WO2012124974A3 - 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법 - Google Patents
그래핀 필름 제조 장치 및 그래핀 필름 제조 방법 Download PDFInfo
- Publication number
- WO2012124974A3 WO2012124974A3 PCT/KR2012/001829 KR2012001829W WO2012124974A3 WO 2012124974 A3 WO2012124974 A3 WO 2012124974A3 KR 2012001829 W KR2012001829 W KR 2012001829W WO 2012124974 A3 WO2012124974 A3 WO 2012124974A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- raw material
- gas
- manufacturing
- graphene film
- fluid raw
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/18—Stationary reactors having moving elements inside
- B01J19/1887—Stationary reactors having moving elements inside forming a thin film
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/18—Stationary reactors having moving elements inside
- B01J19/22—Stationary reactors having moving elements inside in the form of endless belts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/182—Graphene
- C01B32/184—Preparation
- C01B32/186—Preparation by chemical vapour deposition [CVD]
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
- C23C16/4557—Heated nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Manufacturing & Machinery (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
본 발명은 탄소를 함유하는 원료 유체를 공급하는 원료 유체 공급부, 상기 원료 유체 공급부로부터 상기 원료 유체를 공급 받아 상기 원료 유체를 열 분해하여 분출하는 기체 분출부, 상기 기체 분출부로부터 분출된 기체와 접하도록 배치된 촉매 기판 및 적어도 상기 분출된 기체와 접하는 촉매 기판의 영역을 국부적으로 가열하도록 배치된 가열 장치를 포함하는 그래핀 필름 제조 장치를 제공한다.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201280024034.3A CN103534206B (zh) | 2011-03-17 | 2012-03-14 | 石墨烯薄膜制造装置及石墨烯薄膜制造方法 |
US14/005,670 US20140023783A1 (en) | 2011-03-17 | 2012-03-14 | Apparatus for manufacturing graphene film and method for manufacturing graphene film |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2011-0023828 | 2011-03-17 | ||
KR20110023828 | 2011-03-17 | ||
KR10-2012-0024453 | 2012-03-09 | ||
KR1020120024453A KR101806916B1 (ko) | 2011-03-17 | 2012-03-09 | 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012124974A2 WO2012124974A2 (ko) | 2012-09-20 |
WO2012124974A3 true WO2012124974A3 (ko) | 2012-11-08 |
Family
ID=46831206
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2012/001829 WO2012124974A2 (ko) | 2011-03-17 | 2012-03-14 | 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법 |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2012124974A2 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020187896A1 (en) * | 2019-03-18 | 2020-09-24 | The 280 Company | System and process for manufacturing a graphene layer on a substrate |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060052662A (ko) * | 2003-03-24 | 2006-05-19 | 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 | 카본 나노 구조물의 고효율 합성 방법, 장치 및 카본 나노구조물 |
JP2009091174A (ja) * | 2007-10-04 | 2009-04-30 | Univ Of Fukui | グラフェンシートの製造方法 |
KR20090043418A (ko) * | 2007-10-29 | 2009-05-06 | 삼성전자주식회사 | 그라펜 시트 및 그의 제조방법 |
JP2010269944A (ja) * | 2009-05-19 | 2010-12-02 | Nippon Telegr & Teleph Corp <Ntt> | グラファイト薄膜の製造方法および製造装置 |
-
2012
- 2012-03-14 WO PCT/KR2012/001829 patent/WO2012124974A2/ko active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060052662A (ko) * | 2003-03-24 | 2006-05-19 | 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 | 카본 나노 구조물의 고효율 합성 방법, 장치 및 카본 나노구조물 |
JP2009091174A (ja) * | 2007-10-04 | 2009-04-30 | Univ Of Fukui | グラフェンシートの製造方法 |
KR20090043418A (ko) * | 2007-10-29 | 2009-05-06 | 삼성전자주식회사 | 그라펜 시트 및 그의 제조방법 |
JP2010269944A (ja) * | 2009-05-19 | 2010-12-02 | Nippon Telegr & Teleph Corp <Ntt> | グラファイト薄膜の製造方法および製造装置 |
Also Published As
Publication number | Publication date |
---|---|
WO2012124974A2 (ko) | 2012-09-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2012015267A3 (ko) | 그래핀의 제조 방법, 그래핀 시트 및 이를 이용한 소자 | |
WO2012150763A3 (ko) | 연속적인 열처리 화학 기상 증착 방법을 이용한 고품질 그래핀 제조 방법 | |
WO2012008789A3 (ko) | 그래핀의 저온 제조 방법, 및 이를 이용한 그래핀 직접 전사 방법 및 그래핀 시트 | |
WO2012059726A3 (en) | Apparatus for generating hydroxyl radicals | |
WO2011088250A3 (en) | Method and apparatus for electrical control of heat transfer | |
UA112456C2 (uk) | Аерозолеутворювальний виріб для використання з пристроєм для утворення аерозолю | |
TW201130073A (en) | Coating and developing apparatus and coating and developing method | |
MX360006B (es) | Método y sistemas para formar nanotubos de carbono. | |
PH12014501190A1 (en) | Method and apparatus for cleaning a heating element of aerosol generating device | |
WO2013006524A3 (en) | Apparatus and method to separate carrier liquid vapor from ink | |
WO2012118350A3 (ko) | 그래핀의 n-도핑 방법 | |
WO2013004398A3 (de) | Verfahren zur parallelen herstellung von wasserstoff und kohlenstoffhaltigen produkten | |
WO2010101369A3 (ko) | 가스 분배 장치 및 이를 구비하는 기판 처리 장치 | |
WO2012078564A3 (en) | Process for transferring heat or modifying a tube in a heat exchanger | |
PL2506907T3 (pl) | Urządzenie do regulowanego dostarczania gazu, zwłaszcza urządzenie do wspomagania oddychania | |
WO2013015605A3 (en) | Method of producing aromatic hydrocarbons from byproducts of aromatic carboxylic acid and/or aromatic carboxylic acid alkylester preparation processes | |
WO2012134070A3 (ko) | 가스 주입 장치, 원자층 증착장치 및 이 장치를 이용한 원자층 증착방법 | |
WO2013182840A3 (en) | Process and apparatus for thermochemical conversion | |
MY160227A (en) | Method for treating a natural gas containing carbon dioxide | |
WO2012148830A8 (en) | High temperature platformer | |
MY171440A (en) | Energy recovery system and method and polymerization plant with such a recovery system | |
WO2012124974A3 (ko) | 그래핀 필름 제조 장치 및 그래핀 필름 제조 방법 | |
WO2013064737A3 (en) | Apparatus and method for processing substrate | |
MX2013005586A (es) | Produccion de acido acetico con una tasa de produccion aumentada. | |
FR2934507B1 (fr) | Dispositif de chauffage d'un jet de gouttes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 12758330 Country of ref document: EP Kind code of ref document: A2 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14005670 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 12758330 Country of ref document: EP Kind code of ref document: A2 |