WO2012148071A2 - Adhesive film for an organic el device, composition included therein, and organic el display device including same - Google Patents

Adhesive film for an organic el device, composition included therein, and organic el display device including same Download PDF

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Publication number
WO2012148071A2
WO2012148071A2 PCT/KR2012/000305 KR2012000305W WO2012148071A2 WO 2012148071 A2 WO2012148071 A2 WO 2012148071A2 KR 2012000305 W KR2012000305 W KR 2012000305W WO 2012148071 A2 WO2012148071 A2 WO 2012148071A2
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WO
WIPO (PCT)
Prior art keywords
organic
film
substrate
weight
display device
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PCT/KR2012/000305
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French (fr)
Korean (ko)
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WO2012148071A3 (en
Inventor
이지연
김미선
이길성
조민행
Original Assignee
제일모직 주식회사
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Priority claimed from KR1020110039178A external-priority patent/KR101374370B1/en
Priority claimed from KR1020110039180A external-priority patent/KR101397692B1/en
Application filed by 제일모직 주식회사 filed Critical 제일모직 주식회사
Publication of WO2012148071A2 publication Critical patent/WO2012148071A2/en
Publication of WO2012148071A3 publication Critical patent/WO2012148071A3/en

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80Constructional details
    • H10K59/87Passivation; Containers; Encapsulations
    • H10K59/871Self-supporting sealing arrangements
    • H10K59/8722Peripheral sealing arrangements, e.g. adhesives, sealants

Definitions

  • the present invention relates to an adhesive film for an organic EL device, a composition contained therein, and an organic EL display device including the same.
  • An organic EL element is a polycrystalline semiconductor device, is used in backlights of liquid crystals and the like to obtain high luminance light emission at low voltage, and is expected to be a thin flat display device.
  • the organic EL element is extremely weak in moisture, the interface between the metal electric field and the organic EL layer may be peeled off due to the influence of moisture, the metal may be oxidized and become highly resistant, and the organic material itself may be deteriorated by moisture. Therefore, there is a problem that light is not emitted and luminance is lowered.
  • the conventional method of encapsulating the organic EL device has a limitation in suppressing the occurrence and growth of dark spots, it cannot have sufficient adhesive force, and it cannot fully satisfy all the requirements for encapsulation of the organic EL device.
  • the organic EL device has a disadvantage in that it is very sensitive to moisture and easily decomposes, causing chemical reaction with moisture.
  • the curable composition used for the sealing application of the existing organic EL device has a limit in lowering the water transmittance.
  • thermosetting process during the encapsulation process of the organic EL element. Therefore, when the thermal expansion coefficient of the sealing composition is large, the adhesive layer may bend or peeling may occur between the organic EL element and the substrate.
  • An object of the present invention is to provide an adhesive film for an organic EL device comprising an adhesive layer having a low thermal expansion rate, a composition included therein, and an organic EL display device including the same.
  • Another object of the present invention is to provide an adhesive film for an organic EL device comprising an adhesive layer having a low water transmittance, a composition included therein, and an organic EL display device including the same.
  • An adhesive film for an organic EL device which is an aspect of the present invention, includes an adsorbent and may be cured at 90 ° C. for 2 hours, and then have a moisture transmittance of about 100 g / m 2 ⁇ day or less at 50 ° C. and 100% relative humidity. .
  • the adsorbent may be included in about 0.5-40% by weight based on solids in the adhesive film.
  • the adsorbent may include one or more selected from the group consisting of zeolite, calcium oxide, molecular sieve, activated carbon, silica gel and the like.
  • the adhesive film may further include an epoxy resin, a film former resin, and a curing agent having a weight average molecular weight of about 50-10,000 g / mol.
  • the film former resin may be included in an amount of about 50-240 parts by weight based on 100 parts by weight of an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol.
  • the adhesive film may further include one or more selected from the group consisting of a silane coupling agent, a filler, a leveling agent, an antifoaming agent, a storage stabilizer, a plasticizer and a talc adjusting agent.
  • Another aspect of the present invention is an organic EL display device comprising: a first substrate having an organic EL element formed on one surface thereof; A second substrate spaced apart from the first substrate; And a substrate disposed between the first substrate and the second substrate to bond the first substrate and the second substrate, the cured at 90 ° C. for 2 hours, and then the water transmittance at about 50 ° C. and 100% relative humidity of about 100 g / It may include an adhesive layer that is m 2 ⁇ day or less.
  • Another aspect of the present invention is an organic EL display device comprising: a first substrate having an organic EL element formed on one surface thereof; A second substrate spaced apart from the first substrate; And an adhesive layer disposed between the first substrate and the second substrate to bond the first substrate and the second substrate and having a thermal expansion rate of about 0 ° C. to 100 ° C. of about 100 ppm / ° C. or less.
  • the adhesive layer may be cured for 2 hours at 90 °C and the water transmittance at about 50 °C and 100% relative humidity may be about 100g / m 2 ⁇ day or less.
  • the adhesive layer may include a plate-shaped filler.
  • the adhesive layer may further include an epoxy resin, a film former resin, and a curing agent having a weight average molecular weight of about 50-10,000 g / mol.
  • the adhesive layer may further include a silane coupling agent.
  • the adhesive composition for encapsulating an organic EL device includes (A) a plate-shaped filler, (B) an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, (C) a film-forming resin, and (D) It may include a curing agent.
  • the present invention provides an adhesive film for an organic EL device comprising an adhesive layer having a low water transmittance.
  • This invention provided the adhesive film for organic electroluminescent elements containing the adhesive layer in the state of a favorable coating film, and the adhesive force is high and usability is high.
  • the present invention provides an organic EL display device comprising an adhesive layer composed of the adhesive film for organic EL elements.
  • the present invention provides an organic EL display device including an adhesive layer having a low thermal expansion rate and a low water transmittance.
  • the present invention provides an organic EL display device having an adhesive layer having a good coating film state and having good adhesion and high usability.
  • FIG. 1 shows an organic EL display device according to an embodiment of the present invention.
  • One aspect of the present invention relates to an adhesive film for an organic EL device.
  • the film of the present invention may be cured at 90 ° C. for 2 hours, and then the water transmittance in the film thickness direction may be about 100 g / m 2 ⁇ day or less at 50 ° C. and 100% relative humidity. Within this range, the water barrier effect is high, and peeling of the glass or film substrate on which the organic EL element is formed and the organic EL element can be prevented.
  • Moisture permeability may preferably be greater than about 0 up to 100 g / m 2 ⁇ day at 50 ° C. and 100% relative humidity, more preferably greater than about 50 g / m 2 ⁇ day up to 50 ° C. and 100% relative humidity. have.
  • Moisture permeability can be measured with a film having a thickness of 20-30 ⁇ m.
  • the composition constituting the adhesive film is filmed to the thickness and cured at 90 ° C. for 2 hours, and then measured by MOCON test using carrier gas as nitrogen gas under 50 ° C., 100% relative humidity, and 760 mmHg pressure. This is not restrictive.
  • the adhesive film may have a thickness of about 20 ⁇ m-30 ⁇ m.
  • the adhesive film may include an adsorbent.
  • the adsorbent can block the contact between the organic EL element and water by providing hygroscopicity by physical adsorption.
  • the adsorbent preferably uses particles that are porous such that the surface area adsorbed per unit volume or unit weight is wide to provide effective hygroscopicity.
  • the adsorbent preferably has an average pore size of about 1 nm-20 nm.
  • the adsorbent preferably has a particle size (D50) of about 50 nm-5 ⁇ m. Within this range, the hygroscopic effect is good and the film formability does not deteriorate.
  • the adhesive film may comprise an adsorbent having two or more particle sizes.
  • the adsorbent may include one or more selected from the group consisting of zeolite, calcium oxide, molecular sieve, activated carbon, silica gel and the like, but is not limited thereto.
  • the adsorbent may be included in about 0.5-40% by weight of the adhesive film on a solids basis. Within this range, the hygroscopic effect is good and the film formability does not deteriorate. Preferably about 4-20% by weight.
  • the adsorbent may be included in an amount of about 10-150 parts by weight based on 100 parts by weight of an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol described below. Within this range, the hygroscopic effect may be good and the film formability does not deteriorate and the adhesive force may have a high effect. Preferably about 15-50 parts by weight.
  • the adhesive film may further include, in addition to the adsorbent, an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, a film former resin, and a curing agent.
  • the epoxy resin may have a weight average molecular weight of about 50-10,000 g / mol. Within this range, the adhesion of the film may be enhanced and the coating properties may be imparted.
  • the weight average molecular weight may preferably be about 100-5,000 g / mol, more preferably about 200-4,000 g / mol.
  • the epoxy resin preferably has about 700 ppm or less of hydrolyzable chlorine ions. Within this range, there may be an effect that does not damage the device in the acceleration reliability test for long-term reliability evaluation.
  • the chlorine ion may preferably be about 0-500 ppm, more preferably about 0-300 ppm.
  • the epoxy resin is a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a hydrogenated bisphenol type epoxy resin, a cycloaliphatic epoxy resin, a naphthalene type epoxy resin, a phenol novolak type epoxy resin, an o-cresol novolak type epoxy It may include, but is not limited to, one or more selected from the group consisting of resins, disclopentadiene type epoxy resins, biphenyl type epoxy resins, biphenyl novolak type epoxy resins, and naphthalene novolak type epoxy resins. .
  • the epoxy resin may be included in about 20-80% by weight based on the solids of the adhesive layer. Within this range, coating film properties and film formability may be good. Preferably about 20-75% by weight, more preferably about 25-70% by weight, most preferably about 27-59% by weight.
  • the film-forming resin may be an aromatic resin including an epoxy resin having a weight average molecular weight of about 10,000-500,000 g / mol, a (meth) acrylate resin, a urethane (meth) acrylate resin, a polyimide, a styrene resin, And it may include one or more selected from the group consisting of rubber, including diene-based, silicone-based, urethane-based, fluorine-based rubber and the like.
  • the film former resin may be an epoxy resin having a weight average molecular weight of about 10,000-500,000 g / mol.
  • the epoxy resin has an effect of imparting adhesion and coating properties of the film with a room temperature tack within the weight average molecular weight range. Preferably about 70,000-500,000 g / mol.
  • the epoxy resin having a weight average molecular weight of about 10,000-500,000 g / mol may include a resin having a bisphenol A type or a bisphenol F type epoxy skeleton.
  • a resin having a bisphenol A type or a bisphenol F type epoxy skeleton may include, but is not limited to, one or more selected from the group consisting of a solid bisphenol A epoxy resin, a solid bisphenol F epoxy resin, and a phenoxy resin.
  • the film former resin may be included in about 10-70% by weight based on the solids of the adhesive layer. Within this range, the film formability may be good and the reliability may be good. Preferably about 20-70% by weight, more preferably about 25-70% by weight, most preferably about 25-67% by weight.
  • the film former resin may include about 40-240 parts by weight based on 100 parts by weight of the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol. Within this range, the film formability may be good and the reliability may be good. Preferably about 50-240 parts by weight, more preferably about 100-150 parts by weight.
  • the curing agent may include an imidazole series curing agent.
  • the imidazole series curing agent may include an imidazole compound having at least one functional group selected from the group consisting of a phenyl group, 10 or more carbon atoms, preferably 10-20 alkenes, and a cyan group.
  • the imidazole-based curing agent may enable the curing of the film coating film stability, room temperature compatibility and low temperature, especially at a temperature of 90 ° C or less.
  • the curing agent may include an imidazole curing agent having a reaction initiation temperature of about 60-100 ° C. and an imidazole curing agent having a reaction initiation temperature of about 100-160 ° C.
  • the 'reaction start temperature' means a temperature at which the imidazole curing agent reacts with the epoxy resin to start curing.
  • an imidazole curing agent having a reaction initiation temperature of about 70-98 ° C. and an imidazole curing agent having a reaction initiation temperature of about 105-140 ° C. may be included.
  • Two or more kinds of imidazole curing agents having a reaction initiation temperature of about 60-100 ° C. may be included.
  • two or more kinds of imidazole curing agents having the reaction initiation temperature of about 100-160 ° C may be included.
  • the imidazole curing agent having a reaction initiation temperature of about 60-100 ° C. and the imidazole curing agent having a reaction initiation temperature of about 100-160 ° C. are a phenyl group, a benzyl group, one or more carbons, for example, one to twenty carbon alkanes. It may have a cyano group or an amine group.
  • Examples of the imidazole curing agent having a reaction start temperature of about 60-100 ° C. include 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1 -Benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecyl Imidazole, 2-phenylimidazoline, and the like, but are not limited to these.
  • imidazole curing agents having a reaction initiation temperature of about 100-160 ° C. examples include 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium-trimelitate, 2,4- Diamino-6 [2'-undecylimidazolyl- (1 ')]-ethyl-s-triazine, 2,4-diamino-6- [2'-ethyl-4'-methylimidazolyl- (1 ')]-ethyl-s-triazine, 1-cyanoethyl-2-phenylimidazolium-trimelitate, 2-phenylimidazole isocyanuric acid adduct, 1-benzyl-2- Phenylimidazole hydrobromide and the like, but are not limited thereto.
  • the curing agent may be included in about 0.1-10% by weight based on the solids of the adhesive film. Within this range, the film formability may be good and the reliability may be good. Preferably about 1-10% by weight, more preferably about 1-5% by weight.
  • the curing agent is about 0.1-20 parts by weight, preferably about 0.5-10 parts by weight, more preferably about 1-7 parts by weight of 100 parts by weight of the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol. It may be included in parts by weight.
  • the adhesive layer may further include one or more selected from the group consisting of a silane coupling agent and a filler.
  • the silane coupling agent and the filler may increase the properties and reliability of the film coating film.
  • the silane coupling agent may use a conventional coupling agent.
  • a conventional coupling agent For example, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltri Methoxysilane, N-phenyl- ⁇ -aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-mercaptopropyl Selected from the group consisting of trimethoxysilane, vinyltrimethoxysilane, N-2- (vinylbenzylamino) ethyl) -3-aminopropyltrimethoxysilane hydrochloride and 3- (meth) acryloxypropyl
  • the filler may be a conventional filler.
  • one or more selected from the group consisting of aluminum oxide, aluminum silicate, talc and plate silicates may be used, but is not limited thereto.
  • the filler may be included in about 1-150 parts by weight, preferably about 10-100 parts by weight, based on 100 parts by weight of the film-forming resin, based on solids.
  • the adhesive layer may further include one or more additives.
  • the additive can improve the leveling and coating properties on the surface.
  • the additive may be used, for example, but not limited to one or more selected from the group consisting of a leveling agent, an antifoaming agent, a storage stabilizer, a plasticizer and a talc adjusting agent.
  • the adhesive film can be produced by drying and laminating an adhesive composition for sealing an organic EL device described below. Drying and laminating methods are not particularly limited but may include a method of drying at about 20-80 ° C. to about 0.2 m / s-1.5 m / s.
  • the adhesive film may have a thickness of about 1-100 ⁇ m, more preferably about 10-50 ⁇ m. Within this range, the organic EL device and the sealing film can be adhered well.
  • Another aspect of the present invention relates to a resin composition for sealing an organic EL device.
  • composition is present in the form of a film exhibiting non-fluidity at 25 °C and when heated to 50-100 °C to express the fluidity and adhesiveness between the organic EL element formed on the glass or film substrate and the sealing glass or film substrate between can do.
  • an organic EL device consisting of a transparent electrode, a hole transport layer, an organic EL layer and a back electrode on a glass or film substrate, heat transfer the composition of the present invention thereon, and heat-transfer the non-permeable glass or film to bond and encapsulate it.
  • the composition of the present invention may be thermally transferred to a water-impermeable glass or film, and bonded and sealed while heating to a glass or film on which an organic EL element is formed.
  • a transparent electrode is formed to a thickness of about 0.1 mu m on a glass or film substrate.
  • a transparent electrode there is a method by vacuum deposition and sputtering.
  • a hole transporting layer and an organic EL layer are sequentially formed on the transparent electrode at a thickness of about 0.05 ⁇ m, respectively, and a back electrode is formed on the organic EL layer at a thickness of about 0.1-0.3 ⁇ m.
  • the composition of the present invention is transferred to a laminate or the like on top of the glass or film substrate which has finished film formation of the device. At this time, when the composition of the present invention is transferred to a release film to form a sheet can be easily transferred.
  • thermosetting resin is completely cured at a curing temperature, for example, about 90 ° C. or less. It is also possible to transfer the composition of the present invention to the above impervious glass or film substrate first and to polymerize the element substrate on which the organic EL layer is formed.
  • composition of the present invention may have a shelf life of at least about 7 days at about 25 °C.
  • the film or cured product layer prepared from the composition of the present invention preferably has a thickness of about 1-100 ⁇ m, more preferably about 10-50 ⁇ m. It is possible to easily bond between two sheets of glass or film within the above range.
  • the composition may include (A) an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, (B) film former resin, (C) adsorbent, and (D) hardener.
  • the content about said component (A)-(D) is as having mentioned above.
  • composition may further include one or more selected from the group consisting of the silane coupling agent and the filler described above, and may further include one or more of the additives described above.
  • the composition may include a solvent commonly used in the art, for example, methyl ethyl ketone. Solvents may be included in the balance in the composition.
  • the apparatus includes a first substrate having an organic EL element formed on one surface thereof;
  • an organic EL display device 1 may include a first substrate 2, an organic EL element 3, a second substrate 4, and an adhesive layer 5. Can be.
  • the moisture transmittance in the adhesive layer thickness direction may be about 100 g / m 2 ⁇ day or less at 50 ° C. and 100% relative humidity. Within this range, the water barrier effect is high and the peeling of the first substrate and the organic EL element can be prevented.
  • Moisture permeability may preferably be greater than about 0 and less than 50 g / m 2 ⁇ day at 50 ° C. and 100% relative humidity.
  • the adhesive layer may include the adhesive film for organic EL device or the adhesive composition for encapsulating the organic EL device described above.
  • the adhesive layer may have a thickness of about 1-100 ⁇ m, more preferably about 10-50 ⁇ m. Within this range, the organic EL device and the sealing film can be adhered well.
  • the first substrate may be made of a material such as a transparent glass, a film, a plastic sheet, a silicon or metal substrate, and may have a flexible or non-flexible characteristic and a transparent or non-transparent characteristic.
  • One or more organic EL elements are formed on one surface of the first substrate.
  • the organic EL element is composed of a transparent electrode, a hole transport layer, an organic EL layer and a back electrode.
  • the second substrate may be disposed on the organic EL element, spaced apart from the first substrate, and adhered to the first substrate by the adhesive layer.
  • the second substrate not only a glass material substrate but also a substrate having excellent barrier properties such as a plastic sheet on which metal is laminated may be used.
  • a getter 6 may be formed between the first substrate and the second substrate and on the side of the organic EL element to adhere the first substrate and the second substrate.
  • the apparatus includes a first substrate having an organic EL element formed on one surface thereof;
  • the substrate may be disposed between the first substrate and the second substrate to bond the first substrate to the second substrate, and may include an adhesive layer having a thermal expansion rate of about 100 ppm / ° C. or less from 0 ° C. to 100 ° C.
  • an organic EL display device 1 may include a first substrate 2, an organic EL element 3, a second substrate 4, and an adhesive layer 5. Can be.
  • the adhesive layer may have a thermal expansion rate of about 100 ppm / ° C. or less in a temperature range of 0 ° C. to 100 ° C. Within this range, the adhesive layer does not bend even under high temperature curing conditions accompanying the sealing process of the organic EL element, and the first substrate and the organic EL element are not misaligned.
  • the coefficient of thermal expansion may be greater than about 0 up to 100 ppm / ° C., more preferably greater than about 0 up to 51 ppm / ° C.
  • the coefficient of thermal expansion may be measured with an adhesive layer having a length of 8.0 ⁇ 0.5 mm ⁇ width 4.8 ⁇ 0.2 mm ⁇ thickness 0.2 ⁇ 0.1 mm.
  • the composition constituting the adhesive layer is filmed and laminated, and cured at 90 ° C. for 2 hours, and then cut into a length of 8.0 ⁇ 0.5mm ⁇ width 4.8 ⁇ 0.2mm ⁇ thickness 0.2 ⁇ 0.1mm and a thermomechanical analyzer (TMA, Thermal expansion coefficient was measured using Thermal Mechanical Apparatus).
  • TMA Thermal expansion coefficient was measured using Thermal Mechanical Apparatus.
  • the sample was hooked to a quartz hook and subjected to a force of 0.05 N and then heated to 10 ° C./min from ⁇ 30 ° C. to 250 ° C. under a nitrogen atmosphere.
  • required the value of the temperature range from 0 degreeC to 100 degreeC.
  • the adhesive layer is cured at 90 °C for 2 hours
  • the water transmittance in the adhesive layer thickness direction may be about 100g / m 2 ⁇ day or less at 50 °C and 100% relative humidity.
  • the water barrier effect is high and the peeling of the first substrate and the organic EL element can be prevented.
  • Moisture permeability may preferably be greater than about 0 up to 100 g / m 2 ⁇ day at 50 ° C. and 100% relative humidity, more preferably greater than about 50 g / m 2 ⁇ day up to 50 ° C. and 100% relative humidity. have.
  • Moisture permeability can be measured with an adhesive layer having a thickness of about 20-30 ⁇ m.
  • the composition constituting the adhesive layer is filmed to the thickness, and cured at 90 ° C. for 2 hours, and then measured by MOCON test using carrier gas as nitrogen gas under 50 ° C., 100% relative humidity, and 760 mmHg pressure. It is not limited.
  • the adhesive layer may have a thickness of about 10-50 ⁇ m, preferably about 20-30 ⁇ m.
  • the adhesive layer may include a plate-shaped filler.
  • the plate-shaped filler does not impart hygroscopicity by physical adsorption or chemical bonding or hygroscopicity by chemical bonding.
  • the plate-shaped filler may not only prevent the adhesive layer having a form such as a film from expanding under heat as a plate-like form, but also block moisture's movement path or increase its length to impart hygroscopicity. have.
  • the plate-shaped filler may comprise a plate-like structure having a size of about 50 nm-10 ⁇ m in length, about 50 nm-10 ⁇ m in width, and about 50 nm-10 ⁇ m in thickness. Within this range, the coefficient of thermal expansion may be low, the moisture permeability may be low, and film forming may be good.
  • the plate-shaped filler is not particularly limited as long as it is a plate-shaped structure, but may include, for example, one or more selected from the group consisting of talc, mica, plate silicate, graphite and clay.
  • the plate-shaped filler may be included at about 0.5-40% by weight based on solids in the adhesive layer. Within this range, the moisture permeability may be low to have a moisture proof effect, and the film formability does not deteriorate. Preferably about 4-20% by weight.
  • the plate-shaped filler may be included in an amount of about 10-80 parts by weight based on 100 parts by weight of the epoxy resin having a weight average molecular weight of about 50-10,000 g / mol. Within this range, the hygroscopic effect may be good and the film formability does not deteriorate and the adhesive force may have a high effect. Preferably about 15-50 parts by weight.
  • the adhesive layer may further include an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, a film former resin, and a curing agent, in addition to the plate-shaped filler.
  • the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol are as described above.
  • the epoxy resin may be included in about 20-80% by weight based on the solids of the adhesive layer. Within this range, coating film properties and film formability may be good. Preferably about 20-65% by weight, more preferably about 27-63% by weight.
  • the film former resin may be included in about 10-70% by weight based on the solids of the adhesive layer. Within this range, the film formability may be good and the reliability may be good. Preferably about 20-70% by weight, more preferably about 25-67% by weight.
  • the film former resin is about 40-240 parts by weight, preferably about 100-200 parts by weight, more preferably about 100- parts by weight, based on 100 parts by weight of the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol. It may be included in 150 parts by weight.
  • the curing agent may be included in about 0.1-10% by weight based on solids of the adhesive layer. Within this range, the film formability may be good and the reliability may be good. Preferably 1-10% by weight, more preferably about 1-5% by weight.
  • the curing agent may be included in about 1-20 parts by weight, preferably about 1-10 parts by weight, more preferably about 1-5 parts by weight based on 100 parts by weight of the film-forming resin.
  • the adhesive layer may further include a silane coupling agent.
  • the silane coupling agent may increase the properties and reliability of the film coating film. Details of the silane coupling agent are as described above.
  • the silane coupling agent may be included in an amount of about 0.1-20 parts by weight based on 100 parts by weight of the epoxy resin having a weight average molecular weight of about 50-10,000 g / mol.
  • the adhesive layer may further include one or more additives. Details of the additives are as described above.
  • the adhesive layer can be produced by drying and laminating an adhesive composition for sealing an organic EL device described below. Drying and laminating methods are not particularly limited but may include a method of drying at about 20-80 ° C. to about 0.2 m / s-1.5 m / s.
  • the adhesive layer may have a thickness of about 1-100 ⁇ m, more preferably about 10-50 ⁇ m. Within this range, the organic EL device and the sealing film can be adhered well.
  • a getter 6 may be formed between the first substrate and the second substrate and on the side of the organic EL element to adhere the first substrate and the second substrate.
  • Another aspect of the present invention relates to an adhesive composition for sealing an organic EL device.
  • the composition may be present on a film exhibiting non-flowability at 25 ° C. and heated at 50-100 ° C. to express fluidity and adhesiveness to encapsulate between the organic EL element formed on the first substrate and the second substrate. .
  • An organic EL element composed of a transparent electrode, a hole transport layer, an organic EL layer, and a back electrode can be formed on the first substrate, and the composition of the present invention can be thermally transferred, bonded to the second substrate, and joined to be sealed.
  • the composition of the present invention can be thermally transferred to a second substrate, and bonded to and sealed with a first substrate on which an organic EL element is formed.
  • a transparent electrode is formed to a thickness of about 0.1 mu m on the first substrate.
  • a transparent electrode there is a method by vacuum deposition and sputtering.
  • a hole transport layer and an organic EL layer are sequentially formed on the transparent electrode at a thickness of about 0.05 ⁇ m, respectively, and a back electrode is formed on the organic EL layer at a thickness of about 0.1-0.3 ⁇ m.
  • the composition of the present invention is transferred to a laminate or the like on top of the glass or film substrate which has finished film formation of the device. At this time, when the composition of the present invention is transferred to a release film to form a sheet can be easily transferred. Then, the second substrate is superimposed on top of the transferred composition.
  • thermosetting resin is completely cured at a curing temperature, for example, about 90 ° C. or less. It is also possible to transfer the composition to the second substrate first and polymerize the first substrate on which the organic EL layer is formed.
  • the composition may have a shelf life of 7 days or more at 25 °C.
  • the film or cured product layer prepared from the composition may have a thickness of about 1-100 ⁇ m, more preferably about 10-50 ⁇ m. It is possible to easily bond between two sheets of glass or film within the above range.
  • the composition may include (A) a plate-shaped filler, (B) an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, (C) film former resin, and (D) hardener. Details of the above components (A) to (D) are as described above.
  • the plate-shaped filler may be included in about 0.5-40% by weight based on solids of the composition. Within this range, room temperature stability may be good and film formability may be good. Preferably about 4-20% by weight.
  • the epoxy resin having a weight average molecular weight of about 50-10,000 g / mol may be included in an amount of about 20-80 wt% based on the solids content of the composition. Within this range, coating film properties and film formability may be good. Preferably about 20-65% by weight, more preferably about 27-63% by weight.
  • the film former resin may be included in about 10-70% by weight based on solids of the composition. Within this range, the film formability may be good and the reliability may be good. Preferably about 20-70% by weight, more preferably about 25-67% by weight.
  • the curing agent may be included in about 0.1-10% by weight based on solids of the composition. Within this range, the film formability may be good and the reliability may be good. Preferably about 1-10% by weight, more preferably about 1-5% by weight.
  • composition may further comprise the silane coupling agent described above, and may further comprise one or more of the additives described above.
  • YDF-8170 epoxy equivalent 159 g / g-eq., Mw. 318 g / mol
  • epoxy resin having a weight average molecular weight of 50-10,000 g / mol.
  • 2P4MZ (Shikoku) (2-phenyl-4-methylimidazole), which is a curing agent 1
  • 2P4MHZ (Shikoku) (2-phenyl-4-methyl-5-hydoxymethylimidazole), which was a curing agent 2
  • the film-forming resin was dispersed in methyl ethyl ketone and the solid content was mixed in the amount shown in Table 1 below. Then, an epoxy resin, an adsorbent, and a curing agent having a weight average molecular weight of 50-10,000 g / mol were added in the amounts shown in Table 1 below. Dispersion was carried out using a planetary mixer and a 3-roll mill. A coating film was formed with an applicator, dried and laminated to prepare an adhesive film having a thickness of 20 ⁇ m.
  • the film-forming resin and the plate-shaped filler were dispersed in methyl ethyl ketone, respectively, and the solids were mixed in the amounts shown in Table 2 below. Then, the obtained solution was mixed and an epoxy resin and a curing agent were added in the amounts shown in Table 2 below. Dispersion was carried out using a planetary mixer and a 3-roll mill. A coating film was formed with an applicator, dried and laminated to prepare an adhesive layer having a thickness of 20 ⁇ m.
  • Example 1-4 except that the weight average molecular weight of 50-10,000 g / mol epoxy resin, film former resin, adsorbent, curing agent was changed to the content shown in Table 1 below, the same method was carried out to a thickness of 20 A micrometer adhesive film was prepared.
  • An adhesive layer having a thickness of 20 ⁇ m was prepared in the same manner as in Example 5-8, except that the epoxy resin, the film former resin, and the curing agent were changed to the contents shown in Table 2 below.
  • Moisture permeability After heat curing at 90 °C for 2 hours, the film was 20 ⁇ m thickness MOCON test using nitrogen gas as a carrier gas under 50 °C, 100% relative humidity, 760mmHg pressure.
  • Tensile strength The film was cured at 100 ° C. for 2 hours, and then measured by UTM tensile strength measuring method for a film having a width of 8 mm and a thickness of 20 ⁇ m.
  • Example 1 Example 2
  • Example 3 Example 4 Comparative Example 1 Epoxy resin with a weight average molecular weight of 50-10,000 g / mol (parts by weight) 100 100 100 100 100 Film former resin (weight part) 100 100 50 240 100 Adsorbent (part by weight) 15 50 15 15 - Curing agent (part by weight) Curing agent 1 One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One One Hardener 2 4 4 4 4 4 Moisture permeability (g / m 2 ⁇ day) 37 29 36 43 378 Coating state ⁇ ⁇ ⁇ ⁇ ⁇ DSS after hardening (kgf) 76 72 80 64 73 DSS (kgf) after reliability evaluation 63 69 68 48 52
  • Tensile Strength (N / mm 2 ) 24.1 23.6 23.9 19.8 21.3 Availability ⁇ ⁇
  • the film containing the adsorbent of the present invention compared to the film not containing the adsorbent has a low moisture permeability, a good coating state, good adhesion and high usability as a film (Comparative Example 1 Reference).
  • Thermal expansion rate First, the composition constituting the adhesive layer is filmed, laminated, and cured at 90 ° C. for 2 hours, and then cut into 8.0 ⁇ 0.5 mm in length x 4.8 ⁇ 0.2 mm in width x 0.2 ⁇ 0.1 mm in thickness, followed by a thermal system Thermal expansion coefficient was measured using an analytical measuring device (TMA, Thermal Mechanical Apparatus). The sample was hooked to a quartz hook and subjected to a force of 0.05 N and then heated to 10 ° C./min from ⁇ 30 ° C. to 250 ° C. under a nitrogen atmosphere. The thermal expansion coefficient calculated
  • DSS die shear strength after hardening: The 20 ⁇ m thick film was laminated on a 5 mm x 5 mm glass substrate (adhesive conditions 120 °C 5kgf, 5 seconds) and cured for 2 hours at 100 °C DAGE 4000 (DAGE ⁇ ) was measured die shear strength.
  • Film usability When it can be used for organic electroluminescent element sealing use, it evaluated as (circle), (triangle
  • Example 5 Example 6
  • Example 7 Example 8 Comparative Example 2 Epoxy resin with a weight average molecular weight of 50-10,000 g / mol (parts by weight) 100 100 100 100 100 Film former resin (weight part) 100 100 50 240 100 Plate-shaped filler (parts by weight) 15 50 15 15 - Curing agent (part by weight) Curing agent 1 One One One One One One One One One One One One One One One One One One One One One One One Hardener 2 4 4 4 4 4 4 Power Thermal expansion rate (ppm / °C) 47 42 46 51 102 Moisture permeability (g / m 2 ⁇ day) 38 31 36 47 378 Coating state ⁇ ⁇ ⁇ ⁇ ⁇ Tensile Strength (N / mm 2 ) 25.7 30.2 24.5 21.0 21.3 DSS after hardening (kgf) 75 83 82 69 73 DSS (kgf) after reliability evaluation 66 71 68 51 52 Availability ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇ ⁇
  • the adhesive layer containing the plate-shaped filler of the present invention compared to the adhesive layer not containing the plate-shaped filler has a low thermal expansion and water permeability, a good coating state, good adhesion, and high usability as a film. (See Examples 5-8 and Comparative Example 2.)
  • the present invention provides an adhesive film for an organic EL device, a composition contained therein, and an organic EL display device including the same.

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  • Electroluminescent Light Sources (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Abstract

The present invention relates to an adhesive film for an organic EL device, to a composition included therein, and to an organic EL display device including same.

Description

유기 EL 소자용 접착 필름, 이에 포함되는 조성물, 및 이를 포함하는 유기 EL 디스플레이 장치Adhesive film for organic EL elements, composition contained therein, and organic EL display device comprising same
본 발명은 유기 EL 소자용 접착 필름, 이에 포함되는 조성물, 및 이를 포함하는 유기 EL 디스플레이 장치에 관한 것이다.The present invention relates to an adhesive film for an organic EL device, a composition contained therein, and an organic EL display device including the same.
유기 EL 소자는 다결정의 반도체 디바이스이며, 저전압에서 고휘도의 발광을 얻기 위해 액정의 백라이트 등에 사용되고, 박형 평면 표시 디바이스로 기대되고 있다. 그러나, 유기 EL 소자는 수분에 극히 약하고, 금속 전계와 유기 EL층과의 계면이 수분의 영향으로 박리되기도 하고, 금속이 산화하여 고저항화하기도 하며, 유기물 자체가 수분에 의해 변질되기도 하고, 이 때문에 발광하지 않게 되며, 휘도가 저하되기도 한다는 문제점이 있다.An organic EL element is a polycrystalline semiconductor device, is used in backlights of liquid crystals and the like to obtain high luminance light emission at low voltage, and is expected to be a thin flat display device. However, the organic EL element is extremely weak in moisture, the interface between the metal electric field and the organic EL layer may be peeled off due to the influence of moisture, the metal may be oxidized and become highly resistant, and the organic material itself may be deteriorated by moisture. Therefore, there is a problem that light is not emitted and luminance is lowered.
이와 같은 문제점을 해결하기 위하여 유기 EL 소자를 경화형 조성물로 봉지하는 방법이 개발되고 있다. 기존의 봉지 방법으로 유기 EL 소자를 아크릴 수지로 몰드하는 방법, 유기 EL 소자의 봉지 수지 중에 흡습재를 첨가하여 유기 EL 소자를 수분으로부터 차단하는 방법 등이 제안되고 있다.In order to solve such a problem, the method of sealing an organic electroluminescent element with a curable composition is developed. Background Art A method of molding an organic EL element into an acrylic resin by a conventional sealing method, a method of blocking an organic EL element from moisture by adding a moisture absorbent to the sealing resin of the organic EL element, and the like have been proposed.
그러나, 기존의 유기 EL 소자의 봉지 방법은 다크 스폿의 발생 및 성장을 억제하는데 한계가 있었고, 충분한 접착력을 가질 수 없었으며, 유기 EL 소자의 봉지에 필요한 모든 요건을 충분히 만족할 수 없어, 유기 EL 소자의 봉지 용도로 사용하는데 한계가 있었다. 특히, 유기 EL 소자는 수분에 매우 민감하여 분해되기 쉽고 수분과 화학적인 반응을 일으키기 쉽다는 단점을 갖고 있다. 그러나, 기존의 유기 EL 소자의 봉지 용도에 사용된 경화형 조성물은 수분 투과율을 낮추는 데에는 한계가 있었다.However, the conventional method of encapsulating the organic EL device has a limitation in suppressing the occurrence and growth of dark spots, it cannot have sufficient adhesive force, and it cannot fully satisfy all the requirements for encapsulation of the organic EL device. There was a limit to use for encapsulation. In particular, the organic EL device has a disadvantage in that it is very sensitive to moisture and easily decomposes, causing chemical reaction with moisture. However, the curable composition used for the sealing application of the existing organic EL device has a limit in lowering the water transmittance.
또한, 유기 EL 소자의 봉지 과정 중 열 경화 과정에서는 고온의 열이 제공된다. 따라서, 봉지용 조성물의 열팽창율이 클 경우에는 접착층이 휘거나 유기 EL 소자와 기판 간의 박리가 일어날 수 있다.In addition, high temperature heat is provided in the thermosetting process during the encapsulation process of the organic EL element. Therefore, when the thermal expansion coefficient of the sealing composition is large, the adhesive layer may bend or peeling may occur between the organic EL element and the substrate.
본 발명의 목적은 열팽창율이 낮은 접착층을 포함하는 유기 EL 소자용 접착 필름, 이에 포함되는 조성물, 및 이를 포함하는 유기 EL 디스플레이 장치를 제공하는 것이다.SUMMARY OF THE INVENTION An object of the present invention is to provide an adhesive film for an organic EL device comprising an adhesive layer having a low thermal expansion rate, a composition included therein, and an organic EL display device including the same.
본 발명의 다른 목적은 수분투과율이 낮은 접착층을 포함하는 유기 EL 소자용 접착 필름, 이에 포함되는 조성물, 및 이를 포함하는 유기 EL 디스플레이 장치를 제공하는 것이다.Another object of the present invention is to provide an adhesive film for an organic EL device comprising an adhesive layer having a low water transmittance, a composition included therein, and an organic EL display device including the same.
본 발명의 또 다른 목적은 도막 상태가 양호하며 접착력이 좋고 사용가능성이 높은 접착층을 포함하는 유기 EL 소자용 접착 필름, 이에 포함되는 조성물, 및 이를 포함하는 유기 EL 디스플레이 장치를 제공하는 것이다.It is still another object of the present invention to provide an adhesive film for an organic EL device, a composition included therein, and an organic EL display device including the adhesive layer having a good coating film state and having good adhesion and high usability.
본 발명의 일 관점인 유기 EL 소자용 접착 필름은 흡착제를 포함하고, 90℃에서 2시간 동안 경화된 후 50℃ 및 100% 상대습도에서 수분투과율이 약 100g/m2·day 이하가 될 수 있다.An adhesive film for an organic EL device, which is an aspect of the present invention, includes an adsorbent and may be cured at 90 ° C. for 2 hours, and then have a moisture transmittance of about 100 g / m 2 · day or less at 50 ° C. and 100% relative humidity. .
일 구체예에서, 상기 흡착제는 상기 접착 필름 중 고형분 기준으로 약 0.5-40중량%로 포함될 수 있다.In one embodiment, the adsorbent may be included in about 0.5-40% by weight based on solids in the adhesive film.
일 구체예에서, 상기 흡착제는 제올라이트, 산화칼슘, 분자체(molecular sieve), 활성탄, 실리카겔 등으로 이루어진 군으로부터 선택되는 하나 이상을 포함할 수 있다.In one embodiment, the adsorbent may include one or more selected from the group consisting of zeolite, calcium oxide, molecular sieve, activated carbon, silica gel and the like.
일 구체예에서, 상기 접착 필름은 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지, 필름 형성제 수지 및 경화제를 더 포함할 수 있다.In one embodiment, the adhesive film may further include an epoxy resin, a film former resin, and a curing agent having a weight average molecular weight of about 50-10,000 g / mol.
일 구체예에서, 상기 필름 형성제 수지는 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대해 약 50-240중량부로 포함될 수 있다.In one embodiment, the film former resin may be included in an amount of about 50-240 parts by weight based on 100 parts by weight of an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol.
일 구체예에서, 상기 접착 필름은 실란커플링제, 필러, 레벨링제, 소포제, 보존 안정제, 가소제 및 탈크 조정제로 이루어진 군으로부터 선택되는 하나 이상을 더 포함할 수 있다.In one embodiment, the adhesive film may further include one or more selected from the group consisting of a silane coupling agent, a filler, a leveling agent, an antifoaming agent, a storage stabilizer, a plasticizer and a talc adjusting agent.
본 발명의 다른 관점인 유기 EL 디스플레이 장치는 일면에 유기 EL 소자가 형성된 제1 기판; 상기 제1 기판 상에 이격되어 배치된 제2 기판; 및 상기 제1 기판과 상기 제2 기판 사이에 배치되어 상기 제1 기판과 상기 제2 기판을 접합시키며, 90℃에서 2시간 동안 경화된 후 50℃ 및 100% 상대습도에서 수분투과율이 약 100g/m2·day 이하인 접착층을 포함할 수 있다.Another aspect of the present invention is an organic EL display device comprising: a first substrate having an organic EL element formed on one surface thereof; A second substrate spaced apart from the first substrate; And a substrate disposed between the first substrate and the second substrate to bond the first substrate and the second substrate, the cured at 90 ° C. for 2 hours, and then the water transmittance at about 50 ° C. and 100% relative humidity of about 100 g / It may include an adhesive layer that is m 2 · day or less.
본 발명의 또 다른 관점인 유기 EL 디스플레이 장치는 일면에 유기 EL 소자가 형성된 제1 기판; 상기 제1 기판 상에 이격되어 배치된 제2 기판; 및 상기 제1 기판과 상기 제2 기판 사이에 배치되어 상기 제1 기판과 상기 제2 기판을 접합시키며, 0℃에서 100℃까지의 열팽창율이 약 100ppm/℃ 이하인 접착층을 포함할 수 있다.Another aspect of the present invention is an organic EL display device comprising: a first substrate having an organic EL element formed on one surface thereof; A second substrate spaced apart from the first substrate; And an adhesive layer disposed between the first substrate and the second substrate to bond the first substrate and the second substrate and having a thermal expansion rate of about 0 ° C. to 100 ° C. of about 100 ppm / ° C. or less.
일 구체예에서, 상기 접착층은 90℃에서 2시간 동안 경화된 후 50℃ 및 100% 상대습도에서 수분투과율이 약 100g/m2·day 이하가 될 수 있다.In one embodiment, the adhesive layer may be cured for 2 hours at 90 ℃ and the water transmittance at about 50 ℃ and 100% relative humidity may be about 100g / m 2 · day or less.
일 구체예에서, 상기 접착층은 판상형 필러를 포함할 수 있다.In one embodiment, the adhesive layer may include a plate-shaped filler.
일 구체예에서, 상기 접착층은 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지, 필름 형성제 수지 및 경화제를 더 포함할 수 있다.In one embodiment, the adhesive layer may further include an epoxy resin, a film former resin, and a curing agent having a weight average molecular weight of about 50-10,000 g / mol.
일 구체예에서, 상기 접착층은 실란커플링제를 더 포함할 수 있다.In one embodiment, the adhesive layer may further include a silane coupling agent.
본 발명의 또 다른 관점인 유기 EL 소자 봉지용 접착제 조성물은 (A)판상형 필러, (B)중량평균분자량이 약 50-10,000g/mol인 에폭시 수지, (C)필름 형성제 수지 및 (D)경화제를 포함할 수 있다.Another aspect of the present invention, the adhesive composition for encapsulating an organic EL device includes (A) a plate-shaped filler, (B) an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, (C) a film-forming resin, and (D) It may include a curing agent.
본 발명은 수분투과율이 낮은 접착층을 포함하는 유기 EL 소자용 접착 필름을 제공하였다. 본 발명은 도막 상태가 양호하며 접착력이 좋고 사용가능성이 높은 접착층을 포함하는 유기 EL 소자용 접착 필름을 제공하였다. 본 발명은 상기 유기 EL 소자용 접착 필름으로 구성되는 접착층을 포함하는 유기 EL 디스플레이 장치를 제공하였다. 본 발명은 열팽창율과 수분투과율이 낮은 접착층을 포함하는 유기 EL 디스플레이 장치를 제공하였다. 또한, 본 발명은 도막 상태가 양호하며 접착력이 좋고 사용가능성이 높은 접착층을 포함하는 유기 EL 디스플레이 장치를 제공하였다.The present invention provides an adhesive film for an organic EL device comprising an adhesive layer having a low water transmittance. This invention provided the adhesive film for organic electroluminescent elements containing the adhesive layer in the state of a favorable coating film, and the adhesive force is high and usability is high. The present invention provides an organic EL display device comprising an adhesive layer composed of the adhesive film for organic EL elements. The present invention provides an organic EL display device including an adhesive layer having a low thermal expansion rate and a low water transmittance. In addition, the present invention provides an organic EL display device having an adhesive layer having a good coating film state and having good adhesion and high usability.
도 1은 본 발명의 일 구체예에 따른 유기 EL 디스플레이 장치를 나타낸 것이다.1 shows an organic EL display device according to an embodiment of the present invention.
본 발명의 일 관점은 유기 EL 소자용 접착 필름에 관한 것이다.One aspect of the present invention relates to an adhesive film for an organic EL device.
본 발명의 필름은 90℃에서 2시간 동안 경화된 후 필름 두께 방향의 수분투과율이 50℃ 및 100% 상대습도에서 약 100g/m2·day 이하가 될 수 있다. 상기 범위 내에서, 수분 차단 효과가 높고, 유기 EL 소자가 형성된 글라스 또는 필름 기판과 유기 EL 소자의 박리를 막을 수 있다. 수분투과율은 바람직하게는 50℃ 및 100% 상대습도에서 약 0 초과 100g/m2·day 이하, 더욱 바람직하게는 50℃ 및 100% 상대습도에서 약 0 초과 50g/m2·day 이하가 될 수 있다.The film of the present invention may be cured at 90 ° C. for 2 hours, and then the water transmittance in the film thickness direction may be about 100 g / m 2 · day or less at 50 ° C. and 100% relative humidity. Within this range, the water barrier effect is high, and peeling of the glass or film substrate on which the organic EL element is formed and the organic EL element can be prevented. Moisture permeability may preferably be greater than about 0 up to 100 g / m 2 · day at 50 ° C. and 100% relative humidity, more preferably greater than about 50 g / m 2 · day up to 50 ° C. and 100% relative humidity. have.
수분투과율은 두께 20-30㎛의 필름으로 측정될 수 있다. 먼저 접착 필름을 구성하는 조성물을 상기 두께로 필름화하고, 90℃에서 2시간 동안 경화시킨 후, 50℃, 100% 상대습도 및 760mmHg 압력 하에서 carrier gas를 질소 가스로 하여 MOCON 테스트로 측정할 수 있지만, 이에 제한되지 않는다. 경화된 후 접착 필름은 약 20㎛-30㎛의 두께를 가질 수 있다.Moisture permeability can be measured with a film having a thickness of 20-30 μm. First, the composition constituting the adhesive film is filmed to the thickness and cured at 90 ° C. for 2 hours, and then measured by MOCON test using carrier gas as nitrogen gas under 50 ° C., 100% relative humidity, and 760 mmHg pressure. This is not restrictive. After curing, the adhesive film may have a thickness of about 20 μm-30 μm.
일 구체예에서, 상기 접착 필름은 흡착제를 포함할 수 있다. 상기 흡착제는 물리적 흡착에 의한 흡습성을 제공함으로써 유기 EL 소자와 수분과의 접촉을 차단할 수 있다.In one embodiment, the adhesive film may include an adsorbent. The adsorbent can block the contact between the organic EL element and water by providing hygroscopicity by physical adsorption.
상기 흡착제는 효과적인 흡습성을 제공하기 위해서 단위 부피 또는 단위 무게당 흡착되는 표면적이 넓도록 다공성인 입자를 사용하는 것이 바람직하다. 흡착제는 평균 공극 크기가 약 1nm-20nm인 것이 바람직하다.The adsorbent preferably uses particles that are porous such that the surface area adsorbed per unit volume or unit weight is wide to provide effective hygroscopicity. The adsorbent preferably has an average pore size of about 1 nm-20 nm.
상기 흡착제는 입자 크기(D50)가 약 50nm-5㎛인 것이 바람직하다. 상기 범위 내에서, 흡습성 효과가 좋고 필름 성형성이 나빠지지 않는다. 접착 필름은 2종 이상의 입자 크기를 갖는 흡착제를 포함할 수도 있다.The adsorbent preferably has a particle size (D50) of about 50 nm-5 μm. Within this range, the hygroscopic effect is good and the film formability does not deteriorate. The adhesive film may comprise an adsorbent having two or more particle sizes.
상기 흡착제는 제올라이트, 산화칼슘, 분자체(molecular sieve), 활성탄, 실리카겔 등으로 이루어진 군으로부터 선택되는 하나 이상을 포함할 수 있지만, 이에 제한되지 않는다.The adsorbent may include one or more selected from the group consisting of zeolite, calcium oxide, molecular sieve, activated carbon, silica gel and the like, but is not limited thereto.
상기 흡착제는 고형분 기준으로 접착 필름 중 약 0.5-40중량%로 포함될 수 있다. 상기 범위 내에서, 흡습성 효과가 좋고 필름 성형성이 나빠지지 않는다. 바람직하게는 약 4-20중량%로 포함될 수 있다.The adsorbent may be included in about 0.5-40% by weight of the adhesive film on a solids basis. Within this range, the hygroscopic effect is good and the film formability does not deteriorate. Preferably about 4-20% by weight.
상기 흡착제는 하기 기술되는 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대해 약 10-150중량부로 포함될 수 있다. 상기 범위 내에서, 흡습성 효과가 좋고 필름 성형성이 나빠지지 않으며 접착력이 높은 효과가 있을 수 있다. 바람직하게는 약 15-50중량부로 포함될 수 있다.The adsorbent may be included in an amount of about 10-150 parts by weight based on 100 parts by weight of an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol described below. Within this range, the hygroscopic effect may be good and the film formability does not deteriorate and the adhesive force may have a high effect. Preferably about 15-50 parts by weight.
다른 구체예에서, 상기 접착 필름은 상기 흡착제 이외에도, 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지, 필름 형성제 수지, 및 경화제를 더 포함할 수 있다.In another embodiment, the adhesive film may further include, in addition to the adsorbent, an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, a film former resin, and a curing agent.
상기 에폭시 수지는 중량평균분자량이 약 50-10,000g/mol이 될 수 있다. 상기 범위 내에서, 필름의 접착력 증진 및 도막특성을 부여할 수 있다. 중량평균분자량은 바람직하게는 약 100-5,000g/mol, 더욱 바람직하게는 약 200-4,000g/mol이 될 수 있다. 또한, 상기 에폭시 수지는 가수분해성 염소 이온이 약 700ppm 이하인 것이 바람직하다. 상기 범위 내에서, 장기 신뢰도 평가를 위한 가속 신뢰도 test에서 소자에 damage를 주지 않는 효과가 있을 수 있다. 염소 이온은 바람직하게는 약 0-500ppm, 더욱 바람직하게는 약 0-300ppm이 될 수 있다.The epoxy resin may have a weight average molecular weight of about 50-10,000 g / mol. Within this range, the adhesion of the film may be enhanced and the coating properties may be imparted. The weight average molecular weight may preferably be about 100-5,000 g / mol, more preferably about 200-4,000 g / mol. In addition, the epoxy resin preferably has about 700 ppm or less of hydrolyzable chlorine ions. Within this range, there may be an effect that does not damage the device in the acceleration reliability test for long-term reliability evaluation. The chlorine ion may preferably be about 0-500 ppm, more preferably about 0-300 ppm.
상기 에폭시 수지는 비스페놀 A형 에폭시 수지, 비스페놀 F형 에폭시 수지, 수소화 비스페놀형 에폭시 수지, 시클로알리파틱(cycloaliphatic) 에폭시 수지, 나프탈렌형 에폭시 수지, 페놀노볼락형 에폭시 수지, o-크레졸 노볼락형 에폭시 수지, 디스클로펜타디엔형 에폭시 수지, 비페닐형 에폭시 수지, 비페닐 노볼락형 에폭시 수지 및 나프탈렌 노볼락형 에폭시 수지로 이루어진 군으로부터 선택되는 1종 이상을 포함할 수 있지만, 이들에 제한되지 않는다.The epoxy resin is a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a hydrogenated bisphenol type epoxy resin, a cycloaliphatic epoxy resin, a naphthalene type epoxy resin, a phenol novolak type epoxy resin, an o-cresol novolak type epoxy It may include, but is not limited to, one or more selected from the group consisting of resins, disclopentadiene type epoxy resins, biphenyl type epoxy resins, biphenyl novolak type epoxy resins, and naphthalene novolak type epoxy resins. .
상기 에폭시 수지는 상기 접착층의 고형분 기준으로 약 20-80중량%로 포함될 수 있다. 상기 범위 내에서, 도막 특성과 필름 성형성이 좋을 수 있다. 바람직하게는 약 20-75중량%, 더욱 바람직하게는 약 25-70중량%, 가장 바람직하게는 약 27-59중량%로 포함될 수 있다.The epoxy resin may be included in about 20-80% by weight based on the solids of the adhesive layer. Within this range, coating film properties and film formability may be good. Preferably about 20-75% by weight, more preferably about 25-70% by weight, most preferably about 27-59% by weight.
상기 필름 형성제 수지는 중량평균분자량이 약 10,000-500,000g/mol인 에폭시 수지, (메타)아크릴레이트계 수지, 우레탄 (메타)아크릴레이트계 수지, 폴리이미드, 스티렌 수지 등을 포함하는 방향족 수지, 및 디엔계, 실리콘계, 우레탄계, 불소계 고무 등을 포함하는 고무로 이루어진 군으로부터 선택되는 하나 이상을 포함할 수 있다. 바람직하게는, 상기 필름 형성제 수지는 중량평균분자량이 약 10,000-500,000g/mol인 에폭시 수지일 수 있다. 상기 에폭시 수지는 상기 중량평균분자량 범위 내에서, 상온 tack 과 필름의 접착력 및 도막특성을 부여하는 효과가 있다. 바람직하게는 약 70,000-500,000g/mol이 될 수 있다.The film-forming resin may be an aromatic resin including an epoxy resin having a weight average molecular weight of about 10,000-500,000 g / mol, a (meth) acrylate resin, a urethane (meth) acrylate resin, a polyimide, a styrene resin, And it may include one or more selected from the group consisting of rubber, including diene-based, silicone-based, urethane-based, fluorine-based rubber and the like. Preferably, the film former resin may be an epoxy resin having a weight average molecular weight of about 10,000-500,000 g / mol. The epoxy resin has an effect of imparting adhesion and coating properties of the film with a room temperature tack within the weight average molecular weight range. Preferably about 70,000-500,000 g / mol.
상기 중량평균분자량이 약 10,000-500,000g/mol인 에폭시 수지는 비스페놀 A형 또는 비스페놀 F형 에폭시 골격을 갖는 수지를 포함할 수 있다. 예를 들면, 고형 비스페놀 A형 에폭시 수지, 고형 비스페놀 F형 에폭시 수지 및 페녹시 수지로 이루어진 군으로부터 선택되는 하나 이상을 포함할 수 있지만, 이에 제한되지 않는다.The epoxy resin having a weight average molecular weight of about 10,000-500,000 g / mol may include a resin having a bisphenol A type or a bisphenol F type epoxy skeleton. For example, it may include, but is not limited to, one or more selected from the group consisting of a solid bisphenol A epoxy resin, a solid bisphenol F epoxy resin, and a phenoxy resin.
상기 필름 형성제 수지는 상기 접착층의 고형분 기준으로 약 10-70중량%로 포함될 수 있다. 상기 범위 내에서, 필름 성형성이 좋고 신뢰도가 좋을 수 있다. 바람직하게는 약 20-70중량%, 더욱 바람직하게는 약 25-70중량%, 가장 바람직하게는 약 25-67중량%로 포함될 수 있다.The film former resin may be included in about 10-70% by weight based on the solids of the adhesive layer. Within this range, the film formability may be good and the reliability may be good. Preferably about 20-70% by weight, more preferably about 25-70% by weight, most preferably about 25-67% by weight.
상기 필름 형성제 수지는 상기 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대해 약 40-240중량부로 포함될 수 있다. 상기 범위 내에서, 필름 성형성이 좋고 신뢰도가 좋을 수 있다. 바람직하게는 약 50-240중량부, 더욱 바람직하게는 약 100-150중량부로 포함될 수 있다.The film former resin may include about 40-240 parts by weight based on 100 parts by weight of the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol. Within this range, the film formability may be good and the reliability may be good. Preferably about 50-240 parts by weight, more preferably about 100-150 parts by weight.
상기 경화제는 이미다졸계 경화제를 포함할 수 있다. 이미다졸계 경화제는 페닐기, 탄소수 10개 이상 바람직하게는 10-20개의 알켄기 및 시안기로 이루어진 군으로부터 선택되는 하나 이상의 작용기를 갖는 이미다졸 화합물을 포함할 수 있다. 상기 이미다졸계 경화제는 필름 도막의 안정성, 상온 상용성 및 저온 특히 90℃ 이하의 온도에서 경화가 가능하게 할 수 있다.The curing agent may include an imidazole series curing agent. The imidazole series curing agent may include an imidazole compound having at least one functional group selected from the group consisting of a phenyl group, 10 or more carbon atoms, preferably 10-20 alkenes, and a cyan group. The imidazole-based curing agent may enable the curing of the film coating film stability, room temperature compatibility and low temperature, especially at a temperature of 90 ° C or less.
상기 경화제는 반응 개시온도 약 60-100℃인 이미다졸 경화제와 반응 개시온도 약 100-160℃인 이미다졸 경화제를 포함할 수 있다. 본 발명에서 '반응 개시온도'는 이미다졸 경화제가 에폭시 수지와 반응하여 경화를 시작하는 온도를 의미한다. 바람직하게는 반응 개시온도 약 70-98℃인 이미다졸 경화제와 반응 개시온도 약 105-140℃인 이미다졸 경화제를 포함할 수 있다.The curing agent may include an imidazole curing agent having a reaction initiation temperature of about 60-100 ° C. and an imidazole curing agent having a reaction initiation temperature of about 100-160 ° C. In the present invention, the 'reaction start temperature' means a temperature at which the imidazole curing agent reacts with the epoxy resin to start curing. Preferably, an imidazole curing agent having a reaction initiation temperature of about 70-98 ° C. and an imidazole curing agent having a reaction initiation temperature of about 105-140 ° C. may be included.
상기 반응 개시온도 약 60-100℃의 이미다졸 경화제는 2종 이상 포함될 수 있다. 또한, 상기 반응 개시온도 약 100-160℃의 이미다졸 경화제는 2종 이상 포함될 수 있다.Two or more kinds of imidazole curing agents having a reaction initiation temperature of about 60-100 ° C. may be included. In addition, two or more kinds of imidazole curing agents having the reaction initiation temperature of about 100-160 ° C may be included.
상기 반응 개시온도 약 60-100℃인 이미다졸 경화제와 반응 개시온도 약 100-160℃인 이미다졸 경화제는 페닐기, 벤질기, 탄소 1개 이상 예를 들면 탄소 1개 내지 20개의 알케인기(alkane), 시아노기 또는 아민기를 가질 수 있다.The imidazole curing agent having a reaction initiation temperature of about 60-100 ° C. and the imidazole curing agent having a reaction initiation temperature of about 100-160 ° C. are a phenyl group, a benzyl group, one or more carbons, for example, one to twenty carbon alkanes. It may have a cyano group or an amine group.
반응 개시온도 약 60-100℃인 이미다졸 경화제의 예로는 2-운데실이미다졸, 2-헵타데실이미다졸, 2-페닐이미다졸, 2-페닐-4-메틸이미다졸, 1-벤질-2-페닐이미다졸, 1-시아노에틸-2-메틸이미다졸, 1-시아노에틸-2-에틸-4-메틸이미다졸, 1-시아노에틸-2-운데실이미다졸, 2-페닐이미다졸린 등을 포함할 수 있지만, 이들에 제한되지 않는다.Examples of the imidazole curing agent having a reaction start temperature of about 60-100 ° C. include 2-undecylimidazole, 2-heptadecylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, 1 -Benzyl-2-phenylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecyl Imidazole, 2-phenylimidazoline, and the like, but are not limited to these.
반응 개시온도 약 100-160℃인 이미다졸 경화제의 예로는 1-시아노에틸-2-페닐이미다졸, 1-시아노에틸-2-운데실이미다졸리움-트리멜리테이트, 2,4-디아미노-6[2'-운데실이미다졸릴-(1')]-에틸-s-트리아진, 2,4-디아미노-6-[2'-에틸-4'-메틸이미다졸릴-(1')]-에틸-s-트리아진, 1-시아노에틸-2-페닐이미다졸리움-트리멜리테이트, 2-페닐이미다졸 이소시아누릭 애시드 어덕트, 1-벤질-2-페닐이미다졸 하이드로브로마이드 등을 포함할 수 있지만, 이들에 제한되지 않는다.Examples of imidazole curing agents having a reaction initiation temperature of about 100-160 ° C. include 1-cyanoethyl-2-phenylimidazole, 1-cyanoethyl-2-undecylimidazolium-trimelitate, 2,4- Diamino-6 [2'-undecylimidazolyl- (1 ')]-ethyl-s-triazine, 2,4-diamino-6- [2'-ethyl-4'-methylimidazolyl- (1 ')]-ethyl-s-triazine, 1-cyanoethyl-2-phenylimidazolium-trimelitate, 2-phenylimidazole isocyanuric acid adduct, 1-benzyl-2- Phenylimidazole hydrobromide and the like, but are not limited thereto.
상기 경화제는 상기 접착 필름의 고형분 기준으로 약 0.1-10중량%로 포함될 수 있다. 상기 범위 내에서, 필름 성형성이 좋고 신뢰도가 좋을 수 있다. 바람직하게는 약 1-10중량%, 더욱 바람직하게는 약 1-5중량%로 포함될 수 있다. The curing agent may be included in about 0.1-10% by weight based on the solids of the adhesive film. Within this range, the film formability may be good and the reliability may be good. Preferably about 1-10% by weight, more preferably about 1-5% by weight.
또한, 상기 경화제는 상기 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대해 약 0.1-20중량부, 바람직하게는 약 0.5-10중량부, 더욱 바람직하게는 약 1-7중량부로 포함될 수 있다.Further, the curing agent is about 0.1-20 parts by weight, preferably about 0.5-10 parts by weight, more preferably about 1-7 parts by weight of 100 parts by weight of the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol. It may be included in parts by weight.
또 다른 구체예에서, 상기 접착층은 실란커플링제 및 필러로 이루어진 군으로부터 선택되는 1종 이상을 더 포함할 수 있다. 상기 실란커플링제와 필러는 필름 도막의 특성 및 신뢰도를 증가시킬 수 있다.In another embodiment, the adhesive layer may further include one or more selected from the group consisting of a silane coupling agent and a filler. The silane coupling agent and the filler may increase the properties and reliability of the film coating film.
상기 실란커플링제는 통상적인 커플링제를 사용할 수 있다. 예를 들면, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, N-페닐-γ-아미노프로필트리메톡시실란, N-(2-아미노에틸)-3-아미노프로필메틸트리메톡시실란, 3-아미노프로필트리에톡시실란, 3-메르캅토프로필트리메톡시실란, 비닐트리메톡시실란, N-2-(비닐벤질아미노)에틸)-3-아미노프로필트리메톡시실란 염산염 및 3-(메타)아크릴옥시프로필트리메톡시실란으로 이루어진 군으로 선택되는 1종 이상을 사용할 수 있지만, 이에 제한되지 않는다. 상기 실란커플링제는 고형분 기준으로 상기 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대해 약 0.1-20중량부로 포함될 수 있다.The silane coupling agent may use a conventional coupling agent. For example, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltri Methoxysilane, N-phenyl-γ-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-mercaptopropyl Selected from the group consisting of trimethoxysilane, vinyltrimethoxysilane, N-2- (vinylbenzylamino) ethyl) -3-aminopropyltrimethoxysilane hydrochloride and 3- (meth) acryloxypropyltrimethoxysilane One or more species may be used, but is not limited thereto. The silane coupling agent may be included in an amount of about 0.1-20 parts by weight based on 100 parts by weight of the epoxy resin having a weight average molecular weight of about 50-10,000 g / mol.
상기 필러는 통상적인 필러를 사용할 수 있다. 예를 들면, 산화알루미늄, 규산알루미늄, 탈크 및 판상 규산염으로 이루어진 군으로부터 선택되는 1종 이상을 사용할 수 있지만, 이에 제한되지 않는다. 상기 필러는 고형분 기준으로 상기 필름 형성제 수지 100중량부에 대해 약 1-150중량부, 바람직하게는 약 10-100중량부로 포함될 수 있다.The filler may be a conventional filler. For example, one or more selected from the group consisting of aluminum oxide, aluminum silicate, talc and plate silicates may be used, but is not limited thereto. The filler may be included in about 1-150 parts by weight, preferably about 10-100 parts by weight, based on 100 parts by weight of the film-forming resin, based on solids.
또 다른 구체예에서, 상기 접착층은 1종 이상의 첨가제를 더 포함할 수 있다. 첨가제는 표면상의 레벨링 및 도막 특성을 향상시킬 수 있다. 첨가제는 예를 들면 레벨링제, 소포제, 보존 안정제, 가소제 및 탈크 조정제로 이루어진 군으로부터 선택되는 1종 이상을 사용할 수 있지만, 이에 제한되지 않는다.In another embodiment, the adhesive layer may further include one or more additives. The additive can improve the leveling and coating properties on the surface. The additive may be used, for example, but not limited to one or more selected from the group consisting of a leveling agent, an antifoaming agent, a storage stabilizer, a plasticizer and a talc adjusting agent.
상기 접착 필름은 하기 기술되는 유기 EL 소자 봉지용 접착제 조성물을 건조 및 라미네이팅시킴으로써 제조될 수 있다. 건조 및 라미네이팅시키는 방법은 특별히 제한되지 않지만, 약 20-80℃에서 약 0.2m/s-1.5m/s로 건조시키는 방법을 포함할 수 있다.The adhesive film can be produced by drying and laminating an adhesive composition for sealing an organic EL device described below. Drying and laminating methods are not particularly limited but may include a method of drying at about 20-80 ° C. to about 0.2 m / s-1.5 m / s.
상기 접착 필름은 두께를 약 1-100㎛, 더욱 바람직하게는 약10-50㎛로 하는 것이 좋다. 상기 범위 내에서 유기 EL 소자와 봉지용 필름을 잘 접착시킬 수 있다.The adhesive film may have a thickness of about 1-100 μm, more preferably about 10-50 μm. Within this range, the organic EL device and the sealing film can be adhered well.
본 발명의 다른 관점은 유기 EL 소자 봉지용 수지 조성물에 관한 것이다.Another aspect of the present invention relates to a resin composition for sealing an organic EL device.
상기 조성물은 25℃에서는 비유동성을 나타내는 필름 상으로 존재하고 50-100℃로 가열하면 유동성과 점착성을 발현하여 글라스 또는 필름 기판 상에 형성된 유기 EL 소자와, 봉지 글라스 또는 필름 기판과의 사이를 봉지할 수 있다.The composition is present in the form of a film exhibiting non-fluidity at 25 ℃ and when heated to 50-100 ℃ to express the fluidity and adhesiveness between the organic EL element formed on the glass or film substrate and the sealing glass or film substrate between can do.
글라스 또는 필름 기판 상에 투명 전극, 정공수송층, 유기 EL층 및 배면 전극으로 이루어진 유기 EL 소자를 형성하고, 그 위에 본 발명의 조성물을 열전사하고, 비투수성 글라스 또는 필름과 가열하면서 접합시켜 봉지할 수 있다. 또는 비투수성의 글라스 또는 필름에 본 발명의 조성물을 열전사하고, 유기 EL 소자를 형성한 글라스 또는 필름에 가열하면서 접합시켜 봉지할 수도 있다.Form an organic EL device consisting of a transparent electrode, a hole transport layer, an organic EL layer and a back electrode on a glass or film substrate, heat transfer the composition of the present invention thereon, and heat-transfer the non-permeable glass or film to bond and encapsulate it. Can be. Alternatively, the composition of the present invention may be thermally transferred to a water-impermeable glass or film, and bonded and sealed while heating to a glass or film on which an organic EL element is formed.
보다 구체적으로, 글라스 또는 필름 기판 상에 투명 전극을 약 0.1㎛의 두께로 성막한다. 투명 전극의 성막에 있어서는 진공증착 및 스퍼터링에 의한 방법이 있다. 투명 전극의 상부에 정공수송층과 유기 EL층을 각각 약 0.05㎛의 두께로 순차적으로 성막하고 유기 EL 층의 상부에 배면 전극을 약 0.1-0.3㎛의 두께로 성막한다. 소자의 성막을 끝낸 글라스 또는 필름 기판의 상부에 본 발명의 조성물을 라미네이트 등으로 전사한다. 이때, 본 발명의 조성물을 이형 필름 상에 전사하여 시트상으로 형성할 경우 쉽게 전사할 수 있다. 그런 다음, 전사한 조성물의 상부에 비투수성 글라스 또는 필름 기판을 중첩시킨다. 이것을 진공 라미네이터 장치를 사용하여 가열 압착시켜, 하부의 글라스 또는 필름 기판과 상부의 비투수성 글라스 또는 필름 기판을 예비 고착시킨다. 그런 다음, 경화 온도 예를 들면 약 90℃ 이하의 온도에서 열경화형 수지를 완전히 경화시킨다. 또한, 본 발명의 조성물을 상기 비투수성 글라스 또는 필름 기판에 먼저 전사하고 유기 EL층이 형성된 소자 기판에 중합시키는 것도 가능하다.More specifically, a transparent electrode is formed to a thickness of about 0.1 mu m on a glass or film substrate. In the film formation of a transparent electrode, there is a method by vacuum deposition and sputtering. A hole transporting layer and an organic EL layer are sequentially formed on the transparent electrode at a thickness of about 0.05 μm, respectively, and a back electrode is formed on the organic EL layer at a thickness of about 0.1-0.3 μm. The composition of the present invention is transferred to a laminate or the like on top of the glass or film substrate which has finished film formation of the device. At this time, when the composition of the present invention is transferred to a release film to form a sheet can be easily transferred. Then, a non-permeable glass or film substrate is superimposed on top of the transferred composition. This is heat-compression-bonded using a vacuum laminator apparatus to preliminarily fix the lower glass or film substrate and the upper non-permeable glass or film substrate. Then, the thermosetting resin is completely cured at a curing temperature, for example, about 90 ° C. or less. It is also possible to transfer the composition of the present invention to the above impervious glass or film substrate first and to polymerize the element substrate on which the organic EL layer is formed.
본 발명의 조성물은 약 25℃에서 7일 이상의 보존성을 가질 수 있다.The composition of the present invention may have a shelf life of at least about 7 days at about 25 ℃.
본 발명의 조성물로 제조된 필름 또는 경화물층은 두께를 약 1-100㎛, 더욱 바람직하게는 약 10-50㎛로 하는 것이 좋다. 상기 범위 내에서 2장의 글라스 또는 필름 사이를 쉽게 접착할 수 있다.The film or cured product layer prepared from the composition of the present invention preferably has a thickness of about 1-100 μm, more preferably about 10-50 μm. It is possible to easily bond between two sheets of glass or film within the above range.
상기 조성물은 (A) 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지, (B)필름 형성제 수지, (C)흡착제 및 (D)경화제를 포함할 수 있다. 상기 성분 (A) 내지 (D)에 대한 내용은 상술한 바와 같다.The composition may include (A) an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, (B) film former resin, (C) adsorbent, and (D) hardener. The content about said component (A)-(D) is as having mentioned above.
상기 조성물은 상술된 실란커플링제 및 필러로 이루어진 군으로부터 선택되는 1종 이상을 더 포함할 수 있고, 상술된 첨가제 중 하나 이상을 더 포함할 수 있다.The composition may further include one or more selected from the group consisting of the silane coupling agent and the filler described above, and may further include one or more of the additives described above.
상기 조성물은 당해 분야에서 통상적으로 사용되는 용제 예를 들면 메틸에틸케톤을 포함할 수 있다. 용제는 조성물 중 잔부량으로 포함될 수 있다.The composition may include a solvent commonly used in the art, for example, methyl ethyl ketone. Solvents may be included in the balance in the composition.
본 발명의 또 다른 관점은 유기 EL 디스플레이 장치에 관한 것이다. 상기 장치는 일면에 유기 EL 소자가 형성된 제1 기판;Another aspect of the present invention relates to an organic EL display device. The apparatus includes a first substrate having an organic EL element formed on one surface thereof;
상기 제1 기판 상에 이격되어 배치된 제2 기판; 및A second substrate spaced apart from the first substrate; And
상기 제1 기판과 상기 제2 기판 사이에 배치되어 상기 제1 기판과 상기 제2 기판을 접합시키며, 90℃에서 2시간 동안 경화된 후 50℃ 및 100% 상대습도에서 수분투과율이 약 100g/m2·day 이하인 접착층을 포함할 수 있다.Disposed between the first substrate and the second substrate to bond the first substrate and the second substrate, and cured at 90 ° C. for 2 hours, and then a water transmittance of about 100 g / m at 50 ° C. and 100% relative humidity. It may contain an adhesive layer of 2 · day or less.
도 1을 참조하면, 본 발명의 일 구체예에 따른 유기 EL 디스플레이 장치(1)는 제1 기판(2), 유기 EL 소자(3), 제2 기판(4), 접착층(5)을 포함할 수 있다.Referring to FIG. 1, an organic EL display device 1 according to an embodiment of the present invention may include a first substrate 2, an organic EL element 3, a second substrate 4, and an adhesive layer 5. Can be.
상기 접착층은 90℃에서 2시간 동안 경화된 후 접착층 두께 방향의 수분투과율이 50℃ 및 100% 상대습도에서 약 100g/m2·day 이하가 될 수 있다. 상기 범위 내에서, 수분 차단 효과가 높고 제1 기판과 유기 EL 소자의 박리를 막을 수 있다. 수분투과율은 바람직하게는 50℃ 및 100% 상대습도에서 약 0 초과 50g/m2·day 이하가 될 수 있다.After the adhesive layer is cured at 90 ° C. for 2 hours, the moisture transmittance in the adhesive layer thickness direction may be about 100 g / m 2 · day or less at 50 ° C. and 100% relative humidity. Within this range, the water barrier effect is high and the peeling of the first substrate and the organic EL element can be prevented. Moisture permeability may preferably be greater than about 0 and less than 50 g / m 2 · day at 50 ° C. and 100% relative humidity.
상기 접착층은 상술된 유기 EL 소자용 접착 필름 또는 유기 EL 소자 봉지용 접착제 조성물을 포함할 수 있다.The adhesive layer may include the adhesive film for organic EL device or the adhesive composition for encapsulating the organic EL device described above.
상기 접착층은 두께를 약 1-100㎛, 더욱 바람직하게는 약 10-50㎛로 하는 것이 좋다. 상기 범위 내에서 유기 EL 소자와 봉지용 필름을 잘 접착시킬 수 있다.The adhesive layer may have a thickness of about 1-100 μm, more preferably about 10-50 μm. Within this range, the organic EL device and the sealing film can be adhered well.
상기 제1 기판은 투명 글라스, 필름, 플라스틱 시트, 실리콘 또는 금속 기판 등과 같은 물질로 이루어질 수 있으며, 유연하거나 유연하지 않은 특성 및 투명하거나 또는 투명하지 않은 특성을 가질 수 있다. 상기 제1 기판의 일면에는 한 개 이상의 유기 EL 소자가 형성되어 있다. 유기 EL 소자는 투명 전극, 정공수송층, 유기 EL층 및 배면 전극으로 이루어져 있다.The first substrate may be made of a material such as a transparent glass, a film, a plastic sheet, a silicon or metal substrate, and may have a flexible or non-flexible characteristic and a transparent or non-transparent characteristic. One or more organic EL elements are formed on one surface of the first substrate. The organic EL element is composed of a transparent electrode, a hole transport layer, an organic EL layer and a back electrode.
상기 제2 기판은 유기 EL 소자 상부에 배치되며 상기 제1 기판 상에 이격되어 배치될 수 있고, 상기 접착층에 의해 제1 기판과 접착될 수 있다. 상기 제2 기판은 글라스재 기판 뿐만 아니라 금속이 적층되어 있는 플라스틱 시트 등과 같은 배리어성이 우수한 기판을 사용할 수 있다. The second substrate may be disposed on the organic EL element, spaced apart from the first substrate, and adhered to the first substrate by the adhesive layer. As the second substrate, not only a glass material substrate but also a substrate having excellent barrier properties such as a plastic sheet on which metal is laminated may be used.
상기 제1 기판과 제2 기판 사이 및 유기 EL 소자의 측부에는 제1 기판과 제2 기판을 접착하는 게터(getter)(6)가 형성되어 있을 수 있다.A getter 6 may be formed between the first substrate and the second substrate and on the side of the organic EL element to adhere the first substrate and the second substrate.
본 발명의 또 다른 관점은 유기 EL 디스플레이 장치에 관한 것이다. 상기 장치는 일면에 유기 EL 소자가 형성된 제1 기판;Another aspect of the present invention relates to an organic EL display device. The apparatus includes a first substrate having an organic EL element formed on one surface thereof;
상기 제1 기판 상에 이격되어 배치된 제2 기판; 및A second substrate spaced apart from the first substrate; And
상기 제1 기판과 상기 제2 기판 사이에 배치되어 상기 제1 기판과 상기 제2 기판을 접합시키며, 0℃에서 100℃까지의 열팽창율이 약 100ppm/℃ 이하인 접착층을 포함할 수 있다.The substrate may be disposed between the first substrate and the second substrate to bond the first substrate to the second substrate, and may include an adhesive layer having a thermal expansion rate of about 100 ppm / ° C. or less from 0 ° C. to 100 ° C.
도 1을 참조하면, 본 발명의 일 구체예에 따른 유기 EL 디스플레이 장치(1)는 제1 기판(2), 유기 EL 소자(3), 제2 기판(4), 접착층(5)을 포함할 수 있다.Referring to FIG. 1, an organic EL display device 1 according to an embodiment of the present invention may include a first substrate 2, an organic EL element 3, a second substrate 4, and an adhesive layer 5. Can be.
상기 접착층은 0℃에서 100℃의 온도 범위에서 열팽창율이 약 100ppm/℃ 이하가 될 수 있다. 상기 범위 내에서, 유기 EL 소자의 봉지 공정에 수반되는 고온의 경화 조건에서도 접착층이 휘지 않고, 제1 기판과 유기 EL 소자가 미스얼라인먼트(misalignment) 되지 않는다. 바람직하게는 열팽창율은 약 0 초과 100ppm/℃ 이하, 더 바람직하게는 약 0 초과 51ppm/℃ 이하가 될 수 있다.The adhesive layer may have a thermal expansion rate of about 100 ppm / ° C. or less in a temperature range of 0 ° C. to 100 ° C. Within this range, the adhesive layer does not bend even under high temperature curing conditions accompanying the sealing process of the organic EL element, and the first substrate and the organic EL element are not misaligned. Preferably the coefficient of thermal expansion may be greater than about 0 up to 100 ppm / ° C., more preferably greater than about 0 up to 51 ppm / ° C.
열팽창율은 길이 8.0±0.5mm x 폭 4.8±0.2mm x 두께 0.2±0.1mm의 접착층으로 측정될 수 있다. 먼저 접착층을 구성하는 조성물을 필름화하고 lamination하여 90℃에서 2시간 동안 경화시킨 후, 길이 8.0±0.5mm x 폭4.8±0.2mm x 두께 0.2±0.1mm로 잘라내고 열기계분석측정장치(TMA, Thermal Mechanical Apparatus)를 이용하여 열팽창율을 측정하였다. 시료를 수정 후크(quartz hook)에 걸고 0.05N의 힘을 가한 뒤에 질소 분위기 하에서 -30℃에서 250℃까지 10℃/min으로 가열하였다. 열팽창율은 0℃에서 100℃까지의 온도 범위의 값을 구하였다.The coefficient of thermal expansion may be measured with an adhesive layer having a length of 8.0 ± 0.5 mm × width 4.8 ± 0.2 mm × thickness 0.2 ± 0.1 mm. First, the composition constituting the adhesive layer is filmed and laminated, and cured at 90 ° C. for 2 hours, and then cut into a length of 8.0 ± 0.5mm × width 4.8 ± 0.2mm × thickness 0.2 ± 0.1mm and a thermomechanical analyzer (TMA, Thermal expansion coefficient was measured using Thermal Mechanical Apparatus). The sample was hooked to a quartz hook and subjected to a force of 0.05 N and then heated to 10 ° C./min from −30 ° C. to 250 ° C. under a nitrogen atmosphere. The thermal expansion coefficient calculated | required the value of the temperature range from 0 degreeC to 100 degreeC.
일 구체예에서, 상기 접착층은 90℃에서 2시간 동안 경화시킨 후 접착층 두께 방향의 수분투과율이 50℃ 및 100% 상대습도에서 약 100g/m2·day 이하가 될 수 있다. 상기 범위 내에서, 수분 차단 효과가 높고 제1 기판과 유기 EL 소자의 박리를 막을 수 있다. 수분투과율은 바람직하게는 50℃ 및 100% 상대습도에서 약 0 초과 100g/m2·day 이하, 더욱 바람직하게는 50℃ 및 100% 상대습도에서 약 0 초과 50g/m2·day 이하가 될 수 있다.In one embodiment, the adhesive layer is cured at 90 ℃ for 2 hours, the water transmittance in the adhesive layer thickness direction may be about 100g / m 2 · day or less at 50 ℃ and 100% relative humidity. Within this range, the water barrier effect is high and the peeling of the first substrate and the organic EL element can be prevented. Moisture permeability may preferably be greater than about 0 up to 100 g / m 2 · day at 50 ° C. and 100% relative humidity, more preferably greater than about 50 g / m 2 · day up to 50 ° C. and 100% relative humidity. have.
수분투과율은 두께 약 20-30㎛의 접착층으로 측정될 수 있다. 먼저 접착층을 구성하는 조성물을 상기 두께로 필름화하고, 90℃에서 2시간 동안 경화시킨 후 50℃, 100% 상대습도, 760mmHg 압력 하에서 carrier gas를 질소 가스로 하여 MOCON 테스트로 측정할 수 있지만, 이에 제한되지 않는다. 경화된 후 접착층은 약 10-50㎛, 바람직하게는 약 20-30㎛의 두께를 가질 수 있다.Moisture permeability can be measured with an adhesive layer having a thickness of about 20-30 μm. First, the composition constituting the adhesive layer is filmed to the thickness, and cured at 90 ° C. for 2 hours, and then measured by MOCON test using carrier gas as nitrogen gas under 50 ° C., 100% relative humidity, and 760 mmHg pressure. It is not limited. After curing, the adhesive layer may have a thickness of about 10-50 μm, preferably about 20-30 μm.
일 구체예에서, 상기 접착층은 판상형 필러를 포함할 수 있다.In one embodiment, the adhesive layer may include a plate-shaped filler.
판상형 필러는 물리적 흡착이나 화학적 결합에 의해 흡습성을 부여하거나 화학적 결합에 의해 흡습성을 부여하는 것은 아니다. 그러나, 판상형 필러는 판상 형태로서 고온 조건 하에서도 필름 등의 형태를 갖는 접착층이 열에 의해 팽창하는 것을 차단할 수 있을 뿐만 아니라, 수분의 이동 경로를 차단하거나 이동 경로의 길이를 증가시켜 흡습성을 부여할 수 있다.The plate-shaped filler does not impart hygroscopicity by physical adsorption or chemical bonding or hygroscopicity by chemical bonding. However, the plate-shaped filler may not only prevent the adhesive layer having a form such as a film from expanding under heat as a plate-like form, but also block moisture's movement path or increase its length to impart hygroscopicity. have.
판상형 필러는 길이 약 50nm - 10㎛, 폭 약 50nm - 10㎛, 및 두께 약 50nm - 10㎛의 크기를 갖는 판상 구조물을 포함할 수 있다. 상기 범위 내에서, 열팽창율이 낮고 수분투과율이 낮을 수 있으며, 필름성형성이 좋을 수 있다.The plate-shaped filler may comprise a plate-like structure having a size of about 50 nm-10 μm in length, about 50 nm-10 μm in width, and about 50 nm-10 μm in thickness. Within this range, the coefficient of thermal expansion may be low, the moisture permeability may be low, and film forming may be good.
판상형 필러는 판상 구조물이라면 특별히 제한되지 않지만, 예를 들면, 탈크, 마이카, 판상 규산염, 흑연 및 클레이로 이루어진 군으로부터 선택되는 하나 이상을 포함할 수 있다.The plate-shaped filler is not particularly limited as long as it is a plate-shaped structure, but may include, for example, one or more selected from the group consisting of talc, mica, plate silicate, graphite and clay.
판상형 필러는 접착층 중 고형분 기준으로 약 0.5-40중량%로 포함될 수 있다. 상기 범위 내에서, 수분투과율이 낮아 방습 효과가 있을 수 있고, 필름 성형성이 나빠지지 않는다. 바람직하게는 약 4-20중량%로 포함될 수 있다.The plate-shaped filler may be included at about 0.5-40% by weight based on solids in the adhesive layer. Within this range, the moisture permeability may be low to have a moisture proof effect, and the film formability does not deteriorate. Preferably about 4-20% by weight.
판상형 필러는 상기 서술된 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대하여 약 10-80중량부로 포함될 수 있다. 상기 범위 내에서, 흡습성 효과가 좋고 필름 성형성이 나빠지지 않으며 접착력이 높은 효과가 있을 수 있다. 바람직하게는 약 15-50중량부로 포함될 수 있다.The plate-shaped filler may be included in an amount of about 10-80 parts by weight based on 100 parts by weight of the epoxy resin having a weight average molecular weight of about 50-10,000 g / mol. Within this range, the hygroscopic effect may be good and the film formability does not deteriorate and the adhesive force may have a high effect. Preferably about 15-50 parts by weight.
다른 구체예에서, 상기 접착층은 상기 판상형 필러 이외에도, 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지, 필름 형성제 수지, 및 경화제를 더 포함할 수 있다.In another embodiment, the adhesive layer may further include an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, a film former resin, and a curing agent, in addition to the plate-shaped filler.
상기 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지에 대한 상세 내용은 상술한 바와 같다. 상기 에폭시 수지는 상기 접착층의 고형분 기준으로 약 20-80중량%로 포함될 수 있다. 상기 범위 내에서, 도막 특성과 필름 성형성이 좋을 수 있다. 바람직하게는 약 20-65중량%, 더욱 바람직하게는 약 27-63중량%로 포함될 수 있다.Details of the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol are as described above. The epoxy resin may be included in about 20-80% by weight based on the solids of the adhesive layer. Within this range, coating film properties and film formability may be good. Preferably about 20-65% by weight, more preferably about 27-63% by weight.
상기 필름 형성제 수지에 대한 상세 내용은 상술한 바와 같다. 상기 필름 형성제 수지는 상기 접착층의 고형분 기준으로 약 10-70중량%로 포함될 수 있다. 상기 범위 내에서, 필름 성형성이 좋고 신뢰도가 좋을 수 있다. 바람직하게는 약 20-70중량%, 더욱 바람직하게는 약 25-67중량%로 포함될 수 있다.Details of the film-forming resin are as described above. The film former resin may be included in about 10-70% by weight based on the solids of the adhesive layer. Within this range, the film formability may be good and the reliability may be good. Preferably about 20-70% by weight, more preferably about 25-67% by weight.
상기 필름 형성제 수지는 상기 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대해 약 40-240중량부, 바람직하게는 약 100-200중량부, 더욱 바람직하게는 약 100-150중량부로 포함될 수 있다.The film former resin is about 40-240 parts by weight, preferably about 100-200 parts by weight, more preferably about 100- parts by weight, based on 100 parts by weight of the epoxy resin having the weight average molecular weight of about 50-10,000 g / mol. It may be included in 150 parts by weight.
상기 경화제에 대한 상세 내용은 상술한 바와 같다. 상기 경화제는 상기 접착층의 고형분 기준으로 약 0.1-10 중량%로 포함될 수 있다. 상기 범위 내에서, 필름 성형성이 좋고 신뢰도가 좋을 수 있다. 바람직하게는 1-10 중량%, 더욱 바람직하게는 약 1-5 중량%로 포함될 수 있다.Details of the curing agent are as described above. The curing agent may be included in about 0.1-10% by weight based on solids of the adhesive layer. Within this range, the film formability may be good and the reliability may be good. Preferably 1-10% by weight, more preferably about 1-5% by weight.
또한, 상기 경화제는 상기 필름 형성제 수지 100중량부에 대해 약 1-20중량부, 바람직하게는 약 1-10중량부, 더욱 바람직하게는 약 1-5중량부로 포함될 수 있다.In addition, the curing agent may be included in about 1-20 parts by weight, preferably about 1-10 parts by weight, more preferably about 1-5 parts by weight based on 100 parts by weight of the film-forming resin.
또 다른 구체예에서, 상기 접착층은 실란커플링제를 더 포함할 수 있다. 상기 실란커플링제는 필름 도막의 특성 및 신뢰도를 증가시킬 수 있다. 상기 실란커플링제에 대한 상세 내용은 상술한 바와 같다. 상기 실란커플링제는 고형분 기준으로 상기 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지 100중량부에 대해 약 0.1-20중량부로 포함될 수 있다.In another embodiment, the adhesive layer may further include a silane coupling agent. The silane coupling agent may increase the properties and reliability of the film coating film. Details of the silane coupling agent are as described above. The silane coupling agent may be included in an amount of about 0.1-20 parts by weight based on 100 parts by weight of the epoxy resin having a weight average molecular weight of about 50-10,000 g / mol.
또 다른 구체예에서, 상기 접착층은 1종 이상의 첨가제를 더 포함할 수 있다. 첨가제에 대한 상세 내용은 상술한 바와 같다.In another embodiment, the adhesive layer may further include one or more additives. Details of the additives are as described above.
상기 접착층은 하기 기술되는 유기 EL 소자 봉지용 접착제 조성물을 건조 및 라미네이팅시킴으로써 제조될 수 있다. 건조 및 라미네이팅시키는 방법은 특별히 제한되지 않지만, 약 20-80℃에서 약 0.2m/s - 1.5m/s로 건조시키는 방법을 포함할 수 있다.The adhesive layer can be produced by drying and laminating an adhesive composition for sealing an organic EL device described below. Drying and laminating methods are not particularly limited but may include a method of drying at about 20-80 ° C. to about 0.2 m / s-1.5 m / s.
상기 접착층의 두께는 두께를 약 1-100㎛, 더욱 바람직하게는 약 10-50㎛로 하는 것이 좋다. 상기 범위 내에서 유기 EL 소자와 봉지용 필름을 잘 접착시킬 수 있다.The adhesive layer may have a thickness of about 1-100 μm, more preferably about 10-50 μm. Within this range, the organic EL device and the sealing film can be adhered well.
상기 제1 기판, 제 2기판에 대한 상세 내용은 상술한 바와 같다. 상기 제1 기판과 제2 기판 사이 및 유기 EL 소자의 측부에는 제1 기판과 제2 기판을 접착하는 게터(getter)(6)가 형성되어 있을 수 있다.Details of the first substrate and the second substrate are as described above. A getter 6 may be formed between the first substrate and the second substrate and on the side of the organic EL element to adhere the first substrate and the second substrate.
본 발명의 또 다른 관점은 유기 EL 소자 봉지용 접착제 조성물에 관한 것이다. Another aspect of the present invention relates to an adhesive composition for sealing an organic EL device.
상기 조성물은 25℃에서는 비유동성을 나타내는 필름 상으로 존재하고 50-100℃로 가열하면 유동성과 점착성을 발현하여 제1 기판 상에 형성된 유기 EL 소자와, 제2 기판과의 사이를 봉지할 수 있다.The composition may be present on a film exhibiting non-flowability at 25 ° C. and heated at 50-100 ° C. to express fluidity and adhesiveness to encapsulate between the organic EL element formed on the first substrate and the second substrate. .
제1 기판 상에 투명 전극, 정공수송층, 유기 EL층 및 배면 전극으로 이루어진 유기 EL 소자를 형성하고, 그 위에 본 발명의 조성물을 열전사하고, 제2 기판과 가열하면서 접합시켜 봉지할 수 있다. 또는 제2 기판에 본 발명의 조성물을 열전사하고, 유기 EL 소자를 형성한 제1 기판에 가열하면서 접합시켜 봉지할 수도 있다.An organic EL element composed of a transparent electrode, a hole transport layer, an organic EL layer, and a back electrode can be formed on the first substrate, and the composition of the present invention can be thermally transferred, bonded to the second substrate, and joined to be sealed. Alternatively, the composition of the present invention can be thermally transferred to a second substrate, and bonded to and sealed with a first substrate on which an organic EL element is formed.
보다 구체적으로, 제1 기판 상에 투명 전극을 약 0.1㎛의 두께로 성막한다. 투명 전극의 성막에 있어서는 진공증착 및 스퍼터링에 의한 방법이 있다. 투명 전극의 상부에 정공수송층과 유기 EL층을 각각 약 0.05㎛의 두께로 순차적으로 성막하고 유기 EL 층의 상부에 배면 전극을 약 0.1-0.3㎛의 두께로 성막한다. 소자의 성막을 끝낸 글라스 또는 필름 기판의 상부에 본 발명의 조성물을 라미네이트 등으로 전사한다. 이때, 본 발명의 조성물을 이형 필름 상에 전사하여 시트상으로 형성할 경우 쉽게 전사할 수 있다. 그런 다음, 전사한 조성물의 상부에 제2 기판을 중첩시킨다. 이것을 진공 라미네이터 장치를 사용하여 가열 압착시켜, 하부의 제1 기판과 상부의 제2 기판을 예비 고착시킨다. 그런 다음, 경화 온도 예를 들면 약 90℃ 이하의 온도에서 열경화형 수지를 완전히 경화시킨다. 또한, 상기 조성물을 상기 제2 기판에 먼저 전사하고 유기 EL층이 형성된 제1 기판에 중합시키는 것도 가능하다.More specifically, a transparent electrode is formed to a thickness of about 0.1 mu m on the first substrate. In the film formation of a transparent electrode, there is a method by vacuum deposition and sputtering. A hole transport layer and an organic EL layer are sequentially formed on the transparent electrode at a thickness of about 0.05 μm, respectively, and a back electrode is formed on the organic EL layer at a thickness of about 0.1-0.3 μm. The composition of the present invention is transferred to a laminate or the like on top of the glass or film substrate which has finished film formation of the device. At this time, when the composition of the present invention is transferred to a release film to form a sheet can be easily transferred. Then, the second substrate is superimposed on top of the transferred composition. This is heat-compression-bonded using a vacuum laminator apparatus, and the lower 1st board | substrate and the upper 2nd board | substrate are pre-fixed. Then, the thermosetting resin is completely cured at a curing temperature, for example, about 90 ° C. or less. It is also possible to transfer the composition to the second substrate first and polymerize the first substrate on which the organic EL layer is formed.
상기 조성물은 25℃에서 7일 이상의 보존성을 가질 수 있다.The composition may have a shelf life of 7 days or more at 25 ℃.
상기 조성물로 제조된 필름 또는 경화물층은 두께를 약 1-100㎛, 더욱 바람직하게는 약 10-50㎛로 하는 것이 좋다. 상기 범위 내에서 2장의 글라스 또는 필름 사이를 쉽게 접착할 수 있다.The film or cured product layer prepared from the composition may have a thickness of about 1-100 μm, more preferably about 10-50 μm. It is possible to easily bond between two sheets of glass or film within the above range.
상기 조성물은 (A)판상형 필러, (B)중량평균분자량이 약 50-10,000g/mol인 에폭시 수지, (C)필름 형성제 수지 및 (D)경화제를 포함할 수 있다. 상기 성분 (A) 내지 (D)에 대한 상세한 내용은 상술한 바와 같다.The composition may include (A) a plate-shaped filler, (B) an epoxy resin having a weight average molecular weight of about 50-10,000 g / mol, (C) film former resin, and (D) hardener. Details of the above components (A) to (D) are as described above.
상기 판상형 필러는 상기 조성물의 고형분 기준으로 약 0.5-40중량%로 포함될 수 있다. 상기 범위 내에서, 상온 안정성이 좋고 필름 성형성이 좋을 수 있다. 바람직하게는 약 4-20중량%로 포함될 수 있다.The plate-shaped filler may be included in about 0.5-40% by weight based on solids of the composition. Within this range, room temperature stability may be good and film formability may be good. Preferably about 4-20% by weight.
상기 중량평균분자량이 약 50-10,000g/mol인 에폭시 수지는 상기 조성물의 고형분 기준으로 약 20-80중량%로 포함될 수 있다. 상기 범위 내에서, 도막 특성과 필름 성형성이 좋을 수 있다. 바람직하게는 약 20-65중량%, 더욱 바람직하게는 약 27-63중량%로 포함될 수 있다.The epoxy resin having a weight average molecular weight of about 50-10,000 g / mol may be included in an amount of about 20-80 wt% based on the solids content of the composition. Within this range, coating film properties and film formability may be good. Preferably about 20-65% by weight, more preferably about 27-63% by weight.
상기 필름 형성제 수지는 상기 조성물의 고형분 기준으로 약 10-70중량%로 포함될 수 있다. 상기 범위 내에서, 필름 성형성이 좋고 신뢰도가 좋을 수 있다. 바람직하게는 약 20-70중량%, 더욱 바람직하게는 약 25-67중량%로 포함될 수 있다.The film former resin may be included in about 10-70% by weight based on solids of the composition. Within this range, the film formability may be good and the reliability may be good. Preferably about 20-70% by weight, more preferably about 25-67% by weight.
상기 경화제는 상기 조성물의 고형분 기준으로 약 0.1-10중량%로 포함될 수 있다. 상기 범위 내에서, 필름 성형성이 좋고 신뢰도가 좋을 수 있다. 바람직하게는 약 1-10중량%, 더욱 바람직하게는 약 1-5중량%로 포함될 수 있다.The curing agent may be included in about 0.1-10% by weight based on solids of the composition. Within this range, the film formability may be good and the reliability may be good. Preferably about 1-10% by weight, more preferably about 1-5% by weight.
상기 조성물은 상술된 실란커플링제를 더 포함할 수 있고, 상술된 첨가제 중 하나 이상을 더 포함할 수 있다.The composition may further comprise the silane coupling agent described above, and may further comprise one or more of the additives described above.
이하, 본 발명의 바람직한 실시예를 통해 본 발명의 구성 및 작용을 더욱 상세히 설명하기로 한다. 다만, 이는 본 발명의 바람직한 예시로 제시된 것이며 어떠한 의미로도 이에 의해 본 발명이 제한되는 것으로 해석될 수는 없다.Hereinafter, the configuration and operation of the present invention through the preferred embodiment of the present invention will be described in more detail. However, this is presented as a preferred example of the present invention and in no sense can be construed as limiting the present invention.
여기에 기재되지 않은 내용은 이 기술 분야에서 숙련된 자이면 충분히 기술적으로 유추할 수 있는 것이므로 그 설명을 생략하기로 한다.Details that are not described herein will be omitted since those skilled in the art can sufficiently infer technically.
하기 실시예와 비교예에서 사용된 성분의 구체적인 사양은 다음과 같다. Specific specifications of the components used in the following Examples and Comparative Examples are as follows.
(1)중량평균분자량이 50-10,000g/mol인 에폭시 수지로 YDF-8170(TOHTO)(에폭시 당량 159g/g-eq., Mw. 318g/mol)을 사용하였다.(1) YDF-8170 (TOHTO) (epoxy equivalent 159 g / g-eq., Mw. 318 g / mol) was used as an epoxy resin having a weight average molecular weight of 50-10,000 g / mol.
(2)필름 형성제 수지로 중량평균분자량이 10,000-500,000g/mol인 에폭시 수지인 E-4275(JER)(Mw. 74,000g/mol)를 사용하였다.(2) E-4275 (JER) (Mw. 74,000 g / mol), an epoxy resin having a weight average molecular weight of 10,000-500,000 g / mol, was used as the film-forming resin.
(3)흡착제로 제올라이트(Aldrich)를 사용하였다. (3) Zeolite (Aldrich) was used as the adsorbent.
(4)판상형 필러로 D-1000(Nippon talc)을 사용하였다.(4) D-1000 (Nippon talc) was used as a plate-shaped filler.
(5)경화제로 경화제 1인 2P4MZ(Shikoku)(2-phenyl-4-methylimidazole), 경화제 2인 2P4MHZ(Shikoku)(2-phenyl-4-methyl-5-hydoxymethylimidazole)를 사용하였다.(5) As a curing agent, 2P4MZ (Shikoku) (2-phenyl-4-methylimidazole), which is a curing agent 1, and 2P4MHZ (Shikoku) (2-phenyl-4-methyl-5-hydoxymethylimidazole), which was a curing agent 2, were used.
실시예 1-4Example 1-4
메틸에틸케톤에 필름 형성제 수지를 분산시켜 고형분을 하기 표 1에 기재된 함량으로 하여 혼합하였다. 그런 다음, 중량평균분자량이 50-10,000g/mol인 에폭시 수지, 흡착제, 경화제를 하기 표 1에 기재된 함량으로 첨가하였다. 플레네터리 믹서(planetary mixer)와 3-롤 밀(roll mill)을 사용하여 분산시켰다. 어플리케이터로 도막을 형성하고 건조 및 라미네이트시켜 두께 20㎛의 접착 필름을 제조하였다.The film-forming resin was dispersed in methyl ethyl ketone and the solid content was mixed in the amount shown in Table 1 below. Then, an epoxy resin, an adsorbent, and a curing agent having a weight average molecular weight of 50-10,000 g / mol were added in the amounts shown in Table 1 below. Dispersion was carried out using a planetary mixer and a 3-roll mill. A coating film was formed with an applicator, dried and laminated to prepare an adhesive film having a thickness of 20 μm.
실시예 5-8Example 5-8
메틸에틸케톤에 필름 형성제 수지와 판상형 필러를 각각 분산시켜 고형분을 하기 표 2에 기재된 함량으로 하여 혼합하였다. 그런 다음, 얻은 용액을 혼합하고, 에폭시 수지, 경화제를 하기 표 2에 기재된 함량으로 첨가하였다. 플레네터리 믹서(planetary mixer)와 3-롤 밀(roll mill)을 사용하여 분산시켰다. 어플리케이터로 도막을 형성하고 건조 및 라미네이트시켜 두께 20㎛의 접착층을 제조하였다.The film-forming resin and the plate-shaped filler were dispersed in methyl ethyl ketone, respectively, and the solids were mixed in the amounts shown in Table 2 below. Then, the obtained solution was mixed and an epoxy resin and a curing agent were added in the amounts shown in Table 2 below. Dispersion was carried out using a planetary mixer and a 3-roll mill. A coating film was formed with an applicator, dried and laminated to prepare an adhesive layer having a thickness of 20 μm.
비교예 1Comparative Example 1
상기 실시예 1-4에서 중량평균분자량이 50-10,000g/mol인 에폭시 수지, 필름 형성제 수지, 흡착제, 경화제를 하기 표 1에 기재된 함량으로 변경한 것을 제외하고는 동일한 방법을 실시하여 두께 20㎛의 접착 필름을 제조하였다.In Example 1-4, except that the weight average molecular weight of 50-10,000 g / mol epoxy resin, film former resin, adsorbent, curing agent was changed to the content shown in Table 1 below, the same method was carried out to a thickness of 20 A micrometer adhesive film was prepared.
비교예 2Comparative Example 2
상기 실시예 5-8에서 에폭시 수지, 필름 형성제 수지, 경화제를 하기 표 2에 기재된 함량으로 변경한 것을 제외하고는 동일한 방법을 실시하여 두께 20㎛의 접착층을 제조하였다.An adhesive layer having a thickness of 20 μm was prepared in the same manner as in Example 5-8, except that the epoxy resin, the film former resin, and the curing agent were changed to the contents shown in Table 2 below.
실험예 1: 접착 필름의 물성 평가Experimental Example 1: Evaluation of Physical Properties of Adhesive Film
상기 실시예 1-4와 비교예 1에서 제조된 접착 필름을 시료로 하고, 물성을 평가하여 하기 표 1에 기재하였다.The adhesive films prepared in Examples 1-4 and Comparative Example 1 were used as samples, and the physical properties thereof were evaluated and listed in Table 1 below.
<물성측정방법><Measurement of Properties>
(1)수분투과율: 90℃에서 2시간 동안 열경화시킨 후, 두께 20㎛의 필름에 대해 50℃, 상대습도 100%, 760mmHg 압력 하에서 carrier gas로 질소 가스를 사용하여 MOCON 테스트를 하였다.(1) Moisture permeability: After heat curing at 90 ℃ for 2 hours, the film was 20㎛ thickness MOCON test using nitrogen gas as a carrier gas under 50 ℃, 100% relative humidity, 760mmHg pressure.
(2)도막상태:제조된 필름의 25℃에서 tack 발생 및 유동 여부를 확인하였다. tack은 두께 20㎛로 제조된 필름의 표면을 CHEMILAB의 TOPTAC 2000A로 tack 시험한다. 25℃에서 tack이 100gf 이하이거나 유동이 없는 경우 ○, 25℃에서 tack이 100gf 초과하는 경우 ×로 평가하였다.(2) Coating state: It was confirmed whether tack generation and flow of the produced film at 25 ℃. The tack is tack-tested the surface of a film made with a thickness of 20 ㎛ with TOPTAC 2000A of CHEMILAB. When the tack is less than 100gf or no flow at 25 ℃, ○, when the tack exceeds 100gf at 25 ℃ was evaluated as ×.
(3)경화후 DSS(die shear strength): 상기 제조된 20㎛ 두께의 필름을 5mmx5mm 유리 기판에 라미네이션(접착조건 120℃ 5kgf, 5초)하고 100℃에서 2시간 동안 경화시킨 후 DAGE 4000(DAGE90 社)로 die shear strength를 측정하였다.(3) DSS (die shear strength) after curing: Laminated film (20㎛ thickness 5 5, 5 seconds) to the film thickness of the prepared 20㎛ thick substrate and cured for 2 hours at 100 ℃ DAGE 4000 (DAGE90社) was measured the die shear strength.
(4)신뢰성평가 후 DSS: 위 (3)번 측정방법과 동일하게 제조된 샘플을 85℃ 및 85% 상대습도에서 24시간 동안 유지한 후 DAGE 4000으로 die shear strength를 측정하였다.(4) DSS after reliability evaluation: After maintaining the sample prepared in the same manner as the measurement method (3) above at 85 ℃ and 85% relative humidity for 24 hours, the die shear strength was measured by DAGE 4000.
(5)인장강도: 상기 필름에 대해서 100℃에서 2시간 동안 경화시킨 후 폭 8mm, 두께 20㎛의 필름에 대해 UTM tensile strength 측정 방법으로 측정하였다.(5) Tensile strength: The film was cured at 100 ° C. for 2 hours, and then measured by UTM tensile strength measuring method for a film having a width of 8 mm and a thickness of 20 μm.
(6)필름 사용가능성:유기 EL 소자 봉지 용도로 사용가능한 경우 ○, 부분적으로 사용가능한 경우 △, 사용이 불가한 경우 ×로 평가하였다.(6) Film usability: When it can be used for organic electroluminescent element sealing use, it evaluated as (circle), (triangle | delta) when it can be used partially, and × when it cannot use.
표 1
실시예 1 실시예 2 실시예 3 실시예 4 비교예 1
중량평균분자량이 50-10,000g/mol인 에폭시 수지 (중량부) 100 100 100 100 100
필름 형성제 수지(중량부) 100 100 50 240 100
흡착제(중량부) 15 50 15 15 -
경화제(중량부) 경화제 1 1 1 1 1 1
경화제 2 4 4 4 4 4
수분투과율(g/m2·day) 37 29 36 43 378
도막상태
경화후 DSS(kgf) 76 72 80 64 73
신뢰성 평가 후 DSS(kgf) 63 69 68 48 52
인장 강도(N/mm2) 24.1 23.6 23.9 19.8 21.3
사용 가능성 ×
Table 1
Example 1 Example 2 Example 3 Example 4 Comparative Example 1
Epoxy resin with a weight average molecular weight of 50-10,000 g / mol (parts by weight) 100 100 100 100 100
Film former resin (weight part) 100 100 50 240 100
Adsorbent (part by weight) 15 50 15 15 -
Curing agent (part by weight) Curing agent 1 One One One One One
Hardener 2 4 4 4 4 4
Moisture permeability (g / m 2 · day) 37 29 36 43 378
Coating state
DSS after hardening (kgf) 76 72 80 64 73
DSS (kgf) after reliability evaluation 63 69 68 48 52
Tensile Strength (N / mm 2 ) 24.1 23.6 23.9 19.8 21.3
Availability ×
상기 표 1에서 나타난 바와 같이, 흡착제를 포함하지 않는 필름 대비 본 발명의 흡착제를 포함하는 필름은 수분 투과율이 낮고 도막 상태가 양호하며 접착력이 좋고 필름으로서의 사용 가능성이 높음을 알 수 있다(비교예 1 참조).As shown in Table 1, the film containing the adsorbent of the present invention compared to the film not containing the adsorbent has a low moisture permeability, a good coating state, good adhesion and high usability as a film (Comparative Example 1 Reference).
실험예 2: 접착 필름의 물성 평가Experimental Example 2: Evaluation of Physical Properties of Adhesive Film
상기 실시예 5-8과 비교예 2에서 제조된 접착 필름을 시료로 하고, 물성을 평가하여 하기 표 2에 기재하였다.The adhesive films prepared in Examples 5-8 and Comparative Example 2 were used as samples, and physical properties thereof were evaluated, and are shown in Table 2 below.
<물성측정방법><Measurement of Properties>
(1)열팽창율: 먼저 접착층을 구성하는 조성물을 필름화하고 lamination하여 90℃에서 2시간 동안 경화시킨 후, 길이 8.0±0.5mm x 폭4.8±0.2mm x 두께 0.2±0.1mm로 잘라내고 열기계분석측정장치(TMA, Thermal Mechanical Apparatus)를 이용하여 열팽창율을 측정하였다. 시료를 수정 후크(quartz hook)에 걸고 0.05N의 힘을 가한 뒤에 질소 분위기 하에서 -30℃에서 250℃까지 10℃/min으로 가열하였다. 열팽창율은 0℃에서 100℃까지의 온도 범위의 값을 구하였다.(1) Thermal expansion rate: First, the composition constituting the adhesive layer is filmed, laminated, and cured at 90 ° C. for 2 hours, and then cut into 8.0 ± 0.5 mm in length x 4.8 ± 0.2 mm in width x 0.2 ± 0.1 mm in thickness, followed by a thermal system Thermal expansion coefficient was measured using an analytical measuring device (TMA, Thermal Mechanical Apparatus). The sample was hooked to a quartz hook and subjected to a force of 0.05 N and then heated to 10 ° C./min from −30 ° C. to 250 ° C. under a nitrogen atmosphere. The thermal expansion coefficient calculated | required the value of the temperature range from 0 degreeC to 100 degreeC.
(2)수분투과율: 90℃에서 2시간 동안 열경화시킨 후, 두께 20㎛의 필름에 대해 50℃, 상대습도 100%, 760mmHg 압력 하에서 carrier gas로 질소 가스를 사용하여 MOCON 테스트를 하였다.(2) Moisture permeability: After heat curing at 90 ℃ for 2 hours, the MOCON test using a nitrogen gas as a carrier gas under a pressure of 50 ℃, 100% relative humidity, 760mmHg for a film of 20㎛ thickness.
(3)인장강도: 상기 필름에 대해서 90℃에서 2시간 동안 경화시킨 후 폭 8mm, 두께 20㎛의 필름에 대해 UTM tensile strength 측정 방법으로 측정하였다.(3) Tensile strength: The film was cured at 90 ° C. for 2 hours and then measured by UTM tensile strength measuring method for a film having a width of 8 mm and a thickness of 20 μm.
(4)도막상태:제조된 필름의 25℃에서 tack 발생 및 유동 여부를 확인하였다. tack은 두께 20㎛로 제조된 필름의 표면을 CHEMILAB의 TOPTAC 2000A로 tack 시험한다. 25℃에서 tack이 0gf ~ 70gf인 경우 ○, 25℃에서 tack이 70gf ~ 150gf인 경우 △, 25℃에서 tack이 150gf 초과인 경우 ×로 평가하였다.(4) Coating state: It was confirmed whether the tack generation and flow of the produced film at 25 ℃. The tack is tack-tested the surface of a film made with a thickness of 20 ㎛ with TOPTAC 2000A of CHEMILAB. When the tack is 0gf ~ 70gf at 25 ℃, ○, when the tack is 70gf ~ 150gf at 25 ℃, △, × was evaluated when the tack is greater than 150gf at 25 ℃.
(5)경화후 DSS(die shear strength): 상기 제조된 20㎛ 두께의 필름을 5mmx5mm 유리 기판에 라미네이션(접착조건 120℃ 5kgf, 5초)하고 100℃에서 2시간 동안 경화시킨 후 DAGE 4000(DAGE 社)로 die shear strength를 측정하였다.(5) DSS (die shear strength) after hardening: The 20 ㎛ thick film was laminated on a 5 mm x 5 mm glass substrate (adhesive conditions 120 ℃ 5kgf, 5 seconds) and cured for 2 hours at 100 ℃ DAGE 4000 (DAGE社) was measured die shear strength.
(6)신뢰성평가 후 DSS: 위 (5)번 측정방법과 동일하게 제조된 샘플을 85℃ 및 85% 상대습도에서 24시간 동안 유지한 후 DAGE 4000으로 die shear strength를 측정하였다.(6) DSS after reliability evaluation: After maintaining the sample prepared in the same manner as the measurement method (5) above at 85 ℃ and 85% relative humidity for 24 hours, the die shear strength was measured by DAGE 4000.
(7)필름 사용가능성:유기 EL 소자 봉지 용도로 사용가능한 경우 ○, 부분적으로 사용가능한 경우 △, 사용이 불가한 경우 ×로 평가하였다.(7) Film usability: When it can be used for organic electroluminescent element sealing use, it evaluated as (circle), (triangle | delta) when it can be used partially, and × when it cannot use.
표 2
실시예 5 실시예 6 실시예 7 실시예 8 비교예 2
중량평균분자량이 50-10,000g/mol인 에폭시 수지(중량부) 100 100 100 100 100
필름 형성제 수지(중량부) 100 100 50 240 100
판상형 필러(중량부) 15 50 15 15 -
경화제(중량부) 경화제 1 1 1 1 1 1
경화제 2 4 4 4 4 4
열팽창율(ppm/℃) 47 42 46 51 102
수분투과율(g/m2·day) 38 31 36 47 378
도막 상태
인장강도(N/mm2) 25.7 30.2 24.5 21.0 21.3
경화후 DSS(kgf) 75 83 82 69 73
신뢰성 평가 후 DSS(kgf) 66 71 68 51 52
사용가능성 ×
TABLE 2
Example 5 Example 6 Example 7 Example 8 Comparative Example 2
Epoxy resin with a weight average molecular weight of 50-10,000 g / mol (parts by weight) 100 100 100 100 100
Film former resin (weight part) 100 100 50 240 100
Plate-shaped filler (parts by weight) 15 50 15 15 -
Curing agent (part by weight) Curing agent 1 One One One One One
Hardener 2 4 4 4 4 4
Thermal expansion rate (ppm / ℃) 47 42 46 51 102
Moisture permeability (g / m 2 · day) 38 31 36 47 378
Coating state
Tensile Strength (N / mm 2 ) 25.7 30.2 24.5 21.0 21.3
DSS after hardening (kgf) 75 83 82 69 73
DSS (kgf) after reliability evaluation 66 71 68 51 52
Availability ×
상기 표 2에서 나타난 바와 같이, 판상형 필러를 포함하지 않는 접착층 대비 본 발명의 판상형 필러를 포함하는 접착층은 열팽창율과 수분투과율이 낮고 도막 상태가 양호하며 접착력이 좋고 필름으로서의 사용 가능성이 높음을 알 수 있다(실시예 5-8과 비교예 2 참조).As shown in Table 2, it can be seen that the adhesive layer containing the plate-shaped filler of the present invention compared to the adhesive layer not containing the plate-shaped filler has a low thermal expansion and water permeability, a good coating state, good adhesion, and high usability as a film. (See Examples 5-8 and Comparative Example 2.)
이상 첨부된 도면, 실시예 및 표를 참조하여 본 발명의 실시예들을 설명하였으나, 본 발명은 상기 실시예들에 한정되는 것이 아니라 서로 다른 다양한 형태로 제조될 수 있으며, 본 발명이 속하는 기술분야에서 통상의 지식을 가진 자는 본 발명의 기술적 사상이나 필수적인 특징으로 변경하지 않고서 다른 구체적인 형태로 실시될 수 있다는 것을 이해할 것이다. 그러므로 이상에서 기술한 실시예들은 모든 면에서 예시적인 것이며 한정적이 아닌 것으로 이해해야 한다.While the embodiments of the present invention have been described with reference to the accompanying drawings, examples, and tables, the present invention is not limited to the above embodiments, but may be manufactured in various forms, and in the technical field to which the present invention pertains. Those skilled in the art will understand that the present invention may be embodied in other specific forms without changing to the technical spirit or essential features of the present invention. Therefore, it should be understood that the embodiments described above are exemplary in all respects and not restrictive.
본 발명은 유기 EL 소자용 접착 필름, 이에 포함되는 조성물, 및 이를 포함하는 유기 EL 디스플레이 장치를 제공하였다.The present invention provides an adhesive film for an organic EL device, a composition contained therein, and an organic EL display device including the same.

Claims (28)

  1. 흡착제를 포함하고,Contains an adsorbent,
    90℃에서 2시간 동안 경화된 후 50℃ 및 100% 상대습도에서 수분투과율(water vapor transmission rate, WVTR)이 약 100g/m2·day 이하인 유기 EL 소자용 접착 필름.An adhesive film for organic EL device having a water vapor transmission rate (WVTR) of about 100 g / m 2 · day or less at 50 ° C. and 100% relative humidity after curing at 90 ° C. for 2 hours.
  2. 제1항에 있어서, 상기 수분투과율은 약 0 초과 50g/m2·day 이하인 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for organic EL device according to claim 1, wherein the moisture transmittance is greater than about 0 and less than 50 g / m 2 · day.
  3. 제1항에 있어서, 상기 접착 필름은 90℃에서 2시간 동안 경화된 후 두께 약 20㎛-30㎛를 갖는 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for organic EL device according to claim 1, wherein the adhesive film has a thickness of about 20 μm to 30 μm after curing at 90 ° C. for 2 hours.
  4. 제1항에 있어서, 상기 흡착제는 상기 접착 필름 중 고형분 기준으로 약 0.5중량%-40중량%로 포함되는 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for an organic EL device according to claim 1, wherein the adsorbent is included in an amount of about 0.5 wt% to 40 wt% based on solids in the adhesive film.
  5. 제1항에 있어서, 상기 흡착제는 제올라이트, 산화칼슘, 분자체(molecular sieve), 활성탄 및 실리카겔로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for organic EL device according to claim 1, wherein the adsorbent comprises at least one selected from the group consisting of zeolite, calcium oxide, molecular sieve, activated carbon and silica gel.
  6. 제1항에 있어서, 상기 흡착제는 평균 공극 크기가 약 1nm-20nm인 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for organic EL device according to claim 1, wherein the adsorbent has an average pore size of about 1 nm-20 nm.
  7. 제1항에 있어서, 상기 흡착제는 입자 크기가 약 50nm-5㎛인 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for organic EL device according to claim 1, wherein the adsorbent has a particle size of about 50 nm-5 탆.
  8. 제1항에 있어서, 상기 접착 필름은 중량평균분자량이 약 50g/mol-10,000g/mol인 에폭시 수지, 필름 형성제 수지 및 경화제를 더 포함하는 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film of claim 1, wherein the adhesive film further comprises an epoxy resin, a film former resin, and a curing agent having a weight average molecular weight of about 50 g / mol to 10,000 g / mol.
  9. 제8항에 있어서, 상기 필름 형성제 수지는 상기 중량평균분자량이 약 50g/mol-10,000g/mol인 에폭시 수지 100중량부에 대해 약 50중량부-240중량부로 포함되는 것을 특징으로 하는 유기 EL 소자용 접착 필름.9. The organic EL according to claim 8, wherein the film former resin is contained in an amount of about 50 parts by weight to 240 parts by weight based on 100 parts by weight of the epoxy resin having the weight average molecular weight of about 50 g / mol-10,000 g / mol. Adhesive film for the device.
  10. 제8항에 있어서, 상기 필름 형성제 수지는 중량평균분자량이 약 10,000g/mol-500,000g/mol인 에폭시 수지, (메타)아크릴레이트계 수지, 우레탄 (메타)아크릴레이트계 수지, 폴리이미드, 방향족 수지 및 고무로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것을 특징으로 하는 유기 EL 소자용 접착 필름.The method of claim 8, wherein the film-forming resin is an epoxy resin, (meth) acrylate-based resin, urethane (meth) acrylate-based resin, polyimide, having a weight average molecular weight of about 10,000g / mol-500,000g / mol An adhesive film for organic EL devices, characterized by comprising at least one selected from the group consisting of aromatic resins and rubbers.
  11. 제8항에 있어서, 상기 경화제는 반응 개시온도 약 60℃-100℃인 이미다졸 경화제와 반응 개시온도 약 100℃-160℃인 이미다졸 경화제를 포함하는 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for an organic EL device according to claim 8, wherein the curing agent includes an imidazole curing agent having a reaction initiation temperature of about 60 ° C-100 ° C and an imidazole curing agent having a reaction initiation temperature of about 100 ° C-160 ° C.
  12. 제1항에 있어서, 상기 접착 필름은 실란커플링제, 필러, 레벨링제, 소포제, 보존 안정제, 가소제 및 탈크 조정제로 이루어진 군으로부터 선택되는 하나 이상을 더 포함하는 것을 특징으로 하는 유기 EL 소자용 접착 필름.The adhesive film for organic EL device according to claim 1, wherein the adhesive film further comprises at least one selected from the group consisting of a silane coupling agent, a filler, a leveling agent, an antifoaming agent, a storage stabilizer, a plasticizer and a talc adjusting agent. .
  13. 일면에 유기 EL 소자가 형성된 제1 기판;A first substrate having an organic EL element formed on one surface thereof;
    상기 제1 기판 상에 이격되어 배치된 제2 기판; 및A second substrate spaced apart from the first substrate; And
    상기 제1 기판과 상기 제2 기판 사이에 배치되어 상기 제1 기판과 상기 제2 기판을 접합시키며, 90℃에서 2시간 동안 경화된 후 50℃ 및 100% 상대습도에서 수분투과율이 약 100g/m2·day 이하이며, 흡습제를 포함하는 접착층을 포함하는 유기 EL 디스플레이 장치.Disposed between the first substrate and the second substrate to bond the first substrate and the second substrate, and cured at 90 ° C. for 2 hours, and then a water transmittance of about 100 g / m at 50 ° C. and 100% relative humidity. The organic electroluminescence display which is 2 or less days and contains the adhesive layer containing a moisture absorbent.
  14. 일면에 유기 EL 소자가 형성된 제1 기판;A first substrate having an organic EL element formed on one surface thereof;
    상기 제1 기판 상에 이격되어 배치된 제2 기판; 및A second substrate spaced apart from the first substrate; And
    상기 제1 기판과 상기 제2 기판 사이에 배치되어 상기 제1 기판과 상기 제2 기판을 접합시키며, 0℃에서 100℃까지의 열팽창율이 약 100ppm/℃ 이하인 접착층을 포함하는 유기 EL 디스플레이 장치.And an adhesive layer disposed between the first substrate and the second substrate to bond the first substrate and the second substrate, wherein the adhesive layer has a thermal expansion coefficient of about 100 ppm / 占 폚 or less from 0 占 폚 to 100 占 폚.
  15. 제14항에 있어서, 상기 열팽창율은 약 0 초과 51ppm/℃ 이하인 것을 특징으로 하는 유기 EL 디스플레이 장치.The organic EL display device according to claim 14, wherein the coefficient of thermal expansion is greater than about 0 and 51 ppm / ° C or less.
  16. 제14항에 있어서, 상기 접착층은 90℃에서 2시간 동안 경화된 후 접착층 두께 방향의 수분투과율이 50℃ 및 100% 상대습도에서 약 100g/m2·day 이하인 것을 특징으로 하는 유기 EL 디스플레이 장치.15. The organic EL display device according to claim 14, wherein the adhesive layer is cured at 90 ° C for 2 hours, and then the moisture transmittance in the adhesive layer thickness direction is about 100 g / m 2 · day or less at 50 ° C and 100% relative humidity.
  17. 제16항에 있어서, 상기 접착층은 90℃에서 2시간 동안 경화된 후 두께 약 10㎛-50㎛를 갖는 것을 특징으로 하는 유기 EL 디스플레이 장치.The organic EL display device according to claim 16, wherein the adhesive layer has a thickness of about 10 µm to 50 µm after curing at 90 ° C. for 2 hours.
  18. 제14항에 있어서, 상기 접착층은 판상형 필러를 포함하는 것을 특징으로 하는 유기 EL 디스플레이 장치.The organic EL display device according to claim 14, wherein the adhesive layer includes a plate-shaped filler.
  19. 제18항에 있어서, 상기 판상형 필러는 길이 약 50nm - 10㎛, 폭 약 50nm - 10㎛, 및 두께 약 50nm - 10㎛를 갖는 것을 특징으로 하는 유기 EL 디스플레이 장치.19. The organic EL display device according to claim 18, wherein the plate-shaped filler has a length of about 50 nm-10 mu m, a width of about 50 nm-10 mu m, and a thickness of about 50 nm-10 mu m.
  20. 제18항에 있어서, 상기 판상형 필러는 상기 접착층의 고형분 기준으로 약 0.5중량%-40중량%로 포함되는 것을 특징으로 하는 유기 EL 디스플레이 장치.19. The organic EL display device according to claim 18, wherein the plate-shaped filler is contained at about 0.5% by weight to 40% by weight based on solids of the adhesive layer.
  21. 제18항에 있어서, 상기 판상형 필러는 탈크, 마이카, 판상 규산염, 흑연 및 클레이로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것을 특징으로 하는 유기 EL 디스플레이 장치.19. The organic EL display device according to claim 18, wherein the plate-shaped filler comprises at least one selected from the group consisting of talc, mica, plate silicate, graphite and clay.
  22. 제18항에 있어서, 상기 접착층은 중량평균분자량이 약 50g/mol-10,000g/mol인 에폭시 수지, 필름 형성제 수지 및 경화제를 더 포함하는 것을 특징으로 하는 유기 EL 디스플레이 장치.19. The organic EL display device according to claim 18, wherein the adhesive layer further comprises an epoxy resin, a film former resin and a curing agent having a weight average molecular weight of about 50 g / mol-10,000 g / mol.
  23. 제22항에 있어서, 상기 에폭시 수지는 염소 이온이 약 0 초과 내지 500ppm 이하인 것을 특징으로 하는 유기 EL 디스플레이 장치.The organic EL display device according to claim 22, wherein the epoxy resin has a chlorine ion of greater than about 0 to 500 ppm or less.
  24. 제22항에 있어서, 상기 필름 형성제 수지는 중량평균분자량이 약 10,000g/mol-500,000g/mol인 에폭시 수지, (메타)아크릴레이트계 수지, 우레탄 (메타)아크릴레이트계 수지, 폴리이미드, 방향족 수지 및 고무로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것을 특징으로 하는 유기 EL 디스플레이 장치.The method of claim 22, wherein the film-forming resin is an epoxy resin, a (meth) acrylate-based resin, a urethane (meth) acrylate-based resin, a polyimide, having a weight average molecular weight of about 10,000 g / mol-500,000 g / mol An organic EL display device comprising at least one selected from the group consisting of aromatic resins and rubbers.
  25. 제22항에 있어서, 상기 경화제는 반응 개시온도 약 60℃-100℃인 이미다졸 경화제와 반응 개시온도 약 100℃-160℃인 이미다졸 경화제를 포함하는 것을 특징으로 하는 유기 EL 디스플레이 장치.The organic EL display device according to claim 22, wherein the curing agent comprises an imidazole curing agent having a reaction initiation temperature of about 60 ° C-100 ° C and an imidazole curing agent having a reaction initiation temperature of about 100 ° C-160 ° C.
  26. 제22항에 있어서, 상기 필름형성제 수지는 상기 접착층의 고형분 기준으로 약 10중량%-70중량%로 포함되는 것을 특징으로 하는 유기 EL 디스플레이 장치.23. The organic EL display device according to claim 22, wherein the film former resin is contained in an amount of about 10 wt% to 70 wt% based on solids of the adhesive layer.
  27. 제18항에 있어서, 상기 접착층은 실란커플링제, 레벨링제, 소포제, 보존 안정제, 가소제 및 탈크 조정제로 이루어진 군으로부터 선택되는 하나 이상을 더 포함하는 것을 특징으로 하는 유기 EL 디스플레이 장치.19. The organic EL display device according to claim 18, wherein the adhesive layer further comprises at least one selected from the group consisting of a silane coupling agent, a leveling agent, an antifoaming agent, a storage stabilizer, a plasticizer and a talc adjusting agent.
  28. 제13항 또는 제14항에 있어서, 상기 장치는 게터(getter)를 더 포함하는 것을 특징으로 하는 유기 EL 디스플레이 장치.The organic EL display device according to claim 13 or 14, wherein the device further comprises a getter.
PCT/KR2012/000305 2011-04-26 2012-01-12 Adhesive film for an organic el device, composition included therein, and organic el display device including same WO2012148071A2 (en)

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KR1020110039178A KR101374370B1 (en) 2011-04-26 2011-04-26 An adhesive film for organic EL device, a composition for the same, and organic EL display device comprising the same
KR1020110039180A KR101397692B1 (en) 2011-04-26 2011-04-26 Organic EL display device and an adhesive composition for the same
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KR10-2011-0039180 2011-04-26

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CN104293264A (en) * 2014-09-17 2015-01-21 明光市锐创电气有限公司 High-strength metal glue

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JP2009076436A (en) * 2007-08-31 2009-04-09 Fujifilm Corp Sealing method for environment-sensitive device, and image display element
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CN104293264A (en) * 2014-09-17 2015-01-21 明光市锐创电气有限公司 High-strength metal glue

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