WO2012102473A3 - 유기 led 의 산란층 및 평탄화층 형성용 바인더 및 상기 바인더를 포함하는 산란층 형성용 조성물 및 평탄화층 형성용 조성물 - Google Patents

유기 led 의 산란층 및 평탄화층 형성용 바인더 및 상기 바인더를 포함하는 산란층 형성용 조성물 및 평탄화층 형성용 조성물 Download PDF

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WO2012102473A3
WO2012102473A3 PCT/KR2011/008972 KR2011008972W WO2012102473A3 WO 2012102473 A3 WO2012102473 A3 WO 2012102473A3 KR 2011008972 W KR2011008972 W KR 2011008972W WO 2012102473 A3 WO2012102473 A3 WO 2012102473A3
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forming
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WO2012102473A2 (ko
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박장우
송세호
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주식회사 나노신소재
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Publication of WO2012102473A2 publication Critical patent/WO2012102473A2/ko
Publication of WO2012102473A3 publication Critical patent/WO2012102473A3/ko

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/80Constructional details
    • H10K50/85Arrangements for extracting light from the devices
    • H10K50/854Arrangements for extracting light from the devices comprising scattering means
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/26Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen nitrogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/06Polysiloxanes containing silicon bound to oxygen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • C08L83/08Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301Details of OLEDs
    • H10K2102/331Nanoparticles used in non-emissive layers, e.g. in packaging layer

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Silicon Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

본 발명은, 하기 화학식1로 표시되는 화합물을 축중합하여 제조되는 중량평균분자량이 2,000 내지 50,000인 실란 화합물을 포함하는 유기 LED의 산란층 및 평탄화층 형성용 바인더를 제공한다: [화학식1] RxSi(OR')4-x 상기 식에서 x는 0 ~ 3의 정수이고, R은 C1~C10의 탄화수소기 이거나, 에폭시기, 히드록시기, 아민기 및 아크릴레이트기로 이루어진 군으로부터 선택되는 하나 이상의 치환기를 갖는 C1~C10의 탄화수소기이고, R'은 CnH2n+1의 화학식을 갖는 알킬기이며, 여기서 n은 1~10의 정수이다.
PCT/KR2011/008972 2011-01-26 2011-11-23 유기 led 의 산란층 및 평탄화층 형성용 바인더 및 상기 바인더를 포함하는 산란층 형성용 조성물 및 평탄화층 형성용 조성물 WO2012102473A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110007828A KR101240200B1 (ko) 2011-01-26 2011-01-26 유기 led의 산란층 및 평탄화층 형성용 바인더 및 상기 바인더를 포함하는 산란층 형성용 조성물 및 평탄화층 형성용 조성물
KR10-2011-0007828 2011-01-26

Publications (2)

Publication Number Publication Date
WO2012102473A2 WO2012102473A2 (ko) 2012-08-02
WO2012102473A3 true WO2012102473A3 (ko) 2012-09-20

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PCT/KR2011/008972 WO2012102473A2 (ko) 2011-01-26 2011-11-23 유기 led 의 산란층 및 평탄화층 형성용 바인더 및 상기 바인더를 포함하는 산란층 형성용 조성물 및 평탄화층 형성용 조성물

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KR (1) KR101240200B1 (ko)
WO (1) WO2012102473A2 (ko)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20070115802A (ko) * 2006-06-02 2007-12-06 후지필름 가부시키가이샤 안료분산 조성물, 이것을 사용한 착색 감광성 수지 조성물및 감광성 수지 전사재료, 그리고 이것들을 사용한컬러필터, 액정표시장치 및 ccd 디바이스
KR20080101680A (ko) * 2007-05-18 2008-11-21 가부시키가이샤 한도오따이 에네루기 켄큐쇼 액정 표시장치, 전자 기기, 및 그의 구동방법
KR100917334B1 (ko) * 2001-11-29 2009-09-16 나가세케무텍쿠스가부시키가이샤 광중합성 불포화 수지, 이의 제조방법 및 이를 포함하는알칼리 가용형 감방사선성 수지 조성물
KR20100108532A (ko) * 2007-12-10 2010-10-07 카네카 코포레이션 알칼리 현상성을 갖는 경화성 조성물 및 그것을 사용한 절연성 박막 및 박막 트랜지스터

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100917334B1 (ko) * 2001-11-29 2009-09-16 나가세케무텍쿠스가부시키가이샤 광중합성 불포화 수지, 이의 제조방법 및 이를 포함하는알칼리 가용형 감방사선성 수지 조성물
KR20070115802A (ko) * 2006-06-02 2007-12-06 후지필름 가부시키가이샤 안료분산 조성물, 이것을 사용한 착색 감광성 수지 조성물및 감광성 수지 전사재료, 그리고 이것들을 사용한컬러필터, 액정표시장치 및 ccd 디바이스
KR20080101680A (ko) * 2007-05-18 2008-11-21 가부시키가이샤 한도오따이 에네루기 켄큐쇼 액정 표시장치, 전자 기기, 및 그의 구동방법
KR20100108532A (ko) * 2007-12-10 2010-10-07 카네카 코포레이션 알칼리 현상성을 갖는 경화성 조성물 및 그것을 사용한 절연성 박막 및 박막 트랜지스터

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Publication number Publication date
WO2012102473A2 (ko) 2012-08-02
KR20120086530A (ko) 2012-08-03
KR101240200B1 (ko) 2013-03-06

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