sealing material 30 made of a thermosetting resin is drawn in a frame shape along the periphery of the substrate on the surface of the counter substrate 20 on the alignment film 35 side, as shown in FIG. At this time, the sealing material 30 is not formed into a completely closed frame shape, but is formed into a frame shape having a cut 30a in a portion along one side (the right side in FIG. 3A). In addition, a blank area 20a located outside the sealing material 30 is left on the opposite side (the left side in FIG. 3A) of the position where the cut 30a is formed on the counter substrate 20.
 なお、本実施形態では、対向基板20の表面に対してシール材30を描画するとしているが、これに限らず、TFT基板10の配向膜34側表面に対してシール材30を描画してもよい。この場合、シール材30は、端子部12よりも基板10内側に位置するように例えば端子部12配置側の辺の対辺側部分に切れ目30aを有する枠状に描画する。 In this embodiment, the sealing material 30 is drawn on the surface of the counter substrate 20. However, the present invention is not limited to this, and the sealing material 30 may be drawn on the surface of the TFT substrate 10 on the alignment film 34 side. Good. In this case, for example, the sealing material 30 is drawn in a frame shape having a cut 30 a on the opposite side portion of the side on the terminal portion 12 arrangement side so as to be positioned inside the substrate 10 relative to the terminal portion 12.
 続いて、TFT基板10と対向基板20とを、互いに対向させ、電極16,22同士が向き合うように配向膜34,35形成面を対面させた状態でシール材30を介して貼り合わせる。その後に、シール材30を加熱して硬化させることにより、図3(B)に示すように、シール材30の内側に空隙部31を有し、該シール材30の切れ目30aにより構成された液晶注入口30bを有する貼合パネルP’を構成する。このとき、シール材30の切れ目30aが端子部12とは反対側に位置するように、且つシール材30の切れ目30aとは反対側の対向基板20部分、つまり上記余白領域20aが端子部12の上方に延出し、該延出部分20aによって端子部12が覆われるようにTFT基板10と対向基板20とを貼り合わせる。 Subsequently, the TFT substrate 10 and the counter substrate 20 are opposed to each other, and are bonded through the sealing material 30 in a state where the formation surfaces of the alignment films 34 and 35 face each other so that the electrodes 16 and 22 face each other. Thereafter, the sealing material 30 is heated to be cured, and as shown in FIG. 3 (B), a liquid crystal having a gap portion 31 inside the sealing material 30 and constituted by the cuts 30a of the sealing material 30. The bonding panel P ′ having the inlet 30b is configured. At this time, the opposing substrate 20 portion on the opposite side to the cut 30a of the sealing material 30, that is, the blank area 20a is located on the terminal portion 12 so that the cut 30a of the sealing material 30 is located on the opposite side of the terminal portion 12 The TFT substrate 10 and the counter substrate 20 are bonded together so as to extend upward and cover the terminal portion 12 with the extended portion 20a.
 <液晶注入ステップ>
 次に行う液晶注入ステップの手順を図4(A)~(D)に示す。なお、この図4(A)~(D)では、便宜上、シール材30を実線で示している。
<Liquid crystal injection step>
The procedure of the liquid crystal injection step to be performed next is shown in FIGS. 4A to 4D, the sealing material 30 is indicated by a solid line for convenience.
 上記貼合パネルP’を、図4(A)に示すように液晶材料32aを溜めた容器51と共に真空槽50の内部に入れ、該真空槽50内部を真空引きして高真空状態にする。そして、この真空環境下において、図4(B)に示すように、貼合パネルP’の液晶注入口30bを上記液晶材料32aに浸漬する。 The above-mentioned bonding panel P ′ is put into the vacuum chamber 50 together with the container 51 storing the liquid crystal material 32a as shown in FIG. 4A, and the vacuum chamber 50 is evacuated to a high vacuum state. And in this vacuum environment, as shown in FIG.4 (B), the liquid-crystal injection hole 30b of the bonding panel P 'is immersed in the said liquid-crystal material 32a.
 次に、図4(C)に示すように、真空槽50の内部を空気をリークさせて大気圧に開放する。そのことにより、液晶材料32aが液晶注入口30bから空隙部31に注入されていく。その状態で所定の時間おいておくと、図4(D)に示すように、空隙部31の全体に液晶材料32aが充填されて液晶層32が構成される。しかる後、貼合パネルP’を真空槽50から取り出す。 Next, as shown in FIG. 4C, the inside of the vacuum chamber 50 is opened to atmospheric pressure by leaking air. As a result, the liquid crystal material 32a is injected into the gap 31 from the liquid crystal injection port 30b. If it is left for a predetermined time in this state, as shown in FIG. 4D, the liquid crystal material 32 a is filled in the entire gap portion 31 to form the liquid crystal layer 32. Thereafter, the bonding panel P ′ is taken out from the vacuum chamber 50.
 <封止ステップ>
 続いて行う封止ステップで液晶注入口30bが封止された状態の液晶パネルPを図5に示す。
<Sealing step>
FIG. 5 shows the liquid crystal panel P in a state where the liquid crystal inlet 30b is sealed in the subsequent sealing step.
 上記液晶層32を有する貼合パネルP’の両面を加圧してTFT基板10と対向基板20との間のセル厚(液晶層32の厚さ)を所定の厚さにし、その状態で、液晶注入口30bに紫外線硬化性樹脂からなる封止材33を塗布する。そして、この封止材33を紫外線の照射により硬化させて、図5に示すように液晶注入口30bを封止する。こうして、液晶パネルPが作製される。 Pressure is applied to both surfaces of the bonding panel P ′ having the liquid crystal layer 32 so that the cell thickness (thickness of the liquid crystal layer 32) between the TFT substrate 10 and the counter substrate 20 is set to a predetermined thickness. A sealing material 33 made of an ultraviolet curable resin is applied to the injection port 30b. And this sealing material 33 is hardened by irradiation of an ultraviolet-ray, and as shown in FIG. 5, the liquid-crystal injection hole 30b is sealed. Thus, the liquid crystal panel P is manufactured.
 <端子出し工程>
 次に行う端子出し工程の手順を図6(A)~(D)に示す。この端子出し工程では、図6(A)に示す対向基板の延出部分20aを除材部としてシール材30の外側で切断する。図6(A)に示す破線24は、除材部20aの設計上の切断ラインを示している。
<Terminal extraction process>
6A to 6D show the procedure of the terminal extraction process to be performed next. In this terminal lead-out process, the extended portion 20a of the counter substrate shown in FIG. 6A is cut outside the sealing material 30 with the material removal portion. A broken line 24 shown in FIG. 6A indicates a design cutting line of the material removal portion 20a.
 まず、上記液晶パネルPを、図6(B)に示すように、凸状の湾曲面を呈する曲面ステージ52に載置する。この曲面ステージ52は、真空チャックや静電チャックなどの吸着手段を備え、該吸着手段の吸着動作によって液晶パネルPを吸着固定するようになっている。この曲面ステージ52の吸着動作により、液晶パネルPを曲面ステージ52に載置後にその載置面に倣って曲げ、端子部12側のTFT基板10部分を対向基板20の除材部20aから離反するように撓らせて湾曲状態とする。 First, as shown in FIG. 6B, the liquid crystal panel P is placed on a curved surface stage 52 having a convex curved surface. The curved surface stage 52 is provided with suction means such as a vacuum chuck or an electrostatic chuck, and the liquid crystal panel P is sucked and fixed by the suction operation of the suction means. By the suction operation of the curved surface stage 52, the liquid crystal panel P is placed on the curved surface stage 52 and then bent along the placement surface, and the TFT substrate 10 portion on the terminal portion 12 side is separated from the material removal portion 20a of the counter substrate 20. To be bent.
 次いで、L字状の鉤爪54aを有する引上げ治具54を用いて対向基板20の除材部20aを湾曲状態にする。 Next, the material removal portion 20a of the counter substrate 20 is bent using a pulling jig 54 having an L-shaped claw 54a.
 具体的には、引上げ治具54の鉤爪54aの先端を、図6(B)に示すように端子部12と除材部20aとの間に挿入する。続いて、図6(C)に示すように、その鉤爪54aの先端を除材部20aに引っ掛けて、引上げ治具54の引き上げ操作により除材部20aを引き上げる。そうして、対向基板20の除材部20aを、端子部12から離反するように撓らせて、端子部12との間の空間を広げた湾曲状態とする。 Specifically, the tip of the claw 54a of the pulling jig 54 is inserted between the terminal portion 12 and the material removal portion 20a as shown in FIG. 6 (B). Subsequently, as shown in FIG. 6C, the tip of the claw 54 a is hooked on the material removal portion 20 a, and the material removal portion 20 a is pulled up by the pulling up operation of the lifting jig 54. Then, the material removal portion 20 a of the counter substrate 20 is bent so as to be separated from the terminal portion 12, so that a space between the terminal portion 12 and the space is widened.
 この湾曲状態は、上記対向基板20の除材部20aにおけるTFT基板10との対向面を、その法線が端子部12を通らない程度にまで該端子部12の外側方に向けた状態である。このとき、除材部20aを引き上げ過ぎると、対向基板20とシール材30との接着面に過度の応力がかかってしまい、対向基板20がシール材30から剥がれるおそれがある。 This curved state is a state in which the surface facing the TFT substrate 10 in the material removal portion 20a of the counter substrate 20 is directed outward to the extent that the normal line does not pass through the terminal portion 12. . At this time, if the material removal portion 20 a is pulled up too much, an excessive stress is applied to the bonding surface between the counter substrate 20 and the sealing material 30, and the counter substrate 20 may be peeled off from the sealing material 30.
 されど、本実施形態では、端子部12側のTFT基板10部分も除材部20aから離反するように撓った湾曲状態にあるので、対向基板20の除材部20aのみを湾曲状態とする場合に比べて、除材部20aを撓らせる湾曲角度が小さくても、端子部12側のTFT基板10部分も湾曲状態としている分だけこれら除材部20aと端子部12との間の空間を十分に広げられる上に、除材部20aに上記湾曲状態、すなわち除材部20aにおけるTFT基板10との対向面を、その法線が端子部12を通らない程度にまで該端子部12の外側方に向けた状態を容易に実現することができる。そして、対向基板20の除材部20aを撓らせる湾曲角度が小さくて済むので、対向基板20とシール材30との接着面にかかる応力を抑えることができて、対向基板20がシール材30から剥がれることを防止できる。 However, in this embodiment, since the TFT substrate 10 portion on the terminal portion 12 side is also in a curved state that is bent away from the material removal portion 20a, only the material removal portion 20a of the counter substrate 20 is in a curved state. Compared to the above, even if the bending angle for bending the material removal portion 20a is small, the space between the material removal portion 20a and the terminal portion 12 is as much as the TFT substrate 10 portion on the terminal portion 12 side is also in a curved state. In addition to being sufficiently widened, the curved portion of the material removal portion 20a, that is, the surface of the material removal portion 20a facing the TFT substrate 10 is outside the terminal portion 12 so that the normal line does not pass through the terminal portion 12. Can be easily realized. And since the curve angle which bends the material removal part 20a of the opposing board | substrate 20 may be small, the stress concerning the adhesion surface of the opposing board | substrate 20 and the sealing material 30 can be suppressed, and the opposing board | substrate 20 makes the sealing material 30. Can be prevented from peeling off.
 続いて、上記湾曲状態において、除材部20aの切断ライン24に対し、図6(C)に示すように、切断手段としてのレーザー光LをTFT基板10側から対向基板20におけるTFT基板10との対向面に対して垂直あるいはそれに近い角度で照射することにより、除材部20aをシール材30の外側で切断する。これによって、バリを生成することなく除材部20aを切断でき、端子部12を損傷させずに導電不良のない良好な状態で露出させることができる。 Subsequently, in the above-described curved state, as shown in FIG. 6C, the laser beam L as the cutting means is applied to the cutting substrate 24 on the counter substrate 20 from the TFT substrate 10 side with respect to the cutting line 24 of the material removal portion 20a. The material removal portion 20a is cut outside the sealing material 30 by irradiating at an angle perpendicular to or close to the opposite surface of the material. As a result, the material removal portion 20a can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state with no conductive failure without being damaged.
 つまり、上記湾曲状態では、対向基板20の除材部20aと端子部12との間の空間が広げられ、且つ除材部20aのTFT基板10との対向面全体が端子部12の外側方を向いている。そして、このような湾曲状態にある除材部20aに対してそのTFT基板10側表面に垂直あるいはそれに近い角度でレーザー光Lを照射するので、レーザー光Lが端子部12に照射されることなく除材部20aを切断することができる。そうすると、上述した特許文献3の如く除材部20aの切断ライン24上に反射金属膜を形成しておく必要性がそもそもないので、除材部20aの切断によって、端子部12上で隣接する端子12aや配線14同士が短絡するなどして端子部12に導電不良が生じる事態を招かずに済む。しかも、除材部20aをレーザー光Lにより完全に切断しきるので、その切断面にバリが生成されることもない。 That is, in the curved state, the space between the material removal portion 20a of the counter substrate 20 and the terminal portion 12 is widened, and the entire surface of the material removal portion 20a facing the TFT substrate 10 extends outside the terminal portion 12. It is suitable. And since the laser beam L is irradiated to the material removal portion 20a in such a curved state at an angle perpendicular to or close to the surface of the TFT substrate 10, the laser beam L is not irradiated to the terminal portion 12. The material removal portion 20a can be cut. Then, since there is no need to form a reflective metal film on the cutting line 24 of the material removal portion 20a as in Patent Document 3 described above, the adjacent terminals on the terminal portion 12 by cutting the material removal portion 20a. It is not necessary to cause a failure in the terminal portion 12 due to a short circuit between the wiring 12a and the wiring 14. In addition, since the material removal portion 20a is completely cut by the laser beam L, burrs are not generated on the cut surface.
 また、このとき、逆に、対向基板20に対してTFT基板10とは反対側からレーザー光Lを照射する場合には、レーザー光Lが対向基板20に照射された際に該対向基板20の内部を透過し、その透過光の出射方向が屈折や散乱などにより端子部12側を向いて、レーザー光Lが端子部12に照射されるおそれがある。これに対して、本実施形態では、レーザー光LをTFT基板10側から照射するので、端子部12にレーザー光Lが照射される要因を無くして、該端子部12の損傷を確実に防止することができる。 At this time, conversely, when the opposite substrate 20 is irradiated with the laser light L from the side opposite to the TFT substrate 10, when the opposite substrate 20 is irradiated with the laser light L, the opposite substrate 20 There is a possibility that the laser beam L is transmitted through the inside, the emission direction of the transmitted light is directed toward the terminal portion 12 due to refraction or scattering, and the terminal portion 12 is irradiated with the laser light L. On the other hand, in the present embodiment, since the laser light L is irradiated from the TFT substrate 10 side, the cause of the laser light L being applied to the terminal portion 12 is eliminated, and damage to the terminal portion 12 is reliably prevented. be able to.
 このように除材部20aの切断手段としてレーザー光Lを用いれば、端子部12の損傷を確実に防止しながらも高速処理が可能になるので、液晶表示装置Sの製造効率が高められる。上記レーザー光Lとしては、ArレーザーやYAG(Yttrium-Aluminum-Garnet)レーザー、CO2レーザーなどを好適に用いることができる。 As described above, when the laser beam L is used as the cutting means of the material removal portion 20a, high-speed processing is possible while reliably preventing damage to the terminal portion 12, so that the manufacturing efficiency of the liquid crystal display device S is enhanced. As the laser beam L, an Ar laser, a YAG (Yttrium-Aluminum-Garnet) laser, a CO2 laser, or the like can be suitably used.
 次いで、曲面ステージ52の吸着動作を止めて該曲面ステージ52から液晶パネルPを分離する。こうして、図6(D)に示すように、対向基板20よりも端子部12側のTFT基板10部分を突出させて突出部10aを構成し、対向基板20から端子部12を露出させる。 Next, the suction operation of the curved stage 52 is stopped, and the liquid crystal panel P is separated from the curved stage 52. In this way, as shown in FIG. 6D, the TFT substrate 10 portion on the terminal portion 12 side with respect to the counter substrate 20 is protruded to form the protrusion 10 a, and the terminal portion 12 is exposed from the counter substrate 20.
 その後に、液晶パネルPの両面に対して偏光板36,37をそれぞれ貼り付ける。 Thereafter, polarizing plates 36 and 37 are attached to both sides of the liquid crystal panel P, respectively.
 <実装工程>
 液晶パネルPの端子部12に対し、異方性導電膜などを介して外部のドライバICに接続されたFPCなどの配線基板を接続する。しかる後、液晶パネルPに対し、必要に応じて、バックライトユニットなどを搭載する。
<Mounting process>
A wiring board such as an FPC connected to an external driver IC is connected to the terminal portion 12 of the liquid crystal panel P via an anisotropic conductive film or the like. Thereafter, a backlight unit or the like is mounted on the liquid crystal panel P as necessary.
 以上の各工程を行うことによって、図1及び図2に示す液晶表示装置Sを製造することができる。 By performing the above steps, the liquid crystal display device S shown in FIGS. 1 and 2 can be manufactured.
  -実施形態1の効果-
 この実施形態1によると、対向基板20の除材部20aを撓らせて端子部12から離反させた湾曲状態とし、該湾曲状態において除材部20aをレーザー光Lの照射により完全に切断しきるので、バリを生成することなく端子部12の上方に延出する対向基板20の除材部20aを切断し、端子部12を損傷させずに導電不良のない良好な状態で露出させることができる。
-Effect of Embodiment 1-
According to the first embodiment, the material removal portion 20a of the counter substrate 20 is bent to be separated from the terminal portion 12, and the material removal portion 20a is completely cut by irradiation with the laser light L in the curved state. Therefore, the material removal portion 20a of the counter substrate 20 extending above the terminal portion 12 can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state without any conductive failure without being damaged. .
 《発明の実施形態2》
 この実施形態2では、端子出し工程が上記実施形態1と部分的に異なる他は、液晶表示装置Sの構成もその製造方法における他の工程も上記実施形態1と同様であるので、構成の異なる端子出し工程についてのみ説明する。なお、以降の実施形態では、図1~図6と同一の構成箇所については同一符合を付して上記実施形態1の説明に譲ることにし、その詳細な説明を省略する。
<< Embodiment 2 of the Invention >>
In the second embodiment, the configuration of the liquid crystal display device S and other steps in the manufacturing method thereof are the same as those of the first embodiment except that the terminal lead-out process is partially different from the first embodiment. Only the terminal drawing process will be described. In the following embodiments, the same components as those in FIGS. 1 to 6 are denoted by the same reference numerals, and the detailed description thereof will be omitted.
 <端子出し工程>
 本実施形態における端子出し工程の手順を図7(A),(B)に示す。上記実施形態1では、除材部20aを湾曲状態とする手段としてL字状の鉤爪54aを有する引上げ治具54を用いるとしたが、本実施形態では、同手段として弱粘着層56aを有する引上げ治具56を用いる。
<Terminal extraction process>
7A and 7B show the procedure of the terminal extraction process in this embodiment. In the first embodiment, the pulling jig 54 having the L-shaped claw 54a is used as a means for bringing the material removal portion 20a into a curved state. A jig 56 is used.
 まず、上記実施形態1と同様に、図7(A)に示すように、液晶パネルPを曲面ステージ52に載置し、該曲面ステージ52の吸着動作によって液晶パネルPを吸着固定することにより、液晶パネルPを曲面ステージ52の載置面に倣って曲げ、端子部12側のTFT基板10部分を除材部20aから離反するように撓らせて湾曲状態とする。 First, as in the first embodiment, as shown in FIG. 7A, the liquid crystal panel P is placed on the curved surface stage 52, and the liquid crystal panel P is sucked and fixed by the suction operation of the curved surface stage 52. The liquid crystal panel P is bent along the mounting surface of the curved surface stage 52, and the TFT substrate 10 portion on the terminal portion 12 side is bent so as to be separated from the material removal portion 20a to be in a curved state.
 次いで、底部に弱粘着層56aを有する引上げ治具56を用いて対向基板20の除材部20aを湾曲状態とする。 Next, the material removal portion 20a of the counter substrate 20 is bent using the pulling jig 56 having the weak adhesive layer 56a at the bottom.
 具体的には、図7(A)に示すように、対向基板20における除材部20aの延出端部表面に弱粘着層56aを粘着させて、図7(B)に示すように、引上げ治具56の引上げ操作により除材部20aを引き上げる。そうして、対向基板20の除材部20aを、端子部12から離反するように撓らせて、上記実施形態1と同様な角度で端子部12との間の空間を広げた湾曲状態とする。 Specifically, as shown in FIG. 7A, the weak adhesive layer 56a is adhered to the surface of the extended end portion of the material removal portion 20a in the counter substrate 20, and as shown in FIG. By removing the jig 56, the material removal portion 20a is pulled up. Then, the material removal portion 20a of the counter substrate 20 is bent so as to be separated from the terminal portion 12, and a curved state in which a space between the terminal portion 12 is widened at an angle similar to that of the first embodiment, To do.
 続いて、上記湾曲状態において、除材部20aの切断ライン24に対し、図7(B)に示すように、切断手段としてのレーザー光LをTFT基板10側から対向基板20のTFT基板10側表面に対して垂直あるいはそれに近い角度で照射することにより、除材部20aをシール材30の外側で切断する。これによって、バリを生成することなく除材部20aを切断でき、端子部12を損傷させずに導電不良のない良好な状態で露出させることができる。 Subsequently, in the above-described curved state, as shown in FIG. 7B, the laser beam L as the cutting means is applied from the TFT substrate 10 side to the TFT substrate 10 side of the counter substrate 20 with respect to the cutting line 24 of the material removal portion 20a. By irradiating the surface perpendicularly or at an angle close to the surface, the material removal portion 20 a is cut outside the sealing material 30. As a result, the material removal portion 20a can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state with no conductive failure without being damaged.
 しかる後、曲面ステージ52の吸着動作を止めて該曲面ステージ52から液晶パネルPを分離する。こうして、対向基板20よりも端子部12側のTFT基板10部分を突出させて突出部10aを構成し、対向基板20から端子部12を露出させる。 Thereafter, the suction operation of the curved stage 52 is stopped and the liquid crystal panel P is separated from the curved stage 52. Thus, the portion of the TFT substrate 10 closer to the terminal portion 12 than the counter substrate 20 is protruded to form the protruding portion 10a, and the terminal portion 12 is exposed from the counter substrate 20.
  -実施形態2の効果-
 この実施形態2によると、上記実施形態1と同様な効果を得ることができる上に、弱粘着層56aを有する引上げ治具56を用いるので、上記実施形態1の如く引上げ治具54の一部を対向基板20の除材部20aと端子部12との間に挿入することを要さず、除材部20aの延出端部表面に粘着させて使用することで該除材部20aを湾曲状態とすることができ、除材部20aを湾曲状態とする際にも端子部12の損傷を防止することができる。
-Effect of Embodiment 2-
According to the second embodiment, the same effects as those of the first embodiment can be obtained, and the pulling jig 56 having the weak adhesive layer 56a is used. Therefore, a part of the pulling jig 54 as in the first embodiment is used. Is not required to be inserted between the material removal portion 20a of the counter substrate 20 and the terminal portion 12, and the material removal portion 20a is curved by adhering to the surface of the extended end portion of the material removal portion 20a. The terminal portion 12 can be prevented from being damaged even when the material removal portion 20a is in a curved state.
 《発明の実施形態3》
 この実施形態3でも、端子出し工程以外は上記実施形態1と同様であるので、構成の異なる端子出し工程についてのみ説明する。
<< Embodiment 3 of the Invention >>
Since the third embodiment is the same as the first embodiment except for the terminal putting out process, only the terminal putting out process having a different configuration will be described.
 <端子出し工程>
 本実施形態における端子出し工程の手順を図8(A)~(C)に示す。上記実施形態1では、除材部20aを切断する切断手段としてレーザー光Lを用いるとしたが、本実施形態では、同手段として超音波カッター58を用いる。
<Terminal extraction process>
8A to 8C show the procedure of the terminal extraction process in this embodiment. In the first embodiment, the laser beam L is used as a cutting means for cutting the material removal portion 20a. However, in this embodiment, an ultrasonic cutter 58 is used as the same means.
 まず、上記実施形態1と同様に、図8(A)に示すように、液晶パネルPを曲面ステージ52に載置し、該曲面ステージ52の吸着動作によって液晶パネルPを吸着固定することにより、液晶パネルPを曲面ステージ52の載置面に倣って曲げ、端子部12側のTFT基板10部分を除材部20aから離反するように撓らせて上記実施形態1と同様な角度の湾曲状態とする。 First, as in the first embodiment, as shown in FIG. 8A, the liquid crystal panel P is placed on the curved stage 52, and the liquid crystal panel P is sucked and fixed by the sucking operation of the curved stage 52. The liquid crystal panel P is bent following the mounting surface of the curved stage 52, and the TFT substrate 10 portion on the terminal portion 12 side is bent away from the material removal portion 20a to be bent at the same angle as in the first embodiment. And
 次いで、上記実施形態2と同様に、図8(B)に示すように、底部に弱粘着層56aを有する引上げ治具56を用いて対向基板20の除材部20aを湾曲状態とする。 Next, as in the second embodiment, as shown in FIG. 8B, the material removal portion 20a of the counter substrate 20 is bent using a pulling jig 56 having a weak adhesive layer 56a at the bottom.
 続いて、上記湾曲状態において、対向基板20の除材部20aを、図8(B)及び図8(C)に示すように、切断手段としての超音波カッター58により液晶パネルP表面側から切断ライン24に沿ってシール材30の外側で切断する。これによって、バリを生成することなく除材部20aを切断でき、端子部12を損傷させずに導電不良のない良好な状態で露出させることができる。 Subsequently, in the curved state, the material removal portion 20a of the counter substrate 20 is cut from the surface side of the liquid crystal panel P by an ultrasonic cutter 58 as cutting means, as shown in FIGS. Cut along the line 24 on the outside of the sealing material 30. As a result, the material removal portion 20a can be cut without generating burrs, and the terminal portion 12 can be exposed in a good state with no conductive failure without being damaged.
 しかる後、曲面ステージ52の吸着動作を止めて該曲面ステージ52から液晶パネルPを分離する。こうして、対向基板20よりも端子部12側のTFT基板10部分を突出させて突出部10aを構成し、対向基板20から端子部12を露出させる。 Thereafter, the suction operation of the curved stage 52 is stopped and the liquid crystal panel P is separated from the curved stage 52. Thus, the portion of the TFT substrate 10 closer to the terminal portion 12 than the counter substrate 20 is protruded to form the protruding portion 10a, and the terminal portion 12 is exposed from the counter substrate 20.
  -実施形態3の効果-
 この実施形態3によると、上記実施形態1と同様な効果を得ることができる上に、切断手段として超音波カッター58を用いるので、除材部20aを切断する際に対向基板20とシール材30との接着面にかかる応力を抑えて、対向基板20がシール材30から剥がれることを防止できる。
-Effect of Embodiment 3-
According to the third embodiment, the same effect as in the first embodiment can be obtained, and the ultrasonic cutter 58 is used as a cutting means. Therefore, when the material removal portion 20a is cut, the counter substrate 20 and the sealing material 30 are used. It is possible to prevent the counter substrate 20 from being peeled off from the sealing material 30 by suppressing the stress applied to the adhesive surface.
 さらに、レーザー光Lの照射により除材部20aを切断する場合には、レーザー光Lが周囲に飛散するおそれがあり、防護用の設備が必要となるのに対して、超音波カッター58を用いる場合には、レーザー光Lのように周囲にその切断手段自体が飛散することはないので、より安全に除材部20aを切断することができる。 Further, when the material removal portion 20a is cut by irradiation with the laser beam L, the laser beam L may be scattered around, and a protection facility is required. On the other hand, the ultrasonic cutter 58 is used. In this case, since the cutting means itself is not scattered around like the laser beam L, the material removal portion 20a can be cut more safely.
 なお、上記実施形態3では、切断手段として、レーザー光Lに代えて超音波カッター58を用いるとしたが、ヒートカッターを用いても同様な効果を得ることができる。またその他、対向基板20におけるシール材30からの剥離を防止する観点から、これらの接着面にかかる応力を低減できる切断手段を採用することが好ましい。 In the third embodiment, the ultrasonic cutter 58 is used as the cutting means in place of the laser beam L. However, the same effect can be obtained even if a heat cutter is used. In addition, from the viewpoint of preventing the counter substrate 20 from being peeled off from the sealing material 30, it is preferable to employ a cutting means that can reduce the stress applied to these bonding surfaces.
 《その他の実施形態》
 上記実施形態1~3について、以下のように変更してもよい。
<< Other Embodiments >>
The first to third embodiments may be modified as follows.
 <TFT基板10の構成>
 上記実施形態1~3では、TFT基板10がベース基板としてプラスチック基板11を備えているとしたが、本発明はこれに限らず、TFT基板10は、プラスチック基板11に代えてガラス基板やシリコン基板を備えていてもよい。
<Configuration of TFT substrate 10>
In the first to third embodiments, the TFT substrate 10 includes the plastic substrate 11 as a base substrate. However, the present invention is not limited to this, and the TFT substrate 10 may be a glass substrate or a silicon substrate instead of the plastic substrate 11. May be provided.
 <除材部20aを湾曲させる手段の構成>
 上記実施形態1ではL字状の鉤爪54aを有する引上げ治具54を、上記実施形態2では弱粘着層56aを有する引上げ治具56をそれぞれ用いて対向基板20の除材部20aを引き上げて湾曲状態にするとしたが、本発明はこれに限らず、真空ピンセットなどの吸着機能を有する引上げ治具を用いて除材部20aを湾曲状態としてしてもよい。
<Configuration of means for bending the material removal portion 20a>
In the first embodiment, the pulling jig 54 having the L-shaped claw 54a is used, and in the second embodiment, the pulling jig 56 having the weak adhesive layer 56a is used to pull up the material removal portion 20a of the counter substrate 20 and bend it. However, the present invention is not limited to this, and the material removal portion 20a may be curved using a pulling jig having a suction function such as vacuum tweezers.
 また、上記引上げ治具54,56に代えて、除材部20aの延出端部の両端を挟持して引き上げるような引上げ機構を採用してもよい。その他、除材部20aと端子部12との間にエアーを吹き込むことにより、その空気圧により除材部20aを捲り上げて湾曲状態とするブロアーなどの手段を採用しても構わない。 Further, instead of the pulling jigs 54 and 56, a pulling mechanism that sandwiches and lifts both ends of the extending end of the material removal portion 20a may be employed. In addition, by blowing air between the material removal portion 20a and the terminal portion 12, a means such as a blower that raises the material removal portion 20a by its air pressure and makes it curved may be employed.
 <液晶パネルPの作製方法>
 上記実施形態1では、切れ目30aを有する枠状のシール材30を介してTFT基板10と対向基板20とを貼り合わせて空隙部31を有する貼合パネルP’を構成し、該貼合パネルP’の空隙部31にシール材30の切れ目30aにより構成された液晶注入口30bから真空引きによる気圧差を利用して液晶材料32aを注入し、その後に、封止材33により液晶注入口30bを封止する、いわゆる真空注入法により液晶パネルPを作製するとしたが、これに限らない。
<Production method of liquid crystal panel P>
In the said Embodiment 1, the bonding panel P 'which has the space | gap part 31 is comprised by bonding the TFT substrate 10 and the opposing board | substrate 20 through the frame-shaped sealing material 30 which has the cut 30a, and this bonding panel P The liquid crystal material 32a is injected into the gap portion 31 'by using a pressure difference caused by evacuation from the liquid crystal injection port 30b formed by the cut 30a of the sealing material 30, and then the liquid crystal injection port 30b is formed by the sealing material 33. Although the liquid crystal panel P is manufactured by a so-called vacuum injection method for sealing, the present invention is not limited to this.
 すなわち、上記真空注入法に代えて、TFT基板10又は対向基板20の表面に完全に閉じた枠状にシール材30を描画し、該シール材30の内側に液晶材料32aを所定量滴下した後、これらシール材30及び液晶材料32aを介してTFT基板10と対向基板20とを真空環境下で貼り合わせて、最後にシール材30を硬化させる、いわゆる滴下注入法により液晶パネルPを作製してもよい。 That is, instead of the vacuum injection method described above, the sealing material 30 is drawn in a completely closed frame shape on the surface of the TFT substrate 10 or the counter substrate 20, and a predetermined amount of the liquid crystal material 32a is dropped inside the sealing material 30. Then, the TFT substrate 10 and the counter substrate 20 are bonded together under a vacuum environment through the sealing material 30 and the liquid crystal material 32a, and finally the sealing material 30 is cured, so that a liquid crystal panel P is manufactured by a so-called drop injection method. Also good.
 以上、本発明の好ましい実施形態について説明したが、本発明の技術的範囲は、上記の実施形態の範囲に限定されない。上記実施形態が例示であり、それらの各構成要素や各処理プロセスの組合せに、さらにいろいろな変形例が可能なこと、またそうした変形例も本発明の範囲にあることは当業者に理解されるところである。 The preferred embodiments of the present invention have been described above, but the technical scope of the present invention is not limited to the above-described embodiments. It is understood by those skilled in the art that the above embodiment is an exemplification, and that various modifications can be made to the combination of each component and each processing process, and such modifications are also within the scope of the present invention. By the way.
 例えば、上記実施形態1~3では、TFTを用いたアクティブマトリクス駆動方式の液晶表示装置Sを例に挙げて説明したが、本発明はこれに限らず、TFTなどの3端子素子だけでなく、MIM(Metal Insulator Metal) などの2端子素子を駆動素子とするアクティブマトリクス駆動方式の液晶表示装置にも適用可能である。また、本発明に係る表示装置の製造方法は、アクティブ駆動方式の液晶表示装置Sだけでなく、パッシブ(マルチプレックス)駆動方式の液晶表示装置にも勿論適用することができる。さらに、本発明に係る表示装置の製造方法は、透過型、反射型、透過反射両用型のいずれのタイプの表示パネルにも適用できる。 For example, in Embodiments 1 to 3 described above, the active matrix driving type liquid crystal display device S using TFTs has been described as an example. However, the present invention is not limited to this, and is not limited to three-terminal elements such as TFTs. The present invention is also applicable to an active matrix liquid crystal display device using a two-terminal element such as MIM (Metal Insulator Metal) as a drive element. Further, the display device manufacturing method according to the present invention can be applied not only to the active drive type liquid crystal display device S but also to the passive (multiplex) drive type liquid crystal display device. Furthermore, the method for manufacturing a display device according to the present invention can be applied to any type of display panel of transmissive type, reflective type, and transmissive / reflective type.
 また、本発明に係る表示装置の製造方法は、液晶表示装置Sだけでなく、表示媒体層としてEL(Electro Luminescence)層を備えた有機EL(Electro Luminescence)表示装置や無機EL表示装置、表示媒体層としてネオンガス又はキセノンガスなどのガス層を備えたプラズマ表示装置にも適用することができ、その他、FED(Field Emission Display;電界放出ディスプレイ)、SED(Surface-conduction Electron-emitter Display;表面電界ディスプレイ)、エレクトロウェッティング表示装置などの各種表示装置の製造方法としても広く適用することができる。 The display device manufacturing method according to the present invention includes not only the liquid crystal display device S but also an organic EL (Electro Luminescence) display device, an inorganic EL display device, and a display medium each having an EL (Electro Luminescence) layer as a display medium layer. It can be applied to a plasma display device having a gas layer such as neon gas or xenon gas as a layer. In addition, FED (Field-Emission Display), SED (Surface-conduction Electron-emitter Display) ), And can be widely applied as a manufacturing method of various display devices such as an electrowetting display device.
 以上説明したように、本発明は、一対の基板がシール材を介して貼り合わされた構造を有し、一方の基板が側端部に外部回路接続用の端子部を備え、他方の基板が可撓性を有する表示装置を製造する方法について有用であり、特に、バリを生成することなく端子部の上方に延出する基板部分を切断し、端子部を損傷させずに導電不良のない良好な状態で露出させることが要望される表示装置の製造方法に適している。 As described above, the present invention has a structure in which a pair of substrates are bonded to each other with a sealing material, one substrate is provided with a terminal portion for connecting an external circuit at a side end, and the other substrate is acceptable. It is useful for a method of manufacturing a display device having flexibility, and in particular, a substrate portion extending above the terminal portion without generating burrs is cut, and there is no poor conduction without damaging the terminal portion. It is suitable for a manufacturing method of a display device that is required to be exposed in a state.
 L    レーザー光(切断手段)
 S    液晶表示装置
 10   TFT基板(第1基板)
 11、21  プラスチック基板
 12   端子部
 12a  端子
 14   引出配線
 16   画素電極
 20   対向基板(第2基板)
 20a  除材部(第2基板の延出部分,余白領域)
 22   共通電極
 24   切断ライン
 30   シール材
 30a  切れ目
 30b  液晶注入口
 31   空隙部
 32   液晶層
 32a  液晶材料
 33   封止材
 34,35  配向膜
 36,37  偏光板
 50   真空槽
 51   容器
 52   曲面ステージ
 54,56   引上げ治具
 54a  鉤爪
 56a  弱粘着層
 58   超音波カッター(切断手段)
L Laser light (cutting means)
S Liquid crystal display device 10 TFT substrate (first substrate)
DESCRIPTION OF SYMBOLS 11, 21 Plastic substrate 12 Terminal part 12a Terminal 14 Lead-out wiring 16 Pixel electrode 20 Opposite substrate (2nd substrate)
20a Material removal part (extension part of second substrate, blank area)
22 Common electrode 24 Cutting line 30 Sealing material 30a Cut 30b Liquid crystal injection port 31 Void portion 32 Liquid crystal layer 32a Liquid crystal material 33 Sealing material 34, 35 Alignment film 36, 37 Polarizing plate 50 Vacuum chamber 51 Container 52 Curved stage 54, 56 Pulling up Jig 54a Claw 56a Weak adhesive layer 58 Ultrasonic cutter (cutting means)

Claims (13)

  1.  外部回路接続用の端子部を側端部に備えた第1基板と、可撓性を有する第2基板とを、互いに対向させて、上記第2基板が上記端子部の対向領域に延出し該延出部分によって上記端子部の少なくとも一部が覆われるように上記端子部よりも内側に位置するシール材を介して貼り合わせると共に又はその後に、当該第1基板と第2基板との間に表示媒体層を介在させることにより、表示パネルを作製する表示パネル作製工程と、
     上記第2基板の延出部分を、上記端子部から離反するように撓らせて、上記端子部との間の空間を広げた湾曲状態とし、該湾曲状態において上記第2基板の延出部分を切断手段により上記シール材の外側で切断して、上記第2基板から上記端子部を露出させる端子出し工程とを含む
    ことを特徴とする表示装置の製造方法。
    A first substrate having a terminal portion for connecting an external circuit at a side end portion and a second substrate having flexibility are opposed to each other, and the second substrate extends to an opposing region of the terminal portion. Displayed between the first substrate and the second substrate with or after being bonded via a sealing material located inside the terminal portion so that at least a part of the terminal portion is covered by the extending portion. A display panel manufacturing process for manufacturing a display panel by interposing a medium layer;
    The extended portion of the second substrate is bent so as to be separated from the terminal portion, so that the space between the terminal portion and the extended portion is in a curved state, and the extended portion of the second substrate in the curved state Cutting the outer side of the sealing material by a cutting means to expose the terminal portion from the second substrate, and a method for manufacturing a display device.
  2.  請求項1に記載の表示装置の製造方法において、
     上記湾曲状態は、上記第2基板の延出部分における上記第1基板との対向面を、その法線が上記端子部を通らないように該端子部の外側方に向けた状態である
    ことを特徴とする表示装置の製造方法。
    In the manufacturing method of the display device according to claim 1,
    The curved state is a state in which the surface facing the first substrate in the extended portion of the second substrate faces the outside of the terminal portion so that the normal line does not pass through the terminal portion. A display device manufacturing method.
  3.  請求項1又は2に記載の表示装置の製造方法において、
     上記第1基板も可撓性を有し、
     上記端子出し工程では、上記端子部側の第1基板部分も上記第2基板から離反するように撓らせる
    ことを特徴とする表示装置の製造方法。
    In the manufacturing method of the display device according to claim 1 or 2,
    The first substrate also has flexibility,
    The method of manufacturing a display device, wherein in the terminal extraction step, the first substrate portion on the terminal portion side is also bent so as to be separated from the second substrate.
  4.  請求項3に記載の表示装置の製造方法において、
     上記端子出し工程では、上記表示パネルを吸着固定するための吸着手段を備え凸状の湾曲面を呈する曲面ステージ上に、上記表示パネルを上記第1基板が当該ステージ側に位置するように載置し、上記曲面ステージの吸着動作により、上記端子部側の第1基板部分を上記第2基板から離反するように撓らせる
    ことを特徴とする表示装置の製造方法。
    In the manufacturing method of the display device according to claim 3,
    In the terminal pulling-out step, the display panel is placed on a curved stage having a convex curved surface having suction means for sucking and fixing the display panel so that the first substrate is located on the stage side. A method of manufacturing a display device, comprising: bending the first substrate portion on the terminal portion side away from the second substrate by an adsorption operation of the curved stage.
  5.  請求項1~4のいずれか1項に記載の表示装置の製造方法において、
     上記端子出し工程では、上記切断手段としてレーザー光を用いる
    ことを特徴とする表示装置の製造方法。
    The method for manufacturing a display device according to any one of claims 1 to 4,
    A method of manufacturing a display device, characterized in that, in the terminal drawing step, laser light is used as the cutting means.
  6.  請求項5に記載の表示装置の製造方法において、
     上記端子出し工程では、上記湾曲状態において、上記第2基板に対して第1基板側からレーザー光を照射する
    ことを特徴とする表示装置の製造方法。
    In the manufacturing method of the display device according to claim 5,
    The method of manufacturing a display device, wherein, in the terminal-out step, the second substrate is irradiated with laser light from the first substrate side in the curved state.
  7.  請求項1~4のいずれか1項に記載の表示装置の製造方法において、
     上記端子出し工程では、上記切断手段として、超音波カッター又はヒートカッターを用いる
    ことを特徴とする表示装置の製造方法。
    The method for manufacturing a display device according to any one of claims 1 to 4,
    In the terminal drawing step, an ultrasonic cutter or a heat cutter is used as the cutting means.
  8.  請求項1~7のいずれか1項に記載の表示装置の製造方法において、
     上記端子出し工程では、粘着層を有する引上げ治具を用い、上記第2基板の延出部分の延出端部表面に上記粘着層を粘着させて、上記引上げ治具の引上げ操作により上記第2基板の延出部分を上記端子部から離反するように撓らせる
    ことを特徴とする表示装置の製造方法。
    The method for manufacturing a display device according to any one of claims 1 to 7,
    In the terminal pulling-out step, a pulling jig having an adhesive layer is used, the adhesive layer is adhered to the surface of the extended end portion of the extended portion of the second substrate, and the second jig is lifted by the pulling operation of the pulling jig. A method for manufacturing a display device, comprising: bending an extended portion of a substrate so as to be separated from the terminal portion.
  9.  請求項1~8のいずれか1項に記載の表示装置の製造方法において、
     上記第2基板は、ベース基板としてプラスチック基板を備えている
    ことを特徴とする表示装置の製造方法。
    The method for manufacturing a display device according to any one of claims 1 to 8,
    The method for manufacturing a display device, wherein the second substrate includes a plastic substrate as a base substrate.
  10.  請求項9に記載の表示装置の製造方法において、
     上記第2基板が備えるプラスチック基板の厚さは、5μm以上且つ50μm以下である
    ことを特徴とする表示装置の製造方法。
    In the manufacturing method of the display device according to claim 9,
    A method of manufacturing a display device, wherein the plastic substrate included in the second substrate has a thickness of 5 μm to 50 μm.
  11.  請求項9又は10に記載の表示装置の製造方法において、
     上記第1基板も、ベース基板としてプラスチック基板を備えている
    ことを特徴とする表示装置の製造方法。
    In the manufacturing method of the display device according to claim 9 or 10,
    The display device manufacturing method, wherein the first substrate also includes a plastic substrate as a base substrate.
  12.  請求項11に記載の表示装置の製造方法において、
     上記第1基板が備えるプラスチック基板の厚さは、5μm以上且つ50μm以下である
    ことを特徴とする表示装置の製造方法。
    In the manufacturing method of the display device according to claim 11,
    A method of manufacturing a display device, wherein a thickness of a plastic substrate provided in the first substrate is 5 μm or more and 50 μm or less.
  13.  請求項1~12のいずれか1項に記載の表示装置の製造方法において、
     上記表示パネル作製工程では、上記シール材を枠状に形成し、該シール材の内側に上記表示媒体層として液晶層を封入する
    ことを特徴とする表示装置の製造方法。
    The method for manufacturing a display device according to any one of claims 1 to 12,
    In the display panel manufacturing step, the sealing material is formed in a frame shape, and a liquid crystal layer is sealed as the display medium layer inside the sealing material.
PCT/JP2012/004069 2011-06-28 2012-06-22 Display device manufacturing method WO2013001771A1 (en)

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JP2014235279A (en) * 2013-05-31 2014-12-15 株式会社ジャパンディスプレイ Display device and production method thereof
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CN108051965A (en) * 2018-01-02 2018-05-18 京东方(河北)移动显示技术有限公司 Display base plate and manufacturing method, display device and manufacturing method, mobile terminal
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