WO2012156217A1 - Mischlichtquelle - Google Patents
Mischlichtquelle Download PDFInfo
- Publication number
- WO2012156217A1 WO2012156217A1 PCT/EP2012/058302 EP2012058302W WO2012156217A1 WO 2012156217 A1 WO2012156217 A1 WO 2012156217A1 EP 2012058302 W EP2012058302 W EP 2012058302W WO 2012156217 A1 WO2012156217 A1 WO 2012156217A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- heat sink
- light source
- mixed light
- source according
- semiconductor device
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 108
- 230000005855 radiation Effects 0.000 claims abstract description 51
- 239000000463 material Substances 0.000 claims description 32
- 150000001875 compounds Chemical class 0.000 claims description 16
- 230000004907 flux Effects 0.000 claims description 15
- 230000006978 adaptation Effects 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 5
- 238000004088 simulation Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 239000000470 constituent Substances 0.000 description 3
- 239000012790 adhesive layer Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- 229910052738 indium Inorganic materials 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910021478 group 5 element Inorganic materials 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- -1 nitride compound Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000001052 transient effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
- F21K9/00—Light sources using semiconductor devices as light-generating elements, e.g. using light-emitting diodes [LED] or lasers
- F21K9/60—Optical arrangements integrated in the light source, e.g. for improving the colour rendering index or the light extraction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/04—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
- H01L25/075—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00
- H01L25/0753—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L33/00 the devices being arranged next to each other
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/64—Heat extraction or cooling elements
- H01L33/641—Heat extraction or cooling elements characterized by the materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/2612—Auxiliary members for layer connectors, e.g. spacers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/64—Heat extraction or cooling elements
- H01L33/645—Heat extraction or cooling elements the elements being electrically controlled, e.g. Peltier elements
Definitions
- the present patent application relates to a
- mixed light sources with semiconductor devices can be used for the generation of radiation in different
- Temperature dependence of the emitted radiation power for various semiconductor devices may result in a shift of the color location of the total of the mixed light source
- One object is to specify a mixed light source in which a dependence of the color locus, in particular with regard to a temperature change of the semiconductor components, is reduced in a simple manner.
- a mixed light source comprises a first semiconductor component which is provided for generating a first radiation component and a second semiconductor component which is suitable for generating radiation of a second one different from the first radiation component Radiation component is provided on.
- the first semiconductor device is by means of a first
- Semiconductor device is by means of a second
- the thermal resistances R1 and R2 are different from each other.
- the second thermal resistance R2 is at least 20% greater than the first thermal resistance Rl.
- the temperature of the attachment points is adapted to each other so that one by different
- the luminous flux ⁇ of a semiconductor component produced during operation decreases linearly with a temperature coefficient K as the temperature increases.
- the temperature of an attachment point T B s is typically a value ⁇ above an ambient temperature T 0 .
- This temperature difference is calculated from the product of the heat resistance R of the heat sink with the power loss P of
- Radiation component in operation a luminous flux ⁇ 1, depending on the temperature of the first
- the second radiation component has a luminous flux ⁇ 2, which depends on the
- Temperature of the second attachment point with a second temperature coefficient K2 changes.
- the semiconductor device having the larger temperature coefficient is disposed on the heat sink with the smaller heat resistance.
- first heat sink and the second heat sink are thermally decoupled from each other.
- Thermally decoupled means in this context
- the first heat sink can have a different temperature in the region of the first attachment point than the second heat sink in the region of the second during operation of the mixed light source
- Heatsinks can be mechanically connected to each other stably, but are not adjacent to each other expediently.
- the insulating layer preferably adjoins the first
- the insulating layer is formed so that the first heat sink and the second heat sink at any point directly adjacent to each other.
- Insulation layer is further preferably made of a material that is at least 10 times lower
- Thermal conductivity has as the first heat sink.
- the insulating layer has a
- the first heat sink and the second heat sink overlap in a top view onto the mixed light source. Compared to next to each other
- arranged heat sinks can be so in relation to the
- the first one is based
- the first semiconductor device is preferably based on a phosphidic compound semiconductor material.
- based on phosphide compound semiconductors means that a semiconductor body of the
- Semiconductor device in particular an intended for the generation of radiation active region, preferably
- composition according to the above formula may contain one or more dopants as well as additional
- the above formula includes only the essential constituents of the crystal lattice (Al, Ga, In, P), even though these may be partially replaced by small amounts of other substances.
- the second semiconductor component is furthermore preferably based on a nitridic compound semiconductor material.
- nitride compound semiconductors in the present context means that a semiconductor body of the semiconductor component, in particular an active region provided for generating radiation, is a nitride III / V compound semiconductor material, preferably
- this material need not necessarily have a mathematically exact composition according to the above formula. Much more it may have one or more dopants as well as additional constituents which are the characteristic ones
- the above formula contains only the essential constituents of the crystal lattice (Al, Ga, In, N), even if these may be partially replaced by small amounts of other substances.
- the different temperature coefficients in these semiconductor material systems can be achieved by different
- the first heat sink differs from the second heat sink in the geometric shape.
- the geometric shape here includes in particular the size of the heat sink.
- the first heat sink may have a different emissivity from the second heat sink.
- Coating be formed on the heat sink.
- the first heat sink is an active heat sink and the second heat sink is a passive heat sink.
- the active heat sink can be cooled, for example, via a cooling medium or via a fan.
- the first heat sink has a first thermal capacity Cl and the second Heat sink to a second thermal capacitance C2, wherein the relationship applies:
- Rl * Cl / (R2 * C2) B, where for the coefficient B 0.5 - £ B - £ 2, preferably
- Heatsink a plurality of first semiconductor devices and arranged on the second heat sink, a plurality of second semiconductor devices.
- an intermediate carrier is preferably arranged, for example a printed circuit board, such as a printed circuit board (PCB) or a metal core printed circuit board ( Metal Core Printed Circuit Board, MCPCB) or a ceramic carrier with electrical leads for the
- Figure 1 shows a first embodiment of a
- Figure 2 shows a second embodiment of a
- Figure 3 shows a third embodiment of a
- a mixed light source 1 according to the first exemplary embodiment shown in FIG. 1 has a first heat sink 31 with a first main surface 310.
- the first main surface has a first heat sink on the first heat sink
- Semiconductor device 21 arranged with an intended for the generation of radiation active region 210.
- the active region 210 is provided for generating a first radiation component.
- Semiconductor component is by means of a fastening layer 71, for example, a solder or an electrically conductive adhesive layer, attached to a first intermediate carrier 51.
- the intermediate carrier can be used, for example, as a printed circuit board, such as a PCB circuit board or a
- Metal core circuit board be formed. Also a
- Ceramic carrier with electrical connection conductor can be used.
- the first semiconductor component 21 with the intermediate carrier 51 is fastened to the first heat sink 31 by means of a first connection point 61.
- the first connection point directly adjoins the first heat sink.
- Junction can be formed for example by a solder layer or an electrically conductive adhesive layer.
- the active area 210 may be, for example, on a
- the first semiconductor component 21 can be used, for example, for generating radiation in the red spectral range, in particular for
- the mixed light source 1 comprises a second
- Heatsink 32 with a second major surface 320. As in the
- a second semiconductor component 22 having an active region 220 provided for generating radiation of a second radiation component is arranged on the second heat sink 32.
- the second semiconductor device 22 is connected via a second attachment layer 72 with a second Intermediate carrier 52 connected.
- the second semiconductor component with the second intermediate carrier is connected to the second heat sink 32 by means of a second connection point 62.
- the intermediate carriers 51, 52 may be the same or different with respect to the material used.
- the second semiconductor device 22 is based on one different from the first semiconductor device
- Compound semiconductor material system for example, the second semiconductor device 22, in particular the active
- Compound semiconductor material is particularly suitable for the generation of radiation in the blue and ultraviolet spectral range.
- the second semiconductor component 22 may itself be provided for generating mixed radiation.
- a conversion element 225 can be formed on the second semiconductor component 22, which at least partially absorbs the primary radiation generated in the active region 220 and into a secondary radiation
- the primary radiation and the secondary radiation in the CIE diagram have a value between 0.2 and 0.45 inclusive and for C y between 0.1 and 0.61 inclusive.
- the first heat sink 31 and the second heat sink 32 are thermally decoupled from each other in this embodiment by means of an insulating layer 4.
- Factor 10 is smaller than a thermal conductivity of the first heat sink 31.
- a material with a thermal conductivity of at most 1 W / (m * K) is suitable.
- Insulation layer 4 may for example contain a plastic or consist of a plastic.
- the first heat sink 31 has a first heat resistance Rl, which is smaller than a heat resistance R2 of the second heat sink 32.
- the thermal resistance determines the
- a lower heat resistance compared to the second heat sink 32 is achieved for the first heat sink 31 by a larger version of the first heat sink.
- the second heat sink 32 is formed as a passive heat sink.
- the thermal resistances Rl and R2 are designed such that the relationship
- semiconductor devices have, wherein the first heat sink 31 expediently free of second semiconductor devices 22 and the second heat sink 32 free of the first
- the Mixed light source also more than two heat sinks
- the heat sinks 31, 32 may each be a metal
- Thermal conductivity of the material for the heat sink is preferably at least 40 W / (m * K), more preferably at least 100 W / (m * K). Also a ceramic can for the
- Heat sink 31, 32 find application.
- the semiconductor device with the greater temperature dependence is attached to the heat sink, which adjusts the smaller temperature at the attachment point during operation.
- the thermal RC constants ie the product of thermal resistance and thermal capacity of Heat sink matched to each other.
- R1 * C1 / (R2 * C2) B with 0.5 ⁇ B ⁇ 2.
- Temperature change ⁇ as a function of the temperature t during the switch-on process of the mixed light source is shown in FIG. The simulation calculations are
- a curve 81 shows the temperature increase ⁇ 1 at the first connection point 61.
- a curve 82 shows a temperature increase ⁇ 2 at the second connection point 62.
- FIG. 91 shows simulation results for a temperature rise in the case of a mixed light source in which the first semiconductor device 21 and the second one
- Semiconductor component 22 are arranged on a common heat sink.
- a curve 85 shows the luminous flux ⁇ of the first
- the luminous flux ⁇ is for each of the curves on the
- Luminous flux normalized immediately after switching on.
- FIG. 2 A second embodiment of a mixed light source is shown in Figure 2 in a schematic sectional view.
- a coating 35 is formed on the first heat sink 31.
- the Coating 35 is intended to increase the emissivity of the first heat sink, thereby reducing the temperature at the first junction 61.
- the coating preferably has an emissivity of at least 0.8, more preferably of at least 0.9.
- the emissivity of a polished metal is typically about 0.3 and the
- Emissivity of a rough metal has an emissivity of 0.5 to 0.6. Even with the same size and the same material for the heat sink 31, 32 so the thermal resistance of the first heat sink compared to the second heat sink can be greatly reduced by applying the coating,
- thermal resistance are combined with each other, for example, different sized heat sink, the
- a third exemplary embodiment of a mixed light source is shown schematically in a perspective view in FIG.
- This third embodiment substantially corresponds to the first embodiment described in connection with FIG.
- the first heat sink 31 and the second heat sink 32 are formed so that they overlap in a plan view of the mixed light source, ie with a view to the first main surface 310 of the first heat sink 31.
- the first heat sink 31 has a lower part 31A and an upper part 31B connected to the lower part.
- the first heat sink may be integrally formed with the lower part and the upper part.
- the upper part 31B has a smaller one in plan view
- the lower part and the upper part are each formed with a cylindrical basic shape, wherein the axes of the cylinder are collinear.
- Heatsink 32 is annular and surrounds the upper part 31B of the first heat sink 31 in the lateral direction.
- An insulating layer 4 is formed continuously between the first heat sink 31 and the second heat sink 32, so that the heat sinks 31, 32 are not directly adjacent to one another at any point.
- the heatsinks 31, 32 are thus thermally decoupled from each other by means of the insulating layer and further mechanically connected to one another via the insulating layer.
- the lower part 31A and the upper part 31B of the first heat sink 31 may also be one of
- first heat sink 31 may also be formed so that the upper part 31B the second
- Heatsink 32 partially circumscribes, that is, the upper part 31 B may be annular, for example, cylindrical
- Radiation power in the lateral direction has a high color homogeneity.
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- General Engineering & Computer Science (AREA)
- Led Device Packages (AREA)
- Semiconductor Lasers (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/117,294 US9200762B2 (en) | 2011-05-16 | 2012-05-04 | Mixed light source |
KR1020137030125A KR101900987B1 (ko) | 2011-05-16 | 2012-05-04 | 혼합 광원 |
CN201280023937.XA CN103548137B (zh) | 2011-05-16 | 2012-05-04 | 混合光源 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102011101645.0 | 2011-05-16 | ||
DE102011101645A DE102011101645A1 (de) | 2011-05-16 | 2011-05-16 | Mischlichtquelle |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2012156217A1 true WO2012156217A1 (de) | 2012-11-22 |
Family
ID=46044700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2012/058302 WO2012156217A1 (de) | 2011-05-16 | 2012-05-04 | Mischlichtquelle |
Country Status (5)
Country | Link |
---|---|
US (1) | US9200762B2 (de) |
KR (1) | KR101900987B1 (de) |
CN (1) | CN103548137B (de) |
DE (1) | DE102011101645A1 (de) |
WO (1) | WO2012156217A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150198323A1 (en) * | 2014-01-10 | 2015-07-16 | Epistar Corporation | Light-emitting device |
JP6596845B2 (ja) * | 2015-03-06 | 2019-10-30 | 株式会社リコー | 温度制御装置、画像表示装置、車両 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060261351A1 (en) * | 2005-04-08 | 2006-11-23 | Norio Nakazato | Semiconductor light source device |
US20070147044A1 (en) * | 2005-12-27 | 2007-06-28 | Samsung Electronics Co., Ltd. | Light emitting device module |
US20090059582A1 (en) * | 2007-08-29 | 2009-03-05 | Texas Instruments Incorporated | Heat Sinks for Cooling LEDS in Projectors |
EP2072886A2 (de) * | 2007-12-21 | 2009-06-24 | Foxsemicon Integrated Technology, Inc. | Lichtemittierende Diodenlampe |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004038759A2 (en) * | 2002-08-23 | 2004-05-06 | Dahm Jonathan S | Method and apparatus for using light emitting diodes |
JP5038623B2 (ja) * | 2005-12-27 | 2012-10-03 | 株式会社東芝 | 光半導体装置およびその製造方法 |
US7964892B2 (en) * | 2006-12-01 | 2011-06-21 | Nichia Corporation | Light emitting device |
US20080150126A1 (en) * | 2006-12-22 | 2008-06-26 | Zhi-Yong Zhou | Light emitting diode module with heat dissipation device |
DE102007030129A1 (de) * | 2007-06-29 | 2009-01-02 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung einer Mehrzahl optoelektronischer Bauelemente und optoelektronisches Bauelement |
US7744250B2 (en) * | 2007-07-12 | 2010-06-29 | Fu Zhun Precision Industry (Shen Zhen) Co., Ltd. | LED lamp with a heat dissipation device |
US8556448B2 (en) * | 2007-12-19 | 2013-10-15 | Osram Gesellschaft Mit Beschraenkter Haftung | Airfield lighting device |
CN101463986B (zh) * | 2007-12-21 | 2011-01-05 | 富士迈半导体精密工业(上海)有限公司 | 发光二极管灯具 |
WO2009148447A1 (en) * | 2008-06-05 | 2009-12-10 | Relume Corporation | Sectionally covered light emitting assembly |
-
2011
- 2011-05-16 DE DE102011101645A patent/DE102011101645A1/de not_active Withdrawn
-
2012
- 2012-05-04 US US14/117,294 patent/US9200762B2/en not_active Expired - Fee Related
- 2012-05-04 KR KR1020137030125A patent/KR101900987B1/ko active IP Right Grant
- 2012-05-04 CN CN201280023937.XA patent/CN103548137B/zh not_active Expired - Fee Related
- 2012-05-04 WO PCT/EP2012/058302 patent/WO2012156217A1/de active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20060261351A1 (en) * | 2005-04-08 | 2006-11-23 | Norio Nakazato | Semiconductor light source device |
US20070147044A1 (en) * | 2005-12-27 | 2007-06-28 | Samsung Electronics Co., Ltd. | Light emitting device module |
US20090059582A1 (en) * | 2007-08-29 | 2009-03-05 | Texas Instruments Incorporated | Heat Sinks for Cooling LEDS in Projectors |
EP2072886A2 (de) * | 2007-12-21 | 2009-06-24 | Foxsemicon Integrated Technology, Inc. | Lichtemittierende Diodenlampe |
Also Published As
Publication number | Publication date |
---|---|
KR20140027994A (ko) | 2014-03-07 |
US20140226324A1 (en) | 2014-08-14 |
DE102011101645A1 (de) | 2012-11-22 |
CN103548137A (zh) | 2014-01-29 |
US9200762B2 (en) | 2015-12-01 |
KR101900987B1 (ko) | 2018-09-20 |
CN103548137B (zh) | 2016-06-01 |
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