WO2012165159A1 - Élément électroluminescent organique et son procédé de fabrication - Google Patents

Élément électroluminescent organique et son procédé de fabrication Download PDF

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Publication number
WO2012165159A1
WO2012165159A1 PCT/JP2012/062635 JP2012062635W WO2012165159A1 WO 2012165159 A1 WO2012165159 A1 WO 2012165159A1 JP 2012062635 W JP2012062635 W JP 2012062635W WO 2012165159 A1 WO2012165159 A1 WO 2012165159A1
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electrode
functional layer
support substrate
organic
layer
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PCT/JP2012/062635
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English (en)
Japanese (ja)
Inventor
将啓 中村
山木　健之
正人 山名
貴裕 小柳
大貴 加藤
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パナソニック株式会社
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H10K71/611—Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing

Definitions

  • the present invention relates to an organic electroluminescence element used for a lighting fixture, a liquid crystal backlight or various display devices, and a method for producing the same.
  • a typical example of the surface light emitter is an organic electroluminescence element (hereinafter referred to as “organic EL element”).
  • organic EL element a light transmissive second electrode 12 is provided on the surface (lower surface) of a light transmissive support substrate 11, and holes are injected into the surface (lower surface) of the second electrode 12.
  • the functional layer 16 including the layer 13, the hole transport layer 14, and the light emitting layer 15 is provided, and the light reflective first electrode 17 is provided on the surface (lower surface) of the functional layer 16.
  • the light emitted from the functional layer 16 by applying a voltage between the second electrode 12 and the first electrode 17 is extracted through the second electrode 12 and the support substrate 11.
  • the light transmissive second electrode 12 is made of a metal oxide such as ITO, IZO, AZO, GZO, FTO, or ATO as a transparent conductive material, and is subjected to a vacuum process such as sputtering or vacuum deposition. It is formed.
  • a metal oxide such as ITO, IZO, AZO, GZO, FTO, or ATO
  • a vacuum process such as sputtering or vacuum deposition. It is formed.
  • These film forming methods require expensive equipment and a large amount of energy, and techniques for reducing manufacturing costs and environmental burdens are required.
  • the refractive index of the transparent conductive film formed by these is higher than that of the glass support substrate, and in the case of an organic EL device, the total reflection loss due to the difference in refractive index at the interface with the front and rear layers reduces the light extraction efficiency. It is a factor.
  • the present invention has been made in view of the above points, and an object of the present invention is to provide a low-cost organic electroluminescence element that suppresses a short circuit and reduces the influence on operation reliability, and a method for manufacturing the same.
  • the present invention includes forming a functional layer (26) including at least a light emitting layer (25) on the first electrode (27) and then forming a second electrode (22) on the functional layer (26). It is a manufacturing method of an organic electroluminescent element. The method includes forming the second electrode by a wet process, and the second electrode (22) is light transmissive.
  • the method includes forming the first electrode (27) by a dry process.
  • the method includes forming the first electrode (27) on the support substrate (21) by a dry process, and forming the functional layer (26) on the first electrode (27) by a wet process. And forming the second electrode (22) on the functional layer (26) by a wet process.
  • one of the support substrate (21) and the first electrode (27) also serves as the other.
  • the method includes forming the functional layer (26) on a support substrate (21) that also serves as the first electrode (27) by a wet process, and forming the functional layer (26) on the functional layer (26) by a wet process. Forming a second electrode (22).
  • the method includes forming the second electrode (22) in a mesh shape.
  • the present invention includes a functional layer (26) including at least a light emitting layer (25) formed on the first electrode (27) and a second electrode (22) formed on the functional layer (26). It is the organic electroluminescent element provided.
  • a support substrate (21) is provided on the opposite side of the functional layer (26) of the first electrode (27), and the second electrode (22) is light transmissive.
  • the present invention comprises a functional layer (26) including a light emitting layer (25) formed on the first electrode (27) and a second electrode (22) formed on the functional layer (26).
  • Organic electroluminescence device The first electrode (27) is also formed as a support substrate (21), and the second electrode (22) is light transmissive.
  • the second electrode (22) is formed in a mesh shape.
  • the present invention can provide a low-cost organic electroluminescence element that suppresses a short circuit and reduces the influence on operation reliability.
  • FIG. 1 is a schematic cross-sectional view showing a first embodiment of the present invention. It is general
  • FIG. 3A is a schematic sectional view and
  • FIG. 3B is a partial plan view showing a third embodiment of the present invention. It is general
  • FIG. 1 shows a layer configuration of the organic EL element according to the first embodiment of the present invention.
  • the organic EL device of the first embodiment has a functional layer 26 having a first surface (lower surface) 261 and a second surface (upper surface) 262, and a first surface (lower surface) 271 and a second surface (upper surface) 272.
  • the functional layer 26 has a first electrode 27 disposed on the first surface 261 side, a first surface (lower surface) 221 and a second surface (upper surface) 222, and is disposed on the second surface 262 side of the functional layer 26.
  • the second electrode 22 is included.
  • the functional layer 26 is an organic functional layer including at least the light emitting layer 25 made of an organic functional material. In the example of FIG.
  • the organic EL element includes a support substrate 21 having a first surface (lower surface) 211 and a second surface (upper surface) 212, and a first electrode 27 formed on the second surface 212 of the support substrate 21.
  • a functional layer (organic layer) 26 including a light emitting layer 25, a hole transport layer 24, and a hole injection layer 23, and a light transmissive second electrode 22 formed on the second surface 262 of the functional layer 26.
  • the functional layer 26 is formed on the first electrode 27 (second surface 272) such that the first electrode 27 is interposed between the second surface 212 of the support substrate 21 and the first surface 261 of the functional layer 26. .
  • the functional layer 26 is formed by being laminated on one surface (second surface 272) of the first electrode 27.
  • the second surface 272 is a surface of the second electrode 22 on the functional layer 26 side ( It is formed smoother than the first surface 221). Accordingly, it is possible to reduce the influence of the irregularities on the surface of the first electrode 27 (second surface 272) on the functional layer 26. As a result, as shown in FIG. 5, the short circuit that is likely to occur in the functional layer 26 is suppressed as compared with the case where the functional layer 16 is formed on the surface of the second electrode 12 having a larger roughness than the surface of the first electrode 17. The influence on the operation reliability can be reduced.
  • the second electrode 22 can be formed on the functional layer 26 (second surface 262) by a wet process. Accordingly, it is possible to form a low-cost organic EL element that suppresses a short circuit that is likely to occur when the functional layer 16 is formed on the second electrode 12 formed by a wet process and reduces the influence on the operation reliability.
  • the support substrate 21 examples include a rigid transparent glass plate such as soda glass and non-alkali glass, a flexible transparent plastic plate such as polycarbonate and polyethylene terephthalate, and a metal film made of aluminum, copper, stainless steel, or the like. However, it is not limited to these. Moreover, although it is common in any kind of support substrate 21, in order to suppress the short circuit of an organic EL element, the smoothness of the surface (second surface 212) of the support substrate 21 is very important. In general, the metal film may have a rougher surface than glass or the like, but it is preferable to suppress the surface roughness to Ra 100 nm or less, and more preferably to Ra 10 nm or less. Thereby, the influence which the roughness of the surface of the support substrate 21 has on the first electrode 27 can be reduced, and the short circuit of the first electrode 27 can be easily suppressed.
  • a rigid transparent glass plate such as soda glass and non-alkali glass
  • a flexible transparent plastic plate such as polycarbonate and polyethylene terephthalate
  • the first electrode 27 can be formed as a cathode.
  • Such electrode material combinations include alkali metal and Al laminates, alkali metal and silver laminates, alkali metal halides and Al laminates, and alkali metal oxides and Al laminates. Bodies, laminates of alkaline earth metals and rare earth metals and Al, and alloys of these metal species with other metals, such as sodium, sodium-potassium alloy, lithium, magnesium, etc.
  • Examples thereof include a laminate with Al, a magnesium-silver mixture, a magnesium-indium mixture, an aluminum-lithium alloy, a LiF / Al mixture / laminate, an Al / Al 2 O 3 mixture, and the like. Further, in addition to those listed above, it is more preferable to insert a layer that promotes electron injection from the first electrode 27 into the light emitting layer 25, that is, an electron injection layer between the first electrode 27 and the light emitting layer 25. .
  • a material constituting the electron injection layer a material common to the material constituting the first electrode 27, a metal oxide such as titanium oxide and zinc oxide, and a dopant for promoting electron injection are mixed. However, it is not limited to these.
  • Examples of the organic electroluminescent material constituting the light emitting layer 25 include polyparaphenylene vinylene derivatives, polythiophene derivatives, polyparaphenylene derivatives, polysilane derivatives, polyacetylene derivatives, polyfluorene derivatives, polyvinylcarbazole derivatives, the above dye bodies, and metal complex light emission.
  • luminescent materials such as Ir complexes, Os complexes, Pt complexes, and europium complexes, or compounds or polymers having these in the molecule It can be used suitably. These materials can be appropriately selected and used as necessary.
  • a low molecular to high molecular material having a small LUMO can be used as a material constituting the hole transport layer 24 .
  • an aromatic amine is added to a side chain or main chain of polyvinylcarbazole (PVCz), polypyridine, polyaniline, or the like.
  • PVCz polyvinylcarbazole
  • polypyridine polypyridine
  • polyaniline polyaniline
  • polymers containing aromatic amines such as polyarylene derivatives, but are not limited thereto.
  • Examples of the material constituting the hole injection layer 23 include organic materials including thiophene, triphenylmethane, hydrazoline, arylamine, hydrazone, stilbene, triphenylamine, and the like.
  • aromatic carbene derivatives such as polyvinyl carbazole (PVCz), polyethylene dioxythiophene: polystyrene sulfonate (PEDOT: PSS), TPD, etc., the above materials may be used alone, or two or more kinds of materials. May be used in combination.
  • the second electrode 22 can be formed as an anode.
  • the conductive material constituting the second electrode 22 include silver, indium-tin oxide (ITO), indium-zinc oxide (IZO), tin oxide, fine particles of metal such as Au, conductive polymer, conductive Organic material, dopant (donor or acceptor) -containing functional layer, a mixture of a conductor and a conductive organic material (including a polymer), and a mixture of these conductive material and non-conductive material. It is not limited.
  • Non-conductive materials include acrylic resin, polyethylene, polypropylene, polyethylene terephthalate, polymethyl methacrylate, polystyrene, polyethersulfone, polyarylate, polycarbonate resin, polyurethane, polyacrylonitrile, polyvinyl acetal, polyamide, polyimide, diacrylphthalate. Resins, cellulosic resins, polyvinyl chloride, polyvinylidene chloride, polyvinyl acetate, other thermoplastic resins, and copolymers of two or more monomers constituting these resins, but are not limited to these Is not to be done. Moreover, in order to improve electroconductivity, you may perform doping using the following dopants. Examples of the dopant include, but are not limited to, sulfonic acid, Lewis acid, proton acid, alkali metal, alkaline earth metal, and the like.
  • the first electrode 27 is formed on one surface (second surface 212) of the support substrate 21.
  • Various formation methods can be adopted for the first electrode 27 according to the constituent material, and examples thereof include a non-wet process (dry process) and a wet process.
  • the non-wet process the first electrode 27 is formed without using a solvent, and examples thereof include a vacuum deposition method, a sputtering method, and a lamination method in which a metal thin film is thermocompression bonded.
  • the first electrode 27 is formed using a solvent.
  • a spin coating method, a casting method, a micro gravure coating method, a gravure coating method, a bar coating method, a roll coating method, a wire bar coating method examples thereof include a dip coating method, a spray coating method, a screen printing method, a flexographic printing method, an offset printing method, and an ink jet printing method. Since it is preferable that the first electrode 27 has less surface roughness (unevenness) than the second electrode 22, the first electrode 27 is preferably formed by a non-wet process that can form a smooth surface more easily than the wet process. .
  • the functional layer 26 is formed on one surface (second surface 272 opposite to the support substrate 21) of the first electrode 27 formed on the support substrate 21 (second surface 212).
  • Various formation methods can be adopted for the functional layer 26 depending on the constituent material, and examples thereof include the wet process described above.
  • the functional layer 26 can be sequentially formed in the order of the light emitting layer 25, the hole transport layer 24, and the hole injection layer 23 from the first electrode 27 side.
  • the second electrode 22 is formed on one surface (the second surface 262 opposite to the first electrode 27) of the functional layer 26 formed on the first electrode 27 on the support substrate 21.
  • the second electrode 22 can be formed by the above-described wet process, and in this case, a large-scale facility such as a vacuum deposition method is not required, and the cost can be reduced.
  • the second electrode When the second electrode is formed by a wet process, it is necessary to reduce the surface roughness on the second electrode in order to suppress a short circuit in the organic EL element having a configuration in which the functional layer is formed on the second electrode.
  • the second electrode portion defines a light emitting area, it is necessary to form a pattern in order to prevent a short circuit with the first electrode.
  • printing patterning methods such as bank formation after film formation, etching, screen printing and the like. Normally, bank formation and etching involve steps of resist coating, developing solution, and immersion in a resist stripping solution, and the second electrode formed by the wet process is easily damaged and may deteriorate the characteristics of the second electrode. The nature is very high.
  • the organic EL element supplies power to the functional layer 26 through the first electrode 27 and the second electrode 22, causes the light emitting layer 25 to emit light by the power supply, and emits the light from the second electrode 22 (second surface 222). It can be taken out from the support substrate 21 (first surface 211) via the first electrode 27.
  • FIG. 2 shows a second embodiment of the present invention.
  • one of the support substrate 21 and the first electrode 27 also serves as the other.
  • Other configurations are the same as those in FIG.
  • a process for forming only the first electrode 27 is also unnecessary, and the cost can be reduced.
  • a flexible metal is used for the support substrate 21.
  • the support substrate 21 is cheaper than the barrier film, has the same sealing performance, and can also serve as the first electrode 27, which can greatly reduce the cost.
  • the first electrode 27 is formed to also serve as the support substrate 21.
  • the first electrode 27 is not limited, but has a thickness (for example, ⁇ m order) larger than the thickness (for example, the nm order) of the first embodiment.
  • FIG. 3 shows a third embodiment of the present invention.
  • This organic EL element is the same as that shown in FIG. 1 except that the second electrode 22 is formed in a mesh shape.
  • the second electrode 22 can be formed of the above-described conductive material.
  • a metal material such as silver or copper or a conductive material such as carbon is formed on a thin wire, and a plurality of thin wires are formed. It can be formed by crossing appropriately in the vertical and horizontal directions.
  • the width of the thin wire can be about 1 to 100 ⁇ m, but is not limited thereto.
  • arbitrary things can be used also about the width space
  • the mesh-like second electrode 22 can be formed using a conductive paste by screen printing or the like, but is not limited thereto.
  • the shape of the mesh (opening) 30 of the mesh-like second electrode 22 in plan view can be set as appropriate.
  • the mesh-like second electrode 22 has a grid structure (lattice structure).
  • it can be formed in a square mesh 30 in plan view.
  • the mesh 30 can be formed in an arbitrary shape such as a triangle, a hexagon, or a circle in a plan view.
  • the second electrode 22 can easily take out light emitted from the light emitting layer 25 of the functional layer 26 through the mesh 30.
  • This organic EL element can reduce the resistivity and sheet resistance of the second electrode 22 as compared with the case where the second electrode 22 is a thin film formed of a conductive transparent oxide. It is possible to reduce luminance unevenness by reducing the resistance of the electrode 22.
  • FIG. 4 shows a fourth embodiment of the present invention.
  • one of the support substrate 21 and the first electrode 27 also serves as the other, as in the second embodiment.
  • Other configurations are the same as those in FIG.
  • Example 1 A support substrate was prepared, and a first electrode was formed on the support substrate (second surface) by a non-wet process (dry process).
  • a non-alkali glass plate No. 1737, manufactured by Corning
  • a first electrode cathode
  • Example 1 A support substrate was prepared, and a first electrode was formed on the support substrate (second surface) by a non-wet process (dry process).
  • a non-alkali glass plate No. 1737, manufactured by Corning
  • a first electrode cathode
  • Example 1 a red polymer (“Light Emitting Polymer ATS111RE” manufactured by American Dye Source Co.) was dissolved in THF solvent to 1 wt% (hereinafter referred to as “first solution”), and the first solution was prepared.
  • a light-emitting layer was formed by coating the first electrode (cathode) with a spin coater so as to have a film thickness of about 200 nm and baking it at 100 ° C. for 10 minutes.
  • TFB Poly [(9,9-dioctylfluorenyl-2,7-diyl) -co- (4,4 ′-(N- (4-sec-butylphenyl))) diphenyl amine)] (American Dye Source)
  • a solution (hereinafter referred to as “second solution”) prepared by dissolving “Hole Transport Polymer ADS259BE”) in THF solvent to 1 wt% is prepared, and the second solution is formed on the light emitting layer so that the film thickness is about 12 nm.
  • a TFB film was prepared by coating with a spin coater and baked at 200 ° C. for 10 minutes to form a hole transport layer.
  • PEDOT-PSS polyethylene dioxythiophene / polystyrene sulfonic acid
  • the third solution is prepared, and the third solution is applied onto the hole transport layer with a spin coater so that the film thickness of PEDOT-PSS is 30 nm, and is baked at 150 ° C. for 10 minutes. An injection layer was formed.
  • Example 2 ITO nanoparticle (particle size: about 40 nm, NanoTek (registered trademark) ITCW 15 wt% -G30 manufactured by CI Kasei Co., Ltd.) and methyl cellulose (METOLOSE (registered trademark) 60SH manufactured by Shin-Etsu Chemical Co., Ltd.) 5 wt% mixed (hereinafter referred to as “solution”). "Fourth solution”) is prepared, and the fourth solution is printed as an ink on a hole injection layer through a screen printer so that the film thickness is about 300 nm to form a pattern, which is dried at 120 ° C for 15 minutes. Thus, a second electrode (anode) was formed. As a result, an organic EL element having a layer structure as shown in FIG. 1 was obtained.
  • Example 2 A support substrate also serving as a first electrode was prepared, a functional layer was formed on the support substrate (second surface) by a wet process, and a second electrode was formed on the functional layer (second surface) by a wet process.
  • an aluminum foil about 30 ⁇ m thick
  • this support substrate was also used as the first electrode.
  • an organic EL element having a layer structure as shown in FIG. 2 was obtained in the same manner as in Example 1 except that the light emitting layer was formed on the smooth surface (second surface) side of the support substrate by the same method as in Example 1. It was.
  • Example 3 Highly conductive polyethylene dioxythiophene / polystyrene sulfonic acid (PEDOT-PSS) was applied on the hole injection layer to form a highly conductive polymer layer of about 200 nm. Further, using a silver paste material for printing on the surface, a mesh-like second electrode as shown in FIGS. 3A and 3B was formed by screen printing as an anode. The line width was about 40 ⁇ m, the pitch between line centers was about 1000 ⁇ m, and the mesh height was about 5 ⁇ m. Other than that was carried out similarly to Example 1, and obtained the organic EL element of a layer structure like FIG. 3A.
  • PEDOT-PSS polystyrene sulfonic acid
  • Example 4 Highly conductive polyethylene dioxythiophene / polystyrene sulfonic acid (PEDOT-PSS) was applied on the hole injection layer to form a highly conductive polymer layer of about 200 nm. Further, a silver paste material for printing was used on the surface, and a mesh-like second electrode as shown in FIG. 4 was formed by screen printing as an anode. The line width was about 40 ⁇ m, the pitch between line centers was about 1000 ⁇ m, and the mesh height was about 5 ⁇ m. Other than that was carried out similarly to Example 2, and obtained the organic EL element of a layer structure like FIG.
  • PEDOT-PSS polystyrene sulfonic acid
  • a non-alkali glass plate (No. 1737, manufactured by Corning) having a thickness of 0.7 mm was used as the support substrate.
  • Prepare a solution of ITO nanoparticles (particle diameter of about 40 nm, NanoTek (registered trademark) ITCW 15 wt% -G30 manufactured by C-I Kasei Co., Ltd.) and 5 wt% of methylcellulose (METOLOSE (registered trademark) 60SH manufactured by Shin-Etsu Chemical Co., Ltd.).
  • a pattern was formed by printing on a support substrate through a screen printer so that the film thickness was about 300 nm, and this was dried at 120 ° C. for 15 minutes to form a second electrode (anode).
  • PEDOT-PSS polyethylene dioxythiophene / polystyrene sulfonic acid
  • TFB Poly [(9,9-dioctylfluorenyl-2,7-diyl) -co- (4,4 ′-(N- (4-sec-butyphenyl))) diphenyl amine)] (manufactured by American Dye Source) “Hole Transport Polymer ADS259BE”) is prepared in a THF solvent so as to be 1 wt%, and the solution is applied onto the hole injection layer with a spin coater so that the film thickness is about 12 nm. The hole transport layer was formed by producing and baking this at 200 ° C. for 10 minutes.
  • a solution in which a red polymer (“Light Emitting Polymer ATS111RE” manufactured by American Dye Source Co., Ltd.) is dissolved to 1 wt% in a THF solvent is prepared, and the film thickness is about 200 nm on the hole transport layer.
  • the light emitting layer was formed by applying with a spin coater and baking it at 100 ° C. for 10 minutes.
  • an organic EL element was obtained by forming a first electrode (cathode) by depositing aluminum with a thickness of 80 nm on a support substrate by vacuum deposition.
  • Comparative Example 2 An organic EL device was obtained in the same manner as in Comparative Example 1 except that an aluminum foil (about 30 ⁇ m thick) was used as the support substrate and the light emitting layer was formed on the smooth surface side of the support substrate by the same method as in Comparative Example 1. . That is, in Comparative Example 1, the second electrode (anode), the hole injection layer, the hole transport layer, the light emitting layer, and the first electrode (cathode) are sequentially formed on the smooth surface of the support substrate. The second electrode (cathode), the light emitting layer, the hole transport layer, the hole injection layer, and the first electrode (anode) are sequentially formed on the smooth surface of the support substrate.
  • Example 1 (FIG. 1) -4 (FIG. 4) are the second surfaces (222) of the second electrodes (22), respectively, and the front surfaces of Comparative Examples 1 and 2 are the support substrates, respectively. It is the surface (the surface of the support substrate opposite to the second electrode).
  • the front luminance of Examples 1 to 4 is equivalent to that of Comparative Example 1, but the driving voltage of Comparative Example 1 is higher than that of Examples 1 to 4. Furthermore, light emission was not able to be confirmed about the comparative example 2 which formed the laminated structure in order on the metal foil. Therefore, a functional layer (organic layer) is formed on a light-transmitting anode (second electrode) formed by a wet process by using a layered structure reverse to the normal element formation order as shown in FIG.

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Abstract

L'invention concerne un procédé de fabrication d'éléments électroluminescents organiques qui comprend une étape de formation, par colaminage, d'une couche fonctionnelle (26) sur une première électrode (27), ladite couche fonctionnelle comprenant au moins une couche électroluminescente (25), puis une étape de formation, par colaminage, d'une seconde électrode (22) sur la couche fonctionnelle (26). Le procédé prévoit la formation de la seconde électrode (22) par un procédé humide et la seconde électrode (22) présente des caractéristiques de transmission lumineuse.
PCT/JP2012/062635 2011-05-30 2012-05-17 Élément électroluminescent organique et son procédé de fabrication WO2012165159A1 (fr)

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JP2011120087A JP2014149917A (ja) 2011-05-30 2011-05-30 有機エレクトロルミネッセンス素子及びその製造方法
JP2011-120087 2011-05-30

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11224782A (ja) * 1998-02-06 1999-08-17 Kawaguchiko Seimitsu Kk エレクトロルミネッセンス
JP2002352962A (ja) * 2001-05-28 2002-12-06 Matsushita Electric Ind Co Ltd 有機発光素子およびその製造方法、有機発光表示装置および照明装置
JP2006216561A (ja) * 2005-02-05 2006-08-17 Samsung Sdi Co Ltd 有機電界発光素子及び白色発光素子
JP2006286542A (ja) * 2005-04-04 2006-10-19 Ehc:Kk 有機エレクトロルミネッセンス素子の陰極用の材料、有機エレクトロルミネッセンス素子、および、その製造方法
JP2009152113A (ja) * 2007-12-21 2009-07-09 Rohm Co Ltd 有機ｅｌ素子
JP2009301965A (ja) * 2008-06-17 2009-12-24 Hitachi Ltd 有機発光装置
JP2011003442A (ja) * 2009-06-19 2011-01-06 Saitama Univ 有機薄膜素子の製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11224782A (ja) * 1998-02-06 1999-08-17 Kawaguchiko Seimitsu Kk エレクトロルミネッセンス
JP2002352962A (ja) * 2001-05-28 2002-12-06 Matsushita Electric Ind Co Ltd 有機発光素子およびその製造方法、有機発光表示装置および照明装置
JP2006216561A (ja) * 2005-02-05 2006-08-17 Samsung Sdi Co Ltd 有機電界発光素子及び白色発光素子
JP2006286542A (ja) * 2005-04-04 2006-10-19 Ehc:Kk 有機エレクトロルミネッセンス素子の陰極用の材料、有機エレクトロルミネッセンス素子、および、その製造方法
JP2009152113A (ja) * 2007-12-21 2009-07-09 Rohm Co Ltd 有機ｅｌ素子
JP2009301965A (ja) * 2008-06-17 2009-12-24 Hitachi Ltd 有機発光装置
JP2011003442A (ja) * 2009-06-19 2011-01-06 Saitama Univ 有機薄膜素子の製造方法

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