Classifications

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  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/83—Electrodes
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/83—Electrodes
  • H10H20/831—Electrodes characterised by their shape
  • H10H20/8312—Electrodes characterised by their shape extending at least partially through the bodies
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/01—Manufacture or treatment
  • H10H20/011—Manufacture or treatment of bodies, e.g. forming semiconductor layers
  • H10H20/013—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials
  • H10H20/0137—Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials the light-emitting regions comprising nitride materials
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/81—Bodies
  • H10H20/811—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions
  • H10H20/812—Bodies having quantum effect structures or superlattices, e.g. tunnel junctions within the light-emitting regions, e.g. having quantum confinement structures
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/83—Electrodes
  • H10H20/831—Electrodes characterised by their shape
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/83—Electrodes
  • H10H20/831—Electrodes characterised by their shape
  • H10H20/8316—Multi-layer electrodes comprising at least one discontinuous layer
• • H—ELECTRICITY
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  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/83—Electrodes
  • H10H20/832—Electrodes characterised by their material
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/83—Electrodes
  • H10H20/832—Electrodes characterised by their material
  • H10H20/833—Transparent materials
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/83—Electrodes
  • H10H20/832—Electrodes characterised by their material
  • H10H20/835—Reflective materials
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/80—Constructional details
  • H10H20/85—Packages
  • H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
  • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
  • H10H20/01—Manufacture or treatment
  • H10H20/032—Manufacture or treatment of electrodes
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
  • H10W72/00—Interconnections or connectors in packages
  • H10W72/071—Connecting or disconnecting
  • H10W72/075—Connecting or disconnecting of bond wires
  • H10W72/07541—Controlling the environment, e.g. atmosphere composition or temperature
  • H10W72/07554—Controlling the environment, e.g. atmosphere composition or temperature changes in dispositions
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
  • H10W72/00—Interconnections or connectors in packages
  • H10W72/50—Bond wires
  • H10W72/541—Dispositions of bond wires
  • H10W72/547—Dispositions of multiple bond wires
• • H—ELECTRICITY
  • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
  • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
  • H10W90/00—Package configurations
  • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
  • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
  • H10W90/753—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between laterally-adjacent chips

Definitions

• the present disclosure is related to light emitting dies (e.g., light emitting diodes (“LEDs”)) and solid state lighting (“SSL”) devices with light emitting dies having accessible electrodes and methods of manufacturing.
• LEDs light emitting diodes
• SSL solid state lighting
• FIG. 1A is a cross-sectional view of a light emitting die 10 with lateral electrodes.
• the light emitting die 10 includes a substrate 12 carrying an LED structure 11 comprised of N-type gallium nitride (GaN) 14, GaN/indium gallium nitride (InGaN) multiple quantum wells ("MQWs") 16, and P-type GaN 18.
• the light emitting die 10 also includes a first electrode 20 on the N-type GaN 14 and a second electrode 22 on the P-type GaN 18.
• the first and second electrodes 20 and 22 are both on the front side of the LED structure 1 1 and readily accessible.
• Figure IB shows a light emitting die 10' with vertical electrodes.
• the light emitting die 10' includes a first electrode 20 on the N-type GaN 14 and second electrode 22 under the P-type GaN 18.
• the light emitting die 10' can have higher degrees of current spreading between the first and second electrodes 20 and 22 than the light emitting die 10 of Figure 1A.
• the second electrode 22 is not readily accessible because it is buried between the P-type GaN 18 and the substrate 12.
• the first electrode 20 partially blocks the generated light (as indicated by the arrow 15 a), and thus only allows a portion of the generated light to be extracted (as indicated by the arrow 15b).
• the light extraction efficiency of the light emitting die 10' may be limited.
• an light emitting die 10 includes an opening 21 extending into the N-type GaN 14 from the substrate 12.
• An insulating material 25 lines the sidewalls 23 of the opening 21.
• a conductive material is disposed in the opening 21 to form the first electrode 20.
• the light emitting die 10" with the buried first electrode 20 can have improved light extraction efficiencies because it does not cover any portion of the N-type GaN 14.
• neither of the first and second electrodes 20 and 22 are readily accessible in this design, and they require precise alignment with external conductors to avoid electrode mismatch. Accordingly, several improvements in electrode configuration of light emitting dies may be desirable.
• Figure 1 A is a schematic cross-sectional diagram of a light emitting die with lateral electrodes in accordance with the prior art.
• Figure IB is a schematic cross-sectional diagram of a light emitting die with vertical electrodes in accordance with the prior art.
• Figure 1C is a schematic cross-sectional diagram of a light emitting die with a buried electrode in accordance with the prior art.
• Figure 2A is a schematic cross-sectional diagram of a light emitting die with vertical electrodes in accordance with embodiments of the present technology.
• Figure 2B is a schematic top plan view of the light emitting die shown in Figure 2A.
• Figure 3 A is a schematic cross-sectional diagram of a light emitting die with a buried electrode in accordance with embodiments of the present technology.
• Figure 3B is a schematic top plan view of the light emitting die shown in Figure 3A.
• FIG 4 is a schematic illustration of an SSL device incorporating the light emitting dies of Figures 2A-3B in accordance with embodiments of the present technology.
• Figure 5A is a schematic cross-sectional diagram of a light emitting die with a buried electrode in accordance with embodiments of the present technology.
• Figure 5B is a schematic top plan view of the light emitting die shown in Figure 5A.
• Figure 5C is a schematic cross-sectional diagram of a light emitting die with a buried electrode in accordance with embodiments of the present technology.
• Figure 6 A is a schematic cross-sectional diagram of a light emitting die with a buried electrode in accordance with additional embodiments of the present technology.
• Figure 6B is a schematic top plan view of the light emitting die shown in Figure 6A.
• SSL device generally refers to devices with one or more solid state light emitting dies, such as LEDs, laser diodes ("LDs"), and/or other suitable sources of illumination other than electrical filaments, a plasma, or a gas.
• LEDs LEDs
• LDs laser diodes
• a person skilled in the relevant art will also understand that the technology may have additional embodiments, and that the technology may be practiced without several of the details of the embodiments described below with reference to Figures 2A-6B.
• Figure 2A is a schematic cross-sectional diagram of a light emitting die 100
• Figure 2B is a top plan view of the light emitting die 100 shown in Figure 2A.
• the light emitting die 100 can include an SSL structure 111, a first electrode 120, a second electrode 122, and a substrate 102 carrying the SSL structure 111 with an insulating material 103 therebetween. Only certain components of the light emitting die 100 are shown in Figures 2 A and 2B, and it will be appreciated that the light emitting die 100 can also include a lens, a mirror, and/or other suitable optical and/or electrical components in other embodiments.
• the substrate 102 can include a metal, a metal alloy, a doped silicon, and/or other electrically conductive substrate materials.
• the substrate 102 can include copper, aluminum, and/or other suitable metals.
• the substrate 102 can also include a ceramic material, a silicon, a polysilicon, and/or other generally non-conductive substrate materials.
• the substrate 102 can include intrinsic silicon and/or polysilicon materials. Even though only one SSL structure 111 is shown on the substrate 102, two, three, or any other desired number of SSL structure 111 may be formed on the substrate 102 in practice.
• the insulating material 103 can include silicon oxide (Si0 2 ), silicon nitride (Si 3 N 4 ), and/or other suitable non-conductive materials formed on the substrate 102 via thermal oxidation, chemical vapor deposition ("CVD"), atomic layer deposition ("ALD”), and/or other suitable techniques.
• the insulating material 103 can include a polymer (e.g., polytetrafluoroethylene and/or other fluoropolymer of tetrafluoroethylene), an epoxy, and/or other polymeric materials.
• the polymeric materials may be configured as a preformed sheet or tape that can be attached to the substrate 102 via solid-solid bonding, adhesives, and/or other suitable techniques.
• the polymeric materials may be configured as a paste or a liquid that may be applied to the substrate 102 and subsequently cured.
• the insulating material 103 may be omitted if the substrate 102 is electrically insulative.
• the SSL structure 111 is configured to emit light and/or other types of electromagnetic radiation in response to an applied electrical voltage.
• the SSL structure 111 includes a first semiconductor material 104 having a first surface 113a proximate a first side 11 la of the light emitting die 100, an active region 106, and a second semiconductor material 108 having a second surface 113b proximate a second side 11 lb of the light emitting die 100.
• the SSL structure 111 has a stack thickness equal to the sum of the thicknesses of the first semiconductor material 104, the active region 106, and the second semiconductor material 108.
• the stack thickness of the SSL structure 111 shown in Figure 2A is the distance between the first surface 113a and the second surface 113b.
• the SSL structure 111 can also include silicon nitride, aluminum nitride (A1N), and/or other suitable intermediate materials.
• the first semiconductor material 104 can include N-type GaN (e.g., doped with silicon (Si)), and the second semiconductor material 108 can include P- type GaN (e.g., doped with magnesium (Mg)).
• the first semiconductor material 104 can include P-type GaN, and the second semiconductor material 108 can include N-type GaN.
• the first and second semiconductor materials 104 and 108 can individually include at least one of gallium arsenide (GaAs), aluminum gallium arsenide (AlGaAs), gallium arsenide phosphide (GaAsP), gallium(III) phosphide (GaP), zinc selenide (ZnSe), boron nitride (BN), AlGaN, and/or other suitable semiconductor materials.
• GaAs gallium arsenide
• AlGaAs aluminum gallium arsenide
• GaAsP gallium arsenide phosphide
• GaP gallium(III) phosphide
• ZnSe zinc selenide
• BN boron nitride
• AlGaN AlGaN
• the active region 106 can include a single quantum well ("SQW"), MQWs, and/or a bulk semiconductor material.
• a "bulk semiconductor material” generally refers to a single grain semiconductor material (e.g., InGaN) with a thickness greater than about 10 nanometers and up to about 500 nanometers.
• the active region 106 can include an InGaN SQW, GaN/InGaN MQWs, and/or an InGaN bulk material.
• the active region 106 can include aluminum gallium indium phosphide (AlGalnP), aluminum gallium indium nitride (AlGaInN), and/or other suitable materials or configurations.
• At least one of the first semiconductor material 104, the active region 106, and the second semiconductor material 108 can be formed on the substrate material 102 via metal organic chemical vapor deposition ("MOCVD”), molecular beam epitaxy (“MBE”), liquid phase epitaxy (“LPE”), and hydride vapor phase epitaxy (“HVPE”).
• MOCVD metal organic chemical vapor deposition
• MBE molecular beam epitaxy
• LPE liquid phase epitaxy
• HVPE hydride vapor phase epitaxy
• at least one of the foregoing components and/or other suitable components (not shown) of the SSL structure 111 may be formed via other suitable epitaxial growth techniques.
• the first electrode 120 is spaced apart from the second electrode 122 by the vertical thickness of the entire SSL structure 111.
• the shortest distance between the first and second electrodes in this embodiment therefore, is the distance from the first surface 113a to the second surface 113b.
• the first electrode 120 includes a plurality of electrode fingers 121 (three are shown for illustration purposes) coupled to one another by a cross member 123.
• the electrode fingers 121 extend generally parallel to an axis 105 ( Figure 2B) of the SSL structure 111, and the cross member 123 is generally perpendicular to the electrode fingers 121.
• the electrode fingers 121 and/or the cross member 123 can include indium tin oxide ("ITO"), aluminum zinc oxide (“AZO"), fluorine-doped tin oxide ("FTO"), and/or other suitable transparent conductive oxides ("TCOs").
• the electrode fingers 121 and/or the cross member 123 can include copper (Cu), aluminum (Al), silver (Ag), gold (Au), platinum (Pt), and/or other suitable metals.
• the electrode fingers 121 and/or the cross member 123 can include a combination of TCOs and one or more metals.
• Techniques for forming the electrode fingers 121 and/or the cross member 123 can include MOCVD, MBE, spray pyrolysis, pulsed laser deposition, sputtering, electroplating, and/or other suitable deposition techniques.
• the second electrode 122 can include a reflective and conductive material (e.g., silver or aluminum), at least a portion of which can be exposed through the SSL structure 111.
• the second electrode 122 includes a covered first portion 122a and an exposed second portion 122b laterally extending beyond the SSL structure 111.
• the exposed second portion 122b can form a connection site 126 for interconnecting with external components (not shown) via a wirebond and/or other suitable couplers.
• the substrate 102 may be selected to have a first lateral dimension Ls greater than a second lateral dimension L D of the SSL structure 111.
• the insulating material 103 and the second electrode 122 can then be formed on the substrate 102 in sequence.
• the SSL structure 1 11 may be attached to the second electrode 122 on the substrate 102 via solid-solid bonding (e.g., copper-copper bonding, nickel-tin bonding, and gold-tin bonding) between the second electrode 122 and the second semiconductor material 108.
• a bonding material e.g., gold-tin, not shown
• a reflective material e.g., silver, not shown
• the SSL structure 111 can then be bonded to the substrate 102 via solid-solid bonding between the second electrode 122 and the bonding material.
• the SSL structure 111 may be attached to the substrate 102 via other suitable mechanisms.
• the substrate 102 may be selected to have a first lateral dimension Ls that is generally the same as the lateral dimension L D of the SSL structure 1 11.
• a portion of the SSL structure 111 may be removed to form the exposed second portion 122b of the second electrode 122.
• Techniques for removing a portion of the SSL structure 1 11 can include partial dicing (e.g., with a die saw), laser ablation, wet etching, dry etching, and/or other suitable technique.
• the partially exposed second electrode 122 may be formed via other suitable techniques.
• Several embodiments of the light emitting die 100 can have the connection accessibility of the light emitting die 10 of Figure 1A with current spreading characteristics generally similar to that of the light emitting die 10' of Figure IB.
• the exposed second portion 122b of the second electrode 122 provides ready access for external connection.
• both the first electrode 120 and the second electrode 122 can be accessed from the same side (i.e., the first side 11 la) of the SSL structure 111.
• the covered first portion 122a of the second electrode 122 is arranged vertically across the SSL structure 111 with respect to the first electrode 120, and thus providing better current distribution through the SSL structure 111 compared to the lateral device in Figure 1 A.
• several embodiments of the light emitting die 100 can operate with high efficiency while providing the connection accessibility of the light emitting die 10 of Figure 1A.
• the exposed second portion 122b of the second electrode 122 is shown in Figure 2B as extending substantially the entire depth D ( Figure 2B) of the SSL structure 111 along the axis 105, in other embodiments the second portion 122b may extend only partially along the axis 105 of the SSL structure 111.
• the second portion 122b may be exposed through a notch 128 in the SSL structure 111 formed on the substrate 102 with the insulating material 103.
• the notch 128 has a depth d ( Figure 3B) that is less than the depth D ( Figure 2B) of the SSL structure 111.
• the second portion 122b may also include a plurality of individual sections spaced apart from one another.
• three sections are shown in Figure 3B for illustration purposes.
• Each of the three sections 122b, 122b', and 122b" may form a connection site 126 for connecting to an external component (not shown).
• the light emitting die 100 can provide a plurality of connection sites 126 to receive/transmit signals and/or power to/from more than one component.
• the insulating material 103 may be omitted from the light emitting die 100.
• FIG. 4 is a schematic illustration of an SSL device 150 incorporating the light emitting dies 100 of Figures 2A-3B in accordance with embodiments of the present technology.
• the SSL device 150 can include a carrier 152 carrying a plurality of light emitting dies 100.
• the SSL device 150 can include any other desired number of light emitting dies 100.
• the carrier 152 can include a metal, a metal alloy, and/or other types of thermally conductively structure.
• the SSL assembly 150 can also include a first terminal 154 laterally spaced apart from a second terminal 156 on the carrier 152.
• the first and second terminals 154 and 156 are formed on insulative pads 155 and 157, respectively.
• the insulative pads 155 and 157 can include silicon oxide, silicon nitride, and/or other suitable types of electrically insulative materials.
• the first terminal 154, the plurality of light emitting dies 100, and the second terminal 156 are electrically coupled with wirebonds 158 in series because the first and second electrodes 120 and 122 are both on the front side of the individual light emitting dies 100.
• the back side of the light emitting dies 100 can directly contact the surface 152a of the carrier 152. In operation, such direct contact allows the light emitting dies 100 to readily transfer heat to the thermally conductive carrier 152, and thus efficiently dissipate heat away from the light emitting dies 100.
• Figure 5A is a schematic cross-sectional diagram of an light emitting die 200 with a buried electrode in accordance with another embodiment of the technology
• Figure 5B is a top plan view of the light emitting die 200 in Figure 5A.
• the light emitting die 200 can include components that are generally similar in structure and function as those of the light emitting die 100 in Figures 2A-3B.
• the light emitting die 200 can include the substrate 102 carrying the SSL structure 1 11 and the exposed second electrode 122 that are generally similar to those discussed above with reference to Figures 2A-3B.
• common acts and structures are identified by the same reference numbers, and only significant differences in operation and structure are described below.
• the SSL structure 111 includes a plurality of openings 130 (only one is shown in Figure 5A after it has been filled for clarity) extending from the second electrode 122 into the first semiconductor material 104 of the SSL structure 111.
• a passivation material 125 e.g., silicon oxide or silicon nitride
• the first portion 125a generally conforms to the sidewall 131 of the opening 130 and forms a dielectric liner.
• the second portion 125b has a first surface 127a in contact with the second electrode 122 and a second surface 127b in contact with the substrate 102.
• the first electrode 120 can include a conductive material 132 adjacent the passivation material 125 in the opening 130.
• the conductive material 132 has a first end 132a that is generally co-planar with the passivation material 125 such that the first end 132a of the conductive material 132 is in direct contact with the substrate 102.
• the conductive material 132 also includes a second end 132b in contact with the first semiconductor material 104. As a result, the conductive material 132 electrically couples the first semiconductor material 104 to the substrate 102.
• the light emitting die 200 can have more accessible electrical connections than conventional buried electrode devices.
• the first electrode 120 is electrically coupled to the substrate 102.
• the substrate 102 may be electrically conductive and used as a connection site/path to electrically couple external components (not shown). Thus, precise alignment with external conductors may be avoided to reduce production complexity and costs.
• the substrate 102 may be electrically insulative and may include signal routing components (e.g., metal routing layers 134) that route the individual first electrodes 120 to respectively electrical couplers 136 (e.g., solder bumps, solder balls, and/or pillar bumps), as shown in Figure 5C.
• the substrate 102 may be partially electrical conductive and partially electrically insulative.
• the light emitting die 200 may include other suitable configurations, as discussed in more detail below with reference to Figures 6 A and 6B.
• Figure 6 A is a schematic cross-sectional diagram of a light emitting die 300 with a buried electrode
• Figure 6B is a schematic top plan view of the light emitting die 300 shown in Figure 6A.
• the light emitting die 300 includes the substrate 102, the insulating material 103 on the substrate 102, and the SSL structure 111 with exposed first and second electrodes 120 and 122.
• the second electrode 122 can be generally similar to that discussed above with reference to Figure 5 A.
• the insulating material 103 may be omitted.
• the first electrode 120 includes the conductive material 132.
• a first part 133a of the conductive material 132 is adjacent the passivation material 125 in the opening 130.
• a second part 133b of the conductive material 132 is external to the opening 130.
• a portion of the second part 133b laterally extends beyond the second portion 125b of the passivation material 125 and the second portion 122b of the second electrode 122.
• the second part 133b of the conductive material 132 (generally designated as connection area 135) is at least partially exposed through the SSL structure 111.
• the second portion 122b of the second electrode 122 may be laterally opposite and/or having other arrangements relative to the connection area 135.
• the conductive material 132 may include a stack of a plurality of conductive materials (not shown). As shown in Figure 6B, both the first and second electrodes 120 and 122 are accessible from the same side of the SSL structure 111.
• first and/or second electrodes 120 and 122 may also extend a partial depth D of the substrate 102, generally similar to the light emitting die 100 discussed above with reference to Figure 3B.
• the first and/or second electrodes 120 and 122 may include a plurality of electrode elements (not shown).

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